TWI790121B - Display panel - Google Patents

Abstract

A display panel includes a substrate, a plurality isolation structures, a plurality of light-emitting elements, a second photoluminescence material layer, a third photoluminescence material layer, a black matrix layer and an absorption photoresist layer. A first light-emitting region, a second light-emitting region and a third light-emitting region defined on the substrate are separated by the isolation structures. The light-emitting elements are arranged at the first, second, and third light-emitting regions, and generates a first light wave. The second photoluminescence material layer is located on the second light-emitting region and generates a second light wave after excited by the first light wave. The third photoluminescence material layer is located on the second light-emitting region and generates a third light wave after excited by the first light wave. The black matrix layer is on an upper surface of the isolation structures. The absorption photoresist layer covers the second photoluminescence material layer, the third photoluminescence material layer, and the black matrix layer, and absorbs the first light wave. In this way, the problems of light leakage, light mixing caused by assembly and ambient light reflection can be overcome, and high aperture ratio and high luminance are provided.

Description

display panel

The invention relates to the display field, in particular to a display panel.

In the prior art, the display is composed of two panels, a control panel and a color filter, which respectively achieve the effects of circuit control and light filtering. However, optical glue is required for bonding between the two panels, so light generated by the light source may leak laterally along the optical glue. In addition, due to assembly tolerances, if there is alignment deviation, the light of different colors emitted toward the light-emitting surface will also cause light mixing.

In the prior art, in order to reduce the problem of light mixing, a black matrix layer is provided on the color filter to separate different sub-pixel regions. However, considering the assembly tolerance, the black matrix layer will be designed with a wider width, such as covering 1/5 of the sub-pixel. Although the problem of light mixing can be solved, it will inevitably reduce the aperture ratio and brightness of the product.

In addition, due to the assembly of two panels, if the curved surface design is adopted, the alignment deviation may increase, which makes it difficult to apply the existing technology on the flexible substrate, and further limits the design margin of the product.

In order to solve the problems faced by the prior art, a display panel is provided herein. The display panel includes a substrate, a plurality of isolation structures, a plurality of light emitting elements, a second photoexcitation material layer, a third photoexcitation material layer, a black matrix layer, and an absorption photoresist layer.

The substrate defines a first light emitting area, a second light emitting area and a third light emitting area. The isolation structure is disposed on the substrate to separate the first light emitting region, the second light emitting region and the third light emitting region. The light-emitting elements are respectively arranged in the first light-emitting area, the second light-emitting area and the third light-emitting area of the substrate, and the light-emitting elements emit the first light wave.

The second light-exciting material layer is filled in the second light-emitting region, and the second light-exciting material layer is excited by the first light wave to generate the second light wave. The third light-exciting material layer is filled in the third light-emitting area, and the third light-exciting material layer is excited by the first light wave to generate a third light wave, wherein the wavelengths of the second light wave and the third light wave are different from the wavelength of the first light wave. The black matrix layer is disposed on the upper surface of the isolation structure. The absorbing photoresist layer covers the second photoexcitation material layer, the third photoexcitation material layer and the black matrix layer, and the absorption photoresist layer absorbs the first light wave.

In some embodiments, the black matrix layer includes a metal layer and a metal oxide layer, the metal layer is located on the upper surface of the isolation structure, and the metal oxide layer is located between the metal layer and the absorbing photoresist layer.

More specifically, in some embodiments, the metal layer is selected from the group consisting of molybdenum metal, nickel metal, indium metal, copper metal, silver metal, aluminum metal, chromium metal, tantalum metal, titanium metal, and alloys thereof . The metal oxide layer is selected from molybdenum metal oxide, nickel metal oxide, indium metal oxide, copper metal oxide, silver metal oxide, aluminum metal oxide, chromium metal oxide, tantalum metal oxide, titanium metal oxide A group consisting of alloy oxides of molybdenum, nickel, indium, copper, silver, aluminum, chromium, tantalum, and titanium.

In some embodiments, the light emitting element is a blue light emitting diode, and the absorbing photoresist layer is a yellow photoresist layer.

In some embodiments, the light-emitting element is an ultraviolet light-emitting diode, and the display panel further includes a first light-exciting material layer, and the first light-exciting material layer is filled in the first light-emitting region. The absorbing photoresist layer further covers the first light excitation material layer and absorbs the first light wave, and the first light excitation material layer is excited by the first light wave to generate a fourth light wave.

In more detail, in some embodiments, the region of the absorbing photoresist layer on the first photoexcitation material layer, the region on the second photoexcitation material layer, and the region on the third photoexcitation material layer are provided with a plurality of slots . Further, in some embodiments, the slots have different widths.

In some embodiments, the absorbing photoresist layer has different thicknesses on the second photoactive material layer and the third photoactive material layer.

In some embodiments, the absorbing photoresist layer is a curved surface on the second photoexcitation material layer and the third photoexcitation material layer.

In some embodiments, the region of the absorbing photoresist layer on the second photoexcitation material layer and the region on the third photoexcitation material layer is provided with a plurality of grooves.

In more detail, in some embodiments, the substrate is a flexible substrate, and the long side direction of the slot is parallel to the flex axis direction of the substrate.

In more detail, in some embodiments, the slots have different widths.

In some embodiments, the region of the absorbing photoresist layer on the black matrix layer is provided with grooves.

In some embodiments, the edge of the black matrix layer protrudes beyond the edge of the upper surface of the isolation structure.

In some embodiments, the absorbing photoresist layer on the second photoactive material layer or the third photoactive material layer is at least partially connected to the absorbing photoresist layer on the black matrix layer.

In some embodiments, the isolation structure can reflect the first light wave, the second light wave and the third light wave.

As described in the above-mentioned embodiments, the display panel directly manufactures the black matrix layer and absorbing photoresist on a single panel through the panel manufacturing process. Therefore, the problems of light leakage and light mixing caused by assembly tolerances in the prior art can be solved, and at the same time, the problem of ambient light reflection can be solved. Furthermore, it can also be applied to flexible substrates. Furthermore, since there is no need to consider the alignment tolerance in this structure, the area ratio of the black matrix layer can be further reduced, so that the display panel can have a higher aperture ratio and brightness.

In the drawings, the widths of some elements, regions, etc. are exaggerated for clarity. Throughout the specification, the same reference numerals denote the same elements. It will be understood that when an element is referred to as being "on" or "connected to" another element, it can be directly on or connected to the other element or intervening elements may also be present. In contrast, when an element is referred to as being "directly on" or "directly connected to" another element, there are no intervening elements present.

It should be understood that although the terms "first", "second", "third", etc. may be used herein to describe various elements, components, regions, or sections, these elements, components, regions, and/or sections do not shall be limited by these terms. These terms are only used to distinguish one element, component, region, or section from another element, component, region, layer or section. Thus, a "first element," "component," "region," or "section" discussed below could be termed a second element, component, region, or section without departing from the teachings herein.

Additionally, relative terms such as "lower" or "bottom" and "upper" or "top" may be used herein to describe one element's relationship to another element as shown in the figures. It will be understood that relative terms are intended to encompass different orientations of the device in addition to the orientation depicted in the figures. For example, if the device in one of the figures is turned over, elements described as being on the "lower" side of other elements would then be oriented on "upper" sides of the other elements. Thus, the exemplary term "below" can encompass both an orientation of "below" and "upper," depending on the particular orientation of the drawing. Similarly, if the device in one of the figures is turned over, elements described as "below" other elements would then be oriented "above" the other elements. Thus, the exemplary terms "below" or "beneath" can encompass both an orientation of above and below.

Fig. 1 is a partial cross-sectional schematic diagram of the first embodiment. As shown in FIG. 1 , the display panel 1 includes a substrate 10, a plurality of isolation structures 20, a plurality of light emitting elements 30, a second photoexcitation material layer 43, a third photoexcitation material layer 45, a black matrix layer 50, and an absorption photoresist. Layer 60. Here, it should be noted that each element in the drawings is only for clear illustration, and is not completely drawn according to the actual scale.

The substrate 10 defines a first light emitting region 11 , a second light emitting region 13 and a third light emitting region 15 . The isolation structure 20 is disposed on the substrate 10 to separate the first light emitting region 11 , the second light emitting region 13 and the third light emitting region 15 . In more detail, viewed in cross-section, the isolation structure 20 is a columnar structure, but viewed in a top view, the isolation structure 20 may be a grid structure. After the isolation structure 20 is provided, the first light emitting region 11 , the second light emitting region 13 and the third light emitting region 15 together with the two isolation structures 20 form a concave region. The light emitting elements 30 are respectively disposed on the first light emitting area 11 , the second light emitting area 13 and the third light emitting area 15 of the substrate 10 , and the light emitting elements 30 emit the first light wave L1 . Here, the isolation structure 20 may be separated or partially connected.

The second light-exciting material layer 43 is filled in the second light-emitting region 13 , and the second light-exciting material layer 43 is excited by the first light wave L1 to generate the second light wave L2 . The third light-exciting material layer 45 is filled in the third light-emitting region 15, and the third light-exciting material layer 45 is excited by the first light wave L1 to generate the third light wave L3. The wavelengths of the second light wave L2 and the third light wave L3 are different from those of the first light wave L1. For example, the first light wave L1 may be blue light, the second light wave L2 may be red light, and the third light wave may be green light. However, the above is only an example, not a limitation.

The black matrix layer 50 is disposed on the upper surface of the isolation structure 20 to block light emitted toward the upper surface of the isolation structure 20 . In this way, in addition to applying the panel process technology to reduce the alignment tolerance, the area ratio of the black matrix layer 50 can be reduced, and the aperture ratio of the panel can be increased. In other words, the black matrix layer 50 only has manufacturing process tolerances, but no assembly tolerances, which can be more precise without considering the alignment of the two panels. In some embodiments, the width of the upper surface of the isolation structure 20 is about 5 μm. In some embodiments, the distance between the edge of the black matrix layer 50 and the edge of the upper surface of the isolation structure 20 may be about 0 to 5 μm, in other words, the black matrix layer 50 protrudes or shrinks from the upper surface of the isolation structure 20 by about to 5 μm. In order to avoid the light leakage of the isolation structure 20 or the reflection of external light on the upper surface of the isolation structure 20 to reduce the display contrast, the black matrix layer 50 is preferably wider than the upper surface of the isolation structure 20. In some embodiments, the black matrix layer 50 is formed by the isolation structure. The upper surface of 20 protrudes outward by about 0 to 5 μm.

In terms of the overall process, the existing panel process technology can be used to first complete the filling of the second photoactive material layer 43 and the third photoactive material layer 45 , and then complete the black matrix layer 50 . It should be noted that, in the range of the cross-sectional width ratio (H2/H1), since the shadowing effect of the black matrix layer 50 is small, the black matrix layer 50 can also be completed first, and then filled with the second photoactive material layer 43 and the third photoactive material layer 45 . In this way, the process margin can be further improved, which improves the flexibility of production and the utilization rate of equipment.

The absorbing photoresist layer 60 covers the second photoexcitation material layer 43 , the third photoexcitation material layer 45 and the black matrix layer 50 , and the absorption photoresist layer 60 absorbs the first light wave L1 . In this way, the first light wave L1 that does not excite the second photoexcitation material layer 43 and the third photoexcitation material layer 45 in the second photoexcitation material layer 43 and the third photoexcitation material layer 45 can be absorbed, and the purification is performed by the second photoexcitation material layer 45. The second light wave L2 and the third light wave L3 emitted by the light emitting area 13 and the third light emitting area 15 . In this embodiment, the first light-emitting region 11 can be filled into the light-transmitting material layer 41A, so that the first light wave L1 is directly emitted.

In this embodiment, the absorbing photoresist layer 60 of the second photoactive material layer 43 or the third photoactive material layer 45 is at least partially connected to the absorbing photoresist layer 60 on the black matrix layer 50 . In other words, the absorbing photoresist layer 60 covers the whole piece, and the position that does not need to cover the absorbing photoresist layer 60 can be excluded through a masking method.

More specifically, in some embodiments, the light emitting element 30 may be a blue light emitting diode, and may also be a Mini-LED or a Micro LED according to its size. The second photo-exciting material layer 43 includes a plurality of second photo-exciting materials 431 , such as red quantum dots, or high-density red phosphor. The third photo-exciting material layer 45 includes a plurality of third photo-exciting materials 451 , for example, green quantum dots or high-density green phosphor. The absorbing photoresist layer 60 is a yellow photoresist layer. However, the yellow photoresist layer is designed according to the blue light-emitting element to excite red light and green light, which is only an example, not a limitation.

Fig. 2 is a partially enlarged view of Fig. 1 . As shown in FIG. 2 , the black matrix layer 50 may actually be a composite layer stacked with a metal layer 51 and a metal oxide layer 53, and together with the absorbing photoresist layer 60, form a three-layer stacked structure. However, this is only an example, and Not intended to be limiting. The metal layer 51 is located on the upper surface of the isolation structure 20 , and the metal oxide layer 53 is located between the metal layer 51 and the absorbing photoresist layer 60 .

More specifically, the metal layer 51 may be molybdenum metal, nickel metal, indium metal, copper metal, silver metal, aluminum metal, chromium metal, tantalum metal, titanium metal, or an alloy composed of the aforementioned metal materials. The metal oxide layer 53 may be molybdenum metal oxide, nickel metal oxide, indium metal oxide, copper metal oxide, silver metal oxide, aluminum metal oxide, chromium metal oxide, tantalum metal oxide, titanium metal oxide It can also be alloy oxides of molybdenum, nickel, indium, copper, silver, aluminum, chromium, tantalum, and titanium. Furthermore, semiconductor dopants may also be added to the metal oxide layer 53 . The metal layer 51 can reflect the light emitted from the upper surface of the isolation structure 20 . The metal oxide layer 53 can protect the underlying metal from being oxidized to affect the light performance, and can also absorb part of the light emitted from the upper surface of the isolation structure 20 , at the same time. The metal layer 51 and the metal oxide layer 53 can be completed through a low-temperature process, and the low temperature can avoid performance degradation of the second photo-excitation material layer 43 and the third photo-excitation material layer 45 .

The absorbing photoresist layer 60 further covers the metal oxide layer 53 . The first light wave L1 that penetrates through the metal oxide layer 53 or reflects toward the upper surface of the isolation structure 20 is absorbed to further achieve the effect of preventing light mixing.

In more detail, the isolation structure 20 can reflect the first light wave L1 , the second light wave L2 and the third light wave L3 . In this way, the first light wave L1 generated by the light emitting element 30, or the second light wave L2 and the third light wave L3 generated by excitation can be reflected by the isolation structure 20 and return to the first light emitting region 11 and the second light emitting region 13 And the third light-emitting region 15 is emitted from the direction above the figure, thereby increasing the brightness of the emitted light.

The isolation structure 20 may contain a material with high reflectivity, and generally, the isolation structure 20 is white. Fig. 3 is a partially enlarged view of another embodiment of the isolation structure. As shown in FIG. 3 , in some other embodiments, the isolation structure 20 may also be coated with a high-reflectivity material to form a reflective layer 21 . The high reflectivity material can be titanium dioxide. The isolation structure 20 can be made of titanium dioxide, or a photoresist doped with titanium dioxide particles, or the photoresist can be used as the main body and coated with titanium dioxide as the reflective layer 21 . However, the above are examples only and are not intended to be limiting.

FIG. 4 is a partial cross-sectional schematic diagram of a second embodiment of the display panel. As shown in FIG. 4 , the absorbing photoresist layer 60 of the second embodiment has different thicknesses on the second photoexcitation material layer 43 and the third photoexcitation material layer 45 . For example, the thickness on the second photoactive material layer 43 is smaller than the thickness on the third photoactive material layer 45 . Here, the consideration of different thickness designs lies in the degree of blue light leakage. If there is more blue light leakage, a thicker absorbing photoresist layer 60 is required. Therefore, the above is only an example, not a limitation, and the color configuration of the second light-exciting material layer 43 and the third light-exciting material layer 45 , as well as the degree of blue light leakage should be considered for configuration.

FIG. 5 is a partial cross-sectional schematic diagram of a third embodiment of the display panel. As shown in FIG. 5 , further, the absorbing photoresist layer 60 is a curved surface on the second photoexcitation material layer 43 and the third photoexcitation material layer 45 . In this embodiment, the light field of the light-emitting element 30 is an example where the light of the first light wave L1 directly above is the strongest and the first light wave L1 emitted from the side is weaker, and the absorbing photoresist layer 60 arranged correspondingly has a single peak curved surface. However, if the light emitting element 30 has a special light emitting angle. Or a plurality of light-emitting diodes, or a curved surface with multiple peaks. Therefore, the configuration of the shape of the absorbing photoresist layer 60 can be performed by simulating the light field of the light-emitting element 30 , and further, it can be adjusted according to the second embodiment.

FIG. 6 is a partial cross-sectional schematic diagram of a fourth embodiment of the display panel. As shown in FIG. 6 , in the fourth embodiment, the light emitting element 30 is an ultraviolet light emitting diode (UV-LED). The display panel 1 further includes a first photoexcitable material layer 41 filled in the first light emitting region 11 . The first photoexcitation material layer 41 includes a plurality of first photoexcitation materials 411 , such as blue quantum dots or high-density blue phosphor. Likewise, the second photo-exciting material layer 43 includes a plurality of second photo-exciting materials 431 , such as red quantum dots or high-density red phosphor. The third photo-exciting material layer 45 includes a plurality of third photo-exciting materials 451 , for example, green quantum dots or high-density green phosphor. The absorbing photoresist layer 60 further covers the first photoactive material layer 41 and absorbs the first light wave L1. In this embodiment, the first light wave L1 is ultraviolet light, the second light wave L2 is red light, and the third light wave L3 is green light. In the first light-emitting region 11, the first photoexcitable material 411 is stimulated by the first light wave L1. Excited to generate the fourth light wave L4, where the fourth light wave L4 is blue light.

FIG. 7 is a partial top view of a fifth embodiment of the display panel. As shown in FIG. 7 , referring to FIG. 1 , FIG. 4 and FIG. 5 at the same time, only the first light-emitting region 11 , the second light-emitting region 13 , and the third light-emitting region 15 are shown here only to show the design change of the absorbing photoresist layer 60 , the black matrix layer 50 and the absorbing photoresist layer 60, other components are omitted. The substrate 10 of the fifth embodiment adopts a flexible substrate, such as a flexible circuit board, and the absorbing photoresist layer 60 is in the second light-emitting region 13 and the third light-emitting region 15, that is, the region on the second light-exciting material layer 43 and the first light-emitting region. A plurality of slots 61 are opened in the regions on the three photoactive material layers 45 . The purpose of the groove 61 is to serve as a stress release area to disperse the tensile stress concentrated on the absorbing photoresist layer 60 , so as to prevent the absorbing photoresist layer 60 from being peeled off or separated due to the tensile stress when the substrate 10 is flexed. Further, there may be a plurality of slots 61 whose long sides are substantially parallel to the flex axis direction A of the base plate 10 to release stress more effectively. For example, in this embodiment, the longitudinal directions of the slots 61 are substantially parallel to the direction A of the bending axis of the substrate 10 .

FIG. 8 is a partial top view of a sixth embodiment of the display panel. As shown in FIG. 8 , referring to FIG. 7 at the same time, the sixth embodiment is a variation of the fifth embodiment. In some embodiments, the width of the slot 61 is further changed, and the slot 61 may have different widths. For example, when the light intensity directly above the light-emitting element 30 is strong, and when other directions are weak, the blue light that may be generated in the center leaks more. Wider width design to adjust the leakage of blue light. However, this is only an example rather than a limitation. Actually, the width, position, and number of the slots 61 can be adjusted according to the light field of the actual light emitting element 30 . Further, it can also be carried out in conjunction with the designs in Fig. 4 and Fig. 5 .

FIG. 9 is a partial top view of a seventh embodiment of a display panel. As shown in FIG. 9 , referring to FIG. 6 at the same time, in the seventh embodiment, a flexible substrate and an ultraviolet light emitting diode (UV-LED) are used as the light emitting element 30 . The absorbing photoresist layer 60 further covers the first photoactive material layer 41 . The absorbing photoresist layer 60 is also provided with a plurality of slots 61 in the first light-emitting region 11 , that is, the region on the first light-exciting material layer 41 . Further, referring to FIG. 7 , the slot 61 may also extend to a part of the black matrix layer 50 area. Still further, the seventh embodiment can also adjust the width, position, and quantity of the slots 61 according to the designed light field as in the sixth embodiment shown in FIG. 8 .

FIG. 10 is a partial top view of the eighth embodiment of the display panel. As shown in FIG. 10 , the absorbing photoresist layer 60 is provided with a groove 61 in a region on the black matrix layer 50 . The slot 61 serves as a stress relief area. It is also possible to adjust the color temperature of the display panel 1 in a dark state by providing partial reflection of ambient light by means of the slot 61 .

To sum up, the display panel 1 arranges the black matrix layer 50 and the light-absorbing photoresist layer 60 on the same substrate 10 as the light-emitting element 30, which can reduce the overall thickness, and reduce the tolerance of assembly and alignment, thus solving the existing problems. Technically, the problem of light leakage and mixed light caused by the tolerance of the assembly of the two panels, and the problem of ambient light reflection can be solved at the same time, so it can be applied on the flexible substrate 10 . Further, through the reduction of the tolerance, the area ratio of the black matrix layer 50 can be reduced, which enables the display panel 1 to have a higher aperture ratio and brightness.

Although the technical content of the present invention has been disclosed above with preferred embodiments, it is not intended to limit the present invention. Any modification and modification made by those skilled in the art without departing from the spirit of the present invention should be covered by the present invention. Therefore, the scope of protection of the present invention should be defined by the scope of the appended patent application.

1: Display panel 10: Substrate 11: The first light-emitting area 13: The second light-emitting area 15: The third luminous area 20: Isolation structure 21: reflective layer 30: Light emitting element 41: the first light excitation material layer 41A: transparent material layer 411: The first photoexcited material 43: the second photoexcitation material layer 431: The second photoexcited material 45: the third photoexcitation material layer 451: The third photoexcitation material 50: black matrix layer 51: metal layer 53: metal oxide layer 60: Absorbing photoresist layer 61: slotting A: The direction of the deflection axis L1: first light wave L2: second light wave L3: third light wave L4: fourth light wave

FIG. 1 is a partial cross-sectional schematic diagram of a first embodiment of a display panel. Fig. 2 is a partially enlarged view of Fig. 1 . Fig. 3 is a partially enlarged view of another embodiment of the isolation structure. FIG. 4 is a partial cross-sectional schematic diagram of a second embodiment of the display panel. FIG. 5 is a partial cross-sectional schematic diagram of a third embodiment of the display panel. FIG. 6 is a partial cross-sectional schematic diagram of a fourth embodiment of the display panel. FIG. 7 is a partial top view of a fifth embodiment of the display panel. FIG. 8 is a partial top view of a sixth embodiment of the display panel. FIG. 9 is a partial top view of a seventh embodiment of a display panel. FIG. 10 is a partial top view of the eighth embodiment of the display panel. .

1: Display panel

10: Substrate

11: The first light-emitting area

13: The second light-emitting area

15: The third luminous area

20: Isolation structure

30: Light emitting element

41A: transparent material layer

43: the second photoexcitation material layer

431: The second photoexcited material

45: the third light excitation material layer

451: The third photoexcitation material

50: black matrix layer

60: Absorbing photoresist layer

L1: first light wave

L2: second light wave

L3: third light wave

Claims (16)

A display panel comprising: A substrate defining a first light emitting region, a second light emitting region and a third light emitting region; A plurality of isolation structures are arranged on the substrate to separate the first light emitting region, the second light emitting region and the third light emitting region; A plurality of light emitting elements are respectively arranged in the first light emitting region, the second light emitting region and the third light emitting region of the substrate, and the light emitting elements emit a first light wave; A second light-exciting material layer filled in the second light-emitting region, the second light-exciting material layer is excited by the first light wave to generate a second light wave; A third light-exciting material layer filled in the third light-emitting region, the third light-exciting material layer is excited by the first light wave to generate a third light wave, wherein the second light wave and the third light wave have different wavelengths at the wavelength of the first light wave; a black matrix layer disposed on an upper surface of the isolation structures; and An absorption photoresist layer covers the second photoexcitation material layer, the third photoexcitation material layer and the black matrix layer, and the absorption photoresist layer absorbs the first light wave. The display panel as described in claim 1, wherein the black matrix layer includes a metal layer and a metal oxide layer, the metal layer is located on the upper surface of the isolation structures, the metal oxide layer is located on the metal layer and the metal oxide layer between absorbing photoresist layers. The display panel as described in Claim 2, wherein the metal layer is selected from molybdenum metal, nickel metal, indium metal, copper metal, silver metal, aluminum metal, chromium metal, tantalum metal, titanium metal, and alloys thereof Group, the metal oxide layer is selected from molybdenum metal oxide, nickel metal oxide, indium metal oxide, copper metal oxide, silver metal oxide, aluminum metal oxide, chromium metal oxide, tantalum metal oxide , Titanium metal oxides and alloy oxides of molybdenum, nickel, indium, copper, silver, aluminum, chromium, tantalum, and titanium. The display panel according to claim 1, wherein the light emitting element is a blue light emitting diode, and the absorbing photoresist layer is a yellow photoresist layer. The display panel as described in claim 1, wherein the light-emitting element is an ultraviolet light-emitting diode, and the display panel further includes a first photoexcitation material layer, and the first photoexcitation material layer is filled in the first light-emitting region The absorbing photoresist layer further covers the first light excitation material layer to absorb the first light wave, and the first light excitation material layer is excited by the first light wave to generate a fourth light wave. The display panel as claimed in claim 5, wherein the absorbing photoresist layer is formed on the region on the first photoexcitation material layer, the region on the second photoexcitation material layer, and the region on the third photoexcitation material layer There are plural slots. The display panel as claimed in claim 6, wherein the slots have different widths. The display panel as claimed in claim 1, wherein the absorbing photoresist layer has different thicknesses on the second light-exciting material layer and the third light-exciting material layer. The display panel according to claim 1 or claim 7, wherein the absorbing photoresist layer is a curved surface on the second photoexcitation material layer and the third photoexcitation material layer. The display panel as claimed in claim 1, wherein the region of the absorbing photoresist layer on the second light-exciting material layer and the area on the third light-exciting material layer are provided with a plurality of grooves. The display panel as claimed in claim 10, wherein the substrate is a flexible substrate, and a long side direction of the slots is parallel to a bending axis direction of the substrate. The display panel as claimed in claim 10, wherein the slots have different widths. The display panel as claimed in claim 1, wherein the absorbing photoresist layer defines a groove in a region on the black matrix layer. The display panel as claimed in claim 1, wherein the edge of the black matrix layer protrudes from the edge of the upper surface of the isolation structures. The display panel as claimed in claim 1, wherein the absorbing photoresist layer on the second light-exciting material layer or the third light-exciting material layer is at least partially connected to the absorbing photoresist layer on the black matrix layer. The display panel as claimed in claim 1, wherein the isolation structures can reflect the first light wave, the second light wave and the third light wave.

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