TWI788691B - Atomic Absorption Spectrophotometer - Google Patents

Atomic Absorption Spectrophotometer Download PDF

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TWI788691B
TWI788691B TW109126259A TW109126259A TWI788691B TW I788691 B TWI788691 B TW I788691B TW 109126259 A TW109126259 A TW 109126259A TW 109126259 A TW109126259 A TW 109126259A TW I788691 B TWI788691 B TW I788691B
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nozzle
hole
imaging unit
tip
atomic absorption
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TW109126259A
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TW202124939A (en
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太田黒敦彦
小林央祐
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日商島津製作所股份有限公司
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N1/00Sampling; Preparing specimens for investigation
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry

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  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
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Abstract

一種原子吸光分光光度計,包括:原子化部、噴嘴、噴 嘴移動機構、位置調整機構、至少一個攝像部、以及顯示器。原子化部包括:形成有試樣注入用的孔部的爐,藉由加熱而將注入至爐內的試樣進行原子化。噴嘴抽吸及噴出試樣。噴嘴移動機構使噴嘴移動至孔部的正上方位置。位置調整機構構成為:能夠藉由使噴嘴移動機構移動,來調整噴嘴的前端相對於孔部的相對位置。至少一個攝像部是以於噴嘴的前端位於孔部的正上方的狀態下,於攝像視野中包含噴嘴的前端及孔部的方式來配置。顯示器顯示由至少一個攝像部所得的攝像圖像。 An atomic absorption spectrophotometer, comprising: an atomization part, a nozzle, a spray A mouth moving mechanism, a position adjusting mechanism, at least one imaging unit, and a display. The atomization unit includes a furnace having a hole for sample injection, and atomizes the sample injected into the furnace by heating. The nozzle sucks and ejects the sample. The nozzle moving mechanism moves the nozzle to a position directly above the hole. The position adjusting mechanism is configured to be able to adjust the relative position of the tip of the nozzle with respect to the hole by moving the nozzle moving mechanism. At least one imaging unit is arranged so that the tip of the nozzle and the hole are included in the imaging field of view in a state where the tip of the nozzle is located directly above the hole. The display displays captured images obtained by at least one imaging unit.

Description

原子吸光分光光度計 Atomic Absorption Spectrophotometer

本發明是有關於一種原子吸光分光光度計。 The invention relates to an atomic absorption spectrophotometer.

日本專利實開昭61-190856號公報(專利文獻1)中,揭示有:爐式的原子吸光分光光度計中所使用的自動試樣注入裝置。專利文獻1中記載的自動試樣注入裝置,包括:注入機構。注入機構構成為:於形成於圓筒形狀的石墨管的側面的小徑孔部(試樣注入孔)中通過而於管內注入液體試樣。具體而言,注入機構的臂於前端保持噴嘴,且固定於臂旋轉軸。注入機構藉由臂旋轉軸的旋轉運動,使噴嘴自收納有試樣的容器的正上方的位置移動至孔部的正上方後,使臂旋轉停止。繼而,注入機構使臂下降而將噴嘴的前端插入至孔部,自噴嘴向管內部注入試樣。 Japanese Patent Application Laid-Open No. 61-190856 (Patent Document 1) discloses an automatic sample injection device used in a furnace-type atomic absorption spectrophotometer. The automatic sample injection device described in Patent Document 1 includes an injection mechanism. The injection mechanism is configured to inject a liquid sample into the tube by passing through a small-diameter hole (sample injection hole) formed on the side surface of the cylindrical graphite tube. Specifically, the arm of the injection mechanism holds the nozzle at the tip and is fixed to the arm rotation shaft. The injection mechanism moves the nozzle from a position directly above the container storing the sample to directly above the hole by the rotational movement of the arm rotation shaft, and then stops the rotation of the arm. Next, the injection mechanism lowers the arm to insert the tip of the nozzle into the hole, and injects the sample from the nozzle into the tube.

[現有技術文獻] [Prior art literature] [專利文獻] [Patent Document]

[專利文獻1]日本專利實開昭61-190856號公報 [Patent Document 1] Japanese Patent Application Publication No. 61-190856

然而,為了使用所述自動試樣注入裝置,向石墨管中注入試樣,而需要以藉由臂的轉動使噴嘴移動至石墨管的孔部的正上方位置的方式,來預先調整噴嘴相對於孔部的相對位置。 However, in order to inject the sample into the graphite tube using the automatic sample injection device, it is necessary to adjust the position of the nozzle relative to the graphite tube in advance by rotating the arm to move the nozzle to a position directly above the hole of the graphite tube. The relative position of the hole.

先前,此位置調整是藉由使用者以目視來確認孔部的位置,以噴嘴的前端位於孔部的正上方的方式,使注入機構於水平方向移動而進行。 Conventionally, this position adjustment has been performed by the user visually confirming the position of the hole, and moving the injection mechanism in the horizontal direction so that the tip of the nozzle is positioned directly above the hole.

然而,孔部的直徑小至1mm~2mm左右,因此,藉由使用者的目視來確認孔部的位置費時費力,結果,噴嘴的位置調整並不一定是容易的作業。因此,存在分析的準備需要長時間,使分析作業的效率降低的問題。另外,於藉由使用者的目視來進行的位置調整中,存在相對於孔部的正上方位置的偏移殘留的情況,擔憂位置調整的精度不穩定。 However, the diameter of the hole is as small as about 1 mm to 2 mm. Therefore, it takes time and effort to confirm the position of the hole visually by the user. As a result, adjusting the position of the nozzle is not necessarily an easy task. Therefore, there is a problem that it takes a long time to prepare for the analysis, which reduces the efficiency of the analysis work. In addition, in the position adjustment performed by the user's eyes, there is a possibility that a deviation from the position directly above the hole may remain, and there is a concern that the accuracy of the position adjustment may not be stable.

本發明是為了解決如上所述的課題而形成,其目的為,於原子吸光分光光度計中,能夠使噴嘴的位置調整容易,並且提高位置調整的精度。 The present invention is made to solve the above-mentioned problems, and an object of the present invention is to facilitate position adjustment of a nozzle and improve the accuracy of position adjustment in an atomic absorption spectrophotometer.

本發明的第一形態的原子吸光分光光度計包括:原子化部、噴嘴、噴嘴移動機構、位置調整機構、至少一個攝像部、以及顯示器。原子化部包括:形成有試樣注入用的孔部的爐,藉由加熱而將注入至爐內的試樣進行原子化。噴嘴抽吸及噴出試樣。噴嘴移動機構使噴嘴移動至孔部的正上方位置。位置調整機構構成為:能夠藉由使噴嘴移動機構移動,來調整噴嘴的前端相對於 孔部的相對位置。至少一個攝像部是以於噴嘴的前端位於孔部的正上方的狀態下,於攝像視野中包含噴嘴的前端及孔部的方式來配置。顯示器顯示由至少一個攝像部所得的攝像圖像。 An atomic absorption spectrophotometer according to a first aspect of the present invention includes an atomization unit, a nozzle, a nozzle moving mechanism, a position adjustment mechanism, at least one imaging unit, and a display. The atomization unit includes a furnace having a hole for sample injection, and atomizes the sample injected into the furnace by heating. The nozzle sucks and ejects the sample. The nozzle moving mechanism moves the nozzle to a position directly above the hole. The position adjusting mechanism is configured to be able to adjust the front end of the nozzle relative to the nozzle by moving the nozzle moving mechanism. The relative position of the hole. At least one imaging unit is arranged so that the tip of the nozzle and the hole are included in the imaging field of view in a state where the tip of the nozzle is located directly above the hole. The display displays captured images obtained by at least one imaging unit.

根據本發明,於原子吸光分光光度計中,能夠使噴嘴的位置調整容易,並且能夠提高位置調整的精度。 According to the present invention, in the atomic absorption spectrophotometer, the position adjustment of the nozzle can be easily adjusted, and the accuracy of the position adjustment can be improved.

1:光源 1: light source

2:原子化部 2: Atomization Department

3:分光器 3: Optical splitter

4:自動採樣器 4: Automatic sampler

5:檢測器 5: Detector

6:加熱器 6: Heater

8:驅動器 8: drive

9:轉盤 9: turntable

10:位置調整機構 10: Position adjustment mechanism

12、12A、12B:攝像部 12, 12A, 12B: camera department

14、14A、14B、33、34:反射鏡 14, 14A, 14B, 33, 34: mirrors

15:控制器 15: Controller

16:顯示器 16: Display

18:操作部 18:Operation department

21:石墨管 21: graphite tube

22、25:孔部 22, 25: Hole

23、24:電極 23, 24: electrode

26:窗板 26: window panel

31:入口狹縫 31: Entrance slit

32:出口狹縫 32: Exit slit

35:繞射光柵 35: Diffraction grating

40:噴嘴 40: Nozzle

41:噴嘴移動機構 41: Nozzle moving mechanism

42:臂 42: arm

43:旋轉軸 43:Rotary axis

44、90:馬達 44, 90: motor

92:平台 92: platform

94a、94b、94c:容器類 94a, 94b, 94c: container class

100:原子吸光分光光度計 100: Atomic Absorption Spectrophotometer

150:處理器 150: Processor

152:記憶體 152: memory

154:輸入輸出介面(I/F) 154: Input and output interface (I/F)

156:通訊介面(I/F) 156: Communication interface (I/F)

P:作業位置 P: job position

S01~S06:步驟 S01~S06: Steps

X、Y、Z:軸 X, Y, Z: axes

圖1是表示實施方式1的原子吸光分光光度計的概略結構的圖。 FIG. 1 is a diagram showing a schematic configuration of an atomic absorption spectrophotometer according to a first embodiment.

圖2是表示圖1所示的原子化部及自動採樣器的結構例的示意圖。 FIG. 2 is a schematic diagram showing a configuration example of an atomization unit and an automatic sampler shown in FIG. 1 .

圖3是表示圖1所示的原子化部及自動採樣器的結構例的示意圖。 FIG. 3 is a schematic diagram showing a configuration example of an atomization unit and an automatic sampler shown in FIG. 1 .

圖4是用以對利用控制器來進行的噴嘴的位置調整的處理順序進行說明的流程圖。 FIG. 4 is a flowchart for explaining the processing procedure of nozzle position adjustment by the controller.

圖5是表示實施方式2的原子吸光分光光度計的概略結構的圖。 FIG. 5 is a diagram showing a schematic configuration of an atomic absorption spectrophotometer according to Embodiment 2. FIG.

圖6是表示實施方式3的原子吸光分光光度計的概略結構的圖。 FIG. 6 is a diagram showing a schematic configuration of an atomic absorption spectrophotometer according to Embodiment 3. FIG.

圖7是表示實施方式4的原子吸光分光光度計的概略結構的圖。 FIG. 7 is a diagram showing a schematic configuration of an atomic absorption spectrophotometer according to Embodiment 4. FIG.

以下,參照圖式,對本揭示的實施方式進行詳細說明。此外,對圖中的同一或相當部分標註同一符號,原則上不重覆其 說明。 Hereinafter, embodiments of the present disclosure will be described in detail with reference to the drawings. In addition, if the same symbol is marked on the same or a considerable part of the figure, it will not be repeated in principle. illustrate.

[實施方式1] [Embodiment 1]

圖1是表示實施方式1的原子吸光分光光度計的概略結構的圖。本實施方式1的原子吸光分光光度計100是爐式的原子吸光分光光度計。爐式的原子吸光分光光度計中,於石墨管內收納試樣,藉由對該管進行加熱,來對試樣加熱而進行原子化。使光於原子蒸氣(atomic vapor)中通過,來測定吸光率。 FIG. 1 is a diagram showing a schematic configuration of an atomic absorption spectrophotometer according to a first embodiment. The atomic absorption spectrophotometer 100 of Embodiment 1 is a furnace type atomic absorption spectrophotometer. In the furnace-type atomic absorption spectrophotometer, a sample is accommodated in a graphite tube, and the tube is heated to heat and atomize the sample. The absorbance is measured by passing light through atomic vapor.

參照圖1,原子吸光分光光度計100包括:光源1、原子化部2、分光器3、自動採樣器4、檢測器5、加熱器6、驅動器8、位置調整機構10、攝像部12、以及控制器15。 Referring to Fig. 1, atomic absorption spectrophotometer 100 comprises: light source 1, atomization part 2, spectrometer 3, automatic sampler 4, detector 5, heater 6, driver 8, position adjustment mechanism 10, imaging part 12, and controller 15.

光源1包括:發出元素固有的波長的光的燈。燈例如為空心陰極燈。空心陰極燈發出了包含明線光譜的光。 The light source 1 includes a lamp that emits light of a wavelength specific to an element. The lamp is, for example, a hollow cathode lamp. Hollow cathode lamps emit light that contains a spectrum of bright lines.

原子化部2包括:圓筒形狀的石墨管21,構成為將注入至石墨管21內的液體試樣進行加熱而使其原子化。石墨管21是與「爐」的一實施例對應。於石墨管21的側面,形成有試樣注入用的孔部22(試樣注入孔)。孔部22具有直徑為1mm~2mm左右的圓形形狀。 The atomization unit 2 includes a cylindrical graphite tube 21 and is configured to heat and atomize a liquid sample injected into the graphite tube 21 . The graphite tube 21 corresponds to an embodiment of the "furnace". A hole 22 for sample injection (sample injection hole) is formed on the side surface of the graphite tube 21 . The hole portion 22 has a circular shape with a diameter of about 1 mm to 2 mm.

自動採樣器4構成為自動進行如下動作:利用噴嘴40自加入有試樣的試樣容器(未圖示)中抽吸試樣,且向原子化部2的 石墨管21的孔部22注入試樣。具體而言,自動採樣器4包括:圓筒狀的噴嘴40、及噴嘴移動機構41。噴嘴40連接於未圖示的採樣流道的前端部分,且抽吸及噴出液體。採樣流道例如由撓性管所形成,在與噴嘴40相反的一側連接有用以引起泵作用的注射泵。藉由此注射泵的動作,能夠利用噴嘴40來抽吸及噴出液體。 The automatic sampler 4 is configured to automatically perform the following operation: the sample is sucked from the sample container (not shown) containing the sample by the nozzle 40, and the sample is sucked into the atomization part 2. A sample is injected into the hole 22 of the graphite tube 21 . Specifically, the automatic sampler 4 includes a cylindrical nozzle 40 and a nozzle moving mechanism 41 . The nozzle 40 is connected to the front end portion of an unillustrated sampling channel, and sucks and discharges liquid. The sampling flow path is formed of, for example, a flexible tube, and a syringe pump is connected to the side opposite to the nozzle 40 for pumping. By the operation of the syringe pump, the nozzle 40 can suck and discharge the liquid.

噴嘴移動機構41包括:臂42、旋轉軸43、及馬達44。臂42支持噴嘴40。臂42構成為:藉由馬達44而繞旋轉軸43轉動,並且沿著旋轉軸43而升降。驅動器8連接於馬達44,根據來自控制器15的控制指令來驅動馬達44。藉由利用馬達44的臂42的轉動,噴嘴40能夠於未圖示的試樣容器的正上方位置、與石墨管21的孔部22的正上方位置之間移動。 The nozzle moving mechanism 41 includes an arm 42 , a rotating shaft 43 , and a motor 44 . Arm 42 supports nozzle 40 . The arm 42 is configured to be rotated around a rotation shaft 43 by a motor 44 and to be raised and lowered along the rotation shaft 43 . The driver 8 is connected to the motor 44 and drives the motor 44 according to a control command from the controller 15 . By turning the arm 42 of the motor 44 , the nozzle 40 can move between a position directly above the sample container (not shown) and a position directly above the hole 22 of the graphite tube 21 .

位置調整機構10構成為:能夠藉由使噴嘴移動機構41(臂42、旋轉軸43及馬達44)移動,來調整噴嘴40與石墨管21的相對位置。位置調整機構10例如包括XY台,能夠使噴嘴移動機構41向與光源1的光軸平行的兩軸(X軸及Y軸)移動。 The position adjustment mechanism 10 is configured to be able to adjust the relative position of the nozzle 40 and the graphite tube 21 by moving the nozzle moving mechanism 41 (the arm 42 , the rotating shaft 43 and the motor 44 ). The position adjustment mechanism 10 includes, for example, an XY stage, and can move the nozzle moving mechanism 41 along two axes (X axis and Y axis) parallel to the optical axis of the light source 1 .

加熱器6藉由於石墨管21流通電流,來對石墨管21進行加熱。藉由石墨管21內的試樣被加熱,試樣中的元素被原子化。 The heater 6 heats the graphite tube 21 by passing a current through the graphite tube 21 . As the sample in the graphite tube 21 is heated, elements in the sample are atomized.

分光器3包括:入口狹縫31、出口狹縫32、反射鏡33、反射鏡34、及繞射光柵35。如圖1所示,自光源1發出的光於石墨管21內通過,導入至分光器3。導入至分光器3的光若於入口狹縫31的狹縫開口中通過,則經由反射鏡33而射入至繞射光柵35。藉由繞射光柵35轉動,特定波長的光選擇性地經由反射鏡34 而於出口狹縫32的狹縫開口中通過。於出口狹縫32中通過的特定波長的光到達檢測器5。檢測器5若自分光器3接收特定波長的光,則將與其受光強度相應的電訊號輸出至控制器15。 The beam splitter 3 includes: an entrance slit 31 , an exit slit 32 , a mirror 33 , a mirror 34 , and a diffraction grating 35 . As shown in FIG. 1 , the light emitted from the light source 1 passes through the graphite tube 21 and is introduced into the beam splitter 3 . The light introduced into the beam splitter 3 passes through the slit opening of the entrance slit 31 , and enters the diffraction grating 35 via the reflection mirror 33 . By rotating the diffraction grating 35, the light of a specific wavelength selectively passes through the mirror 34 And pass through the slit opening of the exit slit 32. Light of a specific wavelength passing through the exit slit 32 reaches the detector 5 . When the detector 5 receives light of a specific wavelength from the beam splitter 3 , it outputs an electrical signal corresponding to the intensity of the received light to the controller 15 .

此外,圖示雖省略,但於光源1與原子化部2之間、以及原子化部2與分光器3之間,分別配設有適當的聚光光學系統,構成為使光適當地聚光而向下一段導入。 In addition, although not shown in the figure, appropriate converging optical systems are respectively disposed between the light source 1 and the atomization unit 2 and between the atomization unit 2 and the beam splitter 3, and are configured to appropriately condense the light. And import to the next paragraph.

控制器15控制原子吸光分光光度計100的整體。控制器15包括:處理器150、記憶體152、輸入輸出介面(I/F)154、及通訊介面(I/F)156,來作為主要的構成部件。這些各部是以能夠經由未圖示的匯流排而相互通訊的方式來連接。 The controller 15 controls the atomic absorption spectrophotometer 100 as a whole. The controller 15 includes: a processor 150 , a memory 152 , an input/output interface (I/F) 154 , and a communication interface (I/F) 156 as main components. These parts are connected so as to be able to communicate with each other via a bus bar (not shown).

處理器150典型而言為中央處理單元(Central Processing Unit,CPU)或者微處理單元(Micro Processing Unit,MPU)等的運算處理部。處理器150藉由讀出並執行記憶體152所儲存的程式,來控制原子吸光分光光度計100的各部的動作。具體而言,處理器150藉由執行該程式,來實現後述原子吸光分光光度計100的各個處理。此外,圖1的例子中,雖例示出處理器為單個的結構,但控制器15亦可設為包括多個處理器的結構。 The processor 150 is typically an arithmetic processing unit such as a central processing unit (Central Processing Unit, CPU) or a micro processing unit (Micro Processing Unit, MPU). The processor 150 controls the operation of each part of the atomic absorption spectrophotometer 100 by reading and executing the program stored in the memory 152 . Specifically, the processor 150 realizes various processes of the atomic absorption spectrophotometer 100 described later by executing the program. In addition, in the example of FIG. 1, although the structure of a single processor was shown as an example, the controller 15 may be set as the structure including a some processor.

記憶體152是利用隨機存取記憶體(Random Access Memory,RAM)、唯讀記憶體(Read Only Memory,ROM)以及快閃記憶體(flash memory)等的非揮發性記憶體來實現。記憶體152儲存由處理器150所執行的程式、或者由處理器150所使用的資料等。 The memory 152 is realized by using non-volatile memory such as random access memory (Random Access Memory, RAM), read only memory (Read Only Memory, ROM), and flash memory (flash memory). The memory 152 stores programs executed by the processor 150 or data used by the processor 150 .

輸入輸出I/F 154是:用以於處理器150與光源1、檢測器5、加熱器6、驅動器8及位置調整機構10等各部之間,交換各種資料的介面。 The input/output I/F 154 is an interface for exchanging various data between the processor 150 and various parts such as the light source 1 , the detector 5 , the heater 6 , the driver 8 , and the position adjustment mechanism 10 .

通訊I/F 156是:用以於原子吸光分光光度計100與其他裝置之間,交換各種資料的介面,是藉由適配器或者連接器等來實現。此外,通訊方式可為無線區域網路(Local Area Network,LAN)等的無線通訊方式,亦可為利用通用序列匯流排(Universal Serial Bus,USB)等的有線通訊方式。 The communication I/F 156 is an interface for exchanging various data between the atomic absorption spectrophotometer 100 and other devices, and is realized by an adapter or a connector. In addition, the communication method can be a wireless communication method such as a wireless area network (Local Area Network, LAN), or a wired communication method using a universal serial bus (Universal Serial Bus, USB).

於控制器15連接有顯示器16及操作部18。顯示器16包括液晶面板等。操作部18接收使用者對於原子吸光分光光度計100的操作輸入。操作部18典型而言包括:觸控面板、鍵盤、滑鼠等。 A display 16 and an operation unit 18 are connected to the controller 15 . The display 16 includes a liquid crystal panel and the like. The operation unit 18 receives a user's operation input to the atomic absorption spectrophotometer 100 . The operation unit 18 typically includes a touch panel, a keyboard, a mouse, and the like.

原子吸光分光光度計100中,於試樣的定量分析時,利用自動採樣器4而向石墨管21內注入試樣後,自加熱器6向石墨管21中流通電流,藉此將石墨管21加熱至高溫(例如3000℃左右)。藉此,試樣於石墨管21內被乾燥及灰化,進而,試樣中的元素被原子化。自光源1發出的光通過石墨管21內時,試樣中所含的元素所特有的波長的光被強烈地吸收。通過石墨管21的光由分光器3進行波長色散,目標元素所特有的波長的光經選擇而導入至檢測器5。控制器15能夠根據由試樣的有無所引起的檢測器5的受光光度的差來算出吸收率,且基於所算出的吸收率來對試樣進行定量分析。 In the atomic absorption spectrophotometer 100, during the quantitative analysis of the sample, after the sample is injected into the graphite tube 21 by the automatic sampler 4, a current is passed through the graphite tube 21 from the heater 6, whereby the graphite tube 21 Heating to high temperature (eg about 3000°C). Thereby, the sample is dried and ashed in the graphite tube 21, and elements in the sample are atomized. When the light emitted from the light source 1 passes through the graphite tube 21, the light of the wavelength specific to the elements contained in the sample is strongly absorbed. The light passing through the graphite tube 21 is subjected to wavelength dispersion by the spectrometer 3 , and light having a wavelength specific to the target element is selected and introduced to the detector 5 . The controller 15 can calculate the absorptivity from the difference in the light-receiving intensity of the detector 5 due to the presence or absence of the sample, and perform quantitative analysis on the sample based on the calculated absorptivity.

原子吸光分光光度計100中,於實際的試樣的分析之前,進行自動採樣器4的噴嘴40相對於石墨管21的孔部22(試樣注入孔)的位置調整。此位置調整是於已更換噴嘴40及/或石墨管21時,於試樣的分析之前執行。以下,對噴嘴40的位置調整進行說明。 In the atomic absorption spectrophotometer 100 , the position of the nozzle 40 of the autosampler 4 relative to the hole 22 (sample injection hole) of the graphite tube 21 is adjusted before actual sample analysis. This position adjustment is performed before the analysis of the sample when the nozzle 40 and/or the graphite tube 21 have been replaced. Next, position adjustment of the nozzle 40 will be described.

圖2及圖3是表示圖1所示的原子化部2以及自動採樣器4的結構例的示意圖。圖2中示意性地示出原子化部2的剖面。圖3中示出自動採樣器4的概略性平面配置。 2 and 3 are schematic diagrams showing configuration examples of the atomization unit 2 and the autosampler 4 shown in FIG. 1 . FIG. 2 schematically shows a cross section of the atomization part 2 . A schematic planar configuration of the auto sampler 4 is shown in FIG. 3 .

參照圖2,原子化部2包括:石墨管21、電極23、電極24、及窗板26。電極23、電極24保持圓筒形狀的石墨管21的兩端。窗板26包括透明的石英板,夾持石墨管21而設置於光軸方向的兩端部。 Referring to FIG. 2 , the atomization unit 2 includes: a graphite tube 21 , an electrode 23 , an electrode 24 , and a window plate 26 . The electrodes 23 and 24 hold both ends of the cylindrical graphite tube 21 . The window plate 26 is made of a transparent quartz plate, and is provided at both ends in the optical axis direction with the graphite tube 21 interposed therebetween.

於位於石墨管21的上側的側面上的電極23,形成有具有圓形形狀的孔部25。孔部25配置在與形成於石墨管21的孔部22重疊的位置。孔部25的直徑為孔部22的直徑以上。此外,為了容許噴嘴40插入石墨管21內,孔部22及孔部25的直徑大於噴嘴40的外徑。 A circular hole 25 is formed in the electrode 23 located on the upper side of the graphite tube 21 . The hole 25 is arranged at a position overlapping the hole 22 formed in the graphite tube 21 . The diameter of the hole portion 25 is equal to or greater than the diameter of the hole portion 22 . In addition, in order to allow the nozzle 40 to be inserted into the graphite tube 21 , the diameters of the hole 22 and the hole 25 are larger than the outer diameter of the nozzle 40 .

參照圖3,自動採樣器4不僅包括噴嘴移動機構41(臂42、旋轉軸43及馬達44),更包括轉盤9。轉盤9包括圓形形狀的平台92、以及用以使平台92旋轉的馬達90。於平台92上,載置有:包含收納有液體試樣的試樣容器的容器類94a、94b、94c、......等。此外,容器類中,存在了包括:空容器、收納有檢 量線(calibration curve)製作用的標準液的容器、以及收納有稀釋系列的容器等的情況。 Referring to FIG. 3 , the automatic sampler 4 not only includes a nozzle moving mechanism 41 (arm 42 , rotating shaft 43 and motor 44 ), but also includes a turntable 9 . The turntable 9 includes a circular platform 92 and a motor 90 for rotating the platform 92 . Containers 94 a , 94 b , 94 c , . . . including sample containers containing liquid samples are placed on the table 92 . In addition, in the container class, there are: empty container, storage with inspection A container for a standard solution for preparation of a calibration curve, a container for a dilution series, etc.

藉由利用馬達90使平台92旋轉,所選擇的容器移動至作業位置P。藉由利用馬達44,使臂42轉動而使噴嘴40移動至作業位置P,能夠對移動至作業位置P的容器,利用噴嘴40來進行液體的抽吸及噴出。 By rotating the platform 92 with the motor 90, the selected container is moved to the working position P. By rotating the arm 42 with the motor 44 and moving the nozzle 40 to the working position P, the nozzle 40 can suck and discharge the liquid from the container moved to the working position P.

於試樣的定量分析時,使噴嘴40移動至作業位置P而自試樣容器中抽吸試樣後,藉由臂42的轉動,而使噴嘴40移動至石墨管21的孔部22的正上方位置。於此位置使噴嘴40下降,將噴嘴40的前端插入至孔部22,自噴嘴40中噴出試樣。噴出試樣後,再次藉由臂42的轉動,使噴嘴40回到作業位置P。藉此,向石墨管21內注入試樣,進行原子吸光的分析。 In the quantitative analysis of the sample, after the nozzle 40 is moved to the operation position P to suck the sample from the sample container, the nozzle 40 is moved to the front of the hole 22 of the graphite tube 21 by the rotation of the arm 42. upper position. The nozzle 40 is lowered at this position, the tip of the nozzle 40 is inserted into the hole 22 , and the sample is ejected from the nozzle 40 . After the sample is ejected, the nozzle 40 is returned to the working position P by rotating the arm 42 again. Thereby, a sample is injected into the graphite tube 21, and atomic absorption analysis is performed.

此外,於將多個試樣連續進行分析的情況下,對於下一試樣容器反覆進行同樣的動作。進而,於連續分析即將進行之前、連續分析的中途或者連續分析剛結束後,能夠進行使用洗滌液來洗滌噴嘴40的工序。 In addition, when a plurality of samples are continuously analyzed, the same operation is repeated for the next sample container. Furthermore, the step of washing the nozzle 40 with the cleaning liquid can be performed immediately before the continuous analysis, during the continuous analysis, or immediately after the continuous analysis.

為了使用所述自動採樣器4來進行試樣的注入,需要以藉由臂42的轉動,使噴嘴40移動至石墨管21的孔部22的正上方位置的方式,預先調整噴嘴40相對於孔部22的相對位置。先前,此位置調整是藉由使用者以目視來確認石墨管21的孔部22的位置,以噴嘴40的前端位於孔部22的正上方的方式,使位置調整機構10工作,使噴嘴移動機構41向與光軸平行的2軸(X軸、 Y軸)方向移動而進行。 In order to inject a sample using the automatic sampler 4, it is necessary to adjust the position of the nozzle 40 relative to the hole in advance in such a way that the nozzle 40 is moved to a position directly above the hole 22 of the graphite tube 21 by rotating the arm 42. The relative position of part 22. Previously, this position adjustment was performed by the user visually confirming the position of the hole 22 of the graphite tube 21, and the position adjustment mechanism 10 was operated so that the front end of the nozzle 40 was located directly above the hole 22, and the nozzle moving mechanism 41 2 axes parallel to the optical axis (X axis, Y-axis) direction movement.

然而,由於孔部22的直徑小至1mm~2mm左右,故而藉由使用者的目視來捕捉孔部22的位置費時費力,結果,噴嘴40的位置調整未必是容易的作業。因此,存在:分析的準備需要長時間,使分析作業的效率下降的問題。另外,於藉由使用者的目視來進行的位置調整中,存在:相對於孔部22的正上方位置的偏移殘留的情況,擔憂位置調整的精度不穩定。 However, since the diameter of the hole 22 is as small as about 1 mm to 2 mm, it takes time and effort to catch the position of the hole 22 visually by the user. As a result, adjusting the position of the nozzle 40 is not necessarily an easy task. Therefore, there is a problem that it takes a long time to prepare for the analysis, which reduces the efficiency of the analysis work. In addition, in the position adjustment performed by the user's visual observation, there may be cases where a deviation from the position directly above the hole portion 22 remains, and there is a concern that the accuracy of the position adjustment may not be stable.

因此,實施方式1的原子吸光分光光度計100包括:攝像部12,來作為用以檢測噴嘴40相對於孔部22的相對位置的結構。攝像部12是以於攝像範圍(攝像視野)中包含噴嘴40的前端的方式來設置。具體而言,攝像部12是以其聚焦位置位於噴嘴40的前端的方式來設置。如圖2所示,攝像部12是以於噴嘴40的前端位於孔部22的正上方的狀態下,於攝像視野中包含噴嘴40的前端及孔部22的方式來配置。 Therefore, the atomic absorption spectrophotometer 100 according to Embodiment 1 includes the imaging unit 12 as a configuration for detecting the relative position of the nozzle 40 with respect to the hole portion 22 . The imaging unit 12 is provided so as to include the tip of the nozzle 40 in the imaging range (imaging field of view). Specifically, the imaging unit 12 is provided so that its focus position is located at the tip of the nozzle 40 . As shown in FIG. 2 , the imaging unit 12 is arranged so that the tip of the nozzle 40 and the hole 22 are included in the imaging field of view in a state where the tip of the nozzle 40 is located directly above the hole 22 .

此處,為了正確地檢測噴嘴40的前端相對於孔部22的相對位置,理想為,儘可能靠近孔部22的正上方位置來配置攝像部12。因此,使攝像部12接近噴嘴40的前端的正上方位置來配置。圖2的例子中,於臂42的接近噴嘴40的前端的正上方位置的部分,搭載有攝像部12。藉此,於噴嘴40的前端位於孔部22的正上方的狀態下,能夠使攝像部12接近孔部22的正上方位置而配置。 Here, in order to accurately detect the relative position of the tip of the nozzle 40 with respect to the hole 22 , it is desirable to dispose the imaging unit 12 as close as possible to the position immediately above the hole 22 . Therefore, the imaging unit 12 is disposed close to the position directly above the tip of the nozzle 40 . In the example of FIG. 2 , the imaging unit 12 is mounted on a portion of the arm 42 that is close to the position directly above the tip of the nozzle 40 . Thereby, in a state where the tip of the nozzle 40 is located directly above the hole 22 , the imaging unit 12 can be arranged close to the position directly above the hole 22 .

攝像部12包括:透鏡等的光學系統、以及攝像元件。 攝像元件例如是藉由電荷耦合元件(Charge Coupled Device,CCD)感測器、互補金屬氧化物半導體(Complementary Metal Oxide Semiconductor,CMOS)感測器等來實現。攝像元件藉由將經由光學系統而射入的光轉變為電訊號而生成攝像圖像。攝像部12對噴嘴40的前端進行攝像而生成圖像資料,並將所生成的圖像資料發送至控制器15。 The imaging unit 12 includes an optical system such as a lens, and an imaging element. The imaging device is realized by, for example, a Charge Coupled Device (CCD) sensor, a Complementary Metal Oxide Semiconductor (CMOS) sensor, and the like. The imaging device generates a captured image by converting light incident through an optical system into electrical signals. The imaging unit 12 images the tip of the nozzle 40 to generate image data, and sends the generated image data to the controller 15 .

控制器15若自攝像部12接收圖像資料,則將攝像圖像顯示於顯示器16。藉此,使用者能夠藉由參照顯示器16所顯示的攝像圖像,來確認噴嘴40的前端的位置。因此,使用者能夠藉由一面確認噴嘴40的前端相對於孔部22的相對位置,一面使位置調整機構10工作,而以噴嘴40的前端位於孔部22的正上方位置的方式,使噴嘴移動機構41移動。藉此,與現有的藉由目視來進行的位置調整相比,噴嘴40的位置調整作業變得容易。其結果為,能夠提高分析作業的效率,並且能夠提高噴嘴40的位置調整的精度。 When the controller 15 receives image data from the imaging unit 12 , it displays the captured image on the display 16 . Thereby, the user can confirm the position of the tip of the nozzle 40 by referring to the captured image displayed on the monitor 16 . Therefore, the user can move the nozzle so that the tip of the nozzle 40 is located directly above the hole 22 by actuating the position adjustment mechanism 10 while confirming the relative position of the tip of the nozzle 40 with respect to the hole 22 . Mechanism 41 moves. Thereby, the position adjustment operation|work of the nozzle 40 becomes easy compared with the conventional position adjustment by visual inspection. As a result, the efficiency of the analysis work can be improved, and the accuracy of the position adjustment of the nozzle 40 can be improved.

此外,控制器15能夠設為如下結構:藉由使用公知的圖像處理技術,來自動進行所述噴嘴40的位置調整。具體而言,控制器15若自攝像部12取得圖像資料,則藉由自圖像資料中,使用圖像處理技術來選出噴嘴40的前端及孔部22,從而取得噴嘴40的前端與孔部22的位置關係。控制器15是以噴嘴40的前端位於預先設定的基準位置的方式,使位置調整機構10工作。此基準位置能夠基於噴嘴40位於孔部22的正上方的狀態下的噴嘴40的 前端與孔部22的相對位置來設定。藉此,由於不需要由使用者進行的位置調整作業,故而能夠進一步提高分析效率。 In addition, the controller 15 can be configured to automatically adjust the position of the nozzle 40 by using a known image processing technique. Specifically, if the controller 15 acquires image data from the imaging unit 12, it uses image processing technology to select the tip of the nozzle 40 and the hole 22 from the image data, thereby obtaining the tip of the nozzle 40 and the hole. The positional relationship of the part 22. The controller 15 operates the position adjustment mechanism 10 so that the tip of the nozzle 40 is located at a preset reference position. This reference position can be based on the position of the nozzle 40 in the state where the nozzle 40 is located directly above the hole 22. The relative position of the front end and the hole portion 22 is set. Thereby, since the position adjustment work by the user is not required, the analysis efficiency can be further improved.

圖4是用以對利用控制器15進行的噴嘴40的位置調整的處理順序進行說明的流程圖。 FIG. 4 is a flowchart for explaining the processing procedure of adjusting the position of the nozzle 40 by the controller 15 .

參照圖4,首先根據步驟S01,控制器15藉由使噴嘴移動機構41的臂42轉動,而將噴嘴40設置於石墨管21的孔部22的上部。 Referring to FIG. 4 , first, according to step S01 , the controller 15 sets the nozzle 40 on the upper portion of the hole 22 of the graphite tube 21 by rotating the arm 42 of the nozzle moving mechanism 41 .

其次,控制器15根據步驟S02,利用攝像部12來對噴嘴40的前端進行攝像。控制器15於步驟S03中,藉由對由攝像部12的攝像而得的圖像資料實施公知的圖像處理,而選出噴嘴40的前端及孔部22。控制器15基於選出結果,來檢測噴嘴40的前端相對於孔部22的相對位置。 Next, the controller 15 uses the imaging unit 12 to image the tip of the nozzle 40 according to step S02. In step S03 , the controller 15 selects the tip of the nozzle 40 and the hole 22 by performing known image processing on the image data captured by the imaging unit 12 . Based on the selection result, the controller 15 detects the relative position of the tip of the nozzle 40 with respect to the hole 22 .

控制器15根據步驟S04,基於所檢測的孔部22與噴嘴40的前端的相對位置,來算出噴嘴40的前端的位置相對於基準位置的偏移量。 The controller 15 calculates the amount of displacement of the position of the tip of the nozzle 40 from the reference position based on the detected relative position between the hole 22 and the tip of the nozzle 40 in step S04 .

控制器15推進至步驟S05,藉由使位置調整機構10工作,而基於步驟S04中算出的偏移量來調整噴嘴40相對於孔部22的相對位置。位置調整機構10使噴嘴移動機構41向偏移量減小的方向移動。若藉由利用步驟S05的調整,偏移量成為規定值以下,則控制器15根據步驟S06,而將噴嘴40固定於該位置,結束位置調整。 The controller 15 advances to step S05, and adjusts the relative position of the nozzle 40 with respect to the hole part 22 based on the offset calculated in step S04 by operating the position adjustment mechanism 10. The position adjustment mechanism 10 moves the nozzle moving mechanism 41 in a direction in which the amount of displacement decreases. When the amount of deviation becomes equal to or less than a predetermined value through the adjustment in step S05, the controller 15 fixes the nozzle 40 at the position according to step S06, and ends the position adjustment.

如以上所說明,根據實施方式1的原子吸光分光光度計 100,能夠利用對噴嘴40的前端進行攝像的攝像部12,來檢測噴嘴40的前端相對於石墨管21的孔部22的相對位置,因此,能夠使噴嘴40相對於孔部22的相對位置的調整容易。藉此,能提高分析作業的效率,並且能提高噴嘴40的位置調整的精度。 As described above, the atomic absorption spectrophotometer according to Embodiment 1 100, it is possible to detect the relative position of the tip of the nozzle 40 relative to the hole 22 of the graphite tube 21 by using the imaging unit 12 that takes an image of the tip of the nozzle 40, so that the relative position of the nozzle 40 relative to the hole 22 can be determined. Easy to adjust. Thereby, the efficiency of the analysis work can be improved, and the accuracy of the position adjustment of the nozzle 40 can be improved.

進而,實施方式1中,藉由將攝像部12搭載於臂42,若使臂42轉動而使噴嘴40移動至作業位置P,則與噴嘴40一併,攝像部12亦遠離石墨管21,向轉盤9側移動。即,噴嘴移動機構41亦可作為攝像部12的移動機構而發揮功能。 Furthermore, in Embodiment 1, by mounting the imaging unit 12 on the arm 42, when the arm 42 is rotated to move the nozzle 40 to the operation position P, the imaging unit 12 is also moved away from the graphite tube 21 together with the nozzle 40, and toward the Turntable 9 side moves. That is, the nozzle moving mechanism 41 can also function as a moving mechanism of the imaging unit 12 .

於將攝像部12靠近孔部22的正上方位置而設置的情況下,若石墨管21經加熱而成為高溫,則存在攝像部12過熱而損傷的顧慮。因此,若噴嘴40的位置調整結束,則需要用以使攝像部12遠離石墨管21的移動機構。本實施方式1的原子吸光分光光度計100中,藉由將噴嘴移動機構41與攝像部12的移動機構共用,若如上所述,使噴嘴40疏遠石墨管21,則能夠增加攝像部12與石墨管21之間的距離。因此,不需要攝像部12的移動機構。藉此,能夠以簡易的結構,使攝像部12自於試樣的分析時成為高溫的石墨管21退避,保護攝像部12不會過熱。 When the imaging unit 12 is installed close to the position directly above the hole 22 , if the graphite tube 21 is heated to a high temperature, the imaging unit 12 may be overheated and damaged. Therefore, after the adjustment of the position of the nozzle 40 is completed, a movement mechanism for moving the imaging unit 12 away from the graphite tube 21 is required. In the atomic absorption spectrophotometer 100 of Embodiment 1, by using the nozzle moving mechanism 41 in common with the moving mechanism of the imaging unit 12, as described above, if the nozzle 40 is separated from the graphite tube 21, the imaging unit 12 and the graphite tube 21 can be increased. distance between tubes 21. Therefore, a moving mechanism for the imaging unit 12 is unnecessary. Thereby, with a simple structure, the imaging part 12 can be avoided from the graphite tube 21 which becomes high temperature at the time of sample analysis, and the imaging part 12 can be protected from overheating.

此外,實施方式1中,藉由將攝像部12搭載於臂42,而設為利用臂42的轉動來使攝像部12移動的結構,亦可設為原子吸光分光光度計100另外包括攝像部12的移動機構的結構。於此情況下,攝像部12的移動機構構成為:能夠於接近孔部22的正上方位置且於攝像視野中包含噴嘴40的前端及孔部22的第一 位置、與和第一位置相比遠離石墨管21的第二位置之間,使攝像 部12移動。 In addition, in Embodiment 1, the imaging unit 12 is mounted on the arm 42, and the imaging unit 12 is moved by the rotation of the arm 42. The atomic absorption spectrophotometer 100 may also include the imaging unit 12. The structure of the mobile mechanism. In this case, the moving mechanism of the imaging unit 12 is configured such that it can be located close to the position directly above the hole 22 and includes the tip of the nozzle 40 and the first edge of the hole 22 in the imaging field of view. position, and the second position farther away from the graphite tube 21 than the first position, the imaging Section 12 moves.

[實施方式2] [Embodiment 2]

所述實施方式1中,已例示出將對噴嘴40的前端進行攝像的攝像部12搭載於臂42的結構。實施方式2中,對將攝像部12與反射鏡併用而對噴嘴40的前端進行攝像的結構加以說明。 In the first embodiment, the configuration in which the imaging unit 12 for imaging the tip of the nozzle 40 is mounted on the arm 42 has been exemplified. In Embodiment 2, the structure which uses the imaging part 12 and a reflection mirror together and images the front-end|tip of the nozzle 40 is demonstrated.

圖5是表示實施方式2的原子吸光分光光度計100的概略結構的圖。圖5中示意性地示出原子化部2及自動採樣器4的結構例。 FIG. 5 is a diagram showing a schematic configuration of an atomic absorption spectrophotometer 100 according to the second embodiment. FIG. 5 schematically shows configuration examples of the atomization unit 2 and the autosampler 4 .

實施方式2的原子吸光分光光度計100與實施方式1的原子吸光分光光度計100相比較,不同之處在於,更包括:反射鏡14。關於其他結構,由於與實施方式1相同而不重覆說明。 Compared with the atomic absorption spectrophotometer 100 of the first embodiment, the atomic absorption spectrophotometer 100 of Embodiment 2 is different in that it further includes a reflection mirror 14 . About other structures, since it is the same as Embodiment 1, description is not repeated.

參照圖5,實施方式2的原子吸光分光光度計100包括:反射鏡14及攝像部12,來作為用以檢測噴嘴40相對於孔部22的相對位置的結構。反射鏡14設置於可使包含噴嘴40的前端的像反射的位置。如圖5所示,於噴嘴40位於孔部22的正上方的狀態下,反射鏡14是以於反射像中包含噴嘴40的前端及孔部22的方式來配置。 Referring to FIG. 5 , atomic absorption spectrophotometer 100 according to Embodiment 2 includes mirror 14 and imaging unit 12 as a structure for detecting the relative position of nozzle 40 with respect to hole 22 . The reflection mirror 14 is provided at a position where it can reflect an image including the tip of the nozzle 40 . As shown in FIG. 5 , in a state where the nozzle 40 is located directly above the hole 22 , the reflection mirror 14 is arranged so that the tip of the nozzle 40 and the hole 22 are included in the reflected image.

反射鏡14是接近噴嘴40的前端的正上方位置而配置。圖5的例子中,反射鏡14搭載於臂42的接近噴嘴40的前端的正上方位置的部分。藉此,於噴嘴40的前端位於孔部22的正上方的狀態下,能夠使反射鏡14接近孔部22的正上方位置而配置。 The reflecting mirror 14 is disposed close to and directly above the tip of the nozzle 40 . In the example of FIG. 5 , the reflector 14 is mounted on a portion of the arm 42 that is close to the tip of the nozzle 40 and directly above. Thereby, in a state where the tip of the nozzle 40 is located directly above the hole 22 , the reflection mirror 14 can be arranged close to the position directly above the hole 22 .

攝像部12設置於能夠取得由反射鏡14所得的噴嘴40的前端的反射像的位置。如圖5所示,若使噴嘴40移動至孔部22的正上方位置,則反射鏡14中,形成包含噴嘴40的前端及孔部22的反射像。攝像部12能夠藉由取得反射鏡14的反射像,來檢測噴嘴40相對於孔部22的相對位置。 The imaging unit 12 is provided at a position where a reflection image of the tip of the nozzle 40 obtained by the reflection mirror 14 can be obtained. As shown in FIG. 5 , when the nozzle 40 is moved to a position directly above the hole 22 , a reflection image including the tip of the nozzle 40 and the hole 22 is formed on the reflection mirror 14 . The imaging part 12 can detect the relative position of the nozzle 40 with respect to the hole part 22 by acquiring the reflection image of the reflection mirror 14. As shown in FIG.

攝像部12基於反射像而生成噴嘴40的前端的圖像資料,且將所生成的圖像資料發送至控制器15。控制器15將由攝像部12所得的攝像圖像顯示於顯示器16。藉此,使用者能夠藉由參照顯示於顯示器16的攝像圖像,來確認噴嘴40的前端的位置。因此,與實施方式1同樣,使用者能夠藉由一面確認噴嘴40的前端相對於孔部22的相對位置,一面使位置調整機構10工作,而以噴嘴40的前端位於孔部22的正上方位置的方式,使噴嘴移動機構41移動。 The imaging unit 12 generates image data of the tip of the nozzle 40 based on the reflection image, and sends the generated image data to the controller 15 . The controller 15 displays the captured image obtained by the imaging unit 12 on the display 16 . Thereby, the user can confirm the position of the tip of the nozzle 40 by referring to the captured image displayed on the display 16 . Therefore, similarly to Embodiment 1, the user can position the tip of the nozzle 40 directly above the hole 22 by operating the position adjustment mechanism 10 while confirming the relative position of the tip of the nozzle 40 to the hole 22 . In this way, the nozzle moving mechanism 41 is moved.

或者,控制器15能夠藉由對由攝像部12所取得的圖像資料實施公知的圖像處理,而取得噴嘴40的前端與孔部22的相對位置。因此,控制器15能夠基於所取得的相對位置,來自動進行噴嘴40的前端相對於孔部22的位置調整。 Alternatively, the controller 15 can acquire the relative positions of the tip of the nozzle 40 and the hole 22 by performing known image processing on the image data acquired by the imaging unit 12 . Therefore, the controller 15 can automatically adjust the position of the tip of the nozzle 40 with respect to the hole 22 based on the acquired relative position.

如以上所說明,根據實施方式2的原子吸光分光光度計100,攝像部12能夠利用反射鏡14來對噴嘴40的前端進行攝像,因此使用者能夠根據由攝像部12所得的攝像圖像來檢測噴嘴40的前端相對於石墨管21的孔部22的相對位置。因此,能夠獲得與實施方式1的原子吸光分光光度計100同樣的效果。 As described above, according to the atomic absorption spectrophotometer 100 of Embodiment 2, the imaging unit 12 can image the tip of the nozzle 40 using the mirror 14, so the user can detect The relative position of the tip of the nozzle 40 with respect to the hole 22 of the graphite tube 21 . Therefore, the same effect as that of the atomic absorption spectrophotometer 100 of Embodiment 1 can be obtained.

進而根據實施方式2的原子吸光分光光度計100,藉由設為攝像部12取得由反射鏡14所得的噴嘴40的前端的反射像的結構,能夠將攝像部12遠離石墨管21而設置。因此,能夠增加與試樣分析時成為高溫的石墨管21的距離來設置攝像部12,因此能夠保護攝像部12不會過熱。 Furthermore, according to the atomic absorption spectrophotometer 100 of Embodiment 2, the imaging unit 12 can be installed away from the graphite tube 21 by configuring the imaging unit 12 to obtain a reflection image of the tip of the nozzle 40 obtained by the reflecting mirror 14 . Therefore, since the imaging unit 12 can be provided at a greater distance from the graphite tube 21 which becomes high temperature during sample analysis, it is possible to protect the imaging unit 12 from overheating.

[實施方式3] [Embodiment 3]

所述實施方式1中,已對使用一台攝像部12來對噴嘴40的前端進行攝像的結構加以說明,但亦可設為使用多台攝像部12而自多個方向對噴嘴40的前端進行攝像的結構。 In the first embodiment, the configuration in which the front end of the nozzle 40 is imaged using one imaging unit 12 has been described, but it is also possible to use a plurality of imaging units 12 to image the front end of the nozzle 40 from a plurality of directions. camera structure.

圖6是表示實施方式3的原子吸光分光光度計100的概略結構的圖。圖6中示意性地示出原子化部2及自動採樣器4的結構例。 FIG. 6 is a diagram showing a schematic configuration of an atomic absorption spectrophotometer 100 according to the third embodiment. FIG. 6 schematically shows configuration examples of the atomization unit 2 and the autosampler 4 .

實施方式3的原子吸光分光光度計100與實施方式1的原子吸光分光光度計100相比較,不同之處在於,包括:多個攝像部12A、12B。關於其他結構,由於與實施方式1相同,故而不重覆說明。另外,攝像部12A、攝像部12B的結構由於與攝像部12相同,故而不重覆說明。 The atomic absorption spectrophotometer 100 of Embodiment 3 differs from the atomic absorption spectrophotometer 100 of Embodiment 1 in that it includes a plurality of imaging units 12A, 12B. About other structures, since it is the same as Embodiment 1, description is not repeated. In addition, since the configurations of the imaging unit 12A and the imaging unit 12B are the same as those of the imaging unit 12 , description thereof will not be repeated.

參照圖6,攝像部12A、攝像部12B是以於攝像視野中包含噴嘴40的前端的方式來配置。攝像部12A、攝像部12B是以於噴嘴40的前端位於孔部22的正上方的狀態下,於攝像視野中包含噴嘴40的前端及孔部22的方式來配置。 Referring to FIG. 6 , imaging unit 12A and imaging unit 12B are arranged so as to include the tip of nozzle 40 in the imaging field of view. The imaging unit 12A and the imaging unit 12B are arranged so that the tip of the nozzle 40 and the hole 22 are included in the imaging field of view in a state where the tip of the nozzle 40 is located directly above the hole 22 .

但,攝像部12A與攝像部12B配置為:以彼此不同的角 度來對噴嘴40的前端進行攝像。圖6的例子中,攝像部12A與攝像部12B配置於以噴嘴40為中心而成為對象的位置。攝像部12A、攝像部12B均搭載於臂42。 However, the imaging unit 12A and the imaging unit 12B are arranged at different angles from each other. The front end of the nozzle 40 is imaged at a certain degree. In the example shown in FIG. 6 , the imaging unit 12A and the imaging unit 12B are arranged at a target position around the nozzle 40 . Both the imaging unit 12A and the imaging unit 12B are mounted on the arm 42 .

攝像部12A、攝像部12B分別對噴嘴40的前端進行攝像而生成圖像資料,且將所生成的圖像資料發送至控制器15。控制器15若自攝像部12A、攝像部12B接收圖像資料,則將兩張攝像圖像顯示於顯示器16。 The imaging unit 12A and the imaging unit 12B respectively image the tip of the nozzle 40 to generate image data, and transmit the generated image data to the controller 15 . When the controller 15 receives the image data from the imaging unit 12A and the imaging unit 12B, it displays the two captured images on the display 16 .

使用者能夠藉由參照顯示於顯示器16的兩張攝像圖像,來確認噴嘴40的前端的位置。兩張攝像圖像由於自彼此不同的角度來對噴嘴40的前端進行攝像,故而噴嘴40的前端相對於孔部22的相對位置不同。使用者能夠基於自兩張攝像圖像分別取得的兩個相對位置,來確認噴嘴40的前端的位置。 The user can confirm the position of the tip of the nozzle 40 by referring to the two captured images displayed on the display 16 . Since the two captured images capture the tip of the nozzle 40 from different angles, the relative position of the tip of the nozzle 40 to the hole 22 is different. The user can confirm the position of the tip of the nozzle 40 based on the two relative positions respectively obtained from the two captured images.

如實施方式1所述,為了正確地檢測噴嘴40的前端相對於孔部22的相對位置,理想為接近孔部22的正上方位置而配置攝像部12,但存在由於攝像部12的配置的制約,而難以使攝像部12接近孔部22的正上方位置的情況。於此種情況下,如圖6所示,藉由設置多個攝像部12A、12B,設為自彼此不同的角度來對噴嘴40的前端進行攝像的結構,能夠自多個方向檢測噴嘴40的前端相對於孔部22的相對位置,且基於自多個檢測結果所導出的值,來取得噴嘴40的前端相對於孔部22的相對位置。例如,控制器15能夠使用公知的圖像處理技術來合成由多個攝像部12A、12B所得的多片攝像圖像,從而生成自孔部22的正上方位 置對噴嘴40的前端進行攝像的圖像。藉此,使用者能夠根據顯示於顯示器16的合成圖像,來檢測噴嘴40的前端相對於孔部22的相對位置。因此,本實施方式3中,亦與實施方式1同樣,使用者能夠藉由一面確認噴嘴40的前端相對於孔部22的相對位置,一面使位置調整機構10工作,而以噴嘴40的前端位於孔部22的正上方位置的方式,使噴嘴移動機構41移動。 As described in Embodiment 1, in order to accurately detect the relative position of the tip of the nozzle 40 with respect to the hole 22, it is ideal to arrange the imaging unit 12 close to the position directly above the hole 22, but there are constraints due to the arrangement of the imaging unit 12. , and it is difficult to bring the imaging unit 12 close to the position directly above the hole 22 . In this case, as shown in FIG. 6 , by providing a plurality of imaging units 12A, 12B, and setting images of the front end of the nozzle 40 from different angles, the position of the nozzle 40 can be detected from multiple directions. The relative position of the tip with respect to the hole 22 is obtained based on values derived from a plurality of detection results, and the relative position of the tip of the nozzle 40 with respect to the hole 22 is obtained. For example, the controller 15 can use a known image processing technique to synthesize multiple captured images obtained by the multiple imaging units 12A, 12B, thereby generating An image captured at the tip of the nozzle 40 is placed. Thereby, the user can detect the relative position of the tip of the nozzle 40 with respect to the hole 22 based on the synthetic image displayed on the display 16 . Therefore, in Embodiment 3, as in Embodiment 1, the user can operate the position adjustment mechanism 10 while confirming the relative position of the tip of the nozzle 40 with respect to the hole 22 so that the tip of the nozzle 40 is positioned at the position. The nozzle moving mechanism 41 is moved so that the position directly above the hole portion 22 is maintained.

另外,控制器15能夠設為藉由使用公知的圖像處理技術,來自動進行噴嘴40的位置調整的結構。具體而言,控制器15若自攝像部12A、攝像部12B分別取得圖像資料,則藉由將該些兩種圖像資料合成,而生成自孔部22的正上方位置來看的噴嘴40的前端以及孔部22的圖像。控制器15基於所生成的圖像而取得噴嘴40的前端與孔部22的相對位置,且以噴嘴40的前端位於預先設定的基準位置的方式,使位置調整機構10工作。 In addition, the controller 15 can be configured to automatically adjust the position of the nozzle 40 by using a known image processing technique. Specifically, when the controller 15 acquires image data from the imaging unit 12A and the imaging unit 12B, the nozzle 40 viewed from the position directly above the hole portion 22 is generated by synthesizing these two types of image data. The front end and the image of the hole 22. The controller 15 acquires the relative position of the tip of the nozzle 40 and the hole 22 based on the generated image, and operates the position adjustment mechanism 10 so that the tip of the nozzle 40 is located at a preset reference position.

如以上所說明,根據實施方式3的原子吸光分光光度計100,能夠基於分別對噴嘴40的前端進行攝像的多個攝像部12A、12B所得的攝像圖像,來檢測噴嘴40的前端相對於石墨管21的孔部22的相對位置。因此,發揮與實施方式1的原子吸光分光光度計100同樣的效果。 As described above, according to the atomic absorption spectrophotometer 100 of Embodiment 3, based on the captured images obtained by the plurality of imaging units 12A and 12B that respectively image the tip of the nozzle 40, it is possible to detect the relative position of the tip of the nozzle 40 relative to the graphite. The relative position of the hole portion 22 of the pipe 21. Therefore, the same effect as that of the atomic absorption spectrophotometer 100 of Embodiment 1 is exhibited.

另外,根據實施方式3的原子吸光分光光度計100,由於多個攝像部12A、12B的移動機構與噴嘴移動機構41共用,故而若使噴嘴40疏遠石墨管21,則能夠增加攝像部12A、攝像部12B與石墨管21之間的距離。藉此,能夠以簡易的結構,使攝像 部12A、攝像部12B自於試樣的分析時成為高溫的石墨管21退避,來保護攝像部12A、攝像部12B不會過熱。 In addition, according to the atomic absorption spectrophotometer 100 according to Embodiment 3, since the moving mechanism of the plurality of imaging sections 12A, 12B is shared with the nozzle moving mechanism 41, if the nozzle 40 is separated from the graphite tube 21, the number of imaging sections 12A, imaging sections 12A, and imaging section 12A can be increased. The distance between the portion 12B and the graphite tube 21. Thereby, with a simple structure, it is possible to make an image The unit 12A and the imaging unit 12B are evacuated from the graphite tube 21 which becomes high temperature during sample analysis, and the imaging unit 12A and the imaging unit 12B are protected from overheating.

此外,實施方式3中,藉由將攝像部12A、攝像部12B搭載於臂42,而設為利用臂42的轉動來使攝像部12A、攝像部12B移動的結構,但亦可設為原子吸光分光光度計100另外包括攝像部12A、攝像部12B的移動機構的結構。於此情況下,攝像部12A、攝像部12B的移動機構構成為:能夠於接近孔部22且可於攝像視野中包含噴嘴40的前端的第一位置、與和第一位置相比而遠離石墨管21的第二位置之間,使攝像部12A、攝像部12B移動。 Furthermore, in Embodiment 3, by mounting the imaging unit 12A and the imaging unit 12B on the arm 42, the imaging unit 12A and the imaging unit 12B are moved by the rotation of the arm 42, but an atomic absorption light may also be used. The spectrophotometer 100 also includes a structure of a moving mechanism of the imaging unit 12A and the imaging unit 12B. In this case, the moving mechanism of the imaging unit 12A and the imaging unit 12B is configured such that the first position close to the hole 22 and capable of including the tip of the nozzle 40 in the imaging field of view is farther away from the graphite than the first position. Between the second positions of the tube 21, the imaging unit 12A and the imaging unit 12B are moved.

進而,根據實施方式3的原子吸光分光光度計100,藉由合成多個攝像圖像,生成自孔部22的正上方位置來看的噴嘴40的前端及孔部22的圖像,則即便於攝像部的配置受到制約的情況下,亦能夠檢測噴嘴40的前端相對於孔部22的相對位置。 Furthermore, according to the atomic absorption spectrophotometer 100 according to Embodiment 3, by synthesizing a plurality of captured images to generate an image of the tip of the nozzle 40 and the hole 22 viewed from a position directly above the hole 22, it is convenient to Even when the arrangement of the imaging unit is restricted, it is possible to detect the relative position of the tip of the nozzle 40 with respect to the hole 22 .

此外,圖6的例子中,已對設置兩台攝像部12A、12B的結構進行說明,但攝像部的台數並不限定於此,亦可設為設置三台以上的攝像部的結構。 In addition, in the example of FIG. 6, the structure which provided two imaging parts 12A, 12B was demonstrated, but the number of imaging parts is not limited to this, The structure which provided three or more imaging parts is also possible.

[實施方式4] [Embodiment 4]

圖7是表示實施方式4的原子吸光分光光度計100的概略結構的圖。圖7中,示意性地示出原子化部2及自動採樣器4的結構例。 FIG. 7 is a diagram showing a schematic configuration of an atomic absorption spectrophotometer 100 according to Embodiment 4. FIG. FIG. 7 schematically shows configuration examples of the atomization unit 2 and the autosampler 4 .

實施方式4的原子吸光分光光度計100與實施方式1的 原子吸光分光光度計100相比較,不同之處在於,包括:多個攝像部12A、12B以及多個反射鏡14A、14B。關於其他結構,由於與實施方式1相同,故而不重覆說明。另外,攝像部12A、攝像部12B的結構由於與攝像部12相同,故而不重覆說明。 The atomic absorption spectrophotometer 100 of Embodiment 4 is different from that of Embodiment 1 Compared with the atomic absorption spectrophotometer 100 , it is different in that it includes a plurality of imaging units 12A, 12B and a plurality of mirrors 14A, 14B. About other structures, since it is the same as Embodiment 1, description is not repeated. In addition, since the configurations of the imaging unit 12A and the imaging unit 12B are the same as those of the imaging unit 12 , description thereof will not be repeated.

參照圖7,實施方式4的原子吸光分光光度計100包括:反射鏡14A、反射鏡14B以及攝像部12A、攝像部12B,來作為用以檢測噴嘴40相對於孔部22的位置關係的結構。反射鏡14A、反射鏡14B設置於可使包含噴嘴40的前端的像反射的位置。如圖7所示,反射鏡14A、反射鏡14B分別以於噴嘴40位於孔部22的正上方的狀態下,於像中包含噴嘴40的前端及孔部22的方式來配置。但,反射鏡14A與反射鏡14B配置為以彼此不同的角度來反射包含噴嘴40的前端的像。圖7的例子中,反射鏡14A、反射鏡14B均搭載於臂42。 Referring to FIG. 7 , atomic absorption spectrophotometer 100 according to Embodiment 4 includes: mirror 14A, mirror 14B, and imaging unit 12A, imaging unit 12B as a structure for detecting the positional relationship of nozzle 40 relative to hole 22 . The reflecting mirror 14A and the reflecting mirror 14B are provided at positions where they can reflect an image including the tip of the nozzle 40 . As shown in FIG. 7 , reflecting mirror 14A and reflecting mirror 14B are arranged so that the tip of nozzle 40 and hole 22 are included in the image when nozzle 40 is located directly above hole 22 . However, the reflection mirror 14A and the reflection mirror 14B are disposed so as to reflect an image including the tip of the nozzle 40 at angles different from each other. In the example of FIG. 7 , both the mirror 14A and the mirror 14B are mounted on the arm 42 .

攝像部12A設置於能夠取得由反射鏡14A所反射的像的位置。攝像部12B設置於能夠取得由反射鏡14B所反射的像的位置。如圖7所示,若使噴嘴40移動至孔部22的正上方位置,則反射鏡14A、反射鏡14B分別形成包含噴嘴40的前端及孔部22的像。攝像部12A能夠藉由取得由反射鏡14A所反射的像,來檢測噴嘴40相對於孔部22的位置關係。攝像部12B能夠藉由取得由反射鏡14B所反射的像,來檢測噴嘴40相對於孔部22的位置關係。 The imaging unit 12A is installed at a position where an image reflected by the mirror 14A can be obtained. The imaging unit 12B is installed at a position where an image reflected by the mirror 14B can be obtained. As shown in FIG. 7 , when the nozzle 40 is moved to a position directly above the hole 22 , the reflection mirror 14A and the reflection mirror 14B respectively form an image including the tip of the nozzle 40 and the hole 22 . The imaging part 12A can detect the positional relationship of the nozzle 40 with respect to the hole part 22 by acquiring the image reflected by the reflection mirror 14A. The imaging part 12B can detect the positional relationship of the nozzle 40 with respect to the hole part 22 by acquiring the image reflected by the reflection mirror 14B.

攝像部12A、攝像部12B對噴嘴40的前端進行攝像而 生成圖像資料,且將所生成的圖像資料發送至控制器15。控制器15若自攝像部12A、攝像部12B接收圖像資料,則將兩張攝像圖像顯示於顯示器16。 The imaging unit 12A and the imaging unit 12B image the tip of the nozzle 40 to An image material is generated, and the generated image material is sent to the controller 15 . When the controller 15 receives the image data from the imaging unit 12A and the imaging unit 12B, it displays the two captured images on the display 16 .

使用者能夠藉由參照顯示於顯示器16的兩張攝像圖像,來確認噴嘴40的前端的位置。兩張攝像圖像由於自彼此不同的角度對噴嘴40的前端進行攝像,故而噴嘴40的前端相對於孔部22的位置關係不同。使用者能夠基於自兩張攝像圖像分別取得的兩個位置關係,來確認噴嘴40的前端的位置。 The user can confirm the position of the tip of the nozzle 40 by referring to the two captured images displayed on the display 16 . Since the two captured images capture the tip of the nozzle 40 from different angles, the positional relationship of the tip of the nozzle 40 with respect to the hole 22 is different. The user can confirm the position of the tip of the nozzle 40 based on the two positional relationships obtained from the two captured images.

於難以使攝像部12接近孔部22的正上方位置的情況下,能夠藉由將多個反射鏡14A、14B以及多個攝像部12A、12B併用,設為自彼此不同的角度對噴嘴40的前端進行攝像的結構,而自多個方向檢測噴嘴40的前端相對於孔部22的位置關係,且基於根據多個檢測結果來算出的值(例如平均值),從而取得噴嘴40的前端相對於孔部22的位置關係。因此,本實施方式4中,亦與實施方式1同樣,使用者能夠藉由一面確認噴嘴40的前端相對於孔部22的位置關係,一面使位置調整機構10工作,而以噴嘴40位於孔部22的正上方位置的方式,使噴嘴移動機構41移動。 When it is difficult to bring the imaging unit 12 close to the position directly above the hole 22, it is possible to set the nozzle 40 from different angles by using the plurality of mirrors 14A, 14B and the plurality of imaging units 12A, 12B in combination. The structure in which the front end is photographed detects the positional relationship of the front end of the nozzle 40 relative to the hole 22 from multiple directions, and based on a value (for example, an average value) calculated based on a plurality of detection results, the positional relationship of the front end of the nozzle 40 relative to the hole portion 22 is obtained. The positional relationship of the hole portion 22 . Therefore, in Embodiment 4, as in Embodiment 1, the user can position the nozzle 40 in the hole by actuating the position adjustment mechanism 10 while confirming the positional relationship of the tip of the nozzle 40 with respect to the hole 22 . 22, the nozzle moving mechanism 41 is moved.

另外,控制器15能夠設為藉由使用公知的圖像處理技術來自動進行噴嘴40的位置調整的結構。具體而言,控制器15若自攝像部12A、攝像部12B分別取得圖像資料,則對每個圖像資料,使用圖像處理技術來選出噴嘴40的前端及孔部22。控制器15基於多個選出結果而取得噴嘴40的前端與孔部22的位置關 係,以噴嘴40的前端位於預先設定的基準位置的方式,使位置調整機構10工作。 In addition, the controller 15 can be configured to automatically adjust the position of the nozzle 40 by using a known image processing technique. Specifically, when the controller 15 acquires image data from the imaging unit 12A and the imaging unit 12B, the tip of the nozzle 40 and the hole 22 are selected using an image processing technique for each image data. The controller 15 acquires the position relationship between the tip of the nozzle 40 and the hole 22 based on a plurality of selection results. The position adjustment mechanism 10 is operated so that the tip of the nozzle 40 is located at a preset reference position.

如以上所說明,根據實施方式4的原子吸光分光光度計100,能夠基於由分別對噴嘴40的前端進行攝像的多個攝像部所得的攝像圖像,來檢測噴嘴40的前端相對於石墨管21的孔部22的相對位置。因此,發揮與實施方式1的原子吸光分光光度計100同樣的效果。 As described above, according to the atomic absorption spectrophotometer 100 of Embodiment 4, it is possible to detect the relative position of the tip of the nozzle 40 relative to the graphite tube 21 based on the captured images obtained by a plurality of imaging units that respectively image the tip of the nozzle 40 . The relative position of the hole 22. Therefore, the same effect as that of the atomic absorption spectrophotometer 100 of Embodiment 1 is exhibited.

進而,根據實施方式4的原子吸光分光光度計100,能夠藉由設為多個攝像部12A、12B分別取得由多個反射鏡14A、14B所得的噴嘴40的前端的反射像的結構,而將多個攝像部12A、12B遠離石墨管21而設置。因此,能夠增加與試樣分析時成為高溫的石墨管21的距離來設置攝像部12A、攝像部12B,因此能夠保護攝像部12A、攝像部12B不會過熱。 Furthermore, according to the atomic absorption spectrophotometer 100 according to Embodiment 4, by configuring the plurality of imaging units 12A, 12B to acquire the reflected images of the tip of the nozzle 40 obtained by the plurality of mirrors 14A, 14B, respectively, the The plurality of imaging units 12A, 12B are provided away from the graphite tube 21 . Therefore, since the imaging unit 12A and the imaging unit 12B can be provided at a greater distance from the graphite tube 21 which becomes high temperature during sample analysis, it is possible to protect the imaging unit 12A and the imaging unit 12B from overheating.

此外,圖7的例子中,已對設置兩台反射鏡14A、14B以及兩台攝像部12A、12B的結構進行說明,但反射鏡及攝像部的台數並不限定於此,亦可設為設置三台以上的反射鏡及三台以上的攝像部的結構。 In addition, in the example of FIG. 7, the configuration of setting two mirrors 14A, 14B and two imaging units 12A, 12B has been described, but the number of mirrors and imaging units is not limited thereto, and may also be A structure in which three or more mirrors and three or more imaging units are installed.

[形態] [form]

根據所屬技術領域中具有通常知識者所理解,所述多個例示性的實施方式,為以下形態的具體例。 According to the understanding of those skilled in the art, the exemplary embodiments described above are specific examples of the following forms.

(第1項)一形態的原子吸光分光光度計包括:原子化部、噴嘴、噴嘴移動機構、位置調整機構、至少一個攝像部、及 顯示器。原子化部包括形成有試樣注入用的孔部的爐,藉由加熱而將注入至爐的內部的試樣進行原子化。噴嘴抽吸及噴出試樣。噴嘴移動機構使噴嘴移動至孔部的正上方位置。位置調整機構構成為:能夠藉由使噴嘴移動機構移動,來調整噴嘴的前端相對於孔部的相對位置。至少一個攝像部是以於噴嘴的前端位於孔部的正上方的狀態下,於攝像視野中包含噴嘴的前端及孔部的方式來配置。顯示器顯示出由至少一個攝像部所得的攝像圖像。 (Item 1) An atomic absorption spectrophotometer comprising: an atomization unit, a nozzle, a nozzle moving mechanism, a position adjustment mechanism, at least one imaging unit, and monitor. The atomization unit includes a furnace in which a hole for sample injection is formed, and atomizes the sample injected into the furnace by heating. The nozzle sucks and ejects the sample. The nozzle moving mechanism moves the nozzle to a position directly above the hole. The position adjusting mechanism is configured to be able to adjust the relative position of the tip of the nozzle with respect to the hole by moving the nozzle moving mechanism. At least one imaging unit is arranged so that the tip of the nozzle and the hole are included in the imaging field of view in a state where the tip of the nozzle is located directly above the hole. The display displays captured images obtained by at least one imaging unit.

根據第1項所述的原子吸光分光光度計,能夠利用對噴嘴的前端進行攝像的至少一個攝像部,來檢測噴嘴的前端相對於爐的孔部的相對位置,因此能夠使噴嘴相對於孔部的相對位置的調整變得容易。藉此,能夠提高分析作業的效率,並且能夠提高噴嘴的位置調整的精度。 According to the atomic absorption spectrophotometer described in item 1, the relative position of the tip of the nozzle with respect to the hole of the furnace can be detected by using at least one imaging unit that takes an image of the tip of the nozzle, so that the nozzle can be adjusted relative to the hole. The relative position adjustment becomes easy. Thereby, the efficiency of analysis work can be improved, and the accuracy of position adjustment of the nozzle can be improved.

(第2項)第1項所述的原子吸光分光光度計更包括:移動機構,用以使至少一個攝像部,於接近孔部的正上方位置的第一位置、與和第一位置相比而遠離爐的第二位置之間移動。 (Item 2) The atomic absorption spectrophotometer described in Item 1 further includes: a moving mechanism for moving at least one imaging unit to a first position close to the position directly above the hole, compared with the first position while moving between a second location away from the furnace.

根據第2項所述的原子吸光分光光度計,於噴嘴的位置調整結束後,能夠藉由移動機構而增加爐與各攝像部之間的距離。藉此,能夠使至少一個攝像部自於試樣的分析時成為高溫的爐退避,來保護至少一個攝像部不會過熱。 According to the atomic absorption spectrophotometer described in item 2, after the position adjustment of the nozzle is completed, the distance between the furnace and each imaging unit can be increased by the moving mechanism. Thereby, at least one imaging part can be avoided from the furnace which becomes high temperature at the time of analysis of a sample, and at least one imaging part can be protected from overheating.

(第3項)第2項所述的原子吸光分光光度計中,噴嘴移動機構構成為:能夠使噴嘴於孔部的正上方位置與收納有試樣的容器的正上方位置之間移動。攝像部的移動機構與噴嘴移動機構 共用。 (Item 3) In the atomic absorption spectrophotometer according to Item 2, the nozzle moving mechanism is configured to be able to move the nozzle between a position directly above the hole and a position directly above the container containing the sample. Camera moving mechanism and nozzle moving mechanism shared.

根據第3項所述的原子吸光分光光度計,由於噴嘴移動機構與至少一個攝像部的移動機構共用,故而能夠藉由使噴嘴疏遠爐,來增加各攝像部與爐之間的距離。因此,不需要攝像部的移動機構。藉此,能夠以簡易的結構,使至少一個攝像部自於試樣的分析時成為高溫的爐退避。 According to the atomic absorption spectrophotometer described in item 3, since the nozzle moving mechanism is shared with the moving mechanism of at least one imaging unit, the distance between each imaging unit and the furnace can be increased by keeping the nozzle away from the furnace. Therefore, there is no need for a moving mechanism for the imaging unit. Thereby, with a simple structure, at least one imaging unit can be withdrawn from a furnace which becomes high temperature during sample analysis.

(第4項)第3項所述的原子吸光分光光度計中,噴嘴移動機構包括:支持噴嘴的臂。噴嘴移動機構構成為:能夠藉由使臂移動,而使噴嘴於孔部的正上方位置、與收納有試樣的容器的正上方位置之間移動。至少一個攝像部搭載於臂。 (Item 4) In the atomic absorption spectrophotometer according to Item 3, the nozzle moving mechanism includes: an arm supporting the nozzle. The nozzle moving mechanism is configured to be able to move the nozzle between a position directly above the hole and a position directly above the container containing the sample by moving the arm. At least one imaging unit is mounted on the arm.

根據第4項所述的原子吸光分光光度計,能夠藉由利用臂的移動使噴嘴自孔部的正上方位置移動,來增加各攝像部與爐之間的距離。因此,能夠以簡易的結構,而使至少一個攝像部自於試樣的分析時成為高溫的爐退避。 According to the atomic absorption spectrophotometer described in item 4, the distance between each imaging unit and the furnace can be increased by moving the arm to move the nozzle from a position directly above the hole. Therefore, with a simple structure, at least one imaging unit can be withdrawn from a furnace that becomes high temperature during sample analysis.

(第5項)第1項所述的原子吸光分光光度計更包括:至少一個反射鏡。至少一個反射鏡形成噴嘴的前端的反射像。至少一個攝像部是與所述至少一個反射鏡分別對應而設置,取得所對應的反射鏡的反射像。 (Item 5) The atomic absorption spectrophotometer described in Item 1 further includes: at least one mirror. At least one mirror forms a reflected image of the tip of the nozzle. At least one imaging unit is provided corresponding to the at least one reflecting mirror, and obtains a reflection image of the corresponding reflecting mirror.

根據第5項所述的原子吸光分光光度計,由於至少一個攝像部能夠利用至少一個反射鏡來對噴嘴的前端進行攝像,故而能夠根據由至少一個攝像部所得的攝像圖像來檢測噴嘴的前端相對於爐的孔部的相對位置。因此,能夠使噴嘴相對於孔部的相對 位置的調整變得容易。另外,能夠藉由設為至少一個攝像部分別取得由至少一個反射鏡所得的噴嘴的前端的反射像的結構,而使至少一個攝像部遠離爐而設置。因此,能夠增加與試樣分析時成為高溫的爐的距離來設置至少一個攝像部,因此能夠保護各攝像部不會過熱。 According to the atomic absorption spectrophotometer described in item 5, since at least one imaging unit can use at least one mirror to image the tip of the nozzle, it is possible to detect the tip of the nozzle based on the captured image obtained by the at least one imaging unit. The relative position of the hole with respect to the furnace. Therefore, it is possible to make the nozzle relative to the hole relatively The adjustment of the position becomes easy. In addition, at least one imaging unit can be installed at a distance from the furnace by setting at least one imaging unit to obtain a reflection image of the tip of the nozzle by at least one reflecting mirror, respectively. Therefore, since at least one imaging unit can be installed at a distance from a furnace that becomes high in temperature during sample analysis, it is possible to protect each imaging unit from overheating.

(第6項)第5項所述的原子吸光分光光度計中,噴嘴移動機構包括:支持噴嘴的臂。噴嘴移動機構構成為:能夠藉由使臂移動,而使噴嘴於孔部的正上方位置、與收納有試樣的容器的正上方位置之間移動。至少一個反射鏡搭載於臂。 (Item 6) In the atomic absorption spectrophotometer according to Item 5, the nozzle moving mechanism includes: an arm supporting the nozzle. The nozzle moving mechanism is configured to be able to move the nozzle between a position directly above the hole and a position directly above the container containing the sample by moving the arm. At least one mirror is mounted on the arm.

根據第6項所述的原子吸光分光光度計,能夠藉由利用臂的移動使噴嘴自孔部的正上方位置移動,而增加各反射鏡與爐之間的距離。因此,能夠以簡易的結構,使至少一個反射鏡自於試樣的分析時成為高溫的爐退避。 According to the atomic absorption spectrophotometer described in item 6, the distance between each mirror and the furnace can be increased by moving the arm to move the nozzle from the position directly above the hole. Therefore, with a simple structure, at least one reflecting mirror can be withdrawn from the furnace which becomes high temperature during sample analysis.

(第7項)第1項至第6項所述的原子吸光分光光度計更包括:控制器。控制器基於由至少一個攝像部所得的攝像圖像來檢測所述噴嘴的前端相對於孔部的相對位置。控制器根據所檢測的相對位置相對於基準位置的偏移量而使位置調整機構工作。 (Item 7) The atomic absorption spectrophotometer described in Items 1 to 6 further includes: a controller. The controller detects a relative position of the tip of the nozzle with respect to the hole based on a captured image obtained by at least one imaging unit. The controller activates the position adjustment mechanism according to the detected displacement of the relative position from the reference position.

根據第7項所述的原子吸光分光光度計,不需要由使用者進行的噴嘴的位置調整作業,因此能夠進一步提高分析效率。 According to the atomic absorption spectrophotometer described in item 7, since the position adjustment operation of the nozzle by the user is unnecessary, the analysis efficiency can be further improved.

此外,關於所述實施方式1~實施方式4以及變更例,自申請之初預先規定,包括說明書內未提及的組合,且於不產生不良情況或者矛盾的範圍內,將各實施方式中所說明的結構適當 組合。 In addition, with regard to the first to fourth embodiments and modified examples, it is predetermined from the beginning of the application, including combinations not mentioned in the specification, and within the range that does not cause disadvantages or contradictions, the above-mentioned embodiments are combined. Instructions are properly structured combination.

應認為,此次揭示的實施方式於所有方面均為例示,並無限制。本發明的範圍並非由所述說明,而是由專利申請範圍所示出,意圖包括與專利申請範圍同等的含義以及範圍內的所有變更。 It should be considered that the embodiment disclosed this time is an illustration in all points and is not restrictive. The scope of the present invention is shown not by the above description but by the patent claims, and it is intended that the meanings equivalent to the patent claims and all changes within the scope are included.

2:原子化部 2: Atomization Department

10:位置調整機構 10: Position adjustment mechanism

12:攝像部 12: Camera Department

15:控制器 15: Controller

16:顯示器 16: Display

18:操作部 18:Operation Department

21:石墨管 21: graphite tube

22、25:孔部 22, 25: Hole

23、24:電極 23, 24: electrode

26:窗板 26: window panel

40:噴嘴 40: Nozzle

41:噴嘴移動機構 41: Nozzle moving mechanism

42:臂 42: arm

43:旋轉軸 43:Rotary axis

44:馬達 44: motor

X、Y、Z:軸 X, Y, Z: axes

Claims (3)

一種原子吸光分光光度計,其特徵在於,包括:原子化部,包括:形成有試樣注入用的孔部的爐,藉由加熱而將注入至所述爐的內部的試樣進行原子化;噴嘴,抽吸及噴出試樣;噴嘴移動機構,使所述噴嘴移動至所述孔部的正上方位置;位置調整機構,構成為:能夠藉由使所述噴嘴移動機構移動,來調整所述噴嘴的前端相對於所述孔部的相對位置;至少一個攝像部,於攝像視野中包含所述噴嘴的前端及所述孔部的方式來配置;顯示器,顯示由所述至少一個攝像部所得的攝像圖像;以及至少一個反射鏡,形成所述噴嘴的前端的反射像;並且所述至少一個攝像部是與所述至少一個反射鏡分別對應而設置,取得所對應的所述反射鏡的反射像。 An atomic absorption spectrophotometer, characterized by comprising: an atomization part, including: a furnace formed with a hole for sample injection, and atomizing the sample injected into the furnace by heating; a nozzle for sucking and ejecting a sample; a nozzle moving mechanism for moving the nozzle to a position directly above the hole; a position adjustment mechanism for adjusting the The relative position of the front end of the nozzle with respect to the hole; at least one imaging unit is arranged so as to include the front end of the nozzle and the hole in the imaging field of view; Take an image; and at least one mirror, forming a reflection image of the front end of the nozzle; and the at least one imaging unit is respectively set corresponding to the at least one mirror, and obtains the reflection of the corresponding mirror picture. 如請求項1所述的原子吸光分光光度計,其中,所述噴嘴移動機構包括:支持所述噴嘴的臂,所述噴嘴移動機構構成為:能夠藉由使所述臂轉動,而使所述噴嘴於所述孔部的正上方位置、與收納有試樣的容器的正上方位置之間移動,並且所述至少一個反射鏡搭載於所述臂。 The atomic absorption spectrophotometer according to claim 1, wherein the nozzle moving mechanism includes an arm supporting the nozzle, and the nozzle moving mechanism is configured to be able to move the nozzle by rotating the arm. The nozzle moves between a position directly above the hole and a position directly above the container containing the sample, and the at least one mirror is mounted on the arm. 如請求項1或請求項2所述的原子吸光分光光度計,更包括:控制器, 所述控制器基於由所述至少一個攝像部所得的攝像圖像,來檢測所述噴嘴的前端相對於所述孔部的相對位置,且根據所檢測的所述相對位置的相對於基準位置的偏移量,而使所述位置調整機構工作。 The atomic absorption spectrophotometer as described in claim 1 or claim 2, further comprising: a controller, The controller detects a relative position of the tip of the nozzle with respect to the hole based on the captured image obtained by the at least one imaging unit, and based on a relative position of the detected relative position relative to a reference position, offset, so that the position adjustment mechanism works.
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