TWI785393B - Evaporation Mask Box - Google Patents

Abstract

A case for a vapor deposition mask configured to accommodate a vapor deposition mask including a pattern region in which a plurality of through holes are formed and a peripheral region surrounding the pattern region. The vapor deposition mask box is provided with: a supporting part, which includes a flat support surface for supporting the vapor deposition mask when the vapor deposition mask box is used for storing the vapor deposition mask; When masking, the opposite surface facing the support part and the concave part recessed from the opposite surface are configured so that when viewed from the viewpoint facing the support surface, the pattern area of the evaporation mask is located in the concave part, and the surrounding area The vapor deposition mask is covered in such a way as to extend to the outside of the concave portion; and a mark is used to distinguish the cover portion from the aforementioned support portion.

Description

Evaporation mask box

The present invention relates to a vapor deposition mask cassette used for transporting a vapor deposition mask.

The vapor deposition mask box for transporting the vapor deposition mask includes a support and a lid overlapping the support. The cover part has a flat surface facing the supporting part. The supporting part has a concave part on the surface facing the flat surface of the cover part. The recess is covered by a flexible film. When the vapor deposition mask is accommodated between the support portion and the lid portion, the pattern region in which a plurality of through holes are formed is disposed in the concave portion through a thin film (for example, refer to Patent Document 1). [Prior Art Literature] [Patent Document]

[Patent Document 1] International Publication No. 2018/061757

[Problem to be solved by the invention]

When vibration is applied to the vapor deposition mask box when transporting the vapor deposition mask, the force along the direction in which the support part and the cover part face each other acts on the vapor deposition mask, thereby reducing the movement of the vapor deposition mask. The pattern area will flex into a convex shape towards the recess. Although this deflection of the vapor deposition mask can be suppressed by the flexible film supporting the vapor deposition mask, there is also a possibility that the vapor deposition mask and the film will be separated depending on the magnitude of the vibration applied to the vapor deposition mask box. The case where it is flexed to such an extent that the patterned area of the vapor deposition mask is deformed.

An object of the present invention is to provide a cassette for a vapor deposition mask capable of suppressing deformation of a pattern region included in the vapor deposition mask when transporting the vapor deposition mask. [Means to solve the problem]

A vapor deposition mask cartridge for solving the above-mentioned problems is a vapor deposition mask cartridge configured to accommodate a vapor deposition mask including a pattern region in which a plurality of through holes are formed, and a pattern region surrounding the pattern. surrounding area of the area. The vapor deposition mask box includes: a support portion including a flat support surface for supporting the vapor deposition mask when the vapor deposition mask is accommodated in the vapor deposition mask case; The box accommodates the facing surface facing the support portion when the vapor deposition mask is placed, and the recess recessed from the facing surface, and is configured such that when viewed from the viewpoint facing the support surface, the vapor deposition mask The aforementioned pattern area is located in the aforementioned concave portion, and the aforementioned peripheral area extends to the outside of the aforementioned concave portion to cover the aforementioned vapor deposition mask; and a mark is used to distinguish the aforementioned cover portion from the aforementioned supporting portion.

According to the above vapor deposition mask cartridge, since the cap portion having the concave portion is easily identified by the mark, it is easy to dispose the cap portion on the support portion so as to sandwich the vapor deposition mask so that the cap portion is positioned on the support portion. Moreover, the evaporation mask is supported by a flat supporting surface, and the cover part is not in contact with the pattern area. Therefore, when vibration is applied to the vapor deposition mask through the vapor deposition mask cartridge while suppressing deflection of the vapor deposition mask by the support surface, it is possible to prevent the pattern region of the vapor deposition mask from coming into contact with the lid. Thereby, the deformation of the pattern region can be suppressed when the vapor deposition mask is transported, and further the deformation of the through-hole formed in the pattern region can be suppressed.

In the above-mentioned vapor deposition mask box, it is also possible to further include a pair of joint parts, and the pair of joint parts is formed by sandwiching the aforementioned concave part in the longitudinal direction of the aforementioned vapor deposition mask box and at a position outside the aforementioned concave part. The lid is joined to the support to connect the cover to the support. According to this vapor deposition mask cartridge, deformation of the pattern region of the vapor deposition mask due to the force acting on the vapor deposition mask cartridge by the connecting portion to connect the support portion and the lid portion can be suppressed.

The above-mentioned vapor deposition mask box may further include a buffer portion located between the lid portion and the vapor deposition mask in the thickness direction of the lid portion and covering the concave portion of the lid portion. According to this vapor deposition mask cartridge, the buffer portion can suppress stress concentration on a part of the vapor deposition mask due to the step difference between the concave portion of the cover portion and the portion located around the concave portion of the facing surface.

In the above-mentioned vapor deposition mask box, a pair of clamping parts is further provided, and the pair of pinching parts are in a state where the aforementioned support part and the aforementioned cover part face each other when the aforementioned vapor deposition mask box accommodates the aforementioned vapor deposition mask. Next, protruding from the aforementioned facing surface of the aforementioned cover portion toward the aforementioned supporting portion, and the aforementioned pair of clamping portions are located outside the aforementioned concave portion in such a manner as to pinch the aforementioned concave portion in the longitudinal direction of the aforementioned vapor deposition mask box, and In the thickness direction of the vapor deposition mask, it is configured to pinch the peripheral region of the vapor deposition mask together with the support portion; the buffer portion may also cover the concave portion of the cover portion and the pair of pinching portions.

According to the above-mentioned vapor deposition mask box, since the vapor deposition mask is fixed by the clamping part provided by the support part and the cover part, even if vibration is applied to the vapor deposition mask, the vapor deposition mask is not easy to be damaged by the vapor deposition mask. The cover moves inside the box. Therefore, deformation of the pattern region can be suppressed.

In the said vapor deposition mask box, the hinge part which connects the said support part to the said cover part may be further provided. According to this vapor deposition mask box, the positioning of the cover part with respect to the support part is easy compared with the case which does not have a hinge part.

In the above-mentioned vapor deposition mask box, the support part and the cover part may also be formed by a plastic corrugated board having an opening on the side; in the support part, the opening of the plastic corrugated board is located in the support part side of the cover; in the cover, the opening of the plastic corrugated board is located on the side of the cover; the opening of the cover and the opening of the support are blocked. According to the aforementioned vapor deposition mask box, since both the opening on the side surface of the cover portion and the opening on the side surface of the support portion are closed, accumulation of foreign matter in the opening can be suppressed. [Effect of Invention]

According to the present invention, when the vapor deposition mask is transported, deformation of the pattern region included in the vapor deposition mask can be suppressed.

[Mode for Carrying Out the Invention]

One embodiment of the vapor deposition mask cartridge will be described with reference to FIGS. 1 to 6 . FIG. 1 shows the structure of the vapor deposition mask cartridge in a state where the vapor deposition mask cartridge is opened. In addition, in FIG. 1, the shape of the vapor deposition mask accommodated in the cassette for vapor deposition masks is shown schematically.

As shown in FIG. 1 , the case 10 for a vapor deposition mask is a case for accommodating a vapor deposition mask 21 . The vapor deposition mask 21 includes: a pattern region 21a in which a plurality of through holes 21h are formed; and a peripheral region 21b surrounding the pattern region 21a. The vapor deposition mask box 10 includes a support portion 11 and a cover portion 12 . The support portion 11 includes a flat support surface 11S that supports the vapor deposition mask 21 when the vapor deposition mask 21 is accommodated in the vapor deposition mask box 10 . The cover part 12 includes: the facing surface 12S facing the support part 11 when the vapor deposition mask box 10 accommodates the vapor deposition mask 21; and the recessed part 12Sa recessed from the facing surface 12S. When viewed from a viewpoint facing the support surface 11S, the cover 12 covers the vapor deposition mask 21 supported by the support 11 so that the pattern region 21a is located inside the recess 12Sa and the peripheral region 21b extends to the outside of the recess 12Sa.

The vapor deposition mask box 10 further includes a buffer portion 13 , a pair of clamping portions 14 , and a hinge portion 15 . The buffer portion 13 is located between the lid portion 12 and the vapor deposition mask 21 in the thickness direction of the lid portion 12 , and covers the concave portion 12Sa of the lid portion 12 .

The pair of pinching parts 14 protrudes toward the support part 11 from the opposing surface 12S of the cover part 12 in a state where the support part 11 and the cover part 12 face each other. The pair of pinching portions 14 are located outside the concave portion 12Sa so as to pinch the concave portion 12Sa in the longitudinal direction of the vapor deposition mask 21 , that is, in the longitudinal direction of the vapor deposition mask cartridge 10 . A pair of pinching parts 14 is in the thickness direction of the vapor deposition mask 21 , that is, in the direction in which the support part 11 and the cover part 12 face each other, together with the support part 11 pinches the peripheral area 21 b of the vapor deposition mask 21 . In the present embodiment, the buffer portion 13 covers the recessed portion 12Sa of the cover portion 12 and the pair of clamping portions 14 .

According to the deposition mask cartridge 10 , the buffer portion 13 suppresses concentration of stress on a part of the deposition mask 21 due to the step difference between the concave portion 12Sa of the cover portion 12 and the portion of the facing surface 12S located around the concave portion 12Sa. In addition, since the vapor deposition mask 21 is fixed by the support portion 11 and the clamping portion 14, even if vibration is applied to the vapor deposition mask 21, the vapor deposition mask 21 is not easily moved in the vapor deposition mask box 10. Therefore, deformation of the pattern area 21a can be suppressed. Moreover, compared with the case where the vapor deposition mask box 10 does not have the hinge part 15, positioning of the cover part 12 with respect to the support part 11 is easy. Moreover, compared with the case where the hinge part 15 is not provided, the position of the cover part 12 with respect to the support part 11 can be maintained stably.

The evaporation mask box 10 is formed by two plastic cardboards. The plastic corrugated board has a plurality of hollow parts, and the hollow parts have a linear shape extending in a direction perpendicular to the thickness direction of the plastic corrugated board. A plurality of hollow parts are arranged in a direction along the plane where the plastic corrugated board expands. When manufacturing the vapor deposition mask box 10, first, two plastic corrugated boards are pasted together. At this time, the two plastic corrugated boards are laminated so that the direction in which the hollow portion of one plastic corrugated board extends intersects with the direction in which the hollow portion of the other plastic corrugated board extends. Preferably, the direction in which the hollow portion of one plastic corrugated board extends is perpendicular to the direction in which the hollow portion of the other plastic corrugated board extends.

The supporting part 11, the cover part 12 and the hinge part 15 are formed from two plastic corrugated boards by cutting a part of the plastic corrugated board. Plastic corrugated boards are made of synthetic resins such as polypropylene (PP). The thickness of each plastic corrugated board can also be, for example, not less than 5 mm and not more than 15 mm.

Each of the support portion 11 and the cover portion 12 has a strip shape extending in one direction. One side extending along the length direction of the supporting portion 11 is connected to one side extending along the length direction of the cover portion 12 through the hinge portion 15 .

The buffer portion 13 has a strip shape extending along the longitudinal direction of the cover portion 12 . The buffer portion 13 is formed by a resin film. The buffer portion 13 is formed of synthetic resin such as polyethylene terephthalate (PET). The buffer portion 13 has flexibility. The buffer portion 13 may have antistatic properties. When the buffer portion 13 has antistatic properties, the sheet resistance of the buffer portion 13 may be not less than 1.0×10 ¹⁰ Ω/□ and not more than 9.0×10 ¹⁴ Ω/□. The thickness of the buffer portion 13 may be, for example, not less than 150 μm and not more than 300 μm.

Each pinching part 14 has a belt shape extending along the width direction of the vapor deposition mask box 10 . The clamping portion 14 is formed by, for example, a resin plate member. The clamping portion 14 is preferably formed of foamable resin. The clamping portion 14 is formed of synthetic resin such as PP. When the clamping portion 14 is formed of foamable PP, the expansion ratio may be, for example, not less than 1.3 and not more than 3.0, and the density may be, for example, not less than 0.3 g/cm ³ and not more than 0.7 g/cm ³ . The thickness of the clamping portion 14 may be, for example, not less than 100 μm and not more than 300 μm. In the width direction of the vapor deposition mask cartridge 10 , the width of the clamping portion 14 is preferably equal to or greater than the width of the vapor deposition mask 21 .

The area of the clamping portion 14 is appropriately changed according to the size of the vapor deposition mask 21 to be accommodated in the vapor deposition mask box 10 . For example, the width of the clamping portion 14 may be not less than 10 mm and not more than 100 mm, and the length of the pinching portion 14 may be not less than 50 mm and not more than 350 mm. In addition, the width of the clamping portion 14 refers to the length of the clamping portion 14 along the longitudinal direction of the vapor deposition mask box 10 . Also, the length of the pinching portion 14 refers to the length of the pinching portion 14 along the width direction of the vapor deposition mask cartridge 10 . The length of the clamping portion 14 is preferably equal to or greater than the full length of the width of the vapor deposition mask 21 .

In the cover portion 12, the distance between the facing surface 12S and the bottom of the recessed portion 12Sa is the depth of the recessed portion 12Sa. The depth of the concave portion 12Sa can be shallower than the thickness of a piece of plastic corrugated board, can be equal to the thickness of a piece of plastic corrugated board, and can also be deeper than the thickness of a piece of plastic corrugated board.

The vapor deposition mask 21 is made of metal. The vapor deposition mask 21 may also be made of, for example, an iron-nickel alloy. A plurality of through-holes 21h are formed in the pattern region 21a of the vapor deposition mask 21, and these have a shape corresponding to the pattern shape formed by using the vapor deposition mask 21. Each through-hole 21 h includes a first opening opened on the first surface of the vapor deposition mask 21 and a second opening opened on the second surface of the vapor deposition mask 21 . Seen from the viewpoint facing the second surface of the vapor deposition mask 21, the size of the second opening is larger than the size of the first opening. When the vapor deposition mask 21 is used for vapor deposition, the first surface faces the vapor deposition object, and the second face faces the vapor deposition source. In the vapor deposition mask 21, the thickness of the peripheral region 21b may be, for example, not less than 5 μm and not more than 30 μm. The peripheral region 21B does not need to have a through-hole for forming a pattern.

When the vapor deposition mask 21 is housed in the vapor deposition mask box 10 , the vapor deposition mask 21 is sandwiched by a pair of dust-free papers 22 in the thickness direction of the vapor deposition mask 21 . The dust-free paper 22 is used to prevent the direct contact between the vapor deposition mask 21 and the components located around the vapor deposition mask 21 , thereby preventing damage to the vapor deposition mask 21 . Among the pair of dust-free papers 22 holding the vapor deposition mask 21, the second surface of the vapor deposition mask 21 is in contact with the dust-free paper 22 of the supporting part 11, and the first surface of the vapor deposition mask 21 is in contact with the dust-free paper 22 close to the cover. The dust-free paper 22 of the part 12 is in contact with each other, so that the evaporation mask 21 is held by a pair of dust-free paper 22 . Moreover, a pair of dust-free paper 22 is sandwiched by a pair of PET films 23 in the thickness direction of the vapor deposition mask 21 .

The thickness of the dust-free paper 22 is, for example, not less than 50 μm and not more than 150 μm. The thickness of the PET film 23 is, for example, not less than 100 μm and not more than 300 μm. The PET film 23 may also have white color, for example. The PET film 23 can be formed by a single layer, and can also be formed by multiple layers. In the case where the PET film 23 is formed of, for example, two layers, it may also be formed of a transparent layer and a white layer.

The PET film 23 may have antistatic properties. The sheet resistance of the PET film 23 may be not less than 1.0×10 ¹⁰ Ω/□ and not more than 9.0×10 ¹⁴ Ω/□. Thereby, the static electricity accumulated in the PET film 23 can be reduced, and the situation that dust due to static electricity adheres to the PET film 23 can be suppressed.

In addition, in the case 10 for vapor deposition masks, one vapor deposition mask 21 may be accommodated, and a plurality of vapor deposition masks 21 may be accommodated at a time. In either case where the vapor deposition mask box 10 accommodates one vapor deposition mask 21 or when a plurality of vapor deposition masks 21 are accommodated, the vapor deposition mask box 10 is opposite to the second face on the first surface. Each vapor deposition mask 21 is housed in a state where the surface is located close to the cover portion 12 .

When a plurality of vapor deposition masks 21 are housed at one time, a plurality of vapor deposition masks 21 are sandwiched by a pair of dust-free papers 22 to form a mask laminate in the thickness direction of the vapor deposition masks 21 . Then, with the PET film 23 between the mask laminate and the mask laminate, and the PET film 23 in contact with the support part 11 and the cover part 12, stack a plurality of vapor deposition masks 21, a plurality of sheets of dust-free paper 22 and A plurality of sheets of PET film 23. In the case where a plurality of vapor deposition masks 21 are accommodated in the vapor deposition mask box 10, in the thickness direction of the vapor deposition mask box 10, the second surface of the vapor deposition mask 21 located closest to the support portion 11 is It faces the supporting surface 11S of the supporting part 11 .

FIG. 2 shows the structure of the vapor deposition mask cartridge 10 in a state where the vapor deposition mask cartridge 10 is closed. As shown in FIG. 2 , the vapor deposition mask box 10 is provided with a mark 16 for distinguishing the cover part 12 from the support part 11 . In the present embodiment, the mark 16 is, for example, a label attached to the surface 12F which is the surface opposite to the facing surface 12S of the cover portion 12 . Identification information is recorded on the tag. The identification information can also be, for example, product name, batch number, serial number, and the number of evaporation masks 21 .

The vapor deposition mask cartridge 10 further has a pair of connection parts 17 . The pair of connecting parts 17 is to connect the cover part 12 to the cover part 12 by sandwiching the recessed part 12Sa in the longitudinal direction of the vapor deposition mask box 10 and contacting the cover part 12 and the support part 11 outside the recessed part 12Sa. Support Section 11. Therefore, compared with the case where the pair of connecting parts 17 is located inside the concave part 12Sa in the longitudinal direction of the vapor deposition mask cartridge 10, it is possible to suppress the bonding of the connecting part 17 to the vapor deposition mask in order to connect the support part 11 and the cover part 12. The case where the pattern area 21a of the vapor deposition mask 21 is deformed by the force acting on the cartridge 10. Furthermore, the deformation|transformation of the through-hole 21h which the vapor deposition mask 21 has can be suppressed.

The connecting portion 17 is, for example, an adhesive tape. The adhesive tape may include, for example, a belt-shaped main body formed of various synthetic resins, and an adhesive layer formed on one surface of the main body.

3 and 4 show the cross-sectional structure of the vapor deposition mask box 10 together with the cross-sectional structure of the vapor deposition mask 21 . In addition, in FIGS. 3 and 4 , illustration of the air-free paper 22 and the PET film 23 is omitted for convenience of illustration. In addition, FIGS. 3 and 4 show a state in which one vapor deposition mask 21 is housed in the vapor deposition mask box 10 as an example.

3 shows the cross-sectional structure of the vapor deposition mask cartridge 10 and the cross-sectional structure of the vapor deposition mask 21 along a plane perpendicular to the surface 12F of the lid portion 12 and passing through the clamping portion 14 . FIG. 4 shows the cross-sectional structure of the vapor deposition mask cartridge 10 and the cross-sectional structure of the vapor deposition mask 21 along a plane perpendicular to the surface 12F of the lid portion 12 and passing through the recess 12Sa.

As shown in FIG. 3, the support part 11 is formed with the 1st sheet|seat 11a and the 2nd sheet|seat 11b. Each of the first sheet 11a and the second sheet 11b is a plastic corrugated board as described above. The cover part 12 is formed of the 1st sheet|seat 12a and the 2nd sheet|seat 12b. Each of the first sheet 12a and the second sheet 12b is a plastic corrugated board as described above. The first sheet 11a of the support portion 11 and the first sheet 12a of the cover portion 12 are different parts of the same plastic corrugated board. The second sheet 11b of the cover 12 and the second sheet 12b of the cover 12 are different parts of the same plastic corrugated board.

The thickness of the first sheet 11a, 12a may be equal to or different from the thickness of the second sheet 11b, 12b. In the case where the thickness of the first sheet 11a, 12a is different from that of the second sheet 11b, 12b, the first sheet 11a, 12a can also be thicker than the second sheet 11b, 12b, and the first sheet 11a, 12a can also be thicker than the second sheet. 11b, 12b are thin. In addition, the first sheets 11 a and 12 a are located inside the second sheets 11 b and 12 b in the thickness direction of the vapor deposition mask cartridge 10 when the lid portion 12 is stacked on the support portion 11 . Therefore, since the first sheets 11a, 12a are thicker than the second sheets 11b, 12b, even if the second sheets 11b, 12b are damaged, they can be protected by the first sheets 11a, 12a and accommodated in the vapor deposition mask. Use the vapor deposition mask 21 in the box 10 .

The side surface extending in the longitudinal direction of the support portion 11 is a tapered surface inclined in a direction in which the support surface 11S goes downward and separates from the hinge portion 15 in a cross section along the width direction when the cover portion 12 is located above the support portion 11 . In addition, the side surface extending in the width direction of the support portion 11 is a tapered shape inclined downward from the support surface 11S and toward the clamping portion 14 in a section along the length direction when the cover portion 12 is positioned above the support portion 11. noodle.

The side surface extending in the longitudinal direction of the cover part 12 is inclined from the opposite surface 12S upward and away from the hinge part 15 in the cross section in the width direction when the cover part 12 is located above the support part 11. tapered surface. In addition, the side surface extending in the width direction of the cover part 12 is inclined from the opposite surface 12S upward and toward the clamping part 14 in the cross section along the longitudinal direction when the cover part 12 is located above the support part 11. The cone surface.

The pinching part 14 overlaps the peripheral region 21 b of the vapor deposition mask 21 via the buffer part 13 in the thickness direction of the vapor deposition mask cartridge 10 . Since the pinching portion 14 is only located on a part of the facing surface 12S of the cover portion 12 , the load of the cover portion 12 is concentrated on the pinching portion 14 . Therefore, since the peripheral region 21b of the vapor deposition mask 21 is pinched by the clamping portion 14 and the support portion 11, the vapor deposition mask 21 can be firmly fixed compared to the case where the vapor deposition mask box 10 does not have the pinching portion 14. The position inside the box 10 for the vapor deposition mask. In addition, since the load on the lid portion 12 is biased towards the peripheral region 21b of the vapor deposition mask 21, deformation of the pattern region 21a of the vapor deposition mask 21 can be suppressed.

As shown in FIG. 4 , when the vapor deposition mask 21 is housed in the vapor deposition mask cartridge 10 , the support surface 11S of the support portion 11 is in contact with the pattern region 21 a of the vapor deposition mask 21 . In the pattern area 21a, many through-holes 21h for forming a pattern on a vapor deposition target are formed. Therefore, in the evaporation mask 21, the mechanical strength of the pattern region 21a is lower than that of the peripheral region 21b.

In this regard, according to the vapor deposition mask box 10, since the pattern region 21a is supported by the support surface 11S, when the vapor deposition mask 21 is transported, the pattern region 21a can be suppressed from being twisted or bent, whereby the pattern region can be suppressed from being twisted or bent. Variation of 21a. As a result, deformation of the through-hole 21h formed in the pattern region 21a can be suppressed. Moreover, since the support surface 11S of the support part 11 is a flat surface, when the vapor deposition mask 21 is accommodated in the vapor deposition mask box 10, the vapor deposition mask 21 can be arrange|positioned along the support surface 11S. Therefore, when the vapor deposition mask 21 is housed in the vapor deposition mask cassette 10 , deformation such as wrinkles can be suppressed from occurring in the vapor deposition mask 21 , compared to a case where the support portion 11 has a concave portion.

Furthermore, as described above, the vapor deposition mask box 10 accommodates the vapor deposition mask 21 in a state where the second surface of the vapor deposition mask 21 is in contact with the support portion 11 . Here, in the through hole 21h, the contribution of the first opening to the accuracy of the vapor deposition pattern is greater than the contribution of the second opening to the accuracy of the vapor deposition pattern. In this regard, since the first opening of the through hole 21h is not directly connected to the supporting surface 11S, the deformation of the first opening due to contact with the vapor deposition mask box 10 can be suppressed, and the pattern can be supported by the supporting portion 11. Area 21a.

On the other hand, although the part included in the pattern area 21 a of the first surface is in contact with the buffer part 13 , the cover part 12 is not in contact with the part of the buffer part 13 which is in contact with this part. For this reason, the shock of the insulating cover portion 12 is less likely to be applied to the pattern area 21a. Therefore, deformation of the pattern area 21a can be suppressed.

As shown in the above-mentioned vapor deposition mask box 10, the support portion 11 has a flat support surface 11S for supporting the pattern area 21a, and the cover portion 12 has a concave portion 12Sa for avoiding contact with the pattern area 21a. Deformation of the pattern region 21a is preferably suppressed, and thus deformation of the through hole 21h can be suppressed.

In addition, when the vapor deposition mask box 10 accommodates a plurality of vapor deposition masks 21 , the laminated system including the plurality of vapor deposition masks 21 is supported by the support portion 11 . Thereby, the deformation|transformation of the pattern area 21a which the some vapor deposition mask 21 contained in the laminated body has can be suppressed, and the deformation|transformation of the through-hole 21h can be suppressed further.

FIG. 5 shows the side structure of the support portion 11 viewed from a viewpoint facing the side extending in the width direction of the support portion 11 in a state where the vapor deposition mask box 10 is closed.

As shown in FIG. 5, and as mentioned above, the support part 11 is formed with the 1st sheet|seat 11a and the 2nd sheet|seat 11b. In the example shown in FIG. 5, the hollow part 11bh which the 2nd sheet|seat 11b has extends along the depth direction of a paper surface. On the other hand, the hollow part 11ah which the 1st sheet|seat 11a has extends along the left-right direction of a paper surface. The hollow part 11bh which the 2nd sheet|seat 11b has is orthogonal to the hollow part 11ah which the 1st sheet|seat 11a has. Thereby, compared with the case where the hollow part 11ah which the 1st sheet|seat 11a has and the hollow part 11bh which the 2nd sheet|seat 11b has are parallel, the mechanical strength of the cassette 10 for vapor deposition masks can be improved.

In the second sheet 11b, the opening 11bA of each hollow portion 11bh is located on the side surface of the support portion 11 . Each opening 11bA is blocked. For example, each opening 11bA is closed by heating the plastic corrugated board when processing the second sheet 11b. Also, for example, each opening 11bA is closed by embedding a material for closing the opening 11bA located on the side surface of the support portion 11 into the hollow portion 11bh. Also, for example, each opening 11bA is closed by sticking an adhesive sheet on the side surface of the second sheet 11b.

Moreover, each hollow part 11ah of the 1st sheet|seat 11a has opening 11aA in the side surface extended along the longitudinal direction of the cassette 10 for vapor deposition masks. Like the opening 11bA of the hollow portion 11bh of the second sheet 11b, the opening 11aA of the hollow portion 11ah of the first sheet 11a is also closed. The opening 11aA of the hollow portion 11ah of the first sheet 11a is closed by any method of the opening 11bA of the hollow portion 11bh of the second sheet 11b. In addition, the method of closing the opening 11aA of the first sheet 11a and the method of closing the opening 11bA of the second sheet 11b may be the same method or different methods.

In addition, the opening on the side surface of the cover portion 12 is also closed similarly to the opening on the side surface of the support portion 11 . In this way, in the vapor deposition mask box 10 , since both the opening on the side of the lid 12 and the openings 11aA and 11bA on the side of the support 11 are closed, accumulation of foreign matter in the opening can be suppressed. Therefore, it is possible to suppress foreign matter from being carried into the clean room of the vapor deposition apparatus to which the vapor deposition mask 21 is applied, together with the vapor deposition mask 21 due to the carrying in of the vapor deposition mask 21 .

FIG. 6 shows the state of the vapor deposition mask cassette 10 when the vapor deposition mask cassette 10 is carried from the first base to the second base. The first base is, for example, a base for manufacturing the vapor deposition mask 21 , and the second base is, for example, a base for patterning a vapor deposition target using the vapor deposition mask 21 .

As shown in FIG. 6 , when the vapor deposition mask cassette 10 is transported, the vapor deposition mask cassette 10 is covered with an exterior 31 . The exterior decoration 31 is preferably light-transmitting so that the information recorded on the logo 16 possessed by the vapor deposition mask box 10 can be identified through the exterior decoration 31 . The exterior decoration 31 is preferably transparent or translucent. The exterior decoration 31 may also be, for example, a bag or a sheet formed of various synthetic resins. Since the vapor deposition mask case 10 is covered with the exterior 31 , foreign matter can be suppressed from adhering to the vapor deposition mask case 10 . Thereby, foreign objects can be suppressed from being carried into the clean room of the vapor deposition apparatus to which the vapor deposition mask 21 is applied, together with the vapor deposition mask 21 due to the carrying in of the vapor deposition mask 21 .

As described above, according to one embodiment of the vapor deposition mask cartridge, the effects described below can be obtained. (1) Since the cover 12 having the concave portion 12Sa is easily recognized through the mark 16 , it is easy to place the cover 12 on the support 11 so that the cover 12 is placed on the support 11 with the vapor deposition mask 21 interposed therebetween. Moreover, the evaporation mask 21 is supported by the flat supporting surface 11S, and the cover portion 12 is not in contact with the pattern area 21a. Therefore, when vibration is applied to the vapor deposition mask 21 through the vapor deposition mask box 10 while suppressing the deflection of the vapor deposition mask 21 by the support surface 11S, the lid portion 12 can be prevented from coming into contact with the vapor deposition mask. 21 pattern area 21a. Thereby, deformation of the pattern region 21a can be suppressed when the vapor deposition mask 21 is transported, and further deformation of the through-hole 21h formed in the pattern region 21a can be suppressed.

(2) The pattern region 21a of the vapor deposition mask 21 can be suppressed from being deformed by the force acting on the vapor deposition mask cartridge 10 by the connecting portion 17 to connect the support portion 11 and the lid portion 12 .

(3) The buffer portion 13 suppresses stress concentration on a part of the vapor deposition mask 21 due to the step between the recess 12Sa of the lid 12 and the portion of the facing surface 12S around the recess 12Sa.

(4) The vapor deposition mask 21 is fixed by the supporting part 11 and the clamping part 14 . Therefore, even if vibration is applied to the vapor deposition mask 21 , the vapor deposition mask 21 is less likely to move within the vapor deposition mask box 10 . Therefore, deformation of the pattern area 21a can be suppressed.

(5) Since the hinge portion 15 connects the support portion 11 to the cover portion 12 , positioning of the cover portion 12 with respect to the support portion 11 is easier than when the hinge portion 15 is not provided. (6) Since both the opening on the side of the lid 12 and the openings 11aA and 11bA on the side of the support 11 are closed, accumulation of foreign matter in the opening can be suppressed.

In addition, the above-mentioned embodiment can be modified and implemented as follows. [exterior decoration] ・It is not necessary to use the exterior decoration 31 covering the case 10 for a vapor deposition mask when carrying out the conveyance of the case 10 for a vapor deposition mask.

[Support Department] ・The openings 11aA and 11bA located on the side surfaces of the support portion 11 may not be blocked. In this case, the effects according to (1) to (5) above can also be obtained.

[cover part] ・The opening on the side surface of the cover part 12 may not be closed. In this case, the effects according to (1) to (5) above can also be obtained.

[hinge part] ・The case 10 for a vapor deposition mask may not have the hinge part 15. That is, in the case 10 for a vapor deposition mask, the support part 11 does not need to be separated from the cover part 12. As shown in FIG. By separating the support part 11 from the cover part 12, for example, when the vapor deposition mask cartridge 10 is transported, the vapor deposition mask cartridge 10 is heated, thereby even if the vapor deposition mask cartridge 10 has expanded, It is also possible to suppress the occurrence of distortion in the vapor deposition mask cartridge 10 .

In addition, when the vapor deposition mask box 10 has the hinge portion 15, the distance between the support portion 11 and the cover portion 12 is set according to the number of vapor deposition masks 21 accommodated in the vapor deposition mask box 10. In the way of the distance, the hinge part 15 is designed. At this time, the vapor deposition mask box 10 accommodates the vapor deposition mask 21 in a state where the lid portion 12 acts on the laminated body of the vapor deposition mask 21, the dust-free paper 22, and the PET film 23 with a substantially uniform force. to design the hinge portion 15 . Therefore, when accommodating the vapor deposition mask 21 with a number less than the number set at the time of design in the vapor deposition mask box 10, it is necessary to make the laminated layer by adding a dust-free paper 22 or a PET film 23 or the like. The thickness of the body becomes thicker.

In contrast, when the vapor deposition mask box 10 does not have the hinge portion 15, regardless of the number of vapor deposition masks 21 accommodated in the vapor deposition mask box 10, the support portion 11 and the cover portion 12 All will come into contact with the laminate of vapor deposition mask 21 , dust-free paper 22 and PET film 23 . Therefore, the vapor deposition mask 21 can be housed in a state where a substantially uniform force is applied to the laminate by the vapor deposition mask box 10 .

As shown in FIG. 7, the hinge part 15 may be provided with the support side hinge part 15a and the cover side hinge part 15b. In the hinge part 15, the support side hinge part 15a is connected to the support part 11 by the connection part 15a1, and the cover side hinge part 15b is connected to the cover part 12 by the connection part 15b1. The hinge portion 15 further includes a connection portion 15c that connects the support-side hinge portion 15a to the lid-side hinge portion 15b. The hinge part 15 can be bent at the connecting part 15c. The hinge portion 15 is bent at the connection portion 15c such that the surface on the opposite side to the support surface 11S of the support portion 11 faces the surface 12F of the lid portion 12 .

As shown in Figure 8, under the open state of the box 10 for the evaporation mask, the supporting part 11, the hinge part 15 and the cover part 12 can be arranged in the order described, and the supporting part 11, the hinge part 15 and the cover part 12 can be located on the same plane. The vapor deposition mask box 10 can be bent starting from the connecting portion 15c, whereby the cover 12 can rotate in a direction approaching the cover 12 with the connecting portion 15c as a rotation axis. At this time, the vapor deposition mask 21 accommodated in the cassette 10 for vapor deposition masks is maintained in the state located in the support surface 11S.

As shown in FIG. 9 , by the rotation of the cover part 12 , in the state where the connection between the support part 11 and the cover part 12 is maintained, the surface 12F of the cover part 12 and the surface on the opposite side of the support surface 11S in the support part 11 Department of opposite. Thereby, the supporting part 11 is superimposed on the cover part 12 . Also at this time, the vapor deposition mask 21 supported by the vapor deposition mask cartridge 10 is maintained in a state of being positioned on the support surface 11S.

Since the vapor deposition mask box 10 is equipped with the aforementioned hinge portion 15, the vapor deposition mask box 10 can be opened while maintaining the state in which the vapor deposition mask 21 accommodated in the vapor deposition mask box 10 is located on the supporting surface 11S. 10 and overlap the supporting part 11 on the cover part 12 . Therefore, the vapor deposition mask 21 can be exposed to the outside of the vapor deposition mask case 10, and the area in which the vapor deposition mask case 10 is placed can be reduced.

[Holding Department] ・The case 10 for a vapor deposition mask does not need to have the clamping part 14. In this case, the effects according to (1) to (3), (5) and (6) above can also be obtained.

[buffer part] ・The case 10 for a vapor deposition mask may not have the buffer part 13. In this case, the effects according to (1), (2) and (4) to (6) above can also be obtained.

[contracting department] ・The case 10 for a vapor deposition mask may not have the connection part 17. In this case, the effects according to (1) and (3) to (6) above can also be obtained.

[logo] ・The mark 16 is not limited to a label, and may be a printed part formed by printing on the vapor deposition mask cartridge 10, for example. Alternatively, the mark 16 may be formed by at least one of the concave portion and the convex portion formed in the vapor deposition mask box 10 .

・As long as the support part 11 and the cover part 12 can be distinguished through the mark 16, the mark 16 does not need to be located on the surface 12F of the cover part 12. For example, the logo 16 may also be located on the side of the cover 12 , and may also have a shape straddling the surface 12F of the cover 12 and the side of the cover 12 . Moreover, it may be located in the facing surface 12S of the cover part 12. When the logo 16 is located on the opposite surface 12S of the cover 12 , the cover 12 must have light transmission so that the logo 16 can be recognized through the cover 12 . In addition, the sign 16 may also be located on the supporting portion 11 . In this case, the mark 16 may be located on the side surface of the support portion 11 , or may have a shape straddling the side surface of the support portion 11 and the surface opposite to the support surface 11S in the support portion 11 .

[Reinforcing plate and fitting sheet] ・The vapor deposition mask box 10 may further include at least one of a reinforcing plate and a fitting sheet described below. In FIGS. 10 to 13 referred to below, the illustration of the hinge portion 15 connecting the support portion 11 and the cover portion 12 to each other is omitted for convenience of illustration. In addition, the vapor deposition mask box 10 described below may not be provided with the hinge part 15 .

As shown in FIG. 10 , the vapor deposition mask box 10 includes a support side reinforcing plate 18 and a cover side reinforcing plate 19 . The support side reinforcing plate 18 has a rectangular strip shape extending along the longitudinal direction of the supporting portion 11 , and the supporting portion 11 is superimposed on the supporting side reinforcing plate 18 . The cover side reinforcing plate 19 has a rectangular strip shape extending along the longitudinal direction of the cover portion 12 , and the cover portion 12 is overlapped on the cover side reinforcing plate 19 .

The support part 11 and the cover part 12 are made of synthetic resin, for example. The rigidity of the supporting side reinforcing plate 18 is preferably higher than that of the supporting portion 11 , but the rigidity of the supporting side reinforcing plate 18 may be smaller than that of the supporting portion 11 . The rigidity of the cover side reinforcement plate 19 is preferably higher than that of the cover portion 12 , but the rigidity of the cover side reinforcement plate 19 may be smaller than that of the cover portion 12 .

The support side reinforcing plate 18 is provided with a pair of fitting piece 18a. The fitting pieces 18a are located at each end of the support side reinforcing plate 18 in the longitudinal direction. Each fitting piece 18 a protrudes from the supporting surface 11S of the supporting part 11 in the thickness direction of the supporting part 11 . The amount of protrusion of the fitting piece 18 a with respect to the support surface 11S is substantially equal to the thickness of the cover portion 12 . The protrusion amount of the fitting piece 18a is preferably equal to or less than the thickness of the cover portion 12 .

The cover side reinforcing plate 19 is provided with a pair of fitting piece 19a. The fitting piece 19a is located at each end part of the longitudinal direction of the cover side reinforcement board 19. As shown in FIG. Each fitting piece 19a protrudes from the facing surface 12S of the cover part 12 in the thickness direction of the cover part 12 . The amount of protrusion of the fitting piece 19a relative to the facing surface 12S may be less than or equal to the thickness of the supporting portion 11, may be greater than the thickness of the supporting portion 11, and may be smaller than the thickness of the supporting portion 11 and the thickness of the supporting side reinforcing plate 18. sum.

The length of the cover side reinforcing plate 19 along the longitudinal direction of the cover part 12 is longer than the length of the cover part 12 . Thereby, a space into which the fitting piece 18a of the support side reinforcing plate 18 is inserted is formed between the fitting piece 19a and the cover portion 12 in the longitudinal direction of the cover portion 12 .

FIG. 11 shows a state in which the cover portion 12 overlaps the support portion 11 . As shown in FIG. 11 , by overlapping the cover portion 12 on the support portion 11 , the fitting piece 18 a of the supporting side reinforcing plate 18 is inserted into a space formed between the cover portion 12 and the fitting piece 19 a. The mechanical strength of the support part 11 and the cover part 12 can be improved by the vapor deposition mask box 10 provided with the reinforcing plates 18 and 19 .

Therefore, deformation of the vapor deposition mask cartridge 10 due to an external force acting on the vapor deposition mask cartridge 10 can be suppressed. Moreover, since the reinforcing plates 18 and 19 are provided with the fitting pieces 18a and 19a, even if vibration or the like acts on the deposition mask box 10, the position of the cover part 12 with respect to the support part 11 is less likely to shift. Thereby, the cassette 10 for vapor deposition masks becomes easy to keep in a closed state. Moreover, the positioning of the cover part 12 with respect to the support part 11 is easy. In addition, these effects are remarkable especially when the case 10 for vapor deposition masks does not have the hinge part 15. As shown in FIG.

In addition, in the above-mentioned vapor deposition mask box 10, the fitting piece 18a of the support side reinforcing plate 18 is inserted into the space formed between the cover portion 12 and the fitting piece 19a, but the vapor deposition mask box 10 A structure in which the fitting piece 19a of the cover side reinforcing plate 19 is inserted into the space formed between the support portion 11 and the fitting piece 18a may also be provided. Also, one fitting piece 18a may be provided at each end portion of the support side reinforcing plate 18 in the width direction, and one fitting piece 19a may be provided at each end portion of the cover side reinforcing plate 19 in the width direction.

Moreover, each of the support side reinforcement board 18 and the cover side reinforcement board 19 may be provided with only one fitting piece 18a, 19a. At this time, both the fitting piece 18a of the support side reinforcing plate 18 and the fitting piece 19a of the cover side reinforcing plate 19 are viewed from the viewpoint facing the cover portion 12, as long as they are the sides facing each other in the cover portion 12. One of the opposite sides can be configured in such a way that they overlap.

The vapor deposition mask box 10 may include only either one of the support side reinforcing plate 18 and the lid side reinforcing plate 19 . Hereinafter, referring to FIG. 12 and FIG. 13 , a configuration in which the vapor deposition mask box 10 includes the support side reinforcing plate 18 but does not include the cover side reinforcing plate 19 will be described.

As shown in FIG. 12 , the vapor deposition mask box 10 includes a support side reinforcing plate 18 . The support side reinforcing plate 18 has substantially the same shape and substantially the same size as the support portion 11 when viewed from a viewpoint facing the support portion 11 .

The case 10 for vapor deposition masks is equipped with the two fitting pieces 19a. The fitting piece 19a is provided in each of two corners among the four corners which the cover part 12 has. In the example shown in FIG. 12, two fitting pieces 19a are provided at each of two corners arranged on one side of the cover portion 12 extending in the longitudinal direction among the four corners. In addition, the two fitting pieces 19a may also be located at any two corners among the four corners. Moreover, the box 10 for vapor deposition masks may have three or four fitting pieces 19a, and may have only one fitting piece 19a.

In the example shown in FIG. 12 , each fitting piece 19 a has an L-shape when viewed from a viewpoint facing the cover portion 12 , but each fitting piece 19 a may have a U-shape. Each fitting piece 19a protrudes from the facing surface 12S of the cover part 12 in the thickness direction of the cover part 12 . The amount of protrusion of the fitting piece 19a relative to the facing surface 12S may be smaller than the thickness of the support portion 11, or may be greater than the thickness of the support portion 11, and may be less than the sum of the thickness of the support portion 11 and the thickness of the support side reinforcing plate 18. .

FIG. 13 shows a state in which the cover portion 12 is superimposed on the support portion 11 . As shown in FIG. 13 , when the cover portion 12 is stacked on the support portion 11 , each fitting piece 19 a fits into a corner portion of the laminated body of the support side reinforcing plate 18 and the support portion 11 . Each fitting piece 19a fits in different corners among the four corners of the laminated body.

Therefore, even if vibration etc. act on the cartridge 10 for vapor deposition masks, the position of the cover part 12 with respect to the support part 11 is hard to shift. Thereby, the vapor deposition mask box 10 can be easily maintained in a closed state. Moreover, the positioning of the cover part 12 with respect to the support part 11 is easy. In addition, these effects are remarkable especially when the case 10 for vapor deposition masks does not have the hinge part 15. As shown in FIG.

In addition, the vapor deposition mask box 10 may include the fitting piece 19 a but may not include the support side reinforcing plate 18 . Moreover, the cassette 10 for vapor deposition masks may have both the fitting piece 19a located in the cover part 12, and the fitting piece which is located in the support part 11 and has L shape or U shape. In this case, in the state where the support portion 11 and the cover portion 12 are overlapped, the fitting piece 19a of the cover portion 12 and the fitting piece of the support portion 11 need only be positioned at different corners of the vapor deposition mask box 10 from each other. Can. In addition, the fitting piece may be located at the corner of the support part 11 but not at the corner of the cover part 12 .

In the vapor deposition mask box 10 described above with reference to FIGS. It may have an L-shape or a U-shape when viewed from a viewpoint facing the lid portion 12 .

[Vapor deposition mask box] ・The vapor deposition mask box 10 can be formed by one piece of plastic corrugated board, or can be formed by more than three pieces of plastic corrugated board.

・The vapor deposition mask box 10 is a plurality of hollow parts extending along the thickness direction of the plastic corrugated board, and may be formed of a plastic corrugated board having a plurality of hollow parts arranged in a honeycomb shape.

・The vapor deposition mask box 10 may not be formed of plastic corrugated board. In this case, the vapor deposition mask box 10 may be formed of, for example, a plate member formed of various synthetic resins. Alternatively, the vapor deposition mask box 10 may be formed of a metal plate member.

10: Evaporation mask box 11: Support Department 11S: Support surface 12: Cover 12S: opposite side 12Sa: concave part 16: Logo 17:Conclusion 21: Evaporation mask 21a: Pattern area 21b: Surrounding area 22: Dust-free paper 23: PET film

FIG. 1 is a perspective view showing the structure of the vapor deposition mask cassette in a state in which the vapor deposition mask cassette is opened, together with the structure of the vapor deposition mask to be conveyed by the vapor deposition mask cassette. FIG. 2 is a perspective view showing the structure of the vapor deposition mask cartridge in a state where the vapor deposition mask cartridge is closed. FIG. 3 is a cross-sectional view showing the structure of the vapor deposition mask box together with the structure of the vapor deposition mask accommodated in the vapor deposition mask box. FIG. 4 is a cross-sectional view showing the structure of the vapor deposition mask box together with the structure of the vapor deposition mask accommodated in the vapor deposition mask box. Fig. 5 is a side view showing the structure of the support portion included in the vapor deposition mask box. Fig. 6 is a perspective view showing a state in which the vapor deposition mask box is packed. Fig. 7 is a cross-sectional view showing the structure of a first modified example of the vapor deposition mask box. Fig. 8 is a cross-sectional view showing the structure of a first modified example of the vapor deposition mask box. Fig. 9 is a cross-sectional view showing the structure of a first modified example of the vapor deposition mask box. Fig. 10 is a perspective view showing the structure of a second modified example of the vapor deposition mask box. Fig. 11 is a perspective view showing the structure of a second modified example of the vapor deposition mask box. Fig. 12 is a perspective view showing the structure of a third modification example of the vapor deposition mask box. Fig. 13 is a perspective view showing the structure of a third modification example of the vapor deposition mask box.

10: Evaporation mask box

11: Support Department

11S: Support surface

12: Cover

12S: opposite side

12Sa: concave part

13: Buffer

14: Hostage Department

15: Hinge

21: Evaporation mask

21a: Pattern area

21b: Surrounding area

21h: Through hole

22: Dust-free paper

23: PET film

Claims (4)

A case for a vapor deposition mask, which is configured to accommodate a vapor deposition mask, the vapor deposition mask includes a pattern region in which a plurality of through holes are formed, and a peripheral region surrounding the pattern region, and includes: a support portion , including a flat support surface that supports the aforementioned vapor deposition mask when the aforementioned vapor deposition mask box accommodates the aforementioned vapor deposition mask; the cover portion includes when the aforementioned vapor deposition mask box accommodates the aforementioned vapor deposition mask and the aforementioned The opposite surface facing the supporting part, and the concave part recessed from the aforementioned opposing surface, and configured so that when viewed from the viewpoint facing the aforementioned supporting surface, the aforementioned pattern area of the aforementioned vapor deposition mask is located in the aforementioned concave part, and the aforementioned The peripheral area extends to the outside of the aforementioned concave portion to cover the aforementioned vapor deposition mask; the mark is used to distinguish the aforementioned cover portion from the aforementioned support portion; the buffer portion is located between the aforementioned cover portion and the aforementioned Between the vapor deposition mask, and cover the aforementioned concave portion of the aforementioned cover portion; and a pair of clamping portions, when the aforementioned vapor deposition mask box accommodates the aforementioned vapor deposition mask, between the aforementioned supporting portion and the aforementioned cover portion state, protruding from the aforementioned facing surface of the aforementioned cover portion toward the aforementioned supporting portion, and the aforementioned pair of clamping portions are located outside the aforementioned concave portion in such a manner as to pinch the aforementioned concave portion in the longitudinal direction of the aforementioned vapor deposition mask box, And in the direction in which the aforementioned supporting portion and the aforementioned cover portion face each other, it is configured so as to pinch the aforementioned peripheral area of the aforementioned vapor deposition mask together with the aforementioned supporting portion; Hostage Ministry. The vapor deposition mask box according to claim 1, which further has a pair of joint parts, and the pair of joint parts is formed by sandwiching the aforementioned concave part in the longitudinal direction of the aforementioned vapor deposition mask box and closer to the aforementioned concave part. The outer side is in contact with the aforementioned cover portion and the aforementioned support portion, and the aforementioned cover portion is connected to the aforementioned support portion. The vapor deposition mask box according to claim 1 or 2, further comprising a hinge portion connecting the support portion to the lid portion. The vapor deposition mask box according to claim 1 or 2, wherein the aforementioned support portion and the aforementioned cover portion are respectively formed by plastic corrugated boards with openings on the sides, and in the aforementioned support portion, the aforementioned openings of the aforementioned plastic corrugated boards Located on the side of the support part, in the cover part, the opening of the plastic corrugated board is located on the side of the cover part, and the opening of the cover part and the opening of the support part are blocked.

Images