TWI785229B - Zirconia based nanoparticles and dispersion solution - Google Patents

Zirconia based nanoparticles and dispersion solution Download PDF

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TWI785229B
TWI785229B TW108112722A TW108112722A TWI785229B TW I785229 B TWI785229 B TW I785229B TW 108112722 A TW108112722 A TW 108112722A TW 108112722 A TW108112722 A TW 108112722A TW I785229 B TWI785229 B TW I785229B
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zirconia
nanoparticles
monoclinic
powder
particle size
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TW201932416A (en
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大川隆
井上好明
關信之
志岐肇
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日商大研化學工業股份有限公司
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Abstract

Zirconia based nanoparticles having D50 of the particle size distribution of 20 nm or less, wherein (1) the particles have a zirconia monoclinic phase, (2) a diffraction peak is substantially absent in the range from 2θ=29.74 degree to 2θ=30.74 degree in the diffraction pattern of X-ray diffraction.

Description

單斜晶氧化鋯系奈米粒子及分散液 Monoclinic zirconia nanoparticles and dispersion

本發明關於一種新穎之單斜晶氧化鋯系奈米粒子及其製造方法。 The present invention relates to a novel monoclinic zirconia-based nanometer particle and a manufacturing method thereof.

背景技術 Background technique

高折射率材料被使用於諸如透鏡、光學過濾器及抗反射材等各種光學零件上。舉透鏡作為一例,若是具有高折射率之透鏡,則可謀求與其相應之透鏡薄型化、輕量化、高解析度化等,製品將變得有利。 High refractive index materials are used in various optical components such as lenses, optical filters, and anti-reflection materials. Taking the lens as an example, if the lens has a high refractive index, the corresponding lens thickness reduction, weight reduction, high resolution, etc. can be achieved, and the product will become advantageous.

就高折射率材料而言,除了玻璃、陶瓷等透明性無機材料之外,已知有以透明性樹脂為基質並使高折射率粒子分散而得之複合材料,特別在低成本化、輕量化等觀點上,如前述般之複合材料甚是有利。 As for high refractive index materials, in addition to transparent inorganic materials such as glass and ceramics, there are known composite materials obtained by dispersing high refractive index particles using transparent resin as a matrix, especially in the field of low cost and light weight. From the point of view of etc., the composite material as mentioned above is very advantageous.

就分散至複合材料中之高折射率粒子而言,舉例來說,目前採用氧化鈦、氧化鋯、氧化鋁等無機氧化物粒子。特別是氧化鈦、氧化鋯等具有高折射率(2.00以上),但用作光學材料也需具有高透明性。亦即,需要更微細且安定之無機氧化物粒子。 As the high-refractive-index particles dispersed in the composite material, for example, inorganic oxide particles such as titanium oxide, zirconium oxide, and aluminum oxide are currently used. In particular, titanium oxide, zirconium oxide, etc. have a high refractive index (2.00 or more), but they must also have high transparency when used as an optical material. That is, finer and more stable inorganic oxide particles are required.

於此,就製造複合材料時之原料形態而 言,無機氧化物粒子通常以業已分散於溶劑之分散液形式來提供。因此,要求分散液中各個粒子不發生凝集而可發揮高度分散狀態。從此種立場來看,最近為了開發出分散性等更優異之無機氧化物粒子或其分散液,刻正進行各種研究及提案。 Here, in terms of the form of raw materials when manufacturing composite materials In other words, the inorganic oxide particles are usually provided in the form of a dispersion already dispersed in a solvent. Therefore, it is required that individual particles in the dispersion can exhibit a highly dispersed state without aggregating. From such a standpoint, recently, various studies and proposals are being made in order to develop inorganic oxide particles or their dispersion liquids that are more excellent in dispersibility and the like.

舉例來說,已知一種氧化鋯系奈米粒子,其由2種以上之被覆劑所被覆,且為含有正方晶氧化鋯之氧化鋯奈米粒子,其特徵在於該被覆劑中之至少1種係如下式(I)所示者:R1-COOH‧‧‧(I) For example, known zirconia-based nanoparticles are zirconia nanoparticles coated with two or more coating agents, and are zirconia nanoparticles containing tetragonal zirconia, characterized in that at least one of the coating agents is It is represented by the following formula (I): R 1 -COOH‧‧‧(I)

[式中,R1表示碳數6以上之支鏈狀烴基];並且,式(I)所示被覆劑之外的至少1種被覆劑為下述者:具有多數個選自於由羥基、胺基、巰基、羧基、環氧基及烷氧基所構成群組中之至少1種官能基之物;具有乙烯基或苯基之物;矽烷偶合劑;或下式(II)所示之物:R2-COOH‧‧‧(II) [wherein, R 1 represents a branched chain hydrocarbon group with more than 6 carbon atoms]; and at least one coating agent other than the coating agent shown in formula (I) is the following: having a plurality of selected from the group consisting of hydroxyl, At least one functional group in the group consisting of amine group, mercapto group, carboxyl group, epoxy group and alkoxy group; product with vinyl or phenyl group; silane coupling agent; or the product represented by the following formula (II) Compound: R 2 -COOH‧‧‧(II)

[式中,R2表示碳數6以上之直鏈狀烴基](專利文獻1)。 [wherein, R 2 represents a linear hydrocarbon group having 6 or more carbon atoms] (Patent Document 1).

此外,舉例來說,已知一種氧化鋯透明分散液,其特徵在於:含有分散粒徑為1nm以上且20nm以下之正方晶氧化鋯粒子(專利文獻2)。 In addition, for example, there is known a transparent zirconia dispersion liquid characterized by containing tetragonal zirconia particles having a dispersed particle diameter of not less than 1 nm and not more than 20 nm (Patent Document 2).

更進一步來說,目前已提出一種無機微粒子之分散溶液之製造方法,該無機微粒子之分散溶液係於溶劑中分散有一次粒子之平均粒徑為1nm以上且30nm以下的無機微粒子,其特徵在於:使用平均粒徑為15μm以 上且30μm以下之珠粒來攪拌無機微粒子(一次粒子之平均粒徑為1nm以上30nm以下)以凝集狀態存在於溶劑中之混合溶劑同時施加超音波,藉此分散處理前述無機微粒子(專利文獻3)。 Furthermore, a method for producing a dispersion solution of inorganic microparticles has been proposed at present. The dispersion solution of inorganic microparticles is dispersed in a solvent with inorganic microparticles having an average particle diameter of primary particles of more than 1 nm and less than 30 nm. It is characterized in that: Use an average particle size of 15 μm or less Above and below 30 μm beads to stir the inorganic microparticles (average particle size of the primary particles is 1nm to 30nm) in the mixed solvent in the solvent in an aggregated state while applying ultrasonic waves, thereby dispersing the aforementioned inorganic microparticles (Patent Document 3 ).

先行技術文獻 Prior art literature 專利文獻 patent documents

[專利文獻1]日本專利第5030694號 [Patent Document 1] Japanese Patent No. 5030694

[專利文獻2]日本特開2007-99931號公報 [Patent Document 2] Japanese Patent Laid-Open No. 2007-99931

[專利文獻3]日本特開2010-23031號公報 [Patent Document 3] Japanese Unexamined Patent Publication No. 2010-23031

發明概要 Summary of the invention

然而,該等習知技術之分散液中,氧化鋯奈米粒子不僅是單斜晶氧化鋯,也包含了正方晶相氧化鋯。由於氧化鋯之正方晶相為準安定相,而有在某些因素下會經時性地相變為單斜晶相之虞。一旦相變為單斜晶相而引發體積變化(特別是體積收縮),結果將會對分散液所形成之塗膜的物性造成不良影響。更具體來說,以包含正方晶相之氧化鋯奈米粒子形成塗膜後,一旦膜中之正方晶相經時性地相變為單斜晶相,因體積變化而在塗膜中發生應變等,就結果而言,將有使物理特性降低之虞。 However, in the dispersions of the prior art, the zirconia nanoparticles are not only monoclinic zirconia, but also tetragonal zirconia. Since the tetragonal phase of zirconia is a quasi-stable phase, it may change to a monoclinic phase over time under certain factors. Once the phase changes to the monoclinic phase and causes volume change (especially volume shrinkage), the physical properties of the coating film formed by the dispersion will be adversely affected. More specifically, after forming a coating film with zirconia nanoparticles containing a tetragonal phase, once the tetragonal phase in the film changes to a monoclinic phase over time, strain occurs in the coating film due to volume change etc. As a result, there is a possibility that the physical properties may be lowered.

從此種觀點出發,含較少或實質上不含正方晶氧化鋯之氧化鋯奈米粒子可謂理想,但此種氧化鋯奈米粒子目前未至開發乃為現狀。 From this point of view, zirconia nanoparticles containing less or substantially no tetragonal zirconia are ideal, but such zirconia nanoparticles have not yet been developed, which is the status quo.

因此,本發明之主要目的在於提供一種含較少或實質上不含正方晶氧化鋯之氧化鋯奈米粒子。 Therefore, the main object of the present invention is to provide a zirconia nanoparticle containing less or substantially no tetragonal zirconia.

本案發明人鑑於習知技術之問題點反覆精心研究,結果發現,起始材料使用特定之氧化鋯粉末並以特定方法製出之奈米粒子可達成上述目的,終至完成本發明。 The inventors of the present case have repeatedly studied carefully in view of the problems of the conventional technology, and found that the nano-particles produced by using a specific zirconia powder as a starting material and a specific method can achieve the above-mentioned purpose, and finally completed the present invention.

亦即,本發明有關於下述氧化鋯系奈米粒子及其製造方法。 That is, the present invention relates to the following zirconia-based nanoparticles and a method for producing the same.

1.一種單斜晶氧化鋯系奈米粒子,係粒度分佈D50為20nm以下之氧化鋯微粒子,其特徵在於:(1)該氧化鋯微粒子含有氧化鋯單斜晶相;並且(2)該氧化鋯微粒子利用粉末X射線繞射分析所得繞射圖案中,2θ=29.74~30.74度之範圍內實質上不存在繞射尖峰。 1. A monoclinic zirconia-based nanoparticle, which is a zirconia microparticle with a particle size distribution D50 of 20 nm or less, characterized in that: (1) the zirconia microparticle contains a zirconia monoclinic phase; and (2) the zirconia In the diffraction pattern obtained by powder X-ray diffraction analysis of zirconium particles, there is virtually no diffraction peak in the range of 2θ=29.74~30.74 degrees.

2.如前述第1項之單斜晶氧化鋯系奈米粒子,其氧化鋯單斜晶相之含量為90體積%以上。 2. The monoclinic zirconia-based nanoparticles according to item 1 above, wherein the content of the zirconia monoclinic crystal phase is 90% by volume or more.

3.如前述第1或2項之單斜晶氧化鋯系奈米粒子,其由氧化鋯微粒子構成之粉末之粒度分佈為單峰,且粒度分佈D90為30nm以下。 3. The monoclinic zirconia-based nanoparticles according to item 1 or 2 above, wherein the particle size distribution of the powder composed of zirconia fine particles is unimodal, and the particle size distribution D90 is 30 nm or less.

4.一種分散液,係於溶劑中分散有如前述第1至3項中任一項之單斜晶氧化鋯系奈米粒子。 4. A dispersion liquid in which the monoclinic zirconia-based nanoparticles according to any one of the aforementioned items 1 to 3 are dispersed in a solvent.

5.如前述第4項之分散液,其更含有矽烷偶合劑及磷酸酯系分散劑。 5. The dispersion as in item 4 above, which further contains a silane coupling agent and a phosphoric acid ester-based dispersant.

6.一種單斜晶氧化鋯系奈米粒子之製造方法,係一從氧化鋯粉末製出如前述第1項之單斜晶氧化鋯系奈米粒子之方法,其特徵在於:(1)前述氧化鋯粉末之a)粒度分佈D50為900nm以下,b)氧化鋯單斜晶相之含量為90~95體積%,且氧化鋯正方晶相之含量為5~10體積%;(2)包含下述步驟:在粒度分佈D50為40μm以下之珠粒存在下,將前述氧化鋯粉末供予珠磨處理。 6. A method for producing monoclinic zirconia-based nanoparticles, which is a method for producing monoclinic zirconia-based nanoparticles from zirconia powder as described in item 1 above, characterized in that: (1) the aforementioned The a) particle size distribution D50 of zirconia powder is below 900nm, b) the content of zirconia monoclinic phase is 90~95% by volume, and the content of zirconia tetragonal phase is 5~10% by volume; (2) includes the following The above step: in the presence of beads with a particle size distribution D50 of 40 μm or less, the aforementioned zirconia powder is subjected to bead milling treatment.

7.如前述第6項之製造方法,其珠磨處理係一在溶劑存在下進行實施之濕式珠磨處理。 7. As in the manufacturing method of item 6 above, the bead milling treatment is a wet bead milling treatment carried out in the presence of a solvent.

8.如前述第7項之製造方法,其中溶劑中含有矽烷偶合劑及磷酸酯系分散劑。 8. The production method according to item 7 above, wherein the solvent contains a silane coupling agent and a phosphoric acid ester-based dispersant.

9.如前述第6項之製造方法,其中前述珠粒為金屬珠粒及陶瓷珠粒中之至少1種。 9. The production method according to item 6 above, wherein the beads are at least one of metal beads and ceramic beads.

10.如前述第6項之製造方法,其使用具有略呈球形之形狀的粒子作為前述珠粒。 10. The production method according to the aforementioned item 6, which uses particles having a substantially spherical shape as the aforementioned beads.

11.如前述第6項之製造方法,其中氧化鋯粉末之BET比表面積為70m2/g以上。 11. The production method according to item 6 above, wherein the BET specific surface area of the zirconia powder is 70 m 2 /g or more.

依據本發明,可提供一種含較少或實質上不含正方晶氧化鋯之氧化鋯奈米粒子。更具體來說,則可提供一種奈米粒子(單斜晶氧化鋯粒子),其正方晶氧化鋯(準安定正方晶)較少或實質上不含正方晶氧化鋯,並且含有單斜晶氧化鋯。 According to the present invention, there can be provided zirconia nanoparticles containing less or substantially no tetragonal zirconia. More specifically, there can be provided a nanoparticle (monoclinic zirconia particle) that is less or substantially free of tetragonal zirconia (quasi-stable tetragonal) and contains monoclinic zirconia zirconium.

此種特殊奈米粒子可有效抑制乃至於防止正方晶氧化鋯可能引起之伴隨相變而起之體積變動,因此使用將其分散在液相中而成之分散液所得塗膜亦可發揮高可靠性。 This kind of special nanoparticles can effectively suppress or even prevent the volume change that may be caused by tetragonal zirconia due to phase transition, so the coating film obtained by dispersing it in the liquid phase can also exhibit high reliability. sex.

此外,由於本發明之製造方法使用含正方晶氧化鋯之氧化鋯粒子作為起始材料並於特定之微細珠粒存在下將其進行珠磨處理,而可確實且有效地製出正方晶氧化鋯更少或實質不含正方晶氧化鋯且實質上由單斜晶氧化鋯構成之奈米粒子。 In addition, since the production method of the present invention uses zirconia particles containing tetragonal zirconia as a starting material and performs bead milling in the presence of specific fine beads, it is possible to produce tetragonal zirconia reliably and efficiently. Nanoparticles that are less or substantially free of tetragonal zirconia and consist essentially of monoclinic zirconia.

不僅如此,本發明之製造方法所得奈米粒子可得奈米等級下之微細分散狀態。其理由尚未確定,但推測係以如下之作用機制而實現。亦即,本發明之製造方法雖然使用包含正方晶相及單斜晶相兩者之氧化鋯來作為起始材料,其中即使包含了凝集粒子,製造過程中正方晶相相變為單斜晶相時,因體積變化所致之應變會發生於該凝集粒子中,凝集因該應變而解開,結果使得細粒化進行而發揮高分散性。 Moreover, the nanoparticles obtained by the manufacturing method of the present invention can be in a finely dispersed state at the nanometer level. The reason for this has not been determined, but it is presumed to be realized by the following mechanism of action. That is, although the production method of the present invention uses zirconia containing both a tetragonal phase and a monoclinic phase as a starting material, even if aggregated particles are included, the tetragonal phase changes to a monoclinic phase during the production process. In this case, strain due to volume change occurs in the aggregated particles, and the aggregation is released due to the strain, resulting in finer particles and high dispersibility.

如前述,由於本發明之氧化鋯奈米粒子安定且可得高分散性,舉例來說,可適宜用作透鏡、光學過濾器及抗反射材等各種光學零件之原料。 As mentioned above, since the zirconia nanoparticles of the present invention are stable and highly dispersible, for example, they can be suitably used as raw materials for various optical components such as lenses, optical filters, and anti-reflection materials.

10:珠磨裝置 10: Bead milling device

11:珠粒 11: beads

12:被處理物 12: Processed objects

13:粉碎室 13: Crushing room

14:攪拌器 14: Stirrer

15:馬達 15: Motor

16:軸 16: axis

17:冷卻水套 17: Cooling water jacket

18:冷卻水 18: cooling water

圖1係一顯示實施例1所得氧化鋯奈米粒子之X射線繞射分析結果之圖。 FIG. 1 is a graph showing the X-ray diffraction analysis results of the zirconia nanoparticles obtained in Example 1.

圖2係一顯示實施例1所得氧化鋯奈米粒子之拉曼分 光分析之拉曼光譜之圖。 Figure 2 is a graph showing the Raman fraction of the zirconia nanoparticles obtained in Example 1 A graph of a Raman spectrum for optical analysis.

圖3顯示實施例1所得氧化鋯奈米粒子由電子繞射取得之強度曲線。 FIG. 3 shows the intensity curve of the zirconia nanoparticles obtained in Example 1 obtained by electron diffraction.

圖4係一顯示實施例1所得氧化鋯奈米粒子之粒度分佈之圖。 FIG. 4 is a graph showing the particle size distribution of zirconia nanoparticles obtained in Example 1. FIG.

圖5為圖表,係就實施例1所得氧化鋯奈米粒子顯示其粒度分佈D90及[正方晶相(T相)/單斜晶相(M相)]之尖峰比與處理時間的關係。 Fig. 5 is a graph showing the relationship between the particle size distribution D90 and the peak ratio of [tetragonal phase (T phase)/monoclinic phase (M phase)] and processing time for the zirconia nanoparticles obtained in Example 1.

圖6係一顯示使用不同粒徑氧化鋯珠粒所得各氧化鋯系奈米粒子之X射線繞射分析結果之圖(擴大圖)。 FIG. 6 is a diagram (enlarged diagram) showing the X-ray diffraction analysis results of various zirconia-based nanoparticles obtained by using zirconia beads with different particle sizes.

圖7顯示實施例1所用珠磨裝置之概略圖。 FIG. 7 shows a schematic diagram of the bead milling apparatus used in Example 1.

圖8顯示實施例1所用珠磨裝置使用之攪拌器之概略圖。 FIG. 8 shows a schematic diagram of an agitator used in the bead milling apparatus used in Example 1. FIG.

用以實施發明之形態 form for carrying out the invention

1.氧化鋯系奈米粒子 1. Zirconia-based nanoparticles

本發明之單斜晶氧化鋯系奈米粒子(本發明奈米粒子)係粒度分佈D50為20nm以下之氧化鋯微粒子,其特徵在於:(1)該氧化鋯微粒子含有單斜晶相;並且(2)該氧化鋯微粒子利用粉末X射線繞射分析所得繞射圖案中,2θ=29.74~30.74度實質上不存在繞射尖峰。 The monoclinic zirconia-based nanoparticles of the present invention (nanoparticles of the present invention) are zirconia microparticles with a particle size distribution D50 of 20 nm or less, and are characterized in that: (1) the zirconia microparticles contain a monoclinic crystal phase; and ( 2) In the diffraction pattern obtained by the powder X-ray diffraction analysis of the zirconia microparticles, there is substantially no diffraction peak at = 29.74~30.74 degrees.

本發明奈米粒子為結晶性氧化鋯粒子,且含有單斜晶相作為結晶相。氧化鋯單斜晶相之含量通常以 90體積%以上為宜,尤宜為95~100體積%。亦即,本發明奈米粒子可在不妨礙本發明效果之範圍內含有正方晶氧化鋯以外之成分(例如其他結晶相、非晶相等)。 The nanoparticles of the present invention are crystalline zirconia particles, and contain a monoclinic phase as a crystal phase. The content of zirconia monoclinic phase is usually More than 90% by volume is suitable, especially 95-100% by volume. That is, the nanoparticles of the present invention may contain components other than tetragonal zirconia (such as other crystalline phases, amorphous phases, etc.) within the range that does not hinder the effect of the present invention.

就本發明奈米粒子之結晶相而言,其特徵在於:氧化鋯微粒子之粉末X射線繞射分析之繞射圖案中,2θ=29.74~30.74度內實質上不存在繞射尖峰。亦即,正方晶氧化鋯之繞射尖峰(101面)為2θ=30.24度,且繞射圖案上未能識別出正方晶氧化鋯之繞射尖峰一事為本發明奈米粒子之特徵之一。只要未能識別出此種繞射尖峰,本發明可接受含有極微量正方晶氧化鋯。另,就存在繞射尖峰之狀況而言,除了僅在2θ=29.74~30.74度之範圍內存在尖峰之情況之外,也包含跨2θ=29.74~30.74度之範圍內與其範圍外存在有寬幅尖峰的情況。 As for the crystal phase of the nanoparticles of the present invention, it is characterized in that in the diffraction pattern of the powder X-ray diffraction analysis of the zirconia particles, there is substantially no diffraction peak within 2θ=29.74~30.74 degrees. That is, the diffraction peak of tetragonal zirconia (101 planes) is 2θ=30.24 degrees, and the fact that no diffraction peak of tetragonal zirconia can be identified on the diffraction pattern is one of the characteristics of the nanoparticles of the present invention. As long as such a diffraction peak cannot be identified, the present invention accepts a very small amount of tetragonal zirconia. In addition, as far as the existence of diffraction peaks is concerned, in addition to the case of peaks only in the range of 2θ=29.74~30.74 degrees, there are also wide ranges in the range of 2θ=29.74~30.74 degrees and outside the range Spike situation.

另,本發明奈米粒子於利用拉曼分光法之分析中,也宜確認不到波數202cm-1及267cm-1之尖峰。進一步來說,本發明奈米粒子在由電子繞射所得強度曲線圖中,也宜確認不到源自正方晶之111t之尖峰。 In addition, in the analysis of the nanoparticles of the present invention by Raman spectroscopy, it is preferable not to confirm peaks at wavenumbers 202 cm -1 and 267 cm -1 . Furthermore, in the intensity graph of the nanoparticles of the present invention obtained by electron diffraction, it is preferable not to confirm the sharp peak originating from the 111t of the tetragonal crystal.

可想見的是,本發明奈米粒子即使是奈米等級之粒子,仍因具有如同上述之結晶構造而在具有高安定性之同時亦對高分散性有所貢獻。 It is conceivable that even if the nanoparticles of the present invention are nano-scale particles, they still have the above-mentioned crystal structure, which not only has high stability but also contributes to high dispersion.

本發明奈米粒子之粒度分佈D50(平均粒徑)為20nm以下,且宜為15nm以下。其下限值雖不具限定性,但通常可設為1nm程度。可藉由具有此種平均粒徑而有助於高透明性。 The particle size distribution D50 (average particle diameter) of the nanoparticles of the present invention is less than 20 nm, preferably less than 15 nm. Although the lower limit thereof is not restrictive, it can generally be set to about 1 nm. High transparency can be contributed by having such an average particle diameter.

此外,本發明奈米粒子之粒度分佈雖不具限定性,但以呈單峰且粒度分佈D90為30nm以下(特別是25nm以下)尤佳。藉此,可在後述之分散液及其塗膜中更加發揮高安定性及透明性。 In addition, although the particle size distribution of the nanoparticles of the present invention is not limited, it is particularly preferred to have a single peak and a particle size distribution D90 of 30 nm or less (especially 25 nm or less). Thereby, high stability and transparency can be exhibited further in the dispersion liquid and its coating film mentioned later.

本發明奈米粒子宜具有相對較高之比表面積(BET法)。更具體來說,比表面積通常為70m2/g以上,更宜為80m2/g以上。另,比表面積之上限雖不具限定性,通常可設為200m2/g左右。 The nanoparticles of the present invention preferably have a relatively high specific surface area (BET method). More specifically, the specific surface area is usually not less than 70 m 2 /g, more preferably not less than 80 m 2 /g. In addition, although the upper limit of the specific surface area is not limited, it can usually be set at about 200 m 2 /g.

本發明奈米粒子基本上由氧化鋯(ZrO2)構成,但可在不妨礙本發明效果之範圍內附著其他成分或與其他成分複合化。例如,以後述之製造方法製造本發明奈米粒子時,其製程中所添加之添加劑(諸如分散劑、偶合劑等)可附著於氧化鋯粒子或與其複合化。 The nanoparticles of the present invention are basically composed of zirconia (ZrO 2 ), but other components may be attached or composited with other components within the range that does not hinder the effect of the present invention. For example, when the nanoparticles of the present invention are produced by the production method described later, the additives (such as dispersant, coupling agent, etc.) added in the production process can be attached to or composited with the zirconia particles.

本發明奈米粒子可呈現諸如乾燥粉末、分散液等中之任一形態,但本發明之單斜晶氧化鋯系奈米粒子(粉末)尤宜以分散於溶劑中之分散液形態來提供。此時,溶劑未特別受限,可舉例如:甲醇、乙醇、異丙醇、丁醇等醇系溶媒;酮、丙酮、甲乙酮、甲丙酮、甲基異丁酮等酮系溶劑;異丙醚、甲基賽璐蘇等醚系溶劑;丙二醇單甲醚乙酸酯、乙二醇單乙醚乙酸酯等二醇酯系溶劑。 The nanoparticles of the present invention can be in any form such as dry powder, dispersion liquid, etc., but the monoclinic zirconia-based nanoparticles (powder) of the present invention are preferably provided in the form of a dispersion liquid dispersed in a solvent. At this time, the solvent is not particularly limited, and examples include: alcohol-based solvents such as methanol, ethanol, isopropanol, and butanol; ketone-based solvents such as ketone, acetone, methyl ethyl ketone, methyl acetone, and methyl isobutyl ketone; isopropyl ether , Methyl celluloid and other ether solvents; propylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate and other glycol ester solvents.

此外,可視需要而於上述分散液中添加各種添加劑。例如,可使用分散劑、偶合劑、分散輔劑等添加劑。 In addition, various additives may be added to the above-mentioned dispersion liquid as needed. For example, additives such as dispersants, coupling agents, and dispersion aids can be used.

分散液中之本發明奈米粒子分散量(固體成 分量)並未特別受限,可因應如所用溶劑之種類、所需黏度等予以適當設定。本發明尤宜在分散液中1~50重量%之範圍內設定分散量。 The dispersion amount of nanoparticles of the present invention in the dispersion liquid (solid composition Quantity) is not particularly limited, and can be appropriately set in response to the type of solvent used, required viscosity, etc. In the present invention, it is especially preferable to set the dispersion amount within the range of 1 to 50% by weight in the dispersion liquid.

2.單斜晶氧化鋯系奈米粒子之製造方法 2. Manufacturing method of monoclinic zirconia-based nanoparticles

本發明奈米粒子之製造方法並未特別受限,舉例來說可以如同下述之製造方法而適宜地製造。亦即,可適於採用下述製造方法:一種從氧化鋯粉末製造本發明奈米粒子之方法,其特徵在於:(1)前述氧化鋯粉末之a)粒度分佈D50為900nm以下,b)氧化鋯單斜晶相之含量為90~95體積%,且氧化鋯正方晶相之含量為5~10體積%;(2)包含下述步驟:在粒度分佈D50為40μm以下之珠粒存在下,將前述氧化鋯粉末供予珠磨處理(珠磨處理步驟)。 The manufacturing method of the nanoparticles of the present invention is not particularly limited, and can be suitably manufactured as in the following manufacturing method, for example. That is, the following production method can be suitably adopted: a method for producing nanoparticles of the present invention from zirconia powder, characterized in that: (1) a) the particle size distribution D50 of the above-mentioned zirconia powder is 900 nm or less; b) oxidation The content of the zirconium monoclinic phase is 90-95% by volume, and the content of the tetragonal zirconia phase is 5-10% by volume; (2) comprising the following steps: in the presence of beads with a particle size distribution D50 of 40 μm or less, The aforementioned zirconia powder was subjected to bead milling (bead milling step).

起始材料 starting material

本發明之製造方法係以起始材料使用氧化鋯粉末作為前提,該氧化鋯粉末係使用a)粒度分佈D50為900nm以下、b)氧化鋯單斜晶相之含量為90~95體積%且氧化鋯正方晶相之含量為5~10體積%之粉末。 The production method of the present invention is based on the premise that zirconia powder is used as the starting material. The zirconia powder uses a) a particle size distribution D50 of 900nm or less, b) a content of zirconia monoclinic crystal phase of 90-95% by volume and oxidized A powder with a zirconium tetragonal phase content of 5-10% by volume.

氧化鋯粉末使用前述D50為900nm以下之物。前述D50尤宜為800nm以下。此時,D50之下限值雖未受限,但通常為300nm左右,尤宜為400nm。因此,起始材料可使用含有氧化鋯凝集粒子之氧化鋯粉末。舉例來說,粒度分佈D50(二次粒子之平均粒徑)為400~700nm 之氧化鋯粉末可適於用作起始材料。另,用作起始材料之氧化鋯粉末之一次粒子徑亦未受限,但通常可使用1~50nm左右(尤其是5~30nm)範圍內之氧化鋯粉末。換言之,也可使用諸如具有氧化鋯微晶徑5倍以上(尤其是10倍以上)範圍內之二次粒子徑(D50)的氧化鋯粉末。 As the zirconia powder, those whose D50 is 900 nm or less are used. The aforementioned D50 is particularly preferably 800 nm or less. At this time, although the lower limit of D50 is not limited, it is generally about 300 nm, and is particularly preferably 400 nm. Therefore, as a starting material, zirconia powder containing zirconia aggregated particles can be used. For example, particle size distribution D50 (average particle size of secondary particles) is 400~700nm The zirconia powder can be suitable as starting material. In addition, the primary particle size of the zirconia powder used as the starting material is not limited, but generally zirconia powder within the range of 1-50 nm (especially 5-30 nm) can be used. In other words, for example, zirconia powder having a secondary particle diameter (D50) within a range of 5 times or more (especially 10 times or more) the crystallite diameter of zirconia can also be used.

起始材料之氧化鋯粉末可使用由結晶質氧化鋯粒子構成之物,尤其是使用氧化鋯單斜晶相之含量為90~95體積%且氧化鋯正方晶相之含量為5~10體積%之氧化鋯粉末。如此,藉由使用含特定量氧化鋯正方晶相之原料,可製得安定且更為微細之氧化鋯微粒子。 Zirconia powder as the starting material can be composed of crystalline zirconia particles, especially the content of zirconia monoclinic phase is 90~95% by volume and the content of zirconia tetragonal phase is 5~10% by volume. Zirconia powder. In this way, stable and finer zirconia particles can be produced by using a raw material containing a specific amount of zirconia tetragonal crystal phase.

此外,起始材料之氧化鋯粉末之比表面積亦未受限,但尤宜使用比表面積為70m2/g以上(更宜80m2/g以上)之粉末。藉由使用具有此種比表面積之氧化鋯粉末,可更確實地製得高分散性之奈米粒子。另,比表面積之上限雖不具限定性,但通常設為200m2/g左右,尤宜設為150m2/g。 In addition, the specific surface area of the zirconia powder as the starting material is not limited, but it is particularly preferable to use a powder with a specific surface area of 70 m 2 /g or more (more preferably 80 m 2 /g or more). By using zirconia powder having such a specific surface area, highly dispersed nanoparticles can be more reliably produced. In addition, although the upper limit of the specific surface area is not restrictive, it is generally set at about 200 m 2 /g, particularly preferably set at 150 m 2 /g.

具有此種結晶構造、物性等之氧化鋯粉末本身可使用習知或市售物。此外,亦可使用以習知製法合成出之氧化鋯粉末。例如,可適用以水解法、共沉法、中和法、烷氧化物法等液相法合成出之氧化鋯。特別就水解法而言,可藉由水解鋯鹽合成出水和氧化鋯溶膠後,將前述溶膠暫時加熱所得氧化鋯粉末等適宜地用作起始原料。如前述,本發明在無需使用特別之原料而可使用習知或市售之一般氧化鋯粉末作為原料之觀點上以及成本上均為有 效方法。亦即,本發明之製造方法使用此種含有氧化鋯單斜晶相與氧化鋯正方晶相之氧化鋯粉末作為起始原料,可確實且有效率地製得單斜晶氧化鋯系奈米粒子,其繞射圖案之2θ=29.74~30.74度中實質上不存在繞射尖峰。 As the zirconia powder having such a crystal structure, physical properties, etc., conventionally known or commercially available ones can be used. In addition, zirconia powder synthesized by conventional production methods can also be used. For example, zirconia synthesized by liquid-phase methods such as hydrolysis, co-precipitation, neutralization, and alkoxide can be used. Especially in the hydrolysis method, after synthesizing the effluent and the zirconia sol by hydrolyzing the zirconium salt, the zirconia powder obtained by temporarily heating the aforementioned sol can be suitably used as a starting material. As mentioned above, the present invention can use known or commercially available general zirconia powders as raw materials without using special raw materials and cost. effective method. That is, the production method of the present invention uses such zirconia powder containing zirconia monoclinic phase and zirconia tetragonal phase as a starting material, and can reliably and efficiently produce monoclinic zirconia-based nanoparticles , there is virtually no diffraction peak in the 2θ=29.74~30.74 degrees of the diffraction pattern.

珠磨處理步驟 Bead Milling Steps

珠磨處理步驟係於粒度分佈D50為40μm以下之珠粒存在下將前述氧化鋯粉末供予珠磨處理。 The bead milling step is to subject the aforementioned zirconia powder to bead milling in the presence of beads having a particle size distribution D50 of 40 μm or less.

用作媒介(粉碎媒體)之珠粒僅需使粒度分佈D50在40μm以下之範圍內即可,且宜為35μm以下,更宜為32μm以下,最宜30μm以下。上述D50超過40μm時,有無法獲得安定且分散性高之奈米粒子之虞。另,前述D50之下限值雖不具限定性,但通常設為1μm左右即可,尤宜為10μm左右,更宜為20μm左右。本發明可藉由使用此種相對微細之珠粒而更有效率且確實地調製出微細單斜晶氧化鋯系奈米粒子。 Beads used as media (grinding media) only need to have a particle size distribution D50 within the range of 40 μm or less, preferably 35 μm or less, more preferably 32 μm or less, and most preferably 30 μm or less. When the above-mentioned D50 exceeds 40 μm , there is a possibility that stable and highly dispersible nanoparticles cannot be obtained. In addition, although the above-mentioned lower limit of D50 is not limiting, it is generally sufficient to be about 1 μm, more preferably about 10 μm, and more preferably about 20 μm. The present invention can more efficiently and reliably prepare fine monoclinic zirconia-based nanoparticles by using such relatively fine beads.

珠粒之組成並未特別受限,可採用與習知珠磨機等所用珠粒同樣之材質。例如可適用氧化鋯、氧化鋁、氧化矽等氧化物系珠粒、鎳、銅、鎢、鋼等金屬系珠粒、氮化鈦、氮化矽等非氧化物系珠粒等之無機材料系珠粒。從減輕、防止雜質混入及混合效率性等觀點來看,尤宜使用氧化鋯珠粒。 The composition of the beads is not particularly limited, and the same materials as those used in conventional bead mills can be used. For example, inorganic material systems such as oxide-based beads such as zirconia, alumina, and silicon oxide, metal-based beads such as nickel, copper, tungsten, and steel, and non-oxide-based beads such as titanium nitride and silicon nitride can be applied. beads. From the viewpoints of lightening, preventing the mixing of impurities, and mixing efficiency, it is particularly preferable to use zirconia beads.

珠粒形狀通常宜使用略呈球狀之珠粒。此種球狀珠粒可使用習知或市售物。尤其可適用以電漿熔融法(熱電漿熔融法)調製出之球狀珠粒。電漿熔融法本為習 知方法,可利用諸如日本特開2007-4090所揭方法等。亦即,於大氣壓中形成之電漿氣體環境內,以氣相狀態連續供給氧化鋯之原料粉末(例如以粉碎法調製出之粉末),構成前述原料粉末之氧化鋯粒子表面熔融而使該粒子球狀化,之後可藉由包含對流下之該粒子吹噴冷卻氣體使該粒子急速冷卻之步驟的方法來製造球狀氧化鋯粒子。此種方法所得球狀氧化鋯粒子在其粒子形狀大致呈球狀且較少粗大粒子之觀點上有利。 Bead shape Generally, it is suitable to use slightly spherical beads. As such spherical beads, known or commercially available ones can be used. In particular, it is applicable to spherical beads prepared by plasma melting method (thermoplasma melting method). Plasma fusion is a practice Known methods, such as the method disclosed in Japanese Patent Laid-Open No. 2007-4090, etc. can be used. That is, in a plasma gas atmosphere formed under atmospheric pressure, raw material powder of zirconia (such as a powder prepared by a pulverization method) is continuously supplied in a gas phase state, and the surface of the zirconia particles constituting the raw material powder is melted to make the particles Spheroidization, followed by spherical zirconia particles can be produced by a method comprising the step of rapidly cooling the particles by blowing a cooling gas under convective flow of the particles. The spherical zirconia particles obtained by this method are advantageous in that the particle shape is roughly spherical and there are few coarse particles.

珠粒之使用量並不具限定性,但一般而言,可視相對於填充珠粒之空間(通常是珠磨裝置中之粉碎室)容量的珠粒外觀體積比(珠粒填充率)來決定,因應珠磨裝置之型號等將珠粒填充率適當設在10~90%範圍內即可。因此,舉例來說,可設在50~70%範圍內,也可進一步設在40~60%範圍內。此外,舉例來說,亦如同後述實施例所示,珠粒使用熱電漿熔融法所得球狀氧化鋯珠粒時,亦可設成滿足上述珠粒填充率且相對於氧化鋯粉末100重量份前述珠粒為600~900重量份之範圍內。 The amount of beads used is not limited, but generally speaking, it can be determined by the apparent volume ratio of beads (bead filling rate) relative to the capacity of the space (usually the crushing chamber in the bead mill) filled with beads, According to the model of the bead mill, etc., the bead filling rate can be properly set within the range of 10-90%. Therefore, for example, it may be set within a range of 50 to 70%, and may further be set within a range of 40 to 60%. In addition, for example, as shown in the following examples, when the spherical zirconia beads obtained by the thermoplasma fusion method are used for the beads, it can also be set to satisfy the above-mentioned bead filling rate and relative to 100 parts by weight of the zirconia powder mentioned above. Beads are in the range of 600 to 900 parts by weight.

珠磨處理係一以珠粒(粉碎媒體)所生剪切力或衝撃力來粉碎及分散起始材料之方法,例如可使用習知或市售之珠磨裝置來實施。因此,珠磨裝置之型號、形式亦未特別受限。舉例來說,設於珠磨裝置之攪拌器形狀亦不受限,例如碟型、銷型、單輥型等中之任一者皆可。此外,粉碎室(導管)可為縱型及橫型中之任一者。又,珠磨機之運作方式亦不具限定性,可為循環式、道次式、批次 式等中之任一者。 Bead milling is a method of pulverizing and dispersing the starting material by shearing force or impact force generated by beads (grinding medium), for example, it can be implemented by using a conventional or commercially available bead milling device. Therefore, the model and form of the bead milling device are not particularly limited. For example, the shape of the stirrer installed in the bead mill is not limited, for example, any one of disc type, pin type, single roll type, etc. is acceptable. In addition, the crushing chamber (duct) may be any of vertical type and horizontal type. In addition, the operation mode of the bead mill is not limited, it can be circular, pass, batch any of the formulas.

市售之珠磨裝置只要可在本發明之條件下進行珠磨處理者即不具限定性。例如,也可使用Super Apex Mill(HIROSHIMA METAL & MACHINERY CO.,LTD.製)、Ultra Apex Mill(HIROSHIMA METAL & MACHINERY CO.,LTD.製)、Dual Apex mill(HIROSHIMA METAL & MACHINERY CO.,LTD.製)、MSC Mill(NIPPON COKE & ENGINEERING CO.,LTD.製)、Nano Getter(Ashizawa Finetech Ltd.製)、MAX Nano Getter(Ashizawa Finetech Ltd.製)、LABSTAR Mini(Ashizawa Finetech Ltd.製)、JBM系列(JBM-B035、JBM-C020、JBM-C050、JBM-C200、JBM-C500、JBM-C1000、Waterspout-Combo、JBM-D500、JBM-D1000、JBM-D2000)(均為JUST NANOTECH CO.,Ltd.製)。 Commercially available bead milling devices are not limited as long as they can perform bead milling treatment under the conditions of the present invention. For example, Super Apex Mill (manufactured by HIROSHIMA METAL & MACHINERY CO., LTD.), Ultra Apex Mill (manufactured by HIROSHIMA METAL & MACHINERY CO., LTD.), Dual Apex Mill (manufactured by HIROSHIMA METAL & MACHINERY CO., LTD. ), MSC Mill (manufactured by NIPPON COKE & ENGINEERING CO.,LTD.), Nano Getter (manufactured by Ashizawa Finetech Ltd.), MAX Nano Getter (manufactured by Ashizawa Finetech Ltd.), LABSTAR Mini (manufactured by Ashizawa Finetech Ltd.), JBM series (JBM-B035, JBM-C020, JBM-C050, JBM-C200, JBM-C500, JBM-C1000, Waterspout-Combo, JBM-D500, JBM-D1000, JBM-D2000) (all JUST NANOTECH CO., Ltd.).

就珠磨裝置之操作條件而言,以具備本發明製造方法之條件(使用特定起始材料及珠粒)為前提,可視所用氧化鋯粉末之性狀、溶劑種類、珠粒種類等來適當設定。舉例來說,本發明以設有攪拌器之珠磨裝置而言,通常可設定攪拌器周速5~20m/秒左右,特別是7~15m/秒。滯留時間(處理時間)一般設在5~25分鐘左右(特別是8~20分鐘),但只要可確保所得氧化鋯微粒子(粉末)以X射線繞射分析所得繞射圖譜變得實質上無法識別出氧化鋯正方晶相所需之時間充分,並不特別受上述時間所制約。 The operating conditions of the bead mill are based on the conditions of the production method of the present invention (use of specific starting materials and beads), and can be appropriately set depending on the properties of the zirconia powder used, the type of solvent, the type of beads, etc. For example, in the case of a bead mill equipped with a stirrer in the present invention, the peripheral speed of the stirrer can usually be set to about 5-20 m/s, especially 7-15 m/s. The residence time (processing time) is generally set at about 5 to 25 minutes (especially 8 to 20 minutes), but as long as it can ensure that the obtained zirconia particles (powder) are analyzed by X-ray diffraction, the diffraction pattern becomes substantially unrecognizable The time required for the formation of the tetragonal phase of zirconia is sufficient, and is not particularly restricted by the above-mentioned time.

此外,本發明之珠磨處理可為乾式及濕式中任一者,尤宜採用濕式珠磨處理。此時,溶劑除了水之外,可使用諸如甲醇、乙醇、異丙醇、丁醇等醇系溶劑、酮、丙酮、甲乙酮、甲丙酮、甲基異丁酮等酮系溶劑、異丙醚、甲基賽璐蘇等醚系溶劑、丙二醇單甲醚乙酸酯、乙二醇單乙醚乙酸酯等二醇酯系溶劑等各種有機溶劑。 In addition, the bead milling treatment of the present invention can be either dry or wet, and wet bead milling is particularly preferred. In this case, as a solvent other than water, alcohol-based solvents such as methanol, ethanol, isopropanol, and butanol, ketone-based solvents such as ketone, acetone, methyl ethyl ketone, methyl acetone, and methyl isobutyl ketone, isopropyl ether, Various organic solvents such as ether-based solvents such as methyl celluloid, glycol ester-based solvents such as propylene glycol monomethyl ether acetate, and ethylene glycol monoethyl ether acetate.

此外,珠磨處理時,除了溶劑之外,亦可視需要而摻合各種添加劑。例如,可摻合分散劑、偶合劑、黏合劑、分散助劑等各種添加劑。本發明尤宜在獲得高分散性等目的下使分散液中含有分散劑及偶合劑二者。 In addition, in the case of bead milling, various additives may be blended as necessary in addition to the solvent. For example, various additives such as dispersants, coupling agents, binders, and dispersion aids can be blended. In the present invention, it is particularly preferable to include both the dispersant and the coupling agent in the dispersion liquid for the purpose of obtaining high dispersibility and the like.

分散劑可使用諸如非離子系、陰離子系、陽離子系等任一類型之分散劑,但本發明中以陰離子系分散劑尤佳。陰離子系分散劑尤可適用磷酸酯系分散劑。此等分散劑亦可使用市售品。 As the dispersant, any type of dispersant such as nonionic, anionic, or cationic can be used, but anionic dispersants are particularly preferred in the present invention. Anionic dispersants are especially suitable for phosphate ester dispersants. A commercial item can also be used for these dispersants.

分散劑之添加量並未特別限定,通常可在相對於氧化鋯粉末100重量份為0.1~100重量份之範圍內視所用分散劑之種類等予以適當設定。因此,舉例來說,可設在相對於氧化鋯粉末100重量份為0.4~100重量份之範圍內,又可舉例如設在相對於氧化鋯粉末100重量份為0.5~20重量份之範圍內,更可進一舉例如設在相對於氧化鋯粉末100重量份為1~10重量份之範圍內。 The amount of the dispersant to be added is not particularly limited, and can be appropriately set in the range of 0.1 to 100 parts by weight, depending on the type of dispersant to be used, etc., usually within the range of 0.1 to 100 parts by weight relative to 100 parts by weight of the zirconia powder. Therefore, for example, it may be set within a range of 0.4 to 100 parts by weight relative to 100 parts by weight of zirconia powder, and may be set within a range of 0.5 to 20 parts by weight relative to 100 parts by weight of zirconia powder. , can further be set within a range of 1 to 10 parts by weight relative to 100 parts by weight of zirconia powder, for example.

偶合劑可舉例如矽烷偶合劑、鈦偶合劑等,本發明中尤適用矽烷偶合劑。 The coupling agent can be, for example, a silane coupling agent, a titanium coupling agent, etc., and a silane coupling agent is particularly suitable for the present invention.

矽烷偶合劑並未特別受限,但可使用至少具有丙烯醯 基或甲基丙烯醯基作為官能基之矽烷劑為宜。 Silane coupling agent is not particularly limited, but can use at least acryl A silane agent with a functional group or a methacryl group is suitable.

作為一例,可舉如通式X3-n(CH3)nSi-R-Y(但n=1或2,R表示伸乙基或伸丙基,X表示水解性基,Y表示官能基)所示矽烷偶合劑。前述水解性基X可例示如甲氧基、乙氧基、2-甲氧基乙氧基等烷氧基。前述官能基Y可例示如乙烯基、環氧基、苯乙烯基、脲基、丙烯醯基、甲基丙烯醯基、胺基、三聚異氰酸酯基、異氰酸酯基、巰基等。舉例來說,可適用上述通式中上述R為丙烯醯基或甲基丙烯醯基之矽烷偶合劑。此等矽烷偶合劑亦可使用市售品。 As an example, the general formula X 3-n (CH 3 ) n Si-RY (but n=1 or 2, R represents an ethylidene or propylidene group, X represents a hydrolyzable group, and Y represents a functional group) can be cited. Show silane coupling agent. Examples of the hydrolyzable group X include alkoxy groups such as methoxy, ethoxy, and 2-methoxyethoxy. Examples of the functional group Y include vinyl groups, epoxy groups, styrene groups, ureido groups, acryl groups, methacryl groups, amine groups, isocyanurate groups, isocyanate groups, and mercapto groups. For example, a silane coupling agent in which R in the above general formula is acryl or methacryl can be used. These silane coupling agents can also use a commercial item.

偶合劑之添加量並無特別限制,但一般而言,在相對於氧化鋯粉末100重量份為2~200重量份之範圍內,可視諸如所用分散劑之種類等而予以適當設定。因此,舉例來說,可設在相對於氧化鋯粉末100重量份為5~100重量份之範圍內,亦可設在相對於氧化鋯粉末100重量份為5~50重量份範圍內,更可進一步設在相對於氧化鋯粉末100重量份為10~20重量份之範圍內。 The amount of the coupling agent added is not particularly limited, but is generally within the range of 2 to 200 parts by weight relative to 100 parts by weight of the zirconia powder, and can be appropriately set depending on the type of dispersant used, etc. Therefore, for example, it may be set within a range of 5 to 100 parts by weight relative to 100 parts by weight of zirconia powder, or may be set within a range of 5 to 50 parts by weight relative to 100 parts by weight of zirconia powder. Furthermore, it is set in the range of 10-20 weight part with respect to 100 weight part of zirconia powder.

珠磨處理結束後,按常法與珠粒分離後,僅需回收氧化鋯系奈米粒子即可。此時,實施濕式珠磨處理時,可以前述溶劑中分散有氧化鋯系奈米粒子之分散液形態來回收。此時可視需要而將一部份或全部溶劑替換為其他溶劑,或進一步於溶劑中添加分散劑等。 After the bead milling treatment, after separation from the beads according to the usual method, it is only necessary to recover the zirconia-based nanoparticles. At this time, when the wet bead milling treatment is performed, it can be recovered in the form of a dispersion liquid in which the zirconia-based nanoparticles are dispersed in the aforementioned solvent. At this time, part or all of the solvent may be replaced with other solvents, or a dispersant may be further added to the solvent, if necessary.

3.氧化鋯系奈米粒子之使用 3. Use of zirconia-based nanoparticles

本發明之氧化鋯系奈米粒子可與習知之氧化鋯奈米粒子應用於同樣之用途上。 The zirconia-based nanoparticles of the present invention can be used for the same purposes as conventional zirconia nanoparticles.

尤其是為了活用本發明奈米粒子之高度折射率等特長,舉例來說,可以透鏡、光學過濾器、抗反射材、硬塗材、折射率調整材等各種光學零件為中心,廣泛利用在各種用途上。亦即,可將本發明奈米粒子作為習知或市售光學零件之分散材(特別是高折射率粒子)來應用。此時,可單獨使用本發明之氧化鋯系奈米粒子,或者,也可在含有本發明之氧化鋯系奈米粒子及樹脂成分之複合材料形態下使用。就樹脂成分而言,亦可採用如同習知複合材料所採用之各種合成樹脂,例如聚酯樹脂、聚烯烴樹脂、聚醯胺樹脂、丙烯酸樹脂等。 In particular, in order to make full use of the advantages of the high refractive index of the nanoparticles of the present invention, for example, it can be widely used in various optical parts such as lenses, optical filters, anti-reflection materials, hard coating materials, and refractive index adjustment materials. use. That is, the nanoparticles of the present invention can be used as dispersion materials (especially high refractive index particles) of conventional or commercially available optical components. In this case, the zirconia-based nanoparticles of the present invention may be used alone, or may be used in the form of a composite material containing the zirconia-based nanoparticles of the present invention and a resin component. As for the resin component, various synthetic resins such as polyester resins, polyolefin resins, polyamide resins, acrylic resins, etc. that are used in conventional composite materials can also be used.

實施例 Example

以下顯示實施例俾更具體說明本發明之特徵。但本發明之範圍不受實施例所侷限。 Examples are shown below to illustrate the features of the present invention more specifically. However, the scope of the present invention is not limited by the examples.

實施例1 Example 1

(1)氧化鋯系奈米粒子分散液之調製 (1) Preparation of zirconia-based nanoparticle dispersion

以下述方式調製出氧化鋯系奈米粒子分散於溶劑而成之分散液。起始材料之氧化鋯粉末使用市售品。此市售品之粒度分佈D50在0.4~0.7μm之範圍內,單斜晶相為94體積%且正方晶相為6體積%,比表面積為80m2/g。將該氧化鋯粉末6g與添加劑(矽烷偶合劑0.9g及磷酸酯系分散劑0.3g)摻合至甲乙酮15g後,以珠磨裝置(批次式珠磨機,大研化學工業股份有限公司製)將所得混合液實施珠磨處理。上述裝置係由圖7所示結構所構成,使用了1個圖8所示單輥型攪拌器。珠粒使用市售之利用熱電漿熔融法而球 狀化之氧化鋯珠粒(大研化學工業股份有限公司製「DZB」,粒度分佈D50為30μm)50g(相對於粉碎室之容積為44體積%),令攪拌器周速10m/s,處理時間15分鐘。如此而獲得含有氧化鋯系奈米粒子之分散液。 A dispersion liquid in which zirconia-based nanoparticles were dispersed in a solvent was prepared in the following manner. As the zirconia powder of the starting material, a commercially available product was used. The particle size distribution D50 of this commercial product is in the range of 0.4-0.7 μm, the monoclinic phase is 94% by volume and the tetragonal phase is 6% by volume, and the specific surface area is 80m 2 /g. After blending 6 g of this zirconia powder and additives (0.9 g of silane coupling agent and 0.3 g of phosphoric acid ester-based dispersant) into 15 g of methyl ethyl ketone, a bead mill (batch type bead mill, manufactured by Daiken Chemical Industry Co., Ltd.) ) The resulting mixed solution is subjected to bead milling. The above-mentioned apparatus is constituted by the structure shown in Fig. 7, and a single-roller type agitator shown in Fig. 8 is used. As the beads, 50 g of commercially available zirconia beads ("DZB" manufactured by Daiken Chemical Industry Co., Ltd., D50 of particle size distribution 30 μm) spheroidized by the thermal plasma fusion method (44 volumes relative to the volume of the crushing chamber) were used. %), the circumferential speed of the agitator is 10m/s, and the processing time is 15 minutes. In this way, a dispersion liquid containing zirconia-based nanoparticles was obtained.

茲將實施例1所用珠磨裝置之概略圖顯示於圖7。珠磨裝置10設有:a)用以收容珠粒11及被處理物(含分散介質)12之粉碎室(導管)13;b)配置於粉碎室13內之攪拌器14;c)使前述攪拌器14旋轉之馬達15;d)用以將馬達15之旋轉驅動力傳送到攪拌器14之軸16;及,e)收容冷卻粉碎室13外側之冷卻水18的冷卻水套17。冷卻水18流入冷卻水套17並吸收粉碎時發生之熱後,從冷卻水套17排出,放冷後回到冷卻水套17,以此方式循環。 A schematic diagram of the bead milling device used in Example 1 is shown in FIG. 7 . The bead mill 10 is provided with: a) a crushing chamber (pipe) 13 for containing beads 11 and processed objects (containing dispersion medium) 12; b) an agitator 14 arranged in the crushing chamber 13; c) making the aforementioned A motor 15 for the agitator 14 to rotate; d) a shaft 16 for transmitting the rotational driving force of the motor 15 to the agitator 14; The cooling water 18 flows into the cooling water jacket 17 and absorbs the heat generated during pulverization, then is discharged from the cooling water jacket 17, and returns to the cooling water jacket 17 after cooling down, so as to circulate in this way.

攪拌器13係如圖8(a)所示,於中心軸之位置上,軸16安裝在攪拌器14上。圖8(b)係從圖8(a)之箭頭A方向觀視之圖。如圖8(b)所示,實施例使用之攪拌器14為接近風車形狀之單輥型,其藉由朝順時鐘(箭頭方向)旋轉來進行粉碎。 The stirrer 13 is shown in Figure 8 (a), on the position of the central axis, the shaft 16 is installed on the stirrer 14. Fig. 8(b) is a view viewed from the direction of arrow A in Fig. 8(a). As shown in FIG. 8( b ), the agitator 14 used in the embodiment is a single-roller type close to a windmill, and it grinds by rotating clockwise (arrow direction).

(2)氧化鋯系奈米粒子之評價 (2) Evaluation of zirconia-based nanoparticles

針對所得分散液中之氧化鋯系奈米粒子調查結晶構造及粒度。 The crystal structure and particle size of the zirconia-based nanoparticles in the obtained dispersion were investigated.

1)結晶構造 1) Crystal structure

1-1)X射線繞射分析 1-1) X-ray diffraction analysis

針對將實施例1所得分散液乾燥而得之粉末,實施粉末X射線繞射分析。X射線繞射裝置使用「MiniFlex 600」 (Rigaku Corporation製)。將其分析結果(顯示為「處理後」)顯示於圖1。另,為了比較而在圖1中一併顯示以同樣方式測定處理前之氧化鋯粉末(起始材料)的結果。如圖1所示,可知就實施例1所得氧化鋯系奈米粒子而言,繞射圖案中2θ=29.74~30.74度範圍內之繞射尖峰(特別是氧化鋯正方晶相之繞射尖峰)消失。 Powder X-ray diffraction analysis was performed on the powder obtained by drying the dispersion liquid obtained in Example 1. X-ray diffraction device using "MiniFlex 600" (manufactured by Rigaku Corporation). The results of their analysis (shown as "after treatment") are shown in FIG. 1 . In addition, the results of measuring the zirconia powder (starting material) before the treatment in the same manner are also shown in FIG. 1 for comparison. As shown in Figure 1, it can be seen that for the zirconia-based nanoparticles obtained in Example 1, the diffraction peaks in the range of 2θ=29.74~30.74 degrees in the diffraction pattern (especially the diffraction peaks of the zirconia tetragonal crystal phase) disappear.

1-2)拉曼分光法分析 1-2) Raman spectroscopic analysis

此外,也針對前述粉末調查拉曼分光法之結晶性。拉曼分光裝置使用「雷射拉曼顯微鏡RAMAN Touch」(Nanophoton Corporation製),設為激發波長532nm、繞射格子2400gr/mm。將該拉曼圖譜(顯示為「處理後」)示於圖2。另,為了比較而在圖2中一併顯示以同樣方式測定處理前之氧化鋯粉末(起始材料)的結果。從圖2亦可明確得知,即使利用拉曼圖譜,實施例1所製造之氧化鋯系奈米粒子仍無源自氧化鋯正方晶相之波數202cm-1及267cm-1的尖峰。 In addition, the crystallinity of the aforementioned powder was investigated by Raman spectroscopy. As a Raman spectrometer, "Raman Microscope RAMAN Touch" (manufactured by Nanophoton Corporation) was used, and the excitation wavelength was 532 nm, and the diffraction grating was 2400 gr/mm. This Raman spectrum (shown as "after treatment") is shown in FIG. 2 . In addition, the results of measuring the zirconia powder (starting material) before the treatment in the same manner are also shown in FIG. 2 for comparison. It can also be clearly seen from FIG. 2 that even with the Raman spectrum, the zirconia-based nanoparticles produced in Example 1 still have no peaks at wavenumbers 202 cm −1 and 267 cm −1 originating from the tetragonal zirconia phase.

1-3)電子繞射分析 1-3) Electron diffraction analysis

更進一步對前述粉末實施電子繞射分析。使用金微粒子作為面間隔參照用標準試料,從該標準試料之曲線取得長度資料。算出單斜晶及正方晶之最強線111m、111t之位置。茲將該電子繞射所得強度曲線示於圖3。圖3之上圖顯示處理前(起始材料)之結果,圖3之下圖顯示實施例1所得奈米粒子之結果。從圖3之結果亦可明確得知,處理後之奈米粒子不會確認到正方晶之111t之尖峰。 Furthermore, electron diffraction analysis was performed on the aforementioned powder. Use gold microparticles as a standard sample for plane spacing reference, and obtain length data from the curve of the standard sample. Calculate the positions of the strongest lines 111m and 111t of monoclinic and tetragonal crystals. The intensity curve obtained by electron diffraction is shown in FIG. 3 . The upper panel of FIG. 3 shows the results before treatment (starting material), and the lower panel of FIG. 3 shows the results of the nanoparticles obtained in Example 1. It can also be clearly seen from the results in FIG. 3 that the 111t peak of the tetragonal crystal will not be confirmed in the treated nanoparticles.

2)粒度 2) Granularity

粒度測定使用動態光散射式粒度分佈測定裝置「Nanotrac Wave EX-150」(MicrotracBEL Corp.製)。粒度係測定體積基準之累積分佈D50及D90。茲將其結果示於圖4。從圖4之頻率分佈及累積分佈之結果亦可明確得知,粒度分佈(頻度分佈)呈單峰,D50約12nm,D90約20nm。 For particle size measurement, a dynamic light scattering type particle size distribution analyzer "Nanotrac Wave EX-150" (manufactured by MicrotracBEL Corp.) was used. Particle size is the volume-based cumulative distribution D50 and D90. The results are shown in Fig. 4. It can also be clearly seen from the results of the frequency distribution and cumulative distribution in Figure 4 that the particle size distribution (frequency distribution) is a single peak, D50 is about 12nm, and D90 is about 20nm.

此外,調查粒度分佈D90、處理時間及正方晶/單斜晶之尖峰比(強度比)之關係。茲將結果示於圖5。如圖5所示,隨著氧化鋯單斜晶相增大,D90亦連動縮小。亦即,在氧化鋯正方晶相減少之同時,氧化鋯單斜晶相增加,因此變得較起始材料時之單斜晶相94體積%更多。此外,可從圖5之結果推察出,存在於起始材料中之正方晶相變為單斜晶時氧化鋯凝集粒子解開一事也對微細化有所助益,結果則是獲得高分散性。 In addition, the relationship between the particle size distribution D90, processing time and the peak ratio (intensity ratio) of tetragonal crystal/monoclinic crystal was investigated. The results are shown in Figure 5. As shown in Figure 5, as the monoclinic crystal phase of zirconia increases, D90 also decreases. That is, while the tetragonal phase of zirconia decreases, the monoclinic phase of zirconia increases, thus becoming more than 94% by volume of the monoclinic phase of the starting material. In addition, it can be deduced from the results in Fig. 5 that when the tetragonal crystal phase present in the starting material changes to the monoclinic crystal, the unraveling of the aggregated particles of zirconia also contributes to the miniaturization, resulting in high dispersion .

試驗例2 Test example 2

使用平均粒徑D50不同之氧化鋯珠粒,與實施例1同樣地調製出氧化鋯系奈米粒子(比較試料1及比較試料2)。與實施例1同樣地以X射線繞射分析來調查所得氧化鋯系奈米粒子之結晶相。氧化鋯珠粒分別使用了D50為50μm之珠粒(比較試料1使用者)、D50為100μm之珠粒(比較試料2使用者)。將其結果示於圖6。另,於圖6中一併顯示實施例1所得氧化鋯系奈米粒子之分析結果。 Zirconia-based nanoparticles (comparative sample 1 and comparative sample 2) were prepared in the same manner as in Example 1 using zirconia beads having different average particle diameters D50. The crystal phase of the obtained zirconia-based nanoparticles was investigated by X-ray diffraction analysis in the same manner as in Example 1. As the zirconia beads, D50 of 50 μm (comparative sample 1 user) and D50 of 100 μm (comparative sample 2 user) were used. The results are shown in FIG. 6 . In addition, the analysis results of the zirconia-based nanoparticles obtained in Example 1 are also shown in FIG. 6 .

從圖6之結果亦可明確得知,實施例1之氧化鋯系奈米 粒子(使用珠粒徑D50=30μm,圖6中之符號A)在2θ=29.74~30.74度範圍內不存在繞射尖峰。相對於此,以D50超過40μm之氧化鋯珠粒調製出之比較試料1(使用珠粒徑D50=50μm,圖6中之符號B)及比較試料2(使用珠粒徑D50=100μm,圖6中之符號C)則在2θ=29~30度之範圍(特別是2θ=29.74~30.74度之範圍)內出現些微繞射尖峰。 It can also be clearly seen from the results in Figure 6 that the zirconia-based nano Particles (using bead diameter D50=30μm, symbol A in Figure 6) do not have diffraction peaks in the range of 2θ=29.74~30.74 degrees. In contrast, Comparative Sample 1 (bead diameter D50 = 50 μm, symbol B in Fig. 6) and Comparative Sample 2 (bead diameter D50 = 100 μm, Fig. The symbol C) shows a slight diffraction peak in the range of 2θ=29~30 degrees (especially the range of 2θ=29.74~30.74 degrees).

試驗例3 Test example 3

與實施例1同樣調製出含氧化鋯系奈米粒子之分散液,調查從剛調製後至一定期間內之粒度分佈變化。將結果示於表1。 A dispersion liquid containing zirconia-based nanoparticles was prepared in the same manner as in Example 1, and the particle size distribution change within a certain period of time from immediately after preparation was investigated. The results are shown in Table 1.

Figure 108112722-A0305-02-0023-1
Figure 108112722-A0305-02-0023-1

從表1之結果可明確得知,含氧化鋯系奈米粒子之分散液在調製後經過約6個月後仍維持與當初(0天)大致相同之粒度分佈,具有優異之分散安定性。 From the results in Table 1, it can be clearly seen that the dispersion liquid containing zirconia-based nanoparticles still maintains approximately the same particle size distribution as the original (0 day) after about 6 months after preparation, and has excellent dispersion stability.

試驗例4 Test example 4

與實施例1同樣地調製出含氧化鋯系奈米粒子之分散液(分散液1)。此外,使用平均粒徑D50不同之氧化鋯珠 粒,與實施例1同樣地調製出含氧化鋯系奈米粒子之分散液(比較分散液1及比較分散液2)。氧化鋯珠粒分別使用D50為100μm之珠粒(比較分散液1使用者)、D50為50μm之珠粒(比較分散液2使用者)。針對所得各分散液調查透射率及粒度分佈。透射率係以溶劑(MEK)作為空白試料(透射率100%),測定令光路長為5mm時在測定波長600nm下之分光透射率。粒度分佈與實施例1以同樣方式測定。茲將此等結果示於表2。 A zirconia-based nanoparticle-containing dispersion (dispersion 1) was prepared in the same manner as in Example 1. In addition, use zirconia beads with different average particle diameter D50 particles, and prepared in the same manner as in Example 1, dispersions containing zirconia-based nanoparticles (comparative dispersion 1 and comparative dispersion 2). As the zirconia beads, D50 of 100 μm (comparative dispersion 1 user) and D50 of 50 μm (comparative dispersion 2 user) were used. The transmittance and particle size distribution of each of the obtained dispersion liquids were investigated. For the transmittance, the solvent (MEK) is used as a blank sample (transmittance 100%), and the spectral transmittance at the measurement wavelength of 600nm is measured when the optical path length is 5mm. The particle size distribution was measured in the same manner as in Example 1. These results are shown in Table 2.

Figure 108112722-A0305-02-0024-2
Figure 108112722-A0305-02-0024-2

從表2結果亦可明確得知,本發明之分散液1因微細且分散性優異而獲得了30%以上(尤其是35%以上)之高度透射率。相對於此,比較分散液1及2因含有相對較粗大之粒子,透射率變得較低。 It can also be clearly seen from the results in Table 2 that the dispersion liquid 1 of the present invention has a high transmittance of 30% or more (especially 35% or more) due to its fineness and excellent dispersibility. On the other hand, Comparative Dispersion Liquids 1 and 2 had relatively low transmittance because they contained relatively coarse particles.

Claims (5)

一種單斜晶氧化鋯系奈米粒子,係粒度分佈D50為15nm以下之氧化鋯微粒子,其特徵在於:(1)該氧化鋯微粒子含有氧化鋯單斜晶相;並且(2)該氧化鋯微粒子利用粉末X射線繞射分析所得之繞射圖案中,2θ=29.74~30.74度之範圍內不存在繞射尖峰。 A monoclinic zirconia-based nanoparticle, which is a zirconia microparticle with a particle size distribution D50 of 15 nm or less, characterized in that: (1) the zirconia microparticle contains a zirconia monoclinic crystal phase; and (2) the zirconia microparticle In the diffraction pattern obtained by powder X-ray diffraction analysis, there is no diffraction peak in the range of 2θ=29.74~30.74 degrees. 如請求項1之單斜晶氧化鋯系奈米粒子,其氧化鋯單斜晶相之含量為90體積%以上。 For the monoclinic zirconia-based nanoparticles of claim 1, the content of the zirconia monoclinic crystal phase is more than 90% by volume. 如請求項1或2之單斜晶氧化鋯系奈米粒子,其由氧化鋯微粒子構成之粉末之粒度分佈為單峰,且粒度分佈D90為30nm以下。 For the monoclinic zirconia-based nanoparticles of claim 1 or 2, the particle size distribution of the powder composed of zirconia fine particles is unimodal, and the particle size distribution D90 is 30 nm or less. 一種分散液,係於溶劑中分散有如請求項1至3中任一項之單斜晶氧化鋯系奈米粒子。 A dispersion liquid, in which the monoclinic zirconia-based nanoparticles according to any one of Claims 1 to 3 are dispersed in a solvent. 如請求項4之分散液,其更含有矽烷偶合劑及磷酸酯系分散劑。 Such as the dispersion liquid of claim 4, which further contains a silane coupling agent and a phosphoric acid ester-based dispersant.
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