TWI780559B - Position sensing mechanism - Google Patents

Position sensing mechanism Download PDF

Info

Publication number
TWI780559B
TWI780559B TW110100226A TW110100226A TWI780559B TW I780559 B TWI780559 B TW I780559B TW 110100226 A TW110100226 A TW 110100226A TW 110100226 A TW110100226 A TW 110100226A TW I780559 B TWI780559 B TW I780559B
Authority
TW
Taiwan
Prior art keywords
magnetic
unit
layer
magnetoresistance
sensing mechanism
Prior art date
Application number
TW110100226A
Other languages
Chinese (zh)
Other versions
TW202227782A (en
Inventor
賴志煌
李佳璋
徐志豪
蕭恆昇
Original Assignee
大銀微系統股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 大銀微系統股份有限公司 filed Critical 大銀微系統股份有限公司
Priority to TW110100226A priority Critical patent/TWI780559B/en
Publication of TW202227782A publication Critical patent/TW202227782A/en
Application granted granted Critical
Publication of TWI780559B publication Critical patent/TWI780559B/en

Links

Images

Abstract

A position sensing mechanism provided by the invention comprises an encoding element as a sensing signal source, a reading element for sensing signals of the signal source, and a processing unit for receiving and analyzing sensing signals output by the reading element, the position sensing mechanism has a main technical feature lying in a magneto-resistive unit in the reading element for sensing signals of the signal source being a tunneling magneto-resistor (TMR), and two layers of magnetic moments of a reference layer and a free layer of the tunneling magneto-resistor being perpendicular to each other, and in the reference layer and the free layer with the magnetic moments being perpendicular to each other, the magnetic moment of one of the layers is parallel to a film surface, and the magnetic moment of the other layer is perpendicular to the film surface.

Description

位置感測機構Position Sensing Mechanism

本發明係與感測技術有關,特別是關於一種位置感測機構,其係利用穿隧式磁阻進行位置之感測者。The present invention is related to sensing technology, in particular to a position sensing mechanism which uses tunneling magnetoresistance to sense position.

藉由感測編碼元件中如磁或光等特定訊號在位置變動下所產生的變化,以進行位置解析的感測技術,係為習知技術中被廣泛採用的技術手段。具體而言,例如US6100681A號專利前案中,其利用了彼此相對位差為90度的兩組霍爾感測晶片,來感測沿著一移動方向上的位置變動。又或者如US20090102461A號專利公開案中所揭,將編碼元件所提供的,以磁為訊號源的技術中,將其所具有的兩磁軌分別設為二進位制及十進位制,再以多數的離散式霍爾感測元件分別感測各個磁軌的磁場變化,據以解析以獲知其位置資訊。是等以霍爾元件作為磁感測元件的技術手段,固然為位置感測技術中通常之技術,惟由於霍爾元件本身具有較高的耗電量與較低的靈敏度,致使在作為位置感測元件上仍有其限制,特別是在需求低功耗與高感測靈敏度的應用上,霍爾感測元件已難以滿足產業之需求。The sensing technology for performing position resolution by sensing the changes of specific signals such as magnetism or light in the encoding element under position changes is a widely used technical means in the prior art. Specifically, for example, in the prior patent No. US6100681A, two groups of Hall sensor chips with a relative displacement of 90 degrees are used to sense the positional change along a moving direction. Or as disclosed in the US20090102461A patent publication, in the technology of using magnetism as the signal source provided by the encoding element, the two magnetic tracks it has are respectively set to binary system and decimal system, and then the majority The discrete Hall sensing elements sense the magnetic field changes of each magnetic track respectively, and analyze it to obtain its position information. It is a technical means to use Hall elements as magnetic sensing elements. Although it is a common technology in position sensing technology, due to the high power consumption and low sensitivity of Hall elements, it is difficult to use as a position sensor. There are still limitations on the sensing element, especially in applications that require low power consumption and high sensing sensitivity, the Hall sensing element has been difficult to meet the needs of the industry.

在習知技術中更進一步的,則有如圖1所示之US10480963號專利所揭,其雖亦利用了霍爾感測器(1)來作為絕對列磁軌(2)的感測元件,但在增量列磁軌(3)的感測上,則係採用了自旋閥式穿隧磁阻元件(4, Spin-Valve Tunneling Magneto-Resistance, SV TMR)或異向性磁阻元件(Anisotropic Magneto-Resistance, AMR)等相對低功耗與高靈敏度之磁阻元件作為感測元件,期以獲得較佳的感測靈敏度者,但因自旋閥式穿隧磁阻元件(4)或異向性磁阻元件係藉由感測磁軌移動時所造成的磁場角度變化,來獲得位置解析的訊息,而為能準確地感測增量列磁軌中的磁場角度變化,即必需使自旋閥式穿隧磁阻元件或異向性磁阻元件之膜面位於x-z平面上,從而造成了與位於x-y平面上的絕對列磁軌感測元件即霍爾感測器(1),是處於位在不同平面上的空間狀態,進而衍生了必需透過組裝,將絕對列與增量列的各個感測元件,在以零件身分獨立被製成後,再個別地進行精準對位後組裝至基板(圖上未示)上,如此一來,非僅徒增了組裝的工序與成本,對位的精準程度更影響到位置判別的精確性,難以有效地提高產品的良率。Further in the prior art, there is disclosed in US10480963 patent as shown in Fig. 1, although it has also utilized the Hall sensor (1) as the sensing element of the absolute column magnetic track (2), but In the sensing of the incremental magnetic track (3), a spin-valve tunneling magneto-resistance element (4, Spin-Valve Tunneling Magneto-Resistance, SV TMR) or anisotropic magneto-resistance element (Anisotropic Magneto-Resistance, AMR) and other relatively low-power and high-sensitivity magnetoresistive elements are used as sensing elements in order to obtain better sensing sensitivity, but due to spin-valve tunneling magnetoresistive elements (4) or different The directional magnetoresistive element obtains position resolution information by sensing the change of the magnetic field angle caused by the movement of the magnetic track. In order to accurately sense the change of the magnetic field angle in the incremental magnetic track, it is necessary to make the The film surface of the spin-valve tunneling magnetoresistive element or the anisotropic magnetoresistance element is located on the x-z plane, thus forming an absolute column magnetic track sensing element located on the x-y plane, that is, a Hall sensor (1), which is Being in a space state on different planes, it is necessary to assemble each sensing element of the absolute row and the incremental row, after being manufactured independently as parts, and then individually carry out precise alignment and then assemble to the On the substrate (not shown in the figure), this not only increases the assembly process and cost, but also affects the accuracy of position determination, making it difficult to effectively improve the yield of products.

因此,本發明之主要目的即係在提供一種位置感測機構,其係利用穿隧式磁阻進行位置之感測,且係將感測元件直接於基板上成型以獲得具有複數感測元件的一體式感測器,據以免除感測元件以獨立的離散零件身分被組裝至基板上的組裝工序,確保位置感測的精度不受不良組裝工序所影響者。Therefore, the main purpose of the present invention is to provide a position sensing mechanism, which uses tunneling magnetoresistance for position sensing, and forms the sensing element directly on the substrate to obtain a multi-sensing element. The integrated sensor avoids the assembly process of the sensing element being assembled on the substrate as an independent discrete part, so as to ensure that the accuracy of position sensing is not affected by poor assembly process.

緣是,為達成上述目的,本發明所提供之位置感測機構乃係包含了有一作為感測訊號源的編碼元件,一用以進行感測該訊號源訊號之讀取元件,以及一用以接收並解析該讀取元件所輸出感測信號之處理單元,而其技術上的主要特徵則係在於使該讀取元件中用以進行感測訊號源訊號之磁阻單元,係為穿隧磁阻(Tunneling Magneto-Resistance, TMR),並使穿隧磁阻之參考層(reference layer)與自由層(free layer)兩層的磁矩彼此垂直,同時彼此磁矩為垂直之參考層與自由層中,其中一層的磁矩係平行於膜面,而另一層的磁矩則垂直於膜面。The reason is that, in order to achieve the above object, the position sensing mechanism provided by the present invention comprises a coding element as a sensing signal source, a reading element for sensing the signal source signal, and a The processing unit that receives and analyzes the sensing signal output by the reading element, and its main technical feature is that the magnetoresistive unit used to sense the signal source signal in the reading element is a tunneling magnetic Tunneling Magneto-Resistance (TMR), and make the magnetic moments of the reference layer (reference layer) and the free layer (free layer) of the tunneling magnetoresistance perpendicular to each other, and at the same time, the magnetic moments of the reference layer and the free layer are perpendicular to each other In , the magnetic moment of one layer is parallel to the film surface, while the magnetic moment of the other layer is perpendicular to the film surface.

其中,所述磁矩垂直於膜面者係可為該參考層或該自由層。Wherein, the system whose magnetic moment is perpendicular to the film surface can be the reference layer or the free layer.

首先,請參閱圖2所示,在本發明一較佳實施例中所提供之位置感測機構(10)主要乃係包含了有一編碼元件(20)、一讀取元件(30)以及一處理單元(圖上未示)。First, please refer to Fig. 2, the position sensing mechanism (10) provided in a preferred embodiment of the present invention mainly includes a coding element (20), a reading element (30) and a processing unit (not shown in the figure).

該編碼元件(20)乃係以磁場作為訊號源之習知磁性尺技術,其在構造上包含了一絕對列磁軌(21)與一增量列磁軌(22),並使該絕對列磁軌(21)與該增量列磁軌(22)彼此並列地沿著一虛擬之移動軸延伸,且係在如圖2所示的x-y平面依據預設的編碼方式使磁極產生變動,一般來說,該移動軸通常是呈直線狀,且與磁性尺的長度方向為一致的,但關於包含有該絕對列磁軌(21)與該增量列磁軌(22)的磁性尺技術,由於係屬本發明所屬技術領域之通常知識者於本發明申請前既已知悉之先前技術內容,故對其具體的磁極排列、製程或相關之技術,於此即不再另為贅陳。The encoding element (20) is a conventional magnetic ruler technology using a magnetic field as a signal source, and it is structurally comprised of an absolute row of magnetic tracks (21) and an incremental row of magnetic tracks (22), and the absolute row The magnetic track (21) and the incremental column magnetic track (22) extend side by side along a virtual moving axis, and the magnetic poles are changed in the x-y plane as shown in Figure 2 according to the preset encoding method, generally Generally speaking, the moving axis is usually linear and consistent with the length direction of the magnetic scale, but regarding the magnetic scale technology including the absolute column magnetic track (21) and the incremental column magnetic track (22), Since it belongs to the prior technical content known to those with ordinary knowledge in the technical field of the present invention before the application of the present invention, the specific magnetic pole arrangement, manufacturing process or related technologies will not be repeated here.

該讀取元件(30)則係包含了第一磁阻單元(31)與第二磁阻單元(32),而各磁阻單元之數量則可依實際需求加以設定,其數量之多寡並無礙於本發明技術特徵之達成,緣不就其數值加以說明,就該讀取元件(30)之整體而言,其乃係與該編碼元件(20)相隔開來地相鄰於該編碼元件(20)之一側,並使該讀取元件(30)往該編碼元件(20)之投影範圍可以涵蓋到該絕對列磁軌(21)與該增量列磁軌(22),俾得以在該讀取元件(30)與該編碼元件(20)彼此,無論係使該讀取元件(30)相對於該編碼元件(20)移動、或使該編碼元件(20)相對於該讀取元件(30)移動,當兩者在該移動軸上產生相對位移時,均得使該該增量列磁軌(22)與該絕對列磁軌(21)之磁場變化,由該讀取元件(30)所感測得知,具體上來說,該第一磁阻單元(31)乃係對應於該絕對列磁軌(21),以感測在上述的相對位移狀態下時,該絕對列磁軌(21)之磁場變動,而該第二磁阻單元(32)則係對應於該增量列磁軌(22),以感測在上述的相對位移狀態下時,該增量列磁軌(22)之磁場變動,從而藉由該第一磁阻單元(31)與該第二磁阻單元(32)在感測該絕對列磁軌(21)與該增量列磁軌(22)的磁場訊號後,所輸出的感測信號,該處理單元即可依據該些感測信號解析出該讀取元件(30)與該編碼元件(20)的相對位置,以取得移動位置的訊息,俾供作為如線性馬達或旋轉馬達等驅動元件之控制使用。The reading element (30) then comprises a first magnetoresistive unit (31) and a second magnetoresistive unit (32), and the quantity of each magnetoresistive unit can be set according to actual needs, and its quantity does not vary. Owing to the achievement of the technical characteristics of the present invention, the numerical value thereof will not be described. As far as the whole of the reading element (30) is concerned, it is separated from the encoding element (20) and adjacent to the encoding element. (20), and the projection range of the reading element (30) to the encoding element (20) can cover the absolute row of magnetic tracks (21) and the incremental row of magnetic tracks (22), so as to be able to Between the reading element (30) and the coding element (20), whether the reading element (30) is moved relative to the coding element (20) or the coding element (20) is moved relative to the reading element When the element (30) moves, when the two generate relative displacement on the moving axis, the magnetic fields of the incremental column magnetic track (22) and the absolute column magnetic track (21) can be changed, and the reading element (30) It is known that, specifically, the first magnetic resistance unit (31) is corresponding to the absolute column magnetic track (21), so as to sense the absolute column magnetic track (21) in the above-mentioned relative displacement state The magnetic field of the track (21) varies, and the second reluctance unit (32) is corresponding to the incremental column magnetic track (22), so as to sense the position of the incremental column magnetic track in the above-mentioned relative displacement state. The magnetic field of (22) varies, thereby sensing the absolute column magnetic track (21) and the incremental column magnetic track (22) by the first magnetic resistance unit (31) and the second magnetic resistance unit (32) After receiving the magnetic field signal, the processing unit can analyze the relative position of the reading element (30) and the encoding element (20) according to the sensing signals outputted, so as to obtain the information of the moving position, For the control of driving components such as linear motors or rotary motors.

而需更進一步加以提出說明者係,該第一磁阻單元(31)與該第二磁阻單元(32)係有別於習知技術對於絕對列與增量列採用不同感測元件的技術,而係使該第一磁阻單元(31)與該第二磁阻單元(32)兩者為相同技術的構造,而於本實施例中所揭者,係使該第一磁阻單元(31)與該第二磁阻單元(32)均為如圖3所示的穿隧磁阻(Tunneling Magneto-Resistance, TMR)構造,惟其中,該第一磁阻單元(31)係可為具有單一磁穿隧接面(Single Magnetic Tunneling Junction, Single MTJ)之穿隧磁阻,而該第二磁阻單元(32)則為橋式穿隧磁阻(Bridge TMR),並使穿隧磁阻構成中的參考層(301, reference layer)與自由層(302, free layer)兩層的磁矩(303)為相互垂直之狀態,同時令該參考層(301)之磁矩垂直於膜面,以及令該自由層(302)之磁矩平行於膜面,從而使該參考層(301)與該自由層(302)之磁矩具有正交異向性,並使穿隧磁阻之感測膜面位於如圖2所示的x-y平面上,據此,穿隧磁阻之電阻即可對垂直方向(如圖3所示之感測軸即圖2所示之z方向)上的外加磁場變化產生如圖4所示之線性變化。What needs to be further explained is that the first magneto-resistance unit (31) and the second magneto-resistance unit (32) are different from the prior art in which different sensing elements are used for the absolute column and the incremental column. , and make the first reluctance unit (31) and the second reluctance unit (32) have the same technical structure, and what is disclosed in this embodiment is to make the first reluctance unit ( 31) and the second magnetoresistance unit (32) are tunneling magnetoresistance (Tunneling Magneto-Resistance, TMR) structures as shown in Figure 3, but wherein, the first magnetoresistance unit (31) can have The tunneling magnetoresistance of a single magnetic tunneling junction (Single Magnetic Tunneling Junction, Single MTJ), and the second magnetoresistive unit (32) is a bridge type tunneling magnetoresistance (Bridge TMR), and makes the tunneling magnetoresistance The magnetic moments (303) of the reference layer (301, reference layer) and the free layer (302, free layer) in the composition are perpendicular to each other, and the magnetic moment of the reference layer (301) is perpendicular to the film surface, And make the magnetic moment of the free layer (302) parallel to the film surface, so that the magnetic moments of the reference layer (301) and the free layer (302) have orthotropic, and make the sensing of tunneling magnetoresistance The film surface is located on the x-y plane as shown in Figure 2. Accordingly, the resistance of the tunneling magnetoresistance can respond to the external magnetic field in the vertical direction (the sensing axis shown in Figure 3 is the z direction shown in Figure 2) The change produces a linear change as shown in FIG. 4 .

再者,該第二磁阻單元(32)之穿隧磁阻,其位於如圖2所示x-y平面上的感測膜面,即可受到該增量列磁軌(22)所產生的如圖二所示z方向之弦波場,以產生如圖5之感測信號,同時,該第一磁阻單元(31)之穿隧磁阻,其位於如圖2所示x-y平面上的感測膜面,僅需判別該絕對列磁軌(21)在如圖二所示z方向上磁場上之正負,因此,在上述之相對位移時下,該第一磁阻單元(31)之穿隧磁阻中的自由層(302)將會隨著磁極變化而改變方向,而參考層(301)則保持著相同的方向,從而造成高低電阻差,以產生如圖6所示之感測信號,以判別其磁極極性。Furthermore, the tunneling magnetoresistance of the second magnetoresistive unit (32), which is located on the sensing film surface on the x-y plane as shown in Figure 2, can be subjected to such The sinusoidal wave field in the z direction shown in Figure 2, to produce the sensing signal as Figure 5, at the same time, the tunneling magnetoresistance of the first magneto-resistive unit (31), which is located in the sensor on the x-y plane as shown in Figure 2 To measure the film surface, it is only necessary to judge the positive and negative of the absolute column magnetic track (21) on the magnetic field in the z direction as shown in Figure 2. Therefore, under the above-mentioned relative displacement, the wear of the first magnetic resistance unit (31) The free layer (302) in the tunneling magnetoresistance will change direction as the magnetic pole changes, while the reference layer (301) will maintain the same direction, thus causing a difference in high and low resistance to generate the sensing signal as shown in Figure 6 , to determine its magnetic polarity.

藉由穿隧磁阻之參考層(301)與該自由層(302)間的磁矩正交異向性,即得以透過具有相同構造的穿隧磁阻來感測磁性尺中的絕對列磁軌與增量列磁軌的磁場變動,據以獲悉正確的位置訊息。By means of the magnetic moment orthotropy between the reference layer (301) of the tunneling magnetoresistance and the free layer (302), the absolute column magnetism in the magnetic scale can be sensed through the tunneling magnetoresistance with the same structure. The magnetic field changes of the track and the incremental track, so as to obtain the correct position information.

更重要的是,該第一磁阻單元(31)與該第二磁阻單元(32)除具有相同的構造外,其與該編碼元件(20)之相對位置亦係以同一平面為基準,即係圖2所示之x-y平面,如此一來,構成該第一磁阻單元(31)與該第二磁阻單元(32)之穿隧磁阻,即可透過習知的半導體製程,以相同的薄膜沉積、黃光微影與蝕刻製程中,將預定數量與已定義相對位置的第一磁阻單元(31)與第二磁阻單元(32)一次成型於一基板(33,圖2中以虛線示意者)上,從而免除如習知技術般需將離散的不同感測元件進行組裝所衍生的缺失,以獲得不需進行感測元件組裝,以確保感測精度的位置感測機構。More importantly, except that the first magnetoresistance unit (31) and the second magnetoresistance unit (32) have the same structure, their relative positions to the encoding element (20) are also based on the same plane, That is, the x-y plane shown in Figure 2, so that the tunneling magnetoresistance that constitutes the first magnetoresistive unit (31) and the second magnetoresistive unit (32) can pass through the known semiconductor manufacturing process to In the same thin film deposition, lithography and etching processes, a predetermined number of first magnetoresistive units (31) and second magnetoresistive units (32) with defined relative positions are molded on a substrate (33, shown in FIG. (shown by the dotted line), so as to avoid the defect derived from assembling different discrete sensing elements as in the prior art, so as to obtain a position sensing mechanism that does not need to assemble the sensing elements to ensure the sensing accuracy.

(1):霍爾感測器                                      (2):絕對列磁軌 (3):增量列磁軌               (4):自旋閥式穿隧磁阻元件 (10):位置感測機構         (20):編碼元件                 (21):絕對列磁軌 (22):增量列磁軌             (30):讀取元件                 (301):參考層 (302):自由層                   (303):磁矩                       (31):第一磁阻單元 (32):第二磁阻單元         (33):基板 (1): Hall sensor (2): Absolute column track (3): Incremental column track (4): Spin-valve tunneling magnetoresistive element (10): Position sensing mechanism (20): coding element (21): Absolute column track (22): Incremental column track (30): read components (301): Reference layer (302): free layer (303):Magnetic moment (31): the first magnetic resistance unit (32): The second reluctance unit (33):Substrate

圖1係習知技術之立體示意圖。 圖2係本發明一較佳實施例之立體示意圖。 圖3係本發明一較佳實施例中作為磁阻單元之穿隧磁阻平面示意圖。 圖4係本發明一較佳實施例之電阻與磁場之關係圖。 圖5係本發明一較佳實施例對於增量列之感測信號波形圖。 圖6係本發明一較佳實施例對於絕對列之感測信號波形圖。 Fig. 1 is a three-dimensional schematic view of the prior art. Fig. 2 is a schematic perspective view of a preferred embodiment of the present invention. Fig. 3 is a schematic plan view of tunneling magnetoresistance as a magnetoresistance unit in a preferred embodiment of the present invention. Fig. 4 is a diagram showing the relationship between resistance and magnetic field in a preferred embodiment of the present invention. FIG. 5 is a waveform diagram of sensing signals for incremental columns in a preferred embodiment of the present invention. FIG. 6 is a waveform diagram of sensing signals for absolute columns in a preferred embodiment of the present invention.

(301):參考層 (301): Reference layer

(302):自由層 (302): free layer

(303):磁矩 (303): Magnetic moment

Claims (5)

一種位置感測機構,包含有:一編碼元件,具有一絕對列磁軌與一增量列磁軌,係彼此並列地沿著一虛擬之移動軸延伸;一讀取元件,係相鄰於該編碼元件並與之相隔開來,且於該移動軸上與該編碼元件間有相對位置之改變,該讀取元件係具有一受該絕對列磁軌所作用之第一磁阻單元,以及一受該增量列磁軌所作用之第二磁阻單元;一基板,並使具有相同技術的構造之該第一磁阻單元與該第二磁阻單元在相同的薄膜沉積、黃光微影與蝕刻製程同時成形於該基板上,且令該第一磁阻單元及該第二磁阻單元彼此之間的相對位置係以同一平面為基準;一處理單元,係與該讀取單元為電性之連接,用以接收該第一磁阻單元與該第二磁阻單元分別受該絕對列磁軌與該增量列磁軌作用下,各自產生之訊號,據以進行位置之解析;其特徵在於:該第一磁阻單元係具有單一之磁穿隧接面(Single Magnetic Tunneling Junction,Single MTJ)之穿隧磁阻,該第二磁阻單元係為橋式穿隧磁阻(Bridge TMR),並使參考層(reference layer)與自由層(free layer)之磁矩彼此垂直,同時使該參考層與該自由層中,其中一層之磁矩係平行於膜面,而另一層之磁矩則垂直於膜面,從而使該參考層與該自由層之磁矩具有正交異向性。 A position sensing mechanism comprising: an encoding element having an absolute column magnetic track and an incremental column magnetic track extending parallel to each other along a virtual axis of movement; a read element adjacent to the The coding element is separated from it, and there is a relative position change between the moving shaft and the coding element. The reading element has a first magneto-resistive unit affected by the absolute column magnetic track, and a The second magnetoresistive unit affected by the incremental column magnetic track; a substrate, and the first magnetoresistive unit and the second magnetoresistive unit having the same technical structure are deposited in the same thin film, lithography and etching The manufacturing process is formed on the substrate at the same time, and the relative positions of the first magnetoresistance unit and the second magnetoresistance unit are based on the same plane; a processing unit is electrically connected to the reading unit connected to receive the signals generated by the first magnetoresistance unit and the second magnetoresistance unit under the action of the absolute column magnetic track and the incremental column magnetic track respectively, so as to analyze the position; it is characterized in that : The first magnetoresistive unit is a tunneling magnetoresistance with a single Magnetic Tunneling Junction (Single Magnetic Tunneling Junction, Single MTJ), the second magnetoresistive unit is a bridge tunneling magnetoresistance (Bridge TMR), And make the reference layer (reference layer) and the free layer (free layer) magnetic moments perpendicular to each other, and at the same time make the reference layer and the free layer, the magnetic moment of one layer is parallel to the film surface, while the magnetic moment of the other layer is perpendicular to the film surface, so that the magnetic moments of the reference layer and the free layer have orthotropy. 如請求項1所述之位置感測機構,其中,該編碼元件係沿該移動軸相對該讀取元件移動。 The position sensing mechanism as claimed in claim 1, wherein the encoding element moves relative to the reading element along the moving axis. 如請求項1所述之位置感測機構,其中,該讀取元件係沿該移動軸相對該編碼元件移動。 The position sensing mechanism as claimed in claim 1, wherein the reading element moves relative to the encoding element along the moving axis. 如請求項1所述之位置感測機構,其中,磁矩垂直於膜面者係為參考層。 The position sensing mechanism according to claim 1, wherein the magnetic moment perpendicular to the film surface is the reference layer. 如請求項1所述之位置感測機構,其中,磁矩垂直於膜面者係為自由層。 The position sensing mechanism according to claim 1, wherein the free layer has a magnetic moment perpendicular to the film surface.
TW110100226A 2021-01-05 2021-01-05 Position sensing mechanism TWI780559B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW110100226A TWI780559B (en) 2021-01-05 2021-01-05 Position sensing mechanism

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW110100226A TWI780559B (en) 2021-01-05 2021-01-05 Position sensing mechanism

Publications (2)

Publication Number Publication Date
TW202227782A TW202227782A (en) 2022-07-16
TWI780559B true TWI780559B (en) 2022-10-11

Family

ID=83436869

Family Applications (1)

Application Number Title Priority Date Filing Date
TW110100226A TWI780559B (en) 2021-01-05 2021-01-05 Position sensing mechanism

Country Status (1)

Country Link
TW (1) TWI780559B (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7602178B2 (en) * 2003-03-14 2009-10-13 S.N.R. Roulements Magnetoresistive sensor for measuring the strength of a magnetic field
US10859402B2 (en) * 2017-07-18 2020-12-08 Ntn-Snr Roulements Assembly on a member of a system for determining the position of said member

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7602178B2 (en) * 2003-03-14 2009-10-13 S.N.R. Roulements Magnetoresistive sensor for measuring the strength of a magnetic field
US10859402B2 (en) * 2017-07-18 2020-12-08 Ntn-Snr Roulements Assembly on a member of a system for determining the position of said member

Also Published As

Publication number Publication date
TW202227782A (en) 2022-07-16

Similar Documents

Publication Publication Date Title
US11686599B2 (en) Magnetic field sensor
JP4951129B2 (en) Magnetization method of MR element
JP5596906B2 (en) Manufacturing method of magnetic angle sensor
US10921391B2 (en) Magnetic field sensor with spacer
US9588134B2 (en) Increased dynamic range sensor
US9810748B2 (en) Tunneling magneto-resistor device for sensing a magnetic field
US9200884B2 (en) Magnetic sensor system including three detection circuits
CN114096807B (en) Magnetic field sensor with reduced external stray magnetic field effects
CN103323795A (en) Integrated three-axis magnetic sensor
JP3367230B2 (en) Position detection device
US10649043B2 (en) Magnetic field sensor device configured to sense with high precision and low jitter
CN105466324A (en) Displacement sensor and displacement sensing measurement system
CN115267623A (en) Magnetic resistance magnetic switch sensor
CN114646335A (en) Apparatus and method for position detection
JP4874781B2 (en) Magnetic sensor and magnetic encoder using the same
TWI780559B (en) Position sensing mechanism
TWI731620B (en) Magnetic field sensing device
US11543267B2 (en) Position sensing mechanism
KR102533278B1 (en) Position sensing mechanism
EP4030145A1 (en) Position sensing mechanism
CN114764007B (en) Position sensing mechanism
CN114764007A (en) Position sensing mechanism
JP2022109020A (en) Position detection mechanism
US20240068846A1 (en) Magnetic sensor, magnetic encoder, and manufacturing method for magnetic sensor
JP5959686B1 (en) Magnetic detector

Legal Events

Date Code Title Description
GD4A Issue of patent certificate for granted invention patent