TWI778132B - Flux and Solder Paste - Google Patents

Flux and Solder Paste Download PDF

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TWI778132B
TWI778132B TW107132564A TW107132564A TWI778132B TW I778132 B TWI778132 B TW I778132B TW 107132564 A TW107132564 A TW 107132564A TW 107132564 A TW107132564 A TW 107132564A TW I778132 B TWI778132 B TW I778132B
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flux
solder
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alcohol
solder paste
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TW201934667A (en
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柴崎正訓
杉本淳
坂本伊佐雄
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日商田村製作所股份有限公司
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Abstract

提供助焊劑及焊膏。提供助焊劑及焊膏,其係以抑制焊膏回流焊時助焊劑的流動性降低的方式,而能抑制於所形成的焊料接合部、焊料凸塊內所會產生的空隙之產生,並且能抑制焊料凸塊形成時的凸塊遺失的產生。 Flux and solder paste are available. To provide a flux and a solder paste, which can suppress the generation of voids in the formed solder joints and solder bumps by suppressing the decrease in the fluidity of the flux during the reflow of the solder paste, and can The occurrence of bump loss during solder bump formation is suppressed.

一種助焊劑,其特徵在於,包含松香系樹脂、活性劑、觸變劑、以及溶劑,且包含1分子中所含的碳數為18以上且24以下的一元醇作為前述溶劑,前述一元醇的混配量相對於助焊劑總量為30質量%以上且60質量%以下。 A flux comprising a rosin-based resin, an activator, a thixotropic agent, and a solvent, and a monohydric alcohol having a carbon number of 18 or more and 24 or less contained in 1 molecule as the solvent, and the monohydric alcohol The compounding amount is 30 mass % or more and 60 mass % or less with respect to the total amount of the flux.

Description

助焊劑與焊膏 Flux and Solder Paste

本發明關於助焊劑及使用其的焊膏。 The present invention relates to fluxes and solder pastes using the same.

作為在印刷電路板、矽晶圓之類的基板上所形成的電子電路上接合電子部件的接合材料,主要使用焊料合金。 Solder alloys are mainly used as bonding materials for bonding electronic components to electronic circuits formed on substrates such as printed circuit boards and silicon wafers.

作為使用該焊料合金的接合方法,存在例如如下方法:將焊料合金粉末與助焊劑混合而成的焊膏印刷到基板上來進行的方法或者是使用在基板上形成的由焊料合金形成的焊料凸塊來進行的方法。另外,焊膏也有時用於前述焊料凸塊的形成。 As a joining method using this solder alloy, there are, for example, a method of printing a solder paste obtained by mixing solder alloy powder and flux onto a substrate, or a method of using solder bumps formed of a solder alloy formed on the substrate method to proceed. In addition, solder paste is sometimes used for the formation of the aforementioned solder bumps.

焊膏中所使用一般的助焊劑藉由將松香等樹脂作為主成分,將活性劑及觸變劑等在溶劑中熔融而製作。但是,使用以往的助焊劑的焊膏的情況下,有著在電極上印刷焊膏後的回流焊工序時,於所形成的焊料接合部產生空隙的問題。該空隙導致接合部與基板或電子部件之類的被接合部之間的接合性降低、散熱性降低,而成為引起電子設備或半導體的可靠性降低的原因。 A general flux used in a solder paste is produced by melting an activator, a thixotropic agent, and the like in a solvent, using a resin such as rosin as a main component. However, in the case of using the solder paste of the conventional flux, there is a problem that voids are generated in the formed solder joints during the reflow process after the solder paste is printed on the electrodes. This void reduces the bonding property between the bonding portion and a portion to be bonded such as a substrate or an electronic component, and reduces heat dissipation, thereby causing a decrease in reliability of electronic devices and semiconductors.

另外,近年來,作為使用焊膏形成焊料凸塊的方法,使用乾膜工藝。利用該工藝時,首先,在形成有指定的電子電路、或指定的電子電路和絕緣層的基板上黏貼乾膜,進行指定圖案的曝光和顯影。由此,在乾膜的抗蝕劑成分之中,將想要形成焊料凸塊的部分(電極部上)的抗蝕劑成分去除,在基板上形成指定圖案的乾膜層,同時形成周圍被該乾膜層包圍的區域(開口部)。接著, 進行印刷來在上述開口部內填充焊膏,在該狀態下進行回流焊,形成焊料凸塊。另外在其後,去除乾膜層和形成在焊料凸塊附近的助焊劑殘渣。 In addition, in recent years, as a method of forming solder bumps using solder paste, a dry film process has been used. In this process, first, a dry film is attached to a substrate on which a predetermined electronic circuit, or a predetermined electronic circuit and an insulating layer are formed, and exposure and development of a predetermined pattern are performed. In this way, among the resist components of the dry film, the resist component of the portion where the solder bumps are to be formed (on the electrode portion) is removed, and a dry film layer of a predetermined pattern is formed on the substrate. A region (opening) surrounded by the dry film layer. then, Printing is performed to fill the openings with solder paste, and reflow is performed in this state to form solder bumps. Also thereafter, the dry film layer and the flux residue formed in the vicinity of the solder bumps are removed.

使用該乾膜工藝形成焊料凸塊的情況下,與其他凸塊形成方法相比,容易發生如下的現象:變得容易產生焊料凸塊內的空隙的現象、助焊劑殘渣去除時焊料凸塊從基板上消失的遺失凸塊現象。 When the solder bumps are formed using this dry film process, compared with other bump formation methods, the following phenomena are likely to occur: the phenomenon that voids in the solder bumps are easily generated, and the solder bumps are easily removed from the solder bumps when the flux residue is removed. The missing bump phenomenon that disappears on the substrate.

焊料凸塊內的空隙被認為原因是由回流焊時進入到熔融焊料合金內且未排出的助焊劑成分而導致的。另外,遺失凸塊被認為原因是由回流焊時的助焊劑的流動性降低,從而熔融的焊料合金無法充分到達至開口部的底部,並且助焊劑積存在該底部而成為殘渣而導致的。其起因於在回流焊時助焊劑中所含的溶劑揮發,因此助焊劑的黏度上升,助焊劑的流動性降低。 The voids in the solder bumps are believed to be caused by flux components that enter into the molten solder alloy during reflow and are not expelled. The missing bump is considered to be caused by the decrease in the fluidity of the flux during reflow, so that the molten solder alloy did not reach the bottom of the opening sufficiently, and the flux accumulated at the bottom and became a residue. This is because the solvent contained in the flux volatilizes during reflow, so that the viscosity of the flux increases and the fluidity of the flux decreases.

此外,由乾膜工藝形成焊料凸塊的情況下,形成開口部的乾膜層的膜厚與其他方法中使用的遮罩相比多半更厚。因此被認為在這種情況下,從乾膜層表面起至開口部底面為止的高度(開口部的深度)變得更高,一來熔融的焊料合金難以流動至開口部的底部,助焊劑會容易積存在該底部,因而變得更容易產生遺失凸塊。 In addition, when the solder bump is formed by a dry film process, the film thickness of the dry film layer forming the opening is likely to be thicker than that of a mask used in other methods. Therefore, in this case, it is considered that the height from the surface of the dry film layer to the bottom surface of the opening (the depth of the opening) becomes higher, which makes it difficult for the molten solder alloy to flow to the bottom of the opening, and the flux becomes difficult to flow. It is easy to accumulate on the bottom, and thus it becomes more likely to generate missing bumps.

作為抑制遺失凸塊產生的方法,例如公開了具有在減壓下供給至開口部並在大氣壓下填充於該開口部的黏性、調整黏度及觸變比且使用了沸點為240℃以上的溶劑的焊膏(參照專利文獻1)。 As a method of suppressing the generation of missing bumps, for example, it is disclosed that a solvent having a boiling point of 240° C. or higher is used which has a viscosity that is supplied to an opening under reduced pressure and is filled in the opening under atmospheric pressure, adjusts the viscosity and thixotropic ratio solder paste (refer to Patent Document 1).

[先前技術文獻] [Prior Art Literature]

[專利文獻] [Patent Literature]

[專利文獻1]國際公開公報WO2012/173059 [Patent Document 1] International Publication WO2012/173059

專利文獻1中公開的焊膏,係在開口部微細的情況下抑制了因無法充分填充焊膏而引起的遺失凸塊的產生。另外,其為了在開口部充分填充焊膏而以在焊膏的印刷時將基板所放置的環境在減壓下與大氣壓下切換作為前提,進而,就回流焊時的空隙抑制效果既無公開也無暗示。 The solder paste disclosed in Patent Document 1 suppresses the occurrence of missing bumps due to insufficient filling of the solder paste when the openings are fine. In addition, in order to sufficiently fill the openings with solder paste, it is premised that the environment in which the substrate is placed is switched between reduced pressure and atmospheric pressure during printing of the solder paste, and further, the void suppression effect during reflow is neither disclosed nor disclosed. No hint.

本發明的目的是解決這些問題,且與藉由抑制焊膏的回流焊時的助焊劑的流動性降低,從而能夠抑制形成的焊料接合部、焊料凸塊內發生的空隙產生,並且能夠抑制焊料凸塊形成時的遺失凸塊的發生的助焊劑及使用其的焊膏相關。 An object of the present invention is to solve these problems, and by suppressing the decrease in the fluidity of the flux during reflow of the solder paste, it is possible to suppress the generation of voids in the formed solder joints and solder bumps, and to suppress the solder It is related to the flux and the solder paste used for the occurrence of missing bumps at the time of bump formation.

本發明為了實現上述目的而具有以下的構成作為其特徵。 In order to achieve the above-mentioned object, the present invention has the following structures as its features.

(1)本發明的助焊劑的特徵在於,其包含松香系樹脂、活性劑、觸變劑、以及溶劑,且包含1分子中所含的碳數為18以上且24以下的一元醇作為前述溶劑,前述一元醇的混配量相對於助焊劑總量為30質量%以上且60質量%以下。 (1) The flux of the present invention is characterized in that it contains a rosin-based resin, an activator, a thixotropic agent, and a solvent, and contains, as the solvent, a monohydric alcohol having a carbon number of 18 or more and 24 or less contained in 1 molecule. , the compounding amount of the monohydric alcohol is 30% by mass or more and 60% by mass or less with respect to the total amount of the flux.

(2)根據上述(1)所述的構成,其特徵在於,前述一元醇的1分子中所含的碳數為18以上且20以下。 (2) The structure according to the above (1), wherein the number of carbon atoms contained in one molecule of the monohydric alcohol is 18 or more and 20 or less.

(3)根據上述(1)或(2)所述的構成,其特徵在於,前述一元醇為支鏈型醇或不飽和醇。 (3) The structure according to the above (1) or (2), wherein the monohydric alcohol is a branched alcohol or an unsaturated alcohol.

(4)根據上述(1)至(3)中任一項所述的構成,其特徵在於,前述一元醇選自油醇、異十八醇、異二十醇、2-辛基十二醇或2-癸基十四醇的至少一種。 (4) The structure according to any one of (1) to (3) above, wherein the monohydric alcohol is selected from the group consisting of oleyl alcohol, isostearyl alcohol, isoeicosanol, and 2-octyldodecanol or at least one of 2-decyltetradecanol.

(5)根據上述(1)至(4)中任一項所述的構成,其特徵在於,本發明的助焊劑按照以升溫速度2℃/秒的條件自常溫升溫至峰值溫度260℃、達到該峰值溫度後以降溫速度2℃/秒的條件冷卻之回流焊條件進行了加熱後的黏度為30Pa.s以下。 (5) The configuration according to any one of (1) to (4) above, wherein the flux of the present invention is heated from room temperature to a peak temperature of 260° C. at a temperature increase rate of 2° C./sec. After the peak temperature, the viscosity was 30Pa after heating under reflow soldering conditions with a cooling rate of 2°C/sec. s or less.

(6)本發明的焊膏的特徵在於,包含上述(1)至(5)中任一項所述的助焊劑、以及焊料合金粉末。 (6) The solder paste of the present invention is characterized by containing the flux described in any one of (1) to (5) above, and a solder alloy powder.

(7)本發明的焊料凸塊的形成方法的特徵在於,在基板上形成電極部和第一絕緣層,在前述第一絕緣層上形成第二絕緣層,來在前述電極部上形成開口區域,印刷上述(6)所述的焊膏來填充於前述電極部上的開口區域中的方式,對於在前述電極部上的開口區域填充有前述焊膏的前述基板進行加熱而在前述基板上形成助焊劑殘渣,藉由去除前述助焊劑殘渣和前述第二絕緣層,形成焊料凸塊。 (7) The method for forming a solder bump of the present invention is characterized in that an electrode portion and a first insulating layer are formed on a substrate, a second insulating layer is formed on the first insulating layer, and an opening region is formed on the electrode portion. In the method of printing the solder paste described in the above (6) to fill the opening region on the electrode portion, the opening region of the electrode portion is heated to the substrate filled with the solder paste to form on the substrate Solder bumps are formed by removing the flux residue and the second insulating layer.

本發明的助焊劑及使用其的焊膏藉由抑制焊膏的回流焊時的助焊劑的流動性降低,從而能夠抑制形成的焊料接合部、焊料凸塊內產生的空隙的發生,另外能夠抑制焊料凸塊形成時的遺失凸塊的產生。 The flux of the present invention and the solder paste using the same can suppress the occurrence of voids in the formed solder joints and solder bumps by suppressing the decrease in the fluidity of the flux during reflow of the solder paste, and can also suppress the Generation of missing bumps during solder bump formation.

1‧‧‧基板 1‧‧‧Substrate

2‧‧‧電極 2‧‧‧Electrode

3‧‧‧絕緣層 3‧‧‧Insulation layer

4‧‧‧乾膜層 4‧‧‧Dry film layer

5‧‧‧開口部 5‧‧‧Opening

圖1為顯示出實施例及比較例的焊膏的空隙試驗、遺失凸塊試驗以及本發明的實施例及比較例的助焊劑的加熱(回流焊)後的黏度測量時的溫度曲線的圖。 1 is a graph showing temperature profiles in a void test and a missing bump test of the solder pastes of Examples and Comparative Examples, and the viscosity measurement after heating (reflow) of the fluxes of Examples and Comparative Examples of the present invention.

圖2為實施例及比較例的焊膏的空隙試驗及遺失凸塊試驗時的形成焊料凸塊的基板的示意圖。 2 is a schematic diagram of a substrate on which solder bumps are formed during a void test and a missing bump test of the solder pastes of Examples and Comparative Examples.

以下,對於本發明的助焊劑及焊膏的一實施方式進行詳細說明。另外,本發明本來就不限定於該實施方式。 Hereinafter, one embodiment of the flux and solder paste of the present invention will be described in detail. In addition, this invention is not limited to this embodiment at all.

1.助焊劑 1. Flux

本實施方式的助焊劑包含松香系樹脂、活性劑、觸變劑、以及溶劑。 The flux of the present embodiment contains a rosin-based resin, an activator, a thixotropic agent, and a solvent.

作為前述松香系樹脂,例如可列舉出妥爾油松香、脂松香、木松香等松香;氫化松香、聚合松香、歧化松香、丙烯酸改性松香、馬來酸改性松香、甲醯化松香等松香衍生物等。 Examples of the rosin-based resin include rosins such as tall oil rosin, gum rosin, and wood rosin; Derivatives etc.

另外,這些松香系樹脂之中,宜使用軟化點為100℃以下的松香系樹脂。藉由使用低軟化點的松香系樹脂,能提高助焊劑在加熱(回流焊)時的流動性,因此焊料合金(粉末)變得容易沉降,由此能夠提高抑制遺失凸塊產生的效果。 In addition, among these rosin-based resins, it is preferable to use a rosin-based resin having a softening point of 100° C. or lower. By using a rosin-based resin with a low softening point, the fluidity of the flux during heating (reflow soldering) can be improved, so that the solder alloy (powder) tends to settle, thereby enhancing the effect of suppressing the occurrence of missing bumps.

前述松香系樹脂的混配量相對於助焊劑總量宜為25質量%以上且50質量%以下、更宜為30質量%以上且40質量%以下。 The blending amount of the rosin-based resin is preferably 25% by mass or more and 50% by mass or less, and more preferably 30% by mass or more and 40% by mass or less with respect to the total amount of the flux.

作為前述活性劑,可列舉出例如有機胺的鹵化氫鹽等胺鹽(無機酸鹽、有機酸鹽)、有機酸、有機酸鹽、有機胺鹽、溴化鹵素化合物等。具體而言,可列舉出例如二乙胺鹽、酸鹽、琥珀酸、己二酸、癸二酸、戊二酸、二苯胍氫溴酸鹽、環己胺氫溴酸鹽、溴化三烯丙基異氰脲酸酯、三(2,3-二溴丙基)異氰脲酸酯、聚8,13-二甲基-8,12-二十碳二酸酐等。這些之中,特別宜使用聚8,13- 二甲基-8,12-二十碳二酸酐作為前述活性劑。聚8,13-二甲基-8,12-二十碳二酸酐在常溫下為液狀,而且是長鏈狀的化合物,因此高溫下的穩定性優異,能夠提高抑制空隙產生的效果及抑制遺失凸塊產生的效果。另外,它們可以單獨使用也可以組合使用多種。 Examples of the activating agent include amine salts (inorganic acid salts, organic acid salts) such as hydrogen halide salts of organic amines, organic acids, organic acid salts, organic amine salts, and brominated halogen compounds. Specifically, for example, diethylamine salt, acid salt, succinic acid, adipic acid, sebacic acid, glutaric acid, diphenylguanidine hydrobromide, cyclohexylamine hydrobromide, tribromide Allyl isocyanurate, tris(2,3-dibromopropyl) isocyanurate, poly-8,13-dimethyl-8,12-eicosanedioic anhydride, etc. Among these, poly8,13- Dimethyl-8,12-eicosadioic anhydride serves as the aforementioned active agent. Poly-8,13-dimethyl-8,12-eicosanedioic anhydride is liquid at room temperature and is a long-chain compound, so it has excellent stability at high temperature, and can improve the effect of suppressing the generation of voids and suppressing The effect of missing bumps. In addition, these may be used alone or in combination of two or more.

前述活性劑的混配量根據其他成分及使用的無鉛焊料合金而異,一般相對於助焊劑總量為20質量%以下。 The compounding quantity of the said activator differs depending on other components and the lead-free solder alloy used, and is generally 20 mass % or less with respect to the total amount of flux.

作為前述觸變劑,例如可列舉出氫化蓖麻油、雙醯胺系觸變劑(飽和脂肪酸雙醯胺、不飽和脂肪酸雙醯胺、芳香族雙醯胺等)、二甲基二亞苄基山梨糖醇等。 Examples of the thixotropic agent include hydrogenated castor oil, bisamide-based thixotropic agents (saturated fatty acid bisamide, unsaturated fatty acid bisamide, aromatic bisamide, etc.), dimethyldibenzylidene, and the like. Sorbitol, etc.

它們之中特別宜使用氫化蓖麻油作為前述觸變劑。氫化蓖麻油與其它觸變劑相比軟化點低,因此能夠提高助焊劑在加熱(回流焊)時的流動性。因此,焊料合金(粉末)變得容易沉降,由此能夠提高抑制遺失凸塊產生的效果。 Among them, hydrogenated castor oil is particularly preferably used as the aforementioned thixotropic agent. Hydrogenated castor oil has a low softening point compared to other thixotropic agents, so it can improve the fluidity of the flux during heating (reflow). Therefore, the solder alloy (powder) tends to settle, and thereby the effect of suppressing the occurrence of missing bumps can be enhanced.

另外,它們可以單獨使用也可以組合使用多種。 In addition, these may be used alone or in combination of two or more.

前述觸變劑的混配量相對於助焊劑總量宜為3質量%以上且10質量%以下、更宜為5質量%以上且8質量%以下。 The blending amount of the thixotropic agent is preferably 3% by mass or more and 10% by mass or less, more preferably 5% by mass or more and 8% by mass or less, based on the total amount of the flux.

作為前述溶劑,可列舉出醇系、乙醇系、丙酮系、甲苯系、二甲苯系、乙酸乙酯系、乙基溶纖劑系、丁基溶纖劑系、二醇醚系、酯系等。它們可以單獨使用也可以組合使用多種。 Examples of the solvent include alcohols, ethanols, acetones, toluenes, xylenes, ethyl acetates, ethyl cellosolves, butyl cellosolves, glycol ethers, esters, and the like. These can be used alone or in combination.

本實施方式的助焊劑宜包含1分子中所含的碳數為18以上且24以下的一元醇作為前述溶劑。 The flux of the present embodiment preferably contains, as the solvent, a monohydric alcohol having a carbon number of 18 or more and 24 or less contained in one molecule.

這種一元醇即使在加熱(回流焊)溫度高的情況下也具有難以揮發的性質。因此,會抑制加熱(回流焊)時的溶劑的揮發量,且會抑制助焊劑的流動性降低。 由此,助焊劑的成分變得難以進入到加熱(回流焊)時熔融的焊料合金內,能夠抑制空隙的產生。 This monohydric alcohol has the property of being hard to volatilize even when the heating (reflow) temperature is high. Therefore, the volatilization amount of the solvent during heating (reflow soldering) is suppressed, and the flowability of the flux is suppressed from decreasing. As a result, it becomes difficult for the components of the flux to enter into the solder alloy melted during heating (reflow), and the generation of voids can be suppressed.

另外,焊料凸塊的形成中,在加熱(回流焊)時熔融的焊料合金也變得容易流動到開口部的底部,也能夠抑制遺失凸塊的產生。這在由開口部的深度更深的乾膜工藝來形成焊料凸塊時也是同樣的,在這種工藝中也能夠抑制遺失凸塊的產生。 In addition, in the formation of the solder bumps, the molten solder alloy also easily flows to the bottom of the opening during heating (reflow), and the occurrence of missing bumps can also be suppressed. The same is true when the solder bumps are formed by the dry film process in which the depth of the opening is deeper, and the generation of missing bumps can be suppressed also in this process.

另外,作為抑制加熱(回流焊)時的助焊劑的流動性降低的方法,也會考慮使用沸點高的(高溫度下的揮發量少的)酯系溶劑。 In addition, as a method of suppressing the decrease in the fluidity of the flux at the time of heating (reflow), the use of an ester-based solvent having a high boiling point (with a small amount of volatilization at a high temperature) is also considered.

但是,這種酯系溶劑多半與活性劑、觸變劑之類的其他助焊劑成分的溶解性差。因此,通常必須與這種酯系溶劑一同使用溶解性高且沸點低的其他溶劑,多半才能作為助焊劑使用。 However, such ester-based solvents are likely to have poor solubility with other flux components such as activators and thixotropic agents. Therefore, it is usually necessary to use another solvent with high solubility and a low boiling point together with this ester-based solvent, and it is often used as a flux.

但是,本實施方式的助焊劑藉由包含1分子中所含的碳數為18以上且24以下的一元醇作為前述溶劑,而不必與沸點低的其他溶劑一同使用,即使單獨使用也能夠抑制加熱(回流焊)時的助焊劑的流動性降低。但是,並非排除該一元醇與其它溶劑一同使用,仍可以適當地組合使用。 However, the flux of the present embodiment contains, as the solvent, a monohydric alcohol having a carbon number of 18 or more and 24 or less contained in one molecule, and does not need to be used together with another solvent with a low boiling point, and can suppress heating even when used alone. The fluidity of the flux at the time of (reflow soldering) decreased. However, it is not excluded that the monohydric alcohol is used together with other solvents, and it can be used in combination as appropriate.

另外,前述一元醇的1分子中所含的碳數宜為18以上且20以下。 In addition, the number of carbon atoms contained in one molecule of the monohydric alcohol is preferably 18 or more and 20 or less.

另外,前述一元醇宜為支鏈型醇或不飽和醇。 In addition, the aforementioned monohydric alcohol is preferably a branched alcohol or an unsaturated alcohol.

作為前述一元醇,例如可列舉出油醇、異十八醇、異二十醇、2-辛基十二醇、2-癸基十四醇等。它們之中,宜使用油醇、異十八醇、異二十醇及2-辛基十二醇、特別宜使用2-辛基十二醇。它們可以單獨使用也可以組合使用多種。 As said monohydric alcohol, oleyl alcohol, isostearyl alcohol, isoeicosanol, 2-octyldodecanol, 2-decyltetradecanol, etc. are mentioned, for example. Among them, oleyl alcohol, isostearyl alcohol, isoeicosanol, and 2-octyldodecanol are preferably used, and 2-octyldodecanol is particularly preferably used. These can be used alone or in combination.

前述溶劑的混配量相對於助焊劑總量宜為30質量%以上且60質量%以下、更宜為40質量%以上且50質量%以下。 It is preferable that the compounding quantity of the said solvent is 30 mass % or more and 60 mass % or less with respect to the total amount of flux, and it is more preferable that it is 40 mass % or more and 50 mass % or less.

另外,前述一元醇的混配量相對於助焊劑總量宜為30質量%以上且60質量%以下、較宜為35質量%以上且55質量%以下、更宜為40質量%以上且50質量%以下。藉由將前述一元醇的混配量設為該範圍,較能夠提高焊料凸塊的空隙抑制效果。 In addition, the compounding amount of the monohydric alcohol is preferably 30 mass % or more and 60 mass % or less, preferably 35 mass % or more and 55 mass % or less, more preferably 40 mass % or more and 50 mass %, with respect to the total amount of the flux. %the following. By making the compounding quantity of the said monohydric alcohol into this range, the void suppression effect of a solder bump can be improved comparatively.

本實施方式的助焊劑中,係出於抑制焊料合金粉末的氧化的目的,而可以配混抗氧化劑。 In the flux of the present embodiment, an antioxidant may be blended for the purpose of suppressing oxidation of the solder alloy powder.

作為前述抗氧化劑,可列舉出例如受阻酚系抗氧化劑、酚系抗氧化劑、雙酚系抗氧化劑、聚合物型抗氧化劑等。它們之中特別宜使用受阻酚系抗氧化劑。 As said antioxidant, a hindered phenol type antioxidant, a phenol type antioxidant, a bisphenol type antioxidant, a polymer type antioxidant, etc. are mentioned, for example. Among them, hindered phenol-based antioxidants are particularly preferably used.

前述抗氧化劑並非限定於它們,另外,其混配量並沒有特別限定。其通常的混配量相對於助焊劑總量為0.5質量%至5質量%左右。 The aforementioned antioxidants are not limited to these, and the compounding amount thereof is not particularly limited. The usual compounding amount thereof is about 0.5 mass % to 5 mass % with respect to the total amount of the flux.

本實施方式的助焊劑中也可以進一步添加鹵素、消光劑、消泡劑等添加劑。前述添加劑的混配量相對於助焊劑總量宜為10質量%以下、更宜的混配量為5質量%以下。 Additives such as halogens, matting agents, and antifoaming agents may be further added to the flux of the present embodiment. The blending amount of the aforementioned additives is preferably 10% by mass or less, and more preferably 5% by mass or less, based on the total amount of the flux.

本實施方式的助焊劑按照圖1所示的溫度曲線那樣,以升溫速度2℃/秒的條件自常溫升溫至峰值溫度260℃、達到該峰值溫度後以降溫速度2℃/秒的條件冷卻之回流焊條件進行了加熱後的黏度宜為30Pa.s以下。另外,該黏度更宜為25Pa.s以下。 The flux of this embodiment is heated from room temperature to a peak temperature of 260°C at a temperature increase rate of 2°C/sec, as shown in the temperature profile shown in Fig. 1, and then cooled at a temperature drop rate of 2°C/sec after reaching the peak temperature The viscosity after heating under reflow soldering conditions should be 30Pa. s or less. In addition, the viscosity is more preferably 25Pa. s or less.

該黏度的測量中,首先,將本實施方式的助焊劑4g放入鋁盤,將其載置在金屬網上,使用回流焊裝置進行回流焊。回流焊條件依照圖1所示的溫度曲線(上述回流焊條件)。 In the measurement of this viscosity, first, 4 g of the flux of the present embodiment was put into an aluminum pan, placed on a metal mesh, and reflowed using a reflow soldering apparatus. The reflow soldering conditions were in accordance with the temperature profile shown in FIG. 1 (the above-mentioned reflow soldering conditions).

將回流焊後的助焊劑恢復至常溫,使用E型黏度計對其進行測量。另外,黏度測量條件設為轉速10rpm、測定溫度25℃。 Return the flux after reflow to room temperature and measure it with an E-type viscometer. In addition, the viscosity measurement conditions were made into 10 rpm of rotation speed and a measurement temperature of 25 degreeC.

2.焊膏 2. Solder Paste

本實施方式的焊膏可以藉由公知的方法將本實施方式的助焊劑與焊料合金粉末混合而製作。 The solder paste of the present embodiment can be produced by mixing the flux of the present embodiment and the solder alloy powder by a known method.

作為前述焊料合金粉末,例如可列舉出將Sn、Ag、Cu、Bi、Zn、In、Ga、Sb、Au、Pd、Ge、Ni、Cr、Al、P、In、Pb等組合多個而成的物質。另外,前述焊料合金粉末的合金組成未特別限定,只要不損害本實施方式的焊膏的效果者均可使用。 Examples of the solder alloy powder include Sn, Ag, Cu, Bi, Zn, In, Ga, Sb, Au, Pd, Ge, Ni, Cr, Al, P, In, Pb, etc., in combination substance. In addition, the alloy composition of the said solder alloy powder is not specifically limited, As long as the effect of the solder paste of this embodiment is not impaired, it can be used.

另外,作為代表性的焊料合金粉末,可以使用Sn-Ag系焊料合金、Sn-Ag-Cu系焊料合金、Sn-Ag-Cu-In系焊料合金、Sn-Cu系焊料合金之類的無鉛焊料合金粉末,也可以使用含鉛的焊料合金粉末。 In addition, as typical solder alloy powders, lead-free solders such as Sn-Ag-based solder alloys, Sn-Ag-Cu-based solder alloys, Sn-Ag-Cu-In-based solder alloys, and Sn-Cu-based solder alloys can be used As the alloy powder, lead-containing solder alloy powder can also be used.

前述焊料合金粉末的混配量相對於焊膏總量宜為63質量%至93質量%。較宜的混配量為84質量%至92質量%,更宜的混配量為86質量%至90質量%。 The compounding amount of the aforementioned solder alloy powder is preferably 63% by mass to 93% by mass relative to the total amount of the solder paste. A preferable compounding amount is 84 to 92 mass %, and a more preferable compounding amount is 86 to 90 mass %.

3.焊料接合部 3. Solder joint

作為使用本實施方式的焊膏形成的焊料接合部,例如藉由以下的方法形成。 The solder joint portion formed using the solder paste of the present embodiment is formed, for example, by the following method.

即,在基板上的預先決定的指定位置印刷前述焊膏,而在該基板上的指定位置搭載電子部件,並藉由將其進行回流焊而形成。如此形成的焊料接合部因為產生的空隙少、具有高的可靠性,而能夠適用於半導體、電子設備等。 That is, the above-mentioned solder paste is printed on a predetermined predetermined position on the substrate, and electronic components are mounted on the predetermined position on the substrate, and are formed by reflow soldering. The solder joints formed in this way can be applied to semiconductors, electronic devices, and the like because they generate few voids and have high reliability.

4.焊料凸塊 4. Solder bumps

使用本實施方式的焊膏形成的焊料凸塊例如藉由以下的方法形成。 Solder bumps formed using the solder paste of the present embodiment are formed, for example, by the following method.

首先,在基板上形成具有指定圖案的電極部及絕緣層。該絕緣層只要能形成液狀的阻焊劑、乾膜等具有指定膜厚之由絕緣成分形成的層,則藉由任意方法製作均可。 First, an electrode portion and an insulating layer having a predetermined pattern are formed on a substrate. The insulating layer may be produced by any method as long as it can form a layer formed of an insulating component having a predetermined film thickness, such as a liquid solder resist or a dry film.

接著,將與該圖案對應的金屬遮罩(在電極部上開口)載置到前述基板上來接觸前述絕緣層,並使用刮板等印刷來讓前述焊膏填充到前述電極部上的開口區域。然後,將該基板放入到回流焊裝置,按照指定的溫度曲線進行回流焊。回流焊後,藉由去除在前述基板上殘留的助焊劑成分(助焊劑殘渣),而形成焊料凸塊。 Next, a metal mask (opening on the electrode portion) corresponding to the pattern is placed on the substrate to contact the insulating layer, and the opening region on the electrode portion is filled with the solder paste by printing using a squeegee or the like. Then, the board is put into a reflow soldering apparatus, and reflow soldering is performed according to a specified temperature profile. After reflow soldering, solder bumps are formed by removing the flux components (flux residues) remaining on the substrate.

另外,本實施方式的焊膏也可以使用乾膜工藝形成焊料凸塊。由乾膜工藝形成焊料凸塊的步驟例如如以下所述。 In addition, the solder paste of this embodiment can also form solder bumps using a dry film process. The step of forming the solder bumps by the dry film process is as follows, for example.

首先,在基板上形成具有指定圖案的電極部及絕緣層。該絕緣層只要可以形成液狀的阻焊劑、乾膜等具有指定膜厚之由絕緣成分形成的層,則藉由任意方法製作均可。 First, an electrode portion and an insulating layer having a predetermined pattern are formed on a substrate. This insulating layer may be produced by any method as long as it can form a layer formed of an insulating component having a predetermined film thickness, such as a liquid solder resist or a dry film.

接著,在前述絕緣層上形成乾膜層。該乾膜層藉由在前述基板的指定範圍上黏貼乾膜來接觸絕緣層,並藉由對其進行指定圖案的曝光和顯影而形成。即,藉由曝光和顯影而去除前述乾膜的抗蝕劑成分之中想要形成焊料凸塊部分(電極部上)的抗蝕劑成分,在前述基板上形成指定圖案的乾膜層。另外,由此形成周圍被該乾膜層包圍的區域(開口部)。 Next, a dry film layer is formed on the aforementioned insulating layer. The dry film layer is formed by sticking a dry film on a specified range of the aforementioned substrate to contact the insulating layer, and by exposing and developing it in a specified pattern. That is, among the resist components in the dry film, the resist component in the portion where the solder bumps are to be formed (on the electrode portion) is removed by exposure and development, and a dry film layer of a predetermined pattern is formed on the substrate. In addition, a region (opening) surrounded by the dry film layer is thus formed.

然後,使用刮板等印刷來讓前述焊膏填充到前述開口部內。然後,將該基板放入到回流焊裝置中,按照指定的溫度曲線進行回流焊。回流焊後,藉由去除在前述基板上殘留的助焊劑成分(助焊劑殘渣)和前述乾膜層,而形成焊料凸塊。 Then, the openings are filled with the solder paste by printing using a squeegee or the like. Then, the substrate is placed in a reflow soldering apparatus, and reflow soldering is performed according to a specified temperature profile. After reflow soldering, solder bumps are formed by removing the flux component (flux residue) and the dry film layer remaining on the substrate.

如此形成的焊料凸塊由於抑制焊膏的回流焊時的助焊劑的流動性降低,因此能夠抑制焊料凸塊內發生的空隙產生,另外能夠抑制焊料凸塊形成時的遺失凸塊的產生。 The solder bumps formed in this way can suppress the reduction in the fluidity of the flux during reflow of the solder paste, so that the generation of voids in the solder bumps can be suppressed, and the occurrence of missing bumps during the formation of the solder bumps can be suppressed.

[實施例] [Example]

以下,舉出實施例及比較例詳細說明本發明。另外,本發明不限定於這些實施例。 Hereinafter, the present invention will be described in detail with reference to Examples and Comparative Examples. In addition, this invention is not limited to these Examples.

助焊劑的製作 The production of flux

按照表1所示的組成及配方將各成分混煉,製作實施例1~8及比較例1~7的各助焊劑。另外,表1之中,表示組成的數值的單位在沒有特別記載的情況下為質量%。 Each component was kneaded according to the composition and formulation shown in Table 1, and each flux of Examples 1 to 8 and Comparative Examples 1 to 7 was produced. In addition, in Table 1, the unit of the numerical value which shows a composition is mass %, unless it mentions in particular.

接著,將實施例1~8及比較例1~7的助焊劑12質量%與Sn-3Ag-0.5Cu焊料合金粉末(粉末粒徑2μm~8μm:IPC標準Type8)88質量%混合,得到實施例1~8及比較例1~7的焊膏。 Next, 12 mass % of the fluxes of Examples 1 to 8 and Comparative Examples 1 to 7 and 88 mass % of Sn-3Ag-0.5Cu solder alloy powder (powder particle size of 2 μm to 8 μm: IPC standard Type 8) were mixed to obtain Examples The solder pastes of 1 to 8 and Comparative Examples 1 to 7.

Figure 107132564-A0202-12-0012-8
※1 完全氫化改性松香(軟化點80℃) Eastman Chemical公司製※2 甲醯化松香(軟化點85~95℃) Harima Chemicals(股)製※3 三(2,3-二溴丙基)異氰脲酸酯 日本化成(股)製※4 聚8,13-二甲基-8,12-二十碳二酸酐 岡村製油(股)製※5 2-癸基十四醇(碳數24:支鏈型) 新日本理化(股)製※6 2-辛基十二醇(碳數20:支鏈型) 新日本理化(股)製※7 異二十醇(碳數20:支鏈型) 日產化學工業(股)製※8 異十八醇(碳數18:支鏈型) 高級醇工業(股)製※9 2-十六醇(碳數16:支鏈型) 新日本理化(股)製※10 癸二酸雙(2-乙基己酯) 大八化學工業(股)製
Figure 107132564-A0202-12-0012-8
※1 Fully hydrogenated modified rosin (softening point 80°C) Eastman Chemical Co. Ltd. ※2 Carboxylated rosin (softening point 85~95°C) Harima Chemicals Co., Ltd. ※3 Tris(2,3-dibromopropyl) Isocyanurate Nippon Chemical Co., Ltd. *4 Poly-8,13-dimethyl-8,12-eicosadioic anhydride Okamura Oil Co., Ltd. *5 2-decyltetradecanol (24 carbon atoms) : Branched type) Nippon RIKEN Co., Ltd. *6 2-Octyldodecanol (20 carbon atoms: branched) Nippon Rika Co., Ltd. *7 Isoeicosanol (20 carbon atoms: branched) Type) Nissan Chemical Industry Co., Ltd. ※8 Isostearyl alcohol (C 18: branched type) Advanced Alcohol Industry Co., Ltd. ※9 2-hexadecanol (C16: branched type) Nippon RIKEN Co., Ltd. ※10 Bis(2-ethylhexyl sebacate) Manufactured by Daihachi Chemical Industry Co., Ltd.

<失重率> <weight loss rate>

對於各溶劑成分,測定220℃下的失重率。 For each solvent component, the weight loss rate at 220°C was measured.

該失重率的測定在以下的條件下進行。即,使用差熱熱重同時測定裝置(產品名:STA7200RV、(股)日立高新技術製),測定試樣10mg以升溫速度10℃/分鐘在N2(300ml/分鐘)環境下升溫至220℃後的失重率。將其結果顯示於表2。 The measurement of the weight loss rate was performed under the following conditions. That is, using a simultaneous differential thermogravimetric measuring apparatus (product name: STA7200RV, manufactured by Hitachi High-Technologies Corporation), 10 mg of the measurement sample was heated to 220° C. in a N2 (300 ml/min) environment at a heating rate of 10° C./min. weight loss rate. The results are shown in Table 2.

Figure 107132564-A0202-12-0014-3
Figure 107132564-A0202-12-0014-3

<空隙試驗> <void test>

如圖2所示,在基板1上形成電極2、絕緣層3、乾膜層4及開口部5。具有這種構成的基板1例如藉由以下的方法製作。 As shown in FIG. 2 , electrodes 2 , insulating layers 3 , dry film layers 4 , and openings 5 are formed on the substrate 1 . The board|substrate 1 which has such a structure is manufactured by the following method, for example.

首先,在基板1(尺寸:250mm×75mm)上形成具有指定圖案的電極2及絕緣層3。絕緣層3只要可以形成液狀的阻焊劑、乾膜等具有指定膜厚之由絕緣成分形成的層,則藉由任意方法製作均可。另外,將絕緣層3的表面(上表面)的開口直徑做成為直徑85μm。 First, electrodes 2 and insulating layers 3 having a predetermined pattern were formed on a substrate 1 (dimension: 250 mm×75 mm). The insulating layer 3 may be produced by any method as long as a layer formed of an insulating component having a predetermined film thickness such as a liquid solder resist or a dry film can be formed. In addition, the opening diameter of the surface (upper surface) of the insulating layer 3 was set to be 85 μm in diameter.

接著,在絕緣層3上形成乾膜層4。乾膜層4藉由在基板1的指定範圍上黏貼乾膜來接觸絕緣層3(產品名:WB-5040、杜邦公司製),藉由對其進行指定圖案的曝光和顯影而形成。即,藉由曝光和顯影而去除前述乾膜的抗蝕劑成分之中想要形成焊料凸塊部分(電極2上)的抗蝕劑成分,在基板1上形成指定圖案的乾膜層4。另外,將乾膜層4的高度(厚度)為38μm、寬度做成為35μm,將乾膜層4的 表面(上表面)的開口直徑做成為直徑115μm,另外,將間距寬度(圖2的自A至B的距離)為150μm。由此,形成周圍被乾膜層4包圍的區域(開口部5)。 Next, the dry film layer 4 is formed on the insulating layer 3 . The dry film layer 4 is formed by contacting the insulating layer 3 (product name: WB-5040, manufactured by DuPont) with a dry film on a predetermined area of the substrate 1, and exposing and developing it in a predetermined pattern. That is, among the resist components of the dry film described above, the resist component for forming the solder bump portion (on the electrode 2 ) is removed by exposure and development, and the dry film layer 4 of a predetermined pattern is formed on the substrate 1 . In addition, the height (thickness) of the dry film layer 4 was 38 μm and the width was 35 μm. The opening diameter of the surface (upper surface) was 115 μm in diameter, and the pitch width (the distance from A to B in FIG. 2 ) was 150 μm. Thereby, the area|region (opening part 5) surrounded by the dry film layer 4 is formed.

然後,使用聚氨酯刮板,將實施例1~8及比較例1~7的各焊膏印刷於各基板1來填充到開口部5內。另外,印刷次數在一個方向上為10次。 Then, each of the solder pastes of Examples 1 to 8 and Comparative Examples 1 to 7 was printed on each of the substrates 1 using a urethane squeegee, and the openings 5 were filled. In addition, the number of times of printing was 10 times in one direction.

然後,將印刷有各焊膏的各基板1放入回流焊裝置(產品名:TNP25-538EM、(股)田村製作所製)中,按照圖1所示的溫度曲線在氮氣環境下(氧濃度100ppm以下)以無預熱、峰值溫度260℃、升溫速度及降溫速度2℃/秒之條件進行回流焊。然後,在該回流焊後,藉由去除在各基板1上殘留的助焊劑成分(助焊劑殘渣)及乾膜層4,而形成焊料凸塊。 Then, each substrate 1 on which each solder paste was printed was placed in a reflow soldering apparatus (product name: TNP25-538EM, manufactured by Tamura Co., Ltd.), followed by a temperature profile shown in FIG. 1 under a nitrogen atmosphere (oxygen concentration 100 ppm). Below) Reflow soldering is performed under the conditions of no preheating, peak temperature 260°C, heating rate and cooling rate 2°C/sec. Then, after the reflow soldering, the flux components (flux residues) and the dry film layer 4 remaining on the respective substrates 1 are removed to form solder bumps.

接著,在形成的焊料凸塊上塗布助焊劑(產品名:BF-30、(股)田村製作所製),在與上述焊料凸塊形成時的回流焊條件相同的條件下進行回流焊,製作各試驗基板。另外,乾膜層4的去除使用剝離液(產品名:CLEANTHROUGH A-04:花王(股)製),使用超聲波清洗裝置(產品名:ASU-3M、AS ONE(股)製)施加1分鐘振動而進行。另外,設置在各基板1上的焊墊數設為7200個。 Next, flux (product name: BF-30, manufactured by Tamura Co., Ltd.) was applied to the formed solder bumps, and reflow soldering was performed under the same conditions as the reflow soldering conditions at the time of forming the above-mentioned solder bumps to prepare each Test substrate. In addition, to remove the dry film layer 4, a peeling solution (product name: CLEANTHROUGH A-04: manufactured by Kao Co., Ltd.) was used, and vibration was applied for 1 minute using an ultrasonic cleaning apparatus (product name: ASU-3M, manufactured by AS ONE Co., Ltd.). and proceed. In addition, the number of pads provided on each substrate 1 was set to 7200.

對於製作的各試驗基板,使用X射線觀察裝置(產品名:XD7600 Diamond、Nordson Dage公司製),對於所形成的焊料凸塊之中的約500個藉由目視進行空隙觀察,測量這些焊料凸塊中產生的最大空隙直徑(%)及平均空隙直徑(%)、以及空隙直徑率10%以上的所產生的焊料凸塊的比例(空隙產生率(%)),按照以下的基準進行評價。將其結果示顯於表3。 About 500 of the formed solder bumps were visually observed for voids using an X-ray observation apparatus (product name: XD7600 Diamond, manufactured by Nordson Dage Corporation) for each of the produced test boards, and these solder bumps were measured. The maximum void diameter (%), average void diameter (%), and the proportion of generated solder bumps with a void diameter ratio of 10% or more (void generation rate (%)) were evaluated according to the following criteria. The results are shown in Table 3.

.最大空隙直徑(%) . Maximum void diameter (%)

◎:最大空隙直徑為0%以上且20%以下 ◎: The maximum void diameter is 0% or more and 20% or less

○:最大空隙直徑超過20%且為25%以下 ○: Maximum void diameter exceeds 20% and is 25% or less

△:最大空隙直徑超過25%且為30%以下 △: The maximum void diameter exceeds 25% and is 30% or less

×:最大空隙直徑超過30% ×: The maximum void diameter exceeds 30%

.平均空隙直徑(%) . Average void diameter (%)

○:平均空隙直徑為0%以上且15%以下 ○: The average void diameter is 0% or more and 15% or less

△:平均空隙直徑超過15% △: Average void diameter exceeds 15%

.空隙產生率(%) . Void generation rate (%)

◎◎:空隙產生率為0%以上且25%以下 ◎◎: The void generation rate is 0% or more and 25% or less

◎:空隙產生率超過25%且為35%以下 ◎: The void generation rate exceeds 25% and is 35% or less

○:空隙產生率超過35%且為45%以下 ○: The void generation rate exceeds 35% and is 45% or less

△:空隙產生率超過45%且為50%以下 △: The void generation rate exceeds 45% and is 50% or less

×:空隙产生率超過50% ×: The void generation rate exceeds 50%

<遺失凸塊試驗> <Missing bump test>

在與上述空隙試驗同樣的條件下製作各試驗基板。 Each test substrate was produced under the same conditions as the above-mentioned void test.

對於各試驗基板,測量發生了遺失凸塊的焊料凸塊數,按照以下的基準進行評價。將結果示於表3。 For each test substrate, the number of solder bumps with missing bumps was measured and evaluated according to the following criteria. The results are shown in Table 3.

○:無遺失凸塊(零發生) ○: No missing bumps (zero occurrence)

×:有丟失凸塊 ×: There are missing bumps

<回流焊後的助焊劑黏度> <Flux viscosity after reflow>

該黏度的測量中,首先,分別將實施例1~8及比較例1~7的各助焊劑4g放入鋁盤中,將它們載置於金屬網,使用回流焊裝置(產品名:TNP25-538EM、(股)田村製作所製)進行回流焊。另外,回流焊條件依據圖1所示的溫度曲線。 In the measurement of the viscosity, first, 4 g of each of the fluxes of Examples 1 to 8 and Comparative Examples 1 to 7 was put into an aluminum pan, placed on a metal mesh, and a reflow soldering apparatus (product name: TNP25- 538EM, manufactured by Tamura Manufacturing Co., Ltd.) for reflow soldering. In addition, the reflow soldering conditions are based on the temperature profile shown in FIG. 1 .

將回流焊後的各助焊劑恢復至常溫,使用E型黏度計(產品名:RE150U、東機產業(股)製)對其進行測量。另外,黏度測量條件設為轉速10rpm、測定溫度25℃。然後對於測量得到的黏度,按照以下的基準進行評價。將其結果示於表3。 Each flux after reflow was returned to normal temperature, and was measured using an E-type viscometer (product name: RE150U, manufactured by Toki Sangyo Co., Ltd.). In addition, the viscosity measurement conditions were made into 10 rpm of rotation speed and a measurement temperature of 25 degreeC. Then, the measured viscosity was evaluated according to the following criteria. The results are shown in Table 3.

◎:15Pa.s以下 ◎: 15Pa. s or less

○:超過15Pa.s且為25Pa.s以下 ○: More than 15Pa. s and is 25Pa. s or less

△:超過25Pa.s且為30Pa.s以下 △: More than 25Pa. s and is 30Pa. s or less

×:超過30Pa.s ×: More than 30Pa. s

Figure 107132564-A0202-12-0018-10
Figure 107132564-A0202-12-0018-10

如以上所示可知,使用各實施例的焊膏而形成的焊料凸塊的空隙試驗的結果(最大空隙直徑、平均空隙直徑及空隙產生率)也良好,而且遺失凸塊的發生抑制也非常良好。可知,特別是1分子中所含的碳數為18以上且24以下、尤其特別是1分子中所含的碳數為18以上且20以下的一元醇的混配量為40質量%以上且50質量%以下的實施例2~6能夠進一步提高抑制空隙產生的效果。 As can be seen from the above, the results of the void test (maximum void diameter, average void diameter, and void generation rate) of the solder bumps formed using the solder pastes of the respective Examples were also good, and the suppression of the occurrence of missing bumps was also very good. . It can be seen that the compounding amount of the monohydric alcohol whose carbon number contained in 1 molecule is 18 or more and 24 or less, especially the carbon number contained in 1 molecule is 18 or more and 20 or less is 40% by mass or more and 50% by mass. In Examples 2 to 6 having a mass % or less, the effect of suppressing the generation of voids can be further enhanced.

另一方面,使用了220℃下的失重率低的酯系溶劑的比較例1,其他助焊劑成分未完全熔化、而為無法用作助焊劑的狀態。如此,對於比較例1,由於為無法製作助焊劑及焊膏的狀態,因此對於各試驗的評價結果表述為「無法測量」。 On the other hand, in Comparative Example 1 using an ester-based solvent with a low weight loss rate at 220° C., the other flux components were not completely melted, and were in a state that could not be used as a flux. As described above, in Comparative Example 1, since it was in a state in which flux and solder paste could not be prepared, the evaluation results for each test were expressed as "unmeasurable".

另外可知,僅使用了除1分子中所含的碳數為18以上且24以下的一元醇之外的溶劑的比較例2~4及7難以抑制回流焊時的流動性降低,因此焊料凸塊中的空隙產生率均超過50%,其他空隙試驗結果和/或遺失凸塊試驗的結果也比各實施例的焊膏差。 In addition, it was found that in Comparative Examples 2 to 4 and 7 in which only a solvent other than a monohydric alcohol having a carbon number of 18 or more and 24 or less contained in one molecule was used, it was difficult to suppress the decrease in fluidity during reflow, and therefore the solder bumps The void generation rate in all of them exceeded 50%, and other void test results and/or missing bump test results were also worse than those of the solder pastes of the respective Examples.

進而可知,1分子中所含的碳數為18以上且24以下的一元醇的混配量相對於助焊劑總量不足30質量%的比較例5、及超過60質量%的比較例6中,空隙產生率超過50%。 Furthermore, it can be seen that in Comparative Example 5 in which the compounding amount of a monohydric alcohol having a carbon number of 18 or more and 24 or less contained in 1 molecule is less than 30 mass % with respect to the total amount of the flux, and in Comparative Example 6 in which it exceeds 60 mass %, The void generation rate exceeds 50%.

Claims (11)

一種助焊劑,其特徵在於,包含松香系樹脂、活性劑、觸變劑、以及溶劑,所述助焊劑包含1分子中所含的碳數為18以上且24以下的一元醇作為所述溶劑,所述一元醇的混配量相對於助焊劑總量為40質量%以上且50質量%以下,作為前述活性劑係包含聚8,13-二甲基-8,12-二十碳二酸酐。 A flux comprising a rosin-based resin, an activating agent, a thixotropic agent, and a solvent, wherein the flux contains a monohydric alcohol having a carbon number of 18 or more and 24 or less contained in one molecule as the solvent, The compounding quantity of the said monohydric alcohol is 40 mass % or more and 50 mass % or less with respect to the total amount of the flux, and poly-8,13-dimethyl-8,12-eicosanedioic anhydride is contained as the said activator system. 如申請專利範圍第1項所述的助焊劑,其特徵在於,所述一元醇的1分子中所含的碳數為18以上且20以下。 The flux according to claim 1, wherein the number of carbon atoms contained in one molecule of the monohydric alcohol is 18 or more and 20 or less. 如申請專利範圍第1項或第2項所述的助焊劑,其特徵在於,所述一元醇為支鏈型醇或不飽和醇。 The flux according to claim 1 or claim 2, wherein the monohydric alcohol is a branched alcohol or an unsaturated alcohol. 如申請專利範圍第1項或第2項所述的助焊劑,其特徵在於,所述一元醇選自油醇、異十八醇、異二十醇、2-辛基十二醇或2-癸基十四醇的至少一種。 The flux according to item 1 or item 2 of the claimed scope, wherein the monohydric alcohol is selected from oleyl alcohol, isostearyl alcohol, isoeicosanol, 2-octyldodecanol or 2- At least one of decyltetradecanol. 如申請專利範圍第3項所述的助焊劑,其特徵在於,所述一元醇選自油醇、異十八醇、異二十醇、2-辛基十二醇或2-癸基十四醇的至少一種。 The soldering flux according to item 3 of the claimed scope, wherein the monohydric alcohol is selected from oleyl alcohol, isostearyl alcohol, isoeicosanol, 2-octyldodecanol or 2-decyltetradecyl alcohol at least one of alcohols. 如申請專利範圍第1項或第2項所述的助焊劑,其特徵在於,所述助焊劑按照以升溫速度2℃/秒的條件自常溫升溫至峰值溫度260℃、達到該峰值溫度後以降溫速度2℃/秒的條件冷卻之回流焊條件進行了加熱後的黏度為30Pa.s以下。 The flux according to claim 1 or claim 2, characterized in that the flux is heated from room temperature to a peak temperature of 260°C at a temperature increase rate of 2°C/sec, and then decreases after reaching the peak temperature. The viscosity of the reflow soldering under the condition of cooling at a temperature rate of 2°C/sec after heating is 30Pa. s or less. 如申請專利範圍第3項所述的助焊劑,其特徵在於,所述助焊劑按照以升溫速度2℃/秒的條件自常溫升溫至峰值溫度260℃、達到該峰值溫度後以降溫速度2℃/秒的條件冷卻之回流焊條件進行了加熱後的黏度為30Pa.s以下。 The flux according to claim 3, wherein the flux is heated from room temperature to a peak temperature of 260°C at a temperature increase rate of 2°C/sec, and after reaching the peak temperature, the flux is cooled at a rate of 2°C The viscosity of the reflow soldering condition after cooling under the condition of / second was 30Pa after heating. s or less. 如申請專利範圍第4項所述的助焊劑,其特徵在於,所述助焊劑按照以升溫速度2℃/秒的條件自常溫升溫至峰值溫度260℃、達到該峰值溫度後以降溫速度2℃/秒的條件冷卻之回流焊條件進行了加熱後的黏度為30Pa.s以下。 The flux according to claim 4, wherein the flux is heated from room temperature to a peak temperature of 260°C at a temperature increase rate of 2°C/sec, and after reaching the peak temperature, the flux is cooled at a rate of 2°C The viscosity of the reflow soldering condition after cooling under the condition of / second was 30Pa after heating. s or less. 如申請專利範圍第5項所述的助焊劑,其特徵在於,所述助焊劑按照以升溫速度2℃/秒的條件自常溫升溫至峰值溫度260℃、達到該峰值溫度後以降溫速度2℃/秒的條件冷卻之回流焊條件進行了加熱後的黏度為30Pa.s以下。 The flux according to claim 5, wherein the flux is heated from room temperature to a peak temperature of 260°C at a temperature increase rate of 2°C/sec, and after reaching the peak temperature, the flux is cooled at a rate of 2°C The viscosity of the reflow soldering condition after cooling under the condition of / second was 30Pa after heating. s or less. 一種焊膏,其特徵在於,包含如申請專利範圍第1項至第9項中任一項所述的助焊劑、以及焊料合金粉末。 A solder paste characterized by comprising the flux according to any one of the first to ninth claims and a solder alloy powder. 一種焊料凸塊的形成方法,其特徵在於,在基板上形成電極部和第一絕緣層,在所述第一絕緣層上形成第二絕緣層,來在所述電極部上形成開口區域,印刷申請專利範圍第項10所述的焊膏來填充於所述電極部上的開口區域,對於在所述電極部上的開口區域填充有所述焊膏的所述基板進行加熱,而在所述基板上形成助焊劑殘渣,藉由去除所述助焊劑殘渣和所述第二絕緣層,形成焊料凸塊。 A method of forming a solder bump, characterized in that an electrode portion and a first insulating layer are formed on a substrate, a second insulating layer is formed on the first insulating layer, an opening region is formed on the electrode portion, and printing is performed. The opening area of the electrode portion is filled with the solder paste according to claim 10, the substrate in which the solder paste is filled in the opening area of the electrode portion is heated, and the solder paste is filled in the opening area of the electrode portion. Soldering flux residues are formed on the substrate, and solder bumps are formed by removing the fluxing residues and the second insulating layer.
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