TWI777345B - Device for measuring optoelectronic units - Google Patents

Abstract

The invention discloses a device for measuring optoelectronic units, which comprises an objective lens, a focus adjustment module, and a photographing module. The objective lens is arranged on a first light path to receive a first testing light and convert the first testing light into a second testing light. The focus adjustment module is arranged on the first light path to receive the second testing light to reflect a third testing light, and is controlled by a test instruction to adjust the third testing light to focus at a first position or a second position on the second light path. The photographing module is arranged on the second light path to measure beam characteristics of the third testing light.

Description

Photoelectric element characteristic measuring device

The present invention relates to a measuring device for electronic components, in particular to a measuring device for inspecting the characteristics of optoelectronic components.

With the advancement of optoelectronic technology, it is currently known that lasers can be generated from many media, for example, lasers can be generated through media such as gas, chemical or semiconductor. At present, it is more common to generate lasers through semiconductors on the market, and such semiconductors are generally referred to as laser diodes. In practice, after the laser diode is manufactured, many optical inspections are required to ensure the stability of the laser quality. However, many measurement items require frequent movement of the object plane of the objective lens, the image plane of the imaging mirror, or the camera position when detecting the laser light emitted by the laser diode. For example, when the measurement item is to measure near-field parameters such as beam waist (beam waist), divergence angle (divergence angle) and numerical aperture (NA) of related beam characteristics, the objective lens, imaging mirror or camera will be moved by at least 4 The parameters of these beam characteristics can be obtained only at a position. Those with ordinary knowledge in the art can understand that frequently moving any optical element in the optical system will cause the system to vibrate frequently, which not only makes the measurement conditions unstable, but also easily produces measurement errors.

Accordingly, the industry needs a new device for measuring the characteristics of optoelectronic components, in addition to being able to quickly measure parameters related to beam characteristics, it should also avoid moving the optical components during the measurement process, so as to maintain the stability of the optical system.

The invention provides a photoelectric element characteristic measuring device, which can be used to detect multiple near-field parameters related to beam characteristics of a laser diode, and can maintain the stability of the optical system during the measurement process.

The invention provides a photoelectric element characteristic measuring device, which includes an objective lens, a focus adjustment module and a photographing module. The objective lens is arranged on the first light path, and is used for receiving the first light to be measured and converting the first light to be measured into the second light to be measured. The focus adjustment module is arranged on the first light path, and is used for receiving the second light to be measured to reflect the third light to be measured, and controlled by the test instruction to adjust the third light to be measured to focus on the second light path the first or second position. The photographing module is arranged on the second light path and is used for measuring the beam characteristic of the third light to be measured.

In some embodiments, the photoelectric element characteristic measuring device may further include a beam splitter, the beam splitter is disposed between the objective lens and the focus adjustment module, and projects the third light to be measured toward the photographing module. In addition, the focus adjustment module may include a reflective spatial light modulator, the reflective spatial light modulator includes a plurality of pixels, each pixel corresponds to a liquid crystal cell, and the test command can be used to adjust the deflection angle of the liquid crystal cell. In addition, the photoelectric element characteristic measuring device may further include a front polarization unit and an analyzer unit, and the front polarization unit is disposed between the objective lens and the beam splitter for polarizing the second light to be measured. The polarizing unit is arranged between the beam splitter and the photographing module, and is used for filtering the noise of the third light to be measured.

In some embodiments, the focus adjustment module may include a substrate, a plurality of micro-support columns and a flexible reflective film, the plurality of micro-support columns are connected between the substrate and the flexible reflective film, and a test command is used to adjust the The lengths of the plurality of micro-support columns are used to change the position where the flexible reflective film focuses the third light to be measured. In addition, the focus adjustment module may include a micro-mirror array, the micro-mirror array includes a plurality of micro-mirrors, and each micro-mirror is controlled by a test command to adjust the deflection angle, so as to change the focus of the micro-mirror array on the third to-be-tested position of the light.

To sum up, the photoelectric element characteristic measuring device provided by the present invention can detect a plurality of near-field parameters related to the beam characteristics of the laser diode by adjusting the position where the focus adjustment module focuses the light to be measured, so that no movement is required. Optical components such as objective lenses or imaging mirrors in the optical system can maintain the stability of the optical system.

1: Photoelectric element characteristic measurement device

10: Objective lens

12: Focus adjustment module

120: Flexible reflective film

120a: Surface

122: Substrate

122a: Surface

124: Micro support column

126: Spacer

128: Electrodes

14: Photography module

16: Beamsplitter

2: Photoelectric element characteristic measurement device

20: Objective lens

22: Focus adjustment module

220: Substrate

222a~222b: Electrodes

224: Transparent cover

226: Liquid crystal cell

24: Photography Module

26: Beamsplitter

280: Front bias unit

282: Analysis unit

3: Photoelectric element characteristic measurement device

30: Objective lens

32: Focus adjustment module

34: Photography Module

36: Beamsplitter

38: Imaging mirror

4: Photoelectric element characteristic measurement device

40: Objective lens

42: Focus adjustment module

44: Photography Module

46: Beamsplitter

48: Imaging mirror

480: Front bias unit

482: Analyzer unit

DUT: Laser Diode

D1~D3: Distance

L1~L2: Lens

H0~H1: length

P1: focal plane

FIG. 1 is a schematic diagram showing the structure of an apparatus for measuring characteristics of optoelectronic components according to an embodiment of the present invention.

FIG. 2 is a schematic diagram illustrating a structure of a focus adjustment module according to an embodiment of the present invention.

FIG. 3 is a schematic diagram illustrating the structure of an apparatus for measuring characteristics of optoelectronic components according to another embodiment of the present invention.

FIG. 4 is a schematic diagram illustrating a structure of a focus adjustment module according to another embodiment of the present invention.

FIG. 5 is a schematic diagram showing the structure of a photoelectric element characteristic measuring apparatus according to still another embodiment of the present invention.

FIG. 6 is a schematic diagram illustrating the structure of an apparatus for measuring characteristics of optoelectronic components according to another embodiment of the present invention.

The features, objects and functions of the present invention will be further disclosed below. However, the following descriptions are only examples of the present invention, and should not be used to limit the scope of the present invention, that is, any equivalent changes and modifications made according to the scope of the patent application of the present invention will still be the essence of the present invention, Without departing from the spirit and scope of the present invention, it should be regarded as a further embodiment of the present invention.

Please refer to FIG. 1 . FIG. 1 is a schematic diagram illustrating the structure of an apparatus for measuring characteristics of optoelectronic components according to an embodiment of the present invention. As shown in FIG. 1 , the photoelectric element characteristic measuring apparatus 1 of this embodiment is used to measure the relevant parameters of the light beam emitted by the photoelectric element, and the photoelectric element may refer to a laser diode DUT. This embodiment does not limit the type of the laser diode DUT, for example, the optoelectronic element may also be a gas laser element or a chemical laser element. Here, the photoelectric element characteristic measuring device 1 can be used to measure the beam characteristic of the laser diode DUT, especially the near field parameters of the laser light emitted by the laser diode DUT. For example, the photoelectric element characteristic measuring apparatus 1 can be used to measure near-field parameters such as beam waist (W ₀ ), divergence angle (θ), and numerical aperture (NA) of laser light. Generally speaking, when measuring the near-field parameters of the laser diode DUT, the optical system may include a movable objective lens or imaging lens, and the objective lens or imaging lens will move and scan within a certain range. However, the present embodiment proposes an optical structure that does not require an imaging mirror and does not need to move the objective lens. The photoelectric element characteristic measuring apparatus 1 shown in FIG. 1 includes an objective lens 10 , a focus adjustment module 12 , a photographing module 14 and a beam splitter 16 . Here, the photoelectric element characteristic measuring device 1 includes a first optical path and a second optical path, wherein the objective lens 10, the focus adjustment module 12 and the beam splitter 16 are arranged on the first optical path, and the photographic module 14 and the beam splitter are arranged on the first optical path. 16 is disposed on the second light path, and the beam splitter 16 is just at the intersection of the first light path and the second light path. Each element on the first optical path and the second optical path will be described in sequence below.

The objective lens 10 is aimed at the light-emitting side of the laser diode DUT, and is used for receiving the laser light (the first light to be measured) emitted by the laser diode DUT. The dotted line between the laser diode DUT and the objective lens 10 in FIG. 1 is used to indicate that the first light to be measured enters the photoelectric element characteristic measuring device 1 along the first optical path, and is not used to limit the actual objective lens 10 The size of the laser diode DUT also does not limit the angle at which the laser diode DUT emits the first light to be measured. Different from the laser transmitter that has been assembled, here refers to The laser diode DUT has not been assembled with a proper lens, so the laser light (the first light to be measured) emitted by the laser diode DUT is not parallel light. Those skilled in the art know that if the light source is placed on the focal plane of one side of the convex lens, the light emitted by the light source can be converted into parallel light and emitted from the other side of the convex lens due to the optical properties of the convex lens. In one example, the objective lens 10 may be a convex lens, and the distance between the objective lens 10 and the laser diode DUT may be fixed. For example, the laser diode DUT can be placed on the focal plane of the light incident side of the objective lens 10, so that the non-parallel laser light (the first light to be measured) can be converted into parallel laser light (the second light to be measured) light). In other words, the laser diode DUT and the objective lens 10 do not move relative to each other, and the objective lens 10 can convert the first light to be measured into the second light to be measured with parallel beam characteristics.

In the example shown in FIG. 1 , the second light to be measured from the direction of the objective lens 10 will enter the beam splitter 16 along the first optical path, and the second light to be measured entering the beam splitter 16 can penetrate to the focus adjustment mode Group 12. As shown in FIG. 1 , the dotted line from the objective lens 10 to the beam splitter 16 and then from the beam splitter 16 to the focus adjustment module 12 is used to indicate the direction of the second light to be measured along the first light path. travel route. In practice, in order to reduce the volume of the optical system, or to make the optical components easier to erect and adjust, those skilled in the art can understand the purpose of the beam splitter 16, which is not repeated in this embodiment. Here, the focus adjustment module 12 has an element (not shown in FIG. 1 ) that can reflect light inside to reflect the second light to be measured. In this embodiment, the light reflected by the focus adjustment module 12 is referred to as the third light light to be measured. In one example, the second light to be measured before entering the focus adjustment module 12 is parallel light, and the third light to be measured leaving the focus adjustment module 12 becomes non-parallel light and can be focused on a specific position.

Following the above, since the third light to be measured is already a non-parallel laser light, it will gradually focus as the light progresses. Taking the example of FIG. 1 as an example, the second light to be measured is vertically incident on the focus adjustment module 12, so the third light to be measured (the reflected second light to be measured) leaving the focus adjustment module 12 should be Back to beam splitter 16 along the original optical axis. Next, after receiving the third light to be measured reflected by the focus adjustment module 12 , the beam splitter 16 guides the reflected third light to be measured to the photographing module 14 . In other words, in this embodiment, the focus adjustment module 12 is used to focus light without adding an imaging mirror. For example, the photoelectric element characteristic measuring device 1 in this embodiment does not have a tube lens. In addition, because the laser light is converted into parallel light (the second light to be measured) by the objective lens 10, it can theoretically be transmitted to any distance on a straight line, which is also equivalent to extending the length of the first light path.

In one example, this embodiment does not limit the distance D1 between the objective lens 10 and the beam splitter 16 , for example, there is an opportunity to lengthen the distance D1 so that more optical elements can be placed between the objective lens 10 and the beam splitter 16 . However, those skilled in the art know that the parallel light (the second light to be measured) cannot be imaged effectively due to the reason that it is not focused (no focus). Therefore, the focus adjustment module 12 needs to have an optical structure inside that can focus the incident light, so that the parallel laser light (the second light to be measured) can be converted into non-parallel laser light after passing through the focus adjustment module 12 ( The third light to be measured), and the third light to be measured can be imaged, so as to measure the characteristics of the beam. In practice, the focus adjustment module 12 can focus the third light to be measured at multiple focal positions (variable focus), in order to explain the internal structure of the focus adjustment module 12 and how the focus adjustment module 12 changes the third light to be measured. Please refer to Figure 1 and Figure 2 together for the position where the metering beam is focused.

FIG. 2 is a schematic diagram illustrating a structure of a focus adjustment module according to an embodiment of the present invention. As shown, the focus adjustment module 12 may include a flexible reflective film 120 , a substrate 122 , a plurality of micro-support pillars 124 , a plurality of spacers 126 and a plurality of electrodes 128 . The surface 120a on one side of the flexible reflective film 120 may face the beam splitter 16 and can reflect the second light to be measured, and a plurality of positions on the other side of the flexible reflective film 120 may be respectively connected to a micro-support column 124 . Here, both ends of the micro-supporting column 124 may be connected between the substrate 122 and the flexible reflective film 120 respectively, and the micro-supporting column 124 should be slightly elastic. This embodiment does not limit the flexible reflection the material of the injection film 120. In order to strengthen the structural strength of the substrate 122 , a plurality of spacers 126 may also be disposed inside the substrate 122 to prevent the substrate 122 from being damaged by the stress exerted by the micro-support pillars 124 . In addition, microstructures may be formed on the surface 122a of the substrate 122, and the microsupport pillars 124 may be disposed on the microstructures. Assuming that the plurality of micro-support pillars 124 are of equal length in a preset state, the shape of the surface 120a of the flexible reflective film 120 supported by the plurality of micro-support pillars 124 will be close to the shape of the surface 122a. Of course, if the plurality of micro-support pillars 124 are not of equal length in the preset state, the shape of the surface 120a is not only related to the shape of the surface 122a, but also related to the preset lengths of the micro-support pillars 124 at different corresponding positions.

In one example, the micro-support columns 124 can be deformed under the control of the voltage applied to the corresponding electrodes 128 , for example, the micro-support columns 124 can be contracted or extended to adjust the length. In practice, the voltage applied to the electrodes 128 is related to the test command received by the focus adjustment module 12 . For example, the test command can set or control the voltages to be applied by the plurality of electrodes 128 , and the length of the micro-support column 124 is determined by the magnitude of the voltage. Here, the length variation of the micro-support pillars 124 at different positions may be the same or different, which is not limited in this embodiment. In addition, since one end of the micro-support column 124 is connected to the flexible reflective film 120, when the length of the micro-support column 124 at a specific position changes, the flexible reflective film 120 at the corresponding position will be loosened or tightened. Accordingly, each position of the flexible reflective film 120 has different heights, so that the surface 120a forms a specific curved surface, and this curved surface can correspond to a specific focus. In other words, in this embodiment, the bending degree of the flexible reflective film 120 can be determined by changing the length of the micro support column 124 at each position, so as to change the focus position of the third light to be measured.

Taking a practical example, it is assumed that the length of the micro-support pillars 124 in the center of the flexible reflective film 120 is H0, and the length of the micro-support pillars 124 at the edge of the flexible reflective film 120 is H1. First, assume that the focus adjustment module 12 receives the first test command, and the first test command can instruct the corresponding electrode 128 to control the length H0 to be 10 distance units and the length H1 to be 12 distance units, so that the difference between H0 and H1 is 2 distance units. again Assuming that the focus adjustment module 12 receives the next test command, and the test command can indicate that the length H0 is 10 distance units and the length H1 is 13 distance units, the difference between H0 and H1 can be changed to 3 distance units . It can be seen from the above that the first test command can make the difference between the micro-support pillars 124 in the center and the edge of the flexible reflective film 120 smaller, and the surface 120a is less curved (flatter) at this time. On the contrary, the second test command can make the micro-support pillars 124 in the center and the edge of the flexible reflective film 120 differ greatly, and the surface 120a is more curved (more curved) at this time. It can be seen that under the two test commands, the bending degree of the flexible reflective film 120 is different, and the focus position of the third light to be measured is also different.

When the focus adjustment module 12 changes the degree of curvature of the surface 120a in a series, a plurality of third light rays to be measured with different focus positions are correspondingly generated, and these third light rays to be measured return to the beam splitter 16 along the opposite direction of the original optical axis. After that, they are all reflected by the beam splitter 16 to the photographing module 14 . The photographing module 14 and the beam splitter 16 are disposed on the second light path, and the photographing module 14 and the beam splitter 16 do not move relative to each other. In one example, the photographing module 14 measures the beam characteristics of the third light to be measured by using a plurality of thirds of light to be measured at different focus positions. As shown in FIG. 1 , the dotted line between the beam splitter 16 and the photographing module 14 is used to indicate that the third light to be measured reflected by the focus adjustment module 12 travels from the beam splitter along the second light path from the beam splitter 16 shoots out and enters the camera module 14. It is worth mentioning that this embodiment does not necessarily require the beam splitter 16. For example, as long as the third light to be measured does not exit the focus adjustment module 12 vertically (not along the original optical axis), the light reflected from the focus adjustment module 12 will It is possible that the third light to be measured can directly enter the photographing module 14 . In other words, in the absence of the beam splitter 16, as long as the incident angle of the second light to be measured and the outgoing angle of the third light to be measured are calculated, and the camera module 14 is placed in the correct position, it should be easy to A third light to be measured is received. In this embodiment, in order to make the description simple and easy to understand, the following description will still be made with the photoelectric element characteristic measuring apparatus 1 having the spectroscope 16 shown in FIG. 1 .

In one example, the distance D3 between the beam splitter 16 and the photographing module 14 is assumed, and the distance D2 plus the distance D3 may be the preset focus position (eg, the first position) of the focus adjustment module 12 . In practice, the photographing module 14 has a focal length that can be captured (for example, a certain distance range on the second light path), and after the focus adjusting module 12 adjusts the degree of curvature of the surface 120a, the third light to be measured can be focused on the new light. The second position should still be within the focal length that the camera module 14 can capture. In other words, since the third light to be measured is focused in the focal length that can be captured by the camera module 14, it should be able to be imaged in the lens of the camera module 14, so that the camera module 14 can measure the beam of the third light to be measured Properties such as near-field parameters such as beam waist, divergence angle, and numerical aperture.

Of course, the focus adjustment module of the present invention is not limited to a flexible reflective film, for example, it may also be a reflective spatial light modulator. Please refer to FIG. 3 and FIG. 4 together. FIG. 3 is a schematic diagram illustrating the structure of a photoelectric device characteristic measuring apparatus according to another embodiment of the present invention, and FIG. 4 is a schematic diagram illustrating a focus adjustment module according to another embodiment of the present invention. Schematic diagram of the architecture. As shown in the figure, as in the previous embodiment, the photoelectric element characteristic measuring device 2 shown in FIG. In addition, the objective lens 20, the focus adjustment module 22 and the beam splitter 26 are also arranged on the first optical path, and the photographing module 24 and the beam splitter 26 are also arranged on the second optical path. Different from the previous embodiment, the focus adjustment module 22 can be a reflective spatial light modulator, and because the reflective spatial light modulator operates on polarized light, the photoelectric element characteristic measuring device 2 also includes There is a forward bias unit 280 and an analyzer unit 282 . In practice, the front polarizing unit 280 may be an optical polarizer (polarizer) disposed between the objective lens 20 and the beam splitter 26, and the analyzer unit 282 may be an optical analyzer (analyzer) disposed between the beam splitter 26 and the beam splitter 26. Between the photography modules 24.

In one example, the objective lens 20 also receives the laser light (the first light to be measured) emitted by the laser diode DUT, and converts it into parallel laser light (the second light to be measured). The second light to be measured will be It passes through the front polarizing unit 280 to have the characteristics of polarized light, and then passes through the beam splitter 26 to the focus adjustment module 22 . The focus adjustment module 22 may include a substrate 220, electrodes 222a, electrodes 222b and a transparent cover plate 224, and a liquid crystal layer is filled between the electrodes 222a and 222b, and there are multiple groups of liquid crystal cells 226 in the liquid crystal layer. Here, each group of liquid crystal cells 226 may contain many liquid crystal particles, and different liquid crystal cells 226 may be defined in different pixels according to their positions. In addition, the electrode 222a and the electrode 222b can precisely control the voltage corresponding to each pixel. This embodiment does not describe how the electrodes apply voltage to control the liquid crystal particles in the pixel. Those skilled in the art can know that the liquid crystal particles in the liquid crystal cell 226 are controlled by the voltage difference between the electrode 222a and the electrode 222b to change the rotation angle. Similar to the previous embodiment, the second light to be tested will enter the focus adjustment module 22 from the transparent cover plate 224, and a plurality of test commands can set or control a plurality of voltages to be applied to the electrodes 222a and 222b, and are determined by the voltages. The size of φ determines the angle at which the liquid crystal unit 226 refracts the second light to be measured (or the deflection angle of the liquid crystal unit), so as to change the traveling direction of the second light to be measured in the focus adjustment module 22 .

The side of the substrate 220 or the electrode 222a facing the transparent cover plate 224 should be able to reflect light. After the second light to be measured passes through the plurality of liquid crystal cells 226 in the liquid crystal layer, the incident second light to be measured will be reflected by the substrate 220 or the electrode 222a. light. At this time, the second light to be measured after being reflected by the substrate 220 or the electrode 222a should be non-parallel light, which is also defined as the third light to be measured in this embodiment. Similar to the previous embodiment, multiple test instructions can make multiple third rays to be tested have different focus positions. After these third rays to be tested return to the spectroscope 26 along the opposite direction of the original optical axis, they will all be separated by the spectroscope. 26 is reflected toward the analyzer unit 282. Here, the third light to be detected will pass through the analyzer unit 282 to filter noise and then be received by the camera module 24 . In one example, the beam splitter 26 , the analyzer unit 282 and the camera module 24 are all disposed on the second optical path, and the beam splitter 26 , the analyzer unit 282 and the camera module 24 do not move relative to each other. In this way, the photographing module 24 can measure the beam characteristics of the third light beam to be measured according to the third light beam to be measured at a plurality of different focus positions.

Of course, in other examples, the focus adjustment module may also include a micro-mirror array (not shown). Similar to the example in FIG. 1 , the difference between the present embodiment and FIG. 1 is that the focus adjustment module does not necessarily include a flexible reflective film, but replaces the flexible reflective film with a micro-mirror array. The micro-mirror array may consist of a plurality of independently controlled micro-mirrors. Here, each micro-mirror can be controlled by the test command to adjust the deflection angle, so as to change the position where the micro-mirror array focuses the third light to be measured. Those skilled in the art can understand that the flexible reflective film has a continuous reflective surface, and the micro-mirror array can be a discontinuous reflective surface. However, when each micro-mirror is extremely small, as long as a plurality of micro-mirrors are closely arranged, the effect of the flexible reflective film of the foregoing embodiment should also be achieved. Accordingly, in this embodiment, how the micro-mirror array changes the focus position of the third light to be measured will not be repeated.

In addition, the present invention also provides another photoelectric element characteristic measuring apparatus. Please refer to FIG. 1 and FIG. 5 together. FIG. 5 is a schematic diagram illustrating the structure of the photoelectric element characteristic measuring apparatus according to another embodiment of the present invention. Similar to the embodiment shown in FIG. 1 , the photoelectric element characteristic measuring device 3 shown in FIG. 5 also has an objective lens 30 , a focus adjustment module 32 , a photographing module 34 and a beam splitter 36 . The focus adjustment module 32 may be similar to the structure shown in FIG. 2 , which will not be repeated in this embodiment. Unlike FIG. 1 , the photoelectric element characteristic measuring device 3 may further include an imaging mirror 38 , a lens L1 , and a lens L2 . Here, the imaging mirror 38 and the lens L1 are provided between the objective lens 30 and the beam splitter 36 and are located in the first optical path. In one example, the imaging mirror 38 may be a tube lens such that the objective lens 30 and the imaging mirror 38 form a microscope system with a fixed magnification.

Taking a practical example, the second light to be measured from the direction of the objective lens 30 will first enter the imaging mirror 38 along the first optical path, and the imaging mirror 38 can focus the second light to be measured on the focal plane P1, and the focal plane P1 may be exactly at the focal point of lens L1. Those skilled in the art can understand that after the second light to be measured enters the lens L1 from the position of the focal plane P1, the lens L1 will convert the second light to be measured into a Parallel light. Next, the second light to be measured emitted from the lens L1 enters the beam splitter 36 and penetrates to the focus adjustment module 32 . Similar to the aforementioned embodiment, the focus adjustment module 32 can reflect the second light to be measured, and the light reflected by the focus adjustment module 32 is called the third light to be measured. In one example, the second light to be measured before entering the focus adjustment module 32 is parallel light, and the third light to be measured leaving the focus adjustment module 32 becomes non-parallel light and can be focused on a specific position.

Following the above, since the third light to be measured is already a non-parallel laser light, it will gradually focus as the light progresses. Different from FIG. 1 , in this embodiment, in addition to using the focus adjustment module 32 to focus the light, the lens L2 can be used to focus the third light to be measured again, so that the optical path between the beam splitter 36 and the photographing module 34 can be comparable. In FIG. 1 , the optical path from the beam splitter 16 to the photographing module 14 is shorter. For example, the lens L2 can be a convex lens, and the focal plane of the lens L2 can be roughly the position of the lens of the photographic module 34, so that the third light to be measured can be focused on the focal length of the photographic module 34 through the lens L2. Inside. As mentioned above, since the third light to be measured is imaged in the lens of the camera module 34, the camera module 34 can measure the beam characteristics of the third light to be measured, such as near-field beam waist, divergence angle and numerical aperture, etc. parameter.

In one example, the focus adjustment module 32 is placed between the lens L1 and the lens L2, in order to be optically equivalent to the aperture (pupil) of the objective lens 30, so that the focus adjustment module 32 has no magnification during zooming. Variety. That is to say, the focus adjustment module 32 can be regarded as being placed on the relay pupil plane in the first optical path, and the relay aperture plane can be regarded as the plane where the aperture of the objective lens 30 is located. plane). In the example shown in FIG. 5 , the third light to be measured received by the camera module 34 eliminates the factor of magnification change, so the time required to perform magnification correction for different focus positions in the calculation or adjustment process can be reduced. Improve system performance more effectively.

In addition, the present invention proposes another photoelectric element characteristic measuring apparatus based on FIG. 3 . Please refer to FIGS. 3 , 5 and 6 together. FIG. 6 illustrates a photoelectric element characteristic measuring apparatus according to another embodiment of the present invention. Schematic diagram of the architecture. Similar to the embodiment shown in FIG. 3 , the photoelectric element characteristic measuring device 4 shown in FIG. 6 also has an objective lens 40 , a focus adjustment module 42 , a photographing module 44 and a beam splitter 46 . In addition, the objective lens 40, the focus adjustment module 42 and the beam splitter 46 are also arranged on the first optical path, and the photographing module 44 and the beam splitter 46 are also arranged on the second optical path. In addition, the focus adjustment module 42 can also be a reflective spatial light modulator, so that the optoelectronic element characteristic measuring device 4 also includes a forward polarization unit 480 and an analyzer unit 482 . In particular, similarly to the photoelectric element characteristic measuring device 3 shown in FIG. 5 , the photoelectric element characteristic measuring device 4 also includes an imaging mirror 48 , a lens L1 , and a lens L2 . Here, the principles of the imaging mirror 48 , the lens L1 and the lens L2 are the same as those in the previous embodiment, which will not be repeated in this embodiment. Those with ordinary knowledge in the art can understand that the third light to be measured received by the photographing module 44 in FIG. The time for magnification correction at different focus positions is more effective to improve system performance.

To sum up, the photoelectric element characteristic measuring device provided by the present invention can detect a plurality of near-field parameters related to the beam characteristics of the laser diode by adjusting the position where the focus adjustment module focuses the light to be measured, so that no movement is required. Optical components such as objective lenses or imaging mirrors in the optical system can maintain the stability of the optical system.

1: Photoelectric element characteristic measurement device 10: Objective lens 12: Focus adjustment module 14: Photography module 16: Beamsplitter DUT laser diode

Claims (7)

A photoelectric element characteristic measuring device, comprising: an objective lens disposed on a first light path for receiving a first light to be measured and converting the first light to be measured into a second light to be measured; A focus adjustment module, disposed on the first optical path, for receiving the second light to be measured to reflect a third light to be measured, and controlled by a test command to adjust the focus of the third light to be measured at a first location or a second location on a second optical path; and A photographing module is arranged on the second light path for measuring a beam characteristic of the third light to be measured. The photoelectric element characteristic measuring device as claimed in claim 1, further comprising: A beam splitter is arranged between the objective lens and the focus adjustment module, and is used for projecting the third light to be measured toward the photographing module. The photoelectric element characteristic measuring device according to claim 2, wherein the focus adjustment module comprises a reflective spatial light modulator, the reflective spatial light modulator comprises a plurality of pixels, each pixel corresponds to a liquid crystal cell, and the The test command is used to adjust the deflection angle of the liquid crystal cell. The photoelectric element characteristic measuring device according to claim 3, further comprising: a front polarizing unit, disposed between the objective lens and the beam splitter, for polarizing the second light to be measured; and An analyzer unit is arranged between the beam splitter and the photographing module, and is used for filtering the noise of the third light to be measured. The optoelectronic device characteristic measuring device according to claim 2, wherein the focus adjustment module comprises a substrate, a plurality of micro-support columns and a flexible reflective film, and the micro-support columns are connected between the substrate and the flexible reflective film During this time, the test command is used to adjust the lengths of the micro-support columns, so as to change the position where the flexible reflective film focuses the third light to be measured. The optoelectronic device characteristic measuring device according to claim 2, wherein the focus adjustment module comprises a micro-mirror array, the micro-mirror array comprises a plurality of micro-mirrors, and each of the micro-mirrors is controlled by the test command The deflection angle is adjusted to change the position where the micro-mirror array focuses the third light to be measured. The photoelectric element characteristic measuring device according to claim 1, wherein the first light to be measured is provided by a laser diode.

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