CN114689279A

CN114689279A - Photoelectric assembly characteristic measuring device

Info

Publication number: CN114689279A
Application number: CN202011635851.5A
Authority: CN
Inventors: 萧玮仁
Original assignee: Chroma ATE Suzhou Co Ltd
Current assignee: Chroma ATE Suzhou Co Ltd
Priority date: 2020-12-31
Filing date: 2020-12-31
Publication date: 2022-07-01

Abstract

The application provides a photoelectric component characteristic measuring device, which comprises an objective lens, a focus adjusting module and a photographing module. The objective lens is arranged on the first light path and used for receiving the first light to be detected and converting the first light to be detected into the second light to be detected. The focus adjusting module is arranged on the first light path and used for receiving the second light to be detected to reflect a third light to be detected, and is controlled by the test instruction to adjust the third light to be detected to focus on a first position or a second position on the second light path. The photographing module is arranged on the second light path and used for measuring the beam characteristics of the third light to be measured.

Description

Photoelectric assembly characteristic measuring device

Technical Field

The present application relates to a measuring device for an electronic component, and more particularly, to a measuring device for inspecting characteristics of an optoelectronic component.

Background

With the advance of electro-optical technology, it is known to generate laser light from many media, such as gas, chemical or semiconductor media. It is common to produce laser light through a semiconductor, which is generally called a laser diode. In practice, after the laser diode is manufactured, many optical inspections are performed to ensure the stability of the laser quality. However, many measurement items require frequent movement of the object plane of the objective lens, the image plane of the imaging mirror, or the camera position when detecting the laser light emitted by the laser diode. For example, when the measurement items are near field parameters such as beam waist (beam wax), divergence angle (divergence angle), and Numerical Aperture (NA) of the relevant beam characteristics, the parameters of the beam characteristics can be obtained by moving the objective lens, the imaging mirror, or the camera by at least 4 positions. It will be appreciated by those skilled in the art that frequent movement of any optical component in the optical system will cause the system to vibrate frequently, which is prone to measurement errors in addition to unstable measurement conditions.

Accordingly, there is a need for a new optoelectronic device characteristic measuring apparatus, which can not only rapidly measure parameters related to the characteristics of the light beam, but also avoid moving the optical device during the measurement process, so as to keep the stability of the optical system.

Disclosure of Invention

The present application is directed to provide an optoelectronic device characteristic measuring apparatus, which can be used to detect a plurality of near-field parameters of laser diode-related beam characteristics and maintain the stability of an optical system during the measurement process.

In some embodiments, the device for measuring characteristics of an optoelectronic device further includes a beam splitter disposed between the objective lens and the focus adjustment module for projecting the third light to be measured to the photographing module. In addition, the focus adjustment module may include a reflective spatial light modulator, the reflective spatial light modulator includes a plurality of pixels, each pixel corresponds to a liquid crystal cell, and the test command may be used to adjust a deflection angle of the liquid crystal cell. In addition, the device for measuring characteristics of the optoelectronic device further comprises a front polarization unit and an analyzing unit, wherein the front polarization unit is arranged between the objective lens and the spectroscope and is used for polarizing the second light to be measured. The polarization analyzing unit is arranged between the spectroscope and the photographing module and is used for filtering noise of the third light to be measured.

In some embodiments, the focus adjustment module may include a substrate, a plurality of micro-supporting pillars and a flexible reflective film, the plurality of micro-supporting pillars are connected between the substrate and the flexible reflective film, and the test command is used to adjust lengths of the plurality of micro-supporting pillars so as to change a position at which the flexible reflective film focuses the third light to be measured. In addition, the focus adjustment module may include a micro-mirror array including a plurality of micro-mirrors, each of the micro-mirrors being controlled by the test command to adjust the deflection angle, so as to change a position at which the micro-mirror array focuses the third light to be measured.

To sum up, the photoelectric component characteristic measuring device that this application provided just can detect a plurality of near field parameters of laser diode correlation beam characteristic through the position of adjusting focus adjustment module focus light that awaits measuring to need not to remove optical components such as objective or imaging mirror among the optical system, can keep optical system's stability.

Other features and embodiments of the present application will be described in detail below with reference to the drawings.

Drawings

In order to more clearly illustrate the embodiments of the present application or the technical solutions in the prior art, the drawings needed to be used in the description of the embodiments or the prior art will be briefly described below, it is obvious that the drawings in the following description are only some embodiments described in the present application, and other drawings can be obtained by those skilled in the art without creative efforts.

FIG. 1 is a schematic diagram of an optoelectronic device characteristic measurement apparatus according to an embodiment of the present application;

FIG. 2 is a block diagram of a focus adjustment module according to an embodiment of the present disclosure;

FIG. 3 is a schematic diagram of an optoelectronic device characteristic measurement apparatus according to another embodiment of the present application;

FIG. 4 is a block diagram of a focus adjustment module according to another embodiment of the present disclosure;

FIG. 5 is a schematic diagram of an optoelectronic device characteristic measurement apparatus according to yet another embodiment of the present application;

fig. 6 is a schematic diagram of an architecture of an optoelectronic device characteristic measurement apparatus according to another embodiment of the present application.

Description of the symbols

1: photoelectric assembly characteristic measuring device

10: objective lens 12: the focus adjustment module 120: flexible reflective film

120 a: surface 122: substrate 122 a: surface of

124: micro-support posts 126: spacer 128: electrode for electrochemical cell

14: the photographing module 16: spectroscopic 20: objective lens

2: photoelectric assembly characteristic measuring device

22: the focus adjustment module 220: substrates 222a to 222 b: electrode for electrochemical cell

224: transparent cover plate 226: liquid crystal cell 24: camera module

26: beam splitter 280: front bias unit 282: polarization detection unit

3: photoelectric assembly characteristic measuring device

30: objective lens 32: the focus adjustment module 34: camera module

36: beam splitter 38: imaging mirror 40: objective lens

4: photoelectric assembly characteristic measuring device

42: the focus adjustment module 44: the photographing module 46: spectroscope

48: imaging mirror 480: forward bias unit 482: polarization detection unit

DUT: laser diodes D1 to D3: distance L1-L2: lens and its manufacturing method

H0-H1: length P1: focal plane

Detailed Description

The positional relationship described in the following embodiments includes: top, bottom, left and right, unless otherwise indicated, are based on the direction in which elements in the drawings are depicted.

Referring to fig. 1, fig. 1 is a schematic diagram illustrating an architecture of an apparatus for measuring characteristics of an optoelectronic device according to an embodiment of the present disclosure. As shown in fig. 1, the optoelectronic device characteristic measuring apparatus 1 of the present embodiment is used for measuring relevant parameters of a light beam emitted by an optoelectronic device, which may be a laser diode DUT. The present embodiment is not limited to the type of laser diode DUT, for example, the optoelectronic device may be a gas laser device or a chemical laser device. The optoelectronic component characteristic measuring device 1 can be used for measuring beam characteristics of a laser diode DUT, in particular for measuring near field (near field) parameters of laser light emitted by the laser diode DUT. For example, the optoelectronic device characteristic measuring apparatus 1 can be used to measure the beam waist (W) of the laser beam₀) And near field parameters such as divergence angle (θ) and Numerical Aperture (NA). Generally, when measuring near field parameters of a laser diode DUT, the optical system may include a movable objective or imaging mirror that is moved to scan within a certain range. However, the present embodiment proposes an optical architecture that does not require an imaging mirror and does not require a moving objective lens. The optoelectronic device characteristic measuring apparatus 1 shown in fig. 1 includes an objective lens 10, a focus adjusting module 12, a photographing module 14, and a beam splitter 16. Here, the optoelectronic component characteristic measuring apparatus 1 includes a first optical path and a second optical path, wherein the objective lens 10, the focus adjusting module 12 and the beam splitter 16 are disposed on the first optical path, and the photographing module 14 and the beam splitter 16 are disposed on the second optical path, and the beam splitter 16 is just at the intersection of the first optical path and the second optical path. The components in the first optical path and the second optical path will be described in sequence.

The objective lens 10 is aligned with the light emitting side of the laser diode DUT and is used to receive the laser beam (the first light to be measured) emitted from the laser diode DUT. The dotted line between the laser diode DUT and the objective lens 10 in fig. 1 is used to show that the first light to be measured enters the optoelectronic device characteristic measuring apparatus 1 along the first optical path, and is not used to limit the size of the objective lens 10 and the laser diode DUT in practice, nor is it used to limit the angle at which the laser diode DUT emits the first light to be measured. Unlike the assembled laser emitter, the laser diode DUT is not assembled with a proper lens, so the laser beam (the first to-be-detected light beam) emitted by the laser diode DUT is not parallel. As will be appreciated by those skilled in the art, if the light source is disposed on the focal plane of one side of the convex lens, the light emitted from the light source can be converted into parallel light by the optical characteristics of the convex lens and then emitted from the other side of the convex lens. In one example, the objective lens 10 may be a convex lens, and the distance between the objective lens 10 and the laser diode DUT may be fixed. For example, the laser diode DUT may be placed on the focal plane on the light incident side of the objective lens 10, so that the non-parallel laser light (first measurement light) may be converted into parallel laser light (second measurement light). In other words, the laser diode DUT and the objective lens 10 do not move relatively, and the objective lens 10 can convert the first light to be measured into the second light to be measured with the parallel beam characteristic.

As shown in fig. 1, the second light to be measured from the objective lens 10 enters the beam splitter 16 along the first optical path, and the second light to be measured entering the beam splitter 16 can pass through to the focus adjustment module 12. As shown in fig. 1, a point line between the objective lens 10 and the beam splitter 16, and between the beam splitter 16 and the focus adjustment module 12 is used to indicate a path of the second light to be measured along the first light path. In practice, in order to reduce the volume of the optical system or to make the optical assembly easier to be installed and adjusted, a person skilled in the art can understand the purpose of the beam splitter 16, and the embodiment is not described herein again. Here, the focus adjustment module 12 has a component (not shown in fig. 1) capable of reflecting light inside to reflect the second light to be measured, and the light reflected by the focus adjustment module 12 is referred to as a third light to be measured in this embodiment. In one example, the second light to be measured before entering the focus adjustment module 12 is parallel light, and the third light to be measured leaving the focus adjustment module 12 becomes non-parallel light and can be focused on a specific position.

As mentioned above, the third test beam is a non-parallel laser beam, which is slowly focused as the beam advances. In the example of fig. 1, the second light to be measured is vertically incident to the focus adjustment module 12, so that the third light to be measured (the reflected second light to be measured) leaving the focus adjustment module 12 should return to the beam splitter 16 along the original optical axis. Then, the beam splitter 16 receives the third light to be measured reflected back from the focus adjustment module 12, and guides the reflected third light to be measured to the photographing module 16. In other words, the present embodiment focuses light by using the focus adjustment module 12, and does not need to add an additional imaging lens, for example, the optoelectronic device characteristic measuring apparatus 1 of the present embodiment does not have a tube lens (tube lens). In addition, since the laser beam is converted into parallel light (second measurement beam) by the objective lens 10, it can be transmitted to an arbitrary distance on a straight line theoretically, which also amounts to extending the length of the first optical path.

In one example, the distance D1 between the objective lens 10 and the beam splitter 16 is not limited in this embodiment, and for example, the distance D1 may be increased, so that more optical components are disposed between the objective lens 10 and the beam splitter 16. However, as known to those skilled in the art, the parallel light (the second light to be measured) has no focus (no focal point) and thus has no way to effectively image. Therefore, the focus adjustment module 12 needs to have an optical structure to focus the incident light, so that the parallel laser beam (the second light to be measured) can be converted into the non-parallel laser beam (the third light to be measured) after passing through the focus adjustment module 12, and the third light to be measured can be imaged, thereby facilitating the measurement of the beam characteristics. In practice, the focus adjustment module 12 can focus the third light to be measured at a plurality of focus positions (variable focus), and for explaining the internal structure of the focus adjustment module 12 and how the focus adjustment module 12 changes the focus position of the third light to be measured, please refer to fig. 1 and fig. 2 together.

Fig. 2 is a schematic diagram of a focus adjustment module according to an embodiment of the present application. As shown, the focus adjustment module 12 may include a flexible reflective film 120, a substrate 122, a plurality of micro-support posts 124, a plurality of spacers 126, and a plurality of electrodes 128. The surface 120a of one side of the flexible reflective film 120 faces the beam splitter 16 and can reflect the second light to be measured, and a plurality of locations of the other side of the flexible reflective film 120 can be respectively connected to a micro-supporting pillar 124. Here, two ends of the micro-supporting pillars 124 can be respectively connected between the substrate 122 and the flexible reflective film 120, and the micro-supporting pillars 124 should have slight elasticity, and the material of the flexible reflective film 120 is not limited in this embodiment. In order to strengthen the structural strength of the substrate 122, a plurality of spacers 126 may be disposed inside the substrate 122 to prevent the stress applied by the micro-supporting pillars 124 from damaging the substrate 122. In addition, microstructures may be formed on the surface 122a of the substrate 122, and the micro-supporting pillars 124 may be disposed on the microstructures. Assuming that the plurality of micro-support posts 124 are equal in length in a predetermined state, the shape of the surface 120a of the flexible reflective film 120 supported by the plurality of micro-support posts 124 is close to the shape of the surface 122 a. Of course, if the plurality of micro-support posts 124 are not equal in length in the predetermined state, the shape of the surface 120a may be associated with the predetermined lengths of the micro-support posts 124 at different corresponding positions in addition to the shape of the surface 122 a.

In one example, the micro-support posts 124 can be deformed under the control of an applied voltage to the corresponding electrodes 128, for example, the micro-support posts 124 can be contracted or extended to adjust the length. In practice, the applied voltage of the electrodes 128 is related to the test command received by the focus adjustment module 12, for example, the test command can set or control the voltage to be applied to the plurality of electrodes 128, and the length of the micro-support pillar 124 is determined by the voltage. Here, the length variation of the micro-support pillars 124 at different positions may be the same or different, and the embodiment is not limited thereto. In addition, since one end of the micro-supporting post 124 is connected to the flexible reflective film 120, when the length of the micro-supporting post 124 at a specific position is changed, the flexible reflective film 120 at the corresponding position is also loosened or tightened. Accordingly, each position of the flexible reflective film 120 has a different height, so that the surface 120a forms a specific curved surface, and the curved surface can correspond to a specific focus. In other words, the present embodiment can determine the bending degree of the flexible reflective film 120 by changing the length of the micro-supporting pillars 124 at each position, so as to change the focusing position of the third light to be measured.

For practical purposes, assume that the lengths of the micro-support posts 124 at the center of the flexible reflective film 120 are H0, and the lengths of the micro-support posts 124 at the edge of the flexible reflective film 120 are H1. First, assume that the focus adjustment module 12 receives a first test command, which may instruct the corresponding electrode 128 to control the length H0 to be 10 distance units and the length H1 to be 12 distance units, such that the difference between H0 and H1 is 2 distance units. Further, assuming that the focus adjustment module 12 receives the next test command indicating that the length H0 is 10 distance units and the length H1 is 13 distance units, the difference between H0 and H1 can be changed to 3 distance units. As can be seen from the above, the first test command can cause the micro-support posts 124 at the center and the edge of the flexible reflective film 120 to have a smaller difference, and the surface 120a is curved less (more gradually). Conversely, the second test command can cause the micro-support posts 124 at the center and the edge of the flexible reflective film 120 to have a larger difference, such that the surface 120a is more curved (more curved). It can be seen that under the two test commands, the degree of bending of the flexible reflective film 120 is different, and the focusing position of the third test light is also different.

When the focus adjustment module 12 changes the degree of curvature of the surface 120a in a series, a plurality of third light beams to be measured at different focusing positions are generated, and after the third light beams to be measured return to the beam splitter 16 along the opposite direction of the original optical axis, all of the third light beams to be measured are reflected to the photographing module 14 by the beam splitter 16. The photographing module 14 and the beam splitter 16 are disposed on the second optical path, and the photographing module 14 and the beam splitter 16 do not move relatively. In one example, the camera module 14 measures the beam characteristics of the third light to be measured through a plurality of third light to be measured at different focusing positions. As shown in fig. 1, a point between the beam splitter 16 and the photographing module 14 is a curved line, which is used to indicate that the third light to be measured reflected by the focus adjustment module 12 exits from the beam splitter 16 along the second light path and enters the photographing module 14. It should be noted that the beam splitter 16 is not necessarily required in this embodiment, for example, as long as the third light to be measured does not vertically exit the focus adjustment module 12 (not along the original optical axis), the third light to be measured reflected from the focus adjustment module 12 may possibly directly enter the photographing module 14. In other words, in the absence of the beam splitter 16, the third light to be measured can be easily received by calculating the incident angle of the second light to be measured and the emergent angle of the third light to be measured and placing the camera module 14 at the correct position. In order to simplify and simplify the description, the optoelectronic device characteristic measuring apparatus 1 with the spectroscope 16 shown in fig. 1 is described in the following.

In one example, assume the distance D3 between the beam splitter 16 and the camera module 14, and the distance D2 plus the distance D3 may be the default focus position (e.g., the first position) of the focus adjustment module 12. In practice, the photographing module 14 has a focus segment (e.g., a certain distance range on the second optical path) that can be imaged, and after the focus adjustment module 12 adjusts the curvature of the surface 120a, the third light to be measured can be focused at a new position (the second position), which should be still within the focus segment that can be imaged by the photographing module 14. In other words, the third light to be measured should be focused in the focal segment that the photographing module 14 can image, so that the photographing module 14 can measure the beam characteristics of the third light to be measured, such as the beam waist, the divergence angle, the numerical aperture and other near-field parameters.

Of course, the focus adjustment module of the present application is not limited to the flexible reflective film, and may be a reflective spatial light modulator, for example. Referring to fig. 3 and 4 together, fig. 3 is a schematic diagram of an architecture of an optoelectronic device characteristic measuring apparatus according to another embodiment of the present application, and fig. 4 is a schematic diagram of an architecture of a focus adjustment module according to another embodiment of the present application. As shown in the figure, the optoelectronic device characteristic measuring apparatus 2 shown in fig. 3 also has an objective lens 20, a focus adjusting module 22, a photographing module 24 and a beam splitter 26, which are the same as those in the previous embodiment. The objective lens 20, the focus adjustment module 22 and the beam splitter 26 are also disposed on the first optical path, and the photographing module 24 and the beam splitter 26 are also disposed on the second optical path. Unlike the previous embodiment, the focus adjustment module 22 may be a reflective spatial light modulator, and since the reflective spatial light modulator operates on polarized light, the optoelectronic device characteristic measuring apparatus 2 further includes a front polarization unit 280 and an analyzing unit 282. In practice, the forward-bias unit 280 may be an optical polarizer (polarizer) disposed between the objective lens 20 and the beam splitter 26, and the analyzer unit 282 may be an optical analyzer (analyzer) disposed between the beam splitter 26 and the camera module 24.

In one example, the objective lens 20 also receives the laser beam (first measurement beam) from the laser diode DUT and converts the laser beam into a parallel laser beam (second measurement beam). The second light to be measured passes through the front polarization unit 280 and has the property of polarized light, and then passes through the beam splitter 26 to the focus adjustment module 22. The focus adjustment module 22 may include a substrate 220, an electrode 222a, an electrode 222b, and a transparent cover 224, wherein a liquid crystal layer is filled between the electrode 222a and the electrode 222b, and the liquid crystal layer includes a plurality of liquid crystal cells 226. Here, each group of liquid crystal cells 226 may include a plurality of liquid crystal particles, and different liquid crystal cells 226 may be defined in different pixels according to their positions. In addition, the

electrodes

222a and 222b can precisely control the voltage corresponding to each pixel, and this embodiment does not describe how the electrodes apply the voltage to control the liquid crystal particles in the pixels. As known to those skilled in the art, the liquid crystal particles in the liquid crystal cell 226 change the rotation angle under the control of the voltage difference between the

electrodes

222a and 222 b. Similar to the previous embodiment, the second light to be measured enters the focus adjustment module 22 from the transparent cover 224, and the plurality of test commands can set or control a plurality of voltages to be applied to the

electrodes

222a and 222b, and determine an angle at which the liquid crystal cell 226 refracts the second light to be measured (or a deflection angle of the liquid crystal cell) according to the voltage, so as to change a traveling direction of the second light to be measured in the focus adjustment module 22.

The side of the substrate 220 or the electrode 222a facing the transparent cover 224 is reflective, and when the second light to be measured passes through the liquid crystal cells 226 in the liquid crystal layer, the incident second light to be measured is reflected by the substrate 220 or the electrode 222 a. At this time, the second measurement light reflected by the substrate 220 or the electrode 222a should be non-parallel light, and this embodiment is also defined as the third measurement light. Similar to the previous embodiment, the plurality of test commands can make a plurality of third test light beams have different focusing positions, and the third test light beams return to the beam splitter 26 along the opposite direction of the original optical axis and are reflected by the beam splitter 26 toward the polarization analyzing unit 282. Here, the third light to be measured passes through the polarization analyzing unit 282 to filter noise and then is received by the camera module 24. In one example, the beam splitter 26, the polarization analyzing unit 282 and the photographing module 24 are disposed on the second optical path, and the beam splitter 26, the polarization analyzing unit 282 and the photographing module 24 do not move relatively. Therefore, the photographing module 24 can measure the beam characteristics of the third light to be measured according to the third light to be measured at a plurality of different focusing positions.

Of course, in other examples, the focus adjustment module may further include a micro mirror array (not shown). Similar to the example of fig. 1, the difference between this embodiment and fig. 1 is that the focus adjustment module does not necessarily include a flexible reflective film, but replaces the flexible reflective film with a micro-mirror array. The micromirror array may be composed of a plurality of individually controlled micromirrors. Here, each micro-mirror can be controlled by the test command to adjust the deflection angle, so as to change the position of the micro-mirror array for focusing the third light to be tested. Those skilled in the art will appreciate that the flexible reflective film may have a continuous reflective surface and the array of micromirrors may have a discontinuous reflective surface. However, when each micromirror is very small, the effect of the flexible reflective film of the foregoing embodiment should be equally achieved as long as the micromirrors are closely arranged. Accordingly, how the micromirror array changes the focus position of the third light to be measured is not repeated in this embodiment.

In addition, another optoelectronic device characteristic measurement apparatus is provided, please refer to fig. 1 and fig. 5 together, and fig. 5 is a schematic structural diagram of an optoelectronic device characteristic measurement apparatus according to another embodiment of the present application. As in the embodiment shown in fig. 1, the optoelectronic device characteristic measuring apparatus 3 shown in fig. 5 also has an objective lens 30, a focus adjusting module 32, a photographing module 34 and a beam splitter 36. The focus adjustment module 32 may be similar to the structure shown in fig. 2, and is not described herein again. Unlike fig. 1, the optoelectronic device characteristic measurement apparatus 3 may further include an imaging mirror 38, a lens L1, and a lens L2. Here, the imaging mirror 38 and the lens L1 are disposed between the objective lens 30 and the beam splitter 36 and are located in the first optical path. In one example, the imaging lens 38 may be a tube lens (tube lens), such that the objective lens 30 and the imaging lens 38 form a microscope system with a fixed magnification.

In a practical example, the second object light from the objective lens 30 enters the imaging mirror 38 along the first optical path, the imaging mirror 38 can focus the second object light at the focal plane P1, and the focal plane P1 can be exactly at the focal point of the lens L1. As will be understood by those skilled in the art, after the second measurement light enters the lens L1 from the position of the focal plane P1, the lens L1 converts the second measurement light into parallel light. Then, the second light to be measured emitted from the lens L1 enters the beam splitter 36 and passes through to the focus adjustment module 32. As in the previous embodiments, the focus adjustment module 32 may reflect the second light to be measured, and the light reflected by the focus adjustment module 32 is referred to as a third light to be measured. In one example, the second light to be measured before entering the focus adjustment module 32 is parallel light, and the third light to be measured leaving the focus adjustment module 32 becomes non-parallel light and can be focused on a specific position.

As mentioned above, the third test beam is a non-parallel laser beam, which is slowly focused as the beam advances. Different from fig. 1, in this embodiment, in addition to focusing the light by the focus adjustment module 32, the lens L2 may be used to focus the third light to be measured again, so that the optical path from the beam splitter 36 to the photographing module 34 may be shorter than the optical path from the beam splitter 16 to the photographing module 14 in fig. 1. For example, the lens L2 may be a convex lens, and the focal plane of the lens L2 may be substantially the lens position of the photographing module 34, so that the third light to be measured can be focused in the focal segment of the photographing module 34 through the lens L2. As mentioned above, since the third light to be measured is imaged in the lens of the photographing module 34, the photographing module 34 can measure beam characteristics of the third light to be measured, such as near-field parameters of beam waist, divergence angle, and numerical aperture.

In one example, the focus adjustment module 32 is disposed between lens L1 and lens L2, and is intended to be optically aligned with the aperture (pupil) of the objective lens 30, such that the focus adjustment module 32 does not change magnification when zooming. That is, the focus adjustment module 32 can be regarded as being disposed on a relay aperture plane (relay pulse plane) in the first optical path, and the relay aperture plane can be regarded as a plane (relay pulse plane) where the aperture of the objective lens 30 is located optically. In the example shown in fig. 5, the third light to be measured received by the photographing module 34 eliminates the variation factor of the magnification, so that the time required for performing magnification correction on different focusing positions in the calculation or adjustment process can be reduced, and the system performance can be more effectively improved.

In addition, the present application further provides an optoelectronic device characteristic measurement apparatus based on fig. 3, please refer to fig. 3, fig. 5 and fig. 6, wherein fig. 6 is a schematic configuration diagram of an optoelectronic device characteristic measurement apparatus according to another embodiment of the present application. Like the embodiment shown in fig. 3, the optoelectronic device characteristic measuring apparatus 4 shown in fig. 6 also has an objective lens 40, a focus adjusting module 42, a photographing module 44 and a beam splitter 46. The objective lens 40, the focus adjustment module 42 and the beam splitter 46 are also disposed on the first optical path, and the photographing module 44 and the beam splitter 46 are also disposed on the second optical path. In addition, the focus adjusting module 42 may also be a reflective spatial light modulator, so that the optoelectronic device characteristic measuring apparatus 4 may also include a front bias unit 480 and an analyzing unit 482. In particular, the optoelectronic device characteristic measuring apparatus 4 includes an imaging mirror 48, a lens L1 and a lens L2, similarly to the optoelectronic device characteristic measuring apparatus 3 shown in fig. 5. Here, the principles of the imaging mirror 48, the lens L1 and the lens L2 are the same as those of the previous embodiment, and the description of this embodiment is omitted here. As will be understood by those skilled in the art, the third light to be measured received by the photographing module 44 of fig. 6 also eliminates the variation factor of the magnification, so that the time required for performing magnification correction on different focusing positions in the calculation or adjustment process can be reduced, and the system performance can be improved more effectively.

The above-described embodiments and/or implementations are only illustrative of the preferred embodiments and/or implementations for implementing the technology of the present application, and are not intended to limit the implementations of the technology of the present application in any way, and those skilled in the art can make many changes and modifications to the other equivalent embodiments without departing from the scope of the technology disclosed in the present disclosure, but should be regarded as the technology and implementations substantially the same as the present application.

Claims

1. An apparatus for measuring characteristics of an optoelectronic device, comprising:

the objective lens is arranged on a first light path and used for receiving a first light to be detected and converting the first light to be detected into a second light to be detected;

a focus adjusting module, disposed on the first optical path, for receiving the second light to be detected to reflect a third light to be detected, and adjusting the third light to be detected to focus on a first position or a second position on a second optical path under the control of a test instruction; and

and the photographing module is arranged on the second light path and used for measuring a light beam characteristic of the third light ray to be measured.

2. The apparatus of claim 1, further comprising:

and the beam splitter is arranged between the objective lens and the focus adjusting module and is used for projecting the third light to be detected to the photographing module.

3. The apparatus of claim 2, wherein the focus adjustment module comprises a reflective spatial light modulator, the reflective spatial light modulator comprises a plurality of pixels, each of the pixels corresponds to a liquid crystal cell, and the test command is used to adjust a deflection angle of the liquid crystal cell.

4. The device of claim 3, further comprising:

a front polarization unit arranged between the objective lens and the spectroscope and used for polarizing the second light to be measured; and

and the polarization analyzing unit is arranged between the spectroscope and the photographing module and is used for filtering the noise of the third light to be detected.

5. The apparatus of claim 2, wherein the focus adjustment module comprises a substrate, a plurality of micro-supporting pillars and a flexible reflective film, the micro-supporting pillars are connected between the substrate and the flexible reflective film, and the test command is used to adjust lengths of the micro-supporting pillars so as to change a position of the flexible reflective film for focusing the third light to be measured.

6. The apparatus of claim 2, wherein the focus adjustment module comprises a micro-mirror array, the micro-mirror array comprises a plurality of micro-mirrors, each micro-mirror is controlled by the test command to adjust a deflection angle, so as to change a position of the micro-mirror array to focus the third light to be measured.

7. The device of claim 1, wherein the first measurement light is provided by a laser diode.