TWI774041B - Gas-liquid mixing control system and control method - Google Patents

Abstract

A gas-liquid mixing regulation system includes a liquid supply device for supplying liquid, a liquid pressure regulating valve, a gas supply device for supplying gas, a gas pressure regulating valve, a mixing tank, an output pipeline and a non-electrically controlled flow regulating device; The mixing tank is connected to the liquid pressure regulating valve and the gas pressure regulating valve, wherein the liquid and gas are mixed in the mixing tank to form a mixed fluid; the first end of the output pipeline is connected to the mixing tank, and the second end is connected to the machine , so that the mixed fluid is output from the mixing tank through the output pipeline, and the mixed fluid in the first end has a third flow rate, and the mixed fluid in the second end has a fourth flow rate; non-electrically controlled flow regulation The device is communicated with the output pipeline, wherein the mixed fluid passing through the non-electrically controlled flow regulating device has a fifth flow; the first flow is greater than or equal to at least one of the fourth flow and the fifth flow. A gas-liquid mixing control method is also disclosed herein.

Description

Gas-liquid mixing control system and control method

The invention relates to a gas-liquid mixing system; in particular, it refers to a gas-liquid mixing control system and control method.

In the high-tech field, it is necessary to use a gas-liquid mixed fluid with a stable concentration to manufacture high-tech product components (eg, semiconductor chips, display devices, touch panels, etc.). This kind of gas-liquid mixed fluid with stable concentration is usually supplied to the manufacturing machine of the above-mentioned high-tech product parts in the form of fixed pressure and fixed flow rate.

Generally speaking, the gas-liquid mixed flow system uses an electronic control device (such as a mass flow controller; MFC, mass-flow controller) to adjust the pressure and flow of the liquid and gas input into the mixing tank, and then uses another electronic control device. To adjust the pressure and flow rate of the gas-liquid mixed fluid output to the manufacturing machine, the traditional control method of the gas-liquid mixed fluid needs to be regulated by an electronic control device, which in turn causes a heavy burden of power resource consumption, forming another type of Environmental issues.

Furthermore, since the above-mentioned traditional gas-liquid mixed fluid regulation method needs to be regulated by an electronic control device, and the flow rate of the gas-liquid mixed fluid that can be supplied by the related electronic control device is quite limited (for example, 6-8 LPM), if When there are multiple manufacturing machines that need to supply a large amount of gas-liquid mixed fluid (for example, 10~12LPM), multiple control units of gas-liquid mixed fluid must be connected in parallel to fully supply the flow rate of gas-liquid mixed fluid required by the manufacturing machine. Parallel multiple gas-liquid The control unit of the mixed fluid needs to occupy extra space in the workshop and consume a lot of power, which increases the manufacturing cost of the above-mentioned high-tech product components.

In addition, if the flow rate of the gas-liquid mixed fluid required by the manufacturing machine is low (for example, 2 to 4 LPM), it will exceed the control capability range of the relevant electronic control device, so that the related parameters such as the concentration ratio of the gas-liquid mixed fluid are out of balance. Meet the use requirements of the above-mentioned manufacturing machines.

To sum up, the existing gas-liquid mixing control systems and control methods still need to be improved to improve many problems existing in the traditional gas-liquid mixing control systems and control methods.

In view of this, the purpose of the present invention is to provide a gas-liquid mixing control system and control method, which can perform the output flow control of the gas-liquid mixed fluid in a non-electrically controlled manner, and can supply a large flow range (for example, 2~16LPM), and then It is convenient to use a single gas-liquid mixing control system to meet the flow requirements of low-flow (2~4LPM) and high-flow (10~14LPM) gas-liquid mixed fluids. In addition, the gas-liquid mixing control system and control method provided by the present invention do not need to use electric power for control, so the consumption of electric power resources can be avoided, and the environmental protection requirements of the new type of manufacturing industry are met.

In order to achieve the above purpose, the present invention provides a gas-liquid mixing control system, comprising: a liquid supply device, a liquid pressure regulating valve, a gas supply device, a gas pressure regulating valve, a mixing tank body, and an output pipeline And a non-electrically controlled flow regulating device, wherein the liquid supply device is used to provide a liquid with a first fixed pressure and a first flow rate; the liquid pressure regulating valve is communicated with the liquid supply device to keep the liquid in the a first fixed pressure and a first flow; the gas supply device is used to provide a gas with a second fixed pressure and a second flow; the gas pressure regulating valve is communicated with the gas supply device to keep the gas At a second fixed pressure and a second flow rate, wherein the second fixed pressure of the gas is greater than the liquid the first fixed pressure; the mixing tank is connected to the liquid pressure regulating valve and the gas pressure regulating valve, the liquid pressure regulating valve is arranged between the liquid supply device and the mixing tank, and the gas pressure regulating valve is arranged at The gas supply device and the mixing tank are connected to the liquid supply device and the gas supply device, wherein the liquid pressure regulating valve liquid supply device inputs the liquid to the mixing at the first fixed pressure and the first flow rate inside the tank, and the gas pressure regulating valve gas supply device inputs the gas into the mixing tank at the second fixed pressure and the second flow rate, and the liquid and the gas are mixed in the mixing tank to form a mixed fluid; A first end of the output pipeline is connected to the mixing tank, the mixing tank and the mixed fluid in the output pipeline have the same pressure, and a second end of the output pipeline is connected to in at least one machine, so that the mixed fluid is output from the mixing tank to the at least one machine through the output pipeline, and the mixed fluid in the first end has a third flow rate, and the second end The mixed fluid in has a fourth flow; the non-electrically controlled flow regulating device is communicated with the output pipeline, wherein the mixed fluid passing through the non-electrically controlled flow regulating device has a fifth flow; wherein, the first flow is greater than or equal to at least one of the fourth flow and the fifth flow.

Another object of the present invention is to provide a gas-liquid mixing control method, which includes at least the following steps: providing a liquid with a first fixed pressure and a first flow rate in a mixing tank; providing a second fixed pressure and a liquid A second flow of a gas in the mixing tank, wherein the second fixed pressure of the gas is greater than the first fixed pressure of the liquid; mixing the liquid and the gas in the mixing tank to form a mixed fluid; and Through an output pipeline, the mixed fluid is output from the mixing tank to at least one machine, wherein the mixing tank and the mixed fluid in the output pipeline have the same pressure, and a first end of the output pipeline communicated with the mixing tank, and a second end thereof is communicated with the at least one machine, and the mixed fluid in the first end has a third flow rate, and the mixed fluid in the second end has a fourth flow; the output pipeline is communicated with a non-electrically controlled flow regulating device, and the mixed fluid passing through the non-electronically controlled flow regulating device has a fifth flow; wherein, the first flow is greater than or equal to the first flow Three flow rates, and the first flow rate is greater than or equal to at least one of the fourth flow rate and the fifth flow rate.

The effect of the present invention is that the gas-liquid mixing control system and the control method utilize a non-electrically controlled flow control device to control the output flow of the gas-liquid mixed fluid, and can supply a large flow range (for example, 2-16 LPM), thereby facilitating the use of a single The gas-liquid mixing control system can meet the flow requirements of low-flow (2~4LPM) and high-flow (10~14LPM) gas-liquid mixed fluids. In addition, the gas-liquid mixing control system and control method provided by the present invention do not need to use electric power for control, so the consumption of electric power resources can be avoided, and the environmental protection requirements of the new type of manufacturing industry are met.

1: Gas-liquid mixing control system

10: Liquid supply device

12: Liquid pressure regulating valve

20: Gas supply device

22: Gas pressure regulating valve

24: Gas flow meter

30: mixing tank

32: drain device

34: Gas dispersion device

40: Output pipeline

40a: First end

40b: second end

41,42: Mechanical pressure flow measuring device

44: Conductivity meter

50: Non-electrically controlled flow adjustment device (back pressure valve)

52: Mechanical pressure flow measuring device

A,B,C,D: machine

F1: First flow

F3: The third flow

F4: Fourth flow

F5: Fifth flow

S02, S04, S06, S08: Steps

1 is a schematic diagram of a gas-liquid mixing control system according to a preferred embodiment of the present invention; FIG. 2 is a diagram showing the relationship between the inflow time and flow rate of liquid inflow and mixed fluid according to a preferred embodiment of the present invention; FIG. 3 is a traditional gas-liquid mixing The relationship diagram of the mixed fluid flow and pressure of the system; Fig. 4 is the relationship diagram of the equipment (machine) consumption of a preferred embodiment of the present invention and the total flow or pressure of the mixed fluid, wherein the systems with or without the back pressure valve are compared; FIG. 5 is a flow chart of a gas-liquid mixing control method according to a preferred embodiment of the present invention.

In order to explain the present invention more clearly, a preferred embodiment is given and described in detail as follows in conjunction with the drawings. Please refer to FIG. 1. FIG. 1 is a gas-liquid mixing regulator according to a preferred embodiment of the present invention. The schematic diagram of the control system 1 is shown, and the gas-liquid mixing control system 1 provided by the present invention can be used to mix water and carbon dioxide to form a carbon dioxide-water fluid, but it is not limited thereto. The chemical liquid dilution system 1 includes a liquid supply device 10 , a gas supply device 20 , a mixing tank 30 , an output pipeline 40 and a non-electrically controlled flow regulating device 50 .

In the embodiment of the present invention, the liquid supply device 10 is used to provide a liquid (for example, water) with a first fixed pressure and a first flow rate; the gas supply device 20 is used to provide a gas with a second fixed pressure and a second flow rate (for example, carbon dioxide).

In FIG. 1 , the mixing tank 30 is connected to the liquid supply device 10 and the gas supply device 20 . The liquid supply device 10 inputs the liquid into the mixing tank 30 at a first fixed pressure and a first flow rate, and a liquid pressure regulating valve 12 may be arranged between the liquid supply device 10 and the mixing tank 30 to control the flow of the liquid. The supply pressure is a fixed pressure directly supplied by the liquid supply device 10, and the gas supply device 20 inputs gas into the mixing tank 30 at a second fixed pressure and a second flow rate. The gas supply device 20 and the mixing tank 30 A gas pressure regulating valve 22 can be arranged therebetween to control the gas supply pressure or directly supply the demanded fixed pressure from the supply end, and a gas flow meter 24 is arranged between the gas supply device 20 and the mixing tank 30 to measure and The flow rate of the gas flowing into the mixing tank body 30 is regulated, and the liquid and the gas are mixed in the mixing tank body 30 to form a mixed fluid. In the embodiment of the present invention, the gas flow meter 24 may be, for example, a float flow meter, but is not limited thereto. In the embodiment of the present invention, the mixing tank body 30 is connected to the liquid pressure regulating valve 12 and the gas pressure regulating valve 22; the liquid pressure regulating valve 12 inputs liquid into the mixing tank body 30 at a first fixed pressure and a first flow rate, and The gas pressure regulating valve 22 inputs gas into the mixing tank 30 at a second fixed pressure and a second flow rate.

In the embodiment of the present invention, the liquid pressure regulating valve 12 includes a mechanical pressure flow measuring instrument for measuring the pressure and flow value of the liquid output by the liquid supply device 10, and measuring the liquid input first flow F1. In the embodiment of the present invention, the gas supply device 20 includes a The mechanical pressure flow measuring instrument is used to measure the pressure and flow value of the gas output from the gas supply device 20 . It is worth mentioning that the supply flow rate of liquid is L/min level, while the supply flow rate of gas is mL/min level. It is discharged from the discharge device 32, so that the third flow F3 of the mixed fluid in the mixing tank 30 and the first end 40a of the output pipeline 40 is almost the same as the first flow F1 when the liquid is input; in other words, the first flow F1 is greater than or equal to 1000 times the second flow rate, so the third flow rate F3 of the mixed fluid formed by mixing liquid and gas is approximately equal to the first flow rate F1. In the embodiment of the present invention, the second fixed pressure of the gas is greater than the first fixed pressure of the liquid.

In FIG. 1 , the first end 40a of the output pipeline 40 is communicated with the mixing tank 30 , and the second end 40b thereof is communicated with at least one machine A, B, C, D, so that the mixed fluid flows from the mixing tank 30 . It is output to machines A, B, C and D through the output pipeline 40 . In the embodiment of the present invention, the pressures of the mixed fluid in the mixing tank 30 and the output pipeline 40 are the same. In the embodiment of the present invention, the mixed fluid in the first end 40a of the output pipeline 40 has a third flow F3, and the mixed fluid in the second end 40b of the output pipeline 40 has a fourth flow F4, and the fourth flow F4 It is controlled by the valve bodies of machines A, B, C, and D. When a fixed pressure is maintained in the mixing tank 30, the more the valves of machines A, B, C, and D are opened, the more the valves in the mixing tank 30 are opened. The pressure is fixed, so that the flow through each nozzle of the same size will be the same, so the more valve bodies of machines A, B, C, and D are opened, the higher the value of the fourth flow F4. In the embodiment of the present invention, the fourth flow rate F4 of the second end 40b of the output pipeline 40 is equal to a demand of at least one of the machines A, B, C, and D for the mixed fluid.

In FIG. 1 , the non-electrically controlled flow regulating device 50 is connected to the output pipeline 40 , wherein the mixed fluid discharged to the outside of the system (outside the output pipeline 40 ) through the non-electronically controlled flow regulating device 50 has a fifth flow F5 . In the embodiment of the present invention, the first flow F1 is greater than or equal to the third flow F3, and the first flow F1 is greater than or equal to the fourth flow F4 and the fifth flow F5 In practice, the range of the first flow rate F1 may be, for example, 0~16LPM, the range of the third flow rate F3 may be, for example, 0~16LPM, the range of the fourth flow rate F4 may be 0~16LPM, and the range of the fifth flow rate may be 0~16LPM. The range of F5 can be 0~16LPM.

In the embodiment of the present invention, the first flow rate F1 is greater than the sum of the fourth flow rate F4 and the fifth flow rate F5, that is, when F1=16LPM, F4=10LPM, and F5=5.5LPM.

In the embodiment of the present invention, the first flow F1 is equal to the sum of the fourth flow F4 and the fifth flow F5, that is, when F1=16LPM, F4=6LPM, and F5=10LPM.

In the embodiment of the present invention, the first flow rate F1 is a fixed value (the default value is 16LPM, but this is not a limitation, and the value can be adjusted according to actual needs), and when the first flow rate F1 is greater than the fourth flow rate F4, The difference between the first flow rate F1 and the fourth flow rate F4 is discharged by the non-electrically controlled flow regulating device 50, which can be a mechanical valve body, and the mechanical valve body can be, for example, a back pressure valve, The working principle of the back pressure valve 50 is that the fluid enters from the inlet of the back pressure valve 50 and is blocked by the diaphragm, so that the fluid exerts upward pressure on the diaphragm. When the pressure is large enough, the spring is compressed, and the fluid pushes up the diaphragm to form a channel, so that the fluid can flow out from the outlet of the back pressure valve 50; if the fluid pressure is not enough, a pressure will be formed, which will increase the inlet pressure until the pressure rises to the back pressure At the rated pressure of the valve, the fluid pushes up the diaphragm to form a passageway to discharge the fluid. When the flow rate of the fluid changes, the pressure will change, and the opening of the diaphragm will be changed to automatically adjust the fifth flow rate F5.

When the pressure of the pipeline or equipment container is unstable, the back pressure valve can maintain the required pressure of the pipeline; Mixing concentration is a major key factor. In a general factory water supply system, the relationship between flow rate and pressure is shown in Figure 3. When the flow rate is 0~15LPM, the pressure change is large, and when it is greater than 15LPM, the flow rate has a small change in pressure. However, the traditional gas-liquid mixing device does not only use a flow rate of more than 15LPM in general use, and the usage of most back-end machines varies. There are high and low, and most of them are flow changes from 1LPM to more than 20LPM. When the flow rate is constantly changing, the pressure of the mixing tank and the pipeline cannot be maintained stable, and the gas-liquid mixing concentration is constantly changing. Naturally, it is impossible to provide a mixed fluid with a stable concentration to supply the target.

In the embodiment of the present invention, when a back pressure valve (ie, the non-electrically controlled flow adjustment device 50 ) is added to the gas-liquid mixing control system 1, when the required flow rates of the back-end machines A, B, C, and D become smaller, the mixing tank The inner pressure of the body 30 and the output pipeline 40 rises, and when the preset rated pressure of the back pressure valve 50 is exceeded, the back pressure valve 50 begins to release pressure, and the mixed fluid is discharged from the back pressure valve end 50, while the back pressure valve 50 discharges the mixed fluid. The flow rate of the mixed fluid discharged from the end 50 can maintain the inner pressure of the mixing tank 30 and the output pipeline 40 . When the demand of the back-end machines A, B, C, and D increases, the pressure in the mixing tank 30 and the output pipeline 40 drops and is lower than the preset rated pressure of the back pressure valve 50, the back pressure valve 50 opens Decrease, so that the flow rate of the mixed fluid discharged from the back pressure valve 50 decreases, and the flow rate of the mixed fluid is gradually increased and provided to the back-end machines A, B, C, and D for use. Even when the demand of the back-end machines A, B, C, and D increases, and the pressure in the mixing tank 30 and the output pipeline 40 drops below the preset rated pressure of the back pressure valve 50, the back pressure valve 50 It is closed so that the flow rate of the mixed fluid discharged from the back pressure valve 50 becomes 0, and all the flow rates of the mixed fluid are supplied to the back-end machines A, B, C, and D for use. Using the gas-liquid mixing control system and method provided by the embodiments of the present invention, the pressure in the mixing tank 30 and the output pipeline 40 can be stabilized, so as to ensure that the mixing ratio and concentration of gas and liquid are maintained and the back-end machine A is stably supplied. , B, C, D use flow.

In the embodiment of the present invention, the difference between the first flow rate F1 and the fourth flow rate F4 is greater than or equal to the fifth flow rate F5. For example, when only machine A needs to provide mixed fluid, the fourth flow F4 may only need 2LPM, and when the liquid input to the mixing tank is 16 LPM, the third flow F3 output from the mixing tank 30 is 16 LPM, which is more than 16 LPM. The 14LPM is discharged by the non-electrically controlled flow regulating device 50; and when the machines A, B, C, and D need to provide mixed fluid, the fourth flow F4 needs to provide a total flow of 12LPM, and the liquid input to the mixing tank is 16LPM , the third flow F3 output by the mixing tank 30 is 16 LPM, and the excess 4 LPM is discharged by the non-electrically controlled flow regulating device 50 .

In FIG. 1, the gas flow meter 24 is used to measure and regulate the flow rate of the gas flowing into the mixing tank 30. Therefore, the flow rate of the gas flowing into the mixing tank 30 can be regulated by the gas flow meter 24, so that the mixed fluid reaches a The preset conductivity range; the output pipeline 40 includes a conductivity meter 44 disposed between the first end 40a and the second end 40b for detecting the conductivity value of the mixed fluid. In addition, the output pipeline 40 includes a mechanical pressure flow measuring device 41 disposed between the first end 40a and the second end 40b for measuring the pressure of the mixed fluid and the third flow F3; the output pipeline 40 includes a mechanical pressure The flow measuring device 42 is disposed between the first end 40a and the second end 40b for measuring the pressure of the mixed fluid and the fourth flow F4. In the embodiment of the present invention, the non-electrically controlled flow regulating device 50 includes a mechanical pressure flow measuring device 52 disposed on the communication pipe between the non-electrically controlled flow regulating device 50 and the output pipeline 40 to measure the flow rate of the mixed fluid. pressure and fourth flow F4. In the embodiment of the present invention, the back pressure valve 50 has a preset threshold value; when the machines A, B, C, and D are closed, the value of the fourth flow F4 of the mixed fluid in the second end 40b of the output pipeline 40 At this time, because the pressure in the mixing tank body 30 is fixed, the pressure of the mixed fluid in the output pipeline 40 and the mixing tank body 30 is greater than the preset threshold value of the back pressure valve 50, thereby making the fifth flow rate in the mixed fluid F5 is vented through the back pressure valve 50 . When at least one of the machines A, B, C, and D is turned on, the mixed fluid in the second end 40b of the output pipeline 40 is the fourth flow rate F4, and the pressure of the mixed fluid in the mixing tank 30 is dispersed by The second end 40b of the output pipe 40 and the back pressure valve 50 are responsible. At this time, if the mechanical pressure flow measuring device 52 installed on the communication pipe between the back pressure valve 50 and the output pipe 40 measures the flow to the back pressure valve 50 When the pressure of the mixed fluid is greater than or equal to the preset threshold value of the back pressure valve 50, the mixed fluid system is discharged through the back pressure valve 50, and the fifth flow F5 decreases; if it is set between the back pressure valve 50 and the output pipeline 40 Mechanical pressure on the connecting pipe between The flow measuring device 52 determines that the pressure of the mixed fluid flowing to the back pressure valve 50 is less than the preset threshold value of the back pressure valve 50 , and the fifth flow rate in the mixed fluid is zero and cannot be discharged from the back pressure valve 50 .

In FIG. 1 , the mixing tank body 30 includes a drain device 32 disposed at the top of the mixing tank body 30 for discharging the excess part of the gas out of the mixing tank body 30 . In the embodiment of the present invention, the drain device 32 can discharge a part of (excessive) liquid out of the mixing tank body 30 .

In FIG. 1 , the mixing tank 30 includes a gas dispersing device 34 disposed inside the mixing tank 30 for dispersing the gas in the liquid to form a mixed fluid.

In the embodiment of the present invention, the non-electrically controlled flow regulating device 50 is a mechanical valve body, and the mechanical valve body does not use electricity, that is, it does not need to use electricity for control, so the consumption of electricity resources can be avoided, which is in line with new-type manufacturing To meet the environmental protection requirements of the industry, the non-electrically controlled flow regulating device can be a back pressure valve.

In FIG. 2, the first flow F1 is equal to the third flow F3, and the third flow F3 (Δ) is a fixed value (the default value is 18LPM, but it is not limited by this, and the value can be adjusted according to actual needs), and when When the third flow rate F3 (Δ) is greater than the fourth flow rate F4 (★), the difference between the third flow rate F3 (Δ) and the fourth flow rate F4 (★) is discharged by the non-electrically controlled flow regulating device 50 . In the embodiment of the present invention, the difference between the third flow rate F3 (Δ) and the fourth flow rate F4 (★) is equal to the fifth flow rate F5 (◇). For example, when only machine A needs to provide mixed fluid, the fourth flow F4(★) may only need 3LPM, and the third flow F3(△) output from the mixing tank 30 is maintained at 18LPM, with an excess of 15LPM Then it is discharged by the non-electrically controlled flow regulating device 50, that is, the fifth flow F5 (◇); and when the machines A, B, C, and D are continuously opened along the time axis, and the mixed fluid needs to be provided, the fourth flow F4 ( ★) A total flow of 15LPM needs to be provided, while the third flow F3 (△) output by the mixing tank 30 is kept at 18 LPM, and the extra 3 LPM is discharged by the non-electrically controlled flow regulating device 50, that is, the fifth flow F5 (◇ ). In addition, if all machines do not need to supply mixed fluid, the fourth flow F4 (★) is 0LPM, and the mixing tank The third flow rate F3(Δ) output by the body 30 is maintained at 18LPM, and all 18LPM is discharged by the non-electrically controlled flow regulating device 50, that is, the fifth flow rate F5(◇). Accordingly, the gas-liquid mixing control system provided by the embodiment of the present invention can supply a large flow range (for example, 0-18 LPM), so that a single gas-liquid mixing control system can satisfy low flow (0-4 LPM) and high flow ( 10~18LPM) gas-liquid mixed fluid flow requirements.

Next, please refer to FIG. 3 . FIG. 3 is a diagram showing the relationship between the flow rate and pressure of the mixed fluid in a conventional gas-liquid mixing system. Since the mixed fluid is continuously produced in the mixing tank, the mixing tank accumulates internal pressure. When the mixed fluid flows out of the mixing tank, the internal pressure of the mixing tank will decrease significantly, and as the flow of the mixed fluid increases goes stable. As can be seen from Figure 3, when the flow rate of the mixed fluid is less than 10LPM, the pressure value of the mixing tank 30 is between 55psi and 35psi; and when the flow rate of the mixed fluid is greater than or equal to 10LPM, the pressure value of the mixing tank is between 35psi to 25psi. Therefore, in general, under the condition of a large flow of mixed fluid, the traditional gas-liquid mixing system has a relatively stable pressure performance, and the concentration of the mixed fluid it supplies will also be relatively stable; however, the traditional gas-liquid mixing system is at low flow rate. Under the same conditions, the pressure of the mixing tank body changes drastically, so that the concentration of the mixed fluid is relatively unstable, which in turn has an adverse effect on the yield of semiconductor products.

Next, please refer to FIG. 4 . FIG. 4 is a graph showing the relationship between the amount of equipment (machine) and the total flow or pressure of the mixed fluid according to a preferred embodiment of the present invention. The system is compared with or without a back pressure valve. In Figure 4, the horizontal axis is the amount of mixed fluid used by the equipment (machine), the left vertical axis is the pressure value of the mixing tank, the right vertical axis is the total flow of the mixed fluid, and the traditional gas-liquid mixing without back pressure valve The pressure value of the mixing tank body in the system is represented by "○", and the flow value of the mixed fluid is represented by "△"; the pressure value of the mixing tank body 30 in the gas-liquid mixing control system with a back pressure valve provided by the embodiment of the present invention It is represented by "●", and the flow rate of the mixed fluid is represented by "▲". It can be seen from Figure 4 that the pressure value of the mixing tank in the traditional gas-liquid mixing system without back pressure valve will vary with It decreases with the increase in the use of the equipment (machine) for the mixed fluid, and the total flow value of the mixed fluid increases with the increase in the use of the equipment (machine) for the mixed fluid; different from the traditional gas without back pressure valve In the liquid mixing system, in the embodiment of the present invention, since the mixed fluid is continuously produced in the mixing tank 30, the mixing tank 30 will accumulate internal pressure. When the accumulated internal pressure of the mixing tank 30 exceeds the non-electrically controlled flow regulating device When the opening pressure value of 50 (back pressure valve), the non-electrically controlled flow regulating device 50 (back pressure valve) will be opened and the mixed fluid will flow out from the mixing tank. At this time, the internal pressure of the mixing tank 30 can be maintained at a preset value. The internal pressure of the mixing tank 30 remains within the preset pressure value range when the flow rate of the mixed fluid increases. In other words, the mixing tank body 30 in the gas-liquid mixing control system with the back pressure valve provided by the embodiment of the present invention maintains a fixed pressure value, which will not change with the increase in the use amount of the equipment (machine) for the mixed fluid, and The total flow value of the mixed fluid is regulated by a back pressure valve, and a fixed total flow value can be maintained, which will not change with the increase in the usage of the mixed fluid by the equipment (machine).

It can be seen from this that the gas-liquid mixing control system provided by the embodiment of the present invention uses the back pressure valve to improve the traditional gas-liquid mixing system under the condition of low flow rate, because the pressure of the mixing tank body changes drastically, so that the concentration of the mixed fluid is higher than that of the traditional gas-liquid mixing system. instability, which in turn adversely affects the yield of semiconductor products. Compared with the traditional gas-liquid mixing system, the gas-liquid mixing control system provided by the embodiment of the present invention can maintain a fixed pressure value of the mixing tank 30 regardless of whether the equipment (machine) has a high usage amount or a low usage amount of the mixed fluid. And a fixed total flow rate of the mixed fluid to maintain high stability of the mixed fluid concentration, thereby significantly improving the yield of semiconductor products. In the embodiment of the present invention, under the condition of low flow rate (for example, the amount of equipment (machine) is less than 20 LPM), the gas-liquid mixing control system provided by the embodiment of the present invention can maintain a fixed pressure value of the mixing tank 30 and a fixed total flow rate of the mixed fluid to maintain high stability of the mixed fluid concentration, thereby significantly improving the yield of semiconductor products, as shown in Figure 4.

Please refer to FIG. 1 and FIG. 5 together, the gas-liquid mixing control method at least includes the following steps: step S02, providing a liquid with a first fixed pressure and a first flow rate F1 in the mixing tank 30; step S04, providing a second fixed pressure and the second flow rate of gas in the mixing tank 30, the second fixed pressure of the gas is greater than the first fixed pressure of the liquid; step S06, the liquid and the gas are mixed in the mixing tank 30 to form a mixed fluid; step S08, Through the output pipeline 40, the mixed fluid is output from the mixing tank body 30 to at least one machine A, B, C, D, wherein the pressure of the mixed fluid in the mixing tank body 30 and the output pipeline 40 is the same, and the output pipeline 40 The first end 40a of the pump is connected to the mixing tank 30, and the second end 40b of the pump is connected to the machines A, B, C, and D; in the embodiment of the present invention, the mixed fluid in the first end 40a of the output pipeline 40 It has a third flow rate F3, and the mixed fluid in the second end 40b of the output pipeline 40 has a fourth flow rate F4; The mixed fluid has a fifth flow F5; the third flow F3 is greater than or equal to the fourth flow F4 and the fifth flow F5.

In the embodiment of the present invention, the first flow rate F1 is greater than or equal to 1000 times the second flow rate, and the third flow rate F3 is approximately equal to the first flow rate F1. In the embodiment of the present invention, the first flow rate F1 is greater than the sum of the fourth flow rate F4 and the fifth flow rate F5. In the embodiment of the present invention, the first flow F1 is equal to the sum of the fourth flow F4 and the fifth flow F5.

In the embodiment of the present invention, the first flow rate F1 is equal to the third flow rate F3, which is a fixed value, and when the third flow rate F3 is greater than the fourth flow rate F4, the difference between the third flow rate F3 and the fourth flow rate F4 is determined by non-electrical The flow control device 50 is discharged. In the embodiment of the present invention, the difference between the third flow F3 and the fourth flow F4 is equal to the fifth flow F5.

In the embodiment of the present invention, the mixing tank body 30 includes a gas dispersing device 34 disposed inside the mixing tank body 30 for dispersing the gas in the liquid to form a mixed fluid. non-electric The flow control adjusting device 50 is a mechanical valve body, and the mechanical valve body can be, for example, a back pressure valve, and the back pressure valve is a valve body with a purely physical structure, and does not need to use electricity, that is, it does not need to use electricity for control, so it can be avoided. The consumption of power resources meets the environmental protection requirements of the new type of manufacturing industry.

Through the design of the embodiment of the present invention, the gas-liquid mixing control system and the control method provided by the embodiment of the present invention utilize a non-electrically controlled flow regulating device to control the output flow of the gas-liquid mixed fluid, and can supply a large flow range (for example, 2~16LPM), so that a single gas-liquid mixing control system can meet the flow requirements of low flow (2~4LPM) and high flow (10~14LPM) gas-liquid mixed fluids. In addition, the gas-liquid mixing control system and control method provided by the present invention do not need to use electric power for control, so the consumption of electric power resources can be avoided, and the environmental protection requirements of the new type of manufacturing industry are met.

The above descriptions are only preferred feasible embodiments of the present invention, and any equivalent changes made by applying the description of the present invention and the scope of the patent application should be included in the patent scope of the present invention.

1: Gas-liquid mixing control system

10: Liquid supply device

12: Liquid pressure regulating valve

20: Gas supply device

22: Gas pressure regulating valve

24: Gas flow meter

30: mixing tank

32: drain device

34: Gas dispersion device

40: Output pipeline

40a: First end

40b: second end

41,42: Mechanical pressure flow measuring device

44: Conductivity meter

50: Non-electrically controlled flow adjustment device (back pressure valve)

52: Mechanical pressure flow measuring device

A,B,C,D: machine

Claims (18)

A gas-liquid mixing control system, comprising: a liquid supply device to provide a liquid; a liquid pressure regulating valve, communicated with the liquid supply device, to keep the liquid at a first fixed pressure and a first flow rate ; a gas supply device for supplying a gas; a gas pressure regulating valve connected to the gas supply device for maintaining the gas at a second fixed pressure and a second flow rate, wherein the second gas of the gas The fixed pressure is greater than the first fixed pressure of the liquid; a mixing tank body is communicated with the liquid pressure regulating valve and the gas pressure regulating valve, and the liquid pressure regulating valve is arranged between the liquid supply device and the mixing tank body, The gas pressure regulating valve is arranged between the gas supply device and the mixing tank, wherein the liquid pressure regulating valve inputs the liquid into the mixing tank at the first fixed pressure and the first flow rate, and the gas regulating valve The pressure valve inputs the gas into the mixing tank with the second fixed pressure and the second flow rate, and the liquid and the gas are mixed in the mixing tank to form a mixed fluid; an output pipeline, the output pipeline A first end is connected to the mixing tank, the mixing tank and the mixed fluid in the output pipeline have the same pressure, and a second end of the output pipeline is connected to at least one machine, so that the mixing The fluid is output from the mixing tank to the at least one machine through the output pipeline, and the mixed fluid in the first end has a third flow rate, and the mixed fluid in the second end has a fourth flow rate ; And a non-electrically controlled flow regulating device, communicated with the output pipeline, wherein the mixed fluid discharged to the outside of the system through the non-electrically controlled flow regulating device has a fifth flow rate; Wherein, the first flow rate is greater than or equal to at least one of the fourth flow rate and the fifth flow rate, and when the third flow rate is greater than the fourth flow rate, the difference between the third flow rate and the fourth flow rate is equal to the fifth flow rate discharged by the non-electrically controlled flow regulating device. The gas-liquid mixing control system according to claim 1, wherein the third flow rate is a fixed value. The gas-liquid mixing control system as claimed in claim 1, wherein a gas flow meter is arranged between the gas supply device and the mixing tank, and the gas flow meter is communicated with the gas supply device and the mixing tank for measuring The second flow rate of the gas is measured and regulated so that the mixed fluid reaches a predetermined conductivity range. The gas-liquid mixing control system as claimed in claim 3, wherein the output pipeline includes a conductivity meter disposed between the first end and the second end for detecting the conductivity value of the mixed fluid. The gas-liquid mixing control system as claimed in claim 1, wherein the mixing tank body includes a drain device disposed on the top of the mixing tank body for discharging the excess part of the gas from the mixing tank body. The gas-liquid mixing control system of claim 1, wherein the first flow rate is greater than or equal to 1000 times the second flow rate, and the third flow rate is approximately equal to the first flow rate. The gas-liquid mixing control system according to claim 1, wherein the mixing tank includes a gas dispersing device disposed inside the mixing tank for dispersing the gas in the liquid to form the mixed fluid. The gas-liquid mixing control system as claimed in claim 1, wherein the fourth flow rate of the second end is equal to a demand of the at least one machine for the mixed fluid. The gas-liquid mixing regulation system as claimed in claim 8, wherein the non-electrically controlled flow regulating device is a mechanical valve body, and the mechanical valve body does not use electricity. The gas-liquid mixing control system according to claim 9, wherein the mechanical valve body includes a back pressure valve, and the back pressure valve has a preset threshold value; when the at least one machine is closed, the second end The fourth flow rate of the mixed fluid is zero, and the pressure of the mixed fluid in the output pipeline and the mixing tank is greater than the preset threshold of the back pressure valve, so that the fifth flow rate in the mixed fluid is is discharged through the back pressure valve; when the at least one machine is turned on, the mixed fluid in the second end is the fourth flow rate, and the pressure of the mixed fluid in the mixing tank is dispersed by the output pipe The second end of the circuit and the back pressure valve are burdened. If the pressure of the mixed fluid flowing to the back pressure valve is greater than or equal to the preset threshold value of the back pressure valve, the mixed fluid system will be discharged through the back pressure valve. , and the fifth flow rate decreases; if the pressure of the mixed fluid flowing to the back pressure valve is less than the preset threshold of the back pressure valve, the fifth flow rate in the mixed fluid is zero, and cannot be controlled by the back pressure Valve leaks. A gas-liquid mixing control method, comprising: providing a liquid with a first fixed pressure and a first flow in a mixing tank; providing a gas with a second fixed pressure and a second flow in the mixing tank , wherein the second fixed pressure of the gas is greater than the first fixed pressure of the liquid; the liquid and the gas are mixed in the mixing tank to form a mixed fluid; and through an output pipeline, the mixed fluid is transferred from the The mixing tank body is output to at least one machine, wherein the mixing tank body and the mixed fluid in the output pipeline have the same pressure, a first end of the output pipeline is connected to the mixing tank body, and a second The end is connected to the at least one machine, and the mixed fluid in the first end has a third flow rate, and the mixed fluid in the second end has a fourth flow rate; the output pipeline is connected to a non-electrical a flow control adjusting device, and the mixed fluid discharged to the outside of the output pipeline through the non-electrically controlled flow adjusting device has a fifth flow rate; Wherein, the first flow rate is greater than or equal to at least one of the fourth flow rate and the fifth flow rate, and when the third flow rate is greater than the fourth flow rate, the difference between the third flow rate and the fourth flow rate is equal to the fifth flow rate discharged by the non-electrically controlled flow regulating device. The gas-liquid mixing control method according to claim 11, wherein the third flow rate is a fixed value. The gas-liquid mixing control method according to claim 11, wherein the mixing tank body includes a gas dispersing device disposed inside the mixing tank body for dispersing the gas in the liquid to form the mixed fluid. The gas-liquid mixing control method according to claim 11, wherein the first flow rate is greater than or equal to 1000 times the second flow rate, and the third flow rate is approximately equal to the first flow rate. The gas-liquid mixing control method as claimed in claim 11, wherein a gas flow meter is arranged between the gas supply device and the mixing tank, and the gas flow meter is communicated with the gas supply device and the mixing tank for measuring The second flow rate of the gas is measured and regulated so that the mixed fluid reaches a predetermined conductivity range. The gas-liquid mixing control method according to claim 11, wherein the fourth flow rate of the second end is equal to a demand of the at least one machine for the mixed fluid. The gas-liquid mixing regulation method as claimed in claim 16, wherein the non-electrically controlled flow regulating device is a mechanical valve body, and the mechanical valve body does not use electricity. The gas-liquid mixing control method according to claim 17, wherein the mechanical valve body includes a back pressure valve, and the back pressure valve has a preset threshold value; when the at least one machine is closed, the second end The fourth flow rate of the mixed fluid is zero, and the pressure of the mixed fluid in the output pipeline and the mixing tank is greater than the preset threshold of the back pressure valve, so that the fifth flow rate in the mixed fluid is is discharged through the back pressure valve; when the at least one machine is turned on, the second end The mixed fluid is the fourth flow rate, and the pressure of the mixed fluid in the output pipeline and the mixing tank is decreased, if the pressure of the mixed fluid in the output pipeline and the mixing tank is greater than or equal to The preset threshold value of the back pressure valve, the fifth flow rate in the mixed fluid is discharged through the back pressure valve, and the fifth flow rate decreases; if the output pipeline and the mixing tank are mixed The pressure of the fluid is less than the preset threshold value of the back pressure valve, the fifth flow rate in the mixed fluid is zero, and cannot be discharged from the back pressure valve.

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