TWI761493B - film - Google Patents
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- TWI761493B TWI761493B TW107113303A TW107113303A TWI761493B TW I761493 B TWI761493 B TW I761493B TW 107113303 A TW107113303 A TW 107113303A TW 107113303 A TW107113303 A TW 107113303A TW I761493 B TWI761493 B TW I761493B
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
- B32B7/02—Physical, chemical or physicochemical properties
- B32B7/022—Mechanical properties
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/14—Layered products comprising a layer of synthetic resin next to a particulate layer
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/36—Layered products comprising a layer of synthetic resin comprising polyesters
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
- B32B7/02—Physical, chemical or physicochemical properties
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
- B32B7/02—Physical, chemical or physicochemical properties
- B32B7/023—Optical properties
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/50—Recording sheets characterised by the coating used to improve ink, dye or pigment receptivity, e.g. for ink-jet or thermal dye transfer recording
- B41M5/502—Recording sheets characterised by the coating used to improve ink, dye or pigment receptivity, e.g. for ink-jet or thermal dye transfer recording characterised by structural details, e.g. multilayer materials
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/40—Properties of the layers or laminate having particular optical properties
- B32B2307/406—Bright, glossy, shiny surface
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/50—Properties of the layers or laminate having particular mechanical properties
- B32B2307/538—Roughness
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/70—Other properties
- B32B2307/75—Printability
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- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Laminated Bodies (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
Abstract
本發明提供一種薄膜,其在利用至少單面的表面粗糙度SRa為100nm以上3000nm以下、20cm×14cm範圍之前述表面粗糙度SRa的偏差為10%以下、且320nm的平行線穿透率ST320為30%以上的薄膜作為轉印薄膜使用時,可均勻地轉印低光澤調外觀,而且在使用光硬化性樹脂作為被轉印材時,亦可達成低光澤外觀的轉印、形狀固定,而具有不易發生粒子脫落或切削等不良狀況的良好加工步驟合適性。 The present invention provides a thin film having a surface roughness SRa of at least one side of 100 nm or more and 3000 nm or less, the variation of the surface roughness SRa in the range of 20 cm×14 cm is 10% or less, and the parallel line transmittance ST320 of 320 nm is When the film with more than 30% is used as the transfer film, the low-gloss appearance can be uniformly transferred, and when the photocurable resin is used as the transfer material, the transfer of the low-gloss appearance and the shape fixation can also be achieved, and it has Good processing step suitability that is less prone to problems such as particle shedding or chipping.
Description
本發明係有關於一種薄膜。 The present invention relates to a film.
近年來,由於隨著智慧型手機、平板電腦的擴展所致之電路的積體化,從而印刷配線基板逐漸地往高精確度、高密度化發展。在印刷配線基板的製造步驟中,於絕緣基材(聚醯亞胺樹脂、聚苯硫醚樹脂等)的表面設置電路後,以絕緣及保護電路為目的而被覆為具有接著層之耐熱樹脂薄膜之覆蓋膜(coverlay),並隔著脫模薄膜,藉由壓製層合進行成形。此時,脫模薄膜係要求與印刷配線板材料或加壓板的脫模性、形狀順應性、均勻的成形性、霧面調外觀的轉印性等。又,使絕緣層或硬塗層、電磁波遮蔽層等機能層藉由加熱壓製轉印於電路基板表面而成的基材,其對霧面調薄膜的需求也愈來愈高。 In recent years, due to the integration of circuits due to the expansion of smartphones and tablet computers, printed wiring boards have been gradually developed with high precision and high density. In the production step of the printed wiring board, after providing a circuit on the surface of an insulating base material (polyimide resin, polyphenylene sulfide resin, etc.), it is coated with a heat-resistant resin film having an adhesive layer for the purpose of insulating and protecting the circuit The coverlay is formed by press lamination through a release film. In this case, the mold release film is required to have releasability with a printed wiring board material or a pressure plate, shape conformability, uniform moldability, transferability with a matte appearance, and the like. In addition, the demand for matte-finishing films for substrates formed by thermally pressing functional layers such as insulating layers, hard coat layers, and electromagnetic wave shielding layers onto the surface of circuit substrates is increasing.
向來,就霧面調薄膜(matte film)而言,一般為砂消光薄膜、化學消光薄膜或塗覆消光薄膜等加工品。然而,加工品有因步驟增加而導致成本增加、或品質方面的課題,而期望獲得改善。針對此等課題,以將大量粒子與樹脂一同擠出之方法所製造的煉入粒子的薄膜雖可看出其優越性,而就該煉入粒子的薄膜而言,實 不易達成近年所要求的高水準之低光澤外觀。又,該煉入粒子的薄膜由於光線穿透率較低,故在應用光硬化性樹脂作為積層之機能層時硬化變得不充分,而有應用範圍受限的課題。 As far as matte films are concerned, they are generally processed products such as sand matte films, chemical matte films or coated matte films. However, the processed product has problems in terms of cost increase and quality due to an increase in the number of steps, and improvement is desired. In view of these problems, although the film with smelted particles produced by the method of extruding a large number of particles together with the resin can be seen to have advantages, it is not easy to achieve the requirements of recent years for the film with smelted particles High level of low gloss appearance. In addition, since the light transmittance of the particle-incorporated film is low, when the photocurable resin is used as the functional layer of the lamination, the curing becomes insufficient, and there is a problem that the application range is limited.
作為向來使用的霧面調轉印基材,有人提出以高濃度含有無機粒子或有機粒子的聚酯薄膜(例如專利文獻1、2)。又,作為具有高度霧面調外觀之薄膜,有人提出在表面藉由塗覆設置樹脂層的薄膜(例如專利文獻3)。 As a conventionally used matte transfer substrate, a polyester film containing inorganic particles or organic particles at a high concentration has been proposed (for example, Patent Documents 1 and 2). In addition, as a film having a highly matte appearance, a film in which a resin layer is provided on the surface by coating has been proposed (for example, Patent Document 3).
專利文獻1 日本特開2016-97522號公報 Patent Document 1 Japanese Patent Application Laid-Open No. 2016-97522
專利文獻2 日本特開2014-24341號公報 Patent Document 2 Japanese Patent Application Laid-Open No. 2014-24341
專利文獻3 日本特開2005-24942號公報 Patent Document 3 Japanese Patent Laid-Open No. 2005-24942
專利文獻1、2所記載之薄膜,其非為可確保透明性之設計,而且表面粗糙度的偏差亦無法充分減少;因此,應用光硬化性樹脂作為機能層時,有無法均勻地轉印低光澤表面的課題。 The films described in Patent Documents 1 and 2 are not designed to ensure transparency, and the variation in surface roughness cannot be sufficiently reduced; therefore, when a photocurable resin is used as a functional layer, there is a possibility that uniform transfer cannot be achieved. The subject of glossy surfaces.
此外,專利文獻3所記載之薄膜,其光澤度極低且外觀優異,但使用於轉印用途時,會因粗大粒子的脫落,而發生轉印表面的品質變差或粒子附著等不良狀況。又,藉由塗覆設置脫模層時,積層之脫模層填埋薄膜表面的凹部,使光澤度增加,從而有不降低轉印後的光澤度則無法獲得目標霧面調外觀的課題。 In addition, the film described in Patent Document 3 has extremely low gloss and excellent appearance, but when used for transfer applications, coarse particles fall off, resulting in poor quality of the transfer surface and adhesion of particles. In addition, when the release layer is provided by coating, the laminated release layer fills the concave portion on the surface of the film to increase the gloss, so that the target matte appearance cannot be obtained without lowering the gloss after transfer.
本發明課題在於解決上述習知技術的問題。亦即,其課題在於提供一種在作為轉印薄膜使用時,可均勻地轉印低光澤調外觀,而且在使用光硬化性樹脂作為被轉印材時,亦可達成低光澤外觀的轉印、形狀固定,而具有不易發生粒子脫落或切削等不良狀況的良好加工步驟合適性的薄膜。 The subject of the present invention is to solve the above-mentioned problems of the conventional technology. That is, the subject is to provide a transfer and shape that can uniformly transfer a low-gloss appearance when used as a transfer film, and also achieve a low-gloss appearance when a photocurable resin is used as a transfer material. It is a film with good suitability for processing steps that is not prone to problems such as particle shedding or chipping, while being fixed.
為解決所述課題,本發明係採以下構成: In order to solve the problem, the present invention adopts the following structure:
(1)一種薄膜,其至少單面的表面粗糙度SRa為100nm以上3000nm以下,20cm×14cm範圍之前述表面粗糙度SRa的偏差為10%以下,且320nm的平行線穿透率ST320為30%以上。 (1) A thin film having a surface roughness SRa of at least one side of 100 nm or more and 3000 nm or less, a variation of the aforementioned surface roughness SRa in the range of 20 cm×14 cm is 10% or less, and the parallel line transmittance ST320 of 320 nm is 30% above.
(2)如(1)所記載之薄膜,其中前述表面粗糙度SRa為100nm以上3000nm以下之表面的最大波峰高度(SRp)與最大波谷深度(SRv)係滿足下述(II)式:1≦SRp/SRv≦3…(II)。 (2) The thin film according to (1), wherein the maximum peak height (SRp) and the maximum valley depth (SRv) of the surface having a surface roughness SRa of 100 nm or more and 3000 nm or less satisfy the following formula (II): 1≦1 SRp/SRv≦3…(II).
(3)如(1)或(2)所記載之薄膜,其中前述表面粗糙度SRa為100nm以上3000nm以下之表面的中心面面積率(SSr)係滿足下述(III)式:30≦SSr≦60…(III)。(3) The thin film according to (1) or (2), wherein the central surface area ratio (SSr) of the surface having a surface roughness SRa of 100 nm or more and 3000 nm or less satisfies the following formula (III): 30≦SSr≦ 60...(III).
(4)如(1)至(3)中任一項所記載之薄膜,其於100℃、10分鐘之熱處理前後的厚度變化為0.1%以上10%以下。 (4) The thin film according to any one of (1) to (3), wherein the thickness change before and after the heat treatment at 100° C. for 10 minutes is 0.1% or more and 10% or less.
(5)如(1)至(4)中任一項所記載之薄膜,其為具有基材層與含高濃度粒子層(A層)的積層薄膜,其中以前述A層全體為100質量%,A層含有1質量%以上40質量%以下之平均粒徑為1μm以上10μm以下的粒子。 (5) The film according to any one of (1) to (4), which is a laminate film having a base material layer and a high-concentration particle-containing layer (layer A), wherein the entire layer A is 100% by mass The A layer contains 1 mass % or more and 40 mass % or less of particles having an average particle diameter of 1 μm or more and 10 μm or less.
(6)如(1)至(5)中任一項所記載之薄膜,其中前述ST320為60%以上。 (6) The film according to any one of (1) to (5), wherein the ST320 is 60% or more.
(7)如(1)至(6)中任一項所記載之薄膜,其中在薄膜的20cm×14cm範圍,前述ST320的偏差為0.1%以上10%以下。 (7) The thin film according to any one of (1) to (6), wherein the variation of the ST320 in the range of 20 cm×14 cm of the thin film is 0.1% or more and 10% or less.
(8)如(1)至(7)中任一項所記載之薄膜,其中薄膜霧度為70%以下。 (8) The film according to any one of (1) to (7), wherein the film haze is 70% or less.
(9)如(1)至(8)中任一項所記載之薄膜,其中前述表面粗糙度SRa為100nm以上3000nm以下之表面的表面自由能為44mN/m以下。 (9) The thin film according to any one of (1) to (8), wherein the surface free energy of the surface having the surface roughness SRa of 100 nm or more and 3000 nm or less is 44 mN/m or less.
(10)如(1)至(9)中任一項所記載之薄膜,其係以聚酯為主成分。 (10) The film according to any one of (1) to (9), which is mainly composed of polyester.
(11)如(1)至(10)中任一項所記載之薄膜,其係使用於轉印用途。 (11) The film according to any one of (1) to (10), which is used for transfer applications.
(12)一種積層薄膜,其為在基材層的至少其中一表面具有光澤度為30以下之低光澤層的積層薄膜,其中低光澤層表面的表面粗糙度SRa為100nm以上3000nm以下,薄膜的20cm×14cm範圍之表面粗糙度SRa的偏差為10%以下,且320nm的平行線穿透率ST320為30%以上。 (12) A laminate film having a low gloss layer with a glossiness of 30 or less on at least one surface of a base material layer, wherein the surface roughness SRa of the surface of the low gloss layer is 100 nm or more and 3000 nm or less, and the film has The variation of the surface roughness SRa in the range of 20 cm×14 cm is 10% or less, and the parallel line transmittance ST320 of 320 nm is 30% or more.
根據本發明,可提供一種在作為轉印薄膜使用時,低光澤外觀的轉印性與步驟適合性優良的薄膜。該薄膜可適用於作為在電路形成步驟中霧面調外觀的轉印性優良的轉印用薄膜。 According to the present invention, when used as a transfer film, it is possible to provide a film excellent in transferability with a low-gloss appearance and process suitability. This film can be suitably used as a transfer film excellent in transferability with a matte appearance in the circuit formation step.
作為本發明之薄膜的一形態,可舉出至少單面的表面粗糙度SRa為100nm以上3000nm以下,20cm×14cm範圍之前述表面粗糙度SRa的偏差為10%以下,且320nm的平行線穿透率ST320為30%以上的薄膜。 As one form of the thin film of the present invention, the surface roughness SRa of at least one side is 100 nm or more and 3000 nm or less, the variation of the surface roughness SRa in the range of 20 cm×14 cm is 10% or less, and the parallel lines of 320 nm penetrate. The rate ST320 is 30% or more of the film.
用於本發明之薄膜的樹脂不特別限定,可使用例如聚對酞酸乙二酯、聚對酞酸丙二酯、聚對酞酸丁二酯、聚萘二甲酸乙二酯等聚酯、聚丙烯酸酯、聚乙烯、聚丙烯、聚醯胺、聚醯亞胺、聚甲基戊烯、聚氯乙烯、聚苯乙烯、聚甲基丙烯酸甲酯、聚碳酸酯、聚醚醚酮、聚碸、聚醚碸、氟樹脂、聚醚醯亞胺、聚苯硫醚、聚胺基甲酸酯及環狀烯烴系樹脂等。其中,基於薄膜的操作處理性或尺寸穩定性、製造時的經濟性觀點,較佳以聚酯為主成分。本發明中所稱「以聚酯為主成分」,係表示構成薄膜的樹脂當中,50質量%以上為聚酯。又,當本發明之薄膜為包含基材層、含高濃度粒子層的積層薄膜時,較佳的是基材層、含高濃度粒子層皆以聚酯為主成 分。本發明中所稱聚酯,係指主鏈中的主要鍵結採酯鍵之高分子的總稱,一般可藉由使二羧酸成分與二醇成分進行聚縮合反應而得。 The resin used for the film of the present invention is not particularly limited, and for example, polyesters such as polyethylene terephthalate, polypropylene terephthalate, polybutylene terephthalate, polyethylene naphthalate, etc., can be used. Polyacrylate, polyethylene, polypropylene, polyamide, polyimide, polymethylpentene, polyvinyl chloride, polystyrene, polymethyl methacrylate, polycarbonate, polyether ether ketone, poly Dust, polyether dust, fluororesin, polyether imide, polyphenylene sulfide, polyurethane, cyclic olefin resin, etc. Among them, polyester is preferably used as the main component from the viewpoints of handling properties or dimensional stability of the film, and economical efficiency at the time of production. The term "mainly composed of polyester" as used in the present invention means that 50% by mass or more of the resin constituting the film is polyester. Furthermore, when the film of the present invention is a laminate film comprising a substrate layer and a high-concentration particle-containing layer, it is preferable that both the substrate layer and the high-concentration particle-containing layer contain polyester as the main component. The polyester as used in the present invention refers to a general term for polymers whose main chain is mainly bound by ester bonds, and can generally be obtained by subjecting a dicarboxylic acid component and a diol component to a polycondensation reaction.
作為此處所使用的二羧酸成分,可舉出對酞酸、異酞酸、酞酸、2,6-萘二甲酸、二苯基二甲酸、二苯碸二甲酸、二苯氧基乙烷二甲酸、二甲酸5-碸鈉(5-sodium sulfone dicarboxylic acid)等芳香族二羧酸、草酸、琥珀酸、己二酸、癸二酸、二聚酸、馬來酸、富馬酸等脂肪族二羧酸、1,4-環己烷二甲酸等脂環族二羧酸、對羥基苯甲酸等氧基羧酸(oxycarboxylic acid)等的各成分。又,作為二羧酸酯衍生物成分,可舉出上述二羧酸化合物之酯化物、例如對酞酸二甲酯、對酞酸二乙酯、對酞酸2-羥乙基甲酯、2,6-萘二甲酸二甲酯、異酞酸二甲酯、己二酸二甲酯、馬來酸二乙酯、二聚酸二甲酯等的各成分。就構成本發明之樹脂薄膜的聚酯樹脂,基於耐熱性、生產性觀點,總二羧酸成分中之對酞酸及/或萘二甲酸的比例宜較佳為95莫耳%以上,更佳為98莫耳%以上。 The dicarboxylic acid component used here includes terephthalic acid, isophthalic acid, phthalic acid, 2,6-naphthalenedicarboxylic acid, diphenyldicarboxylic acid, diphenylenedicarboxylic acid, and diphenoxyethane Aromatic dicarboxylic acids such as dicarboxylic acid, 5-sodium sulfone dicarboxylic acid, fatty acids such as oxalic acid, succinic acid, adipic acid, sebacic acid, dimer acid, maleic acid, and fumaric acid Each component, such as alicyclic dicarboxylic acid such as 1,4-cyclohexanedicarboxylic acid, oxycarboxylic acid such as p-hydroxybenzoic acid, and the like. Moreover, as a dicarboxylate derivative component, the ester product of the above-mentioned dicarboxylate compound, for example, dimethyl terephthalate, diethyl terephthalate, 2-hydroxyethyl methyl terephthalate, 2-hydroxyethyl terephthalate, , Each component of dimethyl 6-naphthalate, dimethyl isophthalate, dimethyl adipate, diethyl maleate, and dimethyl dimer acid. Regarding the polyester resin constituting the resin film of the present invention, from the viewpoint of heat resistance and productivity, the ratio of terephthalic acid and/or naphthalenedicarboxylic acid in the total dicarboxylic acid component is preferably 95 mol% or more, more preferably is more than 98 mol%.
另外作為二醇成分,可舉出乙二醇、1,2-丙二醇、1,3-丙二醇、1,3-丁二醇、1,4-丁二醇、1,5-戊二醇、1,6-己二醇、2,2-二甲基-1,3-丙二醇等脂肪族二羥基化合物、二乙二醇、聚乙二醇、聚丙二醇、聚四亞甲基二醇等聚氧烷二醇、1,4-環己烷二甲醇、螺二醇等脂環族二羥基化合物、雙酚A、雙酚S等芳香族二羥基化合物等的各成分。其中,以成形性、操作處理性觀點而言,宜使用乙二醇、1,4-丁二醇、2,2-二甲基-1,3-丙二醇、1,4-環己烷二甲醇之各成分。構成本發明之樹脂薄膜的聚酯樹脂中,總二醇成分中之乙二醇的比例若為65莫耳%以上,則由耐熱性、生產性觀點而言係較佳者。此等二羧酸成分、二醇成分亦可併用2種以上。 Moreover, as a glycol component, ethylene glycol, 1, 2- propylene glycol, 1, 3- propylene glycol, 1, 3- butanediol, 1, 4- butanediol, 1, 5- pentanediol, 1 ,6-hexanediol, aliphatic dihydroxy compounds such as 2,2-dimethyl-1,3-propanediol, polyoxyethylene such as diethylene glycol, polyethylene glycol, polypropylene glycol, and polytetramethylene glycol Each component, such as alicyclic dihydroxy compounds, such as alkanediol, 1, 4- cyclohexane dimethanol, spiroglycol, and aromatic dihydroxy compounds, such as bisphenol A and bisphenol S. Among them, ethylene glycol, 1,4-butanediol, 2,2-dimethyl-1,3-propanediol, and 1,4-cyclohexanedimethanol are preferably used from the viewpoint of moldability and handleability. of the ingredients. In the polyester resin constituting the resin film of the present invention, it is preferable from the viewpoints of heat resistance and productivity that the ratio of ethylene glycol in the total glycol components is 65 mol % or more. These dicarboxylic acid components and diol components may be used in combination of two or more.
本發明之薄膜,基於霧面調外觀轉印性觀點,至少單面的表面粗糙度SRa需為100nm以上3000nm以下。表面粗糙度SRa小於100nm時,不易獲得充分的霧面調轉印性;設為大於3000nm時,則薄膜的強度會降低。基於霧面調轉印性與薄膜強度觀點,至少單面的表面粗糙度SRa若為200nm以上2000nm以下,則更佳,若為300nm以上2000nm以下則最佳。 The film of the present invention needs to have a surface roughness SRa of at least 100 nm or more and 3000 nm or less on one side from the viewpoint of transferability of a matte appearance. When the surface roughness SRa is less than 100 nm, it is difficult to obtain sufficient matte transferability, and when the surface roughness SRa is more than 3000 nm, the strength of the film decreases. From the viewpoints of matte transferability and film strength, the surface roughness SRa of at least one side is more preferably 200 nm or more and 2000 nm or less, and more preferably 300 nm or more and 2000 nm or less.
本發明中,用於將至少單面的表面粗糙度SRa設為100nm以上3000nm以下的方法不特別限定。可舉出例如使薄膜中以高濃度含有粒子的方法、如壓花(emboss)加工之使形狀轉印於薄膜表面的方法等。根據使薄膜中以高濃度含有粒子的方法,而將至少單面的表面粗糙度SRa設為上述範圍時,基於兼具薄膜強度與表面粗糙度之觀點,係作成具有基材層與含高濃度粒子層(A層)的積層薄膜,使前述A層所含有之粒子較佳為平均粒徑1μm以上10μm以下;以A層全體為100質量%,其含量較佳為1質量%以上40質量%以下。使A層所含有之粒子的含量更佳為3質量%以上35質量%以下,最佳含有5質量%以上30質量%以下。又,使A層所含有之粒子,其平均粒徑若為2μm以上10μm以下則更佳,若為3μm以上9μm以下則進一步較佳,若為4μm以上8μm以下則最佳。此外,本發明中的平均粒徑係指以D=ΣDi/N(Di:粒子的等效圓直徑、N:粒子的個數)表示的數量平均粒徑D。 In the present invention, the method for setting the surface roughness SRa of at least one side to 100 nm or more and 3000 nm or less is not particularly limited. For example, the method of containing a particle|grains in a high density|concentration in a film, the method of transcribe|transferring a shape to a film surface by embossing, etc. are mentioned. When the surface roughness SRa of at least one side is in the above range according to the method of containing the particles in a high concentration in the film, from the viewpoint of both the film strength and the surface roughness, it is made to have a base material layer and a high concentration of particles. In the layered film of the particle layer (layer A), the particles contained in the layer A preferably have an average particle diameter of 1 μm or more and 10 μm or less; the content of the entire A layer is 100 mass %, and its content is preferably 1 mass % or more and 40 mass % the following. The content of the particles contained in the A layer is more preferably 3 mass % or more and 35 mass % or less, and more preferably 5 mass % or more and 30 mass % or less. In addition, the average particle diameter of the particles contained in the A layer is preferably 2 μm or more and 10 μm or less, more preferably 3 μm or more and 9 μm or less, and most preferably 4 μm or more and 8 μm or less. In addition, the average particle diameter in this invention means the number average particle diameter D represented by D=ΣDi/N (Di: equivalent circle diameter of particle, N: number of objects).
使用於本發明之含高濃度粒子層(A層)的粒子,無機粒子、有機粒子皆可適用。亦可併用無機粒子與有機粒子。 As the particles used in the high-concentration particle-containing layer (layer A) of the present invention, both inorganic particles and organic particles can be applied. Inorganic particles and organic particles may be used in combination.
於此,就使用之無機粒子、有機粒子而言不特別限定。例如,作為無機粒子,可使用二氧化矽、矽酸鋁、矽酸氧化鋁、碳酸鈣、磷酸鈣、氧化鋁、雲母、黏土、滑石等。作為有機粒子,可使用以苯乙烯、聚矽氧、丙烯酸類、甲基丙烯酸類、聚酯類、二乙烯基化合物等作為構成成分的粒子。無機粒子當中,宜使用濕式及乾式二氧化矽、膠體二氧化矽、矽酸鋁等。有機粒子當中,宜使用以苯乙烯、聚矽氧、丙烯酸、甲基丙烯酸、聚酯、二乙烯基苯等作為構成成分的粒子。基於霧面外觀、經濟性觀點,特佳使用二氧化矽、矽酸鋁、矽酸氧化鋁。此外,此等粒子亦可併用二種以上。 Here, the inorganic particles and organic particles to be used are not particularly limited. For example, as the inorganic particles, silica, aluminum silicate, alumina silicate, calcium carbonate, calcium phosphate, alumina, mica, clay, talc, and the like can be used. As the organic particles, particles containing styrene, polysiloxane, acrylic, methacrylic, polyester, and divinyl compounds as constituent components can be used. Among the inorganic particles, wet and dry silica, colloidal silica, aluminum silicate, etc. are preferably used. Among the organic particles, particles containing styrene, polysiloxane, acrylic, methacrylic, polyester, divinylbenzene, etc. as constituent components are preferably used. From the viewpoint of matte appearance and economy, it is particularly preferable to use silica, aluminum silicate, and aluminum silicate. In addition, these particles may be used in combination of two or more.
又,本發明之薄膜,對於表面粗糙度SRa為100nm以上3000nm以下的面,20cm×14cm範圍之表面粗糙度SRa的偏差需為10%以下。本發明中表面粗糙度SRa的偏差,係針對將薄膜於任意位置切成長20cm×寬14cm之大小的試樣,由沿長度方向以5等分、沿寬度方向以4等分切成長4.0cm×寬3.5cm之大小的20個試樣的表面粗糙度SRa,依後述記載的方法來算出。表面 粗糙度SRa的偏差若大於10%,則霧面調轉印性會參差不齊,而導致製品外觀劣化。基於霧面調製品外觀觀點,表面粗糙度SRa的偏差若為8%以下則更佳,若為6%以下則最佳。本案發明人等致力研究的結果闡明,將本發明之薄膜作為轉印薄膜使用時,具有一定程度以上之表面粗糙度SRa的偏差者,剝離性較優良。迄此,此現象係由何種機制所引起並未明瞭,惟吾人推測,若具有一定程度表面粗糙度SRa的偏差,而大量形成用來引起剝離之起點的結果,剝離性良好。因此,基於剝離性觀點,表面粗糙度SRa的偏差較佳為0.1%以上,更佳為0.5%以上,再更佳為1%以上。 In addition, in the thin film of the present invention, the variation of the surface roughness SRa in the range of 20 cm×14 cm needs to be 10% or less for a surface having a surface roughness SRa of not less than 100 nm and not more than 3000 nm. The deviation of the surface roughness SRa in the present invention is for a sample of a size of 20 cm in length x 14 cm in width cut into a film at an arbitrary position, and is divided into 5 equal parts along the length direction and 4 equal parts along the width direction. The length is 4.0 cm x The surface roughness SRa of 20 samples with a width of 3.5 cm was calculated according to the method described later. If the deviation of the surface roughness SRa is more than 10%, the matte transferability will be uneven, and the appearance of the product will be deteriorated. From the viewpoint of the appearance of the matte preparation product, the variation in the surface roughness SRa is more preferably 8% or less, and most preferably 6% or less. As a result of diligent research conducted by the inventors of the present invention, it was found that when the film of the present invention is used as a transfer film, a surface roughness SRa having a variation of a certain level or more is excellent in releasability. So far, the mechanism by which this phenomenon is caused has not been elucidated, but it is presumed that if there is a certain degree of variation in the surface roughness SRa and a large number of starting points for causing peeling are formed, the peelability will be good. Therefore, from the viewpoint of peelability, the variation in the surface roughness SRa is preferably 0.1% or more, more preferably 0.5% or more, and still more preferably 1% or more.
本發明中,就將表面粗糙度SRa為100nm以上3000nm以下之表面的20cm×14cm範圍之表面粗糙度SRa的偏差設為上述範圍的方法而言,不特別限制,例如較佳採用作成具有基材層與含高濃度粒子層(A層)的積層薄膜,並使A層的積層厚度TA(μm)、與A層所含之粒子的平均粒徑DA(μm)滿足下述(I)式的方法。 In the present invention, there is no particular limitation on the method of setting the variation of the surface roughness SRa in the range of 20 cm×14 cm of the surface with the surface roughness SRa of 100 nm to 3000 nm and the above range, for example, it is preferable to use a A layered film with a high-concentration particle-containing layer (layer A) such that the layer thickness TA (μm) of the layer A and the average particle diameter DA (μm) of the particles contained in the layer A satisfy the following formula (I) method.
0.8≦DA/TA≦10.0…(I) 0.8≦DA/TA≦10.0…(I)
藉由滿足(I)式,可進一步使表面粗糙度SRa,於表面一定程度均勻地控制粒子的形狀,而更容易將表面粗糙度SRa的偏差控制於上述範圍。基於表面粗糙度SRa的偏差與抑制粒子脫落觀點,更佳滿足(I’)式,再更佳滿足(I”)式,最佳滿足(I''')。 By satisfying the formula (I), the surface roughness SRa can be further controlled to a certain extent uniformly in the shape of the particles on the surface, and the variation of the surface roughness SRa can be more easily controlled within the above-mentioned range. From the viewpoint of the variation of the surface roughness SRa and the suppression of particle falling off, the formula (I') is more preferably satisfied, the formula (I") is further satisfied, and the expression (I''') is best satisfied.
1.1≦DA/TA≦10.0…(I’) 1.1≦DA/TA≦10.0…(I’)
1.2≦DA/TA≦8.0…(I”) 1.2≦DA/TA≦8.0…(I”)
1.3≦DA/TA≦6.0…(I''')。 1.3≦DA/TA≦6.0…(I''').
當本發明之薄膜為具有基材層與含高濃度粒子層(A層)的積層薄膜時,A層可僅配置於基材層的其中一表面,亦可配置於兩表面。 When the film of the present invention is a laminate film having a substrate layer and a high-concentration particle-containing layer (layer A), layer A may be disposed on only one surface of the substrate layer, or may be disposed on both surfaces.
將本發明之薄膜用於轉印用途時,係在本發明之薄膜的表面粗糙度SRa為100nm以上3000nm以下的薄膜面上設置機能層(轉印本發明之薄膜的表面粗糙度SRa為100nm以上3000nm以下之薄膜面的形狀的被轉印材料層)。作為機能層,宜使用光硬化性樹脂。為充分確保由光硬化性樹脂構成之機能層的硬化性,本發明之薄膜其320nm的平行線穿透率ST320需為30%以上。ST320若小於30%,則光硬化性樹脂的硬化性不充分,導致轉印霧面外觀的特性變差。ST320若為45%以上則更佳,若為60%以上則最佳。基於薄膜的操作處理性觀點,ST320較佳為95%以下。此外,就穿透率而言,一般有(i)考量到反射、散射的穿透率(以積分球聚集穿透的光所測定的總光線穿透率)、(ii)未考量到反射、散射的穿透率(以平行光線測定穿透率之平行線穿透率)。為充分確保由光硬化性樹脂構成之機能層的硬化性,則需提高(ii)的平行線穿透率。 When the film of the present invention is used for transfer purposes, a functional layer is provided on the surface of the film of the present invention whose surface roughness SRa is 100 nm to 3000 nm (the surface roughness SRa of the transfer film of the present invention is 100 nm to 3000 nm). The material layer to be transferred in the shape of the film surface below). As the functional layer, a photocurable resin is preferably used. In order to sufficiently secure the curability of the functional layer composed of the photocurable resin, the parallel line transmittance ST320 at 320 nm of the film of the present invention needs to be 30% or more. If ST320 is less than 30%, the curability of the photocurable resin will be insufficient, and the properties of transferring the matte appearance will be deteriorated. If ST320 is 45% or more, it is more preferable, and if it is 60% or more, it is the best. From the viewpoint of the handleability of the film, ST320 is preferably 95% or less. In addition, in terms of transmittance, there are generally (i) the transmittance taking into account reflection and scattering (the total light transmittance measured by collecting the transmitted light with an integrating sphere), (ii) not taking into account reflection, Scattered transmittance (parallel line transmittance measured with parallel rays). In order to sufficiently secure the curability of the functional layer made of the photocurable resin, it is necessary to increase the parallel line transmittance of (ii).
再者,本發明之薄膜,為壓低霧面調轉印性的偏差,於薄膜20cm×14cm範圍,ST320的偏差較佳為10%以下。藉由使ST320的偏差為10%以下,應用光硬化性樹脂時之樹脂的硬化性更均勻,而能夠抑制霧面調轉印性的偏差。ST320的偏差係與上述表面粗糙度SRa的偏差之評定相同,針對將薄膜於任意位置切成長20cm×寬 14cm之大小的試樣,沿長度方向以5等分、沿寬度方向以4等分切成長4.0cm×寬3.5cm之大小,分別由試樣之320nm的平行線穿透率ST320來算出。薄膜20cm×14cm範圍之ST320的偏差較佳為8%以下,最佳為6%以下。另一方面,本案發明人等致力研究的結果闡明,將本發明之薄膜作為轉印薄膜使用時,具有一定程度以上之ST320的偏差者,剝離性較優良。迄此,此現象係由何種機制所引起並未明瞭,惟若具有一定程度ST320的偏差,在由光硬化性樹脂構成的機能層產生進行硬化的部分與不易進行硬化的部分而形成硬度較高的部分與較低的部分。其結果,在由光硬化性樹脂構成的機能層存在於硬度較低的部分附近之硬度較高的部分便成為引起剝離之起點,推定剝離性良好。因此,基於剝離性觀點,ST320的偏差較佳為0.5%以上,更佳為1%以上。 Furthermore, in the film of the present invention, in order to reduce the variation in the transferability of the matte surface, the variation of ST320 is preferably 10% or less in the range of 20 cm×14 cm of the film. By making the variation of ST320 10% or less, the curability of the resin when the photocurable resin is applied is more uniform, and the variation of the matte transferability can be suppressed. The deviation of ST320 is the same as the evaluation of the deviation of the above-mentioned surface roughness SRa. For a sample with a length of 20cm × a width of 14cm, cut the film at any position into 5 equal parts along the length direction and 4 equal parts along the width direction. The size of the growth 4.0 cm x the width 3.5 cm was calculated from the parallel line transmittance ST320 of the sample at 320 nm, respectively. The deviation of ST320 in the range of the film 20cm×14cm is preferably 8% or less, and most preferably 6% or less. On the other hand, as a result of diligent research conducted by the inventors of the present invention, it has been found that when the film of the present invention is used as a transfer film, those having a variation of ST320 to a certain extent or more are excellent in peelability. So far, it is not clear what mechanism causes this phenomenon, but if there is a certain degree of deviation in ST320, the functional layer composed of photocurable resin will have a hardened part and a hardened part, resulting in a higher hardness. High part and low part. As a result, in the functional layer composed of the photocurable resin, the portion with high hardness in the vicinity of the portion with low hardness becomes a starting point for peeling, and it is presumed that the peelability is good. Therefore, from the viewpoint of peelability, the variation of ST320 is preferably 0.5% or more, more preferably 1% or more.
又,本發明之薄膜其薄膜霧度較佳為70%以下。藉由薄膜霧度為70%以下,在層合於被轉印材料之積層體之構成下,可大幅提升缺陷檢查性而較佳。 Moreover, the film haze of the film of the present invention is preferably 70% or less. When the haze of the film is 70% or less, the defect inspection property can be greatly improved under the constitution of the layered product laminated on the transfer target material, which is preferable.
本發明中,作為使320nm的平行線穿透率ST320為30%以上的方法,可舉出作成具有基材層與含高濃度粒子層(A層)的積層薄膜,僅將前述含高濃度粒子層(A層)配置於基材層的其中一面,並使基材層中的粒子濃度,相對於基材層全體為小於1質量%的方法。基材層中的粒子濃度較佳相對於基材層全體為小於0.5質量%。再者,較佳減少含高濃度粒子層(A層)之粒子周邊的空隙。例如,當基材層、含高濃度粒子層(A層)均包含聚酯而作 成雙軸拉伸聚酯薄膜時,為了抑制含高濃度粒子層(A層)於後述拉伸時產生空隙,而較佳採用:提高含高濃度粒子層(A層)之拉伸性的方法、在後述拉伸後的熱處理步驟中藉由進行高溫處理而減少空隙的方法等。含高濃度粒子層(A層),為提高其拉伸性,係以含有共聚聚對酞酸乙二酯樹脂、聚對酞酸丙二酯樹脂樹脂及/或其共聚物、聚對酞酸丁二酯樹脂及/或其共聚物為佳。 In the present invention, as a method for making the parallel line transmittance ST320 at 320 nm to be 30% or more, a laminate film having a base material layer and a high-concentration particle-containing layer (layer A) is prepared, and only the high-concentration particle-containing layer is formed. A method in which the layer (layer A) is arranged on one surface of the base material layer, and the particle concentration in the base material layer is less than 1 mass % with respect to the whole base material layer. The particle concentration in the base material layer is preferably less than 0.5 mass % with respect to the entire base material layer. Furthermore, it is preferable to reduce the voids around the particles of the high-concentration particle-containing layer (layer A). For example, when both the base material layer and the high-concentration particle-containing layer (layer A) contain polyester to form a biaxially stretched polyester film, in order to suppress the generation of voids in the high-concentration particle-containing layer (layer A) during stretching as described later, More preferably, a method of improving the stretchability of the high-concentration particle-containing layer (layer A), a method of reducing voids by performing a high-temperature treatment in a heat treatment step after stretching, which will be described later, and the like are preferably used. The high-concentration particle-containing layer (layer A) contains copolymerized polyethylene terephthalate resin, polytrimethylene terephthalate resin and/or its copolymer, poly(terephthalic acid) in order to improve its stretchability. Butylene diester resins and/or copolymers thereof are preferred.
此外,本發明中,在薄膜20cm×14cm範圍控制ST320的偏差的方法,可舉出調整薄膜拉伸步驟中的拉伸條件。例如,將本發明之薄膜作成雙軸拉伸聚酯薄膜時,長度方向拉伸、寬度方向拉伸步驟之至少任一拉伸步驟較佳採用2階段以上之階段拉伸。採長度方向、寬度方向之同時雙軸拉伸時,亦較佳採用2階段以上之階段拉伸。本發明中所稱2階段以上之階段拉伸,係指設置2區間以上之拉伸區間,且於2區間採用不同的拉伸條件。茲推定藉由進行2階段以上之階段拉伸,可減少粒子附近的應變,由此可抑制拉伸不均,而能夠將ST320的偏差控制於較佳範圍。又,亦可舉出將拉伸速度設為後述合宜範圍作為較佳方法。拉伸區間較佳採2區間以上3區間以下。 Moreover, in this invention, as the method of controlling the dispersion|variation of ST320 in a film 20cm*14cm range, adjustment of the stretching conditions in a film stretching process is mentioned. For example, when the film of the present invention is used as a biaxially stretched polyester film, at least one of the stretching in the longitudinal direction and the stretching in the width direction is preferably two or more staged stretching. In the case of simultaneous biaxial stretching in the longitudinal direction and the width direction, it is also preferable to employ two or more stage stretching. In the present invention, the two-stage or more staged stretching means that two or more stretching sections are set, and different stretching conditions are used in the two sections. It is presumed that by performing the stepwise stretching in two or more stages, the strain in the vicinity of the particles can be reduced, whereby the stretching unevenness can be suppressed, and the variation of ST320 can be controlled within a preferable range. Moreover, it can also be mentioned as a preferable method to make a drawing speed into a suitable range mentioned later. The stretching interval is preferably above 2 intervals and below 3 intervals.
又,本發明中,為將薄膜霧度成為70%以下,可舉出控制薄膜中所含有之粒子量的方法。當本發明之薄膜為具有基材層與含高濃度粒子層(A層)的積層薄膜時,較佳將基材層中的粒子含量設為相對於基材層全體為小於3質量%。 Moreover, in this invention, in order to make a film haze into 70% or less, the method of controlling the amount of particle|grains contained in a film is mentioned. When the film of the present invention is a laminate film having a substrate layer and a high-concentration particle-containing layer (layer A), the particle content in the substrate layer is preferably less than 3% by mass relative to the entire substrate layer.
本發明之薄膜,基於霧面調轉印性與轉印後的薄膜剝離性觀點,表面粗糙度SRa為100nm以上3000nm以下的面之最大波峰高度(SRp)與最大波谷深度(SRv)較佳滿足下述(II)式。 In the film of the present invention, from the viewpoints of matte transferability and film releasability after transfer, the maximum peak height (SRp) and the maximum valley depth (SRv) of the surface with a surface roughness SRa of not less than 100 nm and not more than 3000 nm preferably satisfy the following requirements: Formula (II) is described.
1≦SRp/SRv≦3…(II) 1≦SRp/SRv≦3…(II)
藉由表面之最大波峰高度(SRp)、與最大波谷深度(SRv)滿足(II)式,而具有足以轉印霧面調的山形狀,而且可良好地控制從機能層的轉印剝離性。表面之最大波峰高度(SRp)、與最大波谷深度(SRv)更佳滿足下述(II)’式,最佳滿足(II)”式。 Since the maximum peak height (SRp) and maximum trough depth (SRv) of the surface satisfy the formula (II), it has a mountain shape sufficient to transfer a matte tone, and can well control the transfer peelability from the functional layer. The maximum peak height (SRp) and maximum trough depth (SRv) of the surface preferably satisfy the following formula (II)', and best satisfy the formula (II)".
1.1≦SRp/SRv≦2.9…(II)’ 1.1≦SRp/SRv≦2.9…(II)’
1.2≦SRp/SRv≦2.8…(II)” 1.2≦SRp/SRv≦2.8…(II)”
用於使表面之最大波峰高度(SRp)、與最大波谷深度(SRv)滿足(II)式的方法不特別限制。例如,當本發明之薄膜為具有基材層與含高濃度粒子層(A層)的積層薄膜時,較佳採用藉由縮小A層所含有之粒子的粒徑,並提高粒子濃度的方法來控制薄膜表面的形狀之方法。較佳將A層所含有之粒子的平均粒徑設為小於2.5μm,且將其含量,以A層全體為100質量%而含有3質量%以上40質量%以下。A層所含有之粒子的平均粒徑更佳小於2.3μm。又,A層的粒子含量更佳含有5質量%以上30質量%以下。 The method for making the maximum peak height (SRp) and the maximum trough depth (SRv) of the surface satisfy the formula (II) is not particularly limited. For example, when the film of the present invention is a laminate film having a substrate layer and a layer containing high-concentration particles (layer A), it is preferable to adopt a method of reducing the particle size of the particles contained in the layer A and increasing the particle concentration. A method of controlling the shape of a film surface. The average particle diameter of the particles contained in the A layer is preferably less than 2.5 μm, and the content is preferably 3 to 40 mass % based on 100 mass % of the entire A layer. The average particle diameter of the particles contained in the A layer is more preferably less than 2.3 μm. Moreover, the particle content of the A layer is more preferably 5 mass % or more and 30 mass % or less.
又,本發明之薄膜,基於使從機能層的轉印剝離性更良好之觀點,表面粗糙度SRa為100nm以上3000nm以下的面之中心面積率(SSr)較佳滿足下述(III)式。 Furthermore, in the film of the present invention, from the viewpoint of making the transfer releasability from the functional layer more favorable, the central area ratio (SSr) of the surface having a surface roughness SRa of 100 nm or more and 3000 nm or less preferably satisfies the following formula (III).
30≦SSr≦60…(III) 30≦SSr≦60…(III)
中心面面積率(SSr)係指根據後述之測定方法所求得者,係表示中心面之凸部佔基準面積之比例的指標。此值愈大,表示存在於薄膜表面之突起的凸部為愈平緩的形狀;此值愈小,則表示存在於薄膜表面的突起為愈陡峭的形狀。藉由表面的中心面面積率(SSr)滿足(III)式,可使霧面調轉印於表面凹凸形狀,同時良好地控制從機能層的轉印剝離性。表面的中心面面積率(SSr)更佳滿足(III)’式,最佳滿足(III)”式。 The central surface area ratio (SSr) is obtained by the measurement method described later, and is an index indicating the ratio of the convex portion of the central surface to the reference area. The larger the value is, the smoother the protrusions of the protrusions on the film surface are; the smaller the value is, the steeper the protrusions on the film surface are. When the center surface area ratio (SSr) of the surface satisfies the formula (III), the matte surface can be adjusted and transferred to the surface asperity shape, and the transferability from the functional layer can be well controlled. The central surface area ratio (SSr) of the surface preferably satisfies the formula (III)', and best meets the formula (III)".
30≦SSr≦55…(III)’ 30≦SSr≦55…(III)’
35≦SSr≦55…(III)” 35≦SSr≦55…(III)”
用於使表面的中心面面積率(SSr)滿足(III)式的方法不特別限制。例如,當本發明之薄膜為具有基材層與含高濃度粒子層(A層)的積層薄膜時,較佳採用縮小A層所含有之粒子的粒徑、提高粒子濃度,並使A層的厚度成為一定值以下的方法。較佳為使A層所含有之粒子的平均粒徑小於2.5μm,且使其含量,以A層全體為100質量%而設為3質量%以上40質量%以下,並使A層的積層厚度小於3μm。又,A層所含有之粒子的平均粒徑與A層之積層厚度的比(DA(μm)/TA(μm))若為0.8以上10以下則較佳,若為1.1以上10以下則更佳,若為1.3以上6以下則最佳。The method for making the central surface area ratio (SSr) of the surface satisfy the formula (III) is not particularly limited. For example, when the film of the present invention is a laminate film having a substrate layer and a layer containing high-concentration particles (layer A), it is preferable to reduce the particle size of the particles contained in the A layer, increase the particle concentration, and make the A layer's particle size smaller. A method in which the thickness becomes less than or equal to a certain value. Preferably, the average particle diameter of the particles contained in the A layer is less than 2.5 μm, and the content of the particles contained in the A layer is preferably 3 mass % or more and 40 mass % or less based on 100 mass % of the entire A layer, and the layer thickness of the A layer is set. less than 3μm. In addition, the ratio (DA (μm)/TA (μm)) of the average particle diameter of the particles contained in the A layer to the laminate thickness of the A layer is preferably 0.8 or more and 10 or less, and more preferably 1.1 or more and 10 or less. , if it is 1.3 or more and 6 or less, it is the best.
本發明之積層薄膜,係以將100℃、10分鐘之熱處理前後的厚度變化控制於0.1%以上10%以下為佳。將本發明之薄膜作為轉印薄膜使用時,係在本發明之薄膜的表面粗糙度SRa為100nm以上3000nm以下的薄膜面上設置機能層(供轉印本發明之薄膜的表面粗糙度SRa為100nm以上3000nm以下的薄膜面之形狀的被轉印材料層),而設置機能層時的機能層塗敷乾燥時係施加熱負載。藉由將施加熱負載時之薄膜的厚度方向的尺寸變化,亦即100℃、10分鐘之熱處理前後的厚度變化控制為10%以下,則機能層塗敷乾燥時薄膜較不易陷入機能層,而能夠更良好地控制轉印剝離性。100℃、10分鐘之熱處理前後的厚度變化更佳為8%以下,再更佳為6%以下。另一方面,本案發明人等致力研究的結果闡明,將本發明之薄膜作為轉印薄膜使用時,施加熱負載時具有一定程度以上之薄膜厚度方向的尺寸變化者,剝離性較優良。迄此,此現象係由何種機制所引起並未明瞭,惟吾人推測,施加熱負載時具有一定程度之薄膜厚度方向的尺寸變化者,較易散佈有薄膜大幅陷入機能層的部位與小幅陷入機能層的部位,結果在薄膜大幅陷入機能層的部位附近,薄膜小幅陷入機能層的部位成為引起剝離之起點。因此,基於剝離性觀點,100℃、10分鐘之熱處理前後的厚度變化較佳為0.5%以上,更佳為1%以上。作為控制100℃、10分鐘之熱處理前後的厚度變化的方法,例如將本發明之薄膜作成雙軸拉伸聚酯薄膜時,可舉出調整薄膜拉伸步驟中的拉伸條件。可舉出將 拉伸倍率(面倍率=長度方向拉伸倍率×寬度方向拉伸倍率)高倍率化至14倍以上、較佳為16倍以上,進一步將拉伸後的熱處理溫度設為230℃以上、較佳為235℃以上250℃以下作為較佳方法。 In the laminated film of the present invention, it is preferable to control the thickness change before and after the heat treatment at 100° C. for 10 minutes to 0.1% or more and 10% or less. When the film of the present invention is used as a transfer film, a functional layer is provided on the surface of the film having a surface roughness SRa of not less than 100 nm and not more than 3000 nm (for transferring the film of the present invention, the surface roughness SRa is not less than 100 nm). 3000nm or less film surface shape of the transfer material layer), and when the functional layer is provided, a thermal load is applied when the functional layer is coated and dried. By controlling the dimensional change in the thickness direction of the film when thermal load is applied, that is, the thickness change before and after heat treatment at 100°C for 10 minutes, to be less than 10%, the film is less likely to fall into the functional layer when the functional layer is coated and dried, and Transfer releasability can be better controlled. The thickness change before and after the heat treatment at 100° C. for 10 minutes is more preferably 8% or less, and still more preferably 6% or less. On the other hand, as a result of intensive research conducted by the inventors of the present invention, when the film of the present invention is used as a transfer film, when a thermal load is applied, a dimensional change in the film thickness direction to a certain extent or more is excellent in releasability. So far, it is not clear what mechanism causes this phenomenon, but we speculate that those with a certain degree of dimensional change in the thickness direction of the film when a thermal load is applied are more likely to have parts where the film is greatly entrapped into the functional layer and slightly entrapped. As a result, at the site of the functional layer, near the site where the film is largely entrapped in the functional layer, and the site where the film slightly entrapped in the functional layer becomes a starting point for peeling. Therefore, from the viewpoint of peelability, the thickness change before and after the heat treatment at 100° C. for 10 minutes is preferably 0.5% or more, more preferably 1% or more. As a method of controlling the thickness change before and after the heat treatment at 100°C for 10 minutes, for example, when the film of the present invention is used as a biaxially stretched polyester film, the stretching conditions in the film stretching step can be adjusted. For example, the stretching ratio (area ratio = longitudinal stretching ratio × width direction stretching ratio) is increased to 14 times or more, preferably 16 times or more, and the heat treatment temperature after stretching is set to 230° C. A preferable method is above, preferably 235°C or more and 250°C or less.
本發明之薄膜,基於轉印性觀點,較佳將表面粗糙度SRa為100nm以上3000nm以下之表面的表面自由能設為44mN/m以下。藉由將表面自由能設為44mN/m以下,由於可提升與轉印材料的剝離性,而容易轉印、剝離,得以提升轉印性。A層側的表面自由能若為42mN/m以下則更佳,若為15mN/m以上40mN/m以下則最佳。 From the viewpoint of transferability, the film of the present invention preferably has a surface free energy of 44 mN/m or less of a surface having a surface roughness SRa of 100 nm or more and 3000 nm or less. By setting the surface free energy to be 44 mN/m or less, since the releasability with the transfer material can be improved, transfer and peeling can be facilitated, and the transferability can be improved. The surface free energy on the layer A side is more preferably 42 mN/m or less, and more preferably 15 mN/m or more and 40 mN/m or less.
就將本發明之薄膜的表面粗糙度SRa為100nm以上3000nm以下之表面的表面自由能設為前述範圍的方法而言,不特別限定,可舉出使薄膜中含有聚矽氧化合物、蠟化合物、氟系化合物等脫模劑的方法、實施脫模塗布的方法等。此外,當本發明之薄膜為具有基材層與含高濃度粒子層(A層)的積層薄膜時,較佳為對含高濃度粒子層(A層)添加前述脫模劑、或對前述(A層)表面實施脫模塗布的方法。 The method for setting the surface free energy of the surface of the thin film of the present invention having a surface roughness SRa of not less than 100 nm and not more than 3000 nm in the aforementioned range is not particularly limited. The method of mold release agent, such as a fluorine-type compound, the method of implementing mold release coating, etc. In addition, when the film of the present invention is a laminate film having a base material layer and a high-concentration particle-containing layer (A layer), it is preferable to add the aforementioned release agent to the high-concentration particle-containing layer (A layer), or to the aforementioned ( A layer) The method of performing mold release coating on the surface.
本發明中,在對含高濃度粒子層(A層)表面實施脫模塗布之構成時,為了使由含高濃度粒子層(A層)中所含有之粒子所形成的凹凸顯現於脫模塗層的表面,脫模塗層的厚度較佳為0.01μm以上3μm以下,若為0.02μm以上2μm以下則更佳,若為0.03μm以上1.5μm以下則進一步較佳。又,基於加熱時的耐熱性觀點,較 佳使脫模層中含有三聚氰胺樹脂與脫模劑。基於耐熱性、脫模穩定性觀點,脫模層中之三聚氰胺樹脂的含量較佳為50質量%以上。 In the present invention, when the surface of the high-concentration particle-containing layer (layer A) is subjected to release coating, in order to make the concavities formed by the particles contained in the high-concentration particle-containing layer (layer A) appear on the release coating On the surface of the layer, the thickness of the release coating is preferably 0.01 μm or more and 3 μm or less, more preferably 0.02 μm or more and 2 μm or less, and even more preferably 0.03 μm or more and 1.5 μm or less. In addition, from the viewpoint of heat resistance during heating, it is preferable to contain a melamine resin and a mold release agent in the mold release layer. From the viewpoint of heat resistance and mold release stability, the content of the melamine resin in the mold release layer is preferably 50% by mass or more.
作為可用於本發明的三聚氰胺樹脂,可舉出三聚氰胺甲醛樹脂或甲基化三聚氰胺甲醛樹脂、丁基化三聚氰胺甲醛樹脂、醚化三聚氰胺甲醛樹脂、環氧改性三聚氰胺甲醛樹脂等三聚氰胺甲醛樹脂、尿素三聚氰胺樹脂、丙烯酸三聚氰胺樹脂等。其中較佳為三聚氰胺甲醛樹脂,由具有適度的脫模性而言,特佳使用甲基化三聚氰胺甲醛樹脂。又,本發明中的脫模層,基於製膜性、拉伸順應性觀點,較佳除黏著劑樹脂、脫模劑外亦含有其他的黏著劑樹脂。作為黏著劑樹脂,較佳使用聚酯系樹脂、丙烯酸系樹脂、胺基甲酸酯系樹脂,特佳使用丙烯酸系樹脂。作為丙烯酸系樹脂,可舉出(甲基)丙烯酸烷基酯之均聚物或共聚物、側鏈及/或主鏈末端具有硬化性官能基之(甲基)丙烯酸酯共聚物;作為硬化性官能基,可舉出羥基、羧基、環氧基、胺基等。其中較佳為共聚合丙烯酸單體與側鏈及/或主鏈末端具有硬化性官能基之丙烯酸酯而成的丙烯酸單體共聚物。又,本發明之脫模層所含有之脫模劑,可舉出例如氟化合物、長鏈烷基化合物及蠟化合物等。此等脫模劑可單獨使用,亦可使用多種。 Examples of the melamine resin usable in the present invention include melamine formaldehyde resins, methylated melamine formaldehyde resins, butylated melamine formaldehyde resins, etherified melamine formaldehyde resins, epoxy-modified melamine formaldehyde resins, and other melamine formaldehyde resins, and urea melamine resins. resin, acrylic melamine resin, etc. Among them, melamine formaldehyde resin is preferred, and methylated melamine formaldehyde resin is particularly preferred because of moderate releasability. In addition, the mold release layer in the present invention preferably contains other adhesive resins in addition to the adhesive resin and the release agent from the viewpoints of film-forming properties and stretchability. As the adhesive resin, polyester-based resins, acrylic-based resins, and urethane-based resins are preferably used, and acrylic-based resins are particularly preferably used. Examples of acrylic resins include homopolymers or copolymers of alkyl (meth)acrylates, and (meth)acrylate copolymers having curable functional groups at the end of the side chain and/or main chain; As a functional group, a hydroxyl group, a carboxyl group, an epoxy group, an amine group, etc. are mentioned. Among them, an acrylic monomer copolymer obtained by copolymerizing an acrylic monomer and an acrylate having a sclerosing functional group at the end of a side chain and/or a main chain is preferable. Moreover, as a release agent contained in the release layer of this invention, a fluorine compound, a long-chain alkyl compound, a wax compound, etc. are mentioned, for example. These release agents may be used alone or in plural.
作為可用於本發明的氟化合物,為化合物中含有氟原子的化合物。可舉出例如含全氟烷基之化合物、含氟原子之烯烴化合物的聚合物、氟苯等芳香族氟 化合物等。將本發明之脫模薄膜用於成形同時轉印箔用途等時,由於在轉印時需施加較高的熱負載,若考量到耐熱性、汙染性,則氟化合物較佳為高分子化合物。 The fluorine compound that can be used in the present invention is a compound containing a fluorine atom in the compound. Examples thereof include perfluoroalkyl group-containing compounds, polymers of fluorine atom-containing olefin compounds, and aromatic fluorine compounds such as fluorobenzene. When the mold release film of the present invention is used for forming and simultaneous transfer foil applications, the fluorine compound is preferably a macromolecular compound in consideration of heat resistance and contamination because a high thermal load is applied during transfer.
長鏈烷基化合物係指具有碳數為6以上,特佳為8以上之直鏈或分支烷基的化合物。作為其具體例,不特別限定,可舉出含長鏈烷基之聚乙烯樹脂、含長鏈烷基之丙烯酸樹脂、含長鏈烷基之聚酯樹脂、含長鏈烷基之胺化合物、含長鏈烷基之醚化合物、含長鏈烷基之四級銨鹽等。長鏈烷基化合物若為高分子化合物,剝離脫模薄膜時可抑制源自脫模層之成分轉黏於貼合之對象基材表面而較佳。 The long-chain alkyl compound refers to a compound having a linear or branched alkyl group having 6 or more carbon atoms, particularly preferably 8 or more carbon atoms. Specific examples thereof include, without particular limitation, long-chain alkyl group-containing polyethylene resins, long-chain alkyl group-containing acrylic resins, long-chain alkyl group-containing polyester resins, long-chain alkyl group-containing amine compounds, Ether compounds containing long-chain alkyl groups, quaternary ammonium salts containing long-chain alkyl groups, etc. If the long-chain alkyl compound is a polymer compound, it is preferable to prevent the components derived from the release layer from sticking to the surface of the target substrate to be bonded when the release film is peeled off.
作為可用於本發明的蠟化合物,為天然蠟、合成蠟、由摻有此等的蠟當中所選出的蠟。天然蠟係指植物系蠟、動物系蠟、礦物系蠟、石油蠟。作為植物系蠟,可舉出小燭樹蠟、卡拿巴蠟、米糠蠟、木蠟、荷荷巴油。作為動物系蠟,可舉出蜜蠟、羊毛脂、鯨蠟。作為礦物系蠟,可舉出褐煤蠟、地蠟、純地蠟。作為石油蠟,可舉出石蠟、微晶蠟、石蠟油。作為合成蠟,可舉出合成烴、改性蠟、氫化蠟、脂肪酸、醯胺、胺、醯亞胺、酯、酮。就合成烴而言,有名者為費托蠟(別名沙索蠟(Sasol Wax))、聚乙烯蠟,此外亦包含屬低分子量的高分子(具體而言為黏度平均分子量500至20000的高分子)之以下的聚合物。亦即,有聚丙烯、乙烯‧丙烯酸共聚物、聚乙二醇、聚丙二醇、聚乙二醇與聚丙二醇之嵌段或接枝連結體。作為改性蠟,可舉出褐煤蠟衍生物、石 蠟衍生物、微晶蠟衍生物。此處所稱衍生物,係指藉由純化、氧化、酯化、皂化之任一種處理、或彼等之組合所得到的化合物。作為氫化蠟,可舉出硬化蓖麻油、及硬化蓖麻油衍生物。 As the wax compound usable in the present invention, there are natural waxes, synthetic waxes, and waxes selected from waxes incorporating these. Natural wax refers to vegetable wax, animal wax, mineral wax and petroleum wax. Examples of the vegetable wax include candelilla wax, carnauba wax, rice bran wax, wood wax, and jojoba oil. Examples of animal waxes include beeswax, lanolin, and spermaceti. As the mineral-based wax, montan wax, ozokerite wax, and ozokerite wax are mentioned. As petroleum wax, paraffin wax, microcrystalline wax, and paraffin oil are mentioned. Examples of synthetic waxes include synthetic hydrocarbons, modified waxes, hydrogenated waxes, fatty acids, amides, amines, amides, esters, and ketones. As far as synthetic hydrocarbons are concerned, well-known ones are Fischer-Tropsch wax (also known as Sasol Wax), polyethylene wax, and also include low molecular weight polymers (specifically, polymers with a viscosity average molecular weight of 500 to 20,000). ) or lower polymers. That is, there are polypropylene, ethylene-acrylic acid copolymers, polyethylene glycol, polypropylene glycol, block or graft linkages of polyethylene glycol and polypropylene glycol. Examples of the modified wax include montan wax derivatives, paraffin wax derivatives, and microcrystalline wax derivatives. The derivatives referred to herein refer to compounds obtained by any one of purification, oxidation, esterification, saponification, or a combination thereof. Examples of the hydrogenated wax include hardened castor oil and hardened castor oil derivatives.
藉由使此等脫模劑均勻地分散於脫模層的表面,可於脫模層上使與積層、剝離之被脫模層的密接力、剝離力達適確範圍。作為脫模劑,若使用長鏈烷基化合物,就可廣泛地調整剝離力而言,於本發明之用途上係較佳者。 By dispersing these mold release agents uniformly on the surface of the mold release layer, the adhesion force and peeling force with the laminated layer and the peeled mold release layer can be adjusted to an appropriate range on the mold release layer. As a mold release agent, when a long-chain alkyl compound is used, it is preferable for the use of the present invention because the peeling force can be adjusted widely.
其次就本發明之薄膜的具體製造方法,針對具有基材層與含高濃度粒子層(A層)的積層薄膜之實例加以記載,惟本發明非由所述實例限定地解釋。 Next, an example of a laminate film having a base material layer and a high-concentration particle-containing layer (layer A) will be described with respect to the specific production method of the film of the present invention, but the present invention is not limited to the example.
本發明之薄膜的基材層、含高濃度粒子層(A層)使用聚酯樹脂時,係分別供給至各個擠出機進行熔融擠出。此時,樹脂溫度較佳控制於255℃~295℃。接著,通過過濾器或齒輪泵,分別進行雜質的去除、擠出量的均等化,並由T模共擠出至冷卻鼓輪上成片狀,而得到積層片。此時,藉由:使用施加高電壓的電極而以靜電使冷卻鼓輪與樹脂密接的靜電施加法、在澆鑄鼓輪與擠出之聚合物片間設置水膜的澆鑄法、使澆鑄鼓輪溫度採聚酯樹脂的玻璃轉移點~(玻璃轉移點-20℃)而擠出之聚合物黏著的方法,或者此等方法多種組合而成的方法,使片狀聚合物密接於澆鑄鼓輪而冷卻固化。此等澆鑄法中,若使用聚酯時,基於生產性或平面性觀點,較佳使用施加靜電的方法。 When polyester resin is used for the base material layer and the high-concentration particle-containing layer (layer A) of the film of the present invention, they are supplied to each extruder and melt-extruded. At this time, the resin temperature is preferably controlled at 255°C to 295°C. Next, the removal of impurities and the equalization of the extrusion amount are carried out by a filter or a gear pump, respectively, and are co-extruded from a T-die onto a cooling drum to form a sheet to obtain a laminated sheet. At this time, by the electrostatic application method in which the cooling drum and the resin are electrostatically brought into close contact with the electrode using a high voltage, the casting method in which a water film is formed between the casting drum and the extruded polymer sheet, and the casting drum The temperature is the glass transition point of polyester resin ~ (glass transition point - 20 ℃) and the extrusion polymer is adhered, or a combination of these methods is used to make the sheet polymer closely adhere to the casting drum. Cool to solidify. Among these casting methods, when polyester is used, a method of applying static electricity is preferably used from the viewpoint of productivity and flatness.
本發明之積層薄膜,基於耐熱性、尺寸穩定性觀點較佳作成雙軸配向薄膜。雙軸配向薄膜可藉由將未拉伸薄膜朝長度方向拉伸後,朝寬度方向拉伸,或者朝寬度方向拉伸後,朝長度方向拉伸的逐次雙軸拉伸方法,或藉由在薄膜的長度方向、寬度方向大致同時地持續拉伸的同時雙軸拉伸方法等進行拉伸而得。 The laminated film of the present invention is preferably a biaxially oriented film from the viewpoints of heat resistance and dimensional stability. The biaxially oriented film can be stretched in the longitudinal direction of the unstretched film by stretching in the width direction, or by the sequential biaxial stretching method in which the unstretched film is stretched in the longitudinal direction after being stretched in the width direction, or by It is obtained by stretching the film by a simultaneous biaxial stretching method or the like in which the longitudinal direction and the width direction of the film are continuously stretched at substantially the same time.
所述拉伸方法中的拉伸倍率,於長度方向較佳為2.8倍以上5倍以下,更佳為2.9倍以上4.5倍以下。又,拉伸速度較佳為1,000%/分鐘以上200,000%/分鐘以下。又,長度方向的拉伸溫度較佳設為70℃以上90℃以下。又,就寬度方向的拉伸倍率,較佳為2.8倍以上5倍以下,更佳為3倍以上4.5倍以下。寬度方向的拉伸速度較佳為1,000%/分鐘以上200,000%/分鐘以下。此外,本發明之積層薄膜,基於控制薄膜的20cm×14cm範圍之320nm的平行線穿透率ST320的偏差之觀點,係以設為2階段以上之階段拉伸較佳。此外,上述拉伸倍率係表示各方向的總拉伸倍率。 The stretching ratio in the stretching method is preferably 2.8 times or more and 5 times or less in the longitudinal direction, more preferably 2.9 times or more and 4.5 times or less. Also, the stretching speed is preferably 1,000%/min or more and 200,000%/min or less. Moreover, the stretching temperature in the longitudinal direction is preferably 70°C or higher and 90°C or lower. In addition, the stretching ratio in the width direction is preferably 2.8 times or more and 5 times or less, and more preferably 3 times or more and 4.5 times or less. The stretching speed in the width direction is preferably 1,000%/min or more and 200,000%/min or less. In addition, the laminated film of the present invention is preferably stretched in two or more stages from the viewpoint of controlling the variation of the parallel line transmittance ST320 of 320 nm in the range of 20 cm×14 cm of the film. In addition, the said draw ratio shows the total draw ratio of each direction.
進而,於雙軸拉伸後進行薄膜的熱處理。熱處理可藉由在烘箱中經加熱的輥上等向來周知之任意方法來進行。此熱處理係於120℃以上聚酯之結晶熔化峰溫度以下的溫度下進行,而為了使320nm的平行線穿透率ST320成為30%以上,基於減少含高濃度粒子層(A層)之粒子周邊的空隙之觀點,熱處理溫度較佳設為含高濃度粒子層(A層)的熔點-20℃以上熔點+10℃以下,更佳設定於熔點-10℃以上熔點-5℃以下。熱處理時間可於不使特性惡化的範圍內任意設定,宜以較佳為5秒以上60秒以下,更佳為10秒以上40秒以下,最佳為15秒以上30秒以下進行。再者,為確保穩定的脫模性,亦可對A層的表面以線內式塗覆脫模層。作為以薄膜製造步驟內之線內式設置塗覆層的方法,較佳為在至少進行過單軸拉伸的薄膜上使塗覆層組成物分散於水中後使用計量棒(metering bar)或凹版輥等均勻地塗布,並一面實施拉伸一面使塗劑乾燥的方法。此時,就脫模層的厚度而言較佳採0.02μm以上0.1μm以下。又,亦可於脫模層中添加各種添加劑,例如抗氧化劑、耐熱穩定劑、紫外線吸收劑、紅外線吸收劑、顏料、染料、有機或無機粒子、抗靜電劑、晶核劑等。 Furthermore, heat treatment of the film is performed after the biaxial stretching. The heat treatment can be carried out by any conventionally known method, such as on heated rolls in an oven. This heat treatment is performed at a temperature of 120°C or higher and below the crystal melting peak temperature of the polyester, and in order to make the parallel line penetration rate ST320 at 320 nm to be 30% or higher, it is based on reducing the particle periphery of the high-concentration particle-containing layer (layer A). From the viewpoint of voids, the heat treatment temperature is preferably set to the melting point of the high-concentration particle-containing layer (layer A) -20°C or higher, melting point +10°C or lower, more preferably -10°C or higher, melting point -5°C or lower. The heat treatment time can be arbitrarily set within a range that does not deteriorate the characteristics, but is preferably 5 seconds or more and 60 seconds or less, more preferably 10 seconds or more and 40 seconds or less, and most preferably 15 seconds or more and 30 seconds or less. Furthermore, in order to ensure stable mold release properties, a mold release layer may be applied in-line to the surface of the A layer. As a method of disposing the coating layer in-line in the film production step, it is preferable to use a metering bar or a gravure plate after dispersing the coating layer composition in water on the film that has been at least uniaxially stretched A method of drying the coating agent while applying it uniformly with a roll or the like and extending it. In this case, the thickness of the mold release layer is preferably 0.02 μm or more and 0.1 μm or less. In addition, various additives such as antioxidants, heat-resistant stabilizers, ultraviolet absorbers, infrared absorbers, pigments, dyes, organic or inorganic particles, antistatic agents, crystal nucleating agents, etc. can also be added to the release layer.
此外,作為本發明之薄膜的一形態,可舉出一種積層薄膜,其為在基材層的至少其中一表面具有光澤度為30以下之低光澤層的積層薄膜,其中低光澤層表面的表面粗糙度SRa為100nm以上3000nm以下,薄膜的20cm×14cm範圍之表面粗糙度SRa的偏差為10%以下,且320nm的平行線穿透率ST320為30%以上。藉由具有光澤度為30以下之低光澤層,作為轉印薄膜使用時,可轉印低光澤外觀。低光澤層的光澤度更佳為25以下,再更佳為20以下。低光澤層的光澤度可藉由使其含有於含高濃度粒子層(A)所用的粒子、或調整低光澤層的表面粗糙度等來控制。於該構成中,低光澤層更佳採含高濃度粒子層(A)。此外,本發明中所稱光澤度,係表示根據後述之測定方法所求得的60°鏡面光澤度。 In addition, as one form of the film of the present invention, there can be mentioned a laminate film having a low gloss layer having a glossiness of 30 or less on at least one surface of the substrate layer, wherein the surface of the low gloss layer surface is The roughness SRa is 100 nm or more and 3000 nm or less, the variation of the surface roughness SRa in the range of 20 cm×14 cm of the thin film is 10% or less, and the parallel line transmittance ST320 at 320 nm is 30% or more. By having a low gloss layer with a glossiness of 30 or less, when used as a transfer film, a low gloss appearance can be transferred. The glossiness of the low gloss layer is more preferably 25 or less, still more preferably 20 or less. The glossiness of the low-gloss layer can be controlled by including particles used in the high-concentration particle-containing layer (A), adjusting the surface roughness of the low-gloss layer, and the like. In this configuration, the low gloss layer is more preferably the high concentration particle-containing layer (A). In addition, the glossiness mentioned in this invention means the 60 degree specular glossiness calculated|required by the measuring method mentioned later.
本發明之薄膜由於其至少單面的表面粗糙度SRa為100nm以上3000nm以下,20cm×14cm範圍之前述表面粗糙度SRa的偏差較小,且320nm的平行線穿透率較高,因此在使用光硬化性樹脂作為被轉印材時,可充分達成低光澤外觀的轉印、形狀固定。因此,其可適用於作為在電路形成步驟中霧面調外觀的轉印性優良的轉印用薄膜。 The film of the present invention has a surface roughness SRa of at least 100 nm to 3000 nm on at least one side, a small deviation of the aforementioned surface roughness SRa in the range of 20 cm×14 cm, and a high transmittance of parallel lines at 320 nm. When a curable resin is used as a material to be transferred, transfer of a low gloss appearance and shape fixation can be sufficiently achieved. Therefore, it can be used as a transfer film excellent in transferability with a matte appearance in the circuit formation step.
可將聚酯樹脂及薄膜溶解於六氟異丙醇(HFIP),並使用1H-NMR及13C-NMR對各單體殘基成分或副產物二乙二醇定量其含量。若為積層薄膜時,可視積層厚度而定,削去薄膜的各層,而採取構成各層單質之成分,並進行評定。此外,對於本發明之薄膜,係由薄膜製造時的混合比率根據計算來算出組成。 The polyester resin and film can be dissolved in hexafluoroisopropanol (HFIP), and the content of each monomer residue component or by-product diethylene glycol can be quantified using 1 H-NMR and 13 C-NMR. If it is a laminated film, depending on the thickness of the laminated layer, each layer of the film is cut off, and the constituents of each layer are taken and evaluated. In addition, the composition of the film of the present invention is calculated by calculation from the mixing ratio at the time of film production.
聚酯樹脂及薄膜的固有黏度係將聚酯溶解於鄰氯酚,使用奧士華黏度計於25℃下測定。若為積層薄膜時,可視積層厚度而定,削去薄膜的各層,來評定各層單質的固有黏度。 The intrinsic viscosity of polyester resin and film is measured by dissolving polyester in o-chlorophenol at 25°C using an Oswald viscometer. If it is a laminated film, depending on the thickness of the laminated layer, cut off each layer of the film to evaluate the inherent viscosity of each layer.
使用前端呈平坦且直徑為4mm的度盤規厚度計(Mitutoyo(股)製)來測定積層薄膜厚度。測定薄膜中心部、距薄膜中心部沿長度方向為4cm的位置(2點)、沿寬度方向為4cm位置(2點)此5點的厚度,以其平均值作為薄膜厚度。 The thickness of the laminated film was measured using a dial thickness gauge (manufactured by Mitutoyo Co., Ltd.) having a flat tip and a diameter of 4 mm. The film thickness was measured at the center of the film, at positions 4 cm from the center of the film in the longitudinal direction (2 points), and at positions 4 cm in the width direction (2 points), and the average value was used as the film thickness.
將積層薄膜包埋於環氧樹脂,以切片機(Microtome)切出薄膜剖面。用穿透型電子顯微鏡(日立製作所製TEM H7100)以5000倍的倍率觀察該剖面,求出各層的厚度。 The laminated film was embedded in epoxy resin, and the film section was cut out with a microtome. The cross section was observed at a magnification of 5000 times with a transmission electron microscope (TEM H7100 manufactured by Hitachi, Ltd.), and the thickness of each layer was determined.
由積層薄膜以電漿低溫灰化處理法(Yamato Scientific製PR-503型)去除構成薄膜的樹脂而使粒子露出。對其以穿透型電子顯微鏡(日立製作所製TEM H7100)進行觀察,將粒子的影像(由粒子所形成的光的濃淡)連結於影像分析儀(Cambridge Instrument製QTM900),改變觀察部位而以粒子數5000個以上進行以下數值處理,以由此求得的數量平均粒徑D作為平均粒徑。 From the laminated film, the resin constituting the film was removed by a plasma low-temperature ashing treatment method (PR-503 manufactured by Yamato Scientific) to expose the particles. This was observed with a transmission electron microscope (TEM H7100, manufactured by Hitachi, Ltd.), an image of the particles (the intensity of light formed by the particles) was connected to an image analyzer (QTM900, manufactured by Cambridge Instruments), and the observation position was changed so that the particles were The number-average particle diameter D obtained by the following numerical treatment was performed on 5,000 or more particles as the average particle diameter.
D=ΣDi/N D=ΣDi/N
於此,Di為粒子的等效圓直徑、N為粒子的個數。 Here, Di is the equivalent circle diameter of the particles, and N is the number of particles.
將聚合物1g投入1N-KOH甲醇溶液200ml中進行加熱回流,而將聚合物溶解。對溶解完畢的該溶液添加200ml的水,接著將該液體載入離心分離器使粒子沉降,並去除上澄液。對粒子進一步加水進行洗淨、離心分離,予以重複2次。使如此所得之粒子乾燥,秤量其質量而算出粒子的含量。 1 g of the polymer was put into 200 ml of a 1N-KOH methanol solution, and heated to reflux to dissolve the polymer. To the dissolved solution, 200 ml of water was added, and then the liquid was loaded into a centrifugal separator to settle the particles, and the supernatant was removed. The particles were further washed with water and centrifuged, and the procedure was repeated twice. The particles thus obtained were dried and weighed to calculate the content of the particles.
以切成長4.0cm×寬3.5cm之尺寸者作為試樣,使用觸針法之高精細微細形狀測定器(三維表面粗糙度計),並依據JIS B0601-1994,依下述條件測定聚酯薄膜的表面形態。 The size of cut length 4.0cm × width 3.5cm was taken as a sample, and the polyester film was measured according to JIS B0601-1994 according to the following conditions using a high-precision micro-shape measuring device (three-dimensional surface roughness meter) by the stylus method. surface morphology.
‧測定裝置:三維微細形狀測定器(小坂研究所(股)製ET-4000A型) ‧Measuring device: Three-dimensional micro-shape measuring device (ET-4000A manufactured by Kosaka Research Institute Co., Ltd.)
‧解析儀器:三維表面粗糙度解析系統(TDA-31型) ‧Analysis instrument: 3D surface roughness analysis system (TDA-31 type)
‧觸針:前端半徑0.5μm,徑2μm,金剛石製 ‧Contact: tip radius 0.5μm, diameter 2μm, made of diamond
‧針壓:100μN ‧Needle pressure: 100μN
‧測定方向:對薄膜長度方向、薄膜寬度方向各測定1次後平均 ‧Measuring direction: average after measuring the length direction of the film and the width direction of the film once each
‧X測定長度:1.0mm ‧X measuring length: 1.0mm
‧X移行速度:0.1mm/s(測定速度) ‧X travel speed: 0.1mm/s (measurement speed)
‧Y移行間距:5μm(測定間隔) ‧Y transition pitch: 5μm (measurement interval)
‧Y線數:81條(測定條數) ‧Number of Y lines: 81 (measurement number)
‧Z倍率:20倍(縱倍率) ‧Z magnification: 20 times (vertical magnification)
‧低域截止:0.20mm ‧Low range cutoff: 0.20mm
‧高域截止:R+Wmm(粗糙度截止值)R+W係指未截止。 ‧High domain cutoff: R+Wmm (roughness cutoff value) R+W means not cutoff.
‧濾波器方式:高斯空間型 ‧Filter method: Gaussian space type
‧平準化:有(傾斜校正) ‧Leveling: Yes (tilt correction)
‧基準面積:1mm2。 ‧Reference area: 1mm 2 .
依上述條件進行測定,其後使用解析系統算出中心面平均粗糙度SRa、最大波峰高度SRp、最大波谷深度(SRv)、中心面面積率(SSr)。 The measurement was carried out under the above-mentioned conditions, and then the center plane average roughness SRa, the maximum peak height SRp, the maximum trough depth (SRv), and the center plane area ratio (SSr) were calculated using an analysis system.
將薄膜於任意位置切成長(與長度方向平行)20cm×寬(與寬度方向平行)14cm之大小而作為試樣,並將該試樣進一步沿長度方向以5等分、沿寬度方向以4等分切成長4.0cm×寬3.5cm之大小(合計20個試樣)。針對該試樣,以與(7)同樣的方式,由各表面粗糙度SRa算出,如下述求出偏差。 Cut the film at any position to a size of 20cm long (parallel to the length direction) x 14cm wide (parallel to the width direction) as a sample, and further divide the sample into 5 equal parts in the length direction and 4 in the width direction. Cut into a size of 4.0 cm in length x 3.5 cm in width (a total of 20 samples). This sample was calculated from each surface roughness SRa in the same manner as in (7), and the deviation was obtained as follows.
表面粗糙度SRa的偏差(%)={(最大值-最小值)/平均值}×100 Deviation of surface roughness SRa (%)={(maximum-minimum)/average}×100
依循JIS-Z-8741(1997年)所規定的方法,使用Suga Test Instruments製數位變角光澤度計UGV-5D,以N=3測定60°鏡面光澤度,以平均值作為本發明之光澤度。 In accordance with the method specified in JIS-Z-8741 (1997), using a digital variable angle gloss meter UGV-5D manufactured by Suga Test Instruments, the 60° specular gloss was measured with N=3, and the average value was used as the gloss of the present invention. .
使用分光光度計U-3410(日立製作所(股)製),於波長320nm的範圍測定平行線穿透率。此外,自(7)中所測得之表面粗糙度(SRa)較小的一面側射入光而進行測定。測定係以與(8)同樣的方式作成各試樣,求出合計20點之測定點的平均作為320nm的平行線穿透率ST320。 Using a spectrophotometer U-3410 (manufactured by Hitachi, Ltd.), the parallel line transmittance was measured in the wavelength range of 320 nm. In addition, the measurement was performed by injecting light from the side of the surface having a small surface roughness (SRa) measured in (7). In the measurement system, each sample was prepared in the same manner as in (8), and the average of 20 measurement points in total was obtained as the parallel line transmittance ST320 of 320 nm.
以與(8)同樣的方式作成各試樣,針對合計20點之測定點,以與(10)同樣的方式算出320nm的平行線穿透率ST320,如下述求出偏差。 Each sample was prepared in the same manner as in (8), the parallel line transmittance ST320 at 320 nm was calculated in the same manner as in (10) for a total of 20 measurement points, and the deviation was determined as follows.
ST320偏差(%)={(最大值-最小值)/平均值}×100 ST320 deviation (%)={(maximum-minimum)/average}×100
將薄膜於任意位置切成長10cm×寬10cm之大小而作為試樣,以與(3)同樣的方式測定薄膜中心部、距薄膜中心部沿長度方向為4cm的位置(2點)、沿寬度方向為4cm的位置(2點)此5點的厚度,以其平均值作為熱處理前的薄膜厚度。其後,將該試樣在設定為100℃的熱風烘箱中保持10分鐘,進行熱處理,且針對熱處理後的試樣亦同樣地測定5點的厚度,以其平均值作為熱處理後的薄膜厚度。由求得之熱處理前、熱處理後的厚度,如下述算出厚度變化。 Cut the film at an arbitrary position to a size of 10 cm in length × 10 cm in width as a sample, and measure the center of the film, at positions 4 cm in the length direction from the center of the film (2 points), and in the width direction in the same manner as in (3). The thickness of the 5 points at the position of 4 cm (2 points) was taken as the average value of the film thickness before heat treatment. Thereafter, the sample was held in a hot air oven set at 100° C. for 10 minutes to perform heat treatment, and the thickness of the sample after the heat treatment was similarly measured at 5 points, and the average value was taken as the film thickness after heat treatment. From the obtained thickness before heat treatment and after heat treatment, the change in thickness was calculated as follows.
厚度變化(%)={|熱處理後的厚度-熱處理前的厚度|/熱處理前的厚度}×100 Thickness change (%)={|thickness after heat treatment-thickness before heat treatment|/thickness before heat treatment}×100
作為測定液,係使用水、乙二醇、甲醯胺及二碘甲烷此4種,使用接觸角計(協和界面科學(股)製CA-D型)求出各液體與薄膜表面所夾的靜態接觸角。針對各液體各測定5次,將其平均接觸角(θ)與測定液(j)的表面張力之各成分分別代入下式,以包含四式之聯立方程式對γL、γ+、γ-求解。 Four kinds of water, ethylene glycol, formamide, and diiodomethane were used as measurement liquids, and the contact angle meter (Model CA-D, manufactured by Kyowa Interface Science Co., Ltd.) was used to determine the contact angle between each liquid and the film surface. static contact angle. Each liquid was measured 5 times, the average contact angle (θ) and each component of the surface tension of the measurement liquid (j) were substituted into the following equations, and γ L , γ + , γ − Solve.
(γLγjL)1/2+2(γ+γj-)1/2+2(γj+γ-)1/2=(1+cosθ)[γjL+2(γj+γj-)1/2]/2 (γ L γj L ) 1/2 +2(γ + γj - ) 1/2 +2(γj + γ - ) 1/2 =(1+cosθ)[γj L +2(γj + γj - ) 1/ 2 ]/2
惟,γ=γL+2(γ+γ-)1/2 However, γ=γ L +2(γ + γ - ) 1/2
γj=γjL+2(γj+γj-)1/2 γj=γj L +2(γj + γj - ) 1/2
於此,γ、γL、γ+、γ-分別表示薄膜表面的表面自由能、長距離間力項、路易士酸參數、路易士鹼參數;且γj、γjL、γj+、γj-分別表示所用測定液的表面自由能、長距離間力項、路易士酸參數、路易士鹼參數。又,此處所使用之各液體的表面張力係使用由Oss(「fundamentals of Adhesion」,L.H.Lee(Ed.),p153,Plenum ess,New York(1991).)所提出的值。 Here, γ, γ L , γ + , and γ - represent the surface free energy, long-distance force term, Lewis acid parameter, and Lewis base parameter of the film surface, respectively; and γj, γj L , γj + , and γj - respectively Indicates the surface free energy, long-distance force term, Lewis acid parameter, and Lewis base parameter of the measuring solution used. In addition, the surface tension of each liquid used here used the value proposed by Oss ("fundamentals of Adhesion", LHLee (Ed.), p153, Plenum ess, New York (1991).).
將薄膜切成長20cm×寬14cm來使用。將下述脫模層形成用溶液以凹版塗布法塗布於薄膜之SRa為100nm以上3000nm以下的面(兩面其SRa均為100nm以上3000nm以下時,表面粗糙度(SRa)較小的面),於烘箱中以180℃乾燥20秒。進而,以控制流量而使乾燥後的厚度成為5μm 的方式使用縫模塗布機塗布硬塗層形成用塗料組成物,以100℃乾燥1分鐘而去除溶劑,得到積層有硬塗層的積層體。 The film was used by cutting out a length of 20 cm x a width of 14 cm. The following solution for forming a release layer is applied by gravure coating on the surface of the film whose SRa is 100 nm or more and 3000 nm or less (when the SRa on both sides is 100 nm or more and 3000 nm or less, the surface roughness (SRa) is small. Dry in an oven at 180°C for 20 seconds. Furthermore, the coating composition for hard-coat layer formation was apply|coated using a slot-die coater so that the thickness after drying might be 5 micrometers by controlling a flow rate, and it dried at 100 degreeC for 1 minute to remove a solvent, and obtained the laminated body with a hard-coat layer laminated|stacked.
將所得之薄膜/脫模層/硬塗層積層體,使用上模溫度、下模溫度均加熱至溫度160℃的壓機,對厚度0.2mm的鋁板/厚度0.125mm的聚醯亞胺薄膜(DU PONT-TORAY製Kapton 500H/V)/積層體/厚度0.125mm的聚醯亞胺薄膜(DU PONT-TORAY製Kapton 500H/V)/厚度0.2mm的鋁板之構成體在1.5MPa的條件下進行1小時加熱壓製。於加熱壓製後,取出積層體/聚醯亞胺薄膜,使用高壓水銀燈自積層體側照射300mJ/cm2的紫外線,使硬塗層硬化而得到試樣。對此試樣於薄膜與脫模層之界面(薄膜/(此界面)/脫模層/硬塗層)實施剝離試驗,依以下基準進行剝離性的評定。 The obtained film/release layer/hard coat layered product was heated to a temperature of 160°C using a press with both the upper die temperature and the lower die temperature. DU PONT-TORAY Kapton 500H/V)/laminated body/polyimide film with a thickness of 0.125mm (DU PONT-TORAY Kapton 500H/V)/aluminum plate with a thickness of 0.2mm The composition was carried out under the condition of 1.5MPa 1 hour heat pressing. After the hot pressing, the laminate/polyimide film was taken out, and 300 mJ/cm 2 of ultraviolet rays were irradiated from the laminate side using a high-pressure mercury lamp to harden the hard coat layer to obtain a sample. This sample was subjected to a peeling test at the interface between the film and the release layer (film/(this interface)/release layer/hard coat layer), and the peelability was evaluated according to the following criteria.
以甲基化三聚氰胺:對甲苯磺酸胺:丙烯酸單體共聚物=20:0.4:1的質量比調製,並以甲苯稀釋。 It was prepared with a mass ratio of methylated melamine: amine p-toluenesulfonate: acrylic monomer copolymer = 20: 0.4: 1, and diluted with toluene.
將下述材料混合,使用甲基乙基酮加以稀釋而得到固體含量濃度40質量%的硬塗層形成用塗料組成物。 The following materials were mixed and diluted with methyl ethyl ketone to obtain a coating composition for forming a hard coat layer having a solid content concentration of 40% by mass.
A:可無阻力地剝離 A: Can be peeled off without resistance
B:剝離時感到阻力,但可剝離 B: Resistance is felt when peeling off, but peelable
C:無法剝離。 C: Unable to peel.
將薄膜切成長20cm×寬14cm而使用。將屬光硬化型樹脂的感光性聚醯亞胺層形成用塗料組成物以凹版塗布法塗布於薄膜之SRa為100nm以上3000nm以下的表面(兩面其SRa均為100nm以上3000nm以下時,表面粗糙度(SRa)較小的面),於烘箱中以90℃乾燥60秒,而得到薄膜/感光性聚醯亞胺層之積層體。就所得積層體,以70℃/0.2MPa對聚醯亞胺薄膜(DU PONT-TORAY製「Kapton」(註冊商標)500H/V)進行層合,使用高壓水銀燈自積層體側照射800mJ/cm2的紫外線。此時,試樣的一半(長20cm×寬7cm)部分係進行遮光(進行遮光的部分未經UV曝光)。分別針對有UV曝光部分、無UV曝光部分,測定薄膜與感光性聚醯亞胺層之間的剝離強度,依下述基準進行評定。此外,就剝離強度,係將薄膜/感光性聚醯亞胺層積 層體作成長15cm×寬5cm的長條狀,在薄膜與感光性聚醯亞胺層之間強制予以剝離,就180°剝離試驗,使用拉伸試驗機(ORIENTEC製Tensilon UCT-100),在25℃、50%RH環境下以剝離速度300mm/分鐘進行測定。此外,以測定長度50%至100%之間的強度的平均值作為剝離強度。 The film was used by cutting out a length of 20 cm x a width of 14 cm. The coating composition for forming a photosensitive polyimide layer, which is a photocurable resin, is applied by gravure coating on the surface of the film whose SRa is 100 nm or more and 3000 nm or less. (SRa) small surface), it dried at 90 degreeC for 60 second in an oven, and obtained the laminated body of a film/photosensitive polyimide layer. The obtained laminate was laminated with a polyimide film ("Kapton" (registered trademark) 500H/V, manufactured by DU PONT-TORAY) at 70°C/0.2MPa, and irradiated with 800 mJ/cm 2 from the laminate side using a high-pressure mercury lamp. of ultraviolet rays. At this time, a half (length 20 cm x width 7 cm) portion of the sample was shielded from light (the shielded portion was not exposed to UV). The peeling strength between the film and the photosensitive polyimide layer was measured for the portion with UV exposure and the portion without UV exposure, respectively, and evaluated according to the following criteria. In addition, regarding the peel strength, the film/photosensitive polyimide laminate was made into a strip with a length of 15 cm x width of 5 cm, and the film and the photosensitive polyimide layer were forcibly peeled off at 180°. The test was measured at a peeling speed of 300 mm/min in a 25°C, 50% RH environment using a tensile tester (Tensilon UCT-100 manufactured by ORIENTEC). In addition, the average value of the strength between 50% and 100% of the measured length was taken as the peel strength.
A:有UV曝光部分與無UV曝光部分之剝離強度的差小於0.5N/50mm A: The difference between the peel strength of the part with UV exposure and the part without UV exposure is less than 0.5N/50mm
B:有UV曝光部分與無UV曝光部分之剝離強度的差為0.5N/50mm以上且小於1N/50mm B: The difference in peel strength between the UV-exposed portion and the UV-exposed portion is 0.5N/50mm or more and less than 1N/50mm
C:有UV曝光部分與無UV曝光部分之剝離強度的差為1N/50mm以上 C: The difference in peel strength between the UV-exposed portion and the UV-exposed portion is 1N/50mm or more
D:在有UV曝光部分、無UV曝光部分的至少任一處無法剝離。 D: Unable to peel off at least any of the UV-exposed part and the non-UV-exposed part.
以與(15)同樣的方式得到薄膜/感光性聚醯亞胺層之積層體。就所得積層體,以70℃/0.2MPa對聚醯亞胺薄膜(DU PONT-TORAY製「Kapton」(註冊商標)500H/V)進行層合。其後,以100℃進行10分鐘的熱處理後,使用高壓水銀燈自積層體側照射800mJ/cm2的紫外線。此時,試樣的一半(長20cm×寬7cm)部分係進行遮光(進行遮光的部分未經UV曝光)。就所得之層合積層體的紫外線照射試樣,分別針對有UV曝光部分與無UV曝光部分,測定薄膜與感光性聚醯亞胺層之間的剝離強度,依下述基準進行評定。 A laminate of the film/photosensitive polyimide layer was obtained in the same manner as in (15). About the obtained laminated body, the polyimide film ("Kapton" (registered trademark) 500H/V made by DU PONT-TORAY) was laminated|stacked at 70 degreeC/0.2MPa. Then, after heat-processing at 100 degreeC for 10 minutes, the ultraviolet-ray of 800mJ/cm< 2 > was irradiated from the laminated body side using a high pressure mercury lamp. At this time, a half (length 20 cm x width 7 cm) portion of the sample was shielded from light (the shielded portion was not exposed to UV). For the UV-irradiated samples of the obtained laminate, the peel strength between the film and the photosensitive polyimide layer was measured for the UV-exposed portion and the UV-exposed portion, respectively, and evaluated according to the following criteria.
A:有UV曝光部分與無UV曝光部分之剝離強度的差小於0.5N/50mm A: The difference between the peel strength of the part with UV exposure and the part without UV exposure is less than 0.5N/50mm
B:有UV曝光部分與無UV曝光部分之剝離強度的差為0.5N/50mm以上且小於1N/50mm B: The difference in peel strength between the UV-exposed portion and the UV-exposed portion is 0.5N/50mm or more and less than 1N/50mm
C:有UV曝光部分與無UV曝光部分之剝離強度的差為1N/50mm以上 C: The difference in peel strength between the UV-exposed portion and the UV-exposed portion is 1N/50mm or more
D:在有UV曝光部分、無UV曝光部分的至少任一處無法剝離。 D: Unable to peel off at least any of the UV-exposed part and the non-UV-exposed part.
對以(14)之方法所得之脫模層的剝離面側,切出長20cm×寬14cm之大小而作為試樣,並將該試樣進一步沿長度方向以5等分、沿寬度方向以4等分切成長4.0cm×寬3.5cm之大小(合計20試樣)。針對該試樣,分別以與(9)同樣的方式測定光澤度,就其平均值依以下基準加以評定。 From the peeling surface side of the release layer obtained by the method of (14), a size of 20 cm in length x 14 cm in width was cut out as a sample, and the sample was further divided into 5 equal parts in the longitudinal direction and 4 in the width direction. It was equally divided into a size of 4.0 cm in length x 3.5 cm in width (20 samples in total). For each of the samples, the glossiness was measured in the same manner as in (9), and the average value was evaluated according to the following criteria.
A:光澤度為10以下 A: Glossiness is 10 or less
B:光澤度超過10且為20以下 B: Glossiness exceeds 10 and is 20 or less
C:光澤度超過20且為30以下 C: Glossiness exceeds 20 and is 30 or less
D:光澤度超過30。 D: The glossiness exceeds 30.
由20點光澤度之最大值與最小值的差,依下述基準進行評定。 From the difference between the maximum value and the minimum value of 20-point glossiness, evaluation was performed according to the following criteria.
A:光澤度之最大值與最小值的差為2以下 A: The difference between the maximum value and the minimum value of gloss is 2 or less
B:光澤度之最大值與最小值的差超過2且為4以下 B: The difference between the maximum value and the minimum value of gloss exceeds 2 and is 4 or less
C:光澤度之最大值與最小值的差超過4。 C: The difference between the maximum value and the minimum value of gloss exceeds 4.
將薄膜切成一邊為10cm的正方形,使用日本電色(股)製霧度計NDH-5000進行霧度測定。測定係於3處實施,以其平均值作為本發明中的霧度。 The film was cut into a 10 cm square, and the haze was measured using a haze meter NDH-5000 manufactured by Nippon Denshoku Co., Ltd. The measurement was carried out at three places, and the average value thereof was used as the haze in the present invention.
此外,上述各測定中,若待測薄膜的長度方向、寬度方向不明時,則將薄膜中具有最大折射率的方向視為寬度方向、與前述寬度方向正交的方向視為長度方向。 In addition, in each of the above measurements, when the length direction and width direction of the film to be measured are unknown, the direction having the largest refractive index in the film is regarded as the width direction, and the direction orthogonal to the width direction is regarded as the length direction.
供於製膜的聚酯樹脂係如下準備: The polyester resin used for film production is prepared as follows:
屬二羧酸成分之對酞酸成分為100莫耳%、屬二醇成分之乙二醇成分為100莫耳%的聚對酞酸乙二酯樹脂(固有黏度0.65)。 Polyethylene terephthalate resin (intrinsic viscosity: 0.65) with 100 mol% of terephthalic acid as a dicarboxylic acid component and 100 mol% of ethylene glycol as a diol component.
共聚有相對於二羧酸成分為20莫耳%之異酞酸而成的共聚合聚對酞酸乙二酯樹脂(固有黏度0.8)。 Copolymerized polyethylene terephthalate resin (intrinsic viscosity: 0.8) obtained by copolymerizing isophthalic acid in an amount of 20 mol % with respect to the dicarboxylic acid component.
屬二羧酸成分之對酞酸成分為100莫耳%、屬二醇成分之1,4-丁二醇成分為100莫耳%的聚對酞酸丁二酯樹脂(固有黏度1.2)。 Polybutylene terephthalate resin (intrinsic viscosity 1.2) with 100 mol% of terephthalic acid as a dicarboxylic acid component and 100 mol% of 1,4-butanediol as a diol component.
DU PONT-TORAY公司製「Hytrel(註冊商標)」7247。 "Hytrel (registered trademark)" 7247 manufactured by DU PONT-TORAY.
聚酯A中以粒子濃度30質量%含有平均粒徑3μm之膠體二氧化矽粒子的聚對酞酸乙二酯粒子母料(固有黏度0.65)。 Polyethylene terephthalate particle masterbatch (intrinsic viscosity: 0.65) containing colloidal silica particles having an average particle diameter of 3 μm in polyester A at a particle concentration of 30% by mass.
聚酯A中以粒子濃度30質量%含有平均粒徑5μm之膠體二氧化矽粒子的聚對酞酸乙二酯粒子母料(固有黏度0.65)。 Polyethylene terephthalate particle master batch (intrinsic viscosity: 0.65) containing colloidal silica particles with an average particle diameter of 5 μm in polyester A at a particle concentration of 30% by mass.
聚酯A中以粒子濃度30質量%含有平均粒徑3μm之矽酸氧化鋁粒子的聚對酞酸乙二酯粒子母料(固有黏度0.65)。 Polyethylene terephthalate particle masterbatch (intrinsic viscosity: 0.65) containing silicate alumina particles having an average particle diameter of 3 μm in polyester A at a particle concentration of 30% by mass.
聚酯A中以粒子濃度30質量%含有平均粒徑5μm之矽酸氧化鋁粒子的聚對酞酸乙二酯粒子母料(固有黏度0.65)。 Polyethylene terephthalate particle master batch (intrinsic viscosity: 0.65) containing silicate alumina particles having an average particle diameter of 5 μm in polyester A at a particle concentration of 30% by mass.
聚酯A中以粒子濃度30質量%含有平均粒徑2.2μm之膠體二氧化矽粒子的聚對酞酸乙二酯粒子母料(固有黏度0.65) Polyethylene terephthalate particle masterbatch containing colloidal silica particles with an average particle size of 2.2 μm at a particle concentration of 30% by mass in polyester A (intrinsic viscosity: 0.65)
聚酯A中以粒子濃度30質量%含有平均粒徑2.4μm之矽酸氧化鋁粒子的聚對酞酸乙二酯粒子母料(固有黏度0.65) Polyethylene terephthalate particle masterbatch (intrinsic viscosity 0.65) containing silicate alumina particles with an average particle diameter of 2.4 μm in polyester A at a particle concentration of 30% by mass
將以下所示交聯劑:黏著劑樹脂:脫模劑:粒子分別以質量比60:23:17混合,用純水加以稀釋而調整成固體含量為1%的質量比。 The following crosslinking agent: adhesive resin: mold release agent: particle was mixed in a mass ratio of 60:23:17, respectively, and diluted with pure water to adjust the mass ratio of solid content to 1%.
‧交聯劑:甲基化三聚氰胺/尿素共聚合之交聯製樹脂(Sanwa Chemical(股)製「NIKALAC」(註冊商標)「MW12LF」) ‧Crosslinking agent: Methylated melamine/urea copolymerized cross-linking resin ("NIKALAC" (registered trademark) "MW12LF" manufactured by Sanwa Chemical Co., Ltd.)
‧黏著劑樹脂I:丙烯酸單體共聚物(Nippon Carbide製) ‧Adhesive resin I: Acrylic monomer copolymer (manufactured by Nippon Carbide)
‧脫模劑:於玻璃製反應容器中裝入屬含全氟烷基之丙烯酸酯的CF3(CF2)nCH2CH2OCOCH=CH2(n=5~11、n的平均=9)80.0g、甲基丙烯酸乙醯基乙醯氧基乙酯20.0g、十二烷硫醇0.8g、去氧純水354.7g、丙酮40.0g、C16H33 N(CH3)3C11.0g及C8H17C6H4O(CH2CH2O)nH(n=8)3.0g,添加偶氮雙異丁脒二鹽酸鹽0.5g,在氮氣環境下一面攪拌一面於60℃使其進行10小時共聚合反應而得的共聚物乳液。 ‧Mold release agent: put CF 3 (CF 2 ) n CH 2 CH 2 OCOCH=CH 2 (n=5~11, average of n=9) into a glass reaction vessel ) 80.0 g, 20.0 g of acetylacetoxyethyl methacrylate, 0.8 g of dodecanethiol, 354.7 g of deoxygenated pure water, 40.0 g of acetone, C 16 H 33 N(CH 3 ) 3 C11. 0 g and C 8 H 17 C 6 H 4 O(CH 2 CH 2 O) n H (n=8) 3.0 g, add 0.5 g of azobisisobutyramidine dihydrochloride, and stir in nitrogen atmosphere while stirring. A copolymer emulsion obtained by subjecting it to a copolymerization reaction at 60°C for 10 hours.
‧粒子:將數量平均粒徑170nm的二氧化矽粒子(日產化學工業(股)製「SNOWTEX」(註冊商標)MP2040)用純水稀釋成固體含量濃度為40重量%而得的水分散體。 Particles: An aqueous dispersion obtained by diluting silica particles with a number average particle diameter of 170 nm (“SNOWTEX” (registered trademark) MP2040, manufactured by Nissan Chemical Industries, Ltd.) with pure water to a solid content concentration of 40% by weight.
組成、積層比係如表所示,將原料分別供給至擠出機,將擠出機缸筒溫度設定為270℃、短管溫度設定為275℃、管嘴溫度設定為280℃,以樹脂溫度280℃,由T模排出至控溫成25℃的冷卻鼓輪上成片狀。此時,使用直徑0.1mm的線狀電極靜電施加,使其密接於冷卻鼓輪而得到未拉伸片。其次,沿長度方向以拉伸溫度85℃、第1段1.5倍、拉伸速度50,000%/分鐘進行拉伸,再以拉伸溫度88℃、第2段2.2倍、拉伸速度80,000%/分鐘進行拉伸(總拉伸倍率3.3倍)。其後,實施電暈放電處理,對A層側的表面使用計量棒塗布脫模塗布溶液(水分散體)成濕式厚度為13.5μm,接著以拉幅式橫向拉伸機,沿寬度方向以拉伸溫度100℃、第1段1.8倍、拉伸速度30,000%/分鐘進行拉伸,再以拉伸溫度120℃、第2段拉伸2倍、拉伸速度40,000%/分鐘進行拉伸(總拉伸倍率3.6倍)。其後,於拉幅機內,以235℃進行熱處理,而得到薄膜厚度16μm(脫模塗層:0.04μm、A層:3.5μm、基材層:12.5μm)的薄膜。 The composition and the lamination ratio are as shown in the table. The raw materials were supplied to the extruder, and the extruder cylinder temperature was set to 270°C, the short tube temperature was set to 275°C, and the nozzle temperature was set to 280°C, and the resin temperature was set to 270°C. 280°C, discharged from T-die to a cooling drum controlled to 25°C to form sheets. At this time, electrostatic application was carried out using a wire electrode having a diameter of 0.1 mm, and it was brought into close contact with a cooling drum to obtain an unstretched sheet. Next, in the longitudinal direction, the stretching temperature is 85°C, the first stage is 1.5 times, and the stretching speed is 50,000%/min, and the stretching temperature is 88°C, the second stage is 2.2 times, and the stretching speed is 80,000%/min. Stretching was performed (total stretching ratio 3.3 times). After that, corona discharge treatment was performed, and a release coating solution (aqueous dispersion) was applied to the surface of the A layer side using a metering bar to a wet thickness of 13.5 μm, followed by a tenter-type transverse stretching machine in the width direction. The stretching temperature is 100°C, the first stage is 1.8 times, and the stretching speed is 30,000%/min, and the stretching temperature is 120°C, the second stage is 2 times, and the stretching speed is 40,000%/min. ( The total stretch ratio is 3.6 times). Then, it heat-processed at 235 degreeC in a tenter, and obtained the film of the film thickness of 16 micrometers (release coating layer: 0.04 micrometer, A layer: 3.5 micrometer, base material layer: 12.5 micrometer).
除如表所示變更組成、積層比以外,係以與實施例1同樣的方式得到薄膜厚度25μm的薄膜。 A film having a film thickness of 25 μm was obtained in the same manner as in Example 1, except that the composition and the lamination ratio were changed as shown in the table.
除如表所示變更組成、積層比以外,係以與實施例1同樣的方式得到薄膜厚度16μm的薄膜。 A film having a film thickness of 16 μm was obtained in the same manner as in Example 1, except that the composition and the lamination ratio were changed as shown in the table.
除如表所示變更組成、積層比以外,係以與實施例1同樣的方式得到薄膜厚度25μm的薄膜。 A film having a film thickness of 25 μm was obtained in the same manner as in Example 1, except that the composition and the lamination ratio were changed as shown in the table.
除如表所示變更組成、積層比,且於長度方向拉伸後未塗布脫模塗布溶液以外,係以與實施例1同樣的方式得到薄膜厚度16μm的薄膜。 A film having a film thickness of 16 μm was obtained in the same manner as in Example 1, except that the composition and the lamination ratio were changed as shown in the table, and the mold release coating solution was not applied after stretching in the longitudinal direction.
除設長度方向的拉伸條件為85℃、3.3倍拉伸,且設寬度方向的拉伸條件為100℃、3.6倍進行拉伸以外,係以與實施例2同樣的方式得到薄膜厚度16μm的薄膜。 A film with a film thickness of 16 μm was obtained in the same manner as in Example 2, except that the stretching conditions in the longitudinal direction were set at 85° C. and 3.3 times, and the stretching conditions in the width direction were set at 100° C. and 3.6 times. film.
除如表所示變更組成、積層比,且於長度方向拉伸後未塗布脫模塗布溶液以外係以與實施例1同樣的方式得到薄膜厚度16μm的薄膜。 A film having a film thickness of 16 μm was obtained in the same manner as in Example 1, except that the composition and the lamination ratio were changed as shown in the table, and the mold release coating solution was not applied after stretching in the longitudinal direction.
除如表所示變更組成、構成、積層比,且於長度方向拉伸後未塗布脫模塗布溶液以外,係以與實施例1同樣的方式得到薄膜厚度19.5μm的薄膜。 A film having a film thickness of 19.5 μm was obtained in the same manner as in Example 1, except that the composition, composition, and lamination ratio were changed as shown in the table, and the mold release coating solution was not applied after stretching in the longitudinal direction.
除如表所示變更組成、積層比,並沿長度方向以拉伸溫度85℃、第1段1.6倍進行拉伸,以拉伸溫度88℃、第2段2.4倍進行拉伸(總拉伸倍率3.8倍),再沿寬度方向以拉伸溫度100℃、第1段1.9倍進行拉伸,以拉伸溫度120℃、第2段拉伸2.2倍進行拉伸(總拉伸倍率4.2倍)以外,係以與實施例1同樣的方式得到薄膜厚度14.5μm(脫模塗層:0.03μm、A層:2μm、基材層:12.5μm)的薄膜。 In addition to changing the composition and lamination ratio as shown in the table, the stretching temperature in the longitudinal direction was 85°C and the first stage was 1.6 times, and the stretching temperature was 88°C and the second stage was stretched by 2.4 times (total stretching). ratio of 3.8 times), and then stretched at a stretching temperature of 100°C and 1.9 times in the first stage in the width direction, and stretched at a stretching temperature of 120°C and stretched 2.2 times in the second stage (total stretching ratio 4.2 times) Except for this, a film having a film thickness of 14.5 μm (release coating layer: 0.03 μm, A layer: 2 μm, base material layer: 12.5 μm) was obtained in the same manner as in Example 1.
除如表所示變更組成、積層比以外,係以與實施例9同樣的方式得到薄膜厚度14.5μm的薄膜。 A film having a film thickness of 14.5 μm was obtained in the same manner as in Example 9, except that the composition and the lamination ratio were changed as shown in the table.
除如表所示變更組成、積層比以外,係以與實施例9同樣的方式得到薄膜厚度14.5μm的薄膜。 A film having a film thickness of 14.5 μm was obtained in the same manner as in Example 9, except that the composition and the lamination ratio were changed as shown in the table.
除如表所示變更組成、積層比以外,係以與實施例9同樣的方式得到薄膜厚度14.5μm的薄膜。 A film having a film thickness of 14.5 μm was obtained in the same manner as in Example 9, except that the composition and the lamination ratio were changed as shown in the table.
除如表所示變更組成、積層比以外,係以與實施例9同樣的方式得到薄膜厚度14.5μm的薄膜。 A film having a film thickness of 14.5 μm was obtained in the same manner as in Example 9, except that the composition and the lamination ratio were changed as shown in the table.
除如表所示變更組成、積層比以外,係以與實施例9同樣的方式得到薄膜厚度14.5μm的薄膜。 A film having a film thickness of 14.5 μm was obtained in the same manner as in Example 9, except that the composition and the lamination ratio were changed as shown in the table.
除如表所示變更組成、積層比以外,係以與實施例9同樣的方式得到薄膜厚度14.5μm的薄膜。 A film having a film thickness of 14.5 μm was obtained in the same manner as in Example 9, except that the composition and the lamination ratio were changed as shown in the table.
除如表所示變更組成、積層比以外,係以與實施例4同樣的方式得到薄膜厚度9μm的薄膜。 A film having a film thickness of 9 μm was obtained in the same manner as in Example 4, except that the composition and the lamination ratio were changed as shown in the table.
除沿長度方向以拉伸溫度85℃、第1段1.7倍進行拉伸,以拉伸溫度88℃、第2段2.4倍進行拉伸(總拉伸倍率4.1倍),再沿寬度方向以拉伸溫度100℃、第1段 1.9倍進行拉伸,以拉伸溫度120℃、第2段拉伸2.2倍進行拉伸(總拉伸倍率4.2倍),其後,於拉幅機內以252℃進行熱處理以外,係以與實施例11同樣的方式得到薄膜厚度14.5μm(脫模塗層:0.03μm、A層:2μm、基材層:12.5μm)的薄膜。 In addition to stretching at a stretching temperature of 85°C and 1.7 times in the first stage in the longitudinal direction, and stretching at a stretching temperature of 88°C and 2.4 times in the second stage (total stretching ratio of 4.1 times), the The stretching temperature was 100°C, the first stage was stretched by 1.9 times, the second stage was stretched at a stretching temperature of 120°C, and the second stage was stretched by 2.2 times (total stretching ratio was 4.2 times). A film having a film thickness of 14.5 μm (release coating layer: 0.03 μm, A layer: 2 μm, base material layer: 12.5 μm) was obtained in the same manner as in Example 11 except that the heat treatment was performed at °C.
除沿長度方向以拉伸溫度85℃、第1段1.2倍進行拉伸,以拉伸溫度86℃、第2段1.2倍進行拉伸,以拉伸溫度87℃、第3段1.6倍,以拉伸溫度88℃、第4段1.7倍進行拉伸(總拉伸倍率3.9倍),並沿寬度方向以拉伸溫度100℃、第1段1.2倍進行拉伸,以拉伸溫度110℃、第2段拉伸1.2倍進行拉伸,以拉伸溫度115℃、第3段拉伸1.6倍進行拉伸,以120℃、第4段拉伸1.8倍進行拉伸(總拉伸倍率4.1倍)以外,係以與實施例11同樣的方式得到薄膜厚度14.5μm(脫模塗層:0.03μm、A層:2μm、基材層:12.5μm)的薄膜。 In addition to stretching in the longitudinal direction at a stretching temperature of 85°C and 1.2 times in the first stage, stretching at a stretching temperature of 86°C and 1.2 times in the second stage, and stretching at a stretching temperature of 87°C and 1.6 times in the third stage, The stretching temperature was 88°C, the fourth stage was stretched by 1.7 times (total stretching ratio was 3.9 times), and the stretching temperature was 100°C in the width direction, and the first stage was stretched by 1.2 times, and the stretching temperature was 110°C, The 2nd stage stretched 1.2 times and stretched at a stretching temperature of 115°C, the 3rd stage stretched 1.6 times, and the 4th stage stretched at 120°C and stretched 1.8 times (total stretching ratio 4.1 times) ), a film having a film thickness of 14.5 μm (release coating layer: 0.03 μm, A layer: 2 μm, base material layer: 12.5 μm) was obtained in the same manner as in Example 11.
除如表所示變更組成、積層比以外,係以與實施例8同樣的方式得到薄膜厚度22.5μm的薄膜。 A film having a film thickness of 22.5 μm was obtained in the same manner as in Example 8, except that the composition and the lamination ratio were changed as shown in the table.
除如表所示變更組成、積層比以外,係以與實施例4同樣的方式得到薄膜厚度25μm的薄膜。 A film having a film thickness of 25 μm was obtained in the same manner as in Example 4, except that the composition and the lamination ratio were changed as shown in the table.
除如表所示變更組成、積層比以外,係以與實施例2同樣的方式得到薄膜厚度20.5μm的薄膜。 A film having a film thickness of 20.5 μm was obtained in the same manner as in Example 2, except that the composition and the lamination ratio were changed as shown in the table.
此外,表中係將表面粗糙度SRa為100nm以上3000nm以下的薄膜面記載為A面、表面粗糙度SRa非為100nm以上3000nm以下的薄膜面記載為B面。若為兩面其表面粗糙度SRa均為100nm以上3000nm以下的薄膜時,則將表面粗糙度較大的面記載為A1面、表面粗糙度SRa之粗糙度較低的面記載為A2面。 In addition, in the table|surface, the thin film surface whose surface roughness SRa is 100 nm or more and 3000 nm or less is described as A surface, and the thin film surface whose surface roughness SRa is not 100 nm or more and 3000 nm or less is described as B surface. In the case of a thin film whose surface roughness SRa is 100 nm or more and 3000 nm or less on both surfaces, the surface with the larger surface roughness is described as the A1 surface, and the surface with the lower surface roughness SRa is described as the A2 surface.
本發明之薄膜由於其至少單面的表面粗糙度SRa為100nm以上3000nm以下,20cm×14cm範圍之前述表面粗糙度SRa的偏差較小,且320nm的平行線穿透率較高,因此在使用光硬化性樹脂作為被轉印材時,可充分達成低光澤外觀的轉印、形狀固定。因此,其可適用於作為在電路形成步驟中霧面調外觀的轉印性優良的轉印用薄膜。 The film of the present invention has a surface roughness SRa of at least one side of 100 nm or more and 3000 nm or less, the deviation of the aforementioned surface roughness SRa in the range of 20 cm × 14 cm is small, and the parallel line transmittance of 320 nm is high. Therefore, when using light When a curable resin is used as a material to be transferred, transfer of a low gloss appearance and shape fixation can be sufficiently achieved. Therefore, it can be used as a transfer film excellent in transferability with a matte appearance in the circuit formation step.
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