TWI758220B - Automatic replenishment control method of trace electroplating additives - Google Patents

Automatic replenishment control method of trace electroplating additives Download PDF

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TWI758220B
TWI758220B TW110129637A TW110129637A TWI758220B TW I758220 B TWI758220 B TW I758220B TW 110129637 A TW110129637 A TW 110129637A TW 110129637 A TW110129637 A TW 110129637A TW I758220 B TWI758220 B TW I758220B
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electroplating
syringe
fixing seat
tank
pipeline
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TW110129637A
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TW202307286A (en
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王允男
趙之遠
趙之豪
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大陸商常州欣盛半導體技術股份有限公司
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Abstract

The invention discloses an automatic replenishment control method of trace electroplating additives, which includes: S1: in the initial state, the first conduction valve and the second conduction valve are both closed; S2: when the electroplating control equipment starts the electroplating work, the electroplating control equipment sends The signal is sent to the controller. After receiving the signal, the controller controls the propulsion mechanism to push the rear end of the syringe forward. At this time, the first conduction valve is turned on and the second conduction valve is closed; the electroplating additive in the syringe can enter through the first pipeline In the electroplating tank, add liquid to the electroplating tank; S3: When the liquid is added, the controller controls the advancing mechanism to drive the rear end of the syringe to move backward. At this time, a negative pressure is formed in the syringe, so that the first conduction valve is closed, and the second The pilot valve is turned on; the syringe can suck new electroplating additives from the replenishing tank through the second pipeline to replenish the syringe; S4: repeat steps S2-S3, and proceed in a loop. The invention can improve the accuracy of adding electroplating additives.

Description

微量電鍍添加劑自動補給控制方法Automatic replenishment control method of trace electroplating additives

本發明涉及半導體生產技術領域,尤其涉及一種微量電鍍添加劑自動補給控制方法。The invention relates to the technical field of semiconductor production, in particular to an automatic replenishment control method of trace electroplating additives.

載帶(Carrier Tape)是指在一種應用於電子包裝領域的帶狀產品,它具有特定的厚度,在其長度方向上等距分佈著用於承放電子元器件的孔穴和用於進行索引定位的定位孔。Carrier Tape refers to a tape-like product used in the field of electronic packaging. It has a specific thickness and is equidistantly distributed along its length with holes for holding electronic components and for indexing positioning. positioning hole.

COF(覆晶薄膜)全稱為chip on film,將顯示驅動晶片不經過任何封裝形式,直接安到撓性電路板上,達到縮小體積、能自由彎曲的目的。COF柔性封裝載帶,是連接半導體顯示晶片和終端產品的柔性線路板,是COF封裝環節的關鍵材料;COF封裝顯示驅動晶片目前主要應用於電視、電腦及手機等產品的顯示幕應用,是LCD/OLED顯示幕的關鍵核心晶片之一。The full name of COF (chip on film) is chip on film. The display driver chip is directly mounted on the flexible circuit board without any packaging to achieve the purpose of reducing the volume and being able to bend freely. COF flexible packaging carrier tape is a flexible circuit board that connects semiconductor display chips and terminal products, and is a key material in COF packaging; COF packaging display driver chips are currently mainly used in TVs, computers, mobile phones and other products. Display screen applications are LCD / One of the key core chips of OLED display.

在COF的製造過程中,需要在基材表面鍍出所需線路銅層,在電鍍時,電鍍液中需要添加微量的電鍍添加劑,每次添加的電鍍添加劑一般在0.01ml-0.1ml之間。現有技術中,大多採用人工添加的方式,但是人工添加的方式產生的誤差較大,會影響後續電鍍的效果,導致產品間產生差異。In the manufacturing process of COF, the required circuit copper layer needs to be plated on the surface of the substrate. During electroplating, a small amount of electroplating additives need to be added to the electroplating solution. The electroplating additives added each time are generally between 0.01ml-0.1ml. In the prior art, the method of manual addition is mostly adopted, but the error generated by the method of manual addition is relatively large, which will affect the effect of subsequent electroplating, resulting in differences between products.

本發明要解決的技術問題是:為了解決現有技術中添加電鍍添加劑無法精准控制的技術問題,本發明提供一種微量電鍍添加劑自動補給控制方法,通過控制器來精准控制注射機構添加電鍍添加劑的多少,能夠避免人為操作的失誤,提高工作效率,提高電鍍添加劑添加的精准性,另外還能夠通過一組注射機構來同時控制加液和補液的量,並且能夠使得加液和補液能夠自動迴圈。The technical problem to be solved by the present invention is: in order to solve the technical problem that the addition of electroplating additives cannot be accurately controlled in the prior art, the present invention provides an automatic replenishment control method of trace electroplating additives, which accurately controls the amount of electroplating additives added by the injection mechanism through a controller, It can avoid human errors, improve work efficiency, and improve the accuracy of adding electroplating additives. In addition, a set of injection mechanisms can be used to control the amount of liquid addition and liquid replenishment at the same time, and the liquid addition and liquid replenishment can be automatically looped.

本發明解決其技術問題所採用的技術方案是:一種微量電鍍添加劑自動補給控制方法,採用微量電鍍液自動補給裝置,該裝置包括:電鍍槽,用於承載電鍍液,所述電鍍槽與電鍍控制設備連接;補液槽,用於承載電鍍添加劑;注射機構,所述電鍍槽通過第一管路和所述注射機構的前端相連通,所述補液槽通過第二管路和所述注射機構的前端相連通,所述注射機構包括注射器和Y型管,所述Y型管的第一端與所述注射器的前端連通,所述Y型管的第二端與所述第一管路連通,所述Y型管的第三端與所述第二管路連通,所述第一管路上設有第一導通閥,所述第二管路上設有第二導通閥;推進機構,所述推進機構能夠推動所述注射機構的後端往復運動,當推進機構推動注射機構的後端向前運動時,注射機構能夠給電鍍槽內進行加液,當推進機構帶動注射機構的後端向後運動時,注射機構能夠停止給電鍍槽內進行加液,同時使得補液槽給注射機構加液;控制器,所述電鍍控制設備和推進機構均與控制器信號連接。The technical solution adopted by the present invention to solve the technical problem is as follows: an automatic replenishment control method of trace electroplating additives, which adopts an automatic replenishment device for trace electroplating solution, and the device includes an electroplating tank for carrying the electroplating solution, and the electroplating tank is connected with the electroplating control method. Equipment connection; liquid replenishment tank for carrying electroplating additives; injection mechanism, the electroplating tank is communicated with the front end of the injection mechanism through the first pipeline, and the liquid replenishment tank is connected with the front end of the injection mechanism through the second pipeline The injection mechanism includes a syringe and a Y-shaped tube, the first end of the Y-shaped tube is communicated with the front end of the syringe, and the second end of the Y-shaped tube is communicated with the first pipeline, so The third end of the Y-shaped pipe is communicated with the second pipeline, the first pipeline is provided with a first conducting valve, and the second pipeline is provided with a second conducting valve; a propulsion mechanism, the propulsion mechanism The back end of the injection mechanism can be pushed to reciprocate. When the push mechanism pushes the back end of the injection mechanism to move forward, the injection mechanism can add liquid to the electroplating tank. When the push mechanism drives the back end of the injection mechanism to move backward, The injection mechanism can stop adding liquid to the electroplating tank, and at the same time make the liquid replenishment tank add liquid to the injection mechanism; the controller, the electroplating control device and the propulsion mechanism are all signal-connected to the controller.

微量電鍍添加劑自動補給控制方法具有以下步驟: S1:初始狀態時,注射器、Y型管、第一導通閥、第一管路,第二導通閥及第二管路內均充滿電鍍添加劑,第一導通閥和第二導通閥均為封閉狀態; S2:當電鍍控制設備開始電鍍工作時,電鍍控制設備發送信號給控制器,控制器接收該信號後控制推進機構推動注射器的後端向前運動,此時,由於第一導通閥後端的壓力大於第一導通閥前端的壓力,使得第一導通閥導通,由於第二導通閥後端的壓力大於第二導通閥前端的壓力,使得第二導通閥關閉;注射器內的電鍍添加劑能夠通過第一管路進入電鍍槽內,給電鍍槽進行加液; S3:當加液完畢後,控制器控制推進機構帶動注射器的後端向後運動,此時,注射器內形成負壓,使得第一導通閥的後端壓力小於第一導通閥前端的壓力,第一導通閥關閉,使得第二導通閥的後端壓力小於第二導通閥的前端壓力,第二導通閥導通;注射器能夠通過第二管路從補液槽內吸取新的電鍍添加劑,給注射器補液; S4:重複步驟S2-S3,迴圈進行。 The automatic replenishment control method of trace electroplating additives has the following steps: S1: In the initial state, the syringe, the Y-tube, the first conduction valve, the first pipeline, the second conduction valve and the second pipeline are all filled with electroplating additives, and the first conduction valve and the second conduction valve are both closed ; S2: When the electroplating control device starts electroplating work, the electroplating control device sends a signal to the controller, and the controller controls the propulsion mechanism to push the rear end of the syringe to move forward after receiving the signal. At this time, since the pressure at the rear end of the first conduction valve is greater than The pressure at the front end of the first conduction valve makes the first conduction valve conduct. Since the pressure at the rear end of the second conduction valve is greater than the pressure at the front end of the second conduction valve, the second conduction valve is closed; the electroplating additives in the syringe can pass through the first pipeline. Enter the electroplating tank and add liquid to the electroplating tank; S3: When the liquid addition is completed, the controller controls the propulsion mechanism to drive the rear end of the syringe to move backward. At this time, a negative pressure is formed in the syringe, so that the pressure at the rear end of the first conduction valve is lower than the pressure at the front end of the first conduction valve. The conducting valve is closed, so that the pressure at the rear end of the second conducting valve is less than the pressure at the front end of the second conducting valve, and the second conducting valve is conducting; the syringe can absorb new electroplating additives from the replenishment tank through the second pipeline to replenish the syringe; S4: Steps S2-S3 are repeated, and the loop is performed.

本發明的微量電鍍添加劑自動補給控制方法,通過控制器控制推進機構向前運動,從而帶動注射機構的後端向前運動,注射機構能夠向電鍍槽內加液;當加液完畢後,推進機構的後端自動向後運動,使得注射機構的後端也向後運動,注射機構能夠從補液槽裡吸取新的電鍍添加劑,實現自動加液和自動補液,並且能夠精准控制注射機構添加電鍍液的量,避免認為操作的失誤,提高產品電鍍的精度。第一導通閥能夠控制第一管路的導通或者閉合,第二導通閥能夠控制第二管路的導通或者閉合,當注射器向電鍍槽內添加電鍍添加劑時,第一導通閥導通,第二導通閥閉合,當注射器從補液槽內吸取新的電鍍添加劑時,第一導通閥閉合,第二導通閥導通,這樣,使得加液和補液之間相互不會干擾,進一步提高添加電鍍添加劑的精准性。The automatic replenishment control method of trace electroplating additives of the present invention controls the forward movement of the propulsion mechanism through the controller, thereby driving the rear end of the injection mechanism to move forward, and the injection mechanism can add liquid into the electroplating tank; when the liquid addition is completed, the propulsion mechanism The rear end of the injection mechanism automatically moves backwards, so that the rear end of the injection mechanism also moves backwards. The injection mechanism can absorb new electroplating additives from the liquid replenishment tank, realize automatic liquid addition and automatic liquid replenishment, and can accurately control the injection mechanism. The amount of electroplating solution added, Avoid mistakes in operation and improve the precision of product electroplating. The first conduction valve can control the conduction or closing of the first pipeline, and the second conduction valve can control the conduction or closing of the second pipeline. When the syringe adds electroplating additives to the electroplating tank, the first conduction valve is turned on, and the second conduction valve is turned on. The valve is closed. When the syringe absorbs new electroplating additives from the replenishment tank, the first conduction valve is closed and the second conduction valve is opened, so that the addition and replenishment will not interfere with each other, which further improves the accuracy of adding electroplating additives. .

進一步地,所述方法還包括:設定需要向電鍍槽添加共Xml的電鍍添加劑,每t分鐘內添加Yml,添加次數為n=X/Y,所述控制器控制注射器先向電鍍槽內進行添加Yml的電鍍添加劑的加液操作,然後控制器控制注射器從補液槽內進行吸取Yml的電鍍添加劑的補液操作,迴圈n次加液補液操作,直至向電鍍槽內共添加Xml電鍍添加劑。Further, the method also includes: setting the need to add a total of Xml of electroplating additives to the electroplating tank, adding Yml in every t minutes, the number of additions is n=X/Y, and the controller controls the injector to add to the electroplating tank first. Add Yml of electroplating additives, and then the controller controls the syringe to absorb Yml of electroplating additives from the refill tank, and loops for n times of adding and refilling operations until Xml of electroplating additives are added to the electroplating tank.

進一步地,所述控制器設定所述注射器的加液速度為V1以及給注射器的補液速度為V2,速度V1大於速度V2,且,t分鐘內加液操作所占的時間為t/4,補液操作所占的時間為t/6。例如,每分鐘內需添加1.1ml的電鍍添加劑,則設定加液速度V1為2.75ml/min,補液速度V2為1.83ml/min。Further, the liquid addition speed that the controller sets the syringe to be V1 and the liquid infusion speed to the syringe is V2, and the speed V1 is greater than the speed V2, and the time occupied by the liquid addition operation in t minutes is t/4, and the liquid infusion rate is t/4. The time occupied by the operation is t/6. For example, if 1.1ml of electroplating additive needs to be added per minute, set the liquid addition rate V1 to 2.75ml/min and the liquid replenishment rate V2 to 1.83ml/min.

進一步地,所述第一導通閥包括第一外殼,所述第一外殼內設有第一過濾網、第一彈簧及第一墊片,所述第一過濾網靠近所述第一外殼的前端,所述第一墊片靠近所述第一外殼的後端,所述第一過濾網與所述第一外殼內壁固定連接,所述第一彈簧的一端與所述第一過濾網固定連接,所述第一彈簧的另一端與所述第一墊片固定連接,所述第一外殼後端開設有第一通孔,所述第一通孔通過所述第一管路與所述Y型管的第二端連通,所述第一外殼的前端開設有第二通孔,所述第二通孔通過所述第一管路與所述電鍍槽連通,所述第一彈簧在第一過濾網和第一墊片之間處於壓縮狀態,使得所述第一墊片抵靠在第一通孔上,第一通孔此時密封;所述第二導通閥包括第二外殼,所述第二外殼內設有第二過濾網、第二彈簧及第二墊片,所述第二墊片靠近所述第二外殼的前端,所述第二過濾網靠近所述第二外殼的後端,所述第二過濾網與所述第二外殼內壁固定連接,所述第二彈簧的一端與所述第二過濾網固定連接,所述第二彈簧的另一端與所述第二墊片固定連接,所述第二外殼的後端開設有第三通孔,所述第三通孔通過所述第二管路與所述Y型管的第三端連通,所述第二外殼的前端開設有第四通孔,所述第四通孔通過第二管路與所述補液槽連通,所述第二彈簧在第二過濾網和第二墊片之間處於壓縮狀態,使得所述第二墊片抵靠在第四通孔上,第四通孔此時密封。Further, the first conduction valve includes a first housing, and the first housing is provided with a first filter screen, a first spring and a first gasket, and the first filter screen is close to the front end of the first housing , the first gasket is close to the rear end of the first shell, the first filter is fixedly connected to the inner wall of the first shell, and one end of the first spring is fixedly connected to the first filter , the other end of the first spring is fixedly connected to the first gasket, the rear end of the first casing is provided with a first through hole, and the first through hole is connected to the Y through the first pipeline. The second end of the molding tube is connected, the front end of the first shell is provided with a second through hole, the second through hole is communicated with the electroplating tank through the first pipeline, and the first spring is in the first The filter screen and the first gasket are in a compressed state, so that the first gasket abuts on the first through hole, and the first through hole is sealed at this time; the second conduction valve includes a second housing, the A second filter screen, a second spring and a second gasket are arranged in the second shell, the second gasket is close to the front end of the second shell, and the second filter screen is close to the rear end of the second shell , the second filter is fixedly connected to the inner wall of the second housing, one end of the second spring is fixedly connected to the second filter, and the other end of the second spring is connected to the second gasket Fixed connection, the rear end of the second shell is provided with a third through hole, the third through hole communicates with the third end of the Y-shaped pipe through the second pipeline, and the front end of the second shell A fourth through hole is opened, the fourth through hole is communicated with the liquid replenishing tank through the second pipeline, and the second spring is in a compressed state between the second filter screen and the second gasket, so that the first through hole is in a compressed state. The two gaskets abut on the fourth through hole, and the fourth through hole is sealed at this time.

當注射器的後端向前運動時,使得第一導通閥的後端壓力大於第一導通閥前端的壓力,使得第一墊片與第一通孔分離,第一導通閥導通,同時,第二導通閥的後端壓力也大於第二導通閥前端的壓力,使得第二墊片與第四通孔更加緊密貼合,第二導通閥閉合,此時,注射器內的電鍍液僅僅能夠從第一管路順利通過進入電鍍槽內;當注射器的後端向後運動時,注射器內形成負壓,使得第一導通閥的後端壓力小於第一導通閥前端的壓力,使得第一墊片與第一通孔緊密貼合,第一導通閥閉合,同時,第二導通閥後端的壓力也小於第二導通閥前端的壓力,使得第二墊片與第四通孔分離,第二導通閥導通,此時,補液槽內的電鍍添加劑能夠從第二管路順利通過進入注射器內。When the rear end of the syringe moves forward, the pressure at the rear end of the first conducting valve is greater than the pressure at the front end of the first conducting valve, so that the first gasket is separated from the first through hole, the first conducting valve is turned on, and at the same time, the second conducting valve is turned on. The pressure at the rear end of the conduction valve is also greater than the pressure at the front end of the second conduction valve, so that the second gasket and the fourth through hole are more closely fitted, and the second conduction valve is closed. The pipeline passes smoothly into the electroplating tank; when the rear end of the syringe moves backward, a negative pressure is formed in the syringe, so that the pressure at the rear end of the first conduction valve is lower than the pressure at the front end of the first conduction valve, so that the first gasket and the first The through hole is tightly fitted, the first conduction valve is closed, and at the same time, the pressure at the rear end of the second conduction valve is also smaller than the pressure at the front end of the second conduction valve, so that the second gasket is separated from the fourth through hole, and the second conduction valve is turned on. At the same time, the electroplating additives in the liquid replenishment tank can smoothly pass through the second pipeline and enter the syringe.

進一步地,所述注射器包括針筒、柱塞杆和柱塞,所述柱塞與所述柱塞杆的前端固定連接,所述柱塞安裝在所述針筒內,使得所述針筒內部形成無杆腔和有杆腔,所述柱塞杆的部分位於所述有杆腔內,所述柱塞杆的後端位於所述針筒外部,所述無杆腔的前端與所述Y型管的第一端連接,所述無杆腔用於容納電鍍添加劑。當柱塞杆向前運動時,無杆腔內的壓力增大,使得第一導通閥導通,第二導通閥閉合,實現加液操作;當柱塞杆向後運動時,無杆腔內形成負壓,使得第一導通閥閉合,第二導通閥導通,實現補液操作。Further, the syringe includes a syringe, a plunger rod and a plunger, the plunger is fixedly connected with the front end of the plunger rod, and the plunger is installed in the syringe so that the inside of the syringe A rodless cavity and a rod cavity are formed, the part of the plunger rod is located in the rod cavity, the rear end of the plunger rod is located outside the barrel, and the front end of the rodless cavity is connected to the Y The first end of the mold tube is connected, and the rodless cavity is used for containing the electroplating additive. When the plunger rod moves forward, the pressure in the rodless cavity increases, so that the first conduction valve is turned on and the second conduction valve is closed to realize the liquid adding operation; when the plunger rod moves backward, a negative pressure is formed in the rodless cavity. pressure, so that the first conduction valve is closed, and the second conduction valve is turned on to realize the liquid replenishment operation.

進一步地,所述推進機構包括推進板和絲杆步進電機,所述推進板與所述絲杆步進電機的絲杆連接,所述絲杆步進電機與所述控制器信號連接,所述推進板的上端面設有卡槽,所述柱塞杆的後部安裝在所述卡槽上。絲杆步進電機能夠做直線往復運動,當控制器發送信號給絲杆步進電機時,絲杆步進電機能夠帶動推進板也做直線往復運動,推進板再帶動柱塞杆做直線往復運動,實現加液和補液操作。Further, the propulsion mechanism includes a propulsion plate and a lead screw stepping motor, the propulsion plate is connected with the lead screw of the lead screw stepping motor, and the lead screw stepping motor is signally connected with the controller, so The upper end surface of the push plate is provided with a clamping groove, and the rear part of the plunger rod is installed on the clamping groove. The lead screw stepping motor can do linear reciprocating motion. When the controller sends a signal to the lead screw stepping motor, the lead screw stepping motor can drive the propulsion plate to do linear reciprocating motion, and the propulsion plate then drives the plunger rod to do linear reciprocating motion. , to achieve liquid addition and rehydration operations.

進一步地,還包括固定機構,所述固定機構位於所述注射器的下方,所述固定機構包括第一固定座、第二固定座及第三固定座,所述第一固定座與所述第二固定座可拆卸連接,所述第二固定座與所述第三固定座可拆卸連接,所述針筒的中部架設在所述第一固定座、第二固定座或第三固定座上。快拆式的固定機構能夠適用於不同尺寸的注射器,使得不同尺寸的注射器與推進板能夠一直保持在同一水準位置,保證電鍍添加劑添加的精准性。Further, it also includes a fixing mechanism, the fixing mechanism is located below the syringe, the fixing mechanism includes a first fixing seat, a second fixing seat and a third fixing seat, the first fixing seat and the second fixing seat The fixing base is detachably connected, the second fixing base is detachably connected to the third fixing base, and the middle part of the needle cylinder is erected on the first fixing base, the second fixing base or the third fixing base. The quick-release fixing mechanism can be applied to syringes of different sizes, so that the syringes of different sizes and the propelling plate can always be kept in the same level position to ensure the accuracy of the addition of electroplating additives.

進一步地,為了便於安裝和拆卸,所述第一固定座上設有第一容納槽,所述第一容納槽底部設有第一安裝孔,所述第一固定座底面設有第一安裝柱;所述第二固定座上設有第二容納槽,所述第二容納槽底部設有第二安裝孔,所述第二固定座底面設有第二安裝柱;所述第三固定座上設有第三容納槽,所述第三容納槽底部設有第三安裝孔,所述第三固定座底面設有第三安裝柱;當所述第一固定座與所述第二固定座連接時,所述第一安裝柱位於所述第二安裝孔內,且所述第一固定座位於所述第二容納槽內;當所述第二固定座與所述第三固定座連接時,所述第二安裝柱位於所述第三安裝孔內,且所述第二固定座位於所述第三容納槽內。Further, in order to facilitate installation and disassembly, the first fixing seat is provided with a first accommodating groove, the bottom of the first accommodating groove is provided with a first installation hole, and the bottom surface of the first fixing seat is provided with a first installation column ; a second accommodating slot is arranged on the second fixing seat, a second mounting hole is arranged at the bottom of the second accommodating slot, and a second mounting post is arranged on the bottom surface of the second fixing seat; the third fixing seat is There is a third accommodating groove, the bottom of the third accommodating groove is provided with a third mounting hole, and the bottom surface of the third fixing base is provided with a third mounting post; when the first fixing base is connected with the second fixing base When the first mounting post is located in the second mounting hole, and the first fixing seat is located in the second accommodating groove; when the second fixing seat is connected with the third fixing seat, The second mounting post is located in the third mounting hole, and the second fixing seat is located in the third accommodating groove.

進一步地,為了第一固定座、第二固定座及第三固定座之間安裝地更牢固,所述第一固定座的寬度為W1,所述第一固定座的長度為H1,所述第二固定座的寬度為W2,所述第二固定座的長度為H2,所述第二容納槽的寬度為d2,所述第二容納槽的長度為L2,所述第三容納槽的寬度為d3,所述第二容納槽的長度為L3,所述寬度W1與所述寬度d2相匹配,所述長度H1與所述長度L3相匹配,所述寬度W2與所述寬度d3相匹配,所述長度H2與所述長度L3相匹配。Further, in order to install the first fixing seat, the second fixing seat and the third fixing seat more firmly, the width of the first fixing seat is W1, the length of the first fixing seat is H1, and the first fixing seat is H1. The width of the second fixing seat is W2, the length of the second fixing seat is H2, the width of the second accommodating groove is d2, the length of the second accommodating groove is L2, and the width of the third accommodating groove is d3, the length of the second accommodating groove is L3, the width W1 matches the width d2, the length H1 matches the length L3, and the width W2 matches the width d3, so The length H2 matches the length L3.

本發明的有益效果是,本發明的微量電鍍添加劑自動補給控制方法,通過控制器控制推進機構向前運動,從而帶動注射機構的後端向前運動,注射機構能夠向電鍍槽內添加電鍍添加劑;當添加完畢後,推進機構的後端自動向後運動,使得注射機構的後端也向後運動,注射機構能夠從補液槽裡吸取新的電鍍添加劑,實現自動加液和自動補液,並且能夠精准控制注射機構添加電鍍添加劑的量,避免認為操作的失誤,提高產品電鍍的精度,還能夠通過一組注射機構來同時控制加液和補液的量,並且能夠使得加液和補液能夠自動迴圈。第一導通閥能夠控制第一管路的導通或者閉合,第二導通閥能夠控制第二管路的導通或者閉合,當注射器向電鍍槽內添加電鍍添加劑時,第一導通閥導通,第二導通閥閉合,當注射器從補液槽內吸取新的電鍍添加劑時,第一導通閥閉合,第二導通閥導通,這樣,使得加液和補液之間相互不會干擾,進一步提高添加電鍍添加劑的精准性。通過快拆式的固定機構能夠適用于不同管徑的注射器,實現添加不同量電鍍添加劑的注射。本發明結構簡單,操作方便,且能迴圈使用。The beneficial effect of the present invention is that, in the automatic replenishment control method of trace electroplating additives of the present invention, the controller controls the forward movement of the propulsion mechanism, thereby driving the rear end of the injection mechanism to move forward, and the injection mechanism can add the electroplating additives into the electroplating tank; When the addition is completed, the rear end of the propulsion mechanism automatically moves backward, so that the rear end of the injection mechanism also moves backward, and the injection mechanism can absorb new electroplating additives from the liquid replenishment tank, realize automatic liquid addition and automatic liquid replenishment, and can accurately control the injection The amount of electroplating additives added by the mechanism can avoid mistakes in operation and improve the accuracy of product electroplating. It can also control the amount of liquid addition and liquid replenishment at the same time through a set of injection mechanisms, and can make liquid addition and liquid replenishment can be automatically looped. The first conduction valve can control the conduction or closing of the first pipeline, and the second conduction valve can control the conduction or closing of the second pipeline. When the syringe adds electroplating additives to the electroplating tank, the first conduction valve is turned on, and the second conduction valve is turned on. The valve is closed. When the syringe absorbs new electroplating additives from the replenishment tank, the first conduction valve is closed and the second conduction valve is opened, so that the addition and replenishment will not interfere with each other, which further improves the accuracy of adding electroplating additives. . The quick-release fixing mechanism can be applied to syringes of different diameters, and realize the injection of adding different amounts of electroplating additives. The invention has simple structure, convenient operation and can be used in a circle.

現在結合圖式對本發明作進一步詳細的說明。這些圖式均為簡化的示意圖,僅以示意方式說明本發明的基本結構,因此其僅顯示與本發明有關的構成。The present invention will now be described in further detail with reference to the drawings. These drawings are all simplified schematic diagrams, and only illustrate the basic structure of the present invention in a schematic manner, so they only show the structures related to the present invention.

在本發明的描述中,需要理解的是,術語“中心”、“縱向”、“橫向”、“長度”、“寬度”、“厚度”、“上”、“下”、“前”、“後”、“左”、“右”、“豎直”、“水準”、“頂”、“底”“內”、“外”、“順時針”、“逆時針”、“軸向”、“徑向”、“周向”等指示的方位或位置關係為基於圖式所示的方位或位置關係,僅是為了便於描述本發明和簡化描述,而不是指示或暗示所指的裝置或元件必須具有特定的方位、以特定的方位構造和操作,因此不能理解為對本發明的限制。此外,限定有“第一”、“第二”的特徵可以明示或者隱含地包括一個或者更多個該特徵。在本發明的描述中,除非另有說明,“多個”的含義是兩個或兩個以上。In the description of the present invention, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", " Rear, Left, Right, Vertical, Horizontal, Top, Bottom, Inner, Outer, Clockwise, Counterclockwise, Axial, The orientation or positional relationship indicated by "radial direction", "circumferential direction", etc. is based on the orientation or positional relationship shown in the drawings, and is only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying the indicated device or element. It must have a specific orientation, be constructed and operate in a specific orientation, and therefore should not be construed as a limitation of the present invention. Furthermore, features delimited with "first", "second" may expressly or implicitly include one or more of that feature. In the description of the present invention, unless otherwise specified, "plurality" means two or more.

在本發明的描述中,需要說明的是,除非另有明確的規定和限定,術語“安裝”、“相連”、“連接”應做廣義理解,例如,可以是固定連接,也可以是可拆卸連接,或一體地連接;可以是機械連接,也可以是電連接;可以是直接相連,也可以通過中間媒介間接相連,可以是兩個元件內部的連通。對於本領域的普通技術人員而言,可以具體情況理解上述術語在本發明中的具體含義。In the description of the present invention, it should be noted that the terms "installed", "connected" and "connected" should be understood in a broad sense, unless otherwise expressly specified and limited, for example, it may be a fixed connection or a detachable connection Connection, or integral connection; can be mechanical connection, can also be electrical connection; can be directly connected, can also be indirectly connected through an intermediate medium, can be internal communication between two elements. For those of ordinary skill in the art, the specific meanings of the above terms in the present invention can be understood in specific situations.

在本實施例中,以電鍍液進入電鍍槽的方向為前方。如圖1至圖11所示,一種微量電鍍添加劑自動補給控制方法,包括:電鍍槽11,用於承載電鍍液,電鍍槽11與電鍍控制設備連接;補液槽12,用於承載電鍍添加劑;注射機構5,電鍍槽11通過第一管路和注射機構5的前端相連通,補液槽12通過第二管路和注射機構5的前端相連通,注射機構5包括注射器51和Y型管52,Y型管52的第一端521與注射器51的前端連通,Y型管52的第二端522與第一管路連通,Y型管52的第三端523與第二管路連通,第一管路上設有第一導通閥53,第二管路上設有第二導通閥54;推進機構3,推進機構3能夠推動注射機構5的後端往復運動,當推進機構3推動注射機構5的後端向前運動時,注射機構5能夠給電鍍槽11內進行加液,當推進機構3帶動注射機構5的後端向後運動時,注射機構5能夠停止給電鍍槽11內進行加液,同時使得補液槽12給注射機構5;控制器2,電鍍控制設備和推進機構3均與控制器2信號連接。In this embodiment, the direction in which the electroplating solution enters the electroplating tank is taken as the front. As shown in FIG. 1 to FIG. 11 , an automatic replenishment control method of trace electroplating additives includes: electroplating tank 11 for carrying electroplating solution, the electroplating tank 11 is connected to the electroplating control equipment; liquid replenishing tank 12 for carrying electroplating additives; injection; Mechanism 5, the electroplating tank 11 is communicated with the front end of the injection mechanism 5 through the first pipeline, the liquid replenishment tank 12 is communicated with the front end of the injection mechanism 5 through the second pipeline, and the injection mechanism 5 includes a syringe 51 and a Y-shaped tube 52, Y The first end 521 of the Y-shaped tube 52 is communicated with the front end of the syringe 51, the second end 522 of the Y-shaped tube 52 is communicated with the first pipeline, the third end 523 of the Y-shaped tube 52 is communicated with the second pipeline, and the first tube There is a first conducting valve 53 on the road, and a second conducting valve 54 on the second pipeline; the propulsion mechanism 3, the propulsion mechanism 3 can push the rear end of the injection mechanism 5 to reciprocate, when the propulsion mechanism 3 pushes the rear end of the injection mechanism 5 When moving forward, the injection mechanism 5 can add liquid to the electroplating tank 11, and when the propulsion mechanism 3 drives the rear end of the injection mechanism 5 to move backward, the injection mechanism 5 can stop adding liquid to the electroplating tank 11, and at the same time make the liquid replenishment. The tank 12 feeds the injection mechanism 5 ; the controller 2 , the electroplating control equipment and the propulsion mechanism 3 are all signally connected to the controller 2 .

微量電鍍添加劑自動補給控制方法具有以下步驟: S1:初始狀態時,注射器51、Y型管52、第一導通閥53、第一管路,第二導通閥54及第二管路內均充滿電鍍添加劑,第一導通閥53和第二導通閥54均為封閉狀態。 S2:當電鍍控制設備開始電鍍工作時,電鍍控制設備發送信號給控制器2,控制器2接收該信號後控制推進機構3推動注射器51的後端向前運動,此時,由於第一導通閥53後端的壓力大於第一導通閥53前端的壓力,使得第一導通閥53導通,由於第二導通閥54後端的壓力大於第二導通閥54前端的壓力,使得第二導通閥54關閉;注射器51內的電鍍添加劑能夠通過第一管路進入電鍍槽11內,給電鍍槽11進行加液。 S3:當加液完畢後,控制器2控制推進機構3帶動注射器51的後端向後運動,此時,注射器51內形成負壓,使得第一導通閥53的後端壓力小於第一導通閥53前端的壓力,第一導通閥53關閉,使得第二導通閥54的後端壓力小於第二導通閥54的前端壓力,第二導通閥54導通;注射器51能夠通過第二管路從補液槽12內吸取新的電鍍添加劑,給注射器51補液;此時,注射器51內又充滿了電鍍添加劑。 S4:重複步驟S2-S3,迴圈進行。 The automatic replenishment control method of trace electroplating additives has the following steps: S1: In the initial state, the syringe 51, the Y-shaped tube 52, the first conduction valve 53, the first pipeline, the second conduction valve 54 and the second pipeline are all filled with electroplating additives, and the first conduction valve 53 and the second conduction The valves 54 are all closed. S2: When the electroplating control device starts the electroplating work, the electroplating control device sends a signal to the controller 2, and the controller 2 controls the propulsion mechanism 3 to push the rear end of the syringe 51 to move forward after receiving the signal. At this time, due to the first conduction valve The pressure at the rear end of 53 is greater than the pressure at the front end of the first conduction valve 53, so that the first conduction valve 53 is turned on. Since the pressure at the rear end of the second conduction valve 54 is greater than the pressure at the front end of the second conduction valve 54, the second conduction valve 54 is closed; the syringe The electroplating additives in 51 can enter the electroplating tank 11 through the first pipeline, and add liquid to the electroplating tank 11 . S3: When the liquid addition is completed, the controller 2 controls the propulsion mechanism 3 to drive the rear end of the syringe 51 to move backward. At this time, a negative pressure is formed in the syringe 51, so that the pressure at the rear end of the first conducting valve 53 is smaller than that of the first conducting valve 53 The pressure at the front end, the first conduction valve 53 is closed, so that the pressure at the rear end of the second conduction valve 54 is less than the pressure at the front end of the second conduction valve 54, and the second conduction valve 54 is turned on; the syringe 51 can pass through the second pipeline. A new electroplating additive is drawn from the inside, and the syringe 51 is replenished with liquid; at this time, the inside of the syringe 51 is filled with the electroplating additive again. S4: Steps S2-S3 are repeated, and the loop is performed.

在本實施例中,設定需要向電鍍槽11添加共Xml的電鍍添加劑,每t分鐘內添加Yml,添加次數為n=X/Y,控制器2控制注射器51先向電鍍槽11內進行添加Yml的電鍍添加劑的加液操作,然後控制器2控制注射器51從補液槽12內進行吸取Yml的電鍍添加劑的補液操作,迴圈n次加液補液操作,直至向電鍍槽11內共添加Xml電鍍添加劑。控制器2設定注射器51的加液速度為V1以及給注射器51的補液速度為V2,速度V1大於速度V2,且,t分鐘內加液操作所占的時間為t/4,補液操作所占的時間為t/6。例如,每分鐘內需添加1.1ml的電鍍添加劑,則可以設定加液速度V1為2.75ml/min,補液速度V2為1.83ml/min,但不限定於此,具體可以根據實際需求進行更改設置。In this embodiment, it is set that a total of Xml of electroplating additives needs to be added to the electroplating tank 11, Yml is added every t minutes, and the number of additions is n=X/Y. The controller 2 controls the injector 51 to add Yml to the electroplating tank 11 first. Then the controller 2 controls the injector 51 to carry out the replenishment operation of absorbing Yml of the electroplating additive from the replenishment tank 12, and loops n times of liquid addition and replenishment operation, until a total of Xml electroplating additives are added to the electroplating tank 11. . The controller 2 sets the liquid addition speed of the syringe 51 as V1 and the liquid replenishment speed to the syringe 51 as V2, the speed V1 is greater than the speed V2, and the time occupied by the liquid addition operation in t minutes is t/4, and the liquid replenishment operation occupies t/4. The time is t/6. For example, if 1.1ml of electroplating additive needs to be added per minute, the liquid addition speed V1 can be set to 2.75ml/min, and the liquid replenishment speed V2 can be set to 1.83ml/min, but it is not limited to this, and the settings can be changed according to actual needs.

第一導通閥53包括第一外殼531,第一外殼531內設有第一過濾網532、第一彈簧533及第一墊片534,第一過濾網532靠近第一外殼531的前端,第一墊片534靠近第一外殼531的後端,第一過濾網532與第一外殼531內壁固定連接,第一彈簧533的一端與第一過濾網532固定連接,第一彈簧533的另一端與第一墊片534固定連接,第一外殼531後端開設有第一通孔535,第一通孔535通過第一管路與Y型管52的第二端522連通,第一外殼531的前端開設有第二通孔536,第二通孔536通過第一管路與電鍍槽11連通,第一彈簧533在第一過濾網532和第一墊片534之間處於壓縮狀態,使得第一墊片534抵靠在第一通孔535上,第一通孔535此時密封。第二導通閥54包括第二外殼541,第二外殼541內設有第二過濾網542、第二彈簧543及第二墊片544,第二墊片544靠近第二外殼541的前端,第二過濾網542靠近第二外殼541的後端,第二過濾網542與第二外殼541內壁固定連接,第二彈簧543的一端與第二過濾網542固定連接,第二彈簧543的另一端與第二墊片544固定連接,第二外殼541的後端開設有第三通孔545,第三通孔545通過第二管路與Y型管52的第三端523連通,第二外殼541的前端開設有第四通孔546,第四通孔546通過第二管路與補液槽12連通,第二彈簧543在第二過濾網542和第二墊片544之間處於壓縮狀態,使得第二墊片544抵靠在第四通孔546上,第四通孔546此時密封。在本實施例中,第一過濾網532可以過濾電鍍添加劑中的雜質,防止進入電鍍槽11內的電解液含有雜質。因為電鍍添加劑是具有酸性或/和鹼性的化學物質,第一彈簧533選用能夠耐酸堿的彈簧,第一墊片534選用能夠耐酸堿的墊片,這樣能夠延長第一彈簧533和第一墊片534的使用壽命。第二過濾網542可以過濾電鍍添加劑中的雜質,防止進入注射器51內的電解液含有雜質。因為電鍍添加劑是具有酸性或/和鹼性的化學物質,第二彈簧543選用能夠耐酸堿的彈簧,第二墊片544選用能夠耐酸堿的墊片,這樣能夠延長第二彈簧543和第二墊片544的使用壽命。The first conduction valve 53 includes a first housing 531, and the first housing 531 is provided with a first filter 532, a first spring 533 and a first gasket 534. The first filter 532 is close to the front end of the first housing 531, and the first The gasket 534 is close to the rear end of the first housing 531, the first filter 532 is fixedly connected to the inner wall of the first housing 531, one end of the first spring 533 is fixedly connected to the first filter 532, and the other end of the first spring 533 is connected to the inner wall of the first housing 531. The first gasket 534 is fixedly connected, the rear end of the first shell 531 is provided with a first through hole 535, the first through hole 535 communicates with the second end 522 of the Y-shaped pipe 52 through a first pipeline, and the front end of the first shell 531 A second through hole 536 is opened, the second through hole 536 communicates with the electroplating tank 11 through the first pipeline, and the first spring 533 is in a compressed state between the first filter screen 532 and the first gasket 534, so that the first gasket The sheet 534 abuts on the first through hole 535, and the first through hole 535 is sealed at this time. The second conduction valve 54 includes a second housing 541 . The second housing 541 is provided with a second filter screen 542 , a second spring 543 and a second gasket 544 . The second gasket 544 is close to the front end of the second housing 541 , and the second The filter screen 542 is close to the rear end of the second shell 541, the second filter screen 542 is fixedly connected with the inner wall of the second shell 541, one end of the second spring 543 is fixedly connected with the second filter screen 542, and the other end of the second spring 543 is connected with The second gasket 544 is fixedly connected, the rear end of the second housing 541 is provided with a third through hole 545, and the third through hole 545 communicates with the third end 523 of the Y-shaped pipe 52 through the second pipeline. The front end is provided with a fourth through hole 546, the fourth through hole 546 communicates with the fluid replenishing tank 12 through the second pipeline, and the second spring 543 is in a compressed state between the second filter screen 542 and the second gasket 544, so that the second The gasket 544 abuts on the fourth through hole 546, and the fourth through hole 546 is sealed at this time. In this embodiment, the first filter screen 532 can filter impurities in the electroplating additive, so as to prevent the electrolyte solution entering the electroplating tank 11 from containing impurities. Because the electroplating additive is an acid or/and alkaline chemical substance, the first spring 533 is selected from a spring that can resist acid, and the first gasket 534 is selected from an acid-resistant gasket, so that the first spring 533 and the first gasket can be extended. life of sheet 534. The second filter screen 542 can filter the impurities in the electroplating additives to prevent the electrolyte solution entering the syringe 51 from containing impurities. Because the electroplating additive is an acid or/and alkaline chemical substance, the second spring 543 is selected from an acid-resistant spring, and the second gasket 544 is selected from an acid-resistant gasket, which can extend the length of the second spring 543 and the second gasket. life of sheet 544.

注射器51包括針筒511、柱塞杆512和柱塞515,柱塞515與柱塞杆512的前端固定連接,柱塞515安裝在針筒511內,使得針筒511內部形成無杆腔513和有杆腔514,柱塞杆512的部分位於有杆腔514內,柱塞杆512的後端位於針筒511外部,無杆腔513的前端與Y型管52的第一端521連接,無杆腔513用於容納電鍍添加劑。The syringe 51 includes a syringe 511, a plunger rod 512 and a plunger 515, the plunger 515 is fixedly connected to the front end of the plunger rod 512, and the plunger 515 is installed in the syringe 511, so that the inside of the syringe 511 forms a rodless cavity 513 and There is a rod cavity 514, the part of the plunger rod 512 is located in the rod cavity 514, the rear end of the plunger rod 512 is located outside the barrel 511, and the front end of the rodless cavity 513 is connected with the first end 521 of the Y-shaped tube 52, without Rod cavity 513 is used to contain plating additives.

推進機構3包括推進板31和絲杆步進電機32,推進板31與絲杆步進電機32的絲杆連接,絲杆步進電機33與控制器2信號連接,推進板31的上端面設有卡槽331,柱塞杆512的後部安裝在卡槽331上。The propulsion mechanism 3 includes a propulsion plate 31 and a lead screw stepping motor 32, the propulsion plate 31 is connected with the lead screw of the lead screw stepping motor 32, the lead screw stepping motor 33 is signally connected with the controller 2, and the upper end surface of the propulsion plate 31 is set. There is a card slot 331 on which the rear of the plunger rod 512 is mounted.

本實施例還包括固定機構4,固定機構4位於注射器51的下方,固定機構4包括第一固定座41、第二固定座42及第三固定座43,第一固定座41與第二固定座42可拆卸連接,第二固定座42與第三固定座43可拆卸連接,針筒511的中部架設在第一固定座41、第二固定座42或第三固定座43上。在本實施例中,第一固定座41、第二固定座42及第三固定座43均可用於安裝注射器51,並且第一固定座41、第二固定座42及第三固定座43的尺寸不同,第一固定座41的尺寸小於第二固定座42的尺寸,第二固定座42的尺寸小於第三固定座43的尺寸,三者分別適用於不同容量的注射器。例如,第一固定座41可以安裝容量為1ml的注射器,第二固定座42可以安裝容量為5ml的注射器,第三固定座43可以安裝容量為10ml的注射器。並且,固定座的數量也不限於三個,本實施例僅為示例,可以根據實際需求增加或者減少固定座的數量。This embodiment further includes a fixing mechanism 4, which is located below the syringe 51, and the fixing mechanism 4 includes a first fixing seat 41, a second fixing seat 42 and a third fixing seat 43, the first fixing seat 41 and the second fixing seat 42 is detachably connected, the second fixing base 42 is detachably connected to the third fixing base 43 , and the middle of the needle cylinder 511 is erected on the first fixing base 41 , the second fixing base 42 or the third fixing base 43 . In this embodiment, the first fixing seat 41 , the second fixing seat 42 and the third fixing seat 43 can all be used to install the syringe 51 , and the dimensions of the first fixing seat 41 , the second fixing seat 42 and the third fixing seat 43 Differently, the size of the first fixing seat 41 is smaller than that of the second fixing seat 42 , and the size of the second fixing seat 42 is smaller than the size of the third fixing seat 43 , which are respectively suitable for syringes of different capacities. For example, the first fixing seat 41 can be installed with a syringe with a capacity of 1 ml, the second fixing seat 42 can be installed with a syringe with a capacity of 5 ml, and the third fixing seat 43 can be installed with a syringe with a capacity of 10 ml. In addition, the number of fixing seats is not limited to three, and this embodiment is only an example, and the number of fixing seats can be increased or decreased according to actual needs.

第一固定座41上設有第一容納槽411,第一容納槽411底部設有第一安裝孔412,第一固定座41底面設有第一安裝柱413;第二固定座42上設有第二容納槽421,第二容納槽421底部設有第二安裝孔422,第二固定座42底面設有第二安裝柱423;第三固定座43上設有第三容納槽431,第三容納槽431底部設有第三安裝孔432,第三固定座43底面設有第三安裝柱433;當第一固定座41與第二固定座42連接時,第一安裝柱413位於第二安裝孔422內,且第一固定座41位於第二容納槽421內;當第二固定座42與第三固定座43連接時,第二安裝柱423位於第三安裝孔432內,且第二固定座41位於第三容納槽431內。也就是說,第一固定座41、第二固定座42和第三固定座43三者是可以疊加放置的,由於第二推進板33的高度是固定的,當注射器51從大容量更換為小容量時,注射器51的直徑也隨之減小,此時,如果小容量的注射器仍然是放置在第三固定座41上,會導致注射器的尾部高於注射器的頭部,進而導致注射的量不準確,影響電鍍效果。因此,當注射器51的容量需要更換時,需要將固定座疊放在一起或者拆分,使得注射器51的尾部和頭部一直保持處於同一水準高度,保證電解液注射的精度。這樣,在同一套系統中,可以同時實現注射不同量的電鍍添加劑,適應性更好,且可以節約成本。The first fixing seat 41 is provided with a first accommodating groove 411 , the bottom of the first accommodating groove 411 is provided with a first mounting hole 412 , the bottom surface of the first fixing seat 41 is provided with a first mounting post 413 ; the second fixing seat 42 is provided with a first mounting hole 412 . The second accommodating groove 421 is provided with a second mounting hole 422 at the bottom of the second accommodating groove 421 , and the second mounting post 423 is provided on the bottom surface of the second fixing base 42 ; the third fixing base 43 is provided with a third accommodating groove 431 . A third mounting hole 432 is provided at the bottom of the accommodating slot 431, and a third mounting post 433 is provided on the bottom surface of the third fixing base 43; hole 422, and the first fixing seat 41 is located in the second accommodating groove 421; when the second fixing seat 42 is connected with the third fixing seat 43, the second mounting post 423 is located in the third mounting hole 432, and the second fixing The seat 41 is located in the third accommodating groove 431 . That is to say, the first fixed seat 41 , the second fixed seat 42 and the third fixed seat 43 can be stacked and placed. Since the height of the second push plate 33 is fixed, when the syringe 51 is changed from a large capacity to a small one When the volume is increased, the diameter of the syringe 51 is also reduced. At this time, if the small-volume syringe is still placed on the third fixing seat 41, the tail of the syringe will be higher than the head of the syringe, and the injection volume will be different. Accurate, affecting the electroplating effect. Therefore, when the capacity of the syringe 51 needs to be replaced, the fixing bases need to be stacked together or separated, so that the tail and the head of the syringe 51 are always kept at the same level, so as to ensure the precision of electrolyte injection. In this way, in the same system, different amounts of electroplating additives can be injected at the same time, with better adaptability and cost savings.

第一固定座41的寬度為W1,第一固定座41的長度為H1,第二固定座42的寬度為W2,第二固定座42的長度為H2,第二容納槽421的寬度為d2,第二容納槽421的長度為L2,第三容納槽431的寬度為d3,第二容納槽421的長度為L3,寬度W1與寬度d2相匹配,長度H1與長度L3相匹配,寬度W2與寬度d3相匹配,長度H2與長度L3相匹配。The width of the first fixing seat 41 is W1, the length of the first fixing seat 41 is H1, the width of the second fixing seat 42 is W2, the length of the second fixing seat 42 is H2, the width of the second receiving groove 421 is d2, The length of the second accommodating groove 421 is L2, the width of the third accommodating groove 431 is d3, the length of the second accommodating groove 421 is L3, the width W1 matches the width d2, the length H1 matches the length L3, and the width W2 matches the width d3 matches, and length H2 matches length L3.

以上述依據本發明的理想實施例為啟示,通過上述的說明內容,相關工作人員完全可以在不偏離本項發明技術思想的範圍內,進行多樣的變更以及修改。本項發明的技術性範圍並不局限於說明書上的內容,必須要如權利要求範圍來確定其技術性範圍。Taking the above ideal embodiments according to the present invention as inspiration, and through the above description, relevant personnel can make various changes and modifications without departing from the technical idea of the present invention. The technical scope of the present invention is not limited to the content in the specification, and the technical scope must be determined according to the scope of the claims.

11:電鍍槽 12:補液槽 2:控制器 3:推進機構 4:固定機構 5:注射機構 31:推進板 32:絲杆步進電機 311:卡槽 41:第一固定座 42:第二固定座 43:第三固定座 411:第一容納槽 412:第一安裝孔 413:第一安裝柱 421:第二容納槽 422:第二安裝孔 423:第二安裝柱 431:第三容納槽 432:第三安裝孔 433:第三安裝柱 51:注射器 52:Y型管 53:第一導通閥 54:第二導通閥 511:針筒 512:柱塞杆 513:無杆腔 514:有杆腔 515:柱塞 521:第一端 522:第二端 523:第三端 531:第一外殼 532:第一過濾網 533:第一彈簧 534:第一墊片 535:第一通孔 536:第二通孔 541:第二外殼 542:第二過濾網 543:第二彈簧 544:第二墊片 545:第三通孔 546:第四通孔11: Electroplating tank 12: Rehydration tank 2: Controller 3: Promoting Mechanisms 4: Fixed mechanism 5: Injection mechanism 31: Propulsion Board 32: Screw stepper motor 311: Card slot 41: The first fixed seat 42: Second fixed seat 43: The third fixed seat 411: The first accommodating slot 412: The first mounting hole 413: First mounting post 421: The second holding slot 422: Second mounting hole 423: Second mounting post 431: The third holding slot 432: The third mounting hole 433: Third mounting post 51: Syringe 52: Y-tube 53: The first conduction valve 54: The second conducting valve 511: Syringe 512: Plunger rod 513: Rodless cavity 514: with rod cavity 515: Plunger 521: First End 522: second end 523: Third End 531: First Shell 532: The first filter 533: First Spring 534: First gasket 535: first through hole 536: second through hole 541: Second shell 542: Second filter 543: Second Spring 544: Second gasket 545: third through hole 546: Fourth through hole

圖1是本發明微量電鍍添加劑自動補給控制方法的流程圖。Fig. 1 is a flow chart of the automatic replenishment control method of trace electroplating additives of the present invention.

圖2是本發明的微量電鍍液自動補給裝置的結構示意圖。FIG. 2 is a schematic structural diagram of the automatic replenishing device for the micro-plating solution of the present invention.

圖3是本發明的注射機構的放大圖。Figure 3 is an enlarged view of the injection mechanism of the present invention.

圖4是本發明的第一導通閥導通時的示意圖。FIG. 4 is a schematic diagram of the first conduction valve of the present invention when it is turned on.

圖5是本發明的第二導通閥導通時的示意圖。FIG. 5 is a schematic diagram of the second conduction valve of the present invention when it is turned on.

圖6是本發明推進板的結構示意圖。FIG. 6 is a schematic view of the structure of the propelling plate of the present invention.

圖7是本發明的固定機構的結構示意圖。FIG. 7 is a schematic structural diagram of the fixing mechanism of the present invention.

圖8是本發明的固定機構的俯視圖。Fig. 8 is a plan view of the fixing mechanism of the present invention.

圖9是本發明的第三固定座的結構示意圖。FIG. 9 is a schematic structural diagram of a third fixing seat of the present invention.

圖10是本發明的第二固定座的結構示意圖。FIG. 10 is a schematic structural diagram of the second fixing seat of the present invention.

圖11是本發明的第一固定座的結構示意圖。FIG. 11 is a schematic structural diagram of the first fixing seat of the present invention.

Claims (9)

一種微量電鍍添加劑自動補給控制方法,其中,採用微量電鍍添加劑自動補給裝置,該裝置包括: 一電鍍槽(11),用於承載電鍍液,該電鍍槽(11)與電鍍控制設備連接; 一補液槽(12),用於承載電鍍添加劑; 一注射機構(5),該電鍍槽(11)通過第一管路和該注射機構(5)的前端相連通,該補液槽(12)通過第二管路和該注射機構(5)的前端相連通,該注射機構(5)包括一注射器(51)和一Y型管(52),該Y型管(52)的一第一端(521)與該注射器(51)的前端連通,該Y型管(52)的一第二端(522)與該第一管路連通,該Y型管(52)的一第三端(523)與該第二管路連通,該第一管路上設有一第一導通閥(53),該第二管路上設有一第二導通閥(54); 一推進機構(3),該推進機構(3)能夠推動該注射機構(5)的後端往復運動,當該推進機構(3)推動該注射機構(5)的後端向前運動時,該注射機構(5)能夠給該電鍍槽(11)內進行加液,當該推進機構(3)帶動該注射機構(5)的後端向後運動時,該注射機構(5)能夠停止給該電鍍槽(11)內進行加液,同時使得該補液槽(12)給該注射機構(5)加液; 一控制器(2),該電鍍控制設備和該推進機構(3)均與該控制器(2)電性連接; 微量電鍍添加劑自動補給控制方法具有以下步驟: S1:初始狀態時,該注射器(51)、該Y型管(52)、該第一導通閥(53)、該第一管路,該第二導通閥(54)及該第二管路內均充滿電鍍添加劑,該第一導通閥(53)和該第二導通閥(54)均為封閉狀態; S2:當電鍍控制設備開始電鍍工作時,電鍍控制設備發送信號給該控制器(2)該控制器(2)接收該信號後控制該推進機構(3)推動該注射器(51)的後端向前運動,此時,由於該第一導通閥(53)後端的壓力大於該第一導通閥(53)前端的壓力,使得該第一導通閥(53)導通,由於該第二導通閥(54)後端的壓力大於該第二導通閥(54)前端的壓力,使得該第二導通閥(54)關閉;該注射器(51)內的電鍍添加劑能夠通過第一管路進入該電鍍槽(11)內,給該電鍍槽(11)進行加液; S3:當加液完畢後,該控制器(2)控制該推進機構(3)帶動該注射器(51)的後端向後運動,此時,該注射器(51)內形成負壓,使得該第一導通閥(53)的後端壓力小於該第一導通閥(53)前端的壓力,該第一導通閥(53)關閉,使得該第二導通閥(54)的後端壓力小於該第二導通閥(54)的前端壓力,該第二導通閥(54)導通;該注射器(51)能夠通過該第二管路從該補液槽(12)內吸取新的電鍍添加劑,給該注射器(51)補液; S4:重複步驟S2-S3,迴圈進行。 An automatic replenishment control method for trace electroplating additives, wherein an automatic replenishment device for trace electroplating additives is adopted, and the device includes: an electroplating tank (11) for carrying the electroplating solution, the electroplating tank (11) is connected with the electroplating control equipment; a liquid replenishing tank (12) for carrying electroplating additives; An injection mechanism (5), the electroplating tank (11) is communicated with the front end of the injection mechanism (5) through a first pipeline, and the liquid replenishing tank (12) is connected with the front end of the injection mechanism (5) through a second pipeline The injection mechanism (5) includes a syringe (51) and a Y-shaped tube (52). A first end (521) of the Y-shaped tube (52) is communicated with the front end of the syringe (51). The A second end (522) of the Y-shaped pipe (52) is communicated with the first pipeline, and a third end (523) of the Y-shaped pipe (52) is communicated with the second pipeline. A first conducting valve (53) is provided, and a second conducting valve (54) is provided on the second pipeline; A propulsion mechanism (3), which can push the rear end of the injection mechanism (5) to reciprocate, when the propulsion mechanism (3) pushes the rear end of the injection mechanism (5) to move forward, the The injection mechanism (5) can add liquid to the electroplating tank (11), and when the propulsion mechanism (3) drives the rear end of the injection mechanism (5) to move backwards, the injection mechanism (5) can stop feeding the electroplating liquid is added in the tank (11), and at the same time, the liquid replenishing tank (12) is made to add liquid to the injection mechanism (5); a controller (2), both the electroplating control device and the propulsion mechanism (3) are electrically connected to the controller (2); The automatic replenishment control method of trace electroplating additives has the following steps: S1: In the initial state, the syringe (51), the Y-shaped tube (52), the first conducting valve (53), the first pipeline, the second conducting valve (54) and the inside of the second pipeline Both are filled with electroplating additives, and the first conducting valve (53) and the second conducting valve (54) are both closed; S2: When the electroplating control device starts electroplating work, the electroplating control device sends a signal to the controller (2). After receiving the signal, the controller (2) controls the propulsion mechanism (3) to push the rear end of the syringe (51) to the Forward movement, at this time, since the pressure at the rear end of the first conducting valve (53) is greater than the pressure at the front end of the first conducting valve (53), the first conducting valve (53) is turned on, because the second conducting valve (54) ) The pressure at the rear end is greater than the pressure at the front end of the second conducting valve (54), so that the second conducting valve (54) is closed; the electroplating additive in the syringe (51) can enter the electroplating tank (11) through the first pipeline inside, adding liquid to the electroplating tank (11); S3: When the liquid addition is completed, the controller (2) controls the propulsion mechanism (3) to drive the rear end of the syringe (51) to move backward. At this time, a negative pressure is formed in the syringe (51), so that the first The pressure at the rear end of the conducting valve (53) is lower than the pressure at the front end of the first conducting valve (53), and the first conducting valve (53) is closed, so that the pressure at the rear end of the second conducting valve (54) is smaller than the pressure at the front end of the second conducting valve (54) The pressure at the front end of the valve (54), the second conducting valve (54) is turned on; the syringe (51) can absorb new electroplating additives from the liquid replenishment tank (12) through the second pipeline, and give the syringe (51) rehydration; S4: Steps S2-S3 are repeated, and the loop is performed. 如請求項1所述的微量電鍍添加劑自動補給控制方法,其中,所述方法還包括:設定需要向該電鍍槽(11)添加共Xml的電鍍添加劑,每t分鐘內添加Yml,添加次數為n=X/Y,該控制器(2)控制該注射器(51)先向該電鍍槽(11)內進行添加Yml的電鍍添加劑的加液操作,然後該控制器(2)控制該注射器(51)從該補液槽(12)內進行吸取Yml的電鍍添加劑的補液操作,迴圈n次加液補液操作,直至向該電鍍槽(11)內共添加Xml電鍍添加劑。The automatic replenishment control method for trace electroplating additives according to claim 1, wherein the method further comprises: setting a total of Xml of electroplating additives to be added to the electroplating tank (11), adding Yml every t minutes, and adding the number of times n =X/Y, the controller (2) controls the injector (51) to add Yml of electroplating additives into the electroplating tank (11) first, and then the controller (2) controls the injector (51) The replenishment operation of sucking Yml of electroplating additives is performed from the replenishment tank (12), and the liquid addition and replenishment operations are repeated n times until a total of Xml of electroplating additives are added to the electroplating tank (11). 如請求項2所述的微量電鍍添加劑自動補給控制方法,其中,該控制器(2)設定該注射器(51)的加液速度為V1以及給該注射器(51)的補液速度為V2,速度V1大於速度V2,且,t分鐘內加液操作所占的時間為t/4,補液操作所占的時間為t/6。The automatic replenishment control method for trace electroplating additives according to claim 2, wherein the controller (2) sets the injection rate of the syringe (51) as V1 and the injection rate of the syringe (51) as V2, and the rate V1 greater than the speed V2, and the time occupied by the liquid addition operation in t minutes is t/4, and the time occupied by the liquid replenishment operation is t/6. 如請求項1所述的微量電鍍添加劑自動補給控制方法,其中,該第一導通閥(53)包括一第一外殼(531),該第一外殼(531)內設有一第一過濾網(532)、一第一彈簧(533)及一第一墊片(534),該第一過濾網(532)靠近該第一外殼(531)的前端,該第一墊片(534)靠近該第一外殼(531)的後端,該第一過濾網(532)與該第一外殼(531)內壁固定連接,該第一彈簧(533)的一端與該第一過濾網(532)固定連接,該第一彈簧(533)的另一端與該第一墊片(534)固定連接,該第一外殼(531)後端開設有一第一通孔(535),該第一通孔(535)通過該第一管路與所述Y型管(52)的該第二端(522)連通,該第一外殼(531)的前端開設有一第二通孔(536),該第二通孔(536)通過該第一管路與該電鍍槽(11)連通,該第一彈簧(533)在該第一過濾網(532)和該第一墊片(534)之間處於壓縮狀態,使得該第一墊片(534)抵靠在該第一通孔(535)上,該第一通孔(535)此時密封;該第二導通閥(54)包括一第二外殼(541),該第二外殼(541)內設有一第二過濾網(542)、一第二彈簧(543)及一第二墊片(544),該第二墊片(544)靠近該第二外殼(541)的前端,該第二過濾網(542)靠近該第二外殼(541)的後端,該第二過濾網(542)與該第二外殼(541)內壁固定連接,該第二彈簧(543)的一端與該第二過濾網(542)固定連接,該第二彈簧(543)的另一端與該第二墊片(544)固定連接,該第二外殼(541)的後端開設有一第三通孔(545),該第三通孔(545)通過該第二管路與該Y型管(52)的一第三端(523)連通,該第二外殼(541)的前端開設有一第四通孔(546),該第四通孔(546)通過第二管路與該補液槽(12)連通;該第二彈簧(543)在該第二過濾網(542)和該第二墊片(544)之間處於壓縮狀態,使得該第二墊片(544)抵靠在該第四通孔(546)上,該第四通孔(546)此時密封。The automatic replenishment control method for trace electroplating additives according to claim 1, wherein the first conduction valve (53) comprises a first casing (531), and a first filter screen (532) is arranged in the first casing (531). ), a first spring (533) and a first gasket (534), the first filter screen (532) is close to the front end of the first shell (531), the first gasket (534) is close to the first the rear end of the casing (531), the first filter screen (532) is fixedly connected to the inner wall of the first casing (531), and one end of the first spring (533) is fixedly connected to the first filter screen (532), The other end of the first spring (533) is fixedly connected to the first washer (534), and the rear end of the first housing (531) defines a first through hole (535) through which the first through hole (535) passes The first pipeline communicates with the second end (522) of the Y-shaped pipe (52). The front end of the first housing (531) defines a second through hole (536). The second through hole (536) ) is communicated with the electroplating tank (11) through the first pipeline, and the first spring (533) is in a compressed state between the first filter screen (532) and the first gasket (534), so that the first spring (533) is in a compressed state. A gasket (534) abuts on the first through hole (535), and the first through hole (535) is sealed at this time; the second conduction valve (54) includes a second housing (541), the first through hole (535) is sealed. A second filter screen (542), a second spring (543) and a second gasket (544) are arranged in the two outer casings (541), and the second gasket (544) is close to the second outer casing (541). Front end, the second filter screen (542) is close to the rear end of the second shell (541), the second filter screen (542) is fixedly connected with the inner wall of the second shell (541), the second spring (543) One end of the spring (543) is fixedly connected to the second filter screen (542), the other end of the second spring (543) is fixedly connected to the second gasket (544), and a third A through hole (545), the third through hole (545) is communicated with a third end (523) of the Y-shaped pipe (52) through the second pipeline, and the front end of the second housing (541) is provided with a first Four through holes (546), the fourth through holes (546) communicate with the fluid replenishing tank (12) through the second pipeline; the second spring (543) is connected between the second filter screen (542) and the second pad The sheets (544) are in a compressed state, so that the second gasket (544) abuts on the fourth through hole (546), which is now sealed. 如請求項1所述的微量電鍍添加劑自動補給控制方法,其中,該注射器(51)包括一針筒(511)、一柱塞杆(512)及一柱塞(515),該柱塞(515)與該柱塞杆(512)的前端固定連接,該柱塞(515)安裝在該針筒(511)內,使得該針筒(511)內部形成一無杆腔(513)和一有杆腔(514),該柱塞杆(512)的部分位於該有杆腔(514)內,該柱塞杆(512)的後端位於該針筒(511)外部,該無杆腔(513)的前端與該Y型管(52)的一第一端(521)連接,該無杆腔(513)用於容納電鍍添加劑。The automatic replenishment control method for trace electroplating additives according to claim 1, wherein the syringe (51) comprises a syringe (511), a plunger rod (512) and a plunger (515), the plunger (515) ) is fixedly connected with the front end of the plunger rod (512), the plunger (515) is installed in the barrel (511), so that a rodless cavity (513) and a rod with a rod are formed inside the barrel (511). A cavity (514), part of the plunger rod (512) is located in the rod cavity (514), the rear end of the plunger rod (512) is located outside the barrel (511), the rodless cavity (513) Its front end is connected with a first end (521) of the Y-shaped tube (52), and the rodless cavity (513) is used for accommodating electroplating additives. 如請求項5所述的微量電鍍添加劑自動補給控制方法,其中,該推進機構(3)包括一推進板(31)和一絲杆步進電機(32),該推進板(31)與該所述絲杆步進電機(32)的絲杆連接,該絲杆步進電機(33)與該控制器(2)信號連接,該推進板(31)的上端面設有一卡槽(331),該柱塞杆(512)的後部安裝在該卡槽(311)上。The automatic replenishment control method for trace electroplating additives according to claim 5, wherein the advancing mechanism (3) comprises a advancing plate (31) and a lead rod stepping motor (32), the advancing plate (31) is compatible with the The lead screw of the lead screw stepping motor (32) is connected with the lead screw stepping motor (33) in signal connection with the controller (2). The rear of the plunger rod (512) is mounted on the slot (311). 如請求項5所述的微量電鍍添加劑自動補給控制方法,其中,還包括一固定機構(4),該固定機構(4)位於該注射器(51)的下方,該固定機構(4)包括一第一固定座(41)、一第二固定座(42)及一第三固定座(43),該第一固定座(41)與該第二固定座(42)可拆卸連接,該第二固定座(42)與該第三固定座(43)可拆卸連接,該針筒(511)的中部架設在該第一固定座(41)、該第二固定座(42)或該第三固定座(43)上。The automatic replenishment control method for trace electroplating additives according to claim 5, further comprising a fixing mechanism (4), the fixing mechanism (4) being located below the syringe (51), the fixing mechanism (4) comprising a first A fixing seat (41), a second fixing seat (42) and a third fixing seat (43), the first fixing seat (41) and the second fixing seat (42) are detachably connected, the second fixing seat (42) The seat (42) is detachably connected to the third fixing seat (43), and the middle part of the needle cylinder (511) is erected on the first fixing seat (41), the second fixing seat (42) or the third fixing seat (43) on. 如請求項7所述的微量電鍍添加劑自動補給控制方法,其中,該第一固定座(41)上設有一第一容納槽(411),該第一容納槽(411)底部設有一第一安裝孔(412),該第一固定座(41)底面設有一第一安裝柱(413);該第二固定座(42)上設有一第二容納槽(421),該第二容納槽(421)底部設有一第二安裝孔(422),該第二固定座(42)底面設有一第二安裝柱(423);該第三固定座(43)上設有一第三容納槽(431),該第三容納槽(431)底部設有一第三安裝孔(432),該第三固定座(43)底面設有一第三安裝柱(433);當該第一固定座(41)與該第二固定座(42)連接時,該第一安裝柱(413)位於該第二安裝孔(422)內,且該第一固定座(41)位於該第二容納槽(421)內;當該第二固定座(42)與該第三固定座(43)連接時,該第二安裝柱(423)位於該第三安裝孔(432)內,且該第二固定座(41)位於該第三容納槽(431)內。The automatic replenishment control method for trace electroplating additives according to claim 7, wherein a first accommodating groove (411) is provided on the first fixing seat (41), and a first mounting groove (411) is provided at the bottom of the first accommodating groove (411). A hole (412), the bottom surface of the first fixing seat (41) is provided with a first mounting post (413); the second fixing seat (42) is provided with a second accommodating groove (421), the second accommodating groove (421) ) is provided with a second mounting hole (422) at the bottom, and a second mounting post (423) is provided on the bottom of the second fixing seat (42); A third mounting hole (432) is provided at the bottom of the third accommodating groove (431), and a third mounting post (433) is provided on the bottom of the third fixing seat (43); When the two fixing bases (42) are connected, the first mounting post (413) is located in the second mounting hole (422), and the first fixing base (41) is located in the second accommodating groove (421); When the second fixing seat (42) is connected with the third fixing seat (43), the second mounting post (423) is located in the third mounting hole (432), and the second fixing seat (41) is located in the third mounting hole (432) three accommodating grooves (431). 如請求項8所述的微量電鍍添加劑自動補給控制方法,其中,該第一固定座(41)的寬度為W1,該第一固定座(41)的長度為H1,該第二固定座(42)的寬度為W2,該第二固定座(42)的長度為H2,該第二容納槽(421)的寬度為d2,該第二容納槽(421)的長度為L2,該第三容納槽(431)的寬度為d3,該第二容納槽(421)的長度為L3,該寬度W1與所述寬度d2相匹配,該長度H1與所述長度L3相匹配,該寬度W2與所述寬度d3相匹配,該長度H2與所述長度L3相匹配。The automatic replenishment control method for trace electroplating additives according to claim 8, wherein the width of the first fixing seat (41) is W1, the length of the first fixing seat (41) is H1, and the second fixing seat (42) ) width is W2, the length of the second fixing seat (42) is H2, the width of the second accommodating groove (421) is d2, the length of the second accommodating groove (421) is L2, the third accommodating groove The width of (431) is d3, the length of the second accommodating groove (421) is L3, the width W1 matches the width d2, the length H1 matches the length L3, and the width W2 matches the width d3 matches, the length H2 matches the length L3.
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Publication number Priority date Publication date Assignee Title
CN202220213U (en) * 2011-09-21 2012-05-16 丰田合成(张家港)塑料制品有限公司 Time-based additive replenishment unit
CN103774179A (en) * 2014-01-28 2014-05-07 白银有色集团股份有限公司 Device and method for automatic control of additive in copper electrolysis production
TW201718953A (en) * 2015-07-17 2017-06-01 應用材料股份有限公司 Inert anode electroplating processor and replenisher

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN202220213U (en) * 2011-09-21 2012-05-16 丰田合成(张家港)塑料制品有限公司 Time-based additive replenishment unit
CN103774179A (en) * 2014-01-28 2014-05-07 白银有色集团股份有限公司 Device and method for automatic control of additive in copper electrolysis production
TW201718953A (en) * 2015-07-17 2017-06-01 應用材料股份有限公司 Inert anode electroplating processor and replenisher

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