TWI755567B - Denitrification device - Google Patents
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- TWI755567B TWI755567B TW107133111A TW107133111A TWI755567B TW I755567 B TWI755567 B TW I755567B TW 107133111 A TW107133111 A TW 107133111A TW 107133111 A TW107133111 A TW 107133111A TW I755567 B TWI755567 B TW I755567B
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- 239000007789 gas Substances 0.000 claims abstract description 156
- 239000003054 catalyst Substances 0.000 claims abstract description 62
- MWUXSHHQAYIFBG-UHFFFAOYSA-N nitrogen oxide Inorganic materials O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 claims abstract description 35
- 238000010586 diagram Methods 0.000 description 8
- 230000003068 static effect Effects 0.000 description 8
- 238000011144 upstream manufacturing Methods 0.000 description 6
- 230000000694 effects Effects 0.000 description 4
- 230000002411 adverse Effects 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000010248 power generation Methods 0.000 description 2
- 239000004020 conductor Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
- B01D53/86—Catalytic processes
- B01D53/88—Handling or mounting catalysts
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J35/00—Catalysts, in general, characterised by their form or physical properties
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- B01J35/30—
Abstract
本發明之目的係在於提供能夠減低壓損,並且可將從導管出口側流出之氣體的流速分佈均等化之脫硝裝置。用以解決課題之手段為,一種脫硝裝置,係具備有供氣體流入的導管及配置於導管內的脫硝反應器(23)之脫硝裝置(21),其特徵為,脫硝反應器(23)係具有複數個模組(4),該等模組具有與流入到導管內的氣體產生反應而將氣體中的氮氧化物去除之觸媒,複數個模組(4)係配置成打褶狀,在複數個模組(4)的出口側之面,以與氣體的流動的方向成為平行的方式,配置有複數個整流板(27),複數個整流板是不會與複數個模組(4)接觸。An object of the present invention is to provide a denitration device capable of reducing pressure loss and equalizing the flow velocity distribution of the gas flowing out from the outlet side of the duct. A means for solving the problem is a denitration device (21) including a duct through which gas flows and a denitration reactor (23) arranged in the duct, characterized in that the denitration reactor is (23) is provided with a plurality of modules (4), the modules have catalysts that react with the gas flowing into the conduit to remove nitrogen oxides in the gas, and the plurality of modules (4) are arranged such that In a pleated shape, a plurality of rectifier plates (27) are arranged on the surface of the outlet side of the plurality of modules (4) so as to be parallel to the flow direction of the gas. Module (4) contacts.
Description
本發明係關於適用於例如廢氣處理裝置之脫硝裝置。The present invention relates to a denitration device suitable for use in, for example, an exhaust gas treatment device.
例如在GTCC(Gas Turbine Combined Cycle)複合發電設備等之發電設備,作為從廢氣中去除氮氧化物(NOx)之裝置,採用脫硝裝置。近年,在脫硝裝置,為了廠房效率的提升、競爭力的強化等,被要求具有用於脫硝的觸媒之模組(觸媒模組)之低壓損化。For example, in power generation equipment such as GTCC (Gas Turbined Combined Cycle) complex power generation equipment, a denitration device is used as a device for removing nitrogen oxides (NOx) from exhaust gas. In recent years, in order to improve plant efficiency, strengthen competitiveness, etc., in denitrification equipment, it is required to have low pressure loss reduction of catalyst modules (catalyst modules) used for denitration.
以往以來,作為觸媒模組,採用蜂巢構造者,但,在作成蜂巢構造之情況,需要多數的晶格數。因此,為了使模組低壓損化,如專利文獻1、2揭示有將模組配置成打褶狀之脫硝反應器。在將模組配置成打褶狀之情況,需要將長度縮短,但可謀求通過模組之器體的流速減低,因此,可減低壓損。
[先行技術文獻]
[專利文獻]Conventionally, a honeycomb structure has been used as a catalyst module. However, when a honeycomb structure is formed, a large number of cells is required. Therefore, in order to reduce the low pressure loss of the module, as in
[專利文獻1]國際公開第2016/019050號 [專利文獻2]日本特開2006-122873號公報[Patent Document 1] International Publication No. 2016/019050 [Patent Document 2] Japanese Patent Laid-Open No. 2006-122873
[發明所欲解決之課題][The problem to be solved by the invention]
圖3係顯示專利文獻1、2所記載將模組配置成打褶狀之脫硝反應器的斜視圖,詳細地說明關於通過脫硝反應器之氣體的流動方式。在如圖3所示的脫硝反應器103,複數個模組104在框體110內配置成打褶狀(皺褶狀)。在此脫硝反應器103,氣體是以圖3中的箭號方向所示流入至脫硝反應器103。3 is a perspective view showing the denitration reactors described in
其次,圖4係顯示通過圖3中以斜線所示的模組之氣體的流動方向之示意圖。圖4中的實線之箭號係顯示氣體的流動方向,圖4中的波浪線之箭號係顯示通過模組104內之氣體的流動方向。如圖4所示,模組104係從與氣體的流動的方向垂直之軸傾斜角度δ(0°<δ<90°)。因此,已經流入到脫硝反應器103之氣體係圖4的波浪線之箭號所示,在模組104內以傾斜了角度δ的方式通過。Next, FIG. 4 is a schematic diagram showing the flow direction of the gas through the module shown by the oblique lines in FIG. 3 . The arrows with solid lines in FIG. 4 show the flow direction of the gas, and the arrows with wavy lines in FIG. 4 show the flow direction of the gas through the
在此,圖5係顯示調查流動於圖3的脫硝反應器之氣體的流速分佈之結果的圖。如圖5所示,關於配置成打褶狀之模組,在從箭號P的方向觀看之情況時的正前方側(打褶之山峰側),通過了模組之氣體變得較稀疏,流速相對地變低。另外,在從箭號P的方向觀看之情況時的深部側(打褶之山谷側),通過了模組之氣體變得較密,流速相對地變高。因此,可得知在通過了脫硝反應器之氣體,因應配置成打褶狀之模組的配置狀況,會產生打褶型的流速之參差不齊。Here, FIG. 5 is a graph showing the results of investigating the flow velocity distribution of the gas flowing in the denitration reactor of FIG. 3 . As shown in FIG. 5, regarding the module arranged in a pleated shape, when viewed from the direction of the arrow P, the gas passing through the module becomes sparser on the front side (the side of the pleated mountain), The flow rate becomes relatively low. In addition, when viewed from the direction of the arrow P, on the deep side (the valley side of the pleats), the gas passing through the module becomes denser, and the flow velocity becomes relatively high. Therefore, it can be seen that in the gas passing through the denitration reactor, the flow rate of the pleated type varies according to the arrangement of the modules arranged in the pleated shape.
圖6係顯示將在圖5所獲得的氣體流速分佈與無因次位置之關係的圖表。在圖6中,縱軸係顯示氣體的垂直方向速度(m/s),橫軸係顯示無因次位置。從圖6亦可得知,若氣體通過如圖3所示的這種脫硝反應器反應器103的話,則在通過之氣體上會產生打褶型的流速之參差不齊。這樣的氣體流速之參差不齊,會有造成對下游機器產生壞影響(例如,傳熱管的傳熱性能因場所改變等)之情況。FIG. 6 is a graph showing the relationship of the gas flow velocity distribution obtained in FIG. 5 to the dimensionless position. In FIG. 6, the vertical axis shows the vertical velocity (m/s) of the gas, and the horizontal axis shows the dimensionless position. It can also be known from FIG. 6 that if the gas passes through the
圖12係以等高線顯示在圖3中的斜線所示的模組附近之氣體的流速之圖。圖12中的箭號係顯示氣體流入的方向(在後述的圖14也相同)。如圖12箭號所顯示的區域A所示,可得知當從導管的出口側觀看時,在複數個模組104之打褶的山谷側,氣體的流動會集中,因此氣體的流速會變大。FIG. 12 is a graph showing the flow velocity of the gas in the vicinity of the module shown by the oblique lines in FIG. 3 as contour lines. The arrows in FIG. 12 indicate the direction in which the gas flows (the same applies to FIG. 14 described later). As shown by the area A indicated by the arrow in FIG. 12 , it can be seen that when viewed from the outlet side of the conduit, the flow of the gas is concentrated on the valley side of the pleats of the plurality of
圖13係顯示圖12中的a地點到b地點之模組104內的氣體的流速分佈與無因次觸媒寬度方向的關係之圖表。在圖13,縱軸係顯示模組(觸媒)104內之氣體的流速(m/s),橫軸係顯示無因次觸媒寬度方向,以開口部(圖12中的a地點)設為0、以頂點部(圖12中的b地點)設為1。如圖13所示,在模組104的開口部附近,因氣體的流速小,所以,在此,可判斷為充分地進行氣體的脫硝。FIG. 13 is a graph showing the relationship between the flow velocity distribution of the gas in the
另外可得知,隨著從模組104的開口部朝向頂點部,氣體的流速逐漸地變大,在模組104的頂點部附近,氣體的流速變得最大。具體而言,模組104的開口部附近之氣體的流速與頂點部附近之氣體的流速之差為大約2.75m/s。在模組104的頂點部附近,由於通過模組104內的氣體之量也變多,故,在此,未充分地進行氣體的脫硝,可判斷為脫硝效率低。In addition, it can be seen that the flow velocity of the gas gradually increases from the opening of the
圖14係以等高線顯示在圖3中的斜線所示的模組附近之靜壓的圖。如圖14中的區域B所示,可得知在模組104之導管的出口側之面的附近,產生從導管的入口側朝向出口側之壓力梯度。FIG. 14 is a graph showing the static pressure in the vicinity of the module shown by the oblique lines in FIG. 3 as contour lines. As shown in area B in FIG. 14 , it can be seen that in the vicinity of the surface of the outlet side of the conduit of the
如此,在使用前述專利文獻1、2這種將模組配置成打褶狀之脫硝反應器的情況,雖可減低壓損,但在導管的下游側會產生流速的參差不齊,故,會有對傳熱管等的下游機器造成壞影響之情況。因前述流速之參差不齊,會有引起局部脫硝效率降低之情況產生。As described above, in the case of using the denitration reactors in which the modules are arranged in a pleated shape, such as the
本發明係有鑑於這樣的情事而開發完成的發明,其目的係在於提供能夠減低壓損,並且可將從導管出口側流出之氣體的流速分佈均等化之脫硝裝置。 [用以解決課題之手段]The present invention has been developed in view of such a situation, and an object thereof is to provide a denitration device capable of reducing pressure loss and equalizing the flow velocity distribution of the gas flowing out from the outlet side of the duct. [means to solve the problem]
為了解決前述課題,本發明的脫硝裝置係採用以下的手段。 本發明的若干個實施形態之脫硝裝置,係具備有:供氣體流入的導管;及配置於該導管內的脫硝反應器,前述脫硝反應器係具有複數個模組,該等模組係具有與流入到前述導管內的前述氣體產生反應而將前述氣體中的氮氧化物去除之觸媒,該複數個模組係配置成打褶狀,在前述複數個模組之間,於流入到前述導管內的前述氣體的流動的方向,複數個阻抗體以相互平行的方式進行等間隔配置。In order to solve the said subject, the denitration apparatus of this invention employs the following means. The denitration device according to some embodiments of the present invention is provided with: a conduit for gas to flow in; and a denitration reactor arranged in the conduit, the denitration reactor has a plurality of modules, and these modules It has a catalyst that reacts with the gas flowing into the conduit to remove nitrogen oxides in the gas, the plurality of modules are arranged in a pleated shape, and between the plurality of modules, the inflow In the direction of the flow of the gas in the conduit, a plurality of impedance bodies are arranged at equal intervals so as to be parallel to each other.
在本發明的若干個實施形態之脫硝裝置,由於脫硝反應器之具有觸媒的模組成為打褶狀之構造,故,可使氣體與觸媒之反應面積增加,並且可減低通過脫硝反應器之氣體的流速。藉此,可減低壓損。藉由在模組之間,阻抗體以相互平行的方式進行等間隔配置,能夠對流入到導管內的氣體負荷壓損,藉此,能夠使從導管出口側流出的氣體的流速分佈均等化。因此,可抑制傳熱管的傳熱性能因場所而改變等造成對下游機器之影響。In the denitration device of some embodiments of the present invention, since the module having the catalyst of the denitration reactor has a pleated structure, the reaction area between the gas and the catalyst can be increased, and the reduction of the gas through the denitration reactor can be reduced. The flow rate of the gas in the nitrile reactor. Thereby, the pressure loss can be reduced. By arranging the impedance bodies at equal intervals so as to be parallel to each other between the modules, pressure loss can be applied to the gas flowing into the duct, thereby making it possible to equalize the flow velocity distribution of the gas flowing out of the duct outlet side. Therefore, it is possible to suppress the influence on downstream equipment due to the change of the heat transfer performance of the heat transfer pipe depending on the location.
本發明的若干個實施形態之脫硝裝置,係具備有:供氣體流入的導管;及配置於該導管內的脫硝反應器,前述脫硝反應器係具有複數個模組,該等模組係具有與流入到前述導管內的前述氣體產生反應而將前述氣體中的氮氧化物去除之觸媒,該複數個模組係對流入到前述導管內的前述氣體之流動的方向傾斜、且相互平行地配置,在前述複數個模組之間,於流入到前述導體內的前述氣體的流動的方向,複數個阻抗體以相互平行的方式進行等間隔配置。The denitration device according to some embodiments of the present invention is provided with: a conduit for gas to flow in; and a denitration reactor arranged in the conduit, the denitration reactor has a plurality of modules, and these modules It has a catalyst that reacts with the gas flowing into the duct to remove nitrogen oxides in the gas, and the plurality of modules are inclined to the direction of the flow of the gas flowing into the duct and mutually In parallel arrangement, between the plurality of modules, in the direction of the flow of the gas flowing into the conductor, a plurality of impedance bodies are arranged at equal intervals so as to be parallel to each other.
在本發明的若干個實施形態之脫硝裝置,由於脫硝反應器具有複數個模組,該等模組係為對流入到導管內的氣體之流動的方向傾斜、且相互平行地配置的構造(半打褶狀的構造),故,可使氣體與觸媒之反應面積增加,並且可減低通過脫硝反應器之氣體的流速。藉此,可減低壓損。藉由在模組之間,阻抗體以相互平行的方式進行等間隔配置,能夠對流入到導管內的氣體負荷壓損,藉此,能夠使從導管出口側流出的氣體的流速分佈均等化。因此,可抑制傳熱管的傳熱性能因場所而改變等造成對下游機器之影響。In the denitration apparatus according to some embodiments of the present invention, since the denitration reactor has a plurality of modules, the modules are configured to be inclined with respect to the flow direction of the gas flowing into the duct and arranged in parallel to each other. (semi-pleated structure), therefore, the reaction area between the gas and the catalyst can be increased, and the flow rate of the gas passing through the denitration reactor can be reduced. Thereby, the pressure loss can be reduced. By arranging the impedance bodies at equal intervals so as to be parallel to each other between the modules, pressure loss can be applied to the gas flowing into the duct, thereby making it possible to equalize the flow velocity distribution of the gas flowing out of the duct outlet side. Therefore, it is possible to suppress the influence on downstream equipment due to the change of the heat transfer performance of the heat transfer pipe depending on the location.
在前述脫硝裝置,前述阻抗體係為具有前述觸媒之觸媒薄片,且,前述模組係較前述阻抗體更緊密地具有前述觸媒者為佳。In the aforementioned denitration device, the aforementioned impedance system is a catalyst sheet having the aforementioned catalyst, and the aforementioned module preferably includes the aforementioned catalyst more closely than the aforementioned impedance body.
若阻抗體為觸媒薄片的話,藉由阻抗體也能去除氣體中的氮氧化物,因此,可使流入至導管內的氣體之脫硝效率提升。若模組為較阻抗體更緊密地具有觸媒者的話,可充分地確保與流入到導管內的氣體之反應面積,因此,可使氣體的脫硝效率進一步提升,並且亦可充分地減低壓損。If the resistance body is a catalyst sheet, nitrogen oxides in the gas can also be removed by the resistance body, so that the denitration efficiency of the gas flowing into the conduit can be improved. If the module has a catalyst closer than the impedance body, the reaction area with the gas flowing into the conduit can be sufficiently secured, so the denitration efficiency of the gas can be further improved, and the pressure can also be sufficiently reduced damage.
在前述脫硝裝置,前述阻抗體係不具有前述觸媒之薄片為佳。In the above-mentioned denitration device, it is preferable that the above-mentioned impedance system does not have the above-mentioned flakes of the above-mentioned catalyst.
在本發明的若干個實施形態,阻抗體亦可為不具有觸媒之薄片,例如可使用濾過器、金屬製的整流薄片等作為本發明之阻抗體。在本發明的若干個實施形態,如此能夠使用不具有觸媒之薄片作為阻抗體,藉此,可減低壓損,並且可使從導管出口側流入之氣體的流速分佈均等化。In some embodiments of the present invention, the impedance body may be a sheet without a catalyst, for example, a filter, a metal rectifier sheet, etc. can be used as the impedance body of the present invention. In some embodiments of the present invention, a sheet without a catalyst can be used as an impedance body, thereby reducing pressure loss and equalizing the flow velocity distribution of the gas flowing in from the outlet side of the duct.
在前述脫硝裝置,於一部分的前述複數個模組之間,未配置有前述阻抗體為佳。In the above-mentioned denitration device, it is preferable that the above-mentioned impedance body is not arranged between a part of the above-mentioned plural modules.
在本發明的若干個實施形態之脫硝裝置,即使在一部分的模組間,未配置有阻抗體之情況,也能夠將從導管出口側流出的氣體的流速分佈充分地均等化。由於亦可在一部分的模組間不配置阻抗體,故,能夠減低成本。In the denitration apparatuses according to some embodiments of the present invention, even if the resistive body is not arranged between some modules, the flow velocity distribution of the gas flowing out from the outlet side of the duct can be sufficiently equalized. Since the impedance body may not be arranged between some modules, the cost can be reduced.
又,本發明的若干個實施形態之脫硝裝置,係具備有:供氣體流入的導管;及配置於該導管內的脫硝反應器的脫硝裝置,其特徵為,前述脫硝反應器係具有複數個模組,該等模組係具有與已經流入到前述導管內的前述氣體產生反應而將前述氣體中的氮氧化物去除之觸媒,該複數個模組係配置成打褶狀,在前述複數個模組的前述導管之出口側之面,以與前述氣體的流動的方向呈平行的方式,將複數個整流板配置成不會與前述複數個模組接觸。Further, a denitration apparatus according to some embodiments of the present invention is a denitration apparatus including: a conduit into which gas flows; and a denitration reactor arranged in the conduit, wherein the denitration reactor is a There are a plurality of modules, the modules have catalysts that react with the gas that has flowed into the conduit to remove nitrogen oxides in the gas, and the modules are arranged in a pleated shape, On the surface of the outlet side of the conduit of the plurality of modules, the plurality of rectifier plates are arranged so as to be parallel to the flow direction of the gas so as not to come into contact with the plurality of modules.
在本發明的若干個實施形態之脫硝裝置,藉由使脫硝反應器之具有觸媒的模組成為打褶狀之構造,故,可使氣體與觸媒之反應面積增加,並且可減低通過脫硝反應器之氣體的流速。藉此,可減低壓損。在模組的出口側之面,藉由以與氣體的流動的方向呈平行的方式配置複數個整流板,可使模組的出口側之氣體的流速均等化。藉此,可使模組的出口側之靜壓均等化。藉由將複數個整流板配置成不會與複數個模組接觸,亦即,在各整流板的上游端與各模組之間形成間隙,使得能夠防止在整流板與模組之接點附近,局部地減少在模組內之氣體的流速而引發流速不平衡。因此,可將脫硝裝置內的氣體的流速均等化,故,可使脫硝效率提升。In the denitration device of some embodiments of the present invention, by making the module having the catalyst in the denitration reactor a pleated structure, the reaction area between the gas and the catalyst can be increased, and the reaction area of the catalyst can be reduced. The flow rate of the gas through the denitration reactor. Thereby, the pressure loss can be reduced. On the surface of the outlet side of the module, the flow velocity of the gas on the outlet side of the module can be equalized by arranging a plurality of rectifier plates in parallel with the direction of the gas flow. Thereby, the static pressure on the outlet side of the module can be equalized. By arranging the plurality of rectifier plates so as not to come into contact with the plurality of modules, that is, by forming a gap between the upstream end of each rectifier plate and each module, it is possible to prevent the rectifier plate and the module from coming into contact near the junction. , locally reducing the flow rate of the gas in the module and causing flow rate imbalance. Therefore, since the flow velocity of the gas in the denitration device can be equalized, the denitration efficiency can be improved.
在前述脫硝裝置,於前述複數個模組之前述導管的入口側之端部,設有朝前述導管的入口側突出之葉片為佳。In the denitration device, it is preferable that a blade protruding toward the inlet side of the duct is provided at the end portion on the inlet side of the duct of the plurality of modules.
若設有前述這樣的葉片的話,能夠將流入到導管內的氣體誘導至配置成打褶狀的模組之導管的入口側之開口部。藉此,在模組之導管的入口側的端部附近,可緩和模組內的氣體的流速降低。藉此,能夠使脫硝效率進一步提升。If such a blade is provided, the gas flowing into the duct can be guided to the opening on the inlet side of the duct of the pleated module. Thereby, in the vicinity of the end portion on the inlet side of the conduit of the module, the decrease in the flow velocity of the gas in the module can be alleviated. Thereby, the denitration efficiency can be further improved.
在前述脫硝裝置,前述葉片的形狀係彎曲成朝前述導管的入口側成為凸狀之圓弧狀、或朝前述氣體的上游側突出且其寬度變窄之V字狀。In the denitration device, the blade is curved in an arc shape that is convex toward the inlet side of the duct, or a V shape that protrudes toward the upstream side of the gas and narrows in width.
如此,在本發明的若干個實施形態之脫硝裝置,可將葉片的形狀作成為例如前述這樣的圓弧狀、V字狀等的形狀。 [發明效果]In this way, in the denitration apparatus according to some embodiments of the present invention, the shape of the blade can be made into a shape such as an arc shape, a V shape, or the like as described above. [Inventive effect]
若依據本發明的脫硝裝置,能夠減低壓損,並且可將從導管出口側流出之氣體的流速分佈均等化。According to the denitration device of the present invention, the pressure loss can be reduced, and the flow velocity distribution of the gas flowing out from the outlet side of the duct can be equalized.
以下,參照圖面說明關於本發明的脫硝裝置之一實施形態。Hereinafter, one embodiment of the denitration apparatus according to the present invention will be described with reference to the drawings.
以下,使用圖1說明關於本發明的第1實施形態。
如圖1所示的脫硝裝置1係具備有:供氣體流入的導管2;及配置於導管2內的脫硝反應器3。圖1中的箭號係顯示氣體流入的方向。Hereinafter, the first embodiment of the present invention will be described with reference to FIG. 1 .
The
脫硝反應器3係具有複數個模組4,該等模組係具有與已經流入到導管2內的氣體產生反應而將氣體中的氮氧化物去除之觸媒,複數個模組4係配置成打褶狀(配置成曲折狀)。複數個模組4係形成有打褶入口面41及打褶出口面42,藉由複數個模組4的內部隔壁所劃定的氣體通路係從打褶入口面41延伸至打褶出口面42。打褶入口面41與脫硝反應器3的入口面43係形成有角度δ(0°<δ<90°)。在本實施形態,如圖1所示,作為一例,顯示打褶入口面41與打褶出口面42成為平行之模組4。如此,由於脫硝反應器3之具有觸媒的模組4成為打褶狀之構造,故,可使氣體與觸媒之反應面積增加,並且可減低通過脫硝反應器3之氣體的流速。藉此,可減低壓損。The
在複數個模組4之間,於流入到導管2的氣體流動之方向,複數個阻抗體5以相互平行的方式進行等間隔配置。如此,藉由在模組4之間,阻抗體5以相互平行的方式進行等間隔配置,能夠對流入到導管2內的氣體負荷壓損,藉此,能夠使從導管2出口側流出的氣體的流速分佈均等化。因此,可抑制傳熱管的傳熱性能因場所而改變等造成對下游機器之影響。Between the plurality of
將複數個模組4,如圖1所示,配置成打褶狀之情況,阻抗體5作成三角形的形狀為佳。藉由將阻抗體5作成三角形之形狀,可在脫硝反應器3之上游側與下游側,將阻抗體5對稱地配置。藉此,當氣體已經通過了脫硝反應器3時,可使各流路之壓損作成相等。When the plurality of
阻抗體5係為具有前述觸媒之觸媒薄片,且,模組4係較阻抗體5更緊密地具有觸媒者為佳。若阻抗體5為觸媒薄片的話,藉由阻抗體5也能去除氣體中的氮氧化物,因此,可使流入至導管2內的氣體之脫硝效率提升。若模組4為較阻抗體5更緊密地具有觸媒者的話,可充分地確保與流入到導管2內的氣體之反應面積,因此,可使氣體的脫硝效率進一步提升,並且亦可充分地減低壓損。The
阻抗體5亦可為不具有觸媒之薄片。在本實施形態,阻抗體5亦可為不具有觸媒之薄片,例如可使用濾過器、金屬製的整流薄片等作為本實施形態之阻抗體5。尤其是若阻抗體5為三角形的形狀且不具有觸媒之薄片的話,也容易進行製造。The
在本實施形態,如此,能夠使用不具有觸媒之薄片作為阻抗體5,藉此,可減低壓損,並且可使從導管2出口側流入之氣體的流速分佈均等化。In the present embodiment, a sheet without a catalyst can be used as the
於一部分的複數個模組4之間,未配置有阻抗體5為佳。在本實施形態之脫硝裝置1,即使在一部分的模組4間,未配置有阻抗體5之情況,也能夠將從導管2出口側流出的氣體的流速分佈充分地均等化。由於亦可在一部分的模組4間不配置阻抗體5,故,能夠減低成本。It is preferable that the
圖1中的符號6係顯示以往的板狀觸媒之配置空間。在本實施形態,從圖1可知,比起以往的板狀觸媒,可將脫硝反應器3更佳省空間化。
如以上所述,若依據本實施形態的脫硝裝置的話,能夠減低壓損,並且可將從導管出口側流出之氣體的流速分佈均等化。As described above, according to the denitration apparatus of the present embodiment, the pressure loss can be reduced, and the flow velocity distribution of the gas flowing out from the outlet side of the duct can be equalized.
其次,使用圖2說明關於本發明的第2實施形態。
針對與第1實施形態之圖1相同者,在圖2中,以相同的符號表示,對於與第1實施形態相同的結構,省略一部分說明。
如圖2所示的脫硝裝置11係具備有:供氣體流入的導管2;及配置於導管2內的脫硝反應器13。圖2中的箭號係顯示氣體流入的方向。Next, a second embodiment of the present invention will be described with reference to FIG. 2 .
The same parts as those in FIG. 1 of the first embodiment are denoted by the same reference numerals in FIG. 2 , and a part of the descriptions of the same structures as those of the first embodiment are omitted.
The
脫硝反應器13係具有複數個模組14,該等模組係具有與已經流入到導管2內的氣體產生反應而將氣體中的氮氧化物去除之觸媒,複數個模組14係對流入到導管2內的氣體之流動的方向傾斜且相互平行地配置。如此,複數個模組14係為對流入到導管2內的氣體之流動的方向傾斜、且相互平行地配置的構造(半打褶狀的構造),故,可使氣體與觸媒之反應面積增加,並且可減低通過脫硝反應器13之氣體的流速。藉此,可減低壓損。The
在複數個模組14之間,於流入到導管2的氣體流動之方向,複數個阻抗體15以相互平行的方式進行等間隔配置。如此,藉由在模組14之間,阻抗體15以相互平行的方式進行等間隔配置,能夠對流入到導管2內的氣體負荷壓損,藉此,能夠使從導管2出口側流出的氣體的流速分佈均等化。因此,可抑制傳熱管的傳熱性能因場所而改變等造成對下游機器之影響。Between the plurality of
將複數個模組14,如圖2所示,配置成半打褶狀之情況,作為阻抗體15的形狀,例如在脫硝反應器13的兩端之部分作成三角形,在脫硝反應器13的兩端以外的部分,作成平行四邊形為佳。藉此,當氣體已經通過了脫硝反應器13時,可使各流路之壓損作成相等。When the plurality of
與第1實施形態同樣地,阻抗體15係為具有觸媒之觸媒薄片,且,模組14係較阻抗體15更緊密地具有觸媒者為佳。阻抗體15亦可為不具有觸媒之薄片。Similar to the first embodiment, the
與第1實施形態同樣地,於一部分的複數個模組14之間,未配置有阻抗體15為佳。Like the first embodiment, it is preferable that the
圖2中的符號6係顯示以往的板狀觸媒之配置空間。在本實施形態,從圖2可知,比起以往的板狀觸媒,可將脫硝反應器13更佳省空間化。
如以上所述,若依據本實施形態的脫硝裝置的話,能夠減低壓損,並且可將從導管出口側流出之氣體的流速分佈均等化。As described above, according to the denitration apparatus of the present embodiment, the pressure loss can be reduced, and the flow velocity distribution of the gas flowing out from the outlet side of the duct can be equalized.
其次,使用圖7A~7C說明關於本發明的第3實施形態。 針對與第1實施形態之圖1相同者,在圖7A~7C中,以相同的符號表示,對於與第1實施形態相同的結構,省略一部分說明。 圖7A~7C係顯示本實施形態之脫硝裝置的圖,圖7A為脫硝反應器的斜視圖,圖7B為顯示脫硝裝置的一部分之斷面圖,圖7C為將圖7B中的虛線之四個角落所包圍的部分放大之斷面圖。圖7A中的箭號係顯示氣體流入的方向。Next, a third embodiment of the present invention will be described with reference to FIGS. 7A to 7C . 7A to 7C , which are the same as those in FIG. 1 of the first embodiment, are denoted by the same reference numerals, and a part of the description of the same configuration as that of the first embodiment is omitted. 7A to 7C are diagrams showing the denitration apparatus of the present embodiment, FIG. 7A is a perspective view of the denitration reactor, FIG. 7B is a cross-sectional view showing a part of the denitration apparatus, and FIG. 7C is a dashed line in FIG. 7B . An enlarged cross-sectional view of the part surrounded by the four corners. The arrows in Figure 7A show the direction of gas inflow.
在如圖7A、7B所示,在本實施形態之脫硝裝置21,脫硝反應器23係具備有複數個模組4,其配置成打褶狀。在複數個模組4之導管的出口側之面,以與氣體的流動之方向呈平行的方式,複數個整流板27經由未圖示的框架配置成不與複數個模組4接觸,亦即,在各整流板27的上游端與各模組4之間形成間隙。特別是配置在氣體的流動的方向之最下游側的整流板27係配置成其下游側的端部較模組4的下游側之端部更朝下游側突出。As shown in FIGS. 7A and 7B , in the
在此,如圖7C所示,在將模組4的板厚方向之厚度設為t之情況,以整流板27與模組4的最短距離成為0.2t的方式,分別配置複數個整流板27。在將從複數個模組4的開口部到頂點部的距離設為l之情況,配置於氣體的流動的方向之最下游側的整流板27係配置成其下游側的端部較模組4的下游側之端部更朝下游側突出0.0831。Here, as shown in FIG. 7C , when the thickness of the
在複數個模組4之前述導管的入口側之端部,設有朝導管的入口側突出之複數個葉片28。此葉片28之形狀係彎曲成朝導管的入口側成為凸狀之圓弧狀。A plurality of
其次,具體地說明關於如圖8至圖10所示,使用圖7B的脫硝裝置21進行脫硝之情況時之對氣體的流速、靜壓等的影響。
圖8係以等高線顯示使氣體流入到圖7B的脫硝裝置之氣體的流速之圖。圖8中的箭號係顯示氣體流入的方向(在後述的圖10也相同)。如圖8中的箭號所顯示的區域A’所示,可得知當從導管的出口側觀看時,在複數個模組4之打褶的山谷側,氣體的流動集中被削除,因此可使氣體的流速之參差不齊變小。Next, as shown in FIGS. 8 to 10 , the influence on the flow velocity, static pressure, etc. of the gas when denitration is performed using the
圖9係顯示圖8中的a’地點到b’地點之模組4內的氣體的流速分佈與無因次觸媒寬度方向的關係之圖表。在圖9,縱軸係顯示模組(觸媒)4內之氣體的流速(m/s),橫軸係顯示無因次觸媒寬度方向,以開口部(圖8中的a’地點)設為0、以頂點部(圖8中的b’地點)設為1。Fig. 9 is a graph showing the relationship between the flow velocity distribution of the gas in the
如圖9所示,與圖13相比較可得知,在從模組4的開口部到頂點部,氣體的流速之變化變小。模組4的開口部附近之氣體的流速和頂點部附近之氣體的流速之差,大約1.5m/s,因此,從此情事亦可得知,在模組4內,從開口部到頂點部,氣體的流速之參差不齊變小。因此,由於模組4內之氣體的流速全體變得均等,故,可判斷為在模組4全體,使氣體的脫硝效率提升。As shown in FIG. 9 , as compared with FIG. 13 , it can be seen that the change in the flow velocity of the gas becomes smaller from the opening portion of the
圖10係以等高線顯示使氣體流入到圖7B的脫硝裝置的情況之靜壓之圖。如圖10中所示的區域B’所示,可得知在模組4之導管的出口側之面的附近,產生從導管的入口側朝向出口側之壓力梯度。亦即,可得知在模組4之導管的出口側之靜壓被均等化。FIG. 10 is a diagram showing the static pressure of the case where the gas is allowed to flow into the denitration device of FIG. 7B by contour lines. As shown in the area B' shown in FIG. 10, it can be seen that a pressure gradient from the inlet side of the duct toward the outlet side is generated in the vicinity of the surface of the outlet side of the duct of the
依據以上的說明,若藉由本實施形態的話,可達到以下的作用效果。
在本實施形態之脫硝裝置21,由於脫硝反應器23之具有觸媒的模組4成為打褶狀之構造,故,可使氣體與觸媒之反應面積增加,並且可減低通過脫硝反應器23之氣體的流速。藉此,可減低壓損。在模組4的出口側之面,藉由以與氣體的流動的方向呈平行的方式配置複數個整流板27,可使模組4的出口側之氣體的流速均等化。藉此,可使模組4的出口側之靜壓均等化。藉由將複數個整流板27配置成不會與複數個模組接觸4,亦即,在各整流板27的上游端與各模組4之間形成間隙,使得能夠防止在整流板27與模組4之接點附近,局部地減少在模組4內之氣體的流速而引發流速不平衡。因此,可將脫硝裝置21內的氣體的流速均等化,故,可使脫硝效率提升。According to the above description, according to this embodiment, the following effects can be achieved.
In the
若設有葉片28的話,能夠將流入到導管內的氣體誘導至配置成打褶狀的模組4之導管的入口側之開口部。藉此,在模組4之導管的入口側的端部附近,可緩和模組4內的氣體的流速降低。藉此,能夠使脫硝效率進一步提升。If the
如本實施形態所示,可將葉片28的形狀作成為例如前述這樣的圓弧狀的形狀。As shown in the present embodiment, the shape of the
在本實施形態,整流板27係配置成其端部較模組4的下游側之端部更朝下游側突出。藉此,在模組4的頂點部,可抑制氣體的流速變得極大。In the present embodiment, the rectifying
在本實施形態,以將整流板27與模組4之最短距離設為0.2t之情況為例進行了說明,但,不限於此。理想為將整流板27與模組4之最短距離設定為0.1t~1.0t的範圍。In the present embodiment, the case where the shortest distance between the
在本實施形態,以整流板27的下游側之端部較模組4的下游側之端部更朝下游側突出0.083l為例進行了說明,但,不限於此。理想為整流板27的下游側之端部係設定成較模組4的下游側之端部更朝下游側突出0.01l~0.2l的範圍。In the present embodiment, the case where the downstream end portion of the rectifying
其次,使用圖11說明關於本發明的第4實施形態。
本實施形態的基本結構,基本上是與第3實施形態相同,與第3實施形態之不同處為,設有V字狀的形狀之葉片38取代圓弧狀的形狀之葉片28。因此,在本實施形態,僅針對此不同的部分進行說明,關於其他重複的部分在此省略說明。
針對與第1實施形態相同的構成要件,賦予相同符號並省略其重複的說明。Next, a fourth embodiment of the present invention will be described with reference to FIG. 11 .
The basic structure of this embodiment is basically the same as that of the third embodiment, and the difference from the third embodiment is that a V-shaped
圖11係顯示本實施形態之脫硝裝置的一部分之斷面圖。
如圖11所示,在本實施形態之脫硝裝置31所具備的脫硝反應器33,設有朝氣體的上游側突出且其寬度變窄之V字狀的形狀之葉片38(一部分未圖示)。Fig. 11 is a cross-sectional view showing a part of the denitration apparatus of the present embodiment.
As shown in FIG. 11 , the
依據以上的說明,若藉由本實施形態的話,可達到以下的作用效果。
如本實施形態所示,可將葉片38的形狀作成為例如前述這樣的V字狀的形狀。若為前述這樣的V字狀之葉片38的話,僅配置直線狀的板,即可設計葉片38,因此容易進行設計。According to the above description, according to this embodiment, the following effects can be achieved.
As shown in the present embodiment, the shape of the
1、11、21、31‧‧‧脫硝裝置
2‧‧‧導管
3、13、23、33、103‧‧‧脫硝反應器
4、14、104‧‧‧模組
5、15‧‧‧阻抗體
6‧‧‧以往的板狀觸媒之配置空間
27‧‧‧整流板
28、38‧‧‧葉片
41‧‧‧打褶入口面
42‧‧‧打褶出口面
43‧‧‧(脫硝反應器的)入口面
110‧‧‧框體
δ‧‧‧角度
P‧‧‧箭號1, 11, 21, 31‧‧‧
圖1係顯示本發明的第1實施形態之脫硝裝置的斷面圖。 圖2係顯示本發明的第2實施形態之脫硝裝置的斷面圖。 圖3係顯示將模組配置成打褶狀之脫硝反應器的斜視圖。 圖4係顯示通過圖3中以斜線所示的模組之氣體的流動方向之示意圖。 圖5係顯示調查流動於圖3的脫硝反應器之氣體的流速分佈之結果的圖。 圖6係顯示將在圖5所獲得的氣體的流速分佈與無因次位置之關係的圖表。 圖7A係顯示本發明的第3實施形態之脫硝裝置的圖,為脫硝反應器的斜視圖。 圖7B係顯示本發明的第3實施形態之脫硝裝置的圖,為顯示脫硝裝置的一部分之斷面圖。 圖7C係顯示本發明的第3實施形態之脫硝裝置的圖,為將圖7B中的虛線之四個角落所包圍的部分放大之斷面圖。 圖8係以等高線顯示使氣體流入到圖7B的脫硝裝置之氣體的流速之圖。 圖9係顯示圖8中的a’地點到b’地點之模組內的氣體的流速分佈與無因次觸媒寬度方向的關係之圖表。 圖10係以等高線顯示使氣體流入到圖7B的脫硝裝置的情況之靜壓之圖。 圖11係顯示本發明的第4實施形態之脫硝裝置的一部分之斷面圖。 圖12係以等高線顯示在圖3中的斜線所示的模組附近之氣體的流速之圖。 圖13係顯示圖12中的a地點到b地點之模組內的氣體的流速分佈與無因次觸媒寬度方向的關係之圖表。 圖14係以等高線顯示在圖3中的斜線所示的模組附近之靜壓的圖。Fig. 1 is a cross-sectional view showing a denitration apparatus according to a first embodiment of the present invention. Fig. 2 is a cross-sectional view showing a denitration apparatus according to a second embodiment of the present invention. Figure 3 is an oblique view showing a denitration reactor in which the modules are arranged in a pleated shape. FIG. 4 is a schematic diagram showing the flow direction of the gas through the module shown with oblique lines in FIG. 3 . FIG. 5 is a graph showing the results of investigating the flow velocity distribution of the gas flowing in the denitration reactor of FIG. 3 . FIG. 6 is a graph showing the relationship between the flow velocity distribution of the gas obtained in FIG. 5 and the dimensionless position. Fig. 7A is a diagram showing a denitration apparatus according to a third embodiment of the present invention, and is a perspective view of a denitration reactor. Fig. 7B is a view showing a denitration apparatus according to a third embodiment of the present invention, and is a cross-sectional view showing a part of the denitration apparatus. Fig. 7C is a view showing the denitration apparatus according to the third embodiment of the present invention, and is an enlarged cross-sectional view of the part surrounded by the four corners of the broken line in Fig. 7B . FIG. 8 is a diagram showing the flow rate of the gas flowing into the denitration device of FIG. 7B in contour lines. Fig. 9 is a graph showing the relationship between the flow velocity distribution of the gas in the module from the point a' to the point b' in Fig. 8 and the width direction of the dimensionless catalyst. FIG. 10 is a diagram showing the static pressure of the case where the gas is allowed to flow into the denitration device of FIG. 7B by contour lines. Fig. 11 is a cross-sectional view showing a part of a denitration apparatus according to a fourth embodiment of the present invention. FIG. 12 is a graph showing the flow velocity of the gas in the vicinity of the module shown by the oblique lines in FIG. 3 as contour lines. FIG. 13 is a graph showing the relationship between the flow velocity distribution of the gas in the module from point a to point b in FIG. 12 and the width direction of the dimensionless catalyst. FIG. 14 is a graph showing the static pressure in the vicinity of the module shown by the oblique lines in FIG. 3 as contour lines.
4‧‧‧模組 4‧‧‧Module
21‧‧‧脫硝裝置 21‧‧‧Denitration device
23‧‧‧脫硝反應器 23‧‧‧Denitration reactor
27‧‧‧整流板 27‧‧‧Rectifier
28‧‧‧葉片 28‧‧‧Blade
Claims (3)
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JP2018046790A JP6965191B2 (en) | 2017-10-20 | 2018-03-14 | Denitration device |
JP2018-046790 | 2018-03-14 |
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Citations (4)
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JPS51117964A (en) * | 1975-04-09 | 1976-10-16 | Hitachi Ltd | Catalyzer reactor |
JPS5689836A (en) * | 1979-12-24 | 1981-07-21 | Mitsubishi Heavy Ind Ltd | Solid-gas contact device |
EP1486649A1 (en) * | 2003-06-06 | 2004-12-15 | Scambia Industrial Developments Aktiengesellschaft | Catalyst and process for its production |
JP2006122873A (en) * | 2004-11-01 | 2006-05-18 | Mitsubishi Heavy Ind Ltd | Adsorbent filling structure for denitrification device |
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JPS5275659A (en) * | 1975-12-20 | 1977-06-24 | Takeda Chem Ind Ltd | Gaseous phase reactor |
DE3505351A1 (en) * | 1985-02-15 | 1986-08-21 | Linde Ag, 6200 Wiesbaden | Adsorber unit or catalyst unit, and process for the adsorptive or catalytic treatment of a fluid stream |
US6821490B2 (en) * | 2001-02-26 | 2004-11-23 | Abb Lummus Global Inc. | Parallel flow gas phase reactor and method for reducing the nitrogen oxide content of a gas |
JP2007130042A (en) * | 2005-11-08 | 2007-05-31 | Seki:Kk | Air cleaner using photocatalyst |
JP5052812B2 (en) * | 2006-04-06 | 2012-10-17 | パナソニック株式会社 | Denitration equipment and denitration equipment for tunnels |
JP2008207097A (en) * | 2007-02-26 | 2008-09-11 | Mitsubishi Heavy Ind Ltd | Exhaust gas purification apparatus, regeneration method of exhaust gas purification apparatus and exhaust gas purification method |
AT514512A1 (en) * | 2013-06-19 | 2015-01-15 | Ibiden Porzellanfabrik Frauenthal Gmbh | catalyst reactor |
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2018
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Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
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JPS51117964A (en) * | 1975-04-09 | 1976-10-16 | Hitachi Ltd | Catalyzer reactor |
JPS5689836A (en) * | 1979-12-24 | 1981-07-21 | Mitsubishi Heavy Ind Ltd | Solid-gas contact device |
EP1486649A1 (en) * | 2003-06-06 | 2004-12-15 | Scambia Industrial Developments Aktiengesellschaft | Catalyst and process for its production |
JP2006122873A (en) * | 2004-11-01 | 2006-05-18 | Mitsubishi Heavy Ind Ltd | Adsorbent filling structure for denitrification device |
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