TWI749287B - Composition of acidic hydrogen peroxide aqueous solution - Google Patents

Composition of acidic hydrogen peroxide aqueous solution Download PDF

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TWI749287B
TWI749287B TW108102434A TW108102434A TWI749287B TW I749287 B TWI749287 B TW I749287B TW 108102434 A TW108102434 A TW 108102434A TW 108102434 A TW108102434 A TW 108102434A TW I749287 B TWI749287 B TW I749287B
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hydrogen peroxide
acid
aqueous solution
acidic hydrogen
peroxide aqueous
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TW202028531A (en
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李虹儀
石育旻
陳培珊
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達興材料股份有限公司
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23FNON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00Etching metallic material by chemical means
    • C23F1/10Etching compositions
    • C23F1/14Aqueous compositions
    • C23F1/16Acidic compositions
    • C23F1/18Acidic compositions for etching copper or alloys thereof

Abstract

A composition of acidic hydrogen peroxide aqueous solution includes hydrogen peroxide, an acid-base regulator and an amino acid. The acid-base regulator includes an acid and an organic base. The amino acid has a structure represented by Formula (I). A pH value of the composition of acidic hydrogen peroxide aqueous solution is greater than or equal to 3.5 and is less than or equal to 4.6. Based on 100 parts by weight of the composition of acidic hydrogen peroxide aqueous solution, a content of the acid-base regulator is 10 parts by weight to 35 parts by weight, and a content of the amino acid is 0.08 parts by weight to its solubility. As such, it is favorable for enhancing the stability of the hydrogen peroxide. Also, it is favorable for removing metal ions with extraction method so as to conduct the liquid waste treatment or to reuse.

Description

酸性過氧化氫水溶液組成物 Acidic hydrogen peroxide aqueous solution composition

本發明是有關於一種過氧化氫水溶液組成物,且特別是有關於一種酸性過氧化氫水溶液組成物。 The present invention relates to an aqueous hydrogen peroxide solution composition, and particularly relates to an acidic hydrogen peroxide aqueous solution composition.

過氧化氫具有很強的金屬氧化性,常作為金屬表面處理劑或是蝕刻液中的氧化劑,但由於過氧化氫具有易分解的特性,在遇熱、遇鹼或混入金屬離子時,易加速過氧化氫的分解速度,進而造成大量氣體產生而有爆炸危險。 Hydrogen peroxide has strong metal oxidizing properties. It is often used as a metal surface treatment agent or an oxidizing agent in etching solutions. However, due to its easy decomposition characteristics, hydrogen peroxide is easy to accelerate when exposed to heat, alkalis or mixed with metal ions The rate of decomposition of hydrogen peroxide, which in turn causes a large amount of gas to be produced and an explosion hazard.

在使用蝕刻液進行蝕刻時,被蝕刻物中的金屬溶解後會以離子型態(即形成金屬離子)進入蝕刻液中,而加速過氧化氫的分解,導致蝕刻液的蝕刻速率及品質隨著金屬離子濃度的升高而無法控制,嚴重者甚至可能導致爆炸。如此一來,使用者需在蝕刻液到達耐受金屬離子濃度時進行更換,以確保蝕刻品質與安全性,因而不利於降低生產成本,且會產生大量廢液。 When the etching solution is used for etching, the metal in the etching object will enter the etching solution in an ionic form (that is, forming metal ions) after dissolving, and accelerate the decomposition of hydrogen peroxide, resulting in the etching rate and quality of the etching solution. The increase in the concentration of metal ions cannot be controlled, and in severe cases, it may even cause an explosion. As a result, the user needs to replace the etching solution when it reaches the tolerable metal ion concentration to ensure the etching quality and safety, which is not conducive to reducing production costs and will generate a large amount of waste liquid.

為延長使用蝕刻液的壽命,可於蝕刻液中加入穩定劑,例如無機磷酸鹽、有機磷酸或含多官能基羧酸等穩定劑,以提升過氧化氫的穩定性,前述穩定劑大多是利用穩定劑與金屬離子產生螯合而減緩過氧化氫的分解速率。 In order to prolong the life of the etching solution, stabilizers such as inorganic phosphate, organic phosphoric acid or polyfunctional carboxylic acid can be added to the etching solution to improve the stability of hydrogen peroxide. Most of the aforementioned stabilizers are used The stabilizer chelates with metal ions to slow down the decomposition rate of hydrogen peroxide.

然而,當穩定劑對金屬離子的螯合能力良好,雖然可提升過氧化氫的穩定性,但當蝕刻液達到耐受金屬離子濃度而需更換時,此蝕刻液無法藉由萃取方法直接將金屬離子有效並快速移除再進行廢液處理或重新使用,只能稀釋後添加混凝劑進行化學混凝處理,導致產生的廢液量大增,對環境不友善。 However, when the stabilizer has a good chelating ability to metal ions, although the stability of hydrogen peroxide can be improved, when the etching solution reaches a tolerable metal ion concentration and needs to be replaced, the etching solution cannot directly remove the metal by the extraction method. The ions are effectively and quickly removed before waste liquid treatment or reuse. Only after dilution, coagulant can be added for chemical coagulation treatment, which leads to a large increase in the amount of waste liquid produced, which is not friendly to the environment.

本發明之一目的是提供一種酸性過氧化氫水溶液組成物,藉此,有利於提升過氧化氫的穩定性,並有利於使用萃取方式除去金屬離子以進行廢液處理或重新使用。 One object of the present invention is to provide an acidic hydrogen peroxide aqueous solution composition, which is beneficial to improve the stability of hydrogen peroxide, and facilitates the use of extraction methods to remove metal ions for waste liquid treatment or reuse.

依據本發明一實施方式,提供一種酸性過氧化氫水溶液組成物,包含過氧化氫、酸鹼調整劑以及胺基酸。酸鹼調整劑包含酸及有機鹼。胺基酸具有如式(I)所示之一結構:CH3(CH2)mS(CH2)n-CH(NH2)-COOH (I),其中,m為0至1的整數,n為1至3的整數,酸性過氧化氫水溶液組成物的酸鹼值大於或等於3.5且小於或等於4.6,基於酸性過氧化氫水溶液組成物為100重量百分比,酸鹼調整劑的含量為10重量百分比至35重量百分比,胺基酸的含量為0.08重量百分比至胺基酸的溶解度。 According to one embodiment of the present invention, there is provided an acidic hydrogen peroxide aqueous solution composition comprising hydrogen peroxide, an acid-base regulator, and an amino acid. The acid-base regulator includes acids and organic bases. The amino acid has a structure as shown in formula (I): CH 3 (CH 2 ) m S(CH 2 ) n -CH(NH 2 )-COOH (I), where m is an integer from 0 to 1, n is an integer from 1 to 3, the acid-base value of the acidic hydrogen peroxide aqueous solution composition is greater than or equal to 3.5 and less than or equal to 4.6, based on 100% by weight of the acidic hydrogen peroxide aqueous solution composition, and the content of the acid-base regulator is 10 The weight percentage to 35 weight percentage, the content of the amino acid is 0.08 weight percentage to the solubility of the amino acid.

為讓本發明之上述和其他目的、特徵、優點與實施例能更明顯易懂,所附圖式之說明如下:第1圖為實施例2~4以及比較例11之衰減率與pH值的關係圖;第2圖為實施例5~8之衰減率與甲硫胺酸之含量的關係圖;以及第3圖為甲硫胺酸不同添加量配合不同pH值時過氧化氫衰減率的評斷結果。 In order to make the above and other objects, features, advantages and embodiments of the present invention more comprehensible, the description of the accompanying drawings is as follows: Figure 1 shows the attenuation rate and pH value of Examples 2 to 4 and Comparative Example 11. The relationship diagram; the second diagram is the relationship diagram between the attenuation rate of Examples 5 to 8 and the content of methionine; and the third diagram is the judgement of the attenuation rate of hydrogen peroxide when different addition amounts of methionine are combined with different pH values result.

本發明中,有時以鍵線式(skeleton formula)表示化合物結構,此種表示法可以省略碳原子、氫原子以及碳氫鍵。倘若,結構式中有明確繪出官能基的,則以繪示者為準。 In the present invention, a skeleton formula is sometimes used to express the structure of a compound, and such a notation may omit carbon atoms, hydrogen atoms, and carbon-hydrogen bonds. If functional groups are clearly drawn in the structural formula, the drawn ones shall prevail.

本發明中,由「一數值至另一數值」表示的範圍,是一種避免在說明書中一一列舉該範圍中的所有數值的概要性表示方式。因此,某一特定數值範圍的記載,涵蓋該數值範圍內的任意數值以及由該數值範圍內的任意數值界定出的較小數值範圍,如同在說明書中明文寫出該任意數值和該較小數值範圍一樣。例如,「0.1wt%~1wt%」的範圍,無論說明書中是否列舉其他數值,均涵蓋「0.5wt%~0.8wt%」的範圍。 In the present invention, the range represented by "a value to another value" is a summary expression method that avoids enumerating all the values in the range one by one in the specification. Therefore, the record of a specific numerical range covers any numerical value in the numerical range and the smaller numerical range defined by any numerical value in the numerical range, as if the arbitrary numerical value and the smaller numerical value are clearly written in the specification The scope is the same. For example, the range of "0.1wt%~1wt%", regardless of whether other values are listed in the specification, all cover the range of "0.5wt%~0.8wt%".

<酸性過氧化氫水溶液組成物><Acid hydrogen peroxide aqueous solution composition>

一種酸性過氧化氫水溶液組成物,包含過氧化氫、酸鹼調整劑以及胺基酸。酸鹼調整劑包含酸及有機鹼。胺基酸具有如式(I)所示之一結構:CH3(CH2)mS(CH2)n-CH(NH2)-COOH (I),其中,m為0至1的整數,n為1至3的整數,酸性過氧化氫水溶液組成物的酸鹼值大於或等於3.5且小於或等於4.6,基於酸性過氧化氫水溶液組成物為100重量百分比,酸鹼調整劑的含量為10重量百分比至35重量百分比,胺基酸的含量為0.08重量百分比至胺基酸的溶解度。 An acidic hydrogen peroxide aqueous solution composition comprising hydrogen peroxide, acid-base regulator and amino acid. The acid-base regulator includes acids and organic bases. The amino acid has a structure as shown in formula (I): CH 3 (CH 2 ) m S(CH 2 ) n -CH(NH 2 )-COOH (I), where m is an integer from 0 to 1, n is an integer from 1 to 3, the acid-base value of the acidic hydrogen peroxide aqueous solution composition is greater than or equal to 3.5 and less than or equal to 4.6, based on 100% by weight of the acidic hydrogen peroxide aqueous solution composition, and the content of the acid-base regulator is 10 The weight percentage to 35 weight percentage, the content of the amino acid is 0.08 weight percentage to the solubility of the amino acid.

藉由上述酸性過氧化氫水溶液組成物,有利於提升過氧化氫的穩定性,並有利於使用萃取方式除去金屬離子以進行廢液處理或重新使用。 The composition of the above-mentioned acidic hydrogen peroxide aqueous solution is beneficial to improve the stability of hydrogen peroxide, and is beneficial to the use of extraction methods to remove metal ions for waste liquid treatment or reuse.

前述「酸鹼調整劑包含酸及有機鹼」,是指在滿足酸性過氧化氫水溶液組成物的酸鹼值大於或等於3.5且小於或等於4.6的條件下,酸及有機鹼可以任意比例混合。 The aforementioned "acid-base regulator includes acid and organic base" means that the acid and organic base can be mixed in any ratio under the condition that the acid-base value of the acidic hydrogen peroxide aqueous solution composition is greater than or equal to 3.5 and less than or equal to 4.6.

前述「溶解度」是指定溫、定壓時,每單位飽和溶液中所含溶質的量,也是溶質在特定溫度與特定壓力下的最大溶解量,因此,「胺基酸的溶解度」是指胺基酸在特定溫度與特定壓力時於酸性過氧化氫水溶液組成物的最大溶解量,例如,酸性過氧化氫水溶液組成物放置於1atm、25℃的環境中,則「胺基酸的溶解度」是指胺基酸在1atm、25℃於酸性過氧化氫水溶液組成物的最大溶解量。換言之,胺基酸於酸性過氧化氫水溶液組成物的含量上限,會隨壓力、溫度而變化。 The aforementioned "solubility" refers to the amount of solute contained in a unit of saturated solution at a specified temperature and pressure. It is also the maximum amount of solute that can be dissolved at a specific temperature and pressure. Therefore, the "solubility of amino acid" refers to the amino group The maximum amount of acid dissolved in an acidic hydrogen peroxide aqueous solution composition at a specific temperature and pressure. For example, if the acidic hydrogen peroxide aqueous solution composition is placed in an environment of 1 atm and 25°C, the "solubility of amino acid" refers to The maximum amount of amino acid dissolved in an acidic hydrogen peroxide aqueous solution composition at 1 atm and 25°C. In other words, the upper limit of the content of the amino acid in the acidic hydrogen peroxide aqueous solution composition varies with pressure and temperature.

前述「萃取方式」可為但不限於使用萃取劑或利用離子交換樹脂除去金屬離子。 The aforementioned "extraction method" can be, but is not limited to, the use of an extractant or the use of ion exchange resins to remove metal ions.

依據前述的酸性過氧化氫水溶液組成物,其中m可等於0,且n可等於2。換言之,胺基酸具有如式(I-1)所示之一結構:CH3S(CH2)2-CH(NH2)-COOH (I-1),式(I-1)之胺基酸的名稱為甲硫胺酸(Methionine)。 According to the aforementioned acidic hydrogen peroxide aqueous solution composition, m can be equal to 0, and n can be equal to 2. In other words, the amino acid has a structure as shown in formula (I-1): CH 3 S(CH 2 ) 2 -CH(NH 2 )-COOH (I-1), the amino group of formula (I-1) The name of the acid is Methionine.

依據前述的酸性過氧化氫水溶液組成物,酸可包含有機酸,具體舉例來說,有機酸可包含由乳酸、蘋果酸、琥珀酸、檸檬酸、丙二酸、苯磺酸、苯磺酸衍生物所組成群組選出之至少一種。亦即有機酸可為乳酸、蘋果酸、琥珀酸、檸檬酸、丙二酸、苯磺酸、苯磺酸衍生物其中的一種,或者至少二種以上且以任意比例形成的混合物。前述「苯磺酸衍生物」是指苯磺酸之苯環上的氫至少一者被一價有機基取代,一價有機基可為但不限於羥基、羧基或醛基。具體舉例來說,苯磺酸衍生物可為4-羥基苯磺酸。另外,酸可包含無機酸,具體舉例來說,無機酸可包含由硫酸、硝酸、磷酸、鹽酸所組成群組選出之至少一種。亦即無機酸可為硫酸、硝酸、磷酸、鹽酸其中一種,或者至少二種以上且以任意比例形成的混合物。 According to the aforementioned composition of the acidic hydrogen peroxide aqueous solution, the acid may include an organic acid. For example, the organic acid may include lactic acid, malic acid, succinic acid, citric acid, malonic acid, benzenesulfonic acid, and benzenesulfonic acid. At least one selected from the group consisting of things. That is, the organic acid may be one of lactic acid, malic acid, succinic acid, citric acid, malonic acid, benzenesulfonic acid, and benzenesulfonic acid derivatives, or a mixture of at least two or more in any ratio. The aforementioned "benzenesulfonic acid derivative" means that at least one of the hydrogens on the benzene ring of benzenesulfonic acid is replaced by a monovalent organic group, and the monovalent organic group can be, but is not limited to, a hydroxyl group, a carboxyl group or an aldehyde group. Specifically, the benzenesulfonic acid derivative may be 4-hydroxybenzenesulfonic acid. In addition, the acid may include an inorganic acid. Specifically, for example, the inorganic acid may include at least one selected from the group consisting of sulfuric acid, nitric acid, phosphoric acid, and hydrochloric acid. That is, the inorganic acid may be one of sulfuric acid, nitric acid, phosphoric acid, and hydrochloric acid, or a mixture of at least two or more in any ratio.

依據前述的酸性過氧化氫水溶液組成物,有機鹼可包含由3-二乙胺基丙胺、2-氨基-2-甲基-1-丙醇、1-氨基-2-丙醇、二甲基乙醇胺所組成群組選出之至少一種。亦即有機鹼可為3-二乙胺基丙胺、2-氨基-2-甲基-1-丙醇、 1-氨基-2-丙醇、二甲基乙醇胺其中的一種,或者至少二種以上且以任意比例形成的混合物。 According to the composition of the aforementioned acidic hydrogen peroxide aqueous solution, the organic base may include 3-diethylaminopropylamine, 2-amino-2-methyl-1-propanol, 1-amino-2-propanol, dimethyl At least one selected from the group consisting of ethanolamine. That is, the organic base can be 3-diethylaminopropylamine, 2-amino-2-methyl-1-propanol, One of 1-amino-2-propanol and dimethylethanolamine, or a mixture of at least two of them in any ratio.

依據前述的酸性過氧化氫水溶液組成物,基於酸性過氧化氫水溶液組成物為100重量百分比,酸與有機鹼的含量總和可為10重量百分比至35重量百分比。 According to the aforementioned acidic hydrogen peroxide aqueous solution composition, based on 100 weight percent of the acidic hydrogen peroxide aqueous solution composition, the total content of acid and organic base can be 10 weight percent to 35 weight percent.

依據前述的酸性過氧化氫水溶液組成物,基於酸性過氧化氫水溶液組成物為100重量百分比,過氧化氫的含量可為1重量百分比至25重量百分比。或者,過氧化氫的含量可為2重量百分比至15重量百分比。或者,過氧化氫的含量可為5重量百分比至9重量百分比。 According to the aforementioned acidic hydrogen peroxide aqueous solution composition, based on 100 weight percent of the acidic hydrogen peroxide aqueous solution composition, the content of hydrogen peroxide may be 1 weight percent to 25 weight percent. Alternatively, the content of hydrogen peroxide may be 2 wt% to 15 wt%. Alternatively, the content of hydrogen peroxide may be 5 weight percent to 9 weight percent.

依據前述的酸性過氧化氫水溶液組成物,基於酸性過氧化氫水溶液組成物為100重量百分比,酸鹼調整劑的含量可為12重量百分比至30重量百分比。或者,酸鹼調整劑的含量可為14重量百分比至28重量百分比。舉例來說,當酸鹼調整劑僅包含有機酸時,有機酸的含量可為12重量百分比至30重量百分比,或者,有機酸的含量可為14重量百分比至28重量百分比。再舉例來說,當酸鹼調整劑僅包含有機酸及有機鹼時,有機酸及有機鹼的含量總和可為12重量百分比至30重量百分比,或者,有機酸及有機鹼的含量總和可為14重量百分比至28重量百分比。又舉例來說,當酸鹼調整劑包含有機酸、有機鹼及無機酸時,有機酸、有機鹼及無機酸的含量總和可為12重量百分比至30重量百分比,或者,有機酸、有機鹼及無機酸的含量總和可為14重量百分比至28重量百分比,依此類推。 According to the aforementioned acidic hydrogen peroxide aqueous solution composition, based on 100 weight percent of the acidic hydrogen peroxide aqueous solution composition, the content of the acid-base regulator can be 12 to 30 weight percent. Alternatively, the content of the acid-base regulator may be 14% to 28% by weight. For example, when the acid-base modifier only contains organic acids, the content of the organic acid may be 12% to 30% by weight, or the content of the organic acid may be 14% to 28% by weight. For another example, when the acid-base regulator only contains organic acids and organic bases, the total content of organic acids and organic bases can be 12% to 30% by weight, or the total content of organic acids and organic bases can be 14 Weight percent to 28 weight percent. For another example, when the acid-base regulator includes organic acids, organic bases, and inorganic acids, the total content of organic acids, organic bases, and inorganic acids can be 12% to 30% by weight, or organic acids, organic bases, and The total content of inorganic acids can be 14% to 28% by weight, and so on.

依據前述的酸性過氧化氫水溶液組成物,可選擇地包含至少一種添加劑,例如過氧化氫安定劑或醇類,以提升其蝕刻表現,關於添加劑係為習用,在此不予贅述。 According to the aforementioned acidic hydrogen peroxide aqueous solution composition, it may optionally contain at least one additive, such as hydrogen peroxide stabilizer or alcohol, to improve its etching performance. The additive system is conventional and will not be repeated here.

依據前述的酸性過氧化氫水溶液組成物,可更包含水。具體來說,酸性過氧化氫水溶液組成物係以水作為溶劑,前述水可為但不限於蒸餾水、去離子水,並以去離子水為佳。 According to the aforementioned acidic hydrogen peroxide aqueous solution composition, it may further contain water. Specifically, the composition of the acidic hydrogen peroxide aqueous solution uses water as a solvent, and the aforementioned water may be, but is not limited to, distilled water, deionized water, and preferably deionized water.

依據前述的酸性過氧化氫水溶液組成物,可用於蝕刻含銅金屬層,具體而言,可用於蝕刻含銅的單層金屬、銅/鈦、銅/鎳、銅/鉬、銅/氮化鉬、鉬/銅/氮化鉬、氮化鉬/銅/氮化鉬以及氮化鉬/銅/鉬等多層金屬層。 According to the aforementioned acidic hydrogen peroxide aqueous solution composition, it can be used to etch copper-containing metal layers, specifically, it can be used to etch copper-containing single-layer metals, copper/titanium, copper/nickel, copper/molybdenum, and copper/molybdenum nitride. , Molybdenum/copper/molybdenum nitride, molybdenum nitride/copper/molybdenum nitride and molybdenum nitride/copper/molybdenum and other multilayer metal layers.

<實驗材料><Experimental materials>

以下實驗1~5中,溶銅前之母液中各成分的功用、縮寫、中文名稱、英文名稱以及結構式列於表1A。 In the following experiments 1 to 5, the functions, abbreviations, Chinese names, English names and structural formulas of the components in the mother liquor before copper dissolution are listed in Table 1A.

Figure 108102434-A0305-02-0009-1
Figure 108102434-A0305-02-0009-1
Figure 108102434-A0101-12-0008-3
Figure 108102434-A0101-12-0008-3

以下實驗4中,比較例12~19中穩定劑縮寫以及結構式列於表1B。 In the following experiment 4, the abbreviations and structural formulas of the stabilizers in Comparative Examples 12-19 are listed in Table 1B.

Figure 108102434-A0101-12-0008-33
Figure 108102434-A0101-12-0008-33
Figure 108102434-A0101-12-0009-5
Figure 108102434-A0101-12-0009-5

實驗5的萃取劑是使用商品名稱為Acorga M5640的物質,其包含式(II)所示之一結構:

Figure 108102434-A0101-12-0009-6
The extractant used in Experiment 5 is a substance with the trade name Acorga M5640, which contains one of the structures shown in formula (II):
Figure 108102434-A0101-12-0009-6

<實驗1、不同胺基酸之過氧化氫穩定性><Experiment 1. Hydrogen peroxide stability of different amino acids>

首先配製實施例1及比較例1~10的酸性過氧化氫水溶液組成物。實施例1之酸性過氧化氫水溶液組成物的配製方法如下:(1)係於配方1添加2.78克的胺基酸,實施例1所使用的胺基酸為甲硫胺酸,再補水至100克,以形成母液,其中酸鹼調整劑為有機酸及有機鹼;(2)取21.6克的母液,加入0.2克的銅箔(Cu)溶解後,以69wt%硝酸水溶液(HNO3(aq.))調整pH值至4.0,並添加31wt%過氧化氫水溶液(H2O2(aq.))使過氧化氫的濃度為8.0wt%,以形成實施例1的溶銅後之酸性過氧化氫水溶液組成物,其中酸鹼調整 劑為有機酸、有機鹼以及無機酸。關於母液的組成請參見表2A,關於酸性過氧化氫水溶液組成物的組成請參見表2B。 比較例1~10之酸性過氧化氫水溶液組成物的配製方法如下:係將實施例1中的胺基酸種類予以更換,如表2C所示,其餘步驟皆相同,以形成比較例1~10的酸性過氧化氫水溶液組成物。 First, the acidic hydrogen peroxide aqueous solution compositions of Example 1 and Comparative Examples 1-10 were prepared. The preparation method of the acidic hydrogen peroxide aqueous solution composition of Example 1 is as follows: (1) Add 2.78 grams of amino acid to formula 1. The amino acid used in Example 1 is methionine, and then make up to 100 G to form a mother liquor, in which the acid-base regulators are organic acids and organic bases; (2) take 21.6 g of mother liquor, add 0.2 g of copper foil (Cu) to dissolve it, and use 69wt% nitric acid aqueous solution (HNO 3(aq. ) ) Adjust the pH to 4.0, and add 31wt% aqueous hydrogen peroxide solution (H 2 O 2(aq.) ) to make the concentration of hydrogen peroxide 8.0wt% to form the acid peroxide after dissolving copper in Example 1. A hydrogen aqueous solution composition, wherein the acid-base regulator is an organic acid, an organic base, and an inorganic acid. For the composition of the mother liquor, see Table 2A, and for the composition of the acidic hydrogen peroxide aqueous solution, see Table 2B. The preparation method of the acidic hydrogen peroxide aqueous solution composition of Comparative Examples 1-10 is as follows: The amino acid type in Example 1 is replaced, as shown in Table 2C, and the rest of the steps are the same to form Comparative Examples 1-10 The composition of the acidic hydrogen peroxide aqueous solution.

過氧化氫穩定性量測方法:量測剛配製好之酸性過氧化氫水溶液組成物之過氧化氫濃度[H2O2]T0,將酸性過氧化氫水溶液組成物放置於35℃的環境中擺放20小時後,量測過氧化氫濃度[H2O2]T1,再計算過氧化氫衰減率,Decay rate(wt%/hr)=([H2O2]T0-[H2O2]T1)/20,實施例1及比較例1~10之過氧化氫穩定性的量測結果如表2C所示。 Hydrogen peroxide stability measurement method: Measure the hydrogen peroxide concentration [H 2 O 2 ]T 0 of the freshly prepared acidic hydrogen peroxide aqueous solution composition, and place the acidic hydrogen peroxide aqueous solution composition in an environment of 35°C After placed in the middle for 20 hours, measure the hydrogen peroxide concentration [H 2 O 2 ]T 1 , and then calculate the hydrogen peroxide decay rate, Decay rate(wt%/hr)=([H 2 O 2 ]T 0 -[ H 2 O 2 ]T 1 )/20, the measurement results of hydrogen peroxide stability of Example 1 and Comparative Examples 1-10 are shown in Table 2C.

Figure 108102434-A0101-12-0010-7
Figure 108102434-A0101-12-0010-7
Figure 108102434-A0101-12-0011-8
Figure 108102434-A0101-12-0011-8

Figure 108102434-A0101-12-0011-9
Figure 108102434-A0101-12-0011-9

Figure 108102434-A0101-12-0012-10
Figure 108102434-A0101-12-0012-10

由表2C可知,實施例1的過氧化氫穩定性優於比較例1~比較例10。 It can be seen from Table 2C that the hydrogen peroxide stability of Example 1 is better than that of Comparative Example 1 to Comparative Example 10.

<實驗2、不同pH值之過氧化氫穩定性><Experiment 2. The stability of hydrogen peroxide at different pH values>

配製實施例2~4及比較例11的酸性過氧化氫水溶液組成物,配製方法如下:(1)係於配方1添加0.09克的甲硫胺酸,再補水至100克,以形成母液,其中酸鹼調整劑為有機酸及有機鹼;(2)取21.6克的母液,加入0.2克的銅箔(Cu)溶解後,以69wt%硝酸水溶液調整pH值分別至3.5、3.7、4.4、4.6,並添加31wt%過氧化氫水溶液使過氧化氫的濃度為8.0wt%,以形成實施例2~4及比較例11的酸性過氧化氫水溶液組成物,其中酸鹼調整劑為有機酸、有機鹼以及無機酸。關於母液的組成請參見表3A,關於酸性過氧化氫水溶液組成物的組成請參見表3B。 The acidic hydrogen peroxide aqueous solution compositions of Examples 2 to 4 and Comparative Example 11 were prepared. The preparation method was as follows: (1) Add 0.09 g of methionine to formula 1, and then make up to 100 g of water to form a mother liquor. Acid-base regulators are organic acids and organic bases; (2) Take 21.6 g of mother liquor, add 0.2 g of copper foil (Cu) to dissolve, and adjust the pH to 3.5, 3.7, 4.4, 4.6 with 69wt% nitric acid aqueous solution, And add 31wt% hydrogen peroxide aqueous solution to make the concentration of hydrogen peroxide 8.0wt% to form the acidic hydrogen peroxide aqueous solution composition of Examples 2 to 4 and Comparative Example 11, wherein the acid-base regulator is an organic acid, an organic base And mineral acids. For the composition of the mother liquor, see Table 3A, and for the composition of the acidic hydrogen peroxide aqueous solution, see Table 3B.

將實施例2~4及比較例11進行過氧化氫穩定性量測,量測方法同實驗1,在此不重複敘述。實施例2~4及比較例11之過氧化氫穩定性的量測結果如表3C所示。 The hydrogen peroxide stability was measured in Examples 2 to 4 and Comparative Example 11. The measurement method is the same as Experiment 1, and the description is not repeated here. The measurement results of hydrogen peroxide stability of Examples 2 to 4 and Comparative Example 11 are shown in Table 3C.

Figure 108102434-A0101-12-0013-34
Figure 108102434-A0101-12-0013-34
Figure 108102434-A0101-12-0014-12
Figure 108102434-A0101-12-0014-12

Figure 108102434-A0101-12-0014-13
Figure 108102434-A0101-12-0014-13

Figure 108102434-A0101-12-0015-14
Figure 108102434-A0101-12-0015-14

配合參照第1圖,其為實施例2~4以及比較例11之衰減率與pH值的關係圖,衰減率的單位為wt%/hr。由表3C以及第1圖可知,當甲硫胺酸的含量約為0.08wt%~0.09wt%時,pH值落在3.5~4.6的範圍,有利於提升過氧化氫的穩定性。 With reference to Figure 1, it is a graph of the relationship between the attenuation rate and the pH value of Examples 2 to 4 and Comparative Example 11. The unit of the attenuation rate is wt%/hr. It can be seen from Table 3C and Figure 1 that when the content of methionine is about 0.08wt%~0.09wt%, the pH value falls in the range of 3.5~4.6, which is beneficial to improve the stability of hydrogen peroxide.

<實驗3-1、pH3.7下不同胺基酸含量之過氧化氫穩定性><Experiment 3-1, the stability of hydrogen peroxide with different amino acid content at pH 3.7>

實驗3-1,配製實施例5~8的酸性過氧化氫水溶液組成物,配製方法如下:(1)係於配方1分別添加0.09克、1.39克、2.78克、4.44克的甲硫胺酸,再補水至100克,以形成實施例5~8的母液,其中酸鹼調整劑為有機酸及有機鹼;(2)取21.6克的母液,加入0.2克的銅箔(Cu)溶解後,以69wt%硝酸水溶液調整pH值至3.7,並添加31wt%過氧化氫水溶液使過氧化氫的濃度為8.0wt%,以形成實施例5~8的酸性過氧化氫水溶液組成物,其中酸鹼調整劑為有機酸、有機鹼以及無機酸。關於母液的組成請參見表4A,關於酸性過氧化氫水溶液組成物的組成請參見表4B。 In Experiment 3-1, the acidic hydrogen peroxide aqueous solution compositions of Examples 5 to 8 were prepared. The preparation method is as follows: (1) Add 0.09 g, 1.39 g, 2.78 g, and 4.44 g of methionine to formula 1, respectively, Then add water to 100 grams to form the mother liquor of Examples 5-8, in which the acid-base regulators are organic acids and organic bases; (2) Take 21.6 grams of mother liquor, add 0.2 g of copper foil (Cu) to dissolve it, and then dissolve it with The pH value of 69wt% nitric acid aqueous solution was adjusted to 3.7, and 31wt% hydrogen peroxide aqueous solution was added to make the concentration of hydrogen peroxide 8.0wt% to form the acidic hydrogen peroxide aqueous solution composition of Examples 5 to 8, wherein the acid-base regulator For organic acids, organic bases and inorganic acids. For the composition of the mother liquor, see Table 4A, and for the composition of the acidic hydrogen peroxide aqueous solution, see Table 4B.

將實施例5~8進行過氧化氫穩定性量測,量測方法同實驗1,在此不重複敘述。實施例5~8之過氧化氫穩定性的量測結果如表4C所示。 The hydrogen peroxide stability measurement was carried out in Examples 5-8, and the measurement method was the same as Experiment 1, and the description is not repeated here. The measurement results of the hydrogen peroxide stability of Examples 5 to 8 are shown in Table 4C.

Figure 108102434-A0101-12-0016-15
Figure 108102434-A0101-12-0016-15

Figure 108102434-A0101-12-0016-16
Figure 108102434-A0101-12-0016-16
Figure 108102434-A0101-12-0017-17
Figure 108102434-A0101-12-0017-17

Figure 108102434-A0101-12-0017-18
Figure 108102434-A0101-12-0017-18

配合參照第2圖,其為實施例5~8之衰減率與甲硫胺酸之含量的關係圖,衰減率的單位為wt%/hr,甲硫胺酸之含量的單位為wt%。由表4C以及第2圖可知,當pH值為3.7時,甲硫胺酸的含量為0.08wt%~3.89wt%,皆有利於提升過氧化氫的穩定性。另由第2圖可推知,當甲硫胺酸的含量由0.08wt%逐漸增加,有利於降低衰減率,而當甲硫胺酸的含量增加至約2.43wt%,其衰減率的變化趨於平緩,因此,可合理推知當甲硫胺酸的含量低於0.08wt%時,其穩定過氧化氫的效果較差,而當甲硫胺酸的含量增加至其溶解度,仍有優良的穩定過氧化氫的效果。 With reference to Figure 2, it is a graph of the relationship between the attenuation rate and the content of methionine in Examples 5 to 8, the unit of the attenuation rate is wt%/hr, and the unit of the content of methionine is wt%. It can be seen from Table 4C and Figure 2 that when the pH is 3.7, the content of methionine is 0.08wt%~3.89wt%, which is beneficial to improve the stability of hydrogen peroxide. In addition, it can be inferred from Figure 2 that when the content of methionine is gradually increased from 0.08wt%, it is beneficial to reduce the attenuation rate, and when the content of methionine increases to about 2.43wt%, the attenuation rate tends to change Therefore, it can be reasonably inferred that when the content of methionine is less than 0.08wt%, the effect of stabilizing hydrogen peroxide is poor, and when the content of methionine is increased to its solubility, there is still excellent stable peroxide The effect of hydrogen.

<實驗3-2、pH4.6下不同胺基酸含量之過氧化氫穩定性><Experiment 3-2, the stability of hydrogen peroxide with different amino acid content at pH 4.6>

另外,進行實驗3-2,其係觀察酸性過氧化氫水溶液組成物之pH值為4.6時,甲硫胺酸之添加量不同時過氧化氫的穩定性,實驗3-2的實驗方法與實驗3-1相似,不同之處在於以69wt%硝酸水溶液調整pH值時,是將pH值調整至4.6。關於母液溶液的組成請參見表5A,關於酸性過氧化氫水溶液組成物的組成請參見表5B。 In addition, experiment 3-2 was performed to observe the stability of hydrogen peroxide when the pH of the acidic hydrogen peroxide aqueous solution composition was 4.6 and the amount of methionine added was different. The experimental methods and experiments of experiment 3-2 3-1 is similar, the difference is that when the pH value is adjusted with 69wt% nitric acid aqueous solution, the pH value is adjusted to 4.6. For the composition of the mother liquor solution, see Table 5A, and for the composition of the acidic hydrogen peroxide aqueous solution, see Table 5B.

Figure 108102434-A0101-12-0018-19
Figure 108102434-A0101-12-0018-19
Figure 108102434-A0101-12-0019-20
Figure 108102434-A0101-12-0019-20

Figure 108102434-A0101-12-0019-21
Figure 108102434-A0101-12-0019-21
Figure 108102434-A0101-12-0020-22
Figure 108102434-A0101-12-0020-22

配合參照第3圖,其為甲硫胺酸不同添加量配合不同pH值時過氧化氫衰減率的評斷結果,其中內有斜線的圓圈表示衰減率評斷為◎,內有×的圓圈表示衰減率評斷為△或×。更具體來說,第3圖係呈現實驗2、實驗3-1以及實驗3-2的量測結果,由第3圖可知,當甲硫胺酸的含量為0.08wt%時,pH值為4.6時穩定過氧化氫的效果不佳,衰減率評斷為△或×,當通過提高甲硫胺酸的含量(例如3.89wt%),可使酸性過氧化氫水溶液組成物於pH值為4.6時,衰減率評斷為◎,仍可提供優良的穩定過氧化氫的效果。 Refer to Figure 3, which is the evaluation result of hydrogen peroxide decay rate when methionine is added with different pH values. The circle with a diagonal line indicates that the decay rate is judged as ◎, and the circle with × indicates the decay rate. The judgment is △ or ×. More specifically, Figure 3 shows the measurement results of Experiment 2, Experiment 3-1, and Experiment 3-2. It can be seen from Figure 3 that when the content of methionine is 0.08wt%, the pH is 4.6 The effect of stabilizing hydrogen peroxide is not good, and the attenuation rate is judged to be △ or ×. When the content of methionine (for example, 3.89wt%) is increased, the acidic hydrogen peroxide aqueous solution composition can be made to have a pH of 4.6. The attenuation rate is judged to be ◎, which can still provide an excellent effect of stabilizing hydrogen peroxide.

<實驗4、可萃取性實驗><Experiment 4. Extractability experiment>

首先配製實施例9、參考例1~2及比較例12~19的測試溶液。實施例9之測試溶液的配製方法如下:(1)以配方2配製第一溶液,並於第一溶液中加入2.52g的無水硫酸銅(CuSO4)以形成含銅溶液,關於配方2的組成請參見表6A;(2)於含銅溶液中添加穩定劑,實施例9的穩定劑為甲硫胺酸,其中銅離子[Cu2+]與甲硫胺酸的莫耳數比為1:1.2,以形成實施例9的測試溶液。參考例1~2及比較例12~19之測試溶液的配製方法如下:係將實施例9中的甲硫胺酸更換為其他穩定劑,如表6B所示,其餘步驟皆相同, 以形成參考例1~2及比較例12~19的測試溶液,倘若其他穩定劑添加至其溶解度時,其莫耳數仍無法達到銅離子的1.2倍,則其添加量以其溶解度為準。 First, the test solutions of Example 9, Reference Examples 1 to 2, and Comparative Examples 12 to 19 were prepared. The preparation method of the test solution of Example 9 is as follows: (1) Prepare the first solution with formula 2, and add 2.52 g of anhydrous copper sulfate (CuSO 4 ) to the first solution to form a copper-containing solution. Regarding the composition of formula 2 Please refer to Table 6A; (2) A stabilizer was added to the copper-containing solution. The stabilizer in Example 9 was methionine, and the molar ratio of copper ion [Cu 2+ ] to methionine was 1: 1.2 to form the test solution of Example 9. The preparation methods of the test solutions of Reference Examples 1 to 2 and Comparative Examples 12 to 19 are as follows: The methionine in Example 9 is replaced with other stabilizers, as shown in Table 6B, and the rest of the steps are the same to form a reference For the test solutions of Examples 1 to 2 and Comparative Examples 12 to 19, if the molar number of other stabilizers cannot reach 1.2 times that of the copper ion when the solubility of other stabilizers is added, the added amount shall be based on the solubility.

可萃取性量測方法:將實施例9、參考例1~2及比較例12~19的測試以萃取劑進行萃取2分鐘,取水相以分光光度計或電感耦合電漿體質譜法(Inductively Coupled Plasma Mass Spectrometry,簡稱ICP-MS)確認水相的銅離子濃度,細節請參照下文。實施例9、參考例1~2及比較例12~19之可萃取性的量測結果如表6B所示。 Extractability measurement method: The tests of Example 9, Reference Examples 1 to 2 and Comparative Examples 12 to 19 were extracted with an extractant for 2 minutes, and the water phase was taken with a spectrophotometer or inductively coupled plasma mass spectrometry (Inductively Coupled Plasma Mass Spectrometry). Plasma Mass Spectrometry (ICP-MS) confirms the copper ion concentration in the water phase. Please refer to the following for details. The extractability measurement results of Example 9, Reference Examples 1 to 2 and Comparative Examples 12 to 19 are shown in Table 6B.

Figure 108102434-A0101-12-0021-23
Figure 108102434-A0101-12-0021-23

Figure 108102434-A0101-12-0021-24
Figure 108102434-A0101-12-0021-24
Figure 108102434-A0101-12-0022-25
Figure 108102434-A0101-12-0022-25

由表6B可知,添加甲硫胺酸,可提供優良的可萃取性,而參考例1及參考例2雖具有優良的可萃取性,卻不利於提升過氧化氫的穩定性(可參照表2C)。 It can be seen from Table 6B that the addition of methionine can provide excellent extractability. Although Reference Example 1 and Reference Example 2 have excellent extractability, they are not conducive to improving the stability of hydrogen peroxide (refer to Table 2C). ).

上述以分光光度計(型號為PhotoFlex Turb)確認水相的銅離子濃度的方法如下:(1)配製待測樣品,先配製指示劑,指示劑的成分包含水(87.07wt%)、乙二胺四乙酸二鈉(2.38wt%)、醋酸鈉(1.50%)、醋酸(9.05wt%),將實施例9、參考例1~2及比較例12~19的水相分別以指示劑稀釋10倍,以形成待測樣品。(2)配製檢量線溶液,先將銅標準品10000ppm分別稀釋形成50ppm、100ppm、500ppm、1000ppm、5000ppm、7500ppm、10000ppm的溶液,將上述溶液以指示劑稀釋10倍。(3)以分光光度計檢測,分析波長為690nm,以檢量線溶液建立檢量線後, 再量測待測樣品以得到吸收值,將量測到的吸收值帶回檢量線公式計算,可得待測樣品的銅離子濃度。 The above method for confirming the copper ion concentration in the water phase with a spectrophotometer (Model PhotoFlex Turb) is as follows: (1) Prepare the sample to be tested, first prepare the indicator, and the indicator contains water (87.07wt%) and ethylenediamine Disodium tetraacetate (2.38wt%), sodium acetate (1.50%), acetic acid (9.05wt%), the water phases of Example 9, Reference Examples 1~2 and Comparative Examples 12~19 were diluted 10 times with indicator respectively , To form the sample to be tested. (2) Prepare the calibration line solution, firstly dilute the copper standard 10000ppm to form 50ppm, 100ppm, 500ppm, 1000ppm, 5000ppm, 7500ppm, 10000ppm solutions, and dilute the above solution 10 times with the indicator. (3) Detect with a spectrophotometer, the analysis wavelength is 690nm, after the calibration line is established with the calibration line solution, Then measure the sample to be tested to obtain the absorption value, and bring the measured absorption value back to the calibration curve formula to calculate the copper ion concentration of the sample to be tested.

上述以ICP-MS(機器型號為Perkin Elmer的Elan DRC II)確認水相的銅離子濃度的方法如下:(1)配製待測樣品,將實施例9、參考例1~2及比較例12~19的水相分別以水稀釋100倍,以形成待測樣品。(2)使用外標法量測。 The above method for confirming the copper ion concentration in the water phase by ICP-MS (machine model is Perkin Elmer’s Elan DRC II) is as follows: (1) Prepare the sample to be tested, and compare Example 9, Reference Examples 1 to 2 and Comparative Example 12 to The water phase of 19 was diluted 100 times with water to form the sample to be tested. (2) Use external standard method to measure.

<實驗5、酸鹼調整劑不同含量之過氧化氫穩定性><Experiment 5, the stability of hydrogen peroxide with different contents of acid-base regulator>

首先配製實施例10~11及比較例20的酸性過氧化氫水溶液組成物。實施例10之酸性過氧化氫水溶液組成物的配製方法如下:(1)先配製母液,母液的成分如表7A所示,其中其中酸鹼調整劑為有機酸及有機鹼;(2)取21.6克的母液,加入0.2克的銅箔溶解後,以69wt%硝酸水溶液調整pH值至3.9,並添加31wt%過氧化氫水溶液使過氧化氫的濃度為5wt%,以形成實施例10的酸性過氧化氫水溶液組成物,其中酸鹼調整劑為有機酸、有機鹼以及無機酸,且69wt%硝酸水溶液以及31wt%過氧化氫水溶液的添加量會依胺基酸的不同而不同。實施例11及比較例20之酸性過氧化氫水溶液組成物的配製方法如下:係將實施例10中母液中各成分的添加量予以更換如表7A所示,並添加31wt%過氧化氫水溶液使過氧化氫的濃度為8wt%,其餘步驟皆相同,以形成實施例11及比較例20的酸性過氧化氫水溶液組成物。關於母液溶液的組成請參見表7A,關於酸性過氧化氫水溶液組成物的組成請參見表7B。 First, the acidic hydrogen peroxide aqueous solution compositions of Examples 10-11 and Comparative Example 20 were prepared. The preparation method of the acidic hydrogen peroxide aqueous solution composition of Example 10 is as follows: (1) First prepare the mother liquor, the composition of the mother liquor is shown in Table 7A, wherein the acid-base regulators are organic acids and organic bases; (2) take 21.6 Gram of mother liquor, add 0.2 grams of copper foil to dissolve, adjust the pH to 3.9 with 69wt% aqueous nitric acid solution, and add 31wt% aqueous hydrogen peroxide solution to make the concentration of hydrogen peroxide 5wt% to form the acidic peroxide of Example 10. The hydrogen oxide aqueous solution composition, wherein the acid-base regulators are organic acids, organic bases, and inorganic acids, and the addition amount of 69wt% nitric acid aqueous solution and 31wt% hydrogen peroxide aqueous solution will vary depending on the amino acid. The preparation method of the acidic hydrogen peroxide aqueous solution composition of Example 11 and Comparative Example 20 is as follows: The addition amount of each component in the mother liquor in Example 10 is replaced as shown in Table 7A, and 31wt% hydrogen peroxide aqueous solution is added to make The concentration of hydrogen peroxide is 8wt%, and the rest of the steps are the same to form the acidic hydrogen peroxide aqueous solution composition of Example 11 and Comparative Example 20. For the composition of the mother liquor solution, see Table 7A, and for the composition of the acidic hydrogen peroxide aqueous solution, see Table 7B.

Figure 108102434-A0101-12-0024-26
Figure 108102434-A0101-12-0024-26

Figure 108102434-A0101-12-0024-27
Figure 108102434-A0101-12-0024-27
Figure 108102434-A0101-12-0025-28
Figure 108102434-A0101-12-0025-28

將實施例10~11以及比較例20進行過氧化氫穩定性量測,量測方法同實驗1,在此不重複敘述。實施例10~11以及比較例20之過氧化氫穩定性的量測結果如表7C所示。 The hydrogen peroxide stability was measured in Examples 10-11 and Comparative Example 20, and the measurement method was the same as Experiment 1, and the description is not repeated here. The measurement results of hydrogen peroxide stability of Examples 10-11 and Comparative Example 20 are shown in Table 7C.

Figure 108102434-A0101-12-0025-29
Figure 108102434-A0101-12-0025-29

由表7C可知,當酸鹼調整劑的含量小於10wt%時,不易降低衰減率,不利於提升過氧化氫的穩定性。 It can be seen from Table 7C that when the content of the acid-base regulator is less than 10wt%, it is difficult to reduce the attenuation rate, which is not conducive to improving the stability of hydrogen peroxide.

綜上所述,依據本發明的酸性過氧化氫水溶液組成物,有利於提升過氧化氫的穩定性,並有利於使用萃取方式除去金屬離子以進行廢液處理或重新使用。 In summary, the acidic hydrogen peroxide aqueous solution composition according to the present invention is beneficial to improve the stability of hydrogen peroxide, and is beneficial to the use of extraction methods to remove metal ions for waste liquid treatment or reuse.

雖然本發明已以實施方式揭露如上,然其並非用以限定本發明,任何熟習此技藝者,在不脫離本發明之精神和範圍內,當可作各種之更動與潤飾,因此本發明之保護範圍當視後附之申請專利範圍所界定者為準。 Although the present invention has been disclosed in the above embodiments, it is not intended to limit the present invention. Anyone familiar with the art can make various changes and modifications without departing from the spirit and scope of the present invention. Therefore, the protection of the present invention The scope shall be subject to those defined in the attached patent scope.

Figure 108102434-A0101-11-0002-1
Figure 108102434-A0101-11-0002-1

Claims (11)

一種酸性過氧化氫水溶液組成物,包含:過氧化氫;酸鹼調整劑,包含酸及有機鹼;以及胺基酸,具有如式(I)所示之一結構:CH3(CH2)mS(CH2)n-CH(NH2)-COOH (I),其中,m為0至1的整數,n為1至3的整數,該酸性過氧化氫水溶液組成物的酸鹼值大於或等於3.5且小於或等於4.6,基於該酸性過氧化氫水溶液組成物為100重量百分比,該酸鹼調整劑的含量為10重量百分比至35重量百分比,該胺基酸的含量為0.08重量百分比至該胺基酸的溶解度。 An acidic hydrogen peroxide aqueous solution composition, comprising: hydrogen peroxide; acid-base regulator, comprising acid and organic base; and amino acid, having a structure as shown in formula (I): CH 3 (CH 2 ) m S(CH 2 ) n -CH(NH 2 )-COOH (I), where m is an integer from 0 to 1, and n is an integer from 1 to 3, and the acid-base value of the acidic hydrogen peroxide aqueous solution composition is greater than or Equal to 3.5 and less than or equal to 4.6, based on 100% by weight of the acidic hydrogen peroxide aqueous solution composition, the content of the acid-base regulator is 10% to 35% by weight, and the content of the amino acid is 0.08% by weight to the The solubility of amino acids. 如申請專利範圍第1項所述的酸性過氧化氫水溶液組成物,其中m等於0,且n等於2。 The acidic hydrogen peroxide aqueous solution composition as described in item 1 of the scope of patent application, wherein m is equal to 0 and n is equal to 2. 如申請專利範圍第1項所述的酸性過氧化氫水溶液組成物,其中該酸包含有機酸。 The acidic hydrogen peroxide aqueous solution composition described in item 1 of the scope of patent application, wherein the acid comprises an organic acid. 如申請專利範圍第3項所述的酸性過氧化氫水溶液組成物,其中該有機酸包含由乳酸、蘋果酸、琥珀 酸、檸檬酸、丙二酸、苯磺酸、苯磺酸衍生物所組成群組選出之至少一種。 The acidic hydrogen peroxide aqueous solution composition as described in item 3 of the scope of patent application, wherein the organic acid comprises lactic acid, malic acid, amber At least one selected from the group consisting of acid, citric acid, malonic acid, benzenesulfonic acid, and benzenesulfonic acid derivatives. 如申請專利範圍第1項所述的酸性過氧化氫水溶液組成物,其中該有機鹼包含由3-二乙胺基丙胺、2-氨基-2-甲基-1-丙醇、1-氨基-2-丙醇、二甲基乙醇胺所組成群組選出之至少一種。 The acidic hydrogen peroxide aqueous solution composition described in item 1 of the scope of patent application, wherein the organic base comprises 3-diethylaminopropylamine, 2-amino-2-methyl-1-propanol, 1-amino- At least one selected from the group consisting of 2-propanol and dimethylethanolamine. 如申請專利範圍第1項所述的酸性過氧化氫水溶液組成物,其中該酸包含無機酸。 The acidic hydrogen peroxide aqueous solution composition described in item 1 of the scope of the patent application, wherein the acid comprises an inorganic acid. 如申請專利範圍第6項所述的酸性過氧化氫水溶液組成物,其中該無機酸包含由硫酸、硝酸、磷酸、鹽酸所組成群組選出之至少一種。 The acidic hydrogen peroxide aqueous solution composition described in item 6 of the scope of patent application, wherein the inorganic acid comprises at least one selected from the group consisting of sulfuric acid, nitric acid, phosphoric acid, and hydrochloric acid. 如申請專利範圍第1項所述的酸性過氧化氫水溶液組成物,其中基於該酸性過氧化氫水溶液組成物為100重量百分比,該過氧化氫的含量為1重量百分比至25重量百分比。 The acidic hydrogen peroxide aqueous solution composition described in item 1 of the scope of patent application, wherein based on the acidic hydrogen peroxide aqueous solution composition is 100 weight percent, the content of the hydrogen peroxide is 1 weight percent to 25 weight percent. 如申請專利範圍第1項所述的酸性過氧化氫水溶液組成物,其中基於該酸性過氧化氫水溶液組成物為 100重量百分比,該過氧化氫的含量為2重量百分比至15重量百分比。 The acidic hydrogen peroxide aqueous solution composition as described in item 1 of the scope of patent application, wherein the acidic hydrogen peroxide aqueous solution composition is based on 100% by weight, the content of the hydrogen peroxide is 2% to 15% by weight. 如申請專利範圍第1項所述的酸性過氧化氫水溶液組成物,其中基於該酸性過氧化氫水溶液組成物為100重量百分比,該酸鹼調整劑的含量為12重量百分比至30重量百分比。 The acidic hydrogen peroxide aqueous solution composition described in item 1 of the scope of patent application, wherein based on the acidic hydrogen peroxide aqueous solution composition is 100 weight percent, the content of the acid-base regulator is 12 weight percent to 30 weight percent. 如申請專利範圍第1項所述的酸性過氧化氫水溶液組成物,其中基於該酸性過氧化氫水溶液組成物為100重量百分比,該酸鹼調整劑的含量為14重量百分比至28重量百分比。 The acidic hydrogen peroxide aqueous solution composition as described in item 1 of the scope of patent application, wherein based on the acidic hydrogen peroxide aqueous solution composition is 100% by weight, the content of the acid-base regulator is 14% by weight to 28% by weight.
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* Cited by examiner, † Cited by third party
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US20090283499A1 (en) * 2003-10-20 2009-11-19 Novellus Systems, Inc. Fabrication of semiconductor interconnect structure
CN107287594A (en) * 2017-06-01 2017-10-24 东莞市达诚显示材料有限公司 A kind of cupro-nickel plural layers etching solution
TW201803969A (en) * 2016-03-24 2018-02-01 Adeka股份有限公司 Etching liquid composition and etching method

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* Cited by examiner, † Cited by third party
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US20090283499A1 (en) * 2003-10-20 2009-11-19 Novellus Systems, Inc. Fabrication of semiconductor interconnect structure
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