TWI737873B - Manufacturing method of optical film - Google Patents

Manufacturing method of optical film Download PDF

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TWI737873B
TWI737873B TW106145410A TW106145410A TWI737873B TW I737873 B TWI737873 B TW I737873B TW 106145410 A TW106145410 A TW 106145410A TW 106145410 A TW106145410 A TW 106145410A TW I737873 B TWI737873 B TW I737873B
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film
peeling
manufacturing
optical
multilayer
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TW106145410A
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TW201823011A (en
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摺出寺浩成
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日商日本瑞翁股份有限公司
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C55/00Shaping by stretching, e.g. drawing through a die; Apparatus therefor
    • B29C55/02Shaping by stretching, e.g. drawing through a die; Apparatus therefor of plates or sheets
    • B29C55/04Shaping by stretching, e.g. drawing through a die; Apparatus therefor of plates or sheets uniaxial, e.g. oblique
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/30Polarising elements
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/13363Birefringent elements, e.g. for optical compensation
    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09FDISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F9/00Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
    • G09F9/30Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00Electroluminescent light sources
    • H05B33/02Details

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Mathematical Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Theoretical Computer Science (AREA)
  • Polarising Elements (AREA)
  • Shaping By String And By Release Of Stress In Plastics And The Like (AREA)
  • Liquid Crystal (AREA)

Abstract

一種光學薄膜之製造方法以及使用其之光學薄膜之偏光板及顯示裝置。前述光學薄膜之製造方法包含提供多層薄膜至剝離處理之剝離步驟,前述多層薄膜係包含由熱塑性樹脂A而成之薄膜(A)及設置於前述薄膜(A)之其中一面或雙面之薄膜(B)之多層薄膜,前述剝離處理包含於溫度Tov(℃)時自前述薄膜(A)以施加沿前述薄膜(A)之厚度方向之力的方式剝離前述薄膜(B),前述溫度Tov與前述薄膜(A)之玻璃轉移溫度TgA(℃)滿足Tov≧TgA之關係,於前述多層薄膜中,於溫度Tov之前述薄膜(A)與前述薄膜(B)之剝離力Pa為0.03N/50mm以上且0.5N/50mm以下。 A manufacturing method of an optical film, a polarizing plate and a display device using the optical film. The manufacturing method of the aforementioned optical film includes a peeling step from providing a multilayer film to a peeling treatment. The multilayer film includes a film (A) made of a thermoplastic resin A and a film provided on one or both sides of the film (A) ( B) For the multilayer film, the peeling treatment includes peeling the film (B) from the film (A) by applying force along the thickness direction of the film (A) at the temperature Tov (°C), and the temperature Tov is the same as the foregoing The glass transition temperature TgA(℃) of the film (A) satisfies the relationship of Tov≧TgA. In the aforementioned multilayer film, the peeling force Pa of the aforementioned film (A) and the aforementioned film (B) at the temperature Tov is 0.03N/50mm or more And 0.5N/50mm or less.

Description

光學薄膜之製造方法 Manufacturing method of optical film

本發明係關於一種光學薄膜之製造方法、偏光板及顯示裝置。 The present invention relates to a manufacturing method of an optical film, a polarizing plate and a display device.

液晶顯示裝置等顯示裝置中,由於光學補償等目的,現正廣泛進行具有相位差之樹脂製光學薄膜的設置。作為將相位差賦予樹脂製薄膜之方法,現正廣泛進行此薄膜之延伸。 In display devices such as liquid crystal display devices, for the purpose of optical compensation, etc., the installation of resin-made optical films with phase difference is now widely carried out. As a method of imparting a phase difference to a resin film, the stretching of this film is currently being widely carried out.

作為如此之光學薄膜,有企求NZ係數Nz滿足0<Nz<1之薄膜的情況,且以0.4<Nz<1之薄膜為佳,且以Nz=0.5之薄膜為更理想的情況。然而,以通常的方法延伸薄膜時,因NZ係數之值會成為小於0之值或大於1之值,而難以獲得0<Nz<1之薄膜。 As such an optical film, there is a case where a film whose NZ coefficient Nz satisfies 0<Nz<1 is sought, and a film with 0.4<Nz<1 is preferred, and a film with Nz=0.5 is more ideal. However, when the film is stretched by the usual method, since the value of the NZ coefficient becomes a value less than 0 or a value greater than 1, it is difficult to obtain a film with 0<Nz<1.

作為獲得0<Nz<1之薄膜的方法,可考慮採用組合多數薄膜之多層薄膜。然而,現正企求以較單純的單層結構實現0<Nz<1之薄膜。 As a method to obtain a film with 0<Nz<1, a multilayer film combining multiple films can be considered. However, a simpler single-layer structure is now being sought to achieve a film with 0<Nz<1.

作為以單層薄膜實現0<Nz<1之薄膜的方法,已知專利文獻1(日本專利公開第H08-207119號公報(對應他國公報:歐洲專利申請公開第0707938號說明書))所記載之方法。專利文獻1中,將收縮薄膜貼合於加工對象之樹脂薄膜,之後令收縮薄膜收縮,藉此令樹脂薄膜收縮,其結果達成0<Nz<1。 As a method for realizing a film of 0<Nz<1 with a single-layer film, the method described in Patent Document 1 (Japanese Patent Publication No. H08-207119 (corresponding to other countries: European Patent Application Publication No. 0707938)) is known . In Patent Document 1, a shrink film is attached to a resin film to be processed, and then the shrink film is shrunk to shrink the resin film. As a result, 0<Nz<1 is achieved.

然而,專利文獻1所記載之方法中,難以控制收縮薄膜之收縮力,且令收縮薄膜收縮之步驟繁雜,而難以簡便製造0<Nz<1之薄膜。However, in the method described in Patent Document 1, it is difficult to control the shrinkage force of the shrink film, and the steps for shrinking the shrink film are complicated, and it is difficult to easily produce a film of 0<Nz<1.

因此,本發明之目的在於提供可輕易製造0<Nz<1之光學薄膜的光學薄膜製造方法。本發明之進一步目的在於提供可輕易製造且具備高度光學補償功能之偏光板,以及提供可輕易製造且呈現高度光學補償之顯示裝置。Therefore, the object of the present invention is to provide an optical film manufacturing method that can easily manufacture an optical film of 0<Nz<1. A further object of the present invention is to provide a polarizing plate that can be easily manufactured and has a high degree of optical compensation, and to provide a display device that can be easily manufactured and exhibits a high degree of optical compensation.

本發明人為了解決前述課題而進行研究。其結果,本發明人發現作為前所未有的光學薄膜之製造方法,利用薄膜之剝離力,藉由沿厚度方向延伸薄膜而可解決此課題。再者,發現藉由使進行沿此厚度方向之延伸的溫度為特定溫度,及使提供於剝離之多層薄膜的特性為特定特性,可進行良好的厚度方向延伸之操作。本發明係基於此發現而完成者。The inventors of the present invention conducted studies in order to solve the aforementioned problems. As a result, the inventors of the present invention found that as an unprecedented manufacturing method of optical films, this problem can be solved by stretching the film in the thickness direction by utilizing the peeling force of the film. Furthermore, it was found that by setting the temperature for stretching in the thickness direction to a specific temperature and the characteristics of the multilayer film to be peeled off as specific characteristics, a good thickness direction stretching operation can be performed. The present invention was completed based on this discovery.

亦即,本發明如下所述。That is, the present invention is as follows.

[1]一種光學薄膜之製造方法,包含於剝離處理提供多層薄膜之剝離步驟;前述多層薄膜係包含由熱塑性樹脂A而成之薄膜(A)及設置於前述薄膜(A)之其中一面或雙面之薄膜(B)之多層薄膜;前述剝離處理包含於溫度Tov(℃)時自前述薄膜(A)以施加沿前述薄膜(A)之厚度方向之力之方式剝離前述薄膜(B);前述溫度Tov與前述薄膜(A)之玻璃轉移溫度TgA(℃)滿足Tov≧TgA之關係;於前述多層薄膜中,於溫度Tov之前述薄膜(A)與前述薄膜(B)之剝離力Pa為0.03 N/50mm以上且0.5 N/50mm以下。[1] A method of manufacturing an optical film, including a peeling step of providing a multilayer film in a peeling process; the multilayer film includes a film (A) made of a thermoplastic resin A and disposed on one or both sides of the film (A) A multilayer film of the film (B) on the side; the peeling treatment includes peeling the film (B) from the film (A) by applying a force along the thickness direction of the film (A) at the temperature Tov (℃); The temperature Tov and the glass transition temperature TgA (℃) of the aforementioned film (A) satisfy the relationship Tov≧TgA; in the aforementioned multilayer film, the peeling force Pa of the aforementioned film (A) and the aforementioned film (B) at the temperature Tov is 0.03 N/50mm or more and 0.5 N/50mm or less.

[2]如記載於[1]之光學薄膜之製造方法,前述熱塑性樹脂A含有含脂環結構聚合物。[2] The method for producing an optical film as described in [1], wherein the thermoplastic resin A contains an alicyclic structure-containing polymer.

[3]如記載於[1]或[2]之光學薄膜之製造方法,更包含沿前述多層薄膜之面內方向延伸前述多層薄膜之延伸步驟。[3] The method for manufacturing an optical film as described in [1] or [2], further comprising a stretching step of extending the multilayer film in the in-plane direction of the multilayer film.

[4]一種偏光板,具備藉由如記載於[1]~[3]之任一項之製造方法所製造之光學薄膜及偏光件。[4] A polarizing plate provided with an optical film and a polarizing member manufactured by the manufacturing method described in any one of [1] to [3].

[5]一種顯示裝置,具備藉由如記載於[1]~[3]之任一項之製造方法所製造之光學薄膜。[5] A display device including an optical film manufactured by the manufacturing method described in any one of [1] to [3].

若根據本發明,則提供可輕易製造0<Nz<1之光學薄膜的光學薄膜之製造方法;可輕易製造且具備高度光學補償功能之偏光板;以及可輕易製造且呈現高度光學補償之顯示裝置。According to the present invention, there is provided a method for manufacturing an optical film that can easily manufacture an optical film with 0<Nz<1; a polarizing plate that can be easily manufactured and has a high degree of optical compensation; and a display device that can be easily manufactured and exhibits a high degree of optical compensation .

以下將針對本發明揭示實施型態及例示物以詳細說明。但是,本發明並非限定於以下所揭示之實施型態及例示物,在未脫離本發明之申請專利範圍及其均等範圍之範圍中得任意變更並實施。Hereinafter, the implementation modes and examples of the present invention will be described in detail. However, the present invention is not limited to the embodiments and exemplified materials disclosed below, and can be arbitrarily changed and implemented without departing from the scope of the present invention and its equivalent scope.

於以下說明中,除非另有註明,否則薄膜之面內延遲(retardation)Re係由Re=(nx−ny)×d所表示之值,除非另有註明,否則薄膜之厚度方向之延遲Rth係由Rth={(nx+ny)/2−nz}×d所表示之值。而且,薄膜之NZ係數Nz係由Nz=(nx−nz)/(nx−ny)所表示之值,亦得由Nz=(Rth/Re)+0.5所表示。於此,nx表示薄膜之面內方向,即垂直於薄膜之厚度方向之方向上賦予最大折射率之方向的折射率。ny表示前述面內方向上正交於nx方向之方向的折射率。nz表示厚度方向的折射率。d表示薄膜之厚度。除非另有註明,否則面內延遲之量測波長為590 nm。In the following description, unless otherwise noted, the in-plane retardation Re of the film is the value represented by Re=(nx−ny)×d. Unless otherwise noted, the retardation Rth in the thickness direction of the film is The value represented by Rth={(nx+ny)/2−nz}×d. Moreover, the NZ coefficient Nz of the film is a value represented by Nz=(nx−nz)/(nx−ny), which can also be represented by Nz=(Rth/Re)+0.5. Here, nx represents the in-plane direction of the film, that is, the refractive index in the direction perpendicular to the thickness direction of the film that gives the maximum refractive index. ny represents the refractive index in the direction orthogonal to the nx direction in the aforementioned in-plane direction. nz represents the refractive index in the thickness direction. d represents the thickness of the film. Unless otherwise noted, the measurement wavelength of the in-plane retardation is 590 nm.

於以下說明中,除非另有註明,否則所謂「偏光板」不僅為剛直的組件,亦可包含例如樹脂製之薄膜般具有可撓性的組件。In the following description, unless otherwise noted, the so-called "polarizing plate" is not only a rigid component, but also a flexible component such as a resin film.

於以下說明中,所謂「長條狀」之薄膜,係指相對於幅寬具有5倍以上之長度的薄膜,以具有10倍或以上之長度為佳,具體係指具有收捲成輥狀以儲存或運輸程度之長度之薄膜。長條狀之薄膜之長度上限並無特別限制,得為例如相對於幅寬之10萬倍以下。In the following description, the so-called "long strip" film refers to a film having a length of 5 times or more relative to the width, preferably a length of 10 times or more, and specifically refers to a film that is wound into a roll shape. The length of the film for storage or transportation. The upper limit of the length of the long film is not particularly limited, and may be, for example, 100,000 times or less relative to the width of the film.

於該技術領域中,所謂薄膜之「延伸」,通常意謂以令薄膜之形狀沿薄膜之面內方向之一個以上的方向擴張而令薄膜變形之操作。然而於本申請中,薄膜之「延伸」並非限制於此,而亦包含以令薄膜之形狀沿面內方向以外的方向(非平行於薄膜之面方向的方向,例如厚度方向等)擴張而令薄膜變形之操作。於以下說明中,於上下文顯知之情況下,通常將以令薄膜之形狀沿薄膜之面內方向之一個以上的方向擴張而令薄膜變形之操作簡稱為「延伸」。另一方面,與如此通常之「延伸」有所區別,而將以令薄膜之形狀沿面內方向以外的方向擴張而令薄膜變形之處理稱為「厚度方向延伸」,且將經過如此處理之薄膜稱為「厚度方向延伸薄膜」。In this technical field, the so-called "stretching" of the film generally means the operation of deforming the film by expanding the shape of the film in more than one direction of the in-plane direction of the film. However, in this application, the "extension" of the film is not limited to this, but also includes expanding the shape of the film in directions other than the in-plane direction (directions that are not parallel to the surface direction of the film, such as the thickness direction, etc.). Deformation operation. In the following description, when the context is clear, the operation of deforming the film by expanding the shape of the film in more than one direction of the in-plane direction of the film is generally referred to as "stretching". On the other hand, it is different from the usual "stretching", and the process of deforming the film by expanding the shape of the film in a direction other than the in-plane direction is called "thickness-direction stretching", and the film that has been processed in this way It is called "thickness-direction stretched film".

[1.光學薄膜之製造方法][1. Manufacturing method of optical film]

本發明之光學薄膜之製造方法,包含提供特定多層薄膜於特定剝離處理之剝離步驟。The manufacturing method of the optical film of the present invention includes a peeling step of providing a specific multilayer film in a specific peeling treatment.

[1.1.多層薄膜][1.1. Multilayer film]

提供於剝離步驟之多層薄膜係包含由熱塑性樹脂A而成之薄膜(A)及設置於前述薄膜(A)之其中一面或雙面之薄膜(B)之多層薄膜。The multilayer film provided in the peeling step includes a film (A) made of a thermoplastic resin A and a film (B) provided on one or both sides of the aforementioned film (A).

[1.1.1.薄膜(A)][1.1.1. Film (A)]

構成薄膜(A)之熱塑性樹脂A並未特別受到限定,得賦予作為光學薄膜之期望物性,且得適當選擇採用包含各種聚合物之樹脂。The thermoplastic resin A constituting the film (A) is not particularly limited, and the desired physical properties as an optical film may be imparted, and resins containing various polymers may be appropriately selected and used.

作為熱塑性樹脂A所包含之聚合物之佳例,可列舉含脂環結構聚合物。As a preferable example of the polymer contained in the thermoplastic resin A, an alicyclic structure-containing polymer can be cited.

含脂環結構聚合物係重複單元中具有脂環結構之聚合物,可使用主鏈中含有脂環結構之聚合物及於側鏈含有脂環結構之聚合物之任一者。含脂環結構聚合物得包含結晶性樹脂及非晶性聚合物。就獲得本發明之期望效果的觀點及製造成本的觀點而言,以非晶性含脂環結構聚合物為佳。The alicyclic structure-containing polymer is a polymer having an alicyclic structure in the repeating unit, and any one of a polymer containing an alicyclic structure in the main chain and a polymer containing an alicyclic structure in the side chain can be used. The alicyclic structure-containing polymer may include crystalline resin and amorphous polymer. From the viewpoint of obtaining the desired effect of the present invention and the viewpoint of production cost, an amorphous alicyclic structure-containing polymer is preferred.

作為非晶性含脂環結構聚合物所具有之脂環結構,可列舉例如:環烷烴結構、環烯烴結構等,但就熱穩定性等觀點而言,以環烷烴結構為佳。Examples of the alicyclic structure possessed by the amorphous alicyclic structure-containing polymer include a cycloalkane structure and a cycloalkene structure, but from the viewpoint of thermal stability and the like, a cycloalkane structure is preferred.

構成一個脂環結構之重複單元的碳數並無特別限制,但通常為4個~30個,以5個~20個為佳,以6個~15個為較佳。The number of carbons in the repeating unit constituting an alicyclic structure is not particularly limited, but is usually 4 to 30, preferably 5 to 20, and more preferably 6 to 15.

含脂環結構聚合物中之具有脂環結構的重複單元之比例可視使用目的而適當選擇,但通常為50重量%以上,以70重量%以上為佳,以90重量%以上為較佳。將具有脂環結構之重複單元定為如此之多,可提升基材薄膜之耐熱性。The proportion of the alicyclic structure-containing repeating unit in the alicyclic structure-containing polymer may be appropriately selected depending on the purpose of use, but is usually 50% by weight or more, preferably 70% by weight or more, and more preferably 90% by weight or more. Setting the repeating unit with alicyclic structure to such a large number can improve the heat resistance of the base film.

含脂環結構聚合物具體而言可列舉:(1)降𦯉烯(norbornene)聚合物、(2)單環的環烯烴聚合物、(3)環狀共軛二烯聚合物、(4)乙烯基脂環烴聚合物,及此些之氫化物等。其中,就透明性及成形性的觀點而言,以降𦯉烯聚合物及其氫化物為較佳。Specific examples of the alicyclic structure-containing polymer include: (1) norbornene polymer, (2) monocyclic cycloolefin polymer, (3) cyclic conjugated diene polymer, (4) Vinyl alicyclic hydrocarbon polymers, and these hydrides, etc. Among them, from the viewpoints of transparency and moldability, norene polymers and their hydrogenated products are preferred.

作為降𦯉烯聚合物,可列舉例如:降𦯉烯單體之開環聚合物、與能與降𦯉烯單體開環共聚之其他單體所形成之開環共聚物及此些之氫化物;降𦯉烯單體加成聚合物、與能與降𦯉烯單體共聚之其他單體所形成之加成共聚物等。其中,就透明性之觀點而言,尤以降𦯉烯單體之開環聚合物之氫化物為佳。Examples of norrene polymers include: ring-opening polymers of norrene monomers, ring-opening copolymers formed with other monomers capable of ring-opening copolymerization with norrene monomers, and hydrogenated products of these ;Norene monomer addition polymer, addition copolymer formed with other monomers that can be copolymerized with norene monomer, etc. Among them, from the viewpoint of transparency, hydrogenated products of ring-opening polymers of norene monomers are particularly preferred.

作為上述之含脂環結構聚合物之例,可列舉例如日本專利公開第2002-321302號公報所揭示之聚合物。As an example of the aforementioned alicyclic structure-containing polymer, for example, the polymer disclosed in Japanese Patent Publication No. 2002-321302 can be cited.

而且,作為結晶性含脂環結構聚合物之例,可列舉日本專利公開第2016-26909號公報所揭示之聚合物。Furthermore, as an example of a crystalline alicyclic structure-containing polymer, the polymer disclosed in Japanese Patent Publication No. 2016-26909 can be cited.

作為熱塑性樹脂A所包含之聚合物之其他例,可列舉三乙醯纖維素(triacetyl cellulose)、聚苯乙烯系聚合物等廣泛使用之聚合物。特別是聚苯乙烯系聚合物中,尤以得採用具有對排(syndiotactic)結構之聚苯乙烯系聚合物為佳。作為具有對排結構之聚苯乙烯系聚合物之例,可列舉日本專利公開第2014-186273號公報所揭示之聚合物。As other examples of polymers included in the thermoplastic resin A, widely used polymers such as triacetyl cellulose and polystyrene polymers can be cited. In particular, among polystyrene polymers, it is particularly preferable to use a polystyrene polymer having a syndiotactic structure. As an example of a polystyrene-based polymer having a parallel structure, a polymer disclosed in Japanese Patent Publication No. 2014-186273 can be cited.

熱塑性樹脂A所包含之聚合物之重量平均分子量並未特別受到限定,但以10000以上為佳,以20000以上為較佳,另以300000以下為佳,以250000以下為較佳。重量平均分子量為於此範圍內之情況下,可輕易獲得機械強度及成形加工性優異之熱塑性樹脂A。The weight average molecular weight of the polymer contained in the thermoplastic resin A is not particularly limited, but is preferably 10,000 or more, more preferably 20,000 or more, more preferably 300,000 or less, and more preferably 250,000 or less. When the weight average molecular weight is within this range, thermoplastic resin A with excellent mechanical strength and moldability can be easily obtained.

熱塑性樹脂A雖亦可僅由以上述等物作為主成分之聚合物而成,但只要不顯著損害本發明之效果,亦可包含任意的摻合劑。樹脂中,作為主成分之聚合物之比例以70重量%以上為佳,以80重量%以上為較佳。Although the thermoplastic resin A may be composed only of a polymer containing the above-mentioned substances as a main component, it may contain any admixture as long as the effect of the present invention is not significantly impaired. In the resin, the ratio of the polymer as the main component is preferably 70% by weight or more, and more preferably 80% by weight or more.

於各式各樣的市售商品中,得適當選擇採用具有期望特性者作為熱塑性樹脂A。作為此市售品之例,可列舉:商品名「ZEONOR」(日本瑞翁股份有限公司製)、商品名「TOPAS」(POLYPLASTICS股份有限公司製)及商品名「ARTON」(JSR股份有限公司製)之商品群。Among various commercially available products, the thermoplastic resin A should be appropriately selected and used as the thermoplastic resin A having the desired characteristics. As an example of this commercially available product, the product name "ZEONOR" (manufactured by Zeon Corporation), the product name "TOPAS" (manufactured by POLYPLASTICS Co., Ltd.), and the product name "ARTON" (manufactured by JSR Co., Ltd.) ) Of the product group.

熱塑性樹脂A之玻璃轉移溫度TgA以100℃以上為佳,以110℃以上為較佳,另以180℃以下為佳,以170℃以下為較佳。TgA為於此範圍之情況下,可順利進行厚度方向延伸等處理,且可輕易獲得具有期望光學體特性之光學薄膜。The glass transition temperature TgA of the thermoplastic resin A is preferably 100°C or higher, preferably 110°C or higher, further preferably 180°C or lower, and preferably 170°C or lower. When TgA is in this range, processing such as stretching in the thickness direction can be smoothly performed, and an optical film with desired optical properties can be easily obtained.

薄膜(A)之厚度以10 μm以上為佳,以20 μm以上為較佳,另以200 μm以下為佳,以190 μm以下為較佳。薄膜(A)之厚度為於此範圍之情況下,可順利進行厚度方向延伸等處理,而可輕易獲得具有期望光學體特性之光學薄膜。The thickness of the film (A) is preferably 10 μm or more, more preferably 20 μm or more, more preferably 200 μm or less, and more preferably 190 μm or less. When the thickness of the film (A) is within this range, processing such as stretching in the thickness direction can be smoothly performed, and an optical film with desired optical properties can be easily obtained.

製造薄膜(A)之方法並未特別受到限定而得採用任意製造方法。舉例而言,藉由將熱塑性樹脂A成形為期望形狀,得製造薄膜(A)。作為用以成形樹脂A之成形方法之佳例,可列舉擠製成形。藉由進行擠製成形,可有效率地製造具有期望尺寸之薄膜(A)。The method of manufacturing the film (A) is not particularly limited, and any manufacturing method may be adopted. For example, by molding the thermoplastic resin A into a desired shape, a film (A) can be produced. As a good example of the molding method for molding the resin A, extrusion molding can be cited. By performing extrusion molding, the film (A) with the desired size can be manufactured efficiently.

[1.1.2.薄膜(B)][1.1.2. Film (B)]

作為構成薄膜(B)之材料並未特別受到限定,得適當選擇採用包含適用於本發明之實施之各種聚合物的樹脂。於以下內容中,此樹脂簡稱為「樹脂B」。The material constituting the film (B) is not particularly limited, and a resin containing various polymers suitable for the implementation of the present invention can be appropriately selected and used. In the following, this resin is referred to as "Resin B" for short.

作為樹脂B,得使用熱塑性樹脂。作為樹脂B所包含之聚合物之例及其分子量之較佳範圍,得列舉與於上所列舉作為熱塑性樹脂A所包含之含脂環結構聚合物及其他聚合物之例相同之例。As the resin B, a thermoplastic resin must be used. As an example of the polymer contained in the resin B and the preferable range of its molecular weight, the same examples as the examples of the alicyclic structure-containing polymer contained in the thermoplastic resin A and other polymers listed above can be cited.

作為樹脂B所包含之含脂環結構聚合物之其他例,可列舉:包含具有含環烴基化合物氫化物單元[I]之2個以上的聚合物嵌段與具有鏈烴化合物氫化物單元[II]或單元[I]及單元[II]之組合之1個以上的聚合物嵌段之氫化嵌段共聚物。作為此氫化嵌段共聚物之具體例,可列舉例如國際專利公開第WO2016/152871號所揭示之聚合物。As another example of the alicyclic structure-containing polymer contained in the resin B, there may be mentioned: a polymer block containing two or more hydride units of a cyclic hydrocarbon group-containing compound [I] and a hydride unit of a chain hydrocarbon compound [II] ] Or a combination of unit [I] and unit [II], a hydrogenated block copolymer of one or more polymer blocks. As a specific example of this hydrogenated block copolymer, for example, the polymer disclosed in International Patent Publication No. WO2016/152871 can be cited.

作為樹脂B所包含之聚合物之其他例,可列舉聚丙烯、(甲基)丙烯酸酯聚合物、聚醯亞胺等廣泛使用之聚合物。於市售商品中,得適當選擇採用具有期望特性者作為樹脂B。作為此市售品之例,可列舉:自黏性延伸聚丙烯薄膜(例如FUTAMURA化學股份有限公司製,商品名「FSA 010M #30」)。As other examples of polymers contained in resin B, widely used polymers such as polypropylene, (meth)acrylate polymers, and polyimides can be cited. Among commercially available products, resin B should be appropriately selected and used with desired characteristics. As an example of this commercially available product, a self-adhesive stretched polypropylene film (for example, manufactured by Futamura Chemical Co., Ltd., trade name "FSA 010M #30") can be cited.

薄膜(B)之厚度以10 μm以上為佳,以15 μm以上為較佳,另以100 μm以下為佳,以90 μm以下為較佳。薄膜(B)之厚度為於此範圍之情況下,可順利進行厚度方向延伸等處理,且可輕易獲得具有期望光學體特性之光學薄膜。The thickness of the film (B) is preferably 10 μm or more, preferably 15 μm or more, more preferably 100 μm or less, and more preferably 90 μm or less. When the thickness of the film (B) is within this range, processing such as stretching in the thickness direction can be smoothly performed, and an optical film with desired optical properties can be easily obtained.

製造薄膜(B)之方法並未特別受到限定而得採用任意製造方法。舉例而言,藉由將樹脂B成形為期望形狀,得製造薄膜(B)。作為用以成形樹脂B之成形方法之佳例,可列舉擠製成形。藉由進行擠製成形,可有效率地製造具有期望尺寸之薄膜(B)。The method of manufacturing the film (B) is not particularly limited, and any manufacturing method may be adopted. For example, by molding the resin B into a desired shape, a film (B) can be produced. As a good example of the molding method for molding the resin B, extrusion molding can be cited. By performing extrusion molding, the film (B) with the desired size can be efficiently manufactured.

[1.1.3.其他層體][1.1.3. Other layers]

多層薄膜除了薄膜(A)及薄膜(B)以外,還得包含任意層體。例如得包含黏合劑層。作為構成黏合劑層之黏合劑,得使用市售之各種黏合劑。具體而言,得使用包含丙烯酸聚合物作為主成分之聚合物之黏合劑。舉例而言,自市售之具有黏合劑層之薄膜(例如藤森工業製之「MASTACK系列」)轉印黏合劑層於薄膜(A)或薄膜(B),得將此利用作為多層薄膜中之黏合劑層。In addition to the film (A) and the film (B), the multilayer film must contain any layer. For example, an adhesive layer must be included. As the adhesive constituting the adhesive layer, various commercially available adhesives can be used. Specifically, it is necessary to use an adhesive containing an acrylic polymer as a polymer as the main component. For example, a commercially available film with an adhesive layer (such as "MASTACK series" manufactured by Fujimori Kogyo) transfers the adhesive layer to the film (A) or film (B), and this can be used as a multi-layer film. Adhesive layer.

多層薄膜於薄膜(A)及(B)之間具有黏合劑層之情況中,以此黏合劑層之對於薄膜(B)之黏合力高於其對於薄膜(A)之黏合力為佳。藉由具有如此之黏合力差異,可減少對於光學薄膜之殘膠,而可輕易獲得高品質的光學薄膜。此黏合力差異得藉由適當選擇黏合劑層之材質或視需求而於薄膜(A)及(B)之表面施加適當的表面處理而獲得。In the case of a multilayer film with an adhesive layer between the films (A) and (B), it is better that the adhesive layer's adhesion to the film (B) is higher than its adhesion to the film (A). By having such a difference in adhesion, the residual glue for the optical film can be reduced, and high-quality optical film can be easily obtained. This difference in adhesion can be obtained by appropriately selecting the material of the adhesive layer or applying appropriate surface treatment on the surfaces of the films (A) and (B) as required.

[1.1.4.剝離力][1.1.4. Peeling force]

於本發明之製造方法中,使用於溫度Tov之薄膜(A)與薄膜(B)之剝離力Pa為特定範圍內之值者作為多層薄膜。於此,溫度Tov係於本發明之製造方法之剝離步驟中的薄膜溫度。In the manufacturing method of the present invention, the film (A) and the film (B) used at the temperature Tov whose peeling force Pa is within a specific range is used as a multilayer film. Here, the temperature Tov is the film temperature in the peeling step of the manufacturing method of the present invention.

剝離力Pa為0.03 N/50mm以上,以0.035 N/50mm以上為佳,以0.04 N/50mm以上為較佳,另為0.5 N/50mm以下,以0.4 N/50mm以下為佳,以0.3 N/50mm以下為較佳。藉由剝離力為於此範圍內,可抑制至剝離步驟之步驟中之皺褶產生,可抑制於剝離步驟前之階段之薄膜(B)的非意圖剝離,且可達成於薄膜(A)之表面的良好剝離,而可順利製造良好品質之光學薄膜。The peeling force Pa is 0.03 N/50mm or more, preferably 0.035 N/50mm or more, preferably 0.04 N/50mm or more, and 0.5 N/50mm or less, preferably 0.4 N/50mm or less, preferably 0.3 N/ It is preferably 50 mm or less. When the peeling force is within this range, the generation of wrinkles in the step of the peeling step can be suppressed, and the unintentional peeling of the film (B) at the stage before the peeling step can be suppressed, and it can be achieved in the film (A). The surface peels well, and the optical film of good quality can be manufactured smoothly.

剝離力Pa得藉由進行關於多層薄膜之180º剝離試驗而求得。180º剝離試驗中,得將多層薄膜切出縱向方向×幅寬方向=300 mm×50 mm之切片,置入附有恆溫恆濕槽之拉伸試驗機(例如INSTRON公司製之「5564型」),於溫度Tov時實施。具體而言,以量測裝置之一側之夾頭(chuck)握持薄膜(A),以另一側之夾頭握持薄膜(B),於拉伸速度300 mm/min之條件下而得實施剝離試驗。The peeling force Pa can be obtained by performing a 180º peeling test on the multilayer film. In the 180º peel test, the multi-layer film must be cut into slices in the longitudinal direction × width direction = 300 mm × 50 mm, and placed in a tensile testing machine with a constant temperature and humidity chamber (for example, "5564" manufactured by INSTRON) , Implemented at the temperature Tov. Specifically, the film (A) is held by the chuck on one side of the measuring device, and the film (B) is held by the chuck on the other side, and the drawing speed is 300 mm/min. Have to implement a peel test.

[1.1.5.多層薄膜之製備方法][1.1.5. Preparation method of multilayer film]

製備提供於本發明之製造方法的多層薄膜之方法,並未特別受到限定,得採用任意方法。此調製得例如藉由貼合薄膜(A)與薄膜(B)而進行。於貼合之前,得視需求而對薄膜(A)及/或薄膜(B)進行電暈(corona)處理等表面處理。而且,於貼合之前,得視需求而於薄膜(A)及/或薄膜(B)之表面形成黏合劑層,且經由此黏合劑層而進行貼合。得藉由對齊縱向方向以輥對輥貼合長條狀薄膜(A)與長條狀薄膜(B)而進行貼合。The method for preparing the multilayer film provided in the manufacturing method of the present invention is not particularly limited, and any method may be adopted. This preparation is performed, for example, by bonding the film (A) and the film (B). Before lamination, the film (A) and/or film (B) may be subjected to surface treatment such as corona treatment as required. Furthermore, before lamination, an adhesive layer may be formed on the surface of the film (A) and/or the film (B) as required, and the adhesive layer may be used for lamination. The long film (A) and the long film (B) have to be laminated by aligning the longitudinal direction and laminating the long film (A) and the long film (B) by roll-to-roll.

[1.2.剝離步驟][1.2. Peeling steps]

本發明之製造方法中之剝離步驟中,將多層薄膜提供於剝離處理。剝離處理包含自薄膜(A)剝離薄膜(B)之動作。藉由進行此剝離處理,可沿厚度方向對薄膜(A)施加牽引力,其結果可達成薄膜(A)之厚度方向延伸。於多層薄膜具有多層之薄膜(B)的情況下,多層之薄膜(B)通常同時剝離。In the peeling step in the manufacturing method of the present invention, the multilayer film is provided for peeling treatment. The peeling treatment includes the action of peeling the film (B) from the film (A). By performing this peeling treatment, traction can be applied to the film (A) in the thickness direction, and as a result, the film (A) can be stretched in the thickness direction. In the case of the multi-layer film (B), the multi-layer film (B) is usually peeled off at the same time.

圖1係概略表示本發明之製造方法中進行剝離步驟之剝離裝置及使用該裝置之剝離步驟的操作之一例的側視圖。於圖1中,沿箭號A11方向運送長條狀多層薄膜100,之後於剝離區域P中提供給剝離步驟。FIG. 1 is a side view schematically showing an example of the peeling device for performing the peeling step in the manufacturing method of the present invention and the operation of the peeling step using the device. In FIG. 1, the long multi-layer film 100 is transported in the direction of the arrow A11, and then provided in the peeling area P for the peeling step.

多層薄膜100包含薄膜(A)131、設置於薄膜(A)131之其中一面之薄膜(B)111、設置於薄膜(A)131之另一面之薄膜(B)112。多層薄膜100更包含介於薄膜(A)及(B)之間的黏合劑層121及122。多層薄膜中之薄膜(A)131之厚度由箭號A14表示。The multilayer film 100 includes a film (A) 131, a film (B) 111 disposed on one side of the film (A) 131, and a film (B) 112 disposed on the other side of the film (A) 131. The multilayer film 100 further includes adhesive layers 121 and 122 between the films (A) and (B). The thickness of the film (A) 131 in the multilayer film is indicated by the arrow A14.

於剝離步驟中之剝離處理,得藉由沿與所運送之薄膜(A)之面內方向相異之方向牽引薄膜(B)而進行。於圖1之例中,於剝離區域P內沿薄膜(B)111之縱向方向牽引薄膜(B)111往箭號A12,且沿薄膜(B)112之縱向方向牽引薄膜(B)112往箭號A13。藉此,自多層薄膜之運送方向之下游朝向上游進行剝離,而可以沿薄膜(A)131之厚度方向施加力之方式剝離薄膜(B)111及112。於此所謂之薄膜厚度方向之力,為非平行於薄膜面內方向之方向的力,以接近垂直於薄膜之面之方向的方向為佳。如此剝離步驟之結果,可獲得經過厚度方向延伸之光學薄膜132。而且,藉由平衡箭號A12方向之牽引力與箭號A13方向之牽引力,可於不賦予多層薄膜100及光學薄膜132之非期望面內方向張力的情形下,進行此些牽引。The peeling treatment in the peeling step can be performed by pulling the film (B) in a direction different from the in-plane direction of the transported film (A). In the example of FIG. 1, the film (B) 111 is drawn along the longitudinal direction of the film (B) 111 to arrow A12 in the peeling area P, and the film (B) 112 is drawn along the longitudinal direction of the film (B) 112 to arrow A12. No. A13. Thereby, peeling is performed from downstream to upstream in the conveying direction of the multilayer film, and the films (B) 111 and 112 can be peeled off by applying force in the thickness direction of the film (A) 131. The so-called force in the thickness direction of the film is a force in a direction that is not parallel to the in-plane direction of the film, preferably a direction close to the direction perpendicular to the surface of the film. As a result of such a peeling step, an optical film 132 extending in the thickness direction can be obtained. Moreover, by balancing the traction force in the direction of the arrow A12 and the traction force in the direction of the arrow A13, such traction can be performed without imparting undesirable in-plane tension to the multilayer film 100 and the optical film 132.

於圖1之例中,光學薄膜132之厚度由箭號A15表示。由於厚度方向延伸之結果,光學薄膜132具有比多層薄膜100中之薄膜(A)131更厚之厚度。然而本發明之製造方法並非以此為限。舉例而言,剝離步驟中亦伴隨沿面內方向延伸之情況,光學薄膜之厚度雖並非必定成為比薄膜(A)之厚度更厚,即使於如此之情況中,亦具有可能獲得0<Nz<1之光學薄膜之情況。In the example of FIG. 1, the thickness of the optical film 132 is indicated by an arrow A15. As a result of the extension in the thickness direction, the optical film 132 has a thicker thickness than the film (A) 131 in the multilayer film 100. However, the manufacturing method of the present invention is not limited to this. For example, the peeling step is accompanied by the extension in the in-plane direction. Although the thickness of the optical film is not necessarily thicker than the thickness of the film (A), even in this case, it is possible to obtain 0<Nz<1 The situation of the optical film.

由剝離區域P中之剝離步驟之結果而獲得之光學薄膜132係進一步沿箭號A11運送。多層薄膜100及光學薄膜132以由剝離區域上游之軋輥151及152以及剝離區域下游之軋輥161及162握持之狀態運送。藉由適當調整此些軋輥之圓周速率而得調整運送速度。The optical film 132 obtained as a result of the peeling step in the peeling area P is further transported along the arrow A11. The multilayer film 100 and the optical film 132 are conveyed in a state of being held by the rollers 151 and 152 at the upstream of the peeling area and the rollers 161 and 162 at the downstream of the peeling area. The conveying speed can be adjusted by appropriately adjusting the circumferential velocity of these rolls.

而且,視需求而得將下游軋輥之周速調整為比上游軋輥之周速更快。藉由進行此調整而可對於多層薄膜100及光學薄膜132賦予期望張力。若有需求,則可藉由調整此張力而隨剝離步驟進行沿薄膜縱向方向之延伸步驟。再者,亦可視需求於剝離步驟的同時,或者於剝離區域P之上游或下游中,進行沿薄膜面內任意方向之延伸。Moreover, the peripheral speed of the downstream rolls may be adjusted to be faster than the peripheral speed of the upstream rolls according to demand. By performing this adjustment, desired tension can be imparted to the multilayer film 100 and the optical film 132. If necessary, the stretching step along the longitudinal direction of the film can be performed along with the peeling step by adjusting the tension. Furthermore, depending on the needs, it can also be extended in any direction in the film surface at the same time as the peeling step, or in the upstream or downstream of the peeling area P.

本發明之光學薄膜之製造方法中,進行厚度方向延伸之外還進行面內方向延伸的情況下之延伸倍率,得按照所企求賦予於光學薄膜之期望光學性能而適當調整。具體延伸倍率以1倍以上為佳,以1.01倍以上為較佳,另以2倍以下為佳,以1.8倍以下為較佳。面內方向延伸倍率為此範圍之情況下,可輕易獲得期望光學性能。In the manufacturing method of the optical film of the present invention, the stretching magnification in the case of stretching in the in-plane direction in addition to the thickness direction stretching can be appropriately adjusted in accordance with the desired optical performance desired to be imparted to the optical film. The specific stretching ratio is preferably 1 time or more, preferably 1.01 times or more, further preferably 2 times or less, and more preferably 1.8 times or less. When the stretching magnification in the in-plane direction is in this range, the desired optical performance can be easily obtained.

於剝離裝置中,連續進行關於長條狀多層薄膜之剝離步驟之情況下,藉由平衡多層薄膜之運送速度與剝離速度,而可將剝離區域P設定於剝離裝置中之某一位置。於此情況,多層薄膜之運送速度成為剝離速度。剝離速度得按照所企求賦予於光學薄膜之期望光學性能而適當調整。具體剝離速度以1 m/min以上為佳,以2 m/min以上為較佳,另以50 m/min以下為佳,以40 m/min以下為較佳。剝離速度為此範圍之情況下,可輕易獲得期望光學性能。In the peeling device, when the peeling step of the long multi-layer film is continuously performed, the peeling area P can be set at a certain position in the peeling device by balancing the transport speed and the peeling speed of the multilayer film. In this case, the transport speed of the multilayer film becomes the peeling speed. The peeling speed should be adjusted appropriately in accordance with the desired optical properties that are desired to be imparted to the optical film. The specific peeling speed is preferably 1 m/min or more, preferably 2 m/min or more, more preferably 50 m/min or less, and preferably 40 m/min or less. When the peeling speed is within this range, the desired optical performance can be easily obtained.

本發明之光學薄膜之製造方法中,於溫度Tov(℃)進行剝離步驟。溫度Tov與薄膜(A)之玻璃轉移溫度TgA(℃)滿足Tov≧TgA之關係。Tov以(TgA+3)℃以上為佳,以(TgA+5)℃以上為較佳。藉由將Tov調整於此範圍,可對於光學薄膜輕易賦予期望NZ係數等光學特性。Tov之上限並未特別受到限定,但得定為例如(TgA+40)℃以下。剝離步驟中之溫度Tov,係於剝離裝置中,藉由以適當加熱裝置加熱,而得調整圍繞包含剝離區域之區域的烘箱(圖未示)內之溫度。In the manufacturing method of the optical film of the present invention, the peeling step is performed at the temperature Tov (°C). The temperature Tov and the glass transition temperature TgA (℃) of the film (A) satisfy the relationship Tov≧TgA. Tov is preferably (TgA+3)°C or higher, preferably (TgA+5)°C or higher. By adjusting the Tov in this range, the optical film can be easily given the desired NZ coefficient and other optical properties. The upper limit of Tov is not particularly limited, but may be set to (TgA+40)°C or lower, for example. The temperature Tov in the peeling step is in the peeling device. By heating with a suitable heating device, the temperature in the oven (not shown) surrounding the area containing the peeling area can be adjusted.

圖2係概略表示本發明之製造方法中進行剝離步驟之剝離裝置及使用該裝置之剝離步驟的操作之另一例的側視圖。於圖2中,沿箭號A21方向運送長條狀多層薄膜200,之後於剝離區域P中提供給剝離步驟。多層薄膜200雖包含薄膜(A)231、設置於薄膜(A)231之其中一面之薄膜(B)211,但於薄膜(A)231之另一面並未設置薄膜(B)。多層薄膜200更包含介於薄膜(A)及(B)之間的黏合劑層221。多層薄膜中之薄膜(A)231之厚度由箭號A24表示。2 is a side view schematically showing another example of the peeling device for performing the peeling step in the manufacturing method of the present invention and another example of the operation of the peeling step using the device. In FIG. 2, the long multi-layer film 200 is transported along the arrow A21 direction, and then provided in the peeling area P for the peeling step. Although the multilayer film 200 includes the film (A) 231 and the film (B) 211 provided on one side of the film (A) 231, the film (B) is not provided on the other side of the film (A) 231. The multilayer film 200 further includes an adhesive layer 221 between the films (A) and (B). The thickness of the film (A) 231 in the multilayer film is indicated by the arrow A24.

於此例中,因多層薄膜200僅於其中一面具有薄膜(B)211,故於剝離步驟中之剝離處理,係藉由沿與所運送之薄膜(A)之面內方向相異之方向即箭號A22之方向牽引此薄膜(B)211而進行。因此,藉由剝離區域上游之軋輥151及152以及剝離區域下游之軋輥161及162,對於多層薄膜200及剝離步驟後之光學薄膜232賦予張力,而藉由此張力對抗薄膜(B)211之牽引。如此剝離步驟之結果,可令薄膜(A)231沿厚度方向延伸而獲得光學薄膜232。光學薄膜232具有比薄膜(A)231更厚且由箭號A25表示之厚度。In this example, since the multilayer film 200 only has the film (B) 211 on one side, the peeling process in the peeling step is performed in a direction different from the in-plane direction of the transported film (A). Pull this film (B) 211 in the direction of arrow A22. Therefore, by the rollers 151 and 152 at the upstream of the peeling zone and the rollers 161 and 162 at the downstream of the peeling zone, tension is applied to the multilayer film 200 and the optical film 232 after the peeling step, and this tension resists the pulling of the film (B) 211 . As a result of the peeling step, the film (A) 231 can be extended in the thickness direction to obtain the optical film 232. The optical film 232 has a thickness that is thicker than the film (A) 231 and is indicated by an arrow A25.

[2.光學薄膜][2. Optical film]

若根據本發明之製造方法,可輕易製造其NZ係數Nz為0<Nz<1之光學薄膜。Nz以0.4<Nz<1為較佳,理想為Nz=0.5。具有此NZ係數之光學薄膜係難以藉由以通常沿面內方向之薄膜延伸而製造,但得有效用於顯示裝置之光學補償等目的。因此,本發明之製造方法由可輕易製造出製造困難且有效用之製品之觀點而言,發揮有高度效果。According to the manufacturing method of the present invention, an optical film whose NZ coefficient Nz is 0<Nz<1 can be easily manufactured. Nz is preferably 0.4<Nz<1, ideally Nz=0.5. The optical film with this NZ coefficient is difficult to be manufactured by stretching the film in the usual in-plane direction, but it can be effectively used for the purpose of optical compensation of display devices. Therefore, the manufacturing method of the present invention exerts a high effect from the viewpoint of easily manufacturing products that are difficult to manufacture and effective.

光學薄膜之面內延遲Re係以100 nm以上為佳,以120 nm以上為較佳,另以350 nm以下為佳,以300 nm以下為較佳。於Re為此範圍之情況下,可構成得有效用於光學補償等用途之光學薄膜。光學薄膜之厚度方向延遲Rth係以−80 nm以上為佳,以−70 nm以上為較佳,另以80 nm以下為佳,以70 nm以下為較佳。於Rth為此範圍之情況下,可構成得具有期望NZ係數等特性且有效用於光學補償等用途之光學薄膜。The in-plane retardation Re of the optical film is preferably 100 nm or more, more preferably 120 nm or more, more preferably 350 nm or less, and more preferably 300 nm or less. When Re is in this range, an optical film that can be effectively used for optical compensation and other purposes can be constructed. The thickness direction retardation Rth of the optical film is preferably −80 nm or more, preferably −70 nm or more, further preferably 80 nm or less, and preferably 70 nm or less. In the case where Rth is in this range, an optical film that has desired characteristics such as NZ coefficient and is effectively used for applications such as optical compensation can be formed.

[3.光學薄膜之用途:偏光板及顯示裝置][3. Use of optical film: polarizing plate and display device]

藉由本發明之製造方法所獲得之光學薄膜,係得使用作為顯示裝置等光學裝置之構成要件。舉例而言,組合光學薄膜與其他組件,而得構成偏光板等光學組件。The optical film obtained by the manufacturing method of the present invention can be used as a constituent element of an optical device such as a display device. For example, an optical film and other components are combined to form an optical component such as a polarizing plate.

本發明之偏光板具備藉由前述本發明之製造方法所製造之光學薄膜與偏光件。本發明之偏光板得藉由貼合光學薄膜與偏光件而製造。The polarizing plate of the present invention is provided with the optical film and the polarizing member manufactured by the aforementioned manufacturing method of the present invention. The polarizing plate of the present invention can be manufactured by bonding an optical film and a polarizer.

貼合於偏光件之前,得於光學薄膜之表面設置任意層體。作為任意層體之例,可列舉:用以提升薄膜表面硬度之硬塗層(hard coat layer)、優化薄膜滑順性之磨砂層(matte layer)及抗反射層。Before bonding to the polarizer, an arbitrary layer can be set on the surface of the optical film. Examples of any layer include: hard coat layer for improving the surface hardness of the film, matte layer for optimizing the smoothness of the film, and anti-reflection layer.

本發明之偏光板亦可更具備位於自光學薄膜切出之薄膜與偏光件之間且用以接合此些之接合劑層。The polarizing plate of the present invention can also be further provided with a bonding agent layer between the film cut from the optical film and the polarizer and used for bonding these.

偏光件並未特別受到限定,而得使用任意偏光件。作為偏光件之例,可列舉於聚乙烯醇薄膜吸附碘、二色性染料等材料之後進行延伸加工者。作為構成接合劑層之接合劑,可列舉將各種聚合物作為基礎聚合物者。作為此基礎聚合物之例,可列舉例如:丙烯酸聚合物、矽氧聚合物、聚酯、聚胺酯、聚醚及合成橡膠。The polarizer is not particularly limited, and any polarizer may be used. As an example of a polarizer, a polyvinyl alcohol film adsorbs iodine, dichroic dyes, and other materials and then stretches it. Examples of the bonding agent constituting the bonding agent layer include those using various polymers as the base polymer. As an example of this base polymer, for example, acrylic polymer, silicone polymer, polyester, polyurethane, polyether, and synthetic rubber can be cited.

偏光板得具備保護薄膜。偏光板所具備之偏光件與保護薄膜之數量雖為任意,但本發明之偏光板通常得具備1層偏光件及設置於其雙面之2層保護薄膜。此二層保護薄膜中,可二者皆為自本發明之光學薄膜所切出之薄膜,亦可僅其中一者為自本發明之光學薄膜所切出之薄膜。The polarizing plate must have a protective film. Although the number of polarizers and protective films provided in the polarizer is arbitrary, the polarizer of the present invention usually has one layer of polarizer and two protective films provided on both sides of the polarizer. In the two-layer protective film, both of them may be the film cut from the optical film of the present invention, or only one of them may be the film cut from the optical film of the present invention.

本發明之顯示裝置可具備藉由前述本發明之製造方法所製造之光學薄膜。本發明之顯示裝置以得具備前述本發明之偏光板為佳。本發明之顯示裝置得藉由將本發明之光學薄膜組合於顯示裝置之其他構成要件而適當構成。The display device of the present invention may include the optical film manufactured by the aforementioned manufacturing method of the present invention. The display device of the present invention preferably has the aforementioned polarizing plate of the present invention. The display device of the present invention can be appropriately constructed by combining the optical film of the present invention with other constituent elements of the display device.

本發明之顯示裝置以液晶顯示裝置為佳。作為液晶顯示裝置,可列舉例如具備面內切換(In-Plane Switching,IPS)模式、垂直配向(Vertical Alignment,VA)模式、多域垂直配向(Multi-domain Vertical Alignment,MVA)模式、連續風車狀配向(Continuous Pinwheel Alignment,CPA)模式、混合配向向列(Hybrid Alignment Nematic,HAN)模式、扭曲向列(Twisted Nematic,TN)模式、超扭曲向列(Super-Twisted Nematic,STN)模式、光學補償彎曲(Optical Compensated Bend,OCB)模式等驅動方式之液晶單元的液晶顯示裝置。The display device of the present invention is preferably a liquid crystal display device. Examples of liquid crystal display devices include in-plane switching (In-Plane Switching, IPS) mode, vertical alignment (Vertical Alignment, VA) mode, multi-domain vertical alignment (Multi-domain Vertical Alignment, MVA) mode, and continuous pinwheel. Alignment (Continuous Pinwheel Alignment, CPA) mode, Hybrid Alignment Nematic (HAN) mode, Twisted Nematic (TN) mode, Super-Twisted Nematic (STN) mode, optical compensation A liquid crystal display device with a liquid crystal cell driven by a bending (Optical Compensated Bend, OCB) mode.

本發明之顯示裝置為液晶顯示裝置之情況下,偏光板得設置作為僅令入射於液晶單元之光線及自液晶單元發出之光線中期望特定偏光穿透之層體。偏光板還得設置作為用以防止外部光線反射之構成要件之一部分。When the display device of the present invention is a liquid crystal display device, the polarizing plate must be provided as a layer that only allows the specific polarized light to pass through from the light incident on the liquid crystal cell and the light emitted from the liquid crystal cell. The polarizing plate must also be provided as a part of the constituent elements to prevent the reflection of external light.

本發明之顯示裝置亦還可為有機電致發光顯示裝置。於此情形下,前述本發明之偏光板可例如設置作為用以防止外部光線反射之構成要件之一部分。The display device of the present invention can also be an organic electroluminescence display device. In this case, the aforementioned polarizing plate of the present invention can be provided as a part of the constituent elements for preventing reflection of external light, for example.

以下,將揭示實施例而針對本發明具體說明。然而,本發明並非限定於以下所揭示之實施例,於未脫離本發明之申請專利範圍及其均等範圍之範圍中得任意變更實施。Hereinafter, embodiments will be disclosed and the present invention will be specifically described. However, the present invention is not limited to the embodiments disclosed below, and can be implemented with any changes within the scope of the patent application and the equivalent scope of the present invention.

於以下之說明中,除非另有註明,否則表示份量之「%」及「份」以重量為基準。而且,除非另有註明,否則說明於以下之操作係於常溫常壓之條件中進行。In the following description, unless otherwise noted, the "%" and "parts" of the weight are based on weight. Moreover, unless otherwise noted, the operations described below are performed under normal temperature and pressure conditions.

[評價方法][Evaluation method]

(樹脂之玻璃轉移溫度之量測方法)(Measurement method of glass transition temperature of resin)

準備量測對象之樹脂之料粒(pellet),使用示差掃描熱析儀(SEIKO INSTRUMENTS公司製之「DSC6220」),量測其樹脂料粒之玻璃轉移溫度。條件定為樣品重量10 mg,升溫速度定為20℃/min。Prepare the resin pellet to be measured, and measure the glass transition temperature of the resin pellet using a differential scanning thermal analyzer ("DSC6220" manufactured by SEIKO INSTRUMENTS). The conditions are set as a sample weight of 10 mg, and the heating rate is set at 20°C/min.

(相位差與NZ係數之量測方法)(Measurement method of phase difference and NZ coefficient)

於波長590 nm使用相位差量測裝置(Axometric公司製,製品名「Axoscan」)量測Re及Rth,基於此些求得NZ係數。Re and Rth were measured using a phase difference measuring device (manufactured by Axometric Corporation, product name "Axoscan") at a wavelength of 590 nm, and the NZ coefficient was obtained based on these.

(薄膜(A)與薄膜(B)之間之剝離力Pa之量測方法)(Measurement method of peeling force Pa between film (A) and film (B))

切出量測對象之長條狀多層薄膜,獲得縱向方向×幅寬方向=300 mm×50 mm之切片。將切片置入附有恆溫恆濕槽之拉伸試驗機(INSTRON公司製之「5564型」),升溫至指定烘箱溫度Tov。於維持該溫度之狀態下進行180º剝離試驗。180º剝離試驗係以量測裝置之一側之夾頭握持薄膜(A),以另一側之夾頭握持薄膜(B),且於拉伸速度300 mm/min之條件下實施。採用穩定拉伸距離50 mm中之剝離力Pa(N/50mm)之量測值之平均值作為剝離力Pa之值。Cut out the long multi-layer film of the measuring object, and obtain the slice of longitudinal direction×width direction=300 mm×50 mm. Place the slices in a tensile testing machine (model "5564" manufactured by INSTRON) with a constant temperature and humidity tank, and heat up to the specified oven temperature Tov. Perform a 180º peel test while maintaining the temperature. The 180º peel test is performed with the chuck on one side of the measuring device holding the film (A) and the other side of the chuck holding the film (B), and the stretching speed is 300 mm/min. The average value of the measured value of the peeling force Pa (N/50mm) in the stable stretching distance of 50 mm is used as the value of the peeling force Pa.

[製造例1.薄膜(A)-1之製造][Manufacturing Example 1. Film (A)-1 Manufacturing]

令含有含脂環結構聚合物之樹脂(玻璃轉移溫度126℃之降𦯉烯聚合物之樹脂,商品名「ZEONOR」,日本瑞翁股份有限公司製)之料粒於100℃乾燥5小時。之後,將乾燥後之樹脂料粒供給至單軸擠製機。於擠製機內令樹脂熔融之後,經過聚合物管路及聚合物過濾器,自T字模(T-die)於鑄造滾筒(casting drum)上擠出成為片狀,並予以冷卻。藉此,獲得厚度80 μm且幅寬1000 mm之長條狀薄膜(A)-1。將所製造之薄膜(A)-1收捲為輥狀以回收。The pellets containing alicyclic structure polymer resin (glass transition temperature of 126°C lower ene polymer resin, trade name "ZEONOR", manufactured by Zeon Co., Ltd.) were dried at 100°C for 5 hours. After that, the dried resin pellets are supplied to a uniaxial extruder. After the resin is melted in the extruder, it is extruded from the T-die on the casting drum through the polymer pipeline and polymer filter into a sheet, and then cooled. In this way, a strip-shaped film (A)-1 with a thickness of 80 μm and a width of 1000 mm was obtained. The produced film (A)-1 is wound into a roll for recovery.

[製造例2.薄膜(A)-2之製造][Manufacturing Example 2. Film (A)-2 Manufacturing]

變更T字模之口部之開口尺寸,此外進行與製造例1相同之操作。藉此,獲得厚度185 μm且幅寬1000 mm之長條狀薄膜(A)-2,收捲為輥狀以回收。Change the opening size of the mouth of the T-shaped mold, and perform the same operations as in Manufacturing Example 1. In this way, a long film (A)-2 with a thickness of 185 μm and a width of 1000 mm is obtained, which is wound into a roll for recovery.

[製造例3.薄膜(A)-3之製造][Manufacturing Example 3. Film (A)-3 Manufacturing]

變更T字模之口部之開口尺寸,此外進行與製造例1相同之操作。藉此獲得厚度133 μm且幅寬1000 mm之長條狀薄膜(A)-3,收捲為輥狀以回收。Change the opening size of the mouth of the T-shaped mold, and perform the same operations as in Manufacturing Example 1. By this, a long film (A)-3 with a thickness of 133 μm and a width of 1000 mm is obtained, which is wound into a roll for recovery.

[製造例4.薄膜(A)-4之製造][Manufacturing Example 4. Film (A)-4 Manufacturing]

將製造例1中所獲得薄膜(A)-1自輥捲出,並於薄膜(A)-1之雙面進行電暈處理。藉此獲得薄膜(A)-4。將所獲得之薄膜(A)-4收捲為輥狀以回收。The film (A)-1 obtained in Production Example 1 was unrolled from a roll, and corona treatment was performed on both sides of the film (A)-1. Thus, film (A)-4 is obtained. The obtained film (A)-4 is wound into a roll for recovery.

[製造例5.薄膜(B)之原料薄膜之製造][Manufacturing Example 5. Manufacturing of raw film for film (B)]

令聚酯樹脂(EASTMAN公司製之「PET-G 6763」)之料粒於120℃乾燥5小時。將乾燥後之料粒供給至擠製機。於擠製機內令其熔融之後,於樹脂溫度260℃之條件下經過聚合物管路及聚合物過濾器,自T字模於鑄造滾筒上擠出成為片狀,並予以冷卻。藉此,獲得厚度60 μm且幅寬1400 mm之原料薄膜。The pellets of polyester resin ("PET-G 6763" manufactured by EASTMAN) were dried at 120°C for 5 hours. The dried pellets are supplied to the extruder. After it is melted in the extruder, it passes through the polymer pipeline and polymer filter at the resin temperature of 260°C, extrudes it from the T-mold on the casting drum into a sheet, and then cools it. In this way, a raw film with a thickness of 60 μm and a width of 1400 mm was obtained.

[製造例6.薄膜(B)-1之製造][Manufacturing Example 6. Film (B)-1 Manufacturing]

將製造例5中所獲得之原料薄膜連續供給至拉幅型橫向延伸裝置。使用此橫向延伸機於延伸溫度80℃且延伸倍率2倍之條件下沿幅寬方向延伸原料薄膜。修整經過延伸之薄膜之幅寬方向的兩端,且進一步於單側之面實施電暈處理。藉此獲得幅寬900 mm且厚度42 μm之長條狀薄膜(B)-1。將電暈處理面捲於內側而將此薄膜(B)-1收捲為輥狀以回收。The raw film obtained in Production Example 5 was continuously supplied to the tenter-type lateral stretching device. Use this transverse stretcher to stretch the raw film in the width direction under the conditions of a stretching temperature of 80°C and a stretching ratio of 2 times. The two ends in the width direction of the stretched film are trimmed, and corona treatment is further applied to one side of the film. Thus, a long film (B)-1 with a width of 900 mm and a thickness of 42 μm is obtained. The corona treated surface is wound on the inside, and this film (B)-1 is wound into a roll for recovery.

[製造例7.多層薄膜(C)-1之製造][Manufacturing example 7. Multilayer film (C)-1 manufacturing]

將製造例6中所獲得薄膜(B)-1自輥捲出,將黏合劑層(藤森工業製之「MASTACK系列」之黏合劑層)轉印於薄膜(B)-1之經過電暈處理之面。再來,以尋常方法將薄膜(B)-1貼合於製造例1中所獲得之薄膜(A)-1之雙面,並使黏合劑層介於薄膜(B)-1與薄膜(A)-1之間。藉此,獲得具有(薄膜(B)-1)/(黏合劑層)/(薄膜(A)-1)/(黏合劑層)/(薄膜(B)-1)之層結構之長條狀多層薄膜(C)-1。將此多層薄膜(C)-1收捲為輥狀以回收。各層之厚度為42 μm/25 μm/80 μm/25 μm/42 μm。The film (B)-1 obtained in Production Example 6 was unrolled from the roll, and the adhesive layer (the adhesive layer of "MASTACK series" manufactured by Fujimori Kogyo Co., Ltd.) was transferred to the film (B)-1 after corona treatment Of the face. Next, the film (B)-1 was bonded to both sides of the film (A)-1 obtained in Manufacturing Example 1 in an ordinary method, and the adhesive layer was interposed between the film (B)-1 and the film (A). )-1. By this, a long strip with a layer structure of (film (B)-1)/(adhesive layer)/(film (A)-1)/(adhesive layer)/(film (B)-1) is obtained Multilayer film (C)-1. This multilayer film (C)-1 is wound into a roll for recovery. The thickness of each layer is 42 μm/25 μm/80 μm/25 μm/42 μm.

[製造例8.多層薄膜(C)-2之製造][Manufacturing example 8. Multilayer film (C)-2 manufacturing]

將製造例6中所獲得薄膜(B)-1自輥捲出,將黏合劑層(藤森工業製之「MASTACK系列」之黏合劑層)轉印於薄膜(B)-1之經過電暈處理之面。再來,以尋常方法將薄膜(B)-1貼合於製造例4中所獲得之薄膜(A)-4之雙面,並使黏合劑層介於薄膜(B)-1與薄膜(A)-4之間。藉此,獲得具有(薄膜(B)-1)/(黏合劑層)/(薄膜(A)-4)/(黏合劑層)/(薄膜(B)-1)之層結構之長條狀多層薄膜(C)-2。將此多層薄膜(C)-2收捲為輥狀以回收。各層之厚度為42 μm/25 μm/80 μm/25 μm/42 μm。The film (B)-1 obtained in Production Example 6 was unrolled from the roll, and the adhesive layer (the adhesive layer of "MASTACK series" manufactured by Fujimori Kogyo Co., Ltd.) was transferred to the film (B)-1 after corona treatment Of the face. Next, the film (B)-1 was bonded to both sides of the film (A)-4 obtained in Manufacturing Example 4 in an ordinary method, and the adhesive layer was interposed between the film (B)-1 and the film (A). )-4. By this, a long strip with a layer structure of (film (B)-1)/(adhesive layer)/(film (A)-4)/(adhesive layer)/(film (B)-1) is obtained Multilayer film (C)-2. This multilayer film (C)-2 is wound into a roll for recovery. The thickness of each layer is 42 μm/25 μm/80 μm/25 μm/42 μm.

[製造例9.多層薄膜(C)-3之製造][Manufacturing Example 9. Manufacturing of Multilayer Film (C)-3]

準備自黏性延伸聚丙烯薄膜(FUTAMURA化學股份有限公司製之「FSA 010M #30」)作為薄膜(B)-2。以尋常方法將薄膜(B)-2貼合於製造例1中所獲得之薄膜(A)-1之雙面。藉此,獲得具有(薄膜(B)-2)/(薄膜(A)-1)/(薄膜(B)-2)之層結構之長條狀多層薄膜(C)-3。將此多層薄膜(C)-3收捲為輥狀以回收。各層之厚度為30 μm/80 μm/30 μm。Prepare a self-adhesive stretched polypropylene film ("FSA 010M #30" manufactured by FUTAMURA Chemical Co., Ltd.) as the film (B)-2. The film (B)-2 was bonded to both sides of the film (A)-1 obtained in Production Example 1 in an ordinary method. Thereby, a long multi-layer film (C)-3 having a layer structure of (film (B)-2)/(film (A)-1)/(film (B)-2) is obtained. This multilayer film (C)-3 is wound into a roll for recovery. The thickness of each layer is 30 μm/80 μm/30 μm.

[製造例10.多層薄膜(C)-4之製造][Manufacturing example 10. Multi-layer film (C)-4 manufacturing]

使用製造例2中所獲得之薄膜(A)-2替代薄膜(A)-1,此外藉由與製造例9相同之操作,獲得具有(薄膜(B)-2)/(薄膜(A)-2)/(薄膜(B)-2)之層結構之長條狀多層薄膜(C)-4。將此多層薄膜(C)-4收捲為輥狀以回收。各層之厚度為30 μm/185 μm/30 μm。The film (A)-2 obtained in Manufacturing Example 2 was used instead of Film (A)-1, and the same operation as in Manufacturing Example 9 was used to obtain (film (B)-2)/(film (A)- 2)/(Film (B)-2) Long strip multilayer film (C)-4 with layer structure. This multilayer film (C)-4 is wound into a roll for recovery. The thickness of each layer is 30 μm/185 μm/30 μm.

[製造例11.多層薄膜(C)-5之製造][Manufacturing Example 11. Manufacturing of Multilayer Film (C)-5]

使用製造例3中所獲得之薄膜(A)-3替代薄膜(A)-1,此外藉由與製造例9相同之操作,獲得具有(薄膜(B)-2)/(薄膜(A)-3)/(薄膜(B)-2)之層結構之長條狀多層薄膜(C)-5。將此多層薄膜(C)-5收捲為輥狀以回收。各層之厚度為30 μm/133 μm/30 μm。The film (A)-3 obtained in Manufacturing Example 3 was used instead of Film (A)-1, and the same operation as in Manufacturing Example 9 was used to obtain (film (B)-2)/(film (A)- 3)/(Film (B)-2) Long-strip multilayer film (C)-5 with layer structure. This multilayer film (C)-5 is wound into a roll for recovery. The thickness of each layer is 30 μm/133 μm/30 μm.

[製造例12.多層薄膜(C)-6之製造][Manufacturing example 12. Multilayer film (C)-6 manufacturing]

將製造例6中所獲得薄膜(B)-1自輥捲出,將黏合劑層(藤森工業製之「MASTACK系列」之黏合劑層)轉印於薄膜(B)-1之經過電暈處理之面。再來,於經過轉印之黏合劑層之表面施加電暈處理。以尋常方法經由黏合劑層而將具有經過電暈處理之黏合劑層之薄膜(B)-1貼合於製造例4中所獲得之薄膜(A)-4之雙面。藉此,獲得具有(薄膜(B)-1)/(黏合劑層)/(薄膜(A)-4)/(黏合劑層)/(薄膜(B)-1)之層結構之長條狀多層薄膜(C)-6。將此多層薄膜(C)-6收捲為輥狀以回收。各層之厚度為42 μm/25 μm/80 μm/25 μm/42 μm。The film (B)-1 obtained in Production Example 6 was unrolled from the roll, and the adhesive layer (the adhesive layer of "MASTACK series" manufactured by Fujimori Kogyo Co., Ltd.) was transferred to the film (B)-1 after corona treatment Of the face. Then, corona treatment is applied to the surface of the transferred adhesive layer. The film (B)-1 with the corona-treated adhesive layer was attached to both sides of the film (A)-4 obtained in Production Example 4 through the adhesive layer in an ordinary method. By this, a long strip with a layer structure of (film (B)-1)/(adhesive layer)/(film (A)-4)/(adhesive layer)/(film (B)-1) is obtained Multilayer film (C)-6. This multilayer film (C)-6 is wound into a roll for recovery. The thickness of each layer is 42 μm/25 μm/80 μm/25 μm/42 μm.

[實施例1][Example 1]

準備浮動式縱向延伸機。此延伸機係得將所運送之長條狀薄膜於溫度經過調節之烘箱內沿其縱向方向延伸之延伸機。將製造例8中所獲得多層薄膜(C)-2自輥捲出,沿薄膜縱向方向運送且供給至前述之縱向延伸機。將多層薄膜(C)-2運送至縱向延伸機之烘箱內。於運送時,將烘箱內溫度Tov定為135℃且以延伸倍率1.07倍進行延伸。Prepare floating longitudinal stretcher. This stretching machine is a stretching machine that stretches the conveyed long strip film in the temperature-adjusted oven along its longitudinal direction. The multilayer film (C)-2 obtained in Manufacturing Example 8 was unrolled from a roll, transported in the film longitudinal direction, and supplied to the aforementioned longitudinal stretching machine. Transport the multilayer film (C)-2 to the oven of the longitudinal stretching machine. During transportation, the temperature Tov in the oven was set to 135°C and the stretching ratio was 1.07 times for stretching.

再來,於烘箱內之出口附近進行剝離步驟。剝離步驟係藉由牽引多層薄膜(C)-2兩側之薄膜(B)-1且自薄膜(A)-4連續剝離薄膜(B)-1而進行。牽引2片薄膜(B)-1之方向定為垂直於所運送之薄膜(A)-4之面之方向,且定為彼此相互相反之方向。藉此,進行於薄膜(A)-4之厚度方向施加力之剝離,以沿厚度方向延伸薄膜(A)-4。剝離速度為5 m/min。其結果獲得經過厚度方向延伸之薄膜(A)-4作為光學薄膜。Next, the peeling step is performed near the exit in the oven. The peeling step is performed by pulling the film (B)-1 on both sides of the multilayer film (C)-2 and continuously peeling the film (B)-1 from the film (A)-4. The direction of pulling the two films (B)-1 is the direction perpendicular to the surface of the film (A)-4 being conveyed, and the directions are opposite to each other. Thereby, peeling by applying a force in the thickness direction of the film (A)-4 is performed to extend the film (A)-4 in the thickness direction. The peeling speed is 5 m/min. As a result, a film (A)-4 stretched in the thickness direction was obtained as an optical film.

量測所獲得之光學薄膜之面內延遲Re、厚度及NZ係數。而且,量測於此實施例之Tov之多層薄膜中薄膜(A)與薄膜(B)之間之剝離力Pa。其結果揭示於表1。由表1之結果可知,所獲得之光學薄膜其NZ係數為0至1之間。Measure the in-plane retardation Re, thickness and NZ coefficient of the obtained optical film. Furthermore, the peeling force Pa between the film (A) and the film (B) in the Tov multilayer film of this embodiment was measured. The results are shown in Table 1. From the results in Table 1, it can be seen that the NZ coefficient of the obtained optical film is between 0 and 1.

[實施例2][Example 2]

將製造例9中所獲得多層薄膜(C)-3自輥捲出,沿薄膜縱向方向運送且供給至與使用於實施例1者相同之縱向延伸機。將多層薄膜(C)-3運送至縱向延伸機之烘箱內。於運送時,將烘箱內溫度Tov定為126℃。並且,將延伸倍率定為1.00倍,亦即進行不伴隨延伸之運送。The multilayer film (C)-3 obtained in Manufacturing Example 9 was unwound from a roll, transported in the film longitudinal direction, and supplied to the same longitudinal stretching machine as used in Example 1. Transport the multilayer film (C)-3 to the oven of the longitudinal stretching machine. During transportation, the temperature Tov in the oven was set to 126°C. In addition, the stretching ratio was set to 1.00, that is, transportation without stretching was performed.

再來,於烘箱內之出口附近進行剝離步驟。剝離步驟係藉由牽引多層薄膜(C)-3兩側之薄膜(B)-2且自薄膜(A)-1連續剝離薄膜(B)-2而進行。牽引2片薄膜(B)-2之方向定為垂直於所運送之薄膜(A)-1之面之方向,且定為彼此相互相反之方向。藉此,進行於薄膜(A)-1之厚度方向施加力之剝離,以沿厚度方向延伸薄膜(A)-1。剝離速度為1 m/min。其結果獲得經過厚度方向延伸之薄膜(A)-1作為光學薄膜。Next, the peeling step is performed near the exit in the oven. The peeling step is performed by pulling the film (B)-2 on both sides of the multilayer film (C)-3 and continuously peeling the film (B)-2 from the film (A)-1. The direction of pulling the two films (B)-2 is the direction perpendicular to the surface of the film (A)-1 being conveyed, and the directions are opposite to each other. Thereby, peeling with a force applied in the thickness direction of the film (A)-1 is performed to extend the film (A)-1 in the thickness direction. The peeling speed is 1 m/min. As a result, a film (A)-1 stretched in the thickness direction was obtained as an optical film.

量測所獲得之光學薄膜之面內延遲Re、厚度及NZ係數。而且,量測於此實施例之Tov之多層薄膜中薄膜(A)與薄膜(B)之間之剝離力Pa。其結果揭示於表1。由表1之結果可知,所獲得之光學薄膜其NZ係數為0至1之間。Measure the in-plane retardation Re, thickness and NZ coefficient of the obtained optical film. Furthermore, the peeling force Pa between the film (A) and the film (B) in the Tov multilayer film of this embodiment was measured. The results are shown in Table 1. From the results in Table 1, it can be seen that the NZ coefficient of the obtained optical film is between 0 and 1.

[實施例3][Example 3]

將烘箱內溫度Tov自126℃變更為130℃,將延伸倍率自1.00倍變更為1.02倍以進行延伸,此外藉由與實施例2相同之操作獲得光學薄膜並進行評價。剝離步驟中之剝離速度為1 m/min。其結果揭示於表1。由表1之結果可知,所獲得之光學薄膜其NZ係數為0至1之間。The temperature Tov in the oven was changed from 126°C to 130°C, and the stretching ratio was changed from 1.00 times to 1.02 times for stretching. In addition, an optical film was obtained and evaluated by the same operation as in Example 2. The peeling speed in the peeling step is 1 m/min. The results are shown in Table 1. From the results in Table 1, it can be seen that the NZ coefficient of the obtained optical film is between 0 and 1.

[實施例4][Example 4]

將製造例10中所獲得多層薄膜(C)-4自輥捲出,沿薄膜縱向方向運送且供給至與使用於實施例1者相同之縱向延伸機。將多層薄膜(C)-4運送至縱向延伸機之烘箱內。於運送時,將烘箱內溫度Tov定為135℃且以延伸倍率1.07倍進行延伸。The multilayer film (C)-4 obtained in Manufacturing Example 10 was unrolled from a roll, transported in the film longitudinal direction, and supplied to the same longitudinal stretching machine as used in Example 1. Transport the multilayer film (C)-4 to the oven of the longitudinal stretching machine. During transportation, the temperature Tov in the oven was set to 135°C and the stretching ratio was 1.07 times for stretching.

再來,於烘箱內之出口附近進行剝離步驟。剝離步驟係藉由牽引多層薄膜(C)-4兩側之薄膜(B)-2且自薄膜(A)-2連續剝離薄膜(B)-2而進行。牽引2片薄膜(B)-2之方向定為垂直於所運送之薄膜(A)-2之面之方向,且定為彼此相互相反之方向。藉此,進行於薄膜(A)-2之厚度方向施加力之剝離,以沿厚度方向延伸薄膜(A)-2。剝離速度為1 m/min。其結果獲得經過厚度方向延伸之薄膜(A)-2作為光學薄膜。Next, the peeling step is performed near the exit in the oven. The peeling step is performed by pulling the film (B)-2 on both sides of the multilayer film (C)-4 and continuously peeling the film (B)-2 from the film (A)-2. The direction of pulling the two films (B)-2 is the direction perpendicular to the surface of the film (A)-2 being conveyed, and the directions are opposite to each other. Thereby, peeling by applying a force in the thickness direction of the film (A)-2 is performed to extend the film (A)-2 in the thickness direction. The peeling speed is 1 m/min. As a result, a film (A)-2 stretched in the thickness direction was obtained as an optical film.

量測所獲得之光學薄膜之面內延遲Re、厚度及NZ係數。而且,量測於此實施例之Tov之多層薄膜中薄膜(A)與薄膜(B)之間之剝離力Pa。其結果揭示於表1。由表1之結果可知,所獲得之光學薄膜其NZ係數為0至1之間。Measure the in-plane retardation Re, thickness and NZ coefficient of the obtained optical film. Furthermore, the peeling force Pa between the film (A) and the film (B) in the Tov multilayer film of this embodiment was measured. The results are shown in Table 1. From the results in Table 1, it can be seen that the NZ coefficient of the obtained optical film is between 0 and 1.

[實施例5][Example 5]

將烘箱內溫度Tov自126℃變更為135℃,將延伸倍率自1.00倍變更為1.07倍以進行延伸,此外藉由與實施例2相同之操作獲得光學薄膜並進行評價。剝離步驟中之剝離速度為5 m/min。其結果揭示於表1。由表1之結果可知,所獲得之光學薄膜其NZ係數為0至1之間。The temperature Tov in the oven was changed from 126°C to 135°C, and the stretching ratio was changed from 1.00 times to 1.07 times for stretching. In addition, an optical film was obtained and evaluated by the same operation as in Example 2. The peeling speed in the peeling step is 5 m/min. The results are shown in Table 1. From the results in Table 1, it can be seen that the NZ coefficient of the obtained optical film is between 0 and 1.

[實施例6][Example 6]

將製造例11中所獲得多層薄膜(C)-5自輥捲出,沿薄膜縱向方向運送且供給至與使用於實施例1者相同之縱向延伸機。將多層薄膜(C)-5運送至縱向延伸機之烘箱內。於運送時,將烘箱內溫度Tov定為140℃且以延伸倍率1.07倍進行延伸。The multilayer film (C)-5 obtained in Manufacturing Example 11 was unrolled from a roll, transported in the film longitudinal direction, and supplied to the same longitudinal stretching machine as that used in Example 1. Transport the multilayer film (C)-5 to the oven of the longitudinal stretching machine. During transportation, the temperature Tov in the oven was set to 140°C and the stretching ratio was 1.07 times for stretching.

再來,於烘箱內之出口附近進行剝離步驟。剝離步驟係藉由牽引多層薄膜(C)-5兩側之薄膜(B)-2且自薄膜(A)-3連續剝離薄膜(B)-2而進行。牽引2片薄膜(B)-2之方向定為垂直於所運送之薄膜(A)-3之面之方向,且定為彼此相互相反之方向。藉此,進行於薄膜(A)-3之厚度方向施加力之剝離,以沿厚度方向延伸薄膜(A)-3。剝離速度為1 m/min。其結果獲得經過厚度方向延伸之薄膜(A)-3作為光學薄膜。Next, the peeling step is performed near the exit in the oven. The peeling step is performed by pulling the film (B)-2 on both sides of the multilayer film (C)-5 and continuously peeling the film (B)-2 from the film (A)-3. The direction of pulling the two films (B)-2 is the direction perpendicular to the surface of the film (A)-3 being conveyed, and the directions are opposite to each other. Thereby, peeling with a force applied in the thickness direction of the film (A)-3 is performed to extend the film (A)-3 in the thickness direction. The peeling speed is 1 m/min. As a result, a film (A)-3 stretched in the thickness direction was obtained as an optical film.

量測所獲得之光學薄膜之面內延遲Re、厚度及NZ係數。而且,量測於此實施例之Tov之多層薄膜中薄膜(A)與薄膜(B)之間之剝離力Pa。其結果揭示於表1。由表1之結果可知,所獲得之光學薄膜其NZ係數為0至1之間。Measure the in-plane retardation Re, thickness and NZ coefficient of the obtained optical film. Furthermore, the peeling force Pa between the film (A) and the film (B) in the Tov multilayer film of this embodiment was measured. The results are shown in Table 1. From the results in Table 1, it can be seen that the NZ coefficient of the obtained optical film is between 0 and 1.

[比較例1][Comparative Example 1]

將製造例7中所獲得多層薄膜(C)-1自輥捲出,沿薄膜縱向方向運送且供給至與使用於實施例1者相同之縱向延伸機。將多層薄膜(C)-1運送至縱向延伸機之烘箱內。於運送時,將烘箱內溫度Tov定為135℃且以延伸倍率1.07倍進行延伸。The multilayer film (C)-1 obtained in Manufacturing Example 7 was unwound from a roll, transported in the film longitudinal direction, and supplied to the same longitudinal stretching machine as that used in Example 1. Transport the multilayer film (C)-1 to the oven of the longitudinal stretching machine. During transportation, the temperature Tov in the oven was set to 135°C and the stretching ratio was 1.07 times for stretching.

再來,雖於烘箱內之出口附近試圖進行剝離步驟,但到達烘箱內之出口附近之多層薄膜(C)-1中產生薄膜(B)-1之剝離,且於薄膜(A)-1整體產生皺褶,而無法進行剝離步驟。Furthermore, although the peeling step was attempted near the exit of the oven, the multilayer film (C)-1 that reached the exit of the oven produced the peeling of the film (B)-1, and the whole film (A)-1 Wrinkles are generated, and the peeling step cannot be performed.

並且,量測於此實施例之Tov之多層薄膜中薄膜(A)與薄膜(B)之間之剝離力Pa。其結果揭示於表1。In addition, the peeling force Pa between the film (A) and the film (B) in the Tov multilayer film of this embodiment was measured. The results are shown in Table 1.

[比較例2][Comparative Example 2]

將製造例12中所獲得多層薄膜(C)-6自輥捲出,沿薄膜縱向方向運送且供給至與使用於實施例1者相同之縱向延伸機。將多層薄膜(C)-6運送至縱向延伸機之烘箱內。於運送時,將烘箱內溫度Tov定為135℃且以延伸倍率1.07倍進行延伸。The multilayer film (C)-6 obtained in Manufacturing Example 12 was unrolled from a roll, transported in the film longitudinal direction, and supplied to the same longitudinal stretching machine as used in Example 1. Transport the multilayer film (C)-6 to the oven of the longitudinal stretching machine. During transportation, the temperature Tov in the oven was set to 135°C and the stretching ratio was 1.07 times for stretching.

再者,雖於烘箱內之出口附近試圖進行剝離步驟,但薄膜(A)與黏合劑層之界面無法順利進行剝離,於剝離後之薄膜(A)之表面殘存黏合劑,而無法進行良好的光學薄膜之製造。Furthermore, although the peeling step was attempted near the exit in the oven, the interface between the film (A) and the adhesive layer could not be peeled smoothly, and the adhesive remained on the surface of the film (A) after peeling, and it could not perform well. Manufacturing of optical film.

並且,量測於此實施例之Tov之多層薄膜中薄膜(A)與薄膜(B)之間之剝離力Pa。其結果揭示於表1。In addition, the peeling force Pa between the film (A) and the film (B) in the Tov multilayer film of this embodiment was measured. The results are shown in Table 1.

[比較例3][Comparative Example 3]

將烘箱內溫度Tov自126℃變更為120℃,此外藉由與實施例2相同之操作獲得光學薄膜並進行評價。剝離步驟中之剝離速度為5 m/min。其結果揭示於表1。由表1之結果可知,所獲得之光學薄膜其NZ係數為1.6,為大於1之值。The temperature Tov in the oven was changed from 126°C to 120°C, and an optical film was obtained and evaluated by the same operation as in Example 2. The peeling speed in the peeling step is 5 m/min. The results are shown in Table 1. It can be seen from the results in Table 1 that the NZ coefficient of the obtained optical film is 1.6, which is a value greater than 1.

並且,量測於此實施例之Tov之多層薄膜中薄膜(A)與薄膜(B)之間之剝離力Pa。其結果揭示於表1。In addition, the peeling force Pa between the film (A) and the film (B) in the Tov multilayer film of this embodiment was measured. The results are shown in Table 1.

實施例及比較例之結果統整揭示於表1。The results of the examples and comparative examples are collectively disclosed in Table 1.

【表1】

Figure 106145410-A0304-0001
【Table 1】
Figure 106145410-A0304-0001

表中簡稱之意義為如下所述。The meanings of the abbreviations in the table are as follows.

COP:含有含脂環結構聚合物之樹脂(玻璃轉移溫度126℃之降𦯉烯聚合物之樹脂,商品名「ZEONOR」,日本瑞翁股份有限公司製)。COP: A resin containing an alicyclic structure polymer (a resin with a glass transition temperature of 126°C and a lower ene polymer, trade name "ZEONOR", manufactured by Zeon Co., Ltd.).

PET:聚酯樹脂(EASTMAN公司製之「PET-G 6763」)。PET: Polyester resin ("PET-G 6763" manufactured by EASTMAN).

OPP:自黏性延伸聚丙烯薄膜(FUTAMURA化學股份有限公司製,商品名「FSA 010M #30」)。OPP: Self-adhesive stretched polypropylene film (manufactured by FUTAMURA Chemical Co., Ltd., trade name "FSA 010M #30").

由表1之結果可知,於Tov與TgA之關係及Pa之值滿足本申請要件之條件下所進行延伸之本申請實施例中。可輕易製造0<Nz<1之光學薄膜。It can be seen from the results in Table 1 that the relationship between Tov and TgA and the value of Pa meet the requirements of the application in the extended embodiment of the application. The optical film with 0<Nz<1 can be easily manufactured.

100‧‧‧多層薄膜111‧‧‧薄膜(B)112‧‧‧薄膜(B)121‧‧‧黏合劑層122‧‧‧黏合劑層131‧‧‧薄膜(A)132‧‧‧光學薄膜151‧‧‧剝離區域上游之軋輥152‧‧‧剝離區域上游之軋輥161‧‧‧剝離區域下游之軋輥162‧‧‧剝離區域下游之軋輥200‧‧‧多層薄膜231‧‧‧薄膜(A)211‧‧‧薄膜(B)221‧‧‧黏合劑層232‧‧‧光學薄膜P‧‧‧剝離區域100‧‧‧Multilayer film 111‧‧‧film (B) 112‧‧‧film (B) 121‧‧‧adhesive layer 122‧‧‧adhesive layer 131‧‧‧film (A) 132‧‧‧optical film 151‧‧‧Roller at the upstream of the stripping area 152‧‧‧Roller at the upstream of the stripping area 161‧‧‧Roller at the downstream of the stripping area 162‧‧‧Roller at the downstream of the stripping area 211‧‧‧Film (B) 221‧‧‧Adhesive layer 232‧‧‧Optical film P‧‧‧Peeling area

圖1係概略表示本發明之製造方法中進行剝離步驟之剝離裝置及使用該裝置之剝離步驟的操作之一例的側視圖。 圖2係概略表示本發明之製造方法中進行剝離步驟之剝離裝置及使用該裝置之剝離步驟的操作之另一例的側視圖。FIG. 1 is a side view schematically showing an example of the peeling device for performing the peeling step in the manufacturing method of the present invention and the operation of the peeling step using the device. 2 is a side view schematically showing another example of the peeling device for performing the peeling step in the manufacturing method of the present invention and another example of the operation of the peeling step using the device.

100:多層薄膜 100: Multilayer film

111:薄膜(B) 111: Film (B)

112:薄膜(B) 112: Film (B)

121:黏合劑層 121: Adhesive layer

122:黏合劑層 122: Adhesive layer

131:薄膜(A) 131: Film (A)

132‧‧‧光學薄膜 132‧‧‧Optical Film

151‧‧‧剝離區域上游之軋輥 151‧‧‧The roller upstream of the stripping area

152‧‧‧剝離區域上游之軋輥 152‧‧‧The roller upstream of the stripping area

161‧‧‧剝離區域下游之軋輥 161‧‧‧The roll downstream of the stripping area

162‧‧‧剝離區域下游之軋輥 162‧‧‧The roller downstream of the stripping area

P‧‧‧剝離區域 P‧‧‧Peeling area

Claims (3)

一種光學薄膜之製造方法,包含於剝離處理提供多層薄膜之剝離步驟;該多層薄膜係包含由熱塑性樹脂A而成之薄膜(A)及設置於該薄膜(A)之其中一面或雙面之薄膜(B)之多層薄膜;該剝離處理包含於溫度Tov(℃)時自該薄膜(A)以將該薄膜(A)沿厚度方向牽引並進行厚度方向延伸之方式剝離該薄膜(B);該溫度Tov與該薄膜(A)之玻璃轉移溫度TgA(℃)滿足Tov≧TgA之關係;於該多層薄膜中,於該溫度Tov之該薄膜(A)與該薄膜(B)之在剝離角度180°、拉伸速度300mm/min下的剝離力Pa為0.03N/50mm以上且0.5N/50mm以下。 A manufacturing method of an optical film, including the peeling step of providing a multilayer film in a peeling process; the multilayer film includes a film (A) made of a thermoplastic resin A and a film set on one or both sides of the film (A) The multilayer film of (B); the peeling treatment includes peeling the film (B) from the film (A) at a temperature of Tov (°C) by pulling the film (A) in the thickness direction and extending the film (B) in the thickness direction; the The temperature Tov and the glass transition temperature TgA(℃) of the film (A) satisfy the relationship Tov≧TgA; in the multilayer film, the peeling angle of the film (A) and the film (B) at the temperature Tov is 180 °, the peeling force Pa at a stretching speed of 300mm/min is 0.03N/50mm or more and 0.5N/50mm or less. 如請求項1所述之光學薄膜之製造方法,其中該熱塑性樹脂A含有含脂環結構聚合物。 The method of manufacturing an optical film according to claim 1, wherein the thermoplastic resin A contains an alicyclic structure-containing polymer. 如請求項1或2所述之光學薄膜之製造方法,更包含沿該多層薄膜之面內方向延伸該多層薄膜之延伸步驟。 The method for manufacturing an optical film according to claim 1 or 2, further comprising an extension step of extending the multilayer film in the in-plane direction of the multilayer film.
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