TWI737317B - Processing apparatus and method for manufacturing optical film - Google Patents
Processing apparatus and method for manufacturing optical film Download PDFInfo
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- TWI737317B TWI737317B TW109117759A TW109117759A TWI737317B TW I737317 B TWI737317 B TW I737317B TW 109117759 A TW109117759 A TW 109117759A TW 109117759 A TW109117759 A TW 109117759A TW I737317 B TWI737317 B TW I737317B
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C71/00—After-treatment of articles without altering their shape; Apparatus therefor
- B29C71/0009—After-treatment of articles without altering their shape; Apparatus therefor using liquids, e.g. solvents, swelling agents
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C71/00—After-treatment of articles without altering their shape; Apparatus therefor
- B29C71/0009—After-treatment of articles without altering their shape; Apparatus therefor using liquids, e.g. solvents, swelling agents
- B29C2071/0045—Washing using non-reactive liquids
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29L—INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULAR ARTICLES
- B29L2007/00—Flat articles, e.g. films or sheets
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Abstract
Description
本揭露係關於一種處理裝置,且特別是有關於一種可減少氣泡產生的處理裝置。The present disclosure relates to a processing device, and in particular, to a processing device that can reduce the generation of bubbles.
光學膜材通常需要歷經各種液體處理的濕式製程,但於製程期間,容易產生膜屑或塵埃等雜質漂浮於處理液之中,經回流後便有很高的機率附著於光學膜材上,導致缺陷產生。Optical film materials usually need to go through various liquid processing wet processes, but during the process, impurities such as film chips or dust are likely to float in the processing liquid. After reflow, they have a high probability of attaching to the optical film materials. Lead to defects.
本揭露內容係有關於一種處理裝置。處理裝置包含一光學膜處理槽、一導液結構以及一溢流裝置。光學膜處理槽配置以容置一處理液。溢流裝置用於處理裝置,以控制其中之處理液的流向,包括盒體部、引流板以及排水管。排水管連接於盒體部。引流板可動地配置於盒體部的至少一側上,以隨處理液之液面調整高度,使處理液導引至盒體部內。導液結構設置於溢流裝置之內,且溢流裝置是設置於光學膜處理槽之內。The content of this disclosure relates to a processing device. The processing device includes an optical film processing tank, a liquid guiding structure and an overflow device. The optical film processing tank is configured to contain a processing liquid. The overflow device is used in the treatment device to control the flow direction of the treatment liquid in it, including the box body, the drainage plate and the drain pipe. The drain pipe is connected to the box body. The guide plate is movably arranged on at least one side of the box body to adjust the height according to the liquid level of the processing liquid, so that the processing liquid is guided into the box body. The liquid guiding structure is arranged in the overflow device, and the overflow device is arranged in the optical film processing tank.
根據本揭露之另一方面,提出一種光學膜材的形成方法,此方法包括以下步驟。進行輸送光學膜材經過上述處理裝置之步驟。接著,進行乾燥光學膜材之步驟。According to another aspect of the present disclosure, a method for forming an optical film is provided. The method includes the following steps. Carry out the step of transporting the optical film through the above-mentioned processing device. Next, the step of drying the optical film material is performed.
本揭露提供一種導液結構,設置於滾輪以及溢流裝置之間,導液結構是配置以引導流經滾輪的清潔液體,以避免清潔液體直接滴落至處理液而產生氣泡的問題。因此,根據本揭露之導液結構的設計,清潔液體直接滴落至處理液而產生之氣泡吸附雜質而造成雜質沾附於光學膜材上的機率可以大幅地被降低。The present disclosure provides a liquid guiding structure, which is arranged between the roller and the overflow device. The liquid guiding structure is configured to guide the cleaning liquid flowing through the roller to avoid the problem of bubbles generated by the cleaning liquid directly dripping onto the processing liquid. Therefore, according to the design of the liquid guiding structure of the present disclosure, the bubbles generated by the cleaning liquid directly dripping onto the processing liquid adsorb impurities and the probability of impurities adhering to the optical film material can be greatly reduced.
在一些實施例中,排水管可具有第一管體、第二管體及底閥座。當需要排水時,可驅動第二管體朝向第一管體移動,使底閥座上被第二管體遮蔽的側開口露出,進而使處理液由側開口排放。基於排水管的結構設計,工作人員只需要拉動第二管體便可以進行排水,而不需要將盒體部以及排水管整個移出光學膜處理槽,因此本揭露的設計可降低人員的負擔以及增加排水的便利性。In some embodiments, the drain pipe may have a first pipe body, a second pipe body, and a bottom valve seat. When drainage is needed, the second pipe body can be driven to move toward the first pipe body, so that the side opening on the bottom valve seat shielded by the second pipe body is exposed, and the treatment liquid is discharged through the side opening. Based on the structural design of the drainage pipe, the staff only need to pull the second pipe body to perform drainage, instead of removing the box body and the drainage pipe entirely out of the optical film processing tank. Therefore, the design of the present disclosure can reduce the burden on personnel and increase Convenience of drainage.
為了讓本揭露之目的、特徵、及優點能更明顯易懂,下文特舉實施例,並配合所附圖式做詳細說明。其中,實施例中的各元件之配置係為說明之用,並非用以限制本揭露。且實施例中圖式標號之部分重複,係為了簡化說明,並非意指不同實施例之間的關聯性。以下實施例中所提到的方向用語,例如:上、下、左、右、前或後等,僅是參考附加圖式的方向。因此,使用的方向用語是用來說明並非用來限制本揭露。In order to make the purpose, features, and advantages of the present disclosure more obvious and understandable, the following embodiments are specifically described in detail in conjunction with the accompanying drawings. Among them, the configuration of each element in the embodiment is for illustrative purposes, and is not intended to limit the disclosure. In addition, the repetition of the drawing symbols in the embodiments is to simplify the description, and does not imply the relevance between different embodiments. The directional terms mentioned in the following embodiments, for example: up, down, left, right, front or back, etc., are only directions for referring to the attached drawings. Therefore, the directional terms used are used to illustrate and not to limit the disclosure.
此外,實施例中可能使用相對性的用語,例如「較低」或「底部」及「較高」或「頂部」,以描述圖式的一個元件對於另一元件的相對關係。能理解的是,如果將圖式的裝置翻轉使其上下顛倒,則所敘述在「較低」側的元件將會成為在「較高」側的元件。In addition, the embodiments may use relative terms, such as “lower” or “bottom” and “higher” or “top” to describe the relative relationship between one element of the drawing and another element. It can be understood that if the device in the drawing is turned upside down, the elements described on the "lower" side will become the elements on the "higher" side.
在此,「約」、「大約」之用語通常表示在一給定值或範圍的20%之內,較佳是10%之內,且更佳是5%之內。在此給定的數量為大約的數量,意即在沒有特定說明的情況下,仍可隱含「約」、「大約」之含義。Here, the terms "about" and "approximately" usually mean within 20% of a given value or range, preferably within 10%, and more preferably within 5%. The quantity given here is an approximate quantity, which means that the meaning of "about" and "approximately" can still be implied in the absence of specific instructions.
本揭露內容係有關於一種處理裝置。在一些實施例中,處理裝置可包含一溢流裝置,其包括一引流板,可動地配置於盒體部的至少一側上,且引流板的位置可隨處理液之液面調整,以控制處理液之流向並將其導引至盒體部內過濾掉雜質,減少雜質沾附於光學膜材上的機率。The content of this disclosure relates to a processing device. In some embodiments, the processing device may include an overflow device, which includes a drainage plate, movably disposed on at least one side of the box body, and the position of the drainage plate can be adjusted with the liquid level of the processing liquid to control The flow direction of the processing liquid and guide it to the box body to filter out impurities and reduce the probability of impurities adhering to the optical film material.
須注意的是,本揭露並非顯示出所有可能的實施例,未於本揭露提出的其他實施態樣也可能可以應用。再者,圖式上的尺寸比例並非按照實際產品等比例繪製。因此,說明書和圖式內容僅作敘述實施例之用,而非作為限縮本揭露保護範圍之用。另外,實施例中之敘述,例如細部結構、製程步驟和材料應用等等,僅為舉例說明之用,並非對本揭露欲保護之範圍做限縮。實施例之步驟和結構各之細節可在不脫離本揭露之精神和範圍內根據實際應用製程之需要而加以變化與修飾。以下是以相同/類似的符號表示相同/類似的元件做說明。It should be noted that this disclosure does not show all possible embodiments, and other implementation aspects not mentioned in this disclosure may also be applicable. Furthermore, the size ratios in the drawings are not drawn in proportion to the actual products. Therefore, the contents of the description and the drawings are only used to describe the embodiments, rather than to limit the protection scope of the disclosure. In addition, the descriptions in the embodiments, such as detailed structure, process steps, material applications, etc., are for illustrative purposes only, and are not intended to limit the scope of protection of the present disclosure. The details of the steps and structures of the embodiments can be changed and modified according to the needs of the actual application process without departing from the spirit and scope of the present disclosure. In the following description, the same/similar symbols represent the same/similar elements.
請參照第1圖,其繪示根據本揭露一些實施例中,光學膜材100之製程設備示意圖。舉例而言,在光學膜材100的製程中,可具有以下步驟:膨潤處理、染色處理、拉伸處理、交聯處理、洗淨處理以及乾燥處理。光學膜材100可經過複數個滾輪160的導引依序通過:用以進行膨潤處理之膨潤槽110、用以進行染色處理之染色槽120、以及用以進行交聯處理之交聯槽130。接著,輸送光學膜材100通過水洗槽140,以將表面附著之反應溶液洗淨。之後,藉由乾燥爐150予以乾燥,即可獲得光學膜材100。然而,由於光學膜材100在通過例如是膨潤槽110、染色槽120、交聯槽130及水洗槽140等光學膜處理槽時,其表面或製程環境中的膜屑或塵埃等雜質容易帶入於這些光學膜處理槽中,此些雜質可能附著於光學膜材100之表面,而影響光學膜材100的光學性質與產出品質。Please refer to FIG. 1, which illustrates a schematic diagram of a process equipment for the
在一實施例中,光學膜材100表面之雜質包括光學膜材屑,例如是聚乙烯醇屑、製程浴槽中的化學藥劑結晶、鐵鏽屑或其他製程材料或設備中產生之雜質。In one embodiment, the impurities on the surface of the
在一實施例中,所述的光學膜材100可為一單層或多層膜片,例如可為一偏光片、相位差膜、增亮膜或其他對光學之增益、配向、補償、轉向、直交、擴散、保護、防黏、耐刮、抗眩、反射抑制、高折射率等有所助益的膜片。In one embodiment, the
在一實施例中,光學膜材100可為一聚乙烯醇(PVA)樹脂膜,其可藉由皂化聚醋酸乙烯樹脂製得。聚醋酸乙烯樹脂的例子包括醋酸乙烯之單聚合物,即聚醋酸乙烯,以及醋酸乙烯之共聚合物和其他能與醋酸乙烯進行共聚合之單體。其他能與醋酸乙烯進行共聚合之單體的例子包括不飽和羧酸(例如丙烯酸、甲基丙烯酸、丙烯酸乙酯、正丙烯酸丙酯、甲基丙烯酸甲酯)、烯烴(例如乙烯、丙烯、1-丁烯、2-甲丙烯)、乙烯醚(例如乙基乙烯醚、甲基乙烯醚、正丙基乙烯醚、異丙基乙烯醚)、不飽和磺酸(例如乙烯基磺酸、乙烯基磺酸鈉)等。In one embodiment, the
請參照第2A圖,其繪示根據本揭露一實施例之處理裝置之光學膜處理槽1的處理液2的循環示意圖。光學膜處理槽1可以是上述膨潤槽110、染色槽120、交聯槽130及水洗槽140中之一,但本揭露不限於此。光學膜處理槽1中貯存有處理液2,且可包括至少一溢流裝置3。為便於說明,實施例中,係將光學膜材(未繪示)浸入處理液2之區域定義為一入液區域P1,將光學膜材於處理液2中移送之區域定義為一移送區域P2,將光學膜材從處理液2拉出之區域定義為一出液區域P3。藉由至少一溢流裝置3的設置,可控制處理液2的流向,並將處理液2中的雜質經由溢流裝置3過濾掉,避免這些雜質回流至入液區域P1、移送區域P2或是出液區域P3而沾附於光學膜材。具體而言,溢流裝置3可包括一引流板31以及一排水管30,引流板31之位置可隨處理液2之液面調整,以將含雜質的處理液2自引流板31導引入內,並經由排水管30排出至光學膜處理槽1外部之循環管路101。於此,循環管路101可設有一淨化裝置10,藉以過濾掉處理液2中的雜質。接著,經過濾淨化後的處理液2可再循環流回至光學膜處理槽1中使用。Please refer to FIG. 2A, which illustrates a schematic diagram of the circulation of the
請參照第2B圖,其繪示第2A圖之光學膜處理槽1之上視圖。光學膜處理槽1可包括一第一壁11、一第二壁12、一第三壁13及一第四壁14,第一壁11與第三壁13相對,第二壁12與第四壁14相對。在另一實施例中,光學膜處理槽1亦可為其他形狀,例如多邊形或圓形等,而不以本實施例之圖式為限。Please refer to FIG. 2B, which shows a top view of the optical
實施例中,溢流裝置3可設置於光學膜處理槽1內的不同位置,且數量亦不限。舉例來說,請參照第2B圖,溢流裝置3可經由一支撐基座(未繪示)而設置於第一壁11、第二壁12、第三壁13及第四壁14的至少一壁上,亦可在每個壁上皆設置溢流裝置3。再者,每個壁上亦可設置不只一個溢流裝置3。於此,引流板31可配置於面對入液區域P1、移送區域P2及出液區域P3的一側上,以將漂浮於入液區域P1、移送區域P2或是出液區域P3上方的雜質經由引流板31及排水管30帶出,避免雜質回流至入液區域P1、移送區域P2或是出液區域P3。在一實施例中,當溢流裝置3設置於第一壁11或第三壁13,光學膜材之行進方向與溢流裝置3之長度延伸方向大致垂直;當溢流裝置3設置於第二壁12或第四壁14,光學膜材之行進方向與溢流裝置3之長度延伸方向大致平行。
In the embodiment, the
在另一實施例中,如第3A和3B圖所示,溢流裝置3可橫跨於第二壁12及第四壁14設置。具體而言,溢流裝置3設置於移送區域P2上方,且引流板31分別配置於面對入液區域P1和出液區域P3的相對二側上,以將漂浮於入液區域P1、移送區域P2或是出液區域P3上方的雜質經由引流板31及排水管30帶出。此外,一實施例中,亦可同時在第一壁11、第二壁12、第三壁13及第四壁14的至少一壁上配置一或多個溢流裝置3。在第3A和3B圖中,光學膜材之行進方向係與溢流裝置3之長度延伸方向大致垂直,且由溢流裝置3以下之處理液中通過,如第3A圖所示。於此,溢流裝置3之長度延伸方向例如是第3B圖中,與第一壁11和第三壁13平行之方向。
In another embodiment, as shown in FIGS. 3A and 3B, the
請參照第4圖,其繪示根據本揭露一實施例之光學膜處理槽1之部分分解圖。溢流裝置3更包括一盒體部32,盒體部32例如是具有五面之盒狀物體,且排水管30連接於盒體部32,例如是連接於盒體部32之底面。一實施例中,盒體部32符合2≦(ab)/A≦200及c/a≦0.5,其中a為盒體部32的長度,b為盒體部32的寬度,c為盒體部32的高度,A為排水管30的截面積。其中,a不大於750cm;b不大於20cm;c不大於150cm;以及A不大於300cm2。
Please refer to FIG. 4, which shows a partial exploded view of the optical
以下詳細描述引流板31之相關配置。實施例中,引流板31係可動地配置於盒體部32的至少一側上,如此,引流板31的位置可隨著處理液2之液面調整。於第4圖的實施例中,盒體部32可具有一底面及四個側面,其中底面係與排水管30連接,且引流板31係設置於四個側面中高度較低的一面。The related configuration of the
詳細地說,請參照第4~5圖,第5圖繪示根據本揭露一實施例之光學膜處理槽1之立體圖。引流板31可具有一開孔310,故可使用一固定件320穿過開孔310而將引流板31鎖固於盒體部32的至少一側上。此處,即是將引流板31固定在盒體部32之四個側面中高度較低的一面上。在一實施例中,開孔310例如是長條孔,開孔310的長軸係垂直於液面。藉此,可依據處理液2之液面高度,而自由調整引流板31的高度,使處理液2可順利流進引流板31和盒體部32所圍成的內部空間3e中。In detail, please refer to FIGS. 4 to 5. FIG. 5 is a perspective view of an optical
如第4圖所示,引流板31可具有一起伏結構31A,起伏結構31A具有一最高點31At和一最低點31Ab。使用者在調整引流板31的位置時,可使處理液2之液面介於起伏結構31A的最高點31At和最低點31Ab之間。如此一來,便能夠將處理液2導引至內部空間3e中,如第5圖所示。As shown in Fig. 4, the drafting
請參照第6A圖,其繪示起伏結構31A之形狀。其中,起伏結構31A之形狀係為三角形之連續組合。起伏結構31A相鄰波段之最高點的距離為L,起伏結構31A之最高點31At與最低點31Ab之間的距離為H,起伏結構31A係符合0.005≦L/a≦1及0.03≦H/c≦1。較佳的,起伏結構31A係符合0.01≦L/a≦0.1及0.03≦H/c≦0.33,其中,a為盒體部32的長度,c為盒體部32的高度。Please refer to FIG. 6A, which shows the shape of the undulating
雖然第6A圖所繪示之起伏結構31A的形狀為三角形之連續組合,但本揭露並未限定於此。請參照第6B圖至第6K圖,其分別繪示本揭露內容實施例之不同形狀的起伏結構31B、31C、31D、31E、31F、31G、31H、31I、31J及31K。如第6B圖所示,起伏結構31B之形狀可為三角形之非連續組合。如第6C、6D、6E和6F圖所示,起伏結構31C、31D、31E和31F可分別包括不同弧度及其組合的弧形。如第6G和6H圖所示,起伏結構31G和31H可分別為四邊形之連續和非連續組合,四邊形例如為梯形。如第6I、6J和6K圖所示,起伏結構31I、31J和31K可為多邊形之連續或非連續組合,例如,起伏結構31I和31J可分別為五邊形之連續和非連續組合,起伏結構31K可為六邊形之連續組合。再者,本揭露起伏結構之形狀並未限於此,起伏結構之形狀亦可為上述圖形之各種組合。Although the shape of the undulating
另外,請參照第5圖,在另一實施例中,溢流裝置3可更包括一過濾件4,過濾件4係可拆卸地配置於盒體部32內,例如是配置在內部空間3e中。過濾件4例如是一過濾網。其中過濾件4具有每平方英寸20~500的孔目數(單位:mesh),藉此,可初步濾除較大型的雜質與雜質,以進一步增加濾除雜質的效率,同時可避免大型雜質與雜質造成排水管30阻塞。再者,排水管30的數量可為一個以上,故可依據實際使用情形增加/減少排水管30的數量。In addition, referring to Figure 5, in another embodiment, the
如第5圖所示,由於排水管30可不斷地將內部空間3e中的處理液2向外排出,故內部空間3e中處理液2之液面高度較光學膜處理槽1中之處理液2液面高度低,內部空間3e中的處理液2不會回流至光學膜處理槽1中,防止光學膜材沾附處理液2之雜質。As shown in Figure 5, since the
此外,一實施例中,排水管30係可拆卸地連接於盒體部32。請參照第4圖,盒體部32可具有一通孔32h,通孔32h例如是設置在盒體部32的底面,但不以此為限。排水管30可具有一開口30h,開口30h對應於通孔32h之大小,例如是依據公差之設計而略小於通孔32h之大小。如此,排水管30可透過開口30h嵌入於通孔32h內而與盒體部32結合,但本揭露不以此結合方式為限。此外,排水管30之內部亦可設置一過濾網(未繪製),以進一步將雜質濾除而避免排水管30阻塞。所述的過濾網具有每平方英寸40~2500的孔目數(單位:mesh),配置時,為到達較佳的過濾效果,過濾網每平方英寸孔目數相對於過濾件4的孔目數較多,例如介於過濾件4的孔目數2~5倍之間。In addition, in an embodiment, the
一實施例中,如第4圖所示,排水管30可更包括一提把301。當需要進行清洗時,使用者可將盒體部32與排水管30拆解開,且可握住提把301而將排水管30拉出光學膜處理槽1進行清洗,便利使用者操作及維護所述之溢流裝置。In one embodiment, as shown in FIG. 4, the
上述所提供之溢流裝置及光學膜處理槽,可控制光學膜處理槽中處理液的流向,以濾除處理液中含有的雜質。溢流裝置可依據使用情況而配置於光學膜處理槽內的不同位置,且配置的數量亦不限。溢流裝置包括一引流板,可動地配置於盒體部的至少一側上。藉此,引流板的位置可隨處理液之液面調整,以控制處理液之流向並將其導引至盒體部內過濾掉雜質,減少雜質沾附於光學膜材上的機率。The overflow device and optical film treatment tank provided above can control the flow direction of the treatment liquid in the optical film treatment tank to filter out impurities contained in the treatment liquid. The overflow device can be arranged in different positions in the optical film processing tank according to the usage, and the number of the arrangement is not limited. The overflow device includes a guide plate, which is movably arranged on at least one side of the box body. Thereby, the position of the guide plate can be adjusted with the liquid level of the treatment liquid to control the flow direction of the treatment liquid and guide it to the box body to filter out impurities and reduce the probability of impurities adhering to the optical film material.
接著請參考第7圖,第7圖為根據本揭露另一實施例之光學膜處理槽1之立體圖。於此實施例中,本揭露的處理裝置可更包含一灑水模組250以及一導液結構200。灑水模組250是配置以對一滾輪160噴灑一清潔液體,以除去雜質或殘留的處理液,確保在製程中滾輪160的清潔,避免影響光學膜的良率。在一實施例中,清潔液體例如可為水,但不限於此。在一實施例中,灑水模組250之長度與導液結構200之長度大致相同,且對應配置。在一實施例中,灑水模組250係從滾輪下方且/或上方噴灑清潔液體。Please refer to FIG. 7, which is a perspective view of an optical
在一實施例中,導液結構200是位於滾輪160以及溢流裝置3之間,並且導液結構200是配置以導引來自灑水模組250與流經滾輪160的清潔液體。於一些實施例中,導液結構200可由不銹鋼材質製成,但不限於此。In one embodiment, the
請參考第7圖至第9圖,第8圖為根據本揭露另一實施例之光學膜處理槽1沿著X軸方向觀看之示意圖,並且第9圖為根據本揭露另一實施例之光學膜處理槽1沿著Y軸方向觀看之示意圖。於此實施例中,導液結構200具有一本體201以及二側翼結構202。本體201定義有一長軸方向AX1以及一短軸方向AX2,長軸方向AX1平行於X軸,短軸方向AX2平行於Y軸,並且長軸方向AX1垂直於短軸方向AX2。Please refer to FIGS. 7-9. FIG. 8 is a schematic diagram of an optical
如第8圖所示,當沿著長軸方向AX1(X軸)觀察時,二側翼結構202連接於本體201的相反兩側。於此實施例中,二側翼結構202分別與一參考平面HL1(第一參考平面)之間形成的一夾角Ag1可為120度~140度,參考平面HL1例如可平行於水平面,但不限於此。另外,第三壁13上可設置有一延伸連接件131,配置以連接於其中一側翼結構202,例如利用螺絲鎖固連接,以使導液結構200懸吊於溢流裝置3上。在一些實施例中,延伸連接件131可以被調整,使得導液結構200於Z軸方向上的位置可以任意地被調整。As shown in FIG. 8, when viewed along the long axis direction AX1 (X axis), the two
於此實施例中,側翼結構202於短軸方向AX2(Y軸)上的長度L1可介於滾輪的半徑的一半(半徑/2)與半徑之間。在一實施例中,滾輪160的半徑可為80公釐(但不限於此),並且側翼結構202於短軸方向AX2(Y軸)上的長度L1介於40公釐~80公釐。基於此設計,可以確保經過滾輪160的清潔液體都可以落在導液結構200上。In this embodiment, the length L1 of the
如第7圖與第9圖所示,本體201可形成有一溝槽結構,所述溝槽結構具有二第一導引斜面204以及二第二導引斜面206。當沿著短軸方向AX2(Y軸)觀察時,二第一導引斜面204是彼此連接,並且二第一導引斜面204是分別連接於相對應之第二導引斜面206。As shown in FIGS. 7 and 9, the
於此實施例中,二第一導引斜面204分別與一參考平面HL2(第二參考平面)之間形成的一夾角Ag2為160度~170度,二第二導引斜面206分別與一參考平面HL3(第三參考平面)之間形成的一夾角Ag3為90度~110度。參考平面HL2、HL3例如可平行於水平面,但不限於此。在一實施例中,第二導引斜面206的一部份是侵入溢流裝置3中的處理液2的液面下,且位於溢流裝置3的盒體部32內。在一實施例中,導液結構200與該盒體部32內處理液2的液面接觸。另外,在一實施例中,本體201可更包括多個側擋牆2011,側擋牆2011是設置於第二導引斜面206的兩旁,以導引清潔液體穩定地沿著第二導引斜面206流入溢流裝置3。In this embodiment, an included angle Ag2 formed between the two first guiding inclined
基於上述結構設計,由導液結構200所引導的清潔液體可以較穩定地沿著第一導引斜面204與第二導引斜面206流至溢流裝置3內,進而降低或減少清潔液體直接滴落至處理液而產生之氣泡的機率。Based on the above structural design, the cleaning liquid guided by the
如第8圖所示,當沿著長軸方向AX1(X軸)觀察時,滾輪160與第一導引斜面204之間的一最短距離D1與滾輪160的半徑的比值(D1/滾輪半徑)介於3.75~6.25之間。在一實施例中,最短距離D1可為30~50公分,滾輪160的半徑可為80公釐,基於此設計,可以使得由滾輪160滴落的清潔液體不容易產生噴濺。再者,滾輪160與側翼結構202之間的一最短距離D2與滾輪160的半徑的比值(D2/滾輪半徑)介於1.25~2.5之間,在一實施例中,最短距離D2可為10~20公分,滾輪160的半徑可為80公釐,基於此設計,可以增加導液結構200引導清潔液體的範圍,並且便於安裝設置而不會對滾輪160造成碰撞傷害。另外,滾輪160具有一轉軸160X,並且轉軸160X與導液結構200(或溢流裝置3)之一中心線CL1於短軸方向AX2(Y軸)上的一距離D3與滾輪160的半徑的比值(D3/滾輪半徑)介於0.125~0.5之間,在一實施例中,距離D3為10~40公釐,滾輪160的半徑可為80公釐,基於此設計,可以使灑水模組250所噴出的清潔液體可以完整地被導液結構200引導。基於上述結構設計,可以降低清潔液體由滾輪160落到導液結構200的衝擊,進而降低或減少氣泡產生的機率。As shown in Figure 8, when viewed along the long axis direction AX1 (X axis), the ratio of the shortest distance D1 between the
請參考第10圖,第10圖為根據本揭露另一實施例之光學膜處理槽1之部分結構的立體圖。在一些實施例中,排水管40可具有第一管體41、第二管體42及底閥座44。當需要排水時,可驅動第二管體42朝向第一管體41移動,使底閥座44上被第二管體42遮蔽的側開口445露出,進而使處理液2由側開口445排放。基於排水管40的結構設計,工作人員只需要拉動第二管體42便可以進行排水,而不需要將溢流裝置3之盒體部32以及排水管40整個移出光學膜處理槽1,因此本揭露的設計可降低人員的負擔以及增加排水的便利性。Please refer to FIG. 10, which is a perspective view of a partial structure of an optical
在一實施例中,排水管40之第一管體41是連接於溢流裝置3之盒體部32的底面,並且第一管體41連通於盒體部32,以使位於盒體部32的液體可以流入第一管體41。在一實施例中,第二管體42是可活動地連接於第一管體41,例如,第一管體41的管徑略大於第二管體42的管徑,以使第二管體42以可活動之方式套設於第一管體41內,但本揭露並不限於此,也可使第二管體42的管徑略大於第一管體41的管徑,以使第二管體42以可活動之方式套設於第一管體41外。In one embodiment, the
在一實施例中,底閥座44配置於光學膜處理槽1之一排水孔15上。具體而言,排水孔15位於光學膜處理槽1的一排水面151上,排水面151的高度(Z軸方向上的位置)低於光學膜處理槽1的底面16,以利於光學膜處理槽1排出處理液2。底閥座44具有一阻擋部441以及一管狀部443,並且管狀部443的第一部份4431設置於排水孔15之一側(例如為內側),管狀部443的第二部分4432設置於排水孔15之另一側(例如為外側),阻擋部441設置於第一部份4431與第二部分4432之間,並且向外徑向延伸,以阻擋液體由排水口15與管狀部443之間的縫隙流入排水孔15。另外,第二管體42是活動地連接於底閥座44,例如第二管體42是套設於底閥座44的管狀部443外,但本揭露並不限於此,也可以是底閥座44的管狀部443套設於第二管體42外,且底閥座44的管狀部443的第二部分4432設置有多個側開口445,當光學膜處理槽1有排出處理液2的需求時,可以移動第二管體42使側開口445露出,以排出光學膜處理槽1內的處理液2。In one embodiment, the
在一實施例中,第二管體42上可具有一卡勾部421,配置以連接於一驅動件60。在一實施例中,卡勾部421可為一提把,驅動件60可為一鍊條,但不限於此。驅動件60可用以拉動第二管體42沿著Z軸方向移動。In an embodiment, the
請參考第10圖至第11圖,第11圖為根據本揭露一實施例之第二管體42相對於第一管體41移動後之立體示意圖。如第11圖所示,當驅動件60驅動第二管體42沿著Z軸方向朝向第一管體41移動時,被第二管體42遮蔽的側開口445便會露出。於是,光學膜處理槽1內的處理液2便可經由側開口445流入排水孔15而被排出至光學膜處理槽1外。Please refer to FIG. 10 to FIG. 11. FIG. 11 is a perspective view of the
另外,第三壁13上可設置有一固定件50,驅動件60可被固定於固定件50上,以使處理液2持續地經由側開口445流入排水孔15內。當處理液2排放到所需的水位時,驅動件60可由固定件50解開並放鬆,此時第二管體42會因重力而朝向阻擋部441移動而遮蔽側開口445,如第10圖所示,以使處理液2不再排出。In addition, a fixing
本揭露提供一種導液結構200,設置於滾輪160以及溢流裝置3之間,導液結構200是配置以引導來自灑水模組250以及流經滾輪160的清潔液體,以避免清潔液體直接滴落至溢流裝置3而產生氣泡的問題。因此,根據本揭露之導液結構200的設計,清潔液體直接滴落至處理液而產生之氣泡吸附雜質而造成雜質沾附於光學膜材上的機率可以大幅地被降低。The present disclosure provides a
另外,在一些實施例中,排水管40可具有第一管體41、第二管體42及底閥座44。當需要排水時,可驅動第二管體42朝向第一管體41移動,使底閥座44上被第二管體42遮蔽的側開口445露出,進而使處理液2由側開口445排放。基於排水管40的結構設計,工作人員只需要拉動第二管體42便可以進行排水,而不需要將盒體部32以及排水管40整個移出光學膜處理槽1,因此本揭露的設計可降低人員的負擔以及增加排水的便利性。In addition, in some embodiments, the
雖然本揭露的實施例及其優點已揭露如上,但應該瞭解的是,任何所屬技術領域中具有通常知識者,在不脫離本揭露之精神和範圍內,當可作更動、替代與潤飾。此外,本揭露之保護範圍並未侷限於說明書內所述特定實施例中的製程、機器、製造、物質組成、裝置、方法及步驟,任何所屬技術領域中具有通常知識者可從本揭露揭示內容中理解現行或未來所發展出的製程、機器、製造、物質組成、裝置、方法及步驟,只要可以在此處所述實施例中實施大抵相同功能或獲得大抵相同結果皆可根據本揭露使用。因此,本揭露之保護範圍包括上述製程、機器、製造、物質組成、裝置、方法及步驟。另外,每一申請專利範圍構成個別的實施例,且本揭露之保護範圍也包括各個申請專利範圍及實施例的組合。Although the embodiments of the present disclosure and their advantages have been disclosed as above, it should be understood that anyone with ordinary knowledge in the relevant technical field can make changes, substitutions and modifications without departing from the spirit and scope of the present disclosure. In addition, the scope of protection of this disclosure is not limited to the manufacturing process, machinery, manufacturing, material composition, device, method, and steps in the specific embodiments described in the specification. Anyone with ordinary knowledge in the technical field can disclose the content from this disclosure. It is understood that the current or future developed processes, machines, manufacturing, material composition, devices, methods, and steps can be used according to the present disclosure as long as they can implement substantially the same functions or obtain substantially the same results in the embodiments described herein. Therefore, the protection scope of the present disclosure includes the above-mentioned manufacturing processes, machines, manufacturing, material composition, devices, methods, and steps. In addition, each patent application scope constitutes an individual embodiment, and the protection scope of the present disclosure also includes each patent application scope and a combination of embodiments.
1:光學膜處理槽1: Optical film processing tank
2:處理液2: Treatment liquid
3:溢流裝置3: overflow device
3e:內部空間3e: internal space
4:過濾件4: filter
10:淨化裝置10: Purification device
11:第一壁11: The first wall
12:第二壁12: second wall
13:第三壁13: The third wall
131:延伸連接件131: Extension connector
14:第四壁14: Fourth Wall
15:排水孔15: Drain hole
151:排水面151: Drainage surface
16:底面16: bottom
30:排水管30: Drain pipe
30h:開口30h: opening
31:引流板31: Drainage plate
31A、31B、31C、31D、31E、31F、31G、31H、31I、31J、31K:起伏結構31A, 31B, 31C, 31D, 31E, 31F, 31G, 31H, 31I, 31J, 31K: undulating structure
31Ab:最低點31Ab: lowest point
31At:最高點31At: highest point
32:盒體部32: Box body
32h:通孔32h: Through hole
40:排水管40: Drain pipe
41:第一管體41: The first tube body
42:第二管體42: second tube body
421:卡勾部421: Card Hook
44:底閥座44: bottom valve seat
441:阻擋部441: Block
443:管狀部443: Tubular section
4431:第一部份4431: Part One
4432:第二部分4432: second part
445:側開口445: side opening
50:固定件50: fixed parts
60:驅動件60: Drive
101:循環管路101: Circulation line
100:光學膜材100: Optical film
110:膨潤槽110: swelling tank
120:染色槽120: Dyeing tank
130:交聯槽130: Cross-linking tank
140:水洗槽140: washing tank
150:乾燥爐150: Drying furnace
160:滾輪160: Roller
160X:轉軸160X: shaft
301:提把301: Handle
310:開孔310: hole
320:固定件320: fixed parts
a:長度a: length
b:寬度b: width
c:高度c: height
H:起伏結構之最高點與最低點之間的距離H: The distance between the highest point and the lowest point of the undulating structure
L:起伏結構相鄰波段之最高點之間的距離L: The distance between the highest points of adjacent bands of the undulating structure
P1:入液區域P1: Liquid entry area
P2:移送區域P2: Transfer area
P3:出液區域P3: Outlet area
200:導液結構200: Liquid-conducting structure
201:本體201: Body
2011:擋牆2011: retaining wall
202:側翼結構202: Flanking structure
204:第一導引斜面204: The first guide slope
206:第二導引斜面206: The second guide slope
250:灑水模組250: Sprinkler module
Ag1:夾角Ag1: included angle
Ag2:夾角Ag2: included angle
Ag3:夾角Ag3: included angle
AX1:長軸方向AX1: Long axis direction
AX2:短軸方向AX2: Minor axis direction
CL1:中心線CL1: Centerline
D1:最短距離D1: shortest distance
D2:最短距離D2: shortest distance
D3:距離D3: distance
HL1:參考平面HL1: Reference plane
HL2:參考平面HL2: Reference plane
HL3:參考平面HL3: Reference plane
L1:長度L1: length
X:X軸X: X axis
Y:Y軸Y: Y axis
Z:Z軸Z: Z axis
本揭露可藉由之後的詳細說明並配合圖式而得到清楚的了解。要強調的是,按照業界的標準做法,各種特徵並沒有按比例繪製,並且僅用於說明之目的。事實上,為了能夠清楚的說明,因此各種特徵的尺寸可能會任意地放大或者縮小。 第1圖繪示根據本揭露一些實施例中,光學膜材之製程設備示意圖。 第2A圖繪示根據本揭露一實施例之處理裝置之光學膜處理槽之處理液的循環示意圖。 第2B圖繪示第2A圖之光學膜處理槽之上視圖。 第3A圖繪示根據本揭露另一實施例之處理裝置之光學膜處理槽之處理液的循環示意圖。 第3B圖繪示第3A圖之光學膜處理槽之上視圖。 第4圖繪示根據本揭露一實施例之光學膜處理槽之部分分解圖。 第5圖繪示根據本揭露一實施例之光學膜處理槽之立體圖。 第6A圖~第6K圖分別繪示本揭露一些實施例之不同形狀的起伏結構。 第7圖為根據本揭露另一實施例之光學膜處理槽之立體圖。 第8圖為根據本揭露另一實施例之光學膜處理槽沿著X軸方向觀看之示意圖。 第9圖為根據本揭露另一實施例之光學膜處理槽沿著Y軸方向觀看之示意圖。 第10圖為根據本揭露另一實施例之光學膜處理槽之部分結構的立體圖。 第11圖為根據本揭露另一實施例之第二管體相對於第一管體移動後之立體示意圖。 The present disclosure can be clearly understood by the detailed description and the accompanying drawings. It should be emphasized that in accordance with industry standard practices, the various features are not drawn to scale and are used for illustrative purposes only. In fact, in order to be able to explain clearly, the size of various features may be arbitrarily enlarged or reduced. FIG. 1 shows a schematic diagram of a process equipment for optical film materials in some embodiments according to the present disclosure. FIG. 2A is a schematic diagram showing the circulation of the processing liquid in the optical film processing tank of the processing device according to an embodiment of the disclosure. Figure 2B shows a top view of the optical film processing tank of Figure 2A. FIG. 3A is a schematic diagram showing the circulation of the processing liquid in the optical film processing tank of the processing device according to another embodiment of the disclosure. Figure 3B shows a top view of the optical film processing tank of Figure 3A. FIG. 4 is a partial exploded view of an optical film processing tank according to an embodiment of the present disclosure. FIG. 5 is a perspective view of an optical film processing tank according to an embodiment of the disclosure. FIGS. 6A to 6K respectively illustrate undulating structures of different shapes according to some embodiments of the present disclosure. FIG. 7 is a perspective view of an optical film processing tank according to another embodiment of the present disclosure. FIG. 8 is a schematic diagram of an optical film processing tank according to another embodiment of the disclosure viewed along the X-axis direction. FIG. 9 is a schematic diagram of an optical film processing tank according to another embodiment of the present disclosure when viewed along the Y-axis direction. FIG. 10 is a perspective view of a partial structure of an optical film processing tank according to another embodiment of the disclosure. FIG. 11 is a perspective schematic view of the second tube body after moving relative to the first tube body according to another embodiment of the disclosure.
1:光學膜處理槽 1: Optical film processing tank
2:處理液 2: Treatment liquid
3:溢流裝置 3: overflow device
3e:內部空間 3e: internal space
12:第二壁 12: second wall
13:第三壁 13: The third wall
14:第四壁 14: Fourth Wall
31:引流板 31: Drainage plate
31Ab:最低點 31Ab: lowest point
31At:最高點 31At: highest point
32:盒體部 32: Box body
40:排水管 40: Drain pipe
160:滾輪 160: Roller
310:開孔 310: hole
320:固定件 320: fixed parts
200:導液結構 200: Liquid-conducting structure
201:本體 201: Body
2011:擋牆 2011: retaining wall
202:側翼結構 202: Flanking structure
250:灑水模組 250: Sprinkler module
AX1:長軸方向 AX1: Long axis direction
AX2:短軸方向 AX2: Minor axis direction
X:X軸 X: X axis
Y:Y軸 Y: Y axis
Z:Z軸 Z: Z axis
Claims (20)
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CN202011442418.XA CN112793194B (en) | 2020-05-28 | 2020-12-08 | Processing apparatus and method for forming optical film material |
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TW201836719A (en) * | 2017-03-28 | 2018-10-16 | 住華科技股份有限公司 | Overflow means, processing apparatus and method for manufacturing optical film |
CN208627997U (en) * | 2018-06-28 | 2019-03-22 | 重庆三创印刷有限公司 | UV idler wheel cleaning solvent recyclable device |
TW201924790A (en) * | 2017-11-21 | 2019-07-01 | 住華科技股份有限公司 | Optical film processing apparatus and method for removing liquid from a surface of an optical film |
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CN2646247Y (en) * | 2003-08-22 | 2004-10-06 | 李飞宇 | Pressure type flushing system |
CN206913712U (en) * | 2017-02-23 | 2018-01-23 | 住友化学株式会社 | The processing unit of polyvinyl alcohol mesentery |
TWI620905B (en) * | 2017-06-14 | 2018-04-11 | 住華科技股份有限公司 | Device for removing liquid |
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TW201836719A (en) * | 2017-03-28 | 2018-10-16 | 住華科技股份有限公司 | Overflow means, processing apparatus and method for manufacturing optical film |
TW201924790A (en) * | 2017-11-21 | 2019-07-01 | 住華科技股份有限公司 | Optical film processing apparatus and method for removing liquid from a surface of an optical film |
CN208627997U (en) * | 2018-06-28 | 2019-03-22 | 重庆三创印刷有限公司 | UV idler wheel cleaning solvent recyclable device |
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