TW201836719A - Overflow means, processing apparatus and method for manufacturing optical film - Google Patents

Overflow means, processing apparatus and method for manufacturing optical film Download PDF

Info

Publication number
TW201836719A
TW201836719A TW106110367A TW106110367A TW201836719A TW 201836719 A TW201836719 A TW 201836719A TW 106110367 A TW106110367 A TW 106110367A TW 106110367 A TW106110367 A TW 106110367A TW 201836719 A TW201836719 A TW 201836719A
Authority
TW
Taiwan
Prior art keywords
wall
box body
body portion
overflow device
optical film
Prior art date
Application number
TW106110367A
Other languages
Chinese (zh)
Inventor
陳志耕
蘇丘容
Original Assignee
住華科技股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 住華科技股份有限公司 filed Critical 住華科技股份有限公司
Priority to TW106110367A priority Critical patent/TW201836719A/en
Priority to CN201710364573.6A priority patent/CN107097438A/en
Publication of TW201836719A publication Critical patent/TW201836719A/en

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C71/00After-treatment of articles without altering their shape; Apparatus therefor
    • B29C71/0009After-treatment of articles without altering their shape; Apparatus therefor using liquids, e.g. solvents, swelling agents
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/001Processes for the treatment of water whereby the filtration technique is of importance
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18Manufacture of films or sheets
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2329/00Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal, or ketal radical; Hydrolysed polymers of esters of unsaturated alcohols with saturated carboxylic acids; Derivatives of such polymer
    • C08J2329/02Homopolymers or copolymers of unsaturated alcohols
    • C08J2329/04Polyvinyl alcohol; Partially hydrolysed homopolymers or copolymers of esters of unsaturated alcohols with saturated carboxylic acids

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Organic Chemistry (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Hydrology & Water Resources (AREA)
  • Environmental & Geological Engineering (AREA)
  • Water Supply & Treatment (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
  • Cleaning By Liquid Or Steam (AREA)

Abstract

An overflow means and processing apparatus are provided. The overflow means is used for controlling the flow direction of the processing liquid in the processing apparatus, and includes a case portion, a flow-guiding plate and a drainage pipe connecting the case portion. The flow-guiding plate is movably disposed on at least one side of the case portion so that the height of the flow-guiding plate can be adjusted according to the liquid level of the processing liquid to guide the processing liquid into the case portion.

Description

溢流裝置、處理裝置及光學膜材之形成方法Overflow device, processing device and method for forming optical film

本揭露是有關於一種溢流裝置及處理裝置,且特別是有關於一種可隨液面調整高度的溢流裝置及應用其之處理槽。This disclosure relates to an overflow device and a processing device, and more particularly to an overflow device capable of adjusting the height with the liquid surface and a processing tank using the same.

光學膜材通常需要歷經各種液體處理的濕式製程,但於製程期間,容易產生膜屑或塵埃等雜質漂浮於處理液之中,經回流後便有很高的機率附著於光學膜材上,導致缺陷產生。Optical film materials usually need to undergo a variety of liquid processing wet processes, but during the process, it is easy to produce film debris or dust and other impurities floating in the treatment liquid, after reflow, there is a high probability of attaching to the optical film material, Cause defects.

本揭露內容係有關於一種溢流裝置及處理裝置。實施例中,溢流裝置包括一引流板,可動地配置於盒體部的至少一側上,且引流板的高度為可調式,以控制處理液之流向並將其導引至盒體部內過濾掉雜質,減少雜質沾附於光學膜材上的機率。The disclosure relates to an overflow device and a processing device. In the embodiment, the overflow device includes a drainage plate movably disposed on at least one side of the box body portion, and the height of the drainage plate is adjustable to control the flow direction of the processing liquid and guide it to the box body for filtration Remove impurities and reduce the chance of impurities sticking to the optical film.

根據本揭露之一方面,提出一種溢流裝置。此溢流裝置包括一盒體部、一引流板以及一排水管。引流板可動地配置於盒體部的至少一側上,且引流板之高度係可調式。排水管連接於盒體部。According to an aspect of the present disclosure, an overflow device is proposed. The overflow device includes a box body, a drainage plate and a drain pipe. The drainage plate is movably disposed on at least one side of the box body, and the height of the drainage plate is adjustable. The drain pipe is connected to the box body.

根據本揭露之另一方面,提出一種處理裝置,包括處理槽以及上述溢流裝置。處理槽中容置處理液,溢流裝置設置於處理槽之內。According to another aspect of the present disclosure, a processing device is provided, which includes a processing tank and the overflow device. A processing liquid is contained in the processing tank, and an overflow device is disposed in the processing tank.

根據本揭露之另一方面,提出一種光學膜材的形成方法,此方法包括以下步驟。進行輸送光學膜材經過上述處理裝置之步驟。接著,進行乾燥光學膜材之步驟。According to another aspect of the present disclosure, a method for forming an optical film is provided. The method includes the following steps. The step of conveying the optical film through the processing device is performed. Next, a step of drying the optical film material is performed.

為了對本揭露之上述及其他方面有更佳的瞭解,下文特舉實施例,並配合所附圖式詳細說明如下:In order to have a better understanding of the above and other aspects of this disclosure, the following specific examples are described in detail below in conjunction with the drawings:

本揭露內容係有關於一種溢流裝置及處理裝置。實施例中,溢流裝置包括一引流板,可動地配置於盒體部的至少一側上,且引流板的位置可隨處理液之液面調整,以控制處理液之流向並將其導引至盒體部內過濾掉雜質,減少雜質沾附於光學膜材上的機率。The disclosure relates to an overflow device and a processing device. In the embodiment, the overflow device includes a drainage plate movably disposed on at least one side of the box body portion, and the position of the drainage plate can be adjusted with the liquid level of the processing liquid to control the flow direction of the processing liquid and guide it The impurities are filtered out in the box body to reduce the chance of the impurities sticking to the optical film.

須注意的是,本揭露並非顯示出所有可能的實施例,未於本揭露提出的其他實施態樣也可能可以應用。再者,圖式上的尺寸比例並非按照實際產品等比例繪製。因此,說明書和圖示內容僅作敘述實施例之用,而非作為限縮本揭露保護範圍之用。另外,實施例中之敘述,例如細部結構、製程步驟和材料應用等等,僅為舉例說明之用,並非對本揭露欲保護之範圍做限縮。實施例之步驟和結構各之細節可在不脫離本揭露之精神和範圍內根據實際應用製程之需要而加以變化與修飾。以下是以相同/類似的符號表示相同/類似的元件做說明。It should be noted that this disclosure does not show all possible embodiments, and other implementations not proposed in this disclosure may also be applicable. Moreover, the dimensional proportions in the drawings are not drawn according to the actual products. Therefore, the contents of the description and the drawings are only used to describe the embodiments, and not used to limit the scope of the disclosure. In addition, the descriptions in the embodiments, such as the detailed structure, process steps, and application of materials, are for illustration purposes only, and are not intended to limit the scope of the disclosure to be protected. The details of the steps and structures of the embodiments can be changed and modified according to the needs of the actual application process without departing from the spirit and scope of the present disclosure. The following uses the same / similar symbols to indicate the same / similar components for explanation.

請參照第1圖,其繪示根據本揭露一些實施例中,光學膜材100之製程設備示意圖。舉例而言,在光學膜材100的製程中,可具有以下步驟:膨潤處理、染色處理、拉伸處理、交聯處理、洗淨處理以及乾燥處理。光學膜材100可經過複數個滾輪160的導引依序通過:用以進行膨潤處理之膨潤槽110、用以進行染色處理之染色槽120、以及用以進行交聯處理之交聯槽130。接著,輸送光學膜材100通過水洗槽140,以將表面附著之反應溶液洗淨。之後,藉由乾燥爐150予以乾燥,即可獲得光學膜材100。然而,由於光學膜材100在通過例如是膨潤槽110、染色槽120、交聯槽130及水洗槽140等處理槽時,其表面或製程環境中的膜屑或塵埃等雜質容易帶入於這些處理槽中,此些雜質可能附著於光學膜材100之表面,而影響光學膜材100的光學性質與產出品質。Please refer to FIG. 1, which illustrates a schematic diagram of a manufacturing process of the optical film 100 in some embodiments according to the present disclosure. For example, the manufacturing process of the optical film 100 may include the following steps: swelling treatment, dyeing treatment, stretching treatment, crosslinking treatment, washing treatment, and drying treatment. The optical film 100 can be sequentially passed through the guidance of a plurality of rollers 160: a swelling tank 110 for performing a swelling treatment, a dyeing tank 120 for performing a dyeing treatment, and a crosslinking tank 130 for performing a crosslinking treatment. Next, the optical film material 100 is conveyed through the water washing tank 140 to wash the reaction solution attached to the surface. After that, it is dried in the drying furnace 150 to obtain the optical film 100. However, when the optical film 100 passes through processing tanks such as the swelling tank 110, the dyeing tank 120, the cross-linking tank 130, and the water washing tank 140, impurities such as film debris or dust in the surface or the process environment are easily brought into these In the processing tank, such impurities may adhere to the surface of the optical film material 100 and affect the optical properties and output quality of the optical film material 100.

在一實施例中,光學膜材100表面之雜質包括光學膜材屑,例如是聚乙烯醇屑、製程浴槽中的化學藥劑結晶、鐵鏽屑或其他製程材料或設備中產生之雜質。In one embodiment, impurities on the surface of the optical film 100 include optical film scraps, such as polyvinyl alcohol scraps, chemical crystals in a process bath, rust scraps, or impurities generated in other process materials or equipment.

在一實施例中,所述的光學膜材100可為一單層或多層膜片,例如可為一偏光片、相位差膜、增亮膜或其他對光學之增益、配向、補償、轉向、直交、擴散、保護、防黏、耐刮、抗眩、反射抑制、高折射率等有所助益的膜片。In one embodiment, the optical film 100 may be a single-layer or multi-layer film, for example, it may be a polarizer, a retardation film, a brightness enhancement film, or other optical gain, alignment, compensation, steering, Orthogonal, diffuse, protective, anti-stick, scratch-resistant, anti-glare, reflection suppression, high refractive index and other helpful films.

在一實施例中,光學膜材100可為一聚乙烯醇(PVA)樹脂膜,其可藉由皂化聚醋酸乙烯樹脂製得。聚醋酸乙烯樹脂的例子包括醋酸乙烯之單聚合物,即聚醋酸乙烯,以及醋酸乙烯之共聚合物和其他能與醋酸乙烯進行共聚合之單體。其他能與醋酸乙烯進行共聚合之單體的例子包括不飽和羧酸(例如丙烯酸、甲基丙烯酸、丙烯酸乙酯、正丙烯酸丙酯、甲基丙烯酸甲酯)、烯烴(例如乙烯、丙烯、1-丁烯、2-甲丙烯)、乙烯醚(例如乙基乙烯醚、甲基乙烯醚、正丙基乙烯醚、異丙基乙烯醚)、不飽和磺酸(例如乙烯基磺酸、乙烯基磺酸鈉)等。製程浴槽3係進行染色交聯製程、表面處理製程或水洗製程之浴槽。In one embodiment, the optical film 100 can be a polyvinyl alcohol (PVA) resin film, which can be made by saponifying a polyvinyl acetate resin. Examples of the polyvinyl acetate resin include a single polymer of vinyl acetate, that is, polyvinyl acetate, and a copolymer of vinyl acetate and other monomers capable of copolymerizing with vinyl acetate. Examples of other monomers copolymerizable with vinyl acetate include unsaturated carboxylic acids (e.g. acrylic acid, methacrylic acid, ethyl acrylate, propyl n-acrylate, methyl methacrylate), olefins (e.g. ethylene, propylene, 1 -Butene, 2-methylpropene), vinyl ethers (e.g. ethyl vinyl ether, methyl vinyl ether, n-propyl vinyl ether, isopropyl vinyl ether), unsaturated sulfonic acids (e.g. vinyl sulfonic acid, vinyl Sodium sulfonate) and the like. The process bath 3 is a bath for dyeing and cross-linking process, surface treatment process or water washing process.

請參照第2A圖,其繪示根據本揭露一實施例之處理裝置之處理槽1的處理液2的循環示意圖。處理槽1可以是上述膨潤槽110、染色槽120、交聯槽130及水洗槽140中之一,但本揭露不限於此。處理槽1中貯存有處理液2,且可包括至少一溢流裝置3。為便於說明,實施例中,係將光學膜材(未繪示)浸入處理液2之區域定義為一入液區域P1,將光學膜材於處理液2中移送之區域定義為一移送區域P2,將光學膜材從處理液2拉出之區域定義為一出液區域P3。藉由至少一溢流裝置3的設置,可控制處理液2的流向,並將處理液2中的雜質經由溢流裝置3過濾掉,避免這些雜質回流至入液區域P1、移送區域P2或是出液區域P3而沾附於光學膜材。具體而言,溢流裝置3可包括一引流板31以及一排水管30,引流板31之位置可隨處理液2之液面調整,以將含雜質的處理液2自引流板31導引入內,並經由排水管30排出至處理槽1外部之循環管路101。於此,循環管路101可設有一淨化裝置10,藉以過濾掉處理液2中的雜質。接著,經過濾淨化後的處理液2可再循環流回至處理槽1中使用。Please refer to FIG. 2A, which illustrates a schematic diagram of the circulation of the processing liquid 2 in the processing tank 1 of the processing apparatus according to an embodiment of the disclosure. The treatment tank 1 may be one of the swelling tank 110, the dyeing tank 120, the crosslinking tank 130, and the water washing tank 140 described above, but the disclosure is not limited thereto. The treatment tank 1 stores a treatment liquid 2 and may include at least one overflow device 3. For the convenience of description, in the embodiment, the area where the optical film (not shown) is immersed in the processing liquid 2 is defined as a liquid-receiving area P1, and the area where the optical film is transferred in the processing liquid 2 is defined as a transfer area P2 The area where the optical film material is pulled out from the processing liquid 2 is defined as a liquid discharge area P3. With the arrangement of at least one overflow device 3, the flow direction of the processing liquid 2 can be controlled, and impurities in the processing liquid 2 can be filtered out through the overflow device 3 to prevent these impurities from flowing back into the liquid inlet area P1, the transfer area P2 or The liquid discharge region P3 adheres to the optical film material. Specifically, the overflow device 3 may include a drainage plate 31 and a drain pipe 30, and the position of the drainage plate 31 may be adjusted according to the liquid level of the treatment liquid 2 to guide the treatment liquid 2 containing impurities from the drainage plate 31 Inside, and is discharged to the circulation pipe 101 outside the treatment tank 1 through the drain pipe 30. Here, the circulation pipeline 101 may be provided with a purification device 10 to filter out impurities in the treatment liquid 2. Then, the filtered and purified treatment liquid 2 can be recycled to the treatment tank 1 for reuse.

請參照第2B圖,其繪示第2A圖之處理槽1之上視圖。處理槽1可包括一第一壁11、一第二壁12、一第三壁13及一第四壁14,第一壁11與第三壁13相對,第二壁12與第四壁14相對。在另一實施例中,處理槽1亦可為其他形狀,例如多邊形或圓形等,而不以本實施例之圖式為限。Please refer to FIG. 2B, which shows a top view of the processing tank 1 of FIG. 2A. The processing tank 1 may include a first wall 11, a second wall 12, a third wall 13, and a fourth wall 14. The first wall 11 is opposed to the third wall 13, and the second wall 12 is opposed to the fourth wall 14. . In another embodiment, the processing tank 1 may have other shapes, such as a polygon or a circle, and is not limited to the drawings in this embodiment.

實施例中,溢流裝置3可設置於處理槽1內的不同位置,且數量亦不限。舉例來說,請參照第2B圖,溢流裝置3可經由一支撐基座(未繪示)而設置於第一壁11、第二壁12、第三壁13及第四壁14的至少一壁上,亦可在每個壁上皆設置溢流裝置3。再者,每個壁上亦可設置不只一個溢流裝置3。於此,引流板31可配置於面對入液區域P1、移送區域P2及出液區域P3的一側上,以將漂浮於入液區域P1、移送區域P2或是出液區域P3上方的雜質經由引流板31及排水管30帶出,避免雜質回流至入液區域P1、移送區域P2或是出液區域P3。在一實施例中,當溢流裝置3設置於第一壁11或第三壁13,光學膜材之行進方向與溢流裝置3之長度延伸方向大致垂直;當溢流裝置3設置於第二壁12或第四壁14,光學膜材之行進方向與溢流裝置3之長度延伸方向大致平行。In the embodiment, the overflow device 3 may be disposed at different positions in the processing tank 1, and the number is not limited. For example, referring to FIG. 2B, the overflow device 3 may be disposed on at least one of the first wall 11, the second wall 12, the third wall 13, and the fourth wall 14 via a support base (not shown). Overflow devices 3 can also be provided on each wall. Furthermore, more than one overflow device 3 may be provided on each wall. Here, the drainage plate 31 may be disposed on a side facing the liquid inlet region P1, the transfer region P2, and the liquid outlet region P3, so as to float impurities on the liquid inlet region P1, the transfer region P2, or the liquid outlet region P3. It is carried out through the drainage plate 31 and the drainage pipe 30 to prevent impurities from flowing back to the liquid-in area P1, the transfer area P2, or the liquid-out area P3. In one embodiment, when the overflow device 3 is disposed on the first wall 11 or the third wall 13, the traveling direction of the optical film material is substantially perpendicular to the length extension direction of the overflow device 3. When the overflow device 3 is disposed on the second wall In the wall 12 or the fourth wall 14, the traveling direction of the optical film material is substantially parallel to the length extension direction of the overflow device 3.

在另一實施例中,如第3A和3B圖所示,溢流裝置3可橫跨於第二壁12及第四壁14設置。具體而言,溢流裝置3設置於移送區域P2上方,且引流板31分別配置於面對入液區域P1和出液區域P3的相對二側上,以將漂浮於入液區域P1、移送區域P2或是出液區域P3上方的雜質經由引流板31及排水管30帶出。此外,一實施例中,亦可同時在第一壁11、第二壁12、第三壁13及第四壁14的至少一壁上配置一或多個溢流裝置3。在第3A和3B圖中,光學膜材之行進方向係與溢流裝置3之長度延伸方向大致垂直,且由溢流裝置3以下之處理液中通過,如第3A圖所示。於此,溢流裝置3之長度延伸方向例如是第3B圖中,與第一壁11和第三壁13平行之方向。In another embodiment, as shown in FIGS. 3A and 3B, the overflow device 3 may be disposed across the second wall 12 and the fourth wall 14. Specifically, the overflow device 3 is disposed above the transfer area P2, and the drainage plates 31 are respectively disposed on two opposite sides facing the liquid inlet area P1 and the liquid outlet area P3 to float on the liquid inlet area P1 and the transfer area. P2 or impurities above the liquid discharge area P3 are carried out through the drainage plate 31 and the drain pipe 30. In addition, in one embodiment, one or more overflow devices 3 may be disposed on at least one of the first wall 11, the second wall 12, the third wall 13, and the fourth wall 14 at the same time. In FIGS. 3A and 3B, the traveling direction of the optical film is substantially perpendicular to the length extension direction of the overflow device 3, and passes through the processing liquid below the overflow device 3, as shown in FIG. 3A. Here, the length extension direction of the overflow device 3 is, for example, a direction parallel to the first wall 11 and the third wall 13 in FIG. 3B.

請參照第4圖,其繪示根據本揭露一實施例之處理槽1之部分分解圖。溢流裝置3更包括一盒體部32,盒體部32例如是具有五面之盒狀物體,且排水管30連接於盒體部32,例如是連接於盒體部32之底面。一實施例中,盒體部32符合2≦(ab)/A≦200及c/a≦0.5,其中a為盒體部32的長度,b為盒體部32的寬度,c為盒體部32的高度,A為排水管30的截面積。其中,a不大於750cm;b不大於20cm;c不大於150cm;以及A不大於300cm2Please refer to FIG. 4, which illustrates a partial exploded view of the processing tank 1 according to an embodiment of the present disclosure. The overflow device 3 further includes a box body portion 32. The box body portion 32 is, for example, a box-shaped object having five sides, and the drain pipe 30 is connected to the box body portion 32, for example, is connected to the bottom surface of the box body portion 32. In one embodiment, the box body portion 32 conforms to 2 ≦ (ab) / A ≦ 200 and c / a ≦ 0.5, where a is the length of the box body portion 32, b is the width of the box body portion 32, and c is the box body portion The height of 32, A is the cross-sectional area of the drain pipe 30. Among them, a is not greater than 750 cm; b is not greater than 20 cm; c is not greater than 150 cm; and A is not greater than 300 cm 2 .

以下詳細描述引流板31之相關配置。實施例中,引流板31係可動地配置於盒體部32的至少一側上,如此,引流板31的位置可隨著處理液2之液面調整。於第4圖的實施例中,盒體部32可具有一底面及四個側面,其中底面係與排水管30連接,且引流板31係設置於四個側面中高度較低的一面。The related configuration of the drainage plate 31 is described in detail below. In the embodiment, the drainage plate 31 is movably disposed on at least one side of the box body portion 32. Thus, the position of the drainage plate 31 can be adjusted according to the liquid level of the processing liquid 2. In the embodiment of FIG. 4, the box body portion 32 may have a bottom surface and four side surfaces, wherein the bottom surface is connected to the drain pipe 30, and the drainage plate 31 is disposed on the lower side of the four side surfaces.

詳細地說,請參照第4~5圖,第5圖繪示根據本揭露一實施例之處理槽1之立體圖。引流板31可具有一開孔310,故可使用一固定件320穿過開孔310而將引流板31鎖固於盒體部32的至少一側上。此處,即是將引流板31固定在盒體部32之四個側面中高度較低的一面上。在一實施例中,開孔310例如是長條孔,開孔310的長軸係垂直於液面。藉此,可依據處理液2之液面高度,而自由調整引流板31的高度,使處理液2可順利流進引流板31和盒體部32所圍成的內部空間3e中。In detail, please refer to FIGS. 4 to 5. FIG. 5 illustrates a perspective view of the processing tank 1 according to an embodiment of the present disclosure. The drainage plate 31 may have an opening 310. Therefore, a fixing member 320 may be inserted through the opening 310 to lock the drainage plate 31 on at least one side of the box body portion 32. Here, the drainage plate 31 is fixed to the lower one of the four side surfaces of the box body portion 32. In an embodiment, the opening 310 is, for example, a long hole, and the long axis of the opening 310 is perpendicular to the liquid surface. Thereby, the height of the drainage plate 31 can be freely adjusted according to the liquid surface height of the processing liquid 2 so that the processing liquid 2 can smoothly flow into the inner space 3e surrounded by the drainage plate 31 and the box body portion 32.

如第4圖所示,引流板31可具有一起伏結構31A,起伏結構31A具有一最高點31At和一最低點31Ab。使用者在調整引流板31的位置時,可使處理液2之液面介於起伏結構31A的最高點31At和最低點31Ab之間。如此一來,便能夠將處理液2導引至內部空間3e中,如第5圖所示。As shown in FIG. 4, the drainage plate 31 may have an undulating structure 31A, and the undulating structure 31A has a highest point 31At and a lowest point 31Ab. When the user adjusts the position of the drainage plate 31, the liquid level of the processing liquid 2 can be between the highest point 31At and the lowest point 31Ab of the undulating structure 31A. In this way, the processing liquid 2 can be guided into the internal space 3e, as shown in FIG. 5.

請參照第6A圖,其繪示起伏結構31A之形狀。其中,起伏結構31A之形狀係為三角形之連續組合。起伏結構31A相鄰波段之最高點的距離為L,起伏結構31A之最高點31At與最低點31Ab之間的距離為H,起伏結構31A係符合0.005≦L/a≦1及0.03≦H/c≦1。較佳的,起伏結構31A係符合0.01≦L/a≦0.1及0.03≦H/c≦0.33,其中,a為盒體部32的長度,c為盒體部32的高度。Please refer to FIG. 6A, which shows the shape of the undulating structure 31A. The shape of the undulating structure 31A is a continuous combination of triangles. The distance between the highest point of the undulating structure 31A adjacent to the band is L, and the distance between the highest point 31At and the lowest point 31Ab of the undulating structure 31A is H. The undulating structure 31A conforms to 0.005 ≦ L / a ≦ 1 and 0.03 ≦ H / c ≦ 1. Preferably, the undulating structure 31A conforms to 0.01 ≦ L / a ≦ 0.1 and 0.03 ≦ H / c ≦ 0.33, where a is the length of the box body portion 32 and c is the height of the box body portion 32.

雖然第6A圖所繪示之起伏結構31A的形狀為三角形之連續組合,但本揭露並未限定於此。請參照第6B圖至第6K圖,其分別繪示本揭露內容實施例之不同形狀的起伏結構31B、31C、31D、31E、31F、31G、31H、31I、31J及31K。如第6B圖所示,起伏結構31B之形狀可為三角形之非連續組合。如第6C、6D、6E和6F圖所示,起伏結構31C、31D、31E和31F可分別包括不同弧度及其組合的弧形。如第6G和6H圖所示,起伏結構31G和31H可分別為四邊形之連續和非連續組合,四邊形例如為梯形。如第6I、6J和6K圖所示,起伏結構31I、31J和31K可為多邊形之連續或非連續組合,例如,起伏結構31I和31J可分別為五邊形之連續和非連續組合,起伏結構31K可為六邊形之連續組合。再者,本揭露起伏結構之形狀並未限於此,起伏結構之形狀亦可為上述圖形之各種組合。Although the shape of the undulating structure 31A shown in FIG. 6A is a continuous combination of triangles, the disclosure is not limited thereto. Please refer to FIG. 6B to FIG. 6K, which respectively show the undulating structures 31B, 31C, 31D, 31E, 31F, 31G, 31H, 31I, 31J, and 31K of different shapes of the embodiments of the disclosure. As shown in FIG. 6B, the shape of the undulating structure 31B may be a discontinuous combination of triangles. As shown in FIGS. 6C, 6D, 6E, and 6F, the undulating structures 31C, 31D, 31E, and 31F may include arcs of different radians and combinations thereof. As shown in Figs. 6G and 6H, the undulating structures 31G and 31H may be continuous and discontinuous combinations of quadrilaterals, for example, the quadrilaterals are trapezoidal. As shown in Figures 6I, 6J, and 6K, the undulating structures 31I, 31J, and 31K can be continuous or discontinuous combinations of polygons. For example, the undulating structures 31I and 31J can be continuous and discontinuous combinations of pentagons. 31K can be a continuous combination of hexagons. Furthermore, the shape of the undulating structure is not limited to this, and the shape of the undulating structure can also be various combinations of the above figures.

另外,請參照第5圖,在另一實施例中,溢流裝置3可更包括一過濾件4,過濾件4係可拆卸地配置於盒體部32內,例如是配置在內部空間3e中。過濾件4例如是一過濾網。其中過濾件4具有每平方英寸20~500的孔目數(單位:mesh),藉此,可初步濾除較大型的雜質與雜質,以進一步增加濾除雜質的效率,同時可避免大型雜質與雜質造成排水管30阻塞。再者,排水管30的數量可為一個以上,故可依據實際使用情形增加/減少排水管30的數量。In addition, please refer to FIG. 5. In another embodiment, the overflow device 3 may further include a filter element 4. The filter element 4 is detachably disposed in the box body portion 32, for example, in the internal space 3 e. . The filter 4 is, for example, a filter. The filter element 4 has a mesh number (unit: mesh) of 20 to 500 per square inch. By this, larger impurities and impurities can be filtered out initially to further increase the efficiency of filtering out impurities, while avoiding large impurities and The impurities cause the drain pipe 30 to become blocked. Furthermore, the number of the drainage pipes 30 may be more than one, so the number of the drainage pipes 30 may be increased / decreased according to the actual use situation.

如第5圖所示,由於排水管30可不斷地將內部空間3e中的處理液2向外排出,故內部空間3e中處理液2之液面高度較處理槽1中之處理液2液面高度低,內部空間3e中的處理液2不會回流至處理槽1中,防止光學膜材沾附處理液2之雜質。As shown in FIG. 5, since the drain pipe 30 can continuously discharge the processing liquid 2 in the internal space 3e, the liquid level of the processing liquid 2 in the internal space 3e is higher than that of the processing liquid 2 in the processing tank 1. The height is low, and the processing liquid 2 in the internal space 3e will not flow back into the processing tank 1 to prevent the optical film from adhering to the impurities of the processing liquid 2.

此外,一實施例中,排水管30係可拆卸地連接於盒體部32。請參照第4圖,盒體部32可具有一通孔32h,通孔32h例如是設置在盒體部32的底面,但不以此為限。排水管30可具有一開口30h,開口30h對應於通孔32h之大小,例如是依據公差之設計而略小於通孔32h之大小。如此,排水管30可透過開口30h嵌入於通孔32h內而與盒體部32結合,但本揭露不以此結合方式為限。此外,排水管30之內部亦可設置一過濾網(未繪製),以進一步將雜質濾除而避免排水管30阻塞。所述的過濾網具有每平方英寸40~2500的孔目數(單位:mesh),配置時,為到達較佳的過濾效果,過濾網每平方英寸孔目數相對於過濾件4的孔目數較多,例如介於過濾件4的孔目數2~5倍之間。In addition, in one embodiment, the drain pipe 30 is detachably connected to the box body portion 32. Referring to FIG. 4, the box body portion 32 may have a through hole 32 h. The through hole 32 h is disposed on the bottom surface of the box body portion 32, but is not limited thereto. The drain pipe 30 may have an opening 30h, and the opening 30h corresponds to the size of the through hole 32h, for example, it is slightly smaller than the size of the through hole 32h according to the design of the tolerance. In this way, the drain pipe 30 can be embedded in the through hole 32h through the opening 30h and combined with the box body portion 32, but the present disclosure is not limited to this combination. In addition, a filter screen (not shown) may be provided inside the drain pipe 30 to further filter out impurities and prevent the drain pipe 30 from being blocked. The filter has a mesh number of 40 to 2500 per square inch (unit: mesh). In order to achieve a better filtering effect, the number of meshes per square inch of the filter is relative to the number of meshes of the filter 4 Many, for example, between 2 and 5 times the number of holes in the filter 4.

一實施例中,如第4圖所示,排水管30可更包括一提把301。當需要進行清洗時,使用者可將盒體部32與排水管30拆解開,且可握住提把301而將排水管30拉出處理槽1進行清洗,便利使用者操作及維護所述之溢流裝置。In an embodiment, as shown in FIG. 4, the drain pipe 30 may further include a handle 301. When cleaning is needed, the user can disassemble the box body portion 32 and the drain pipe 30, and can hold the handle 301 and pull the drain pipe 30 out of the processing tank 1 for cleaning, which is convenient for the user to operate and maintain. Overflow device.

上述所提供之溢流裝置及處理槽,可控制處理槽中處理液的流向,以濾除處理液中含有的雜質。溢流裝置可依據使用情況而配置於處理槽內的不同位置,且配置的數量亦不限。溢流裝置包括一引流板,可動地配置於盒體部的至少一側上。藉此,引流板的位置可隨處理液之液面調整,以控制處理液之流向並將其導引至盒體部內過濾掉雜質,減少雜質沾附於光學膜材上的機率。The overflow device and the processing tank provided above can control the flow direction of the processing liquid in the processing tank to filter out impurities contained in the processing liquid. The overflow device can be arranged in different positions in the processing tank according to the use situation, and the number of the arrangement is not limited. The overflow device includes a drainage plate movably disposed on at least one side of the box body portion. Thereby, the position of the drainage plate can be adjusted according to the liquid level of the processing liquid, so as to control the flow direction of the processing liquid and guide it into the box body to filter out impurities and reduce the chance of the impurities sticking to the optical film.

綜上所述,雖然本發明已以實施例揭露如上,然其並非用以限定本發明。本發明所屬技術領域中具有通常知識者,在不脫離本發明之精神和範圍內,當可作各種之更動與潤飾。因此,本發明之保護範圍當視後附之申請專利範圍所界定者為準。In summary, although the present invention has been disclosed as above with the embodiments, it is not intended to limit the present invention. Those with ordinary knowledge in the technical field to which the present invention pertains can make various changes and modifications without departing from the spirit and scope of the present invention. Therefore, the protection scope of the present invention shall be determined by the scope of the attached patent application.

1‧‧‧處理槽1‧‧‧ treatment tank

2‧‧‧處理液2‧‧‧ treatment liquid

3‧‧‧溢流裝置3‧‧‧ Overflow device

3e‧‧‧內部空間3e‧‧‧Internal space

4‧‧‧過濾件4‧‧‧Filter

10‧‧‧淨化裝置10‧‧‧Purification device

11‧‧‧第一壁11‧‧‧ first wall

12‧‧‧第二壁12‧‧‧ the second wall

13‧‧‧第三壁13‧‧‧ Third wall

14‧‧‧第四壁14‧‧‧ fourth wall

30‧‧‧排水管30‧‧‧ Drain pipe

30h‧‧‧開口30h‧‧‧Open

31‧‧‧引流板31‧‧‧ Drain Board

31A、31B、31C、31D、31E、31F、31G、31H、31I、31J、31K‧‧‧起伏結構31A, 31B, 31C, 31D, 31E, 31F, 31G, 31H, 31I, 31J, 31K

31Ab‧‧‧最低點31Ab‧‧‧ Low

31At‧‧‧最高點31At‧‧‧ Highest Point

32‧‧‧盒體部32‧‧‧Box body

32h‧‧‧通孔32h‧‧‧through hole

101‧‧‧循環管路101‧‧‧Circulation pipeline

100‧‧‧光學膜材100‧‧‧ Optical Film

110‧‧‧膨潤槽110‧‧‧Swelling trough

120‧‧‧染色槽120‧‧‧ Dyeing tank

130‧‧‧交聯槽130‧‧‧ Crosslinking tank

140‧‧‧水洗槽140‧‧‧washing tank

150‧‧‧乾燥爐150‧‧‧ drying furnace

160‧‧‧滾輪160‧‧‧roller

301‧‧‧提把301‧‧‧Handle

310‧‧‧開孔310‧‧‧ opening

320‧‧‧固定件320‧‧‧Fixed parts

a‧‧‧長度a‧‧‧length

b‧‧‧寬度b‧‧‧ width

c‧‧‧高度c‧‧‧ height

H‧‧‧起伏結構之最高點與最低點之間的距離H‧‧‧ The distance between the highest point and the lowest point of the undulating structure

L‧‧‧起伏結構相鄰波段之最高點之間的距離L‧‧‧ the distance between the highest points of adjacent wave bands

P1‧‧‧入液區域P1‧‧‧Into the liquid area

P2‧‧‧移送區域P2‧‧‧ transfer area

P3‧‧‧出液區域P3‧‧‧ discharge area

第1圖繪示根據本揭露一些實施例中,光學膜材之製程設備示意圖。 第2A圖繪示根據本揭露一實施例之處理裝置之處理槽之處理液的循環示意圖。 第2B圖繪示第2A圖之處理槽之上視圖。 第3A圖繪示根據本揭露另一實施例之處理裝置之處理槽之處理液的循環示意圖。 第3B圖繪示第3A圖之處理槽之上視圖。 第4圖繪示根據本揭露一實施例之處理槽之部分分解圖。 第5圖繪示根據本揭露一實施例之處理槽之立體圖。 第6A圖~第6K圖分別繪示本揭露一些實施例之不同形狀的起伏結構。FIG. 1 is a schematic diagram of a process equipment for an optical film in some embodiments according to the present disclosure. FIG. 2A is a schematic diagram of a circulation of a processing liquid in a processing tank of a processing apparatus according to an embodiment of the disclosure. FIG. 2B is a top view of the processing tank of FIG. 2A. FIG. 3A is a schematic diagram of the circulation of the processing liquid in the processing tank of the processing apparatus according to another embodiment of the present disclosure. FIG. 3B is a top view of the processing tank of FIG. 3A. FIG. 4 is a partial exploded view of a processing tank according to an embodiment of the disclosure. FIG. 5 is a perspective view of a processing tank according to an embodiment of the disclosure. FIG. 6A to FIG. 6K respectively show the undulating structures with different shapes according to some embodiments of the present disclosure.

Claims (12)

一種溢流裝置,包括: 一盒體部; 一引流板,可動地配置於該盒體部的至少一側上,其中該引流板之高度係可調式;以及 一排水管,連接於該盒體部。An overflow device includes: a box body portion; a drainage plate movably disposed on at least one side of the box body portion, wherein the height of the drainage plate is adjustable; and a drainage pipe connected to the box body unit. 如申請專利範圍第1項所述之溢流裝置,其中該引流板具有一開孔; 該引流板係藉由一固定件穿過該開孔而固定於該盒體部的該至少一側上;且/或該開孔係長條孔。The overflow device according to item 1 of the scope of patent application, wherein the drainage plate has an opening; the drainage plate is fixed on the at least one side of the box body portion by a fixing member passing through the opening. ; And / or the opening is an elongated hole. 如申請專利範圍第1項所述之溢流裝置,更包括一過濾件; 該過濾件可拆卸地配置於該盒體部內;且/或該過濾件具有每平方英寸20~500的孔目數。The overflow device according to item 1 of the patent application scope further includes a filter element; the filter element is detachably disposed in the box body portion; and / or the filter element has a number of holes of 20 to 500 per square inch . 如申請專利範圍第1項所述之溢流裝置,其中該排水管係可拆卸地連接於該盒體部;且/或該盒體部具有一通孔,該排水管具有一開口,該開口適於嵌入該通孔中,使該排水管與該盒體部結合;且/或該排水管更包括一提把;且/或該排水管內設置一過濾網,該過濾網具有每平方英寸40~2500的孔目數。The overflow device according to item 1 of the scope of patent application, wherein the drain pipe is detachably connected to the box body portion; and / or the box body portion has a through hole, the drain pipe has an opening, and the opening is suitable for The drainage pipe is embedded in the through hole so that the drainage pipe is combined with the box body portion; and / or the drainage pipe further includes a handle; and / or a drainage screen is set in the drainage pipe, and the filtration screen has a per square inch of 40 The number of holes of ~ 2500. 如申請專利範圍第1項所述之溢流裝置,其中該引流板係可動地配置於該盒體部的相對二側上;且/或該引流板具有一起伏結構,其中該起伏結構的形狀係為弧形、三角形、梯形、多邊形或上述圖形之組合。The overflow device according to item 1 of the patent application scope, wherein the drainage plate is movably disposed on two opposite sides of the box body portion; and / or the drainage plate has an undulating structure, wherein the shape of the undulating structure It is arc, triangle, trapezoid, polygon, or a combination of the above graphics. 如申請專利範圍第5項所述之溢流裝置,其中該起伏結構符合0.005≦L/a≦1及0.03≦H/c≦1,其中L係該起伏結構相鄰波段之該最高點之間的距離,H係該起伏結構之該最高點與該最低點之間的距離,a係該盒體部的長度,c係該盒體部的高度。The overflow device according to item 5 of the scope of patent application, wherein the undulating structure conforms to 0.005 ≦ L / a ≦ 1 and 0.03 ≦ H / c ≦ 1, where L is between the highest point of the adjacent band of the undulating structure The distance H is the distance between the highest point and the lowest point of the undulating structure, a is the length of the box body portion, and c is the height of the box body portion. 如申請專利範圍第1項所述之溢流裝置,其中該盒體部符合2≦(ab)/A≦200及c/a≦0.5,其中a係該盒體部的長度,b係該盒體部的寬度,c係該盒體部的高度,A係該排水管的截面積;且/或a不大於750cm,b不大於20cm以及c不大於150cm;A不大於300cm2The overflow device according to item 1 of the scope of patent application, wherein the box body portion meets 2 ≦ (ab) / A ≦ 200 and c / a ≦ 0.5, where a is the length of the box body portion and b is the box portion The width of the body, c is the height of the box body, and A is the cross-sectional area of the drain pipe; and / or a is not greater than 750 cm, b is not greater than 20 cm, and c is not greater than 150 cm; A is not greater than 300 cm 2 . 一種處理裝置,包括: 一處理槽,其中該處理槽中容置一處理液;以及 一如申請專利範圍第1~7項所述之溢流裝置,設置於該處理槽之內。A processing device includes: a processing tank, wherein a processing liquid is contained in the processing tank; and an overflow device according to items 1 to 7 of the scope of patent application, which is arranged in the processing tank. 如申請專利範圍第8項所述之處理裝置,其中該處理槽更包括一第一壁、一第二壁、一第三壁及一第四壁,該第一壁與該第三壁相對,該第二壁與該第四壁相對;其中該至少一溢流裝置係設置於該第一壁、該第二壁、該第三壁及該第四壁的至少一壁上;且/或該處理槽係一膨潤槽、一染色槽、一交聯槽,及/或一水洗槽。The processing device according to item 8 of the scope of patent application, wherein the processing tank further includes a first wall, a second wall, a third wall, and a fourth wall, and the first wall is opposite to the third wall, The second wall is opposite to the fourth wall; wherein the at least one overflow device is disposed on at least one of the first wall, the second wall, the third wall, and the fourth wall; and / or the The treatment tank is a swelling tank, a dyeing tank, a cross-linking tank, and / or a water washing tank. 如申請專利範圍第9項所述之處理裝置,其中該溢流裝置係橫跨於該第二壁及該第四壁,且該溢流裝置之長度延伸方向與該第一壁和該第三壁之方向平行。The processing device according to item 9 of the scope of patent application, wherein the overflow device is across the second wall and the fourth wall, and the length extension direction of the overflow device is the first wall and the third wall. The directions of the walls are parallel. 一種光學膜材的形成方法,包括: 輸送一光學膜材經過一如申請專利範圍第8~10項所述之處理裝置;以及 乾燥該光學膜材。A method for forming an optical film material includes: conveying an optical film material through a processing device as described in items 8 to 10 of the scope of patent application; and drying the optical film material. 如申請專利範圍第11項所述之光學膜材的形成方法,其中該光學膜材係一聚乙烯醇樹脂膜;且/或該光學膜材之行進方向係與該溢流裝置之長度延伸方向大致垂直;且/或該光學膜材由該溢流裝置以下之該處理液中通過。The method for forming an optical film material according to item 11 of the scope of application for patent, wherein the optical film material is a polyvinyl alcohol resin film; and / or the travel direction of the optical film material is the length extension direction of the overflow device Approximately vertical; and / or the optical film is passed through the treatment liquid below the overflow device.
TW106110367A 2017-03-28 2017-03-28 Overflow means, processing apparatus and method for manufacturing optical film TW201836719A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
TW106110367A TW201836719A (en) 2017-03-28 2017-03-28 Overflow means, processing apparatus and method for manufacturing optical film
CN201710364573.6A CN107097438A (en) 2017-03-28 2017-05-22 Overflow device, processing device and forming method of optical film material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW106110367A TW201836719A (en) 2017-03-28 2017-03-28 Overflow means, processing apparatus and method for manufacturing optical film

Publications (1)

Publication Number Publication Date
TW201836719A true TW201836719A (en) 2018-10-16

Family

ID=59669963

Family Applications (1)

Application Number Title Priority Date Filing Date
TW106110367A TW201836719A (en) 2017-03-28 2017-03-28 Overflow means, processing apparatus and method for manufacturing optical film

Country Status (2)

Country Link
CN (1) CN107097438A (en)
TW (1) TW201836719A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI737317B (en) * 2020-05-28 2021-08-21 住華科技股份有限公司 Processing apparatus and method for manufacturing optical film

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN201264979Y (en) * 2008-08-27 2009-07-01 达信科技股份有限公司 Manufacturing system for material layer and manufacturing system for polaroid
CN101983941B (en) * 2010-12-06 2013-01-09 沈阳工业大学 Electric flocculation-air flotation integrated waste water treatment equipment
CN106512912B (en) * 2016-09-07 2018-09-25 深圳三思国际环保科技有限公司 Wastewater treatment equipment and its system

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI737317B (en) * 2020-05-28 2021-08-21 住華科技股份有限公司 Processing apparatus and method for manufacturing optical film

Also Published As

Publication number Publication date
CN107097438A (en) 2017-08-29

Similar Documents

Publication Publication Date Title
TWI618621B (en) Method for manufacturing
US8842364B2 (en) Optical device, manufacturing method thereof, and method of manufacturing master
TWI695961B (en) Liquid remove apparatus and liquid remove method
WO2011162259A1 (en) Method for manufacturing polarizing film
TW201836719A (en) Overflow means, processing apparatus and method for manufacturing optical film
TW200407997A (en) Developing method, substrate processing method and substrate processing device
JP5970117B1 (en) Polarizing film manufacturing method and manufacturing apparatus
JP6111060B2 (en) Initial drying apparatus and initial drying method
TWI737317B (en) Processing apparatus and method for manufacturing optical film
KR101802722B1 (en) Polarizing film production method
JP4813233B2 (en) Cleaning device and cleaning method
TWI714637B (en) Method of manufacturing pellicle adhesive
TWI678236B (en) Scraper, drain device and liquid remove system
JP2008277556A (en) Processing apparatus for substrate
JP6807277B2 (en) Head, foreign matter removing device, film manufacturing equipment, foreign matter removing method, and film manufacturing method
TWI696004B (en) Floating body and system for manufacturing polarizer film by applying the same and method for manufacturing polarizer film by applying the same
CN211490857U (en) Low-speed polishing machine for optical lens processing
JP2021047398A (en) Method and apparatus for manufacturing polarization film
JP2703424B2 (en) Cleaning equipment
CN107520212B (en) Inclined plane mechanism for cleaning lens
CN207641304U (en) Using the membrane module cleaning device of universal adjustment
KR20070121485A (en) Plate cleaning apparatus and method of cleaning plate
TWI659988B (en) System and method for manufacturing a polarizer film
CN214551696U (en) Film slag intercepting device
JP2010219187A (en) Substrate treatment apparatus and substrate treatment method