TWI736736B - Electronic package and method of manufacture - Google Patents
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- TWI736736B TWI736736B TW107102196A TW107102196A TWI736736B TW I736736 B TWI736736 B TW I736736B TW 107102196 A TW107102196 A TW 107102196A TW 107102196 A TW107102196 A TW 107102196A TW I736736 B TWI736736 B TW I736736B
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/56—Encapsulations, e.g. encapsulation layers, coatings
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/31—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
- H01L23/3107—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L25/00—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
- H01L25/16—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof the devices being of types provided for in two or more different main groups of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. forming hybrid circuits
Abstract
Description
本發明係有關一種半導體封裝技術,尤指一種多晶片之電子封裝件及其製法。 The present invention relates to a semiconductor packaging technology, especially a multi-chip electronic package and its manufacturing method.
隨著電子產業的蓬勃發展,電子產品也逐漸邁向多功能、高性能的趨勢。為了滿足電子封裝件微型化(miniaturization)的封裝需求,係發展出晶片級封裝(Chip Scale Package,簡稱CSP)的技術。 With the vigorous development of the electronics industry, electronic products are gradually moving towards the trend of multi-function and high performance. In order to meet the packaging requirements of miniaturization of electronic packages, the technology of Chip Scale Package (CSP) has been developed.
第1A至1E圖係為習知晶片級封裝之半導體封裝件1之製法之剖面示意圖。
FIGS. 1A to 1E are schematic cross-sectional views of the manufacturing method of the
如第1A圖所示,形成一熱化離形膠層(thermal release tape)100於一承載件10上。
As shown in FIG. 1A, a
接著,置放複數半導體晶片11於該熱化離形膠層100上,該些半導體晶片11具有相對之作用面11a與非作用面11b,各該作用面11a上均具有複數電極墊110,且各該作用面11a黏著於該熱化離形膠層100上。
Next, a plurality of
如第1B圖所示,形成一封裝膠體14於該熱化離形膠層100上,以包覆該半導體晶片11。
As shown in FIG. 1B, an
如第1C圖所示,烘烤該封裝膠體14以硬化該熱化離形膠層100而移除該熱化離形膠層100與該承載件10,以外露出該半導體晶片11之作用面11a。
As shown in FIG. 1C, the
如第1D圖所示,形成一線路結構16於該封裝膠體14與該半導體晶片11之作用面11a上,令該線路結構16電性連接該電極墊110。接著,形成一絕緣保護層18於該線路結構16上,且該絕緣保護層18外露該線路結構16之部分表面,以供結合如銲球之導電元件17。
As shown in FIG. 1D, a
如第1E圖所示,沿如第1D圖所示之切割路徑L進行切單製程,以獲取複數個CSP封裝結構之半導體封裝件1,俾供電性連接於電路板(Mother Board)上。
As shown in FIG. 1E, the singulation process is performed along the cutting path L shown in FIG. 1D to obtain a plurality of
惟,習知半導體封裝件1僅有單側設置該半導體晶片11,使該半導體封裝件1之功能及效能受限,而為了符合終端產品之多功能及高功效之需求,故於切單製程時,係將複數個半導體晶片11形成於同一平面上(如第1E圖所示),因而使整體封裝結構之平面面積過大,故難以縮小終端產品之體積。
However, the
再者,如第1F圖所示,業界雖開發出另一種半導體封裝件1’,其線路結構16之上、下側均配置有電子元件(半導體晶片11或被動元件12),以強化終端產品之功能及效能,但因該線路結構16之上、下側所接置之電子元件之數量不同,且該些電子元件之尺寸大小亦不相同,故該線路結構16之上、下側之封裝膠體14,15之厚度t1,t2及體積亦不相同,因而造成該半導體封裝件1’呈現不對稱狀
態而發生翹曲(warpage)之情況,進而無法有效設置於終端產品(如行動電話)之電路板(如軟板基板)上。
Furthermore, as shown in Figure 1F, although the industry has developed another semiconductor package 1', electronic components (
另一方面,製作該半導體封裝件1’時,因採用整組模具同時形成該封裝膠體14,15,故無法調控該封裝膠體14,15之厚度t1,t2,因而難以改變該半導體封裝件1’之翹曲程度。
On the other hand, when the semiconductor package 1'is manufactured, since the entire set of molds are used to simultaneously form the
因此,如何克服習知技術中之種種問題,實已成目前亟欲解決的課題。 Therefore, how to overcome various problems in the conventional technology has become an urgent issue to be solved at present.
鑒於上述習知技術之缺失,本發明提供一種電子封裝件,係包括:承載結構,係具有相對之第一側與第二側;第一電子元件,係設於該承載結構之第一側上;封裝層,係包覆該第一電子元件;第二電子元件,係設於該承載結構之第二側上;調控層,係包覆該第二電子元件;以及強化件,係設於該調控層上。 In view of the deficiencies of the above-mentioned conventional technology, the present invention provides an electronic package, which includes: a supporting structure having a first side and a second side opposite to each other; and a first electronic component disposed on the first side of the supporting structure An encapsulation layer, which covers the first electronic component; a second electronic component, which is arranged on the second side of the carrying structure; a control layer which covers the second electronic component; and a strengthening member which is arranged on the At the regulatory level.
本發明亦提供一種電子封裝件之製法,係包括:提供一封裝組構及一包含有調控層之強化件,其中,該封裝組構包含有具相對之第一側與第二側之承載結構、設於該第一側上之第一電子元件、包覆該第一電子元件之封裝層及設於該第二側上之第二電子元件;以及將該強化件設於該承載結構之第二側上,並使該調控層包覆該第二電子元件。 The present invention also provides a method for manufacturing an electronic package, which includes: providing a package structure and a reinforcing member including a control layer, wherein the package structure includes a supporting structure with a first side and a second side opposite to each other , A first electronic component arranged on the first side, an encapsulation layer covering the first electronic component, and a second electronic component arranged on the second side; and the reinforcing member is arranged on the first side of the supporting structure On both sides, and make the control layer cover the second electronic component.
前述之製法中,復包括將該強化件設於該承載結構之第二側上之前,形成應力部於該承載結構之第二側上。於一實施例中,該應力部係對應位於切單製程之切割路徑上 The aforementioned manufacturing method further includes forming a stress part on the second side of the load-bearing structure before arranging the reinforcing member on the second side of the load-bearing structure. In one embodiment, the stress part is correspondingly located on the cutting path of the single cutting process
前述之電子封裝件及其製法中,該第一電子元件之部分表面係外露出該封裝層。 In the aforementioned electronic package and its manufacturing method, part of the surface of the first electronic component is exposed with the package layer.
前述之電子封裝件及其製法中,該強化件係使用熱膨脹係數小於20的材質製成者。 In the aforementioned electronic package and its manufacturing method, the reinforcement is made of a material with a thermal expansion coefficient of less than 20.
前述之電子封裝件及其製法中,該調控層係為絕緣材。 In the aforementioned electronic package and its manufacturing method, the control layer is an insulating material.
前述之電子封裝件及其製法中,該封裝層之厚度係等於該強化件之厚度與該調控層之厚度之總和。 In the aforementioned electronic package and its manufacturing method, the thickness of the package layer is equal to the sum of the thickness of the reinforcing member and the thickness of the control layer.
前述之電子封裝件及其製法中,復包括形成複數導電元件於該封裝層上,且該導電元件係延伸至該承載結構之第一側以電性連接該承載結構。 The aforementioned electronic package and its manufacturing method further include forming a plurality of conductive elements on the packaging layer, and the conductive elements are extended to the first side of the supporting structure to be electrically connected to the supporting structure.
由上可知,本發明之電子封裝件及其製法,主要藉由先製作該封裝組構,再將該強化件及調控層設於該承載結構之第二側上,因而能預先模擬得知該封裝組構之預估翹曲量,以調整該強化件之形狀及該調控層之用量,故相較於習知技術之整組模具同時形成上下側之封裝膠體,本發明之強化件與製作該封裝層之模具互為獨立治具,因而能控制該強化件之厚度與體積及該調控層之厚度與體積,進而能調整該電子封裝件之最終結構之翹曲程度。 It can be seen from the above that the electronic package of the present invention and its manufacturing method are mainly produced by first manufacturing the package structure, and then arranging the reinforcing member and the control layer on the second side of the supporting structure, so that the simulation can be learned in advance. The estimated warpage of the package assembly is used to adjust the shape of the reinforcement and the amount of the control layer. Therefore, compared with the entire set of molds in the prior art, the upper and lower sides of the package are formed at the same time. The reinforcement of the present invention is manufactured The molds of the packaging layer are mutually independent jigs, so the thickness and volume of the strengthening member and the thickness and volume of the control layer can be controlled, and the degree of warpage of the final structure of the electronic packaging can be adjusted.
1,1’‧‧‧半導體封裝件 1,1’‧‧‧Semiconductor package
10‧‧‧承載件 10‧‧‧Carrier
100‧‧‧熱化離形膠層 100‧‧‧Thermal release adhesive layer
11‧‧‧半導體晶片 11‧‧‧Semiconductor chip
11a,21a,22a‧‧‧作用面 11a,21a,22a‧‧‧action surface
11b,21b,22b‧‧‧非作用面 11b,21b,22b‧‧‧Non-acting surface
110‧‧‧電極墊 110‧‧‧electrode pad
12‧‧‧被動元件 12‧‧‧Passive components
14,15‧‧‧封裝膠體 14,15‧‧‧Packaging gel
16‧‧‧線路結構 16‧‧‧Line structure
17,27‧‧‧導電元件 17,27‧‧‧Conductive element
18‧‧‧絕緣保護層 18‧‧‧Insulation protection layer
2‧‧‧電子封裝件 2‧‧‧Electronic package
2a‧‧‧封裝組構 2a‧‧‧Packaging structure
20‧‧‧承載結構 20‧‧‧Bearing structure
20a‧‧‧第一側 20a‧‧‧First side
20b‧‧‧第二側 20b‧‧‧Second side
200‧‧‧線路層 200‧‧‧Line layer
201‧‧‧絕緣層 201‧‧‧Insulation layer
21‧‧‧第一電子元件 21‧‧‧The first electronic component
210,220‧‧‧導電凸塊 210,220‧‧‧Conductive bump
22‧‧‧第二電子元件 22‧‧‧Second electronic component
23‧‧‧強化件 23‧‧‧Reinforcement
24‧‧‧應力部 24‧‧‧Stress Department
25‧‧‧封裝層 25‧‧‧Encapsulation layer
25b‧‧‧外表面 25b‧‧‧Outer surface
26‧‧‧調控層 26‧‧‧Control layer
d,h1,h2,t,t1,t2‧‧‧厚度 d,h1,h2,t,t1,t2‧‧‧Thickness
L,S‧‧‧切割路徑 L,S‧‧‧cutting path
第1A至1E圖係為習知半導體封裝件之製法之剖面示意圖;第1F圖係為另一種習知半導體封裝件之剖面示意圖;以及第2A至2E圖係為本發明之電子封裝件之製法的剖面 示意圖;其中,第2D’圖係為第2D圖之另一實施例。 Figures 1A to 1E are cross-sectional schematic diagrams of the manufacturing method of a conventional semiconductor package; Figure 1F is a cross-sectional schematic diagram of another conventional semiconductor package; and Figures 2A to 2E are the manufacturing method of the electronic package of the present invention Profile of Schematic diagram; wherein, the 2D' picture is another embodiment of the 2D picture.
以下藉由特定的具體實施例說明本發明之實施方式,熟悉此技藝之人士可由本說明書所揭示之內容輕易地瞭解本發明之其他優點及功效。 The following specific examples illustrate the implementation of the present invention. Those familiar with the art can easily understand the other advantages and effects of the present invention from the contents disclosed in this specification.
須知,本說明書所附圖式所繪示之結構、比例、大小等,均僅用以配合說明書所揭示之內容,以供熟悉此技藝之人士之瞭解與閱讀,並非用以限定本發明可實施之限定條件,故不具技術上之實質意義,任何結構之修飾、比例關係之改變或大小之調整,在不影響本發明所能產生之功效及所能達成之目的下,均應仍落在本發明所揭示之技術內容得能涵蓋之範圍內。同時,本說明書中所引用之如「上」、「第一」、「第二」及「一」等之用語,亦僅為便於敘述之明瞭,而非用以限定本發明可實施之範圍,其相對關係之改變或調整,在無實質變更技術內容下,當亦視為本發明可實施之範疇。 It should be noted that the structure, ratio, size, etc. shown in the drawings in this manual are only used to match the content disclosed in the manual for the understanding and reading of those who are familiar with the art, and are not intended to limit the implementation of the present invention. Therefore, it does not have any technical significance. Any structural modification, proportional relationship change or size adjustment should still fall within the original The technical content disclosed by the invention can be covered. At the same time, the terms "on", "first", "second" and "one" cited in this specification are only for ease of description and are not used to limit the scope of the present invention. The change or adjustment of the relative relationship shall be regarded as the scope of the implementation of the present invention without substantial changes to the technical content.
請參閱第2A至2E圖,係為本發明之電子封裝件2之製法的剖面示意圖。
Please refer to FIGS. 2A to 2E, which are schematic cross-sectional views of the manufacturing method of the
如第2A圖所示,提供一封裝組構2a與一強化件23,其中,該封裝組構2a係包含一承載結構20、至少一第一電子元件21、至少一第二電子元件22及一封裝層25,且該強化件23上形成有調控層26。
As shown in FIG. 2A, a
所述之承載結構20係具有相對之第一側20a與第二側20b。於本實施例中,該承載結構20係例如具有核心層與
線路部之封裝基板(substrate)或具有線路部之無核心層(coreless)式封裝基板,其線路部具有至少一絕緣層201與設於該絕緣層201上之線路層200,該線路層200例如扇出(fan out)型重佈線路層(redistribution layer,簡稱RDL),並可依需求形成防焊層(圖略)於該第一側20a與第二側20b上。例如,形成該線路層200之材質係為銅,且形成該絕緣層201之材質係為如聚對二唑苯(Polybenzoxazole,簡稱PBO)、聚醯亞胺(Polyimide,簡稱PI)、預浸材(Prepreg,簡稱PP)等之介電材。應可理解地,該承載結構亦可為其它可供承載如晶片等電子元件之承載單元,例如導線架(leadframe)或矽中介板(silicon interposer),並不限於上述。
The supporting
所述之第一電子元件21係結合於該承載結構20之第一側20a上。於本實施例中,該第一電子元件21係為主動元件、被動元件或其二者組合,且該主動元件係例如半導體晶片,而該被動元件係例如電阻、電容及電感。例如,若該第一電子元件21係為半導體晶片,其具有相對之作用面21a與非作用面21b,該第一電子元件21以其作用面21a藉由複數導電凸塊210以覆晶方式設於該線路層200上並電性連接該線路層200;或者,該第一電子元件21可以該非作用面21b設於該第一側20a上並使該作用面21a藉由複數銲線(圖略)以打線方式電性連接該線路層200。然而,有關該第一電子元件21電性連接該承載結構20之方式不限於上述。
The first
所述之第二電子元件22係結合於該承載結構20之第二側20b上。於本實施例中,該第二電子元件22係為主動元件、被動元件或其二者組合等,其中,該主動元件係例如半導體晶片,且該被動元件係例如電阻、電容及電感。例如,若該第二電子元件22係為半導體晶片,其具有相對之作用面22a與非作用面22b,該第二電子元件22以其作用面22a藉由複數如銲錫材料之導電凸塊220以覆晶方式設於該線路層200上並電性連接該線路層200;或者,該第二電子元件22可藉由複數銲線(圖略)以打線方式電性連接該線路層200;亦或,該第二電子元件22可直接接觸該線路層200。然而,有關該第二電子元件22電性連接該承載結構20之方式不限於上述。
The second
另一方面,該第一電子元件21之作用面21a與該第二電子元件22之作用面22a係以面對面方式設置。
On the other hand, the
所述之封裝層25係形成於該承載結構20之第一側20a上,以包覆該些第一電子元件21。於本實施例中,該封裝層25係為絕緣材,如聚醯亞胺(polyimide,簡稱PI)、乾膜(dry film)、如環氧樹脂(expoxy)之封裝膠體或封裝材(molding compound),其可用壓合(lamination)或模壓(molding)之方式形成於該承載結構20之第一側20a上。
The
所述之強化件23係使用熱膨脹係數(Coefficient of thermal expansion,簡稱CTE)較低的材質,例如,CTE小於20的材質,較佳為CTE小於10的材質,如玻璃、晶圓、矽板等。
The strengthening
所述之調控層26係為絕緣材,其種類係為聚亞醯胺(PI)、乾膜、環氧樹脂、封裝材或半乾材。於本實施例中,該調控層26之材質與該封裝層25之材質可相同或不相同。
The
如第2B圖所示,該強化件23以壓合(lamination)方式將該調控層26結合至該承載結構20之第二側20b上,使該調控層26包覆該第二電子元件22。
As shown in FIG. 2B, the reinforcing
於本實施例中,該強化件23未電性連接該承載結構20、第一電子元件21及第二電子元件22。
In this embodiment, the reinforcing
如第2C圖所示,進行整平製程,以移除部分該封裝層25之材質及該第一電子元件21之部分材質,使該第一電子元件21之非作用面21b與該封裝層25之外表面25b共平面(齊平)。
As shown in Figure 2C, a leveling process is performed to remove part of the material of the
於本實施例中,該整平製程係以切除方式一次整平;亦可先以蝕刻方式或研磨方式移除該封裝層25之部分材質,再以研磨方式移除該第一電子元件21之非作用面21b之部分材質,使該第一電子元件21之非作用面21b齊平該封裝層25之外表面25b。
In the present embodiment, the leveling process is leveled at one time by cutting; it is also possible to first remove part of the material of the
如第2D圖所示,形成複數導電元件27於該封裝層25上並延伸至該承載結構20之第一側20a以電性連接該線路層200,俾供後續製程用以接置其它電子裝置(如封裝件、電路板或晶片等),且該導電元件27電性連接該承載結構20之線路層200。
As shown in FIG. 2D, a plurality of
於本實施例中,形成該導電元件27之材質係例如為銅材、銲錫材或其它可導電材。
In this embodiment, the material for forming the
再者,製作該導電元件27係先形成穿孔(圖略)於該封裝層25之外表面25b上以外露該線路層200,再形成該些導電元件27於該穿孔中以接觸該線路層200。
Furthermore, to fabricate the
如第2E圖所示,沿如第2D圖所示之切割路徑S進行切單製程。 As shown in Fig. 2E, the cutting process is performed along the cutting path S shown in Fig. 2D.
於本實施例中,可選擇性先於第2A圖所示之封裝組構2a之承載結構20之第二側20b上形成至少一對應該切割路徑S之應力部24(如凹狀或其它構形),以釋放第一次模壓(即於該承載結構20之第一側20a上形成該封裝層25)所造成整體結構翹曲之應力,以利於後續製程中提高可靠度。另一方面,該應力部24呈凹狀時可作為半切狀切割道,以利於該切單製程所用之切除工具(如雷射或刀具)進行對位。應可理解地,亦可如第2D’圖所示,於第2A圖所示之封裝組構2a中,未形成該應力部24於該承載結構20之第二側20b上。
In this embodiment, at least one pair of stress portions 24 (such as a concave shape or other structures) corresponding to the cutting path S can be formed on the
因此,本發明之製法係先製作該封裝組構2a(或該封裝層25),再於該承載結構20之第二側20b上進行壓合製程,因而能預先模擬(已知該封裝層25之厚度h1及體積)得知該封裝組構2a之預估翹曲量(考量整平製程後之封裝層25之厚度h2及體積),以調整該強化件23之形狀及該調控層26之用量,故相較於習知技術之整組模具同時形成上下側之封裝膠體,本發明之強化件23與製作該封裝層25之模具互為獨立治具,因而能控制該強化件23之厚度d與體積(或形狀)及該調控層之厚度t與體積(如該封裝
層25之厚度h2等於該強化件23之厚度d與該調控層之厚度t之總和),進而能調整該電子封裝件2之最終結構之翹曲程度,例如,易於將12吋晶圓(12”wafer)之翹曲程度控制在允許範圍內(如+/-3.5mm)。
Therefore, the manufacturing method of the present invention is to first fabricate the
再者,當該承載結構20之第一側20a與第二側20b所接置之第一電子元件21與第二電子元件22之數量不同,且該些第一電子元件21與第二電子元件22之尺寸大小亦不相同時,藉由調整該強化件23之形狀及該調控層26之用量,以避免該電子封裝件2呈現不對稱狀態而發生翹曲之情況,故該電子封裝件2能有效設置於終端產品(如行動電話)之電路板(如軟板基板)上。
Furthermore, when the number of the first
本發明亦提供一種電子封裝件2,其包括:一承載結構20、至少一第一電子元件21、一封裝層25、至少一第二電子元件22、一調控層26以及一強化件23。
The present invention also provides an
所述之承載結構20係具有相對之第一側20a與第二側20b及線路層200。
The supporting
所述之第一電子元件21係結合於該承載結構20之第一側20a上並電性連接該線路層200。
The first
所述之封裝層25係形成於該承載結構20之第一側20a上,以包覆該第一電子元件21。
The
所述之第二電子元件22係設於該承載結構20之第二側20b上並電性連接該線路層200。
The second
所述之調控層26係為絕緣材,其形成於該承載結構20之第二側20b上,以包覆該第二電子元件22。
The
所述之強化件23係形成於該調控層26上,且該強化件係使用熱膨脹係數小於20的材質製成者。
The reinforcing
於一實施例中,該第一電子元件21之部分表面(非作用面21b)係外露出該封裝層25之外表面25b。
In one embodiment, a part of the surface (
於一實施例中,該封裝層25之厚度h2等於該強化件23之厚度d與該調控層之厚度t之總和(h2=d+t)。
In one embodiment, the thickness h2 of the
於一實施例中,所述之電子封裝件2復包括複數導電元件27,係形成於該封裝層25上並延伸至該承載結構20之第一側20a以電性連接該線路層200。
In one embodiment, the
綜上所述,本發明之電子封裝件及其製法,係藉由該強化件及調控層之設計,並藉由調整該強化件之厚度與體積及該調控層之厚度與體積,進而控制該電子封裝件之最終結構之翹曲程度。 In summary, the electronic package of the present invention and its manufacturing method are controlled by the design of the strengthening member and the control layer, and by adjusting the thickness and volume of the strengthening member and the thickness and volume of the control layer. The degree of warpage of the final structure of the electronic package.
上述實施例係用以例示性說明本發明之原理及其功效,而非用於限制本發明。任何熟習此項技藝之人士均可在不違背本發明之精神及範疇下,對上述實施例進行修改。因此本發明之權利保護範圍,應如後述之申請專利範圍所列。 The above-mentioned embodiments are used to exemplify the principles and effects of the present invention, but not to limit the present invention. Anyone familiar with this technique can modify the above-mentioned embodiments without departing from the spirit and scope of the present invention. Therefore, the scope of protection of the rights of the present invention should be listed in the scope of patent application described later.
2‧‧‧電子封裝件 2‧‧‧Electronic package
20‧‧‧承載結構 20‧‧‧Bearing structure
20a‧‧‧第一側 20a‧‧‧First side
20b‧‧‧第二側 20b‧‧‧Second side
200‧‧‧線路層 200‧‧‧Line layer
21‧‧‧第一電子元件 21‧‧‧The first electronic component
22‧‧‧第二電子元件 22‧‧‧Second electronic component
23‧‧‧強化件 23‧‧‧Reinforcement
25‧‧‧封裝層 25‧‧‧Encapsulation layer
26‧‧‧調控層 26‧‧‧Control layer
27‧‧‧導電元件 27‧‧‧Conductive element
d,h2,t‧‧‧厚度 d,h2,t‧‧‧thickness
Claims (12)
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