TWI724642B - Micro imaging apparatus and processing method thereof - Google Patents

Abstract

This invention provides a micro imaging apparatus comprising a projection device for providing a plurality of beams forming a pattern; a collimating element for forming the plurality of collimated beams; a reticle element for forming the plurality of collimated beams into a plurality of shrinking beams; and a focusing element for forming a plurality of focusing beams from a plurality of shrinking beams to image a pattern formed by the plurality of focusing beams on the target, thereby avoiding the use of a mask in the conventional process to reduce process cost and improve process efficiency.

Description

Micro-imaging equipment and its processing method

The present invention relates to a micro-imaging equipment and its processing method, in particular to a micro-imaging equipment and its processing method used in a maskless manufacturing process.

Micro-imaging equipment is a device used to image a desired pattern onto a target, and it is mainly used in, for example, semiconductor packaging, panel display, or printed circuit board (PCB) manufacturing processes. The current micro-imaging equipment in the semiconductor manufacturing process often uses a photomask to image the desired pattern on the photosensitive material layer of the substrate, and then transfer it onto the substrate such as a silicon wafer or a glass plate.

However, in the current manufacturing process, the photomask itself not only takes a considerable amount of time to manufacture, and its cost is also quite expensive. In addition, it is impossible to change the pattern formed on the photomask at any time according to the demand. At this time, the pattern formed on the photomask is not what it is. If necessary, this photomask cannot be used, so a considerable loss is caused to the product manufacturer.

In order to solve the above-mentioned problems, the related industry has developed a "maskless" process. Compared with the traditional process that requires a mask, the maskless process has the advantages of reducing the process time and being able to change the pattern at any time. Today's matte mask manufacturing process mainly uses the "high-precision digital micro-mirror device (DMD)" manufactured by Texas Instruments. nice The DMD chip manufactured by Texas Instruments is composed of a plurality of micro lenses. The light source passes through the plurality of micro lenses, and the angle of the plurality of micro lenses is switched to the ON and OFF state to control the brightness of the light, thereby forming a pattern and Image on the substrate.

Although DMD wafers can be used in the current process to achieve a maskless process, the DMD wafer itself is expensive and has a limited irradiation area. Therefore, it is necessary to combine multiple DMD wafers into an array during the manufacturing process to improve production efficiency. In addition, DMD wafers The multiple micro lenses on the above are also prone to failure after switching the ON and OFF states for many times, so the cost of the manufacturing process is still high.

Therefore, how to overcome the various problems of the above-mentioned conventional technology has actually become a problem that the industry urgently needs to overcome.

In view of the various deficiencies of the above-mentioned conventional technologies, the present invention provides a micro-imaging equipment, including: a projection device, which is an array of light elements, for providing a plurality of light beams forming a pattern; and a collimating element for correction The plurality of light beams are used to form a plurality of collimated light beams; a reduction element is used to reduce the plurality of collimated light beams to form a plurality of reduced light beams; and a focusing element is used to focus the plurality of reduced light beams The light beams form a plurality of focused beams to image the pattern formed by the plurality of focused beams on the target.

The present invention provides a micro-imaging processing method, including: providing a light source including a plurality of light beams useful to form a pattern; correcting the plurality of light beams to form a plurality of collimated light beams; reducing the plurality of collimated light beams to Forming a plurality of reduced light beams; focusing the plurality of reduced light beams to form a plurality of focused light beams; and imaging the pattern formed by the plurality of focused light beams on the target object.

In one embodiment, it further includes a light splitting element, which is arranged between the collimating element and the light reducing element, for splitting the plurality of collimated light beams generated by the collimating element into a plurality of first light beams The collimated beams and the plurality of second split collimated beams are used to project the plurality of first split collimated beams to a detection element and the plurality of second split collimated beams to the light reduction element.

In one embodiment, a light shielding element is further included, which is disposed between the light splitting element and the light reducing element to shield the plurality of second light splitting collimated light beams.

In one embodiment, it further includes a processing module that is communicatively connected to the detection element and the shading element, wherein the detection element detects whether the pattern formed by the plurality of first split collimated beams is correct, and if it is formed If the pattern is correct, the processing module controls the shading element to project the plurality of second split collimated light beams onto the light reduction element to form the plurality of light reduction beams through the light reduction element.

In one embodiment, the processing module is communicatively connected to the projection device. If the detection element detects that the pattern formed by the plurality of first split collimated beams is incorrect, the processing module adjusts the The multiple light beams generated by the projection device are used to re-form the pattern.

In one embodiment, the light reduction element reduces the plurality of collimated light beams into the plurality of light reduction beams according to an adjustable magnification or a fixed magnification.

In one embodiment, the light element array of the projection device is a Micro Light Emitting Diode (Micro LED).

In an embodiment, the collimating element, the light reduction element and the focusing element are aspherical elements or spherical elements.

It can be seen from the above that in the micro-imaging equipment and its processing method of the present invention, the light element array formed by the micro-light emitting diode (Micro-LED) provides the patterned light source, thereby reducing the light in the manufacturing process. The cost of the cover, and the pattern can be changed at any time in response to demand. In addition, compared to the conventional technology using DMD chip manufacturing process, the present invention uses micro-light emitting diodes (Micro-LED) to cooperate with collimating elements, light splitting elements, light reduction elements and focusing elements to replace the light source combined with DMD. The structure of the chip also greatly reduces the cost of the maskless manufacturing process.

1‧‧‧Micro-imaging equipment

1a‧‧‧Component group

10‧‧‧Projection device

100‧‧‧Beam

20‧‧‧collimation element

21‧‧‧First calibration element

210‧‧‧Corrected beam

22‧‧‧The first average component

220‧‧‧First mean beam

23‧‧‧The second mean value component

230‧‧‧Second Mean Beam

24‧‧‧Second calibration element

240‧‧‧Collimated beam

30‧‧‧Splitter element

300a‧‧‧First beam collimated beam

300b‧‧‧Second beam splitting collimated beam

301‧‧‧Anti-reflective coating

302‧‧‧Beam splitter coating

303‧‧‧Glue Department

303a‧‧‧First surface

303b‧‧‧Second surface

31‧‧‧Light reduction element

310‧‧‧Shrinking beam

32‧‧‧Focusing element

320‧‧‧Focused beam

40‧‧‧Processing Module

41‧‧‧Detection element

42‧‧‧Shading element

43‧‧‧Substrate

5‧‧‧3D printing device

51‧‧‧Container

510‧‧‧Opening

511‧‧‧Bottom

52‧‧‧Anti-stick glass

53‧‧‧Light curing materials

54‧‧‧Frame

55‧‧‧Three-axis platform

L, T‧‧‧Optical axis

S‧‧‧accommodating space

Figure 1 is a schematic diagram showing the structure of the micro-imaging equipment of the present invention;

Figure 2 is a flowchart showing the micro-imaging processing method of the present invention;

Figure 3 is a cross-sectional view of the spectroscopic element of the present invention; and

Figure 4 shows another application embodiment of the micro-imaging equipment of the present invention.

The following specific examples illustrate the implementation of the present invention. Those familiar with the art can easily understand the other advantages and effects of the present invention from the content disclosed in this specification.

It should be noted that the structure, ratio, size, etc. shown in the drawings in this manual are only used to match the content disclosed in the manual for the understanding and reading of those who are familiar with the art, and are not intended to limit the implementation of the present invention. Therefore, it does not have any technical significance. Any structural modification, proportional relationship change or size adjustment, without affecting the effects and objectives that can be achieved by the present invention, should still fall within the scope of the present invention. The technical content disclosed by the invention can cover Within the range. At the same time, the terms such as "upper", "lower", "left", "right", "rear", "bottom" and "one" cited in this manual are only for clarity of description, not For limiting the scope of the present invention, the change or adjustment of the relative relationship shall be regarded as the scope of the present invention without substantially changing the technical content.

FIG. 1 is a schematic diagram showing the structure of the micro imaging device 1 of the present invention. As shown in Figure 1, the micro imaging equipment 1 includes a projection device 10, a collimating element 20, a beam splitting element 30, a light reducing element 31, a focusing element 32, a processing module 40, and a detection element. 41 and a shading element 42 for performing a patterning process on a target such as a substrate 43. In other embodiments, the micro-imaging device 1 can also be provided with other required elements (such as optical elements) before, after, or between the projection device 10 and the focusing element 32.

The projection device 10 is an array of light elements for providing a plurality of light beams 100 as light sources and forming a pattern. The projection device 10 can be a Micro Light Emitting Diode (Micro LED), but it is not limited to this.

In this embodiment, an optical axis L (as shown in FIG. 1) is defined as the direction in which the light beam 100 generated by the projection device 10 is projected from the projection device 10 to the substrate 43.

The collimating element 20 corrects the plurality of light beams 100 provided by the projection device 10 according to the direction of the optical axis L, so that the plurality of light beams 100 become a plurality of collimated light beams 240, wherein the collimating element 20 includes Arranged in sequence or corresponding to a first correction element 21, a first averaging element 22, a second averaging element 23, and a second correction element 24.

Furthermore, the optical element array of the projection device 10 provides the plurality of light beams 100 to enter the first correcting element 21, and the first correcting element 21 preliminarily corrects the plurality of light beams 100 to be horizontally along the direction of the optical axis L A plurality of correction light beams 210 are advancing, and the plurality of correction light beams 210 generate a plurality of first average light beams 220 through the first averaging element 22, and the plurality of first average light beams 220 generate a plurality of light beams through the second averaging element 23 The second mean beam 230, with Through the first averaging element 22 and the second averaging element 23, the intensity of the plurality of correction beams 210 is more uniform and consistent, and finally the second correction element 24 again corrects the plurality of second average beams 230 to be horizontally along The plurality of collimated light beams 240 in the direction of the optical axis L.

The beam splitting element 30 is used to split the plurality of collimated beams 240 generated by the collimating element 20 into a plurality of first splitting collimated beams 300a and a plurality of second splitting collimated beams 300b, and the beam splitting element 30 will The plurality of first split collimated beams 300a are projected onto the detection element 41 to detect whether the pattern formed by the plurality of first split collimated beams 300a has insufficient beam intensity, imaging errors of the pattern, and beam deviation. Wherein, the detection element 41 can be a charge-coupled device (CCD).

In addition, the light splitting element 30 projects the plurality of second splitting collimated light beams 300b onto the shading element 42, which is used to shield the plurality of second splitting collimated light beams, and the processing module 40 is connected in communication The projection device 10, the detection element 41 and the shading element 42.

That is, the detection element 41 is used to detect the pattern formed by the plurality of first split collimated beams 300a, and if the formed pattern is correct, the detection element 41 feeds back to the processing module 40, And the processing module 40 controls the shading element 42 to project the plurality of second split collimated beams 300b horizontally along the direction of the optical axis L to the light reduction element 31, and the light reduction element 31 reduces the plurality of second light beams. The two-splitting collimated light beam 300b is used to form a plurality of reduced light beams 310; on the contrary, if the detection element 41 detects that the pattern formed by the plurality of first splitting collimated light beams 300a is incorrect, then the detection element 41 is fed back to the processing module 40, and the processing module 40 adjusts the plurality of light beams 100 generated by the projection device 10 to re-form the pattern.

When adjusting the plurality of light beams 100 generated by the projection device 10, the insufficient beam intensity of the plurality of first split collimated light beams 300a, the pattern imaging error, and the light beam have been eliminated After the deviation and other conditions, the processing module 40 controls the shading element 42 so that the plurality of second split collimated light beams 300b are horizontally projected to the light reduction element 31 along the direction of the optical axis L.

In one embodiment, the light reduction element 31 reduces the plurality of second split collimated light beams 300 b into a plurality of light reduction light beams 310 according to an adjustable magnification or a fixed magnification.

The focusing element 32 focuses the plurality of reduced light beams 310 generated by the light reduction element 31 to form a plurality of focused light beams 320.

A plurality of focused beams 320 generated by the focusing element 32 are mapped on the substrate 43 to form the pattern, wherein a material layer is formed on the substrate 43 so that the pattern is formed on the substrate 43.

In one embodiment, the collimating element 20, the light reducing element 31 and the focusing element 32 are spherical mirrors or aspherical mirrors.

Figure 2 is a flow chart of the micro-imaging processing method of the present invention. The micro-image processing method shown in Figure 2 will be described in detail below. Please also refer to Figure 1 above.

The micro-imaging processing method includes: providing a light source including a plurality of light beams 100 useful for forming a pattern; modifying the plurality of light beams 100 to form a plurality of collimated light beams 240; reducing the plurality of collimated light beams 240, To form a plurality of reduced light beams 310; focus the plurality of reduced light beams 310 to form a plurality of focused light beams 320; and image the pattern formed by the plurality of focused light beams 320 on the target object.

As shown in Fig. 2, the micro-imaging processing method of the present invention may include the following technical content from step S21 to step S27.

In step S21, a projection device 10 provides a light source including a plurality of light beams, and the plurality of light beams form a pattern, wherein the projection device 10 is made of a micro light emitting diode (Micro Light Emitting Diode, Micro LED ) Composed of an array of light elements.

In step S22, a collimating element 20 corrects the direction of the plurality of light beams 100 according to the direction of the optical axis L, so that the plurality of light beams 100 become a plurality of collimated light beams 240, wherein the collimating element 20 includes Arranged in sequence or corresponding to a first correction element 21, a first averaging element 22, a second averaging element 23, and a second correction element 24.

The optical element array of the projection device 10 provides the plurality of light beams 100 to enter the first correction element 21, and the first correction element 21 preliminarily corrects the plurality of light beams 100 into a plurality of corrections that advance horizontally along the optical axis L Light beam 210, and the plurality of correction light beams 210 generate a plurality of first average light beams 220 through the first averaging element 22, and the plurality of first average light beams 220 generate a plurality of second average light beams 230 through the second averaging element 23 , To make the intensity of the plurality of correction beams 210 more uniform and consistent through the first averaging element 22 and the second averaging element 23, and finally the second correction element 24 corrects the plurality of second average beams 230 to be horizontal again A plurality of collimated light beams 240 along the direction of the optical axis L.

In step S23, a beam splitting element 30 splits the plurality of collimated beams 240 generated by the collimating element 20 into a plurality of first splitting collimated beams 300a and a plurality of second splitting collimated beams 300b.

In step S24, the beam splitting element 30 projects the plurality of first split collimated beams 300a onto a detection element 41 to detect whether the pattern formed by the plurality of first split collimated beams 300a has insufficient beam intensity , The pattern imaging error and beam deviation, in addition, the beam splitting element 30 projects the plurality of second split collimated beams 300b onto the shading element 42, and a processing module 40 is communicatively connected to the projection device 10, The detection element 41 and the shading element 42. If the detection result of the detection element 41 is normal, the detection element 41 feeds back to the processing module 40, and the processing module 40 controls the shading element 42 to project the plurality of second split collimated beams 300b to the light reduction element 31; On the contrary, if the detection result of the detection element 41 is abnormal, the detection element The component 41 is fed back to the processing module 40, and the processing module 40 adjusts the plurality of light beams 100 generated by the projection device 10, and thus returns to step S21 to form the pattern again.

In step S25, a light reduction element 31 receives the plurality of second split collimated light beams 300b, and reduces the plurality of second split collimated light beams 300b according to an adjustable magnification or a fixed magnification to generate a plurality of reduced light beams 310 .

In step S26, the plurality of reduced light beams 310 generated by the reduced light element 31 are focused through a focusing element 32 to form a plurality of focused light beams 320.

In step S27, a plurality of focused light beams 320 generated by the focusing element 32 are mapped on the substrate 43 with a material layer above, so as to form the pattern on the substrate 43.

FIG. 3 is a cross-sectional view of the spectroscopic element 30 of the present invention. As shown in FIG. 3, the beam splitter element 30 includes an antireflective coating (AR coating) 301, a beam splitter coating (BS coating) 302 and a glue part 303.

In this embodiment, the light splitting element 30 is a rectangular three-dimensional lens, and the glue part 303 is provided inside the light splitting element 30, wherein the glue part 303 has a first surface 303a and a second surface 303b opposite to each other. , The second surface 303b and the optical axis L form an included angle α (as shown in Figure 3), the included angle α is, for example, 45°, and the first surface 303a is provided with the beam splitter coating 302 for removing The plurality of collimated beams 240 are split into a plurality of first splitting collimated beams 300a and a plurality of second splitting collimated beams 300b. In addition, the surface of the beam splitting element 30 is provided with an anti-reflection coating 301 to prevent the plurality of collimated beams The straight beam 240, the plurality of first split collimated beams 300a, and the plurality of second split collimated beams 300b are reflected, resulting in insufficient beam intensity of the pattern, imaging errors of the pattern, and beam deviation.

It can be seen from the above that in the micro-imaging equipment and its processing method of the present invention, the light element array formed by the micro-light-emitting diode (Micro-LED) provides a patterned light source. The collimating element 20, the beam splitting element 30, the light reducing element 31, and the focusing element 32 map the pattern on the substrate, thereby reducing the cost of the photomask in the manufacturing process, and changing the pattern at any time according to demand. pattern. In addition, compared to the conventional process using DMD chips, the present invention uses a micro-light emitting diode (Micro-LED) to match the collimating element 20, the beam splitting element 30, the light reducing element 31, and the focusing element 32. , Replacing the light source combined with the DMD chip structure, greatly reducing the cost of the manufacturing process.

Fig. 4 shows another application embodiment of the micro imaging device 1 of the present invention. As shown in Fig. 4, a 3D printing device 5 includes: a micro imaging device 1. In this embodiment, the micro imaging device 1 includes a projection device 10 and a component group 1a. The component group 1a may include a collimating element 20, a beam splitting element 30, a light reducing element 31, a focusing element 32, a processing module 40, a detecting element 41, and a shading element 42 as described above, which use the micro The imaging device 1 generates a plurality of focused beams 320 to form a pattern; a container 51 is arranged on a three-axis platform 55, and the container 51 has an opening 510 and a bottom 511 opposite to each other, and one of the openings 510 is connected to each other. The accommodating space S, where a photocurable material 53 is installed in the accommodating space S, and a frame 54 is disposed in the accommodating space S of the container 51 and contacts the bottom 511; and a non-stick glass 52 is covered On the opening 510 of the container 51.

In this embodiment, an optical axis T (as shown in FIG. 4) is defined as the direction in which the light beam 100 generated by the projection device 10 is projected from the projection device 10 to the frame 54. The 3D printing device 5 cuts the pattern of a target to be printed into a plurality of patterns, and generates the plurality of focused beams 320 through the micro imaging device 1 to form the plurality of patterns one by one, and the plurality of focused patterns The light beam 320 penetrates the release glass 52 along the optical axis T and is projected onto the frame 54 or the bottom 511, so that the photocurable material 53 forms the plurality of patterns on the frame 54 or the bottom 511 one by one, And the plurality of patterns are stacked on each other to form the target.

The above-mentioned embodiments only illustrate the principles, features and effects of the present invention, and are not intended to limit the scope of implementation of the present invention. Anyone who is familiar with the art can comment on the above without departing from the spirit and scope of the present invention. Modifications and changes to the implementation form. Any equivalent changes and modifications made by using the contents disclosed in the present invention should still be covered by the following patent application scope. Therefore, the protection scope of the present invention should be as listed in the scope of the patent application.

1‧‧‧Micro-imaging equipment

10‧‧‧Projection device

100‧‧‧Beam

20‧‧‧collimation element

21‧‧‧First calibration element

210‧‧‧Corrected beam

22‧‧‧The first average component

220‧‧‧First mean beam

23‧‧‧The second mean value component

230‧‧‧Second Mean Beam

24‧‧‧Second calibration element

240‧‧‧Collimated beam

30‧‧‧Splitter element

300a‧‧‧First beam collimated beam

300b‧‧‧Second beam splitting collimated beam

31‧‧‧Light reduction element

310‧‧‧Shrinking beam

32‧‧‧Focusing element

320‧‧‧Focused beam

40‧‧‧Processing Module

41‧‧‧Detection element

42‧‧‧Shading element

43‧‧‧Substrate

L‧‧‧Optical axis

Claims (12)

A micro-imaging equipment includes: a projection device, which is an array of light elements, used to provide a plurality of light beams forming a pattern; a collimating element, which is used to correct the plurality of light beams to form a plurality of collimated light beams ; A beam splitting element for splitting the plurality of collimated beams to form a plurality of first splitting collimated beams and a plurality of second splitting collimated beams, and projecting the plurality of first splitting collimated beams to a Detection element; a reduction element for reducing the plurality of second split collimated beams to form a plurality of reduced beams; and a focusing element for focusing the plurality of reduced beams to form a plurality of focused beams , To image the pattern formed by the plurality of focused beams on the target. The micro-imaging equipment described in the first item of the scope of patent application further includes a light-shielding element, which is arranged between the light-splitting element and the light-shrinking element to shield the plurality of second light-splitting collimated light beams. For example, the micro-imaging equipment described in item 2 of the scope of patent application further includes a processing module, which is communicatively connected to the detection element and the shading element, wherein the detection element detects the plurality of first split collimated light beams. Is the pattern correct? If the pattern formed is correct, the processing module controls the shading element to project the plurality of second split collimated beams onto the light reduction element to pass through the light reduction element The plurality of reduced light beams are formed. For example, the micro-imaging equipment described in item 3 of the scope of patent application, wherein the processing module is communicatively connected to the projection device, and if the detection element detects that the pattern formed by the plurality of first split collimated beams is not If it is correct, the processing module adjusts the plurality of light beams generated by the projection device to form the pattern again. For the micro-imaging device described in item 1 of the scope of patent application, the reduction element reduces the plurality of second split collimated light beams into the plurality of reduced light beams according to an adjustable magnification or a fixed magnification. According to the micro-imaging equipment described in item 1 of the scope of patent application, the light element array of the projection device is a micro light emitting diode (Micro Light Emitting Diode, Micro LED). As described in the first item of the patent application, the micro-imaging device, wherein the collimating element, the light reduction element and the focusing element are aspherical elements or spherical elements. A micro-imaging processing method includes: providing a light source including a plurality of light beams useful to form a pattern; correcting the plurality of light beams to form a plurality of collimated light beams; and splitting the plurality of collimated light beams to form a plurality of collimated light beams The first splitting collimated beam and the plurality of second splitting collimated beams; reducing the plurality of second splitting collimated beams to form a plurality of reduced beams; focusing the plurality of reduced beams to form a plurality of focused beams; And the pattern formed by the plurality of focused beams is imaged on the target. The micro-imaging processing method described in item 8 of the scope of patent application further includes detecting whether the pattern formed by the plurality of first split collimated beams is correct, so as to adjust the pattern when the pattern formed is correct. A plurality of second beams are collimated to form the plurality of reduced beams. The micro-imaging processing method described in item 9 of the scope of patent application, wherein, if the pattern formed is incorrect, the plurality of light beams are re-adjusted to form the pattern. The micro-imaging processing method described in item 8 of the scope of patent application, wherein the plurality of reduced light beams are formed by reducing the plurality of second split collimated light beams according to an adjustable magnification or a fixed magnification. The micro-imaging processing method described in item 8 of the scope of patent application, wherein the light source is from a micro light emitting diode (Micro Light Emitting Diode, Micro LED).

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