TWI723204B - High-purity dispense system - Google Patents

Abstract

Techniques herein include a bladder-based dispense system using an elongate bladder configured to selectively expand and contract to assist with dispense actions. This dispense system compensates for filter-lag, which often accompanies fluid filtering for microfabrication. This dispense system also provides a high-purity and high precision dispense unit. A process fluid filter is located downstream from a process fluid source as well as a system valve. Downstream from the process fluid filter there are no valves. Dispense actions can be initiated and stop while the system valve is open by using the elongate bladder. The elongate bladder can be expanded to stop or pause a dispense action, and then be contracted to assist with a dispense action.

Description

High purity distribution system

The content of the present disclosure is related to semiconductor manufacturing, and more particularly to film distribution/coating and development processes and systems. Cross-reference of related applications

This application claims the rights of U.S. Provisional Patent Application No. 62/373,729 named "High-Purity Dispense Unit" filed on August 11, 2016, which is incorporated herein in its entirety for reference.

Many micro-manufacturing processes using coater/developer tools specify different chemicals to be distributed on the substrate (wafer) for a specific design. For example, many resist (photoresist) coatings can be distributed on the surface of the substrate. The resist coating can be changed according to the type of reaction to actinic radiation (positive type/negative type), and can also be changed according to the composition of different stages of patterning (front stage of the production line, metallization, etc.). In addition, many developers and solvents can be selected to be distributed on the wafer. However, the challenge of being able to distribute many chemicals on the wafer is to avoid defects in the distributed chemicals. Any small impurities or agglomerations in the chemicals may cause defects on the wafer. As the size of semiconductor features continues to decrease, avoiding and preventing defects in the dispensed chemicals becomes more and more important.

One way to avoid defects in the liquid dispensed on the substrate is to purchase pre-filtered chemical components used in coater/developer tools. However, such pre-filtered chemical components may be very expensive, and although pre-filtered, defects may develop in the chemical composition during transportation or use. Another way to avoid defects is to filter the chemicals at the semiconductor manufacturing tool (eg, coater/developer "track" tool) immediately before being dispensed on the substrate. One of the crux of filtering (the timing of using filtering) immediately before distribution is the decrease in flow rate. For example, in order to transport fluids that have been sufficiently filtered to meet the purity requirements, relatively fine filters are required. The challenge of using such a fine filter is that when the fluid chemical composition is pushed through the relatively fine filters, the filters reduce the fluid flow rate of a given chemical composition. Many semiconductor manufacturing processes require chemical components to be distributed in accordance with specific flow rates (or flow rate ranges) of specific parameters. Situations where the flow rate is above or below such a given specific flow rate may result in defects, insufficient coverage, and/or excessive coverage on the substrate. In other words, it is difficult to push the fluid through the tapered filter fast enough to meet the distribution flow requirements.

The technology disclosed herein provides a fluid delivery system that compensates for a relatively slow fluid filtration rate while using digital distribution control to provide a specific distribution rate. In other words, the system herein allows the filtered liquid to be distributed to the substrate with high purity at a distribution rate faster than the filtration rate.

Such a system may include equipment for fluid distribution. The process fluid conduit extends from the process fluid source inlet to the dispensing nozzle. The process fluid conduit system is used to receive the process fluid, and the process fluid has a pressure sufficient to drive the process fluid from the inlet of the process fluid source to the dispensing nozzle as the flow direction of the process fluid. Therefore, the source of the process fluid is upstream, and the distribution nozzle is downstream. The process fluid valve is positioned downstream of the process fluid source inlet along the process fluid conduit. The process fluid valve system is configured to selectively stop the flow of process fluid through the process fluid conduit and allow the process fluid to flow through the process fluid conduit. The process fluid filter is positioned downstream of the process fluid valve along the process fluid conduit, and is configured to filter the process fluid passing through the process fluid conduit. The elongated bladder system is positioned downstream of the process fluid filter and is configured as a part or part of the process fluid conduit. The elongated bladder system is positioned in a chamber defined by a hydraulic fluid housing. The elongated balloon extends from the chamber inlet opening to the chamber outlet opening. The elongated capsule defines a linear flow path between the chamber inlet opening and the chamber outlet opening. The long and narrow bladder system is configured to expand and contract laterally in the chamber, so that when the long and narrow bladder contains a volume of process fluid, the volume of the process fluid in the long and narrow bladder can increase and decrease. The controller is configured to selectively contract the elongated balloon by increasing the pressure of the hydraulic fluid applied on the outer surface of the elongated balloon, so that the process fluid is distributed from the dispensing nozzle. The controller is configured to selectively inflate the elongated capsule by reducing the pressure of the hydraulic fluid applied on the outer surface of the elongated capsule, thereby stopping the dispensing of the process fluid from the dispensing nozzle. Accordingly, the distribution system does not include a valve in the process fluid line after the process fluid filter (downstream of the process fluid filter).

Such a technique can reduce the defect rate of the deposited film. The film defect rate may be caused by bubbles, falling particles, organic residues/polymers, metal impurities, agglomerated particles, etc. The source and formation mechanism of all these defects are strongly influenced by the design and configuration of the coating machine/developing machine distribution pipeline. A cause or mechanism of the bubble defect may be related to the dissolved gas in the liquid chemical substance (process fluid) to be dispensed. The dissolved gas may then enter the film layer during the dispensing step and become a bubble defect, or the bubbles themselves may act as a nucleation site to attract small particles to become large particles that are subsequently deposited into the film layer during the dispensing step. A contributing factor to the generation of particles, organic residues, and metal impurities is the components (pumps, valves, tanks, pipes, fittings, etc.) that constitute the distribution pipeline.

The technique in this paper minimizes the defects that cause gas dissolution by using an indirect distribution system. Use the system in this article to minimize the exposure of process fluids to gases and the environment. Furthermore, the system in this paper minimizes other types of defects (e.g., falling particles, particles, etc.) by minimizing the components (pumps, valves, tanks, pipes, fittings, etc.) used in the distribution pipelines herein. Organic residues/polymers, and metal impurities). Because each component increases the potential for defects, we can see the advantages of reducing the components in the distribution pipeline. Minimizing dead space and surface contact between process fluids and components/hardware can minimize flow vortices by minimizing nucleation sites required for chemical aggregation.

Of course, the order of discussion of the different steps as described herein has been presented for clarity. Generally speaking, these steps and techniques can be performed in any suitable order. In addition, although each of the different features, technologies, configurations, etc. herein can be discussed at different positions in the present disclosure, it is intended that each of these concepts can be implemented independently or in combination with each other. Accordingly, the present invention can be implemented and considered in many different ways.

It is noted that the content of the present invention does not specifically describe each embodiment of the disclosure or the claimed invention and/or incrementally novel implementation aspects. On the contrary, the summary of the present invention only provides a preliminary discussion of different embodiments and corresponding points of novelty superior to the conventional technology. For additional details and/or possible viewpoints of the present invention and the embodiments, the reader is directed to the implementation mode part of the present disclosure and the corresponding drawings as discussed further below.

The technology herein can be implemented as a capsule-based dispensing system using elongated capsules. This distribution system compensates for the filter-lag that usually accompanies micro-manufacturing fluid filtration. This distribution system also provides high-purity and high-precision distribution units. The distribution system in this article reduces the chance of defects. Conventional fluid delivery systems usually have "dead legs" suspended from fluid lines. The dead pipe can be a branch from a fluid line (for example, for a pressure measuring device or a reservoir). Conventional fluid delivery systems may have other discontinuities (including many valves), which lead to significant opportunities for defects in the fluid. The fluid connector system is designed to reduce defects on the fluid conduit wall (inner wall). Any rough connectors or twists may result in a location where the fluid may recirculate, slow down, or stop in other ways (which may cause agglomeration). Therefore, when the process fluid conduit is equipped with a piston, baffle plate, or side-mounted reservoir, many undesirable cross-flows may be generated, and a position where the fluid is blocked or decelerated may be generated. Such cross flow and deceleration points may cause particles to be generated in the fluid. Then, such particles become defects when they are distributed on a given substrate (for example, when a photoresist is distributed on a silicon wafer).

Accordingly, the system herein includes a long and narrow balloon device using indirect pressure/volume control to distribute the process fluid, minimize the dissolution of gas in the process fluid, and reduce the overall components used in the distribution system. When the elongated balloon is configured to provide a cross section similar to the cross section of the upstream and downstream ducts (for fluid flow), a better fluid distribution result is achieved. Such a configuration helps prevent the process fluid from cross-flowing or decelerating the process fluid flow. When fluid enters or passes through the elongated capsule, it has a smooth and gradual widening process to maintain laminar flow. During the dispensing off phase (that is, when the fluid is not dispensed from the corresponding nozzle onto the substrate), after the process fluid is pushed through the fine filter (microfilter), the process fluid can accumulate in the capsule ( Become an inflated balloon). In one embodiment, this elongated capsule acts as a fluid capacitor for dispensing, which is configured to use (already upstream during the dispensing closure phase, or has been filtered just before entering the elongated capsule)之) Process fluid is filled. In some exemplary distribution applications, a given flow system is distributed at a predetermined flow rate (for example, 0.4 to 1.4 cubic centimeters per second), and the flow system is distributed (to the substrate) for a relatively short period of time. For example, a given dispense time can last for about one second, and then the fluid dispensing system can no longer be used until after the rest period. The rest period can be any time from about 15 seconds to 60 seconds, or a longer time for some manufacturing processes.

When the dispensing is restarted from the nozzle, the long and narrow capsule unit changes from a state where the process fluid is collected to a state where the process fluid is discharged. In other words, the elongated capsule has the ability to expand to collect an injected amount of process fluid; and then selectively compress to collect the injected amount of fluid (which has passed through the microcapsule just before entering the elongated capsule). The filter) is released to help maintain a specific process fluid flow rate. Therefore, such a configuration provides a system with a distribution reservoir, which includes a system configured to expand to receive an injected amount of fluid, and contract to assist in expelling the accumulated injected amount of fluid, while maintaining the process fluid passing through the elongated capsule. A balloon or inflatable member with a substantially linear flow path.

The expansion and contraction of the elongated bladder can be accomplished through a coupled hydraulic system (or pneumatic system) that controls the hydraulic fluid in contact with the outer surface of the elongated bladder. The elongated capsule can have different cross-sectional shapes, for example, round, square, and elliptical. To facilitate the description of the embodiments herein, the present disclosure will mainly focus on a capsule having an approximately elliptical or circular shape. Connecting the oblique pyramidal end to the process fluid input conduit and the process fluid output conduit can facilitate a smooth transition from the process fluid conduit to a specific long and narrow balloon shape. Different cross-sectional shapes provide different advantages. The advantage of using a capsule with an oblong cross-sectional shape is that it has two relatively flat facing surfaces, which can be the main flexure surfaces for expansion and contraction. In the case of a substantially uniform or symmetrical cross-sectional shape (for example, a circular cross-section), all the sidewall surfaces will be able to expand and contract substantially uniformly, and this shape can also provide multiple advantages.

In a common operation, when there are equal pressures on the inside and outside of the elongated capsule, the elongated capsule has an initial shape or cross-section. The elongated balloon substantially expands beyond the initial shape to an expanded state (up to a certain expanded state that reaches the expansion limit of the balloon) to collect an injected amount of process fluid and/or stop the dispensing action. Then, the elongated balloon can be contracted from the expanded state to the initial state. In some embodiments, for a specific dispensing operation, the elongated balloon can contract to be smaller than the initial state, but avoid contraction that substantially exceeds the initial state. Prevent defects. In fact, the system can be configured to prevent the process fluid from being clamped by the elongated capsule. If the opposing inner walls contact each other to clamp the elongated capsule, this action may be similar to a valve that physically and completely obstructs the flow of the process fluid, causing defects in the process fluid. The system can be configured to prevent any clamping of the process fluid by the elongated capsule. Therefore, with the exception of the process fluid valve upstream of the process fluid filter, the system does not include any valve (that can completely block the flow of the process fluid through the process fluid conduit) between the process fluid filter and the distribution nozzle.

Indirect pressure distribution can be performed by the following actions: without using direct gas (gas pressure) on the process fluid in the source container, pull/push the process fluid out of the chemical substance bottle or the process fluid source container into the distribution system . Such a system can utilize a supply bottle with an internal liner that insulates the gas used to squeeze/fold the inner bag. Alternatively, a conventional fluid containment bottle can be used with a pulling device that pulls the process fluid from the source bottle without using gas in contact with the process fluid. Another way is to use a gravity feed system that includes a siphon mechanism.

Another implementation aspect of the embodiments herein includes reducing the overall components in the distribution system compared to the conventional photoresist distribution system. The embodiments herein include removing many components and valves from the distribution line after the process fluid filter (that is, downstream of the process fluid filter). Most of the particles in the process fluid can be removed by the process fluid filter, but the particles generated after the process fluid filter may cause defects on the substrate, and the defects are in the deposited film.

In some embodiments, after passing through the process fluid filter, there are no moving parts that directly contact the process fluid. That is, there are no moving parts other than the capsule wall itself, but the movement of the capsule wall is dispersed and relatively uniform, and there is no sharp contact portion or edge (which produces process fluid defects) related to the conventional moving parts. This embodiment may include the case where there is no valve after the process fluid filter. Therefore, the technology in this paper eliminates the dispensing valve and related pumps, where the system operates without pumps used to drive the process fluid through the system and onto the substrate.

The distribution system in this article can be divided into two areas or parts. For example, there is a "clean zone" area, which contains the distribution system pipelines and components from the process fluid source to the process fluid filter. It also has a "super clean zone", which contains the distribution pipeline from the process fluid filter to the distribution nozzle. The headroom area (upstream from the process fluid filter) covers all moving parts such as valves, tanks, and reservoirs. There are no moving parts in contact with the process fluid (liquid) in the ultra-clear area (downstream from the process fluid filter).

The technology includes a distribution unit with a long and narrow balloon (which is surrounded by hydraulic fluid) for expansion and contraction, which has a piston and/or rod that can be inserted into the hydraulic fluid, for volume control of the hydraulic fluid, and by The extension is used for volume control of the long and narrow capsule. The distribution unit in this article provides a high-purity and high-precision distribution system. This may include electronic (digital) control of the amount of process fluid passing through the dispensing nozzle during dispensing operation. In addition, the dispensing unit can provide electronic control of the amount of process fluid that is drawn back into the dispensing nozzle during the post-dispensing operation, which is also called suck-back control. As part of the suckback control, the system can suck the process fluid back so that the meniscus remains at a predetermined position in the dispensing nozzle, and then the meniscus can be maintained at that position during the refilling of the capsule. Therefore, the technology in this article provides accurate digital suction control and meniscus control. Precise dispensing and sucking back are partly achieved by precise pistons and/or rods, and related motors. Precise volume control and long and narrow capsules achieve a valve-less system downstream of the process fluid filter.

The technology includes a dispensing nozzle with a precise fluid level detector. The system can detect and control the position of the meniscus in the dispensing nozzle. The meniscus sensor provides continuous feedback of the position of the liquid meniscus in the dispensing nozzle to the elongated capsule unit to continuously adjust the capsule volume and maintain the meniscus at a desired position. The system may include a nozzle system with a shielding device or a shield that creates a favorable micro-environment around the nozzle by flowing solvent gas around the dispensing nozzle to prevent the process fluid (e.g., photoresist) in the dispensing nozzle ) Of drying. When the solvent in the process fluid evaporates (because there is no valve, at the dispensing nozzle exposed to the air), the evaporation may leave dry particles, which can be easily transferred to the substrate in subsequent dispensing operations. The shielding device in this paper eliminates the drying of the process fluid in the nozzle without using a valve that may cause defects.

Now, the embodiments herein will be described in more detail. Reference is now made to Figures 1 to 3, which depict a dispensing unit 100 that can be used for fluid delivery. Such a dispensing unit 100 may include a hydraulic fluid housing 111 defining a chamber (or balloon chamber) in which the elongated bladder system is positioned. The piston rod housing 113 containing the hydraulic fluid chamber is attached to the hydraulic fluid housing 111, and the hydraulic fluid chamber is fluidly connected to the hydraulic fluid housing 111. The piston rod housing 113 can be used to precisely control the pressure of the hydraulic fluid in the elongated bladder unit. The actuator 114 can be used to move and control the piston rod. The discharge valve 118 may be used to assist in the removal of air from the hydraulic system. The distribution unit herein can be configured to operate as a self-contained hydraulic system-embodiments do not require hydraulic lines or connectors that extend to the distribution unit. The embodiment can be compact and operate with a low hydraulic volume.

Reference is now made to Figures 4 and 5, which depict a cross-sectional side view of an exemplary capsule-based dispensing unit. The elongated balloon 115 extends from the chamber inlet opening 116 to the chamber outlet opening 117. The chamber 119 is sized to allow the elongated balloon 115 to expand to a predetermined volume and prevent it from expanding beyond the predetermined volume. The elongated capsule defines a linear fluid flow path between the chamber inlet opening 116 and the chamber outlet opening 117. The elongated balloon system is configured to expand and contract laterally in the chamber 119, so that when the elongated balloon contains the processing fluid, the volume of the processing fluid in the elongated balloon can increase and decrease.

This embodiment includes a piston rod housing 113 attached to the cavity 119. The piston rod housing contains a piston 124 configured to move within the displacement chamber. A motor such as the stepping motor 128 can be used to move the piston 124. The displacement chamber 127 is in fluid connection with the chamber 119. Accordingly, by moving the piston 124, when the hydraulic fluid fills the chamber and the displacement chamber, the pressure exerted on the outer surface of the elongated capsule 115 can be increased and decreased. The anti-recoil mechanism 129 can be used to remove the action of the hydraulic fluid to increase the accuracy and control of the volume of the process fluid in the elongated capsule. The DIN rail mounting portion 148 can be used to fix the capsule-based dispensing unit in a coater-developer tool or other dispensing system that benefits from the precise and controlled dispensing of liquid.

Therefore, the technology herein can be implemented as a single cassette-type chamber distribution unit in a closed loop. The hydraulic displacement pin (or rod, or piston, or plural pins) may affect the hydraulic fluid. This hydraulic fluid system is in contact with the (plural) outer surface of the elastic long and narrow capsule. The control of balloon contraction is a function of how far the pin (or (plural) piston, or (plural)) rod, or (plural) plunger) is inserted into the hydraulic fluid. Likewise, the control of balloon inflation is a function of the degree to which the pin is removed or pulled back from the hydraulic fluid. Accordingly, extremely precise control of the expansion or contraction of the long and narrow balloon is achieved. Further control of the hydraulic fluid is affected by the number, size, and combination of pins used. For example, a situation with a relatively large pin filling the entire hydraulic fluid channel can impart a relatively large volume change. Seals can be used around the piston/rod at the opening into the hydraulic fluid chamber to prevent the loss of hydraulic fluid. Utilizing a rod or pin with a relatively small cross-section can facilitate gradual and small changes in volume, which can facilitate the distribution of relatively small amounts of fluid. Alternatively, embodiments may include using a plurality of rods (e.g., rods with different sizes) to cause different volume changes.

The actuator can be used to push the piston or rod. The actuator can be a stepper motor, a DC motor, a servo motor, or other mechanisms. The choice of hydraulic control mechanism can be based on specific distribution requirements. For example, a given system can be designed to dispense from the nozzle at a rate of 0.3 to 1.0 mL/s. Taking a non-limiting example as an example, common design considerations for dispensing photoresist on semiconductor wafers include dispensing quickly enough to avoid dripping, but dispensing slowly enough to prevent splashing onto the wafer. The dispensing speed can also be a function of: the viscosity of the particular process fluid to be dispensed. Because the delivery rate is a function of actuator speed, the selection of a particular actuator can be based on the distribution parameters desired for a given system.

The distribution unit herein can be restricted or physically restricted when it exceeds a certain degree, so that the elongated bladder can be over-pressurized or over-back-pressurized. In other words, after the balloon is pressurized to a certain degree (increase the volume of the balloon), the balloon contacts the wall and no longer expands, similar to expanding a balloon in a barrel. At a certain level, the elongated balloon contacts the chamber wall or the balloon expansion restriction portion, and no longer expands. Figures 6 and 7 are schematic cross-sectional views depicting this feature. In FIG. 6, the elongated balloon 115 is depicted as positioned within the cavity 119. The elongated capsule 115 is in a moderately expanded state, and is shown to have a uniform cross-section through which the process fluid is flowing. The balloon expansion restriction portion 145 is positioned around the elongated balloon 115. Note that the hydraulic fluid 126 fills the gap between the elongated capsule 115 and the capsule expansion restriction portion 145. It is also noted that the balloon expansion restriction portion 145 may include holes, or gaps, or perforations to provide hydraulic fluid in and out. Therefore, in an embodiment, the balloon expansion restriction portion 145 may be configured as a rigid sleeve defining a plurality of openings, or a rigid mesh sleeve may be used.

When the pressure of the hydraulic fluid applied to the elongated balloon decreases (for example, by retracting the piston 124 from the chamber (or displacement chamber)), the fluid pressure of the process fluid can expand the elongated balloon and collect an injection volume Fluid. This expanded state is depicted in FIG. 7. The expansion of the elongated balloon can continue until the balloon completely contacts the balloon expansion restriction portion. At this time, avoid expanding the inner diameter of the long and narrow capsule. Such a physical restriction avoids the hysteresis problem of the elastic material originating from the long and narrow capsule, thereby eliminating the need for continuous recalibration. Figure 8 depicts an embodiment in which the cavity 119 is sized small enough to act as a balloon expansion restriction. FIG. 8 also depicts an embodiment using two displacement members (which may include a piston 124 and a rod 125). This provides two levels of control. The piston 124 can provide a larger displacement for coarser control, while the smaller rod 125 provides a finer displacement control. Figure 9 depicts a given embodiment in which the displacement member travels into the same chamber in which the elongated balloon 115 is positioned.

With the distribution unit embodiment herein, when used with an air piston anti-recoil preload, additional hydraulic fluid is not always required. The air piston can avoid "brake softness" or slack in the volume change, so that the chamber does not need to have multiple pins to accurately adjust the volume. The air piston can apply pressure to the entire system to eliminate any residual deformation potential or softness. For example, air pistons can be used to eliminate recoil in linear actuators. The backlash in this paper includes the idling when the screw changes direction, and the subsequent change of the nut or ball bearing from one wall of the screw to the other. By applying a constant force on the shaft, the component remains in contact with the screw side. Drain valves for areas containing hydraulic fluid can be used to remove air from the system.

The system can include an optical interrupt switch that acts as a limit switch. Alternatively, a reed or a Hall effect sensor can be used and a magnet located at the base of the rod mounting part can be used. For example, using a meniscus position sensor, a linear encoder can optionally be used for closed loop control or for data collection.

The distribution system herein uses infusion accumulation and distribution capsules to provide a valveless distribution system after the process fluid is filtered. Figure 10 is a schematic diagram of an exemplary distribution system. The process flow system is supplied or delivered from the process fluid source 150 to the valve 152. For example, the process fluid source can be a bottle of photoresist, developer, etc. Valve 152 is a fully closed valve, and therefore can start or stop flow into the larger distribution system. The process fluid flows from valve 152 to and through filter 154, which may be a high-purity filter, to remove particulates and/or other contaminants. The process fluid flows from the filter 154 to the capsule-based dispensing unit 100 that includes an elongated capsule.

The distribution unit can expand the volume of the long and narrow capsule to collect an injected amount of process fluid. When the processing fluid is distributed on the substrate, the distribution unit can shrink the elongated capsule, which causes the filtered processing fluid to flow to the distribution nozzle 137 and out of the distribution nozzle to the substrate 105. Note that after the process fluid passes through the filter 154, there is no valve in the distribution line. This includes situations where the nozzle valve is not dispensed. Accordingly, downstream of the filter 154, the system is an open-tube design. Generally, in the case of an open tube system, when the valve is opened, the process fluid will continuously flow out of the dispensing nozzle. However, the system in this paper uses an inflatable bladder to suck back the process fluid and collect an injected amount of the process fluid to prevent the fluid from being dispensed at an undesirable time. The reinjection rate can be adjusted according to a specific distribution cycle. For example, a given system may require the deposition of process fluids on different substrates every 30 seconds, or every 45 seconds, or every 60 seconds. Based on the distribution cycle and process fluid filtration, a specific re-injection rate can be set. For the longer period between dispensing operations, the valve 152 can be closed when the elongated capsule should not collect the infusion indefinitely.

The absence of a valve after the process fluid filter means a smaller chance of defects. Some liquid compositions have a higher tendency to self-aggregate (for example, some anti-reflective coatings containing silicon), and the self-aggregation problem increases with more physical contact parts (valves, bleed off, etc.). And therefore it is usually possible to exclude one gallon of such material at the beginning of a manufacturing batch, or when changing fluids. The distribution unit and distribution system herein do not provide an opportunity for gathering such materials, and therefore increase the usage rate of the materials. Conventional systems usually contain many mechanical components that try to prevent defects (including booster valves, pre-injection chambers, bleed screws, purge locations, thick and fine needle valves, buffer tanks, etc.) Bubbles, etc.), but all of these features themselves may produce defects. Accordingly, as disclosed in this document, the case where there is no mechanical element contacting the process fluid after filtration provides high-purity distribution, and the precise motor control of the distribution unit provides high-precision distribution.

The configuration of the distribution system in this article essentially divides the process fluid pipeline into two regions or sections. Referring again to FIG. 10, the portion 171 may be referred to as the "headroom" portion, and the portion 172 may be referred to as the "super headroom" portion. Note that the valve 152 and the process fluid source 150 are located in the clearance portion on the upstream side of the process fluid filter. The headroom can be regarded as a secondary important area (compared to the super headroom) because the process fluid has not yet passed through the final filter before dispensing. In addition, the valve 152 may have flexible opening and closing and electronic control. After the filter 154 (final filter), there is no impact or gathering location, and the distribution line (duct) runs from the filter 154 to the distribution nozzle 137. Therefore, in the ultra-clear space, there are no mechanical moving parts in contact with the process fluid except for the long and narrow capsule that expands and contracts smoothly.

The embodiment of the distribution system herein may also include meniscus control using continuous monitoring and feedback. The meniscus sensor 138 can monitor the meniscus position at the dispensing nozzle 137 at a relatively high sampling rate (ten or more cycles per second), and transmit the meniscus position data (including meniscus position changes) To the controller 142 that controls the expansion and contraction of the long and narrow balloon. Accordingly, the position of the meniscus can be maintained at a predetermined position in the dispensing nozzle 137 between dispensing operations. This involves the use of long and narrow balloons to control the suckback after the process fluid is distributed.

The technology in this article can provide digital suck back in part by the following: having enough back-and-forth volume conversion to keep the meniscus in operation. The meniscus can stop on the distribution line and then maintain its position in the nozzle area of the system. In the case of the conventional system, it is impossible to use an open tube system. However, using the technique of using long and narrow capsules in this article, such control is possible. The distribution unit can be configured to respond to the meniscus position feedback with a small delay. For example, a meniscus position sensor (such as an optical sensor) monitors the position of the meniscus to identify the position of the meniscus and the change of the meniscus (which the human eye usually cannot detect). Then, the PID control loop is used to make one-way or reverse volume changes immediately. For example, one response is to rapidly expand the long and narrow balloon to absorb the volume change of the pressure pulse about to hit the meniscus. The result of this response is that the process fluid remains in the nozzle and is not distributed on the substrate.

Any sensor that can perform the following actions can be used: monitor the position of the meniscus in the nozzle area in sufficient time and detect the change in position to transmit the change in position, so the distribution unit can make volume adjustments to make The meniscus is maintained within a predetermined position range. Referring now to FIG. 11, in one embodiment, an optical sensor is used with the dispensing nozzle 137. The electronic light sensor 168 (for example, a linear photodiode array (PDA, photodiode array) sensor, or a charge-coupled device (CCD, charge-coupled device) sensor) is positioned on the dispensing nozzle 137 or in the nozzle area . The nozzle area may include a nozzle, a tapered portion of the nozzle, or a nozzle and a conduit of a predetermined length immediately before the dispensing nozzle 137. For example, a light source 167 such as a light emitting diode (LED) is installed facing the light sensor to provide light. The electronic light sensor 168 can then be used to detect the position 169 of the meniscus. The control loop response time can be configured to be less than ten milliseconds. Alternatively, surface mount LEDs with light diffusers can be used. Alternatively, a capacitive sensor, a visual camera system, a time-domain reflectometer, or an ultrasonic sensor can be used. The stepping motor can be included in the control loop and can be changed quickly to maintain the meniscus at a predetermined holding position. Accordingly, even if there is no valve at the dispensing nozzle 137, and regardless of any physical impact action on the system, or variable flow rate through the process fluid filter, the system herein can still maintain the meniscus at the meniscus position. The monitoring of the meniscus position provides digital suction control. During the dispensing operation, the elongated bladder can be contracted or compressed using hydraulic fluid. This action helps the process fluid to leave the dispensing nozzle and onto the substrate. Additional flow can be provided from the process fluid source. After the dispensing operation is completed, the system can expand the long and narrow capsule until the meniscus of the process fluid is sucked back to a predetermined position in the nozzle area. The meniscus monitoring sensor can be positioned directly on the nozzle itself, or can be positioned considering the nozzle.

The embodiment may include a technique to prevent the meniscus of the process fluid from evaporating when the dispensing is not performed, so as to prevent defects. As already described, the system in this document operates without a valve at the nozzle. At the nozzle, the process flow system is maintained in the nozzle or nozzle area when the meniscus is exposed to air. When the solvent in the process fluid evaporates, the evaporation may leave dry particles, which can be easily transferred to the substrate in subsequent dispensing operations. Referring now to FIG. 12, embodiments may include the use of an evaporation barrier 178 and/or a solvent gas supply 177. The evaporation barrier 178 may provide a nozzle shield, a partial housing, or a complete housing (encapsulation part) to prevent or reduce evaporation. The barrier device with a complete shell can wrap the tip of the nozzle without touching the nozzle. Therefore, in terms of particle generation, no mechanical parts touch the meniscus. The evaporation barrier 178 may be configured to open and close depending on the dispensing action, so as to contain the evaporate when closed, and then open to allow the dispensing action. A gas-based solvent can be supplied to the nozzle to replace or add to the barrier device. By filling the air in contact with the meniscus of the process fluid, the solvent of the process fluid has a reduced chance of evaporating from the process fluid and leaving a higher concentration of solids. Accordingly, such a technology can prevent or reduce evaporation at the meniscus without physical contact with the mechanical parts of the meniscus of the process fluid.

The system in this article contains several operating states. An operating state is an operating state that maintains the position of the meniscus. Before dispensing or during the idle period, using feedback from the meniscus position sensor, the elongated bladder system is used to maintain the meniscus of the process fluid at a specific position in the nozzle or nozzle area. The other operating state is the operating state of the dispensing fluid. If the meniscus of the process fluid is not at the desired position, the bladder is used to adjust the meniscus to position. Then, the capsule can dispense a desired volume of process fluid to a substrate such as a semiconductor wafer at a desired rate, and then stop the dispensing operation and suck the meniscus back to the holding position. Note that during the dispensing operation, there is no valve operation, that is, there is no valve downstream of the process fluid filter. The other operating state is the operating state of reinjecting the long and narrow capsule. The valve (on the upstream side of the filter) is open to allow process fluid to flow into the elongated capsule. The elongated balloon is expanded to refill the fluid injection volume and manage the meniscus to maintain its position. When the capsule has been refilled and subsequent dispensing is not required, the valve can be closed.

The system in this paper can maintain the meniscus position based on pixel movement. When detecting pixel movement larger than, for example, 5 pixels, the system can make volume adjustments. Accordingly, using the technology in this article, the meniscus can be maintained at a specific holding position within +/- 1 mm of the set position. The system herein can be configured to dispense about 0.5 ml in about 1 second. In an exemplary reinjection process, the valve is opened to allow the process fluid to flow through the filter and into the elongated capsule. PID control can be used to start the volume control motor of the distribution unit to maintain the meniscus in the holding position. When the stage position reaches the refill set point, valve 152 can be closed. The motor can be stopped after an optional delay to allow additional fluid to diverge from the filter. Then, a proportional controller can be used to position the meniscus at the holding position. Depending on the system parameters and size, the re-injection of the filtered process fluid in the capsule can take 5-30 seconds. Therefore, the system herein can have a substrate cycle time of less than about 20 seconds. The system herein can provide a valveless distribution system with high repeatability and meniscus control within about 1 mm.

Other embodiments for maintaining the position of the meniscus include configuring the dispensing nozzle and/or nozzle area to utilize capillary action. Capillary action can be used to create a portion with a pressure difference without using a capsule to move the process fluid. In one embodiment, the substantial pressure difference is generated within the nozzle range by using features in the nozzle. For example, the screen can be positioned in the nozzle immediately before the nozzle opening (or fine filter, screen, etc.). Taking a non-limiting example as an example, in terms of photoresist distribution using a duct (which has a nozzle opening of about 1 mm), a plate with a plurality of micron-level openings can be used. After the process fluid passes through the screen, the process fluid can easily fall on the substrate positioned under the nozzle. After reducing the pressure of the process fluid, the process fluid is held on the duct side of the screen. Then, before the process fluid can leave the nozzle, it needs to have a critical pressure to overcome the capillary action of the sieve plate. Accordingly, the capillary action from the sieve plate can maintain the meniscus of the process fluid in the nozzle area.

Another embodiment may include the use of a narrowed fluid conduit immediately before the dispensing nozzle. When the diameter of the pipe narrows, the capillary force increases, and the adhesion between the liquid and the pipe can increase. Therefore, by using the narrowed opening positioned near the dispensing nozzle or positioned immediately before leaving the dispensing nozzle, the fluid adhesion force in this portion can be increased. If the pressure of the process fluid in the process fluid conduit is sufficiently reduced, the process fluid that has passed through the narrowed portion is cut off and leaves the dispensing nozzle, and the remaining process fluid is held in the narrowed conduit due to adhesive force. Then a certain critical pressure greater than zero is required to restart the dispensing process fluid. Otherwise, the process fluid may be held in the open dispensing nozzle instead of dripping from the dispensing nozzle. Taking a non-limiting example as an example, if the process fluid conduit has a diameter of 1 mm and the dispensing nozzle has a diameter of 0.8 mm, the length of the conduit immediately before the dispensing nozzle may have a diameter of about 0.5 mm. Such an embodiment can operate with or without a meniscus sensor, and can operate with or without an evaporation prevention mechanism.

Accordingly, the embodiments herein provide a fluid delivery system. Such a system may include a device for fluid distribution, which may include a process fluid conduit extending from an inlet of a process fluid source to a dispensing nozzle. The conduit may include pipes or piping for the transportation of liquid chemical components. The process fluid source inlet is used to receive the process fluid, wherein the process fluid has a pressure sufficient to drive the process fluid from the process fluid inlet to the dispensing nozzle as the flow direction of the process fluid. For example, the process fluid source inlet may be configured to be attached to a photoresist container. The source of the process fluid is upstream, and the distribution nozzle is downstream.

For example, the source of the process fluid may be a supply bottle containing chemical components for the customized process fluid. The process fluid valve is positioned downstream of the process fluid source inlet along the process fluid conduit. The process fluid valve system is configured to selectively stop the flow of the process fluid through the process fluid conduit and allow the process fluid to flow through the process fluid conduit. The process fluid filter is positioned downstream of the process fluid valve along the process fluid conduit, and is configured to filter the process fluid passing through the process fluid conduit. For example, the photoresist is filtered when it is pushed through the process fluid filter. Therefore, the system is configured to flow the process fluid from the process fluid source inlet to the process fluid valve, and then to the process fluid filter. During the dispensing operation, the process fluid supply pressure should be sufficient to push the process fluid through the filter and into the elongated capsule, and prevent backflow through the process filter.

The elongated bladder system is positioned downstream of the process fluid filter and is configured as a part of the process fluid conduit. In other words, the long and narrow balloon serves as or serves as a part of a continuous process fluid conduit. The long and narrow bladder system is positioned in the cavity defined by the hydraulic fluid housing, and can be implemented as a modular unit that can be removed and replaced as needed. The elongated capsule extends from the chamber entrance to the chamber exit. The elongated capsule defines a linear flow path between the chamber inlet opening and the chamber outlet opening. The long and narrow bladder system is configured to expand and contract laterally in the chamber, so that when the long and narrow bladder contains a volume of process fluid, the volume of the process fluid in the long and narrow bladder can increase and decrease. The elongated capsule may have a circular, elliptical, or oblong cross-sectional shape. The elongated capsule has a length greater than the height of the cross-section of the elongated capsule. In some embodiments, the length of the elongated capsule may be four times greater than the height of the cross-section.

The controller is configured to increase the pressure of the hydraulic fluid applied to the outer surface (or a plurality of outer surfaces) of the elongated capsule, thereby selectively contracting the elongated capsule, so that the process fluid is distributed from the dispensing nozzle. The controller is configured to selectively inflate the elongated balloon by reducing the pressure of the hydraulic fluid applied on the outer surface of the elongated balloon, thereby stopping the dispensing of the process fluid from the dispensing nozzle.

The device can be configured to start a given dispensing from the dispensing nozzle and stop a given dispensing from the dispensing nozzle when the process fluid valve is in an open state. Note that there is no valve at the dispensing nozzle. The process fluid conduit has no valve between the process fluid filter and the dispensing nozzle. Therefore, the embodiments include situations where no valve is positioned on the process fluid conduit downstream of the process fluid filter. That is, the process fluid conduit does not have a valve (that can completely block the flow of the process fluid through the process fluid conduit) between the process fluid filter and the dispensing nozzle.

The elongated bladder system is configured to expand and collect an injected amount of process fluid when no process fluid is being dispensed from the dispensing nozzle. The elongated capsule can be selected as an elastic material or a flexible material. The fluid conduit may have an oblique connection to the elongated balloon at each end of the elongated balloon. The equipment can be positioned in a coater-developer tool for depositing and developing film layers on semiconductor wafers.

The hydraulic fluid housing includes a balloon expansion restricting portion positioned in the hydraulic fluid housing and sized to allow the elongated balloon to expand to a predetermined volume and prevent it from expanding beyond the predetermined volume. The displacement member can be inserted into the hydraulic fluid housing to increase the hydraulic fluid pressure, and can be retracted from the hydraulic fluid housing to reduce the hydraulic fluid pressure.

Embodiments may include a meniscus sensor positioned at the dispensing nozzle and configured to transmit the meniscus position of the process fluid in the dispensing nozzle (or nozzle area) to the controller. Such a meniscus sensor can be optical, capacitive, ultrasonic, etc. The controller may be configured to receive a command to maintain the position of the meniscus, and then selectively maintain the position of the meniscus in the dispensing nozzle within a predetermined tolerance by adjusting the volume in the elongated capsule.

In some embodiments, the evaporation prevention device is positioned to partially or completely surround the dispensing nozzle without contacting the process fluid in the dispensing nozzle. In other words, the shield or cover is used to surround the tip of the dispensing nozzle, or to reduce the exposure of the tip of the dispensing nozzle to air, without actually touching the tip of the dispensing nozzle. The solvent delivery unit can also be positioned and configured to deliver the solvent in the gas phase to the open area of the dispensing nozzle, so that the solvent can flow into contact with the meniscus of the process fluid. In other words, the gas phase solvent (compatible with the process fluid) can be pumped or flowed to the opening of the dispensing nozzle. By enclosing the air at the tip of the dispensing nozzle so that the vapor phase solvent contacts the meniscus of the process fluid, the evaporation of the process fluid can be reduced or prevented, thereby reducing potential defects in the process fluid.

Another embodiment includes a device for fluid distribution. The device includes a process fluid conduit extending from a process fluid valve to a dispensing nozzle. The process fluid valve is configured to selectively stop the flow of process fluid through the process fluid conduit, and allow the process fluid to flow through the process fluid conduit to the dispensing nozzle (eg, total back pressure). The process fluid filter is positioned in the process fluid conduit between the process fluid valve and the distribution nozzle.

The long and narrow bladder system is positioned between the process fluid filter and the dispensing nozzle. The long and narrow balloon system is configured as a part of the process fluid conduit. The elongated bladder system is positioned in the hydraulic fluid housing. The elongated bladder extends from the chamber inlet opening of the hydraulic fluid housing to the chamber outlet opening. The elongated capsule defines a linear flow path between the chamber inlet opening and the chamber outlet opening. The long and narrow bladder system is configured to expand and contract laterally in the hydraulic fluid housing, so that when the long and narrow bladder contains a volume of process fluid, the volume of the process fluid in the long and narrow bladder can increase and decrease.

In other embodiments, the process fluid valve capable of completely closing the fluid conduit does not exist in the fluid distribution system. Exemplary process valves include spherical valves, butterfly valves, gate valves, needle valves, etc., which basically include any inelastic valve. Therefore, there is no valve or no rigid (inelastic) valve from the inlet of the process fluid source to the dispensing nozzle. This embodiment is implemented in part by manipulating the supply pressure of the fluid source. By reducing the supply pressure of the process fluid source to zero within the system, there is sufficient fluid friction in the process fluid conduit to prevent the flow of the process fluid. The supply fluid pressure can then be increased to generate flow to overcome the resulting pressure drop. For example, a common photoresist supply source can be a bottle or a bag in a container. The bottle may have a fluid outlet and an inlet for increasing the air pressure on the photoresist surface. This situation can also be achieved with a photoresist located in the bag, where air pressure is applied to the outer surface of the bag. This allows the photoresist to flow through the distribution system and can be started, stopped, paused, and adjusted by the controller. Therefore, in such an embodiment, the process fluid conduit extends from the process fluid source inlet to the dispensing nozzle. The process fluid source may be attached to the process fluid source inlet to receive the process fluid. The process fluid source may have a selectable supply pressure from zero pressure to an increased pressure, and the increased pressure is at least sufficient to drive the process fluid from the process fluid source inlet to the dispensing nozzle as the process fluid flow direction, where the process fluid source is The distribution nozzle is upstream and downstream. Such a system can be configured in other ways as described above, but the process fluid conduit does not have a valve between the process fluid source inlet and the dispensing nozzle. The valve refers to a valve that can completely block the flow of the process fluid passing through the process fluid conduit, such as a ball valve or a needle valve. The controller can also be configured to control the supply pressure of the process fluid source to continuously adjust the supply pressure.

The controller is configured to increase the pressure of the hydraulic fluid applied to the outer surface of the elongated capsule, thereby selectively contracting the elongated capsule, so that the process fluid is distributed from the dispensing nozzle. The controller is configured to selectively inflate the elongated balloon by reducing the pressure of the hydraulic fluid applied to the outer surface of the elongated balloon, thereby stopping the flow of the processing fluid from the dispensing nozzle when the processing fluid valve is open. distribution. The process fluid conduit may have no valve between the process fluid filter and the dispensing nozzle. The elongated bladder system is configured to expand and collect an injected amount of process fluid when no process fluid is being dispensed from the dispensing nozzle. The equipment is positioned in a coater-developer tool for depositing and developing film layers on semiconductor wafers.

Accordingly, a high-purity, high-precision, valveless distribution system is provided.

In the foregoing description, specific details such as the specific geometric structure of the processing system and the description of many elements and processes used therein have been proposed. However, we should understand that the technology in this document can be implemented in other embodiments that deviate from these specific details, and such details are for explanatory and non-limiting purposes. The embodiments disclosed herein have been described with reference to the accompanying drawings. Similarly, for the purpose of explanation, specific numbers, materials, and configurations have been proposed to provide a thorough understanding. However, the embodiments can be implemented without such specific details. Elements having substantially the same functional structure are denoted by similar reference signs, and thus any repetitive description may be omitted.

Various different techniques have been described as plural separation operations to help understand the various embodiments. The order of description should not be taken as implying that these operations must be sequence dependent. In fact, these operations need not be performed in the order presented. The described operations can be performed in a different order than the described embodiment. In additional embodiments, many additional operations may be performed, and/or the operations may be omitted.

According to the present invention, the "substrate" or "target substrate" used herein generally refers to the object to be processed. The substrate may include any material part or structure of a device (especially a semiconductor or other electronic device), and for example, may be a basic substrate structure, such as a semiconductor wafer, a shrinking mask, or a basic substrate structure on or covering the foundation Substrate structure coating (such as film). Therefore, the substrate is not limited to any specific basic structure, lower or upper layer, patterned or unpatterned, but the substrate is considered to include any such cladding or basic structure, and the cladding and/or basic structure. Any combination. The description can refer to a specific type of substrate, but it is for illustrative purposes only.

Those skilled in the art will also understand that many different changes can be made to the operation of the technology explained above, while still achieving the same goal of the invention. Such changes are intended to be included in the scope of this disclosure. Therefore, the foregoing contents of the embodiments of the present invention are not intended to be limiting. Instead, any limitations on the embodiments of the present invention are presented in the scope of the following patent applications.

100‧‧‧Distribution unit 105‧‧‧Base plate 111‧‧‧Hydraulic fluid housing 113‧‧‧Piston rod housing 114‧‧‧Actuator 115‧‧‧Long and narrow capsule 116‧‧‧ Chamber entrance opening 117‧ ‧‧ Chamber outlet opening 118‧‧‧Discharge valve 119‧‧‧ Chamber 124‧‧‧Piston 125‧‧‧ Rod 126‧‧‧Hydraulic fluid 127‧‧‧Displacement chamber 128‧‧‧Motor 129‧‧ ‧Anti-recoil mechanism 137‧‧‧Distribution nozzle 138‧‧‧Menis sensor 142‧‧‧Controller 145‧‧‧Bladder expansion restriction part 148‧‧‧DIN rail mounting part 150‧‧‧Process fluid Source 152‧‧‧Valve 154‧‧‧Filter 167‧‧‧Light source 168‧‧‧Electronic light sensor 169‧‧‧Menix position 171‧‧Part 172‧‧‧Part 177‧‧‧Solvent gas Supply 178‧‧‧evaporation barrier

With reference to the following implementations considered together with the accompanying drawings, a more complete understanding of the many embodiments of the present invention and many accompanying advantages will become apparent. These diagrams are not necessarily drawn to scale, but to emphasize the characteristics, principles, and concepts.

Figure 1 is a perspective view of a capsule-based dispensing unit as described herein.

Figure 2 is a side view of a capsule-based dispensing unit as described herein.

Figure 3 is a front view of the capsule-based dispensing unit as described herein.

Figure 4 is a cross-sectional side view of a capsule-based dispensing unit as described herein.

Figure 5 is a cross-sectional side view of a capsule-based dispensing unit as described herein.

Figure 6 is a cross-sectional schematic side view of a capsule-based dispensing unit as described herein.

Figure 7 is a cross-sectional schematic side view of a capsule-based dispensing unit as described herein.

Figure 8 is a cross-sectional schematic side view of a capsule-based dispensing unit as described herein.

Figure 9 is a cross-sectional schematic side view of a capsule-based dispensing unit as described herein.

Figure 10 is a schematic diagram of a distribution system as described herein.

Figure 11 is a schematic cross-sectional view of a nozzle and a meniscus sensor as described herein.

Figure 12 is a schematic cross-sectional view of a nozzle and a meniscus sensor as described herein.

100‧‧‧Distribution unit

105‧‧‧Substrate

137‧‧‧Distribution nozzle

138‧‧‧ Meniscus Sensor

142‧‧‧controller

150‧‧‧Processing fluid source

152‧‧‧valve

154‧‧‧Filter

Part 171‧‧‧

Part 172‧‧‧

Claims (18)

An apparatus for distributing fluid, the apparatus comprising: a process fluid conduit extending from an inlet of a process fluid source to a dispensing nozzle, the process fluid conduit system for receiving the process fluid, the process fluid having a sufficient capacity from the The inlet of the process fluid source drives the pressure of the process fluid toward the distribution nozzle as the flow direction of the process fluid, wherein the distribution nozzle is downstream of the inlet of the process fluid source; a process fluid valve is positioned along the process Downstream of the inlet of the process fluid source of the fluid conduit, the process fluid valve is configured to selectively allow and stop the flow of process fluid from the inlet of the process fluid source through the process fluid conduit; a process fluid filter, which Located downstream of the process fluid valve along the process fluid conduit and upstream of the dispensing nozzle along the process fluid conduit, the process fluid filter is configured to filter the process fluid passing through the process fluid conduit; A long and narrow bladder is positioned downstream of the process fluid filter and upstream of the dispensing nozzle along the process fluid conduit. The long and narrow bladder system is positioned in a chamber defined by a hydraulic fluid housing. The balloon extends from a chamber entrance to a chamber exit, the elongated balloon defines a linear flow path between a chamber entrance opening and a chamber exit opening, and the elongated balloon system is arranged in the cavity The chamber expands and contracts laterally, so that a volume of the process fluid in the elongated capsule can be increased and decreased; and a controller configured to: by causing the hydraulic pressure applied to an outer surface of the elongated capsule The fluid pressure is increased to selectively contract the elongated capsule to dispense the process fluid from the dispensing nozzle, and the pressure of the hydraulic fluid applied to the outer surface of the elongated capsule is reduced to selectively cause The elongated capsule is expanded to stop the dispensing of the process fluid from the dispensing nozzle, wherein the process fluid conduit has no valve between the process fluid valve and the dispensing nozzle. For example, the device for distributing fluid in the first item of the scope of patent application, wherein the device is configured to activate a given dispensing action from the dispensing nozzle when the process fluid valve is in an open state, and to make the dispensing nozzle The given distribution action is stopped. For example, the device for dispensing fluid in the first patent application, wherein the elongated bladder system is configured to expand and collect an injected amount of process fluid when no process fluid is being dispensed from the dispensing nozzle. For example, the device for distributing fluid in the first item of the scope of patent application, wherein the device is positioned in a coater-developing machine tool for depositing and developing film layers on semiconductor wafers. For example, the device for distributing fluid according to the first item of the scope of patent application, wherein the hydraulic fluid housing includes a bladder expansion restricting portion, the bladder expansion restricting portion is positioned in the hydraulic fluid housing, and is sized to allow the elongated The balloon expands to a predetermined volume and prevents the elongated balloon from expanding beyond a predetermined lateral expansion value. For example, the device for distributing fluid in item 5 of the scope of patent application, wherein the balloon expansion restriction portion defines one or more openings for the in and out of hydraulic fluid. For example, the device for distributing fluid in the first item of the scope of the patent application further includes a displacement member that can be inserted into the chamber to increase the pressure of the hydraulic fluid, and can be retracted from the chamber to reduce the pressure of the hydraulic fluid. For example, the device for distributing fluid in the first item of the scope of patent application further includes a meniscus sensor, which is positioned at the dispensing nozzle and configured to be a meniscus of the process fluid in the dispensing nozzle The surface position is transmitted to the controller. For example, the device for distributing fluid according to item 8 of the scope of patent application, wherein the controller is further configured to receive a command to maintain the position of the meniscus, and selectively the distributing nozzle by adjusting the volume of the elongated capsule The position of a meniscus inside is maintained within a predetermined tolerance. For example, the device for distributing fluid in the first patent application, wherein the process fluid filter is configured to filter out particles from a photoresist as the process fluid, wherein the process fluid conduit has an elongated capsule Each end is connected to an oblique connecting portion of the elongated capsule. For example, the device for distributing fluid in the first item of the scope of patent application, wherein the long and narrow bladder system is composed of elastic material and has a length four times greater than the height of the cross section. For example, the device for distributing fluid in the first item of the scope of the patent application further includes an evaporation prevention device, which partially or completely surrounds the dispensing nozzle without contacting the process fluid in the dispensing nozzle. For example, the device for distributing fluid in the first item of the patent application further includes a solvent delivery unit, which is configured to deliver a solvent in a gaseous phase to an opening area of the dispensing nozzle, so that the solvent can flow into and The process fluid is in contact with the meniscus. For example, the device for distributing fluid in the scope of patent application includes a meniscus sensor, which is positioned at the dispensing nozzle and configured to be a meniscus of the process fluid in the dispensing nozzle The surface position is transmitted to the controller. An apparatus for distributing fluid, the apparatus comprising: a process fluid conduit extending from an inlet of a process fluid source to a dispensing nozzle, the process fluid conduit being used for receiving the process fluid from the inlet of the process fluid source, the The process fluid source inlet has a supply pressure that can be selected from zero pressure to an increased pressure, and the increased pressure is at least sufficient to drive the process fluid from the process fluid source inlet to the dispensing nozzle as the process fluid flow direction, wherein the dispensing nozzle system Downstream of the process fluid source inlet; a process fluid filter positioned downstream of the process fluid source inlet along the process fluid conduit and upstream of the distribution nozzle along the process fluid conduit, the process fluid The filter is configured to filter the process fluid passing through the process fluid conduit; A long and narrow bladder is positioned downstream of the process fluid filter and upstream of the dispensing nozzle along the process fluid conduit. The long and narrow bladder system is positioned in a chamber defined by a hydraulic fluid housing. The balloon extends from a chamber entrance to a chamber exit, the elongated balloon defines a linear flow path between a chamber entrance opening and a chamber exit opening, and the elongated balloon system is arranged in the cavity The chamber expands and contracts laterally, so that a volume of the process fluid in the elongated capsule can be increased and decreased; and a controller configured to: by causing the hydraulic pressure applied to an outer surface of the elongated capsule The fluid pressure is increased to selectively contract the elongated capsule to dispense the process fluid from the dispensing nozzle, and the pressure of the hydraulic fluid applied to the outer surface of the elongated capsule is reduced to selectively cause the The elongated capsule expands to stop the dispensing of the process fluid from the dispensing nozzle and to control the supply pressure of the process fluid source, wherein the process fluid conduit has no valve between the process fluid filter and the dispensing nozzle. For example, the device for dispensing fluid according to the scope of patent application, wherein the process fluid source inlet is configured to be attached to a photoresist container, and the elongated bladder system is configured to be when no process fluid is being dispensed from the dispensing nozzle Expand and collect an injected amount of process fluid. For example, the device for distributing fluid according to the 15th patent application, wherein the device is configured to activate a dispensing nozzle from the dispensing nozzle when the supply pressure from the process fluid source is sufficient to drive the process fluid to the dispensing nozzle And stop the given dispensing action from the dispensing nozzle. For example, the device for distributing fluid in the scope of patent application, wherein the hydraulic fluid housing includes a bladder expansion restricting portion, which is positioned in the hydraulic fluid housing and is sized to contain The long and narrow balloon is allowed to expand to a predetermined volume and the expansion of the long and narrow balloon is prevented from exceeding a predetermined lateral expansion value.

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