TWI723046B - How to check the gas supply system - Google Patents

How to check the gas supply system Download PDF

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TWI723046B
TWI723046B TW105129699A TW105129699A TWI723046B TW I723046 B TWI723046 B TW I723046B TW 105129699 A TW105129699 A TW 105129699A TW 105129699 A TW105129699 A TW 105129699A TW I723046 B TWI723046 B TW I723046B
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flow
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flow controller
pressure gauge
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TW201719065A (en
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網倉紀彥
實吉梨沙子
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日商東京威力科創股份有限公司
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    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05DSYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D7/00Control of flow
    • G05D7/06Control of flow characterised by the use of electric means
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01MTESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M3/00Investigating fluid-tightness of structures
    • G01M3/02Investigating fluid-tightness of structures by using fluid or vacuum
    • G01M3/26Investigating fluid-tightness of structures by using fluid or vacuum by measuring rate of loss or gain of fluid, e.g. by pressure-responsive devices, by flow detectors
    • G01M3/28Investigating fluid-tightness of structures by using fluid or vacuum by measuring rate of loss or gain of fluid, e.g. by pressure-responsive devices, by flow detectors for pipes, cables or tubes; for pipe joints or seals; for valves ; for welds
    • G01M3/2807Investigating fluid-tightness of structures by using fluid or vacuum by measuring rate of loss or gain of fluid, e.g. by pressure-responsive devices, by flow detectors for pipes, cables or tubes; for pipe joints or seals; for valves ; for welds for pipes
    • G01M3/2815Investigating fluid-tightness of structures by using fluid or vacuum by measuring rate of loss or gain of fluid, e.g. by pressure-responsive devices, by flow detectors for pipes, cables or tubes; for pipe joints or seals; for valves ; for welds for pipes using pressure measurements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02107Forming insulating materials on a substrate
    • H01L21/02296Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer
    • H01L21/02299Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer pre-treatment
    • H01L21/02312Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer pre-treatment treatment by exposure to a gas or vapour
    • H01L21/02315Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer pre-treatment treatment by exposure to a gas or vapour treatment by exposure to a plasma

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Abstract

本發明之課題在於檢察基板處理裝置用之氣體供給系統。 The subject of the present invention is to inspect a gas supply system for a substrate processing apparatus.

一實施形態中,供給於基板處理裝置之處理容器內的氣體流量於第1流量控制器係對應於設定流量受到控制。此外,來自第1流量控制器之氣體也供給於第2流量控制器。當第1流量控制器之輸出流量成為恆常狀態時,取得第2流量控制器之第1壓力計之第1測定壓力值以及第2壓力計之第2測定壓力值。求出第1測定壓力值與基準壓力值之間的差分絕對值、以及第2測定壓力值與基準壓力值之間的差分絕對值,求出此等差分絕對值之平均值。差分絕對值以及平均值分別來和第1~第3閾值做比較。 In one embodiment, the flow rate of the gas supplied into the processing container of the substrate processing apparatus is controlled by the first flow controller in accordance with the set flow rate. In addition, the gas from the first flow controller is also supplied to the second flow controller. When the output flow rate of the first flow controller becomes a constant state, the first measurement pressure value of the first pressure gauge of the second flow controller and the second measurement pressure value of the second pressure gauge are obtained. The absolute value of the difference between the first measured pressure value and the reference pressure value and the absolute value of the difference between the second measured pressure value and the reference pressure value are calculated, and the average of the absolute values of these differences is calculated. The absolute value and average value of the difference are compared with the first to third thresholds respectively.

Description

檢查氣體供給系統之方法 How to check the gas supply system

本發明之實施形態係關於一種用以對基板處理裝置之處理容器內供給氣體之檢查氣體供給系統之方法。 The embodiment of the present invention relates to a method of an inspection gas supply system for supplying gas in a processing container of a substrate processing apparatus.

電漿處理裝置等基板處理裝置,係從氣體供給系統對其處理容器內供給氣體而處理基板。基板處理裝置有時會依序進行複數種的處理。因此,氣體供給系統有時會控制複數種氣體當中一以上之氣體的流量,將流量受到控制之一以上之氣體供給於處理容器內。 A substrate processing apparatus, such as a plasma processing apparatus, processes a substrate by supplying gas in its processing container from a gas supply system. The substrate processing apparatus sometimes performs multiple processing in sequence. Therefore, the gas supply system sometimes controls the flow rate of more than one gas among a plurality of gases, and supplies more than one gas whose flow rate is controlled into the processing container.

具體而言,氣體供給系統具備:複數第1配管、複數第1閥、複數流量控制器、複數第2配管、複數第2閥、第3配管、以及第3閥。複數第1配管分別連接於複數氣體源。複數第1閥分別設於複數第1配管。複數流量控制器分別設於複數第1配管之下游。複數第2配管分別設於複數流量控制器之下游。複數第2閥分別設於複數第2配管。第3配管連接於複數第2配管。第3閥設於第3配管。第3閥之下游處,第3配管係連接於處理容器。 Specifically, the gas supply system includes a plurality of first pipes, a plurality of first valves, a plurality of flow controllers, a plurality of second pipes, a plurality of second valves, a third pipe, and a third valve. The plural first pipes are respectively connected to plural gas sources. The plural first valves are respectively provided in the plural first pipes. The plural flow controllers are respectively arranged downstream of the plural first pipes. The plural second pipes are respectively arranged downstream of the plural flow controllers. The plural second valves are respectively provided in the plural second pipes. The third pipe is connected to the plural second pipes. The third valve is provided in the third pipe. Downstream of the third valve, the third piping system is connected to the processing container.

複數流量控制器可使用下述專利文獻1~3所記載類型、亦即壓力控制式之流量控制器。此類型之流量控制器具有銳孔、控制閥、第1壓力計、以及第2壓力計。控制閥設置於銳孔之上游側。第1壓力計係以對控制閥與銳孔間的配管內部之壓力進行測定的方式所構成。第2壓力計係以對銳孔下游之配管內部的壓力進行測定的方式所構成。此類型之流量控制器係因應於設定流量來對控制閥進行控制。當第1壓力計之測定壓力值為第2壓力計之測定壓力值的約2倍以上之情況,以減少從第1壓力計之測定壓力值所求得之輸出流量與設定流量之差的方式來對控制閥進行控制。此外,當第1壓力計之測定壓力值較第2壓力計之測定壓力值的約2倍來得小之情況,係以減少 從第1壓力計之測定壓力值與第2壓力計之測定壓力值之差所求得之輸出流量與設定流量之差的方式來對控制閥進行控制。 As the plural flow controllers, the types described in the following Patent Documents 1 to 3, that is, pressure-controlled flow controllers can be used. This type of flow controller has an orifice, a control valve, a first pressure gauge, and a second pressure gauge. The control valve is arranged on the upstream side of the orifice. The first pressure gauge is configured to measure the pressure inside the pipe between the control valve and the orifice. The second pressure gauge is configured to measure the pressure inside the pipe downstream of the orifice. This type of flow controller controls the control valve in response to the set flow. When the measured pressure value of the first pressure gauge is about twice or more than the measured pressure value of the second pressure gauge, the method to reduce the difference between the output flow rate obtained from the measured pressure value of the first pressure gauge and the set flow rate To control the control valve. In addition, when the measured pressure value of the first pressure gauge is approximately 2 times smaller than the measured pressure value of the second pressure gauge, it should be reduced The control valve is controlled by the difference between the output flow rate and the set flow rate obtained from the difference between the measured pressure value of the first pressure gauge and the measured pressure value of the second pressure gauge.

先前技術文獻 Prior art literature

專利文獻1 日本專利第3291161號說明書 Patent Document 1 Japanese Patent No. 3291161 Specification

專利文獻2 日本專利第4102564號說明書 Patent Document 2 Japanese Patent No. 4102564 Specification

專利文獻3 日本專利第4866682號說明書 Patent Document 3 Japanese Patent No. 4866682 Specification

另一方面,氣體供給系統之狀態會隨著基板處理裝置之運轉時間的經過而變化。若氣體供給系統之狀態從以前之狀態變化,即使依照相同程序配方來對基板處理裝置之處理容器供給氣體,但基板處理上所需供給於處理容器內之氣體流量會和用以處理其他基板於以前供給於處理容器內之氣體流量成為不同流量。從而,會發生以前所處理過之基板之狀態與後來處理過之基板之狀態不同的事態。從而,必須檢查氣體供給系統。 On the other hand, the state of the gas supply system changes with the elapse of the operating time of the substrate processing apparatus. If the state of the gas supply system changes from the previous state, even if the gas is supplied to the processing container of the substrate processing apparatus according to the same recipe, the flow rate of the gas supplied to the processing container during substrate processing will be the same as that used to process other substrates. In the past, the gas flow rate supplied into the processing container became a different flow rate. As a result, the state of the substrate processed before and the state of the substrate processed later may be different. Therefore, the gas supply system must be checked.

一態樣中,係提供一種檢查氣體供給系統(用以對基板處理裝置之處理容器內供給氣體)之方法。氣體供給系統具備有複數第1配管、複數第1閥、複數流量控制器、複數第2配管、複數第2閥、第3配管、以及第3閥。複數第1配管分別連接於複數氣體源。複數第1閥分別設於複數第1配管。複數流量控制器分別設於複數第1配管之下游,而分別連接於該複數第1配管。複數第2配管分別設於複數流量控制器之下游,而分別連接於該複數流量控制器。複數第2閥分別設於複數第2配管。第3配管設於複數第2配管之下游,而連接於複數第2配管。第3閥設於第3配管。第3配管於前述第3閥之下游係連接於處理容器。複數流量控制器分別具有:銳孔;第4配管,於銳孔之上游延伸而連接於第1配管;第5配管,於銳孔之下游延伸而連接於第2配管;控制閥,設於第4配管;第1壓力計,於控制閥與銳孔之間,用以測定第4配管之內部壓力;以及,第2壓力計,用以測定第5配管之內部壓力。 In one aspect, a method for inspecting a gas supply system (used to supply gas into a processing container of a substrate processing apparatus) is provided. The gas supply system includes plural first pipes, plural first valves, plural flow controllers, plural second pipes, plural second valves, third pipes, and third valves. The plural first pipes are respectively connected to plural gas sources. The plural first valves are respectively provided in the plural first pipes. The plurality of flow controllers are respectively provided downstream of the plurality of first pipes, and are respectively connected to the plurality of first pipes. The plurality of second pipes are respectively arranged downstream of the plurality of flow controllers, and are respectively connected to the plurality of flow controllers. The plural second valves are respectively provided in the plural second pipes. The third pipe is provided downstream of the plurality of second pipes, and is connected to the plurality of second pipes. The third valve is provided in the third pipe. The third pipe is connected to the processing container downstream of the aforementioned third valve. The plurality of flow controllers respectively have: an orifice; a fourth pipe, which extends upstream of the orifice and is connected to the first pipe; a fifth pipe, which extends downstream of the orifice and is connected to the second pipe; and a control valve, which is arranged at the first pipe. 4 piping; the first pressure gauge is used between the control valve and the orifice to measure the internal pressure of the fourth pipe; and the second pressure gauge is used to measure the internal pressure of the fifth pipe.

一態樣之方法包含下述製程:(i)對於經由複數流量控制器當中之第1流量控制器而供給於處理容器內的氣體流量進行控制,其中該氣體流量係於第1流量控制器對應於設定流量而受到控制(以下稱為「流量控制製程」); (ii)於流量控制製程之實行期間,開啟複數第2閥當中之一以上的第2閥,該一以上的第2閥係於該複數流量控制器當中未控制氣體流量之一以上的第2流量控制器之下游所設者;(iii)求出一以上的第1差分絕對值以及一以上的第2差分絕對值,其中該一以上的第1差分絕對值個別為在該第1流量控制器之輸出流量成為恆常狀態之恆常期間中藉由一以上的第2流量控制器個別之第1壓力計所測定出的第1恆常壓力值與第1基準恆常壓力值之間的差分絕對值,一以上的第2差分絕對值個別為在恆常期間中藉由一以上的第2流量控制器個別之第2壓力計所測定出的第2恆常壓力值與第2基準恆常壓力值之間的差分絕對值,第1基準恆常壓力值以及第2基準恆常壓力值分別在比實行期間更早前被決定,對應於該設定流量來控制著供給至處理容器內之氣體流量的第1流量控制器之輸出流量在成為該恆常狀態時係藉由一以上的第2流量控制器個別之第1壓力計以及該第2壓力計分別所測定出的測定壓力值;(iv)求出一以上的第1差分絕對值以及一以上的第2差分絕對值之平均值;(v)判定一以上的第1差分絕對值個別是否大於第1閾值、一以上的第2差分絕對值個別是否大於第2閾值、以及該平均值是否大於第3閾值。 One aspect of the method includes the following processes: (i) Controlling the flow of gas supplied into the processing vessel via a first flow controller among the plurality of flow controllers, wherein the gas flow corresponds to the first flow controller Controlled at the set flow rate (hereinafter referred to as "flow control process"); (ii) During the execution of the flow control process, open one or more of the second valves among the plurality of second valves. The one or more second valves are the second valves in the plurality of flow controllers that do not control more than one of the gas flow rates. Set downstream of the flow controller; (iii) Calculate more than one absolute value of the first difference and more than one absolute value of the second difference, where the one or more absolute values of the first difference are individually determined in the first flow control During the constant period in which the output flow of the device becomes a constant state, between the first constant pressure value measured by the first pressure gauge of one or more second flow controllers and the first reference constant pressure value The absolute value of the difference, one or more second absolute values of the difference are the second constant pressure value and the second reference constant measured by the second pressure gauge of the one or more second flow controllers during the constant period. The absolute value of the difference between the normal pressure values, the first reference constant pressure value and the second reference constant pressure value are respectively determined earlier than the execution period, and control the supply to the processing container in accordance with the set flow rate. When the output flow of the first flow controller of the gas flow becomes the constant state, the measured pressure values respectively measured by the first pressure gauge and the second pressure gauge of the one or more second flow controllers; (iv) Calculate the average value of one or more first difference absolute values and one or more second difference absolute values; (v) determine whether one or more first difference absolute values are individually greater than the first threshold and one or more second absolute values Whether the absolute value of the difference is individually larger than the second threshold value and whether the average value is larger than the third threshold value.

上述方法,於實行期間中以對應於設定流量之流量從第1流量控制器輸出的氣體除了供給於處理容器也供給於一以上的第2流量控制器之第4配管以及第5配管。從而,一以上的第1恆常壓力值以及一以上的第2恆常壓力值係反映恆常狀態中之第1流量控制器之輸出流量。此外,第1基準恆常壓力值為較實行期間更早之期間(以下稱為「基準期間」)對應於相同設定流量而輸出著氣體之第1流量控制器之輸出流量成為恆常狀態時所取得之第1恆常壓力值。此外,第2基準恆常壓力值為於基準期間對應於相同設定流量而輸出著氣體之第2流量控制器之輸出流量成為恆常狀態時所取得之第2恆常壓力值。從而,藉由判定一以上的第1差分絕對值個別是否大於第1閾值、一以上的第2差分絕對值個別是否大於第2閾值、以及平均值是否大於第3閾值,可判定實行期間中第1流量控制器之恆常狀態之輸出流量是否從基準期間中之第1流量控制器之恆常狀態之輸出流量產生變化。是以,依據本方法,氣體供給系統之檢查成為可能。此外,當一以上的第1差分絕對值個別大於第1閾值之情況、一以上的第2差分絕對值個別大於第2閾值之情況、或 是平均值大於第3閾值之情況,可藉由基板處理裝置之控制部來發出警報訊號,也可藉由基板處理裝置之控制部來停止由該基板處理裝置所實行著的程序。 In the above method, the gas output from the first flow controller at a flow rate corresponding to the set flow rate during the execution period is supplied to the fourth pipe and the fifth pipe of one or more second flow controllers in addition to being supplied to the processing container. Therefore, more than one first constant pressure value and more than one second constant pressure value reflect the output flow rate of the first flow controller in the constant state. In addition, the first reference constant pressure value is a period earlier than the execution period (hereinafter referred to as the "reference period") corresponding to the same set flow rate and the output flow rate of the first flow controller outputting gas becomes a constant state. The first constant pressure value obtained. In addition, the second reference constant pressure value is the second constant pressure value obtained when the output flow rate of the second flow controller outputting gas corresponding to the same set flow rate during the reference period becomes a constant state. Therefore, by determining whether one or more first absolute difference values are individually greater than the first threshold, whether one or more second absolute differences are individually greater than the second threshold, and whether the average value is greater than the third threshold, it is possible to determine whether the first absolute value of the execution period is greater than the first threshold. 1 Whether the output flow rate of the constant state of the flow controller changes from the output flow rate of the constant state of the first flow controller in the reference period. Therefore, according to this method, the inspection of the gas supply system becomes possible. In addition, when more than one absolute value of the first difference is individually greater than the first threshold, when more than one absolute value of the second difference is individually greater than the second threshold, or When the average value is greater than the third threshold, the control unit of the substrate processing device can issue an alarm signal, or the control unit of the substrate processing device can stop the program executed by the substrate processing device.

一實施形態中,一以上的第2流量控制器可為複數流量控制器當中於上述實行期間未控制氣體流量之複數第2流量控制器。此實施形態中,一以上的第1差分絕對值以及一以上的第2差分絕對值係藉由求出恆常期間中藉由複數第2流量控制器個別之第1壓力計所測定之第1恆常壓力值與第1基準恆常壓力值之間的差分絕對值以及恆常期間中藉由複數第2流量控制器個別之第2壓力計所測定之第2恆常壓力值與第2基準恆常壓力值之間的差分絕對值而得到之複數第1差分絕對值以及複數第2差分絕對值,上述平均值為複數第1差分絕對值以及前述複數第2差分絕對值之平均值,於進行判定之前述製程中,可判定複數第1差分絕對值個別是否大於第1閾值、複數第2差分絕對值個別是否大於第2閾值、以及平均值是否大於第3閾值。依據此實施形態,由於使用複數第2流量控制器之第1壓力計以及第2壓力計之測定壓力值,能以更高感度來檢測出實行期間中恆常狀態之第1流量控制器之輸出流量相對於基準期間中之恆常狀態之第1流量控制器之輸出流量是否出現變化。 In one embodiment, the one or more second flow controllers may be a plurality of second flow controllers that do not control the gas flow during the above-mentioned execution period among the plurality of flow controllers. In this embodiment, one or more first difference absolute values and one or more second difference absolute values are obtained by calculating the first pressure gauge measured by a plurality of second flow controllers in the constant period. The absolute value of the difference between the constant pressure value and the first reference constant pressure value, and the second constant pressure value and the second reference measured by the second pressure gauge of the multiple second flow controller during the constant period The complex first difference absolute value and the complex second difference absolute value are obtained from the absolute value of the difference between the constant pressure values. The above average value is the average value of the complex first difference absolute value and the aforementioned complex second difference absolute value. In the aforementioned process for making the determination, it can be determined whether the plural first absolute difference values are individually greater than the first threshold value, whether the plural second difference absolute values are individually greater than the second threshold value, and whether the average value is greater than the third threshold value. According to this embodiment, since the measured pressure values of the first pressure gauge and the second pressure gauge of the plurality of second flow controllers are used, the output of the first flow controller in the constant state during the execution period can be detected with higher sensitivity. Whether the flow rate changes relative to the output flow rate of the first flow controller in a constant state during the reference period.

一實施形態中,方法可進而包含下述製程:求出上述實行期間中、且較上述恆常期間為前之過渡期間中之複數時點之第1流量控制器之該第2壓力計之測定壓力值的積算值;以及,比較積算值與既定基準值。此既定基準值可為基準期間中之過渡期間中的第1流量控制器之第2壓力計之測定壓力值的積算值。此實施形態所使用之第1流量控制器之第2壓力計之測定壓力值係反映第1流量控制器之輸出流量。從而,上述積算值係反映實行期間中第1流量控制器之輸出流量之過渡特性。藉由比較相關積算值與既定基準值,可判定於實行期間中第1流量控制器之輸出流量之過渡特性是否變化為無法容許之程度。此外,當積算值與既定基準值之差的絕對值為既定值以上之情況,可判定實行期間中第1流量控制器之輸出流量之過渡特性變化為無法容許之程度。此外,當判定實行期間中第1流量控制器之輸出流量之過渡特性變化為無法容許之程度之情況,可藉由基板處理裝置之控制部來發 出警報訊號,也可藉由基板處理裝置之控制部來停止由該基板處理裝置所實行著之程序。 In one embodiment, the method may further include the following process: obtaining the measured pressure of the second pressure gauge of the first flow controller at a plurality of time points in the transition period before the above-mentioned constant period during the above-mentioned execution period The cumulative value of the value; and, the comparison of the cumulative value with the established reference value. The predetermined reference value may be the cumulative value of the measured pressure value of the second pressure gauge of the first flow controller during the transition period of the reference period. The measured pressure value of the second pressure gauge of the first flow controller used in this embodiment reflects the output flow rate of the first flow controller. Therefore, the above-mentioned integrated value reflects the transient characteristics of the output flow rate of the first flow controller during the execution period. By comparing the correlation integrated value with the predetermined reference value, it can be determined whether the transition characteristic of the output flow rate of the first flow controller has changed to an unacceptable degree during the execution period. In addition, when the absolute value of the difference between the integrated value and the predetermined reference value is greater than the predetermined value, it can be determined that the transient characteristic change of the output flow rate of the first flow controller during the execution period is not tolerable. In addition, when it is determined that the transition characteristic of the output flow rate of the first flow controller changes to an unacceptable level during the execution period, it can be sent by the control unit of the substrate processing apparatus. When an alarm signal is issued, the control unit of the substrate processing device can also stop the program executed by the substrate processing device.

一實施形態中,方法可進而包含下述製程:求出該實行期間中、且較該恆常期間為前之過渡期間中之複數時點之一以上的第2流量控制器之第1壓力計之測定壓力值的積算值之製程;以及比較積算值與既定基準值之製程。此既定基準值可為基準期間中之過渡期間中之複數時點的第2流量控制器之第1壓力計之測定值之積算值。此實施形態所使用之第2流量控制器之第1壓力計之測定壓力值也反映第1流量控制器之輸出流量。藉由比較相關積算值與既定基準值,可判定實行期間中第1流量控制器之輸出流量之過渡特性是否變化為無法容許之程度。此外,當積算值與既定基準值之差的絕對值為既定值以上之情況,可判定實行期間中第1流量控制器之輸出流量之過渡特性變化為無法容許之程度。此外,當判定實行期間中第1流量控制器之輸出流量之過渡特性變化為無法容許之程度的情況,可藉由基板處理裝置之控制部發出警報訊號、也可藉由基板處理裝置之控制部來停止由該基板處理裝置所實行著之程序。 In one embodiment, the method may further include the following process: calculating the first pressure gauge of the second flow controller during the execution period and at least one of the plural time points in the transition period before the constant period The process of measuring the accumulated value of the pressure value; and the process of comparing the accumulated value with the established reference value. This predetermined reference value may be the cumulative value of the measured values of the first pressure gauge of the second flow controller at multiple points in the transition period in the reference period. The measured pressure value of the first pressure gauge of the second flow controller used in this embodiment also reflects the output flow rate of the first flow controller. By comparing the relevant integrated value with the established reference value, it can be determined whether the transient characteristics of the output flow of the first flow controller during the execution period have changed to an unacceptable degree. In addition, when the absolute value of the difference between the integrated value and the predetermined reference value is greater than the predetermined value, it can be determined that the transient characteristic change of the output flow rate of the first flow controller during the execution period is not tolerable. In addition, when the transition characteristic of the output flow rate of the first flow controller changes to an unacceptable level during the execution period of the judgment, an alarm signal can be issued by the control section of the substrate processing apparatus, or the control section of the substrate processing apparatus To stop the program executed by the substrate processing device.

另一態樣係提供一種檢查氣體供給系統之方法,該氣體供給系統係對基板處理裝置之處理容器內供給氣體者。氣體供給系統具備有:複數第1配管、複數第1閥、複數流量控制器、複數第2配管、複數第2閥、第3配管、以及第3閥。複數第1配管分別連接於複數氣體源。複數第1閥分別設於複數第1配管。複數流量控制器分別設於複數第1配管之下游,而分別連接於該複數第1配管。複數第2配管分別設於複數流量控制器之下游,而分別連接於該複數流量控制器。複數第2閥分別設於複數第2配管。第3配管設於複數第2配管之下游,而連接於複數第2配管。第3閥設於第3配管。第3配管於該第3閥之下游係連接於處理容器。複數流量控制器分別具有:銳孔;第4配管,係延伸於銳孔之上游而連接於第1配管;第5配管,係延伸於銳孔之下游而連接於第2配管;控制閥,係設於第4配管;第1壓力計,係於控制閥與銳孔之間用以測定第4配管之內部壓力;以及,第2壓力計,係用以測定第5配管之內部壓力。氣體供給系統具備有用以測定該第3配管之內部壓力的第3壓力計。 Another aspect is to provide a method of inspecting a gas supply system that supplies gas into the processing container of the substrate processing apparatus. The gas supply system includes plural first pipes, plural first valves, plural flow controllers, plural second pipes, plural second valves, third pipes, and third valves. The plural first pipes are respectively connected to plural gas sources. The plural first valves are respectively provided in the plural first pipes. The plurality of flow controllers are respectively provided downstream of the plurality of first pipes, and are respectively connected to the plurality of first pipes. The plurality of second pipes are respectively arranged downstream of the plurality of flow controllers, and are respectively connected to the plurality of flow controllers. The plural second valves are respectively provided in the plural second pipes. The third pipe is provided downstream of the plurality of second pipes, and is connected to the plurality of second pipes. The third valve is provided in the third pipe. The third pipe is connected to the processing container downstream of the third valve. The plural flow controllers respectively have: an orifice; a fourth pipe, which extends upstream of the orifice and is connected to the first pipe; a fifth pipe, which extends downstream of the orifice and is connected to the second pipe; a control valve, which is connected to the second pipe Set in the fourth pipe; the first pressure gauge is used between the control valve and the orifice to measure the internal pressure of the fourth pipe; and the second pressure gauge is used to measure the internal pressure of the fifth pipe. The gas supply system is provided with a third pressure gauge for measuring the internal pressure of the third pipe.

上述其他態樣之方法包含下述製程:(i)對於經由複數流量控制器當中之第1流量控制器而供給於處理容器內的氣體流量進行控制之製程,其中該氣體流量係於第1流量控制器對應於設定流量而受到控制;(ii)求出差分絕對值之製程,該差分絕對值為第1流量控制器之輸出流量成為恆常狀態之恆常期間中由第3壓力計所測定出的恆常壓力值與基準恆常壓力值之間的差分絕對值,基準恆常壓力值係較控制氣體流量之該製程的實行期間更早前所決定,為對應於設定流量來控制著供給於處理容器內之氣體流量的第1流量控制器之輸出流量成為恆常狀態時由第3壓力計所測定出的測定壓力值;(iii)判定差分絕對值是否大於閾值之製程。 The above-mentioned other aspects of the method include the following processes: (i) A process of controlling the flow of gas supplied into the processing vessel via a first flow controller among a plurality of flow controllers, wherein the gas flow rate is the first flow rate The controller is controlled corresponding to the set flow rate; (ii) The process of obtaining the absolute value of the difference, the absolute value of which is measured by the third pressure gauge during the constant period when the output flow of the first flow controller becomes a constant state The absolute value of the difference between the output constant pressure value and the reference constant pressure value. The reference constant pressure value is determined earlier than the execution period of the process that controls the gas flow. It controls the supply corresponding to the set flow. The measured pressure value measured by the third pressure gauge when the output flow rate of the first flow controller of the gas flow rate in the processing vessel becomes a constant state; (iii) The process of determining whether the absolute value of the difference is greater than the threshold value.

上述其他態樣之方法中,於實行期間中以對應於設定流量的流量從第1流量控制器所輸出的氣體係流往第3配管。從而,恆常壓力值係反映恆常狀態中的第1流量控制器之輸出流量。此外,基準恆常壓力值為較實行期間更早之期間(亦即基準期間)中,當對應於相同設定流量而輸出著氣體之第1流量控制器之輸出流量成為恆常狀態時由第3壓力計所取得之恆常壓力值。從而,藉由判定恆常壓力值與基準恆常壓力值之差分絕對值是否大於閾值,可判定實行期間中第1流量控制器之恆常狀態之輸出流量是否從基準期間中之第1流量控制器之恆常狀態之輸出流量產生了變化。是以,依據本方法,氣體供給系統之檢查成為可能。此外,當差分絕對值大於閾值之情況,可藉由基板處理裝置之控制部來發出警報訊號,也可藉由基板處理裝置之控制部來停止由該基板處理裝置所實行著之程序。 In the method of the other aspect described above, the gas system output from the first flow controller flows to the third pipe at a flow rate corresponding to the set flow rate during the execution period. Therefore, the constant pressure value reflects the output flow rate of the first flow controller in the constant state. In addition, when the reference constant pressure value is earlier than the execution period (ie the reference period), when the output flow rate of the first flow controller outputting gas corresponding to the same set flow rate becomes a constant state, the third The constant pressure value obtained by the pressure gauge. Therefore, by determining whether the absolute value of the difference between the constant pressure value and the reference constant pressure value is greater than the threshold value, it can be determined whether the output flow rate of the constant state of the first flow controller during the execution period is controlled from the first flow rate in the reference period The output flow rate of the constant state of the device has changed. Therefore, according to this method, the inspection of the gas supply system becomes possible. In addition, when the absolute value of the difference is greater than the threshold, the control unit of the substrate processing apparatus can issue an alarm signal, and the control unit of the substrate processing apparatus can also stop the program executed by the substrate processing apparatus.

一實施形態中,方法可進而包含:求出實行期間中、且較恆常期間為前之過渡期間中之複數時點的第3壓力計之測定壓力值之積算值之製程;以及,比較積算值與既定基準值之製程。此實施形態所使用之既定基準值可為基準期間中之過渡期間中的第3壓力計之測定壓力值之積算值。此實施形態所使用之第3壓力計之測定壓力值係反映第1流量控制器之輸出流量。從而,上述積算值係反映實行期間中第1流量控制器之輸出流量之過渡特性。藉由比較相關積算值與既定基準值,可判定實行期間中第1流量控制器之輸出流量之過渡特性是否變化為無法容許之程度。此外,當積算值與既定基準值之差的絕對值為既定值以上之情況,可判定實行期間中第1流量控制器 之輸出流量之過渡特性變化為無法容許之程度。此外,當判定實行期間中第1流量控制器之輸出流量之過渡特性變化為無法容許之程度之情況,可藉由基板處理裝置之控制部來發出警報訊號,也可藉由基板處理裝置之控制部來停止由該基板處理裝置所實行著之程序。 In one embodiment, the method may further include: the process of obtaining the cumulative value of the measured pressure value of the third pressure gauge during the execution period and the plural time points in the transition period before the more constant period; and, comparing the cumulative value The manufacturing process with the established benchmark value. The predetermined reference value used in this embodiment may be the cumulative value of the measured pressure value of the third pressure gauge in the transition period of the reference period. The measured pressure value of the third pressure gauge used in this embodiment reflects the output flow rate of the first flow controller. Therefore, the above-mentioned integrated value reflects the transient characteristics of the output flow rate of the first flow controller during the execution period. By comparing the relevant integrated value with the established reference value, it can be determined whether the transient characteristics of the output flow of the first flow controller during the execution period have changed to an unacceptable degree. In addition, when the absolute value of the difference between the integrated value and the predetermined reference value is greater than the predetermined value, it can be determined that the first flow controller during the execution period The transition characteristics of the output flow rate change to an unacceptable degree. In addition, when the transition characteristic of the output flow rate of the first flow controller during the judgment execution period has changed to an unacceptable level, an alarm signal can be issued by the control unit of the substrate processing apparatus, or by the control of the substrate processing apparatus Part to stop the program executed by the substrate processing apparatus.

一實施形態中,複數流量控制器個別之控制閥進而具有驅動部,該驅動部包含:壓電元件,係以使得控制閥之開閉動作所用的閥體做移動的方式所構成;以及,控制電路,係以對該壓電元件施加電壓的方式所構成。此實施形態中,方法可進而包含下述製程:判定上述實行期間中對第1流量控制器之壓電元件的施加電壓是否和做為對第1流量控制器之控制閥全開時之壓電元件的施加電壓所預先設定之基準電壓相同、以及判定上述實行期間中之第1流量控制器之輸出流量是否小於設定流量。即便對壓電元件施加了使得控制閥全開之電壓,當第1流量控制器之輸出流量小於設定流量之情況,供給於第1流量控制器之氣體壓力仍會不足。例如,如此之情況,被認為是位於第1流量控制器之上游的第1閥發生動作不良。依據此實施形態,由於判定上述實行期間中對第1流量控制器之壓電元件的施加電壓是否和基準電壓相同、以及判定上述實行期間中之第1流量控制器之輸出流量是否小於設定流量,將可檢測第1流量控制器之上游側(一次側)之供給壓力不足。此外,當上述實行期間中對壓電元件所施加的電壓和上述基準電壓相同、且上述實行期間中之第1流量控制器之輸出流量小於設定流量之情況,可藉由基板處理裝置之控制部來發出警報訊號,也可藉由基板處理裝置之控制部來停止由該基板處理裝置所實行著之程序。 In one embodiment, the individual control valves of the plurality of flow controllers further have a drive unit including: a piezoelectric element, which is configured to move a valve body used for the opening and closing actions of the control valve; and, a control circuit , Is constructed by applying voltage to the piezoelectric element. In this embodiment, the method may further include the following process: determining whether the voltage applied to the piezoelectric element of the first flow controller during the above-mentioned execution period is the same as the piezoelectric element when the control valve of the first flow controller is fully opened The applied voltage is the same as the preset reference voltage, and it is determined whether the output flow rate of the first flow controller during the above-mentioned execution period is less than the set flow rate. Even if a voltage that makes the control valve fully open is applied to the piezoelectric element, when the output flow rate of the first flow controller is less than the set flow rate, the pressure of the gas supplied to the first flow controller will still be insufficient. For example, in this case, it is considered that the first valve located upstream of the first flow controller malfunctions. According to this embodiment, it is determined whether the voltage applied to the piezoelectric element of the first flow controller during the above-mentioned execution period is the same as the reference voltage, and it is determined whether the output flow rate of the first flow controller during the above-mentioned execution period is less than the set flow rate, It will be possible to detect insufficient supply pressure on the upstream side (primary side) of the first flow controller. In addition, when the voltage applied to the piezoelectric element during the execution period is the same as the reference voltage, and the output flow rate of the first flow controller in the execution period is less than the set flow rate, the control unit of the substrate processing apparatus can be used To issue an alarm signal, it is also possible to stop the program executed by the substrate processing device by the control part of the substrate processing device.

一實施形態中,方法可進而包含下述製程:判定上述實行期間中之第1流量控制器之第1壓力計之測定壓力值與該實行期間中之第1流量控制器之第2壓力計之測定壓力值之差是否為既定值以下。當第1流量控制器之下游之第2閥因故障而關閉著的情況,第1流量控制器之第1壓力計之測定壓力值與該第1流量控制器之第2壓力計之測定壓力值會成為大致相同。從而,依據此實施形態,將可檢測第1流量控制器之下游之第2閥之故障。此外,當上述差為既定值以下之情況,可藉由基板處理裝置之控制部來發出警報訊號,也可藉由基板處理裝置之控制部來停止由該基板處理裝置所實行著之 程序。 In one embodiment, the method may further include the following process: determining the difference between the measured pressure value of the first pressure gauge of the first flow controller during the execution period and the second pressure gauge of the first flow controller during the execution period Whether the difference between the measured pressure values is below the predetermined value. When the second valve downstream of the first flow controller is closed due to a failure, the measured pressure value of the first pressure gauge of the first flow controller and the measured pressure value of the second pressure gauge of the first flow controller Will become roughly the same. Therefore, according to this embodiment, the failure of the second valve downstream of the first flow controller can be detected. In addition, when the above difference is less than a predetermined value, the control unit of the substrate processing apparatus can issue an alarm signal, or the control unit of the substrate processing apparatus can stop the execution of the substrate processing apparatus. program.

一實施形態中,方法可進而包含下述製程:在複數流量控制器之內部氣體已排氣之狀態下,判定複數流量控制器個別之第1壓力計之測定壓力值是否大於第1既定值、以及判定複數流量控制器個別之第2壓力計之測定壓力值是否大於第2既定值。第1壓力計以及第2壓力計係以流量控制器之內部氣體已排氣之狀態下輸出「0」之測定值的方式被初期設定著。亦即,於第1壓力計以及第2壓力計係初期進行了零點之調整。依據此實施形態,在複數流量控制器之內部氣體已排氣之狀態下,當複數流量控制器個別之第1壓力計之測定壓力值大於第1既定值之情況,可檢測該流量控制器之第1壓力計之零點偏移。此外,在複數流量控制器之內部氣體已排氣之狀態下,當複數流量控制器個別之第2壓力計之測定壓力值大於第2既定值之情況,可檢測該流量控制器之第2壓力計之零點偏移。此外,當檢測出零點偏移之情況,可藉由基板處理裝置之控制部來發出警報訊號,也可藉由基板處理裝置之控制部來停止由該基板處理裝置所實行之程序。 In one embodiment, the method may further include the following process: in a state where the internal gas of the plurality of flow controllers is exhausted, determining whether the measured pressure value of the first pressure gauge of the plurality of flow controllers is greater than the first predetermined value, And to determine whether the measured pressure value of the individual second pressure gauge of the plural flow controller is greater than the second predetermined value. The first pressure gauge and the second pressure gauge are initially set to output a measured value of "0" when the internal gas of the flow controller is exhausted. That is, the zero point adjustment was performed at the initial stage of the first pressure gauge and the second pressure gauge. According to this embodiment, in the state where the internal gas of the plurality of flow controllers is exhausted, when the measured pressure value of the individual first pressure gauge of the plurality of flow controllers is greater than the first predetermined value, the flow controller can be detected The zero point offset of the first pressure gauge. In addition, when the internal gas of the plural flow controllers is exhausted, when the measured pressure value of the second pressure gauge of the plural flow controllers is greater than the second predetermined value, the second pressure of the flow controller can be detected Calculate the zero offset. In addition, when the zero point shift is detected, the control unit of the substrate processing apparatus can issue an alarm signal, and the control unit of the substrate processing apparatus can also stop the program executed by the substrate processing apparatus.

一實施形態中,方法可進而包含下述製程:在複數流量控制器之內部氣體已排氣之狀態下,判定既定時間內複數流量控制器個別之第1壓力計所測定出的複數測定壓力值之移動平均值與第2壓力計所測定出的複數測定壓力值之移動平均值的差分絕對值是否為既定值以上。當流量控制器無零點偏移之情況,在流量控制器之內部已排氣之狀態下,第1壓力計之測定壓力值之移動平均值與第2壓力計之測定壓力值之移動平均值之間幾乎不存在著差。從而,當此等二個移動平均值之間的差分絕對值為既定值以上之情況,將成為發生了零點偏移。是以,依據此實施形態,可進行零點之檢測。此外,當檢測出零點偏移之情況,可藉由基板處理裝置之控制部來發出警報訊號,也可藉由基板處理裝置之控制部來停止由該基板處理裝置所實行之程序。 In one embodiment, the method may further include the following process: in a state where the internal gas of the plurality of flow controllers is exhausted, determining the plurality of measured pressure values measured by the individual first pressure gauge of the plurality of flow controllers within a predetermined time Is the absolute value of the difference between the moving average value and the moving average value of the plural measured pressure values measured by the second pressure gauge more than a predetermined value. When the flow controller has no zero offset and the interior of the flow controller is exhausted, the moving average of the measured pressure value of the first pressure gauge and the moving average of the measured pressure value of the second pressure gauge There is almost no difference between. Therefore, when the absolute value of the difference between these two moving averages is greater than the predetermined value, a zero point shift will occur. Therefore, according to this embodiment, zero point detection can be performed. In addition, when the zero point shift is detected, the control unit of the substrate processing apparatus can issue an alarm signal, and the control unit of the substrate processing apparatus can also stop the program executed by the substrate processing apparatus.

一實施形態中,方法可進而包含下述製程:在複數第1閥以及複數第2閥呈現關閉之狀態下取得由複數流量控制器個別之第1壓力計所測定之第1測定壓力值以及由複數流量控制器個別之第2壓力計所測定之第2測定壓力值之製程;藉由將第1測定壓力值輸入於預定之函數,來取得和該第1測定 壓力值相對應之第2壓力計之初期壓力值之製程;以及比較第2測定壓力值與初期壓力值之製程。此函數之獲得方式,係於實行此實施形態之方法的各製程前,在複數第1閥以及複數第2閥呈現關閉之狀態下,一面將各流量控制器之內部壓力設定為各種壓力、一面測定出由複數流量控制器個別之第1壓力計所測定之第1測定壓力值以及由複數流量控制器個別之第2壓力計所測定之第2測定壓力值,而將第1測定壓力值與對應之第2測定壓力值之關係加以函數化。若各流量控制器之第1壓力計之狀態以及第2壓力計之狀態為正常,則將在該流量控制器之上游之第1閥與該流量控制器之下游之第2閥為關閉之狀態下所取得之該流量控制器之第1壓力計之測定壓力值(第1測定壓力值)輸入上述函數中所得之初期壓力值應該會和該流量控制器之第2壓力計之測定壓力值(第2測定壓力值)為大致相同值。從而,藉由比較上述初期壓力值與第2測定壓力值,可判定流量控制器之第1壓力計以及第2壓力計之某一測定壓力值是否相對於初期之測定壓力值出現了誤差。此外,也可例如當第2測定壓力值相對於初期壓力值有既定值以上差異的情況,判定流量控制器之第1壓力計以及第2壓力計之某一測定壓力值相對於初期之測定壓力值出現了誤差。此外,當判定流量控制器之第1壓力計以及第2壓力計之某一測定壓力值相對於初期之測定壓力值出現了誤差之情況,可藉由基板處理裝置之控制部來發出警報訊號,也可藉由基板處理裝置之控制部來停止由該基板處理裝置所實行之程序。 In one embodiment, the method may further include the following process: obtaining the first measurement pressure value measured by the individual first pressure gauge of the plurality of flow controllers in a state where the plurality of first valves and the plurality of second valves are closed, and The manufacturing process of the second measured pressure value measured by the second pressure gauge of the multiple flow controller; by inputting the first measured pressure value into a predetermined function, the first measurement is obtained The manufacturing process of the initial pressure value of the second pressure gauge corresponding to the pressure value; and the manufacturing process of comparing the second measured pressure value with the initial pressure value. The method of obtaining this function is to set the internal pressure of each flow controller to various pressures when the plural first valves and plural second valves are closed before each process of the method of this embodiment is implemented. Measure the first measured pressure value measured by the individual first pressure gauge of the plural flow controller and the second measured pressure value measured by the second pressure gauge of the individual plural flow controller, and compare the first measured pressure value with The relationship corresponding to the second measured pressure value is functionalized. If the state of the first pressure gauge and the state of the second pressure gauge of each flow controller are normal, the first valve upstream of the flow controller and the second valve downstream of the flow controller will be closed The measured pressure value of the first pressure gauge of the flow controller (the first measured pressure value) obtained under the input of the above function should be the same as the measured pressure value of the second pressure gauge of the flow controller ( The second measured pressure value) is approximately the same value. Therefore, by comparing the initial pressure value with the second measured pressure value, it can be determined whether one of the first pressure gauge and the second pressure gauge of the flow controller has an error with respect to the initial measured pressure value. In addition, for example, when the second measured pressure value is different from the initial pressure value by more than a predetermined value, it can be determined that one of the first pressure gauge and the second pressure gauge of the flow controller is relative to the initial measured pressure. There is an error in the value. In addition, when it is determined that the measured pressure value of the first pressure gauge and the second pressure gauge of the flow controller has an error with respect to the initial measured pressure value, an alarm signal can be issued by the control unit of the substrate processing device. It is also possible to stop the program executed by the substrate processing apparatus by the control part of the substrate processing apparatus.

一實施形態中,方法可進而包含下述製程:在複數第1閥以及複數第2閥呈現關閉之狀態下,判定既定時間內由複數流量控制器個別之第1壓力計所測定出的複數測定壓力值之移動平均值與由第2壓力計所測定出的複數測定壓力值之移動平均值的差分絕對值是否為既定值以上。當流量控制器之第1壓力計以及第2壓力計之雙方為正常之情況,該流量控制器之上游之第1閥與下游之第2閥為關閉之狀態下,第1壓力計之測定壓力值之移動平均值與第2壓力計之測定壓力值之移動平均值之間幾乎不存在著差。從而,當此等二個移動平均值之間之差分絕對值為既定值以上之情況,將成為流量控制器之第1壓力計或是第2壓力計輸出具有誤差之測定壓力值的狀態。是以,依據此實施形態,將可測定出流量控制器之第1壓力計或是第2壓力計 處於輸出具有誤差之測定壓力值的狀態。此外,當檢測出流量控制器之第1壓力計或是第2壓力計處於輸出具有誤差之測定壓力值的狀態之情況,可藉由基板處理裝置之控制部來發出警報訊號,也可藉由基板處理裝置之控制部來停止由該基板處理裝置所實行之程序。 In one embodiment, the method may further include the following process: in a state where the plural first valves and plural second valves are closed, the determination is made within a predetermined time by the plural measurement measured by the individual first pressure gauges of the plural flow controllers Is the absolute value of the difference between the moving average value of the pressure value and the moving average value of the plural measured pressure values measured by the second pressure gauge more than a predetermined value. When both the first pressure gauge and the second pressure gauge of the flow controller are normal, and the first valve upstream and the second valve downstream of the flow controller are closed, the measured pressure of the first pressure gauge There is almost no difference between the moving average value of the value and the moving average value of the measured pressure value of the second pressure gauge. Therefore, when the absolute value of the difference between these two moving averages is greater than the predetermined value, it will be a state where the first pressure gauge or the second pressure gauge of the flow controller outputs a measured pressure value with an error. Therefore, according to this embodiment, the first pressure gauge or the second pressure gauge of the flow controller can be measured It is in the state of outputting the measured pressure value with error. In addition, when it is detected that the first pressure gauge or the second pressure gauge of the flow controller is in the state of outputting the measured pressure value with error, an alarm signal can be issued by the control part of the substrate processing apparatus, or by The control part of the substrate processing apparatus stops the program executed by the substrate processing apparatus.

一實施形態中,方法可進而包含下述製程:在複數流量控制器個別之控制閥處於關閉之狀態下,判定是否經過了既定時間。有時控制閥無法完全遮斷氣體。若控制閥關閉著的狀態長期間持續,會對於之後開啟下游之第2閥來供給程序用氣體之情況的過渡特性造成影響。依據此實施形態,將可檢測如此之對過渡特性造成影響之控制閥之狀態。此外,在控制閥呈現關閉之狀態下經過了既定時間之情況,可藉由基板處理裝置之控制部來發出警報訊號,也可藉由基板處理裝置之控制部來停止由該基板處理裝置所實行之程序。 In one embodiment, the method may further include the following process: in a state where the individual control valves of the plurality of flow controllers are in a closed state, it is determined whether a predetermined time has passed. Sometimes the control valve cannot completely block the gas. If the closed state of the control valve continues for a long period of time, it will affect the transient characteristics of the case where the second downstream valve is opened to supply program gas. According to this embodiment, it is possible to detect the state of the control valve that affects the transient characteristics in this way. In addition, when a predetermined time has elapsed when the control valve is closed, the control unit of the substrate processing device can issue an alarm signal, or the control unit of the substrate processing device can stop the execution of the substrate processing device. The procedure.

一實施形態中,方法可進而包含下述製程:當對複數流量控制器個別之壓電元件的施加電壓和該流量控制器之該控制閥為關閉時做為對壓電元件的施加電壓所事先設定之基準電壓為相同之情況,判定複數流量控制器個別之第1壓力計之測定壓力值是否增加為既定值以上。即便對壓電元件之施加電壓成為用以關閉控制閥之設定,但被認為在第1壓力計之測定壓力值增加為既定值以上的情況,會於控制閥發生無法容許之漏洩。依據此實施形態,在對壓電元件之施加電壓成為用以關閉控制閥之設定的情況下,可判定複數流量控制器個別之第1壓力計之測定壓力值是否增加為既定值以上,而可檢測出無法容許之控制閥之漏洩。此外,當控制閥發生漏洩之情況,可藉由基板處理裝置之控制部來發出警報訊號,也可藉由基板處理裝置之控制部來停止由該基板處理裝置所實行之程序。 In one embodiment, the method may further include the following process: when the voltage applied to the individual piezoelectric elements of the plurality of flow controllers and the control valve of the flow controller are closed, the voltage applied to the piezoelectric elements is predetermined When the set reference voltage is the same, it is judged whether the measured pressure value of the individual first pressure gauge of the plural flow controllers has increased above the predetermined value. Even if the applied voltage to the piezoelectric element is set to close the control valve, it is considered that if the measured pressure value of the first pressure gauge increases above the predetermined value, an unacceptable leak will occur in the control valve. According to this embodiment, when the voltage applied to the piezoelectric element is set to close the control valve, it can be determined whether the measured pressure value of the first pressure gauge of the plurality of flow controllers has increased above the predetermined value. An unacceptable leakage of the control valve was detected. In addition, when the control valve leaks, an alarm signal can be issued by the control part of the substrate processing apparatus, and the control part of the substrate processing apparatus can also be used to stop the program executed by the substrate processing apparatus.

一實施形態中,方法可進而包含下述製程:當複數第2閥個別呈現關閉、對複數流量控制器個別之壓電元件的施加電壓和基準電壓為相同之情況,判定複數流量控制器個別之該第1壓力計之測定壓力值是否有減少。即便第2閥為關閉、對壓電元件之施加電壓成為用以關閉控制閥之設定,被認為在第1壓力計之測定壓力值有減少的情況,係於該控制閥之下游之第2閥發生了漏洩。依據此實施形態,在對壓電元件之施加電壓成為用以關閉控 制閥之設定的情況下,係判定第1壓力計之測定壓力值是否有減少,將可檢測有無第2閥之漏洩。此外,當第2閥發生漏洩之情況,可藉由基板處理裝置之控制部來發出警報訊號,也可藉由基板處理裝置之控制部來停止由該基板處理裝置所實行之程序。 In one embodiment, the method may further include the following process: when the plurality of second valves are individually closed, and the voltage applied to the piezoelectric elements of the plurality of flow controllers is the same as the reference voltage, it is determined that the plurality of flow controllers are individually closed. Whether the measured pressure value of the first pressure gauge has decreased. Even if the second valve is closed and the voltage applied to the piezoelectric element is set to close the control valve, it is considered that the measured pressure value of the first pressure gauge has decreased, and it is the second valve downstream of the control valve. A leak has occurred. According to this embodiment, the voltage applied to the piezoelectric element is used to turn off the control In the case of setting the control valve, it is determined whether the measured pressure value of the first pressure gauge has decreased, and the leakage of the second valve can be detected. In addition, when the second valve leaks, an alarm signal can be issued by the control part of the substrate processing apparatus, and the control part of the substrate processing apparatus can also be used to stop the program executed by the substrate processing apparatus.

如以上說明般,檢查氣體供給系統一事成為可能。尤其,在氣體經由第1流量控制器而供給於基板處理裝置之處理容器的期間,可判定第1流量控制器之恆常狀態之輸出流量是否從基準期間之第1流量控制器之恆常狀態之輸出流量出現了變化。 As explained above, it is possible to check the gas supply system. In particular, while the gas is supplied to the processing container of the substrate processing apparatus via the first flow controller, it can be determined whether the output flow rate of the first flow controller in the constant state is from the constant state of the first flow controller in the reference period The output flow rate has changed.

10‧‧‧基板處理裝置 10‧‧‧Substrate processing equipment

PC‧‧‧處理容器 PC‧‧‧Disposal container

12‧‧‧控制部 12‧‧‧Control Department

GP‧‧‧氣體供給系統 GP‧‧‧Gas Supply System

GS‧‧‧氣體源 GS‧‧‧Gas source

L1‧‧‧第1配管 L1‧‧‧The first piping

L2‧‧‧第2配管 L2‧‧‧Second piping

L3‧‧‧第3配管 L3‧‧‧3rd piping

V1‧‧‧第1閥 V1‧‧‧The first valve

V2‧‧‧第2閥 V2‧‧‧Second valve

V3‧‧‧第3閥 V3‧‧‧3rd valve

FC‧‧‧流量控制器 FC‧‧‧Flow Controller

OF‧‧‧銳孔 OF‧‧‧Sharp hole

L4‧‧‧第4配管 L4‧‧‧4th piping

L5‧‧‧第5配管 L5‧‧‧Fifth piping

P1‧‧‧第1壓力計 P1‧‧‧The first pressure gauge

P2‧‧‧第2壓力計 P2‧‧‧The second pressure gauge

20‧‧‧控制電路 20‧‧‧Control circuit

CV‧‧‧控制閥 CV‧‧‧Control valve

22‧‧‧驅動部 22‧‧‧Drive

24‧‧‧控制電路 24‧‧‧Control circuit

26‧‧‧壓電元件 26‧‧‧Piezoelectric element

30‧‧‧閥體 30‧‧‧Valve body

圖1係例示基板處理裝置之圖。 Fig. 1 is a diagram illustrating a substrate processing apparatus.

圖2係連同流量控制器顯示基板處理裝置之控制部之圖。 Fig. 2 is a diagram showing the control part of the substrate processing apparatus together with the flow controller.

圖3係例示控制閥之圖。 Fig. 3 is a diagram illustrating the control valve.

圖4係顯示實施形態之方法之一部分的檢查處理流程圖。 Fig. 4 is a flowchart showing a part of the inspection process of the method of the embodiment.

圖5係顯示製程ST3之一實施形態之流程圖。 Fig. 5 is a flowchart showing an embodiment of the process ST3.

圖6係顯示製程ST3之其他實施形態之流程圖。 Fig. 6 is a flowchart showing another embodiment of the process ST3.

圖7係顯示製程ST6之一實施形態之流程圖。 Fig. 7 is a flowchart showing an embodiment of the process ST6.

圖8係顯示製程ST4之一實施形態之流程圖。 Fig. 8 is a flowchart showing an embodiment of the process ST4.

圖9係顯示製程ST5之一實施形態之流程圖。 Fig. 9 is a flowchart showing an embodiment of the process ST5.

圖10係顯示製程ST5之其他實施形態之流程圖。 Fig. 10 is a flowchart showing another embodiment of the process ST5.

圖11係顯示實施形態之方法之一部分的檢查處理之流程圖。 Fig. 11 is a flowchart showing a part of the inspection process of the method of the embodiment.

圖12係顯示實施形態之方法之一部分的檢查處理之流程圖。 Fig. 12 is a flowchart showing a part of the inspection process of the method of the embodiment.

圖13係顯示實施形態之方法之一部分的檢查處理之流程圖。 Fig. 13 is a flowchart showing a part of the inspection process of the method of the embodiment.

圖14係顯示實施形態之方法之一部分的檢查處理之流程圖。 Fig. 14 is a flowchart showing a part of the inspection process of the method of the embodiment.

圖15係顯示實施形態之方法之一部分的檢查處理之流程圖。 Fig. 15 is a flowchart showing a part of the inspection process of the method of the embodiment.

圖16係顯示實施形態之方法之一部分的檢查處理之流程圖。 Fig. 16 is a flowchart showing a part of the inspection process of the method of the embodiment.

圖17係顯示實施形態之方法之一部分的檢查處理之流程圖。 Fig. 17 is a flowchart showing a part of the inspection process of the method of the embodiment.

圖18係顯示基板處理裝置之其他例之圖。 Fig. 18 is a diagram showing another example of the substrate processing apparatus.

圖19係顯示其他實施形態之方法之一部分的檢查處理之流程圖。 Fig. 19 is a flowchart showing a part of the inspection process of another embodiment of the method.

圖20係顯示製程ST300之流程圖。 Fig. 20 shows a flow chart of the process ST300.

圖21係顯示製程ST600之流程圖。 Figure 21 is a flow chart showing the process ST600.

以下,參見圖式針對各種實施形態來詳細說明。此外,各圖式中針對相同或是對應之部分係賦予相同符號。 Hereinafter, various embodiments will be described in detail with reference to the drawings. In addition, in each drawing, the same or corresponding parts are given the same symbols.

首先,針對可適用實施形態相關方法之具有氣體供給系統的基板處理裝置來說明。圖1係例示基板處理裝置之圖。圖1所示基板處理裝置10具備有處理容器PC以及氣體供給系統GP。處理容器PC提供內部空間。於處理容器PC之內部空間收容基板。處理容器PC經由壓力調整閥APC而連接著排氣裝置EA。氣體供給系統GP係以將基板處理用之氣體供給於處理容器PC內的方式所構成。基板處理裝置10可為例如用以對基板施以電漿蝕刻等電漿處理之裝置。基板處理裝置10當為電漿處理裝置之情況係進而具備電漿源。 First, a description will be given of a substrate processing apparatus having a gas supply system to which the method related to the embodiment can be applied. Fig. 1 is a diagram illustrating a substrate processing apparatus. The substrate processing apparatus 10 shown in FIG. 1 includes a processing container PC and a gas supply system GP. The processing container PC provides an internal space. The substrate is accommodated in the internal space of the processing container PC. The processing container PC is connected to an exhaust device EA via a pressure regulating valve APC. The gas supply system GP is configured to supply the gas for substrate processing in the processing container PC. The substrate processing apparatus 10 may be, for example, an apparatus for applying plasma processing such as plasma etching to a substrate. When the substrate processing apparatus 10 is a plasma processing apparatus, it further includes a plasma source.

氣體供給系統GP具備有:複數第1配管L1、複數第1閥V1、複數流量控制器FC、複數第2配管L2、複數第2閥V2、第3配管L3、以及第3閥V3。 The gas supply system GP includes a plurality of first pipes L1, a plurality of first valves V1, a plurality of flow controllers FC, a plurality of second pipes L2, a plurality of second valves V2, a third pipe L3, and a third valve V3.

複數第1配管L1之上游側端部分別連接於複數氣體源GS。複數氣體源GS係彼此不同氣體種類的氣體源。複數第1閥V1分別設於複數第1配管L1。複數第1配管L1之下游側端部分別連接於複數流量控制器FC。關於複數流量控制器FC個別構成將於後述。 The upstream ends of the plurality of first pipes L1 are respectively connected to the plurality of gas sources GS. The plural gas sources GS are gas sources of different gas types. The plural first valves V1 are respectively provided in the plural first pipes L1. The downstream ends of the plural first pipes L1 are respectively connected to the plural flow controllers FC. The individual configuration of the plural flow controller FC will be described later.

複數第2配管L2之上游側端部分別連接於複數流量控制器FC。複數流量控制器FC分別為壓力控制式流量控制器。複數第2閥V2分別設於複數第2配管L2。複數第2配管L2於第3配管L3合流。此第3配管L3設有第3閥V3。第3閥V3之下游處,第3配管L3係連接於處理容器PC。 The upstream ends of the plurality of second pipes L2 are respectively connected to the plurality of flow controllers FC. The plural flow controllers FC are pressure-controlled flow controllers. The plural second valves V2 are respectively provided in the plural second pipes L2. The plural second pipes L2 merge with the third pipe L3. This third pipe L3 is provided with a third valve V3. At the downstream of the third valve V3, the third pipe L3 is connected to the processing container PC.

氣體供給系統GP可進而具備:配管LP1、閥VP1、閥VP2、複數配管LP3、以及複數閥VP3。配管LP1之上游側端部連接於沖洗氣體源GPS。沖洗氣體為例如氮氣體。閥VP1係設於配管LP1。此外,閥VP2於閥VP1之下游係設於配管LP1。配管LP2於閥VP1與閥VP2之間係從配管LP1分歧。複數配管LP3之上游側端部係連接於配管LP2。複數配管LP3之下游側端部分別連接於複數第1配管L1。複數閥VP3分別設於複數配管LP3。 The gas supply system GP may further include: a pipe LP1, a valve VP1, a valve VP2, a plurality of pipes LP3, and a plurality of valves VP3. The upstream end of the pipe LP1 is connected to the flushing gas source GPS. The flushing gas is, for example, nitrogen gas. The valve VP1 is provided in the pipe LP1. In addition, the valve VP2 is provided in the pipe LP1 downstream of the valve VP1. The pipe LP2 is branched from the pipe LP1 between the valve VP1 and the valve VP2. The upstream end of the plural pipes LP3 is connected to the pipe LP2. The downstream ends of the plural pipes LP3 are respectively connected to the plural first pipes L1. The plural valves VP3 are respectively provided in the plural pipes LP3.

以下,連同圖1參見圖2。圖2係連同流量控制器來顯示基板處理裝置之控制部之圖。如圖1以及圖2所示般,基板處理裝置10更具備有控制部12。控制部12可為具備處理器12p以及記憶體等記憶裝置12m之電腦裝置。 Hereinafter, refer to FIG. 2 together with FIG. 1. Fig. 2 is a diagram showing the control part of the substrate processing apparatus together with the flow controller. As shown in FIGS. 1 and 2, the substrate processing apparatus 10 further includes a control unit 12. The control unit 12 may be a computer device equipped with a processor 12p and a memory device 12m such as a memory.

記憶裝置12m中記憶著實行後述實施形態之方法中各種檢查處理所用的程式、以及於基板處理裝置10所實行之基板處理用之程序配方。此外,記憶裝置12m係用以將後述實施形態之方法中從氣體供給系統GP所送來之各種數值加以記憶。 The memory device 12m stores programs used to execute various inspection processes in the method of the embodiment described later, and program recipes for substrate processing executed in the substrate processing apparatus 10. In addition, the memory device 12m is used to memorize various values sent from the gas supply system GP in the method of the embodiment described later.

處理器12p係依據記憶裝置12m所記憶之程式來動作,參見程序配方來控制基板處理裝置10之各部。此外,處理器12p係依據記憶裝置12m所記憶之程式來實行後述實施形態之方法中的各種檢查處理。 The processor 12p operates according to the program memorized by the memory device 12m, and controls each part of the substrate processing apparatus 10 by referring to the program recipe. In addition, the processor 12p executes various inspection processes in the method of the embodiment described later in accordance with the program memorized in the memory device 12m.

以下,參見圖2針對複數流量控制器FC之個別構成來說明。流量控制器FC具備有銳孔OF、控制閥CV、第1壓力計P1、第2壓力計P2、第4配管L4、第5配管L5、以及控制電路20。銳孔OF係於第4配管L4與第5配管L5之間提供銳孔。第4配管L4延伸於銳孔OF上游側,第5配管L5延伸於銳孔下游側。第4配管L4連接於對應之第1配管L1。控制閥CV設於第4配管L4之中途。亦即,第4配管L4包含有:相對於控制閥CV在上游側延伸之上游側部分L4a、以及相對於控制閥CV在下游側延伸之下游側部分L4b,控制閥CV設置於該上游側部分L4a與該下游側部分L4b之間。於銳孔OF之上游側且於控制閥CV之下游側設有第1壓力計P1。第1壓力計P1係以測定第4配管L4之內部壓力的方式所構成。於銳孔OF之下游側設有第2壓力計P2。第2壓力計P2係以測定第5配管L5之內部壓力的方式所構成。流量控制器FC可進而具備溫度測定器TS。溫度測定器TS係以測定通過銳孔OF之銳孔的氣體溫度的方式所構成。 Hereinafter, referring to FIG. 2, the individual configuration of the plural flow controller FC will be described. The flow controller FC includes an orifice OF, a control valve CV, a first pressure gauge P1, a second pressure gauge P2, a fourth pipe L4, a fifth pipe L5, and a control circuit 20. The orifice OF provides an orifice between the fourth pipe L4 and the fifth pipe L5. The fourth pipe L4 extends on the upstream side of the orifice OF, and the fifth pipe L5 extends on the downstream side of the orifice OF. The fourth pipe L4 is connected to the corresponding first pipe L1. The control valve CV is provided in the middle of the fourth pipe L4. That is, the fourth pipe L4 includes an upstream portion L4a extending on the upstream side with respect to the control valve CV, and a downstream portion L4b extending on the downstream side with respect to the control valve CV. The control valve CV is provided in the upstream portion Between L4a and the downstream portion L4b. A first pressure gauge P1 is provided on the upstream side of the orifice OF and on the downstream side of the control valve CV. The first pressure gauge P1 is configured to measure the internal pressure of the fourth pipe L4. A second pressure gauge P2 is provided on the downstream side of the orifice OF. The second pressure gauge P2 is configured to measure the internal pressure of the fifth pipe L5. The flow controller FC may further include a temperature measuring device TS. The temperature measuring device TS is configured to measure the temperature of the gas passing through the orifice OF.

控制電路20可從控制部12輸入由程序配方所特定之設定流量Fset。此外,控制電路20被輸入第1壓力計P1之測定壓力值Pm1以及第2壓力計P2之測定壓力值Pm2。再者,控制電路20被輸入由溫度測定器TS所測定之溫度Tm。 The control circuit 20 can input the set flow rate Fset specified by the program recipe from the control unit 12. In addition, the control circuit 20 is inputted with the measured pressure value Pm1 of the first pressure gauge P1 and the measured pressure value Pm2 of the second pressure gauge P2. Furthermore, the control circuit 20 receives the temperature Tm measured by the temperature measuring device TS.

控制電路20在滿足臨界條件時係以下述式(1)來求出流量控制器FC之輸出流量Fout。臨界條件例如在第1壓力計P1之測定壓力值Pm1為第2壓力計P2之測定壓力值Pm2之2倍以上之時獲得滿足。 When the control circuit 20 satisfies the critical condition, the output flow rate Fout of the flow controller FC is obtained by the following equation (1). The critical condition is satisfied, for example, when the measured pressure value Pm1 of the first pressure gauge P1 is more than twice the measured pressure value Pm2 of the second pressure gauge P2.

Fout=K×Pm1...(1) Fout=K×Pm1...(1)

此外,式(1)中,K為以K=SC/Tm1/2所定之值。此處,S為氣體通過之銳孔OF之銳孔截面積,C為比例係數。 In addition, in formula (1), K is a value determined by K=SC/Tm1/2. Here, S is the orifice cross-sectional area of the orifice OF through which the gas passes, and C is the proportionality factor.

此外,控制電路20在不滿足臨界條件之時、亦即滿足非臨界條件之時係藉由下述式(2)來求出流量控制器FC之輸出流量Fout。非臨界條件在第1壓力計P1之測定壓力值Pm1小於第2壓力計P2之測定壓力值Pm2之2倍時滿足。 In addition, when the control circuit 20 does not satisfy the critical condition, that is, when the non-critical condition is satisfied, the output flow rate Fout of the flow controller FC is obtained by the following formula (2). The non-critical condition is met when the measured pressure value Pm1 of the first pressure gauge P1 is less than twice the measured pressure value Pm2 of the second pressure gauge P2.

Fout=K×Pm2i×(Pm1-Pm2)j...(2) Fout=K×Pm2i×(Pm1-Pm2)j...(2)

此外,式(2)中i為0.40<i<0.50之常數,j為0.50<j<0.65之常數,雙方皆由實驗所定。 In addition, in formula (2), i is a constant of 0.40<i<0.50, and j is a constant of 0.50<j<0.65, both of which are determined by experiments.

控制電路20係將所算出之輸出流量Fout與設定流量Fset之差、亦即△F輸出至控制閥CV。此外,控制電路20基於後述實施形態相關方法之各種檢查處理中的利用,係將測定壓力值Pm1、輸出流量Fout、以及測定壓力值Pm2輸入至控制部12。 The control circuit 20 outputs the difference between the calculated output flow rate Fout and the set flow rate Fset, that is, ΔF to the control valve CV. In addition, the control circuit 20 inputs the measured pressure value Pm1, the output flow rate Fout, and the measured pressure value Pm2 to the control unit 12 based on the utilization in various inspection processes of the method related to the embodiment described later.

圖3係例示控制閥之圖。如圖3所示般,控制閥CV具有驅動部22。此驅動部22具有控制電路24。控制電路24係從控制電路20被輸入△F。 Fig. 3 is a diagram illustrating the control valve. As shown in FIG. 3, the control valve CV has a drive unit 22. The driving unit 22 has a control circuit 24. The control circuit 24 receives ΔF from the control circuit 20.

此外,驅動部22包含壓電元件26。壓電元件26於控制閥CV之開閉動作中係以使得後述閥體30移動的方式所構成。控制電路24係以△F成為0的方式來對施加於壓電元件26之電壓Vp進行控制。此外,控制電路24係將特定對於壓電元件之施加電壓Vp的訊號輸入控制部12。 In addition, the driving unit 22 includes a piezoelectric element 26. The piezoelectric element 26 is configured to move the valve body 30 described later during the opening and closing operation of the control valve CV. The control circuit 24 controls the voltage Vp applied to the piezoelectric element 26 so that ΔF becomes zero. In addition, the control circuit 24 inputs a signal specifying the applied voltage Vp to the piezoelectric element to the control unit 12.

控制閥CV更具有本體28、閥體30(隔膜)、圓形簧32、抵壓構件34、基座構件36、球體38、以及支撐構件40。本體28係提供流路28a、流路28b、以及閥室28c。流路28a係延伸於第4配管L4之上游側部分L4a與閥室28c之間。流路28b係延伸於閥室28c與第4配管L4之下游側部分L4b之間。此外,本體28進而提供閥座28d。 The control valve CV further has a body 28, a valve body 30 (diaphragm), a circular spring 32, a pressing member 34, a base member 36, a ball 38, and a supporting member 40. The body 28 provides a flow path 28a, a flow path 28b, and a valve chamber 28c. The flow path 28a extends between the upstream portion L4a of the fourth pipe L4 and the valve chamber 28c. The flow path 28b extends between the valve chamber 28c and the downstream portion L4b of the fourth pipe L4. In addition, the body 28 in turn provides a valve seat 28d.

閥體30係藉由圓形簧32而經由抵壓構件34來對閥座28d做蓄勢。在對於壓電元件26之施加電壓為零之情況,閥體30係抵接於閥座28d,控制閥CV成為關閉狀態。 The valve body 30 uses the circular spring 32 to accumulate the valve seat 28 d via the pressing member 34. When the voltage applied to the piezoelectric element 26 is zero, the valve body 30 is in contact with the valve seat 28d, and the control valve CV is in the closed state.

壓電元件26之一端(圖中為下端)係被基座構件36所支撐著。壓電元件26 連結於支撐構件40。支撐構件40於一端(圖中為下端)係和抵壓構件34結合著。若對此壓電元件26施加電壓,則該壓電元件26會伸張。若壓電元件26伸張,則支撐構件40會朝離開閥座28d之方向移動,伴隨於此,抵壓構件34也朝離開閥座28d之方向移動。藉此,閥體30從閥座28d分離,控制閥CV成為開啟狀態。控制閥CV之開度、亦即閥體30與閥座28d之間的距離係被施加於壓電元件26之電壓所控制。 One end (the lower end in the figure) of the piezoelectric element 26 is supported by the base member 36. Piezo Elements 26 It is connected to the support member 40. The supporting member 40 is connected to the pressing member 34 at one end (the lower end in the figure). If a voltage is applied to the piezoelectric element 26, the piezoelectric element 26 will expand. When the piezoelectric element 26 expands, the support member 40 moves in a direction away from the valve seat 28d, and with this, the pressing member 34 also moves in a direction away from the valve seat 28d. Thereby, the valve body 30 is separated from the valve seat 28d, and the control valve CV becomes an open state. The opening degree of the control valve CV, that is, the distance between the valve body 30 and the valve seat 28d, is controlled by the voltage applied to the piezoelectric element 26.

以下,針對實施形態之檢查氣體供給系統之方法來說明。實施形態之方法包含:在對基板處理裝置10之處理容器PC供給氣體之實行期間、亦即實行著程序之期間之用以檢查氣體供給系統GP之數個檢查處理;以及實行期間以外之期間、亦即未進行程序之期間中用以檢查氣體供給系統GP之數個檢查處理。以下,依序說明此等複數檢查處理。 Hereinafter, the method of inspecting the gas supply system of the embodiment will be described. The method of the embodiment includes several inspection processes for inspecting the gas supply system GP during the execution period of supplying gas to the processing container PC of the substrate processing apparatus 10, that is, the period during which the program is executed; and during periods other than the execution period, That is, several inspection processes for inspecting the gas supply system GP during the period when the program is not performed. Hereinafter, these plural inspection processes will be described in order.

圖4係實施形態之方法之一部分的檢查處理之流程圖。圖4中,於二個雙重線之間所示製程係並列進行之製程。圖4所示檢查處理係於基板處理裝置實行程序,在經由複數流量控制器當中一以上之第1流量控制器的氣體供給於處理容器內之期間所實行之檢查處理(以下稱為「即時檢查處理RP」)。亦即,圖4所示處理係於一以上之第1流量控制器控制著氣體流量之實行期間所進行之檢查處理。以下,舉出基板處理裝置依照一個程序配方來實行程序,第1流量控制器為流量控制器FC(1),而未進行流量控制、亦即未對處理容器PC供給氣體之第2流量控制器為流量控制器FC(2)以及流量控制器FC(3)之情況為例,針對即時檢查處理RP來說明。此外,基板處理裝置所實行之程序若為不同程序,則複數流量控制器FC當中做為第1流量控制器使用之一以上的流量控制器以及做為第2流量控制器使用之一以上的流量控制器係成為和上述之例不同。此外,第1流量控制器之個數以及第2流量控制器之個數並無限定。 Fig. 4 is a flowchart of a part of the inspection process of the method of the embodiment. In FIG. 4, the process shown between the two double lines is a process performed in parallel. The inspection process shown in FIG. 4 is a program executed in the substrate processing apparatus. The inspection process is performed during the period when the gas from one or more first flow controllers among the plurality of flow controllers is supplied into the processing container (hereinafter referred to as "real-time inspection"). Processing RP"). That is, the processing shown in FIG. 4 is an inspection processing performed during the execution period when more than one first flow controller controls the gas flow. In the following, the substrate processing apparatus executes the program according to a program recipe. The first flow controller is the flow controller FC(1), and the flow control is not performed, that is, the second flow controller that does not supply gas to the processing container PC. Take the case of the flow controller FC(2) and the flow controller FC(3) as an example, and describe the instant inspection process RP. In addition, if the programs executed by the substrate processing apparatus are different programs, one or more flow controllers used as the first flow controller among the plurality of flow controllers FC and one or more flow controllers used as the second flow controller The controller is different from the above example. In addition, the number of first flow controllers and the number of second flow controllers are not limited.

如圖4所示般,即時檢查處理RP首先實行製程ST1,於該製程ST1中開始基於流量控制器FC(1)來進行氣體流量控制。流量經流量控制器FC(1)所調整過之氣體係供給於處理容器PC。於製程ST1,複數第1閥V1當中位於流量控制器FC(1)之上游的第1閥V1(1)開啟,複數第2閥V2當中位於流量控制器FC(1)之下游的第2閥V2(2)開啟,第3閥V3開啟。此外,閥VP1、閥VP2、複 數閥VP3關閉。此外,製程ST1中閥之開閉可藉由來自控制部12之訊號而被控制。再者,製程ST1中,由程序配方所指定之設定流量Fset係從控制部12輸入至流量控制器FC(1),流量控制器FC(1)如上述般以減少輸出流量Fout與設定流量Fset之差的方式來調整控制閥CV之開度。 As shown in FIG. 4, the immediate inspection process RP first executes the process ST1, in which process ST1 starts to perform gas flow control based on the flow controller FC(1). The flow rate is supplied to the processing vessel PC by the gas system adjusted by the flow controller FC(1). In process ST1, the first valve V1(1) of the plurality of first valves V1 located upstream of the flow controller FC(1) is opened, and the second valve of the plurality of second valves V2 located downstream of the flow controller FC(1) V2(2) is opened, and the third valve V3 is opened. In addition, valve VP1, valve VP2, and valve The counting valve VP3 is closed. In addition, the opening and closing of the valve in the process ST1 can be controlled by a signal from the control unit 12. Furthermore, in the process ST1, the set flow rate Fset specified by the program recipe is input from the control unit 12 to the flow controller FC(1), and the flow controller FC(1) reduces the output flow rate Fout and the set flow rate Fset as described above. Adjust the opening of the control valve CV by using the difference.

製程ST2係和製程ST1大致同時開始。於製程ST2,流量控制器FC(2)之下游之第2閥V2(2)以及流量控制器FC(3)之下游之第2閥V2(3)開啟。製程ST2中閥之開閉可藉由來自控制部12之訊號所控制。此外,流量控制器FC(2)以及流量控制器FC(3)之個別控制閥CV可為開啟也可為關閉。 The process ST2 and the process ST1 start roughly at the same time. In process ST2, the second valve V2(2) downstream of the flow controller FC(2) and the second valve V2(3) downstream of the flow controller FC(3) are opened. The opening and closing of the valve in the process ST2 can be controlled by a signal from the control unit 12. In addition, the individual control valves CV of the flow controller FC(2) and the flow controller FC(3) can be open or closed.

於即時檢查處理RP,在製程ST2之實行為大致同時之時點以後且實行以下之製程ST3~ST6之間、亦即實行期間中的流量控制器FC(1)之輸出流量Fout係從該流量控制器FC(1)之控制電路20送往控制部12。此外,於實行期間中之複數時點藉由流量控制器FC(1)之第1壓力計P1所測定出的測定壓力值Pm1以及藉由流量控制器FC(1)之第2壓力計P2所測定出的測定壓力值Pm2係從流量控制器FC(1)之控制電路20送往控制部12,於該複數時點由流量控制器FC(2)之第1壓力計P1所測定出的測定壓力值Pm1以及由流量控制器FC(2)之第2壓力計P2所測定出的測定壓力值Pm2係從流量控制器FC(2)之控制電路20送往控制部12,於該複數時點由流量控制器FC(3)之第1壓力計P1所測定出的測定壓力值Pm1以及由流量控制器FC(3)之第2壓力計P2所測定出的測定壓力值Pm2係從流量控制器FC(3)之控制電路20送往控制部12。此等測定壓力值係藉由控制部12之記憶裝置12m所記憶。此外,實行期間中特定對於流量控制器FC(1)之控制閥CV之壓電元件26的施加電壓Vp的訊號係從該流量控制器FC(1)之控制閥CV之制御電路24送往控制部12。 In the real-time inspection process RP, the output flow rate Fout of the flow controller FC(1) during the execution period after the execution of the process ST2 is approximately the same time and the execution of the following processes ST3~ST6 is controlled from the flow rate The control circuit 20 of the FC(1) is sent to the control unit 12. In addition, the measured pressure value Pm1 measured by the first pressure gauge P1 of the flow controller FC(1) and the second pressure gauge P2 of the flow controller FC(1) at multiple points in the execution period The measured pressure value Pm2 is sent from the control circuit 20 of the flow controller FC(1) to the control unit 12, and the measured pressure value measured by the first pressure gauge P1 of the flow controller FC(2) at this plural time Pm1 and the measured pressure value Pm2 measured by the second pressure gauge P2 of the flow controller FC(2) are sent from the control circuit 20 of the flow controller FC(2) to the control unit 12, and the flow is controlled by the flow at the plural time. The measured pressure value Pm1 measured by the first pressure gauge P1 of the FC(3) and the measured pressure value Pm2 measured by the second pressure gauge P2 of the flow controller FC(3) are obtained from the flow controller FC(3) ) The control circuit 20 is sent to the control unit 12. These measured pressure values are memorized by the memory device 12m of the control unit 12. In addition, the signal specifying the applied voltage Vp to the piezoelectric element 26 of the control valve CV of the flow controller FC(1) during the execution period is sent from the control circuit 24 of the control valve CV of the flow controller FC(1) to the control Department 12.

製程ST2之實行後,即時檢查處理RP係並列實行製程ST3、製程ST4、以及製程ST5。此外,製程ST6為製程ST3之實行後所實行之製程,該製程ST6也和製程ST4以及製程ST5為並列實行。 After the execution of the process ST2, the immediate inspection process RP executes the process ST3, the process ST4, and the process ST5 in parallel. In addition, the process ST6 is the process performed after the process ST3 is executed, and the process ST6 is also executed in parallel with the process ST4 and the process ST5.

製程ST3係進行從流量控制器FC(1)所輸出之氣體之輸出流量的過渡特性之檢查。圖5係製程ST3之一實施形態之流程圖。圖5所示一實施形態之製程ST3包含製程ST31以及製程ST32。製程ST31以及製程ST32之運算係藉由控制部12來實行。 The process ST3 is to check the transition characteristics of the output flow of the gas output from the flow controller FC(1). Fig. 5 is a flowchart of an embodiment of the process ST3. The process ST3 of an embodiment shown in FIG. 5 includes a process ST31 and a process ST32. The calculations of the process ST31 and the process ST32 are performed by the control unit 12.

製程ST31中,係於實行期間中之過渡期間中複數時點算出由流量控制器FC(1)之第2壓力計P2所測定出的複數測定壓力值Pm2之積算值AC1。過渡期間係恆常期間前的實行期間中之期間。恆常期間係流量控制器FC(1)之輸出流量成為恆常狀態之期間,例如,當既定時間內之流量控制器FC(1)之輸出流量之最大值與最小值之差為既定值以下之情況,可判斷流量控制器FC(1)之輸出流量成為恆常狀態。 In the process ST31, the cumulative value AC1 of the plural measured pressure values Pm2 measured by the second pressure gauge P2 of the flow controller FC(1) is calculated at the plural points in the transition period during the execution period. The transition period is the period in the implementation period before the constant period. The constant period is the period during which the output flow of the flow controller FC(1) becomes a constant state, for example, when the difference between the maximum value and the minimum value of the output flow of the flow controller FC(1) within a predetermined time is less than the predetermined value In this case, it can be judged that the output flow of the flow controller FC(1) has become a constant state.

後續製程ST32中,積算值AC1係和既定基準值Ref1做比較。既定基準值Ref1係基準期間中之過渡期間中的複數時點之流量控制器FC(1)之第2壓力計P2之測定壓力值Pm2之積算值。基準期間為實行期間更以前之期間,為依照和實行期間所利用之程序配方為相同程序配方的程序在基板處理裝置實行過之期間,為流量控制器FC(1)對應於該程序配方所指定之設定流量來控制了輸出流量之期間。例如,基準期間可為依照上述程序配方之程序在基板處理裝置最初實行過的期間。 In the subsequent process ST32, the integrated value AC1 is compared with the established reference value Ref1. The predetermined reference value Ref1 is the cumulative value of the measured pressure value Pm2 of the second pressure gauge P2 of the flow controller FC(1) at a plurality of points in the transition period in the reference period. The reference period is the period before the execution period. It is the period during which the program that is the same as the program recipe used in the execution period has been executed in the substrate processing device, and is designated by the flow controller FC(1) corresponding to the program recipe. The setting flow rate controls the period of output flow rate. For example, the reference period may be the period during which the program according to the above-mentioned program recipe was first executed in the substrate processing apparatus.

流量控制器FC(1)之第2壓力計P2之測定壓力值Pm2係反映流量控制器FC(1)之輸出流量。從而,積算值AC1係反映實行期間中之過渡期間的流量控制器FC(1)之輸出流量之過渡特性。將相關積算值AC1與既定基準值Ref1進行比較,可判定實行期間中之流量控制器FC(1)之輸出流量之過渡特性是否從基準期間中之流量控制器FC(1)之輸出流量之過渡特性變化為無法容許之程度。 The measured pressure value Pm2 of the second pressure gauge P2 of the flow controller FC(1) reflects the output flow of the flow controller FC(1). Therefore, the integrated value AC1 reflects the transient characteristics of the output flow rate of the flow controller FC(1) during the transition period in the execution period. Comparing the relevant integrated value AC1 with the established reference value Ref1, it can be determined whether the transition characteristic of the output flow of the flow controller FC(1) in the execution period is a transition from the output flow of the flow controller FC(1) in the reference period The characteristics change to an unacceptable degree.

製程ST32之比較中,例如,當積算值AC1與既定基準值Ref1之差的絕對值為既定值Tha以上之情況,可判定實行期間中之流量控制器FC(1)之輸出流量之過渡特性從基準期間中之流量控制器FC(1)之輸出流量之過渡特性變化為無法容許之程度。當判定實行期間中之流量控制器FC(1)之輸出流量之過渡特性從基準期間中之流量控制器FC(1)之輸出流量之過渡特性變化為無法容許之程度的情況,於製程ST7係藉由控制部12來輸出警報訊號。此外,後續製程ST8中,所實行之程序藉由控制部12來停止。另一方面,於製程ST32,當判定實行期間中之流量控制器FC(1)之輸出流量之過渡特性僅從基準期間中之流量控制器FC(1)之輸出流量之過渡特性變化為能容許之程度、或是實行期間中之流量控制器FC(1)之輸出流量之過渡特性和基準期間 中之流量控制器FC(1)之輸出流量之過渡特性為相同之情況,則實行後續製程ST6。 In the comparison of process ST32, for example, when the absolute value of the difference between the integrated value AC1 and the predetermined reference value Ref1 is greater than the predetermined value Tha, it can be determined that the transition characteristic of the output flow of the flow controller FC(1) during the execution period is changed from The transition characteristic of the output flow of the flow controller FC(1) in the reference period changes to an unacceptable degree. When the transition characteristic of the output flow of the flow controller FC(1) in the judgment execution period changes from the transition characteristic of the output flow of the flow controller FC(1) in the reference period to an unacceptable degree, in the process ST7 system The control unit 12 outputs an alarm signal. In addition, in the subsequent process ST8, the executed program is stopped by the control unit 12. On the other hand, in process ST32, when it is determined that the transition characteristic of the output flow of the flow controller FC(1) in the execution period only changes from the transition characteristic of the output flow of the flow controller FC(1) in the reference period to allowable Or the transition characteristics and reference period of the output flow of the flow controller FC(1) during the execution period If the transition characteristics of the output flow of the flow controller FC(1) are the same, the follow-up process ST6 is implemented.

此外,於實行圖5所示製程ST3之期間中,流量控制器FC(2)之下游之第2閥V2以及流量控制器FC(3)之下游之第2閥V2可為關閉也可為開啟。後者之情況、亦即當流量控制器FC(2)之下游之第2閥V2以及流量控制器FC(3)之下游之第2閥V2為開啟之情況,可確保更長期間之過渡期間,可更高精度判定實行期間中之流量控制器FC(1)之輸出流量之過渡特性相對於基準期間中之流量控制器FC(1)之輸出流量之過渡特性是否有變化。 In addition, during the process ST3 shown in FIG. 5, the second valve V2 downstream of the flow controller FC(2) and the second valve V2 downstream of the flow controller FC(3) can be closed or open. . In the latter case, that is, when the second valve V2 downstream of the flow controller FC(2) and the second valve V2 downstream of the flow controller FC(3) are open, a longer transition period can be ensured. It can be judged with higher accuracy whether the transition characteristic of the output flow of the flow controller FC(1) in the execution period has changed relative to the transition characteristic of the output flow of the flow controller FC(1) in the reference period.

圖6係製程ST3之其他實施形態之流程圖。在實行圖6所示實施形態之製程ST3的期間,流量控制器FC(2)之下游之第2閥V2以及流量控制器FC(3)之下游之第2閥V2處於開啟狀態。圖6所示實施形態之製程ST3包含製程ST35以及製程ST36。製程ST35以及製程ST36中的運算係藉由控制部12來實行。於製程ST35,算出於實行期間中之過渡期間中之複數時點由流量控制器FC(2)之第1壓力計P1所測定出的複數測定壓力值Pm1、以及於該複數時點由流量控制器FC(3)之第1壓力計P1所測定出的複數測定壓力值Pm1之積算值AC2。 Fig. 6 is a flowchart of another embodiment of the process ST3. During the process ST3 of the embodiment shown in FIG. 6, the second valve V2 downstream of the flow controller FC(2) and the second valve V2 downstream of the flow controller FC(3) are in an open state. The process ST3 of the embodiment shown in FIG. 6 includes a process ST35 and a process ST36. The calculations in the process ST35 and the process ST36 are executed by the control unit 12. In process ST35, the plural measured pressure values Pm1 measured by the first pressure gauge P1 of the flow controller FC(2) at the plural time points in the transition period during the execution period are calculated, and the plural time points are calculated by the flow controller FC (3) The accumulated value AC2 of the plural measured pressure values Pm1 measured by the first pressure gauge P1.

後續製程ST36,積算值AC2係和既定基準值Ref2做比較。既定基準值Ref2係於基準期間中之過渡期間中之複數時點由流量控制器FC(2)之第1壓力計P1所測定出的測定壓力值Pm1、以及於該複數時點由流量控制器FC(3)之第1壓力計P1所測定出的測定壓力值Pm1之積算值。 In the subsequent process ST36, the accumulated value AC2 is compared with the established reference value Ref2. The predetermined reference value Ref2 is the measured pressure value Pm1 measured by the first pressure gauge P1 of the flow controller FC(2) at the plural time points in the transition period of the reference period, and at the plural time points by the flow controller FC( 3) The cumulative value of the measured pressure value Pm1 measured by the first pressure gauge P1.

實行期間中,從流量控制器FC(1)輸出的氣體也被供給於流量控制器FC(2)之第4配管L4以及第5配管L5、以及流量控制器FC(3)之第4配管L4以及第5配管L5。從而,流量控制器FC(2)之第1壓力計P1之測定壓力值Pm1以及流量控制器FC(3)之第1壓力計P1之測定壓力值Pm1係反映流量控制器FC(1)之輸出流量。是以,積算值AC2係反映著流量控制器FC(1)之輸出流量之過渡特性。藉由將相關積算值AC2與既定基準值Ref2做比較,可判定實行期間中之流量控制器FC(1)之輸出流量之過渡特性是否從基準期間中之流量控制器FC(1)之輸出流量之過渡特性變化為無法容許之程度。 During the execution period, the gas output from the flow controller FC(1) is also supplied to the fourth pipe L4 and the fifth pipe L5 of the flow controller FC(2), and the fourth pipe L4 of the flow controller FC(3) And the fifth pipe L5. Therefore, the measured pressure value Pm1 of the first pressure gauge P1 of the flow controller FC(2) and the measured pressure value Pm1 of the first pressure gauge P1 of the flow controller FC(3) reflect the output of the flow controller FC(1) flow. Therefore, the integrated value AC2 reflects the transient characteristics of the output flow of the flow controller FC(1). By comparing the relevant integrated value AC2 with the established reference value Ref2, it can be determined whether the transition characteristic of the output flow of the flow controller FC(1) in the execution period is from the output flow of the flow controller FC(1) in the reference period The transitional characteristics change to an unacceptable degree.

製程ST36中的比較,例如當積算值AC2與既定基準值Ref2之差的絕對 值為既定值Thb以上之情況,可判定實行期間中之流量控制器FC(1)之輸出流量之過渡特性係從基準期間中之流量控制器FC(1)之輸出流量之過渡特性變化為無法容許之程度。當判定實行期間中之流量控制器FC(1)之輸出流量之過渡特性從基準期間中之流量控制器FC(1)之輸出流量之過渡特性變化為無法容許之程度之情況,於製程ST7中係藉由控制部12來輸出警報訊號。此外,後續製程ST8中,所實行之程序係被控制部12所停止。另一方面,製程ST36中,當判定實行期間中之流量控制器FC(1)之輸出流量之過渡特性僅從基準期間中之流量控制器FC(1)之輸出流量之過渡特性變化為能容許之程度、或是實行期間中之流量控制器FC(1)之輸出流量之過渡特性和基準期間中之流量控制器FC(1)之輸出流量之過渡特性為相同之情況,則實行後續製程ST6。 The comparison in process ST36, for example, when the absolute difference between the accumulated value AC2 and the established reference value Ref2 When the value is above the predetermined value Thb, it can be determined that the transition characteristic of the output flow of the flow controller FC(1) in the execution period is changed from the transition characteristic of the output flow of the flow controller FC(1) in the reference period to impossible The degree of tolerance. When the transition characteristic of the output flow of the flow controller FC(1) in the judgment execution period changes from the transition characteristic of the output flow of the flow controller FC(1) in the reference period to an unacceptable degree, in process ST7 The control unit 12 outputs an alarm signal. In addition, in the subsequent process ST8, the executed program is stopped by the control unit 12. On the other hand, in the process ST36, when the transition characteristic of the output flow of the flow controller FC(1) in the judgment execution period only changes from the transition characteristic of the output flow of the flow controller FC(1) in the reference period to allowable If the transition characteristic of the output flow of the flow controller FC(1) during the execution period and the transition characteristic of the output flow of the flow controller FC(1) in the reference period are the same, the subsequent process ST6 .

此外,積算值AC2之算出也可使用流量控制器FC(2)以及流量控制器FC(3)當中一者的第1壓力計P1之複數測定壓力值Pm1。於此情況,既定基準值Ref2於基準期間中之過渡期間係使用由流量控制器FC(2)以及流量控制器FC(3)當中一者的第1壓力計P1所測定之複數測定壓力值Pm1來求得。此外,從流量控制器FC(2)之第1壓力計P1之複數測定壓力值Pm1所求得之積算值以及從流量控制器FC(3)之第1壓力計P1之複數測定壓力值Pm1所求得之積算值也可和分別對應之既定基準值做個別比較。 In addition, the calculation of the integrated value AC2 may also use the plural measured pressure value Pm1 of the first pressure gauge P1 of one of the flow controller FC(2) and the flow controller FC(3). In this case, the predetermined reference value Ref2 in the transition period of the reference period uses the plural measured pressure value Pm1 measured by the first pressure gauge P1 of one of the flow controller FC(2) and the flow controller FC(3) Come get it. In addition, the integrated value obtained from the plural measured pressure value Pm1 of the first pressure gauge P1 of the flow controller FC(2) and the plural measured pressure value Pm1 of the first pressure gauge P1 of the flow controller FC(3) The calculated integrated value can also be compared with the corresponding established reference value individually.

圖7係製程ST6之一實施形態之流程圖。於實行圖7所示製程ST6之期間中,流量控制器FC(2)之下游之第2閥V2以及流量控制器FC(3)之下游之第2閥V2呈開啟狀態。製程ST6包含製程ST61~製程ST63。此等製程ST61~ST63之運算可藉由控制部12來實行。 Fig. 7 is a flowchart of an embodiment of the process ST6. During the process ST6 shown in FIG. 7, the second valve V2 downstream of the flow controller FC(2) and the second valve V2 downstream of the flow controller FC(3) are in an open state. Process ST6 includes process ST61~process ST63. The calculations of these processes ST61 to ST63 can be implemented by the control unit 12.

製程ST61中,算出複數第1差分絕對值△P1以及複數第2差分絕對值△P2。具體而言,算出於實行期間中之恆常期間中由流量控制器FC(2)之第1壓力計P1所測定出的測定壓力值Pm1(亦即第1恆常壓力值)與第1基準恆常壓力值之差分絕對值(第1差分絕對值△P1)。此第1基準恆常壓力值係於比實行期間更早前被決定,為基準期間中之恆常期間中由流量控制器FC(2)之第1壓力計P1所測定出的測定壓力值。此外,算出於實行期間中之恆常期間中由流量控制器FC(2)之第2壓力計P2所測定出的測定壓力值Pm2(亦即第2恆 常壓力值)與第2基準恆常壓力值之差分絕對值(第2差分絕對值△P2)。此第2基準恆常壓力值係於比實行期間更早前被決定,為基準期間中之恆常期間中由流量控制器FC(2)之第2壓力計P2所測定出的測定壓力值。 In the process ST61, the plural first absolute difference values ΔP1 and the plural second absolute difference values ΔP2 are calculated. Specifically, it is calculated from the measured pressure value Pm1 (that is, the first constant pressure value) measured by the first pressure gauge P1 of the flow controller FC(2) during the constant period of the execution period and the first reference The absolute difference of the constant pressure value (the first absolute difference △P1). This first reference constant pressure value is determined earlier than the execution period, and is the measured pressure value measured by the first pressure gauge P1 of the flow controller FC(2) during the constant period of the reference period. In addition, the measured pressure value Pm2 measured by the second pressure gauge P2 of the flow controller FC(2) during the constant period during the execution period (that is, the second constant The absolute value of the difference between the normal pressure value) and the second reference constant pressure value (the second absolute difference value △P2). This second reference constant pressure value is determined earlier than the execution period, and is the measured pressure value measured by the second pressure gauge P2 of the flow controller FC(2) during the constant period of the reference period.

此外,算出於實行期間中之恆常期間中由流量控制器FC(3)之第1壓力計P1所測定出的測定壓力值Pm1(亦即第1恆常壓力值)與第1基準恆常壓力值之差分絕對值(第1差分絕對值△P1)。此第1基準恆常壓力值係於比實行期間更早前被決定,係基準期間中之恆常期間中由流量控制器FC(3)之第1壓力計P1所測定出的測定壓力值。此外,算出實行期間中之恆常期間中由流量控制器FC(3)之第2壓力計P2所測定出的測定壓力值Pm2(亦即第2恆常壓力值)與第2基準恆常壓力值之差分絕對值(第2差分絕對值△P2)。此第2基準恆常壓力值係於比實行期間更早前被決定,為於基準期間中之恆常期間中由流量控制器FC(3)之第2壓力計P2所測定出的測定壓力值。藉由如此之運算,於製程ST61算出複數第1差分絕對值△P1以及複數第2差分絕對值△P2。 In addition, the measured pressure value Pm1 (that is, the first constant pressure value) measured by the first pressure gauge P1 of the flow controller FC(3) during the constant period of the execution period and the first reference constant The absolute difference of the pressure value (the first absolute difference ΔP1). This first reference constant pressure value is determined earlier than the execution period, and is the measured pressure value measured by the first pressure gauge P1 of the flow controller FC(3) during the constant period of the reference period. In addition, calculate the measured pressure value Pm2 (that is, the second constant pressure value) and the second reference constant pressure measured by the second pressure gauge P2 of the flow controller FC(3) during the constant period during the execution period The absolute value of the difference (the second absolute difference ΔP2). This second reference constant pressure value is determined earlier than the execution period, and is the measured pressure value measured by the second pressure gauge P2 of the flow controller FC(3) during the constant period in the reference period . Through such calculations, the complex first absolute difference ΔP1 and the complex second absolute difference ΔP2 are calculated in the process ST61.

後續製程ST62中,算出複數第1差分絕對值△P1以及複數第2差分絕對值△P2之平均值Ave。後續製程ST63中,判定複數第1差分絕對值△P1是否分別大於既定第1閾值Th1、或是複數第2差分絕對值△P2是否分別大於既定第2閾值Th2、或是平均值Ave是否大於既定第3閾值Th3。 In the subsequent process ST62, the average value Ave of the plural first absolute difference ΔP1 and the plural second absolute difference ΔP2 is calculated. In the subsequent process ST63, it is determined whether the plural first absolute difference values △P1 are respectively greater than the predetermined first threshold Th1, or whether the plural second absolute difference values △P2 are respectively greater than the predetermined second threshold Th2, or whether the average value Ave is greater than the predetermined value. The third threshold Th3.

當複數第1差分絕對值△P1個別大於既定第1閾值Th1、或是複數第2差分絕對值△P2個別大於既定第2閾值Th2、或是平均值Ave大於既定第3閾值Th3之情況,乃接著實行製程ST7。另一方面,當複數第1差分絕對值△P1個別為既定第1閾值Th1以下、複數第2差分絕對值△P2個別為既定第2閾值Th2以下、且平均值Ave為既定第3閾值Th3以下之情況,乃結束即時檢查處理RP。此外,製程ST6於實行期間中之恆常期間中也可反覆實行。 When the first complex absolute difference ΔP1 is individually greater than the predetermined first threshold Th1, or the complex second absolute difference ΔP2 is individually greater than the predetermined second threshold Th2, or the average Ave is greater than the predetermined third threshold Th3, it is Then the process ST7 is carried out. On the other hand, when the complex first difference absolute value ΔP1 is individually below the predetermined first threshold Th1, the complex second difference absolute value ΔP2 is individually below the predetermined second threshold Th2, and the average Ave is below the predetermined third threshold Th3 In this case, the immediate inspection process RP is ended. In addition, the process ST6 can also be repeatedly executed during the constant period of the execution period.

實行期間中以對應於設定流量之流量從流量控制器FC(1)所輸出的氣體除了供給於處理容器PC也供給於流量控制器FC(2)以及FC(3)個別的第4配管L4以及第5配管L5。從而,第1恆常壓力值以及第2恆常壓力值係反映恆常狀態下流量控制器FC(1)之輸出流量。此外,第1基準恆常壓力值為基準期間中之恆常期間中所測定出之第1恆常壓力值。此外,第2基準恆常壓力值為基準期間中之恆常期間中所測定出之第2恆常壓力值。從而,藉由製程 ST63之判定,可判定實行期間中之流量控制器FC(1)之恆常狀態之輸出流量是否從基準期間中之流量控制器FC(1)之恆常狀態之輸出流量產生了變化。此外,即使未控制流量之一以上的第2流量控制器(例如流量控制器FC(2)以及FC(3))之第4配管L4以及第5配管L5中的壓力變化較確實反映於該一以上之第2流量控制器之第1壓力計P1以及第2壓力計P2個別的測定壓力值的壓力變化來得小的情況,如此小的壓力變化會反映於上述平均值。此乃由於相關小的壓力變化即便未反映於一以上之第2流量控制器之第1壓力計P1之測定壓力值以及第2壓力計P2之測定值當中的一部分,也會反映於其他一部分,故以結果來說會反映於平均值。是以,藉由使用平均值,可高精度判定實行期間中之流量控制器FC(1)之恆常狀態之輸出流量是否從基準期間中之流量控制器FC(1)之恆常狀態之輸出流量產生了變化。此外,由於使用了複數第2流量控制器、亦即流量控制器FC(2)以及流量控制器FC(3)之第1壓力計P1以及第2壓力計P2之測定壓力值,故可更高感度檢測實行期間中之恆常狀態之流量控制器FC(1)之輸出流量相對於基準期間中之恆常狀態之流量控制器FC(1)之輸出流量是否出現變化。此外,製程ST6中做為第2流量控制器也可使用流量控制器FC(2)以及流量控制器FC(3)當中的一流量控制器。 During the execution period, the gas output from the flow controller FC (1) at a flow rate corresponding to the set flow rate is supplied to the processing vessel PC and also supplied to the flow controllers FC (2) and FC (3) in the fourth piping L4 and the respective fourth pipes L4 and FC (3). The fifth pipe L5. Therefore, the first constant pressure value and the second constant pressure value reflect the output flow of the flow controller FC(1) in a constant state. In addition, the first reference constant pressure value is the first constant pressure value measured during the constant period in the reference period. In addition, the second reference constant pressure value is the second constant pressure value measured during the constant period of the reference period. Thus, through the process The ST63 determination can determine whether the output flow rate of the constant state of the flow controller FC(1) during the execution period has changed from the output flow rate of the constant state of the flow controller FC(1) during the reference period. In addition, even if one or more second flow controllers (for example, flow controllers FC(2) and FC(3)) do not control the flow rate, the pressure changes in the fourth pipe L4 and the fifth pipe L5 are more surely reflected in this one. When the pressure change of the measured pressure value of the first pressure gauge P1 and the second pressure gauge P2 of the above second flow controller is small, such a small pressure change will be reflected in the above average value. This is because even if the relevant small pressure changes are not reflected in one or more of the measured pressure values of the first pressure gauge P1 of the second flow controller and part of the measured values of the second pressure gauge P2, they will also be reflected in other parts. Therefore, the result will be reflected in the average value. Therefore, by using the average value, it can be judged with high accuracy whether the output flow of the constant state of the flow controller FC(1) during the execution period is from the constant state of the flow controller FC(1) during the reference period. The flow rate has changed. In addition, the measured pressure values of the first pressure gauge P1 and the second pressure gauge P2 of the multiple second flow controllers, namely the flow controller FC(2) and the flow controller FC(3), can be higher Sensitivity detects whether the output flow rate of the flow controller FC(1) in the constant state during the execution period changes relative to the output flow rate of the flow controller FC(1) in the constant state during the reference period. In addition, one of the flow controller FC(2) and the flow controller FC(3) can also be used as the second flow controller in the process ST6.

圖8係製程ST4之一實施形態之流程圖。製程ST4如上述般可和製程ST3、製程ST5、以及製程ST6來並列實行。製程ST4包含製程ST41。製程ST41之運算係藉由控制部12來實行。製程ST41於實行期間中係判定對於流量控制器FC(1)之控制閥CV之壓電元件26的施加電壓Vp是否和基準電壓Vpref1相同、以及流量控制器FC(1)之輸出流量Fout是否小於設定流量Fset。基準電壓Vpref1乃做為對於流量控制器FC(1)之控制閥CV之全開時的壓電元件26之施加電壓而預先設定之基準電壓。 Fig. 8 is a flowchart of an embodiment of the process ST4. The process ST4 can be implemented in parallel with the process ST3, the process ST5, and the process ST6 as described above. Process ST4 includes process ST41. The calculation of the process ST41 is carried out by the control unit 12. The process ST41 determines whether the applied voltage Vp to the piezoelectric element 26 of the control valve CV of the flow controller FC(1) is the same as the reference voltage Vpref1 during the execution period, and whether the output flow rate Fout of the flow controller FC(1) is less than Set the flow rate Fset. The reference voltage Vpref1 is a reference voltage preset as the applied voltage to the piezoelectric element 26 when the control valve CV of the flow controller FC(1) is fully opened.

即便對壓電元件26施加了使得控制閥CV全開之電壓,當流量控制器FC(1)之輸出流量Fout小於設定流量Fset之情況,供給於流量控制器FC(1)之氣體壓力仍有可能不足。例如,如此之情況被認為是於流量控制器FC(1)之上游的第1閥V1(1)發生動作不良。依據製程ST41,由於判定對流量控制器FC(1)之控制閥CV之壓電元件26的施加電壓Vp是否和基準電壓Vpref1相同、以及流量控制器FC(1)之輸出流量Fout是否小於設定流量Fset,而可檢測 流量控制器FC(1)之上游側(一次側)之供給壓力不足。 Even if a voltage that makes the control valve CV fully open is applied to the piezoelectric element 26, when the output flow rate Fout of the flow controller FC(1) is less than the set flow rate Fset, the pressure of the gas supplied to the flow controller FC(1) is still possible insufficient. For example, such a situation is considered to be malfunctioning of the first valve V1 (1) upstream of the flow controller FC (1). According to the process ST41, it is determined whether the applied voltage Vp to the piezoelectric element 26 of the control valve CV of the flow controller FC(1) is the same as the reference voltage Vpref1, and whether the output flow rate Fout of the flow controller FC(1) is less than the set flow rate Fset, while detectable The supply pressure on the upstream side (primary side) of the flow controller FC(1) is insufficient.

製程ST41,當施加電壓Vp和基準電壓Vpref1相同、且流量控制器FC(1)之輸出流量Fout小於設定流量Fset之情況,判定供給於流量控制器FC(1)之氣體壓力為不足。當判定供給於流量控制器FC(1)之氣體壓力不足之情況,接著實行製程ST7。另一方面,當判定供給於流量控制器FC(1)之氣體壓力不足之情況,結束製程ST4之實行。此外,製程ST4也可於實行期間中來反覆實行。 In process ST41, when the applied voltage Vp is the same as the reference voltage Vpref1 and the output flow rate Fout of the flow controller FC(1) is less than the set flow rate Fset, it is determined that the gas pressure supplied to the flow controller FC(1) is insufficient. When it is determined that the gas pressure supplied to the flow controller FC(1) is insufficient, then the process ST7 is executed. On the other hand, when it is determined that the gas pressure supplied to the flow controller FC(1) is insufficient, the execution of the process ST4 is ended. In addition, the process ST4 can also be repeatedly executed during the execution period.

圖9係製程ST5之一實施形態之流程圖。圖9所示製程ST5如上述般可和製程ST3、製程ST5、以及製程ST6來並列實行。圖9所示製程ST5包含製程ST51。製程ST51之運算係藉由控制部12來實行。製程ST51於實行期間中係判定流量控制器FC(1)之第1壓力計P1之測定壓力值Pm1與流量控制器FC(1)之第2壓力計P2之測定壓力值Pm2的差是否為既定值Pth以下。當流量控制器FC(1)之第1壓力計P1之測定壓力值Pm1與流量控制器FC(1)之第2壓力計P2之測定壓力值Pm2的差為既定值Pth以下之情況,接著實行製程ST7。另一方面,當流量控制器FC(1)之第1壓力計P1之測定壓力值Pm1與流量控制器FC(1)之第2壓力計P2之測定壓力值Pm2的差大於既定值Pth之情況,結束製程ST5之實行。此外,製程ST5也可於實行期間中來反覆實行。 Fig. 9 is a flowchart of an embodiment of the process ST5. The process ST5 shown in FIG. 9 can be implemented in parallel with the process ST3, the process ST5, and the process ST6 as described above. The process ST5 shown in FIG. 9 includes the process ST51. The calculation of the process ST51 is carried out by the control unit 12. During the execution of process ST51, it is determined whether the difference between the measured pressure value Pm1 of the first pressure gauge P1 of the flow controller FC(1) and the measured pressure value Pm2 of the second pressure gauge P2 of the flow controller FC(1) is a predetermined The value is less than Pth. When the difference between the measured pressure value Pm1 of the first pressure gauge P1 of the flow controller FC(1) and the measured pressure value Pm2 of the second pressure gauge P2 of the flow controller FC(1) is less than the predetermined value Pth, then execute Process ST7. On the other hand, when the difference between the measured pressure value Pm1 of the first pressure gauge P1 of the flow controller FC(1) and the measured pressure value Pm2 of the second pressure gauge P2 of the flow controller FC(1) is greater than the predetermined value Pth , End the implementation of process ST5. In addition, the process ST5 can also be repeatedly executed during the execution period.

當流量控制器FC(1)之下游之第2閥V2(1)起因於故障而關閉著的情況,流量控制器FC(1)之第1壓力計P1之測定壓力值Pm1與流量控制器FC(1)之第2壓力計P2之測定壓力值Pm2成為大致相同。從而,依據製程ST51之判定,將可檢測流量控制器FC(1)之下游之第2閥V2(1)之故障。 When the second valve V2(1) downstream of the flow controller FC(1) is closed due to a failure, the measured pressure value Pm1 of the first pressure gauge P1 of the flow controller FC(1) and the flow controller FC (1) The measured pressure value Pm2 of the second pressure gauge P2 becomes substantially the same. Therefore, according to the judgment of the process ST51, the failure of the second valve V2(1) downstream of the flow controller FC(1) can be detected.

圖10係製程ST5之其他實施形態之流程圖。圖10所示製程ST5如上述般可和製程ST3、製程ST4、以及製程ST6來並列實行。圖10所示製程ST5包含製程ST55。製程ST55之運算係藉由控制部12來實行。於製程ST55係判定實行期間中之流量控制器FC(1)之第2壓力計P2之測定壓力值Pm2是否大於既定上限壓力值Plim。當實行期間中之流量控制器FC(1)之第2壓力計P2之測定壓力值大於既定上限壓力值Plim之情況,接著實行製程ST7。另一方面,當實行期間中之流量控制器FC(1)之第2壓力計P2之測定壓力值為既定上限壓力值Plim以下之情況,結束製程ST5之實行。此外,製程ST5也可於實行期 間中來反覆實行。 Fig. 10 is a flowchart of another embodiment of the process ST5. The process ST5 shown in FIG. 10 can be implemented in parallel with the process ST3, the process ST4, and the process ST6 as described above. The process ST5 shown in FIG. 10 includes the process ST55. The calculation of the process ST55 is carried out by the control unit 12. In the process ST55, it is determined whether the measured pressure value Pm2 of the second pressure gauge P2 of the flow controller FC(1) during the execution period is greater than the predetermined upper limit pressure value Plim. When the measured pressure value of the second pressure gauge P2 of the flow controller FC(1) during the execution period is greater than the predetermined upper limit pressure value Plim, then the process ST7 is executed. On the other hand, when the measured pressure value of the second pressure gauge P2 of the flow controller FC(1) during the execution period is less than the predetermined upper limit pressure value Plim, the execution of the process ST5 is ended. In addition, process ST5 can also be used during the implementation period Repeatedly from time to time.

氣體供給系統GP之流量控制器FC之第5配管L5之內部壓力通常設定有上限。從而,若流量控制器FC之第2壓力計P2之測定壓力值Pm2超過既定上限壓力值Plim,被認為會發生該流量控制器FC(1)之下游之第2閥V2(1)之故障。從而,依據製程ST55之判定,將可檢測流量控制器FC(1)之下游之第2閥V2(1)之故障。 The internal pressure of the fifth pipe L5 of the flow controller FC of the gas supply system GP is usually set with an upper limit. Therefore, if the measured pressure value Pm2 of the second pressure gauge P2 of the flow controller FC exceeds the predetermined upper pressure value Plim, it is considered that a failure of the second valve V2(1) downstream of the flow controller FC(1) will occur. Therefore, according to the judgment of the process ST55, the failure of the second valve V2(1) downstream of the flow controller FC(1) can be detected.

以下,針對實施形態之方法之檢查處理當中,於實行期間以外所實行之幾個檢查處理參見圖11~圖15來說明。圖11~圖15係實施形態之方法之一部分的檢查處理之流程圖。 Hereinafter, among the inspection processing of the method of the embodiment, several inspection processing performed outside the execution period will be described with reference to Figs. 11-15. Figures 11 to 15 are flowcharts of inspection processing as part of the method of the embodiment.

圖11所示檢查處理包含製程ST101~製程ST104。製程ST101以及製程ST104係在控制部12之控制下來實行。此外,製程ST102以及ST103係藉由控制部12來實行。 The inspection process shown in FIG. 11 includes process ST101 to process ST104. The process ST101 and the process ST104 are executed under the control of the control unit 12. In addition, the processes ST102 and ST103 are executed by the control unit 12.

於製程ST101係進行複數流量控制器FC之內部氣體的排氣。具體而言,關閉複數第1閥V1以及閥VP1,開啟複數第2閥V2、複數流量控制器FC之控制閥CV以及第3閥V3,使得排氣裝置EA作動。藉此,進行複數流量控制器FC之內部氣體的排氣。此外,製程ST101中,閥VP2以及複數閥VP3也可被開啟。 In the process ST101, the internal gas of the plurality of flow controllers FC is exhausted. Specifically, the plurality of first valves V1 and VP1 are closed, and the plurality of second valves V2, the control valve CV of the plurality of flow controllers FC, and the third valve V3 are opened, so that the exhaust device EA is activated. In this way, the internal gas of the plurality of flow controllers FC is exhausted. In addition, in the process ST101, the valve VP2 and the plural valves VP3 can also be opened.

後續製程ST102,在複數流量控制器FC之內部氣體受到排氣之狀態下,判定複數流量控制器FC個別的第1壓力計P1之測定壓力值Pm1是否大於第1既定值P01、以及複數流量控制器FC個別的第2壓力計P2之測定壓力值Pm2是否大於第2既定值P02。 In the subsequent process ST102, in the state where the internal gas of the multiple flow controller FC is exhausted, it is determined whether the measured pressure value Pm1 of the first pressure gauge P1 of the multiple flow controller FC is greater than the first predetermined value P01, and the multiple flow control Whether the measured pressure value Pm2 of the second pressure gauge P2 of the device FC is greater than the second predetermined value P02.

複數流量控制器FC個別之第1壓力計P1以及第2壓力計P2係以在複數流量控制器FC個別之內部氣體已排氣之狀態輸出「0」之測定值的方式做初期設定。亦即,複數流量控制器FC個別之第1壓力計P1以及第2壓力計P2初期受到零點調整。從而,在複數流量控制器FC之內部氣體已排氣之狀態下,當測定壓力值Pm1大於第1既定值P01之情況,可檢測對應之流量控制器FC之第1壓力計P1之零點偏移。此外,在複數流量控制器FC之內部氣體已排氣之狀態下,當測定壓力值Pm2大於第2既定值P02之情況,可檢測對應之流量控制器FC之第2壓力計P2之零點偏移。 The first pressure gauge P1 and the second pressure gauge P2 of the plurality of flow controllers FC are initially set to output the measured value of "0" when the internal gas of the plurality of flow controllers FC is exhausted. That is, the first pressure gauge P1 and the second pressure gauge P2 of the plurality of flow controllers FC are initially zero-point adjusted. Therefore, when the measured pressure value Pm1 is greater than the first predetermined value P01 in the state where the internal gas of the plural flow controller FC is exhausted, the zero point offset of the first pressure gauge P1 of the corresponding flow controller FC can be detected . In addition, when the internal gas of the plural flow controller FC is exhausted, when the measured pressure value Pm2 is greater than the second predetermined value P02, the zero point offset of the second pressure gauge P2 of the corresponding flow controller FC can be detected .

於製程ST102,當判定某一流量控制器FC之第1壓力計P1之測定壓力值Pm1大於第1既定值P01、或是某一流量控制器FC之第2壓力計P2之測定壓力值Pm2大於第2既定值P02之情況,於後續製程ST103係輸出警報訊號。此製程ST103和製程ST7為同樣的製程。後續製程ST104中,停止接下來進行之預定程序。另一方面,當全部的流量控制器FC之第1壓力計P1之測定壓力值Pm1為第1既定值P01以下、且全部的流量控制器FC之第2壓力計P2之測定壓力值Pm2為第2既定值P02以下的情況,判定無零點偏移,結束圖11所示檢查處理。 In process ST102, when it is determined that the measured pressure value Pm1 of the first pressure gauge P1 of a certain flow controller FC is greater than the first predetermined value P01, or the measured pressure value Pm2 of the second pressure gauge P2 of a certain flow controller FC is greater than In the case of the second predetermined value P02, an alarm signal is output in the subsequent process ST103. This process ST103 and process ST7 are the same process. In the subsequent process ST104, the next scheduled process is stopped. On the other hand, when the measured pressure value Pm1 of the first pressure gauge P1 of all the flow controllers FC is less than the first predetermined value P01, and the measured pressure value Pm2 of the second pressure gauge P2 of all the flow controllers FC is the first 2 When the predetermined value P02 is less than or equal to P02, it is determined that there is no zero offset, and the inspection process shown in Fig. 11 is ended.

圖12所示檢查處理係用以檢查於複數流量控制器FC個別之第1壓力計P1以及第2壓力計P2之某一測定壓力值是否相對於對應之初期的測定壓力值產生誤差的處理,例如對複數流量控制器FC個別供給之氣體做切換時所實行之處理。圖12所示檢查處理包含製程ST111~製程ST116。其中製程ST111以及製程ST116係基於控制部12之控制下來實行。此外,製程ST112~ST115係藉由控制部12來實行。 The inspection process shown in FIG. 12 is a process for inspecting whether a measurement pressure value of the first pressure gauge P1 and the second pressure gauge P2 of the plurality of flow controllers FC has an error with respect to the corresponding initial measurement pressure value. For example, the processing performed when the gas supplied by the plural flow controllers FC is switched individually. The inspection process shown in FIG. 12 includes process ST111 to process ST116. Among them, the process ST111 and the process ST116 are executed under the control of the control unit 12. In addition, the processes ST112 to ST115 are implemented by the control unit 12.

製程ST111係關閉複數第1閥V1以及複數第2閥V2。製程ST112~製程ST116對於複數流量控制器FC來個別實行。以下,說明對於一個流量控制器FC之製程ST112~製程ST116之處理內容。 In the process ST111, the plurality of first valves V1 and the plurality of second valves V2 are closed. Process ST112~process ST116 are implemented individually for multiple flow controllers FC. The following describes the processing content of the process ST112 to the process ST116 of a flow controller FC.

製程ST112係取得流量控制器FC之第1壓力計P1之測定壓力值Pm1以及該流量控制器FC之第2壓力計P2之測定壓力值Pm2。後續製程ST113係取得初期壓力值P2i。初期壓力值P2i係將製程ST112中所取得之測定壓力值Pm1輸入至預定函數所取得之壓力值。此函數係從圖12之檢查處理實行前之期間中所取得之複數測定壓力值Pm1與分別對應於該複數測定壓力值Pm1之測定壓力值Pm2所作成的函數。檢查處理實行前之期間為流量控制器FC之全新導入不久後之期間、或是進行了流量控制器FC個別之第1壓力計以及第2壓力計之調整不久後的期間等初期期間。更具體而言,此函數係將流量控制器FC之內部壓力設定為互異之複數壓力的狀況下,形成流量控制器FC之上游之第1閥V1以及該流量控制器FC之下游之第2閥V2呈現關閉之狀態,每當設定該複數壓力時,將藉由取得流量控制器FC之第1壓力計P1之測定壓力值Pm1以及該流量控制器FC之第2壓力計P2之測定壓力值Pm2所得複數測 定壓力值Pm1與分別對應於該複數測定壓力值Pm1之複數第2測定壓力值Pm2的關係加以函數化者。例如,此函數可為近似於複數測定壓力值Pm1與分別對應於該複數測定壓力值Pm1之測定壓力值Pm2之間的關係之函數。 The process ST112 is to obtain the measured pressure value Pm1 of the first pressure gauge P1 of the flow controller FC and the measured pressure value Pm2 of the second pressure gauge P2 of the flow controller FC. The subsequent process ST113 obtains the initial pressure value P2i. The initial pressure value P2i is a pressure value obtained by inputting the measured pressure value Pm1 obtained in the process ST112 into a predetermined function. This function is a function of the plural measured pressure values Pm1 obtained during the period before the inspection process of FIG. 12 is executed and the measured pressure values Pm2 respectively corresponding to the plural measured pressure values Pm1. The period before the execution of the inspection process is the period immediately after the new introduction of the flow controller FC, or the period immediately after the adjustment of the first pressure gauge and the second pressure gauge of the flow controller FC. More specifically, this function forms the first valve V1 upstream of the flow controller FC and the second downstream valve V1 of the flow controller FC under the condition that the internal pressure of the flow controller FC is set to different plural pressures. The valve V2 is in a closed state. Whenever the plural pressure is set, the measured pressure value Pm1 of the first pressure gauge P1 of the flow controller FC and the measured pressure value of the second pressure gauge P2 of the flow controller FC are obtained. Pm2 obtained complex number measurement The relationship between the constant pressure value Pm1 and the plural second measured pressure values Pm2 respectively corresponding to the plural measured pressure values Pm1 is functionalized. For example, this function may be a function that approximates the relationship between the plural measured pressure values Pm1 and the measured pressure values Pm2 respectively corresponding to the plural measured pressure values Pm1.

於後續製程ST114,比較測定壓力值Pm2與初期壓力值P2i。若流量控制器FC之第1壓力計P1之狀態以及第2壓力計P2之狀態為正常,則在該流量控制器FC之上游之第1閥V1與該流量控制器FC之下游之第2閥V2處於關閉之狀態下,將該流量控制器FC之第1壓力計P1之測定壓力值Pm1輸入於上述函數所得之初期壓力值P2i與於製程ST112所取得之流量控制器FC之第2壓力計P2之測定壓力值Pm2應該成為約相同值。從而,藉由製程ST114之比較,將可判定流量控制器FC之第1壓力計P1以及第2壓力計P2之某一測定壓力值是否對於初期之測定壓力值產生誤差。 In the subsequent process ST114, the measured pressure value Pm2 is compared with the initial pressure value P2i. If the state of the first pressure gauge P1 and the state of the second pressure gauge P2 of the flow controller FC are normal, the first valve V1 upstream of the flow controller FC and the second valve downstream of the flow controller FC When V2 is in the closed state, input the measured pressure value Pm1 of the first pressure gauge P1 of the flow controller FC into the initial pressure value P2i obtained by the above function and the second pressure gauge of the flow controller FC obtained in the process ST112 The measured pressure value Pm2 of P2 should be approximately the same value. Therefore, by comparing the process ST114, it can be determined whether one of the measured pressure values of the first pressure gauge P1 and the second pressure gauge P2 of the flow controller FC has an error with respect to the initial measured pressure value.

製程ST114係判定例如製程ST112所取得之測定壓力值Pm2與初期壓力值P2i之差的絕對值是否為既定值Pdref以上。當製程ST112所取得之測定壓力值Pm2與初期壓力值P2i之差的絕對值為既定值Pdref以上之情況,乃實行後續製程ST115並進而實行製程ST116。製程ST115和製程ST103為同樣的製程,製程ST116和製程ST104為同樣的製程。另一方面,當製程ST112所取得之測定壓力值Pm2與初期壓力值P2i之差的絕對值小於既定值Pdref之情況,乃判定流量控制器FC之第1壓力計P1以及第2壓力計P2之某一測定壓力值相對於初期之測定壓力值產生誤差,而結束圖12所示檢查處理。 The process ST114 determines whether the absolute value of the difference between the measured pressure value Pm2 obtained in the process ST112 and the initial pressure value P2i is greater than a predetermined value Pdref, for example. When the absolute value of the difference between the measured pressure value Pm2 and the initial pressure value P2i obtained in the process ST112 is greater than the predetermined value Pdref, the subsequent process ST115 is performed and then the process ST116 is performed. The process ST115 and the process ST103 are the same process, and the process ST116 and the process ST104 are the same process. On the other hand, when the absolute value of the difference between the measured pressure value Pm2 and the initial pressure value P2i obtained in the process ST112 is less than the predetermined value Pdref, it is determined whether the first pressure gauge P1 and the second pressure gauge P2 of the flow controller FC are A certain measured pressure value has an error with respect to the initial measured pressure value, and the inspection process shown in FIG. 12 is ended.

圖13所示檢查處理係用以檢測複數流量控制器FC個別之控制閥CV是否產生了漏洩之處理,包含製程ST121~ST123。製程ST123係基於控制部12之控制下來實行。此外,製程ST121~ST122係藉由控制部12來實行。以下,僅就對一個流量控制器FC之製程ST121~ST123之處理內容來說明。 The inspection process shown in Figure 13 is a process used to detect whether the individual control valves CV of the plural flow controllers FC have leaked, including the processes ST121~ST123. The process ST123 is executed under the control of the control unit 12. In addition, the processes ST121 to ST122 are implemented by the control unit 12. In the following, only the processing content of the process ST121~ST123 of a flow controller FC will be described.

製程ST121中,在流量控制器FC之控制閥CV呈關閉之狀態下,判定是否經過了既定時間以上的時間。此外,當對流量控制器FC之控制閥CV之壓電元件26的施加電壓Vp和既定基準電壓Vpref2相同之情況,判定流量控制器FC之控制閥CV處於已關閉之狀態。此基準電壓Vpref2在圖4所示控制閥CV為零。 In the process ST121, with the control valve CV of the flow controller FC in a closed state, it is determined whether or not a predetermined time or more has passed. In addition, when the voltage Vp applied to the piezoelectric element 26 of the control valve CV of the flow controller FC is the same as the predetermined reference voltage Vpref2, it is determined that the control valve CV of the flow controller FC is in a closed state. The reference voltage Vpref2 is zero in the control valve CV shown in FIG. 4.

控制閥CV一般而言無法完全遮斷氣體。若關閉控制閥CV之狀態長期間 持續,會影響之後開啟下游之第2閥V2基於程序目的而供給氣體之情況的過渡特性。依據製程ST121之判定,將可檢測對如此之過渡特性造成影響之控制閥CV之狀態。 Generally speaking, the control valve CV cannot completely block the gas. If the control valve CV is closed for a long period of time Continuing will affect the transient characteristics of the case where the second downstream valve V2 is opened and the gas is supplied for the purpose of the program. According to the judgment of the process ST121, the state of the control valve CV that affects such transient characteristics can be detected.

具體而言,製程ST121中,在流量控制器FC之控制閥CV處於關閉之狀態下,若判定經過了既定時間以上之時間,則實行後續製程ST122,進而實行製程ST123。製程ST122和製程ST103為同樣的製程,製程ST123和製程ST104為同樣的製程。另一方面,製程ST121中,在流量控制器FC之控制閥CV處於關閉之狀態下,當判定未經過既定時間以上之時間,則結束圖13所示之檢查處理。 Specifically, in the process ST121, when the control valve CV of the flow controller FC is in a closed state, if it is determined that the predetermined time or more has passed, the subsequent process ST122 is executed, and then the process ST123 is executed. The process ST122 and the process ST103 are the same process, and the process ST123 and the process ST104 are the same process. On the other hand, in the process ST121, when the control valve CV of the flow controller FC is in the closed state, when it is determined that the predetermined time or more has not passed, the inspection process shown in FIG. 13 is ended.

圖14所示檢查處理係用以檢測複數流量控制器FC個別之控制閥CV是否產生漏洩之其他處理,包含製程ST131~ST133。製程ST133係基於控制部12之控制所實行。此外,製程ST131~ST132係藉由控制部12來實行。以下,僅說明對一個流量控制器FC之製程ST131~ST133之處理內容。 The inspection process shown in Fig. 14 is used to detect whether the individual control valves CV of the plurality of flow controllers FC are leaking or not, including the processes ST131~ST133. The process ST133 is implemented based on the control of the control unit 12. In addition, the processes ST131 to ST132 are implemented by the control unit 12. In the following, only the processing content of the process ST131~ST133 of a flow controller FC will be described.

製程ST131中,流量控制器FC之控制閥CV處於關閉之狀態下,判定該流量控制器FC之第1壓力計P1之測定壓力值Pm1是否增加至既定值以上。此外,當對流量控制器FC之控制閥CV之壓電元件26的施加電壓Vp和既定基準電壓Vpref2相同之情況,判定流量控制器FC之控制閥CV處於關閉之狀態。 In the process ST131, with the control valve CV of the flow controller FC in a closed state, it is determined whether the measured pressure value Pm1 of the first pressure gauge P1 of the flow controller FC has increased above a predetermined value. In addition, when the voltage Vp applied to the piezoelectric element 26 of the control valve CV of the flow controller FC is the same as the predetermined reference voltage Vpref2, it is determined that the control valve CV of the flow controller FC is in a closed state.

即便對壓電元件26之施加電壓Vp處在用以關閉控制閥CV之設定下,但被認為當第1壓力計P1之測定壓力值Pm1增加為既定值以上之情況,會於控制閥CV發生無法容許之漏洩。依據製程ST131之判定,當對壓電元件26之施加電壓Vp處在用以關閉控制閥CV之設定的情況,由於判定流量控制器FC之第1壓力計P1之測定壓力值Pm1是否增加為既定值以上,而可檢測無法容許之控制閥之漏洩。 Even if the voltage Vp applied to the piezoelectric element 26 is set to close the control valve CV, it is considered that when the measured pressure value Pm1 of the first pressure gauge P1 increases above the predetermined value, it will happen to the control valve CV. Unallowable leakage. According to the judgment of process ST131, when the applied voltage Vp to the piezoelectric element 26 is at the setting for closing the control valve CV, it is determined whether the measured pressure value Pm1 of the first pressure gauge P1 of the flow controller FC has increased as a predetermined Value above, and can detect the leakage of the control valve that cannot be tolerated.

具體而言,製程ST131中,在流量控制器FC之控制閥CV處於關閉之狀態下,當判定該流量控制器FC之第1壓力計P1之測定壓力值Pm1增加為既定值以上的情況,係實行後續製程ST132,進而實行製程ST133。製程ST132和製程ST103為同樣的製程,製程ST133和製程ST104為同樣的製程。另一方面,製程ST131中,在流量控制器FC之控制閥CV處於關閉之狀態下,當判定流量控制器FC之第1壓力計P1之測定壓力值Pm1增加為既定值以上,則 結束圖14所示檢查處理。 Specifically, in the process ST131, when the control valve CV of the flow controller FC is in the closed state, when it is determined that the measured pressure value Pm1 of the first pressure gauge P1 of the flow controller FC has increased above the predetermined value, it is Carry out the follow-up process ST132, and then carry out the process ST133. The process ST132 and the process ST103 are the same process, and the process ST133 and the process ST104 are the same process. On the other hand, in the process ST131, when the control valve CV of the flow controller FC is in a closed state, when it is determined that the measured pressure value Pm1 of the first pressure gauge P1 of the flow controller FC has increased above the predetermined value, then The inspection process shown in Fig. 14 ends.

圖15所示檢查處理為檢查是否於複數第2閥V2發生漏洩之處理,包含製程ST141~製程ST143。製程ST143係基於控制部12之控制下來實行。此外,製程ST141~ST142係藉由控制部12來實行。以下,僅針對一個流量控制器FC之下游之一個第2閥V2來說明其漏洩之檢查處理的內容。 The inspection process shown in FIG. 15 is a process of inspecting whether a leak occurs in a plurality of second valves V2, and includes the process ST141 to the process ST143. The process ST143 is executed under the control of the control unit 12. In addition, the processes ST141 to ST142 are implemented by the control unit 12. In the following, only the second valve V2 downstream of a flow controller FC will be described for the leakage inspection process.

於製程ST141,當流量控制器FC之下游之第2閥為關閉、且該流量控制器FC之控制閥CV為關閉之情況,判定該流量控制器FC之第1壓力計P1之測定壓力值Pm1是否減少。此外,當對流量控制器FC之控制閥CV之壓電元件26的施加電壓Vp和既定基準電壓Vpref2為相同之情況,判定流量控制器FC之控制閥CV處於關閉之狀態。 In process ST141, when the second valve downstream of the flow controller FC is closed and the control valve CV of the flow controller FC is closed, the measured pressure value Pm1 of the first pressure gauge P1 of the flow controller FC is determined Whether to reduce. In addition, when the voltage Vp applied to the piezoelectric element 26 of the control valve CV of the flow controller FC is the same as the predetermined reference voltage Vpref2, it is determined that the control valve CV of the flow controller FC is in a closed state.

即便流量控制器FC之下游之第2閥V2為關閉,該流量控制器FC之控制閥CV為關閉,當該流量控制器FC之第1壓力計P1之測定壓力值Pm1減少的情況,被認為會於該控制閥CV之下游之第2閥V2發生漏洩。依據製程ST141,當流量控制器FC之控制閥CV為關閉之情況,由於判定該流量控制器FC之第1壓力計P1之測定壓力值Pm1是否減少,將可檢測流量控制器FC之下游之第2閥V2有無漏洩。 Even if the second valve V2 downstream of the flow controller FC is closed, the control valve CV of the flow controller FC is closed. When the measured pressure value Pm1 of the first pressure gauge P1 of the flow controller FC decreases, it is considered Leakage will occur in the second valve V2 downstream of the control valve CV. According to the process ST141, when the control valve CV of the flow controller FC is closed, since it is determined whether the measured pressure value Pm1 of the first pressure gauge P1 of the flow controller FC has decreased, it will be possible to detect the first downstream of the flow controller FC. 2 Whether valve V2 is leaking.

具體而言,製程ST141中,當流量控制器FC之下游之第2閥V2為關閉、且該流量控制器FC之控制閥CV為關閉之情況,當判定該流量控制器FC之第1壓力計P1之測定壓力值Pm1減少既定值以上的情況,乃實行後續製程ST142,進而實行製程ST143。製程ST142和製程ST103為同樣的製程,製程ST143和製程ST104為同樣的製程。另一方面,製程ST141中,當流量控制器FC之下游之第2閥V2為關閉、且該流量控制器FC之控制閥CV為關閉之情況,若判定該流量控制器FC之第1壓力計P1之測定壓力值Pm1未減少既定值以上,則結束圖15所示檢查處理。 Specifically, in process ST141, when the second valve V2 downstream of the flow controller FC is closed and the control valve CV of the flow controller FC is closed, it is determined that the first pressure gauge of the flow controller FC When the measured pressure value Pm1 of P1 decreases by more than a predetermined value, the subsequent process ST142 is implemented, and then the process ST143 is implemented. The process ST142 and the process ST103 are the same process, and the process ST143 and the process ST104 are the same process. On the other hand, in process ST141, when the second valve V2 downstream of the flow controller FC is closed and the control valve CV of the flow controller FC is closed, if it is determined that the first pressure gauge of the flow controller FC If the measured pressure value Pm1 of P1 does not decrease by more than the predetermined value, the inspection process shown in FIG. 15 is ended.

以下,參見圖16,針對可取代圖11之檢查處理所實行之檢查處理來說明。圖16所示檢查處理和圖11所示檢查處理同樣地包含製程ST101、製程ST103、製程ST104。此外,圖16所示檢查處理包含與圖11所示檢查處理之製程ST102不同的製程ST102A。製程ST101以及製程ST104係基於控制部12之控制下來實行。此外,製程ST102A以及ST103係藉由控制部12來實行。 以下,僅說明製程ST102A。 Hereinafter, referring to FIG. 16, the inspection process that can be executed instead of the inspection process of FIG. 11 will be described. The inspection process shown in FIG. 16 includes the process ST101, the process ST103, and the process ST104 similarly to the inspection process shown in FIG. In addition, the inspection process shown in FIG. 16 includes a process ST102A that is different from the process ST102 of the inspection process shown in FIG. 11. The process ST101 and the process ST104 are executed under the control of the control unit 12. In addition, the processes ST102A and ST103 are implemented by the control unit 12. Below, only the process ST102A is described.

製程ST102A,在複數流量控制器FC之內部氣體已排氣之狀態,判定於既定時間內藉由複數流量控制器FC個別之第1壓力計P1所測定出的複數測定壓力值Pm1之移動平均值MVA1與藉由第2壓力計P2所測定出的複數測定壓力值Pm2之移動平均值MVA2的差分絕對值是否為既定值PD1(例如數kPa)以上。當複數流量控制器FC當中有任何滿足製程ST102A之判定條件的情況,係實行後續製程ST103。另一方面,當任一流量控制器皆不滿足製程ST102A之條件的情況,乃結束圖16所示檢查處理。此外,既定時間取決於測定壓力值Pm1以及測定壓力值Pm2之取得速率,例如當該取得速率為100μsec之情況,可為0.1秒以上、5秒以下之時間。 In process ST102A, in the state where the internal gas of the multiple flow controller FC is exhausted, it is determined that the moving average of the multiple measured pressure values Pm1 measured by the first pressure gauge P1 of the multiple flow controller FC within a predetermined time Whether the absolute value of the difference between MVA1 and the moving average MVA2 of the plural measured pressure values Pm2 measured by the second pressure gauge P2 is greater than or equal to the predetermined value PD1 (for example, several kPa). When any of the plurality of flow controllers FC meets the determination conditions of the process ST102A, the subsequent process ST103 is executed. On the other hand, when any flow controller does not meet the conditions of the process ST102A, the inspection process shown in FIG. 16 is ended. In addition, the predetermined time depends on the acquisition rate of the measured pressure value Pm1 and the measured pressure value Pm2. For example, when the acquisition rate is 100 μsec, it can be a time of 0.1 second or more and 5 seconds or less.

當流量控制器FC個別無零點偏移之情況,於流量控制器之內部已排氣之狀態下,移動平均值MVA1與移動平均值MVA2之間幾乎不存在著差。從而,當此等二個移動平均值之間的差分絕對值為既定值PD1以上之情況,會成為該流量控制器發生了零點偏移。是以,依據圖16所示檢查處理,流量控制器之零點的檢測成為可能。 When the flow controller FC has no zero offset individually, there is almost no difference between the moving average MVA1 and the moving average MVA2 when the interior of the flow controller is exhausted. Therefore, when the absolute value of the difference between these two moving averages is greater than or equal to the predetermined value PD1, it will become a zero offset of the flow controller. Therefore, according to the inspection process shown in Fig. 16, the zero point detection of the flow controller becomes possible.

以下,參見圖17,針對取代圖12之檢查處理所能實行之檢查處理來說明。圖17所示檢查處理和圖12所示檢查處理同樣地包含製程ST111、製程ST115、製程ST116。此外,圖17所示檢查處理進而包含製程ST112A。製程ST111以及製程ST116係基於控制部12之控制下來實行。此外,製程ST112A以及ST115係藉由控制部12來實行。以下,僅說明製程ST112A。 Hereinafter, referring to FIG. 17, the inspection process that can be executed instead of the inspection process of FIG. 12 will be described. The inspection process shown in FIG. 17 includes the process ST111, the process ST115, and the process ST116 similarly to the inspection process shown in FIG. In addition, the inspection process shown in FIG. 17 further includes the process ST112A. The process ST111 and the process ST116 are executed under the control of the control unit 12. In addition, the processes ST112A and ST115 are implemented by the control unit 12. Below, only the process ST112A is described.

製程ST112A係於製程ST111之後實行。製程ST112A,在複數第1閥V1以及複數第2閥V2為關閉之狀態下,判定於既定時間內藉由複數流量控制器FC個別之第1壓力計P1所測定出的複數測定壓力值Pm1之移動平均值MVA11與藉由第2壓力計P2所測定出的複數測定壓力值Pm2之移動平均值MVA12之差分絕對值是否為既定值PD2(例如數kPa)以上。當複數流量控制器FC當中任一者滿足製程ST112A之判定條件的情況,其次來實行製程ST115。另一方面,當任一流量控制器皆不滿足製程ST112A之條件的情況,乃結束圖17所示檢查處理。此外,既定時間取決於測定壓力值Pm1以及測定壓力值Pm2之取得速率,例如當該取得速率為100μsec之情況,可為0.1秒以 上、5秒以下之時間。 The process ST112A is implemented after the process ST111. In the process ST112A, when the plural first valves V1 and the plural second valves V2 are closed, it is judged that the plural measured pressure values Pm1 measured by the individual first pressure gauge P1 of the plural flow controller FC within a predetermined time Whether the absolute value of the difference between the moving average MVA11 and the moving average MVA12 of the plural measured pressure values Pm2 measured by the second pressure gauge P2 is greater than or equal to the predetermined value PD2 (for example, several kPa). When any one of the plurality of flow controllers FC meets the determination condition of the process ST112A, the process ST115 is executed next. On the other hand, when any flow controller does not meet the conditions of the process ST112A, the inspection process shown in FIG. 17 is ended. In addition, the predetermined time depends on the acquisition rate of the measured pressure value Pm1 and the measured pressure value Pm2. For example, when the acquisition rate is 100 μsec, it can be 0.1 seconds or more. Up, 5 seconds or less time.

當複數流量控制器個別之第1壓力計P1以及第2壓力計P2之雙方為正常之情況,該流量控制器之上游之第1閥V1與下游之第2閥V2在關閉之狀態下關於流量控制器所求出之移動平均值MVA11與移動平均值MVA12之間幾乎不存在著差。從而,當此等二個移動平均值之間的差分絕對值為既定值PD2以上之情況,該流量控制器之第1壓力計P1或是第2壓力計P2將會處在輸出具有誤差之測定壓力值的狀態。是以,依據圖17所示檢查處理,將可檢測複數流量控制器FC個別之第1壓力計P1或是第2壓力計P2處在輸出具有誤差之測定壓力值的狀態。 When both the first pressure gauge P1 and the second pressure gauge P2 of the plural flow controllers are normal, the first valve V1 upstream of the flow controller and the second valve V2 downstream of the flow controller are closed. There is almost no difference between the moving average MVA11 and the moving average MVA12 calculated by the controller. Therefore, when the absolute value of the difference between these two moving averages is greater than the predetermined value PD2, the first pressure gauge P1 or the second pressure gauge P2 of the flow controller will be in a measurement with an error in the output The state of the pressure value. Therefore, according to the inspection process shown in FIG. 17, the first pressure gauge P1 or the second pressure gauge P2 that can detect the plurality of flow controllers FC is in a state of outputting a measured pressure value with an error.

以下,針對可取代圖4所示即時檢查處理RP而使用之即時檢查處理RP2來說明。此即時檢查處理RP2可適用於圖18所示之基板處理裝置。圖18所示基板處理裝置10A在具備有氣體供給系統GPA(進而具有第3壓力計P30)這點係有別於圖1所示基板處理裝置10。第3壓力計P30係測定第3配管L3之內部壓力。此第3壓力計P30之測定壓力值Pm3係輸出至控制部12。 Hereinafter, the instant inspection process RP2 that can be used instead of the instant inspection process RP shown in FIG. 4 will be described. This instant inspection process RP2 can be applied to the substrate processing apparatus shown in FIG. 18. The substrate processing apparatus 10A shown in FIG. 18 is different from the substrate processing apparatus 10 shown in FIG. 1 in that it is equipped with a gas supply system GPA (and further has a third pressure gauge P30). The third pressure gauge P30 measures the internal pressure of the third pipe L3. The measured pressure value Pm3 of the third pressure gauge P30 is output to the control unit 12.

即時檢查處理RP2如圖19所示般在不包含製程ST2這點係有別於圖4所示之即時檢查處理RP。此外,即時檢查處理RP2包含有取代製程ST3之製程ST300,並包含取代製程ST6之製程ST600。關於其他點,即時檢查處理RP2係和即時檢查處理RP同樣。以下,針對製程ST300與製程ST600來說明。於以下之說明中,舉出於基板處理裝置係實行依照一個程序配方的程序,第1流量控制器為流量控制器FC(1),而未進行流量控制(亦即未對處理容器PC供給氣體)之第2流量控制器係流量控制器FC(2)以及流量控制器FC(3)之情況。 The instant inspection process RP2 as shown in FIG. 19 is different from the instant inspection process RP shown in FIG. 4 in that it does not include the process ST2. In addition, the real-time inspection process RP2 includes a process ST300 that replaces the process ST3, and includes a process ST600 that replaces the process ST6. Regarding other points, the immediate inspection process RP2 system is the same as the immediate inspection process RP. Hereinafter, the process ST300 and the process ST600 will be described. In the following description, the substrate processing device executes a program in accordance with a recipe. The first flow controller is the flow controller FC(1), and the flow control is not performed (that is, the processing container PC is not supplied with gas ) The second flow controller is the case of the flow controller FC(2) and the flow controller FC(3).

圖20係顯示製程ST300之流程圖。如圖20所示般,製程ST300中係進行從流量控制器FC(1)所輸出之氣體的輸出流量之過渡特性的檢查。製程ST300包含製程ST301以及製程ST302。製程ST301以及製程ST302中之運算係以控制部12來實行。 Fig. 20 shows a flow chart of the process ST300. As shown in FIG. 20, in the process ST300, the transition characteristic of the output flow rate of the gas output from the flow controller FC(1) is checked. Process ST300 includes process ST301 and process ST302. The calculations in the process ST301 and the process ST302 are executed by the control unit 12.

製程ST301,係算出於經由流量控制器FC(1)對基板處理裝置10A之處理容器PC供給氣體之實行期間中之過渡期間中之複數時點,藉由第3壓力計P30所測定出的複數測定壓力值Pm3之積算值AC3。過渡期間為恆常期間前 之實行期間中之期間。恆常期間為流量控制器FC(1)之輸出流量成為恆常狀態之期間,例如當既定時間內之流量控制器FC(1)之輸出流量之最大值與最小值的差為既定值以下之情況,可判斷流量控制器FC(1)之輸出流量成為恆常狀態。 The process ST301 is calculated from the plural time points in the transition period during the execution period of the gas supply to the processing container PC of the substrate processing apparatus 10A via the flow controller FC(1), and the plural times are measured by the third pressure gauge P30 The cumulative value AC3 of the pressure value Pm3. The transition period is before the constant period The period of the implementation period. The constant period is the period during which the output flow of the flow controller FC(1) becomes a constant state, for example, when the difference between the maximum value and the minimum value of the output flow of the flow controller FC(1) within a predetermined time is less than the predetermined value In this case, it can be judged that the output flow of the flow controller FC(1) has become a constant state.

後續製程ST302,積算值AC3係和既定基準值Ref3做比較。既定基準值Ref3係基準期間中之過渡期間中之複數時點的第3壓力計P30之測定壓力值Pm3之積算值。基準期間為比實行期間更早之前的期間,係依照和在實行期間所利用之程序配方為相同程序配方之程序而在基板處理裝置中所實行過的期間,為流量控制器FC(1)因定於該程序配方所指定的設定流量來控制了輸出流量之期間。例如,基準期間可為在基板處理裝置最初實行依照程序配方之程序的期間。 In the subsequent process ST302, the accumulated value AC3 is compared with the established reference value Ref3. The predetermined reference value Ref3 is the cumulative value of the measured pressure value Pm3 of the third pressure gauge P30 at a plurality of points in the transition period in the reference period. The reference period is the period earlier than the execution period. It is the period executed in the substrate processing apparatus in accordance with the same program recipe as the program recipe used during the execution period. It is the flow controller FC(1). The period during which the output flow rate is controlled at the set flow rate specified by the program recipe. For example, the reference period may be a period during which a program in accordance with the program recipe is initially executed in the substrate processing apparatus.

第3壓力計P30之測定壓力值Pm3係反映流量控制器FC(1)之輸出流量。從而,積算值AC3係反映實行期間中流量控制器FC(1)之輸出流量之過渡特性。藉由將相關積算值AC3來和既定基準值Ref3做比較,可判定實行期間中流量控制器FC(1)之輸出流量之過渡特性是否變化為無法容許之程度。 The measured pressure value Pm3 of the third pressure gauge P30 reflects the output flow rate of the flow controller FC(1). Therefore, the integrated value AC3 reflects the transient characteristics of the output flow rate of the flow controller FC(1) during the execution period. By comparing the correlation integrated value AC3 with the predetermined reference value Ref3, it can be determined whether the transient characteristic of the output flow of the flow controller FC(1) has changed to an unacceptable degree during the execution period.

在製程ST302之比較中,例如當積算值AC3與既定基準值Ref3之差的絕對值為既定值Thc以上之情況,可判定實行期間中之流量控制器FC(1)之輸出流量之過渡特性從基準期間中之流量控制器FC(1)之輸出流量之過渡特性變化為無法容許之程度。當判定實行期間中之流量控制器FC(1)之輸出流量之過渡特性從基準期間中之流量控制器FC(1)之輸出流量之過渡特性變化為無法容許之程度的情況,於製程ST7係藉由控制部12來輸出警報訊號。此外,後續製程ST8中,所實行之程序係由控制部12所停止。另一方面,製程ST302中,當判定實行期間中之流量控制器FC(1)之輸出流量之過渡特性從基準期間中之流量控制器FC(1)之輸出流量之過渡特性僅變化了能容許之程度、或是實行期間中之流量控制器FC(1)之輸出流量之過渡特性和基準期間中之流量控制器FC(1)之輸出流量之過渡特性為相同之情況,係實行後續製程ST600。 In the comparison of process ST302, for example, when the absolute value of the difference between the integrated value AC3 and the predetermined reference value Ref3 is greater than the predetermined value Thc, it can be determined that the transition characteristic of the output flow of the flow controller FC(1) during the execution period is changed from The transition characteristic of the output flow of the flow controller FC(1) in the reference period changes to an unacceptable degree. When the transition characteristic of the output flow of the flow controller FC(1) in the judgment execution period changes from the transition characteristic of the output flow of the flow controller FC(1) in the reference period to an unacceptable degree, in the process ST7 system The control unit 12 outputs an alarm signal. In addition, in the subsequent process ST8, the executed program is stopped by the control unit 12. On the other hand, in process ST302, when the transition characteristic of the output flow of the flow controller FC(1) in the judgment execution period is changed from the transition characteristic of the output flow of the flow controller FC(1) in the reference period, it is only allowable If the transition characteristic of the output flow of the flow controller FC(1) during the execution period and the transition characteristic of the output flow of the flow controller FC(1) during the reference period are the same, the follow-up process ST600 is implemented. .

圖21係顯示製程ST600之流程圖。製程ST600包含製程ST601以及製程ST602。此等製程ST601以及製程ST602之運算可藉由控制部12來實行。 Figure 21 is a flow chart showing the process ST600. Process ST600 includes process ST601 and process ST602. The operations of these processes ST601 and ST602 can be implemented by the control unit 12.

製程ST601中係算出差分絕對值△P3。具體而言,算出實行期間中之恆常期間中藉由第3壓力計P30所測定出的測定壓力值Pm3(恆常壓力值)與基準恆常壓力值之差分絕對值△P3。此基準恆常壓力值係於實行期間之前所定,為基準期間中之恆常期間中由第3壓力計P30所測定出的測定壓力值。 In the process ST601, the absolute value of the difference △P3 is calculated. Specifically, the absolute value ΔP3 of the difference between the measured pressure value Pm3 (constant pressure value) measured by the third pressure gauge P30 and the reference constant pressure value in the constant period of the execution period is calculated. This reference constant pressure value is determined before the execution period, and is the measured pressure value measured by the third pressure gauge P30 during the constant period of the reference period.

後續製程ST602中,判定差分絕對值△P3是否大於閾值Th31。當差分絕對值△P3大於閾值Th31之情況,接著實行製程ST7。另一方面,當差分絕對值△P3為閾值Th31以下之情況,結束即時檢查處理RP2。此外,製程ST600也可於實行期間中之恆常期間中反覆實行。 In the subsequent process ST602, it is determined whether the absolute difference ΔP3 is greater than the threshold Th31. When the absolute difference ΔP3 is greater than the threshold Th31, then the process ST7 is executed. On the other hand, when the absolute difference value ΔP3 is less than or equal to the threshold Th31, the immediate inspection process RP2 is ended. In addition, the process ST600 can also be repeatedly executed during the constant period of the execution period.

實行期間中以對應於設定流量的流量從流量控制器FC(1)輸出的氣體係流往第3配管L3。從而,藉由第3壓力計P30所測定之恆常壓力值係反映恆常狀態中流量控制器FC(1)之輸出流量。此外,基準恆常壓力值係於比實行期間更早之期間(亦即基準期間)中,在對應於相同設定流量而輸出著氣體之流量控制器FC(1)之輸出流量成為恆常狀態時由第3壓力計P30所取得之恆常壓力值。從而,藉由判定恆常壓力值與基準恆常壓力值之差分絕對值△P3是否大於閾值Th31,可判定實行期間中流量控制器FC(1)之恆常狀態之輸出流量是否從基準期間中之流量控制器FC(1)之恆常狀態之輸出流量產生了變化。 During the execution period, the gas system output from the flow controller FC(1) at a flow rate corresponding to the set flow rate flows to the third pipe L3. Therefore, the constant pressure value measured by the third pressure gauge P30 reflects the output flow rate of the flow controller FC(1) in the constant state. In addition, the reference constant pressure value is in a period earlier than the execution period (that is, the reference period), when the output flow rate of the flow controller FC (1) that outputs gas corresponding to the same set flow rate becomes a constant state The constant pressure value obtained by the third pressure gauge P30. Therefore, by determining whether the absolute value of the difference between the constant pressure value and the reference constant pressure value ΔP3 is greater than the threshold Th31, it can be determined whether the output flow rate of the constant state of the flow controller FC(1) during the execution period is from the reference period The output flow rate of the flow controller FC(1) in the constant state has changed.

以上,雖針對實施形態之方法做了說明,但毋須實行上述複數檢查處理的全部,亦可僅實行此等複數檢查處理當中數個的檢查處理。 Although the method of the embodiment has been described above, it is not necessary to perform all of the above-mentioned plural inspection processes, and only a few of the plural inspection processes may be executed.

ST61‧‧‧算出第1差分絕對值△P1以及第2差分絕對值△P2 ST61‧‧‧Calculate the first difference absolute value △P1 and the second difference absolute value △P2

ST62‧‧‧算出平均值Ave ST62‧‧‧Calculate the average Ave

ST63‧‧‧△P1>Th1或△P2>Th2或Ave>Th3? ST63‧‧‧△P1>Th1 or △P2>Th2 or Ave>Th3?

Claims (15)

一種檢查氣體供給系統之方法,該氣體供給系統係對基板處理裝置之處理容器內供給氣體者;該氣體供給系統具備有:複數第1配管,係分別連接於複數氣體源;複數第1閥,係分別設於該複數第1配管;複數流量控制器,係分別設於該複數第1配管之下游,而分別連接於該複數第1配管;複數第2配管,係分別設於該複數流量控制器之下游,而分別連接於該複數流量控制器;複數第2閥,係分別設於該複數第2配管;第3配管,係設於該複數第2配管之下游,而連接於該複數第2配管;以及第3閥,係設於該第3配管;該第3配管於該第3閥之下游係連接於該處理容器;該複數流量控制器分別具有:銳孔;第4配管,係延伸於該銳孔之上游而連接於該第1配管;第5配管,係延伸於該銳孔之下游而連接於該第2配管;控制閥,係設於該第4配管;第1壓力計,係於該控制閥與該銳孔之間用以測定該第4配管之內部壓力;以及,第2壓力計,係用以測定該第5配管之內部壓力;該方法包含下述製程:對於經由該複數流量控制器當中之第1流量控制器而供給於該處理容器內的氣體流量進行控制之製程,其中該氣體流量係於第1流量控制器對應於設定流量而受到控制;於控制氣體流量之該製程之實行期間,開啟該複數第2閥當中之一以上的第2閥之製程,該一以上的第2閥係於該複數流量控制器當中未控制氣體流量之一以上的第2流量控制器之下游所設者;求出一以上的第1差分絕對值以及一以上的第2差分絕對值之製程,其中該一以上的第1差分絕對值個別為在該第1流量控制器之輸出流量成為恆 常狀態之恆常期間中藉由該一以上的第2流量控制器個別之該第1壓力計所測定出的第1恆常壓力值與第1基準恆常壓力值之間的差分絕對值,該一以上的第2差分絕對值個別為在該恆常期間中藉由該一以上的第2流量控制器個別之該第2壓力計所測定出的第2恆常壓力值與第2基準恆常壓力值之間的差分絕對值,該第1基準恆常壓力值以及該第2基準恆常壓力值分別在比該實行期間更早前被決定,對應於該設定流量來控制著供給至該處理容器內之氣體流量的該第1流量控制器之輸出流量在成為該恆常狀態時係藉由該一以上的第2流量控制器個別之該第1壓力計以及該第2壓力計分別所測定出的測定壓力值,該第1基準恆常壓力值及該第2基準恆常壓力值為藉由在該實行期間前之基準期間的期間為恆常狀態之該第2流量控制器所測定的測定值;求出該一以上的第1差分絕對值以及該一以上的第2差分絕對值之平均值之製程;以及藉由判定該一以上的第1差分絕對值個別是否大於第1閾值、該一以上的第2差分絕對值個別是否大於第2閾值、以及該平均值是否大於第3閾值之製程,來判定在該實行期間的期間而在該恆常狀態下該第1流量控制器的輸出流量是否從該基準期間的期間而在該恆常狀態下該第1流量控制器的輸出流量產生變化。 A method for inspecting a gas supply system, the gas supply system is to supply gas into the processing container of a substrate processing apparatus; the gas supply system is provided with: a plurality of first pipes which are respectively connected to a plurality of gas sources; a plurality of first valves, Are respectively installed in the plural first piping; plural flow controllers are respectively installed downstream of the plural first piping, and respectively connected to the plural first piping; plural second piping are respectively installed in the plural flow control The downstream of the device is connected to the plural flow controllers; the plural second valves are respectively arranged in the plural second pipes; the third pipe is arranged downstream of the plural second pipes, and is connected to the plural second pipes. 2 piping; and a third valve, which is provided in the third piping; the third piping is connected to the processing vessel downstream of the third valve; the plurality of flow controllers respectively have: an orifice; a fourth piping, Extending upstream of the orifice and connected to the first piping; fifth piping, extending downstream of the orifice and connected to the second piping; control valve, connected to the fourth piping; first pressure gauge , Is used between the control valve and the orifice to measure the internal pressure of the fourth pipe; and, the second pressure gauge is used to measure the internal pressure of the fifth pipe; the method includes the following process: A process in which the gas flow rate supplied into the processing vessel is controlled by the first flow controller among the plurality of flow controllers, wherein the gas flow rate is controlled by the first flow controller corresponding to the set flow rate; in controlling the gas During the execution of the flow of the process, the process of opening one or more of the second valves among the plurality of second valves, and the one or more second valves are the second valves in the plurality of flow controllers that do not control more than one of the gas flow rates It is set downstream of the flow controller; the process of finding more than one absolute value of the first difference and more than one absolute value of the second difference, wherein the one or more first absolute values of the difference are individually in the first flow controller The output flow becomes constant The absolute value of the difference between the first constant pressure value and the first reference constant pressure value measured by the first pressure gauge of the one or more second flow controllers during the constant period of the normal state, The one or more second difference absolute values are the second constant pressure value and the second reference constant measured by the second pressure gauge of the one or more second flow controllers during the constant period. The absolute value of the difference between the normal pressure values. The first reference constant pressure value and the second reference constant pressure value are respectively determined earlier than the execution period, and the supply to the set flow rate is controlled in accordance with the set flow rate. When the output flow rate of the first flow controller for the gas flow rate in the processing vessel becomes the constant state, the first pressure gauge and the second pressure gauge are respectively controlled by the one or more second flow controllers. The measured measured pressure value, the first reference constant pressure value and the second reference constant pressure value are measured by the second flow controller in the constant state during the reference period before the execution period The process of obtaining the average value of the one or more first difference absolute values and the one or more second difference absolute values; and by determining whether the one or more first difference absolute values are individually greater than the first threshold , The process of determining whether the absolute value of the one or more second difference is greater than the second threshold value and whether the average value is greater than the third threshold value to determine the first flow controller during the execution period and in the constant state Whether the output flow rate of the first flow controller changes from the period of the reference period in the constant state. 如申請專利範圍第1項之檢查氣體供給系統之方法,其中該一以上的第2流量控制器為該複數流量控制器當中在該實行期間未控制氣體流量之複數第2流量控制器;該一以上的第1差分絕對值以及該一以上的第2差分絕對值係藉由求出該恆常期間中藉由該複數第2流量控制器個別之該第1壓力計所測定之第1恆常壓力值與該第1基準恆常壓力值之間的差分絕對值以及該恆常期間中藉由該複數第2流量控制器個別之該第2壓力計所測定之第2恆常壓力值與該第2基準恆常壓力值之間的差分絕對值而得到之複數第1差分絕對值以及複數第2差分絕對值;該平均值為該複數第1差分絕對值以及該複數第2差分絕對值之平均值; 於進行判定之該製程中,係判定該複數第1差分絕對值個別是否大於第1閾值、該複數第2差分絕對值個別是否大於第2閾值、以及該平均值是否大於第3閾值。 For example, the method for inspecting a gas supply system in the first item of the scope of patent application, wherein the one or more second flow controllers are the plurality of second flow controllers that do not control the gas flow during the implementation period; the one The above first absolute value of the difference and the one or more second absolute values of the difference are obtained by obtaining the first constant measured by the first pressure gauge of the plurality of second flow controllers during the constant period The absolute value of the difference between the pressure value and the first reference constant pressure value, and the second constant pressure value measured by the second pressure gauge of the plurality of second flow controllers during the constant period and the second constant pressure value. The complex first difference absolute value and the complex second difference absolute value obtained from the difference absolute value between the second reference constant pressure value; the average value is the difference between the complex first difference absolute value and the complex second difference absolute value average value; In the process of determining, it is determined whether the plurality of first absolute difference values are individually greater than the first threshold, whether the plurality of second absolute differences are individually greater than the second threshold, and whether the average value is greater than the third threshold. 如申請專利範圍第1或2項之檢查氣體供給系統之方法,係進而包含下述製程:求出該實行期間中、且較該恆常期間為前之過渡期間中之複數時點之該第1流量控制器之該第2壓力計之測定壓力值的積算值之製程;以及比較該積算值與既定基準值之製程。 For example, the method of inspecting the gas supply system in item 1 or 2 of the scope of the patent application further includes the following process: finding the first time point in the transition period before the constant period in the implementation period The manufacturing process of the integrated value of the measured pressure value of the second pressure gauge of the flow controller; and the manufacturing process of comparing the integrated value with a predetermined reference value. 如申請專利範圍第1或2項之檢查氣體供給系統之方法,係進而包含下述製程:求出該實行期間中、且較該恆常期間為前之過渡期間中之複數時點之該一以上的第2流量控制器之該第1壓力計之測定壓力值的積算值之製程;以及比較該積算值與既定基準值之製程。 For example, the method for inspecting the gas supply system in item 1 or 2 of the scope of the patent application further includes the following process: finding the one or more of the multiple points in the transition period before the constant period during the execution period The manufacturing process of the cumulative value of the measured pressure value of the first pressure gauge of the second flow controller; and the manufacturing process of comparing the cumulative value with a predetermined reference value. 一種檢查氣體供給系統之方法,該氣體供給系統係對基板處理裝置之處理容器內供給氣體者;該氣體供給系統具備有:複數第1配管,係分別連接於複數氣體源;複數第1閥,係分別設於該複數第1配管;複數流量控制器,係分別設於該複數第1配管之下游,而分別連接於該複數第1配管;複數第2配管,係分別設於該複數流量控制器之下游,而分別連接於該複數流量控制器;複數第2閥,係分別設於該複數第2配管;第3配管,係設於該複數第2配管之下游,而連接於該複數第2配管;以及第3閥,係設於該第3配管;該第3配管於該第3閥之下游係連接於該處理容器;該複數流量控制器分別具有:銳孔;第4配管,係延伸於該銳孔之上游 而連接於該第1配管;第5配管,係延伸於該銳孔之下游而連接於該第2配管;控制閥,係設於該第4配管;第1壓力計,係於該控制閥與該銳孔之間用以測定該第4配管之內部壓力;以及,第2壓力計,係用以測定該第5配管之內部壓力;該氣體供給系統具備有用以測定該第3配管之內部壓力的第3壓力計;該方法包含下述製程:對於經由該複數流量控制器當中之第1流量控制器而供給於該處理容器內的氣體流量進行控制之製程,其中該氣體流量係於第1流量控制器對應於設定流量而受到控制;求出差分絕對值之製程,該差分絕對值為該第1流量控制器之輸出流量成為恆常狀態之恆常期間中由該第3壓力計所測定出的恆常壓力值與基準恆常壓力值之間的差分絕對值,該基準恆常壓力值係較控制氣體流量之該製程的實行期間更早前所決定,為對應於該設定流量來控制著供給於該處理容器內之氣體流量的該第1流量控制器之輸出流量成為該恆常狀態時由該第3壓力計所測定出的測定壓力值,其中該基準恆常壓力值為藉由在該實行期間前之基準期間的期間為恆常狀態之該第3壓力計所測定的測定值;以及藉由判定該差分絕對值是否大於閾值之製程,來判定在該實行期間的期間而在該恆常狀態下該第1流量控制器的輸出流量是否從該基準期間的期間而在該恆常狀態下該第1流量控制器的輸出流量產生變化。 A method for inspecting a gas supply system, the gas supply system is to supply gas into the processing container of a substrate processing apparatus; the gas supply system is provided with: a plurality of first pipes which are respectively connected to a plurality of gas sources; a plurality of first valves, Are respectively installed in the plural first piping; plural flow controllers are respectively installed downstream of the plural first piping, and respectively connected to the plural first piping; plural second piping are respectively installed in the plural flow control The downstream of the device is connected to the plural flow controllers; the plural second valves are respectively arranged in the plural second pipes; the third pipe is arranged downstream of the plural second pipes, and is connected to the plural second pipes. 2 piping; and a third valve, which is provided in the third piping; the third piping is connected to the processing vessel downstream of the third valve; the plurality of flow controllers respectively have: an orifice; a fourth piping, Extending upstream of the orifice And connected to the first pipe; the fifth pipe, which extends downstream of the orifice and is connected to the second pipe; the control valve, which is connected to the fourth pipe; the first pressure gauge, which is connected to the control valve and The orifice is used to measure the internal pressure of the fourth pipe; and, the second pressure gauge is used to measure the internal pressure of the fifth pipe; the gas supply system is equipped to measure the internal pressure of the third pipe The third pressure gauge; the method includes the following process: a process for controlling the flow of gas supplied to the processing vessel through the first flow controller of the plurality of flow controllers, wherein the gas flow is in the first The flow controller is controlled corresponding to the set flow; the process of obtaining the absolute value of the difference, the absolute value of which is measured by the third pressure gauge during the constant period when the output flow of the first flow controller becomes a constant state The absolute value of the difference between the output constant pressure value and the reference constant pressure value. The reference constant pressure value is determined earlier than the execution period of the process that controls the gas flow, and is controlled corresponding to the set flow. The output flow rate of the first flow controller for the gas flow rate supplied to the processing vessel becomes the measured pressure value measured by the third pressure gauge when the constant state is reached, wherein the reference constant pressure value is determined by The period of the reference period before the execution period is the measured value measured by the third pressure gauge in a constant state; and by determining whether the absolute value of the difference is greater than the threshold value, it is determined during the period of the execution period. Whether the output flow rate of the first flow controller in the constant state changes from the period of the reference period to the output flow rate of the first flow controller in the constant state. 如申請專利範圍第5項之檢查氣體供給系統之方法,係進而包含下述製程:求出該實行期間中、且較該恆常期間為前之過渡期間中之複數時點的該第3壓力計之測定壓力值之積算值之製程;以及比較該積算值與既定基準值之製程。 For example, the method for inspecting the gas supply system in item 5 of the scope of the patent application further includes the following process: find the third pressure gauge in the execution period and the plural time points in the transition period before the constant period The process of measuring the accumulated value of the pressure value; and the process of comparing the accumulated value with the established reference value. 一種檢查氣體供給系統之方法,該氣體供給系統係對基板處理裝置之處理容器內供給氣體者;該氣體供給系統具備有:複數第1配管,係分別連接於複數氣體源; 複數第1閥,係分別設於該複數第1配管;複數流量控制器,係分別設於該複數第1配管之下游,而分別連接於該複數第1配管;複數第2配管,係分別設於該複數流量控制器之下游,而分別連接於該複數流量控制器;複數第2閥,係分別設於該複數第2配管;第3配管,係設於該複數第2配管之下游,而連接於該複數第2配管;以及第3閥,係設於該第3配管;該第3配管於該第3閥之下游係連接於該處理容器;該複數流量控制器分別具有:銳孔;第4配管,係延伸於該銳孔之上游而連接於該第1配管;第5配管,係延伸於該銳孔之下游而連接於該第2配管;控制閥,係設於該第4配管;第1壓力計,係於該控制閥與該銳孔之間用以測定該第4配管之內部壓力;以及,第2壓力計,係用以測定該第5配管之內部壓力;該方法包含下述製程:對於經由該複數流量控制器當中之第1流量控制器而供給於該處理容器內的氣體流量進行控制之製程,其中該氣體流量係於第1流量控制器對應於設定流量而受到控制;於控制氣體流量之該製程之實行期間,開啟該複數第2閥當中之一以上的第2閥之製程,該一以上的第2閥係於該複數流量控制器當中未控制氣體流量之一以上的第2流量控制器之下游所設者;求出一以上之第1差分絕對值以及一以上之第2差分絕對值的平均值之製程,係求出該一以上的第1差分絕對值以及該一以上的第2差分絕對值之製程,其中該一以上的第1差分絕對值個別為在該第1流量控制器之輸出流量成為恆常狀態之恆常期間中藉由該一以上的第2流量控制器個別之該第1壓力計所測定出的第1恆常壓力值與第1基準恆常壓力值之間的差分絕對值,該一以上的第2差分絕對值個別為在該恆常期間中藉由該一以上的第2流量控制器個別之該第2壓力計所測定出的第2恆常壓力值與第2基準恆常 壓力值之間的差分絕對值,該第1基準恆常壓力值以及該第2基準恆常壓力值分別在比該實行期間更早前被決定,對應於該設定流量來控制著供給至該處理容器內之氣體流量的該第1流量控制器之輸出流量在成為該恆常狀態時係藉由該一以上的第2流量控制器個別之該第1壓力計以及該第2壓力計分別所測定出的測定壓力值;藉由判定該一以上的第1差分絕對值個別是否大於第1閾值、該一以上的第2差分絕對值個別是否大於第2閾值、以及該平均值是否大於第3閾值,該複數流量控制器個別之該控制閥進而具有驅動部,該驅動部包含:壓電元件,係以使得該控制閥之開閉動作所用的閥體做移動的方式所構成;以及,控制電路,係以對該壓電元件施加電壓的方式所構成;進而包含下述製程:判定該實行期間中對該第1流量控制器之該壓電元件的施加電壓是否和做為對該第1流量控制器之該控制閥全開時之該壓電元件的施加電壓所預先設定之基準電壓相同、以及判定該實行期間中之該第1流量控制器之輸出流量是否小於該設定流量。 A method for inspecting a gas supply system, the gas supply system is a device that supplies gas into a processing container of a substrate processing apparatus; the gas supply system is provided with: a plurality of first pipes which are respectively connected to a plurality of gas sources; The plural first valves are respectively installed in the plural first piping; plural flow controllers are respectively installed downstream of the plural first piping and connected to the plural first piping respectively; the plural second piping are respectively installed Downstream of the plurality of flow controllers and respectively connected to the plurality of flow controllers; a plurality of second valves are respectively provided in the plurality of second piping; the third piping is provided downstream of the plurality of second piping, and Connected to the plurality of second pipes; and a third valve, which is provided in the third pipe; the third pipe is connected to the processing vessel downstream of the third valve; the plurality of flow controllers respectively have: orifices; The fourth pipe extends upstream of the orifice and is connected to the first pipe; the fifth pipe extends downstream of the orifice and is connected to the second pipe; the control valve is connected to the fourth pipe ; The first pressure gauge is used to measure the internal pressure of the fourth pipe between the control valve and the orifice; and, the second pressure gauge is used to measure the internal pressure of the fifth pipe; the method includes The following process: a process for controlling the flow of gas supplied into the processing vessel via the first flow controller among the plurality of flow controllers, wherein the gas flow is controlled by the first flow controller corresponding to the set flow Control; during the execution of the process that controls the gas flow, the process of opening one or more of the second valves among the plurality of second valves, and the one or more second valves are in the plurality of flow controllers that do not control the gas flow It is installed downstream of more than one second flow controller; the process of obtaining the average value of the first difference absolute value of more than one and the average value of the second difference absolute value of more than one is to obtain the first difference absolute value of the one or more Value and the process of the one or more second difference absolute values, wherein the one or more first difference absolute values are individually achieved by the one or more during the constant period when the output flow of the first flow controller becomes a constant state The absolute value of the difference between the first constant pressure value measured by the first pressure gauge and the first reference constant pressure value of the second flow controller individually, and the second absolute value of the difference between the one or more absolute values During the constant period, the second constant pressure value measured by the second pressure gauge of the one or more second flow controllers and the second reference constant The absolute value of the difference between the pressure values, the first reference constant pressure value and the second reference constant pressure value are respectively determined earlier than the execution period, and the supply to the process is controlled according to the set flow rate When the output flow rate of the first flow controller of the gas flow rate in the container becomes the constant state, it is measured by the first pressure gauge and the second pressure gauge of the one or more second flow controllers respectively By determining whether the one or more first difference absolute values are individually greater than the first threshold, whether the one or more second absolute differences are individually greater than the second threshold, and whether the average value is greater than the third threshold , The control valve of the plurality of flow controllers further has a driving part, and the driving part includes a piezoelectric element, which is configured to move a valve body used in the opening and closing actions of the control valve; and, a control circuit, It is constituted by applying voltage to the piezoelectric element; further includes the following process: determining whether the applied voltage to the piezoelectric element of the first flow controller during the execution period is the same as the first flow control When the control valve of the device is fully opened, the reference voltage preset for the applied voltage of the piezoelectric element is the same, and it is determined whether the output flow rate of the first flow controller during the execution period is less than the set flow rate. 如申請專利範圍第1、2、5、6或7項之檢查氣體供給系統之方法,係進而包含下述製程:判定該實行期間中之該第1流量控制器之該第1壓力計之測定壓力值與該實行期間中之該第1流量控制器之該第2壓力計之測定壓力值之差是否為既定值以下。 For example, the method for inspecting the gas supply system of item 1, 2, 5, 6 or 7 in the scope of the patent application further includes the following process: determining the measurement of the first pressure gauge of the first flow controller during the execution period Whether the difference between the pressure value and the measured pressure value of the second pressure gauge of the first flow controller during the execution period is less than a predetermined value. 如申請專利範圍第1、2、5、6或7項之檢查氣體供給系統之方法,係進而包含下述製程:在該複數流量控制器之內部氣體已排氣之狀態下,判定該複數流量控制器個別之該第1壓力計之測定壓力值是否大於第1既定值、以及判定該複數流量控制器個別之該第2壓力計之測定壓力值是否大於第2既定值。 For example, the method for inspecting the gas supply system of item 1, 2, 5, 6 or 7 of the scope of patent application further includes the following process: in the state where the internal gas of the plurality of flow controllers has been exhausted, determine the plurality of flow rates Whether the measured pressure value of the first pressure gauge of the individual controller is greater than the first predetermined value, and determine whether the measured pressure value of the second pressure gauge of the plurality of flow controllers is greater than the second predetermined value. 如申請專利範圍第1、2、5、6或7項之檢查氣體供給系統之方法,係進而包含下述製程:在該複數流量控制器之內部氣體已排氣之狀態下,判定既定時間內該複數流量控制器個別之該第1壓力計所測定出的複數測定壓力值之移動平均值與該第2壓力計所測定出的複數測定壓力值之移動平均值的差分絕對值是否為既定值以上。 For example, the method for inspecting the gas supply system of item 1, 2, 5, 6 or 7 in the scope of the patent application further includes the following process: in the state where the internal gas of the plurality of flow controllers has been exhausted, it is determined within a predetermined time Whether the absolute value of the difference between the moving average value of the plural measured pressure values measured by the first pressure gauge of the plural flow controller and the moving average value of the plural measured pressure values measured by the second pressure gauge is a predetermined value the above. 如申請專利範圍第1、2、5、6或7項之檢查氣體供給系統之方法,係 進而包含下述製程:在該複數第1閥以及該複數第2閥呈現關閉之狀態下取得由該複數流量控制器個別之該第1壓力計所測定之第1測定壓力值以及由該複數流量控制器個別之該第2壓力計所測定之第2測定壓力值之製程;藉由將該第1測定壓力值輸入於預定之函數,來取得和該第1測定壓力值相對應之該第2壓力計之初期壓力值之製程;以及比較該第2測定壓力值與該初期壓力值之製程。 For example, the method of inspecting the gas supply system in items 1, 2, 5, 6 or 7 of the scope of patent application is It further includes the following process: obtaining the first measured pressure value measured by the first pressure gauge of the plurality of flow controllers and the plurality of flow rates in a state where the plurality of first valves and the plurality of second valves are closed The manufacturing process of the second measured pressure value measured by the second pressure gauge of the individual controller; by inputting the first measured pressure value into a predetermined function, the second measured pressure value corresponding to the first measured pressure value is obtained The manufacturing process of the initial pressure value of the pressure gauge; and the manufacturing process of comparing the second measured pressure value with the initial pressure value. 如申請專利範圍第1、2、5、6或7項之檢查氣體供給系統之方法,係進而包含下述製程:在該複數第1閥以及該複數第2閥呈現關閉之狀態下,判定既定時間內由該複數流量控制器個別之該第1壓力計所測定出的複數測定壓力值之移動平均值與由該第2壓力計所測定出的複數測定壓力值之移動平均值的差分絕對值是否為既定值以上。 For example, the method for inspecting the gas supply system of item 1, 2, 5, 6 or 7 of the scope of patent application further includes the following process: when the plural first valves and the plural second valves are closed, it is determined that the predetermined The absolute value of the difference between the moving average value of the plural measured pressure values measured by the first pressure gauge of the plural flow controller and the moving average value of the plural measured pressure values measured by the second pressure gauge during the time Is it above the predetermined value? 如申請專利範圍第1、2、5、6或7項之檢查氣體供給系統之方法,係進而包含下述製程:在該複數流量控制器個別之該控制閥處於關閉之狀態下,判定是否經過了既定時間。 For example, the method for inspecting the gas supply system of item 1, 2, 5, 6 or 7 of the scope of patent application further includes the following process: when the control valve of the plural flow controller is closed, it is judged whether it passes The set time. 一種檢查氣體供給系統之方法,該氣體供給系統係對基板處理裝置之處理容器內供給氣體者;該氣體供給系統具備有:複數第1配管,係分別連接於複數氣體源;複數第1閥,係分別設於該複數第1配管;複數流量控制器,係分別設於該複數第1配管之下游,而分別連接於該複數第1配管;複數第2配管,係分別設於該複數流量控制器之下游,而分別連接於該複數流量控制器;複數第2閥,係分別設於該複數第2配管;第3配管,係設於該複數第2配管之下游,而連接於該複數第2配管;以及第3閥,係設於該第3配管;該第3配管於該第3閥之下游係連接於該處理容器; 該複數流量控制器分別具有:銳孔;第4配管,係延伸於該銳孔之上游而連接於該第1配管;第5配管,係延伸於該銳孔之下游而連接於該第2配管;控制閥,係設於該第4配管;第1壓力計,係於該控制閥與該銳孔之間用以測定該第4配管之內部壓力;以及,第2壓力計,係用以測定該第5配管之內部壓力;該方法包含下述製程:對於經由該複數流量控制器當中之第1流量控制器而供給於該處理容器內的氣體流量進行控制之製程,其中該氣體流量係於第1流量控制器對應於設定流量而受到控制;於控制氣體流量之該製程之實行期間,開啟該複數第2閥當中之一以上的第2閥之製程,該一以上的第2閥係於該複數流量控制器當中未控制氣體流量之一以上的第2流量控制器之下游所設者;求出一以上之第1差分絕對值以及一以上之第2差分絕對值的平均值之製程,係求出該一以上的第1差分絕對值以及該一以上的第2差分絕對值之製程,其中該一以上的第1差分絕對值個別為在該第1流量控制器之輸出流量成為恆常狀態之恆常期間中藉由該一以上的第2流量控制器個別之該第1壓力計所測定出的第1恆常壓力值與第1基準恆常壓力值之間的差分絕對值,該一以上的第2差分絕對值個別為在該恆常期間中藉由該一以上的第2流量控制器個別之該第2壓力計所測定出的第2恆常壓力值與第2基準恆常壓力值之間的差分絕對值,該第1基準恆常壓力值以及該第2基準恆常壓力值分別在比該實行期間更早前被決定,對應於該設定流量來控制著供給至該處理容器內之氣體流量的該第1流量控制器之輸出流量在成為該恆常狀態時係藉由該一以上的第2流量控制器個別之該第1壓力計以及該第2壓力計分別所測定出的測定壓力值;藉由判定該一以上的第1差分絕對值個別是否大於第1閾值、該一以上的第2差分絕對值個別是否大於第2閾值、以及該平均值是否大於第3閾值,該複數流量控制器個別之該控制閥進而具有驅動部,該驅動部包含:壓電元件,係以使得該控制閥之開閉動作所用的閥體做移動的方式所構成;以及,控制電路,係以對該壓電元件施加電壓的方式所構成; 進而包含下述製程:當對該複數流量控制器個別之該壓電元件的施加電壓和該流量控制器之該控制閥為關閉時做為對該壓電元件的施加電壓所事先設定之基準電壓為相同之情況,判定該複數流量控制器個別之第1壓力計之測定壓力值是否增加為既定值以上。 A method for inspecting a gas supply system, the gas supply system is to supply gas into the processing container of a substrate processing apparatus; the gas supply system is provided with: a plurality of first pipes which are respectively connected to a plurality of gas sources; a plurality of first valves, Are respectively installed in the plural first piping; plural flow controllers are respectively installed downstream of the plural first piping, and respectively connected to the plural first piping; plural second piping are respectively installed in the plural flow control The downstream of the device is connected to the plural flow controllers; the plural second valves are respectively arranged in the plural second pipes; the third pipe is arranged downstream of the plural second pipes, and is connected to the plural second pipes. 2 piping; and a third valve, which is provided in the third piping; the third piping is connected to the processing vessel downstream of the third valve; The plurality of flow controllers respectively have: an orifice; a fourth pipe extending upstream of the orifice and connected to the first pipe; a fifth pipe extending downstream of the orifice and connected to the second pipe ; The control valve is located in the fourth pipe; the first pressure gauge is used between the control valve and the orifice to measure the internal pressure of the fourth pipe; and the second pressure gauge is used to measure The internal pressure of the fifth piping; the method includes the following process: a process of controlling the flow of gas supplied into the processing vessel through the first flow controller among the plurality of flow controllers, wherein the gas flow is at The first flow controller is controlled corresponding to the set flow; during the execution of the process that controls the gas flow, one or more of the second valves are opened in the process of the second valve, and the one or more second valves are connected to Among the plurality of flow controllers, the one installed downstream of the second flow controller that does not control more than one of the gas flow; the process of finding the average value of more than one first difference absolute value and more than one second difference absolute value, The process of obtaining the absolute value of the one or more first difference and the absolute value of the second difference of the one or more, wherein the absolute value of the first difference of the one or more is that the output flow rate of the first flow controller becomes constant During the constant period of the state, the absolute value of the difference between the first constant pressure value measured by the first pressure gauge of the one or more second flow controllers and the first reference constant pressure value, the The one or more second difference absolute values are the second constant pressure value and the second reference constant measured by the second pressure gauge of the one or more second flow controllers during the constant period. The absolute value of the difference between the pressure values, the first reference constant pressure value and the second reference constant pressure value are respectively determined earlier than the execution period, and the supply to the process is controlled according to the set flow rate When the output flow rate of the first flow controller of the gas flow rate in the container becomes the constant state, it is measured by the first pressure gauge and the second pressure gauge of the one or more second flow controllers respectively By determining whether the one or more first difference absolute values are individually greater than the first threshold, whether the one or more second absolute differences are individually greater than the second threshold, and whether the average value is greater than the third threshold , The control valve of the plurality of flow controllers further has a driving part, and the driving part includes a piezoelectric element, which is configured to move a valve body used in the opening and closing actions of the control valve; and, a control circuit, It is constructed by applying voltage to the piezoelectric element; It further includes the following process: when the applied voltage to the piezoelectric element of the plurality of flow controllers and the control valve of the flow controller are closed, the reference voltage is set in advance as the applied voltage to the piezoelectric element If it is the same, it is determined whether the measured pressure value of the first pressure gauge of the plural flow controller has increased above the predetermined value. 如申請專利範圍第14項之檢查氣體供給系統之方法,係進而包含下述製程:當該複數第2閥個別呈現關閉、對該複數流量控制器個別之該壓電元件的施加電壓和該基準電壓為相同之情況,判定該複數流量控制器個別之該第1壓力計之測定壓力值是否有減少。 For example, the method for inspecting the gas supply system of item 14 of the scope of patent application further includes the following process: when the plurality of second valves are individually closed, the applied voltage of the piezoelectric element of the plurality of flow controllers and the reference If the voltage is the same, it is determined whether the measured pressure value of the first pressure gauge of the plurality of flow controllers has decreased.
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