TWI721760B - Electroplating device and method - Google Patents
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Abstract
一種電鍍裝置及使用該電鍍裝置的電鍍方法,電鍍裝置包括電鍍槽體、電源模組、一對陽極板、吊掛模組、驅動模組以及控制模組;透過驅動模組設於電鍍槽體上方且驅動吊掛模組,並移動該等被鍍物;控制模組控制驅動模組,驅動模組驅動吊掛模組,使相鄰的該等被鍍物間的間距係小於或等於10毫米,據此,透過被鍍物的寬度及相鄰被鍍物的間距決定每個被鍍物吊掛的位置,而且控制在所有被鍍物都進入電解槽體後才開始通電,藉此提高每次吊掛的使用率而且也能有效達到被鍍物的鍍層厚度一致之優勢。An electroplating device and an electroplating method using the electroplating device. The electroplating device includes an electroplating tank, a power supply module, a pair of anode plates, a hanging module, a driving module, and a control module; the electroplating device is arranged in the electroplating tank through the driving module Above and drive the hanging module and move the objects to be plated; the control module controls the drive module, and the drive module drives the hanging module so that the distance between adjacent objects to be plated is less than or equal to 10 Millimeters, according to this, the hanging position of each plated object is determined by the width of the plated object and the distance between adjacent plated objects, and it is controlled to start energizing after all the plated objects enter the electrolytic cell body, thereby improving The usage rate of each hanger can also effectively achieve the advantage of consistent coating thickness of the object to be plated.
Description
本發明係有關於一種電鍍裝置及電鍍方法,特別是有關於一種可根據被電鍍物寬度及相鄰被電鍍物間距,計算各被電鍍物的吊掛位置,且在所有的被電鍍物均排列到定位後才開始進行電鍍的電鍍裝置及使用該電鍍裝置的電鍍方法。The present invention relates to an electroplating device and an electroplating method, in particular to a method that can calculate the hanging position of each electroplated object according to the width of the electroplated object and the distance between adjacent electroplated objects, and arrange all the objects to be electroplated An electroplating device that starts electroplating after positioning and an electroplating method using the electroplating device.
現有的電鍍裝置區分為兩種,在其中一種電鍍裝置中電鍍槽包含入料口及出料口,多個被電鍍物經由電鍍槽的入料口逐一依序地被放入而且吊掛在電鍍槽內,並且被電鍍物會依照行進路徑依序地被移動到電鍍槽的出料口,在電鍍完成後接著由出料口被移出電鍍槽。這種方式又被稱為『上、下料不同側』的電鍍裝置,例如入料口是在電鍍槽的前側,而出料口則是在電鍍槽的後側。另外一種電鍍裝置中,電鍍槽則是只包含一個進出口,例如進出口是在電鍍槽的前側,而被電鍍物的入料位置及出料位置分別在進出口的左、右兩側。多個被電鍍物經由電鍍槽的前側的進出口的左側的入料位置,逐一依序地被放入而且吊掛在電鍍槽內,被電鍍物會依照行進路徑依序地被移動到電鍍槽的後側,並且在後側進行行進路徑的U形迴轉,接著再由U形迴轉後的行進路徑,將被電鍍物由電鍍槽的後側移動到電鍍槽的前側的進出口的右側的出料位置,在電鍍完成後接著由出料位置被移出電鍍槽。這種方式又被稱為『上、下料相同側』的電鍍裝置。There are two types of existing electroplating devices. In one of the electroplating devices, the electroplating tank includes a material inlet and a discharge port. A plurality of objects to be electroplated are sequentially put into and hung in the electroplating tank through the material inlet of the electroplating tank. Inside the tank, and the objects to be electroplated will be moved to the discharge port of the electroplating tank in sequence according to the travel path, and then moved out of the electroplating tank from the discharge port after the electroplating is completed. This method is also known as an electroplating device with "loading and unloading on different sides". For example, the inlet is on the front side of the electroplating tank, and the outlet is on the back side of the electroplating tank. In another type of electroplating device, the electroplating tank contains only one inlet and outlet. For example, the inlet and outlet are on the front side of the electroplating tank, and the feeding and discharging positions of the electroplated objects are on the left and right sides of the inlet and outlet respectively. A plurality of objects to be plated are sequentially placed and hung in the electroplating tank through the feeding position on the left side of the entrance and exit of the front side of the electroplating tank, and the objects to be plated will be moved to the electroplating tank in sequence according to the travel path. The U-shaped rotation of the travel path is performed on the back side, and then the travel path after the U-shaped rotation moves the object to be electroplated from the back side of the electroplating tank to the exit on the right side of the inlet and outlet on the front side of the electroplating tank. The material position is moved out of the electroplating tank from the material discharging position after the electroplating is completed. This method is also called "the same side of loading and unloading" electroplating device.
前述現有的電鍍裝置,各被鍍物的放置位置都是固定,也就是不論被鍍物的寬度為多少,每個被鍍物都放置在相同的位置,一次都放置相同數量的被鍍物,但是對於寬度較小的被鍍物而言則會造成電鍍裝置的使用率浪費,而且造成相鄰的被鍍物之間的間距相對較大。而且,在電鍍的過程中,被鍍物邊緣的電流密度較強,因此被鍍物邊緣會形成厚度較大的鍍層,因而有被鍍物的鍍層厚度不一致的問題。In the aforementioned existing electroplating device, the placement position of each object to be plated is fixed, that is, regardless of the width of the object to be plated, each object to be plated is placed in the same position, and the same number of objects to be plated are placed at a time. However, for objects to be plated with a small width, the utilization rate of the electroplating device is wasted, and the distance between adjacent objects to be plated is relatively large. Moreover, during the electroplating process, the current density at the edge of the object to be plated is relatively strong, so a thicker plating layer is formed on the edge of the object to be plated, so there is a problem of inconsistent plating thickness of the object to be plated.
有鑑於此,本發明的目的在於提供一種電鍍裝置及電鍍方法,可根據被鍍物的寬度及相鄰被鍍物的距離決定每個被鍍物吊掛的位置,而且控制在所有被鍍物都進入電解槽體後才開始通電,藉此提高每次吊掛的使用率而且也能避免被鍍物的鍍層厚度不一致的問題。In view of this, the purpose of the present invention is to provide an electroplating device and an electroplating method, which can determine the hanging position of each object to be plated according to the width of the object to be plated and the distance between adjacent objects, and control it in all objects to be plated After entering the electrolytic cell body, the power is turned on, thereby increasing the usage rate of each hanging and avoiding the problem of inconsistent coating thickness of the object to be plated.
本發明的電鍍裝置的一實施例包括一電鍍槽體、一電源模組、一對陽極板、一吊掛模組、一驅動模組以及一控制模組。電鍍槽體具有一容置空間,該容置空間裝載電鍍液。電源模組提供一正電位以及一負電位。該對陽極板連接於正電位,且設置於容置空間中。吊掛模組設於電鍍槽體上方且位於該對陽極板之間,被鍍物係吊掛於吊掛模組並位於該對陽極板之間且浸入電鍍液中,吊掛模組連接於負電位。驅動模組設於電鍍槽體上方且驅動吊掛模組,並能夠移動該等被鍍物。控制模組電性連接於驅動模組以及電源模組。其中控制模組控制驅動模組,驅動模組驅動吊掛模組,使相鄰的該等被鍍物間的間距係小於或等於10毫米。An embodiment of the electroplating device of the present invention includes an electroplating tank, a power module, a pair of anode plates, a hanging module, a driving module, and a control module. The electroplating tank has an accommodating space, and the accommodating space is loaded with electroplating liquid. The power module provides a positive potential and a negative potential. The pair of anode plates are connected to a positive potential and are arranged in the accommodating space. The hanging module is arranged above the electroplating tank and located between the pair of anode plates. The object to be plated is suspended from the hanging module and located between the pair of anode plates and immersed in the electroplating solution. The hanging module is connected to Negative potential. The driving module is arranged above the electroplating tank and drives the hanging module, and can move the objects to be plated. The control module is electrically connected to the drive module and the power module. The control module controls the drive module, and the drive module drives the hanging module so that the distance between adjacent objects to be plated is less than or equal to 10 mm.
在另一實施例中,當吊掛於該吊掛模組的被鍍物的數量到達一設定數量時,控制模組控制電源模組供電給該對陽極板及吊掛模組。In another embodiment, when the number of objects to be plated hanging on the hanging module reaches a set amount, the control module controls the power module to supply power to the pair of anode plates and the hanging module.
在另一實施例中,該設定數量為吊掛模組吊掛該等被鍍物的最大數量。In another embodiment, the set number is the maximum number of objects to be plated by the hanging module.
在另一實施例中,控制模組根據吊掛模組的寬度、被鍍物的寬度及該等被鍍物間的距離計算吊掛模組可吊掛被鍍物的最大數量。In another embodiment, the control module calculates the maximum number of objects that can be hung by the suspension module according to the width of the suspension module, the width of the object to be plated, and the distance between the objects to be plated.
在另一實施例中,本發明的電鍍裝置更包括一對假鍍板(dummy plate),其中該等被鍍物係排成一列且位在該對假鍍板之間。In another embodiment, the electroplating apparatus of the present invention further includes a pair of dummy plates, wherein the objects to be plated are arranged in a row and located between the pair of dummy plates.
在另一實施例中,吊掛模組包括一吊掛軌道以及複數個夾具,該等夾具係可移動地設置於吊掛軌道,且每一該等夾具夾持一被鍍物。In another embodiment, the hanging module includes a hanging rail and a plurality of clamps, and the clamps are movably arranged on the hanging rail, and each of the clamps clamps an object to be plated.
在另一實施例中,驅動模組包括一橫移軌道、一驅動本體、一第一驅動器、一移動機構以及一撥動機構,第一驅動器以及撥動機構設置於驅動本體,第一驅動器驅動移動機構使驅動本體沿橫移軌道移動,撥動機構推撥夾具沿該吊掛軌道移動。In another embodiment, the driving module includes a transverse rail, a driving body, a first driver, a moving mechanism, and a toggle mechanism. The first driver and the toggle mechanism are disposed on the driving body, and the first driver drives The moving mechanism makes the driving body move along the horizontal moving track, and the toggle mechanism pushes the jig to move along the hanging track.
在另一實施例中,橫移軌道平行於吊掛軌道。In another embodiment, the traverse rail is parallel to the suspension rail.
在另一實施例中,移動機構包括一導程件、一受導件以及一位置感測器,受導件固設於驅動本體且由導程件導引而行進一既定的導程,位置感測器感測受導件的位置。In another embodiment, the moving mechanism includes a leading element, a guided element, and a position sensor. The guided element is fixed to the driving body and guided by the leading element to travel a predetermined lead. The sensor senses the position of the guided part.
在另一實施例中,導程件為一齒條,受導件為一齒輪,齒輪由第一驅動器驅動旋轉。In another embodiment, the leading member is a rack and the guided member is a gear, and the gear is driven to rotate by the first driver.
在另一實施例中,齒條係平行於橫移軌道。In another embodiment, the rack is parallel to the traverse rail.
在另一實施例中,導程件為一導螺桿,受導件為一滑塊,滑塊螺合於導螺桿,導螺桿由第一驅動器驅動旋轉。In another embodiment, the lead member is a lead screw, and the guided member is a slider, the slider is screwed to the lead screw, and the lead screw is driven to rotate by the first driver.
在另一實施例中,撥動機構包括一第二驅動器、一撥動件以及一角度感測器,第二驅動器使撥動件繞平行於吊掛導軌的一轉軸旋轉,角度感測器偵測撥動件旋轉的角度。In another embodiment, the toggle mechanism includes a second driver, a toggle member, and an angle sensor. The second driver rotates the toggle member around a rotation axis parallel to the hanging rail, and the angle sensor detects Measure the angle of rotation of the toggle.
在另一實施例中,撥動件可抵接於夾具。In another embodiment, the toggle member can abut against the clamp.
在另一實施例中,控制模組包括一處理器、一被鍍物寬度單元、一間距單元、一數量單元以及一行程單元,被鍍物寬度單元連接於一被鍍物寬度資料庫,間距單元連接於一間距參數庫,被鍍物寬度單元自該被鍍物寬度參數庫讀取一被鍍物寬度參數,間距單元自該間距資料庫讀取一間距參數,處理器根據該被鍍物寬度參數、間距參數以及吊掛模組的寬度計算出數量以及每個被鍍物在該吊掛模組的位置以輸出一數量參數至該數量單元以及一位置參數至該行程單元,處理器根據該位置參數以及數量參數驅動驅動模組,驅動模組移動吊掛模組使該等被鍍物分別移動至既定的位置。In another embodiment, the control module includes a processor, a plated object width unit, a pitch unit, a quantity unit, and a stroke unit. The plated object width unit is connected to a plated object width database. The unit is connected to a spacing parameter library, the width of the plated object reads a width parameter of the plated object from the width parameter library of the plated, the spacing unit reads a spacing parameter from the spacing database, and the processor is based on the width of the plated object. The width parameter, the spacing parameter and the width of the hanging module calculate the quantity and the position of each object to be plated in the hanging module to output a quantity parameter to the quantity unit and a position parameter to the stroke unit, and the processor is based on The position parameter and the quantity parameter drive the driving module, and the driving module moves the hanging module to move the objects to be plated to a predetermined position.
在另一實施例中,控制模組更包括一夾具單元,夾具單元連接於一夾具寬度資料庫,夾具單元自夾具寬度資料庫讀取一夾具寬度參數。In another embodiment, the control module further includes a clamp unit connected to a clamp width database, and the clamp unit reads a clamp width parameter from the clamp width database.
在另一實施例中,控制模組更包括一輸入單元,輸入單元連接於處理器,經由輸入單元輸入被鍍物寬度參數以及間距參數。In another embodiment, the control module further includes an input unit, the input unit is connected to the processor, and the width parameter and the spacing parameter of the object to be plated are input through the input unit.
在另一實施例中,控制模組更包括一輸出單元,輸出單元連接於處理器以及驅動模組,處理器根據位置參數以及數量參數傳送控制訊號至驅動模組。In another embodiment, the control module further includes an output unit connected to the processor and the drive module, and the processor transmits the control signal to the drive module according to the position parameter and the quantity parameter.
此外,在本發明提供的一種電鍍方法的一實施例,係適用於如上所述之電鍍裝置,其中該電鍍方法至少包括以下步驟:取得參數步驟:取得複數個參數,該等參數包括一夾具寬度參數、一夾具數量參數、一被鍍物數量參數、一被鍍物寬度參數及被鍍物間的一間距參數;計算參數位置步驟:經由該等參數計算出每一被鍍物的一位置參數;夾具定位步驟:將每一夾具及每一夾具所夾持的被鍍物移動至對應於該位置參數的位置;電鍍步驟:當所有的夾具及所夾持的被鍍物移動至該等位置後,進行電鍍。In addition, an embodiment of an electroplating method provided by the present invention is applicable to the electroplating apparatus as described above, wherein the electroplating method at least includes the following steps: obtaining parameters: obtaining a plurality of parameters, the parameters including a clamp width Parameters, a number of fixtures, a number of objects to be plated, a width parameter of the objects to be plated, and a distance parameter between the objects to be plated; step of calculating the position of the parameters: calculate a position parameter of each object to be plated through these parameters ; Fixture positioning step: move each fixture and the plated object held by each fixture to the position corresponding to the position parameter; electroplating step: when all the fixtures and the plated object held are moved to these positions After that, electroplating is performed.
在該電鍍方法的另一實施例中,在電鍍步驟之前進一步更包含夾持設置假鍍板之步驟:透過設置至少一假鍍板(dummy plate)於被鍍物旁,當假鍍板卸下後即可讓被鍍物的鍍層達到均一性。In another embodiment of the electroplating method, before the electroplating step, the step of clamping and setting the dummy plate is further included: by setting at least one dummy plate beside the object to be plated, when the dummy plate is removed After that, the coating of the object to be plated can reach uniformity.
在該電鍍方法的另一實施例中,其中該假鍍板係為兩個,而各該被鍍物係排成一列且位在兩個該假鍍板之間。In another embodiment of the electroplating method, there are two dummy plating plates, and each of the objects to be plated is arranged in a row and located between the two dummy plating plates.
在該電鍍方法的另一實施例中,該夾具單元連接於一夾具寬度資料庫,該夾具單元自該夾具寬度資料庫讀取該夾具寬度參數。In another embodiment of the electroplating method, the clamp unit is connected to a clamp width database, and the clamp unit reads the clamp width parameter from the clamp width database.
在該電鍍方法的另一實施例中,其中,各該被鍍物間的該間距參數係小於或等於10毫米。In another embodiment of the electroplating method, wherein the parameter of the spacing between the objects to be plated is less than or equal to 10 mm.
在該電鍍方法的另一實施例中,其中,該取得參數步驟及該計算參數位置步驟之間,進一步更包含一將各該參數輸入至一控制模組之輸入參數步驟,其係用以取得參數並輸入後再進行被鍍物的間距、寬度或數量之運算,以供該控制模組調整電鍍裝置之運作。In another embodiment of the electroplating method, wherein, between the step of obtaining parameters and the step of calculating the position of the parameters, an input parameter step of inputting each parameter to a control module is further included, which is used to obtain After inputting the parameters, calculate the distance, width or quantity of the object to be plated, so that the control module can adjust the operation of the electroplating device.
在該電鍍方法的另一實施例中,該控制模組包括一處理器、一被鍍物寬度單元、一間距單元、一數量單元以及一行程單元,該被鍍物寬度單元連接於一被鍍物寬度資料庫,該間距單元連接於一間距資料庫,該被鍍物寬度單元自該被鍍物寬度資料庫讀取一被鍍物寬度參數,該間距單元自該間距資料庫讀取一間距參數,該處理器根據該被鍍物寬度參數、該間距參數以及該吊掛模組的寬度計算出數量以及每個被鍍物在該吊掛模組的位置以輸出一數量參數至該數量單元以及一位置參數至該行程單元,該處理器根據該位置參數以及該數量參數驅動該驅動模組,該驅動模組移動該吊掛模組使該等被鍍物分別移動至既定的位置。In another embodiment of the electroplating method, the control module includes a processor, a width unit of the object to be plated, a pitch unit, a quantity unit, and a stroke unit, and the width unit of the object to be plated is connected to a width unit to be plated. Object width database, the spacing unit is connected to a spacing database, the plated object width unit reads a plated object width parameter from the plated object width database, and the spacing unit reads a spacing from the spacing database Parameters, the processor calculates the quantity and the position of each plated object in the hanging module according to the width parameter of the plated object, the spacing parameter and the width of the hanging module to output a quantity parameter to the quantity unit And a position parameter to the stroke unit, the processor drives the driving module according to the position parameter and the quantity parameter, and the driving module moves the hanging module to move the objects to be plated to predetermined positions.
在該電鍍方法的另一實施例中,在電鍍步驟前,該控制模組需待所有夾持被鍍物或假鍍板之夾具全部都定位之後,才可進行電鍍步驟。In another embodiment of the electroplating method, before the electroplating step, the control module can perform the electroplating step after all the fixtures holding the object to be plated or the dummy plated plate are positioned.
本發明的提供電鍍裝置及使用該電鍍裝置的電鍍方法,其係藉由控制模組根據被鍍物的寬度及相鄰被鍍物的間距距離及吊掛模組的寬度計算出每個被鍍物的位置,並經由驅動模組驅動吊掛模組將每個被鍍物移動到預定的位置,藉此可以使每次吊掛被鍍物的使用率達到最佳。The present invention provides an electroplating device and an electroplating method using the electroplating device. The control module calculates each plated object according to the width of the object to be plated, the distance between adjacent objects to be plated, and the width of the hanging module. The hanging module is driven by the drive module to move each plated object to a predetermined position, so that the utilization rate of each hanging object can be optimized.
另外,本發明的電鍍裝置及使用該電鍍裝置的電鍍方法,主要係透過控制在所有的被鍍物都進入電鍍槽體後才使電源單元開始供電,然後在電鍍結束關閉電源單元後,才將被鍍物移出,可以使每個被鍍物都得到相同厚度的鍍層。另外,在被鍍物列的兩側最邊緣處設置假鍍板,可以使電流密度較大處形成於假鍍板上,而避免真正的被鍍物產生鍍層厚度不均的問題。In addition, the electroplating device of the present invention and the electroplating method using the electroplating device mainly control the power supply unit to start power supply after all the objects to be plated enter the electroplating tank, and then turn off the power supply unit after the electroplating is finished. By removing the plated object, each object to be plated can be plated with the same thickness. In addition, provision of dummy plating plates at the extreme edges of the two sides of the rows of objects to be plated can make the areas with higher current density be formed on the dummy plates, avoiding the problem of uneven plating thickness of the actual objects to be plated.
請參閱第1圖、第2圖及第3圖,其表示本發明的電鍍裝置的一實施例。本發明的電鍍裝置100包括一電鍍槽體10、一電源模組(圖未繪出)、一對陽極板11(第13圖)、一吊掛模組20、一驅動模組30以及一控制模組40(第11圖)。電鍍槽體10具有一容置空間(第13圖,未標號),該容置空間裝載電鍍液。電源模組提供一正電位以及一負電位。該對陽極板11連接於正電位,且設置於容置空間中。吊掛模組20設於電鍍槽體10上方且位於該對陽極板之間,複數個被鍍物O(第4圖)係吊掛於吊掛模組20並位於該對陽極板11之間且浸入電鍍液中,吊掛模組20連接於負電位。驅動模組30設於電鍍槽體10上方且驅動吊掛模組20,並移動該等被鍍物O。控制模組40電性連接於驅動模組30以及電源模組。其中控制模組40控制驅動模組30,驅動模組30驅動吊掛模組20,使相鄰的該等被鍍物O間的距離係小於或等於10毫米。Please refer to FIG. 1, FIG. 2, and FIG. 3, which show an embodiment of the electroplating apparatus of the present invention. The
如第1圖所示,在電鍍槽體10的側邊設置一延伸壁W,吊掛模組20及驅動模組30都設置於延伸壁W上。吊掛模組20包括一吊掛軌道21以及複數個夾具22(請參閱第4圖),該等夾具22係可移動地設置於吊掛軌道21,且每一夾具22夾持一個被鍍物O。在本實施例中,被鍍物O可以是例如電路板。電解液可以是例如硫酸銅溶液(CuSO
4),該對陽極板11可以是例如銅板。
As shown in FIG. 1, an extension wall W is provided on the side of the
驅動模組30包括一橫移軌道31、一驅動本體32、一第一驅動器33、一移動機構34以及一撥動機構35,第一驅動器33以及撥動機構35設置於驅動本體32,第一驅動器33驅動移動機構34,使移動機構34移動驅動本體32沿橫移軌道31移動,撥動機構35推動夾具22沿吊掛軌道21移動。橫移軌道31設置在延伸壁W上且平行於吊掛軌道21,當驅動本體32沿橫移軌道31移動時,撥動機構35推動夾具22於相同方向沿吊掛軌道21移動。The driving
在本實施例中,如第2圖及第3圖所示,驅動本體32設有上下兩組滾輪321,滾輪321夾持橫移軌道31並可於橫移軌道31上滾動而使驅動本體32沿著橫移軌道31移動。驅動本體32還包括一延伸臂322,撥動機構35設置於延伸壁的前端。延伸臂322平行於吊掛軌道21及橫移軌道31。第一驅動器33設置於驅動本體32。在本實施例中,第一驅動器33為馬達,例如步進馬達或伺服馬達。In this embodiment, as shown in Figures 2 and 3, the driving
移動機構34包括一導程件341、一受導件342以及一位置感測器343,受導件342設置於驅動本體31且由導程件341導引而行進一既定的導程,位置感測器343感測受導件342的位置。在本實施例中,導程件341為一齒條,受導件342為一齒輪,受導件342由第一驅動器33驅動旋轉。如第3圖所示,受導件342樞設於驅動本體32,並由第一驅動器33驅動旋轉,導程件341設於延伸壁W上,受導件342與導程件341嚙合。當受導件342由第一驅動器33驅動旋轉時,受導件342沿著導程件341行進,導程件341的節距(pitch)作為導程,計算移動過受導件342多少個節距,即可計算出受導件342移動的距離。因此位置感測器343可以使用感測第一驅動器33旋轉的角度感測器來間接計算出受導件342移動的距離。位置感測器343也可以使用線性的感測器,例如光學尺,來量測受導件342移動的距離。The moving
另外,如第3圖所示,第一驅動器33的輸出軸直接穿設於作為受導件342的齒輪。在另一實施例中,第一驅動器33的輸出軸也可以是平行於作為導程件341的齒條,因此第一驅動器31的輸出軸可穿設於一蝸桿,由蝸桿驅動作為受導件342的齒輪(蝸輪),如此可以達到在兩正交方向上傳遞轉動動力。又或者是第一驅動器33的輸出軸可穿設於一傘齒輪(bevel gear),作為受導件342的齒輪可串接另一傘齒輪,兩傘齒輪互相嚙合,也可以達到在兩正交方向上傳遞轉動動力的效果。In addition, as shown in FIG. 3, the output shaft of the
在另一實施例中,導程件341也可以是導螺桿,受導件342也可以是與導螺桿螺合的滑塊。第一驅動器33驅動旋轉導程件341(導螺桿),使受導件342(滑塊)沿著導程件341移動。在其他實施例中,第一驅動器33也可安裝在延伸壁W上,而不是安裝在驅動本體32上。In another embodiment, the
如第2圖及第3圖所示,撥動機構35包括一第二驅動器351、一撥動件352以及一角度感測器353,第二驅動器351使撥動件352繞平行於吊掛導軌21的一轉軸旋轉,角度感測器353偵測撥動件352旋轉的角度。在本實施例中,第二驅動器351設置在驅動本體32的延伸臂322的前端,撥動件352安裝在第二驅動器351的輸出軸上,在第二驅動器351上設置兩個角度感測器353,兩角度感測器353相隔既定的角距離,當第二驅動器351驅動撥動件352旋轉時,撥動件352移動至被任一角度感測器353感測到時,第二驅動器351會停止轉動,如此兩角度感測器353限定出撥動件352旋轉的角度。As shown in Figures 2 and 3, the
請參閱第4圖、第5圖及第6圖,其表示電鍍裝置的被鍍物進料的過程。夾具22連同被夾具22夾持的被鍍物O從電解槽體10的入口放置在吊掛軌道21上。此時,第一驅動器33驅動受導件342沿導程件341移動而使驅動本體32沿著橫移軌道31移動至入口處,此時。如第5圖所示,撥動件352順時針方向旋轉並避開夾具22後,再反時針轉動並使撥動件352抵接於夾具22,使撥動件352位在夾具的前方。然後第一驅動器33反轉並驅動受導件342沿導程件341朝反方向移動而使驅動本體32沿著橫移軌道31移動至預定的位置,同時撥動件352推動夾具22沿吊掛軌道21移動至既定的位置。每個夾具22連同被夾具22夾持的被鍍物O逐一地移動至所相對應的預定的位置。Please refer to Fig. 4, Fig. 5 and Fig. 6, which show the process of feeding the material to be plated in the electroplating device. The
在本實施例中,等到被鍍物O在吊掛模組20達到設定數量且都進入電鍍槽體10後,才啟動電源模組,供電給該對陽極板及吊掛模組20,因此所有被鍍物可以同時開始電鍍。等到被鍍物的表面上的鍍層達到預定的厚度時,先關閉電源模組,再逐一地將被鍍物O取出。如此每個被鍍物O都可以得到均勻厚度的鍍層。In this embodiment, the power supply module is turned on after the object to be plated O reaches the set number in the hanging
請參閱第7圖,其表示本發明的電鍍裝置的被鍍物退料的過程。第一驅動器33驅動受導件342沿導程件341移動而使驅動本體32沿著橫移軌道31移動至夾具22處,然後旋轉撥動件352,使撥動件352抵接於夾具22,然後第一驅動器31驅動受導件342沿導程件341移動而使驅動本體32沿著橫移軌道31移動至入口處,同時撥動件352推動夾具22沿吊掛軌道21移動至入口處,接著再逐一地將被鍍物O連同夾具22取出。Please refer to Figure 7, which shows the process of removing the material to be plated in the electroplating device of the present invention. The
上述被鍍物O在吊掛模組20的設定數量可以是吊掛模組20吊掛該等被鍍物O的最大數量。控制模組40根據吊掛模組20的寬度、被鍍物O的寬度及被鍍物O間的距離計算出吊掛模組20可吊掛被鍍物O的最大數量。例如吊掛模組20的吊掛軌道21的長度為3米(300公分),每一被鍍物O的寬度為20公分,而兩被鍍物O之間的間距為10毫米,如此可以計算出吊掛模組20可吊掛被鍍物O的最大數量為14個。然後控制模組40再計算出每個夾具22在吊掛軌道21上的位置座標,然後如以上所述的方式移動每個夾具22到達設定的座標。The set number of the above-mentioned objects O to be plated in the hanging
請參閱第8圖及第9圖,其表示兩種不同寬度的被鍍物O (電路板)放置在吊掛模組20上,控制模組40會根據被鍍物O的寬度及兩個被鍍物O的間距,讓吊掛模組20吊掛該等被鍍物O達到最大的數量。不會如先前技術,不論被鍍物O的寬度是多少,夾具都是移動到一定的位置,容易造成使用率的降低。Please refer to Figures 8 and 9, which show that two different widths of the plated object O (circuit board) are placed on the hanging
請參閱第10圖,為本發明的電鍍裝置的吊掛模組吊掛假鍍板及被鍍物的示意圖。由於本發明的電鍍裝置,其被鍍物O間的間距可以縮小至小於或等於10毫米,因此整列多個被鍍物O對電流而言,可以被視同一整件大寬度的被鍍物,因此左右兩側的電流密度最大,因此在整列被鍍物O的左右兩側各增加一個假鍍板(dummy plate)DO,使假鍍板DO承受較大的電流密度而生成厚度較大的鍍層,真正的被鍍物O可以得到較均勻的電流密度而形成較平均的鍍層厚度。Please refer to FIG. 10, which is a schematic diagram of the hanging module of the electroplating device of the present invention hanging the dummy plate and the object to be plated. Because of the electroplating device of the present invention, the spacing between the objects O to be plated can be reduced to less than or equal to 10 mm, so the entire row of multiple objects O can be treated as the same large-width object to be plated for current. Therefore, the current density on the left and right sides is the largest. Therefore, a dummy plate DO is added to the left and right sides of the entire column of the plated object O, so that the dummy plate DO is subjected to a larger current density to generate a thicker plating layer. The real O to be plated can obtain a more uniform current density and form a more average plating thickness.
請參閱第11圖,其為為本發明的電鍍裝置的控制模組的方塊圖。控制模組40包括一處理器41、一被鍍物寬度單元42、一間距單元43、一被鍍物數量單元44以及一行程單元45。被鍍物寬度單元42連接於一被鍍物寬度資料庫421,間距單元43連接於一間距資料庫431。被鍍物寬度單元42自被鍍物寬度資料庫421讀取及/或寫入一被鍍物寬度參數4211,被鍍物寬度參數4211係載有被鍍物O的寬度。間距單元43自間距資料庫431讀取及/或寫入一間距參數4311,間距參數4311係載有兩個被鍍物O的間距。處理器41根據該被鍍物寬度參數4211、間距參數4311以及吊掛模組20的寬度,計算出吊掛模組20可以吊掛該等被鍍物O的最大數量,以及每個被鍍物O在吊掛模組20的所對應的位置(吊掛軌道21上的位置座標)以輸出載有被鍍物數量的一被鍍物數量參數4411至被鍍物數量單元44的一被鍍物數量資料庫441,以及載有被鍍物O在吊掛軌道21上的位置座標的一位置參數4511至行程單元45的位置資料庫451。處理器41根據位置參數4511以及被鍍物數量參數4411控制驅動模組30,驅動模組30移動吊掛模組20使該等被鍍物O分別移動至既定的位置。Please refer to FIG. 11, which is a block diagram of the control module of the electroplating apparatus of the present invention. The
控制模組更包括一夾具單元46,夾具單元46連接於一夾具寬度資料庫461,夾具單元46自該夾具寬度資料庫461讀取一載有夾具22的寬度的夾具寬度參數4611;且夾具單元46更連接於一夾具數量資料庫462,夾具單元46自該夾具數量資料庫462讀取一載有夾具22的數量的夾具數量參數4621。處理器41還根據夾具寬度參數4611計算出夾具22的數量以及每個夾具22在吊掛模組20的位置(夾具22在吊掛軌道21上的位置座標)。The control module further includes a
控制模組40更包括一輸入單元47,輸入單元47連接於處理器41,經由輸入單元47輸入被鍍物寬度參數4211以及間距參數4311。輸入單元47可以是鍵盤或觸控式面板。The
控制模組40更包括一輸出單元48,其連接至驅動模組30以及電源模組。處理器41根據位置參數4511以及被鍍物數量參數4411經由輸出單元48將控制訊號輸送至驅動模組30,驅動模組30接收到控制訊號後,將被鍍物O逐一地輸送至吊掛軌道21上對應的位置座標處。等到吊掛軌道21上的被鍍物數量到達被鍍物數量參數4411所定的數量後,處理器41經由輸出單元48將控制訊號輸送至電源單元,開始供電至陽極板11及被鍍物O。The
請參閱第12圖,其表示本發明的電鍍方法的流程圖。在本發明之電鍍方法一實施例中,至少包含以下步驟:Please refer to Figure 12, which shows a flowchart of the electroplating method of the present invention. In an embodiment of the electroplating method of the present invention, at least the following steps are included:
在取得參數步驟S1中,處理器41(CPU)從輸入單元51取得夾具寬度、夾具數量、被鍍物數量、被鍍物寬度及被鍍物間距,或者分別從夾具單元46的夾具寬度資料庫461取得載有夾具寬度的夾具寬度參數4611、從夾具單元46的夾具數量資料庫462取得載有夾具數量的夾具數量參數4621、從被鍍物數量單元44的被鍍物數量資料庫441取得載有被鍍物數量的被鍍物數量參數4411、從被鍍物寬度單元42的被鍍物寬度資料庫421取得載有被鍍物寬度的被鍍物寬度參數4211,以及從間距單元43的間距資料庫431取得載有間距的間距參數4311。接著進入計算位置參數步驟S2。In the parameter obtaining step S1, the processor 41 (CPU) obtains the clamp width, the number of clamps, the number of objects to be plated, the width of the objects to be plated, and the distance between the objects to be plated from the input unit 51, or separately from the clamp width database of the
在計算位置參數步驟S2中,處理器41依據夾具寬度、被鍍物數量、被鍍物寬度及間距,或者處理器41依據夾具寬度參數4611、夾具數量參數4621、被鍍物數量參數4411、被鍍物寬度參數4211及間距參數4311,計算出吊掛每一被鍍物O的夾具22在吊掛軌道21上的對應位置而形成所對應的位置參數4511,並儲存於位置資料庫451中。接著進入夾具定位步驟S3。In step S2 of calculating the position parameter, the
在夾具定位步驟S3中,第一驅動器33(步進馬達或伺服馬達)依次序將吊掛著被鍍物O的夾具22,依序依照每個對應的位置參數4511,將每個夾具22沿著吊掛軌道21移動到所對應位置。接著進入電鍍步驟S4。In the fixture positioning step S3, the first driver 33 (stepping motor or servo motor) sequentially suspends the
在電鍍步驟S4中,當預定數量的吊掛有被鍍物O的夾具22都移至所對應位置之後,才開始開啟電源模組,以進行電鍍。In the electroplating step S4, when the predetermined number of
在本發明的電鍍方法中,其中,更可包含以下步驟:該假鍍板DO係為兩個,而各該被鍍物O係排成一列且位在兩個該假鍍板DO之間。該夾具單元46連接於一夾具寬度資料庫461,該夾具單元46自該夾具寬度資料庫461讀取該夾具寬度參數4611。在本發明另一實施例中,其中,各該被鍍物O間的該間距參數4311係小於或等於10毫米。在本發明又一實施例中,該取得參數步驟S1及該計算參數位置步驟S2之間,進一步更包含一將各該參數輸入至一控制模組40之輸入參數步驟,其係用以取得參數並輸入後再進行被鍍物O的間距、寬度或數量之運算,以供該控制模組40調整電鍍裝置之運作;其中,該控制模組40包括一處理器41、一被鍍物寬度單元42、一間距單元43、一被鍍物數量單元44以及一行程單元45,該被鍍物寬度單元42連接於一被鍍物寬度資料庫421,該間距單元43連接於一間距資料庫431,該被鍍物寬度單元42自該被鍍物寬度資料庫421讀取一被鍍物寬度參數4211,該間距單元43自該間距資料庫431讀取一間距參數4311,該處理器41根據該被鍍物寬度參數4211、該間距參數4311以及該吊掛模組20的寬度計算出可吊掛的被鍍物O的數量以及每個被鍍物O在該吊掛模組的位置以輸出一被鍍物數量參數4411至該被鍍物數量單元44以及一位置參數4511至該行程單元45,該處理器41根據該位置參數4511以及該被鍍物數量參數4411驅動該驅動模組30,該驅動模組30移動該吊掛模組20使該等被鍍物O分別移動至既定的位置。再者,在電鍍步驟前,控制模組40需待所有夾持被鍍物O之夾具22全部都定位之後,才可進行電鍍步驟。In the electroplating method of the present invention, it may further include the following steps: there are two dummy plating plates DO, and each object O to be plated is arranged in a row and located between the two dummy plating plates DO. The
此外,在本發明再一實施例中,在電鍍步驟之前進一步更包含夾持設置假鍍板之步驟:透過設置至少一假鍍板(dummy plate)DO於被鍍物O旁,據此,當假鍍板DO卸下後,使其能夠讓被鍍物O的鍍層達到均一性之優勢。In addition, in still another embodiment of the present invention, before the electroplating step, the step of clamping and setting the dummy plate is further included: by setting at least one dummy plate (dummy plate) DO next to the object to be plated O, according to this, when After the dummy plate DO is removed, it can make the coating of the object O to be plated to achieve the advantage of uniformity.
再請一併參閱第13圖,為本發明電鍍裝置的電鍍槽體之結構示意圖。在本發明一實施例中,電鍍槽體10具有一容置空間,該容置空間裝載電鍍液。電源模組提供一正電位以及一負電位。該對陽極板11連接於正電位,且設置於容置空間中。吊掛模組20設於電鍍槽體10上方且位於該對陽極板11之間,被鍍物O係吊掛於吊掛模組20且浸入電鍍液中,吊掛模組20連接於負電位。驅動模組30設於電鍍槽體10上方且驅動吊掛模組20,並移動該等被鍍物O。Please also refer to FIG. 13, which is a structural diagram of the electroplating tank of the electroplating apparatus of the present invention. In an embodiment of the present invention, the
本發明的電鍍裝置及電鍍方法,其藉由控制模組根據被鍍物的寬度及相鄰被鍍物的間距距離及吊掛模組的寬度計算出每個被鍍物的位置,並經由驅動模組驅動吊掛模組將每個被鍍物移動到預定的位置,藉此可以使每次吊掛被鍍物的使用率達到最佳。另外,本發明的電鍍裝置控制在所有的被鍍物都進入電鍍槽體後才使電源單元開始供電,然後在電鍍結束關閉電源單元後,才將被鍍物移出,可以使每個被鍍物都得到相同厚度的鍍層。另外,在被鍍物列的兩側最邊緣處設置假鍍板,可以使電流密度較大處形成於假鍍板上,而避免真正的被鍍物產生鍍層厚度不均的問題。The electroplating device and the electroplating method of the present invention calculate the position of each object to be plated by the control module according to the width of the object to be plated, the distance between adjacent objects to be plated and the width of the hanging module, and drive The module drives the hanging module to move each plated object to a predetermined position, so that the utilization rate of each hanging plated object can be optimized. In addition, the electroplating device of the present invention controls the power supply unit to start power supply after all the objects to be plated enter the electroplating tank, and then the power supply unit is turned off at the end of electroplating, and then the objects to be plated are removed, so that each object to be plated can be removed. Both get the same thickness of plating. In addition, provision of dummy plating plates at the extreme edges of the two sides of the rows of objects to be plated can make the areas with higher current density be formed on the dummy plates, avoiding the problem of uneven plating thickness of the actual objects to be plated.
惟以上所述者,僅為本發明之較佳實施例而已,當不能以此限定本發明實施之範圍,即大凡依本發明申請專利範圍及發明說明內容所作之簡單的等效變化與修飾,皆仍屬本發明專利涵蓋之範圍內。另外,本發明的任一實施例或申請專利範圍不須達成本發明所揭露之全部目的或優點或特點。此外,摘要部分和標題僅是用來輔助專利文件搜尋之用,並非用來限制本發明之權利範圍。此外,本說明書或申請專利範圍中提及的”第一”、”第二”等用語僅用以命名元件(element)的名稱或區別不同實施例或範圍,而並非用來限制元件數量上的上限或下限。However, the above are only preferred embodiments of the present invention, and should not be used to limit the scope of implementation of the present invention, that is, simple equivalent changes and modifications made in accordance with the scope of the patent application of the present invention and the description of the invention, All are still within the scope of the invention patent. In addition, any embodiment of the present invention or the scope of the patent application does not have to achieve all the objectives or advantages or features disclosed in the present invention. In addition, the abstract part and title are only used to assist in searching for patent documents, and are not used to limit the scope of rights of the present invention. In addition, the terms "first" and "second" mentioned in this specification or the scope of the patent application are only used to name the element (element) or to distinguish different embodiments or ranges, and are not used to limit the number of elements. Upper or lower limit.
100:電鍍裝置 10:電鍍槽體 11:陽極板 20:吊掛模組 21:吊掛軌道 22:夾具 30:驅動模組 31:橫移軌道 32:驅動本體 321:滾輪 322:延伸臂 33:第一驅動器 34:移動機構 341:導程件 342:受導件 343:位置感測器 35:撥動機構 351:第二驅動器 352:撥動件 353:角度感測器 40:控制模組 41:處理器 42:被鍍物寬度單元 421:被鍍物寬度資料庫 4211:被鍍物寬度參數 43:間距單元 431:間距資料庫 4311:間距參數 44:被鍍物數量單元 441:被鍍物數量資料庫 4411:被鍍物數量參數 45:行程單元 451:位置資料庫 4511:位置參數 46:夾具單元 461:夾具寬度資料庫 4611:夾具寬度參數 462:夾具數量資料庫 4621:夾具數量參數 47:輸入單元 48:輸出單元 DO:假鍍板 W:延伸壁 O:被鍍物 S1:取得參數步驟 S2:計算位置參數步驟 S3:夾具定位步驟 S4:電鍍步驟 100: Electroplating device 10: Electroplating tank 11: Anode plate 20: Hanging module 21: Hanging rail 22: Fixture 30: drive module 31: Transverse track 32: Drive body 321: Wheel 322: Extension arm 33: first drive 34: mobile mechanism 341: Lead Piece 342: Guided Parts 343: Position Sensor 35: Toggle mechanism 351: second drive 352: Toggle Piece 353: Angle Sensor 40: control module 41: processor 42: Width unit of the plated object 421: Width database of plated objects 4211: Width of the plated object 43: Pitch unit 431: Spacing Database 4311: Spacing parameter 44: Number of objects to be plated unit 441: Database of the number of objects to be plated 4411: Parameter of the number of objects to be plated 45: stroke unit 451: Location Database 4511: positional parameters 46: Fixture unit 461: Fixture Width Database 4611: Fixture width parameter 462: Fixture Quantity Database 4621: Number of Fixtures Parameters 47: input unit 48: output unit DO: false plating W: Extension wall O: Plated S1: Steps to obtain parameters S2: Steps to calculate position parameters S3: Fixture positioning steps S4: Electroplating step
第1圖為本發明的電鍍裝置的一實施例的示意圖。 第2圖為本發明的電鍍裝置的驅動模組的部分元件的結構示意圖。 第3圖為本發明的電鍍裝置的驅動模組的側視圖。 第4圖為本發明的電鍍裝置的被鍍物進料的示意圖。 第5圖為本發明的電鍍裝置的推撥機構作動的示意圖。 第6圖為本發明的電鍍裝置的驅動模組推動吊掛模組移動被鍍物至預定位置的示意圖。 第7圖為本發明的電鍍裝置的被鍍物退料的示意圖。 第8圖為本發明的電鍍裝置的吊掛模組吊掛寬度較大的被鍍物的示意圖。 第9圖為本發明的電鍍裝置的吊掛模組吊掛寬度較小的被鍍物的示意圖。 第10圖為本發明的電鍍裝置的吊掛模組吊掛假鍍板及被鍍物的示意圖。 第11圖為本發明的電鍍裝置的控制模組的方塊圖。 第12圖為本發明的電鍍方法的流程圖。 第13圖為本發明電鍍裝置的電鍍槽體之結構示意圖。 Figure 1 is a schematic diagram of an embodiment of the electroplating apparatus of the present invention. Figure 2 is a schematic diagram of the structure of some components of the drive module of the electroplating apparatus of the present invention. Figure 3 is a side view of the drive module of the electroplating apparatus of the present invention. Figure 4 is a schematic diagram of the material to be plated in the electroplating apparatus of the present invention. Figure 5 is a schematic diagram of the operation of the pushing mechanism of the electroplating apparatus of the present invention. Figure 6 is a schematic diagram of the driving module of the electroplating device of the present invention pushing the hanging module to move the object to be plated to a predetermined position. Figure 7 is a schematic diagram of the material to be plated withdrawn in the electroplating apparatus of the present invention. Figure 8 is a schematic diagram of the hanging module of the electroplating apparatus of the present invention hanging a large-width object to be plated. Figure 9 is a schematic diagram of the hanging module of the electroplating apparatus of the present invention hanging a plated object with a small width. Figure 10 is a schematic diagram of the hanging module of the electroplating apparatus of the present invention hanging the dummy plate and the object to be plated. Figure 11 is a block diagram of the control module of the electroplating apparatus of the present invention. Figure 12 is a flowchart of the electroplating method of the present invention. Figure 13 is a schematic view of the structure of the electroplating tank of the electroplating apparatus of the present invention.
100:電鍍裝置 100: Electroplating device
10:電鍍槽體 10: Electroplating tank
20:吊掛模組 20: Hanging module
21:吊掛軌道 21: Hanging rail
30:驅動模組 30: drive module
31:橫移軌道 31: Transverse track
32:驅動本體 32: Drive body
33:第一驅動器 33: first drive
34:移動機構 34: mobile mechanism
341:導程件 341: Lead Piece
342:受導件 342: Guided Parts
35:撥動機構 35: Toggle mechanism
351:第二驅動器 351: second drive
352:撥動件 352: Toggle Piece
353:角度感測器 353: Angle Sensor
W:延伸壁 W: Extension wall
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CN1610769A (en) * | 2002-07-18 | 2005-04-27 | 株式会社荏原制作所 | Plating device |
CN104611757A (en) * | 2013-11-05 | 2015-05-13 | 鼎展电子股份有限公司 | Pitch adjustable electrode and electroplating cathode for electroplating equipment |
TW201925544A (en) * | 2017-11-22 | 2019-07-01 | 財團法人工業技術研究院 | Plating apparatus |
TWM594021U (en) * | 2020-01-17 | 2020-04-21 | 海技股份有限公司 | Electroplating apparatus |
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CN1610769A (en) * | 2002-07-18 | 2005-04-27 | 株式会社荏原制作所 | Plating device |
CN104611757A (en) * | 2013-11-05 | 2015-05-13 | 鼎展电子股份有限公司 | Pitch adjustable electrode and electroplating cathode for electroplating equipment |
TW201925544A (en) * | 2017-11-22 | 2019-07-01 | 財團法人工業技術研究院 | Plating apparatus |
TWM594021U (en) * | 2020-01-17 | 2020-04-21 | 海技股份有限公司 | Electroplating apparatus |
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