TWI709794B - Display apparatus - Google Patents

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TWI709794B
TWI709794B TW108124808A TW108124808A TWI709794B TW I709794 B TWI709794 B TW I709794B TW 108124808 A TW108124808 A TW 108124808A TW 108124808 A TW108124808 A TW 108124808A TW I709794 B TWI709794 B TW I709794B
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substrate
signal line
electrically connected
pixels
multiplexer
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TW108124808A
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TW202102902A (en
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李長紘
郭威宏
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友達光電股份有限公司
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Abstract

A display apparatus includes a first substrate, first pixels disposed on the first substrate, a second substrate disposed opposite the first substrate, second pixels disposed on the second substrate and a display medium disposed between the first substrate and the second substrate. Each of the first pixels has a first signal line, a second signal line, a first thin film transistor and a first pixel electrode. Each of the second pixels has a third signal line, a fourth signal line, a second thin film transistor and a second pixel electrode. A vertical projection of the first thin film transistor of one of the first pixels on the first substrate and a vertical projection of the second thin film transistor of one of the second pixels on the first substrate are arranged in mirror symmetry.

Description

顯示裝置Display device

本發明是有關於一種電子裝置,且特別是有關於一種顯示裝置。The present invention relates to an electronic device, and more particularly to a display device.

提高顯示裝置的解析度一直是發展顯示技術的重要目標之一。一般而言,可藉由提高畫素密度(pixel per inch,PPI)的方法來提高顯示裝置的解析度。提高畫素密度伴隨著增加主動陣列中主動元件的數量,此將縮短相鄰主動元件之間的間距以及主動元件中相鄰構件之間的間距。如此一來,對於將主動陣列設置於同一基板的顯示裝置而言,提高畫素密度會導致難以精準地控制相鄰主動元件之間或主動元件的相鄰構件之間的間距。Improving the resolution of display devices has always been one of the important goals of developing display technology. Generally speaking, the resolution of the display device can be improved by increasing the pixel per inch (PPI) method. Increasing the pixel density is accompanied by an increase in the number of active elements in the active array, which will shorten the spacing between adjacent active elements and the spacing between adjacent components in the active element. As a result, for a display device in which the active array is disposed on the same substrate, increasing the pixel density will make it difficult to accurately control the spacing between adjacent active elements or between adjacent components of the active elements.

本發明提供一種顯示裝置,性能佳且製作成本低。The invention provides a display device with good performance and low manufacturing cost.

本發明的顯示裝置包括第一基板、設置於第一基板上的多個第一畫素、設置於第一基板之對向的第二基板、設置於第二基板上的多個第二畫素和設置於第一基板與第二基板之間的顯示介質。每一第一畫素具有第一訊號線、與第一訊號線交錯設置的第二訊號線、電性連接至第一訊號線及第二訊號線的第一薄膜電晶體和電性連接至第一薄膜電晶體的第一畫素電極。每一第二畫素具有第三訊號線、與第三訊號線交錯設置的第四訊號線、電性連接至第三訊號線及第四訊號線的第二薄膜電晶體和電性連接至第二薄膜電晶體的第二畫素電極。特別是,第一畫素的第一薄膜電晶體在第一基板上的垂直投影與第二畫素的第二薄膜電晶體在第一基板上的垂直投影呈鏡像對稱。The display device of the present invention includes a first substrate, a plurality of first pixels disposed on the first substrate, a second substrate disposed opposite to the first substrate, and a plurality of second pixels disposed on the second substrate And a display medium arranged between the first substrate and the second substrate. Each first pixel has a first signal line, a second signal line interleaved with the first signal line, a first thin film transistor electrically connected to the first signal line and the second signal line, and a first thin film transistor electrically connected to the first signal line The first pixel electrode of a thin film transistor. Each second pixel has a third signal line, a fourth signal line interleaved with the third signal line, a second thin film transistor electrically connected to the third signal line and the fourth signal line, and electrically connected to the first signal line. Two second pixel electrodes of thin film transistors. In particular, the vertical projection of the first thin film transistor of the first pixel on the first substrate and the vertical projection of the second thin film transistor of the second pixel on the first substrate are mirror-symmetrical.

為讓本發明的上述特徵和優點能更明顯易懂,下文特舉實施例,並配合所附圖式作詳細說明如下。In order to make the above-mentioned features and advantages of the present invention more comprehensible, the following specific embodiments are described in detail in conjunction with the accompanying drawings.

現將詳細地參考本發明的示範性實施例,示範性實施例的實例說明於附圖中。只要有可能,相同元件符號在圖式和描述中用來表示相同或相似部分。Reference will now be made in detail to the exemplary embodiments of the present invention, and examples of the exemplary embodiments are illustrated in the accompanying drawings. Whenever possible, the same component symbols are used in the drawings and descriptions to indicate the same or similar parts.

應當理解,當諸如層、膜、區域或基板的元件被稱為在另一元件“上”或“連接到”另一元件時,其可以直接在另一元件上或與另一元件連接,或者中間元件可以也存在。相反,當元件被稱為“直接在另一元件上”或“直接連接到”另一元件時,不存在中間元件。如本文所使用的,“連接”可以指物理及/或電性連接。再者,“電性連接”或“耦合”係可為二元件間存在其它元件。It should be understood that when an element such as a layer, film, region, or substrate is referred to as being "on" or "connected" to another element, it can be directly on or connected to the other element, or Intermediate elements may also be present. In contrast, when an element is referred to as being "directly on" or "directly connected to" another element, there are no intervening elements. As used herein, "connected" can refer to physical and/or electrical connection. Furthermore, "electrically connected" or "coupled" may mean that there are other elements between two elements.

本文使用的“約”、“近似”、或“實質上”包括所述值和在本領域普通技術人員確定的特定值的可接受的偏差範圍內的平均值,考慮到所討論的測量和與測量相關的誤差的特定數量(即,測量系統的限制)。例如,“約”可以表示在所述值的一個或多個標準偏差內,或±30%、±20%、±10%、±5%內。再者,本文使用的“約”、“近似”或“實質上”可依光學性質、蝕刻性質或其它性質,來選擇較可接受的偏差範圍或標準偏差,而可不用一個標準偏差適用全部性質。As used herein, "about", "approximately", or "substantially" includes the stated value and the average value within the acceptable deviation range of the specific value determined by a person of ordinary skill in the art, taking into account the measurement in question and the The specific amount of measurement-related error (ie, the limitation of the measurement system). For example, "about" can mean within one or more standard deviations of the stated value, or within ±30%, ±20%, ±10%, ±5%. Furthermore, the "about", "approximately" or "substantially" used herein can be based on optical properties, etching properties or other properties to select a more acceptable range of deviation or standard deviation, instead of one standard deviation for all properties .

除非另有定義,本文使用的所有術語(包括技術和科學術語)具有與本發明所屬領域的普通技術人員通常理解的相同的含義。將進一步理解的是,諸如在通常使用的字典中定義的那些術語應當被解釋為具有與它們在相關技術和本發明的上下文中的含義一致的含義,並且將不被解釋為理想化的或過度正式的意義,除非本文中明確地這樣定義。Unless otherwise defined, all terms (including technical and scientific terms) used herein have the same meaning as commonly understood by those of ordinary skill in the art to which the present invention belongs. It will be further understood that terms such as those defined in commonly used dictionaries should be interpreted as having meanings consistent with their meanings in the context of related technologies and the present invention, and will not be interpreted as idealized or excessive The formal meaning, unless explicitly defined as such in this article.

圖1A至圖1D為本發明一實施例之顯示裝置的製造流程的上視示意圖。1A to 1D are schematic top views of a manufacturing process of a display device according to an embodiment of the invention.

圖2A至圖2D為本發明一實施例之顯示裝置的製造流程剖面示意圖。圖2A至圖2D分別對應圖1A至圖1D的剖線A-A’。2A to 2D are schematic cross-sectional views of a manufacturing process of a display device according to an embodiment of the invention. Figures 2A to 2D respectively correspond to the section line A-A' of Figures 1A to 1D.

圖3A為圖1A之區域R1的放大示意圖。圖1A省略圖3A之多個第一畫素PX1及第一遮光圖案BM1的繪示。FIG. 3A is an enlarged schematic diagram of the region R1 in FIG. 1A. FIG. 1A omits the illustration of the plurality of first pixels PX1 and the first light shielding pattern BM1 in FIG. 3A.

圖3B為圖1B之區域R2的放大示意圖。圖1B省略圖2B之多個第二畫素PX2及第二遮光圖案BM2的繪示。FIG. 3B is an enlarged schematic diagram of the area R2 in FIG. 1B. FIG. 1B omits the illustration of the plurality of second pixels PX2 and the second light shielding pattern BM2 in FIG. 2B.

圖3C為圖1C及圖1D之區域R的放大示意圖。圖1C及圖1D省略圖3C之多個第一畫素PX1、多個第二畫素PX2、第一遮光圖案BM1及第二遮光圖案BM2的繪示。FIG. 3C is an enlarged schematic view of the area R in FIG. 1C and FIG. 1D. 1C and FIG. 1D omit the illustration of the plurality of first pixels PX1, the plurality of second pixels PX2, the first light shielding pattern BM1, and the second light shielding pattern BM2 of FIG. 3C.

圖1C及圖1D省略圖2C及圖2D之顯示介質300及框膠400的繪示。FIGS. 1C and 1D omit the illustration of the display medium 300 and the sealant 400 of FIGS. 2C and 2D.

以下配合圖1A至圖1D、圖2A至圖2D及圖3A至圖3C說明本發明一實施例之顯示裝置10的製造流程及其構造。1A to 1D, 2A to 2D, and 3A to 3C illustrate the manufacturing process and structure of the display device 10 according to an embodiment of the present invention.

請參照圖1A、圖2A及圖3A,首先,提供第一畫素陣列基板100。第一畫素陣列基板100包括第一基板110以及多個第一畫素PX1。第一基板110的承載面112具有第一主動區112a。多個第一畫素PX1設置於第一基板110之承載面112的第一主動區112a上。1A, 2A and 3A, first, a first pixel array substrate 100 is provided. The first pixel array substrate 100 includes a first substrate 110 and a plurality of first pixels PX1. The bearing surface 112 of the first substrate 110 has a first active area 112a. The plurality of first pixels PX1 are disposed on the first active area 112 a of the supporting surface 112 of the first substrate 110.

請參照圖3A,每一第一畫素PX1具有第一訊號線SL1、與第一訊號線SL1交錯設置的第二訊號線SL2、電性連接至第一訊號線SL1及第二訊號線SL2的第一薄膜電晶體T1和電性連接至第一薄膜電晶體T1的第一畫素電極E1。Referring to FIG. 3A, each first pixel PX1 has a first signal line SL1, a second signal line SL2 interleaved with the first signal line SL1, and a second signal line SL2 electrically connected to the first signal line SL1 and the second signal line SL2 The first thin film transistor T1 and the first pixel electrode E1 electrically connected to the first thin film transistor T1.

具體而言,在本實施例中,第一薄膜電晶體T1包括第一端T1a、第二端T1b、控制端T1c及第一半導體圖案T1d,其中第一端T1a及第二端T1b分別與第一半導體圖案T1d的不同兩區電性連接,且第二端T1b與第一畫素電極E1電性連接。Specifically, in this embodiment, the first thin film transistor T1 includes a first terminal T1a, a second terminal T1b, a control terminal T1c, and a first semiconductor pattern T1d, wherein the first terminal T1a and the second terminal T1b are connected to the Two different regions of a semiconductor pattern T1d are electrically connected, and the second terminal T1b is electrically connected to the first pixel electrode E1.

在本實施例中,第一薄膜電晶體T1的第一端T1a電性連接至第一訊號線SL1,而第一訊號線SL1例如是第一資料線;第一薄膜電晶體T1的控制端T1c電性連接至第二訊號線SL2,而第二訊號線SL2例如是第一掃描線,但本發明不以此為限。In this embodiment, the first terminal T1a of the first thin film transistor T1 is electrically connected to the first signal line SL1, and the first signal line SL1 is, for example, the first data line; the control terminal T1c of the first thin film transistor T1 It is electrically connected to the second signal line SL2, and the second signal line SL2 is, for example, the first scan line, but the invention is not limited to this.

在本實施例中,第一畫素陣列基板100可選擇性地具有第一遮光圖案BM1,設置於第一基板110上。第一遮光圖案BM1包括多個第一遮光條121及多個第二遮光條122。多個第一遮光條121在第一基板110上的多個垂直投影與第一訊號線SL1在第一基板110上的多個垂直投影交替排列。也就是說,每一第一遮光條121在第一基板110上的垂直投影位於相鄰兩條第一訊號線SL1的多個垂直投影之間,而第一遮光條121未與第一訊號線SL1重疊。多個第二遮光條122與多個第一遮光條121交叉設置,且多個第二遮光條122分別與多條第二訊號線SL2重疊。In this embodiment, the first pixel array substrate 100 may optionally have a first light shielding pattern BM1, which is disposed on the first substrate 110. The first light shielding pattern BM1 includes a plurality of first light shielding bars 121 and a plurality of second light shielding bars 122. The plurality of vertical projections of the plurality of first shading bars 121 on the first substrate 110 and the plurality of vertical projections of the first signal line SL1 on the first substrate 110 are alternately arranged. That is, the vertical projection of each first light shielding strip 121 on the first substrate 110 is located between the multiple vertical projections of two adjacent first signal lines SL1, and the first light shielding strip 121 is not connected to the first signal line SL1. SL1 overlaps. The plurality of second light-shielding bars 122 and the plurality of first light-shielding bars 121 are arranged to cross each other, and the plurality of second light-shielding bars 122 overlap with the plurality of second signal lines SL2 respectively.

在本實施例中,第一遮光圖案BM1還可包括多個第三遮光條123。多個第三遮光條123與多個第一遮光條121平行設置。多個第三遮光條123與多個第一遮光條121交替排列,其中多個第三遮光條123分別與多條第一訊號線SL1重疊。然而,本發明不限於此,根據其它實施例,也可省略第三遮光條123的設置。In this embodiment, the first light shielding pattern BM1 may further include a plurality of third light shielding bars 123. The plurality of third light shielding bars 123 are arranged in parallel with the plurality of first light shielding bars 121. The plurality of third light-shielding bars 123 and the plurality of first light-shielding bars 121 are alternately arranged, and the plurality of third light-shielding bars 123 respectively overlap the plurality of first signal lines SL1. However, the present invention is not limited to this, and according to other embodiments, the arrangement of the third light shielding strip 123 may also be omitted.

請參照圖1A、圖2A及圖3A,在本實施例中,第一畫素陣列基板100還可選擇性地包括第一多工器MUX1及第二多工器MUX2。第一基板110的承載面112除了具有第一主動區112a外,第一基板110的承載面112還具有分別位於第一主動區112a之相對兩側的第一周邊區112b及第二周邊區112c。第一多工器MUX1設置於第一周邊區112b上,且電性連接至多個第一畫素PX1的多條第一資料線(例如但不限於:第一訊號線SL1)。第二多工器MUX2設置於第二周邊區112c上,且電性連接至多個第一畫素PX1的多條第一資料線(例如但不限於:第一訊號線SL1)。1A, 2A, and 3A, in this embodiment, the first pixel array substrate 100 may also optionally include a first multiplexer MUX1 and a second multiplexer MUX2. In addition to the carrying surface 112 of the first substrate 110 having the first active area 112a, the carrying surface 112 of the first substrate 110 also has a first peripheral area 112b and a second peripheral area 112c located on opposite sides of the first active area 112a. . The first multiplexer MUX1 is disposed on the first peripheral region 112b, and is electrically connected to a plurality of first data lines of the plurality of first pixels PX1 (for example, but not limited to: the first signal line SL1). The second multiplexer MUX2 is disposed on the second peripheral area 112c, and is electrically connected to a plurality of first data lines of the plurality of first pixels PX1 (for example, but not limited to: the first signal line SL1).

特別是,在本實施例中,第一多工器MUX1在第一基板110上的垂直投影與第二多工器MUX2在第一基板110上的垂直投影呈鏡像對稱。更精確地說,一第一參考線L1通過第一主動區112a的中心且與第一資料線(例如但不限於:第一訊號線SL1)交錯設置,而第一多工器MUX1在第一基板110上的垂直投影與第二多工器MUX2在第一基板110上的垂直投影相對於第一參考線L1呈鏡像對稱。In particular, in this embodiment, the vertical projection of the first multiplexer MUX1 on the first substrate 110 and the vertical projection of the second multiplexer MUX2 on the first substrate 110 are mirror-symmetrical. More precisely, a first reference line L1 passes through the center of the first active area 112a and is interleaved with the first data line (for example, but not limited to: the first signal line SL1), and the first multiplexer MUX1 is in the first The vertical projection on the substrate 110 and the vertical projection of the second multiplexer MUX2 on the first substrate 110 are mirror-symmetrical with respect to the first reference line L1.

在本實施例中,第一畫素陣列基板100還包括多條第一扇出走線FL1及多條第二扇出走線FL2,分別電性連接於第一多工器MUX1及第二多工器MUX2。特別是,在本實施例中,多條第一扇出走線FL1在第一基板110上的垂直投影與多條第二扇出走線FL2在第一基板110上的垂直投影相對於第一參考線L1呈鏡像對稱。In this embodiment, the first pixel array substrate 100 further includes a plurality of first fan-out traces FL1 and a plurality of second fan-out traces FL2, which are electrically connected to the first multiplexer MUX1 and the second multiplexer, respectively MUX2. In particular, in this embodiment, the vertical projections of the plurality of first fan-out traces FL1 on the first substrate 110 and the vertical projections of the plurality of second fan-out traces FL2 on the first substrate 110 are relative to the first reference line. L1 is mirror symmetry.

請參照圖1B、圖2B及圖3B,接著,提供第二畫素陣列基板200。第一畫素陣列基板100與第二畫素陣列基板200係利用同一組光罩製作,因此第一畫素陣列基板100的構造與第二畫素陣列基板200的構造係相同。具體說明第二畫素陣列基板200的構造如下。Please refer to FIG. 1B, FIG. 2B and FIG. 3B, and then, a second pixel array substrate 200 is provided. The first pixel array substrate 100 and the second pixel array substrate 200 are manufactured using the same set of photomasks, so the structure of the first pixel array substrate 100 is the same as the structure of the second pixel array substrate 200. A detailed description of the structure of the second pixel array substrate 200 is as follows.

第二畫素陣列基板200包括第二基板210以及多個第二畫素PX2。第二基板210的承載面212具有第二主動區212a。多個第二畫素PX2設置於第二基板210之承載面212的第二主動區212a上。The second pixel array substrate 200 includes a second substrate 210 and a plurality of second pixels PX2. The bearing surface 212 of the second substrate 210 has a second active area 212a. A plurality of second pixels PX2 are disposed on the second active area 212a of the supporting surface 212 of the second substrate 210.

請參照圖3B,每一第二畫素PX2具有第三訊號線SL3、與第三訊號線SL3交錯設置的第四訊號線SL4、電性連接至第三訊號線SL3及第四訊號線SL4的第二薄膜電晶體T2和電性連接至第二薄膜電晶體T2的第二畫素電極E2。Referring to FIG. 3B, each second pixel PX2 has a third signal line SL3, a fourth signal line SL4 interleaved with the third signal line SL3, and electrical connection to the third signal line SL3 and the fourth signal line SL4 The second thin film transistor T2 and the second pixel electrode E2 electrically connected to the second thin film transistor T2.

具體而言,在本實施例中,第二薄膜電晶體T2包括第一端T2a、第二端T2b、控制端T2c及第二半導體圖案T2d,其中第一端T2a及第二端T2b分別與第二半導體圖案T2d的不同兩區電性連接,且第二端T2b與第二畫素電極E2電性連接。Specifically, in this embodiment, the second thin film transistor T2 includes a first terminal T2a, a second terminal T2b, a control terminal T2c, and a second semiconductor pattern T2d. The first terminal T2a and the second terminal T2b are connected to the Two different regions of the two semiconductor patterns T2d are electrically connected, and the second end T2b is electrically connected to the second pixel electrode E2.

在本實施例中,第二薄膜電晶體T2的第一端T2a電性連接至第三訊號線SL3,而第三訊號線SL3例如是第二資料線;第二薄膜電晶體T2的控制端T1c電性連接至第四訊號線SL4,而第四訊號線SL4例如是第二掃描線,但本發明不以此為限。In this embodiment, the first terminal T2a of the second thin film transistor T2 is electrically connected to the third signal line SL3, and the third signal line SL3 is, for example, the second data line; the control terminal T1c of the second thin film transistor T2 It is electrically connected to the fourth signal line SL4, and the fourth signal line SL4 is, for example, the second scan line, but the invention is not limited to this.

在本實施例中,第二畫素陣列基板200可選擇性地具有第二遮光圖案BM2,設置於第二基板210上。第二遮光圖案BM2包括多個第四遮光條221及多個第五遮光條222。多個第四遮光條221在第二基板210上的多個垂直投影與第三訊號線SL3在第二基板210上的多個垂直投影交替排列。也就是說,每一第四遮光條221在第二基板210上的垂直投影位於相鄰兩條第三訊號線SL3在第二基板210上的多個垂直投影之間,而第四遮光條221未與第三訊號線SL3重疊。多個第五遮光條222與多個第四遮光條221交叉設置。多個第五遮光條222分別與多條第四訊號線SL4重疊。In this embodiment, the second pixel array substrate 200 may optionally have a second light shielding pattern BM2, which is disposed on the second substrate 210. The second light shielding pattern BM2 includes a plurality of fourth light shielding bars 221 and a plurality of fifth light shielding bars 222. The vertical projections of the fourth light shielding bars 221 on the second substrate 210 and the vertical projections of the third signal line SL3 on the second substrate 210 are alternately arranged. That is, the vertical projection of each fourth light-shielding strip 221 on the second substrate 210 is located between the multiple vertical projections of two adjacent third signal lines SL3 on the second substrate 210, and the fourth light-shielding strip 221 Does not overlap with the third signal line SL3. The plurality of fifth light shielding strips 222 and the plurality of fourth light shielding strips 221 are intersectedly arranged. The plurality of fifth light shielding strips 222 respectively overlap with the plurality of fourth signal lines SL4.

在本實施例中,第二遮光圖案BM2還可包括多個第六遮光條223。多個第六遮光條223與多個第四遮光條221平行設置。多個第六遮光條223與多個第四遮光條221交替排列,其中多個第六遮光條223分別與多條第三訊號線SL3重疊。然而,本發明不限於此,根據其它實施例,也可省略第六遮光條223的設置。In this embodiment, the second light shielding pattern BM2 may further include a plurality of sixth light shielding bars 223. The plurality of sixth light shielding bars 223 and the plurality of fourth light shielding bars 221 are arranged in parallel. The plurality of sixth light shielding strips 223 and the plurality of fourth light shielding strips 221 are alternately arranged, and the plurality of sixth light shielding strips 223 overlap with the plurality of third signal lines SL3 respectively. However, the present invention is not limited to this. According to other embodiments, the arrangement of the sixth light shielding strip 223 may also be omitted.

在本實施例中,第一畫素陣列基板100及第二畫素陣列基板200d可皆具有遮光圖案(即第一遮光圖案BM1和第二遮光圖案BM2)。然而,本發明不限於此,根據其它實施例中,也可省略第一遮光圖案BM1與第二遮光圖案BM2的一者。In this embodiment, the first pixel array substrate 100 and the second pixel array substrate 200d may both have light shielding patterns (ie, the first light shielding pattern BM1 and the second light shielding pattern BM2). However, the present invention is not limited to this. According to other embodiments, one of the first light shielding pattern BM1 and the second light shielding pattern BM2 may also be omitted.

請參照圖1B、圖2B及圖3B,在本實施例中,第二畫素陣列基板200還可選擇性地包括第三多工器MUX3及第四多工器MUX4。第二基板210的承載面212除了具有第二主動區212a外,第二基板210的承載面212還具有分別位於第二主動區212a之相對兩側的第三周邊區212b及第四周邊區212c。第三多工器MUX3設置於第三周邊區212b上,且電性連接至多個第二畫素PX2的多條第二資料線(例如但不限於:第三訊號線SL3)。第四多工器MUX4設置於第二基板210之承載面212的第四周邊區212c上,且電性連接至多個第二畫素PX2的多條第二資料線(例如但不限於:第三訊號線SL3)。Referring to FIGS. 1B, 2B and 3B, in this embodiment, the second pixel array substrate 200 may also optionally include a third multiplexer MUX3 and a fourth multiplexer MUX4. In addition to the second active area 212a on the carrying surface 212 of the second substrate 210, the carrying surface 212 of the second substrate 210 also has a third peripheral area 212b and a fourth peripheral area 212c located on opposite sides of the second active area 212a. . The third multiplexer MUX3 is disposed on the third peripheral area 212b, and is electrically connected to a plurality of second data lines of the plurality of second pixels PX2 (for example, but not limited to: the third signal line SL3). The fourth multiplexer MUX4 is disposed on the fourth peripheral area 212c of the supporting surface 212 of the second substrate 210, and is electrically connected to the plurality of second data lines of the plurality of second pixels PX2 (for example, but not limited to: the third Signal line SL3).

特別是,在本實施例中,第三多工器MUX3在第二基板210上的垂直投影與第四多工器MUX4在第二基板210上的垂直投影呈鏡像對稱。更精確地說,一第二參考線L2通過第二主動區212a的中心且與第二資料線(例如但不限於:第三訊號線SL3)交錯設置,而第三多工器MUX3在第二基板210上的垂直投影與第四多工器MUX4在第二基板210上的垂直投影相對於第二參考線L2呈鏡像對稱。In particular, in this embodiment, the vertical projection of the third multiplexer MUX3 on the second substrate 210 and the vertical projection of the fourth multiplexer MUX4 on the second substrate 210 are mirror-symmetrical. More precisely, a second reference line L2 passes through the center of the second active area 212a and is interleaved with the second data line (for example, but not limited to: the third signal line SL3), and the third multiplexer MUX3 is in the second The vertical projection on the substrate 210 and the vertical projection of the fourth multiplexer MUX4 on the second substrate 210 are mirror-symmetrical with respect to the second reference line L2.

在本實施例中,第二畫素陣列基板200還包括多條第三扇出走線FL3及多條第四扇出走線FL4,分別電性連接於第三多工器MUX3及第四多工器MUX4。特別是,在本實施例中,多條第三扇出走線FL3在第二基板210上的垂直投影與多條第四扇出走線FL4在第二基板210上的垂直投影相對於第二參考線L2可呈鏡像對稱。In this embodiment, the second pixel array substrate 200 further includes a plurality of third fan-out traces FL3 and a plurality of fourth fan-out traces FL4, which are respectively electrically connected to the third multiplexer MUX3 and the fourth multiplexer MUX4. In particular, in this embodiment, the vertical projection of the plurality of third fan-out traces FL3 on the second substrate 210 and the vertical projection of the plurality of fourth fan-out traces FL4 on the second substrate 210 are relative to the second reference line. L2 can be mirror symmetry.

請參照圖1C、圖2C及圖3C,接著,組立第一畫素陣列基板100與第二畫素陣列基板200,並形成顯示介質300於第一畫素陣列基板100與第二畫素陣列基板200之間。1C, 2C and 3C, then, assembling the first pixel array substrate 100 and the second pixel array substrate 200, and form a display medium 300 on the first pixel array substrate 100 and the second pixel array substrate Between 200.

舉例而言,在本實施例中,可令第一畫素陣列基板100之第一基板110的承載面112朝上,並在第一基板110的承載面112上塗佈框膠400;接著,將顯示介質300(例如:液晶)填入第一畫素陣列基板100與框膠400圍出的空間;然後,令第二畫素陣列基板200之第二基板210的承載面212朝下,且在接近真空的條件下令第二畫素陣列基板200與第一畫素陣列基板100上的框膠400接觸,進而使第二畫素陣列基板200與第一畫素陣列基板100連接且將顯示介質300封入第一畫素陣列基板100、第二畫素陣列基板200及框膠400圍出的空間。For example, in this embodiment, the carrying surface 112 of the first substrate 110 of the first pixel array substrate 100 may be facing upward, and the sealant 400 may be coated on the carrying surface 112 of the first substrate 110; then, Fill the display medium 300 (for example: liquid crystal) into the space enclosed by the first pixel array substrate 100 and the sealant 400; then, make the bearing surface 212 of the second substrate 210 of the second pixel array substrate 200 face down, and The second pixel array substrate 200 is brought into contact with the sealant 400 on the first pixel array substrate 100 under conditions close to vacuum, thereby connecting the second pixel array substrate 200 to the first pixel array substrate 100 and connecting the display medium 300 is enclosed in the space enclosed by the first pixel array substrate 100, the second pixel array substrate 200 and the sealant 400.

請參照圖1C、圖2C、圖3C、圖1D及圖2D,接著,沿著第一切割道C1切割第一畫素陣列基板100,且沿著第二切割道C2切割第二畫素陣列基板200。在本實施例中,每一第二扇出走線FL2的一部分位於第一切割道C1與框膠400之間,每一第三扇出走線FL3的一部分位於第二切割道C2與框膠400之間。沿著第一切割道C1及第二切割道C2切割第一畫素陣列基板100及第二畫素陣列基板200後,多條第二扇出走線FL2的多個端點FL2a與第一基板110的邊緣110d實質上切齊,多條第三扇出走線FL3的多個端點FL3a與第二基板210的一邊緣210d實質上切齊。Please refer to Figure 1C, Figure 2C, Figure 3C, Figure 1D and Figure 2D, then, cut the first pixel array substrate 100 along the first dicing lane C1, and cut the second pixel array substrate along the second dicing lane C2 200. In this embodiment, a part of each second fan-out wiring FL2 is located between the first cutting track C1 and the sealant 400, and a part of each third fan-out wiring FL3 is located between the second cutting track C2 and the sealant 400 between. After cutting the first pixel array substrate 100 and the second pixel array substrate 200 along the first scribe lane C1 and the second scribe lane C2, the multiple end points FL2a of the multiple second fan-out traces FL2 and the first substrate 110 The edges 110d of the second substrate 210 are substantially aligned with each other, and the multiple end points FL3a of the plurality of third fan-out traces FL3 are substantially aligned with an edge 210d of the second substrate 210.

請參照圖1D、圖2D及圖3C,接著,令第一驅動電路IC1電性連接至第一基板110上的多條第一扇出走線FL1,且令第二驅動電路IC2電性連接至第二基板210上的多條第四扇出走線FL4。於此,便完成了本實施例的顯示裝置10。第一驅動電路IC1透過多條第一扇出走線FL1電性連接至第一多工器MUX1。第一多工器MUX1電性連接於第一驅動電路IC1及多個第一畫素PX1之間,且多個第一畫素PX1電性連接於第一多工器MUX1與第二多工器MUX2之間。第二驅動電路IC2透過多條第四扇出走線FL4電性連接至第四多工器MUX4。第四多工器MUX4電性連接於第二驅動電路IC2及多個第二畫素PX2之間,且多個第二畫素PX2電性連接於第三多工器MUX3與第四多工器MUX4之間。1D, 2D and 3C, then, the first driving circuit IC1 is electrically connected to the plurality of first fan-out wiring FL1 on the first substrate 110, and the second driving circuit IC2 is electrically connected to the first A plurality of fourth fan-out traces FL4 on the second substrate 210. At this point, the display device 10 of this embodiment is completed. The first driving circuit IC1 is electrically connected to the first multiplexer MUX1 through a plurality of first fan-out wires FL1. The first multiplexer MUX1 is electrically connected between the first driving circuit IC1 and the plurality of first pixels PX1, and the plurality of first pixels PX1 are electrically connected to the first multiplexer MUX1 and the second multiplexer Between MUX2. The second driving circuit IC2 is electrically connected to the fourth multiplexer MUX4 through a plurality of fourth fan-out wires FL4. The fourth multiplexer MUX4 is electrically connected between the second driving circuit IC2 and the plurality of second pixels PX2, and the plurality of second pixels PX2 are electrically connected to the third multiplexer MUX3 and the fourth multiplexer Between MUX4.

請參照圖1D、圖2D及圖3C,顯示裝置10包括第一基板110、設置於第一基板110上的多個第一畫素PX1、設置於第一基板110之對向的第二基板210、設置於第二基板210上的多個第二畫素PX2以及設置於第一基板110與第二基板210之間的顯示介質300。特別是,如圖3C所示,一第一畫素PX1在第一基板110上的垂直投影與對應之一第二畫素PX2在第一基板110上的垂直投影呈鏡像對稱。1D, 2D, and 3C, the display device 10 includes a first substrate 110, a plurality of first pixels PX1 disposed on the first substrate 110, and a second substrate 210 disposed opposite to the first substrate 110 , A plurality of second pixels PX2 disposed on the second substrate 210, and a display medium 300 disposed between the first substrate 110 and the second substrate 210. In particular, as shown in FIG. 3C, the vertical projection of a first pixel PX1 on the first substrate 110 and the vertical projection of a corresponding second pixel PX2 on the first substrate 110 are mirror-symmetrical.

具體而言,一第一畫素PX1的第一薄膜電晶體T1在第一基板110上的垂直投影與對應之一第二畫素PX2的第二薄膜電晶體T2在第一基板110上的垂直投影呈鏡像對稱。Specifically, the vertical projection of the first thin film transistor T1 of a first pixel PX1 on the first substrate 110 is perpendicular to the vertical projection of the second thin film transistor T2 of a second pixel PX2 on the first substrate 110 The projection is mirror symmetry.

在本實施例中,第一畫素陣列基板100與第二畫素陣列基板200實質上無組立偏移(即第一畫素PX1的第一訊號線SL1在第一基板110上的垂直投影與對應之第二畫素PX2的第三訊號線SL3在第一基板110上的垂直投影實質上重合),而第一薄膜電晶體T1在第一基板110上的垂直投影與第二薄膜電晶體T2在第一基板110上的垂直投影可相對於第一訊號線SL1在第一基板110上的垂直投影呈鏡像對稱,但本發明不以此為限。In this embodiment, the first pixel array substrate 100 and the second pixel array substrate 200 have substantially no assembly offset (that is, the vertical projection of the first signal line SL1 of the first pixel PX1 on the first substrate 110 and The vertical projection of the third signal line SL3 corresponding to the second pixel PX2 on the first substrate 110 substantially overlaps), and the vertical projection of the first thin film transistor T1 on the first substrate 110 is the same as that of the second thin film transistor T2 The vertical projection on the first substrate 110 may be mirror-symmetrical with respect to the vertical projection of the first signal line SL1 on the first substrate 110, but the invention is not limited thereto.

舉例而言,在本實施例中,第一薄膜電晶體T1之第一半導體圖案T1d在第一基板110上的垂直投影與第二薄膜電晶體T2之第二半導體圖案T2d在第一基板110上的垂直投影相對於第一訊號線SL1在第一基板110上的垂直投影呈鏡像對稱;第一薄膜電晶體T1之第二端T1b在第一基板110上的垂直投影與第二薄膜電晶體T2之第二端T2b在第一基板110上的垂直投影相對於第一訊號線SL1在第一基板110上的垂直投影呈鏡像對稱。For example, in this embodiment, the vertical projection of the first semiconductor pattern T1d of the first thin film transistor T1 on the first substrate 110 and the second semiconductor pattern T2d of the second thin film transistor T2 on the first substrate 110 The vertical projection of the first signal line SL1 is mirror-symmetrical to the vertical projection of the first signal line SL1 on the first substrate 110; the vertical projection of the second end T1b of the first thin film transistor T1 on the first substrate 110 is the same as that of the second thin film transistor T2 The vertical projection of the second end T2b on the first substrate 110 is mirror-symmetrical to the vertical projection of the first signal line SL1 on the first substrate 110.

第一畫素PX1的第一畫素電極E1在第一基板110上的垂直投影與第二畫素PX2的第二畫素電極E2在第一基板110上的垂直投影呈鏡像對稱。The vertical projection of the first pixel electrode E1 of the first pixel PX1 on the first substrate 110 and the vertical projection of the second pixel electrode E2 of the second pixel PX2 on the first substrate 110 are mirror-symmetrical.

在本實施例中,第一畫素陣列基板100與第二畫素陣列基板200實質上無組立偏移(即第一畫素PX1的第一訊號線SL1在第一基板110上的垂直投影與對應之第二畫素PX2的第三訊號線SL3在第一基板110上的垂直投影實質上重合),而第一畫素PX1之第一畫素電極E1在第一基板110上的垂直投影與第二畫素PX2之第二畫素電極E2在第一基板110上的垂直投影可相對於第一訊號線SL1在第一基板110上的垂直投影呈鏡像對稱,但本發明不以此為限。In this embodiment, the first pixel array substrate 100 and the second pixel array substrate 200 have substantially no assembly offset (that is, the vertical projection of the first signal line SL1 of the first pixel PX1 on the first substrate 110 and The vertical projection of the third signal line SL3 corresponding to the second pixel PX2 on the first substrate 110 substantially overlaps), and the vertical projection of the first pixel electrode E1 of the first pixel PX1 on the first substrate 110 is the same as The vertical projection of the second pixel electrode E2 of the second pixel PX2 on the first substrate 110 may be mirror-symmetrical with respect to the vertical projection of the first signal line SL1 on the first substrate 110, but the invention is not limited to this .

在本實施例中,顯示裝置10包括多個畫素組GP,其中每一畫素組GP包括其垂直投影互相為鏡像對稱的一第一畫素PX1及一第二畫素PX2。多個畫素組GP包括相鄰的一第一畫素組GP1及一第二畫素組GP2。第一遮光圖案BM1的第一遮光條121遮蔽第一畫素組GP1之第二畫素PX2的第二畫素電極E2與第二畫素組GP2之第一畫素PX1的第一畫素電極E1之間的間隙g,以防止顯示面板10漏光。類似地,在本實施例中,第二遮光圖案BM2的第四遮光條221也會遮蔽第一畫素組GP1的第二畫素電極E2與第二畫素組GP2的第一畫素電極E1之間的間隙g,以防止顯示面板10漏光。In this embodiment, the display device 10 includes a plurality of pixel groups GP, and each pixel group GP includes a first pixel PX1 and a second pixel PX2 whose vertical projections are mirror-symmetric to each other. The plurality of pixel groups GP includes a first pixel group GP1 and a second pixel group GP2 adjacent to each other. The first light-shielding strip 121 of the first light-shielding pattern BM1 shields the second pixel electrode E2 of the second pixel PX2 of the first pixel group GP1 and the first pixel electrode of the first pixel PX1 of the second pixel group GP2 The gap g between E1 is to prevent the display panel 10 from leaking light. Similarly, in this embodiment, the fourth light-shielding strip 221 of the second light-shielding pattern BM2 will also shield the second pixel electrode E2 of the first pixel group GP1 and the first pixel electrode E1 of the second pixel group GP2. There is a gap g between them to prevent the display panel 10 from leaking light.

在本實施例中,第一畫素PX1及第二畫素PX2是分別製作在第一基板110及第二基板210,以形成第一畫素陣列基板100及第二畫素陣列基板200;之後,再組立第一畫素陣列基板100與第二畫素陣列基板200,進而形成顯示裝置10。因此,第一畫素PX1之第一訊號線SL1與第二畫素PX2之第三訊號線SL3的距離以及第一畫素PX1之第一半導體圖案T1d與第二畫素PX2之第二半導體圖案T2d的距離不受圖案化製程能力的限制,第一畫素PX1之第一訊號線SL1與第二畫素PX2之第三訊號線SL3可以非常靠近甚至重疊,第一畫素PX1之第一半導體圖案T1d與第二畫素PX2之第二半導體圖案T2d可以非常靠近甚至重疊。藉此,第一畫素PX1與第二畫素PX2可以非常靠近甚至部分重疊,進而能實現高解析度的顯示裝置10。In this embodiment, the first pixel PX1 and the second pixel PX2 are respectively fabricated on the first substrate 110 and the second substrate 210 to form the first pixel array substrate 100 and the second pixel array substrate 200; then Then, the first pixel array substrate 100 and the second pixel array substrate 200 are assembled to form the display device 10. Therefore, the distance between the first signal line SL1 of the first pixel PX1 and the third signal line SL3 of the second pixel PX2 and the first semiconductor pattern T1d of the first pixel PX1 and the second semiconductor pattern of the second pixel PX2 The distance of T2d is not limited by the capability of the patterning process. The first signal line SL1 of the first pixel PX1 and the third signal line SL3 of the second pixel PX2 can be very close or even overlapped. The first semiconductor of the first pixel PX1 The pattern T1d and the second semiconductor pattern T2d of the second pixel PX2 may be very close or even overlapped. In this way, the first pixel PX1 and the second pixel PX2 can be very close or even partially overlapped, so that a high-resolution display device 10 can be realized.

更重要的是,一第一畫素PX1在第一基板110上的垂直投影與對應之一第二畫素PX2在第一基板110上的垂直投影呈鏡像對稱;也就是說,第一畫素PX1與第二畫素PX2是利用同一組光罩製作的,因此,顯示裝置10不但具有高解析度,更具有低製造成本的優勢。More importantly, the vertical projection of a first pixel PX1 on the first substrate 110 and the vertical projection of a corresponding second pixel PX2 on the first substrate 110 are mirror-symmetrical; that is, the first pixel The PX1 and the second pixel PX2 are manufactured using the same set of photomasks. Therefore, the display device 10 not only has a high resolution, but also has the advantage of low manufacturing cost.

在此必須說明的是,下述實施例沿用前述實施例的元件標號與部分內容,其中採用相同的標號來表示相同或近似的元件,並且省略了相同技術內容的說明。關於省略部分的說明可參考前述實施例,下述實施例不再重複贅述。It must be noted here that the following embodiments use the element numbers and part of the content of the foregoing embodiments, wherein the same numbers are used to represent the same or similar elements, and the description of the same technical content is omitted. For the description of the omitted parts, reference may be made to the foregoing embodiments, and the following embodiments will not be repeated.

圖4A至圖4D為本發明另一實施例之顯示裝置的製造流程的上視示意圖。4A to 4D are schematic top views of a manufacturing process of a display device according to another embodiment of the invention.

圖5A至圖5D為本發明另一實施例之顯示裝置的製造流程的剖面示意圖。圖5A至圖5D分別對應圖4A至圖4D的剖線A-A’。5A to 5D are schematic cross-sectional views of a manufacturing process of a display device according to another embodiment of the invention. Figures 5A to 5D correspond to the section line A-A' of Figures 4A to 4D, respectively.

圖6A為圖4A之區域R1的放大示意圖。圖4A省略圖6A之多個第一畫素PX1及第一遮光圖案BM1的繪示。FIG. 6A is an enlarged schematic diagram of the area R1 in FIG. 4A. FIG. 4A omits the illustration of the plurality of first pixels PX1 and the first light shielding pattern BM1 in FIG. 6A.

圖6B為圖4B之區域R2的放大示意圖。圖4B省略圖6B之多個第二畫素PX2及第二遮光圖案BM2的繪示。FIG. 6B is an enlarged schematic diagram of the area R2 in FIG. 4B. FIG. 4B omits the illustration of the plurality of second pixels PX2 and the second light shielding pattern BM2 in FIG. 6B.

圖6C為圖4C及圖4D之區域R的放大示意圖。圖6C省略圖4C及圖4D之多個第一畫素PX1、多個第二畫素PX2、第一遮光圖案BM1及第二遮光圖案BM2的繪示。Fig. 6C is an enlarged schematic view of the area R in Fig. 4C and Fig. 4D. FIG. 6C omits the illustration of the plurality of first pixels PX1, the plurality of second pixels PX2, the first light-shielding pattern BM1, and the second light-shielding pattern BM2 of FIGS. 4C and 4D.

圖4C及圖4D省略圖5C及圖5D之顯示介質300及框膠400的繪示。4C and 4D omit the illustration of the display medium 300 and the sealant 400 of FIGS. 5C and 5D.

請參照圖4A、圖5A及圖6A,首先,提供第一畫素陣列基板100。第一畫素陣列基板100包括第一基板110以及多個第一畫素PX1。第一基板110的承載面112具有第一主動區112a。多個第一畫素PX1設置於第一基板110之承載面112的第一主動區112a上。每一第一畫素PX1具有第一訊號線SL1、與第一訊號線SL1交錯設置的第二訊號線SL2、電性連接至第一訊號線SL1及第二訊號線SL2的第一薄膜電晶體T1和電性連接至第一薄膜電晶體T1的第一畫素電極E1。Referring to FIGS. 4A, 5A and 6A, first, a first pixel array substrate 100 is provided. The first pixel array substrate 100 includes a first substrate 110 and a plurality of first pixels PX1. The bearing surface 112 of the first substrate 110 has a first active area 112a. The plurality of first pixels PX1 are disposed on the first active area 112 a of the supporting surface 112 of the first substrate 110. Each first pixel PX1 has a first signal line SL1, a second signal line SL2 interleaved with the first signal line SL1, and a first thin film transistor electrically connected to the first signal line SL1 and the second signal line SL2 T1 is electrically connected to the first pixel electrode E1 of the first thin film transistor T1.

與前述實施例不同的是,在本實施例中,第一薄膜電晶體T1的控制端T1c電性連接至第一訊號線SL1,而第一訊號線SL1例如是第一掃描線;第一薄膜電晶體T1的第一端T1a電性連接至第二訊號線SL2,而第二訊號線SL2例如是第一資料線。Different from the previous embodiment, in this embodiment, the control terminal T1c of the first thin film transistor T1 is electrically connected to the first signal line SL1, and the first signal line SL1 is, for example, a first scan line; The first terminal T1a of the transistor T1 is electrically connected to the second signal line SL2, and the second signal line SL2 is, for example, the first data line.

請參照圖4A、圖5A及圖6A,在本實施例中,第一畫素陣列基板100還可選擇性地包括第一多工器MUX1。第一基板110的承載面112除了具有第一主動區112a外,第一基板110的承載面112還具有分別位於第一主動區112a之一側的第一周邊區112b。第一多工器MUX1設置於第一基板110之承載面112的第一周邊區112b上,且電性連接至多個第一畫素PX1的多條第一資料線(例如但不限於:第二訊號線SL2)。與前述實施例不同的是,在本實施例中,第一畫素陣列基板100可不包括前述的第二多工器MUX2。Referring to FIG. 4A, FIG. 5A and FIG. 6A, in this embodiment, the first pixel array substrate 100 may also optionally include a first multiplexer MUX1. In addition to the carrying surface 112 of the first substrate 110 having the first active area 112a, the carrying surface 112 of the first substrate 110 also has first peripheral areas 112b respectively located on one side of the first active area 112a. The first multiplexer MUX1 is disposed on the first peripheral area 112b of the carrying surface 112 of the first substrate 110, and is electrically connected to the first data lines of the first pixels PX1 (for example, but not limited to: the second Signal line SL2). The difference from the foregoing embodiment is that in this embodiment, the first pixel array substrate 100 may not include the foregoing second multiplexer MUX2.

在本實施例中,第一畫素陣列基板100還包括多條第一扇出走線FL1,電性連接於第一多工器MUX1。與前述實施例不同的是,在本實施例中,第一畫素陣列基板100可不包括前述的多條第二扇出走線FL2。In this embodiment, the first pixel array substrate 100 further includes a plurality of first fan-out traces FL1, which are electrically connected to the first multiplexer MUX1. The difference from the foregoing embodiment is that in this embodiment, the first pixel array substrate 100 may not include the foregoing multiple second fan-out wirings FL2.

請參照圖4B、圖5B及圖6B,接著,提供第二畫素陣列基板200。第一畫素陣列基板100與第二畫素陣列基板200係利用同一組光罩製作,因此第一畫素陣列基板100的構造與第二畫素陣列基板200的構造係相同。具體說明第二畫素陣列基板200的構造如下。Please refer to FIG. 4B, FIG. 5B and FIG. 6B, and then, a second pixel array substrate 200 is provided. The first pixel array substrate 100 and the second pixel array substrate 200 are manufactured using the same set of photomasks, so the structure of the first pixel array substrate 100 is the same as the structure of the second pixel array substrate 200. A detailed description of the structure of the second pixel array substrate 200 is as follows.

第二畫素陣列基板200包括第二基板210以及多個第二畫素PX2。第二基板210的承載面212具有第二主動區212a。多個第二畫素PX2設置於第二基板210之承載面212的第二主動區212a上。每一第二畫素PX2具有第三訊號線SL3、與第三訊號線SL3交錯設置的第四訊號線SL4、電性連接至第三訊號線SL3及第四訊號線SL4的第二薄膜電晶體T2和電性連接至第二薄膜電晶體T21的第二畫素電極E2。The second pixel array substrate 200 includes a second substrate 210 and a plurality of second pixels PX2. The bearing surface 212 of the second substrate 210 has a second active area 212a. A plurality of second pixels PX2 are disposed on the second active area 212a of the supporting surface 212 of the second substrate 210. Each second pixel PX2 has a third signal line SL3, a fourth signal line SL4 interleaved with the third signal line SL3, and a second thin film transistor electrically connected to the third signal line SL3 and the fourth signal line SL4 T2 is electrically connected to the second pixel electrode E2 of the second thin film transistor T21.

與前述實施例不同的是,在本實施例中,第二薄膜電晶體T2的控制端T2c電性連接至第三訊號線SL3,而第三訊號線SL3例如是第二掃描線;第二薄膜電晶體T2的第一端T1a電性連接至第四訊號線SL4,而第四訊號線SL4例如是第二資料線。The difference from the previous embodiment is that in this embodiment, the control terminal T2c of the second thin film transistor T2 is electrically connected to the third signal line SL3, and the third signal line SL3 is, for example, the second scan line; The first terminal T1a of the transistor T2 is electrically connected to the fourth signal line SL4, and the fourth signal line SL4 is, for example, the second data line.

請參照圖4B、圖5B及圖6B,在本實施例中,第二畫素陣列基板200還可選擇性地包括第三多工器MUX3。第二基板210的承載面212除了具有第二主動區212a外,第二基板210的承載面212還具有分別位於第二主動區212a之一側的第三周邊區212b。第三多工器MUX3設置於第二基板210之承載面212的第三周邊區212b上,且電性連接至多個第二畫素PX2的多條第二資料線(例如但不限於:第四訊號線SL4)。與前述實施例不同的是,在本實施例中,第二畫素陣列基板200可不包括前述的第四多工器MUX4。Referring to FIG. 4B, FIG. 5B and FIG. 6B, in this embodiment, the second pixel array substrate 200 may also optionally include a third multiplexer MUX3. In addition to the second active area 212a on the supporting surface 212 of the second substrate 210, the supporting surface 212 of the second substrate 210 also has third peripheral areas 212b located on one side of the second active area 212a. The third multiplexer MUX3 is disposed on the third peripheral area 212b of the carrying surface 212 of the second substrate 210, and is electrically connected to the plurality of second data lines of the plurality of second pixels PX2 (for example, but not limited to: the fourth Signal line SL4). Different from the foregoing embodiment, in this embodiment, the second pixel array substrate 200 may not include the foregoing fourth multiplexer MUX4.

在本實施例中,第二畫素陣列基板200還包括多條第三扇出走線FL3,電性連接於第三多工器MUX3。與前述實施例不同的是,在本實施例中,第二畫素陣列基板200可不包括前述的多條第四扇出走線FL4。In this embodiment, the second pixel array substrate 200 further includes a plurality of third fan-out wiring FL3, which are electrically connected to the third multiplexer MUX3. The difference from the foregoing embodiment is that, in this embodiment, the second pixel array substrate 200 may not include the foregoing multiple fourth fan-out wirings FL4.

請參照圖4C、圖5C及圖6C,接著,組立第一畫素陣列基板100與第二畫素陣列基板200,並形成顯示介質300於第一畫素陣列基板100與第二畫素陣列基板200之間。4C, 5C and 6C, then, the first pixel array substrate 100 and the second pixel array substrate 200 are assembled, and a display medium 300 is formed on the first pixel array substrate 100 and the second pixel array substrate Between 200.

請參照圖4C、圖5C、圖6C、圖4D及圖5D,接著,沿著第一切割道C1切割第一畫素陣列基板100,且沿著第二切割道C2切割第二畫素陣列基板200。4C, FIG. 5C, FIG. 6C, FIG. 4D and FIG. 5D, then, cut the first pixel array substrate 100 along the first dicing path C1, and cut the second pixel array substrate along the second dicing path C2 200.

請參照圖4D、圖5D及圖6C,接著,令第一驅動電路IC1電性連接至第一基板110上的多條第一扇出走線FL1,且令第二驅動電路IC2電性連接至第二基板210上的多條第三扇出走線FL3。第一驅動電路IC1透過多條第一扇出走線FL1電性連接至第一多工器MUX1。第二驅動電路IC2透過多條第三扇出走線FL3電性連接至第三多工器MUX3。於此,便完成了本實施例的顯示裝置10A。Please refer to FIGS. 4D, 5D, and 6C. Then, the first driving circuit IC1 is electrically connected to the plurality of first fan-out traces FL1 on the first substrate 110, and the second driving circuit IC2 is electrically connected to the first A plurality of third fan-out traces FL3 on the second substrate 210. The first driving circuit IC1 is electrically connected to the first multiplexer MUX1 through a plurality of first fan-out wires FL1. The second driving circuit IC2 is electrically connected to the third multiplexer MUX3 through a plurality of third fan-out wires FL3. Hereby, the display device 10A of this embodiment is completed.

請參照圖4D、圖5D及圖6C,顯示裝置10A包括第一基板110、設置於第一基板110上的多個第一畫素PX1、設置於第一基板110之對向的第二基板210、設置於第二基板210上的多個第二畫素PX2以及設置於第一基板110與第二基板210之間的顯示介質300。特別是,如圖6C所示,一第一畫素PX1在第一基板110上的垂直投影與對應之一第二畫素PX2在第一基板110上的垂直投影呈鏡像對稱。Referring to FIGS. 4D, 5D and 6C, the display device 10A includes a first substrate 110, a plurality of first pixels PX1 disposed on the first substrate 110, and a second substrate 210 disposed on the opposite side of the first substrate 110 , A plurality of second pixels PX2 disposed on the second substrate 210, and a display medium 300 disposed between the first substrate 110 and the second substrate 210. In particular, as shown in FIG. 6C, the vertical projection of a first pixel PX1 on the first substrate 110 and the vertical projection of a corresponding second pixel PX2 on the first substrate 110 are mirror-symmetrical.

與前述實施例不同的是,在本實施例中,一第一畫素PX1在第一基板110上的垂直投影與對應之一第二畫素PX2在第一基板110上的垂直投影係相對於第二掃描線(即本實施例的第一訊號線SL1)呈鏡像對稱。The difference from the previous embodiment is that in this embodiment, the vertical projection of a first pixel PX1 on the first substrate 110 and the vertical projection of a corresponding second pixel PX2 on the first substrate 110 are relative to The second scan line (ie, the first signal line SL1 in this embodiment) is mirror-symmetrical.

具體而言,在本實施例中,在本實施例中,第一薄膜電晶體T1之第一半導體圖案T1d在第一基板110上的垂直投影與第二薄膜電晶體T2之第二半導體圖案T2d在第一基板110上的垂直投影相對於第二掃描線(即本實施例的第一訊號線SL1)在第一基板110上的垂直投影呈鏡像對稱;第一薄膜電晶體T1之第二端T1b在第一基板110上的垂直投影與第二薄膜電晶體T2之第二端T2b在第一基板110上的垂直投影相對於第二掃描線(即本實施例的第一訊號線SL1)在第一基板110上的垂直投影呈鏡像對稱。第一畫素PX1之第一畫素電極E1在第一基板110上的垂直投影與第二畫素PX2之第二畫素電極E2在第一基板110上的垂直投影相對於第二掃描線(即本實施例的第一訊號線SL1)在第一基板110上的垂直投影呈鏡像對稱。Specifically, in this embodiment, in this embodiment, the vertical projection of the first semiconductor pattern T1d of the first thin film transistor T1 on the first substrate 110 and the second semiconductor pattern T2d of the second thin film transistor T2 The vertical projection on the first substrate 110 is mirror-symmetrical with respect to the vertical projection of the second scan line (that is, the first signal line SL1 in this embodiment) on the first substrate 110; the second end of the first thin film transistor T1 The vertical projection of T1b on the first substrate 110 and the vertical projection of the second end T2b of the second thin film transistor T2 on the first substrate 110 are relative to the second scan line (ie, the first signal line SL1 of this embodiment) The vertical projection on the first substrate 110 is mirror-symmetrical. The vertical projection of the first pixel electrode E1 of the first pixel PX1 on the first substrate 110 and the vertical projection of the second pixel electrode E2 of the second pixel PX2 on the first substrate 110 are relative to the second scan line ( That is, the vertical projection of the first signal line SL1) on the first substrate 110 in this embodiment is mirror-symmetrical.

在本實施例中,第一畫素PX1與第二畫素PX2是分別製作在第一基板110與第二基板210上,以形成第一畫素陣列基板100及第二畫素陣列基板200;之後,再組立第一畫素陣列基板100與第二畫素陣列基板200,進而形成顯示裝置10A。第一資料訊號及第一掃描訊號用以輸入至多個第一畫素PX1,第二資料訊號及第二掃描訊號用以輸入至多個第二畫素PX2,其中第一資料訊號、第一掃描訊號、第一資料訊號、第二掃描訊號能同時被輸入位於第一基板110上的多個第一畫素PX1及位於第二基板210上的多個第二畫素PX2。藉此,顯示裝置10A能在維持足夠之充電時間的情況下,提升圖框率(frame rate)。In this embodiment, the first pixel PX1 and the second pixel PX2 are respectively fabricated on the first substrate 110 and the second substrate 210 to form the first pixel array substrate 100 and the second pixel array substrate 200; After that, the first pixel array substrate 100 and the second pixel array substrate 200 are assembled to form the display device 10A. The first data signal and the first scan signal are used for input to a plurality of first pixels PX1, the second data signal and the second scan signal are used for input to a plurality of second pixels PX2, among which the first data signal and the first scan signal , The first data signal and the second scan signal can be simultaneously input to a plurality of first pixels PX1 on the first substrate 110 and a plurality of second pixels PX2 on the second substrate 210. Thereby, the display device 10A can increase the frame rate while maintaining sufficient charging time.

更重要的是,一第一畫素PX1在第一基板110上的垂直投影與對應之一第二畫素PX2在第一基板110上的垂直投影呈鏡像對稱;也就是說,第一畫素PX1與第二畫素PX2是利用同一組光罩製作的,因此,顯示裝置10A不但具有高圖框率(frame rate),更具有低製造成本的優勢。More importantly, the vertical projection of a first pixel PX1 on the first substrate 110 and the vertical projection of a corresponding second pixel PX2 on the first substrate 110 are mirror-symmetrical; that is, the first pixel The PX1 and the second pixel PX2 are manufactured using the same set of photomasks. Therefore, the display device 10A not only has a high frame rate, but also has the advantage of low manufacturing cost.

雖然本發明已以實施例揭露如上,然其並非用以限定本發明,任何所屬技術領域中具有通常知識者,在不脫離本發明的精神和範圍內,當可作些許的更動與潤飾,故本發明的保護範圍當視後附的申請專利範圍所界定者為準。Although the present invention has been disclosed in the above embodiments, it is not intended to limit the present invention. Anyone with ordinary knowledge in the technical field can make some changes and modifications without departing from the spirit and scope of the present invention. The scope of protection of the present invention shall be determined by the scope of the attached patent application.

10、10A:顯示裝置10.10A: Display device

100:第一畫素陣列基板100: The first pixel array substrate

110:第一基板110: first substrate

112:承載面112: bearing surface

112a:第一主動區112a: first active zone

112b:第一周邊區112b: The first peripheral area

112c:第二周邊區112c: second peripheral zone

121:第一遮光條121: The first shading strip

122:第二遮光條122: second shading strip

123:第三遮光條123: The third shading strip

200:第二畫素陣列基板200: The second pixel array substrate

210:第二基板210: second substrate

212:承載面212: bearing surface

212a:第二主動區212a: second active zone

212b:第三周邊區212b: The third peripheral zone

212c:第四周邊區212c: the fourth peripheral area

221:第四遮光條221: The fourth shading strip

222:第五遮光條222: Fifth shading strip

223:第六遮光條223: The sixth shading strip

300:顯示介質300: display medium

400:框膠400: frame glue

A-A’:剖線A-A’: Cut line

BM1:第一遮光圖案BM1: The first shading pattern

BM2:第二遮光圖案BM2: second shading pattern

C1:第一切割道C1: The first cutting pass

C2:第二切割道C2: Second cutting pass

E1:第一畫素電極E1: The first pixel electrode

E2:第二畫素電極E2: second pixel electrode

FL1:第一扇出走線FL1: The first fan-out wiring

FL2:第二扇出走線FL2: The second fan-out wiring

FL2a、FL3a:端點FL2a, FL3a: Endpoint

FL3:第三扇出走線FL3: The third fan-out wiring

FL4:第四扇出走線FL4: The fourth fan-out wiring

GP:畫素組GP: Pixel Group

GP1:第一畫素組GP1: The first pixel group

GP2:第二畫素組GP2: The second pixel group

g:間隙g: gap

L1:第一參考線L1: The first reference line

L2:第二參考線L2: Second reference line

MUX1:第一多工器MUX1: the first multiplexer

MUX2:第二多工器MUX2: second multiplexer

MUX3:第三多工器MUX3: third multiplexer

MUX4:第四多工器MUX4: the fourth multiplexer

SL1:第一訊號線SL1: The first signal line

SL2:第二訊號線SL2: second signal line

SL3:第三訊號線SL3: The third signal line

SL4:第四訊號線SL4: The fourth signal line

T1:第一薄膜電晶體T1: The first thin film transistor

T1a、T2a:第一端T1a, T2a: first end

T1b、T2b:第二端T1b, T2b: second end

T1c、T2c:控制端T1c, T2c: control terminal

T1d:第一半導體圖案T1d: The first semiconductor pattern

T2:第二薄膜電晶體T2: The second thin film transistor

T2d:第二半導體圖案T2d: second semiconductor pattern

PX1:第一畫素PX1: the first pixel

PX2:第二畫素PX2: second pixel

IC1:第一驅動電路IC1: the first drive circuit

IC2:第二驅動電路IC2: second drive circuit

R、R1、R2:區域R, R1, R2: area

圖1A至圖1D為本發明一實施例之顯示裝置的製造流程的上視示意圖。 圖2A至圖2D為本發明一實施例之顯示裝置的製造流程剖面示意圖。 圖3A為圖1A之區域R1的放大示意圖。 圖3B為圖1B之區域R2的放大示意圖。 圖3C為圖1C及圖1D之區域R的放大示意圖。 圖4A至圖4D為本發明另一實施例之顯示裝置的製造流程的上視示意圖。 圖5A至圖5D為本發明另一實施例之顯示裝置的製造流程的剖面示意圖。 圖6A為圖4A之區域R1的放大示意圖。 圖6B為圖4B之區域R2的放大示意圖。 圖6C為圖4C及圖4D之區域R的放大示意圖。 1A to 1D are schematic top views of a manufacturing process of a display device according to an embodiment of the invention. 2A to 2D are schematic cross-sectional views of a manufacturing process of a display device according to an embodiment of the invention. FIG. 3A is an enlarged schematic diagram of the region R1 in FIG. 1A. FIG. 3B is an enlarged schematic diagram of the area R2 in FIG. 1B. FIG. 3C is an enlarged schematic view of the area R in FIG. 1C and FIG. 1D. 4A to 4D are schematic top views of a manufacturing process of a display device according to another embodiment of the invention. 5A to 5D are schematic cross-sectional views of a manufacturing process of a display device according to another embodiment of the invention. FIG. 6A is an enlarged schematic diagram of the area R1 in FIG. 4A. FIG. 6B is an enlarged schematic diagram of the area R2 in FIG. 4B. Fig. 6C is an enlarged schematic view of the area R in Fig. 4C and Fig. 4D.

10:顯示裝置 10: Display device

100:第一畫素陣列基板 100: The first pixel array substrate

110:第一基板 110: first substrate

121:第一遮光條 121: The first shading strip

122:第二遮光條 122: second shading strip

123:第三遮光條 123: The third shading strip

200:第二畫素陣列基板 200: The second pixel array substrate

210:第二基板 210: second substrate

221:第四遮光條 221: The fourth shading strip

222:第五遮光條 222: Fifth shading strip

223:第六遮光條 223: The sixth shading strip

BM1:第一遮光圖案 BM1: The first shading pattern

BM2:第二遮光圖案 BM2: second shading pattern

E1:第一畫素電極 E1: The first pixel electrode

E2:第二畫素電極 E2: second pixel electrode

GP:畫素組 GP: Pixel Group

GP1:第一畫素組 GP1: The first pixel group

GP2:第二畫素組 GP2: The second pixel group

g:間隙 g: gap

SL1:第一訊號線 SL1: The first signal line

SL2:第二訊號線 SL2: second signal line

SL3:第三訊號線 SL3: The third signal line

SL4:第四訊號線 SL4: The fourth signal line

T1:第一薄膜電晶體 T1: The first thin film transistor

T1a、T2a:第一端 T1a, T2a: first end

T1b、T2b:第二端 T1b, T2b: second end

T1c、T2c:控制端 T1c, T2c: control terminal

T1d:第一半導體圖案 T1d: The first semiconductor pattern

T2:第二薄膜電晶體 T2: The second thin film transistor

T2d:第二半導體圖案 T2d: second semiconductor pattern

PX1:第一畫素 PX1: the first pixel

PX2:第二畫素 PX2: second pixel

R:區域 R: area

Claims (11)

一種顯示裝置,包括:一第一基板;多個第一畫素,設置於該第一基板上,其中每一該第一畫素具有一第一訊號線、與該第一訊號線交錯設置的一第二訊號線、電性連接至該第一訊號線及該第二訊號線的一第一薄膜電晶體和電性連接至該第一薄膜電晶體的一第一畫素電極;一第二基板,設置於該第一基板的對向;多個第二畫素,設置於該第二基板上,其中每一該第二畫素具有一第三訊號線、與該第三訊號線交錯設置的一第四訊號線、電性連接至該第三訊號線及該第四訊號線的一第二薄膜電晶體和電性連接至該第二薄膜電晶體的一第二畫素電極;以及一顯示介質,設置於該第一基板與該第二基板之間,其中一該第一畫素的該第一薄膜電晶體在該第一基板上的垂直投影與一該第二畫素的該第二薄膜電晶體在該第一基板上的垂直投影呈鏡像對稱,該第一畫素的該第一訊號線在該第一基板上的垂直投影與該第二畫素的該第三訊號線在該第一基板上的垂直投影實質上重合,且該第一薄膜電晶體在該第一基板上的垂直投影與該第二薄膜電晶體在該第一基板上的垂直投影相對於該第一訊號線在該第一基板上的垂直投影呈鏡像對稱。 A display device, comprising: a first substrate; a plurality of first pixels arranged on the first substrate, wherein each of the first pixels has a first signal line interleaved with the first signal line A second signal line, a first thin film transistor electrically connected to the first signal line and the second signal line, and a first pixel electrode electrically connected to the first thin film transistor; a second The substrate is arranged opposite to the first substrate; a plurality of second pixels are arranged on the second substrate, wherein each of the second pixels has a third signal line, which is arranged alternately with the third signal line A fourth signal line, a second thin film transistor electrically connected to the third signal line and the fourth signal line, and a second pixel electrode electrically connected to the second thin film transistor; and The display medium is arranged between the first substrate and the second substrate, wherein the vertical projection of the first thin film transistor of a first pixel on the first substrate and the second pixel of the second pixel The vertical projection of the two thin film transistors on the first substrate is mirror-symmetrical, and the vertical projection of the first signal line of the first pixel on the first substrate and the third signal line of the second pixel are in The vertical projection on the first substrate substantially overlaps, and the vertical projection of the first thin film transistor on the first substrate and the vertical projection of the second thin film transistor on the first substrate are relative to the first signal The vertical projection of the line on the first substrate is mirror-symmetrical. 如申請專利範圍第1項所述的顯示裝置,其中該第一畫素的該第一畫素電極在該第一基板上的垂直投影與該第二畫素的該第二畫素電極在該第一基板上的垂直投影相對於該第一訊號線在該第一基板上的垂直投影呈鏡像對稱。 The display device according to claim 1, wherein the vertical projection of the first pixel electrode of the first pixel on the first substrate and the second pixel electrode of the second pixel are on the The vertical projection on the first substrate is mirror-symmetrical to the vertical projection of the first signal line on the first substrate. 如申請專利範圍第1項所述的顯示裝置,其中該第一訊號線為一第一資料線,且該第三訊號線為一第二資料線。 For the display device described in the first item of the scope of patent application, the first signal line is a first data line, and the third signal line is a second data line. 如申請專利範圍第1項所述的顯示裝置,其中該第一訊號線為一第一掃描線,且該第三訊號線為一第二掃描線。 As for the display device described in claim 1, wherein the first signal line is a first scan line, and the third signal line is a second scan line. 一種顯示裝置,包括:一第一基板;多個第一畫素,設置於該第一基板上,其中每一該第一畫素具有一第一訊號線、與該第一訊號線交錯設置的一第二訊號線、電性連接至該第一訊號線及該第二訊號線的一第一薄膜電晶體和電性連接至該第一薄膜電晶體的一第一畫素電極;一第二基板,設置於該第一基板的對向;多個第二畫素,設置於該第二基板上,其中每一該第二畫素具有一第三訊號線、與該第三訊號線交錯設置的一第四訊號線、電性連接至該第三訊號線及該第四訊號線的一第二薄膜電晶體和電性連接至該第二薄膜電晶體的一第二畫素電極;以及一顯示介質,設置於該第一基板與該第二基板之間,其中一該第一畫素的該第一薄膜電晶體在該第一基板上的垂直投影與一 該第二畫素的該第二薄膜電晶體在該第一基板上的垂直投影呈鏡像對稱;其中該第一基板具有一第一主動區、一第一周邊區及一第二周邊區,該些第一畫素設置於該第一主動區,該第一周邊區及該第二周邊區分別位於該第一主動區的相對兩側,而該顯示裝置更包括:一第一多工器,設置於該第一基板的該第一周邊區上,且電性連接至該些第一畫素;一第二多工器,設置於該第一基板的該第二周邊區上,且電性連接至該些第一畫素;以及一第一驅動電路,電性連接至該第一多工器,其中該第一多工器電性連接於該第一驅動電路及該些第一畫素之間,且該些第一畫素電性連接於該第一多工器與該第二多工器之間。 A display device, comprising: a first substrate; a plurality of first pixels arranged on the first substrate, wherein each of the first pixels has a first signal line interleaved with the first signal line A second signal line, a first thin film transistor electrically connected to the first signal line and the second signal line, and a first pixel electrode electrically connected to the first thin film transistor; a second The substrate is arranged opposite to the first substrate; a plurality of second pixels are arranged on the second substrate, wherein each of the second pixels has a third signal line, which is arranged alternately with the third signal line A fourth signal line, a second thin film transistor electrically connected to the third signal line and the fourth signal line, and a second pixel electrode electrically connected to the second thin film transistor; and The display medium is arranged between the first substrate and the second substrate, and a vertical projection of the first thin-film transistor of the first pixel on the first substrate and a The vertical projection of the second thin film transistor of the second pixel on the first substrate is mirror-symmetrical; wherein the first substrate has a first active area, a first peripheral area, and a second peripheral area, the The first pixels are arranged in the first active area, the first peripheral area and the second peripheral area are respectively located on opposite sides of the first active area, and the display device further includes: a first multiplexer, Is disposed on the first peripheral area of the first substrate and is electrically connected to the first pixels; a second multiplexer is disposed on the second peripheral area of the first substrate and is electrically connected Connected to the first pixels; and a first driving circuit electrically connected to the first multiplexer, wherein the first multiplexer is electrically connected to the first driving circuit and the first pixels And the first pixels are electrically connected between the first multiplexer and the second multiplexer. 如申請專利範圍第5項所述的顯示裝置,其中該第一多工器在該第一基板上的垂直投影與該第二多工器在該第一基板上的垂直投影呈鏡像對稱。 According to the display device described in claim 5, the vertical projection of the first multiplexer on the first substrate and the vertical projection of the second multiplexer on the first substrate are mirror-symmetrical. 如申請專利範圍第5項所述的顯示裝置,更包括:多條第一扇出走線,電性連接於該第一多工器,其中該第一驅動電路電性連接至該些第一扇出走線;以及多條第二扇出走線,電性連接於該第二多工器,且該些第二扇出走線的多個端點與該第一基板的一邊緣實質上切齊。 The display device described in item 5 of the scope of patent application further includes: a plurality of first fan-out wires electrically connected to the first multiplexer, wherein the first driving circuit is electrically connected to the first fans Outgoing traces; and a plurality of second fan-out traces are electrically connected to the second multiplexer, and a plurality of end points of the second fan-out traces are substantially aligned with an edge of the first substrate. 如申請專利範圍第5項所述的顯示裝置,其中該第二基板具有一第二主動區、一第三周邊區及一第四周邊區,該些第二畫素設置於該第二主動區,該第三周邊區及該第四周邊區分別位於該第二主動區的相對兩側,而該顯示裝置更包括:一第三多工器,設置於該第二基板的該第三周邊區上,且電性連接至該些第二畫素;一第四多工器,設置於該第二基板的該第四周邊區上,且電性連接至該些第二畫素;以及一第二驅動電路,電性連接至該第三多工器,其中該第四多工器電性連接於該第二驅動電路及該些第二畫素之間,且該些第二畫素電性連接於該第三多工器與該第四多工器之間。 The display device according to claim 5, wherein the second substrate has a second active area, a third peripheral area, and a fourth peripheral area, and the second pixels are disposed in the second active area , The third peripheral area and the fourth peripheral area are respectively located on opposite sides of the second active area, and the display device further includes: a third multiplexer disposed on the third peripheral area of the second substrate And electrically connected to the second pixels; a fourth multiplexer disposed on the fourth peripheral area of the second substrate and electrically connected to the second pixels; and a first Two driving circuits, electrically connected to the third multiplexer, wherein the fourth multiplexer is electrically connected between the second driving circuit and the second pixels, and the second pixels are electrically connected Connected between the third multiplexer and the fourth multiplexer. 如申請專利範圍第8項所述的顯示裝置,其中該第三多工器在該第二基板上的垂直投影與該第四多工器在該第二基板上的垂直投影呈鏡像對稱。 According to the display device described in claim 8, wherein the vertical projection of the third multiplexer on the second substrate and the vertical projection of the fourth multiplexer on the second substrate are mirror-symmetrical. 如申請專利範圍第8項所述的顯示裝置,更包括:多條第三扇出走線,電性連接於該第三多工器;以及多條第四扇出走線,電性連接於該第四多工器,其中該第二驅動電路電性連接至該些第四扇出走線,且該些第三扇出走線的多個端點與該第二基板的一邊緣實質上切齊。 For example, the display device described in item 8 of the scope of patent application further includes: a plurality of third fan-out wires electrically connected to the third multiplexer; and a plurality of fourth fan-out wires electrically connected to the first A quad multiplexer, wherein the second driving circuit is electrically connected to the fourth fan-out traces, and the ends of the third fan-out traces are substantially aligned with an edge of the second substrate. 如申請專利範圍第1項或第5項所述的顯示裝置,更包括: 多個第一遮光條,設置於該第一基板上,其中該些第一遮光條在該第一基板上的多個垂直投影與該些第一畫素之多條第一訊號線在該第一基板上的多個垂直投影交替排列,且每一該第一遮光條在該第一基板上的垂直投影位於該些第一訊號線之相鄰兩條第一訊號線在該第一基板上的多個垂直投影之間。 For example, the display device described in item 1 or item 5 of the scope of patent application includes: A plurality of first shading bars are arranged on the first substrate, wherein the vertical projections of the first shading bars on the first substrate and the first signal lines of the first pixels are on the first substrate A plurality of vertical projections on a substrate are arranged alternately, and the vertical projection of each of the first shading strips on the first substrate is located on the first signal lines. Two adjacent first signal lines are on the first substrate Between multiple vertical projections.
TW108124808A 2019-07-13 2019-07-13 Display apparatus TWI709794B (en)

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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201037432A (en) * 2009-04-03 2010-10-16 Century Display Shenxhen Co High display quality pixel electrode structure
US20100320472A1 (en) * 2009-04-03 2010-12-23 Chih-Chung Liu Pixel electrode structure with high display quality
TWI572963B (en) * 2014-02-12 2017-03-01 友達光電股份有限公司 Display panel
TW201909410A (en) * 2017-07-06 2019-03-01 鴻海精密工業股份有限公司 Display device and method for making same

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201037432A (en) * 2009-04-03 2010-10-16 Century Display Shenxhen Co High display quality pixel electrode structure
US20100320472A1 (en) * 2009-04-03 2010-12-23 Chih-Chung Liu Pixel electrode structure with high display quality
TWI572963B (en) * 2014-02-12 2017-03-01 友達光電股份有限公司 Display panel
TW201909410A (en) * 2017-07-06 2019-03-01 鴻海精密工業股份有限公司 Display device and method for making same

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