TWI709360B - Plasma control system and plasma control system program - Google Patents

Abstract

The present invention can use a long-sized antenna to cope with the increase in the size of the substrate and generate uniform plasma along the long side of the antenna. The present invention includes: a high-frequency power supply; a first antenna, one end of which is connected to the high-frequency power supply; a second antenna, one end of which is connected to the other end of the first antenna; and a first variable reactance element arranged on the first antenna Between the antenna and the second antenna, the reactance is changed by the movement of the movable part; the first driving part moves the movable part of the first variable reactance element; the second variable reactance element is the other part of the second antenna One end is connected, and the reactance is changed by the movement of the movable part; the second driving part moves the movable part of the second reactance variable element; the first current detection part detects the current flowing into one end of the first antenna; The second current detection part detects the current flowing between the first antenna and the second antenna; the third current detection part detects the current flowing in the other end of the second antenna; and the control device outputs the The first current value obtained by the first current detecting unit, the second current value obtained by the second current detecting unit, and the third current value obtained by the third current detecting unit become equal to each other, which are controlled separately Control signals for the first driving part and the second driving part.

Description

Plasma control system and plasma control system program

The present invention relates to a plasma control system for controlling inductively coupled plasma generated by flowing high-frequency current into an antenna, and a program used in the plasma control system.

As a generator of inductively coupled plasma (abbreviated as ICP (Inductively Coupled Plasma)), as shown in Patent Document 1, it is known that a plurality of antennas are arranged on the four corners of a substrate in a vacuum vessel, and the height The plasma processing device is constructed in such a way that high-frequency current flows into these antennas.

To explain in more detail, this plasma processing apparatus includes variable impedance elements connected to the plurality of antennas, and pickup coils or capacitors provided on the power supply sides of the plurality of antennas. Furthermore, the impedance value of the variable impedance element is feedback controlled based on the output value from the pickup coil or the capacitor, thereby controlling the density of the plasma generated around each antenna within a predetermined range, and achieving a vacuum container The spatial homogenization of the plasma density generated inside.

However, if the substrate becomes a large substrate, it cannot be dealt with by arranging relatively short antennas on the four corners of the substrate as used in the plasma processing apparatus of Patent Document 1. In this case, the patent A long antenna as shown in Document 2.

When such a long antenna is arranged in a vacuum container to generate inductively coupled plasma, the electrostatic coupling between the antenna and the plasma causes current to flow between the antenna and the vacuum through the plasma. Flow between the walls of the container, or allow current to flow between adjacent antennas via plasma.

As a result, there is a problem that the distribution of the amount of current along the longitudinal direction of the antenna becomes uneven, and the plasma density along the longitudinal direction of the antenna becomes uneven.

[Prior Art Literature]

[Patent Literature]

Patent Document 1: Japanese Patent Laid-Open No. 2004-228354

Patent Document 2: Japanese Patent Laid-Open No. 2016-138598

Therefore, the present invention was developed to solve the above-mentioned problems, and its main problem is that a long antenna can be used to cope with the increase in the size of the substrate, and the generation of uniform plasma along the longitudinal direction of the antenna is its main problem.

That is, the plasma control system of the present invention is characterized by comprising: a high-frequency power supply; a first antenna, one end of which is connected to the high-frequency power supply; a second antenna, one end of which is connected to the other end of the first antenna Section connection; a first variable reactance element, arranged between the first antenna and the second antenna, the reactance is changed by the movement of the movable part; the first driving part makes the first reactance variable The movable part of the element moves; the second variable reactance element is connected to the other end of the second antenna, and the reactance is The movable member moves and changes; a second driving part moves the movable part of the second variable reactance element; a first current detection part detects the current flowing into one end of the first antenna; second A current detection unit that detects the current flowing between the first antenna and the second antenna; a third current detection unit that detects the current that flows into the other end of the second antenna; and a control device , The output is used to use the first current value obtained by the first current detection unit, the second current value obtained by the second current detection unit, and the first current value obtained by the third current detection unit The three current values become equal to each other, and the control signals of the first driving part and the second driving part are respectively controlled.

According to this plasma control system, the control device outputs control signals for controlling the first driving part and the second driving part so that the first current value, the second current value, and the third current value become equal to each other. Therefore, the current flowing in the first antenna and the second antenna can be made as uniform as possible along the longitudinal direction.

As a result, a long antenna can be used to cope with an increase in the size of the substrate, and a uniform plasma can be generated along the longitudinal direction of the antenna.

Furthermore, in the present invention, "the first current value, the second current value, and the third current value become equal to each other" means except for the case where the first current value, the second current value, and the third current value become the same , It also includes making the current flowing in the first antenna and the second antenna as uniform as possible along the long side direction, and then generating a variable between the first current value, the second current value, and the third current value. Disregarded errors or undetectable errors.

As used to phase the first current value, the second current value, and the third current value The specific structure of the control device that becomes equal to each other may include the following structure, which includes: a first comparison unit that compares the first detection value with the second detection value; and a second comparison unit that compares the The second detection value is compared with the third detection value; and the control unit, based on the comparison result of the first comparison unit, outputs a signal for outputting the first current value and the second current value to become equal Control the control signal of the first driving part, and according to the comparison result of the second comparing part, output for controlling the second driving in such a way that the second current value and the third current value become equal Department of control signal.

With this structure, the first current value and the second current value can be made equal, and the second current value and the third current value can be made equal, and as a result, the first current value and the second current value can be made equal , And the third current value become equal to each other.

As another structure of the control device, the following structure can be cited, which includes: a mode data storage unit that stores the relationship between the first current value, the second current value, and the third current value. The multiple reference current value modes and the corresponding reference current value modes are determined in advance, and are used to control the first drive unit and the second drive unit in such a way that the current values become equal to each other. Mode data; an actual current value mode judging unit that judges the actual current value mode as the actual magnitude relationship of the first current value, the second current value, and the third current value; and the control unit, judging and The reference current value mode corresponding to the actual current value mode, and according to the control mode that has been combined with the reference current value mode, output for controlling the first driving part and the second driving part respectively Control signal.

With this structure, according to the control mode corresponding to the actual current value mode, a control signal for controlling the first driving part and the second driving part respectively is output, so that the first current value, the second current value, and the And the third current value becomes equal to each other.

In addition, in the structure in which the first antenna and the second antenna respectively penetrate the opposed side walls of the vacuum container containing the substrate, and the ends of the antennas on the same side are electrically connected and connected in series, when each reactance element is changed In the case of reactance, the variation of the second current value is smaller than the variation of the first current value or the third current value. The reason for this is considered to be that the current flowing between the first antenna and the second antenna is less affected by the plasma than the current flowing in each antenna.

Therefore, the control device is preferably configured as follows: when the first current value and the second current value are different from each other, output is used to make the first current value close to the first current value. The control signal of the first driving unit is controlled in a two-current value mode. When the second current value and the third current value are different from each other, the output is used to make the third current value close to all The second current value is used to control the control signal of the second driving unit.

With this structure, the first current value or the third current value is made close to the relatively stable second current value, so the first current value, the second current value, and the third current value can be adjusted in a relatively short time. Become equal to each other.

As the first variable reactance element, the following variable capacitor can be cited, which has: a first fixed electrode electrically connected to the first antenna; a second fixed electrode electrically connected to the second antenna Sexual connection; and as the movable electrode of the movable member, a first capacitor is formed between the first fixed electrode and the A second capacitor is formed between the second fixed electrodes; and the movable electrode is configured to change its electrostatic capacitance by rotating around a predetermined rotation axis.

In this structure, for example, when the electrostatic capacitance is zero, that is, when the movable electrode and each fixed electrode do not overlap each other in a plan view, if a gap is formed between the movable electrode and each fixed electrode, sometimes Arc discharge occurs in the gap, which may cause damage to the capacitor element.

Therefore, in the above configuration, it is preferable that the control device includes a control stop portion that stops the rotation of the movable electrode when the rotation angle of the movable electrode has reached a predetermined threshold value.

With this structure, the rotation of the movable electrode can be stopped before reaching the rotation angle at which arc discharge may occur, and the generation of arc discharge can be prevented.

Preferably, the first antenna and the second antenna respectively penetrate the opposing side walls of the vacuum container accommodating the substrate, and are connected in series by a connecting conductor interposed between ends of the same side of each antenna , Each of the antennas has a flow path in which a cooling liquid flows, and the connecting conductor has: a first variable capacitor as the first variable reactance element; a first connecting portion for connecting the first variable A capacitor is connected to the end of the first antenna, and the coolant flowing out of the opening formed in the end is guided to the first variable capacitor; and a second connection part The first variable capacitor is connected to an end of the second antenna, and the coolant that has passed through the first variable capacitor is guided into an opening formed at the end; and The coolant is the dielectric of the first variable capacitor.

With this structure, the reactance for high-frequency currents in short becomes from the antenna The inductive reactance is obtained by subtracting the capacitive reactance of the first variable capacitor. Therefore, a pair of antennas can be connected in series and the impedance of the antenna can be reduced. As a result, even when the antenna is made longer, the increase in impedance can be suppressed, high-frequency current can easily flow into the antenna, and plasma can be generated efficiently. Furthermore, since the cooling liquid of the antenna is used as the dielectric of the first variable capacitor, the first variable capacitor can be cooled and sudden changes in its electrostatic capacitance can be suppressed.

In addition, the plasma control system program of the present invention is a program for the plasma control system, the plasma control system includes: a high-frequency power supply; a first antenna, one end of which is connected to the high-frequency power supply; The second antenna has one end connected to the other end of the first antenna; the first variable reactance element is arranged between the first antenna and the second antenna, and the reactance is provided by a movable part The first driving part moves the movable part of the first variable reactance element; the second variable reactance element is connected to the other end of the second antenna, and the reactance passes through the movable part Move and change; a second drive part to move the movable part of the second variable reactance element; a first current detection part to detect a current flowing into one end of the first antenna; a second current detection Section, detecting the current flowing between the first antenna and the second antenna; and a third current detecting section, detecting the current flowing into the other end of the second antenna; and the electrical The program for the pulp control system is characterized in that: the computer is used to output the first current value obtained by the first current detection unit, the second current value obtained by the second current detection unit, and The third current values obtained by the third current detecting unit become equal to each other, and the functions of the control signals of the first driving unit and the second driving unit are respectively controlled.

According to such a plasma control system program, the same functions and effects as the plasma control system can be exerted.

According to the present invention configured as described above, a long antenna can be used to cope with an increase in the size of the substrate, and uniform plasma can be generated along the longitudinal direction of the antenna.

2: Vacuum container

3: antenna

3(A): The first antenna

3a1: One end (end on the power supply side)

3a2: the other end

3(B): second antenna

3b1: one end

3b2: The other end (terminal part)

3H: Opening

3s: flow path

4: High frequency power supply

5: Vacuum exhaust device

6: substrate holder

7: Bias power supply

8: Insulating member

10: Insulating cover

11: Circulating flow path

12: connecting conductor

13: Variable capacitor

14: The first connection part

15: The second connecting part

16: first fixed electrode

17: Second fixed electrode

18: Movable electrode (movable part)

19: Containment container

21: Gas inlet

41: matching circuit

61: heater

91, 92: liner

100: Plasma processing device

101: DC conversion circuit

102: AD converter

103: Motor drive circuit

111: Thermostat

112: Circulation mechanism

161: The first fixed metal plate

161a, 171a, 182a, 183a: end edge

161b, 171b: front edge

162: first flange member

162H, 172H: through hole

171: The second fixed metal plate

172: second flange member

181: Rotating shaft

181x: The part that supports the first movable metal plate 182 and the second movable metal plate 183

181y: The part extending outward from the container 19

182: The first movable metal plate

183: The second movable metal plate

191: positioning recess

200: Plasma control system

A1: The first facing area

A2: The second facing area

C: Rotation axis

CL: Coolant (liquid dielectric)

G: Gas

IR: high frequency current

I1: the first current value

I2: second current value

I3: Third current value

M1: The first drive unit (motor)

M2: The second drive unit (motor)

P: Inductively coupled plasma

P1: Import port

P2: Export port

S1: The first current detection part

S2: The second current detection part

S3: The third current detection unit

Sa, Sb: sealing components

VC1: The first variable capacitor

VC2: second variable capacitor

VC3: Third variable capacitor

W: substrate

X: control device

X1: Current value acquisition section

X2: The first comparison section

X3: The second comparison section

X4: Control Department

X5: Control stop

X6: Pattern data storage section

X7: Actual current value mode judgment unit

θ: rotation angle

S1~S6: steps

Z: gap

FIG. 1 is a schematic diagram showing the configuration of a plasma control system of this embodiment.

FIG. 2 is a longitudinal sectional view schematically showing the structure of the plasma processing apparatus of the present embodiment.

FIG. 3 is a cross-sectional view schematically showing the structure of the plasma processing apparatus of the present embodiment.

FIG. 4 is a cross-sectional view schematically showing the connecting conductor of the present embodiment.

Fig. 5 is a longitudinal sectional view schematically showing the connecting conductor of the present embodiment.

Fig. 6 is a side view of the variable capacitor of this embodiment viewed from the inlet port side.

Fig. 7 is a schematic diagram showing a state where the fixed metal plate and the movable metal plate of the present embodiment are not facing each other.

FIG. 8 is a schematic diagram showing a state where the fixed metal plate and the movable metal plate of this embodiment face each other.

FIG. 9 is a functional block diagram showing the functions of the control device of this embodiment.

FIG. 10 is a flowchart for explaining the operation of the control device of this embodiment.

Fig. 11 is a functional block diagram showing the functions of the control device of the second embodiment.

Fig. 12 is a diagram for explaining a reference current value pattern of the second embodiment.

FIG. 13 is a schematic diagram showing the configuration of a plasma control system in another embodiment.

Hereinafter, an embodiment of the plasma control system of the present invention will be described with reference to the drawings.

<System structure>

As shown in FIG. 1, the plasma control system 200 of this embodiment at least includes a plasma processing device 100 that uses inductively coupled plasma to process a substrate, and a control device X for controlling the plasma.

First, the plasma processing apparatus 100 will be described.

As shown in FIG. 2, the plasma processing apparatus 100 is a device that performs, for example, film formation, etching, ashing, and sputtering on the substrate W using a plasma chemical vapor deposition (CVD) method. The substrate W is, for example, a substrate for a flat panel display (FPD) such as a liquid crystal display or an organic electroluminescence (Electroluminescence, EL) display, a flexible substrate for a flexible display, and the like.

Furthermore, the plasma processing device 100 is also called a plasma CVD device when the plasma CVD method is used for film formation, and when etching is performed, it is also called a plasma etching device. In this case, it is also called a plasma ashing device, and in the case of sputtering, it is also called a plasma sputtering device.

Specifically, the plasma processing apparatus 100 includes: a vacuum container 2 for performing vacuum exhaust and introducing gas G; a long antenna 3 arranged in the vacuum container 2; And the high-frequency power source 4 applies a high frequency to the antenna 3 for generating inductively coupled plasma P in the vacuum container 2. Furthermore, when a high frequency is applied to the antenna 3 from the high frequency power supply 4, a high frequency current IR flows into the antenna 3, an induced electric field is generated in the vacuum container 2 and an inductive coupling type plasma P is generated.

The vacuum container 2 is, for example, a metal container, and the inside thereof is evacuated by a vacuum exhaust device 5. In this example, the vacuum container 2 is electrically grounded.

In the vacuum container 2, the gas G is introduced through, for example, a flow regulator (not shown) and a gas inlet 21 formed on the side wall of the vacuum container 2. The gas G only needs to be set to correspond to the content of the processing performed on the substrate W.

In addition, a substrate holder 6 holding the substrate W is provided in the vacuum container 2. The self-bias power supply 7 may also apply a bias voltage to the substrate holder 6 as in this example. The bias voltage is, for example, a negative DC voltage, a negative pulse voltage, etc., but it is not limited to this. With such a bias voltage, for example, the energy of the positive ions in the plasma P when the substrate W is incident on the substrate W can be controlled, and the crystallinity of the film formed on the surface of the substrate W can be controlled. A heater 61 for heating the substrate W may be provided in the substrate holder 6.

Here, the antenna 3 is a linear antenna, and a plurality of antennas are arranged above the substrate W in the vacuum container 2 along the surface of the substrate W (for example, substantially parallel to the surface of the substrate W).

The vicinity of both ends of the antenna 3 penetrates the mutually opposed side walls of the vacuum container 2 respectively. Insulating members 8 are respectively provided on the portions through which both ends of the antenna 3 penetrate the vacuum container 2. Both ends of the antenna 3 penetrate the insulating members 8, and the penetration portions are vacuum-sealed by, for example, gaskets 91. Between each insulating member 8 and the vacuum container 2 It is also vacuum sealed by a gasket 92, for example. Furthermore, the material of the insulating member 8 is, for example, ceramics such as alumina, quartz, or engineering plastics such as polyphenylene sulfide (PPS) or polyether-ether-ketone (PEEK).

Furthermore, in the antenna 3, a portion located in the vacuum container 2 is covered by a straight tubular insulating cover 10. Both ends of the insulating cover 10 are supported by insulating members 8. Furthermore, the material of the insulating cover 10 is, for example, quartz, alumina, fluororesin, silicon nitride, silicon carbide, silicon, etc.

In addition, the plurality of antennas 3 are antennas of a hollow structure having a flow path 3s through which the coolant CL flows. In this embodiment, the antenna 3 is a metal tube having a straight tubular shape. The material of the metal pipe is, for example, copper, aluminum, these alloys, and stainless steel.

Furthermore, the cooling liquid CL is circulated through the antenna 3 through the circulation flow path 11 provided outside the vacuum vessel 2, and the circulation flow path 11 is provided with a device for adjusting the cooling liquid CL to a fixed temperature. A temperature adjustment mechanism 111 such as a heat exchanger, and a circulation mechanism 112 such as a pump for circulating the cooling liquid CL in the circulation flow path 11. As the coolant CL, from the viewpoint of electrical insulation, high-resistance water is preferable, for example, pure water or water close to pure water is preferable. In addition, for example, a liquid refrigerant other than water such as a fluorine-based inert liquid may also be used.

In addition, as shown in FIG. 3, a plurality of antennas 3 are connected by connecting conductors 12 to form a single antenna structure. In other words, the end portions of the antennas 3 that are adjacent to each other that extend toward the outside of the vacuum container 2 are electrically connected to each other by the connecting conductor 12. To describe in more detail, in this embodiment, two antennas 3 are connected by a connecting conductor 12, and one of the antennas 3 (hereinafter, also referred to as the first antenna 3A) The end of is electrically connected to the end of another antenna 3 (hereinafter, also referred to as the second antenna 3B).

Here, the ends of the first antenna 3A and the second antenna 3B connected by the connecting conductor 12 are the ends on the same side wall. As a result, the high-frequency currents IR opposite to each other flow into the first antenna 3A and the second antenna 3B.

In addition, the connecting conductor 12 has a flow path inside, and is configured such that the cooling liquid CL flows into the flow path. Specifically, one end of the connecting conductor 12 communicates with the flow path of the first antenna 3A, and the other end of the connecting conductor 12 communicates with the flow path of the second antenna 3B. Thereby, in the antennas 3A and 3B adjacent to each other, the coolant CL that has flowed in the first antenna 3A flows into the second antenna 3B through the flow path of the connection conductor 12. In this way, the plurality of antennas 3 can be cooled by the common cooling liquid CL. In addition, the plurality of antennas 3 can be cooled by one flow path, so the structure of the circulation flow path 11 can be simplified.

The end of the antenna 3A and the antenna 3B on the side not connected by the connecting conductor 12 (here, the end of the first antenna 3A) becomes the power supply side end 3a1, and the power supply side end 3a1 passes through the matching circuit 41 And connected to the high-frequency power source 4. In addition, the terminal portion 3b2 which is the other end portion (here, the other end portion of the second antenna 3B) is grounded via the variable capacitor VC2. Furthermore, as the variable capacitor VC2, variable capacitors of various structures can be used. As an example, it includes a fixed electrode (not shown) and a movable electrode (not shown) as a movable member forming a capacitor between the fixed electrode and the fixed electrode. Show), and is constructed in a way that the movable electrode rotates around a predetermined axis of rotation to change its electrostatic capacitance.

With this structure, the high-frequency current IR can flow from the high-frequency power source 4 through the matching circuit 41 into the antenna 3. The high-frequency frequency is, for example, a general 13.56 MHz, but it is not limited to this.

<Structure of Connection Conductor 12>

Next, the connecting conductor 12 will be described in detail with reference to FIGS. 4 to 8. In addition, in FIGS. 4 and 5, a part of the sealing member and the like are omitted.

As shown in FIGS. 4 and 5, the connecting conductor 12 includes: a variable capacitor VC1, which is electrically connected to each antenna 3A and antenna 3B; and a first connecting portion 14, which is connected to the variable capacitor VC1 and the other of the first antenna 3A. One end portion 3a2 is connected; and the second connection portion 15 connects the variable capacitor VC1 and one end portion 3b1 of the second antenna 3B. In addition, in order to distinguish the variable capacitor VC1 from the variable capacitor VC2 connected to the terminal portion 3b2 of the second antenna 3B shown in FIGS. 1 and 2, the former will be referred to as the first variable capacitor below. VC1, the latter is called the second variable capacitor VC2.

The first connecting portion 14 is in electrical contact with the antenna 3A by surrounding the other end 3a2 of the first antenna 3A, and guides the coolant CL from the opening 3H formed in the other end 3a2 of the antenna 3A To the first variable capacitor VC1.

The second connecting portion 15 is in electrical contact with the antenna 3B by surrounding the one end 3b1 of the second antenna 3B, and guides the coolant CL that has passed through the first variable capacitor VC1 to the antenna 3B. One of the openings 3H in the one end 3b1.

The materials of the connecting portions 14 and 15 are, for example, copper, aluminum, these alloys, and stainless steel.

The connecting portions 14 and 15 of the present embodiment are at the end of the antenna 3, and are mounted liquid-tightly on the side closer to the vacuum container 2 than the opening 3H via a sealing member Sa such as an O-ring, and are not limited It is configured to be outside the opening 3H (see FIG. 4). Thereby, it becomes a structure which allows a slight tilt of the antenna 3 with respect to the connection part 14 and the connection part 15.

The first variable capacitor VC1 includes: a first fixed electrode 16 electrically connected to the first antenna 3A; a second fixed electrode 17 electrically connected to the second antenna 3B; and a movable electrode 18 as a movable component, and A first capacitor is formed between the first fixed electrode 16 and a second capacitor is formed between the first fixed electrode 17.

The first variable capacitor VC1 of the present embodiment is configured such that the movable electrode 18 rotates around a predetermined rotation axis C, so that the electrostatic capacitance thereof can be changed. Furthermore, the first variable capacitor VC1 includes an insulating container 19 that houses the first fixed electrode 16, the second fixed electrode 17, and the movable electrode 18.

The storage container 19 has an introduction port P1 through which the cooling liquid CL from the first antenna 3A is introduced, and an exit port P2 through which the cooling liquid CI is led out to the second antenna 3B. The inlet port P1 is formed on one side wall (the left side wall in FIG. 4) of the container 19, the outlet port P2 is formed on the other side wall (the right side wall in FIG. 4) of the container 19, and the inlet ports P1 and The outlet ports P2 are arranged at positions facing each other. In addition, the storage container 19 of this embodiment is formed in the substantially rectangular parallelepiped shape which has a hollow part inside, but may be another shape.

The first fixed electrode 16 and the second fixed electrode 17 are arranged at different positions around the rotation axis C of the movable electrode 18. In this embodiment, the first solid The fixed electrode 16 is inserted into the inside of the storage container 19 from the introduction port P1 of the storage container 19 and installed. In addition, the second fixed electrode 17 is inserted into the inside of the storage container 19 from the outlet port P2 of the storage container 19 and installed. Thereby, the first fixed electrode 16 and the second fixed electrode 17 are arranged at symmetrical positions with respect to the rotation axis C.

As shown in FIGS. 5 and 6, the first fixed electrode 16 has a plurality of first fixed metal plates 161 arranged to face each other. In addition, the second fixed electrode 17 has a plurality of second fixed metal plates 171 that are arranged to face each other. The fixed metal plates 161 and the fixed metal plates 171 are arranged along the rotation axis C at substantially equal intervals.

In addition, the plurality of first fixed metal plates 161 are mutually formed in the same shape and are supported by the first flange member 162. The first flange member 162 is fixed to the left side wall of the storage container 19 where the introduction port P1 is formed. Here, a through hole 162H communicating with the introduction port P1 is formed in the first flange member 162. In addition, the plurality of second fixed metal plates 171 are mutually formed in the same shape, and are supported by the second flange member 172. The second flange member 172 is fixed to the right side wall of the storage container 19 where the outlet port P2 is formed. Here, a through hole 172H communicating with the outlet port P2 is formed in the second flange member 172. The plurality of first fixed metal plates 161 and the plurality of second fixed metal plates 171 are fixed to the storage container 19 and are arranged at positions symmetrical about the rotation axis C.

In addition, the first fixed metal plate 161 and the second fixed metal plate 171 are formed in a flat plate shape. As shown in FIG. 7, in a plan view, they have a shape whose width decreases toward the rotation axis C. Moreover, in each of the fixed metal plate 161 and the fixed metal plate 171, The end side 161a and the end side 171a having a reduced width are formed along the radial direction of the rotation axis C. Furthermore, the angle formed by the end side 161a and the end side 171a facing each other is 90 degrees. In addition, each of the fixed metal plate 161, the front end side 161b of the fixed metal plate 171 on the side of the rotation axis C, and the front end side 171b form an arc shape.

As shown in FIGS. 4 and 5, the movable electrode 18 includes a rotating shaft body 181, which is pivotally supported on the side wall (the front side wall in FIG. 4) of the container 19 so as to be rotatable around the rotating shaft C; and a first movable metal plate 182, It is supported by the rotating shaft body 181 and facing the first fixed electrode 16; and the second movable metal plate 183 is supported by the rotating shaft body 181 and facing the second fixed electrode 17.

The rotating shaft body 181 has a linear shape extending along the rotating shaft C. The rotating shaft body 181 is configured such that one end portion thereof extends outward from the front side wall of the container 19. In addition, the front side wall of the storage container 19 is rotatably supported by a sealing member Sb such as an O-ring. Here, in the front side wall, two O-rings support at two points. In addition, the other end of the rotating shaft body 181 rotatably contacts the positioning recess 191 provided on the inner surface of the storage container 19.

In addition, the portion 181x of the rotating shaft body 181 that supports the first movable metal plate 182 and the second movable metal plate 183 is formed of a conductive material such as metal, and the portion 181y extending from the container 19 to the outside is insulated by resin or the like. Material formation.

A plurality of first movable metal plates 182 are provided corresponding to the first fixed metal plate 161. In addition, the first movable metal plates 182 have the same shape. In addition, a plurality of second movable metal plates 183 are provided corresponding to the second fixed metal plates 171. Furthermore, the second movable metal plates 183 are formed in the same shape. These movable metals The plate 182 and the movable metal plate 183 are provided along the rotation axis C at substantially equal intervals. In addition, in this embodiment, the movable metal plates 182 and the movable metal plates 183 are sandwiched between the fixed metal plates 161 and the fixed metal plates 171. In FIG. 4, the fixed metal plate 161 and the fixed metal plate 171 are set to six pieces, and the movable metal plate 182 and the movable metal plate 183 are set to five pieces, but it is not limited to this. In addition, the distance between the movable metal plate 182 and the movable metal plate 183 and the fixed metal plate 161 and the fixed metal plate 171 is, for example, 1 mm.

As shown in FIG. 5, the first movable metal plate 182 and the second movable metal plate 183 are provided at positions symmetrical about the rotation axis C and have the same shape. Specifically, as shown in FIG. 7, each movable metal plate 182 and the movable metal plate 183 are formed in a fan shape that expands from the rotation axis C to the radially outer side in a plan view. In this embodiment, each movable metal plate 182 and the movable metal plate 183 are those formed in a fan shape with a center angle of 90 degrees.

In the first variable capacitor VC1 configured in this way, by rotating the movable electrode 18, as shown in FIG. 8, the facing area (first facing area A1) of the first fixed metal plate 161 and the first movable metal plate 182 changes , And the facing area (second facing area A2) of the second fixed metal plate 171 and the second movable metal plate 183 changes. In this embodiment, the first facing area A1 and the second facing area A2 are changed similarly. In addition, each of the fixed metal plate 161, the front end side 161b of the fixed metal plate 171 on the side of the rotation axis C, and the front end side 171b are arc-shaped. By rotating the movable electrode 18, the first facing area A1 and the second facing area A2 are equal to The rotation angle θ of the movable electrode 18 changes proportionally.

In addition, in this embodiment, as shown in FIG. 7, in a state where the fixed metal plates 161 and 171 are not opposed to the movable metal plates 182 and 183, in a plan view, the movable metal plates 182. A gap Z is provided between the expanded end 182a and the end 183a of the movable metal plate 183 and the fixed metal plate 161 and the reduced end 161a and the end 171a of the fixed metal plate 171. Thereby, the movable electrode 18 can be removed in the axial direction. In this embodiment, the movable electrode 18 is removed by removing the front wall supporting the movable electrode 18 along the axial direction.

In the above structure, if the cooling liquid CL flows in from the introduction port P1 of the storage container 19, the inside of the storage container 19 is filled with the cooling liquid CL. At this time, the space between the first fixed metal plate 161 and the first movable metal plate 182 is filled with the coolant CL, and the space between the second fixed metal plate 171 and the second movable metal plate 183 is filled with the coolant CL. Thereby, the coolant CL becomes the dielectric of the first capacitor and the dielectric of the second capacitor. In this embodiment, the electrostatic capacitance of the first capacitor is the same as the electrostatic capacitance of the second capacitor. In addition, the first capacitor and the second capacitor configured in this way are connected in series, and the electrostatic capacitance of the first variable capacitor VC1 becomes half of the electrostatic capacitance of the first capacitor (or the second capacitor).

Here, in this embodiment, the opposing direction of the first fixed electrode 16 and the second fixed electrode 17 and the movable electrode 18 and the opposing direction of the inlet port P1 and the outlet port P2 are configured to be orthogonal. That is, the fixed metal plate 161, the fixed metal plate 171, the movable metal plate 182, and the movable metal plate 183 are provided along the opposing direction of the inlet port P1 and the outlet port P2. With this structure, the cooling liquid CL easily flows inside the storage container 19. As a result, the replacement of the cooling liquid CL in the storage container 19 becomes accommodating. It is easy, and the first variable capacitor VC1 can be cooled efficiently. In addition, the coolant CL that has flowed in from the introduction port P1 easily flows into the space between the fixed metal plate 161, the fixed metal plate 171 and the movable metal plate 182, and the movable metal plate 183, and can easily self-fix the metal plate 161, the fixed metal plate 171 and the movable metal plate Flow out between the metal plate 182 and the movable metal plate 183. As a result, the replacement of the coolant between the fixed metal plate 161, the fixed metal plate 171, the movable metal plate 182, and the movable metal plate 183 becomes easy, and the temperature change of the coolant CL used as a dielectric can be suppressed. Thereby, the electrostatic capacitance of the first variable capacitor VC1 can be easily maintained constant. Furthermore, it is difficult for air bubbles to stay between the fixed metal plate 161, the fixed metal plate 171, and the movable metal plate 182 and the movable metal plate 183.

Moreover, as shown in FIG. 1, the plasma control system 200 of this embodiment further includes: a first current detection unit S1 that detects the flow into the end portion 3a1 of the first antenna 3A (ie, the power supply side end portion 3a1) The second current detection unit S2, which detects the current flowing between the first antenna 3A and the second antenna 3B; the third current detection unit S3, which detects the other end 3b2 (ie , The current in the terminal portion 3b2); and the control device X controls the first variable capacitor VC1 and the second variable capacitor VC2. In addition, for convenience of description, in FIG. 1, the description of the peripheral structure of the antenna 3 such as the vacuum container 2 is omitted.

The first current detection unit S1 is a current monitor such as a current transformer that is installed at or near the end 3a1 of the first antenna 3A. The detection signal detected by the first current detection unit S1 is converted from AC to DC by a DC conversion circuit 101, and converted from an analog signal by an analog/digital (Analog/Digital, A/D) converter 102 After being digital signal, it is output to control device X in.

The second current detection unit S2 is a current monitor such as a current transformer provided between the first variable capacitor VC1 and one end 3b1 of the second antenna 3B. The detection signal detected by the second current detection unit S2 is converted from AC to DC by the DC conversion circuit 101, and converted from the analog signal to the digital signal by the AD converter 102, and then output to the control device X in. Furthermore, the second current detection unit S2 may also be provided between the other end 3a2 of the first antenna 3A and the first variable capacitor VC1, and output and flow the current into the other end 3a2 of the first antenna 3A. The size corresponds to the detection signal.

The third current detection unit S3 is a current monitor, such as a current transformer, installed at or near the other end 3b2 of the second antenna 3B. The detection signal detected by the third current detection unit S3 is converted from AC to DC by the DC conversion circuit 101, and converted from the analog signal to the digital signal by the AD converter 102, and then output to the control device X in.

The control device X controls the electrostatic capacitance of the first variable capacitor VC1 and the electrostatic capacitance of the second variable capacitor VC2. Here, as shown in FIG. 1, the movable electrode 18 of the first variable capacitor VC1 is driven by the motor as the first driving unit M1, and the unillustrated movable member of the second variable capacitor VC2 is used as the second The motor of the driving part M2 is driven. The motors M1 and M2 are rotated by a drive signal from a motor drive circuit 103, and the motor drive circuit 103 is controlled by the control device X.

The control device X physically includes a central processing unit (Central A computer such as a Programmable Logic Controller (PLC) such as a Processing Unit (CPU), memory, input and output interface, etc., is constructed in the following manner: by executing a program that has been stored in the memory, In addition, each device cooperates and functions as a current value acquisition unit X1, a first comparison unit X2, a second comparison unit X3, and a control unit X4 as shown in FIG. 9.

Hereinafter, each part will be described.

The current value acquisition unit X1 acquires a signal indicating the magnitude of the current detected by each current detection unit S1 to current detection unit S3.

Specifically, the current value acquiring unit X1 acquires a digital signal representing the first current value I1 detected by the first current detecting unit S1, and representing the second current value I2 detected by the second current detecting unit S2. A digital signal, and a digital signal representing the third current value I3 detected by the third current detection unit S3. Then, the first current value I1 and the second current value I2 are output to the first comparison unit X2, and the second current value I2 and the third current value I3 are output to the second comparison unit X3.

The first comparison unit X2 compares the first current value I1 with the second current value I2. Specifically, it is configured to determine whether the first current difference ΔI1 obtained by subtracting the first current value I1 from the second current value I2 is greater than zero.

The second comparison unit X3 compares the second current value I2 with the third current value I3. Specifically, it is configured to determine whether the second current difference ΔI2 obtained by subtracting the third current value I3 from the second current value I2 is greater than zero.

The control unit X4 controls the electrostatic capacitance and the second variable capacitance of the first variable capacitor VC1 based on the first current value I1, the second current value I2, and the third current value I3. The electrostatic capacitance of the VC2 feedback controller. Specifically, the control signal is output to the motor drive circuit 103 such that the first current value I1, the second current value I2, and the third current value I3 become equal to each other.

Hereinafter, while referring to the flowchart of FIG. 10, more detailed control contents will be described.

First, the first comparison unit X2 determines whether the second current value I2 is greater than the first current value I1, that is, whether the first current difference ΔI1 is greater than 0 (S1)

When it has been determined in S1 that the first current difference ΔI1 is greater than 0, the control unit X4 outputs a control signal to the motor drive circuit 103 in such a way that the electrostatic capacitance of the first variable capacitor VC1 increases (S2). Furthermore, the drive signal based on the control signal is output from the motor drive circuit 103 to the first drive part M1.

On the other hand, when it is determined in S1 that the first current difference ΔI1 is not greater than 0, that is, when the first current difference ΔI1 is 0 or less, the control unit X4 reduces the capacitance of the first variable capacitor VC1 , Output the control signal to the motor drive circuit 103 (S3). Furthermore, the drive signal based on the control signal is output from the motor drive circuit 103 to the first drive part M1.

When the electrostatic capacitance of the first variable capacitor VC1 is changed in S2 and S3, the change in the second current value I2 is relatively small, and the first current value I1 relatively greatly increases and decreases so as to approach the second current value I2. The reason for this is considered to be that the current flowing between the first antenna 3A and the second antenna 3B is less affected by the plasma than the current flowing into the first antenna 3A.

Then, the second comparison unit X3 determines whether the second current value I2 is greater than the third The current value I1, that is, whether the second current difference △I2 is greater than 0 (S4)

When it is determined in S4 that the second current difference ΔI2 is greater than 0, the control unit X4 outputs a control signal to the motor drive circuit 103 in such a way that the electrostatic capacitance of the second variable capacitor VC2 becomes smaller (S5). In addition, the drive signal based on the control signal is output from the motor drive circuit 103 to the second drive part M2.

On the other hand, when it has been determined in S4 that the second current difference ΔI2 is not greater than 0, that is, when the second current difference ΔI2 is 0 or less, the control unit X4 increases the capacitance of the second variable capacitor VC2 , Output the control signal to the motor drive circuit 103 (S6). In addition, the drive signal based on the control signal is output from the motor drive circuit 103 to the second drive part M2.

When the electrostatic capacitance of the second variable capacitor VC2 is changed in S5 and S6, the change in the second current value I2 is relatively small, and the third current value I3 relatively increases or decreases so as to approach the second current value I2. The reason for this is considered to be that the current flowing between the first antenna 3A and the second antenna 3B is less affected by the plasma than the current flowing into the second antenna 3B.

Hereinafter, the control unit X4 repeats S1 to S6, and continuously outputs the control signal in such a way that the first current value I1 and the second current value I2 become equal to each other, and the second current value I2 and the third current value I3 become equal to each other. To the motor drive circuit 103.

Furthermore, as shown in FIG. 9, the control apparatus X of this embodiment has the function as a control stop part X5.

This control stop part X5 makes the rotation of the movable electrode 18 when at least the rotation angle of the movable electrode 18 of the first variable capacitor VC1 has reached a predetermined threshold value. Transfer stopper.

More specifically, the movable electrode 18 is provided with an angle detection unit (not shown) such as an encoder, and a detection angle signal indicating the rotation angle of the movable electrode 18 is output from the angle detection unit to the control stop part X5 . Furthermore, for example, as shown in FIGS. 7 and 8, the rotation angle here is a state where the movable metal plates 182, the movable metal plates 183, and the fixed metal plates 161 and 171 will not overlap each other when viewed from above. That is, the state where the electrostatic capacitance is zero is set to the rotation angle θ at 0 degrees.

The threshold value is set to an angle in a state where each movable metal plate 182 and a part of the movable metal plate 183 and a part of the first fixed metal plate 161 or the second fixed metal plate 171 overlap each other in a plan view.

Specifically, the threshold value is to rotate each movable metal plate 182 and the movable metal plate 183 from 0 degrees at which they do not overlap each other with the fixed metal plate 161 and the fixed metal plate 171. The angle of rotation until the first fixed metal plate 161 or the second fixed metal plate 171 overlaps with the first fixed metal plate 161 or the second fixed metal plate 171 is 90 degrees, for example, 10 degrees. Furthermore, here is assumed to be a structure in which the movable metal plate 182 and the movable metal plate 183 rotate forward and backward between 0 degrees and 90 degrees. However, in the structure where the movable metal plate 182 and the movable metal plate 183 rotate more than 90 degrees, The upper limit and lower limit can also be set as the threshold.

In addition, when the rotation angle of the movable electrode 18 is greater than the threshold value, the control performed by the control unit X4 is performed. When the rotation angle of the movable electrode 18 is reduced to reach the threshold value, regardless of The judgment made by the control part X4, the control stop part X5 outputs the stop signal to the motor drive circuit 103, and is strong The rotation of the movable electrode 18 is systematically stopped.

Furthermore, the control stop part X5 may be the same as the first variable capacitor VC1, so that when the rotation angle of the movable electrode (not shown) of the second variable capacitor VC2 has reached a predetermined threshold, It is constructed in a way that the rotation of the movable electrode is stopped.

<Effects of this embodiment>

In this way, according to the plasma control system 200 of this embodiment, the control unit X4 is used to control the first driving unit so that the first current value I1, the second current value I2, and the third current value I3 become equal to each other. The control signals of M1 and the second driving part M2 are output to the motor driving circuit 103, so the high-frequency current IR flowing in the first antenna 3A and the second antenna 3B can be made uniform as much as possible along the longitudinal direction .

As a result, the long antenna 3 can be used to cope with the increase in the size of the substrate W, and uniform plasma P can be generated along the longitudinal direction of the antenna 3.

Furthermore, the "first current value I1, second current value I2, and third current value I3 are mutually equal" as long as the first current difference ΔI1 and the second current difference ΔI2 are substantially It is sufficient to change to zero, as long as the current flowing in the first antenna 3A and the second antenna 3B can be made uniform as much as possible along the longitudinal direction, the first current difference ΔI1 or the second current difference ΔI2 is also Can be slightly greater than zero or slightly less than zero.

In addition, when the rotation angle of the movable electrode 18 has reached the threshold value, the stop part X5 is controlled to stop the rotation of the movable electrode 18. Therefore, the movable metal plate 182, the movable metal plate 183, and the fixed metal plate 161. Before a gap Z is formed between the fixed metal plates 171, the rotation of the movable electrode 18 stops. Take this, not The gap Z that may generate arc discharge during the generation of the plasma P is generated, and the damage of the first variable capacitor VC1 caused by the arc discharge can be prevented.

Furthermore, since the antenna 3 can be cooled by the cooling liquid CL, the plasma P can be generated stably. In addition, since the coolant CL flowing in the antenna 3 constitutes the dielectric of the first variable capacitor VC1, it is possible to cool the first variable capacitor VC1 and suppress sudden changes in its electrostatic capacitance.

In addition, the first fixed electrode 16 and the second fixed electrode 17 are disposed at different positions around the rotation axis C, so that the size of the rotation axis C in the axial direction can be reduced.

Moreover, each of the fixed electrode 16 and the fixed electrode 17 has a plurality of fixed metal plates 161 and a fixed metal plate 171, and the movable electrode has a plurality of movable metal plates 182 and a movable metal plate 183. Therefore, the fixed metal plate 161 and the fixed metal plate may not be enlarged. The areas of 171, the movable metal plate 182, and the movable metal plate 183 increase the maximum value of the facing area between the electrodes.

<Second Embodiment>

The structure of the control device X of the plasma control system 200 in the second embodiment is different from that in the above-mentioned embodiment.

Specifically, as shown in FIG. 11, the control device X in the second embodiment includes a current value acquisition unit X1, a mode data storage unit X6, an actual current value mode determination unit X7, a control unit X4, and a control stop unit X5. Function.

Hereinafter, each section will be described. The functions of the current value acquisition section X1 and the control stop section X5 are the same as those of the above-mentioned embodiment, and therefore detailed descriptions are omitted.

The pattern data storage unit X6 is set in a predetermined area of the memory constituting the control device X, and stores a variety of reference current values indicating the magnitude relationship between the first current value I1, the second current value I2, and the third current value I3. The mode is combined with the control mode for controlling the first driving unit M1 and the second driving unit M2, which is determined in advance corresponding to each reference current value mode.

The multiple reference current value modes are different modes that can be conceived as the magnitude relationship between the first current value I1, the second current value I2, and the third current value I3. Here are the four reference modes shown in FIG. 12 The current value mode is as follows.

[First reference current value mode]

First current value I1<second current value I2<third current value I3

[Second reference current value mode]

First current value I1>second current value I2<third current value I3

[Third reference current value mode]

First current value I1>second current value I2>third current value I3

[Fourth reference current value mode]

First current value I1<second current value I2> third current value I3

Furthermore, the case where the first current value I1=the second current value I2 or the case where the second current value I2=the third current value I3 can also be considered, and the reference current value patterns can be divided into more types as appropriate.

The control mode is for each reference current value mode. The direction of increase or decrease of the reactance of the first variable capacitor VC1 and the second variable capacitor VC2 required to make the current value I1, the current value I2, and the current value I3 equal to each other is determined in advance (In other words, static The direction of increase or decrease of capacitance). Specifically, the first control mode to the fourth control mode for the first reference current value mode to the fourth reference current value mode are as follows.

[First control mode]

The reactance of the first variable capacitor VC1 is reduced, and the reactance of the second variable capacitor VC2 is reduced. In other words, the electrostatic capacitance of the first variable capacitor VC1 is reduced, and the electrostatic capacitance of the second variable capacitor VC2 is reduced.

[Second control mode]

The reactance of the first variable capacitor VC1 is increased, and the reactance of the second variable capacitor VC2 is decreased. In other words, the electrostatic capacitance of the first variable capacitor VC1 is increased, and the electrostatic capacitance of the second variable capacitor VC2 is decreased.

[Third control mode]

The reactance of the first variable capacitor VC1 is increased, and the reactance of the second variable capacitor VC2 is increased. In other words, the electrostatic capacitance of the first variable capacitor VC1 is increased, and the electrostatic capacitance of the second variable capacitor VC2 is increased.

[Fourth control mode]

The reactance of the first variable capacitor VC1 is reduced, and the reactance of the second variable capacitor VC2 is increased. In other words, the electrostatic capacitance of the first variable capacitor VC1 is reduced, and the electrostatic capacitance of the second variable capacitor VC2 is increased.

Furthermore, in each control mode, after changing the electrostatic capacitance of the first variable capacitor VC1, the electrostatic capacitance of the second variable capacitor VC2 can be changed. Conversely, the electrostatic capacitance of the second variable capacitor VC2 can also be changed. After that, the capacitance of the first variable capacitor VC1 is changed.

The actual current value pattern judgment unit X7 judges as the first current value I1, the second current value I2, and the third current value I3 based on the first current value I1, the second current value I2, and the third current value I3 output by the current value acquisition unit X1. And the actual current value model of the actual magnitude relationship of the third current value I3.

Specifically, the actual current value pattern determining unit X7 determines the magnitude relationship between the first current value I1 and the second current value I2, and also determines the magnitude relationship between the second current value I2 and the third current value I3.

The control unit X4 determines the reference current value mode corresponding to the actual current value mode, and outputs a control signal to the motor drive circuit 103 according to the control mode combined with the reference current value mode. Furthermore, the motor driving circuit 103 outputs driving signals to the first driving part M1 and the second driving part M2 respectively according to the control signal.

Specifically, firstly, among the multiple reference current value modes, a reference current value mode consistent with the magnitude relationship of the first current value I1, the second current value I2, and the third current value I3 is selected.

Furthermore, the control signal is output to the motor so that the increase or decrease direction of the electrostatic capacitance of the first variable capacitor and the second variable capacitor becomes the increase or decrease direction shown in the control mode combined with the selected reference current value mode In the driving circuit 103. In more detail, when the first current value I1 and the second current value I2 are different from each other, the control signal is output to the motor drive circuit 103 in such a way that the first current value I1 is close to the second current value I2, When the second current value I2 and the third current value I3 are different from each other, the control signal is output in such a way that the third current value I3 is close to the second current value I2 Out to the motor drive circuit 103.

According to the structure, the reference current value mode that is consistent with the actual current value mode is determined, and the control signal is output to the motor drive circuit 103 according to the control mode that has been matched with the reference current value mode, so that the first current value The value I1, the second current value I2, and the third current value I3 become equal to each other.

<Other Modified Embodiments>

In addition, the present invention is not limited to each embodiment described above.

For example, in the above embodiment, the plasma control system 200 includes two antennas 3, but as shown in FIG. 13, multiple (for example, two) antennas 3 connected in series may also be arranged in parallel. . Furthermore, the number of antennas 3 connected in series may be three or more.

Furthermore, the plasma control system 200 shown in FIG. 13 further includes a third variable capacitor VC3 respectively connected to the power supply side end 3a1 of the first antenna 3A.

With such a structure, similar to the above-mentioned embodiment, the capacitance and the capacitance of the first variable capacitor VC1 are controlled so that the first current value I1, the second current value I2, and the third current value I3 become equal. The electrostatic capacitance of the second variable capacitor VC2 can thereby generate uniform plasma P along the longitudinal direction of the first antenna 3A and the second antenna 3B.

Furthermore, the first current value I1 flowing into the power feeding side end 3a1 of each first antenna 3A is detected by the first current detection unit S1, so that the distribution ratio of the high-frequency current IR to the plurality of first antennas 3A can be grasped . Therefore, by changing the capacitance of each third variable capacitor VC3 according to each first current value I1, it is possible to adjust the The distribution ratio of the high-frequency current IR supplied by the antenna 3A.

As a result, the high-frequency current IR flowing into the first antenna 3A and the second antenna 3B can be made uniform along the longitudinal direction, and the high-frequency current IR from the high-frequency power source 4 can be evenly distributed to the parallel arrangement. In each of the first antennas 3A, the plasma P can be generated uniformly in space.

In the first variable capacitor of the above-mentioned embodiment, the movable electrode 18 is one that rotates around the rotation axis C, but the movable electrode may be one that slides in one direction. Here, as the structure in which the movable electrode slides, the movable electrode may slide in a direction orthogonal to the facing direction of the fixed electrode to change the facing area, or the movable electrode may slide in the facing direction of the fixed electrode. Those who change the facing area.

In this structure, as the first drive unit, it may be a motor as in the above-mentioned embodiment, or an air cylinder or the like.

Furthermore, in the second variable capacitor, the movable electrode may also be one that slides in one direction. In this case, an air cylinder or the like may also be used as the second driving unit.

It is also possible to use a first variable reactance element, such as a variable impedance element or a variable resistance element, whose reactance is changed by the movement of a movable member, instead of the first variable capacitor in the embodiment.

In addition, a second variable reactance element, such as a variable impedance element or a variable resistive element, whose reactance is changed by the movement of a movable member may be used instead of the second variable capacitor in the above embodiment.

In the above embodiment, the antenna is a linear antenna, but it may also be a curved or flexed shape. In this case, the metal pipe may be bent or buckled, or the insulating pipe may be bent or buckled.

In addition, the present invention is not limited to the above-mentioned embodiments, and of course various modifications can be made without departing from the spirit thereof.

3(A)‧‧‧First antenna

3a1‧‧‧One end (end of power supply side)

3a2‧‧‧The other end

3(B)‧‧‧Second antenna

3b1‧‧‧One end

3b2‧‧‧The other end (terminal part)

4‧‧‧High frequency power supply

41‧‧‧Matching circuit

100‧‧‧Plasma processing device

101‧‧‧DC conversion circuit

102‧‧‧AD converter

103‧‧‧Motor drive circuit

200‧‧‧Plasma Control System

I1‧‧‧First current value

I2‧‧‧Second current value

I3‧‧‧The third current value

M1‧‧‧First drive unit (motor)

M2‧‧‧Second drive unit (motor)

S1‧‧‧First current detection unit

S2‧‧‧Second current detection unit

S3‧‧‧The third current detection unit

VC1‧‧‧The first variable capacitor

VC2‧‧‧Second variable capacitor

X‧‧‧Control device

Claims (7)

A plasma control system, comprising: a high-frequency power supply; a first antenna, one end of which is connected to the high-frequency power supply; a second antenna, one end of which is connected to the other end of the first antenna; The variable reactance element is arranged between the first antenna and the second antenna, and the reactance is changed by the movement of a movable member; the first driving part makes the movable element of the first variable reactance element move The component moves; the second variable reactance element is connected to the other end of the second antenna, and the reactance is changed by the movement of the movable member; the second driving part makes the movable of the second variable reactance element The component moves; a first current detection unit detects the current flowing into one end of the first antenna; a second current detection unit detects the current flowing between the first antenna and the second antenna A third current detection unit, which detects the current flowing into the other end of the second antenna; and a control device, which outputs a first current value obtained by the first current detection unit, by the The second current value obtained by the second current detection unit and the third current value obtained by the third current detection unit become equal to each other, respectively controlling the first driving unit and the second driving unit Control signal. The plasma control system described in item 1 of the scope of patent application, wherein the control device includes: A first comparison unit, which compares the first detection value with the second detection value; a second comparison unit, which compares the second detection value with the third detection value; and a control unit, according to the The comparison result of the first comparing unit outputs a control signal for controlling the first driving unit in such a way that the first current value and the second current value become equal, and according to the second comparing unit The result of the comparison is to output a control signal for controlling the second driving unit in such a way that the second current value and the third current value become equal. The plasma control system described in claim 1, wherein the control device includes: a mode data storage unit that stores the first current value, the second current value, and the third The multiple reference current value patterns of the magnitude relationship of the current values and the respective reference current value patterns are determined in advance, and are used to control the first drive section and the second drive section such that the current values become equal to each other Mode data combined with the control mode; an actual current value mode judging unit that judges the actual current value mode as the actual magnitude relationship between the first current value, the second current value, and the third current value; and The control unit judges the reference current value mode corresponding to the actual current value mode, and according to the control mode that has been combined with the reference current value mode, outputs an output for separately controlling the first driving unit and the The control signal of the second driving part. The plasma control system according to any one of items 1 to 3 in the scope of the patent application, wherein the control device is configured as follows: the first current value and the second current value are different from each other In the case of outputting a control signal for controlling the first driving unit in such a way that the first current value is close to the second current value, the second current value and the third current value are mutually If they are not the same, output a control signal for controlling the second driving unit in such a way that the third current value is close to the second current value. The plasma control system according to any one of items 1 to 3 in the scope of the patent application, wherein the first variable reactance element is a variable capacitor having: a first fixed electrode, and the first The antenna is electrically connected; the second fixed electrode is electrically connected to the second antenna; and the movable electrode as the movable component forms a first capacitor with the first fixed electrode, and is connected to the A second capacitor is formed between the second fixed electrodes; and the movable electrode is rotated around a predetermined axis of rotation to change its electrostatic capacitance, and the control device is included in the rotation angle of the movable electrode When it has reached the predetermined threshold value, a control stop unit that stops the rotation of the movable electrode. The plasma control system according to any one of items 1 to 3 of the scope of patent application, wherein the first antenna and the second antenna respectively penetrate the opposite side walls of the vacuum container containing the substrate, and By the same side of each antenna The connecting conductors between the ends are connected in series, each of the antennas has a flow path through which a cooling liquid flows inside, and the connecting conductor has: a first variable capacitor as the first variable reactance element; A connecting portion that connects the first variable capacitor to the end of the first antenna, and guides the coolant flowing out of the opening formed in the end to the first variable And a second connecting portion that connects the first variable capacitor to the end of the second antenna, and guides the coolant that has passed through the first variable capacitor to be formed in And the coolant is the dielectric of the first variable capacitor. A program for a plasma control system, which is a program for a plasma control system including: a high-frequency power supply; a first antenna, one end of which is connected to the high-frequency power supply; The antenna has one end connected to the other end of the first antenna; a first variable reactance element is arranged between the first antenna and the second antenna, and the reactance is moved by the movable part Change; a first driving part to move the movable part of the first variable reactance element; a second variable reactance element connected to the other end of the second antenna, and the reactance is moved by the movable part Change; a second drive part to move the movable part of the second variable reactance element; a first current detection part to detect current flowing into one end of the first antenna; a second current detection part, Detecting the current flowing between the first antenna and the second antenna; and a third current detecting unit that detects the other end flowing into the second antenna Part of the current; and the computer is used to output the first current value obtained by the first current detection part, the second current value obtained by the second current detection part, and the first current value The third current values obtained by the three current detecting parts become equal to each other, and the functions of the control signals of the first driving part and the second driving part are respectively controlled.

Images