TWI703993B - Fluid sterilization device - Google Patents

Fluid sterilization device Download PDF

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TWI703993B
TWI703993B TW108107868A TW108107868A TWI703993B TW I703993 B TWI703993 B TW I703993B TW 108107868 A TW108107868 A TW 108107868A TW 108107868 A TW108107868 A TW 108107868A TW I703993 B TWI703993 B TW I703993B
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fluid
light
reaction chamber
sterilization device
sterilization
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TW108107868A
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Chinese (zh)
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TW201941791A (en
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盧建均
許鎮鵬
甘 馬林
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財團法人工業技術研究院
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Priority claimed from US15/940,552 external-priority patent/US20180290900A1/en
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Priority to US16/381,816 priority Critical patent/US11312642B2/en
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Abstract

A fluid sterilization device includes a first reaction chamber, a second reaction chamber, a communication chamber and at least one light source. The first reaction chamber is connected to a fluid inlet. The second reaction chamber is connected to the fluid outlet. The communication chamber connects the first reaction chamber and the second reaction chamber. The light source is configured to emit a sterilization light to the first reaction chamber and the second reaction chamber. The fluid inlet allows a fluid to enter the first reaction chamber, the communication chamber allows the fluid to pass through and then flow to the second reaction chamber, and flow velocity distribution of the fluid in the second reaction chamber is different from that of the fluid in the first reaction chamber.

Description

流體殺菌裝置Fluid sterilization device

本揭露是有關於一種流體殺菌裝置,且特別是有關於一種多反應腔的流體殺菌裝置。The present disclosure relates to a fluid sterilization device, and more particularly to a fluid sterilization device with multiple reaction chambers.

傳統的殺菌裝置一般都是採用一次殺菌的方式。然而,一次殺菌的殺菌率通常有限。若欲提高殺菌率,大多須採用高功率的殺菌光源或複雜的流路設計,但這樣會導致成本及製程複雜度的增加。Traditional sterilization devices generally adopt a one-time sterilization method. However, the sterilization rate of one sterilization is usually limited. To increase the sterilization rate, most of the high-power sterilization light sources or complicated flow path designs must be used, but this will increase the cost and complexity of the manufacturing process.

本揭露係有關於一種流體殺菌裝置,可改善前述習知問題。This disclosure relates to a fluid sterilization device that can improve the aforementioned conventional problems.

根據本揭露之一實施例,提出一種流體殺菌裝置。流體殺菌裝置包括一第一反應腔、一第二反應腔、一連通腔及一光源。第一反應腔連接至一流體入口。第二反應腔連接至流體出口。連通腔連接第一反應腔與第二反應腔。光源用以發出一殺菌光至第一反應腔與第二反應腔。其中,流體入口允許一流體進入第一反應腔,連通腔允許流體通過而進入第二反應腔,流體在第二反應腔內的流速分布不同於流體在第一反應腔內的流速分布。According to an embodiment of the disclosure, a fluid sterilization device is provided. The fluid sterilization device includes a first reaction chamber, a second reaction chamber, a communication chamber and a light source. The first reaction chamber is connected to a fluid inlet. The second reaction chamber is connected to the fluid outlet. The communication cavity connects the first reaction cavity and the second reaction cavity. The light source is used for emitting a sterilization light to the first reaction cavity and the second reaction cavity. Wherein, the fluid inlet allows a fluid to enter the first reaction chamber, and the communication cavity allows fluid to pass through and enter the second reaction chamber. The flow velocity distribution of the fluid in the second reaction chamber is different from the flow velocity distribution of the fluid in the first reaction chamber.

根據本揭露之另一實施例,提出一種流體殺菌裝置。流體殺菌裝置包括一光源、一反應腔、一流體感知器、一光感測器及一控制器。光源提供一殺菌光。反應腔以使一流體通過,殺菌光照射至反應腔。流體感知器用以感知流體的通過和流速。光感測器用以接收並感測殺菌光照射至反應腔的一反射光。控制器依據反射光的強度控制殺菌光的光強度。According to another embodiment of the present disclosure, a fluid sterilization device is provided. The fluid sterilization device includes a light source, a reaction chamber, a fluid sensor, a light sensor and a controller. The light source provides a germicidal light. The reaction chamber allows a fluid to pass through, and the sterilizing light irradiates the reaction chamber. The fluid sensor is used to sense the passage and flow rate of the fluid. The light sensor is used for receiving and sensing a reflected light of the sterilization light irradiated to the reaction cavity. The controller controls the light intensity of the germicidal light according to the intensity of the reflected light.

為了對本揭露之上述及其他方面有更佳的瞭解,下文特舉實施例,並配合所附圖式詳細說明如下:In order to have a better understanding of the above and other aspects of the present disclosure, the following embodiments are specially cited, and the accompanying drawings are described in detail as follows:

請參照第1A~1E圖,第1A及1B圖繪示依照本揭露一實施例之流體殺菌裝置100的外觀圖,第1C及1D圖繪示第1A圖之流體殺菌裝置100的分解圖,而第1E圖繪示第1B圖之流體殺菌裝置100沿方向1E-1E’的剖視圖。Please refer to Figures 1A to 1E. Figures 1A and 1B show the appearance of the fluid sterilization device 100 according to an embodiment of the present disclosure. Figures 1C and 1D show the exploded view of the fluid sterilization device 100 in Figure 1A. Figure 1E shows a cross-sectional view of the fluid sterilization device 100 of Figure 1B along the direction 1E-1E'.

如第1A~1D圖所示,流體殺菌裝置100由下至上依序包括外殼170、本體110、透光板150、間隔板140、光源130、電路板120以及外蓋160。本體110包括基座111、第一管體112及第二管體113。如第1A~1E圖所示,基座111具有連通腔111a、第一孔洞111b及第二孔洞111c。第一管體112內有第一反應腔P1。第二管體113內有第二反應腔P2。第一反應腔P1具有第一開口P11及第二開口P12,而第二反應腔P2具有第三開口P21及第四開口P22。第一管體112的第二開口P12連接於第一孔洞111b。第二管體113的第三開口P21連接於第二孔洞111c。第一反應腔P1及第二反應腔P2彼此間隔且互相平行。在其他的實施例,第一反應腔P1及第二反應腔P2也可夾一角度。在本實施例,第一反應腔P1及第二反應腔P2提供的是垂直流道,連通腔111a提供一水平流道,可延長流體F1在流體殺菌裝置100內部的流動時間,以更增加殺菌光對流體F1的殺菌率。As shown in FIGS. 1A to 1D, the fluid sterilization device 100 includes a housing 170, a body 110, a light-transmitting plate 150, a spacer plate 140, a light source 130, a circuit board 120, and an outer cover 160 in order from bottom to top. The main body 110 includes a base 111, a first tube 112 and a second tube 113. As shown in FIGS. 1A to 1E, the base 111 has a communicating cavity 111a, a first hole 111b, and a second hole 111c. There is a first reaction chamber P1 in the first tube 112. There is a second reaction chamber P2 in the second tube body 113. The first reaction chamber P1 has a first opening P11 and a second opening P12, and the second reaction chamber P2 has a third opening P21 and a fourth opening P22. The second opening P12 of the first tube 112 is connected to the first hole 111b. The third opening P21 of the second tube body 113 is connected to the second hole 111c. The first reaction chamber P1 and the second reaction chamber P2 are spaced apart and parallel to each other. In other embodiments, the first reaction chamber P1 and the second reaction chamber P2 may also be angled. In this embodiment, the first reaction chamber P1 and the second reaction chamber P2 provide vertical flow channels, and the communicating cavity 111a provides a horizontal flow channel, which can prolong the flow time of the fluid F1 inside the fluid sterilization device 100 to increase sterilization. The sterilization rate of light on fluid F1.

本體110允許流體F1依序通過第一開口P11、第一反應腔P1、第二開口P12、連通腔111a、第三開口P21、第二反應腔P1及第四開口P22。如第1E圖所示,第一反應腔P1之第一開口P11例如是流體入口,而第二反應腔P2之第四開口P22例如是流體出口。流體F1在第一反應腔P1中朝第一方向流動,在第二反應腔P2中朝第二方向流動,其中第二方向不同於第一方向,例如第二方向與第一方向相反。此外,如第1E圖所示,第一反應腔P1、第二反應腔P2與連通腔111a形成U型流路(圖示方位旋轉180度即為U型流路)。The body 110 allows the fluid F1 to sequentially pass through the first opening P11, the first reaction chamber P1, the second opening P12, the communication chamber 111a, the third opening P21, the second reaction chamber P1, and the fourth opening P22. As shown in FIG. 1E, the first opening P11 of the first reaction chamber P1 is, for example, a fluid inlet, and the fourth opening P22 of the second reaction chamber P2 is, for example, a fluid outlet. The fluid F1 flows in a first direction in the first reaction chamber P1 and flows in a second direction in the second reaction chamber P2, wherein the second direction is different from the first direction, for example, the second direction is opposite to the first direction. In addition, as shown in Figure 1E, the first reaction chamber P1, the second reaction chamber P2, and the communication chamber 111a form a U-shaped flow path (the U-shaped flow path is rotated by 180 degrees in the illustration).

流體F1可以是氣體或液體,例如是外部液體,如瓶子內的液體(如水)、工廠管路內的液體、自來水等各種水源。電路板120配置在本體110上。光源130配置在電路板120上,且用以發出第一殺菌光L1及第二殺菌光L2,第一殺菌光L1經過第二開口P12,入射於第一反應腔P1,第二殺菌光L2經過第三開口P21,入射於該第二反應腔P2。如此,流體F1在第一反應腔P1經過第一次殺菌,而在第二反應腔P2經過第二次殺菌。相較於一次殺菌,第二次殺菌的可提昇殺菌率。The fluid F1 can be a gas or a liquid, for example, an external liquid, such as liquid in a bottle (such as water), liquid in a factory pipeline, tap water and other water sources. The circuit board 120 is disposed on the body 110. The light source 130 is disposed on the circuit board 120 and used to emit the first sterilization light L1 and the second sterilization light L2. The first sterilization light L1 passes through the second opening P12 and is incident on the first reaction chamber P1, and the second sterilization light L2 passes through The third opening P21 is incident on the second reaction chamber P2. In this way, the fluid F1 undergoes the first sterilization in the first reaction chamber P1 and the second sterilization in the second reaction chamber P2. Compared with the first sterilization, the second sterilization can increase the sterilization rate.

雖然上述實施例的本體110的管體係以二個為例說明,然在另一實施例中,本體110的管體的數量可超過二個,如k個,其中k等於3或超過3。如此,流體F1在經過k個管體的反應腔後,係受到k次殺菌,可更增加流體F1的殺菌率。Although two tube systems of the main body 110 in the above embodiment are described as an example, in another embodiment, the number of the tube bodies of the main body 110 may exceed two, such as k, where k is 3 or more than 3. In this way, after the fluid F1 passes through the reaction chambers of k tubes, it is sterilized k times, which can further increase the sterilization rate of the fluid F1.

如第1E圖所示,基座111具有上表面111s1及下表面111s2,連通腔111a從上表面111s1延伸至第一孔洞111b及第二孔洞111c,而第一孔洞111b及第二孔洞111c從連通腔111a延伸至下表面111s2。As shown in Figure 1E, the base 111 has an upper surface 111s1 and a lower surface 111s2. The communication cavity 111a extends from the upper surface 111s1 to the first hole 111b and the second hole 111c, and the first hole 111b and the second hole 111c communicate The cavity 111a extends to the lower surface 111s2.

基座111、第一管體112及第二管體113可分別製作完成後再組裝一起。雖然圖未繪示,然第一管體112的第二開口P12及第二管體113的第三開口P21可分別螺合於第一孔洞111b及第二孔洞111c。在另一實施例中,基座111、第一管體112及第二管體113可在同一製程中以相同材料一體成形,如以塑膠材料利用射出成形技術成形。第一管體112和第二管體113的材質可為石英或聚四氟乙烯(Polytetrafluoroethylene, PTFE),聚四氟乙烯相較於石英,具有高設計彈性、低成本及高剛性的優點。在其他實施例,第一管體112和第二管體113可為雙層結構,即由兩種材質所構成,第一管體112和第二管體113的內層或內表面為石英或聚四氟乙烯,第一管體112和第二管體113的外層或外表面為聚丙烯,意即第一管體112和第二管體113的內層或內表面的材質與第一管體112和第二管體113的外層或外表面的材質不同。The base 111, the first tube body 112, and the second tube body 113 can be fabricated separately and then assembled together. Although not shown in the figure, the second opening P12 of the first tube 112 and the third opening P21 of the second tube 113 can be screwed into the first hole 111b and the second hole 111c, respectively. In another embodiment, the base 111, the first tube body 112, and the second tube body 113 can be integrally formed with the same material in the same manufacturing process, for example, a plastic material is formed by injection molding technology. The material of the first tube body 112 and the second tube body 113 may be quartz or polytetrafluoroethylene (PTFE). Compared with quartz, polytetrafluoroethylene has the advantages of high design flexibility, low cost, and high rigidity. In other embodiments, the first tube body 112 and the second tube body 113 may have a double-layer structure, that is, composed of two materials. The inner layer or inner surface of the first tube body 112 and the second tube body 113 is quartz or Polytetrafluoroethylene, the outer layer or outer surface of the first tube body 112 and the second tube body 113 is polypropylene, which means that the material of the inner layer or inner surface of the first tube body 112 and the second tube body 113 is the same as that of the first tube The material of the outer layer or outer surface of the body 112 and the second tube body 113 are different.

電路板120具有相對之上表面120s1及下表面120s2。光源130配置在面向連通腔111a的下表面120s2上。光源130可以是多個發光元件,這些發光元件可以是發光二極體,光源130所產生的第一殺菌光L1及/或第二殺菌光L2可為具有殺菌效果的紫外光,所以這些發光元件可以是紫外光發光二極體。相較於汞燈,發光二極體的啟動速度更快、體積更小且更省電。The circuit board 120 has a relatively upper surface 120s1 and a lower surface 120s2. The light source 130 is disposed on the lower surface 120s2 facing the communication cavity 111a. The light source 130 may be a plurality of light-emitting elements, and these light-emitting elements may be light-emitting diodes. The first germicidal light L1 and/or the second germicidal light L2 generated by the light source 130 may be ultraviolet light with a germicidal effect, so these light-emitting elements It can be an ultraviolet light emitting diode. Compared with mercury lamps, light-emitting diodes have a faster start-up speed, a smaller volume and are more energy-efficient.

如第1E圖所示,光源130包括至少一第一發光元件131’及至少一第二發光元件132’。第一發光元件131’ 發出第一殺菌光L1,入射於第一反應腔P1,第二發光元件132’發出第二殺菌光L2,入射於第二反應腔P2。第一發光元件131’的發光光軸與第一反應腔P1的中心軸AX1重合,使第一發光元件131’的第一殺菌光L1往第一反應腔P1的中心軸AX1的二側方向擴展對流體F1進行殺菌。第二發光元件132’ 的發光光軸與第二反應腔P2的中心軸AX2重合,使第二發光元件132’的第二殺菌光L2往第二反應腔P2的中心軸AX2的二側方向擴展對流體F1進行殺菌。第一發光元件131’和第二發光元件132’的位置分別正對第二開口P12及第三開口P21。如此,第一發光元件131’及第二發光元件132’所發出的第一殺菌光L1及第二殺菌光L2分別透過第二開口P12及第三開口P21入射進第一反應腔P1及第二反應腔P2,以對流體F1進行殺菌。在其他實施例,光源130可包括多個第一發光元件131’以及多個第二發光元件132’。在其他實施例,多個第一發光元件131’圍繞第一反應腔P1的中心軸AX1配置,多個第二發光元件132’圍繞第二反應腔P2的中心軸AX2配置,可達到類似的均勻殺菌效果。如第1E圖所示,在第一發光元件131’的同一平面上設置有第一光強度感測器131,用以感測第一發光元件131’的發光強度,在第二發光元件132’的同一平面上設置有第二光強度感測器132,用以感測第二發光元件132’的光強度。As shown in FIG. 1E, the light source 130 includes at least one first light-emitting element 131' and at least one second light-emitting element 132'. The first light emitting element 131' emits the first sterilizing light L1 and is incident on the first reaction cavity P1, and the second light emitting element 132' emits the second sterilizing light L2 and is incident on the second reaction cavity P2. The light-emitting optical axis of the first light-emitting element 131' coincides with the central axis AX1 of the first reaction chamber P1, so that the first germicidal light L1 of the first light-emitting element 131' expands to the two sides of the central axis AX1 of the first reaction chamber P1 Sterilize fluid F1. The light-emitting optical axis of the second light-emitting element 132' coincides with the central axis AX2 of the second reaction cavity P2, so that the second germicidal light L2 of the second light-emitting element 132' expands to the two sides of the central axis AX2 of the second reaction cavity P2 Sterilize fluid F1. The positions of the first light-emitting element 131' and the second light-emitting element 132' are opposite to the second opening P12 and the third opening P21, respectively. In this way, the first germicidal light L1 and the second germicidal light L2 emitted by the first light-emitting element 131' and the second light-emitting element 132' respectively pass through the second opening P12 and the third opening P21 and enter the first reaction chamber P1 and the second The reaction chamber P2 is used to sterilize the fluid F1. In other embodiments, the light source 130 may include a plurality of first light-emitting elements 131' and a plurality of second light-emitting elements 132'. In other embodiments, the plurality of first light-emitting elements 131' are arranged around the central axis AX1 of the first reaction chamber P1, and the plurality of second light-emitting elements 132' are arranged around the central axis AX2 of the second reaction chamber P2, which can achieve similar uniformity. Sterilization effect. As shown in Figure 1E, a first light intensity sensor 131 is provided on the same plane of the first light-emitting element 131' to sense the luminous intensity of the first light-emitting element 131'. A second light intensity sensor 132 is provided on the same plane of, for sensing the light intensity of the second light emitting element 132'.

此外,第二開口P12的開口面積A1約等於第一發光元件131’的發光面積A2的n倍,其中n等於或大於1,以使流體殺菌裝置100提供預期的殺菌率。相似地,第三開口P21的開口面積A3約等於第二發光元件132’的發光面積A4的m倍,其中m等於或大於1,以使流體殺菌裝置100提供預期的殺菌率。在一實施例中,n與m的值可相同或相異。此外,第一反應腔P1的長度H1至少約為第一發光元件131’的發光面積A2的邊長的15倍或15倍以上,第二反應腔P2的長度H2至少約為第二發光元件132’的發光面積A4的邊長的15倍或15倍以上,以使流體F1在流體殺菌裝置100內流動一預期時間,進而使流體殺菌裝置100提供預期殺菌率。在一實施例中,第一發光元件131’的發光面積A2及/或第二發光元件132’的發光面積A4可介於

Figure 02_image001
平方毫米(
Figure 02_image003
)與
Figure 02_image005
Figure 02_image007
之間,第一發光元件131’的發光面積A2的邊長及/或第二發光元件132’的發光面積A4的邊長可介於3.5毫米(mm)與25 mm之間,而第一反應腔P1的長度H1及/或第二反應腔P2的長度H2可介於15毫米(mm) 與100mm之間。In addition, the opening area A1 of the second opening P12 is approximately equal to n times the light-emitting area A2 of the first light-emitting element 131 ′, where n is equal to or greater than 1, so that the fluid sterilization device 100 provides an expected sterilization rate. Similarly, the opening area A3 of the third opening P21 is approximately equal to m times the light-emitting area A4 of the second light-emitting element 132', where m is equal to or greater than 1, so that the fluid sterilization device 100 provides the expected sterilization rate. In an embodiment, the values of n and m may be the same or different. In addition, the length H1 of the first reaction cavity P1 is at least about 15 times or more than the side length of the light-emitting area A2 of the first light-emitting element 131', and the length H2 of the second reaction cavity P2 is at least about the second light-emitting element 132 The light-emitting area A4 is 15 times or more than 15 times the side length, so that the fluid F1 flows in the fluid sterilization device 100 for a predetermined time, so that the fluid sterilization device 100 provides the expected sterilization rate. In an embodiment, the light-emitting area A2 of the first light-emitting element 131' and/or the light-emitting area A4 of the second light-emitting element 132' may be between
Figure 02_image001
Square millimeter (
Figure 02_image003
)versus
Figure 02_image005
Figure 02_image007
The side length of the light-emitting area A2 of the first light-emitting element 131' and/or the side length of the light-emitting area A4 of the second light-emitting element 132' may be between 3.5 millimeters (mm) and 25 mm, and the first reaction The length H1 of the cavity P1 and/or the length H2 of the second reaction cavity P2 may be between 15 millimeters (mm) and 100 mm.

光源130包含數個發光元件,此些發光元件的功率總和可以約等於使用一個發光元件(如第3圖所示的光源130)的功率。詳言之,本揭露實施例的流體殺菌裝置100的光源無論包含幾個發光元件,皆不增加光源的總功率,換言之,本揭露實施例可在不增加光源總功率下決定發光元件的數量,可避免增加光源的選用成本。The light source 130 includes several light-emitting elements, and the total power of these light-emitting elements can be approximately equal to the power of one light-emitting element (such as the light source 130 shown in FIG. 3). In detail, the light source of the fluid sterilization device 100 of the disclosed embodiment does not increase the total power of the light source regardless of whether it contains several light-emitting elements. In other words, the disclosed embodiment can determine the number of light-emitting elements without increasing the total power of the light source. It can avoid increasing the cost of light source selection.

此外,在光源的總功率不變的情況下,第一發光元件131’和第二發光元件132’的功率可以透過適當配置,避免發光元件過熱而減少壽命。例如,殺菌需要的光源總功率為100mW,若平均分配總功率,即第一發光元件131’和第二發光元件132’的功率分別為50mW,則會因為發光元件上熱量的累積,造成發光元件因為光衰而減少使用壽命。In addition, when the total power of the light source does not change, the power of the first light-emitting element 131' and the second light-emitting element 132' can be configured appropriately to prevent the light-emitting element from overheating and reduce the life span. For example, the total power of the light source required for sterilization is 100mW. If the total power is evenly distributed, that is, the power of the first light-emitting element 131' and the second light-emitting element 132' are 50mW respectively, the heat accumulation on the light-emitting element will cause the light-emitting element Reduced service life due to light decay.

光源130的數個發光元件可在不同時點個別發出不同光強的殺菌光,藉此可調節發光元件的發熱量,在一實施例中,在第一個10秒的殺菌過程中,第一發光元件131’可發出總功率的25%的光,即25毫瓦的殺菌光,而第二發光元件132’可發出總功率的75%的光,即75毫瓦的殺菌光,在第二個10秒的殺菌過程中,第一發光元件131’可發出總功率的75%的光,即75毫瓦的殺菌光,而第二發光元件132’可發出總功率的25%的光,即25毫瓦的殺菌光,即第一發光元件131’和第二發光元件132’的負載功率比例互相交換;在第三個10秒的殺菌過程中,第一發光元件131’可發出25毫瓦的殺菌光,而第二發光元件132’可發出75毫瓦的殺菌光;在第四個10秒的殺菌過程中,第一發光元件131’可發出75毫瓦的殺菌光,而第二發光元件132’可發出25毫瓦的殺菌光;…以此類推。前述光源130的總發光功率維持定值,如100毫瓦,但本揭露實施例不受此限。The several light-emitting elements of the light source 130 can individually emit sterilization light of different light intensities at different time points, thereby adjusting the calorific value of the light-emitting elements. In one embodiment, in the first 10-second sterilization process, the first light-emitting The element 131' can emit 25% of the total power, that is, 25 milliwatts of sterilization light, and the second light emitting element 132' can emit 75% of the total power, that is, 75 milliwatts of sterilization light. During the 10-second sterilization process, the first light-emitting element 131' can emit 75% of the total power, that is, 75 milliwatts of sterilization light, while the second light-emitting element 132' can emit 25% of the total power, that is 25%. Milliwatts of sterilization light, that is, the load power ratio of the first light-emitting element 131' and the second light-emitting element 132' is exchanged with each other; in the third 10-second sterilization process, the first light-emitting element 131' can emit 25 milliwatts The second light-emitting element 132' can emit 75 milliwatts of sterilizing light; in the fourth 10-second sterilization process, the first light-emitting element 131' can emit 75 milliwatts of sterilizing light, and the second light-emitting element 132' can emit 25 milliwatts of germicidal light; ... and so on. The total luminous power of the aforementioned light source 130 maintains a constant value, such as 100 milliwatts, but the embodiment of the disclosure is not limited thereto.

間隔板140具有開口140a,以容納光源130。換言之,由於開口140a的設計,使光源130不會與間隔板140的實體材料干涉。且,由於光源130位於開口140a內,因此可縮短流體殺菌裝置100的長度尺寸(如沿Z軸向的尺寸)。在一實施例中,間隔板140例如是金屬板。The partition plate 140 has an opening 140 a to accommodate the light source 130. In other words, due to the design of the opening 140a, the light source 130 will not interfere with the solid material of the spacer 140. Moreover, since the light source 130 is located in the opening 140a, the length dimension (such as the dimension along the Z axis) of the fluid sterilization device 100 can be shortened. In an embodiment, the spacer plate 140 is, for example, a metal plate.

如第1E圖所示,透光板150被抵壓在間隔板140與本體110之間。例如,透光板150被抵壓在間隔板140與本體110之基座111的上表面111s1之間。由於透光板150被抵壓在間隔板140與本體110之間,使透光板150與本體110係緊密接觸以及透光板150與間隔板140係緊密接觸,可封閉透光板150與本體110之間的縫隙及透光板150與間隔板140之間的縫隙,以避免流體F1從透光板150與本體110之間及透光板150與間隔板140之間流到電路板120及/或光源130,進而避免流體F1導致電路板120及/或光源130失效。As shown in FIG. 1E, the light-transmitting plate 150 is pressed between the spacer plate 140 and the body 110. For example, the light-transmitting plate 150 is pressed between the spacer plate 140 and the upper surface 111s1 of the base 111 of the body 110. Since the transparent plate 150 is pressed between the partition plate 140 and the main body 110, the transparent plate 150 is in close contact with the main body 110 and the transparent plate 150 and the partition plate 140 are in close contact, and the transparent plate 150 and the main body can be sealed The gap between the light-transmitting plate 150 and the spacer plate 140 is to prevent the fluid F1 from flowing between the light-transmitting plate 150 and the body 110 and between the light-transmitting plate 150 and the spacer plate 140 to the circuit board 120 and /Or the light source 130, so as to prevent the fluid F1 from causing the circuit board 120 and/or the light source 130 to fail.

如第1E圖所示,電路板120、間隔板140及基座111分別具有第一穿孔120h、第二穿孔140h及第三穿孔111h。第一穿孔120h、第二穿孔140h及第三穿孔111h大致重合。雖然圖未繪示,然流體殺菌裝置100更包括至少一固定元件,其穿設第一穿孔120h、第二穿孔140h及第三穿孔111h,以固定電路板120、間隔板140與基座111的相對位置。在一實施例中,固定元件例如是螺絲,而第三穿孔111h為螺孔。透過螺合,固定元件可固定電路板120、間隔板140與基座111的相對位置。As shown in FIG. 1E, the circuit board 120, the spacer 140, and the base 111 have a first through hole 120h, a second through hole 140h, and a third through hole 111h, respectively. The first perforation 120h, the second perforation 140h, and the third perforation 111h approximately overlap. Although not shown in the figure, the fluid sterilization device 100 further includes at least one fixing element, which penetrates the first through hole 120h, the second through hole 140h and the third through hole 111h to fix the circuit board 120, the spacer plate 140 and the base 111 relative position. In an embodiment, the fixing element is, for example, a screw, and the third through hole 111h is a screw hole. Through screwing, the fixing element can fix the relative positions of the circuit board 120, the spacer plate 140 and the base 111.

在一實施例中,透光板150例如是石英板。如第1E圖所示,外蓋160蓋合在電路板120上,以保護電路板120。在一實施例中,外蓋160與電路板120接觸,可將電路板120的熱量對流至外界。在實施例中,外蓋160可以由優良導熱性材料製成,如銅、鋁、鐵或其它合適的導熱材料。In an embodiment, the light-transmitting plate 150 is, for example, a quartz plate. As shown in FIG. 1E, the outer cover 160 covers the circuit board 120 to protect the circuit board 120. In an embodiment, the outer cover 160 is in contact with the circuit board 120, and can convection the heat of the circuit board 120 to the outside. In an embodiment, the outer cover 160 may be made of a material with excellent thermal conductivity, such as copper, aluminum, iron or other suitable thermal conductive materials.

如第1E圖所示,外殼170可容納本體110、電路板120、光源130、間隔板140、透光板150及外蓋160,以保護此些元件。As shown in FIG. 1E, the housing 170 can accommodate the body 110, the circuit board 120, the light source 130, the spacer 140, the light-transmitting plate 150 and the outer cover 160 to protect these components.

此外,如第1E圖所示,在實際使用時,可以第二反應腔P2的第四開口P22的邊緣為整個流體殺菌裝置100的最高點的方位擺設流體殺菌裝置100。如此,可幫助流體殺菌裝置100內部的空氣(若有的話)往上從第四開口P22排出,避免空氣累積在流體殺菌裝置100內部。In addition, as shown in FIG. 1E, in actual use, the fluid sterilization device 100 may be placed in an orientation where the edge of the fourth opening P22 of the second reaction chamber P2 is the highest point of the entire fluid sterilization device 100. In this way, the air (if any) inside the fluid sterilization device 100 can be assisted to be discharged upward from the fourth opening P22, and the air can be prevented from accumulating in the fluid sterilization device 100.

請參照第2圖,其繪示第1E圖之流體殺菌裝置100的流量與殺菌能力的關係圖。圖式中,橫軸為流量(公升/分鐘),而縱軸為以對數表示的細菌減少率(E. coli log reduction)。曲線C1為第一管體112及第二管體113以聚四氟乙烯製成的流體殺菌裝置100的殺菌率曲線,曲線C2為單管(單管僅能提供一次殺菌)以石英製成的的流體殺菌裝置的殺菌率曲線,而曲線C3為單管(單管僅能提供一次殺菌)以聚四氟乙烯製成的的流體殺菌裝置的殺菌率曲線。曲線C1、C2及C3係在細菌濃度為5.2e5 (CFU/ml)及光源的功率為60毫瓦(mW)之相同條件下的實驗結果。Please refer to FIG. 2, which shows the relationship between the flow rate and the sterilization capability of the fluid sterilization device 100 in FIG. 1E. In the diagram, the horizontal axis is the flow rate (liter/minute), and the vertical axis is the logarithm of the bacterial reduction rate (E. coli log reduction). Curve C1 is the sterilization rate curve of the fluid sterilization device 100 in which the first tube body 112 and the second tube body 113 are made of polytetrafluoroethylene, and the curve C2 is a single tube (single tube can only provide one sterilization) made of quartz The sterilization rate curve of the fluid sterilization device, and the curve C3 is the sterilization rate curve of the fluid sterilization device made of polytetrafluoroethylene with a single tube (single tube can only provide one sterilization). Curves C1, C2, and C3 are the experimental results under the same conditions that the bacterial concentration is 5.2e 5 (CFU/ml) and the power of the light source is 60 milliwatts (mW).

比較曲線C1及C2可知,由於本揭露實施利的流體殺菌裝置100提供二次殺菌,因此即使管體材料使用聚四氟乙烯,流體殺菌裝置100的殺菌率仍遠高於單管以石英製成的流體殺菌裝置。比較曲線C1及C3可知,相較於一次殺菌,由於本揭露實施利的流體殺菌裝置100採用多次殺菌而能具有更高的殺菌率。Comparing the curves C1 and C2, it can be seen that since the fluid sterilization device 100 implemented in the present disclosure provides secondary sterilization, the sterilization rate of the fluid sterilization device 100 is still much higher than that of a single tube made of quartz even if the tube material is made of PTFE. The fluid sterilization device. Comparing the curves C1 and C3, it can be seen that compared to one-time sterilization, the fluid sterilization device 100 according to the present disclosure adopts multiple sterilizations and can have a higher sterilization rate.

請參照第3圖,其繪示依照本揭露另一實施例之流體殺菌裝置200的剖視圖。流體殺菌裝置200包括本體210、電路板120、光源230、間隔板140、透光板150、外蓋160及外殼170。本揭露實施例的流體殺菌裝置200具有與前述流體殺菌裝置100類似或相同的特徵,不同處在於,流體殺菌裝置200的光源230正對第一反應腔P1與第二反應腔P2之間的區域,即光源230沒有正對第一反應腔P1及第二反應腔P2。Please refer to FIG. 3, which shows a cross-sectional view of a fluid sterilization device 200 according to another embodiment of the present disclosure. The fluid sterilization device 200 includes a main body 210, a circuit board 120, a light source 230, a partition plate 140, a light-transmitting plate 150, an outer cover 160 and a housing 170. The fluid sterilization device 200 of the embodiment of the disclosure has similar or the same features as the aforementioned fluid sterilization device 100, except that the light source 230 of the fluid sterilization device 200 is directly facing the area between the first reaction chamber P1 and the second reaction chamber P2 , That is, the light source 230 is not directly facing the first reaction chamber P1 and the second reaction chamber P2.

如第3圖所示,光源230包括至少一發光元件,發光元件沒有正對第一反應腔P1及第二反應腔P2。本體210包括基座211、第一管體112及第二管體113。基座211具有類似或同於前述基座111的特徵,不同處在於,基座211包括分隔部211a,分隔部211a位於第一反應腔P1與第二反應腔P2之間。As shown in FIG. 3, the light source 230 includes at least one light-emitting element, and the light-emitting element does not directly face the first reaction chamber P1 and the second reaction chamber P2. The main body 210 includes a base 211, a first tube 112 and a second tube 113. The base 211 has similar or same features as the aforementioned base 111, except that the base 211 includes a partition 211a, and the partition 211a is located between the first reaction chamber P1 and the second reaction chamber P2.

由於光源230的發光具有一發光角,光源230的發光可區分成第一殺菌光L1及第二殺菌光L2。分隔部211a具有相對之第一導光部211a1及第二導光部211a2,其中第一導光部211a1可將第一殺菌光L1引導至第一反應腔P1,而第二導光部211a2可將第二殺菌光L2引導至第二反應腔P2。如圖所示,第一導光部211a1及第二導光部211a2例如是相對二斜面,其間的夾角A1可介於約30度與約120度之間。Since the light emitted by the light source 230 has a light emitting angle, the light emitted by the light source 230 can be divided into the first sterilizing light L1 and the second sterilizing light L2. The partition 211a has a first light guide 211a1 and a second light guide 211a2 opposite to each other. The first light guide 211a1 can guide the first germicidal light L1 to the first reaction chamber P1, and the second light guide 211a2 can The second sterilizing light L2 is guided to the second reaction chamber P2. As shown in the figure, the first light guide portion 211a1 and the second light guide portion 211a2 are, for example, two inclined surfaces, and the included angle A1 between them can be between about 30 degrees and about 120 degrees.

在另一實施例中,流體殺菌裝置200更包括一導光板(未繪示),其可覆蓋光源230。導光板可提供類似或同於第一導光部211a1及第二導光部211a2的導光效果。在此情況下,流體殺菌裝置200可省略第一導光部211a1及第二導光部211a2,即第3圖之分隔部211a可變更為第1E圖的對應結構。In another embodiment, the fluid sterilization device 200 further includes a light guide plate (not shown), which can cover the light source 230. The light guide plate can provide a light guide effect similar to or the same as the first light guide portion 211a1 and the second light guide portion 211a2. In this case, the fluid sterilization device 200 can omit the first light guide portion 211a1 and the second light guide portion 211a2, that is, the partition portion 211a in FIG. 3 may be changed to a corresponding structure in FIG. 1E.

請參照第4圖,其繪示依照本揭露另一實施例之流體殺菌裝置300的剖視圖。流體殺菌裝置300包括本體110、電路板120、光源130、間隔板140、透光板150、外蓋160、外殼170、第一濾芯380及第二濾芯390。本揭露實施例的流體殺菌裝置300具有與前述流體殺菌裝置100類似或相同的特徵,不同處在於,流體殺菌裝置300更包括至少一濾芯。Please refer to FIG. 4, which shows a cross-sectional view of a fluid sterilization device 300 according to another embodiment of the present disclosure. The fluid sterilization device 300 includes a body 110, a circuit board 120, a light source 130, a partition plate 140, a light-transmitting plate 150, an outer cover 160, a housing 170, a first filter element 380 and a second filter element 390. The fluid sterilization device 300 of the embodiment of the present disclosure has similar or the same features as the aforementioned fluid sterilization device 100. The difference is that the fluid sterilization device 300 further includes at least one filter element.

詳言之,第一濾芯380配置在第一反應腔P1內,而第二濾芯390配置在第二反應腔P2。流體F1依序通過第一開口P11、第一濾芯380、第二開口P12、連通腔111a、第三開口P21、第二濾芯390及第四開口P22。流體F1的雜質可經過濾芯的濾除,以淨化流體F1。在另一實施例中,流體殺菌裝置300可省略第一濾芯380與第二濾芯390之一者。此外,如第4圖所示,第一濾芯380可填滿第一反應腔P1的至少一部分,且第二濾芯390也可填滿第二反應腔P2的至少一部分。In detail, the first filter element 380 is disposed in the first reaction chamber P1, and the second filter element 390 is disposed in the second reaction chamber P2. The fluid F1 sequentially passes through the first opening P11, the first filter element 380, the second opening P12, the communication cavity 111a, the third opening P21, the second filter element 390, and the fourth opening P22. The impurities in the fluid F1 can be filtered out by the filter element to purify the fluid F1. In another embodiment, the fluid sterilization device 300 can omit one of the first filter element 380 and the second filter element 390. In addition, as shown in FIG. 4, the first filter element 380 can fill at least a part of the first reaction cavity P1, and the second filter element 390 can also fill at least a part of the second reaction cavity P2.

請參照第5A~5E圖,第5A圖繪示依照本揭露另一實施例之流體殺菌裝置400的分解圖,第5B圖繪示第5A圖之流體殺菌裝置400組合後的剖視圖,第5C圖繪示第5A圖之流體殺菌裝置400沿方向5C-5C’的剖視圖,第5D圖繪示第5B圖之第一反應腔P1及第二反應腔P2的流速模擬圖,而第5E圖繪示省略凹槽411a2之第二反應腔及第5B圖之第二反應腔P2的流速模擬圖。Please refer to FIGS. 5A to 5E. FIG. 5A is an exploded view of the fluid sterilization device 400 according to another embodiment of the present disclosure, FIG. 5B is a cross-sectional view of the fluid sterilization device 400 of FIG. 5A after being combined, and FIG. 5C Shows a cross-sectional view of the fluid sterilization device 400 in Figure 5A along the direction 5C-5C', Figure 5D shows a simulation diagram of the flow velocity of the first reaction chamber P1 and the second reaction chamber P2 in Figure 5B, and Figure 5E shows The flow velocity simulation diagram of the second reaction chamber of the groove 411a2 and the second reaction chamber P2 of Fig. 5B is omitted.

流體殺菌裝置400包括本體410、電路板120、光源130、間隔板140、透光板150、外蓋160、外殼170、流體感知器480(選擇性)及擾流板490(選擇性)。本體410包括基座411、第一管體412及第二管體413。基座411具有連通腔411a、第一孔洞411b、第二孔洞411c及分隔部411d。分隔部411d位於第一反應腔P1與第二反應腔P2之間。連通腔411a從基座411的承靠面411u延伸至分隔部411d,其中承靠面411u用以承載透光板150。連通腔411a包括連通槽411a1及凹槽411a2,其中連通槽411a1從承靠面411u延伸至凹槽411a2,而凹槽411a2從連通槽411a1往光線照射方向延伸至分隔部411d。凹槽411a2的位置大致對應於第一發光元件與第二發光元件之間的區域。凹槽411a2的設置可減少分隔部411d對光線的阻擋。例如,光源130的第一發光元件的第一殺菌光L1可入射至第一管體412及第二管體413內,且第二發光元件的第二殺菌光L2可入射至第一管體412及第二管體413內。The fluid sterilization device 400 includes a body 410, a circuit board 120, a light source 130, a spacer 140, a light-transmitting plate 150, an outer cover 160, a housing 170, a fluid sensor 480 (optional), and a spoiler 490 (optional). The main body 410 includes a base 411, a first tube 412 and a second tube 413. The base 411 has a communicating cavity 411a, a first hole 411b, a second hole 411c, and a partition 411d. The partition 411d is located between the first reaction chamber P1 and the second reaction chamber P2. The communicating cavity 411a extends from the bearing surface 411u of the base 411 to the partition portion 411d, wherein the bearing surface 411u is used to carry the light-transmitting plate 150. The communicating cavity 411a includes a communicating groove 411a1 and a groove 411a2. The communicating groove 411a1 extends from the bearing surface 411u to the groove 411a2, and the groove 411a2 extends from the communicating groove 411a1 in the light irradiation direction to the partition 411d. The position of the groove 411a2 roughly corresponds to the area between the first light-emitting element and the second light-emitting element. The arrangement of the groove 411a2 can reduce the blocking of light by the partition 411d. For example, the first germicidal light L1 of the first light-emitting element of the light source 130 can be incident on the first tube 412 and the second tube 413, and the second germicidal light L2 of the second light-emitting element can be incident on the first tube 412 And the second tube 413.

凹槽411a2的設置亦可以改變流體F1的流動速度、流動方向和/或流動路徑,達到擾流的目的。也藉由擾流,提升殺菌的效率。詳細來說,擾流可使殺菌光未及區域(如靠近側壁的區域)的流體在受到擾動後流至殺菌光所及的區域(如反應腔中間區域),避免有些流體集中在殺菌光未及區域,使流場內的流體得以充分混合,因此能明顯提高殺菌率。The arrangement of the groove 411a2 can also change the flow speed, flow direction and/or flow path of the fluid F1 to achieve the purpose of turbulence. The turbulence also improves the efficiency of sterilization. In detail, the turbulence can make the fluid in the area not reached by the sterilization light (such as the area near the side wall) flow to the area covered by the sterilization light (such as the middle area of the reaction chamber) after being disturbed, so as to prevent some fluid from being concentrated in the sterilization light. And area, so that the fluid in the flow field can be fully mixed, so it can significantly improve the sterilization rate.

如第5B圖所示,流體F1於第一反應腔P1的內側壁周圍P1a的流速與外側壁周圍P1b的流速不同,例如流體F1於第一反應腔P1的內側壁周圍P1a的流速及流體F1於外側壁周圍P1b的流速皆低於流體F1於第一反應腔P1的中央區域的流速。如第5B圖所示,由於凹槽411a2的設計,流體F1在第二反應腔P2的流速分布為:外側壁周圍P2b的流速V1大於中央區域的流速V2,而中央區域的流速V2大於內側壁周圍P2a的流速V3,以達到渦流擾動效果。如此,在相同的照光條件(如光強相同)下,相較於非呈擾流狀態的流場,呈擾流狀態的流體F1的流場的殺菌率更高。綜上,藉由凹槽411a2的設計,可改變流體F1從第一反應腔P1進入到第二反應腔P2的流速分布,以達到擾流的技術效果。在實施例中,流體F1在第二反應腔P2內呈擾流狀態,換言之,流體F1在第二反應腔P2一區域的雷諾數大於在第一反應腔P1的雷諾數,雷諾數愈大,表示擾流程度愈大。As shown in Figure 5B, the flow rate of fluid F1 around the inner wall P1a of the first reaction chamber P1 is different from the flow rate around the outer wall P1b. For example, the flow rate of fluid F1 around the inner wall of the first reaction chamber P1 P1a and fluid F1 The flow rate around the outer wall P1b is lower than the flow rate of the fluid F1 in the central area of the first reaction chamber P1. As shown in Figure 5B, due to the design of the groove 411a2, the flow velocity distribution of the fluid F1 in the second reaction chamber P2 is: the flow velocity V1 around the outer wall P2b is greater than the flow velocity V2 in the central area, and the flow velocity V2 in the central area is greater than the inner wall The flow velocity V3 around P2a can achieve the effect of vortex disturbance. In this way, under the same illumination conditions (such as the same light intensity), the flow field of the fluid F1 in the turbulent state has a higher sterilization rate than the flow field in the non-turbulent state. In summary, with the design of the groove 411a2, the flow velocity distribution of the fluid F1 from the first reaction chamber P1 to the second reaction chamber P2 can be changed to achieve the technical effect of turbulence. In an embodiment, the fluid F1 is in a turbulent flow state in the second reaction chamber P2. In other words, the Reynolds number of the fluid F1 in a region of the second reaction chamber P2 is greater than the Reynolds number in the first reaction chamber P1. The larger the Reynolds number, Indicates the greater the degree of turbulence.

如第5D圖所示,第二反應腔P2的點S1、點S2及點S3分別表示管壁一側、反應腔中間及管壁另一側的量測點,而第一反應腔P1的點S4、點S5及點S6分別表示管壁一側、反應腔中間及管壁另一側的量測點。第二反應腔P2的點S1、點S2及點S3的流速分別是0.036、0.011及0.008,即反應腔一側壁附近的流速大於反應腔中間和另一側壁的流速,而第一反應腔P1的點S4、點S5及點S6的流速分別是0.008、0.018及0.003,即第一反應腔中間的流速大於兩側壁的流速,其中流速的單位為公尺/秒。如圖所示,由於凹槽411a2的設計,第二反應腔P2的點S1及S3的流速差大於第一反應腔P1的點S4及S6的流速差,可見凹槽411a2的設計能夠提高第二反應腔P2的擾流程度。As shown in Figure 5D, point S1, point S2, and point S3 of the second reaction chamber P2 represent measurement points on one side of the tube wall, the middle of the reaction chamber, and the other side of the tube wall, and the point of the first reaction chamber P1 S4, point S5, and point S6 represent measurement points on one side of the tube wall, the middle of the reaction chamber, and the other side of the tube wall, respectively. The flow rates of point S1, point S2, and point S3 of the second reaction chamber P2 are 0.036, 0.011, and 0.008, respectively. That is, the flow rate near one side wall of the reaction chamber is greater than the flow rate near the middle and the other side wall of the reaction chamber, while the flow rate of the first reaction chamber P1 The flow velocity at point S4, point S5, and point S6 are 0.008, 0.018, and 0.003, respectively, that is, the flow velocity in the middle of the first reaction chamber is greater than the flow velocity on the two side walls, and the unit of the flow velocity is meters/second. As shown in the figure, due to the design of the groove 411a2, the flow rate difference between the points S1 and S3 of the second reaction chamber P2 is greater than the flow velocity difference between the points S4 and S6 of the first reaction chamber P1. It can be seen that the design of the groove 411a2 can increase the second The degree of turbulence in the reaction chamber P2.

如第5E圖所示,圖示右邊為第5B圖之第二反應腔P2的流速模擬圖,而圖示左邊為省略凹槽411a2的第二反應腔P2’的流速模擬圖。由於本揭露實施例之連通腔411a的凹槽設計,依據電腦模擬數據,第5B圖之第二反應腔P2的點S1及點S3的雷諾數分別為918.37及204.08 (大致介於200~900之間),而省略凹槽設計的第二反應腔P2’中,點S1及點S3的雷諾數分別為612.24及76.53 (大致介於76~612之間)。比較第二反應腔P2與第二反應腔P2’明顯可知,本揭露實施例之連通腔411a的凹槽設計能夠明顯增加第二反應腔P2內流場的擾流程度(因為雷諾數明顯增加)。在流體力學中,雷諾數(Reynolds number)是流體的慣性力與黏性力比值的量度。雷諾數較大時,慣性力對流場的影響大於黏滯力,流體流動較不穩定,流速的微小變化容易發展、增強,形成紊亂、不規則的紊流流場。As shown in Figure 5E, the right side of the figure is a simulation diagram of the flow rate of the second reaction chamber P2 in Figure 5B, and the left side of the figure is a simulation diagram of the flow rate of the second reaction chamber P2' with the groove 411a2 omitted. Due to the groove design of the communicating cavity 411a in the embodiment of the present disclosure, according to computer simulation data, the Reynolds numbers of point S1 and point S3 of the second reaction chamber P2 in Figure 5B are 918.37 and 204.08 (approximately between 200 and 900) In the second reaction chamber P2' with the groove design omitted, the Reynolds numbers of the point S1 and the point S3 are 612.24 and 76.53 (approximately between 76 and 612), respectively. Comparing the second reaction chamber P2 with the second reaction chamber P2', it is obvious that the groove design of the communicating cavity 411a in the embodiment of the present disclosure can significantly increase the degree of turbulence of the flow field in the second reaction chamber P2 (because the Reynolds number is significantly increased) . In fluid mechanics, the Reynolds number is a measure of the ratio of the inertial force to the viscous force of a fluid. When the Reynolds number is large, the influence of inertial force on the flow field is greater than the viscous force, the fluid flow is relatively unstable, and small changes in the flow velocity are easy to develop and increase, forming a turbulent and irregular turbulent flow field.

如第5A及5C圖所示,凹槽411a2的深度W2大於2釐米,在另一實施例,凹槽411a2的深度W2約為5釐米到8釐米。凹槽411a2的寬度W1小於第一反應腔P1的截面直徑,也小於第二反應腔P2的截面直徑,亦即凹槽411a2的寬度W1小於第一管體412的內直徑,也小於第二管體413的內直徑。凹槽411a2的形狀可為多邊形(由剖面圖視之),例如矩形或正方形。當凹槽411a2的深度W2等於寬度W1時,流體F1於第二反應腔P2內的擾流程度最大。As shown in FIGS. 5A and 5C, the depth W2 of the groove 411a2 is greater than 2 cm. In another embodiment, the depth W2 of the groove 411a2 is about 5 cm to 8 cm. The width W1 of the groove 411a2 is smaller than the cross-sectional diameter of the first reaction chamber P1, and also smaller than the cross-sectional diameter of the second reaction chamber P2. That is, the width W1 of the groove 411a2 is smaller than the inner diameter of the first tube body 412 and also smaller than the second tube The inner diameter of the body 413. The shape of the groove 411a2 may be a polygon (as viewed from the cross-sectional view), such as a rectangle or a square. When the depth W2 of the groove 411a2 is equal to the width W1, the degree of turbulence of the fluid F1 in the second reaction chamber P2 is the greatest.

如第5A~5C圖所示,第一反應腔P1的第一開口P11具有第一截面積,第二反應腔P2的第四開口P22具有第二截面積,而連通腔411a具有第三截面積A5(如第5C圖所示),其中第一截面積大致等於第二截面積,且第三截面積A5不小於第一截面積或第二截面積的一半,因此可減少流體F1流動過程的流體能損失。As shown in FIGS. 5A to 5C, the first opening P11 of the first reaction chamber P1 has a first cross-sectional area, the fourth opening P22 of the second reaction chamber P2 has a second cross-sectional area, and the communicating cavity 411a has a third cross-sectional area A5 (as shown in Figure 5C), where the first cross-sectional area is approximately equal to the second cross-sectional area, and the third cross-sectional area A5 is not less than half of the first cross-sectional area or the second cross-sectional area, so the flow of fluid F1 can be reduced Fluid energy is lost.

如第5B圖所示,流體感知器480設置於第一反應腔P1。流體感知器480用以感測流體的通過及其流速。流體F1從第一開口P11後經過流體感知器480。流體感知器480可感知流體F1的流量,且流體F1在流經流體感知器480後可形成擾流。此外,在另一實施例中,第一管體412可以流體感知器取代,在此設計下,第一管體412為流體感知器的外殼,而流體感知器本身具有第一反應腔P1。在一實施例中,殺菌光的功率可依據流體感知器480所感知的流速調整。例如,當流體F1的流速愈高,殺菌光的功率可愈大;反之則愈小。As shown in FIG. 5B, the fluid sensor 480 is disposed in the first reaction chamber P1. The fluid sensor 480 is used to sense the passage of fluid and its flow rate. The fluid F1 passes through the fluid sensor 480 from the first opening P11. The fluid sensor 480 can sense the flow of the fluid F1, and the fluid F1 can form a turbulent flow after flowing through the fluid sensor 480. In addition, in another embodiment, the first tube body 412 can be replaced by a fluid sensor. Under this design, the first tube body 412 is a housing of the fluid sensor, and the fluid sensor itself has a first reaction chamber P1. In one embodiment, the power of the germicidal light can be adjusted according to the flow rate sensed by the fluid sensor 480. For example, when the flow rate of the fluid F1 is higher, the power of the sterilization light can be greater; otherwise, the power of the sterilization light can be smaller.

如第5B圖所示,擾流板490配置在第一反應腔P1中,可改變通過擾流板490之流體的流場,例如增加通過擾流板490之流體F1的擾流程度,以提高殺菌率。擾流板490具有多個穿孔,如穿孔490a1及490a2,可改變通擾流板490之流體的流場。例如,當流體F1通過此些穿孔後流速會改變,如變快,因此能增加擾流程度。如圖所示,穿孔可以是斜孔(如穿孔490a1),可將通過穿孔的流體F1引導至特定方向(如第一反應腔P1的中間方向),以增加擾流程度。此外,穿孔也可以是直孔(如穿孔490a2)。在一實施例中,擾流板490的數個穿孔可以皆為斜孔或直孔,或包含斜孔及直孔。只要能夠增加擾流程度即可,本揭露實施例不限定穿孔的尺寸(如內徑)、數量及/或延伸方向。As shown in Figure 5B, the spoiler 490 is arranged in the first reaction chamber P1, which can change the flow field of the fluid passing through the spoiler 490, for example, increase the degree of turbulence of the fluid F1 passing through the spoiler 490 to improve Sterilization rate. The spoiler 490 has a plurality of perforations, such as perforations 490a1 and 490a2, which can change the flow field of the fluid passing through the spoiler 490. For example, when the fluid F1 passes through these perforations, the flow rate will change, such as become faster, so the degree of turbulence can be increased. As shown in the figure, the perforation may be an oblique hole (such as the perforation 490a1), and the fluid F1 passing through the perforation can be guided to a specific direction (such as the middle direction of the first reaction chamber P1) to increase the degree of turbulence. In addition, the perforation can also be a straight hole (such as perforation 490a2). In an embodiment, the several perforations of the spoiler 490 may all be oblique holes or straight holes, or include oblique holes and straight holes. As long as the degree of turbulence can be increased, the present disclosure does not limit the size (such as inner diameter), number, and/or extension direction of the perforations.

請參照第6圖,其繪示依照本揭露另一實施例之連通腔411a’的剖視圖。連通腔411a’包括連通槽411a1及凹槽411a2’,其中凹槽411a2’從連通槽411a1往光線照射方向延伸至分隔部411d。凹槽411a2’的位置大致對應於第一發光元件與第二發光元件之間的區域。凹槽411a2’的設置可減少分隔部411d對光線的阻擋。如圖所示,本揭露實施例之凹槽411a2’包含多個彼此分離的子凹槽411a21’、 411a22’及411a23’,同樣可達到前述擾流的技術功效。在另一實施例中,第一截面積大致等於與第二截面積,且第三截面積A5不小於第一截面積或第二截面積的一半,本揭露實施例不限定連通腔之凹槽的幾何型態。Please refer to FIG. 6, which shows a cross-sectional view of the communicating cavity 411a' according to another embodiment of the present disclosure. The communicating cavity 411a' includes a communicating groove 411a1 and a groove 411a2', wherein the groove 411a2' extends from the communicating groove 411a1 in the light irradiation direction to the partition 411d. The position of the groove 411a2' roughly corresponds to the area between the first light-emitting element and the second light-emitting element. The arrangement of the groove 411a2' can reduce the blocking of light by the partition 411d. As shown in the figure, the groove 411a2' of the disclosed embodiment includes a plurality of sub-grooves 411a21', 411a22', and 411a23' separated from each other, which can also achieve the technical effect of the aforementioned turbulence. In another embodiment, the first cross-sectional area is approximately equal to the second cross-sectional area, and the third cross-sectional area A5 is not less than half of the first cross-sectional area or the second cross-sectional area. The disclosed embodiment does not limit the groove of the communicating cavity Geometry.

請參照第7圖,其繪示依照本揭露另一實施例之流體殺菌裝置的分解圖。在此實施例中,本體410’的基座411’包含基座底件4111’和基座面件4112’,基座底件4111’可套合在基座面件4112’上,基座面件4112’的材質為聚四氟乙烯,本體411’的第一管體412和第二管體413與基座底件4111’相連接,可以用一體成形的方式同時形成第一管體412和第二管體413與基座底件4111’。Please refer to FIG. 7, which shows an exploded view of a fluid sterilization device according to another embodiment of the present disclosure. In this embodiment, the base 411' of the main body 410' includes a base bottom piece 4111' and a base surface piece 4112', the base bottom piece 4111' can be sleeved on the base surface piece 4112', and the base surface The material of the part 4112' is polytetrafluoroethylene. The first tube body 412 and the second tube body 413 of the main body 411' are connected to the base bottom part 4111', and the first tube body 412 and the second tube body 413 can be formed in an integrated manner. The second tube body 413 and the base bottom part 4111'.

請參照第8A至8C圖,其繪示依照本揭露數個實施例之時間與光源的發光功率的關係圖。Please refer to FIGS. 8A to 8C, which illustrate the relationship between time and luminous power of the light source according to several embodiments of the present disclosure.

如第8A圖所示,在時間區間T11中,在流體F1不流動狀態下,光源130會以一低電流(低功率)狀態持續發光待機。在時間區間T12中,當流體F1流動時,流體殺菌裝置啟動殺菌功能,光源130會以高電流(高功率)狀態發光。As shown in FIG. 8A, in the time interval T11, when the fluid F1 is not flowing, the light source 130 will continue to emit light in a low current (low power) state on standby. In the time interval T12, when the fluid F1 flows, the fluid sterilization device activates the sterilization function, and the light source 130 emits light in a high current (high power) state.

如第8B圖所示,在時間區間T21中,在流體F1不流動狀態下,光源130會以脈衝訊號方式發光。在時間區間T22中,當流體F1流動時,流體殺菌裝置啟動殺菌功能,光源130會持續發光。As shown in FIG. 8B, in the time interval T21, when the fluid F1 is not flowing, the light source 130 emits light in a pulse signal manner. In the time interval T22, when the fluid F1 flows, the fluid sterilization device activates the sterilization function, and the light source 130 continues to emit light.

如第8C圖所示,當外部訊號啟動時,流體殺菌裝置至少延遲一段時間t1發出殺菌光,且至少延遲一段時間t2出水。當流體裝置接收到外部訊號結束時,結束止水,且至少延遲一段時間後停止發出殺菌光。As shown in Fig. 8C, when the external signal is activated, the fluid sterilization device delays at least a period of t1 to emit the sterilizing light, and delays at least a period of t2 to emit water. When the fluid device receives the external signal and ends, it stops the water stop, and stops emitting the sterilizing light after at least a period of delay.

在第8A至8C圖的發光模式下,無論流體殺菌裝置內的流體F1是否流動,光源130持續對流體殺菌裝置內內流體F1保持殺菌狀態。In the light-emitting mode of FIGS. 8A to 8C, the light source 130 continues to maintain the sterilization state of the fluid F1 in the fluid sterilization device regardless of whether the fluid F1 in the fluid sterilization device flows.

請參照第9A至9B圖,第9A圖繪示依照本揭露另一實施例之流體殺菌裝置500的剖視圖,而第9B圖繪示第9A圖之流體殺菌裝置500之時間與光源的發光功率的關係圖。流體殺菌裝置500包括本體210、電路板120、光源230、間隔板140、透光板150、外蓋160、外殼170及光強度感測器580。光強度感測器580配置在電路板120上,且用以感測光強度。光強度感測器580的配置也可參照第1E圖的光強度感測器131或132的配置,但不以此為限。此外,其它實施例的流體殺菌裝置的光強度感測器的配置位置也可與光強度感測器580在流體殺菌裝置500內的配置位置相同。Please refer to FIGS. 9A to 9B. FIG. 9A illustrates a cross-sectional view of a fluid sterilization device 500 according to another embodiment of the present disclosure, and FIG. 9B illustrates the relationship between the time of the fluid sterilization device 500 and the luminous power of the light source in FIG. 9A relation chart. The fluid sterilization device 500 includes a main body 210, a circuit board 120, a light source 230, a spacer 140, a light-transmitting plate 150, an outer cover 160, a housing 170 and a light intensity sensor 580. The light intensity sensor 580 is disposed on the circuit board 120 and used to sense light intensity. The configuration of the light intensity sensor 580 can also refer to the configuration of the light intensity sensor 131 or 132 in FIG. 1E, but is not limited thereto. In addition, the arrangement position of the light intensity sensor of the fluid sterilization device of other embodiments may also be the same as the arrangement position of the light intensity sensor 580 in the fluid sterilization device 500.

在一開始的時間區間T31中,光強度感測器580偵測光源230的光強度,在單位時間內,開啟約50%單位脈衝時間,可達到殺菌效果。隨時間進行,例如在時間區間T32中,光強度感測器580持續偵測光源230的光強度,當光強度因為光衰降至50%時,開啟100%單位脈衝時間,以讓殺菌效果不因為光衰而變差。殺菌過程中,在時間區間T31,劑量約等於50%脈衝時間乘以光強度,在時間區間T32,劑量約等於100%脈衝時間乘以50%光強度。如此,時間區間T31的劑量等於時間區間T32的劑量。如此,藉由調控光源230的開啟的單位脈衝時間,可讓殺菌劑量維持不變。In the initial time interval T31, the light intensity sensor 580 detects the light intensity of the light source 230 and turns on for about 50% of the unit pulse time within a unit time to achieve a sterilization effect. Over time, for example, in the time interval T32, the light intensity sensor 580 continues to detect the light intensity of the light source 230. When the light intensity drops to 50% due to light attenuation, the unit pulse time is turned on for 100% to prevent the sterilization effect. It gets worse because of light decay. During the sterilization process, in the time interval T31, the dose is approximately equal to 50% of the pulse time multiplied by the light intensity, and in the time interval T32, the dose is approximately equal to 100% of the pulse time multiplied by the 50% light intensity. In this way, the dose in the time interval T31 is equal to the dose in the time interval T32. In this way, by adjusting the unit pulse time of the light source 230 to be turned on, the sterilizing dose can be maintained unchanged.

光強度感測器580除了用以感測光源230的光強度外,亦可依據所接收的內部反射光強度判斷通過流體的含菌量多寡,當反應腔體內為空氣時,光強度感測器580所接收的光強度約等於光源230所提供的光強度,當通過反應腔的流體為純水時,光強度感測器所接收的光強度約為光源230光強度的80~85%,在一實施例中,當通過反應腔的流體,例如水,的大腸桿菌含菌量為30~1000cfu/ml時,光強度感測器580所接收的光強度為光源230光強度的60~35%。流體殺菌裝置500可進一步包含控制器(未圖示),控制器依據光強度感測器580所接收的反射光強度控制光源230的光強度。在另一實施例中,流體殺菌裝置500亦可包含演算單元(未圖示),演算單元依據光強度感測器580所接收的反射光強度判斷流體的含菌量。在另一實施例中,流體中的雜質多寡和粒徑大小也會影響光強度感測器580所接收的反射光強度,演算單元可根據所接收的反射光強度判斷流體的水質。In addition to sensing the light intensity of the light source 230, the light intensity sensor 580 can also determine the amount of bacteria in the passing fluid according to the received internal reflected light intensity. When the reaction chamber is air, the light intensity sensor The light intensity received by the 580 is approximately equal to the light intensity provided by the light source 230. When the fluid passing through the reaction chamber is pure water, the light intensity received by the light intensity sensor is approximately 80-85% of the light intensity of the light source 230. In one embodiment, when the E. coli content of the fluid passing through the reaction chamber, such as water, is 30~1000 cfu/ml, the light intensity received by the light intensity sensor 580 is 60~35% of the light intensity of the light source 230 . The fluid sterilization device 500 may further include a controller (not shown), which controls the light intensity of the light source 230 according to the intensity of the reflected light received by the light intensity sensor 580. In another embodiment, the fluid sterilization device 500 may also include an arithmetic unit (not shown), and the arithmetic unit determines the bacterial content of the fluid according to the intensity of the reflected light received by the light intensity sensor 580. In another embodiment, the amount of impurities in the fluid and the size of the particle size will also affect the intensity of the reflected light received by the light intensity sensor 580, and the calculation unit can determine the water quality of the fluid according to the intensity of the received reflected light.

請參照第10A~10B圖,第10A圖繪示依照本揭露另一實施例之流體殺菌裝置600的分解圖,而第10B圖繪示第10A圖之流體殺菌裝置600組合後的剖視圖。流體殺菌裝置600包括本體610、電路板120、光源130、間隔板140、透光板150、外蓋160及外殼170。Please refer to FIGS. 10A to 10B. FIG. 10A is an exploded view of the fluid sterilization device 600 according to another embodiment of the present disclosure, and FIG. 10B is a cross-sectional view of the fluid sterilization device 600 of FIG. 10A after being assembled. The fluid sterilization device 600 includes a main body 610, a circuit board 120, a light source 130, a spacer 140, a light-transmitting plate 150, an outer cover 160 and a housing 170.

本體610包括基座611、第一管體612及第二管體613。本體610具有與本體410類似或相同特徵,不同處在於,基座611省略分隔部。詳言之,基座611具有連通腔611a、第一孔洞411b及第二孔洞411c,其中連通腔611a包括連通槽411a1及凹槽611a2。連通槽411a1從承靠面411u延伸至凹槽611a2,而凹槽611a2從連通槽411a1往光線照射方向貫穿基座611。由於基座611省略分隔部,因此第一發光元件131的第一殺菌光L1及第二發光元件132的第二殺菌光L2不會受到分隔部的阻擋,增加第一殺菌光L1進入第二反應腔P2的光量及增加第二殺菌光L2進入第一反應腔P1的光量,進而增強殺菌率。The main body 610 includes a base 611, a first tube 612 and a second tube 613. The main body 610 has similar or the same features as the main body 410, except that the base 611 omits a partition. In detail, the base 611 has a communicating cavity 611a, a first hole 411b, and a second hole 411c. The communicating cavity 611a includes a communicating groove 411a1 and a groove 611a2. The communicating groove 411a1 extends from the bearing surface 411u to the groove 611a2, and the groove 611a2 penetrates the base 611 from the communicating groove 411a1 in the light irradiation direction. Since the base 611 omits the partition, the first sterilization light L1 of the first light-emitting element 131 and the second sterilization light L2 of the second light-emitting element 132 will not be blocked by the partition, increasing the first sterilization light L1 into the second reaction The light quantity of the cavity P2 and the increase of the light quantity of the second sterilization light L2 entering the first reaction cavity P1, thereby enhancing the sterilization rate.

如第10B圖所示,第一管體611與第二管體612彼此連接。例如,第一管體611與第二管體612以連接部611d連接。當第一管體611及第二管體612分別組裝至第一孔洞411b及第二孔洞411c時,連接部611d塞滿凹槽611a2,可避免流體F1從凹槽611a2洩漏至基座611外。此外,第一管體611、第二管體612與連接部611d可以是一體成形結構,然亦可分別製作完成後再結合一起。As shown in FIG. 10B, the first tube body 611 and the second tube body 612 are connected to each other. For example, the first tube body 611 and the second tube body 612 are connected by a connecting portion 611d. When the first tube body 611 and the second tube body 612 are assembled to the first hole 411b and the second hole 411c, respectively, the connecting portion 611d fills the groove 611a2, which can prevent the fluid F1 from leaking from the groove 611a2 to the outside of the base 611. In addition, the first tube body 611, the second tube body 612 and the connecting portion 611d may be an integrally formed structure, or they may be fabricated separately and then combined together.

綜上所述,雖然本揭露已以實施例揭露如上,然其並非用以限定本揭露。本揭露所屬技術領域中具有通常知識者,在不脫離本揭露之精神和範圍內,當可作各種之更動與潤飾。因此,本揭露之保護範圍當視後附之申請專利範圍所界定者為準。To sum up, although the present disclosure has been disclosed as above by embodiments, it is not intended to limit the present disclosure. Those with ordinary knowledge in the technical field to which this disclosure belongs can make various changes and modifications without departing from the spirit and scope of this disclosure. Therefore, the protection scope of this disclosure shall be subject to the scope of the attached patent application.

100、200、300、400、500、600‧‧‧流體殺菌裝置 110、210、410、410’、610‧‧‧本體 111、211、411、411’‧‧‧基座 111a、411a、611a‧‧‧連通腔 111b、411b‧‧‧第一孔洞 111c、411c‧‧‧第二孔洞 112、412、612‧‧‧第一管體 113、413、613‧‧‧第二管體 111h‧‧‧第三穿孔 111s1‧‧‧上表面 111s2‧‧‧下表面 120‧‧‧電路板 120h‧‧‧第一穿孔 120s1‧‧‧上表面 120s2‧‧‧下表面 130、230‧‧‧光源 131、132、580‧‧‧光強度感測器 131’‧‧‧第一發光元件 132’‧‧‧第二發光元件 140‧‧‧間隔板 140a‧‧‧開口 150‧‧‧透光板 140h‧‧‧第二穿孔 160‧‧‧外蓋 170‧‧‧外殼 211a、411d‧‧‧分隔部 211a1‧‧‧第一導光部 211a2‧‧‧第二導光部 380‧‧‧第一濾芯 390‧‧‧第二濾芯 411a1‧‧‧連通槽 411a2、411a2’、611a2‧‧‧凹槽 411a21’、411a22’、411a23’‧‧‧子凹槽 411u‧‧‧承靠面 4111’‧‧‧基座底件 4112’‧‧‧基座面件 480‧‧‧流體感知器 490‧‧‧擾流板 490a1、490a2‧‧‧穿孔 611d‧‧‧連接部 A1、A2、A3、A4、A5‧‧‧面積 AX1、AX2‧‧‧中心軸 C1、C2、C3‧‧‧曲線 H1、H2‧‧‧長度 L1‧‧‧第一殺菌光 L2‧‧‧第二殺菌光 F1‧‧‧流體 P1‧‧‧第一反應腔 P1a、P2a‧‧‧內側壁周圍 P1b、P2b‧‧‧外側壁周圍 P11‧‧‧第一開口 P12‧‧‧第二開口 P2、P2’‧‧‧第二反應腔 P21‧‧‧第三開口 P22‧‧‧第四開口 S1~S6‧‧‧點 T11、T12、T21、T22、T31、T32‧‧‧時間區間100, 200, 300, 400, 500, 600‧‧‧Fluid sterilization device 110, 210, 410, 410’, 610‧‧‧ ontology 111, 211, 411, 411’‧‧‧ base 111a, 411a, 611a‧‧‧Connecting cavity 111b, 411b‧‧‧First hole 111c, 411c‧‧‧second hole 112, 412, 612‧‧‧First tube 113, 413, 613‧‧‧Second tube 111h‧‧‧Third perforation 111s1‧‧‧Upper surface 111s2‧‧‧lower surface 120‧‧‧Circuit board 120h‧‧‧First punch 120s1‧‧‧Upper surface 120s2‧‧‧Lower surface 130、230‧‧‧Light source 131, 132, 580‧‧‧Light intensity sensor 131’‧‧‧First light emitting element 132’‧‧‧The second light-emitting element 140‧‧‧Spacer 140a‧‧‧Opening 150‧‧‧Transparent board 140h‧‧‧Second perforation 160‧‧‧Outer cover 170‧‧‧Shell 211a, 411d‧‧‧partition 211a1‧‧‧First light guide 211a2‧‧‧Second light guide 380‧‧‧First filter element 390‧‧‧Second filter element 411a1‧‧‧Connecting groove 411a2, 411a2’, 611a2‧‧‧ groove 411a21’, 411a22’, 411a23’‧‧‧ sub groove 411u‧‧‧Supporting surface 4111’‧‧‧Base Bottom 4112’‧‧‧Base plate 480‧‧‧Fluid Sensor 490‧‧‧ Spoiler 490a1, 490a2‧‧‧perforation 611d‧‧‧Connecting part A1, A2, A3, A4, A5‧‧‧Area AX1, AX2‧‧‧Central axis C1, C2, C3‧‧‧Curve H1, H2‧‧‧length L1‧‧‧The first germicidal light L2‧‧‧Second Sterilizing Light F1‧‧‧Fluid P1‧‧‧First reaction chamber P1a, P2a‧‧‧around the inner wall P1b, P2b‧‧‧around the outer wall P11‧‧‧First opening P12‧‧‧Second opening P2, P2’‧‧‧Second reaction chamber P21‧‧‧The third opening P22‧‧‧Fourth opening S1~S6‧‧‧point T11, T12, T21, T22, T31, T32‧‧‧Time interval

第1A及1B圖繪示依照本揭露一實施例之流體殺菌裝置的外觀圖。 第1C及1D圖繪示第1A圖之流體殺菌裝置的分解圖。 第1E圖繪示第1B圖之流體殺菌裝置沿方向1E-1E’的剖視圖。 第2圖繪示第1E圖之流體殺菌裝置的流量與殺菌能力的關係圖。 第3圖繪示依照本揭露另一實施例之流體殺菌裝置的剖視圖。 第4圖繪示依照本揭露另一實施例之流體殺菌裝置的剖視圖。 第5A圖繪示依照本揭露另一實施例之流體殺菌裝置的分解圖。 第5B圖繪示第5A圖之流體殺菌裝置組合後的剖視圖。 第5C圖繪示第5A圖之流體殺菌裝置沿方向5C-5C’的剖視圖。 第5D圖繪示第5B圖之第一反應腔及第二反應腔的流速模擬圖。 第5E圖繪示省略凹槽之第二反應腔及第5B圖之第二反應腔的流速模擬圖。 第6圖繪示依照本揭露另一實施例之連通腔411a’的剖視圖。 第7圖繪示依照本揭露另一實施例之流體殺菌裝置的分解圖。 第8A至8C圖繪示依照本揭露數個實施例之時間與光源的發光功率的關係圖。 第9A圖繪示依照本揭露另一實施例之流體殺菌裝置的剖視圖。 第9B圖繪示第9A圖之流體殺菌裝置之時間與光源的發光功率的關係圖。 第10A圖繪示依照本揭露另一實施例之流體殺菌裝置的分解圖。 第10B圖繪示第10A圖之流體殺菌裝置組合後的剖視圖。Figures 1A and 1B show the appearance of a fluid sterilization device according to an embodiment of the disclosure. Figures 1C and 1D are exploded views of the fluid sterilization device of Figure 1A. Figure 1E shows a cross-sectional view of the fluid sterilization device of Figure 1B along the direction 1E-1E'. Fig. 2 shows the relationship between the flow rate and the sterilization ability of the fluid sterilization device in Fig. 1E. Figure 3 is a cross-sectional view of a fluid sterilization device according to another embodiment of the disclosure. FIG. 4 is a cross-sectional view of a fluid sterilization device according to another embodiment of the disclosure. FIG. 5A is an exploded view of a fluid sterilization device according to another embodiment of the disclosure. Figure 5B is a cross-sectional view of the fluid sterilization device of Figure 5A after being assembled. Figure 5C shows a cross-sectional view of the fluid sterilization device of Figure 5A along the direction 5C-5C'. Figure 5D shows a simulation diagram of the flow velocity of the first reaction chamber and the second reaction chamber in Figure 5B. Fig. 5E shows a simulation diagram of the flow velocity of the second reaction chamber without grooves and the second reaction chamber in Fig. 5B. Figure 6 is a cross-sectional view of the communicating cavity 411a' according to another embodiment of the disclosure. FIG. 7 is an exploded view of a fluid sterilization device according to another embodiment of the disclosure. 8A to 8C are diagrams showing the relationship between time and luminous power of the light source according to several embodiments of the present disclosure. FIG. 9A is a cross-sectional view of a fluid sterilization device according to another embodiment of the disclosure. Fig. 9B shows the relationship between the time of the fluid sterilization device in Fig. 9A and the luminous power of the light source. FIG. 10A is an exploded view of a fluid sterilization device according to another embodiment of the disclosure. Figure 10B is a cross-sectional view of the fluid sterilization device of Figure 10A after being assembled.

110‧‧‧本體 110‧‧‧Ontology

111‧‧‧基座 111‧‧‧Base

111a‧‧‧連通腔 111a‧‧‧Connecting cavity

111b‧‧‧第一孔洞 111b‧‧‧First hole

111c‧‧‧第二孔洞 111c‧‧‧Second hole

112‧‧‧第一管體 112‧‧‧First tube

113‧‧‧第二管體 113‧‧‧Second tube

111s1‧‧‧上表面 111s1‧‧‧Upper surface

111s2‧‧‧下表面 111s2‧‧‧lower surface

120‧‧‧電路板 120‧‧‧Circuit board

120s1‧‧‧上表面 120s1‧‧‧Upper surface

140‧‧‧間隔板 140‧‧‧Spacer

140a‧‧‧開口 140a‧‧‧Opening

150‧‧‧透光板 150‧‧‧Transparent board

160‧‧‧外蓋 160‧‧‧Outer cover

170‧‧‧外殼 170‧‧‧Shell

Claims (27)

一種流體殺菌裝置,包括:一第一反應腔,連接至一流體入口;一第二反應腔,連接至一流體出口;一連通腔,連接該第一反應腔與該第二反應腔;以及一光源,用以發出一殺菌光至該第一反應腔與該第二反應腔,以對該流體進行殺菌;其中,該流體入口允許一流體進入該第一反應腔,該連通腔允許該流體通過而進入該第二反應腔,該流體在該第二反應腔內的流速分布不同於該流體在該第一反應腔內的流速分布。 A fluid sterilization device includes: a first reaction chamber connected to a fluid inlet; a second reaction chamber connected to a fluid outlet; a communication chamber connecting the first reaction chamber and the second reaction chamber; and a A light source for emitting a sterilization light to the first reaction chamber and the second reaction chamber to sterilize the fluid; wherein the fluid inlet allows a fluid to enter the first reaction chamber, and the communication cavity allows the fluid to pass When entering the second reaction chamber, the flow velocity distribution of the fluid in the second reaction chamber is different from the flow velocity distribution of the fluid in the first reaction chamber. 如申請專利範圍第1項所述之流體殺菌裝置,該流體在該第一反應腔中朝一第一方向流動,在該第二反應腔中朝一第二方向流動,該第二方向不同於該第一方向。 According to the fluid sterilization device described in item 1 of the scope of patent application, the fluid flows in a first direction in the first reaction chamber and flows in a second direction in the second reaction chamber, and the second direction is different from the first direction. One direction. 如申請專利範圍第2項所述之流體殺菌裝置,該第二方向與該第一方向相反。 For the fluid sterilization device described in item 2 of the scope of patent application, the second direction is opposite to the first direction. 如申請專利範圍第1項所述之流體殺菌裝置,該流體在該第二反應腔的流速分布為外側壁周圍的流速大於中央區域的流速,中央區域的流速大於內側壁周圍的流速。 For the fluid sterilization device described in the first item of the scope of patent application, the flow velocity distribution of the fluid in the second reaction chamber is such that the flow velocity around the outer wall is greater than the flow velocity in the central area, and the flow velocity in the central area is greater than the flow velocity around the inner wall. 如申請專利範圍第1項所述之流體殺菌裝置,該流體在該第二反應腔一區域的雷諾數大於在該第一反應腔的雷諾數。 According to the fluid sterilization device described in item 1 of the scope of patent application, the Reynolds number of the fluid in a region of the second reaction chamber is greater than the Reynolds number of the first reaction chamber. 如申請專利範圍第5項所述之流體殺菌裝置,該流體在該第二反應腔為一擾流狀態。 According to the fluid sterilization device described in item 5 of the scope of patent application, the fluid is in a turbulent flow state in the second reaction chamber. 如申請專利範圍第1項所述之流體殺菌裝置,其中該流體入口的截面積與該流體出口的截面積大致相等,該連通腔的截面積不小於該流體入口的截面積或該流體出口的截面積的一半。 For the fluid sterilization device described in item 1 of the scope of patent application, the cross-sectional area of the fluid inlet is approximately equal to the cross-sectional area of the fluid outlet, and the cross-sectional area of the communicating cavity is not less than the cross-sectional area of the fluid inlet or the fluid outlet. Half of the cross-sectional area. 如申請專利範圍第1項所述之流體殺菌裝置,該連通腔具有一凹槽。 For the fluid sterilization device described in item 1 of the scope of patent application, the communication cavity has a groove. 如申請專利範圍第8項所述之流體殺菌裝置,該凹槽的一截面為正方形。 For the fluid sterilization device described in item 8 of the scope of patent application, a cross section of the groove is square. 如申請專利範圍第1項所述之流體殺菌裝置,該第一反應腔、該第二反應腔與該連通腔形成一U型流路。 According to the fluid sterilization device described in item 1 of the scope of patent application, the first reaction chamber, the second reaction chamber and the communication chamber form a U-shaped flow path. 如申請專利範圍第1項所述之流體殺菌裝置,更包含一流體感知器,設置於該第一反應腔,該流體經過該流體感知器形成擾流狀。 The fluid sterilization device described in item 1 of the patent application further includes a fluid sensor disposed in the first reaction chamber, and the fluid passes through the fluid sensor to form a turbulent flow. 如申請專利範圍第1項所述之流體殺菌裝置,更包含一流體感知器,該流體感知器用以感測該流體的通過及流速。 The fluid sterilization device described in claim 1 further includes a fluid sensor for sensing the passage and flow rate of the fluid. 如申請專利範圍第1項所述之流體殺菌裝置,其中該殺菌光的功率係依據該流速調整。 In the fluid sterilization device described in item 1 of the scope of patent application, the power of the sterilization light is adjusted according to the flow rate. 如申請專利範圍第1項所述之流體殺菌裝置,更包含一流體感知器,該流體感知器具有該第一反應腔。 The fluid sterilization device described in item 1 of the scope of patent application further includes a fluid sensor having the first reaction chamber. 如申請專利範圍第12項所述之流體殺菌裝置,其中該流體感知器感知該流體在不流動狀態時,該光源以一低功率狀態持續發出該殺菌光。 The fluid sterilization device described in item 12 of the scope of patent application, wherein when the fluid sensor senses that the fluid is not flowing, the light source continuously emits the sterilization light in a low power state. 如申請專利範圍第15項所述之流體殺菌裝置,其中該流體感知器感知該流體在流動狀態時,該光源以一高功率狀態持續發出該殺菌光。 According to the fluid sterilization device described in claim 15, wherein the light source continuously emits the sterilization light in a high-power state when the fluid sensor senses the fluid in a flowing state. 如申請專利範圍第12項所述之流體殺菌裝置,其中該流體感知器感知該流體在不流動狀態時,該光源以一脈衝訊號方式發出該殺菌光。 The fluid sterilization device described in item 12 of the scope of patent application, wherein when the fluid sensor senses that the fluid is not flowing, the light source emits the sterilization light in a pulse signal manner. 如申請專利範圍第17項所述之流體殺菌裝置,其中該流體感知器感知該流體在流動狀態時,該光源以持續發光方式發出該殺菌光。 For the fluid sterilization device described in item 17 of the scope of patent application, when the fluid sensor senses the fluid in a flowing state, the light source emits the sterilization light in a continuous luminous manner. 如申請專利範圍第12項所述之流體殺菌裝置,其中當一外部訊號啟動時,該光源延遲發出該殺菌光。 The fluid sterilization device described in item 12 of the scope of patent application, wherein when an external signal is activated, the light source delays emitting the sterilization light. 如申請專利範圍第19項所述之流體殺菌裝置,其中當一外部訊號結束時,該光源延遲一段時間後停止發出該殺菌光。 The fluid sterilization device described in item 19 of the scope of patent application, wherein when an external signal ends, the light source stops emitting the sterilization light after a period of delay. 如申請專利範圍第1項所述之流體殺菌裝置,更包括:一擾流板,配置在該第一反應腔內,該擾流板具有複數個穿孔,以改變通過該穿孔之該流體的流場。 The fluid sterilization device described in item 1 of the scope of the patent application further includes: a spoiler arranged in the first reaction chamber, the spoiler having a plurality of perforations to change the flow of the fluid through the perforation field. 一種流體殺菌裝置,包括:一光源,提供一殺菌光;一反應腔,以使一流體通過,該殺菌光照射至該反應腔;一流體感知器,用以感知該流體的通過和流速;一光感測器,用以接收並感測該殺菌光照射至反應腔的一反射光;以及一控制器,依據該反射光的強度控制該殺菌光的光強度。 A fluid sterilization device includes: a light source to provide a sterilization light; a reaction chamber to allow a fluid to pass through, and the sterilization light irradiates the reaction chamber; a fluid sensor to sense the passage and flow rate of the fluid; The light sensor is used for receiving and sensing a reflected light of the sterilization light irradiated to the reaction chamber; and a controller, which controls the light intensity of the sterilization light according to the intensity of the reflected light. 如申請專利範圍第22項所述之流體殺菌裝置,進一步包含一演算單元,依據該反射光的光強度判斷該流體的含菌量和水質。 The fluid sterilization device described in item 22 of the scope of patent application further includes an arithmetic unit for judging the bacterial content and water quality of the fluid based on the light intensity of the reflected light. 如申請專利範圍第22項所述之流體殺菌裝置,其中該流體感知器感知該流體在不流動狀態時,該光源以一低功率狀態持續發出該殺菌光。 For the fluid sterilization device described in item 22 of the scope of patent application, when the fluid sensor senses that the fluid is not flowing, the light source continuously emits the sterilization light in a low power state. 如申請專利範圍第24項所述之流體殺菌裝置,其中該流體感知器感知該流體在流動狀態時,該光源以一高功率狀態持續發出該殺菌光。 The fluid sterilization device according to the 24th patent application, wherein the light source continuously emits the sterilization light in a high power state when the fluid sensor senses the fluid in a flowing state. 如申請專利範圍第22項所述之流體殺菌裝置,其中該流體感知器感知該流體在不流動狀態時,該光源以一脈衝訊號方式發出該殺菌光。 The fluid sterilization device described in the 22nd patent application, wherein when the fluid sensor senses that the fluid is not flowing, the light source emits the sterilization light in a pulse signal manner. 如申請專利範圍第26項所述之流體殺菌裝置,其中該流體感知器感知該流體在流動狀態時,該光源以持續發光方式發出該殺菌光。 According to the fluid sterilization device described in item 26 of the scope of patent application, when the fluid sensor senses the fluid in a flowing state, the light source emits the sterilization light in a continuous luminous manner.
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