TWI688542B - Laser reseal with local delimitation - Google Patents

Laser reseal with local delimitation Download PDF

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TWI688542B
TWI688542B TW105140183A TW105140183A TWI688542B TW I688542 B TWI688542 B TW I688542B TW 105140183 A TW105140183 A TW 105140183A TW 105140183 A TW105140183 A TW 105140183A TW I688542 B TWI688542 B TW I688542B
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substrate
cavity
cap
plane
area
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TW201730092A (en
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阿奇美 布萊林
法蘭克 萊賢巴哈
猶根 蘭穆斯
尤莉亞 雅木托
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德商羅伯特博斯奇股份有限公司
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00015Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
    • B81C1/00261Processes for packaging MEMS devices
    • B81C1/00277Processes for packaging MEMS devices for maintaining a controlled atmosphere inside of the cavity containing the MEMS
    • B81C1/00293Processes for packaging MEMS devices for maintaining a controlled atmosphere inside of the cavity containing the MEMS maintaining a controlled atmosphere with processes not provided for in B81C1/00285

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  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
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Abstract

A method is provided for producing a micromechanical component having a substrate and having a cap which is connected to the substrate and encloses a first cavity with the substrate, a first pressure prevailing and a first gas mixture having a first chemical composition being enclosed in the first cavity, - an access opening connecting the first cavity to an environment of the micromechanical component being formed in the substrate or in the cap in a first method step, - the first pressure and/or the first chemical composition in the first cavity being adjusted in a second method step, - the access opening being sealed by introducing energy or heat into an absorbent part of the substrate or of the cap with the aid of a laser in a third method step, wherein - a structure raised relative to a surface, facing away from the first cavity, of the substrate or of the cap and arranged in the region of the access opening is formed in a fourth method step in order to provide a material region of the substrate or of the cap which is converted into a liquid state of aggregation in the third method step.

Description

具有局部定界的雷射再封閉 Laser reclosure with local delimitation

本發明大致上係關於具有局部定界的雷射再封閉。 The present invention relates generally to laser reclosing with local delimitation.

本發明係基於一種根據申請專利範圍第1項之前序部分之方法。 The present invention is based on a method according to the preamble of item 1 of the patent application.

此種方法自WO 2015/120939 A1已知。若需要微機械組件之空腔中之特定內部壓力,或若意欲將具有特定化學成分之氣體混合物圍封於該空腔中,則常常在微機械組件之封蓋期間或在基板晶圓與蓋帽晶圓之間的接合製程期間調整內部壓力或化學成分。在封蓋期間,例如,將蓋帽連接至基板,從而使得蓋帽與基板一起圍封空腔。藉由在封蓋期間調整存在於環境中之大氣或壓力及/或氣體混合物之化學成分,可從而調整該空腔中之特定內部壓力及/或特定化學成分。 Such a method is known from WO 2015/120939 A1. If a specific internal pressure in the cavity of the micromechanical component is required, or if a gas mixture with a specific chemical composition is to be enclosed in the cavity, it is often during the capping of the micromechanical component or in the substrate wafer and cap The internal pressure or chemical composition is adjusted during the bonding process between wafers. During capping, for example, the cap is connected to the substrate, so that the cap encloses the cavity together with the substrate. By adjusting the chemical composition of the atmosphere or pressure and/or gas mixture present in the environment during capping, the specific internal pressure and/or specific chemical composition in the cavity can be adjusted accordingly.

藉由自WO 2015/120939已知之方法,可以受控方式調整微機械組件之空腔中之內部壓力。藉由此方法,尤其有可能產生具有第一空腔之微機械組件,有可能在該第一空腔中調整第一壓力及第一化學成分(其分別不同於封蓋時的第二壓力及第二化學成分)。 By the method known from WO 2015/120939, the internal pressure in the cavity of the micromechanical component can be adjusted in a controlled manner. By this method, it is particularly possible to produce a micromechanical component with a first cavity, it is possible to adjust the first pressure and the first chemical composition in the first cavity (which are different from the second pressure and the second pressure when capping, respectively) The second chemical composition).

在根據WO 2015/120939 A1的用於以受控方式調整微機械組件之空腔中之內部壓力的方法中,在蓋帽中,或在蓋帽晶圓中,或在基板 中,或在感測器晶圓中產生通往空腔之窄接取通道。隨後,藉由該接取通道使該空腔充滿所要氣體及所要內部壓力。最終,藉助於雷射局部加熱該接取通道周圍之區域,且該基板材料局部液化,並且當其凝固時氣密性地封閉該接取通道。 In a method according to WO 2015/120939 A1 for adjusting the internal pressure in the cavity of a micromechanical component in a controlled manner, in a cap, or in a cap wafer, or in a substrate , Or create a narrow access channel to the cavity in the sensor wafer. Subsequently, the cavity is filled with the desired gas and the desired internal pressure through the access channel. Finally, the area around the access channel is locally heated by laser, and the substrate material is locally liquefied, and the access channel is hermetically closed when it solidifies.

本發明之一目的為提供一種用於以與先前技術相比簡單且經濟的方式製造微機械組件之方法,該微機械組件與先前技術相比為機械穩固的且具有較長壽命。本發明之另一目的為提供一種微機械組件,該微機械組件與先前技術相比為緊密且機械穩固的且具有較長壽命。根據本發明,此尤其適用於具有(第一)空腔之微機械組件。藉由根據本發明之方法及根據本發明之微機械組件,另外亦可能製造可在第一空腔中調整第一壓力及第一化學成分且可在第二空腔中調整第二壓力及第二化學成分之微機械組件。舉例而言,提供用於製造微機械組件之此種方法,其對於將第一壓力圍封於第一空腔中且將第二壓力圍封於第二空腔中有利,該第一壓力既定不同於該第二壓力。此可(例如)為當意欲將用於旋轉速率量測之第一感測器單元及用於加速度量測之第二感測器單元整合於微機械組件中時之情況。 An object of the present invention is to provide a method for manufacturing a micromechanical component in a simple and economical manner compared to the prior art, which is mechanically stable and has a longer life compared to the prior art. Another object of the present invention is to provide a micromechanical component which is compact and mechanically stable and has a longer life compared to the prior art. According to the invention, this applies in particular to micromechanical components with (first) cavities. With the method according to the invention and the micromechanical component according to the invention, it is also possible to manufacture the first pressure and the first chemical composition that can be adjusted in the first cavity and the second pressure and the first pressure that can be adjusted in the second cavity 2. Micro-mechanical components of chemical composition. For example, providing such a method for manufacturing a micromechanical component is advantageous for enclosing a first pressure in a first cavity and enclosing a second pressure in a second cavity, the first pressure is given Different from this second pressure. This may be, for example, when it is intended to integrate the first sensor unit for rotation rate measurement and the second sensor unit for acceleration measurement into the micromechanical component.

該目的藉由以下方式達成- 在第四方法步驟中形成相對於該基板或該蓋帽之背對第一空腔之表面升高且配置於接取開口之區域中的結構,以便提供該基板或該蓋帽之材料區域,該材料區域在第三方法步驟中轉換成液態聚集體。 This object is achieved by forming a structure that is raised relative to the surface of the substrate or the cap facing away from the first cavity in the fourth method step and is disposed in the area where the opening is taken to provide the substrate or The material area of the cap is converted into a liquid aggregate in the third method step.

藉助於此方式,以簡單且經濟的方式提供一種用於製造微機械組件的方法,藉由該方法可產生凝固後材料區域,使得其相對於該基板或該蓋帽之背對第一空腔之另一表面降低。與不形成該結構之方法相比,根據本發明之方法具有(例如)凝固後材料區域突出超過另一表面較少,從而使得凝固後材料區域提供較少用於機械衝擊之接合區域的優點。以此方式,凝固後材料區域及/或凝固後材料區域與該基板之其餘部分或該蓋帽之其餘部分之間的介面及/或介面周圍的區域較不易形成裂痕。換言之,藉助於根據本發明之方法,凝固後材料區域(例如)在製造流程期間較不易損壞且較不易發生非預期接觸,且因此亦較少裂痕之起因及開始點。因此以與先前技術相比簡單且經濟的方式提供用於製造與先前技術相比機械穩固且具有較長壽命的微機械組件之方法。 With this method, a method for manufacturing a micromechanical component is provided in a simple and economical manner, by which a region of material after solidification can be generated such that it faces away from the first cavity with respect to the back of the substrate or the cap The other surface is lowered. Compared to methods that do not form this structure, the method according to the invention has the advantage that, for example, the solidified material area protrudes less than the other surface, so that the solidified material area provides less bonding area for mechanical impact. In this way, the solidified material area and/or the interface between the solidified material area and the rest of the substrate or the rest of the cap and/or the area around the interface are less likely to form cracks. In other words, with the aid of the method according to the invention, the solidified material area (for example) is less susceptible to damage during the manufacturing process and is less prone to unintended contact, and therefore also less cause and starting point of cracks. Therefore, a method for manufacturing a micromechanical component that is mechanically stable and has a longer life compared to the prior art is provided in a simple and economical manner compared to the prior art.

根據本發明之方法的另一優點為,藉助於升高部分,基板或蓋帽之吸收部分可幾何地劃分成吸收第一子部分及吸收第二子部分,使得第一子部分配置於該結構內部且第二子部分配置於基板或蓋帽之表面區域中。由於第一子部分中相比於第二子部分中之熱消散可能性的幾何有限熱消散可能性,因此變得有可能(例如)僅第一子部分中之材料區域轉換成液態聚集體。以此方式,藉助於該結構,可有利地使以下事實成為可能:轉換成液態聚集體之材料區域可在雷射輻射之前已經由該結構之幾何形狀以幾何方式決定。因此,藉由根據本發明之方法,提供一種相對於具有接取孔之雷射之對準中之較小變化尤其穩固之方法。 Another advantage of the method according to the invention is that, by means of the raised portion, the absorption portion of the substrate or cap can be geometrically divided into the absorption of the first sub-portion and the absorption of the second sub-portion, so that the first sub-portion is arranged inside the structure And the second sub-portion is disposed in the surface area of the substrate or the cap. Due to the geometrically limited heat dissipation possibilities in the first sub-section compared to the heat dissipation possibilities in the second sub-section, it becomes possible (for example) to convert only the material areas in the first sub-section into liquid aggregates. In this way, by means of the structure, it can be advantageously made possible that the material area converted into liquid aggregates can already be determined geometrically by the geometry of the structure before laser radiation. Therefore, by the method according to the invention, a method is provided which is particularly robust with small changes in the alignment with respect to lasers with access holes.

此外,藉由根據本發明之方法,當僅局部加熱基板材料且經加熱材料在凝固期間及在相對於其環境冷卻期間都收縮時不太成問題。甚至從而封閉區域中可出現極高的拉伸應力之事實亦不太成問題,此係因為 (例如)可藉由降低凝固後材料區域來將機械衝擊之接合區域最小化。因此亦不大可能形成取決於應力及材料而產生之自發裂痕。亦不大可能在進一步處理期間或在該區域中在微機械組件之熱或機械負載下形成裂痕,此係因為(例如)封閉的接取開口之區域受到(例如)更好保護。 Furthermore, with the method according to the invention, it is not a problem when only the substrate material is locally heated and the heated material shrinks both during solidification and during cooling relative to its environment. Even the fact that extremely high tensile stress can occur in the enclosed area is not a problem, because For example, the mechanically impacted joint area can be minimized by reducing the solidified material area. Therefore, it is unlikely to form spontaneous cracks depending on stress and material. It is also unlikely that cracks will form during further processing or in this area under the heat or mechanical load of the micromechanical components, because (for example) the closed access area is (for example) better protected.

根據本發明,「在接取開口之區域中」欲意謂基板或蓋帽直接緊鄰接取開口之區域。根據本發明,該結構配置於接取開口之區域中。此外,根據本發明,提供基板或蓋帽與接取開口分離之區域。此分離區域(例如)基本上在垂直於接取開口之中軸的方向上與接取開口分離地配置。此外,分離區域(例如)直接緊鄰接取開口之區域配置。在此情況下,例如規定表面至少部分地配置於分離區域中。 According to the invention, "in the area of the access opening" is intended to mean that the substrate or the cap is directly adjacent to the area of the access opening. According to the invention, the structure is arranged in the area where the opening is taken. Furthermore, according to the present invention, an area where the substrate or the cap is separated from the receiving opening is provided. This separation area is, for example, arranged to be separated from the receiving opening in a direction perpendicular to the central axis of the receiving opening. In addition, the separation area (for example) is arranged directly adjacent to the area where the opening is taken. In this case, for example, it is prescribed that the surface is arranged at least partially in the separation area.

此外,根據本發明,「基板或蓋帽之吸收部分」欲意謂該基板或該蓋帽中發生該基板或該蓋帽中之90%能量或熱吸收的區域。 Furthermore, according to the present invention, the "absorption portion of the substrate or cap" is intended to mean the area of the substrate or cap where 90% of the energy or heat absorption in the substrate or cap occurs.

結合本發明,術語「微機械組件」應理解為意謂涵蓋微機械組件及微機電組件兩者之術語。 In conjunction with the present invention, the term "micromechanical component" should be understood to mean a term covering both micromechanical components and microelectromechanical components.

本發明較佳地意欲用於製造具有空腔之微機械組件或用於具有空腔之微機械組件。然而,本發明(例如)亦意欲用於具有兩個空腔或具有多於兩個空腔(亦即,三個、四個、五個、六個或多於六個空腔)之微機械組件。 The present invention is preferably intended for the manufacture of micromechanical components with cavities or for micromechanical components with cavities. However, the present invention is, for example, also intended for micromachines having two cavities or having more than two cavities (ie, three, four, five, six, or more than six cavities) Components.

較佳地,藉由雷射將能量或熱引入至基板或蓋帽之能量吸收部分或熱吸收部分中來封閉接取開口。在此情況下,較佳地以時間順序分別將能量或熱引入至複數個微機械組件之基板或蓋帽之吸收部分中,該複數個微機械組件(例如)一起產生於一晶圓上。然而,作為替代方案,亦 (例如)藉由使用複數個雷射波束或雷射裝置,時間上同時地將能量或熱引入至複數個微機械組件之基板或蓋帽之各別吸收部分中。 Preferably, the access opening is closed by introducing energy or heat into the energy absorption portion or heat absorption portion of the substrate or cap by means of laser. In this case, it is preferable to introduce energy or heat into the absorption portions of the substrates or caps of the plurality of micromechanical components, which are produced together on a wafer, for example, in time sequence. However, as an alternative, For example, by using a plurality of laser beams or laser devices, energy or heat is simultaneously introduced into the respective absorption portions of the substrates or caps of the plurality of micromechanical components at the same time.

可在所附申請專利範圍以及參考圖式之說明中發現本發明之有利組態及改進。 The advantageous configuration and improvement of the present invention can be found in the attached patent application scope and the description with reference to the drawings.

根據一個較佳的改進,該蓋帽與該基板圍封一第二空腔,第二壓力存在於該第二空腔中且具有第二化學成分之第二氣體混合物圍封於該第二空腔中。 According to a preferred improvement, the cap and the substrate enclose a second cavity, a second pressure exists in the second cavity and a second gas mixture having a second chemical composition is enclosed in the second cavity in.

根據一個較佳的改進,該結構經組態成使得在第三方法步驟之後凝固的材料區域配置於基本上沿基板或蓋帽之背對第一空腔之另一表面延伸的平面與第一空腔之間。此有利地使得凝固後材料區域有可能不凸起超出另一表面,從而使得凝固後材料區域提供較少機械衝擊之接合區域。藉助於此,凝固後材料區域及/或凝固後材料區域與基板之其餘部分或蓋帽之其餘部分之間的介面及/或介面周圍的區域甚至更不易形成裂痕。 According to a preferred improvement, the structure is configured such that the solidified material region after the third method step is arranged substantially along the plane of the other surface of the substrate or cap extending away from the first cavity and the first cavity Between the cavities. This advantageously makes it possible that the solidified material area does not protrude beyond the other surface, so that the solidified material area provides a less mechanically impacted joint area. By means of this, the solidified material region and/or the interface between the solidified material region and the rest of the substrate or the rest of the cap and/or the area around the interface are even less likely to form cracks.

根據一個較佳的改進,該結構經組態成使得在第三方法步驟之後凝固的材料區域配置於基本上沿基板或蓋帽之背對第一空腔之另一表面延伸的平面與基本上沿該表面延伸的另一平面之間。此有利地使得可產生相對於機械衝擊尤其穩固之微機械組件成為可能。 According to a preferred improvement, the structure is configured such that the solidified material region after the third method step is arranged substantially along a plane extending substantially along the other surface of the substrate or cap facing away from the first cavity This surface extends between another plane. This advantageously makes it possible to produce micromechanical components that are particularly stable against mechanical shocks.

根據一個較佳的改進,該結構經組態成使得該結構至基本上沿該表面延伸之另一平面上之突出部的第一面積小於凝固後材料區域至該另一平面上之突出部的第二面積且/或小於該基板或該蓋帽之吸收部分至該另一平面上之突出部的第三面積。此可有利地使得可藉助於該結構之幾何形狀以受控方式調整藉由雷射引入至基板或蓋帽中之能量或熱成為可能。 此外,有利地提供一種相比於先前技術具有特別高的能量或熱引入精確性之方法。 According to a preferred improvement, the structure is configured such that the first area of the structure to the protrusion on another plane extending substantially along the surface is smaller than the area of the solidified material region to the protrusion on the other plane The second area is/and is smaller than the third area of the absorbing portion of the substrate or the cap to the protrusion on the other plane. This can advantageously make it possible to adjust the energy or heat introduced by the laser into the substrate or cap in a controlled manner by means of the geometry of the structure. Furthermore, it is advantageous to provide a method with particularly high energy or heat introduction accuracy compared to the prior art.

根據一個較佳的改進,該結構經基本上相對於接取開口且/或相對於凝固後材料區域之質量中心且/或相對於基板或蓋帽之吸收部分旋轉對稱地且/或環狀地組態於基本上平行於該表面延伸之另一平面中。此使得轉換成液態聚集體之材料區域可尤其有利地流動成為可能。 According to a preferred improvement, the structure is arranged symmetrically and/or annularly with respect to the access opening and/or to the center of mass of the solidified material region and/or to the absorption portion of the substrate or cap The state lies in another plane extending substantially parallel to the surface. This makes it possible for material regions converted into liquid aggregates to flow particularly advantageously.

根據一個較佳的改進,基本上平行於該表面延伸之第三平面中之結構基本上與第三平面中之接取通道之中點分離配置之最大尺度為第三平面中之接取通道與該中點分離配置之最大尺度的至多六倍或至多五倍或至多四倍或至多三倍或至多兩倍。此可使得轉換成液態聚集體之材料區域可尤其有利地流動成為可能。舉例而言,此有利地使得材料區域可以以下方式流動成為可能:使得在第三方法步驟之後凝固的材料區域配置於基本上沿基板或蓋帽之背對第一空腔之另一表面延伸的平面與第一空腔之間。 According to a preferred improvement, the structure in the third plane extending substantially parallel to the surface is substantially separated from the midpoint of the access channel in the third plane. The maximum dimension of the configuration is the access channel in the third plane and The maximum scale of the midpoint separation configuration is at most six times or at most five times or at most four times or at most three times or at most twice. This makes it possible for the material areas converted into liquid aggregates to flow particularly advantageously. For example, this advantageously makes it possible for the material region to flow in such a way that the solidified material region after the third method step is arranged in a plane extending substantially along the other surface of the substrate or cap facing away from the first cavity With the first cavity.

此外,本發明係關於一種微機械組件,該微機械組件具有基板,且具有連接至該基板並且與該基板圍封第一空腔之蓋帽,第一壓力存在於該第一空腔中且具有第一化學成分之第一氣體混合物圍封於該第一空腔中之,該基板或該蓋帽包含封閉的接取開口,其中該基板或該蓋帽包含相對於該基板或該蓋帽之背對第一空腔之表面升高且配置於該接取開口之區域中的結構,以便提供該基板或該蓋帽之材料區域,該材料區域在該接取開口之封閉期間轉換成液態聚集體。以此方式,有利地提供具有經調整第一壓力之緊密、機械穩固且經濟的微機械組件。根據本發明之方法的前 述優點亦相應地適用於根據本發明之微機械組件。 In addition, the present invention relates to a micromechanical component having a substrate and having a cap connected to the substrate and enclosing a first cavity with the substrate, a first pressure exists in the first cavity and has The first gas mixture of the first chemical composition is enclosed in the first cavity, and the substrate or the cap includes a closed access opening, wherein the substrate or the cap includes a portion opposite to the substrate or the cap A structure of the surface of a cavity raised and arranged in the area of the access opening to provide a material area of the substrate or the cap, which material area is converted into a liquid aggregate during the closing of the access opening. In this way, it is advantageous to provide a compact, mechanically stable and economical micromechanical component with an adjusted first pressure. Before the method of the present invention The advantages mentioned above also apply correspondingly to the micromechanical component according to the invention.

根據一個較佳的改進,該結構經組態成使得在封閉接取開口之後凝固的材料區域配置於基本上沿該基板或該蓋帽之背對第一空腔之另一表面延伸的平面與第一空腔之間。以此方式,有利地提供相對於機械衝擊尤其穩固之微機械組件。 According to a preferred improvement, the structure is configured such that the solidified material region after closing the access opening is arranged substantially along the plane and the first surface of the substrate or the cap extending away from the other surface of the first cavity Between a cavity. In this way, it is advantageous to provide micromechanical components that are particularly stable against mechanical shocks.

根據一個較佳的改進,該結構經組態成使得在封閉接取開口之後凝固的材料區域配置於基本上沿該基板或該蓋帽之背對第一空腔之另一表面延伸的平面與基本上沿該表面延伸的另一平面之間。以此方式,有利地提供相對於機械衝擊尤其穩固之微機械組件。 According to a preferred improvement, the structure is configured such that the solidified material region after closing the access opening is arranged on a plane and substantially extending along the other surface of the substrate or the cap facing away from the first cavity Between the other planes extending along the surface. In this way, it is advantageous to provide micromechanical components that are particularly stable against mechanical shocks.

根據一個較佳的改進,該結構經組態成使得該結構至基本上沿該表面延伸之另一平面上之突出部的第一面積小於凝固後材料區域至該另一平面上之突出部的第二面積且/或小於該基板或該蓋帽之吸收部分至該另一平面上之突出部的第三面積。 According to a preferred improvement, the structure is configured such that the first area of the structure to the protrusion on another plane extending substantially along the surface is smaller than the area of the solidified material region to the protrusion on the other plane The second area is/and is smaller than the third area of the absorbing portion of the substrate or the cap to the protrusion on the other plane.

根據一個較佳的改進,該結構基本上相對於接取開口且/或相對於凝固後材料區域之質量中心且/或相對於該基板或該蓋帽之吸收部分旋轉對稱地且/或環狀地組態於基本上平行於該表面延伸之另一平面中。此有利地使得以下成為可能:相比於自先前技術已知的微機械組件,最大應力距離接取通道較遠且較不集中。此外,從而有利地可能實現凝固後材料區域經配置僅低於基本上沿該表面延伸之另一平面之效果。 According to a preferred improvement, the structure is substantially rotationally symmetrical and/or ring-shaped with respect to the access opening and/or with respect to the center of mass of the solidified material area and/or with respect to the absorption portion of the substrate or the cap It is arranged in another plane extending substantially parallel to the surface. This advantageously makes it possible for the maximum stress to be farther from the access channel and less concentrated compared to micromechanical components known from the prior art. Furthermore, it is thereby advantageously possible to achieve the effect that the solidified material region is configured only below another plane which extends substantially along the surface.

根據一個較佳的改進,基本上平行於該表面延伸之第三平面中之結構基本上與第三平面中之接取通道之中點分離配置之最大尺度為第三平面中之接取通道與該中點分離配置之最大尺度的至多六倍或至多五倍 或至多四倍或至多三倍或至多兩倍。 According to a preferred improvement, the structure in the third plane extending substantially parallel to the surface is substantially separated from the midpoint of the access channel in the third plane. The maximum dimension of the configuration is the access channel in the third plane and At most six times or at most five times the maximum scale of this midpoint separation configuration Or at most four times or at most three times or at most twice.

根據一個較佳的改進,該基板及/或該蓋帽包含矽。此有利地使得可藉由自先前技術已知的層技術之製造方法來製造微機械組件成為可能。 According to a preferred improvement, the substrate and/or the cap comprise silicon. This advantageously makes it possible to manufacture micromechanical components by means of manufacturing methods known from the prior art.

根據一個較佳的改進,該蓋帽與該基板圍封一第二空腔,第二壓力存在於該第二空腔中且具有第二化學成分之第二氣體混合物圍封於該第二空腔中。以此方式,有利地提供具有經調整之第一壓力及第二壓力的緊密、機械穩固且經濟的微機械組件。 According to a preferred improvement, the cap and the substrate enclose a second cavity, a second pressure exists in the second cavity and a second gas mixture having a second chemical composition is enclosed in the second cavity in. In this way, it is advantageous to provide a compact, mechanically stable and economical micromechanical assembly with adjusted first and second pressures.

根據一個較佳的改進,第一壓力低於第二壓力,用於旋轉速率量測之第一感測器單元配置於第一空腔中且用於加速度量測之第二感測器單元配置於第二空腔中。以此方式,有利地提供具有用於第一感測器單元及用於第二感測器單元之最佳操作條件的用於旋轉速率量測及加速量測之機械穩固的微機械組件。 According to a preferred improvement, the first pressure is lower than the second pressure, the first sensor unit for rotation rate measurement is arranged in the first cavity and the second sensor unit for acceleration measurement is arranged In the second cavity. In this way, it is advantageous to provide a mechanically stable micromechanical assembly with optimal operating conditions for the first sensor unit and for the second sensor unit for rotation rate measurement and acceleration measurement.

1‧‧‧微機械組件 1‧‧‧Micromechanical components

3‧‧‧基板 3‧‧‧ substrate

5‧‧‧第一空腔 5‧‧‧ First cavity

7‧‧‧蓋帽 7‧‧‧block

9‧‧‧環境 9‧‧‧Environment

11‧‧‧接取開口/接取孔 11‧‧‧Access opening/access hole

13‧‧‧材料區域/熔融金屬 13‧‧‧Material area/Molten metal

15‧‧‧橫向區域 15‧‧‧Horizontal

19‧‧‧表面 19‧‧‧surface

21‧‧‧吸收部分 21‧‧‧ Absorption

101‧‧‧第一方法步驟 101‧‧‧ First method steps

102‧‧‧第二方法步驟 102‧‧‧ Second method steps

103‧‧‧第三方法步驟 103‧‧‧ Third method steps

104‧‧‧第四方法步驟 104‧‧‧ Fourth method step

205‧‧‧第二空腔 205‧‧‧ Second cavity

211‧‧‧雷射輻射/雷射脈衝 211‧‧‧Laser radiation/laser pulse

213‧‧‧升高部分/圓錐尖端 213‧‧‧raised part/conical tip

1301‧‧‧表面 1301‧‧‧Surface

1303‧‧‧結構 1303‧‧‧Structure

1305‧‧‧平面 1305‧‧‧plane

1307‧‧‧平面 1307‧‧‧plane

1309‧‧‧最大尺度 1309‧‧‧Maximum scale

1311‧‧‧第三平面 1311‧‧‧The third plane

1313‧‧‧中點 1313‧‧‧ midpoint

1315‧‧‧最大尺度 1315‧‧‧Maximum scale

圖1展示根據本發明之一個例示性具體實例的具有打開的接取開口之微機械組件之示意性圖示。 Fig. 1 shows a schematic illustration of a micromechanical assembly with an open access opening according to an illustrative embodiment of the invention.

圖2展示根據圖1之接取開口閉合的微機械組件之示意性圖示。 FIG. 2 shows a schematic illustration of a micromechanical component closed according to the access opening of FIG. 1 .

圖3展示根據本發明之一個例示性具體實例的用於製造微機械組件之方法之示意性圖示。 Figure 3 shows a schematic illustration of a method for manufacturing a micromechanical component according to an illustrative embodiment of the present invention.

圖4展示已知微機械組件之示意性圖示。 Figure 4 shows a schematic illustration of a known micromechanical component.

圖5、圖6、圖7、圖8圖9展示根據圖4之微機械組件之子區域在 已知製造方法中在不同時間處之示意性圖示。 FIGS. 5, 6, 7, 8 and 9 show schematic representations of sub-regions of the micromechanical component according to FIG. 4 at different times in known manufacturing methods.

圖10、圖11、圖12、圖13、圖14圖15展示根據本發明之一個例示性具體實例之微機械組件之子區域在根據本發明之方法中在不同時間處之示意性圖示。 10, 11, 12, 12, 13, and 15 show schematic representations of sub-regions of a micromechanical component according to an illustrative embodiment of the present invention at different times in the method according to the present invention.

在各圖式中,相同的部件始終具備相同的參考數字,且因此通常在各情況中僅提出或提及一次。 In the various drawings, the same components always have the same reference numerals, and therefore are usually only mentioned or mentioned once in each case.

圖1圖2表示根據本發明之一個例示性具體實例的微機械組件1之示意性圖示,該微機械組件在圖1中具有打開的接取開口11且在圖2中具有閉合的接取開口11。在此情況下,微機械組件1包含基板3及蓋帽7。基板3及蓋帽7較佳地氣密性地彼此連接,且一起圍封第一空腔5。舉例而言,微機械組件1經組態成使得基板3與蓋帽7額外一起圍封第二空腔。然而,圖1圖2中未表示第二空腔。 FIG 1 and FIG 2 shows a schematic illustration of a micro-mechanical components of a specific example of an exemplary of the present invention of 1, the micromechanical component has an open acess opening 11 and has a closed in FIG. 2 connected in FIG. 1取开11。 Take the opening 11. In this case, the micromechanical component 1 includes the substrate 3 and the cap 7. The base plate 3 and the cap 7 are preferably connected to each other in an airtight manner, and together enclose the first cavity 5. For example, the micromechanical component 1 is configured such that the substrate 3 and the cap 7 additionally enclose the second cavity. However, the second cavity is not shown in FIGS. 1 and 2 .

舉例而言,尤其在接取開口11如圖2中所表示閉合的情況下,第一壓力存在於第一空腔5中。另外,具有第一化學成分之第一氣體混合物圍封於第一空腔5中。此外,舉例而言,第二壓力存在於第二空腔中,且具有第二化學成分之第二氣體混合物圍封於第二空腔中。較佳地,接取開口11配置於基板3中或蓋帽7中。在本例示性具體實例中,作為舉例,接取開口11配置於蓋帽7中。然而,根據本發明,作為其替代方案,亦可規定將接取開口11配置於基板3中。 For example, particularly in the acess opening 11 as in the case represented by 2 is closed, the first pressure present in the first cavity 5 in FIG. In addition, the first gas mixture with the first chemical composition is enclosed in the first cavity 5. In addition, for example, the second pressure exists in the second cavity, and the second gas mixture having the second chemical composition is enclosed in the second cavity. Preferably, the access opening 11 is arranged in the substrate 3 or the cap 7. In this illustrative specific example, as an example, the access opening 11 is arranged in the cap 7. However, according to the present invention, as an alternative thereto, it may also be provided that the access opening 11 is arranged in the substrate 3.

舉例而言,規定第一空腔5中之第一壓力低於第二空腔中之第二壓力。舉例而言,亦規定用於旋轉速率量測之第一微機械感測器單元 (圖1圖2中未表示)配置於第一空腔5中,且用於加速度量測之第二微機械感測器單元(圖1圖2中未表示)配置於第二空腔中。 For example, it is specified that the first pressure in the first cavity 5 is lower than the second pressure in the second cavity. For example, the first micromechanical sensor unit (not shown in FIGS. 1 and 2 ) for rotation rate measurement is also provided in the first cavity 5 and the second The mechanical sensor unit (not shown in FIGS. 1 and 2 ) is disposed in the second cavity.

圖3表示根據本發明之一個例示性具體實例的用於製造微機械組件1之方法之示意性圖示。在此情況下,- 在第一方法步驟101中,在基板3或蓋帽7中形成將第一空腔5連接至微機械組件1之環境9的特別窄的接取開口11。 FIG. 3 shows a schematic illustration of a method for manufacturing a micromechanical component 1 according to an illustrative specific example of the present invention. In this case,-in a first method step 101, a particularly narrow access opening 11 is formed in the substrate 3 or cap 7 that connects the first cavity 5 to the environment 9 of the micromechanical component 1.

圖1藉助於實例展示第一方法步驟101後之微機械組件1。另外,- 在第二方法步驟102中,調整第一空腔5中之第一壓力及/或第一化學成分,或經由接取通道使第一空腔5充滿所要氣體及所要內部壓力。此外,例如,- 在第三方法步驟103中,藉由雷射將能量或熱引入至基板3或蓋帽7之吸收部分中來封閉接取開口11。作為替代方案,例如,規定- 在第三方法步驟103中,較佳地藉由雷射僅局部加熱接取通道周圍之區域,且氣密性地封閉該接取通道。因此,亦可能有利地為根據本發明之方法提供其他能量源來代替用於封閉接取開口11之雷射。圖2藉助於實例展示第三方法步驟103後之微機械組件1。 FIG. 1 shows the micromechanical component 1 after the first method step 101 by means of an example. In addition,-in the second method step 102, the first pressure and/or the first chemical composition in the first cavity 5 are adjusted, or the first cavity 5 is filled with the desired gas and the desired internal pressure via the access channel. In addition, for example,-in the third method step 103, energy or heat is introduced into the absorption portion of the substrate 3 or the cap 7 by the laser to close the access opening 11. As an alternative, for example, it is provided that-in the third method step 103, it is preferable to only locally heat the area around the access channel by laser, and to close the access channel in an airtight manner. Therefore, it may also be advantageous to provide other energy sources for the method according to the invention instead of the laser for closing the access opening 11. FIG. 2 shows the micromechanical component 1 after the third method step 103 by means of an example.

按時間順序在第三方法步驟103之後,機械應力可出現於蓋帽7之背對空腔5之另一表面19上的在圖2中藉助於實例表示之橫向區域15中,及微機械組件1之垂直於橫向區域15至該另一表面19上之突出部(亦即,沿接取開口11且在第一空腔5之方向上)的深度中。此等機械應力(特定言之,局部機械應力)尤其存在於蓋帽7之材料區域13與蓋帽7之其餘區域之間的介面處及附近,該材料區域在第三方法步驟103中轉換 成液態聚集體且在第三方法步驟103之後轉換成固態聚集體並且封閉接取開口11,該其餘區域在第三方法步驟103期間保持固態聚集體。在圖2中,蓋帽7之封閉接取開口11之材料區域13僅被視為示意性的,亦即其被示意性地表示,尤其在其橫向尺度或形狀(特定言之平行於另一表面19延伸之橫向尺度或形狀)方面,且尤其在其垂直於該橫向尺度(特定言之垂直於另一表面19)延伸之尺度或組態方面。 After the third method step 103 in chronological order, mechanical stresses can occur on the other surface 19 of the cap 7 facing away from the cavity 5 in the lateral region 15 shown by way of example in FIG. 2 and the micromechanical component 1 Is perpendicular to the depth of the lateral region 15 to the protrusion on the other surface 19 (that is, in the direction of taking the opening 11 and in the first cavity 5). These mechanical stresses (specifically, local mechanical stresses) are particularly present at and near the interface between the material area 13 of the cap 7 and the remaining area of the cap 7, which material area is converted into liquid accumulation in the third method step 103 After the third method step 103, it is converted into a solid aggregate and the access opening 11 is closed. The remaining area remains solid aggregate during the third method step 103. In FIG. 2 , the material area 13 of the closed access opening 11 of the cap 7 is only regarded as schematic, that is, it is represented schematically, especially in its lateral scale or shape (specifically parallel to another surface 19 extends the lateral dimension or shape), and especially in terms of the dimension or configuration it extends perpendicular to the lateral dimension (specifically perpendicular to the other surface 19).

另外,如圖3中藉助於實例所表示- 在第四方法步驟104中,形成相對於基板3或蓋帽7之背對第一空腔5之表面1301升高且配置於接取開口11之區域中之結構1303,以便提供基板3或蓋帽7之材料區域13,該材料區域在第三方法步驟103中轉換成液態聚集體。 Further, as in Figure 3 showing by way of example - in a fourth method step 104, the surface facing away from the substrate is formed with respect to the cap 3 or 7 of the first cavity 5 disposed in a region 1301 rises and the opening 11 of the acess The structure 1303 in order to provide the material region 13 of the substrate 3 or the cap 7 which is converted into a liquid aggregate in the third method step 103.

圖4中,或在圖4A中,藉助於實例表示已知微機械組件1。藉助於實例,此處表示具有用蓋帽晶圓氣密性地封閉之經合併加速度感測器及旋轉速率感測器之微機械組件1。在加速度感測器之第二空腔205中,在封蓋製程期間調整較高內部壓力。藉由已知方法,在旋轉速率感測器之第一空腔5中調整較低內部壓力。若例如在第一空腔5中之內部壓力調整之後,蓋帽7中形成裂痕,則旋轉速率感測器之第一空腔5變得充滿(例如)空氣,且旋轉速率感測器可由於空氣阻尼而不再振盪且(例如)失效。最後,經閉合接取開口11或凝固後材料區域13之區域表示於圖4B圖4C中。在此情況下,圖4B圖4C展示具有較高機械應力或較高拉伸應力之區域。 In FIG. 4 , or in FIG. 4A , the known micromechanical component 1 is represented by way of example. By way of example, here is shown a micromechanical assembly 1 with an integrated acceleration sensor and a rotation rate sensor hermetically closed with a cap wafer. In the second cavity 205 of the acceleration sensor, a higher internal pressure is adjusted during the capping process. By a known method, the lower internal pressure is adjusted in the first cavity 5 of the rotation rate sensor. If, for example, after the internal pressure in the first cavity 5 is adjusted, a crack is formed in the cap 7, the first cavity 5 of the rotation rate sensor becomes filled with, for example, air, and the rotation rate sensor may be Damped without oscillation and (for example) failed. Finally, the area of the opening 11 or the solidified material area 13 after being closed is shown in FIGS. 4B and 4C . In this case, FIGS. 4B and 4C show regions with higher mechanical stress or higher tensile stress.

圖5、圖6、圖7、圖8圖9表示根據圖4之已知微機械 組件1之子區域在已知方法中在不同時間處之示意性圖示。 FIGS. 5, 6, 7, 8 and 9 show schematic representations of the sub-regions of the known micromechanical component 1 according to FIG. 4 at different times in the known method.

圖6中,藉助於實例表示吸收部分21或吸收雷射能量之區域,其至少部分吸收由箭頭示意性地表示之雷射輻射211。雷射輻射211或雷射脈衝211或複數個雷射脈衝211將接取孔11周圍或接取開口11周圍之材料加熱,或用雷射脈衝211將接取孔11周圍或接取開口11周圍之材料熔化。在此情況下,雷射脈衝211較佳地居中配置於接取孔11上,以便形成儘可能小的熔融區域且因此使用較小的雷射功率。 In FIG. 6 , the absorption portion 21 or the region absorbing laser energy is shown by way of example, and at least part of it absorbs the laser radiation 211 schematically represented by an arrow. Laser radiation 211 or laser pulse 211 or a plurality of laser pulses 211 heat the material around the access hole 11 or around the opening 11 or use laser pulse 211 to surround the access hole 11 or around the opening 11 The material melts. In this case, the laser pulse 211 is preferably arranged centrally on the access hole 11 in order to form the smallest possible melting area and therefore use less laser power.

圖7表示呈液態聚集體或呈熔融金屬13形式之材料區域13。圖7展示熔融材料或熔融物分佈於熔融區域內部且封閉接取孔11或接取開口11之方式。熔融物或材料區域13隨後凝固。 FIG. 7 shows the material region 13 in the form of liquid aggregates or in the form of molten metal 13. FIG. 7 shows the manner in which the molten material or molten material is distributed inside the molten region and closes the access hole 11 or the access opening 11. The melt or material region 13 subsequently solidifies.

此外,圖8表示材料區域13已經自液態聚集體部分地轉換為固態聚集體時之時間。此處,已經轉換成固態聚集體之材料區域13之部分經表示為凝固正面。 In addition, FIG. 8 shows the time when the material region 13 has been partially converted from the liquid aggregate to the solid aggregate. Here, the portion of the material region 13 that has been converted into solid aggregates is indicated as a solidified front.

最後,圖9藉助於實例表示所有材料區域13已轉換成固態聚集體且凝固後材料區域13之突出超出沿另一表面19延伸之平面的升高部分213已居中形成於接取開口11上方之方式。此處,藉助於實例將升高部分213描繪為具有高於基板之高度的圓錐形突起部分。 Finally, FIG. 9 shows by way of example that all material regions 13 have been converted into solid aggregates and after solidification, the raised portion 213 of the material region 13 protruding beyond the plane extending along the other surface 19 has been formed centrally above the access opening 11 the way. Here, the raised portion 213 is depicted as a conical protrusion portion having a height higher than that of the substrate by way of example.

藉由圖5、圖6、圖7、圖8圖9中表示之方法步驟,例如,在蓋帽材料中或在蓋帽7中或在基板3中誘發應力。此等應力或此應力或此等機械應力尤其出現於材料區域13之凝固期間。舉例而言,最強應力出現於熔融區域之最低點處。顯然,此可例如由以下事實進行解釋:熔融物在彼處最大程度地被實心體包圍,且因此可對不同膨脹運動作出最差 反應。舉例而言,材料可在表面上直接與突起部分或回縮部分反應。在熔融區域中間,可極清晰地觀察到此情形。舉例而言,由於矽自邊緣開始凝固且在凝固期間膨脹,因此例如在熔融區域中間形成如圖9中所表示之圓錐突起部分。該突起部分(例如)極高,以至於其可延伸高出基板數微米。 By the method steps shown in FIGS. 5, 6, 7, 8 and 9 , for example, stress is induced in the cap material or in the cap 7 or in the substrate 3. These stresses or these stresses or these mechanical stresses occur especially during the solidification of the material region 13. For example, the strongest stress occurs at the lowest point of the molten region. Obviously, this can be explained, for example, by the fact that the melt is surrounded by the solid body to the greatest extent there, and therefore can respond the worst to different expansion movements. For example, the material can directly react with the protruding portion or the retracted portion on the surface. In the middle of the melting zone, this situation can be observed very clearly. For example, since the silicon from the edge begins to solidify and the expansion during setting, thus for example, a cone as indicated in FIG. 9 of the projecting portion in the middle region of the melt. The protruding portion is, for example, extremely high, so that it can extend a few microns above the substrate.

舉例而言,對於圖9中所表示之配置而言重要的有四點: For example, there are four important points for the configuration shown in Figure 9:

- 材料中具有最大應力之區域正好處於接取孔11或接取開口11之區域中及上方。現在閉合的接取孔11或現在閉合的接取開口為塊狀材料中之擾動部分。因此其充當(例如)裂痕之開始點,且因此弱化材料。 -The area of the material with the greatest stress is just in and above the area of the access hole 11 or the access opening 11. The access hole 11 that is now closed or the access opening that is now closed is a disturbing portion in the bulk material. It therefore acts as a starting point for cracks, for example, and thus weakens the material.

- 在接取孔11上方或在接取開口11上方形成(例如)圓錐尖端213,其明顯延伸超出基板3或蓋帽7。此對於在該領域中之進一步處理及使用有風險,且尖端可在機械上承載負荷且因此在材料中產生裂痕。 -For example, a conical tip 213 is formed above the pick-up hole 11 or above the pick-up opening 11, which extends significantly beyond the base plate 3 or the cap 7. This is a risk for further processing and use in this field, and the tip can carry loads mechanically and thus create cracks in the material.

- 轉換成液態聚集體之熔融區域或材料區域13或者吸收部分21可取決於雷射之位置而相對於接取孔11或相對於接取開口11產生變化。此情形之缺點為由於熔融區域相對於接取孔之不對稱配置,不對稱配置可增加裂痕形成。 -The molten region or material region 13 or the absorption portion 21 converted into a liquid aggregate may vary with respect to the receiving hole 11 or with respect to the receiving opening 11 depending on the position of the laser. The disadvantage of this situation is that due to the asymmetric configuration of the molten region relative to the access hole, the asymmetric configuration can increase crack formation.

- 熔融區域之所描述變化的另一缺點為較難進行自動光學檢測。尤其當晶片表面上存在對準結構或其他輔助結構時,由於熔融區域相對於輔助結構之變化有所波動且因此(例如)無法在每一情況中與疵點清晰地區分開,因此自動疵點偵測較難之。 -Another disadvantage of the described changes in the fusion zone is that it is more difficult to perform automatic optical inspection. Especially when there are alignment structures or other auxiliary structures on the surface of the wafer, because the melting area changes relative to the auxiliary structure and therefore (for example) cannot be clearly distinguished from the defect in each case, automatic defect detection is more Difficult.

圖10、圖11、圖12、圖13、圖14圖15表示根據本發明之一個例示性具體實例之微機械組件1之子區域在根據本發明之方法中在不同時間處之示意性圖示。在此情況下,(例如)規定基板3或蓋帽7包含 相對於基板3或蓋帽7之背對第一空腔5之表面1301升高且配置於接取開口11之區域中的結構1303,以便提供基板3或蓋帽7之材料區域13,該材料區域在接取開口11之封閉期間轉換成液態聚集體。 10, 11, 12, 13, 14, and 15 show schematic representations of sub-regions of the micromechanical component 1 according to an illustrative embodiment of the invention at different times in the method according to the invention . In this case, for example, it is specified that the substrate 3 or the cap 7 includes a structure 1303 that is raised relative to the surface 1301 of the substrate 3 or the cap 7 facing away from the first cavity 5 and is disposed in the area where the opening 11 is taken, so that A material area 13 of the base plate 3 or cap 7 is provided, which material area is converted into a liquid aggregate during the closing of the access opening 11.

此外,如圖14圖15中藉助於實例所表示,規定結構1303經組態成使得在第三方法步驟103之後凝固的材料區域13配置於基本上沿基板3或蓋帽7之背對第一空腔5之另一表面19延伸的平面1305與第一空腔5之間。此外,作為替代方案或另外,規定結構1303經組態成使得在第三方法步驟103之後凝固的材料區域13配置於平面1305與基本上沿表面1301延伸的另一平面1307之間。 Further, as in FIG. 14 and FIG. 15 showing by way of example, the structure 1303 by a predetermined material configured such that the region 103 after the third method step 13 is arranged substantially solidified in the cap or the substrate 3 facing away from the first 7 Between the plane 1305 on which the other surface 19 of the cavity 5 extends and the first cavity 5. Furthermore, as an alternative or in addition, the prescribed structure 1303 is configured such that the solidified material region 13 after the third method step 103 is arranged between the plane 1305 and another plane 1307 extending substantially along the surface 1301.

此外,例如,規定結構1303經組態成使得結構1303至另一平面1307上之突出部的第一面積小於凝固後材料區域13至另一平面1307上之突出部的第二面積且/或小於基板3或蓋帽7之吸收部分21至另一平面1307上之突出部的第三面積。此在圖12、圖13、圖14圖15中藉助於實例加以表示。 In addition, for example, the prescribed structure 1303 is configured such that the first area of the protrusion from the structure 1303 to the other plane 1307 is smaller than the second area of the protrusion from the solidified material region 13 to the other plane 1307 and/or is smaller than The third area of the absorption portion 21 of the substrate 3 or the cap 7 to the protrusion on the other plane 1307. This is shown in FIGS. 12, 13, 14, and 15 by way of example.

舉例而言,如圖12中藉助於實例所表示,規定雷射輻射211至另一平面1307上之突出部的第四面積實質上大於結構1303之突出部的第一面積。此有利地使得基板3或蓋帽7之吸收部分21可幾何地劃分成吸收第一子部件及吸收第二子部件成為可能,從而使得第一子部件配置於結構1303內部且第二子部件配置於該基板或該蓋帽之表面1301之區域中。換言之,由於結構1303之所選擇配置或所選擇幾何形狀,在該基板上之兩個不同區域中吸收雷射能量。在此情況下,例如,規定在升高部分之上部區域中或在結構1303之上部區域中吸收大部分能量。舉例而言,在位準低於升 高部分或結構1303之基準點的基板3或蓋帽7中,或者在升高部分周圍或結構1303周圍的環中之表面1301之區域中吸收小部分雷射能量。在此情況下,例如,規定耦合之能量可僅在向下方向上或在朝向第一空腔5之方向上消散於升高部分之上部區域中或結構1303中。在此情況下,包含(例如)矽之基板3或蓋帽7之材料在結構1303之上部區域中或在第一子部分中融化,且由於材料區域13之表面能量形成幾乎球形的熔融區域或幾乎球形的材料區域13,因此該材料區域之輪廓由升高部分之幾何形狀決定。在材料區域13已轉換成液態聚集體之後,熔融物或材料區域13凝固且封閉接取孔或接取開口11。舉例而言,亦規定在升高部分周圍的下部區域中或在第二子部分中吸收極少的雷射能量。在第二子部分中吸收之能量可(例如)在幾乎所有方向上消散。因此,例如,規定僅較少區域熔化,或第二子部分與第一子部分相比包含較少材料區域13。舉例而言,規定第二子部分之材料區域13極快速地再次凝固,或根本不發生熔化,亦即第二子部分不包含材料區域13。 For example, FIG. 12 as indicated by way of example, the fourth predetermined area of the projecting portion 211 to the other of the laser radiation is substantially larger than the first area of the plane 1307 of the projection 1303 of the structure. This advantageously makes it possible for the absorption portion 21 of the substrate 3 or the cap 7 to be geometrically divided into absorbing the first sub-component and absorbing the second sub-component, so that the first sub-component is arranged inside the structure 1303 and the second sub-component is arranged at In the area of the surface 1301 of the substrate or the cap. In other words, due to the selected configuration or selected geometry of the structure 1303, laser energy is absorbed in two different regions on the substrate. In this case, for example, it is provided that most energy is absorbed in the upper region of the elevated portion or in the upper region of the structure 1303. For example, in the substrate 3 or cap 7 whose level is lower than the reference point of the elevated portion or structure 1303, or in the area of the surface 1301 in the ring around the elevated portion or structure 1303, a small portion of the laser is absorbed energy. In this case, for example, it is prescribed that the energy of the coupling may only be dissipated in the upper region of the elevated portion or in the structure 1303 in the downward direction or in the direction toward the first cavity 5. In this case, the material of the substrate 3 or the cap 7 containing (for example) silicon melts in the upper region of the structure 1303 or in the first sub-portion, and due to the surface energy of the material region 13 forms a nearly spherical melting region or almost Spherical material area 13, so the contour of this material area is determined by the geometry of the elevated portion. After the material area 13 has been converted into a liquid aggregate, the melt or material area 13 solidifies and closes the access hole or access opening 11. By way of example, it is also provided that very little laser energy is absorbed in the lower region around the elevated portion or in the second sub-portion. The energy absorbed in the second sub-portion can, for example, dissipate in almost all directions. Thus, for example, it is provided that only fewer areas melt, or that the second sub-portion contains fewer material areas 13 than the first sub-portion. For example, it is provided that the material region 13 of the second sub-portion solidifies again very quickly, or melting does not occur at all, that is, the second sub-portion does not contain the material area 13.

圖13圖14中,藉助於實例表示圖10、圖11、圖12、圖13中所表示之結構1303經組態成使得材料區域13以液態聚集體幾何地自我限制。 In FIGS. 13 and 14 , the structure 1303 shown in FIGS. 10, 11, 12 and 13 is configured by way of example so that the material region 13 is geometrically self-limiting with liquid aggregates.

此外,例如,亦規定結構1303基本上相對於接取開口11且/或相對於凝固後材料區域13之質量中心且/或相對於基板3或蓋帽7之吸收部分21旋轉對稱地且/或環狀地組態於另一平面1307中。 Furthermore, for example, it is also provided that the structure 1303 is substantially rotationally symmetrical and/or circular with respect to the access opening 11 and/or with respect to the center of mass of the solidified material region 13 and/or with respect to the absorption portion 21 of the substrate 3 or cap 7 It is configured in another plane 1307 like this.

舉例而言,規定結構1303藉由在基板3或蓋帽中蝕刻出局部環而形成。此在圖12中藉助於實例表示。作為替代方案或另外,亦規定 結構1303藉由將基板3之第一基板部分或蓋帽7之第一蓋帽部分施加至基板3之第二基板部分上或蓋帽7之第二蓋帽部分上而形成。根據本發明,例如,提供複數個沈積製程及/或生長製程及/或構造製程以便形成結構1303。 For example, the prescribed structure 1303 is formed by etching a partial ring in the substrate 3 or the cap. This is shown in FIG. 12 by way of example. Alternatively or additionally, it is also provided that the structure 1303 is formed by applying the first substrate portion of the substrate 3 or the first cap portion of the cap 7 to the second substrate portion of the substrate 3 or the second cap portion of the cap 7. According to the present invention, for example, a plurality of deposition processes and/or growth processes and/or construction processes are provided to form the structure 1303.

最後,例如,亦規定基本上平行於表面1301延伸之第三平面1311中之結構1303基本上與第三平面1311中之接取通道11之中點1313分離配置之最大尺度1309為第三平面1311中之接取通道11與中點1313分離配置之最大尺度1315的至多六倍或至多五倍或至多四倍或至多三倍或至多兩倍。此在圖11中藉助於實例表示。舉例而言,作為替代方案或另外,亦規定升高部分或結構1303之中央直徑以與接取孔或接取開口11之中央直徑相比低於5:1之比率經組態。此情形有利地實現之效果為,在熔化及凝固製程之後,升高部分或材料區域13之最高點處於基板表面之位準以下,或不凸起超出另一表面19,且因此處於或配置於機械保護區域中。 Finally, for example, the maximum dimension 1309 of the structure 1303 in the third plane 1311 extending substantially parallel to the surface 1301 is substantially separated from the point 1313 in the access channel 11 in the third plane 1311 as the third plane 1311 The maximum dimension 1315 of the access channel 11 and the midpoint 1313 in the separated configuration is at most six times or at most five times or at most four times or at most three times or at most twice. This is shown in FIG. 11 by way of example. For example, as an alternative or in addition, the central diameter of the raised portion or structure 1303 is also configured to be configured at a ratio lower than 5:1 compared to the central diameter of the access hole or access opening 11. This situation advantageously achieves the effect that after the melting and solidification process, the highest point of the raised portion or material region 13 is below the level of the substrate surface, or does not protrude beyond the other surface 19, and is therefore or In a mechanically protected area.

與先前技術相比,根據本發明之方法及根據本發明之微機械組件的其他優點為: Compared with the prior art, the method according to the invention and other advantages of the micromechanical component according to the invention are:

- 凝固後材料或凝固後材料區域13配置於表面1301上方,或安放於升高部分上,亦即呈圓柱之形式。在此情況下,可很好地減少冷卻製程期間的熱應力,且就內部應力而言獲得非常穩定的配置。舉例而言,此係由於以下達成:當,封閉的接取開口11之區域中出現之機械應力可藉助於結構1303在接取開口11封閉時剩餘的其餘部分之彈性形變而得到釋放,或可轉移至基板3或蓋帽7距接取開口11更遠之區域中。 -The solidified material or the solidified material region 13 is arranged above the surface 1301 or placed on the elevated portion, that is, in the form of a cylinder. In this case, the thermal stress during the cooling process can be well reduced, and a very stable configuration in terms of internal stress can be obtained. For example, this is due to the fact that when the mechanical stress occurring in the area of the closed access opening 11 can be relieved by the elastic deformation of the remaining part of the structure 1303 when the access opening 11 is closed, or Transfer to a region of the substrate 3 or the cap 7 further away from the access opening 11.

- 接取孔或接取開口11上方未形成圓錐尖端或僅形成較小圓錐尖 端。首先,形成球面。取決於配置,額外可能達成以下效果:球面之最高點處於基板之表面下方,或配置於另一表面19下方,且因此處於機械保護區域中。 -No conical tip or only a small conical tip is formed above the access hole or access opening 11 end. First, form a spherical surface. Depending on the configuration, it is additionally possible to achieve the following effect: the highest point of the spherical surface is below the surface of the substrate, or is disposed below the other surface 19, and is therefore in the mechanical protection area.

- 熔融區域或材料區域13由升高部分之配置限定。系統不對雷射之較小定位不準確性作出反應,或與自先前技術已知的相比反應較小。更穩定的系統及更簡單的自動疵點偵測成為可能。 -The melting area or material area 13 is defined by the configuration of the raised portion. The system does not respond to minor positioning inaccuracies of the laser, or responds less than is known from prior art. A more stable system and simpler automatic defect detection become possible.

1‧‧‧微機械組件 1‧‧‧Micromechanical components

3‧‧‧基板 3‧‧‧ substrate

5‧‧‧第一空腔 5‧‧‧ First cavity

7‧‧‧蓋帽 7‧‧‧block

9‧‧‧環境 9‧‧‧Environment

11‧‧‧接取開口/接取孔 11‧‧‧Access opening/access hole

Claims (10)

一種用於製造一微機械組件(1)之方法,該微機械組件具有一基板(3),且具有一蓋帽(7),其係連接至該基板(3)並且與該基板(3)圍封一第一空腔(5),一第一壓力存在於該第一空腔(5)中,且具有一第一化學成分之一第一氣體混合物圍封於該第一空腔(5)中,在一第一方法步驟(101)中,在該基板(3)或該蓋帽(7)中形成一接取開口(11),其係將該第一空腔(5)連接至該微機械組件(1)之一環境(9),在一第二方法步驟(102)中,調整該第一空腔(5)中之該第一壓力及/或該第一化學成分,在一第三方法步驟(103)中,藉由一雷射將能量或熱引入至該基板(3)或該蓋帽(7)之一吸收部分(21)中來封閉該接取開口(11),特徵在於:在一第四方法步驟(104)中,形成一結構(1303),其係相對於該基板(3)或該蓋帽(7)之背對該第一空腔(5)之一表面(1301)升高且配置於該接取開口(11)之區域中,以便提供該基板(3)或該蓋帽(7)之一材料區域(13),該材料區域在該第三方法步驟(103)中轉換成一液態聚集體。 A method for manufacturing a micromechanical component (1) having a substrate (3) and a cap (7), which is connected to the substrate (3) and surrounds the substrate (3) A first cavity (5) is sealed, a first pressure exists in the first cavity (5), and a first gas mixture having a first chemical composition is enclosed in the first cavity (5) In a first method step (101), an access opening (11) is formed in the substrate (3) or the cap (7), which connects the first cavity (5) to the micro An environment (9) of the mechanical component (1), in a second method step (102), the first pressure and/or the first chemical composition in the first cavity (5) are adjusted in a first In the three method step (103), a laser is used to introduce energy or heat into an absorption portion (21) of the substrate (3) or the cap (7) to close the access opening (11), characterized in that : In a fourth method step (104), a structure (1303) is formed which is opposite to a surface (1301) of the first cavity (5) opposite to the back of the substrate (3) or the cap (7) ) Raised and arranged in the area of the access opening (11) in order to provide a material area (13) of the substrate (3) or the cap (7), the material area in the third method step (103) Converted into a liquid aggregate. 如申請專利範圍第1項之方法,其中該蓋帽(7)與該基板(3)圍封一第二空腔,一第二壓力存在於該第二空腔中,且具有一第二化學成分之一第二氣體混合物圍封於該第二空腔中。 A method as claimed in item 1 of the patent application, wherein the cap (7) and the substrate (3) enclose a second cavity, a second pressure exists in the second cavity, and has a second chemical composition A second gas mixture is enclosed in the second cavity. 如申請專利範圍第1項或第2項之方法,其中該結構(1303)係經組態, 使得在該第三方法步驟(103)之後凝固的該材料區域(13)係配置於一平面(1305)與該第一空腔(5)之間,該平面(1305)基本上沿該基板(3)或該蓋帽(7)之背對該第一空腔(5)之一另一表面(19)延伸。 For example, the method of applying for the first or second item of patent scope, in which the structure (1303) is configured, In this way, the material region (13) solidified after the third method step (103) is arranged between a plane (1305) and the first cavity (5), the plane (1305) substantially along the substrate ( 3) Or the back of the cap (7) extends to another surface (19) of one of the first cavities (5). 如申請專利範圍第1項或第2項之方法,其中該結構(1303)係經組態,使得在該第三方法步驟(103)之後凝固的該材料區域(13)係配置於一平面(1305)與一另一平面(1307)之間,該平面(1305)基本上沿該基板(3)或該蓋帽(7)之背對該第一空腔(5)之一另一表面(19)延伸,該另一平面(1307)基本上沿該表面(1301)延伸。 For example, the method of claim 1 or item 2, wherein the structure (1303) is configured so that the solidified material region (13) after the third method step (103) is arranged on a plane ( 1305) and another plane (1307), the plane (1305) is substantially along the other surface (19) of the first cavity (5) along the back of the base plate (3) or the cap (7) ) Extends, the other plane (1307) extends substantially along the surface (1301). 如申請專利範圍第1項或第2項之方法,其中該結構(1303)係經組態,使得該結構(1303)投影至基本上沿該表面(1301)延伸之一另一平面(1307)上之一第一面積係小於凝固後材料區域(13)投影至該另一平面(1307)上之一第二面積,且/或小於該基板(3)或該蓋帽(7)之該吸收部分(21)投影至該另一平面(1307)上之一第三面積。 For example, the method of claim 1 or item 2, wherein the structure (1303) is configured such that the structure (1303) is projected to another plane (1307) that extends substantially along the surface (1301) The first area on the top is smaller than the second area of the solidified material area (13) projected onto the other plane (1307), and/or smaller than the absorbing portion of the substrate (3) or the cap (7) (21) A third area projected onto the other plane (1307). 如申請專利範圍第1項或第2項之方法,其中該結構(1303)基本上相對於該接取開口(11),且/或相對於該凝固後材料區域(13)之質量中心,且/或相對於該基板(3)或該蓋帽(7)之該吸收部分(21)旋轉對稱地,且/或環狀地組態於基本上平行於該表面(1301)延伸之一另一平面(1307)中。 For example, the method of claim 1 or claim 2, wherein the structure (1303) is substantially relative to the access opening (11) and/or relative to the center of mass of the solidified material region (13), and /Or the absorption portion (21) of the substrate (3) or the cap (7) is rotationally symmetrical and/or annularly arranged in another plane extending substantially parallel to the surface (1301) (1307). 如申請專利範圍第1項或第2項之方法,其中基本上平行於該表面(1301)延伸之一第三平面(1311)中之該結構(1303)基本上與該第三平面(1311)中之該接取通道(11)之一中點(1313)所分離配置之 一最大尺度(1309)係該第三平面(1311)中之該接取通道(11)與該中點(1313)所分離配置之一最大尺度(1315)的至多六倍、或至多五倍、或至多四倍、或至多三倍、或至多兩倍。 A method as claimed in item 1 or item 2 of the patent scope, wherein the structure (1303) in a third plane (1311) extending substantially parallel to the surface (1301) is substantially in line with the third plane (1311) The middle point (1313) of the access channel (11) is separated A maximum scale (1309) is at most six times, or at most five times, the maximum scale (1315) of one of the largest scales (1315) separated by the access channel (11) and the midpoint (1313) in the third plane (1311), Or at most four times, or at most three times, or at most two times. 一種微機械組件(1),其具有一基板(3),且具有一蓋帽(7),其係連接至該基板(3)並且與該基板(3)圍封一第一空腔(5),一第一壓力存在於該第一空腔(5)中且具有一第一化學成分之一第一氣體混合物圍封於該第一空腔(5)中,該基板(3)或該蓋帽(7)包含一封閉的接取開口(11),特徵在於:該基板(3)或該蓋帽(7)包含一結構(1303),其係相對於該基板(3)或該蓋帽(7)之背對該第一空腔(5)之一表面(1301)升高且配置於該接取開口(11)之區域中,以便提供該基板(3)或該蓋帽(7)之一材料區域(13),該材料區域在該接取開口(11)之封閉期間轉換成一液態聚集體。 A micromechanical component (1) having a substrate (3) and a cap (7) connected to the substrate (3) and enclosing a first cavity (5) with the substrate (3) , A first pressure exists in the first cavity (5) and a first gas mixture with a first chemical composition is enclosed in the first cavity (5), the substrate (3) or the cap (7) includes a closed access opening (11), characterized in that the substrate (3) or the cap (7) includes a structure (1303), which is opposite to the substrate (3) or the cap (7) A surface (1301) of the first cavity (5) is raised and arranged in the area of the access opening (11) to provide a material area of the substrate (3) or the cap (7) (13), the material area is converted into a liquid aggregate during the closing of the access opening (11). 如申請專利範圍第8項之微機械組件(1),其中該蓋帽(7)與該基板(3)圍封一第二空腔,一第二壓力存在於該第二空腔中,且具有一第二化學成分之一第二氣體混合物圍封於該第二空腔中。 For example, the micromechanical component (1) of claim 8 of the patent application, wherein the cap (7) and the substrate (3) enclose a second cavity, and a second pressure exists in the second cavity and has A second gas mixture of a second chemical component is enclosed in the second cavity. 如申請專利範圍第8項或第9項之微機械組件(1),其中該第一壓力低於該第二壓力,用於旋轉速率量測之一第一感測器單元係配置於該第一空腔(5)中,且用於加速度量測之一第二感測器單元係配置於該第二空腔中。 For example, the micromechanical component (1) of claim 8 or item 9, wherein the first pressure is lower than the second pressure, and a first sensor unit for rotation rate measurement is disposed on the first In a cavity (5), a second sensor unit for acceleration measurement is disposed in the second cavity.
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