TWI683175B - Detecting method of circuit board - Google Patents
Detecting method of circuit board Download PDFInfo
- Publication number
- TWI683175B TWI683175B TW107138176A TW107138176A TWI683175B TW I683175 B TWI683175 B TW I683175B TW 107138176 A TW107138176 A TW 107138176A TW 107138176 A TW107138176 A TW 107138176A TW I683175 B TWI683175 B TW I683175B
- Authority
- TW
- Taiwan
- Prior art keywords
- negative film
- circuit board
- exposure
- circuit boards
- temperature
- Prior art date
Links
Images
Abstract
Description
本發明涉及一種檢測方法,且還涉及一種電路板檢測方法。 The invention relates to a detection method, and also relates to a circuit board detection method.
現今科技發達進而帶動各式電子產品的發展,而各式電子產品又多以印刷電路板為其基礎元件,因此提供優良的印刷電路板便為各家廠商所欲追求的發展方向。在現有的電路板生產方法中,電路板的曝光作業需搭配底片來加以實施,但電路板常會因為製程上的誤差而使電路板產生形變,進而造成每個電路板的尺寸非完全相同。進一步地說,電路板在以底片進行曝光作業時,影響底片品質的最關鍵因素常為漲縮問題,並且底片太常產生漲縮或是底片的漲縮幅度過大,則易縮短底片的使用壽命。然而,現有的電路板生產過程中,並未對於底片的漲縮問題有相對應的改良方案。 Nowadays, the development of science and technology has driven the development of various electronic products, and most of the electronic products use printed circuit boards as their basic components. Therefore, providing excellent printed circuit boards is the development direction that various manufacturers want to pursue. In the existing circuit board production method, the exposure operation of the circuit board needs to be implemented with a negative film, but the circuit board often deforms the circuit board due to errors in the manufacturing process, thereby causing the size of each circuit board to be not exactly the same. Furthermore, when the circuit board is exposed to negative film, the most critical factor affecting the quality of the negative film is often the problem of expansion and contraction. If the negative film is too often shrinking or the expansion and contraction of the negative film are too large, it is easy to shorten the life of the negative film. . However, in the existing circuit board production process, there is no corresponding improvement plan for the expansion and contraction of the negative film.
於是,本發明人認為上述缺陷可改善,乃特潛心研究並配合科學原理的運用,終於提出一種設計合理且有效改善上述缺陷的本發明。 Therefore, the inventor believes that the above-mentioned defects can be improved, and Naite devotes himself to research and cooperates with the application of scientific principles, and finally proposes a reasonable design and effectively improves the above-mentioned defects of the present invention.
本發明實施例在於提供一種電路板檢測方法,能有效地改善現有電路板生產方法所產生的缺陷。 An embodiment of the present invention is to provide a circuit board inspection method, which can effectively improve the defects generated by the existing circuit board production methods.
本發明實施例公開一種電路板檢測方法,包括:一篩選步驟:以相對於一第一底片的一第一預設值進行X個待測電路板的檢測,篩選出能在所述第一預設值下進行曝光作業的Y個適格電路板、及不能在所述第一預設值下進行曝光作業的Z個淘汰電路 板,並且X=Y+Z;其中,X為正整數、Y與Z皆為不小於零的整數;一再生步驟:找出能夠使Z個所述淘汰電路板中的至少其中一個所述淘汰電路板進行曝光作業的一第二預設值;其中,所述第二預設值是相對於一第二底片;以及一曝光步驟:依據所述第一預設值並以所述第一底片依序使Y個所述適格電路板進行曝光作業,並且依據所述第二預設值並以所述第二底片使相對應的至少一個所述淘汰電路板進行曝光作業;其中,所述曝光步驟於一曝光設備內實施,並且所述曝光設備以一環境控制機構來對所述曝光設備內的一環境溫度進行冷卻,以使Y個所述適格電路板、所述第一底片、與至少一個所述淘汰電路板、及所述第二底片能在所述曝光設備內進行所述曝光作業的過程中,維持所述環境溫度在一預定溫度以下。 An embodiment of the present invention discloses a circuit board inspection method, including: a screening step: carrying out inspection on X circuit boards to be tested with a first preset value relative to a first negative film, screening out the first pre Y qualified circuit boards performing exposure operation under the set value, and Z elimination circuits that cannot perform exposure operation under the first preset value Board, and X=Y+Z; where X is a positive integer, and Y and Z are both integers not less than zero; a regeneration step: find out that at least one of the Z eliminated circuit boards can be eliminated A second preset value for the exposure operation of the circuit board; wherein, the second preset value is relative to a second negative film; and an exposure step: according to the first preset value and using the first negative film Sequentially performing exposure operations on the Y qualified circuit boards, and performing exposure operations on at least one of the eliminated circuit boards corresponding to the second negative film according to the second preset value; wherein, the exposure The steps are implemented in an exposure device, and the exposure device uses an environmental control mechanism to cool an ambient temperature in the exposure device, so that the Y qualified circuit boards, the first negative film, and at least One of the eliminated circuit board and the second negative film can maintain the ambient temperature below a predetermined temperature during the exposure operation in the exposure apparatus.
綜上所述,本發明實施例所公開的電路板檢測方法,是透過環境控制機構來對曝光設備內的環境溫度進行冷卻並能維持在預定溫度以下,藉以控制底片(如:第一底片與第二底片)於上述預定溫度以下的環境溫度進行曝光作業,進而避免底片產生大幅地漲縮、以提升底片的使用壽命。 In summary, the circuit board detection method disclosed in the embodiments of the present invention is to cool the ambient temperature in the exposure device through the environmental control mechanism and maintain it below a predetermined temperature, thereby controlling the negative film (eg, the first negative film and (Second negative film) Perform exposure operation at an ambient temperature below the predetermined temperature, thereby preventing the negative film from greatly expanding and contracting, so as to increase the service life of the negative film.
為使能更進一步瞭解本發明的特徵及技術內容,請參閱以下有關本發明的詳細說明與附圖,但是此等說明與附圖僅用來說明本發明,而非對本發明的保護範圍作任何的限制。 In order to further understand the features and technical contents of the present invention, please refer to the following detailed description and drawings of the present invention, but these descriptions and drawings are only used to illustrate the present invention, not to make any protection to the scope of the present invention. limits.
1‧‧‧檢測設備 1‧‧‧ Testing equipment
11‧‧‧攝像裝置 11‧‧‧Camera device
12‧‧‧運算裝置 12‧‧‧Calculating device
2‧‧‧底片 2‧‧‧ film
21‧‧‧第一底片 21‧‧‧First film
21P‧‧‧中心點 21P‧‧‧Center
22‧‧‧第二底片 22‧‧‧Second negative
3‧‧‧標準玻璃底片 3‧‧‧Standard glass negative
4‧‧‧待測電路板 4‧‧‧ circuit board to be tested
41‧‧‧適格電路板 41‧‧‧ qualified circuit board
42‧‧‧淘汰電路板 42‧‧‧ Elimination of circuit boards
4P‧‧‧中心點 4P‧‧‧Center
R1‧‧‧第一預設值 R1‧‧‧ First preset value
R2‧‧‧第二預設值 R2‧‧‧ Second preset value
W‧‧‧寬度方向 W‧‧‧Width direction
L‧‧‧長度方向 L‧‧‧Long
100‧‧‧曝光設備 100‧‧‧Exposure equipment
5‧‧‧環境控制機構 5‧‧‧Environmental Control Agency
51‧‧‧溫度感測器 51‧‧‧Temperature sensor
52‧‧‧降溫裝置 52‧‧‧cooling device
53‧‧‧濕度控制器 53‧‧‧Humidity controller
54‧‧‧濕度感測器 54‧‧‧Humidity sensor
61‧‧‧曝光環境 61‧‧‧ exposure environment
62‧‧‧承載平台 62‧‧‧Bearing platform
圖1為本發明電路板檢測方法的流程示意圖。 FIG. 1 is a schematic flowchart of the circuit board inspection method of the present invention.
圖2為本發明電路板檢測方法所使用的檢測設備的功能方塊示意圖。 2 is a functional block diagram of a testing device used in the circuit board testing method of the present invention.
圖3為本發明電路板檢測方法的底片及預設值的示意圖。 FIG. 3 is a schematic diagram of a film and a preset value of the circuit board detection method of the present invention.
圖4為本發明電路板檢測方法的篩選步驟示意圖(一)。 4 is a schematic diagram (1) of the screening steps of the circuit board inspection method of the present invention.
圖5為本發明電路板檢測方法的篩選步驟示意圖(二)。 5 is a schematic diagram (2) of the screening steps of the circuit board inspection method of the present invention.
圖6為本發明電路板檢測方法的再生步驟示意圖。 6 is a schematic diagram of regeneration steps of the circuit board inspection method of the present invention.
圖7為本發明電路板曝光方法的流程示意圖。 7 is a schematic flowchart of the circuit board exposure method of the present invention.
圖8為本發明電路板檢測方法的流程示意圖。 FIG. 8 is a schematic flowchart of the circuit board detection method of the present invention.
圖9為圖8中功能方塊示意圖。 9 is a schematic diagram of the functional block in FIG. 8.
請參閱圖1至圖6,為本發明的實施例一,需先說明的是,本實施例對應附圖所提及的相關數量與外型,僅用來具體地說明本發明的實施方式,以便於了解本發明的內容,而非用來侷限本發明的保護範圍。 Please refer to FIG. 1 to FIG. 6, which is the first embodiment of the present invention. It should be noted that this embodiment corresponds to the relevant quantity and appearance mentioned in the drawings, and is only used to specifically describe the embodiment of the present invention. In order to understand the content of the present invention, it is not used to limit the protection scope of the present invention.
如圖1所示,本實施例公開一種電路板檢測方法,尤其是指一種電路板在進行曝光作業前的檢測方法。所述電路板檢測方法包括步驟如下:一準備步驟、一篩選步驟、一再生步驟、及一曝光步驟。以下將對各步驟的具體實施方式作一說明,但下述說明並非限制各個步驟的必要實施順序。 As shown in FIG. 1, this embodiment discloses a circuit board inspection method, and particularly refers to a circuit board inspection method before performing an exposure operation. The circuit board inspection method includes the following steps: a preparation step, a screening step, a regeneration step, and an exposure step. The specific implementation of each step will be described below, but the following description does not limit the necessary implementation order of each step.
準備步驟:請參閱圖2和圖3所示,提供一檢測設備1,包括一攝像裝置11以及電性連接於所述攝像裝置11的一運算裝置12,藉以通過上述檢測設備1的攝像裝置11與運算裝置12而實施下述各種比較或選擇作業。其中,所述攝像裝置11能擷取N種底片2的影像及X個待測電路板4的影像並傳送至所述運算裝置12。上述底片2與待測電路板4於本實施例中皆大致呈四邊形,並且所述待測電路板4於本實施例中是指尚未搭配底片2進行曝光作業的電路板。
Preparation steps: Please refer to FIG. 2 and FIG. 3 to provide a
進一步地說,所述運算裝置12能比較上述N種底片2以及一
標準玻璃底片3(N為大於1的正整數),並將每種底片2定義出相關於電路板曝光作業的一漲縮係數。舉例來說,所述標準玻璃底片3在相互垂直的寬度方向W與長度方向L的漲縮係數皆預設為1,運算裝置12可以依據各種底片2的影像與上述標準玻璃底片3的影像,而在寬度方向W與長度方向L上進行尺寸比較,藉以定義出各種底片2在寬度方向W與長度方向L的漲縮係數(如:0.995、1.005)。
Furthermore, the
再者,本實施例的標準玻璃底片3可以是透明狀,藉以利於將兩種底片2分別對位地設置於上述標準玻璃底片3的相反兩個表面上,使攝像裝置11能夠同時取得標準玻璃底片3及置於其上的兩種底片2的影像,進而能令運算裝置12同時進行上述兩種底片2的漲縮係數運算。需說明的是,本實施例雖是以攝像裝置11同時擷取標準玻璃底片3及置於其上的兩種底片2的影像,以作為底片2漲縮係數的判斷標準,但本發明不排除以其他方式實施。例如:運算裝置12內可預設有標準玻璃底片3的影像,以使攝像裝置11僅需擷取各種底片2的影像後,即可通過運算裝置12進行底片2的漲縮係數運算。
Furthermore, the standard glass negative 3 of this embodiment may be transparent, so as to facilitate the positioning of the two types of
篩選步驟:請參閱圖4和圖5所示,以一第一預設值R1進行上述X個待測電路板4的檢測,篩選出能在所述第一預設值R1下進行曝光作業的Y個適格電路板41、及不能在所述第一預設值R1下進行曝光作業的Z個淘汰電路板42。其中,X=Y+Z、X為正整數、Y與Z皆為不小於零的整數。於本實施例中,所述第一預設值R1定義為一第一底片21的尺寸相對於一容許誤差(如:小於35微米)而向內縮及向外擴的一虛擬尺寸範圍(如圖3中,鄰近第一底片21邊緣的內側矩形虛線與外側矩形虛線所包圍的區域)。再者,所述N種底片2包括上述第一底片21,也就是說,所述攝像裝置11已擷取所述第一底片21的影像並傳送至所述運
算裝置12中。
Screening steps: Please refer to FIG. 4 and FIG. 5 to perform the detection of the X number of
更詳細地說,所述運算裝置12是依據所述X個待測電路板的影像,藉以在上述N種底片2中,選擇出在所述容許誤差內能夠進行曝光作業的待測電路板4數量為最多的第一底片21。並且所述運算裝置12依據自攝像裝置11傳送的所述第一底片21的影像與X個待測電路板4的影像,而判斷出上述Y個適格電路板41及Z個淘汰電路板42。
In more detail, the
進一步地說,所述篩選步驟於本實施例中是將所述第一底片21依序疊置於每個待測電路板4,並且所述第一底片21的中心點21P大致對齊或鄰近於相疊置的待測電路板4的中心點4P;接著,當所述第一底片21與相疊置的待測電路板4的尺寸差異大於或小於所述容許誤差時(如圖5),則相疊置的待測電路板4判定為一個淘汰電路板42,反之,當所述第一底片21與相疊置的待測電路板4的尺寸差異在所述容許誤差內時(如圖4),則相疊置的待測電路板4判定為一個適格電路板41。此外,上述雖是以第一底片21的中心點21P大致對齊或鄰近於相疊置待測電路板4的中心點4P為例,但本發明並不受限於此。上述中心點21P及中心點4P,於本實施例中皆大致定義為由其所有頂點相對於平面中心的連線的交點。
Further, in this embodiment, the screening step is to sequentially stack the first
換個角度來說,上述第一底片21與相疊置待測電路板4間的尺寸差異判斷過程也可以是:所述第一底片21在四個角落各預設有對位部(圖中未標示),並且上述待測電路板4的四個角落也各預設有相對應的對位部(圖中未標示)。將所述第一底片21的其中一個對位部大致對齊於上述待測電路板4的其中一個對位部,接著取得第一底片21的其他對位部與相疊置待測電路板4的相鄰對位部之間的距離值,而後再比較上述距離值與容許誤差;若上述第一底片21與待測電路板4在上述四個角落所測得的其中一個距離值大於容許誤差,則相疊置待測電路板4判定為淘汰電路板
42。
To put it another way, the process of determining the difference in size between the first
再生步驟:請參閱圖6所示,找出能夠使Z個所述淘汰電路板42中的至少其中一個淘汰電路板42進行曝光作業的一第二預設值R2。其中,當Z大於1時,所述Z個淘汰電路板42能夠依據M種預設值進行曝光作業(M大於1並且小於Z的正整數),所述M種預設值包含有上述第二預設值R2,也可進一步包含有第三預設值、第四預設值、及第五預設值等等。再者,於所述M種預設值中,上述第二預設值R2能夠進行曝光作業的淘汰電路板42數量為最多。而於本實施例中,第二預設值R2定義為一第二底片22的尺寸相對於所述容許誤差而向內縮及向外擴的一虛擬尺寸範圍,並且所述N種底片2包括上述第二底片22。
Regeneration step: Please refer to FIG. 6 to find a second preset value R2 that enables at least one of the Z eliminated
更詳細地說,所述運算裝置12依據上述Z個淘汰電路板42的影像,而判斷出能夠在所述容許誤差內對至少一個所述淘汰電路板42進行曝光作業的第二底片22。舉例來說,所述第一底片21的漲縮係數為1.005,而圖5所示的淘汰電路板42相較於第一底片21的尺寸差異,小於所述容許誤差,所以運算裝置12以小於第一底片21的漲縮係數為其中一個篩選條件,進而在其餘的底片2中進行選擇,例如:本實施例是選擇圖6所示的具有漲縮係數為0.995的第二底片22。
In more detail, the
藉此,因應每個電路板的尺寸並非完全相同,所以本實施例的待測電路板4在以底片2進行曝光作業前,先進行上述電路板檢測方法,藉以避免待測電路板4與底片2在曝光作業的過程中產生對位問題,並且所述電路板檢測方法通過再生步驟而能依據上述淘汰電路板42選擇其他合適的底片,進而有效地降低電路板的淘汰率及節省生產時間。
In this way, since the size of each circuit board is not exactly the same, the circuit board under
請參閱圖7,為本發明的實施例二,本實施例與上述實施例一類似,相同處則不再加以贅述,而兩個實施例的主要差異如下所述。 Please refer to FIG. 7, which is the second embodiment of the present invention. This embodiment is similar to the above-mentioned first embodiment, and the same points will not be described again. The main differences between the two embodiments are as follows.
具體來說,本實施例公開一種電路板曝光方法,包括實施例一所述的電路板檢測方法以及一曝光步驟。其中,所述曝光步驟為;依據所述第一預設值R1依序使Y個所述適格電路板41進行曝光作業,並且依據所述第二預設值R2使相對應的至少一個所述淘汰電路板42進行曝光作業。進一步地說,依據上述M種預設值分別使相對應的所述淘汰電路板42進行曝光作業。
Specifically, this embodiment discloses a circuit board exposure method, including the circuit board inspection method described in
須說明的是,若是某個預設值所對應的淘汰電路板42數量過少時(如:少於三個),由於僅針對上述過少的淘汰電路板42進行曝光步驟所需花費的製造成本,反而比直接拋棄上述過少的淘汰電路板42還要高,所以上述過少的淘汰電路板42也可無須進一步實施上述的曝光步驟而直接拋棄。
It should be noted that if the number of
請參閱圖8和圖9,為本發明的實施例三,本實施例與上述實施例二類似,相同處則不再加以贅述,而本實施例與上述兩個實施例的主要差異如下所述。 Please refer to FIG. 8 and FIG. 9, which is the third embodiment of the present invention. This embodiment is similar to the above-mentioned second embodiment, and the same parts will not be repeated here. The main differences between this embodiment and the above two embodiments are as follows .
具體來說,本實施例公開一種電路板檢測方法,其包括有準備步驟、篩選步驟、再生步驟、及曝光步驟。其中,上述準備步驟、篩選步驟、再生步驟、及曝光步驟已記載於實施例一和二的內容則不再於本實施例中加以贅述,而本實施例於下述主要進一步說明如何完善曝光步驟。
Specifically, this embodiment discloses a circuit board inspection method, which includes a preparation step, a screening step, a regeneration step, and an exposure step. Among them, the content of the above preparation steps, screening steps, regeneration steps, and exposure steps that have been recorded in
進一步地說,所述曝光步驟於本實施例中是置於一曝光設備100內實施。其中,所述曝光設備100包含有一曝光機(未示於圖)、一環境控制機構5、及至少一個承載平台62。
Further, the exposure step is implemented in an
所述曝光機(未示於圖)是用來提供底片進行曝光顯影作業
及電路板進行線路圖騰佈置的儀器,上述曝光機通常形成有一曝光區域並且相對處於一獨立環境(一般屬於高溫低濕的環境),而上述曝光設備100的內部於本實施例中定義為一曝光環境61。其中,上述曝光環境61的溫度定義為一曝光溫度,並且所述曝光溫度即為一曝光作業下的一種環境溫度,上述曝光環境61的濕度定義為一環境濕度。
The exposure machine (not shown) is used to provide negative film for exposure and development operations
And the circuit board totem layout equipment, the exposure machine usually forms an exposure area and is relatively in an independent environment (generally belongs to a high temperature and low humidity environment), and the inside of the
所述承載平台62用以承載上述底片2(如:第一底片21或上述第二底片22)進行曝光。上述第一底片21及第二底片22中的任一個在未進行曝光作業前因應本身材質不同,其種類可分為鹵化銀(俗稱黑白片)、偶氮(俗稱棕片)、金屬底片、或玻璃底片(Glass Photo-mask),但本發明不受限於此。
The carrying platform 62 is used to carry the above-mentioned negative film 2 (such as the first
也就是說,在特定的相對濕度下,上述底片2的尺寸會隨著環境溫度的上升而漲大,環境溫度下降而縮小,因而形成一漲縮現象。再者,底片2製造時因為本身材質的因素而無法預先控制底片2中的濕度與每個生產區域的濕度一致,因此在曝光作業的過程中,盡可能使底片2所在的環境溫度維持於一預定溫度,以避免有大幅漲縮的現象發生。
That is to say, under a specific relative humidity, the size of the above-mentioned
所述預定溫度於本實施例中是指使上述底片2(包含第一底片21與第二底片22)處於其內能夠較不會有大幅漲縮現象發生的一安全溫度值。再者,第一底片21與第二底片22於本實施例中會因應本身材質的不同,而可能具有不同的變形溫度,亦即第一底片21具有一變形溫度,並且第二底片22也具有一變形溫度。據此,所述預定溫度不大於第一底片21的變形溫度、也不大於所述第二底片22的變形溫度。
In this embodiment, the predetermined temperature refers to a safe temperature value in which the above-mentioned negative film 2 (including the first
換個角度來說,當第一底片21本身的溫度值到達其變形溫度時,第一底片21會產生形變,也就是說,變形溫度例如是第一底片21產生形變的一個臨界溫度值;如果第一底片21本身太常隨著環境溫度的上升或下降而產生漲縮形變,都很容易縮短第一底
片21的使用壽命。因此,預設溫度是用來盡可能地使第一底片21本身的溫度值不會達到其變形溫度,藉以降低第一底片21發生形變的機率。
To put it another way, when the temperature value of the first
再者,當第二底片22也產生相同於第一底片21的漲縮形變現象時,預設溫度是用來盡可能地使第二底片22本身的溫度值不會達到其變形溫度,藉以降低第二底片22發生形變的機率。
Furthermore, when the second
另外,所述電路板檢測方法於本實施例中定義有第一預設值與第二預設值,並且第一預設值R1是相對於第一底片21而定義,第二預設值R2是相對於第二底片22而定義。於本實施例中,第一預設值R1定義為第一底片21的尺寸相對於容許誤差(如:小於35微米)而向內縮及向外擴的虛擬尺寸範圍(如圖3中,鄰近第一底片21邊緣的內側矩形虛線與外側矩形虛線所包圍的區域),而所述第二預設值R2定義為第二底片22的尺寸相對於容許誤差而向內縮及向外擴的虛擬尺寸範圍。
In addition, the circuit board detection method in this embodiment defines a first preset value and a second preset value, and the first preset value R1 is defined relative to the first
所述環境控制機構5包含有一溫度感測器51、降溫裝置52、濕度控制器53及濕度感測器54。需說明的是,所述環境控制機構5於本實施例中是以同時包含有上述元件為例,但在本發明未繪示的其他實施例中,所述環境控制機構5也可以是包含有溫度感測器51、降溫裝置52、濕度控制器53、及濕度感測器54的至少其中之一。
The environmental control mechanism 5 includes a
所述溫度感測器51用以偵測承載平台62的溫度;所述降溫裝置52於本實施例中包含有一冰水機或一霧化降溫器,用以冷卻環境溫度,並且環境控制機構5依據溫度感測器51所偵測到的溫度值,而對應地調整降溫裝置52的運作(如:冰水機或霧化降溫器的出風量)。
The
更詳細地說,上述冰水機一般是設置有一出風口及一通風口,所述通風口內設置有一風流扇,藉由環境控制機構5控制所
述風流扇將機內產生的帶有些微濕氣冷風由所述出風口吹出,可將冷風吹向曝光環境61,使得環境溫度達到非純乾燥的降溫效果,但本發明不受限於此。再者,上述霧化降溫器也可依據曝光環境61的環境溫度及相對環境濕度而控制適當吹出霧化冷風,使得環境溫度達到非純乾燥的降溫效果。
In more detail, the above ice water machine is generally provided with an air outlet and a vent, and an air flow fan is provided in the vent, which is controlled by the environmental control mechanism 5
The air flow fan blows out the slightly moist cold air generated in the machine through the air outlet, which can blow the cold air toward the
所述濕度控制器53用以對曝光設備100內的曝光環境61的所述環境濕度進行控制。上述濕度感測器54用以偵測環境濕度,以使環境控制機構5能依據濕度感測器54所偵測到的濕度值,而對應地調整濕度控制器53的運作。
The
依上所述,所述曝光設備100於本實施例中通過環境控制機構5來對曝光設備100內的曝光環境61的環境溫度進行冷卻,以使Y個所述適格電路板41與至少一個所述淘汰電路板42能在曝光設備100內進行曝光作業的過程中,維持環境溫度在預定溫度以下。
As described above, in this embodiment, the
舉例來說,所述環境控制機構5於本實施例中能通過降溫裝置52的冰水機或霧化降溫器,而維持環境溫度在預定溫度以下。而於本實施例中,環境控制機構5是依據溫度感測器51與濕度感測器54所測得的曝光環境61的環境溫度及相對環境濕度,而控制降溫裝置52的冰水機或霧化降溫器(或濕度控制器53)產生些微濕氣冷風或霧化冷風吹向承載平台62,以對曝光環境61達到非純乾燥的降溫效果,用以維持環境溫度在預定溫度以下。
For example, in this embodiment, the environmental control mechanism 5 can maintain the ambient temperature below a predetermined temperature by the ice water machine or the atomizing temperature reducer of the
此外,所述電路板檢測方法於本實施例中雖是以包含有實施例二所載的至少部分內容來說明,但本發明不受限於此。舉例來說,所述電路板檢測方法也可以是包含:將至少一個電路板4與一底片2於一曝光設備100內實施一曝光作業。其中,所述曝光設備100以一環境控制機構5來對所述曝光設備100內的一環境溫度進行冷卻,以使至少一個所述電路板4與所述底片2能在所
述曝光設備100內進行所述曝光作業的過程中,維持所述環境溫度在一預定溫度以下。
In addition, although the circuit board detection method is described in this embodiment by including at least part of the content contained in the second embodiment, the present invention is not limited to this. For example, the circuit board inspection method may also include: performing an exposure operation on at least one
依據上述實施例所載,因應每個電路板的尺寸並非完全相同,所以本實施例的待測電路板4在以底片2進行曝光作業前,先進行上述電路板檢測的各項步驟。
According to the above embodiment, since the size of each circuit board is not exactly the same, the
綜上所述,本發明實施例所公開的電路板檢測方法,是透過環境控制機構5來對曝光設備100內的環境溫度進行冷卻,並使環境溫度能維持在預定溫度以下,藉以控制底片(如:第一底片與第二底片)於上述預定溫度以下的環境溫度進行曝光作業,進而避免底片產生大幅地漲縮、以提升底片的使用壽命。
In summary, the circuit board detection method disclosed in the embodiment of the present invention is to cool the ambient temperature in the
其中,所述曝光步驟是於曝光設備100內實施,並且曝光過程中環境控制機構5控制曝光環境61的環境溫度與環境濕度(例如:冷卻上述底片2所在的承載平台62的溫度與週遭附近的溫度),以使底片2在曝光作業的過程中能處於均勻的溫度與溼度,進而降低底片2發生漲縮的機率,達到維持底片2尺寸穩定效果,並且提升底片2的使用壽命。
Wherein, the exposure step is implemented in the
再者,由於至少一個電路板4在預定溫度以下的環境溫度中有效地進行曝光作業,藉以避免待測電路板4與底片2在曝光作業的過程中產生異常對位問題,並且通過再生步驟而能依據上述淘汰電路板42選擇其他合適的底片,以有效地降低電路板的淘汰率及節省生產時間。藉此,本實施例進而能大幅提升生產品質及效率。
Furthermore, since at least one
以上所述僅為本發明的優選可行實施例,並非用來侷限本發明的保護範圍,凡依本發明申請專利範圍所做的同等變化與修飾,皆應屬本發明的涵蓋範圍。 The above are only preferred and feasible embodiments of the present invention, and are not intended to limit the scope of protection of the present invention. All equivalent changes and modifications made in accordance with the patent application scope of the present invention shall fall within the scope of the present invention.
100‧‧‧曝光設備 100‧‧‧Exposure equipment
5‧‧‧環境控制機構 5‧‧‧Environmental Control Agency
51‧‧‧溫度感應器 51‧‧‧Temperature sensor
52‧‧‧降溫裝置 52‧‧‧cooling device
53‧‧‧濕度控制器 53‧‧‧Humidity controller
54‧‧‧濕度感測器 54‧‧‧Humidity sensor
61‧‧‧曝光環境 61‧‧‧ exposure environment
62‧‧‧承載平台 62‧‧‧Bearing platform
2‧‧‧底片 2‧‧‧ film
Claims (9)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW107138176A TWI683175B (en) | 2018-10-29 | 2018-10-29 | Detecting method of circuit board |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW107138176A TWI683175B (en) | 2018-10-29 | 2018-10-29 | Detecting method of circuit board |
Publications (2)
Publication Number | Publication Date |
---|---|
TWI683175B true TWI683175B (en) | 2020-01-21 |
TW202016644A TW202016644A (en) | 2020-05-01 |
Family
ID=69942560
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW107138176A TWI683175B (en) | 2018-10-29 | 2018-10-29 | Detecting method of circuit board |
Country Status (1)
Country | Link |
---|---|
TW (1) | TWI683175B (en) |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWM482092U (en) * | 2014-03-12 | 2014-07-11 | Grafmac Two Co Ltd | A screen exposure machine monitor system |
CN104375391A (en) * | 2014-12-10 | 2015-02-25 | 志圣科技(广州)有限公司 | Method and device for controlling photoetching machine |
US9252373B2 (en) * | 2010-06-29 | 2016-02-02 | Cooledge Lighting, Inc. | Electronic devices with yielding substrates |
-
2018
- 2018-10-29 TW TW107138176A patent/TWI683175B/en not_active IP Right Cessation
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9252373B2 (en) * | 2010-06-29 | 2016-02-02 | Cooledge Lighting, Inc. | Electronic devices with yielding substrates |
TWM482092U (en) * | 2014-03-12 | 2014-07-11 | Grafmac Two Co Ltd | A screen exposure machine monitor system |
CN104375391A (en) * | 2014-12-10 | 2015-02-25 | 志圣科技(广州)有限公司 | Method and device for controlling photoetching machine |
Also Published As
Publication number | Publication date |
---|---|
TW202016644A (en) | 2020-05-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR102562020B1 (en) | Substrate inspection method, substrate processing system, and computer storage medium | |
WO2003077291A1 (en) | Semiconductor manufacturing method and device thereof | |
TWI761880B (en) | Apparatus, method, computer readable medium and computer program product for inspecting substrate defect | |
WO2018211967A1 (en) | Substrate transportation method | |
US8873849B2 (en) | Image processing method, image display method, image processing apparatus and a non-transitory computer-readable recording medium | |
TW200425371A (en) | Wafer defect inspection system and method thereof | |
TWI683175B (en) | Detecting method of circuit board | |
KR20200109236A (en) | Inspection apparatus and inspection method | |
CN111163586B (en) | Circuit board detection method | |
JP2014109436A (en) | Substrate defect inspection method, substrate defect inspection device, program, and computer storage medium | |
JP5002380B2 (en) | Processing device abnormality detection method, processing device, and computer-readable storage medium | |
US20220100081A1 (en) | Information processing apparatus, inspection method, storage medium, exposure apparatus, determination method, and article manufacturing method | |
JP6423064B2 (en) | Substrate processing system | |
US20190164853A1 (en) | Method for inspecting sensor package structure, inspection apparatus, and focus assistant loader of inspection apparatus | |
JP2006128572A (en) | Exposure condition correcting method, substrate processing apparatus, and computer program | |
JP2005017234A (en) | Visual inspection method, visual inspection device, and manufacturing equipment for electronic circuit substrate | |
JPS5734402A (en) | Inspecting method for defect in circuit pattern | |
CN110428793B (en) | Brightness correction system and method | |
TWI651589B (en) | Detecting method of circuit board and exposing method of circuit board | |
JP2018056574A (en) | Base plate processing system | |
TW201839364A (en) | Motherboard analysis device and method | |
CN214374394U (en) | Floor type intelligent visual detection equipment | |
JP3189441B2 (en) | Teaching data correction method for mounted component inspection equipment | |
KR20220167224A (en) | Substrate inspection device, substrate inspection method, and storage medium | |
CN114563916A (en) | Method for setting coordinates of inspection area of mask inspection machine |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |