TWI682010B - Coating liquid for forming film, method for manufacturing the same, and method for manufacturing base material with coating - Google Patents

Coating liquid for forming film, method for manufacturing the same, and method for manufacturing base material with coating Download PDF

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TWI682010B
TWI682010B TW105108808A TW105108808A TWI682010B TW I682010 B TWI682010 B TW I682010B TW 105108808 A TW105108808 A TW 105108808A TW 105108808 A TW105108808 A TW 105108808A TW I682010 B TWI682010 B TW I682010B
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component
coating
coating liquid
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mass
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TW201708449A (en
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荒金宏忠
江上美紀
村口良
小松通郎
熊澤光章
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日商日揮觸媒化成股份有限公司
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    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D1/00Coating compositions, e.g. paints, varnishes or lacquers, based on inorganic substances
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/02Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by baking
    • B05D3/0254After-treatment
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/02Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by baking
    • B05D3/0254After-treatment
    • B05D3/0263After-treatment with IR heaters
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/06Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
    • B05D3/061Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation using U.V.
    • B05D3/065After-treatment
    • B05D3/067Curing or cross-linking the coating
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40Additives
    • C09D7/60Additives non-macromolecular
    • C09D7/63Additives non-macromolecular organic

Abstract

本發明之透明被膜形成用塗佈液係將可與金屬烷氧化物形成螯合物之有機化合物(A成分)、式(2)所表示之3官能以上之矽烷化合物及其水解縮合物之至少一者(B成分)、及式(3)所表示之金屬烷氧化物及其水解縮合物之至少一者(C成分)溶解或分散至包含水及有機溶劑之混合溶劑中而成者。此時,A成分之莫耳數(M1)與C成分之莫耳數(M3)之莫耳比(M1/M3)為0.25以上且未達2.0之範圍,B成分之莫耳數(M2)與C成分之莫耳數(M3)之莫耳比(M2/M3)為0.1以上且9.0以下之範圍。 The coating liquid for forming a transparent film of the present invention comprises at least an organic compound (component A) capable of forming a chelate compound with a metal alkoxide, at least three functional silane compounds represented by formula (2) and their hydrolyzed condensates. One (component B) and at least one of the metal alkoxide represented by formula (3) and its hydrolyzed condensate (component C) are dissolved or dispersed in a mixed solvent containing water and an organic solvent. At this time, the molar ratio (M1) of component A (M1) to the molar number of component C (M3) (M1/M3) is more than 0.25 and less than the range of 2.0, and the molar number of component B (M2) The molar ratio (M2/M3) to the molar number (M3) of the component C is in the range of 0.1 or more and 9.0 or less.

(通式(2)、(3)如說明書所記載) (Formulas (2) and (3) are as described in the description)

Description

被膜形成用之塗佈液及其製造方法、以及附被膜基材之製造方法 Coating liquid for forming film, method for manufacturing the same, and method for manufacturing base material with coating

本發明係關於一種被膜形成用之塗佈液。 The present invention relates to a coating liquid for film formation.

詳細而言,本發明係關於一種儘管於相對低溫下進行硬化,亦可形成硬度及抗龜裂性之兼顧性優異之透明被膜的塗佈液。 In detail, the present invention relates to a coating liquid that can form a transparent coating film excellent in both the hardness and the crack resistance despite being cured at a relatively low temperature.

先前,為了對玻璃或塑膠等之基材賦予功能而於基材表面形成被膜。例如,為了提高玻璃、塑膠片、塑膠透鏡、樹脂膜、及顯示裝置前面板等基材表面之耐擦傷性,而於基材表面形成硬塗膜。作為此種硬塗膜,已知有有機樹脂膜及無機膜。進而,亦已知有於有機樹脂膜及無機膜中摻合樹脂粒子或二氧化矽(silica)等無機粒子,而進一步提高耐擦傷性之情況。 Previously, a film was formed on the surface of the substrate in order to impart functions to the substrate such as glass or plastic. For example, in order to improve the scratch resistance of substrate surfaces such as glass, plastic sheets, plastic lenses, resin films, and front panels of display devices, a hard coating film is formed on the surface of the substrate. As such a hard coating film, an organic resin film and an inorganic film are known. Furthermore, it is also known that the organic resin film and the inorganic film are blended with inorganic particles such as resin particles or silica to further improve scratch resistance.

又,亦已知有於透明被膜中摻合導電性粒子而賦予抗靜電性能、電磁波屏蔽性能之附透明被膜基材。進而,亦已知有於透明被膜中摻合有高折射率粒子之高折射率透明被膜、於透明被膜中摻合低折射率粒子而賦予抗反射性能之低折射率透明被膜、摻合有著色顏料粒子之透明性被膜等。 In addition, a transparent coating base material in which conductive particles are blended into a transparent coating to impart antistatic performance and electromagnetic wave shielding performance is also known. Furthermore, a high-refractive-index transparent film in which a high-refractive-index particle is blended in a transparent film, a low-refractive-index transparent film in which a low-refractive-index particle is blended in a transparent film to impart antireflection performance, and a coloring compound are also known Transparent coating of pigment particles, etc.

又,亦已知有為了調節基材之折射率或介電常數,而使用烷 氧化物化合物、或於其中摻合有膠體粒子之塗佈液,藉由溶膠-凝膠法而形成觸控面板用之被膜之情況。然而,於該方法中,為了使被膜硬化,需要於500℃左右之溫度下進行加熱,僅能使用耐熱性較高之基材。 In addition, it is also known to use alkane to adjust the refractive index or dielectric constant of the base material. The oxide compound, or the coating liquid in which colloidal particles are blended, forms a coating for a touch panel by a sol-gel method. However, in this method, in order to harden the coating, it is necessary to heat at a temperature of about 500°C, and only substrates with high heat resistance can be used.

相對於此,已知有若使用包含乙醯丙酮螯合物化合物、矽烷化合物、除矽以外之金屬烷氧化物的塗佈液,(於乾燥時或乾燥後),則可藉由紫外線照射,於相對低溫下進行硬化,而形成耐久性優異之透明陶瓷被膜(例如參照文獻1(日本特開平2-48403號公報))。 On the other hand, it is known that if a coating solution containing an acetone chelate compound, a silane compound, and a metal alkoxide other than silicon is used (during or after drying), it can be irradiated by ultraviolet rays. It is cured at a relatively low temperature to form a transparent ceramic film excellent in durability (for example, refer to Document 1 (Japanese Patent Laid-Open No. 2-48403)).

又,已知有使用由如下者所構成之塗佈溶液,而形成具有微細之凹凸狀表層之溶膠凝膠膜:使添加有利用乙醯丙酮進行穩定化之金屬烷氧化物之四烷氧基矽烷進行水解及脫水縮合而成之溶膠A、與使將1個官能基進行烷基化之烷基三烷氧基矽烷水解及脫水縮合而成之溶膠B之混合物;以異丙醇為主成分之溶劑;以及與該等混合存在之二醇類(例如參照文獻2(日本特開2005-281132號公報))。 In addition, it is known to use a coating solution composed of a sol-gel film having a fine uneven surface layer to form a tetraalkoxy group added with a metal alkoxide stabilized with acetone. A mixture of sol A obtained by hydrolysis and dehydration condensation of silane, and sol B obtained by hydrolysis and dehydration condensation of alkyl trialkoxysilane with one functional group alkylated; isopropyl alcohol as the main component Solvent; and glycols mixed with these (for example, refer to Document 2 (Japanese Patent Laid-Open No. 2005-281132)).

利用文獻1所揭示之塗佈液,雖然可提供於相對低溫下進行硬化之透明被膜,但例如於基底為樹脂之情形時,存在難以抑制龜裂之產生的問題。 Although the coating liquid disclosed in Document 1 can provide a transparent coating that is cured at a relatively low temperature, for example, when the substrate is a resin, there is a problem that it is difficult to suppress the occurrence of cracks.

又,文獻2中揭示有使用將3官能矽烷(例如烷基三烷氧基矽烷)進行水解及脫水縮合(水解縮合)而獲得之溶膠,而形成微細之凹凸狀表層之情況。然而,由於在低溫下難以成為硬度充分之被膜,故而需要在至少600℃左右之溫度下進行焙燒。因此,無法使用耐熱性較低之基材。 In addition, Document 2 discloses that a sol obtained by hydrolyzing and dehydrating and condensing (hydrolyzing and condensing) trifunctional silane (for example, alkyltrialkoxysilane) is used to form a fine uneven surface layer. However, since it is difficult to form a coating with sufficient hardness at a low temperature, it is necessary to perform baking at a temperature of at least about 600°C. Therefore, a substrate with low heat resistance cannot be used.

本發明之目的在於提供一種於塗佈至基材後具有充分之硬度並且難以產生龜裂之被膜形成用之塗佈液。 An object of the present invention is to provide a coating solution for forming a coating that has sufficient hardness after application to a substrate and is less likely to crack.

本發明者等人為了解決上述問題而進行努力研究,結果發現,若使用將可與金屬烷氧化物形成螯合物之有機化合物、3官能以上之矽烷化合物、及金屬烷氧化物(其中,除了矽烷氧化物)溶解或分散至由水及有機溶劑所構成之混合溶劑中而成之塗佈液,則可獲得具有充分之硬度並且難以產生龜裂之被膜。本發明係基於該見解而完成者。 The present inventors have made intensive studies to solve the above-mentioned problems, and found that if an organic compound that can form a chelate compound with a metal alkoxide, a trifunctional silane compound, or a metal alkoxide (wherein, except (Silica oxide) dissolving or dispersing in a mixed solvent composed of water and organic solvents, a coating with sufficient hardness and hard to crack can be obtained. The present invention was completed based on this knowledge.

即,本發明之被膜形成用之塗佈液係將可與金屬烷氧化物形成螯合物之有機化合物(A成分)、3官能以上之矽烷化合物及其水解縮合物之至少一者(B成分)、及金屬烷氧化物及其水解縮合物之至少一者(C成分)溶解或分散至包含水及有機溶劑之混合溶劑中而成。此時,A成分之莫耳數(M1)與C成分之莫耳數(M3)之莫耳比(M1/M3)為0.25以上且未達2.0,B成分之莫耳數(M2)與C成分之莫耳數(M3)之莫耳比(M2/M3)為0.1以上且9.0以下。再者,B成分與C成分分別如下述式(2)及式(3)所示。 That is, the coating solution for forming a film of the present invention is at least one of an organic compound (component A) capable of forming a chelate compound with a metal alkoxide, a silane compound with a trifunctionality or more, and its hydrolyzed condensate (component B ), and at least one of metal alkoxide and its hydrolyzed condensate (component C) is dissolved or dispersed in a mixed solvent containing water and an organic solvent. At this time, the molar ratio (M1) of component A (M1) to the molar number of component C (M3) (M1/M3) is more than 0.25 and less than 2.0, and the molar number of component B (M2) and C The molar ratio (M2/M3) of the molar number (M3) of the components is 0.1 or more and 9.0 or less. In addition, B component and C component are shown by following formula (2) and formula (3), respectively.

進而,將源自B成分之SiO2換算濃度(濃度C2)設為0.005~12質量%之範圍,將源自C成分之元素M之MOx換算濃度(濃度C3)設為0.02~14.25質量%之範圍,將濃度C2與濃度C3之合計(CT)設為0.1~15質量%之範圍。藉此,可提高被膜之抗龜裂性。 Further, derived from the 2 SiO B component in terms of concentration (concentration C2) set in a range of 0.005 to 12% by mass, derived from the elements C MO x component of M in terms of the concentration (concentration C3) 0.02 to 14.25 mass% The range (CT) of the concentration C2 and the concentration C3 is set to a range of 0.1 to 15% by mass. Thereby, the crack resistance of the coating can be improved.

進而,於B成分為3官能矽烷化合物及其水解縮合物之至少一者之情形時,將莫耳比(M2/M3)設為0.5~8.0之範圍。 Furthermore, when the component B is at least one of a trifunctional silane compound and its hydrolyzed condensate, the molar ratio (M2/M3) is set in the range of 0.5 to 8.0.

又,本發明之塗佈液之製造方法具備以下步驟1~3。 In addition, the method for producing a coating liquid of the present invention includes the following steps 1 to 3.

步驟1:將有機溶劑、水、3官能以上之矽烷化合物(B成分)、及水解觸媒進行摻合,而製備預備液1之步驟 Step 1: Blend organic solvent, water, silane compound (component B) with 3 or more functions, and hydrolysis catalyst to prepare preliminary solution 1

步驟2:將有機溶劑、可與金屬烷氧化物形成螯合物之有機化合物(A成分)、及金屬烷氧化物(C成分)進行摻合,而製備預備液2之步驟 Step 2: The organic solvent, the organic compound (component A) that can form a chelate compound with the metal alkoxide, and the metal alkoxide (component C) are blended to prepare the preparation solution 2

此處,A成分之摻合量相對於C成分之金屬元素1莫耳而為0.25莫耳以上且未達2.0莫耳之範圍。 Here, the blending amount of the component A is not less than 0.25 mol and less than 2.0 mol relative to 1 mol of the metal element of the component C.

步驟3:將預備液1、預備液2、及水進行摻合,於5℃以上且40℃以下進行攪拌之步驟 Step 3: Blend the preparation solution 1, the preparation solution 2, and water, and stir at a temperature above 5°C and below 40°C

再者,B成分與C成分分別如下述式(2)與式(3)所示。 In addition, the B component and the C component are respectively represented by the following formula (2) and formula (3).

進而,本發明之附被膜基材係使用上述任一構成之塗佈液而於基材上形成被膜。 Furthermore, the base material with a coating of the present invention forms a coating on the base material using the coating solution of any of the above-mentioned configurations.

進而,本發明之附被膜基材之製造方法具備:塗佈步驟,其係將上述任一構成之塗佈液塗佈至基材;乾燥步驟,其係於塗佈步驟後將基材於80℃以上且150℃以下進行加熱;照射步驟,其係於乾燥步驟後對形成於基材上之塗佈膜照射紫外線;及加熱步驟,其係於照射步驟後對塗佈膜於80℃以上且300℃以下進行加熱。由於可在300℃以下之製程中進行成膜,故而可於耐熱性較低之基材上,製作兼顧硬度及抗龜裂性之被膜。 Furthermore, the method for manufacturing a coated substrate of the present invention includes: a coating step which applies the coating liquid of any of the above-mentioned configurations to the substrate; a drying step which applies the substrate to 80 after the coating step Heating above ℃ and below 150 ℃; irradiation step, which irradiates the coating film formed on the substrate with ultraviolet rays after the drying step; and heating step, which irradiates the coating film above 80 ℃ after the irradiation step and Heating below 300°C. Since the film can be formed in a process below 300°C, a film with both hardness and crack resistance can be produced on a substrate with low heat resistance.

若應用本發明,即便不對塗佈液摻合高折射率粒子亦可形成高折射率(折射率1.3~2.3)之透明被膜。 If the present invention is applied, a transparent film with a high refractive index (refractive index of 1.3 to 2.3) can be formed even if high-refractive-index particles are not blended into the coating liquid.

以下,對本發明之被膜形成用之塗佈液、塗佈液之製造方法、附被膜基材、及附被膜基材之製造方法進行說明。 Hereinafter, the coating liquid for forming a film of the present invention, the method for manufacturing the coating liquid, the base material for coating, and the method for manufacturing the base material for coating will be described.

[被膜形成用之塗佈液] [Coating solution for film formation]

被膜形成用之塗佈液(以下,稱為「本塗佈液」)係將可與金屬烷氧化物形成螯合物之有機化合物(A成分)、式(2)所表示之3官能以上之矽烷化合物及其水解縮合物之至少一者(B成分)、及式(3)所表示之金屬烷氧化物及其水解縮合物之至少一者(C成分)溶解或分散至包含水及有機溶劑之混合溶劑中而成。 The coating solution for film formation (hereinafter, referred to as "this coating solution") is an organic compound (component A) capable of forming a chelate compound with a metal alkoxide, and a trifunctional or more functional compound represented by formula (2) At least one of the silane compound and its hydrolyzed condensate (component B), and at least one of the metal alkoxide represented by formula (3) and its hydrolyzed condensate (component C) are dissolved or dispersed to include water and an organic solvent Made of mixed solvents.

(R3)(4-m)Si(R4)m (2) (R 3 ) (4-m) Si(R 4 ) m (2)

(此處,m為3或4之至少一者;R3為碳數1至8之未經取代或經取代之烷基、未經取代或經取代之芳基、及乙烯基之任一者;R4為碳數1至8之未經取代或經取代之烷氧基、未經取代或經取代之芳氧基、乙烯氧基、羥基、氫原子、及鹵素原子之任一者,可相同亦可不同) (Here, m is at least one of 3 or 4; R 3 is any of unsubstituted or substituted alkyl having 1 to 8 carbons, unsubstituted or substituted aryl, and vinyl ; R 4 is any one of unsubstituted or substituted alkoxy groups having 1 to 8 carbon atoms, unsubstituted or substituted aryloxy groups, vinyloxy groups, hydroxyl groups, hydrogen atoms, and halogen atoms, which may be Same or different)

M(OR5)n (3) M(OR 5 ) n (3)

(此處,M為選自Be、Al、Sc、Ti、V、Cr、Fe、Ni、Zn、Ga、Ge、As、Se、Y、Zr、Nb、In、Sn、Sb、Te、Hf、Ta、W、Pb、B、Bi、Ce、及Cu中之1種元素,R5為碳數1至10之未經取代或經取代之烷基;n為與M之原子價相同之數) (Here, M is selected from Be, Al, Sc, Ti, V, Cr, Fe, Ni, Zn, Ga, Ge, As, Se, Y, Zr, Nb, In, Sn, Sb, Te, Hf, One element in Ta, W, Pb, B, Bi, Ce, and Cu, R 5 is an unsubstituted or substituted alkyl group having 1 to 10 carbon atoms; n is the same number as the atomic value of M)

根據上述式(2)可知,B成分有m=3之情形時之「3官能矽烷化合物及其水解縮合物之至少一者(B3成分)」、及m=4之情形時之 「4官能矽烷化合物及其水解縮合物之至少一者(B4成分)」。而且,本塗佈液包含B3成分及B4成分之至少一者作為B成分。再者,本塗佈液亦可包含將B成分與C成分水解縮合而生成之水解縮合物。 According to the above formula (2), when the component B has m=3, "at least one of a trifunctional silane compound and its hydrolyzed condensate (component B3)", and when m=4 "At least one of a 4-functional silane compound and its hydrolyzed condensate (component B4)". Furthermore, the present coating liquid contains at least one of the B3 component and the B4 component as the B component. In addition, the present coating liquid may contain a hydrolyzed condensate formed by hydrolytically condensing components B and C.

此時,A成分之莫耳數(M1)與C成分之莫耳數(M3)之莫耳比(M1/M3)需為0.25以上且未達2.0之範圍。進而,B成分之莫耳數(M2)與C成分之莫耳數(M3)之莫耳比(M2/M3)需為0.1以上且9.0以下之範圍。此處,於將各成分進行水解之情形時,莫耳數(M1~M3)亦使用以水解前之結構為基準之值。 At this time, the molar ratio (M1) of component A (M1) and the molar ratio (M1/M3) of component C (M3) of component C need to be at least 0.25 and less than the range of 2.0. Furthermore, the molar ratio (M2) of component B (M2) and the molar ratio (M2/M3) of component C (M3) must be in the range of 0.1 or more and 9.0 or less. Here, in the case of hydrolyzing each component, the Mohr number (M1 to M3) also uses the value based on the structure before hydrolysis.

若莫耳比(M1/M3)為2.0以上,則有A成分配位於C成分中之OR5部之大半部分,而抑制B成分與C成分之反應之虞。因此,有硬化時難以形成-M-O-Si-之交聯,所獲得之被膜之硬度變得不充分之虞。又,亦有殘存於被膜之A成分之量增加,膜之表面電阻值等電特性隨著時間經過而發生變化,從而降低可靠性之虞。又,於莫耳比(M1/M3)未達0.25之情形時,由於C成分過度反應,故而於塗佈液體中之水解縮合物之穩定性變差,塗佈液壽命縮短,因此有對所獲得之被膜之抗龜裂性產生不良影響之虞。尤其是,莫耳比(M1/M3)較佳為0.5以上且1.0以下之範圍。 If the molar ratio (M1/M3) is 2.0 or more, the A component is located in the majority of the OR 5 part of the C component, and the reaction between the B component and the C component may be suppressed. Therefore, it is difficult to form -MO-Si- crosslinks during curing, and the hardness of the obtained coating may become insufficient. In addition, the amount of the A component remaining in the film increases, and electrical characteristics such as the surface resistance value of the film change with time, thereby reducing reliability. In addition, when the molar ratio (M1/M3) is less than 0.25, the component C reacts excessively, so the stability of the hydrolyzed condensate in the coating liquid becomes poor, and the life of the coating liquid is shortened. The crack resistance of the obtained coating may adversely affect it. In particular, the molar ratio (M1/M3) is preferably in the range of 0.5 or more and 1.0 or less.

於莫耳比(M2/M3)未達0.1之情形時,塗佈液之穩定性降低,塗佈液壽命縮短。因此,有無法穩定地獲得膜厚、折射率、硬度等被膜特性之虞。另一方面,若莫耳比(M2/M3)超過9.0,則有於將由塗佈液所形成之塗佈膜於300℃以下之溫度下進行加熱之情形時,被膜之硬度變得不充分之虞。 When the molar ratio (M2/M3) is less than 0.1, the stability of the coating liquid is reduced and the life of the coating liquid is shortened. Therefore, there is a possibility that coating characteristics such as film thickness, refractive index, and hardness cannot be stably obtained. On the other hand, if the molar ratio (M2/M3) exceeds 9.0, when the coating film formed from the coating liquid is heated at a temperature of 300°C or lower, the hardness of the coating film becomes insufficient Yu.

若使用此種塗佈液,則藉由UV處理及低溫(80~300℃) 下之加熱處理,可形成具備充分之硬度及耐擦傷性之被膜。因此,即便對耐熱性較差之基材亦可形成具有充分之硬度及耐擦傷性之被膜,可獲得具有充分之硬度並且難以產生龜裂之附被膜基材。 If this coating liquid is used, UV treatment and low temperature (80~300℃) The following heat treatment can form a coating with sufficient hardness and scratch resistance. Therefore, a coating having sufficient hardness and scratch resistance can be formed even on a substrate with poor heat resistance, and a coating substrate with sufficient hardness and hard to crack can be obtained.

即,根據本發明,可在不向塗佈液中摻合高折射率粒子之情況下實現被膜之高折射率化(折射率1.3~2.3)。因此,可防止習知之摻合有高折射率粒子之塗佈液之課題(因藉由高活性之微粒子包圍溶劑並且進行增黏而產生之空隙而導致膜之緻密性之降低、硬度之降低、耐化學品性之降低等)。 That is, according to the present invention, the high refractive index of the coating film (refractive index 1.3 to 2.3) can be achieved without blending high-refractive-index particles into the coating liquid. Therefore, it is possible to prevent the problem of the conventional coating liquid blended with high-refractive-index particles (the void caused by the high-activity fine particles surrounding the solvent and being thickened, resulting in a decrease in the density of the film, a decrease in hardness, Chemical resistance reduction, etc.).

又,源自B成分之SiO2換算濃度(濃度C2)較佳為0.005~12質量%。若濃度C2為0.005質量%以上,則可使水解反應順利地進行,而充分地提高被膜之抗龜裂性。又,若濃度C2為12質量%以下,則水解反應不會過度進行,可獲得穩定之塗佈液。尤佳為0.01~8質量%。 In addition, the SiO 2 conversion concentration (concentration C2) derived from the component B is preferably 0.005 to 12% by mass. If the concentration C2 is 0.005 mass% or more, the hydrolysis reaction can proceed smoothly, and the crack resistance of the coating can be sufficiently improved. In addition, if the concentration C2 is 12% by mass or less, the hydrolysis reaction does not proceed excessively, and a stable coating liquid can be obtained. It is particularly preferably 0.01 to 8% by mass.

源自C成分之元素M之MOx換算濃度(濃度C3)較佳為0.02~14.25質量%。 The MO x conversion concentration (concentration C3) of the element M derived from the component C is preferably 0.02 to 14.25% by mass.

若濃度C3為0.02質量%以上,則水解反應順利地進行,被膜之抗龜裂性充分變高。又,若濃度C3為14.25質量%以下,則水解反應不會過度進行,而獲得穩定之塗佈液。尤佳為0.04~9.5質量%。 If the concentration C3 is 0.02% by mass or more, the hydrolysis reaction proceeds smoothly, and the crack resistance of the coating becomes sufficiently high. In addition, if the concentration C3 is 14.25% by mass or less, the hydrolysis reaction does not proceed excessively, and a stable coating liquid is obtained. Especially preferred is 0.04 to 9.5% by mass.

進而,濃度C2與濃度C3之合計之濃度CT較佳為0.1~15質量%。若濃度CT為0.1質量%以上,則於通常之塗佈條件下亦可獲得充分之厚度之膜,亦可減少為了獲得硬度及抗龜裂性較高之膜而重複進行塗佈之必要性。若濃度CT為15質量%以下,則通常之塗佈條件下亦可控制所獲得之膜厚,容易抑制龜裂之產生。又,塗佈液之穩定性亦變得充分, 因而可抑制經時性之黏度之上升。因此,所獲得之被膜之膜厚、折射率、硬度等特性較穩定。進而,濃度CT更佳為0.2~10質量%。 Furthermore, the concentration CT of the total of the concentration C2 and the concentration C3 is preferably 0.1 to 15% by mass. If the concentration CT is 0.1% by mass or more, a film with a sufficient thickness can be obtained under normal coating conditions, and the need to repeat coating to obtain a film with high hardness and crack resistance can also be reduced. If the concentration CT is 15% by mass or less, the thickness of the film obtained can be controlled under normal coating conditions, and the occurrence of cracks is easily suppressed. In addition, the stability of the coating solution becomes sufficient, Therefore, the increase in viscosity over time can be suppressed. Therefore, the film thickness, refractive index, hardness and other characteristics of the obtained coating are relatively stable. Furthermore, the concentration CT is more preferably 0.2 to 10% by mass.

又,於本塗佈液包含3官能矽烷化合物及其水解縮合物中之至少一者(B3成分)作為B成分之情形時,塗佈液之pH值較佳為4~8,進而更佳為4~7.5。若包含B3成分之摻合液為酸性,則3官能矽烷化合物容易以不溶性之固形物成分之形式析出,故而欠佳。 In addition, when the coating liquid contains at least one of the trifunctional silane compound and its hydrolyzed condensate (component B3) as the component B, the pH of the coating liquid is preferably 4 to 8, and more preferably 4~7.5. If the blending liquid containing the B3 component is acidic, the trifunctional silane compound is easily precipitated in the form of an insoluble solid component, which is not preferable.

又,本塗佈液所含之B成分為3官能矽烷化合物及其水解縮合物中之至少一者(B3成分)時,即,作為B成分僅包含B3成分時,B成分之莫耳數(M2)與C成分之莫耳數(M3)之莫耳比(M2/M3)需為0.5以上且8.0以下之範圍。若莫耳比(M2/M3)未達0.5,則塗佈液之穩定性降低,塗佈液壽命縮短。因此,存在無法穩定地獲得膜厚、折射率、硬度等被膜特性之情況。進而,亦有抗龜裂性降低之虞。若莫耳比(M2/M3)超過8.0,則有所獲得之被膜之硬度變得不充分,抗龜裂性降低之虞。進而,莫耳比(M2/M3)更佳為0.6以上且7.5以下。 In addition, when the B component contained in the coating liquid is at least one of the trifunctional silane compound and its hydrolyzed condensate (component B3), that is, when only the B3 component is included as the B component, the mole number of the B component ( M2) The molar ratio (M2/M3) of the molar number (M3) of the component C must be in the range of 0.5 or more and 8.0 or less. If the molar ratio (M2/M3) is less than 0.5, the stability of the coating liquid is reduced and the life of the coating liquid is shortened. Therefore, there are cases where coating characteristics such as film thickness, refractive index, and hardness cannot be stably obtained. Furthermore, there is a possibility that the crack resistance may decrease. If the molar ratio (M2/M3) exceeds 8.0, the hardness of the obtained coating may become insufficient, and the crack resistance may decrease. Furthermore, the molar ratio (M2/M3) is more preferably 0.6 or more and 7.5 or less.

同樣地,本塗佈液僅包含B3成分作為B成分時,源自C成分之元素M之MOx換算濃度(濃度C3)較佳為0.02~14質量%,進而更佳為0.04~9.5質量%。若濃度C3為14質量%以下,則水解反應不會過度進行,而獲得穩定之塗佈液。 Similarly, when the coating solution contains only the B3 component as the B component, the MO x converted concentration (concentration C3) of the element M derived from the C component is preferably 0.02 to 14% by mass, and more preferably 0.04 to 9.5% by mass . If the concentration C3 is 14% by mass or less, the hydrolysis reaction does not proceed excessively, and a stable coating liquid is obtained.

其次,對塗佈液包含3官能矽烷化合物及其水解縮合物之至少一者(B3成分)、與4官能矽烷化合物及其水解縮合物之至少一者(B4成分)之情形進行說明。B3成分之莫耳數(MB3)、與B4成分之莫耳數(MB4)之莫耳比(MB4/MB3)之值較佳為0.01以上且1以下。若莫耳比(MB4/MB3) 為0.01以上,則膜之硬度提高,若為1以下,則難以引起抗龜裂性之降低。進而,莫耳比尤佳為0.01以上且0.5以下。 Next, the case where the coating liquid contains at least one of the trifunctional silane compound and its hydrolyzed condensate (component B3) and at least one of the tetrafunctional silane compound and its hydrolyzed condensate (component B4) will be described. The values of the molar number of component B3 (M B3 ) and the molar ratio of component B4 (M B4 ) (M B4 /M B3 ) are preferably 0.01 or more and 1 or less. If the molar ratio (M B4 /M B3 ) is 0.01 or more, the hardness of the film increases, and if it is 1 or less, it is difficult to cause a decrease in crack resistance. Furthermore, the molar ratio is more preferably 0.01 or more and 0.5 or less.

此處,於B3成分或B4成分進行水解之情形時,莫耳數亦為以水解前之結構為基準之值。又,亦可包含B3成分與B4成分與C成分部之水解縮合物。 Here, when the B3 component or the B4 component is hydrolyzed, the mole number is also a value based on the structure before hydrolysis. Moreover, the hydrolyzed condensate of B3 component, B4 component, and C component part may also be included.

以下,對本發明之塗佈液所含之各成分進行詳細說明。 Hereinafter, each component contained in the coating liquid of the present invention will be described in detail.

<A成分> <component A>

A成分係可與金屬烷氧化物形成螯合物之有機化合物,可使用1種有機化合物,亦可將2種以上混合而使用。就作為螯合劑之效果之觀點而言,尤佳為使用乙醯丙酮。 The component A is an organic compound that can form a chelate compound with a metal alkoxide, and one organic compound may be used, or two or more kinds may be mixed and used. From the viewpoint of the effect as a chelating agent, it is particularly preferable to use acetone.

除此以外,作為A成分,可例示:三氟乙醯丙酮、六氟乙醯丙酮、苯甲醯丙酮、苯甲醯三氟丙酮、二苯甲醯甲烷、呋喃甲醯丙酮、三氟呋喃甲醯丙酮、苯甲醯呋喃甲醯甲烷、噻吩甲醯丙酮、三氟噻吩甲醯丙酮、呋喃甲醯噻吩甲醯丙酮、8-羥基喹啉(oxine)、2-甲基-8-羥基喹啉、4-甲基-8-羥基喹啉、5-甲基-8-羥基喹啉、6-甲基-8-羥基喹啉、7-甲基-8-羥基喹啉、8-羥基喹啉-5-磺酸、7-碘-8-羥基喹啉-5-磺酸、喹啉-2-羧酸、喹啉-8-羧酸、8-羥基

Figure 105108808-A0202-12-0009-4
啉、4-羥基-1,5-萘啶、8-羥基-1,6-萘啶、8-羥基-1,7-萘啶、5-羥基喹
Figure 105108808-A0202-12-0009-5
啉、8-羥基喹唑啉、2,2'-聯吡啶、2-(2'-噻吩基)吡啶、1,10-啡啉、2-甲基-1,10-啡啉、5-甲基-1,10-啡啉、2,9-二甲基-1,10-啡啉、4,7-二甲基-1,10-啡啉、5-氯-1,10-啡啉、6-溴-1,10-啡啉、5-硝基-1,10-啡啉、5-苯基-1,10-啡啉、4,7-二苯基-1,10-啡啉、丁二酮肟、丁二酮肟-O-甲酯、二甲基二硫代胺基甲酸、二乙基二硫代胺基甲酸、N-亞硝基苯基羥胺、1-亞硝基-2-萘酚、2-亞硝 基-1-萘酚、3-羥基黃酮、5-羥基黃酮、1-(2-吡啶基偶氮)-2-萘酚、4-(2-吡啶基偶氮)間苯二酚、2-(4'-二甲胺基苯基偶氮)吡啶、羊毛鉻黑A(Eriochrome Black A)、羊毛鉻黑T、羊毛鉻藍黑B、羊毛鉻藍黑R、酞錯合劑、烷醇胺、及羥基酸等。 In addition, as the component A, trifluoroacetone acetone, hexafluoroacetone acetone, benzoyl acetone, benzoyl trifluoroacetone, dibenzoyl methane, furan methyl acetone, trifluorofuran methyl Acetyl acetone, benzoyl furan methyl acetone, thiophene methyl acetone, trifluorothiophene methyl acetone, furan methyl thiophene methyl acetone, 8-hydroxyquinoline (oxine), 2-methyl-8-hydroxyquinoline , 4-methyl-8-hydroxyquinoline, 5-methyl-8-hydroxyquinoline, 6-methyl-8-hydroxyquinoline, 7-methyl-8-hydroxyquinoline, 8-hydroxyquinoline -5-sulfonic acid, 7-iodo-8-hydroxyquinoline-5-sulfonic acid, quinoline-2-carboxylic acid, quinoline-8-carboxylic acid, 8-hydroxyl
Figure 105108808-A0202-12-0009-4
Porphyrin, 4-hydroxy-1,5-naphthyridine, 8-hydroxy-1,6-naphthyridine, 8-hydroxy-1,7-naphthyridine, 5-hydroxyquin
Figure 105108808-A0202-12-0009-5
Porphyrin, 8-hydroxyquinazoline, 2,2'-bipyridine, 2-(2'-thienyl)pyridine, 1,10-morpholine, 2-methyl-1,10-morpholine, 5-methyl Yl-1,10-morpholine, 2,9-dimethyl-1,10-morpholine, 4,7-dimethyl-1,10-morpholine, 5-chloro-1,10-morpholine, 6-bromo-1,10-morpholine, 5-nitro-1,10-morpholine, 5-phenyl-1,10-morpholine, 4,7-diphenyl-1,10-morpholine, Butanedione oxime, butanedione oxime-O-methyl ester, dimethyldithiocarbamic acid, diethyldithiocarbamic acid, N-nitrosophenylhydroxylamine, 1-nitroso- 2-naphthol, 2-nitroso-1-naphthol, 3-hydroxyflavone, 5-hydroxyflavone, 1-(2-pyridylazo)-2-naphthol, 4-(2-pyridyl) (Nitrogen) resorcinol, 2-(4'-dimethylaminophenylazo) pyridine, wool chrome black A (Eriochrome Black A), wool chrome black T, wool chrome blue black B, wool chrome blue black R , Phthalic acid complexing agent, alkanolamine, and hydroxy acid, etc.

作為A成分,尤其適合為下述式(1)所表示之具有2個以上羰基之羰基化合物。 As the component A, a carbonyl compound having two or more carbonyl groups represented by the following formula (1) is particularly suitable.

Figure 105108808-A0202-12-0010-1
Figure 105108808-A0202-12-0010-1

式(1)中,R1為碳數1~10之有機基。R2為碳數1~10之有機基或羥基。作為R1,例如可列舉:甲基、乙基、異丙基、苯基、呋喃基、噻吩基、三氟甲基、甲氧基、及乙氧基等。尤佳為甲基、乙基、及乙氧基。關於R2,例如可例示:甲基、乙基、異丙基、苯基、呋喃基、噻吩基、三氟基、甲氧基、及乙氧基等作為有機基。 In formula (1), R 1 is an organic group having 1 to 10 carbon atoms. R 2 is an organic group having 1 to 10 carbon atoms or a hydroxyl group. Examples of R 1 include methyl, ethyl, isopropyl, phenyl, furyl, thienyl, trifluoromethyl, methoxy, and ethoxy. Particularly preferred are methyl, ethyl, and ethoxy. Regarding R 2 , for example, methyl, ethyl, isopropyl, phenyl, furyl, thienyl, trifluoro, methoxy, and ethoxy groups can be exemplified as organic groups.

<B成分> <component B>

藉由摻合B成分(3官能以上之矽烷化合物),塗佈膜(透明被膜)之硬度或抗龜裂性提高。尤其是,3官能矽烷化合物由於具有大體積之非官能性之有機基(碳數1至8之未經取代或經取代之烷基、未經取代或經取代之芳基、及乙烯基),故而對被膜賦予可撓性,進而提高被膜與基材(有機材料)之潤濕性。因此,抗龜裂性進一步提高。又,於藉由成膜步驟中之紫外線照射而使有機基之至少一部分發生分解之情形時,亦可緩和應力集中,因此此情況亦有助於提昇抗龜裂性。 By blending the B component (a silane compound with 3 or more functions), the hardness or crack resistance of the coating film (transparent coating) is improved. In particular, the trifunctional silane compound has a large volume of non-functional organic groups (unsubstituted or substituted alkyl groups having 1 to 8 carbon atoms, unsubstituted or substituted aryl groups, and vinyl groups), Therefore, the film is given flexibility, and the wettability between the film and the substrate (organic material) is improved. Therefore, the crack resistance is further improved. In addition, in the case where at least a part of the organic group is decomposed by ultraviolet irradiation in the film forming step, stress concentration can also be relieved, so this case also contributes to improving crack resistance.

於上述式(2)之R3及R4中,作為碳數1至8之未經取代烷 氧基,可列舉:甲氧基、乙氧基、異丙氧基、及丁氧基等。同樣地,作為經取代之烷氧基,可列舉將上述未經取代烷氧基之氫原子取代為甲基、乙基等而成之基。作為芳氧基,可列舉:苯氧基、及萘氧基等。作為鹵素原子,可列舉:氟原子、氯原子、溴原子、及碘原子等。 In R 3 and R 4 of the above formula (2), examples of the unsubstituted alkoxy group having 1 to 8 carbon atoms include methoxy, ethoxy, isopropoxy, butoxy and the like. Similarly, as the substituted alkoxy group, a group obtained by substituting a hydrogen atom of the above-mentioned unsubstituted alkoxy group with a methyl group, an ethyl group, or the like. Examples of the aryloxy group include phenoxy group and naphthoxy group. Examples of halogen atoms include fluorine atoms, chlorine atoms, bromine atoms, and iodine atoms.

又,作為3官能矽烷化合物,可較佳地列舉:甲基三甲氧基矽烷(MTMS)、甲基三乙氧基矽烷(MTES)、乙基三乙氧基矽烷(ETES)、甲基三異丙氧基矽烷、乙基三甲氧基矽烷、乙基三異丙氧基矽烷、辛基三甲氧基矽烷、辛基三乙氧基矽烷、乙烯基三甲氧基矽烷、乙烯基三乙氧基矽烷、苯基三甲氧基矽烷、苯基三乙氧基矽烷、三氟甲基三甲氧基矽烷、三氟甲基三乙氧基矽烷、γ-(甲基)丙烯醯氧基丙基二甲氧基矽烷、及γ-(甲基)丙烯醯氧基丙基二乙氧基矽烷等。該等可使用1種,亦可將任意2種以上混合而使用。但是,若R3成為過長之長鏈,則有難以獲得充分之硬度之虞。又,若R3互不相同,則水解速度產生差異,變得難以引起均勻之反應,因此較佳為使用甲基三甲氧基矽烷(MTMS)。 Further, as the trifunctional silane compound, preferably, methyl trimethoxy silane (MTMS), methyl triethoxy silane (MTES), ethyl triethoxy silane (ETES), methyl triiso Propoxysilane, ethyltrimethoxysilane, ethyltriisopropoxysilane, octyltrimethoxysilane, octyltriethoxysilane, vinyltrimethoxysilane, vinyltriethoxysilane , Phenyltrimethoxysilane, phenyltriethoxysilane, trifluoromethyltrimethoxysilane, trifluoromethyltriethoxysilane, γ-(meth)acryloxypropyldimethoxy Silane, and γ-(meth)acryl propylpropyl diethoxy silane, etc. One of these may be used, or any two or more of them may be mixed and used. However, if R 3 becomes an excessively long chain, it may be difficult to obtain sufficient hardness. In addition, if R 3 is different from each other, the hydrolysis rate is different and it becomes difficult to cause a uniform reaction. Therefore, it is preferable to use methyltrimethoxysilane (MTMS).

作為4官能矽烷化合物,可列舉:四甲氧基矽烷、四乙氧基矽烷、四丙氧基矽烷、四異丙氧基矽烷、四丁氧基矽烷、四氯矽烷、三甲氧基矽烷等。尤佳為四乙氧基矽烷。 Examples of the tetrafunctional silane compound include tetramethoxysilane, tetraethoxysilane, tetrapropoxysilane, tetraisopropoxysilane, tetrabutoxysilane, tetrachlorosilane, and trimethoxysilane. Particularly preferred is tetraethoxysilane.

4官能矽烷化合物可單獨使用1種,亦可將多種組合而使用。 The 4-functional silane compound may be used alone or in combination.

〈C成分〉 <Component C>

如上所述,C成分係式(3)所表示之金屬烷氧化物及其水解縮合物之至少一者。C成分之金屬元素M係選擇除Si以外之金屬元素。具體而言,使用金屬元素M為選自Be、Al、Sc、Ti、V、Cr、Fe、Ni、Zn、 Ga、Ge、As、Se、Y、Zr、Nb、In、Sn、Sb、Te、Hf、Ta、W、Pb、B、Bi、Ce及Cu中之至少1種元素之烷氧化物。尤佳為Ti、Al、Zr。 As described above, the component C is at least one of the metal alkoxide represented by formula (3) and its hydrolyzed condensate. The metal element M of the component C is a metal element other than Si. Specifically, the metal element M is selected from Be, Al, Sc, Ti, V, Cr, Fe, Ni, Zn, Alkoxides of at least one element of Ga, Ge, As, Se, Y, Zr, Nb, In, Sn, Sb, Te, Hf, Ta, W, Pb, B, Bi, Ce and Cu. Particularly preferred are Ti, Al, and Zr.

關於作為C成分之金屬烷氧化物,可列舉:三甲醇鋁、三乙醇鋁、三丙醇鋁、三異丙醇鋁、三正丁醇鋁、三異丁醇鋁、三第三丁醇鋁、三戊醇鋁、三己醇鋁、三辛醇鋁、三苄醇鋁、三苯酚鋁、三甲氧基乙醇鋁、三甲氧基乙氧基乙醇鋁、三甲氧基丙醇鋁、四甲醇鈦、四乙醇鈦、四丙醇鈦、四異丙醇鈦、四甲氧基乙醇鈦、四丁醇鈦、四甲醇鋯、四乙醇鋯、四丙醇鋯、四異丙醇鋯、四甲氧基乙醇鋯、四丁醇鋯、五乙醇鈮、三甲醇銦、三乙醇銦、三丙醇銦、三異丙醇銦、三正丁醇銦、三異丁醇銦、三第三丁醇銦、三戊醇銦、三己醇銦、三辛醇銦、三苄醇銦、三苯酚銦、三甲氧基乙醇銦、三甲氧基乙氧基乙醇銦、三甲氧基丙醇銦、三甲醇銻、三乙醇銻、三丙醇銻、三異丙醇銻、三正丁醇銻、及三異丁醇銻等。該等可使用1種亦可將任意2種以上混合而使用,就水解速度適當且容易取得之觀點而言,較佳為使用四異丙醇鈦、四丙醇鋯。 Examples of the metal alkoxides as component C include aluminum trimethoxide, aluminum triethoxide, aluminum tripropoxide, aluminum triisopropoxide, aluminum tri-n-butoxide, aluminum triisobutoxide, and aluminum tributoxide. , Aluminum tripentoxide, aluminum trihexanol, aluminum trioctoxide, aluminum tribenzyl alcohol, aluminum triphenol, aluminum trimethoxyethanol, aluminum trimethoxyethoxyethanol, aluminum trimethoxypropoxide, titanium tetramethoxide , Titanium tetraethoxide, titanium tetrapropoxide, titanium tetraisopropoxide, titanium tetramethoxyethoxide, titanium tetrabutoxide, zirconium tetramethoxide, zirconium tetraethoxide, zirconium tetrapropoxide, zirconium tetraisopropoxide, tetramethoxy Zirconium ethoxide, zirconium tetrabutoxide, niobium pentaethanol, indium trimethoxide, indium triethanolate, indium tripropoxide, indium triisopropoxide, indium tributoxide, indium triisobutoxide, indium tributoxide , Indium triamyl alcohol, indium trihexanol, indium trioctyl alcohol, indium tribenzyl alcohol, indium triphenol, indium trimethoxyethanol, indium trimethoxyethoxyethanol, indium trimethoxypropanol, antimony trimethoxide , Antimony triethanol, antimony tripropanol, antimony triisopropanol, antimony tributanol, antimony triisobutanol, etc. One of these may be used alone, or any two or more of them may be mixed and used. From the viewpoint of an appropriate hydrolysis rate and easy availability, titanium tetraisopropoxide and zirconium tetrapropoxide are preferably used.

〈D成分〉 <Component D>

於本塗佈液中,存在源自製造步驟之水解用觸媒殘留0.2質量%左右之情況。根據本塗佈液之用途,期望將水解用觸媒去除。於該情形時,例如可藉由離子交換、中和、蒸餾等將水解用觸媒去除。於進行中和之情形時,酸中和物質殘留於本塗佈液體中。以下,對中和處理之情形進行詳細說明。 In this coating liquid, the catalyst for hydrolysis derived from the manufacturing process may remain at about 0.2% by mass. According to the application of the coating liquid, it is desirable to remove the catalyst for hydrolysis. In this case, for example, the catalyst for hydrolysis can be removed by ion exchange, neutralization, distillation, or the like. In the case of neutralization, the acid-neutralizing substance remains in the coating liquid. Hereinafter, the case of the neutralization process will be described in detail.

D成分係為了將塗佈液之pH值設為4~8而添加之酸中和物質。於包含3官能矽烷化合物(B3成分)作為上述B成分之情形時,B3 成分被酸觸媒等水解用觸媒所水解。為了將摻合液恢復至中性而添加酸中和物質。若摻合液為酸性之狀態,則3官能矽烷化合物容易以不溶性之固形物成分之形式析出,故而欠佳。本塗佈液體中所含之D成分較佳為1質量%以下。 Component D is an acid-neutralizing substance added to set the pH of the coating solution to 4 to 8. When a trifunctional silane compound (component B3) is included as the above component B, B3 The components are hydrolyzed by an acid catalyst and other hydrolysis catalysts. In order to restore the blended liquid to neutrality, an acid neutralizing substance is added. If the blending liquid is in an acidic state, the trifunctional silane compound is easily precipitated in the form of an insoluble solid component, which is not preferable. The D component contained in the coating liquid is preferably 1% by mass or less.

關於酸中和物質,就金屬雜質之混入、向有機溶劑中之溶解性之觀點而言,適宜為胺化合物。作為胺化合物,可列舉:三乙醇胺、二乙醇胺、單乙醇胺、三甲基胺、乙二胺、哌啶、苯胺、及吡啶等。可使用1種酸中和物質,亦可將任意2種以上酸中和物質混合而使用。 The acid-neutralizing substance is preferably an amine compound from the viewpoint of mixing of metal impurities and solubility in an organic solvent. Examples of the amine compound include triethanolamine, diethanolamine, monoethanolamine, trimethylamine, ethylenediamine, piperidine, aniline, and pyridine. One kind of acid-neutralizing substance may be used, or any two or more kinds of acid-neutralizing substances may be mixed and used.

〈混合溶劑〉 <Mixed solvent>

本塗佈液中使用水及有機溶劑之混合溶劑。但是,作為有機溶劑,排除可與上述成分(A)金屬烷氧化物形成螯合物之有機化合物(A成分)。作為水與有機溶劑之混合比率,較佳為水/有機溶劑(質量比)為20/80~0.1/99.9,更佳為10/90~1/99。關於有機溶劑,沸點較佳為120℃以上。更佳為150℃以上。其中,沸點較佳為300℃以下。又,於20℃之有機溶劑之黏度較佳為1~400mPa‧s之範圍,更佳為20~350mPa‧s之範圍。又,於混合多種有機溶劑之情形時,沸點為120℃以上、於20℃之黏度為1~400mPa‧s之有機溶劑較佳為50質量%以上,更佳為60質量%以上。 A mixed solvent of water and organic solvent is used in this coating solution. However, as the organic solvent, an organic compound (component A) that can form a chelate compound with the metal alkoxide of the above component (A) is excluded. As the mixing ratio of water and organic solvent, water/organic solvent (mass ratio) is preferably 20/80 to 0.1/99.9, more preferably 10/90 to 1/99. Regarding the organic solvent, the boiling point is preferably 120°C or higher. More preferably, it is 150°C or higher. Among them, the boiling point is preferably 300° C. or lower. In addition, the viscosity of the organic solvent at 20°C is preferably in the range of 1 to 400 mPa‧s, and more preferably in the range of 20 to 350 mPa‧s. In the case of mixing a plurality of organic solvents, the organic solvent having a boiling point of 120° C. or higher and a viscosity of 1 to 400 mPa‧s at 20° C. is preferably 50% by mass or more, and more preferably 60% by mass or more.

作為有機溶劑,可列舉:甲醇、乙醇、異丙醇、丁醇、二丙酮醇、呋喃甲醇、乙二醇、己二醇等醇類;乙酸甲酯、乙酸乙酯等酯類;二乙醚、乙二醇單甲醚、乙二醇單乙醚、二乙二醇單甲醚、二乙二醇單乙醚、二乙二醇單丁醚、丙二醇單甲醚、丙二醇單丙醚等醚類;丙酮、及甲基乙基酮等酮類等。 Examples of organic solvents include alcohols such as methanol, ethanol, isopropanol, butanol, diacetone alcohol, furan methanol, ethylene glycol, and hexanediol; esters such as methyl acetate and ethyl acetate; diethyl ether, Ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, propylene glycol monomethyl ether, propylene glycol monopropyl ether and other ethers; acetone , And ketones such as methyl ethyl ketone.

再者,於本塗佈液中,於不妨礙其效果之範圍,可添加任意成分。例如,亦可添加無機氧化物微粒子、有機樹脂微粒子、有機聚矽氧烷樹脂微粒子、顏料、著色料、抗靜電劑、及界面活性劑等。 In addition, in this coating liquid, arbitrary components can be added within a range that does not hinder its effect. For example, inorganic oxide fine particles, organic resin fine particles, organic polysiloxane resin fine particles, pigments, colorants, antistatic agents, and surfactants may also be added.

[本塗佈液之製造方法] [Manufacturing method of this coating liquid]

本塗佈液之製造方法包括下述步驟1、步驟2及步驟3。 The manufacturing method of the coating liquid includes the following steps 1, 2 and 3.

步驟1:將有機溶劑、水、B成分(式(2)所表示之3官能以上之矽烷化合物)及水解觸媒進行摻合,而製備預備液1之步驟 Step 1: The organic solvent, water, component B (a silane compound with more than 3 functions represented by formula (2)) and a hydrolysis catalyst are blended to prepare the preparation solution 1

此處,於B成分使用4官能矽烷化合物之情形時,B成分之摻合量相對於步驟2中之C成分之金屬元素M之1莫耳,為0.1莫耳以上且9.0莫耳以下之範圍。 Here, when a 4-functional silane compound is used as the component B, the blending amount of the component B is in a range of 0.1 mol or more and 9.0 mol or less with respect to 1 mole of the metal element M of the C component in step 2 .

又,於B成分使用3官能矽烷化合物之情形時,B成分之摻合量相對於步驟2中之C成分之金屬元素M之1莫耳,為0.5莫耳以上且8.0莫耳以下之範圍。進而,實施中和處理,而將預備液1之pH值調整為5~8之範圍。 In addition, when the trifunctional silane compound is used as the component B, the blending amount of the component B is in the range of 0.5 mol or more and 8.0 mol or less with respect to 1 mole of the metal element M of the C component in step 2. Furthermore, the neutralization process was implemented, and the pH value of the preliminary solution 1 was adjusted to the range of 5-8.

步驟2:將有機溶劑、A成分、及C成分(式(3)所表示之金屬烷氧化物)進行摻合,而製備金屬烷氧化物溶液(預備液2)之步驟 Step 2: The step of preparing a metal alkoxide solution (preparation solution 2) by blending an organic solvent, component A, and component C (metal alkoxide represented by formula (3))

此處,A成分相對於C成分之金屬元素M之1莫耳,為0.25莫耳以上且未達2莫耳之範圍。 Here, the component A is in a range of 0.25 mol or more and less than 2 mol relative to 1 mol of the metal element M of the C component.

步驟3:將於步驟1中所獲得之預備液1、於步驟2中所獲得之預備液2、及水進行摻合,且於5℃以上且40℃以下之溫度下進行攪拌之步驟 Step 3: The preparation solution 1 obtained in step 1 and the preparation solution 2 obtained in step 2 and water are blended, and the stirring step is performed at a temperature of 5°C or higher and 40°C or lower

以下,對上述各步驟進行詳細說明。 Hereinafter, the above steps will be described in detail.

<步驟1> <Step 1>

於B成分使用4官能矽烷化合物之情形時,於有機溶劑、水及水解用觸媒之存在下,使4官能矽烷化合物水解縮合,而製備4官能矽烷化合物及其水解縮合物之至少一者分散至混合溶劑中而成之溶液(預備液1)。或者,於B成分使用3官能矽烷化合物之情形時,於有機溶劑、水及水解用觸媒之存在下,使3官能矽烷化合物水解縮合,進而實施中和而將溶液之pH值設為5~8之範圍。藉由上述方式,可獲得3官能矽烷化合物及其水解縮合物中之至少一者分散至混合溶劑中而成之預備液1。通常,於該步驟1中,於有機溶劑中添加水、水解用觸媒、B成分,於5~40℃進行5~120分鐘之攪拌,而獲得預備液1。 When the 4-functional silane compound is used as the component B, the 4-functional silane compound is hydrolyzed and condensed in the presence of an organic solvent, water and a catalyst for hydrolysis, and at least one of the 4-functional silane compound and its hydrolyzed condensate is prepared and dispersed Solution prepared in mixed solvent (preparation solution 1). Alternatively, when the trifunctional silane compound is used as the component B, the trifunctional silane compound is hydrolyzed and condensed in the presence of an organic solvent, water and a catalyst for hydrolysis, and then neutralized to set the pH value of the solution to 5~ The scope of 8. In the above manner, it is possible to obtain a preliminary liquid 1 in which at least one of the trifunctional silane compound and its hydrolyzed condensate is dispersed in a mixed solvent. Generally, in this step 1, water, a catalyst for hydrolysis, and component B are added to an organic solvent, and the mixture is stirred at 5 to 40° C. for 5 to 120 minutes to obtain a preliminary solution 1.

作為水解用觸媒,可使用(a)硝酸、乙酸、鹽酸、硫酸、硝酸、磷酸、氟化氫等無機酸、(b)草酸、順丁烯二酸等羧酸、(c)甲磺酸等磺酸、及(d)酸性或弱酸性之無機鹽等觸媒。但是,並不限定於該等。又,亦可將多種該等觸媒任意地進行混合。水解觸媒之量相對於B成分之3官能以上之矽烷化合物,較佳為0.001~1莫耳%(SiO2換算、外加比例)之範圍內。 As the catalyst for hydrolysis, inorganic acids such as (a) nitric acid, acetic acid, hydrochloric acid, sulfuric acid, nitric acid, phosphoric acid, and hydrogen fluoride, (b) carboxylic acids such as oxalic acid and maleic acid, and (c) sulfonic acids such as methanesulfonic acid can be used. Acid and (d) acidic or weakly acidic inorganic salts and other catalysts. However, it is not limited to these. Also, a plurality of these catalysts may be arbitrarily mixed. The amount of the hydrolysis catalyst is preferably in the range of 0.001 to 1 mol% (SiO 2 conversion, external ratio) relative to the trifunctional silane compound of component B or more.

水之量相對於B成分之3官能以上之矽烷化合物1莫耳,較佳為0.5~10莫耳(SiO2換算、外加比例)之範圍。只要為該莫耳比之範圍,則於有效地促進B成分之水解方面有效。再者,水之量更佳為1~8莫耳之範圍。 The amount of water is preferably in the range of 0.5 to 10 mol (SiO 2 conversion, external ratio) with respect to 1 mol of the trifunctional silane compound of component B or more. As long as it is within the range of this molar ratio, it is effective in effectively promoting the hydrolysis of the component B. Furthermore, the amount of water is more preferably in the range of 1-8 moles.

關於B成分於預備液1中之量,只要為可進行水解縮合之程度,則無特別限定,較佳為0.01~8質量%(SiO2換算)之範圍。 The amount of the component B in the preliminary solution 1 is not particularly limited as long as it can be hydrolyzed and condensed, and is preferably in the range of 0.01 to 8% by mass (in terms of SiO 2 ).

又,於B成分為3官能矽烷化合物之情形時,產生3官能 矽烷化合物之水解縮合物後,為了將摻合液恢復至中性而添加酸中和物質。若包含B成分之摻合液為酸性之狀態,則3官能矽烷化合物容易以不溶性之固形物成分之形式析出,故而欠佳。此處,推薦3官能矽烷溶液之pH值較佳為5~8,更佳為pH值6~7.5。 In addition, when component B is a trifunctional silane compound, trifunctional After the hydrolyzed condensate of the silane compound, an acid-neutralizing substance is added in order to restore the admixture to neutrality. If the blending liquid containing the component B is in an acidic state, the trifunctional silane compound is likely to be precipitated as an insoluble solid component, which is not preferable. Here, it is recommended that the pH value of the trifunctional silane solution is preferably 5 to 8, more preferably the pH value is 6 to 7.5.

再者,酸中和物質(D成分)並非必須。亦可不藉由添加酸中和物質,而使用離子交換樹脂,將水解用觸媒去除,而將pH值設為5~8。 Furthermore, the acid-neutralizing substance (component D) is not necessary. Instead of adding acid-neutralizing substances, ion exchange resins can be used to remove the hydrolysis catalyst and set the pH to 5-8.

<步驟2> <Step 2>

於該步驟中,於有機溶劑中添加A成分及C成分(式(3)所表示之金屬烷氧化物),並進行攪拌,藉此製備包含金屬烷氧化物或其水解縮合物之金屬烷氧化物溶液(預備液2)。有機溶劑、A成分或C成分如上所述。 In this step, component A and component C (metal alkoxide represented by formula (3)) are added to the organic solvent and stirred, thereby preparing metal alkoxide including metal alkoxide or its hydrolyzed condensate Material solution (preparation solution 2). The organic solvent, component A or component C is as described above.

該步驟中之A成分之莫耳數(M1)相對於C成分之莫耳數(M3)之莫耳比(M1/M3)為0.25以上且未達2.0之範圍。於該步驟中,A成分會與C成分之烷氧基進行配位,若莫耳比(M1/M3)為0.25以上且未達2.0之範圍,則會殘存未與A成分所具有之螯合物配位基進行配位之金屬烷氧化物,故而可控制C成分之反應性。再者,莫耳比(M1/M3)更佳為0.5以上且1.0以下之範圍。 In this step, the molar ratio (M1) of the component A (M1) to the molar number (M3) of the component C (M1/M3) is 0.25 or more and less than 2.0. In this step, the component A will coordinate with the alkoxy group of the component C. If the molar ratio (M1/M3) is 0.25 or more and less than 2.0, the chelation that is not with the component A will remain. The metal alkoxide whose coordination group is coordinated can control the reactivity of the C component. Furthermore, the molar ratio (M1/M3) is more preferably in the range of 0.5 or more and 1.0 or less.

於莫耳比(M1/M3)為2.0以上之情形時,由於過度進行金屬烷氧化物針對烷氧基之配位,故而有金屬烷氧化物之穩定化過大,對與B成分之共水解縮合產生影響,而變得不適合於被膜形成用塗佈液之低溫硬化(80~300℃)之虞。 In the case where the molar ratio (M1/M3) is 2.0 or more, the coordination of the metal alkoxide to the alkoxy group is excessively performed, so the stabilization of the metal alkoxide is too large, and the co-hydrolysis condensation with the component B It may cause an effect and become unsuitable for low-temperature curing (80 to 300°C) of the coating liquid for film formation.

藉由該步驟所獲得之金屬烷氧化物溶液包含配位有A成分 之金屬烷氧化物或其水解縮合物。 The metal alkoxide solution obtained by this step contains the component A coordinated Metal alkoxide or its hydrolyzed condensate.

<步驟3> <Step 3>

於步驟1中所製備之3官能以上之矽烷溶液(預備液1)中,添加步驟2中所製備之金屬烷氧化物溶液(預備液2),繼而添加水,於5~40℃進行攪拌,而獲得本塗佈液。 Add the metal alkoxide solution (preparation solution 2) prepared in step 2 to the silane solution (preparation solution 1) prepared with more than 3 functions prepared in step 1, then add water and stir at 5~40°C. And this coating liquid was obtained.

就抗龜裂性之觀點而言,於該步驟前,預備液1所含之B成分、即水解縮合後之B成分之重量平均分子量(聚苯乙烯換算)較佳為300~3000之範圍。再者,B成分之重量平均分子量更佳為500~1500之範圍。此處,重量平均分子量係藉由GPC而求出。 From the viewpoint of crack resistance, before this step, the weight average molecular weight (in terms of polystyrene) of the component B contained in the preliminary solution 1, that is, the component B after hydrolysis and condensation is preferably in the range of 300 to 3000. Furthermore, the weight average molecular weight of component B is more preferably in the range of 500 to 1500. Here, the weight average molecular weight is determined by GPC.

此處,於B成分為4官能矽烷化合物之情形時,B成分之莫耳數(M2)與C成分之莫耳數(M3)之莫耳比(M2/M3)為0.1以上且9.0以下,較佳為0.2以上且5.0以下之範圍。於B成分為3官能矽烷化合物之情形時,B成分之莫耳數(M2)與C成分之莫耳數(M3)之莫耳比(M2/M3)為0.5以上且8以下,較佳為0.6以上且7.5以下之範圍。其原因在於,若莫耳比(M2/M3)為該等範圍內,則共水解反應會順利進行。 Here, when the component B is a 4-functional silane compound, the molar ratio (M2/M3) of the molar number (M2) of the component B and the molar number (M3) of the component C is 0.1 or more and 9.0 or less, It is preferably in the range of 0.2 or more and 5.0 or less. In the case where the component B is a trifunctional silane compound, the molar ratio (M2/M3) of the component B (M2) to the molar number (M3) of the component C is 0.5 or more and 8 or less, preferably 0.6 to 7.5. The reason is that if the molar ratio (M2/M3) is within these ranges, the co-hydrolysis reaction will proceed smoothly.

藉由添加水,可促進3官能以上之矽烷之水解縮合物、與金屬烷氧化物之至少一者之共水解縮合反應,因此於獲得緻密之被膜之方面而言較佳。 By adding water, it is possible to promote the co-hydrolysis condensation reaction of at least one of trifunctional silane hydrolyzate and metal alkoxide, so it is preferable in terms of obtaining a dense coating.

再者,於B成分包含3官能矽烷化合物之情形時,本塗佈液之pH值較佳為4~8,更佳為4~7.5。 Furthermore, when the component B contains a trifunctional silane compound, the pH value of the coating solution is preferably 4-8, more preferably 4-7.5.

[附被膜基材之製造方法] [Manufacturing method of base material with coating]

附被膜基材之製造方法包括:塗佈步驟,其係將本塗佈液塗 佈至基材;乾燥步驟,其使基材上之塗佈液乾燥而形成塗佈膜;及硬化步驟,其係使基材上之塗佈膜硬化而形成附被膜基材。對該乾燥步驟及硬化步驟進而詳細地進行說明,乾燥步驟係由將基材上之塗佈液於80℃以上且150℃以下之溫度下進行加熱之步驟所構成,硬化步驟係由對乾燥步驟後之附塗佈膜之基材照射紫外線之照射步驟及於80℃以上且300℃以下之溫度下進行加熱之加熱步驟所構成。 The manufacturing method of the base material with coating includes: a coating step, which is to coat the coating liquid The cloth is applied to the substrate; the drying step is to dry the coating liquid on the substrate to form a coating film; and the curing step is to harden the coating film on the substrate to form a coating film substrate. The drying step and the hardening step will be described in further detail. The drying step is composed of a step of heating the coating liquid on the substrate at a temperature of 80° C. or higher and 150° C. or lower, and the curing step is a step of drying The subsequent step of irradiating the substrate with the coating film to ultraviolet rays and a heating step of heating at a temperature of 80° C. or more and 300° C. or less.

作為將本塗佈液塗佈至基材之塗佈方法,可採用浸漬法、旋轉塗佈法、棒式塗佈法、噴霧法、輥式塗佈法、軟版印刷法、狹縫式塗佈法等先前公知之方法。作為基材,例如可列舉:使用有玻璃、經ITO膜處理之基材、聚碳酸酯、丙烯酸樹脂、PET、及TAC等素材之片、膜、及板等。 As the coating method for applying the coating liquid to the substrate, a dipping method, a spin coating method, a bar coating method, a spray method, a roll coating method, a flexographic printing method, and a slit coating method can be used Bufa and other previously known methods. Examples of the base material include sheets, films, and plates using materials such as glass, ITO film-treated substrates, polycarbonate, acrylic resin, PET, and TAC.

於乾燥步驟中,只要可於不使基材變質之情況下獲得所需之硬度、抗龜裂性等,則對加熱溫度並無特別限定,較佳為80~150℃之範圍,更佳為90~140℃之範圍。又,於乾燥步驟中,較佳為加熱1~10分鐘左右。 In the drying step, the heating temperature is not particularly limited as long as the required hardness, crack resistance, etc. can be obtained without deteriorating the base material, preferably in the range of 80 to 150°C, more preferably The range of 90~140℃. In addition, in the drying step, it is preferably heated for about 1 to 10 minutes.

於乾燥步驟中,只要可獲得具有所需之硬度、抗龜裂性等之被膜,則可於一次之步驟操作中實施乾燥及加熱,亦可於乾燥後於高於乾燥溫度之溫度下進行加熱。作為乾燥方法或加熱方法,可使用先前公知之方法。又,亦可併用電磁波照射處理。 In the drying step, as long as a coating with the required hardness, crack resistance, etc. is obtained, it can be dried and heated in one step operation, or it can be heated at a temperature higher than the drying temperature after drying . As the drying method or heating method, a previously known method can be used. In addition, electromagnetic wave irradiation treatment may be used together.

於乾燥步驟中之加熱溫度未達80℃之情形時,因溶劑之殘存、或者-M-O-M-、或-M-O-Si-之交聯不足,而無法獲得充分之膜強度,若加熱乾燥溫度超過150℃,則存在B成分之有機基發生分解,而無法獲得所需膜特性之情況。 In the case where the heating temperature in the drying step does not reach 80°C, sufficient film strength cannot be obtained due to the residual solvent or insufficient crosslinking of -MOM- or -MO-Si-. If the heating and drying temperature exceeds 150 At ℃, the organic group of component B may be decomposed and the desired film characteristics may not be obtained.

於照射步驟中,對藉由乾燥步驟而乾燥之透明被膜照射紫外線(UV)。例如使用2kw之高壓水銀燈照射3,000mJ/cm2之紫外線。藉由UV照射,於被膜內產生A成分之脫附,被膜成為於加熱步驟中容易交聯之狀態。 In the irradiation step, the transparent film dried by the drying step is irradiated with ultraviolet rays (UV). For example, a 2kw high-pressure mercury lamp is used to irradiate 3,000mJ/cm 2 of ultraviolet rays. By UV irradiation, desorption of component A occurs in the coating, and the coating becomes in a state of being easily crosslinked during the heating step.

於照射步驟之後,將被膜於80~300℃之範圍進行加熱。藉由該加熱步驟,透明被膜成為充分地進行交聯之狀態。若加熱溫度為80~300℃之範圍,例如可抑制ITO配線之電阻變化。再者,加熱時間較佳為1~10分鐘。 After the irradiation step, the coating is heated in the range of 80 to 300°C. By this heating step, the transparent film becomes fully crosslinked. If the heating temperature is in the range of 80 to 300°C, for example, the resistance change of the ITO wiring can be suppressed. Furthermore, the heating time is preferably from 1 to 10 minutes.

[附被膜基材] [Substrates with coating]

藉由上述成膜方法所獲得之被膜之平均膜厚(T)較佳為20~200nm,更佳為40~150nm之範圍。若被膜之平均膜厚(T)為20nm以上,則因膜厚較充分而難以產生無法成膜之部分(塗佈不均),亦可充分地獲得成膜之效果。另一方面,若平均膜厚(T)為200nm以下,則可充分地抑制龜裂之產生,又,膜之硬度亦變得充分。 The average film thickness (T) of the film obtained by the above film forming method is preferably 20 to 200 nm, more preferably 40 to 150 nm. If the average film thickness (T) of the coating is 20 nm or more, it is difficult to produce a portion where the film cannot be formed (uneven coating) because the film thickness is sufficient, and the effect of film formation can also be sufficiently obtained. On the other hand, if the average film thickness (T) is 200 nm or less, the occurrence of cracks can be sufficiently suppressed, and the hardness of the film becomes sufficient.

本發明之被膜可較佳地用於液晶顯示裝置之電極基板與配向膜間所使用之絕緣膜、觸控面板之透明電極上之保護膜等。 The coating of the present invention can be preferably used for an insulating film used between an electrode substrate and an alignment film of a liquid crystal display device, a protective film on a transparent electrode of a touch panel, and the like.

實施例Examples

以下,對用以形成透明被膜之塗佈液之實施例進行具體說明。本塗佈液可應用於觸控面板之透明電極上之保護膜等。本發明並不限定於該等實施例。 Hereinafter, examples of the coating liquid for forming a transparent coating will be specifically described. The coating liquid can be applied to the protective film on the transparent electrode of the touch panel. The invention is not limited to these embodiments.

[實施例1] [Example 1]

《透明被膜形成用之塗佈液之製備》 "Preparation of Coating Liquid for Forming Transparent Coating"

(步驟1) (step 1)

將己二醇(和光純藥股份有限公司製造)4507.86g、純水214.93g及濃度61質量%之硝酸3.58g進行混合,並攪拌5分鐘。繼而,一面進行攪拌一面添加作為B成分(4官能矽烷化合物)之矽酸乙酯(多摩化學股份有限公司製造:SiO2濃度28.8質量%)1243.78g,並攪拌30分鐘。如此,獲得固形物成分濃度6.0質量%之預備液1。 4507.86 g of hexanediol (made by Wako Pure Chemical Industries, Ltd.), 214.93 g of pure water, and 3.58 g of nitric acid with a concentration of 61% by mass were mixed and stirred for 5 minutes. Subsequently, 1243.78 g of ethyl silicate (product of Tama Chemical Co., Ltd.: SiO 2 concentration 28.8% by mass) as a component B (4-functional silane compound) was added while stirring, and stirred for 30 minutes. In this way, the preliminary solution 1 having a solid content concentration of 6.0% by mass was obtained.

(步驟2) (Step 2)

將己二醇(和光純藥股份有限公司製造)297.97g、作為A成分之乙醯丙酮(和光純藥股份有限公司製造)149.25g、作為C成分之鈦酸四異丙酯(Matsumoto Fine Chemical股份有限公司製造:Orgatix TA-10,TiO2濃度28質量%)852.88g進行混合,並攪拌5分鐘。藉此,獲得固形物成分濃度6.0質量%之預備液2。 Hexanediol (made by Wako Pure Chemical Industries, Ltd.) 297.97g, acetone as component A (made by Wako Pure Chemical Industries, Ltd.) 149.25g, tetraisopropyl titanate (Matsumoto Fine Chemical Co., Ltd.) as component C Manufactured by Co., Ltd.: Organix TA-10, TiO 2 concentration 28% by mass) 852.88g was mixed and stirred for 5 minutes. By this, the preliminary solution 2 having a solid content concentration of 6.0% by mass was obtained.

(步驟3) (Step 3)

一面進行攪拌一面將預備液2混合至預備液1中,攪拌10分鐘後,添加純水49.75g,於5℃攪拌144小時。攪拌結束後,利用0.2μm之過濾器進行過濾,將凝集物等去除而製備濃度CT為6.0質量%之塗佈液。 While stirring, the preliminary liquid 2 was mixed into the preliminary liquid 1, and after stirring for 10 minutes, 49.75 g of pure water was added and stirred at 5° C. for 144 hours. After the stirring was completed, it was filtered with a 0.2 μm filter to remove aggregates and the like to prepare a coating liquid having a concentration CT of 6.0% by mass.

將所獲得之塗佈液中之各成分之濃度、莫耳比等示於表1。再者,於表1中將A成分(可與金屬烷氧化物形成螯合物之有機化合物)之莫耳數設為M1,將B成分(3官能以上之二氧化矽化合物及其水解縮合物之至少一者)之莫耳數設為M2。又,作為B成分,於3官能二氧化矽化合物及其水解縮合物之至少一者(B3成分)、與4官能二氧化矽化合物及其水解縮合物之至少一者(B4成分)共存時,將B3成分之莫耳數設為MB3, 將B4成分之莫耳數設為MB4Table 1 shows the concentration, molar ratio, and the like of each component in the obtained coating liquid. In addition, in Table 1, the mole number of component A (organic compound that can form a chelate compound with metal alkoxide) is set to M1, and component B (silicon dioxide compound with more than 3 functions and its hydrolyzed condensate) At least one of them) is set to M2. In addition, as component B, when at least one of the trifunctional silica compound and its hydrolyzed condensate (component B3) coexists with at least one of the tetrafunctional silica compound and its hydrolyzed condensate (component B4), Let the number of moles of component B3 be M B3 and the number of moles of component B4 be M B4 .

將式(3)所表示之金屬烷氧化物及其水解縮合物之至少一者(C成分)之莫耳數設為M3。 The molar number of at least one (component C) of the metal alkoxide represented by formula (3) and its hydrolyzed condensate is M3.

於塗佈液中,將源自B成分之SiO2換算濃度設為濃度C2,將源自C成分之MOx換算濃度設為濃度C3,將濃度C2與濃度C3之合計設為濃度CT。 In the coating liquid, the SiO 2 conversion concentration derived from the component B is defined as the concentration C2, the MO x conversion concentration derived from the component C is defined as the concentration C3, and the total of the concentration C2 and the concentration C3 is defined as the concentration CT.

關於塗佈液,藉由下述方法對經時穩定性進行評價。將結果示於表1。 Regarding the coating liquid, the stability over time was evaluated by the following method. The results are shown in Table 1.

《經時穩定性》 "Time Stability"

將塗佈液於40℃加熱72小時後,利用E型黏度計(東機產業股份有限公司製造:TV-25型)對黏度進行測定,根據以下基準進行評價。 After the coating liquid was heated at 40°C for 72 hours, the viscosity was measured with an E-type viscometer (manufactured by Toki Industries Co., Ltd.: TV-25 type), and evaluated according to the following criteria.

◎:未見黏度變化 ◎: No change in viscosity

○:可見黏度略微增加(未達5mPa‧s) ○: Visible viscosity increased slightly (less than 5mPa‧s)

×:可見黏度明顯增加(5mPa‧s以上) ×: Visible viscosity increased significantly (over 5mPa‧s)

《附透明被膜基材之評價》 "Evaluation of Substrates with Transparent Coating"

針對附透明被膜基材,藉由下述方法對膜厚、表面電阻值及鉛筆硬度進行測定。將結果示於表1。 For the base material with a transparent coating, the film thickness, surface resistance value, and pencil hardness were measured by the following method. The results are shown in Table 1.

《膜厚》 "Film Thickness"

利用表面粗糙度測定機(東京精密股份有限公司製造:Surfcom)進行測定。 The measurement was performed using a surface roughness measuring machine (manufactured by Tokyo Precision Co., Ltd.: Surfcom).

《表面電阻值》 《Surface Resistance Value》

表面電阻值係利用表面電阻測定機(Mitsubishi Chemical Analytech股份有限公司製造:Hiresta-UX MCP-HT800)進行測定。 The surface resistance value is measured using a surface resistance measuring machine (Mitsubishi Chemical Analytech Co., Ltd.: Hiresta-UX MCP-HT800) for measurement.

《鉛筆硬度》 "Pencil Hardness"

依據JIS-K-5600,利用鉛筆硬度試驗器進行測定。即,以與透明被膜表面呈45度之角度設置鉛筆,負載特定之負荷,以一定速度進行拉伸,觀察有無擦傷。 According to JIS-K-5600, a pencil hardness tester was used for the measurement. That is, a pencil is set at an angle of 45 degrees to the surface of the transparent film, a specific load is applied, and the film is stretched at a constant speed to observe the presence of scratches.

膜厚、表面電阻值及鉛筆硬度之評價用之附透明被膜基材係藉由如下方法而準備。 The transparent coating base material for evaluation of the film thickness, surface resistance value and pencil hardness was prepared by the following method.

將實施例1中所獲得之塗佈液藉由軟版印刷法塗佈於附ITO膜之玻璃基板(AGC Fabritech股份有限公司製造,厚度:1.1mm)上。於90℃乾燥5分鐘,繼而於照射波長365nm之紫外線(3000mJ/cm2)與波長254nm之紫外線(2000mJ/cm2)後,於230℃加熱30分鐘,而獲得附透明被膜基材。 The coating liquid obtained in Example 1 was applied on a glass substrate with an ITO film (manufactured by AGC Fabritech Co., Ltd., thickness: 1.1 mm) by a flexographic printing method. After drying at 90 ℃ 5 minutes and then irradiated at a wavelength of 365nm ultraviolet (3000mJ / cm 2) with a wavelength of 254nm ultraviolet light (2000mJ / cm 2), heated for 30 minutes at 230 deg.] C, to obtain a substrate with a transparent film.

針對附透明被膜基材,藉由下述方法對全光線穿透率、霧度及耐擦傷性進行測定。將結果示於表1。 For the substrate with a transparent coating, the total light transmittance, haze and scratch resistance were measured by the following method. The results are shown in Table 1.

《全光線穿透率及霧度》 "Full Light Transmission and Haze"

全光線穿透率及霧度係利用測霧計(Suga Test Instruments股份有限公司製造)進行測定。 The total light transmittance and haze were measured using a fog meter (manufactured by Suga Test Instruments Co., Ltd.).

《耐擦傷性之測定》 "Determination of Scratch Resistance"

使#0000鋼絲絨接觸透明被膜表面,以負載2kg/cm2滑動10次,以目視觀察膜之表面,根據以下基準對耐擦傷性進行評價。 The #0000 steel wool was brought into contact with the surface of the transparent film, and slid 10 times with a load of 2 kg/cm 2 , the surface of the film was visually observed, and the scratch resistance was evaluated according to the following criteria.

評價基準: Evaluation criteria:

未見條紋狀之傷痕:◎ No streak scars: ◎

略微可見條紋狀之傷痕:○ Striated scars are slightly visible: ○

大量可見條紋狀之傷痕:△ A large number of visible scars: △

整個面被刮削:× The entire surface is scraped: ×

全光線穿透率、霧度及耐擦傷性之評價用之附透明被膜基材係藉由如下方法而準備。 The base material with a transparent film for evaluation of total light transmittance, haze and scratch resistance was prepared by the following method.

將實施例1中所獲得之塗佈液藉由軟版印刷法塗佈於附二氧化矽膜之玻璃基板(AGC Fabritech股份有限公司製造,厚度:1.1mm)上。於90℃乾燥5分鐘,繼而於照射波長365nm之紫外線(3000mJ/cm2)與波長254nm之紫外線(2000mJ/cm2)後,於230℃加熱30分鐘,而獲得附透明被膜基材。 The coating liquid obtained in Example 1 was applied onto a glass substrate with a silicon dioxide film (manufactured by AGC Fabritech Co., Ltd., thickness: 1.1 mm) by a flexographic printing method. After drying at 90 ℃ 5 minutes and then irradiated at a wavelength of 365nm ultraviolet (3000mJ / cm 2) with a wavelength of 254nm ultraviolet light (2000mJ / cm 2), heated for 30 minutes at 230 deg.] C, to obtain a substrate with a transparent film.

針對附透明被膜基材,藉由下述方法測定折射率。將結果示於表1。 Regarding the base material with a transparent coating, the refractive index was measured by the following method. The results are shown in Table 1.

《折射率》 "Refractive Index"

利用光譜式橢圓儀(SOPRA股份有限公司製造:ES4G,@ 550nm)進行測定。 The measurement was performed using a spectroscopic ellipsometer (manufactured by SOPRA Corporation: ES4G, @550nm).

折射率之評價用之附透明被膜基材係藉由如下方法而準備。 The base material with a transparent film for evaluation of the refractive index was prepared by the following method.

將實施例1中所獲得之塗佈液藉由軟版印刷法塗佈於6英吋之矽晶圓(松崎製作所股份有限公司製作,厚度:0.625mm)上。於90℃乾燥5分鐘,繼而於照射波長365nm之紫外線(3000mJ/cm2)與波長254nm之紫外線(2000mJ/cm2)後,於230℃加熱30分鐘,而獲得附透明被膜基材。 The coating liquid obtained in Example 1 was applied to a 6-inch silicon wafer (made by Matsuzaki Manufacturing Co., Ltd., thickness: 0.625 mm) by a flexographic printing method. After drying at 90 ℃ 5 minutes and then irradiated at a wavelength of 365nm ultraviolet (3000mJ / cm 2) with a wavelength of 254nm ultraviolet light (2000mJ / cm 2), heated for 30 minutes at 230 deg.] C, to obtain a substrate with a transparent film.

針對附透明被膜基材,藉由下述方法測定抗龜裂性。將結果 示於表1。 For the substrate with a transparent coating, the crack resistance was measured by the following method. Will result 示于表1。 Shown in Table 1.

《塗佈膜之抗龜裂性》 "Crack Resistance of Coating Film"

以目視觀察塗佈膜之表面,根據以下基準對抗龜裂性進行評價。 The surface of the coating film was visually observed and evaluated for crack resistance according to the following criteria.

◎:塗佈面內未見龜裂 ◎: No cracks in the coated surface

○:邊緣部略微可見龜裂 ○: Cracks are slightly visible at the edge

×:塗佈面內產生龜裂 ×: Cracks occurred in the coated surface

塗佈膜之抗龜裂性之評價用之附透明被膜基材係藉由如下方法而準備。 The transparent coating base material for evaluation of the crack resistance of the coating film was prepared by the following method.

於附二氧化矽膜之玻璃基板(AGC Fabritech股份有限公司製造,厚度:1.1mm)上形成厚度2μm之丙烯酸樹脂層。丙烯酸樹脂層係使用棒式塗佈機(No.4)進行塗佈,繼而於80℃乾燥2分鐘後,照射波長365nm之紫外線(300mJ/cm2)。將實施例1中所獲得之塗佈液藉由軟版印刷法塗佈於附該丙烯酸樹脂層之玻璃基板上,於90℃乾燥5分鐘,繼而於照射3000mJ/cm2之紫外線(波長365nm)後,於230℃加熱30分鐘,而獲得附透明被膜基材。 An acrylic resin layer with a thickness of 2 μm was formed on a glass substrate with a silicon dioxide film (manufactured by AGC Fabritech Co., Ltd., thickness: 1.1 mm). The acrylic resin layer was applied using a bar coater (No. 4), followed by drying at 80°C for 2 minutes, and then irradiated with ultraviolet light (300 mJ/cm 2 ) at a wavelength of 365 nm. The coating liquid obtained in Example 1 was applied to a glass substrate with an acrylic resin layer by a flexographic printing method, dried at 90°C for 5 minutes, and then irradiated with ultraviolet light (wavelength 365 nm) of 3000 mJ/cm 2 Then, it heated at 230 degreeC for 30 minutes, and obtained the base material with a transparent film.

[實施例2] [Example 2]

《透明被膜形成用之塗佈液之製備》 "Preparation of Coating Liquid for Forming Transparent Coating"

於步驟2中,使用己二醇(和光純藥股份有限公司製造)255.917g、乙醯丙酮(和光純藥股份有限公司製造)568.05g,除此以外,以與實施例1相同之方式製備濃度CT為6.0質量%之塗佈液。 In Step 2, 255.917 g of hexanediol (made by Wako Pure Chemical Industries, Ltd.) and 568.05 g of acetone (made by Wako Pure Chemical Industries, Ltd.) were used, except that the concentration was prepared in the same manner as in Example 1. CT is 6.0% by mass of coating liquid.

將所獲得之塗佈液之各成分之濃度、莫耳比等示於表1。 Table 1 shows the concentration, molar ratio, etc. of the components of the obtained coating liquid.

《附透明被膜基材之評價》 "Evaluation of Substrates with Transparent Coating"

除了使用該塗佈液以外,以與實施例1相同之方式進行測定、評價。將結果示於表1。 The measurement and evaluation were performed in the same manner as in Example 1, except that the coating liquid was used. The results are shown in Table 1.

[實施例3] [Example 3]

《透明被膜形成用之塗佈液之製備》 "Preparation of Coating Liquid for Forming Transparent Coating"

於步驟2中,使用己二醇(和光純藥股份有限公司製造)3052.48g、乙醯丙酮(和光純藥股份有限公司製造)74.74g,除此以外,以與實施例1相同之方式製備濃度CT為6.0質量%之塗佈液。 In Step 2, the concentration was prepared in the same manner as in Example 1, except that hexanediol (manufactured by Wako Pure Chemical Industries, Ltd.) 3054.48 g and acetone (manufactured by Wako Pure Chemical Industries, Ltd.) 74.74 g were used. CT is 6.0% by mass of coating liquid.

將所獲得之塗佈液之各成分之濃度、莫耳比等示於表1。 Table 1 shows the concentration, molar ratio, etc. of the components of the obtained coating liquid.

《附透明被膜基材之評價》 "Evaluation of Substrates with Transparent Coating"

除了使用該塗佈液以外,以與實施例1相同之方式進行測定、評價。將結果示於表1。 The measurement and evaluation were performed in the same manner as in Example 1, except that the coating liquid was used. The results are shown in Table 1.

[實施例4] [Example 4]

《透明被膜形成用之塗佈液之製備》 "Preparation of Coating Liquid for Forming Transparent Coating"

(步驟1) (step 1)

將己二醇(和光純藥股份有限公司製造)6536.14g、純水311.64g及濃度61質量%之硝酸5.19g混合,並攪拌5分鐘。繼而,一面進行攪拌一面添加作為B成分(4官能矽烷化合物)之矽酸乙酯(多摩化學股份有限公司製造:SiO2濃度28.8質量%)1803.48g,攪拌30分鐘而製備固形物成分濃度6.0質量%之預備液1。 6536.14 g of hexanediol (manufactured by Wako Pure Chemical Industries, Ltd.), 311.64 g of pure water, and 5.19 g of nitric acid with a concentration of 61% by mass were mixed and stirred for 5 minutes. Then, while stirring, 1803.48 g of ethyl silicate (produced by Tama Chemical Co., Ltd.: SiO 2 concentration 28.8% by mass) as a component B (4-functional silane compound) was added, and stirred for 30 minutes to prepare a solid content concentration of 6.0% %的prep液1.

(步驟2) (Step 2)

將己二醇(和光純藥股份有限公司製造)967.76g、作為A 成分之乙醯丙酮(和光純藥股份有限公司製造)48.58g、作為C成分之鈦酸四異丙酯(Matsumoto Fine Chemical股份有限公司製造:Orgatix TA-10,TiO2濃度28質量%)277.19g混合,並攪拌5分鐘,而製備固形物成分濃度6.0質量%之預備液2。 Hexanediol (Wako Pure Chemical Industries, Ltd.) 967.76g, component A acetone (Wako Pure Chemical Industries, Ltd.) 48.58g, C component tetraisopropyl titanate (Matsumoto Fine Chemical Co., Ltd.) Manufactured by Co., Ltd.: Organix TA-10, TiO 2 concentration 28% by mass) 277.19 g were mixed and stirred for 5 minutes to prepare a preparative solution 2 with a solid content concentration of 6.0% by mass.

(步驟3) (Step 3)

一面進行攪拌一面將預備液2混合至預備液1中,攪拌10分鐘後,添加純水49.75g,於5℃攪拌144小時。攪拌結束後,利用0.2μm之過濾器進行過濾,將凝集物等去除,而製備濃度CT為6.0質量%之塗佈液。 While stirring, the preliminary liquid 2 was mixed into the preliminary liquid 1, and after stirring for 10 minutes, 49.75 g of pure water was added and stirred at 5° C. for 144 hours. After the stirring was completed, it was filtered with a 0.2 μm filter to remove aggregates and the like, and a coating liquid having a concentration CT of 6.0% by mass was prepared.

將所獲得之塗佈液之各成分之濃度、莫耳比等示於表1。 Table 1 shows the concentration, molar ratio, etc. of the components of the obtained coating liquid.

《附透明被膜基材之評價》 "Evaluation of Substrates with Transparent Coating"

除了使用該塗佈液以外,以與實施例1相同之方式進行測定、評價。將結果示於表1。 The measurement and evaluation were performed in the same manner as in Example 1, except that the coating liquid was used. The results are shown in Table 1.

[實施例5] [Example 5]

《透明被膜形成用之塗佈液之製備》 "Preparation of Coating Liquid for Forming Transparent Coating"

(步驟1) (step 1)

將己二醇(和光純藥股份有限公司製造)1126.97g、純水53.73g及濃度61質量%之硝酸0.90g混合,並攪拌5分鐘。繼而,一面進行攪拌一面添加作為B成分(4官能矽烷化合物)之矽酸乙酯(多摩化學股份有限公司製造:SiO2濃度28.8質量%)310.95g,攪拌30分鐘,而製備固形物成分濃度6.0質量%之預備液1。 1126.97 g of hexanediol (made by Wako Pure Chemical Industries, Ltd.), 53.73 g of pure water, and 0.90 g of nitric acid with a concentration of 61% by mass were mixed and stirred for 5 minutes. Subsequently, 310.95 g of ethyl silicate (product of Tama Chemical Co., Ltd.: SiO 2 concentration 28.8% by mass) as a component B (4-functional silane compound) was added while stirring, and stirred for 30 minutes to prepare a solid content concentration of 6.0 Preparative solution of mass% 1.

(步驟2) (Step 2)

將己二醇(和光純藥股份有限公司製造)6327.69g、作為A成分之乙醯丙酮(和光純藥股份有限公司製造)317.66g、作為C成分之鈦酸四異丙酯(Matsumoto Fine Chemical股份有限公司製造:Orgatix TA-10,TiO2濃度28質量%)1812.37g混合,並攪拌5分鐘,而製備固形物成分濃度6.0質量%之預備液2。 Hexanediol (manufactured by Wako Pure Chemical Industries, Ltd.) 6,237.69 g, acetone as component A (manufactured by Wako Pure Chemical Industries, Ltd.) 317.66 g, and tetraisopropyl titanate (Matsumoto Fine Chemical Co., Ltd.) as component C Co., Ltd. manufacture: Organix TA-10, TiO 2 concentration 28% by mass) 1812.37 g are mixed and stirred for 5 minutes to prepare a preparative solution 2 with a solid content concentration of 6.0% by mass.

(步驟3) (Step 3)

一面進行攪拌一面將預備液2混合至預備液1中,攪拌10分鐘後,添加純水49.75g,於5℃攪拌144小時。攪拌結束後,利用0.2μm之過濾器進行過濾,將凝集物等去除,而製備濃度CT為6.0質量%之塗佈液。將所獲得之塗佈液中之各成分之濃度、莫耳比等示於表1。 While stirring, the preliminary liquid 2 was mixed into the preliminary liquid 1, and after stirring for 10 minutes, 49.75 g of pure water was added and stirred at 5° C. for 144 hours. After the stirring was completed, it was filtered with a 0.2 μm filter to remove aggregates and the like, and a coating liquid having a concentration CT of 6.0% by mass was prepared. Table 1 shows the concentration, molar ratio, and the like of each component in the obtained coating liquid.

《附透明被膜基材之評價》 "Evaluation of Substrates with Transparent Coating"

除了使用該塗佈液以外,以與實施例1相同之方式進行測定、評價。將結果示於表1。 The measurement and evaluation were performed in the same manner as in Example 1, except that the coating liquid was used. The results are shown in Table 1.

[實施例6] [Example 6]

《透明被膜形成用之塗佈液之製備》 "Preparation of Coating Liquid for Forming Transparent Coating"

(步驟1) (step 1)

將己二醇(和光純藥股份有限公司製造)5239.00g、純水107.46g及濃度61質量%之硝酸1.79g混合,並攪拌5分鐘。繼而,一面進行攪拌一面添加作為B成分(4官能矽烷化合物)之矽酸乙酯(多摩化學股份有限公司製造:SiO2濃度28.8質量%)621.89g,並攪拌30分鐘,而製備固形物成分濃度6.0質量%之預備液1。 5235.00 g of hexanediol (made by Wako Pure Chemical Industries, Ltd.), 107.46 g of pure water, and 1.79 g of nitric acid with a concentration of 61% by mass were mixed and stirred for 5 minutes. Then, while stirring, 621.89 g of ethyl silicate (made by Tama Chemical Co., Ltd.: SiO 2 concentration 28.8% by mass) as component B (4-functional silane compound) was added, and stirred for 30 minutes to prepare a solid content concentration 6.0% by mass of preparation solution 1.

(步驟2) (Step 2)

將己二醇(和光純藥股份有限公司製造)3478.92g、作為A成分之乙醯丙酮(和光純藥股份有限公司製造)74.74g、作為C成分之鈦酸四異丙酯(Matsumoto Fine Chemical股份有限公司製造:Orgatix TA-10,TiO2濃度28質量%)426.44g混合,並攪拌5分鐘,而製備固形物成分濃度6.0質量%之預備液2。 3,478.92 g of hexanediol (Wako Pure Chemical Industries, Ltd.), 74.74 g of acetone (product of Wako Pure Chemical Industries, Ltd.) as component A, and tetraisopropyl titanate (Matsumoto Fine Chemical Co., Ltd.) as component C Co., Ltd. manufacture: Organix TA-10, TiO 2 concentration 28% by mass) 426.44g was mixed and stirred for 5 minutes to prepare a preparative solution 2 with a solid content concentration of 6.0% by mass.

(步驟3) (Step 3)

一面進行攪拌一面將預備液2混合至預備液1中,攪拌10分鐘後,添加純水49.75g,於5℃攪拌144小時。攪拌結束後,利用0.2μm之過濾器進行過濾,將凝集物等去除,而製備濃度CT為6.0質量%之塗佈液。將所獲得之塗佈液之各成分之濃度、莫耳比等示於表1。 While stirring, the preliminary liquid 2 was mixed into the preliminary liquid 1, and after stirring for 10 minutes, 49.75 g of pure water was added and stirred at 5° C. for 144 hours. After the stirring was completed, it was filtered with a 0.2 μm filter to remove aggregates and the like, and a coating liquid having a concentration CT of 6.0% by mass was prepared. Table 1 shows the concentration, molar ratio, etc. of the components of the obtained coating liquid.

《附透明被膜基材之評價》 "Evaluation of Substrates with Transparent Coating"

將紫外線照射後之加熱條件設為120℃、30分鐘,除此以外,以與實施例1相同之方式進行測定、評價。將結果示於表1。 Except that the heating conditions after ultraviolet irradiation were 120° C. and 30 minutes, measurement and evaluation were performed in the same manner as in Example 1. The results are shown in Table 1.

[實施例7] [Example 7]

《透明被膜形成用之塗佈液之製備》 "Preparation of Coating Liquid for Forming Transparent Coating"

(步驟1) (step 1)

將己二醇(和光純藥股份有限公司製造)3776.72g、純水322.39g及濃度61質量%之硝酸5.37g混合,並攪拌5分鐘。繼而,一面進行攪拌一面添加作為B成分(4官能矽烷化合物)之矽酸乙酯(多摩化學股份有限公司製造:SiO2濃度28.8質量%)1865.67g,並攪拌30分鐘,而製備固形物成分濃度9.0質量%之預備液1。 3776.72 g of hexanediol (manufactured by Wako Pure Chemical Industries, Ltd.), 322.39 g of pure water, and 5.37 g of nitric acid with a concentration of 61% by mass were mixed and stirred for 5 minutes. Next, 1865.67 g of ethyl silicate (made by Tama Chemical Co., Ltd.: SiO 2 concentration 28.8% by mass) as component B (4-functional silane compound) was added while stirring, and stirred for 30 minutes to prepare a solid content concentration 9.0% by mass of preparation solution 1.

(步驟2) (Step 2)

將己二醇(和光純藥股份有限公司製造)2476.55g、作為A成分之乙醯丙酮(和光純藥股份有限公司製造)224.23g、作為C成分之鈦酸四異丙酯(Matsumoto Fine Chemical股份有限公司製造:Orgatix TA-10,TiO2濃度28質量%)1279.32g混合,並攪拌5分鐘,而製備固形物成分濃度9.0質量%之預備液2。 Hexanediol (manufactured by Wako Pure Chemical Industries, Ltd.) 2476.55 g, acetylacetone (manufactured by Wako Pure Chemical Industries, Ltd.) 224.23 g as component A, and tetraisopropyl titanate (Matsumoto Fine Chemical Co., Ltd.) as component C Co., Ltd. manufacture: Organix TA-10, TiO 2 concentration 28% by mass) 1279.32 g was mixed and stirred for 5 minutes to prepare a preparative solution 2 having a solid content concentration of 9.0% by mass.

(步驟3) (Step 3)

一面進行攪拌一面將預備液2混合至預備液1中,攪拌10分鐘後,添加純水49.75g,於5℃攪拌144小時。攪拌結束後,利用0.2μm之過濾器進行過濾,將凝集物等去除,而製備濃度CT為9.0質量%之塗佈液。將所獲得之塗佈液之各成分之濃度、莫耳比等示於表1。 While stirring, the preliminary liquid 2 was mixed into the preliminary liquid 1, and after stirring for 10 minutes, 49.75 g of pure water was added and stirred at 5° C. for 144 hours. After the stirring was completed, filtration was performed with a 0.2 μm filter to remove aggregates and the like, and a coating liquid having a concentration CT of 9.0% by mass was prepared. Table 1 shows the concentration, molar ratio, etc. of the components of the obtained coating liquid.

《附透明被膜基材之評價》 "Evaluation of Substrates with Transparent Coating"

將紫外線照射後之加熱條件設為280℃、30分鐘,除此以外,以與實施例1相同之方式進行測定、評價。將結果示於表1。 Except that the heating conditions after ultraviolet irradiation were 280° C. for 30 minutes, measurement and evaluation were performed in the same manner as in Example 1. The results are shown in Table 1.

[實施例8] [Example 8]

《透明被膜形成用之塗佈液之製備》 "Preparation of Coating Liquid for Forming Transparent Coating"

(步驟1) (step 1)

將己二醇(和光純藥股份有限公司製造)3681.42g、純水175.52g及濃度61質量%之硝酸2.93g混合,並攪拌5分鐘。繼而,一面進行攪拌一面添加作為B成分(4官能矽烷化合物)之矽酸乙酯(多摩化學股份有限公司製造:SiO2濃度28.8質量%)1015.75g,並攪拌30分鐘,而製備固形物成分濃度6.0質量%之預備液1。 Hexanediol (manufactured by Wako Pure Chemical Industries, Ltd.) 3681.42g, pure water 175.52g, and nitric acid 2.93g having a concentration of 61% by mass were mixed and stirred for 5 minutes. Then, while stirring, 1015.75 g of ethyl silicate (product of Tama Chemical Co., Ltd.: SiO 2 concentration 28.8% by mass) as component B (4-functional silane compound) was added, and stirred for 30 minutes to prepare a solid content concentration 6.0% by mass of preparation solution 1.

(步驟2) (Step 2)

將己二醇(和光純藥股份有限公司製造)3416.09g、作為A成分之乙醯丙酮(和光純藥股份有限公司製造)218.93.g、作為C成分之鋯酸正丙酯(Matsumoto Fine Chemical股份有限公司製造Orgatix ZA-45,ZrO2濃度21.2質量%)1439.61g混合,並攪拌5分鐘,而製備固形物成分濃度6.0質量%之預備液2。 Hexanediol (manufactured by Wako Pure Chemical Industries, Ltd.) 3416.09g, acetone as component A (manufactured by Wako Pure Chemical Industries, Ltd.) 218.93.g, n-propyl zirconate as component C (Matsumoto Fine Chemical Co., Ltd.) Orgatix ZA-45, ZrO 2 concentration 21.2% by mass) 1439.61g was mixed and stirred for 5 minutes to prepare a preparation solution 2 with a solid content concentration of 6.0% by mass.

(步驟3) (Step 3)

一面進行攪拌一面將預備液2混合至預備液1中,攪拌10分鐘後,添加純水49.23g,於5℃攪拌144小時。攪拌結束後,利用0.2μm之過濾器進行過濾,將凝集物等去除,而製備濃度CT為6.0質量%之塗佈液。將所獲得之塗佈液之各成分之濃度、莫耳比等示於表1。 While stirring, the preliminary solution 2 was mixed into the preliminary solution 1, and after stirring for 10 minutes, 49.23 g of pure water was added and stirred at 5° C. for 144 hours. After the stirring was completed, it was filtered with a 0.2 μm filter to remove aggregates and the like, and a coating liquid having a concentration CT of 6.0% by mass was prepared. Table 1 shows the concentration, molar ratio, etc. of the components of the obtained coating liquid.

《附透明被膜基材之評價》 "Evaluation of Substrates with Transparent Coating"

除了使用該塗佈液以外,以與實施例1相同之方式進行測定、評價。將結果示於表1。 The measurement and evaluation were performed in the same manner as in Example 1, except that the coating liquid was used. The results are shown in Table 1.

[實施例9] [Example 9]

《透明被膜形成用之塗佈液之製備》 "Preparation of Coating Liquid for Forming Transparent Coating"

(步驟1) (step 1)

將作為B成分(3官能矽烷化合物)之KBM-13(信越化學工業股份有限公司製造:SiO2濃度44.1質量%)713.22g及Solmix AP-11(Japan Alcohol Trading股份有限公司製造)1875.40g混合,並攪拌30分鐘。繼而,一面進行攪拌一面歷時30分鐘逐次添加濃度0.1質量%之硝酸570.50g,並攪拌30分鐘。此時之pH值為2.0。於其中一面進行攪拌一面添加三乙醇胺(林純藥工業股份有限公司製造)5.06g,攪拌10分鐘而製備固形物成分濃 度10.0質量%之預備液1-1。此時之pH值為7.1。 713.22g of KBM-13 (manufactured by Shin-Etsu Chemical Industry Co., Ltd.: SiO 2 concentration 44.1% by mass) as a component B (trifunctional silane compound) and Solmix AP-11 (manufactured by Japan Alcohol Trading Co., Ltd.) 1875.40g were mixed, And stir for 30 minutes. Then, while stirring, 570.50 g of nitric acid with a concentration of 0.1% by mass was added sequentially over 30 minutes, and stirred for 30 minutes. The pH value at this time is 2.0. On one side, 5.06 g of triethanolamine (manufactured by Lin Chun Pharmaceutical Co., Ltd.) was added while stirring, and the mixture was stirred for 10 minutes to prepare a preliminary liquid 1-1 having a solid content concentration of 10.0% by mass. The pH at this time is 7.1.

繼而,於己二醇(和光純藥股份有限公司製造)2109.45g中,一面進行攪拌一面添加預備液1-1並攪拌30分鐘,而製備固形物成分濃度6.0質量%之預備液1。 Then, in 2109.45 g of hexanediol (made by Wako Pure Chemical Industries, Ltd.), the preliminary liquid 1-1 was added while stirring and stirred for 30 minutes to prepare a preliminary liquid 1 having a solid content concentration of 6.0% by mass.

(步驟2) (Step 2)

將己二醇(和光純藥股份有限公司製造)3498.84g、作為A成分之乙醯丙酮(和光純藥股份有限公司製造)175.65g、作為C成分之鈦酸四異丙酯(Matsumoto Fine Chemical股份有限公司製造:Orgatix TA-10,TiO2濃度28質量%)1002.13g混合,攪拌5分鐘,而製備固形物成分濃度6.0質量%之預備液2。 Hexanediol (manufactured by Wako Pure Chemical Industries, Ltd.) 3,498.84g, acetone as component A (manufactured by Wako Pure Chemical Industries, Ltd.) 175.65g, tetraisopropyl titanate (Matsumoto Fine Chemical Co., Ltd.) as component C Manufactured by Co., Ltd.: Organix TA-10, TiO 2 concentration 28% by mass) 1002.13g was mixed and stirred for 5 minutes to prepare a preparative solution 2 with a solid content concentration of 6.0% by mass.

(步驟3) (Step 3)

一面進行攪拌一面將預備液2混合至預備液1中,攪拌10分鐘後,添加純水49.75g,於25℃攪拌30分鐘。攪拌結束後,利用0.2μm之過濾器進行過濾,將凝集物等去除,而製備濃度CT為6.0質量%之塗佈液。將結果示於表1。 While stirring, the preparation solution 2 was mixed into the preparation solution 1, and after stirring for 10 minutes, 49.75 g of pure water was added and stirred at 25° C. for 30 minutes. After the stirring was completed, it was filtered with a 0.2 μm filter to remove aggregates and the like, and a coating liquid having a concentration CT of 6.0% by mass was prepared. The results are shown in Table 1.

《附透明被膜基材之評價》 "Evaluation of Substrates with Transparent Coating"

除了使用該塗佈液以外,以與實施例1相同之方式進行測定、評價。將結果示於表1。 The measurement and evaluation were performed in the same manner as in Example 1, except that the coating liquid was used. The results are shown in Table 1.

[實施例10] [Example 10]

《透明被膜形成用之塗佈液之製備》 "Preparation of Coating Liquid for Forming Transparent Coating"

除了以下之預備步驟以外,以與實施例1相同之方式製備塗佈液。將所獲得之塗佈液之各成分之濃度、莫耳比等示於表1。 Except for the following preliminary steps, a coating liquid was prepared in the same manner as in Example 1. Table 1 shows the concentration, molar ratio, etc. of the components of the obtained coating liquid.

(步驟1) (step 1)

將作為B成分(3官能矽烷化合物)之KBM-13(信越化學工業股份有限公司製造:SiO2濃度44.1質量%)1009.27g及Solmix AP-11(Japan Alcohol Trading股份有限公司製造)2653.86g混合,並攪拌30分鐘。繼而,一面進行攪拌一面歷時30分鐘逐次添加濃度0.1質量%之硝酸807.32g,並攪拌30分鐘。此時之pH值為2.1。於其中一面進行攪拌一面添加三乙醇胺(林純藥工業股份有限公司製造)7.16g,攪拌10分鐘而製備固形物成分濃度9.9質量%之預備液1-1。此時之pH值為7.2。 1009.27g of KBM-13 (manufactured by Shin-Etsu Chemical Industry Co., Ltd.: SiO 2 concentration 44.1% by mass) as a component B (trifunctional silane compound) and 26.53.86g of Solmix AP-11 (manufactured by Japan Alcohol Trading Co., Ltd.) were mixed, And stir for 30 minutes. Then, while stirring, 807.32 g of nitric acid with a concentration of 0.1% by mass was added sequentially over 30 minutes and stirred for 30 minutes. The pH at this time is 2.1. On one side, 7.16 g of triethanolamine (manufactured by Linchun Pharmaceutical Co., Ltd.) was added while stirring, and stirred for 10 minutes to prepare a preliminary liquid 1-1 having a solid content concentration of 9.9% by mass. At this time, the pH value was 7.2.

繼而,於己二醇(和光純藥股份有限公司製造)2985.07g中,一面進行攪拌一面添加預備液1-1,攪拌30分鐘,而製備固形物成分濃度6.0質量%之預備液1-2。 Then, to 2985.07 g of hexanediol (Wako Pure Chemical Industries, Ltd.), the preliminary liquid 1-1 was added while stirring, and stirred for 30 minutes to prepare a preliminary liquid 1-2 having a solid content concentration of 6.0% by mass.

(步驟2) (Step 2)

將己二醇(和光純藥股份有限公司製造)1861.08g、作為A成分之乙醯丙酮(和光純藥股份有限公司製造)93.43g、作為C成分之鈦酸四異丙酯(Matsumoto Fine Chemical股份有限公司製造:Orgatix TA-10,TiO2濃度28質量%)533.05g混合,攪拌5分鐘,而製備固形物成分濃度6.0質量%之預備液2。 Hexanediol (Wako Pure Chemical Industries, Ltd.) 1861.08g, A component acetone (Wako Pure Chemical Industries, Ltd.) 93.43g, C component tetraisopropyl titanate (Matsumoto Fine Chemical Co., Ltd.) Manufactured by Co., Ltd.: Organix TA-10, TiO 2 concentration 28% by mass) 533.05g was mixed and stirred for 5 minutes to prepare a preparation solution 2 with a solid content concentration of 6.0% by mass.

《附透明被膜之基材之評價》 "Evaluation of Substrates with Transparent Coating"

除了使用該塗佈液以外,以與實施例1相同之方式進行測定、評價。將結果示於表1。 The measurement and evaluation were performed in the same manner as in Example 1, except that the coating liquid was used. The results are shown in Table 1.

[實施例11] [Example 11]

除了以下之步驟以外,以與實施例1相同之方式製備透明被 膜形成用之塗佈液。 The transparent quilt was prepared in the same manner as in Example 1 except for the following steps Coating liquid for film formation.

將所獲得之塗佈液之各成分之濃度、莫耳比等示於表1。 Table 1 shows the concentration, molar ratio, etc. of the components of the obtained coating liquid.

(步驟1) (step 1)

將作為B成分(3官能矽烷化合物)之KBM-13(信越化學工業股份有限公司製造:SiO2濃度44.1質量%)1143.84g及Solmix AP-11(Japan Alcohol Trading股份有限公司製造)3007.71g混合,並攪拌30分鐘。繼而,一面進行攪拌一面歷時30分鐘逐次添加濃度0.1質量%之硝酸914.96g,並攪拌30分鐘。此時之pH值為2.1。於其中一面進行攪拌一面添加三乙醇胺(林純藥工業股份有限公司製造)8.11g,攪拌10分鐘,而製備固形物成分濃度9.9質量%之預備液1-1。此時之pH值為7.1。 1143.84 g of KBM-13 (manufactured by Shin-Etsu Chemical Co., Ltd.: SiO 2 concentration 44.1% by mass) and 3007.71 g of Solmix AP-11 (manufactured by Japan Alcohol Trading Co., Ltd.) as a component B (trifunctional silane compound), And stir for 30 minutes. Then, while stirring, 914.96 g of nitric acid with a concentration of 0.1% by mass was added sequentially over 30 minutes, and stirred for 30 minutes. The pH at this time is 2.1. Triethanolamine (manufactured by Linchun Pharmaceutical Co., Ltd.) 8.11 g was added to one side while stirring, and stirred for 10 minutes to prepare a preliminary liquid 1-1 having a solid content concentration of 9.9% by mass. The pH at this time is 7.1.

繼而,於己二醇(和光純藥股份有限公司製造)3383.08g中,一面進行攪拌一面添加預備液1-1,攪拌30分鐘,而製備固形物成分濃度6.0質量%之預備液1。 Next, to 3383.08 g of hexanediol (Wako Pure Chemical Industries, Ltd.), the preparation liquid 1-1 was added while stirring, and the mixture was stirred for 30 minutes to prepare a preparation liquid 1 having a solid content concentration of 6.0% by mass.

(步驟2) (Step 2)

將己二醇(和光純藥股份有限公司製造)1116.65g、作為A成分之乙醯丙酮(和光純藥股份有限公司製造)56.06g、作為C成分之鈦酸四異丙酯(Matsumoto Fine Chemical股份有限公司製造:Orgatix TA-10,TiO2濃度28質量%)319.83g混合,攪拌5分鐘,而製備固形物成分濃度6.0質量%之預備液2。 Hexanediol (made by Wako Pure Chemical Industries, Ltd.) 1116.65g, acetone as component A (made by Wako Pure Chemical Industries, Ltd.) 56.06g, tetraisopropyl titanate (Matsumoto Fine Chemical Co., Ltd.) as component C Manufactured by Co., Ltd.: Organix TA-10, TiO 2 concentration 28% by mass) 319.83g was mixed and stirred for 5 minutes to prepare a preparative solution 2 with a solid content concentration of 6.0% by mass.

《附透明被膜基材之評價》 "Evaluation of Substrates with Transparent Coating"

除了使用該塗佈液以外,以與實施例1相同之方式進行測定、評價。將結果示於表1。 The measurement and evaluation were performed in the same manner as in Example 1, except that the coating liquid was used. The results are shown in Table 1.

[實施例12] [Example 12]

《透明被膜形成用之塗佈液之製備》 "Preparation of Coating Liquid for Forming Transparent Coating"

除了以下之步驟以外,以與實施例1相同之方式製備塗佈液。 Except for the following steps, a coating liquid was prepared in the same manner as in Example 1.

將所獲得之塗佈液之各成分之濃度、莫耳比等示於表1。 Table 1 shows the concentration, molar ratio, etc. of the components of the obtained coating liquid.

(步驟1) (step 1)

將作為B成分(3官能矽烷化合物)之KBM-13(信越化學工業股份有限公司製造:SiO2濃度44.1質量%)403.71g及Solmix AP-11(Japan Alcohol Trading股份有限公司製造)1061.55g混合,並攪拌30分鐘。繼而,一面進行攪拌一面歷時30分鐘逐次添加濃度0.1質量%之硝酸322.92g,並攪拌30分鐘。此時之pH值為2.0。於其中一面進行攪拌一面添加三乙醇胺(林純藥工業股份有限公司製造)2.86g,攪拌10分鐘,而製備固形物成分濃度9.9質量%之預備液1-1。此時之pH值為7.0。 403.71 g of KBM-13 (manufactured by Shin-Etsu Chemical Co., Ltd.: SiO 2 concentration 44.1% by mass) as a component B (trifunctional silane compound) and 1061.55 g of Solmix AP-11 (manufactured by Japan Alcohol Trading Co., Ltd.) were mixed, And stir for 30 minutes. Then, while stirring, 322.92 g of nitric acid with a concentration of 0.1% by mass was added sequentially over 30 minutes, and stirred for 30 minutes. The pH value at this time is 2.0. Triethanolamine (manufactured by Linchun Pharmaceutical Co., Ltd.) 2.86 g was added to one side while stirring, and stirred for 10 minutes to prepare a preliminary liquid 1-1 having a solid content concentration of 9.9% by mass. The pH at this time is 7.0.

繼而,於己二醇(和光純藥股份有限公司製造)1194.03g中,一面進行攪拌一面添加預備液1-1,攪拌30分鐘,而製備固形物成分濃度6.0質量%之預備液1。 Then, to 1194.03 g of hexanediol (Wako Pure Chemical Industries, Ltd.), the preliminary liquid 1-1 was added while stirring, and stirred for 30 minutes to prepare a preliminary liquid 1 having a solid content concentration of 6.0% by mass.

(步驟2) (Step 2)

將己二醇(和光純藥股份有限公司製造)5211.04g、作為A成分之乙醯丙酮(和光純藥股份有限公司製造)261.60g、作為C成分之鈦酸四異丙酯(Matsumoto Fine Chemical股份有限公司製造:Orgatix TA-10,TiO2濃度28質量%)1492.54g混合,攪拌5分鐘,而製備固形物成分濃度6.0質量%之預備液2。 Hexanediol (manufactured by Wako Pure Chemical Industries, Ltd.) 5211.04g, acetone as component A (manufactured by Wako Pure Chemical Industries, Ltd.) 261.60g, tetraisopropyl titanate (Matsumoto Fine Chemical Co., Ltd.) as component C Manufactured by Co., Ltd.: Organix TA-10, TiO 2 concentration 28% by mass) 1492.54 g was mixed and stirred for 5 minutes to prepare a preparative solution 2 with a solid content concentration of 6.0% by mass.

《附透明被膜基材之評價》 "Evaluation of Substrates with Transparent Coating"

除了使用該塗佈液以外,以與實施例1相同之方式進行測定、評價。將結果示於表1。 The measurement and evaluation were performed in the same manner as in Example 1, except that the coating liquid was used. The results are shown in Table 1.

[實施例13] [Example 13]

《透明被膜形成用之塗佈液之製備》 "Preparation of Coating Liquid for Forming Transparent Coating"

除了以下之步驟以外,以與實施例1相同之方式製備塗佈液。 Except for the following steps, a coating liquid was prepared in the same manner as in Example 1.

將所獲得之塗佈液之各成分之濃度、莫耳比等示於表1。 Table 1 shows the concentration, molar ratio, etc. of the components of the obtained coating liquid.

(步驟1) (step 1)

將作為B3成分(3官能矽烷化合物)之KBM-13(信越化學工業股份有限公司製造:SiO2濃度44.1質量%)484.25g及Solmix AP-11(Japan Alcohol Trading股份有限公司製造)1273.85g混合,攪拌30分鐘。繼而,一面進行攪拌一面歷時30分鐘逐次添加濃度0.1質量%之硝酸387.51g,攪拌30分鐘。此時之pH值為2.0。於其中一面進行攪拌一面添加三乙醇胺(林純藥工業股份有限公司製造)3.44g,攪拌10分鐘,而製備固形物成分濃度9.9質量%之預備液1-1。此時之pH值為6.9。 484.25 g of KBM-13 (manufactured by Shin-Etsu Chemical Industry Co., Ltd.: SiO 2 concentration 44.1% by mass) as a B3 component (trifunctional silane compound) 484.25 g and 1273.85 g of Solmix AP-11 (manufactured by Japan Alcohol Trading Co., Ltd.) were mixed, Stir for 30 minutes. Then, while stirring, 387.51 g of nitric acid with a concentration of 0.1% by mass was added sequentially over 30 minutes, and stirred for 30 minutes. The pH value at this time is 2.0. Triethanolamine (manufactured by Linchun Pharmaceutical Co., Ltd.) 3.44 g was added while stirring on one side, and stirred for 10 minutes to prepare a preliminary liquid 1-1 having a solid content concentration of 9.9% by mass. At this time, the pH value was 6.9.

繼而,於己二醇(和光純藥股份有限公司製造)2710.06g中,將純水60.90g及濃度61質量%之硝酸1.01g混合,並攪拌5分鐘。繼而,一面進行攪拌一面添加作為B4成分(4官能矽烷化合物)之矽酸乙酯(多摩化學股份有限公司製造:SiO2濃度28.8質量%)352.40g,並攪拌30分鐘。進而,一面進行攪拌一面添加預備液1-1,攪拌30分鐘,而製備固形物成分濃度6.0質量%之預備液1。 Next, in 270.06 g of hexanediol (made by Wako Pure Chemical Industries, Ltd.), 60.90 g of pure water and 1.01 g of nitric acid with a concentration of 61% by mass were mixed and stirred for 5 minutes. Subsequently, 352.40 g of ethyl silicate (manufactured by Tama Chemical Co., Ltd.: SiO 2 concentration 28.8% by mass) as a B4 component (4-functional silane compound) was added while stirring, and stirred for 30 minutes. Furthermore, the preliminary liquid 1-1 was added while stirring, and stirred for 30 minutes to prepare the preliminary liquid 1 having a solid content concentration of 6.0% by mass.

(步驟2) (Step 2)

將己二醇(和光純藥股份有限公司製造)3498.84g、作為A成分之乙醯丙酮(和光純藥股份有限公司製造)175.65g、作為C成分之鈦酸四異丙酯(Matsumoto Fine Chemical股份有限公司製造:Orgatix TA-10,TiO2濃度28質量%)1002.13g混合,攪拌5分鐘,而製備固形物成分濃度6.0質量%之預備液2。 Hexanediol (manufactured by Wako Pure Chemical Industries, Ltd.) 3,498.84g, acetone as component A (manufactured by Wako Pure Chemical Industries, Ltd.) 175.65g, tetraisopropyl titanate (Matsumoto Fine Chemical Co., Ltd.) as component C Manufactured by Co., Ltd.: Organix TA-10, TiO 2 concentration 28% by mass) 1002.13g was mixed and stirred for 5 minutes to prepare a preparative solution 2 with a solid content concentration of 6.0% by mass.

《附透明被膜基材之評價》 "Evaluation of Substrates with Transparent Coating"

除了使用該塗佈液以外,以與實施例1相同之方式進行測定、評價。將結果示於表1。 The measurement and evaluation were performed in the same manner as in Example 1, except that the coating liquid was used. The results are shown in Table 1.

[比較例1] [Comparative Example 1]

《透明被膜形成用之塗佈液之製備》 "Preparation of Coating Liquid for Forming Transparent Coating"

將己二醇(和光純藥股份有限公司製造)4507.86g、純水214.93g及濃度61質量%之硝酸3.58g混合,並攪拌5分鐘。繼而,一面進行攪拌一面添加作為B成分(4官能矽烷化合物)之矽酸乙酯(多摩化學股份有限公司製造:SiO2濃度28.8質量%)1243.78g,並攪拌30分鐘,而製備固形物成分濃度6.0質量%之4官能矽烷化合物溶液。 4507.86 g of hexanediol (made by Wako Pure Chemical Industries, Ltd.), 214.93 g of pure water, and 3.58 g of nitric acid with a concentration of 61% by mass were mixed and stirred for 5 minutes. Subsequently, 1243.78 g of ethyl silicate (made by Tama Chemical Co., Ltd.: SiO 2 concentration 28.8% by mass) as a component B (4-functional silane compound) was added while stirring, and stirred for 30 minutes to prepare a solid content concentration 6.0% by mass of 4-functional silane compound solution.

將己二醇(和光純藥股份有限公司製造)2527.95g、以TiO2濃度計16.4質量%之乙醯丙酮酸鈦(Matsumoto Fine Chemical股份有限公司製造:Orgatix TC-100,TiO2濃度16.4%)238.81g混合,並攪拌5分鐘,而製備固形物成分濃度6.0質量%之金屬烷氧化物溶液。 2527.95 g of hexylene glycol (Wako Pure Chemical Industries, Ltd.), 16.4 mass% titanium acetonate based on TiO 2 concentration (Matsumoto Fine Chemical Co., Ltd.: Organatix TC-100, TiO 2 concentration 16.4%) 238.81 g was mixed and stirred for 5 minutes to prepare a metal alkoxide solution having a solid content concentration of 6.0% by mass.

繼而,一面進行攪拌一面將金屬烷氧化物溶液混合至4官能矽烷化合物溶液中,攪拌10分鐘後,添加純水49.75g,於5℃攪拌144小 時。攪拌結束後,利用0.2μm之過濾器進行過濾,將凝集物等去除,而製備濃度CT為6.0質量%之透明被膜形成用之塗佈液。 Then, while stirring, the metal alkoxide solution was mixed into the 4-functional silane compound solution, and after stirring for 10 minutes, 49.75 g of pure water was added, and the mixture was stirred at 5°C for 144 hours Time. After the stirring was completed, filtration was performed with a 0.2 μm filter to remove aggregates and the like, and a coating liquid for forming a transparent film having a concentration CT of 6.0% by mass was prepared.

將所獲得之塗佈液之各成分之濃度、莫耳比等示於表2。 Table 2 shows the concentration, molar ratio, etc. of the components of the obtained coating liquid.

《附透明被膜基材之評價》 "Evaluation of Substrates with Transparent Coating"

使用該塗佈液,將紫外線照射後之加熱條件設為350℃、30分鐘,除此以外,以與實施例1相同之方式進行測定、評價。將結果示於表2。 Using this coating liquid, measurement and evaluation were performed in the same manner as in Example 1, except that the heating conditions after ultraviolet irradiation were 350° C. for 30 minutes. The results are shown in Table 2.

[比較例2] [Comparative Example 2]

《附透明被膜基材之評價》 "Evaluation of Substrates with Transparent Coating"

於比較例1中,使用該塗佈液,將紫外線照射後之加熱條件設為200℃、30分鐘,除此以外,以與實施例1相同之方式進行測定、評價。將結果示於表2。 In Comparative Example 1, measurement and evaluation were carried out in the same manner as in Example 1 except that the coating liquid was used and the heating conditions after ultraviolet irradiation were set at 200°C for 30 minutes. The results are shown in Table 2.

[比較例3] [Comparative Example 3]

《附透明被膜基材之評價》 "Evaluation of Substrates with Transparent Coating"

於比較例1中,使用該塗佈液,將紫外線照射後之加熱條件設為120℃、30分鐘,除此以外,以與實施例1相同之方式進行測定、評價。將結果示於表2。 In Comparative Example 1, measurement and evaluation were performed in the same manner as in Example 1, except that the coating liquid was used and the heating conditions after ultraviolet irradiation were 120°C and 30 minutes. The results are shown in Table 2.

[比較例4] [Comparative Example 4]

《透明被膜形成用之塗佈液之製備》 "Preparation of Coating Liquid for Forming Transparent Coating"

(步驟1) (step 1)

將己二醇(和光純藥股份有限公司製造)4507.86g、純水214.93g及濃度61質量%之硝酸3.58g混合,攪拌5分鐘。繼而,一面進行 攪拌一面添加作為B成分(4官能矽烷化合物)之矽酸乙酯(多摩化學股份有限公司製造:SiO2濃度28.8質量%)1243.78g,並攪拌30分鐘,而製備固形物成分濃度6.0質量%之預備液1。 4507.86 g of hexanediol (manufactured by Wako Pure Chemical Industries, Ltd.), 214.93 g of pure water, and 3.58 g of nitric acid with a concentration of 61% by mass were mixed and stirred for 5 minutes. Subsequently, 1243.78 g of ethyl silicate (made by Tama Chemical Co., Ltd.: SiO 2 concentration 28.8% by mass) as a component B (4-functional silane compound) was added while stirring, and stirred for 30 minutes to prepare a solid content concentration 6.0% by mass of preparation solution 1.

(步驟2) (Step 2)

將己二醇(和光純藥股份有限公司製造)1931.33g、作為A成分之乙醯丙酮(和光純藥股份有限公司製造)1195.89g、作為C成分之鈦酸四異丙酯(Matsumoto Fine Chemical股份有限公司製造:Orgatix TA-10,TiO2濃度28質量%)852.88g混合,並攪拌5分鐘,而製備固形物成分濃度6.0質量%之預備液2。 1931.33g of hexylene glycol (Wako Pure Chemical Industries, Ltd.), 1195.89g of acetone as a component (made by Wako Pure Chemical Industries, Ltd.), tetraisopropyl titanate (Matsumoto Fine Chemical Co., Ltd.) as a C component Manufactured by Co., Ltd.: Organix TA-10, TiO 2 concentration 28% by mass) 852.88g was mixed and stirred for 5 minutes to prepare a preparative solution 2 with a solid content concentration of 6.0% by mass.

(步驟3) (Step 3)

一面進行攪拌一面將預備液2混合至預備液1中,攪拌10分鐘後,添加純水49.75g,於5℃攪拌144小時。攪拌結束後,利用0.2μm之過濾器進行過濾,將凝集物等去除,而製備濃度CT為6.0質量%之透明被膜形成用之塗佈液。 While stirring, the preliminary liquid 2 was mixed into the preliminary liquid 1, and after stirring for 10 minutes, 49.75 g of pure water was added and stirred at 5° C. for 144 hours. After the stirring was completed, filtration was performed with a 0.2 μm filter to remove aggregates and the like, and a coating liquid for forming a transparent film having a concentration CT of 6.0% by mass was prepared.

將所獲得之塗佈液之各成分之濃度、莫耳比等示於表2。 Table 2 shows the concentration, molar ratio, etc. of the components of the obtained coating liquid.

《附透明被膜基材之評價》 "Evaluation of Substrates with Transparent Coating"

除了使用該塗佈液以外,以與實施例1相同之方式進行測定、評價。將結果示於表2。 The measurement and evaluation were performed in the same manner as in Example 1, except that the coating liquid was used. The results are shown in Table 2.

[比較例5] [Comparative Example 5]

《透明被膜形成用之塗佈液之製備》 "Preparation of Coating Liquid for Forming Transparent Coating"

(步驟1) (step 1)

將己二醇(和光純藥股份有限公司製造)4507.86g、純水 214.93g及濃度61質量%之硝酸3.58g混合,並攪拌5分鐘。繼而,一面進行攪拌一面添加作為B成分(4官能矽烷化合物)之矽酸乙酯(多摩化學股份有限公司製造:SiO2濃度28.8質量%)1243.78g,攪拌30分鐘,而製備固形物成分濃度6.0質量%之預備液1。 4507.86 g of hexanediol (made by Wako Pure Chemical Industries, Ltd.), 214.93 g of pure water, and 3.58 g of nitric acid with a concentration of 61% by mass were mixed and stirred for 5 minutes. Subsequently, 1243.78 g of ethyl silicate (product of Tama Chemical Co., Ltd.: SiO 2 concentration 28.8% by mass) as a component B (4-functional silane compound) was added while stirring, and stirred for 30 minutes to prepare a solid content concentration of 6.0 Preparative solution of mass% 1.

(步驟2) (Step 2)

將己二醇(和光純藥股份有限公司製造)3067.43g、作為A成分之乙醯丙酮(和光純藥股份有限公司製造)59.79g、作為C成分之鈦酸四異丙酯(Matsumoto Fine Chemical股份有限公司製造:Orgatix TA-10,TiO2濃度28質量%)852.88g混合,並攪拌5分鐘,而製備固形物成分濃度6.0質量%之預備液2。 3067.43g of hexanediol (Wako Pure Chemical Industries, Ltd.), 59.79g of acetone as a component (made by Wako Pure Chemical Industries, Ltd.), tetraisopropyl titanate (Matsumoto Fine Chemical Co., Ltd.) as a component C Manufactured by Co., Ltd.: Organix TA-10, TiO 2 concentration 28% by mass) 852.88g was mixed and stirred for 5 minutes to prepare a preparative solution 2 with a solid content concentration of 6.0% by mass.

(步驟3) (Step 3)

一面進行攪拌一面將預備液2混合至預備液1中,攪拌10分鐘後,添加純水49.75g,於5℃攪拌144小時,但於攪拌途中觀察到凝膠化,而未進行附透明被膜基材之製作、評價。 While stirring, the preparation solution 2 was mixed into the preparation solution 1. After stirring for 10 minutes, 49.75 g of pure water was added and stirred at 5° C. for 144 hours. However, gelation was observed during the stirring without carrying a transparent film base Material production and evaluation.

將所獲得之塗佈液(包含凝膠)中之各成分之濃度、莫耳比等示於表2。 Table 2 shows the concentration, molar ratio, and the like of each component in the obtained coating liquid (including gel).

[比較例6] [Comparative Example 6]

《透明被膜形成用之塗佈液之製備》 "Preparation of Coating Liquid for Forming Transparent Coating"

除了以下之步驟以外,以與實施例1相同之方式製備塗佈液。 Except for the following steps, a coating liquid was prepared in the same manner as in Example 1.

將所獲得之塗佈液之各成分之濃度、莫耳比等示於表2。 Table 2 shows the concentration, molar ratio, etc. of the components of the obtained coating liquid.

(步驟1) (step 1)

將作為B成分(3官能矽烷化合物)之KBM-13(信越化學工業股份有限公司製造:SiO2濃度44.1質量%)1184.22g及Solmix AP-11(Japan Alcohol Trading股份有限公司製造)3113.87g混合,並攪拌30分鐘。繼而,一面進行攪拌一面歷時30分鐘逐次添加濃度0.1質量%之硝酸947.25g,並攪拌30分鐘。此時之pH值為2.0。於其中一面進行攪拌一面添加三乙醇胺(林純藥工業股份有限公司製造)8.40g,攪拌10分鐘,而製備固形物成分濃度9.9質量%之預備液1-1。此時之pH值為7.0。 1184.22g of KBM-13 (manufactured by Shin-Etsu Chemical Co., Ltd.: SiO 2 concentration 44.1% by mass) and Solmix AP-11 (manufactured by Japan Alcohol Trading Co., Ltd.) 3131.87g as a component B (trifunctional silane compound) were mixed, And stir for 30 minutes. Then, while stirring, 947.25 g of nitric acid with a concentration of 0.1% by mass was added sequentially over 30 minutes, and stirred for 30 minutes. The pH value at this time is 2.0. Triethanolamine (manufactured by Linchun Pharmaceutical Industry Co., Ltd.) 8.40 g was added to one side while stirring, and stirred for 10 minutes to prepare a preliminary liquid 1-1 having a solid content concentration of 9.9% by mass. The pH at this time is 7.0.

於己二醇(和光純藥股份有限公司製造)3502.49g中,一面進行攪拌一面添加上述預備液1-1,攪拌30分鐘,而製備固形物成分濃度6.0質量%之預備液1。 To 3502.49 g of hexanediol (manufactured by Wako Pure Chemical Industries, Ltd.), the above prepared liquid 1-1 was added while stirring, and stirred for 30 minutes to prepare a prepared liquid 1 having a solid content concentration of 6.0% by mass.

(步驟2) (Step 2)

將己二醇(和光純藥股份有限公司製造)893.32g、作為A成分之乙醯丙酮(和光純藥股份有限公司製造)44.85g、作為C成分之鈦酸四異丙酯(Matsumoto Fine Chemical股份有限公司製造:Orgatix TA-10,TiO2濃度28質量%)255.86g混合,攪拌5分鐘,而製備固形物成分濃度6.0質量%之預備液2。 Hexanediol (Wako Pure Chemical Industries, Ltd.) 893.32g, A component acetone (Wako Pure Chemical Industries, Ltd.) 44.85g, C component tetraisopropyl titanate (Matsumoto Fine Chemical Co., Ltd.) Manufactured by Co., Ltd.: Organix TA-10, TiO 2 concentration 28% by mass) 255.86g was mixed and stirred for 5 minutes to prepare a preparative solution 2 with a solid content concentration of 6.0% by mass.

《附透明被膜基材之評價》 "Evaluation of Substrates with Transparent Coating"

除了使用該塗佈液以外,以與實施例1相同之方式進行測定、評價。將結果示於表2。 The measurement and evaluation were performed in the same manner as in Example 1, except that the coating liquid was used. The results are shown in Table 2.

[比較例7] [Comparative Example 7]

《透明被膜形成用之塗佈液之製備》 "Preparation of Coating Liquid for Forming Transparent Coating"

除了以下之步驟以外,以與實施例1相同之方式製備塗佈 液。 The coating was prepared in the same manner as in Example 1 except for the following steps liquid.

將所獲得之塗佈液之各成分之濃度、莫耳比等示於表2。 Table 2 shows the concentration, molar ratio, etc. of the components of the obtained coating liquid.

(步驟1) (step 1)

將作為B成分(3官能矽烷化合物)之KBM-13(信越化學工業股份有限公司製造:SiO2濃度44.1質量%)67.28g及Solmix AP-11(Japan Alcohol Trading股份有限公司製造)176.92g混合,並攪拌30分鐘。繼而,一面進行攪拌一面歷時30分鐘逐次添加濃度0.1質量%之硝酸53.82g,並攪拌30分鐘。此時之pH值為2.1。於其中一面進行攪拌一面添加三乙醇胺(林純藥工業股份有限公司製造)0.48g,攪拌10分鐘,而製備固形物成分濃度9.9質量%之預備液1-1。此時之pH值為7.1。 67.28 g of KBM-13 (manufactured by Shin-Etsu Chemical Co., Ltd.: SiO 2 concentration 44.1% by mass) as a component B (trifunctional silane compound) and 176.92 g of Solmix AP-11 (manufactured by Japan Alcohol Trading Co., Ltd.) were mixed, And stir for 30 minutes. Then, while stirring, 53.82 g of nitric acid with a concentration of 0.1% by mass was added sequentially over 30 minutes, and stirred for 30 minutes. The pH at this time is 2.1. On one side, 0.48 g of triethanolamine (manufactured by Linchun Pharmaceutical Co., Ltd.) was added while stirring, and the mixture was stirred for 10 minutes to prepare a preliminary liquid 1-1 having a solid content concentration of 9.9% by mass. The pH at this time is 7.1.

於己二醇(和光純藥股份有限公司製造)199.00g中,一面進行攪拌一面添加上述預備液1-1,攪拌30分鐘,而製備固形物成分濃度6.0質量%之預備液1。 To 199.00 g of hexylene glycol (manufactured by Wako Pure Chemical Industries, Ltd.), the above-mentioned preparatory liquid 1-1 was added while stirring, and stirred for 30 minutes to prepare a preparatory liquid 1 having a solid content concentration of 6.0% by mass.

(步驟2) (Step 2)

將己二醇(和光純藥股份有限公司製造)7072.12g、作為A成分之乙醯丙酮(和光純藥股份有限公司製造)355.03g、作為C成分之鈦酸四異丙酯(Matsumoto Fine Chemical股份有限公司製造:Orgatix TA-10,TiO2濃度28質量%)2025.59g混合,攪拌5分鐘,而製備固形物成分濃度6.0質量%之預備液2。 Hexanediol (manufactured by Wako Pure Chemical Industries, Ltd.) 7072.12g, acetone as component A (manufactured by Wako Pure Chemical Industries, Ltd.) 355.03g, and tetraisopropyl titanate as component C (Matsumoto Fine Chemical Co., Ltd.) Co., Ltd.: Orgatix TA-10, TiO 2 concentration 28% by mass) 2025.59g was mixed and stirred for 5 minutes to prepare a preparation solution 2 with a solid content concentration of 6.0% by mass.

《附透明被膜基材之評價》 "Evaluation of Substrates with Transparent Coating"

除了使用該塗佈液以外,以與實施例1相同之方式進行測定、評價。將結果示於表2。 The measurement and evaluation were performed in the same manner as in Example 1, except that the coating liquid was used. The results are shown in Table 2.

[比較例8] [Comparative Example 8]

《透明被膜形成用之塗佈液之製備》 "Preparation of Coating Liquid for Forming Transparent Coating"

除了以下之步驟以外,以與實施例1相同之方式製備塗佈液。 Except for the following steps, a coating liquid was prepared in the same manner as in Example 1.

將所獲得之塗佈液之各成分之濃度、莫耳比等示於表2。 Table 2 shows the concentration, molar ratio, etc. of the components of the obtained coating liquid.

(步驟1) (step 1)

將作為B3成分(3官能矽烷化合物)之KBM-13(信越化學工業股份有限公司製造:SiO2濃度44.1質量%)134.57g及Solmix AP-11(Japan Alcohol Trading股份有限公司製造)353.85g混合,並攪拌30分鐘。繼而,一面進行攪拌一面歷時30分鐘逐次添加濃度0.1質量%之硝酸107.64g,並攪拌30分鐘。此時之pH值為2.0。於其中一面進行攪拌一面添加三乙醇胺(林純藥工業股份有限公司製造)0.95g,攪拌10分鐘,而製備固形物成分濃度9.9質量%之預備液1-1。此時之pH值為6.9。 134.57 g of KBM-13 (manufactured by Shin-Etsu Chemical Industry Co., Ltd.: SiO 2 concentration 44.1% by mass) as a B3 component (trifunctional silane compound) and 135.85 g of Solmix AP-11 (manufactured by Japan Alcohol Trading Co., Ltd.) were mixed, And stir for 30 minutes. Then, while stirring, 107.64 g of nitric acid with a concentration of 0.1% by mass was added sequentially over 30 minutes, and stirred for 30 minutes. The pH value at this time is 2.0. On one side, 0.95 g of triethanolamine (manufactured by Linchun Pharmaceutical Co., Ltd.) was added while stirring, and the mixture was stirred for 10 minutes to prepare a preliminary liquid 1-1 having a solid content concentration of 9.9% by mass. At this time, the pH value was 6.9.

於己二醇(和光純藥股份有限公司製造)1524.98g中,將純水53.73g及濃度61質量%之硝酸0.90g混合,並攪拌5分鐘。繼而,一面進行攪拌一面添加作為B4成分(4官能矽烷化合物)之矽酸乙酯(多摩化學股份有限公司製造:SiO2濃度28.8質量%)310.95g,並攪拌30分鐘。進而,一面進行攪拌一面添加上述預備液1-1,攪拌30分鐘,而製備固形物成分濃度6.0質量%之預備液1。 In 1524.98 g of hexanediol (manufactured by Wako Pure Chemical Industries, Ltd.), 53.73 g of pure water and 0.90 g of nitric acid with a concentration of 61% by mass were mixed and stirred for 5 minutes. Subsequently, 310.95 g of ethyl silicate (produced by Tama Chemical Co., Ltd.: SiO 2 concentration 28.8% by mass) as a B4 component (4-functional silane compound) was added while stirring, and stirred for 30 minutes. Furthermore, the above-mentioned preparatory liquid 1-1 was added while stirring, and stirred for 30 minutes to prepare preparatory liquid 1 having a solid content concentration of 6.0% by mass.

(步驟2) (Step 2)

將己二醇(和光純藥股份有限公司製造)3621.25g、作為A成分之乙醯丙酮(和光純藥股份有限公司製造)2242.29g、作為C成分之 鈦酸四異丙酯(Matsumoto Fine Chemical股份有限公司製造:Orgatix TA-10,TiO2濃度28質量%)1599.15g混合,攪拌5分鐘,而製備固形物成分濃度6.0質量%之預備液2。 3621.25g of hexylene glycol (manufactured by Wako Pure Chemical Industries, Ltd.), acetylacetone (manufactured by Wako Pure Chemical Industries, Ltd.) as component A 2242.29g, and tetraisopropyl titanate (Matsumoto Fine Chemical Co., Ltd.) as component C Manufactured by Co., Ltd.: Organix TA-10, TiO 2 concentration 28% by mass) 1591.15 g was mixed and stirred for 5 minutes to prepare a preparative solution 2 with a solid content concentration of 6.0% by mass.

《附透明被膜基材之評價》 "Evaluation of Substrates with Transparent Coating"

除了使用該塗佈液以外,以與實施例1相同之方式進行測定、評價。將結果示於表2。 The measurement and evaluation were performed in the same manner as in Example 1, except that the coating liquid was used. The results are shown in Table 2.

再者,使用B成分(3官能矽烷化合物及其水解縮合物之至少一者)之實施例9~13及比較例6~8中所製備之各透明被膜形成用塗佈液之pH值如下。 In addition, the pH values of the coating solutions for forming transparent films prepared in Examples 9 to 13 and Comparative Examples 6 to 8 using the component B (at least one of trifunctional silane compounds and their hydrolyzed condensates) are as follows.

實施例9(pH值5.0) Example 9 (pH 5.0)

實施例10(pH值5.5) Example 10 (pH 5.5)

實施例11(pH值6.0) Example 11 (pH 6.0)

實施例12(pH值4.5) Example 12 (pH 4.5)

實施例13(pH值4.0) Example 13 (pH 4.0)

比較例6(pH值6.0) Comparative Example 6 (pH 6.0)

比較例7(pH值4.0) Comparative Example 7 (pH 4.0)

比較例8(pH值3.3) Comparative Example 8 (pH 3.3)

Figure 105108808-A0305-02-0046-2
Figure 105108808-A0305-02-0046-2

Figure 105108808-A0202-12-0045-3
Figure 105108808-A0202-12-0045-3

[評價結果] [Evaluation results]

如表1所示,根據實施例1~13可知,使用本發明之塗佈液所製造之附透明被膜基材於鉛筆硬度、耐擦傷性及抗龜裂性方面優異。 As shown in Table 1, it is understood from Examples 1 to 13 that the transparent coating base material produced using the coating liquid of the present invention is excellent in pencil hardness, scratch resistance, and crack resistance.

另一方面,使用比較例1~8之塗佈液之附透明被膜基材無法滿足硬度及抗龜裂性之兩者。 On the other hand, the transparent coating base material using the coating liquids of Comparative Examples 1 to 8 cannot satisfy both hardness and crack resistance.

Claims (10)

一種透明被膜形成用之塗佈液,其係將可與金屬烷氧化物形成螯合物之有機化合物(A成分)、下述式(2)所表示之3官能以上之矽烷化合物及其水解縮合物之至少一者(B成分)、及下述式(3)所表示之金屬烷氧化物及其水解縮合物之至少一者(C成分)溶解或分散至包含水及有機溶劑之混合溶劑中而成者,其特徵在於:上述A成分之莫耳數(M1)與上述C成分之莫耳數(M3)之莫耳比(M1/M3)為0.25以上且未達2.0,上述B成分之莫耳數(M2)與上述C成分之莫耳數(M3)之莫耳比(M2/M3)為0.1以上且9.0以下,上述有機溶劑之沸點為120℃以上,且於20℃之黏度為1~400mPa‧s之範圍,(R3)(4-m)Si(R4)m (2)(m為3或4之至少一者;R3為碳數1至8之未經取代或經取代之烷基、未經取代或經取代之芳基、及乙烯基之任一者;R4為碳數1至8之未經取代或經取代之烷氧基、未經取代或經取代之芳氧基、乙烯氧基、羥基、氫原子、及鹵素原子之任一者,可相同亦可不同)M(OR5)n (3)(M為選自Be、Al、Sc、Ti、V、Cr、Fe、Ni、Zn、Ga、Ge、As、 Se、Y、Zr、Nb、In、Sn、Sb、Te、Hf、Ta、W、Pb、B、Bi、Ce、及Cu中之1種元素;R5為碳數1至10之未經取代或經取代之烷基;n為與M之原子價相同之數)。 A coating liquid for forming a transparent film, which is an organic compound (component A) that can form a chelate compound with a metal alkoxide, a trifunctional silane compound represented by the following formula (2) and its hydrolysis condensation At least one of the substances (component B), and at least one of the metal alkoxide represented by the following formula (3) and its hydrolyzed condensate (component C) are dissolved or dispersed in a mixed solvent containing water and an organic solvent The author is characterized in that the molar ratio (M1) of the above component A (M1) to the molar number (M3) of the above component C (M1/M3) is more than 0.25 and less than 2.0, and the above component B The molar ratio (M2) of the molar number (M2) to the molar number (M3) of the above component C (M2/M3) is 0.1 or more and 9.0 or less, the boiling point of the organic solvent is 120°C or more, and the viscosity at 20°C is 1~400mPa‧s, (R 3 ) (4-m) Si(R 4 ) m (2)(m is at least one of 3 or 4; R 3 is unsubstituted or carbon number 1 to 8) Any one of substituted alkyl, unsubstituted or substituted aryl, and vinyl; R 4 is an unsubstituted or substituted alkoxy, unsubstituted, or substituted having 1 to 8 carbon atoms Aryloxy group, vinyloxy group, hydroxyl group, hydrogen atom, and halogen atom, which may be the same or different) M (OR 5 ) n (3) (M is selected from Be, Al, Sc, Ti, Among V, Cr, Fe, Ni, Zn, Ga, Ge, As, Se, Y, Zr, Nb, In, Sn, Sb, Te, Hf, Ta, W, Pb, B, Bi, Ce, and Cu 1 element; R 5 is an unsubstituted or substituted alkyl group having 1 to 10 carbon atoms; n is the same number as the atomic valence of M). 一種透明被膜形成用之塗佈液,其係將可與金屬烷氧化物形成螯合物之有機化合物(A成分)、下述式(2)所表示之3官能以上之矽烷化合物及其水解縮合物之至少一者(B成分)、及下述式(3)所表示之金屬烷氧化物及其水解縮合物之至少一者(C成分)溶解或分散至包含水及有機溶劑之混合溶劑中而成者,其特徵在於:上述A成分之莫耳數(M1)與上述C成分之莫耳數(M3)之莫耳比(M1/M3)為0.25以上且未達2.0,上述B成分之莫耳數(M2)與上述C成分之莫耳數(M3)之莫耳比(M2/M3)為0.1以上且9.0以下,源自上述B成分之SiO2換算濃度(濃度C2)為0.005~12質量%之範圍,源自上述C成分之元素M之MOx換算濃度(濃度C3)為0.02~14.25質量%之範圍,上述濃度C2與上述濃度C3之合計(濃度CT)為0.1~15質量%之範圍,(R3)(4-m)Si(R4)m (2) (m為3或4之至少一者;R3為碳數1至8之未經取代或經取代之烷基、未經取代或經取代之芳基、及乙烯基之任一者;R4為碳數1至8之未經取代或經取代之烷氧基、未經取代或經取代之芳氧基、乙烯氧基、羥基、氫原子、及鹵素原子之任一者,可相同亦可不同)M(OR5)n (3)(M為選自Be、Al、Sc、Ti、V、Cr、Fe、Ni、Zn、Ga、Ge、As、Se、Y、Zr、Nb、In、Sn、Sb、Te、Hf、Ta、W、Pb、B、Bi、Ce、及Cu中之1種元素;R5為碳數1至10之未經取代或經取代之烷基;n為與M之原子價相同之數)。 A coating liquid for forming a transparent film, which is an organic compound (component A) that can form a chelate compound with a metal alkoxide, a trifunctional silane compound represented by the following formula (2) and its hydrolysis condensation At least one of the substances (component B), and at least one of the metal alkoxide represented by the following formula (3) and its hydrolyzed condensate (component C) are dissolved or dispersed in a mixed solvent containing water and an organic solvent The author is characterized in that the molar ratio (M1) of the above component A (M1) to the molar number (M3) of the above component C (M1/M3) is more than 0.25 and less than 2.0, and the above component B The molar ratio (M2/M3) of the molar number (M2) and the molar number (M3) of the above component C is 0.1 or more and 9.0 or less, and the SiO 2 conversion concentration (concentration C2) derived from the above component B is 0.005 to In the range of 12% by mass, the MO x conversion concentration (concentration C3) of the element M derived from the above C component is in the range of 0.02 to 14.25% by mass, and the total of the above concentration C2 and the above concentration C3 (concentration CT) is 0.1 to 15 mass % Range, (R 3 ) (4-m) Si(R 4 ) m (2) (m is at least one of 3 or 4; R 3 is an unsubstituted or substituted alkane with a carbon number of 1 to 8 Either of a group, an unsubstituted or substituted aryl group, and a vinyl group; R 4 is an unsubstituted or substituted alkoxy group having 1 to 8 carbon atoms, an unsubstituted or substituted aryloxy group , Any of vinyloxy, hydroxyl, hydrogen, and halogen atoms, which may be the same or different) M(OR 5 ) n (3) (M is selected from Be, Al, Sc, Ti, V, Cr, One element of Fe, Ni, Zn, Ga, Ge, As, Se, Y, Zr, Nb, In, Sn, Sb, Te, Hf, Ta, W, Pb, B, Bi, Ce, and Cu; R 5 is an unsubstituted or substituted alkyl group having 1 to 10 carbon atoms; n is the same number as the valence of M). 如申請專利範圍第1或2項之透明被膜形成用之塗佈液,其中,上述B成分為3官能矽烷化合物及其水解縮合物之至少一者時,上述B成分之莫耳數(M2)與上述C成分之莫耳數(M3)之莫耳比(M2/M3)為0.5~8.0之範圍。 If the coating liquid for forming a transparent film according to item 1 or 2 of the patent application, wherein the component B is at least one of a trifunctional silane compound and its hydrolyzed condensate, the mole number (M2) of the component B The molar ratio (M2/M3) to the molar number (M3) of the above C component is in the range of 0.5 to 8.0. 如申請專利範圍第1或2項之透明被膜形成用之塗佈液,其中,上述塗佈液包含3官能之矽烷化合物及其水解縮合物之至少一者時,該塗佈液之pH值為4~8。 For example, the coating liquid for forming a transparent film according to item 1 or 2 of the patent application range, where the coating liquid contains at least one of a trifunctional silane compound and its hydrolyzed condensate, the pH of the coating liquid is 4~8. 一種透明被膜形成用塗佈液之製造方法,其實施以下之步驟:步驟1:將有機溶劑、水、式(2)所表示之3官能以上之矽烷化合物(B成分)、及水解觸媒進行摻合,而製備預備液1之步驟;步驟2:將有機溶劑、可與金屬烷氧化物形成螯合物之有機化合物(A成分)、及式(3)所表示之金屬烷氧化物(C成分)進行摻合,而製備預備液2之步驟(其中,上述A成分之摻合量相對於上述C成分 之元素M1莫耳為0.25莫耳以上且未達2.0莫耳之範圍);步驟3:將上述預備液1、上述預備液2、及水進行摻合,於5℃以上且40℃以下之溫度下進行攪拌之步驟;(R3)(4-m)Si(R4)m (2)(m為3或4之至少一者;R3為碳數1至8之未經取代或經取代之烷基、未經取代或經取代之芳基、及乙烯基之任一者;R4為碳數1至8之未經取代或經取代之烷氧基、未經取代或經取代之芳氧基、乙烯氧基、羥基、氫原子、及鹵素原子之任一者,可相同亦可不同)M(OR5)n (3)(M為選自Be、Al、Sc、Ti、V、Cr、Fe、Ni、Zn、Ga、Ge、As、Se、Y、Zr、Nb、In、Sn、Sb、Te、Hf、Ta、W、Pb、B、Bi、Ce、及Cu中之1種元素,R5為碳數1至10之未經取代或經取代之烷基,n為與M之原子價相同之數)。 A method for manufacturing a coating liquid for forming a transparent film, which implements the following steps: Step 1: an organic solvent, water, a trifunctional silane compound (component B) represented by formula (2) or more, and a hydrolysis catalyst are carried out The step of blending and preparing the preparation solution 1; Step 2: The organic solvent, the organic compound (component A) that can form a chelate compound with the metal alkoxide, and the metal alkoxide (C) represented by the formula (3) Ingredients) for blending, and the step of preparing the preliminary solution 2 (wherein the blending amount of the above-mentioned component A relative to the element M1 of the above-mentioned component C is more than 0.25 mol and less than 2.0 mol); Step 3 : Blending the above preparation solution 1, the above preparation solution 2, and water, and stirring at a temperature between 5°C and 40°C; (R 3 ) (4-m) Si(R 4 ) m ( 2) (m is at least one of 3 or 4; R 3 is any of unsubstituted or substituted alkyl groups having 1 to 8 carbon atoms, unsubstituted or substituted aryl groups, and vinyl groups; R 4 is any of unsubstituted or substituted alkoxy groups having 1 to 8 carbon atoms, unsubstituted or substituted aryloxy groups, vinyloxy groups, hydroxyl groups, hydrogen atoms, and halogen atoms, which may be the same May be different) M(OR 5 ) n (3)(M is selected from Be, Al, Sc, Ti, V, Cr, Fe, Ni, Zn, Ga, Ge, As, Se, Y, Zr, Nb, One element in In, Sn, Sb, Te, Hf, Ta, W, Pb, B, Bi, Ce, and Cu, R 5 is an unsubstituted or substituted alkyl group having 1 to 10 carbon atoms, n It is the same as the valence of M). 如申請專利範圍第5項之被膜形成用之塗佈液之製造方法,其中,上述B成分為3官能矽烷化合物時,於上述步驟1中所獲得之預備液1之pH值為5~8之範圍。 For example, the method for manufacturing a coating liquid for forming a coating film according to item 5 of the patent application, wherein, when the above-mentioned component B is a trifunctional silane compound, the pH value of the preparation solution 1 obtained in the above step 1 is 5 to 8. range. 如申請專利範圍第5項之被膜形成用之塗佈液之製造方法,其中,上述預備液1所含之上述B成分之重量平均分子量(聚苯乙烯換算)為300以上且3000以下。 The method for manufacturing a coating liquid for forming a coating according to item 5 of the patent application range, wherein the weight average molecular weight (in terms of polystyrene) of the component B contained in the preliminary liquid 1 is 300 or more and 3000 or less. 一種附被膜基材之製造方法,其具備:塗佈步驟,其係將申請專利範圍第1至4項中任一項之塗佈液塗佈至基材; 乾燥步驟,其係於上述塗佈步驟之後,使上述基材上之上述塗佈液乾燥而形成塗佈膜;及硬化步驟,其係使上述塗佈膜硬化而形成被膜。 A method for manufacturing a substrate with a coating, comprising: a coating step, which is to apply the coating liquid according to any one of items 1 to 4 of the patent application scope to the substrate; The drying step is to dry the coating liquid on the substrate to form a coating film after the coating step; and the curing step is to harden the coating film to form a coating film. 如申請專利範圍第8項之附被膜基材之製造方法,其中,於上述乾燥步驟中,上述塗佈液係於80℃以上且150℃以下進行加熱。 A method for manufacturing a substrate with a coating film as claimed in item 8 of the patent application range, wherein in the drying step, the coating liquid is heated at 80°C or higher and 150°C or lower. 如申請專利範圍第8項之附被膜基材之製造方法,其具備:於上述硬化步驟中,對形成於上述基材上之上述塗佈膜照射紫外線,且於80℃以上且300℃以下進行加熱之步驟。 The method for manufacturing a substrate with a coating film as claimed in item 8 of the patent scope includes: in the curing step, the coating film formed on the substrate is irradiated with ultraviolet rays at a temperature of 80°C or more and 300°C or less Steps of heating.
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