TWI680980B - Sulfur-containing amine-based organic oxysilane compound and manufacturing method thereof - Google Patents
Sulfur-containing amine-based organic oxysilane compound and manufacturing method thereof Download PDFInfo
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- TWI680980B TWI680980B TW105102863A TW105102863A TWI680980B TW I680980 B TWI680980 B TW I680980B TW 105102863 A TW105102863 A TW 105102863A TW 105102863 A TW105102863 A TW 105102863A TW I680980 B TWI680980 B TW I680980B
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- 150000001875 compounds Chemical class 0.000 title claims abstract description 44
- 150000001412 amines Chemical class 0.000 title claims abstract description 30
- 229910052717 sulfur Inorganic materials 0.000 title claims abstract description 29
- 239000011593 sulfur Substances 0.000 title claims abstract description 28
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 title claims abstract description 27
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 11
- 125000005842 heteroatom Chemical group 0.000 claims abstract description 23
- 239000000203 mixture Substances 0.000 claims abstract description 22
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 18
- 125000001183 hydrocarbyl group Chemical group 0.000 claims abstract description 14
- 125000004433 nitrogen atom Chemical group N* 0.000 claims abstract description 12
- 150000002430 hydrocarbons Chemical class 0.000 claims description 41
- 125000004432 carbon atom Chemical group C* 0.000 claims description 29
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 15
- 229910052799 carbon Inorganic materials 0.000 claims description 15
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 11
- 239000004215 Carbon black (E152) Substances 0.000 claims description 6
- 229930195733 hydrocarbon Natural products 0.000 claims description 6
- -1 silane compound Chemical class 0.000 abstract description 45
- 125000003277 amino group Chemical group 0.000 abstract description 13
- 239000000654 additive Substances 0.000 abstract description 9
- 230000000694 effects Effects 0.000 abstract description 6
- 239000003973 paint Substances 0.000 abstract description 6
- 230000000996 additive effect Effects 0.000 abstract description 5
- 229910000077 silane Inorganic materials 0.000 abstract description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract description 2
- 239000001301 oxygen Substances 0.000 abstract description 2
- 229910052760 oxygen Inorganic materials 0.000 abstract description 2
- 238000002329 infrared spectrum Methods 0.000 description 12
- 238000000425 proton nuclear magnetic resonance spectrum Methods 0.000 description 12
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical group [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 11
- 238000006243 chemical reaction Methods 0.000 description 11
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 10
- 125000003545 alkoxy group Chemical group 0.000 description 10
- 239000002904 solvent Substances 0.000 description 10
- 125000003118 aryl group Chemical group 0.000 description 9
- 125000002947 alkylene group Chemical group 0.000 description 8
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 8
- 125000000217 alkyl group Chemical group 0.000 description 7
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 7
- 229920005989 resin Polymers 0.000 description 7
- 239000011347 resin Substances 0.000 description 7
- 125000003944 tolyl group Chemical group 0.000 description 7
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 6
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 6
- 239000000853 adhesive Substances 0.000 description 5
- 230000001070 adhesive effect Effects 0.000 description 5
- 125000003342 alkenyl group Chemical group 0.000 description 5
- 125000003710 aryl alkyl group Chemical group 0.000 description 5
- 238000009835 boiling Methods 0.000 description 5
- 229910052801 chlorine Inorganic materials 0.000 description 5
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 5
- ZXPDYFSTVHQQOI-UHFFFAOYSA-N diethoxysilane Chemical compound CCO[SiH2]OCC ZXPDYFSTVHQQOI-UHFFFAOYSA-N 0.000 description 5
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 5
- AVTLBBWTUPQRAY-UHFFFAOYSA-N 2-(2-cyanobutan-2-yldiazenyl)-2-methylbutanenitrile Chemical compound CCC(C)(C#N)N=NC(C)(CC)C#N AVTLBBWTUPQRAY-UHFFFAOYSA-N 0.000 description 4
- UUEWCQRISZBELL-UHFFFAOYSA-N 3-trimethoxysilylpropane-1-thiol Chemical compound CO[Si](OC)(OC)CCCS UUEWCQRISZBELL-UHFFFAOYSA-N 0.000 description 4
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 4
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 4
- 125000004093 cyano group Chemical group *C#N 0.000 description 4
- 125000004185 ester group Chemical group 0.000 description 4
- 125000001033 ether group Chemical group 0.000 description 4
- 229910052731 fluorine Inorganic materials 0.000 description 4
- 125000005843 halogen group Chemical group 0.000 description 4
- 239000001257 hydrogen Substances 0.000 description 4
- 229910052739 hydrogen Inorganic materials 0.000 description 4
- 229910052740 iodine Inorganic materials 0.000 description 4
- 238000004949 mass spectrometry Methods 0.000 description 4
- 238000001819 mass spectrum Methods 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- 125000004430 oxygen atom Chemical group O* 0.000 description 4
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 4
- 239000002994 raw material Substances 0.000 description 4
- 230000006641 stabilisation Effects 0.000 description 4
- 238000011105 stabilization Methods 0.000 description 4
- 125000004434 sulfur atom Chemical group 0.000 description 4
- 125000000101 thioether group Chemical group 0.000 description 4
- 125000003396 thiol group Chemical group [H]S* 0.000 description 4
- IKYAJDOSWUATPI-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propane-1-thiol Chemical compound CO[Si](C)(OC)CCCS IKYAJDOSWUATPI-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 239000006087 Silane Coupling Agent Substances 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 125000004429 atom Chemical group 0.000 description 3
- 125000001309 chloro group Chemical group Cl* 0.000 description 3
- 125000001153 fluoro group Chemical group F* 0.000 description 3
- 125000000524 functional group Chemical group 0.000 description 3
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- GBCKRQRXNXQQPW-UHFFFAOYSA-N n,n-dimethylprop-2-en-1-amine Chemical compound CN(C)CC=C GBCKRQRXNXQQPW-UHFFFAOYSA-N 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 125000004368 propenyl group Chemical group C(=CC)* 0.000 description 3
- 125000002572 propoxy group Chemical group [*]OC([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 3
- 125000001424 substituent group Chemical group 0.000 description 3
- 239000012756 surface treatment agent Substances 0.000 description 3
- 0 **S*N(*)*I Chemical compound **S*N(*)*I 0.000 description 2
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 2
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 239000012295 chemical reaction liquid Substances 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 2
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- LSXWFXONGKSEMY-UHFFFAOYSA-N di-tert-butyl peroxide Chemical compound CC(C)(C)OOC(C)(C)C LSXWFXONGKSEMY-UHFFFAOYSA-N 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- APQKDJQPCPXLQL-UHFFFAOYSA-N hexyl-dimethoxy-methylsilane Chemical compound CCCCCC[Si](C)(OC)OC APQKDJQPCPXLQL-UHFFFAOYSA-N 0.000 description 2
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 2
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- 150000003254 radicals Chemical class 0.000 description 2
- 230000009257 reactivity Effects 0.000 description 2
- 150000004756 silanes Chemical class 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- HMUNWXXNJPVALC-UHFFFAOYSA-N 1-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]piperazin-1-yl]-2-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethanone Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)N1CCN(CC1)C(CN1CC2=C(CC1)NN=N2)=O HMUNWXXNJPVALC-UHFFFAOYSA-N 0.000 description 1
- ZWAQJGHGPPDZSF-UHFFFAOYSA-N 1-prop-2-enylpiperazine Chemical compound C=CCN1CCNCC1 ZWAQJGHGPPDZSF-UHFFFAOYSA-N 0.000 description 1
- WZFUQSJFWNHZHM-UHFFFAOYSA-N 2-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]piperazin-1-yl]-1-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethanone Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)N1CCN(CC1)CC(=O)N1CC2=C(CC1)NN=N2 WZFUQSJFWNHZHM-UHFFFAOYSA-N 0.000 description 1
- MBNRBJNIYVXSQV-UHFFFAOYSA-N 3-[diethoxy(methyl)silyl]propane-1-thiol Chemical compound CCO[Si](C)(OCC)CCCS MBNRBJNIYVXSQV-UHFFFAOYSA-N 0.000 description 1
- FMRSVUHIKQTOFR-UHFFFAOYSA-N 3-[ethoxy(dimethyl)silyl]propane-1-thiol Chemical compound CCO[Si](C)(C)CCCS FMRSVUHIKQTOFR-UHFFFAOYSA-N 0.000 description 1
- DQMRXALBJIVORP-UHFFFAOYSA-N 3-[methoxy(dimethyl)silyl]propane-1-thiol Chemical compound CO[Si](C)(C)CCCS DQMRXALBJIVORP-UHFFFAOYSA-N 0.000 description 1
- DCQBZYNUSLHVJC-UHFFFAOYSA-N 3-triethoxysilylpropane-1-thiol Chemical compound CCO[Si](OCC)(OCC)CCCS DCQBZYNUSLHVJC-UHFFFAOYSA-N 0.000 description 1
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 1
- SUSANAYXICMXBL-UHFFFAOYSA-N 4-prop-2-enylmorpholine Chemical compound C=CCN1CCOCC1 SUSANAYXICMXBL-UHFFFAOYSA-N 0.000 description 1
- 239000004342 Benzoyl peroxide Substances 0.000 description 1
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- NHTMVDHEPJAVLT-UHFFFAOYSA-N Isooctane Chemical compound CC(C)CC(C)(C)C NHTMVDHEPJAVLT-UHFFFAOYSA-N 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- DUVRJGHTIVORLW-UHFFFAOYSA-N [diethoxy(methyl)silyl]methanethiol Chemical compound CCO[Si](C)(CS)OCC DUVRJGHTIVORLW-UHFFFAOYSA-N 0.000 description 1
- VXQOFNJETKUWLT-UHFFFAOYSA-N [dimethoxy(methyl)silyl]methanethiol Chemical compound CO[Si](C)(CS)OC VXQOFNJETKUWLT-UHFFFAOYSA-N 0.000 description 1
- KFXKOQKIAJLZNS-UHFFFAOYSA-N [ethoxy(dimethyl)silyl]methanethiol Chemical compound CCO[Si](C)(C)CS KFXKOQKIAJLZNS-UHFFFAOYSA-N 0.000 description 1
- ZHYGIFUMPWJZSI-UHFFFAOYSA-N [methoxy(dimethyl)silyl]methanethiol Chemical compound CO[Si](C)(C)CS ZHYGIFUMPWJZSI-UHFFFAOYSA-N 0.000 description 1
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 1
- 125000002252 acyl group Chemical group 0.000 description 1
- 150000001335 aliphatic alkanes Chemical class 0.000 description 1
- 125000005370 alkoxysilyl group Chemical group 0.000 description 1
- 125000003368 amide group Chemical group 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 235000019400 benzoyl peroxide Nutrition 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- IAQRGUVFOMOMEM-UHFFFAOYSA-N but-2-ene Chemical group CC=CC IAQRGUVFOMOMEM-UHFFFAOYSA-N 0.000 description 1
- 229940125904 compound 1 Drugs 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 125000006165 cyclic alkyl group Chemical group 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- GLUUGHFHXGJENI-UHFFFAOYSA-N diethylenediamine Natural products C1CNCCN1 GLUUGHFHXGJENI-UHFFFAOYSA-N 0.000 description 1
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- JVSWJIKNEAIKJW-UHFFFAOYSA-N dimethyl-hexane Natural products CCCCCC(C)C JVSWJIKNEAIKJW-UHFFFAOYSA-N 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 239000003759 ester based solvent Substances 0.000 description 1
- 239000004210 ether based solvent Substances 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- ZZRGHKUNLAYDTC-UHFFFAOYSA-N ethoxy(methyl)silane Chemical compound CCO[SiH2]C ZZRGHKUNLAYDTC-UHFFFAOYSA-N 0.000 description 1
- CWAFVXWRGIEBPL-UHFFFAOYSA-N ethoxysilane Chemical compound CCO[SiH3] CWAFVXWRGIEBPL-UHFFFAOYSA-N 0.000 description 1
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- CZWLNMOIEMTDJY-UHFFFAOYSA-N hexyl(trimethoxy)silane Chemical compound CCCCCC[Si](OC)(OC)OC CZWLNMOIEMTDJY-UHFFFAOYSA-N 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 1
- 125000000325 methylidene group Chemical group [H]C([H])=* 0.000 description 1
- 125000002757 morpholinyl group Chemical group 0.000 description 1
- JWAJUTZQGZBKFS-UHFFFAOYSA-N n,n-diethylprop-2-en-1-amine Chemical compound CCN(CC)CC=C JWAJUTZQGZBKFS-UHFFFAOYSA-N 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 125000004193 piperazinyl group Chemical group 0.000 description 1
- 125000003386 piperidinyl group Chemical group 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 125000000719 pyrrolidinyl group Chemical group 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 238000007151 ring opening polymerisation reaction Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 150000007944 thiolates Chemical class 0.000 description 1
- 125000005369 trialkoxysilyl group Chemical group 0.000 description 1
- XSIGLRIVXRKQRA-UHFFFAOYSA-N triethoxysilylmethanethiol Chemical compound CCO[Si](CS)(OCC)OCC XSIGLRIVXRKQRA-UHFFFAOYSA-N 0.000 description 1
- QJOOZNCPHALTKK-UHFFFAOYSA-N trimethoxysilylmethanethiol Chemical compound CO[Si](CS)(OC)OC QJOOZNCPHALTKK-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
- C07F7/1804—Compounds having Si-O-C linkages
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Abstract
本發明之目的為提供一種含硫之胺基有機氧 矽烷化合物及其製造方法,在作為塗料添加劑等使用的情況中胺基及有機氧矽烷基之效果可充分發揮,而且可設為一液型硬化性組成物。 The purpose of the present invention is to provide a sulfur-containing amine-based organic oxygen The silane compound and its manufacturing method can fully exert the effects of the amine group and the organic oxysilane group when used as a paint additive, etc., and can be set as a one-component hardenable composition.
以下述一般式(I)表示的含硫之胺基
有機氧矽烷化合物
Description
本發明係關於有用於作為矽烷偶合劑、表面處理劑、樹脂添加劑、塗料添加劑、接著劑等的含硫之胺基有機氧矽烷化合物及其製造方法。 The present invention relates to a sulfur-containing amine-based organic oxysilane compound useful as a silane coupling agent, surface treatment agent, resin additive, paint additive, adhesive, etc., and a method for manufacturing the same.
胺基烷氧基矽烷化合物,由於具有極性官能基之胺基、和水解性基的烷氧基矽烷基,故有用於作為矽烷偶合劑、表面處理劑、樹脂添加劑、塗料添加劑、接著劑等來使用的情況。作為如此的胺基烷氧基矽烷化合物之具體例,可例示3-胺基丙基三甲氧基矽烷或3-乙二胺基丙基三甲氧基矽烷等,特別是含硫之胺基有機氧矽烷化合物之具體例,可例示1-胺基-4-硫-庚基三甲氧基矽烷(專利文獻1:國際公開第2009/056778號)。 Aminoalkoxysilane compounds have amine groups with polar functional groups and hydrolyzable alkoxysilane groups, so they are useful as silane coupling agents, surface treatment agents, resin additives, paint additives, adhesives, etc. Use case. As a specific example of such an aminoalkoxysilane compound, 3-aminopropyltrimethoxysilane or 3-ethylenediaminopropyltrimethoxysilane, etc., especially sulfur-containing amine organic oxygen Specific examples of the silane compound include 1-amino-4-thio-heptyltrimethoxysilane (Patent Document 1: International Publication No. 2009/056778).
[專利文獻1]國際公開第2009/056778號 [Patent Literature 1] International Publication No. 2009/056778
但是,上述含硫之胺基有機氧矽烷化合物係具有1級胺基,在添加於含有特定之官能基的樹脂,特別是添加於環氧樹脂或碳酸酯樹脂的情況,有不能發揮所期望的效果的可能性。例如,在添加於環氧樹脂的情況,環氧基係藉由胺基而進行開環聚合,有樹脂硬化的可能性。另外,在添加於碳酸酯樹脂的情況,含硫之胺基有機氧矽烷化合物之胺基被轉換為醯胺基,有胺基之效果未被充分發揮的可能性。因此,期望有對於各式各樣的官能基為安定的(可使用於一液型硬化性組成物之)胺基有機氧矽烷化合物。 However, the above-mentioned sulfur-containing amine-based organooxysilane compound has a first-level amine group, and when added to a resin containing a specific functional group, especially when added to an epoxy resin or a carbonate resin, it may not perform as expected. Possibility of effect. For example, when added to an epoxy resin, the epoxy group undergoes ring-opening polymerization through an amine group, and the resin may be hardened. In addition, when added to a carbonate resin, the amine group of the sulfur-containing amine group organic oxysilane compound is converted to an amide group, and the effect of the amine group may not be fully exerted. Therefore, it is desirable to have amine-based organooxysilane compounds that are stable to various functional groups (which can be used in one-component hardenable compositions).
本發明係鑑於上述情事而為者,其目的為提供一種含硫之胺基有機氧矽烷化合物及其製造方法,在作為塗料添加劑、接著劑等使用的情況中可充分發揮胺基及烷氧基矽烷基等之有機氧矽烷基之效果,而且可設為一液型硬化性組成物。 The present invention is made in view of the above circumstances, and its object is to provide a sulfur-containing amine-based organooxysilane compound and a method for producing the same, which can fully utilize amine groups and alkoxy groups when used as paint additives, adhesives, etc. The effect of organic oxysilyl groups such as silane groups can also be set as a one-component hardening composition.
本發明者係為了達成上述目的,重覆專心致力研討的結果,發現了以一般式(1)所示的含硫之胺基有機氧矽烷化合物係分子之自由度較先前之胺基烷氧基矽烷化合物更高,於作為塗料添加劑或接著劑等使用的情 況,可充分地發揮胺基及烷氧基矽烷基等之有機氧矽烷基之效果,而且可設為一液型組成物,進而完成本發明。 In order to achieve the above object, the present inventors have repeatedly devoted themselves to the results of research, and found that the sulfur-containing amino-organooxysilane compound represented by the general formula (1) has a higher degree of freedom than the previous amino-alkoxy group Silane compounds are higher, so they are used as paint additives or adhesives In addition, the effects of organic oxysilyl groups such as amine groups and alkoxysilyl groups can be fully exerted, and it can be set as a one-component composition, thereby completing the present invention.
因而,本發明係提供表示於下述的含硫之胺基有機氧矽烷化合物及其製造方法。 Therefore, the present invention provides a sulfur-containing amine-based organic oxysilane compound shown below and a method for producing the same.
[1]一種含硫之胺基有機氧矽烷化合物,其係以下述一般式(1)表示
(式中,R1,R2係氫原子或可含有雜原子的碳數1~20之取代或非取代之1價烴基,各自可相同或相異,但R1及R2並非同時為氫原子。另外,R1與R2亦可相互鍵結而與此等所鍵結的氮原子一起形成環。R3係可含有雜原子的碳數1~20之直鏈狀或分支狀之2價烴基,R4係碳數1~20之直鏈狀或分支狀之2價烴基,R5、R6係碳數1~10之1價烴基,n為0、1或2)。
(In the formula, R 1 and R 2 are hydrogen atoms or C 1-20 substituted or unsubstituted monovalent hydrocarbon groups which may contain hetero atoms, and each may be the same or different, but R 1 and R 2 are not both hydrogen. Atoms. In addition, R 1 and R 2 can also be bonded to each other to form a ring with these bonded nitrogen atoms. R 3 can contain a hetero atom of 1 to 20 linear or
[2]如[1]所記載之含硫之胺基有機氧矽烷化合物,其中,前述R3係以[-CH2CH2OCH2CH2CH2-]或[-CH2CH2OCH2CH(CH3)-]所示的基。 [2] The sulfur-containing amine organooxysilane compound as described in [1], wherein the aforementioned R 3 is represented by [-CH 2 CH 2 OCH 2 CH 2 CH 2 -] or [-CH 2 CH 2 OCH 2 CH(CH 3 )-].
[3]一種以下述一般式(1')所示之含硫之胺基有機氧矽烷化合物之製造方法,其特徵為使以下述一般式(2)所示的胺基化合物
(式中,R1,R2係氫原子或可含有雜原子的碳數1~20之取代或非取代之1價烴基,各自可相同或相異,但R1及R2並非同時為氫原子。另外,R1與R2亦可相互鍵結而與此等所鍵結的氮原子一起形成環。R3'係可含有雜原子的碳數1~18之直鏈狀或分支狀之2價烴基,R7係氫原子或甲基,R7為氫原子的情況時,R3'為碳數1~18之2價烴基,R7為甲基的情況時,R3'為碳數1~17之2價烴基)
(In the formula, R 1 and R 2 are hydrogen atoms or C 1-20 substituted or unsubstituted monovalent hydrocarbon groups which may contain hetero atoms, and each may be the same or different, but R 1 and R 2 are not both hydrogen. atoms. Further, R 1 and R 2 may be bonded to each other to form a ring .R 3 'may contain a carbon-based number of heteroatoms linear or branched of 1 to 18 of these are bonded together with a nitrogen atom Bivalent hydrocarbon group, R 7 is a hydrogen atom or a methyl group, when R 7 is a hydrogen atom, R 3′ is a divalent hydrocarbon group having 1 to 18 carbon atoms, and when R 7 is a methyl group, R 3′ is a carbon (
與以下述一般式(3)所示的含有巰基之有機氧矽烷化合物
(式中,R4係碳數1~20之直鏈狀或分支狀之2價烴基,R5、R6係碳數1~10之1價烴基,n為0、1或2) (In the formula, R 4 is a linear or branched divalent hydrocarbon group having 1 to 20 carbon atoms, R 5 and R 6 are monovalent hydrocarbon groups having 1 to 10 carbon atoms, and n is 0, 1 or 2)
進行反應;
(式中,R1、R2、R4、R5、R6及n係與上述相同,R3"係可含有雜原子的碳數3~20之直鏈狀或分支狀之2價烴基)。 (In the formula, R 1 , R 2 , R 4 , R 5 , R 6 and n are the same as above, R 3" is a linear or branched divalent hydrocarbon group of 3 to 20 carbon atoms which may contain hetero atoms ).
[4]如[3]所記載之含硫之胺基有機氧矽烷化合物之製造方法,其中,所得到之含硫之胺基有機氧矽烷化合物, 係一般式(1')中之R3"為含有以[-CH2CH2CH2-]所示的基者、與含有以[-CH2CH(CH3)-]所示的基者之混合物。 [4] The method for producing a sulfur-containing amine-based organic oxysilane compound as described in [3], wherein the obtained sulfur-containing amine-based organic oxysilane compound is R 3" in the general formula (1') It is a mixture containing those represented by [-CH 2 CH 2 CH 2 -] and those represented by [-CH 2 CH(CH 3 )-].
如藉由本發明,則可提供一種含硫之胺基有機氧矽烷化合物,其係於使用時可將胺基之效果發揮至先前之上,而且可設為一液型硬化性組成物,可作為矽烷偶合劑、表面處理劑、樹脂添加劑、塗料添加劑、接著劑等來使用。 According to the present invention, a sulfur-containing amine-based organic oxysilane compound can be provided, which can exert the effect of amine groups to the previous level when used, and can be set as a one-component hardening composition, which can be used as Silane coupling agent, surface treatment agent, resin additive, paint additive, adhesive, etc. are used.
[第1圖]在實施例1所得的1-二甲基胺基-4-硫-庚基三甲氧基矽烷與1-二甲基胺基-2-甲基-3-硫-己基三甲氧基矽烷之混合物之1H-NMR光譜。 [Figure 1] 1-Dimethylamino-4-thio-heptyltrimethoxysilane obtained in Example 1 and 1-dimethylamino-2-methyl-3-thio-hexyltrimethoxy 1 H-NMR spectrum of a mixture of silanes.
[第2圖]在實施例1所得的1-二甲基胺基-4-硫-庚基三甲氧基矽烷與1-二甲基胺基-2-甲基-3-硫-己基三甲氧基矽烷之混合物之IR光譜。 [Figure 2] 1-Dimethylamino-4-thio-heptyltrimethoxysilane obtained in Example 1 and 1-dimethylamino-2-methyl-3-thio-hexyltrimethoxy IR spectrum of a mixture of silanes.
[第3圖]在實施例2所得的1-二甲基胺基-4-硫-庚基甲基二甲氧基矽烷與1-二甲基胺基-2-甲基-3-硫-己基甲基二甲氧基矽烷之混合物之1H-NMR光譜。 [Figure 3] 1-Dimethylamino-4-sulfo-heptylmethyldimethoxysilane and 1-dimethylamino-2-methyl-3-sulfide obtained in Example 2 1 H-NMR spectrum of a mixture of hexylmethyldimethoxysilane.
[第4圖]在實施例2所得的1-二甲基胺基-4-硫-庚基甲基二甲氧基矽烷與1-二甲基胺基-2-甲基-3-硫-己基甲基二甲氧基矽烷之混合物之IR光譜。 [Figure 4] 1-Dimethylamino-4-thio-heptylmethyldimethoxysilane and 1-dimethylamino-2-methyl-3-sulfide obtained in Example 2 IR spectrum of a mixture of hexylmethyldimethoxysilane.
[第5圖]在實施例3所得的1-二甲基胺基-3-側氧基-7-硫-癸基三甲氧基矽烷與1-二甲基胺基-5-甲基-3-側氧基-6-硫-壬基三甲氧基矽烷之混合物之1H-NMR光譜。 [Figure 5] 1-Dimethylamino-3- pendant-7-thio-decyltrimethoxysilane and 1-dimethylamino-5-methyl-3 obtained in Example 3 -1 H-NMR spectrum of a mixture of pendant-6-sulfur-nonyltrimethoxysilane.
[第6圖]在實施例3所得的1-二甲基胺基-3-側氧基-7-硫-癸基三甲氧基矽烷與1-二甲基胺基-5-甲基-3-側氧基-6-硫-壬基三甲氧基矽烷之混合物之IR光譜。 [Figure 6] 1-Dimethylamino-3- pendant-7-thio-decyltrimethoxysilane and 1-dimethylamino-5-methyl-3 obtained in Example 3 -IR spectrum of a mixture of pendant-6-sulfur-nonyltrimethoxysilane.
[第7圖]在實施例4所得的1-二甲基胺基-3-側氧基-7-硫-癸基甲基二甲氧基矽烷與1-二甲基胺基-5-甲基-3-側氧基-6-硫-壬基甲基二甲氧基矽烷之混合物之1H-NMR光譜。 [Figure 7] 1-Dimethylamino-3-pentoxy-7-thio-decylmethyldimethoxysilane and 1-dimethylamino-5-methyl obtained in Example 4 1 H-NMR spectrum of a mixture of phenyl-3-oxo-6-thio-nonylmethyldimethoxysilane.
[第8圖]在實施例4所得的1-二甲基胺基-3-側氧基-7-硫-癸基甲基二甲氧基矽烷與1-二甲基胺基-5-甲基-3-側氧基-6-硫-壬基甲基二甲氧基矽烷之混合物之IR光譜。 [Figure 8] The 1-dimethylamino-3-pentoxy-7-thio-decylmethyldimethoxysilane and 1-dimethylamino-5-methyl obtained in Example 4 IR spectrum of the mixture of -3--3-oxo-6-thio-nonylmethyldimethoxysilane.
本發明之含硫之胺基有機氧矽烷化合物係以下述一般式(1)所示的化合物。 The sulfur-containing amine organooxysilane compound of the present invention is a compound represented by the following general formula (1).
(式中,R1,R2係氫原子或可含有雜原子的碳數1~20之取代或非取代之1價烴基,各自可相同或相異,但R1及R2並非同時為氫原子。另外,R1與R2係亦可相互鍵結而與此等所鍵結的氮原子一起形成環。R3係可含有雜原子的碳數1~20之直鏈狀或分支狀之2價烴基,R4係碳數 1~20之直鏈狀或分支狀之2價烴基,R5、R6係碳數1~10之1價烴基,n為0、1或2)。 (In the formula, R 1 and R 2 are hydrogen atoms or C 1-20 substituted or unsubstituted monovalent hydrocarbon groups which may contain hetero atoms, and each may be the same or different, but R 1 and R 2 are not both hydrogen. In addition, R 1 and R 2 can also be bonded to each other to form a ring with these bonded nitrogen atoms. R 3 can contain heteroatoms with a linear or branched carbon number of 1 to 20 Divalent hydrocarbon group, R 4 is a linear or branched divalent hydrocarbon group having 1 to 20 carbon atoms, R 5 and R 6 are monovalent hydrocarbon groups having 1 to 10 carbon atoms, and n is 0, 1 or 2).
在此,R1,R2係氫原子或可含有氧原子、氮原子、硫原子等之雜原子的碳數1~20,特別是1~10之取代或非取代之1價烴基,各自可相同或相異,但R1及R2並非同時為氫原子。另外,R1與R2係亦可相互鍵結而與此等所鍵結的氮原子一起形成環。作為R1、R2,具體而言可例示甲基、乙基、丙基、丁基、戊基、己基、庚基、辛基、癸基等之直鏈狀烷基、異丙基、異丁基、第二丁基、第三丁基、第三己基、2-乙基己基等之分支狀烷基、環戊基、環己基等之環狀烷基、乙烯基、烯丙基、丙烯基等之烯基、苯基等之芳基、苄基、苯乙基等之芳烷基等,特別是由原料之籌集容易性及生成物之有用性而言,甲基、乙基為理想。另外,此等之烴基之氫原子之一部分或全部亦可被取代,作為該取代基,具體而言係例如可舉出甲氧基、乙氧基、(異)丙氧基等之烷氧基;氟原子、氯原子、溴原子、碘原子等之鹵素原子;氰基;胺基;苯基、甲苯基等之碳數6~10之芳基、苄基、苯乙基等之碳數7~10之芳烷基、碳數2~10之醯基;各自之各烷基、各烷氧基為碳數1~5的三烷基矽烷基、三烷氧基矽烷基、二烷基單烷氧基矽烷基、單烷基二烷氧基矽烷基等,其間更進一步存在有酯基(-COO-)、醚基(-O-)、硫醚基(-S-)等亦可,組合此等成分而使用亦可。
Here, R 1 and R 2 are hydrogen atoms or heteroatoms which may contain oxygen atoms, nitrogen atoms, sulfur atoms, etc. The carbon number is 1-20, especially 1-10 substituted or unsubstituted monovalent hydrocarbon groups, each of which may be The same or different, but R 1 and R 2 are not simultaneously hydrogen atoms. In addition, R 1 and R 2 systems may be bonded to each other to form a ring together with these bonded nitrogen atoms. Specific examples of R 1 and R 2 include linear alkyl groups such as methyl, ethyl, propyl, butyl, pentyl, hexyl, heptyl, octyl, and decyl groups, isopropyl groups, and isopropyl groups. Branched alkyl such as butyl, second butyl, third butyl, third hexyl, 2-ethylhexyl, cyclic alkyl such as cyclopentyl, cyclohexyl, vinyl, allyl, propylene Alkenyl groups such as aryl groups, aryl groups such as phenyl groups, aralkyl groups such as benzyl groups, phenethyl groups, etc. Especially in terms of ease of raising raw materials and usefulness of products, methyl and ethyl groups are ideal . In addition, some or all of the hydrogen atoms of these hydrocarbon groups may be substituted. Specific examples of the substituent include alkoxy groups such as methoxy, ethoxy, and (iso)propoxy. ; Fluorine atom, chlorine atom, bromine atom, iodine atom and other halogen atoms; cyano group; amine group; phenyl group, tolyl group, etc. C 6-10 aryl group, benzyl group, phenethyl group, etc. carbon number 7 ~10 aralkyl group, C 2-10 acyl group; each alkyl group and each alkoxy group are
另外,於R1、R2結合而形成環構造的情況係
作為以下述式所示的基來表示
R3係可含有氧原子、氮原子、硫原子等之雜原子的碳數1~20,特別是1~10之直鏈狀或分支狀之2價烴基,作為碳數1~20之2價烴基,具體而言係可例示亞甲基、伸乙基、伸丙基、伸丁基、六亞甲基、亞辛基、伸癸基等之直鏈狀伸烷基、甲基伸乙基、甲基伸丙基等之分支狀伸烷基、伸環己基等之環狀伸烷基、伸丙烯基等之伸烯基、伸苯基等之伸芳基、伸甲基伸苯基、伸甲基伸苯基伸甲基等之伸芳烷基等,特別是由原料之籌集容易性而言,以伸丙基為佳。另外,作為可含有雜原子的碳數1~20之2價烴基係可舉出以[-CH2CH2OCH2CH2CH2-]、[-CH2CH2OCH2CH(CH3)-]表示的基等。另外,此等之烴基之氫原子之一部分或全部亦可被取代,作為該取代基,具體而言係例如可舉出甲氧基、乙氧基、(異)丙氧基等之烷氧基;氟原子、氯原子、溴原子、碘原子等之鹵素原子;氰基;胺基;苯基、甲苯基等之碳數6~10之芳基、苄基、苯乙基等之碳數7~10之芳烷基、碳數2~10之醯基、各自之各烷基、各烷氧基為碳數1~5的三烷基矽烷基、三烷氧基矽烷基、二烷基單烷氧基矽烷基、單烷基二烷氧基矽烷基等,其間更進一步存在有酯基(-COO-)、醚 基(-O-)、硫醚基(-S-)等亦可,組合此等成分而使用亦可。 R 3 is a divalent hydrocarbon group with 1 to 20 carbon atoms which may contain heteroatoms such as oxygen atoms, nitrogen atoms, and sulfur atoms, especially a linear or branched divalent hydrocarbon group with 1 to 10 carbon atoms. Hydrocarbyl groups, specifically, linear alkylene groups such as methylene, ethylidene, propylidene, butylidene, hexamethylene, octylene, decylidene, etc. , Branched alkylene such as methyl propyl, cyclic alkylene such as cyclohexyl, alkenyl such as propenyl, aryl such as phenyl, methyl phenyl, etc. The aralkylene groups such as the methylidene group and the phenylene group are particularly preferred in terms of ease of raising raw materials. In addition, examples of the bivalent hydrocarbon group having 1 to 20 carbon atoms which may contain heteroatoms include [-CH 2 CH 2 OCH 2 CH 2 CH 2 -], [-CH 2 CH 2 OCH 2 CH(CH 3 ) -] Represents the base etc. In addition, some or all of the hydrogen atoms of these hydrocarbon groups may be substituted. Specific examples of the substituent include alkoxy groups such as methoxy, ethoxy, and (iso)propoxy. ; Fluorine atom, chlorine atom, bromine atom, iodine atom and other halogen atoms; cyano group; amine group; phenyl group, tolyl group, etc. C 6-10 aryl group, benzyl group, phenethyl group, etc. carbon number 7 ~10 aralkyl group, C 2-10 acetyl group, each alkyl group, each alkoxy group is C 1-5 trialkyl silane group, trialkoxy silane group, dialkyl mono Alkoxy silane groups, monoalkyl dialkoxy silane groups, etc., furthermore, ester groups (-COO-), ether groups (-O-), thioether groups (-S-), etc. may be present, These components may be used in combination.
R4係碳數1~20,特別是1~10之直鏈狀或分支狀之2價烴基,具體而言係可舉出與作為R3例示者(作為可含有雜原子的2價烴基而舉出者除外)為相同者。 R 4 is a linear or branched divalent hydrocarbon group having 1 to 20 carbon atoms, particularly 1 to 10, specifically, as exemplified as R 3 (as a divalent hydrocarbon group which may contain a hetero atom) The exceptions are the same.
R5、R6,其係碳數1~10,理想為1~6,較理想為1~3之1價烴基,具體而言可例示甲基、乙基、丙基、丁基、戊基、己基、庚基、辛基、癸基等之直鏈狀烷基、異丙基、異丁基、第三丁基等之分支狀烷基、環戊基、環己基等之環狀烷基、乙烯基、烯丙基、丙烯基等之烯基、苯基、甲苯基等之芳基、苄基、苯乙基等之芳烷基等,由目的物成為較低沸點化合物之點而言,特別是甲基、乙基為理想。 R 5 and R 6 have a carbon number of 1 to 10, preferably 1 to 6, and more preferably 1 to 3 monovalent hydrocarbon group, specifically methyl, ethyl, propyl, butyl, pentyl , Linear alkyl groups such as hexyl, heptyl, octyl, decyl, branched alkyl groups such as isopropyl, isobutyl, and tertiary butyl, cyclic alkyl groups such as cyclopentyl, cyclohexyl, etc. Alkenyl groups such as vinyl, allyl, propenyl, aryl groups such as phenyl, tolyl, aralkyl groups such as benzyl, phenethyl, etc., from the point that the target object becomes a lower boiling point compound , Especially methyl and ethyl are ideal.
作為以上述一般式(1)所示的含硫之胺基有機氧矽烷化合物之具體例,可例示1-二甲基胺基-4-硫-庚基三甲氧基矽烷、1-二甲基胺基-4-硫-庚基甲基二甲氧基矽烷、1-二甲基胺基-4-硫-庚基二甲基甲氧基矽烷、1-二甲基胺基-4-硫-庚基三乙氧基矽烷、1-二甲基胺基-4-硫-庚基甲基二乙氧基矽烷、1-二甲基胺基-4-硫-庚基二甲基乙氧基矽烷、1-二甲基胺基-2-甲基-3-硫-己基三甲氧基矽烷、1-二甲基胺基-2-甲基-3-硫-己基甲基二甲氧基矽烷、1-二甲基胺基-2-甲基-3-硫-己基二甲基甲氧基矽烷、1-二甲基胺基-2-甲基-3-硫-己基三乙氧基矽烷、 1-二甲基胺基-2-甲基-3-硫-己基甲基二乙氧基矽烷、1-二甲基胺基-2-甲基-3-硫-己基二甲基乙氧基矽烷、1-二乙基胺基-4-硫-庚基三甲氧基矽烷、1-二乙基胺基-4-硫-庚基甲基二甲氧基矽烷、1-二乙基胺基-4-硫-庚基二甲基甲氧基矽烷、1-二乙基胺基-4-硫-庚基三乙氧基矽烷、1-二乙基胺基-4-硫-庚基甲基二乙氧基矽烷、1-二乙基胺基-4-硫-庚基二甲基乙氧基矽烷、1-二乙基胺基-2-甲基-3-硫-己基三甲氧基矽烷、1-二乙基胺基-2-甲基-3-硫-己基甲基二甲氧基矽烷、1-二乙基胺基-2-甲基-3-硫-己基二甲基甲氧基矽烷、1-二乙基胺基-2-甲基-3-硫-己基三乙氧基矽烷、1-二乙基胺基-2-甲基-3-硫-己基甲基二乙氧基矽烷、1-二乙基胺基-2-甲基-3-硫-己基二甲基乙氧基矽烷、1-甲基哌嗪基-4-硫-庚基三甲氧基矽烷、1-甲基哌嗪基-4-硫-庚基甲基二甲氧基矽烷、1-甲基哌嗪基-4-硫-庚基二甲基甲氧基矽烷、1-甲基哌嗪基-4-硫-庚基三乙氧基矽烷、1-甲基哌嗪基-4-硫-庚基甲基二乙氧基矽烷、1-甲基哌嗪基-4-硫-庚基二甲基乙氧基矽烷、1-甲基哌嗪基-2-甲基-3-硫-己基三甲氧基矽烷、1-甲基哌嗪基-2-甲基-3-硫-己基甲基二甲氧基矽烷、1-甲基哌嗪基-2-甲基-3-硫-己基二甲基甲氧基矽烷、1-甲基哌嗪基-2-甲基-3-硫-己基三乙氧基矽烷、 1-甲基哌嗪基-2-甲基-3-硫-己基甲基二乙氧基矽烷、1-甲基哌嗪基-2-甲基-3-硫-己基二甲基乙氧基矽烷、1-苯甲基胺基-4-硫-庚基三甲氧基矽烷、1-苯甲基胺基-4-硫-庚基甲基二甲氧基矽烷、1-苯甲基胺基-4-硫-庚基二甲基甲氧基矽烷、1-苯甲基胺基-4-硫-庚基三乙氧基矽烷、1-苯甲基胺基-4-硫-庚基甲基二乙氧基矽烷、1-苯甲基胺基-4-硫-庚基二甲基乙氧基矽烷、1-苯甲基胺基-2-甲基-3-硫-己基三甲氧基矽烷、1-苯甲基胺基-2-甲基-3-硫-己基甲基二甲氧基矽烷、1-苯甲基胺基-2-甲基-3-硫-己基二甲基甲氧基矽烷、1-苯甲基胺基-2-甲基-3-硫-己基三乙氧基矽烷、1-苯甲基胺基-2-甲基-3-硫-己基甲基二乙氧基矽烷、1-苯甲基胺基-2-甲基-3-硫-己基二甲基乙氧基矽烷、1-二甲基胺基-3-側氧基-7-硫-癸基三甲氧基矽烷、1-二甲基胺基-3-側氧基-7-硫-癸基甲基二甲氧基矽烷、1-二甲基胺基-3-側氧基-7-硫-癸基二甲基甲氧基矽烷、1-二甲基胺基-3-側氧基-7-硫-癸基三乙氧基矽烷、1-二甲基胺基-3-側氧基-7-硫-癸基甲基二乙氧基矽烷、1-二甲基胺基-3-側氧基-7-硫-癸基二甲基乙氧基矽烷、1-二甲基胺基-5-甲基-3-側氧基-6-硫-壬基三甲氧基矽烷、1-二甲基胺基-5-甲基-3-側氧基-6-硫-壬基甲基二甲氧基矽烷、1-二甲基胺基-5-甲基-3-側氧基-6-硫-壬基二甲基甲氧基矽 烷、1-二甲基胺基-5-甲基-3-側氧基-6-硫-壬基三乙氧基矽烷、1-二甲基胺基-5-甲基-3-側氧基-6-硫-壬基甲基二乙氧基矽烷、1-二甲基胺基-5-甲基-3-側氧基-6-硫-壬基二甲基乙氧基矽烷、1-二乙基胺基-3-側氧基-7-硫-癸基三甲氧基矽烷、1-二乙基胺基-3-側氧基-7-硫-癸基甲基二甲氧基矽烷、1-二乙基胺基-3-側氧基-7-硫-癸基二甲基甲氧基矽烷、1-二乙基胺基-3-側氧基-7-硫-癸基三乙氧基矽烷、1-二乙基胺基-3-側氧基-7-硫-癸基甲基二乙氧基矽烷、1-二乙基胺基-3-側氧基-7-硫-癸基二甲基乙氧基矽烷、1-二乙基胺基-5-甲基-3-側氧基-6-硫-壬基三甲氧基矽烷、1-二乙基胺基-5-甲基-3-側氧基-6-硫-壬基甲基二甲氧基矽烷、1-二乙基胺基-5-甲基-3-側氧基-6-硫-壬基二甲基甲氧基矽烷、1-二乙基胺基-5-甲基-3-側氧基-6-硫-壬基三乙氧基矽烷、1-二乙基胺基-5-甲基-3-側氧基-6-硫-壬基甲基二乙氧基矽烷、1-二乙基胺基-5-甲基-3-側氧基-6-硫-壬基二甲基乙氧基矽烷等。 As a specific example of the sulfur-containing amine organooxysilane compound represented by the above general formula (1), 1-dimethylamino-4-sulfo-heptyltrimethoxysilane, 1-dimethyl Amino-4-thio-heptylmethyldimethoxysilane, 1-dimethylamino-4-thio-heptyldimethylmethoxysilane, 1-dimethylamino-4-sulfide -Heptyltriethoxysilane, 1-dimethylamino-4-thio-heptylmethyldiethoxysilane, 1-dimethylamino-4-thio-heptyldimethylethoxy Silane, 1-dimethylamino-2-methyl-3-sulfo-hexyltrimethoxysilane, 1-dimethylamino-2-methyl-3-sulfo-hexylmethyldimethoxy Silane, 1-dimethylamino-2-methyl-3-sulfo-hexyldimethylmethoxysilane, 1-dimethylamino-2-methyl-3-sulfo-hexyltriethoxy Silane, 1-Dimethylamino-2-methyl-3-thio-hexylmethyl diethoxysilane, 1-dimethylamino-2-methyl-3-thio-hexyldimethylethoxy Silane, 1-diethylamino-4-thio-heptyltrimethoxysilane, 1-diethylamino-4-thio-heptylmethyldimethoxysilane, 1-diethylamino -4-thio-heptyldimethylmethoxysilane, 1-diethylamino-4-thio-heptyltriethoxysilane, 1-diethylamino-4-thio-heptylmethyl Diethoxysilane, 1-diethylamino-4-thio-heptyldimethylethoxysilane, 1-diethylamino-2-methyl-3-thio-hexyltrimethoxy Silane, 1-diethylamino-2-methyl-3-sulfo-hexylmethyldimethoxysilane, 1-diethylamino-2-methyl-3-sulfo-hexyldimethylmethyl Oxysilane, 1-diethylamino-2-methyl-3-sulfo-hexyltriethoxysilane, 1-diethylamino-2-methyl-3-sulfo-hexylmethyldiethyl Oxysilane, 1-diethylamino-2-methyl-3-thio-hexyldimethylethoxysilane, 1-methylpiperazinyl-4-thio-heptyltrimethoxysilane, 1 -Methylpiperazinyl-4-thio-heptylmethyldimethoxysilane, 1-methylpiperazinyl-4-thio-heptyldimethylmethoxysilane, 1-methylpiperazinyl -4-thio-heptyltriethoxysilane, 1-methylpiperazinyl-4-thio-heptylmethyldiethoxysilane, 1-methylpiperazinyl-4-thio-heptyldi Methylethoxysilane, 1-methylpiperazinyl-2-methyl-3-sulfo-hexyltrimethoxysilane, 1-methylpiperazinyl-2-methyl-3-sulfo-hexylmethyl Dimethoxysilane, 1-methylpiperazinyl-2-methyl-3-sulfo-hexyldimethylmethoxysilane, 1-methylpiperazinyl-2-methyl-3-sulfo-hexyl Triethoxysilane, 1-methylpiperazinyl-2-methyl-3-sulfo-hexylmethyl diethoxysilane, 1-methylpiperazinyl-2-methyl-3-sulfo-hexyldimethylethoxy Silane, 1-benzylamino-4-thio-heptyltrimethoxysilane, 1-benzylamino-4-thio-heptylmethyldimethoxysilane, 1-benzylamino -4-thio-heptyldimethylmethoxysilane, 1-benzylamino-4-thio-heptyltriethoxysilane, 1-benzylamino-4-thio-heptylmethyl Diethoxysilane, 1-benzylamino-4-thio-heptyldimethylethoxysilane, 1-benzylamino-2-methyl-3-thio-hexyltrimethoxy Silane, 1-benzylamino-2-methyl-3-sulfo-hexylmethyldimethoxysilane, 1-benzylamino-2-methyl-3-sulfo-hexyldimethylform Oxysilane, 1-Benzylamino-2-methyl-3-sulfo-hexyltriethoxysilane, 1-Benzylamino-2-methyl-3-sulfo-hexylmethyldiethyl Oxysilane, 1-benzylamino-2-methyl-3-sulfo-hexyldimethylethoxysilane, 1-dimethylamino-3- pendant-7-sulfo-decyl Trimethoxysilane, 1-dimethylamino-3- pendant-7-thio-decylmethyldimethoxysilane, 1-dimethylamino-3- pendant-7-sulfur -Decyldimethylmethoxysilane, 1-dimethylamino-3- pendant-7-thio-decyltriethoxysilane, 1-dimethylamino-3- pendant -7-thio-decylmethyldiethoxysilane, 1-dimethylamino-3-pendantoxy-7-thio-decyldimethylethoxysilane, 1-dimethylamino -5-methyl-3-oxo-6-thio-nonyltrimethoxysilane, 1-dimethylamino-5-methyl-3-oxo-6-thio-nonylmethyl Dimethoxysilane, 1-dimethylamino-5-methyl-3- pendant-6-thio-nonyldimethylmethoxysilicone Alkanes, 1-dimethylamino-5-methyl-3-oxo-6-thio-nonyltriethoxysilane, 1-dimethylamino-5-methyl-3-oxo Yl-6-thio-nonylmethyldiethoxysilane, 1-dimethylamino-5-methyl-3- pendant-6-thio-nonyldimethylethoxysilane, 1 -Diethylamino-3-oxo-7-thio-decyltrimethoxysilane, 1-diethylamino-3-oxo-7-thio-decylmethyldimethoxy Silane, 1-diethylamino-3-oxo-7-thio-decyldimethylmethoxysilane, 1-diethylamino-3-oxo-7-sulfo-decyl Triethoxysilane, 1-diethylamino-3-oxo-7-thio-decylmethyl diethoxysilane, 1-diethylamino-3-oxo-7- Sulfur-decyldimethylethoxysilane, 1-diethylamino-5-methyl-3-pentoxy-6-thio-nonyltrimethoxysilane, 1-diethylamino- 5-methyl-3-oxo-6-thio-nonylmethyldimethoxysilane, 1-diethylamino-5-methyl-3-oxo-6-thio-nonyl Dimethylmethoxysilane, 1-diethylamino-5-methyl-3-oxo-6-thio-nonyltriethoxysilane, 1-diethylamino-5-methyl 3-Phenoxy-6-thio-nonylmethyl diethoxysilane, 1-diethylamino-5-methyl-3- pendoxy-6-thio-nonyldimethyl Ethoxysilane etc.
作為在本發明的含硫之胺基有機氧矽烷化合物之製造方法,例如可例示使下述一般式(2)所示的胺
基化合物
(式中,R1,R2係氫原子或可含有雜原子的碳數1~20之取代或非取代之1價烴基,各自可相同或相異,但R1及R2並非同時為氫原子。另外,R1與R2亦可相互鍵結而與此等所鍵結的氮原子一起形成環。R3'係可含有雜原子的碳數1~18之直鏈狀或分支狀之2價烴基,R7係氫原子或甲基,R7為氫原子的情況時,R3'為碳數1~18之2價烴基,R7為甲基的情況時,R3'為碳數1~17之2價烴基)
(In the formula, R 1 and R 2 are hydrogen atoms or C 1-20 substituted or unsubstituted monovalent hydrocarbon groups which may contain hetero atoms, and each may be the same or different, but R 1 and R 2 are not both hydrogen. atoms. Further, R 1 and R 2 may be bonded to each other to form a ring .R 3 'may contain a carbon-based number of heteroatoms linear or branched of 1 to 18 of these are bonded together with a nitrogen atom Bivalent hydrocarbon group, R 7 is a hydrogen atom or a methyl group, when R 7 is a hydrogen atom, R 3′ is a divalent hydrocarbon group having 1 to 18 carbon atoms, and when R 7 is a methyl group, R 3′ is a carbon (
與下述一般式(3)所示的含有巰基之有機氧矽烷化合物
(式中,R4係碳數1~20之直鏈狀或分支狀之2價烴基,R5、R6係碳數1~10之1價烴基,n為0、1或2) (In the formula, R 4 is a linear or branched divalent hydrocarbon group having 1 to 20 carbon atoms, R 5 and R 6 are monovalent hydrocarbon groups having 1 to 10 carbon atoms, and n is 0, 1 or 2)
進行反應之方法。 The method of reaction.
在此,R3係可含有氧原子、氮原子、硫原子等之雜原子的碳數1~18,特別是1~8之直鏈狀或分支狀之2價烴基,作為碳數1~18之2價烴基,具體而言係可例示亞甲基、伸乙基、伸丙基、伸丁基、六亞甲基、亞辛基等之直鏈狀伸烷基、甲基伸乙基、甲基伸丙基等之分支狀伸烷基、伸環己基等之環狀伸烷基、伸丙烯基等之伸烯基、伸苯基等之伸芳基、伸甲基伸苯基、伸甲基伸苯基伸 甲基等之伸芳烷基等,特別是由原料之籌集容易性而言,以亞甲基為佳。另外,作為可含有雜原子的碳數1~18之2價烴基係可舉出以[-CH2CH2OCH2-]表示的基等。另外,此等成分之烴基之氫原子之一部分或全部亦可被取代,作為該取代基,具體而言係例如可舉出甲氧基、乙氧基、(異)丙氧基等之烷氧基;氟原子、氯原子、溴原子、碘原子等之鹵素原子;氰基;胺基;苯基、甲苯基等之碳數6~10之芳基、苄基、苯乙基等之碳數7~10之芳烷基等,其間更進一步存在有酯基(-COO-)、醚基(-O-)、硫醚基(-S-)等亦可,亦可組合此等成分而使用。 Here, R 3 may contain a hetero atom such as an oxygen atom, a nitrogen atom, a sulfur atom, and the like, having a carbon number of 1 to 18, especially a linear or branched divalent hydrocarbon group of 1 to 8, as a carbon number of 1 to 18. The bivalent hydrocarbon group is specifically a linear alkylene group such as methylene, ethylidene, propylidene, butylidene, hexamethylene, octylene, etc. Branched alkylene such as methyl propyl, cyclic alkylene such as cyclohexyl, alkenyl such as propenyl, aryl such as phenyl, methyl phenyl, etc. The aralkylene group such as methyl phenyl phenyl methyl group is particularly preferred in terms of ease of raising raw materials, and the methylene group is preferred. In addition, examples of the divalent hydrocarbon group having 1 to 18 carbon atoms which may contain a hetero atom include a group represented by [-CH 2 CH 2 OCH 2 -]. In addition, some or all of the hydrogen atoms of the hydrocarbon group of these components may be substituted. Specific examples of the substituent include alkoxy groups such as methoxy, ethoxy, and (iso)propoxy groups. Group; halogen atoms such as fluorine atom, chlorine atom, bromine atom, iodine atom; cyano group; amine group; phenyl group, tolyl group, etc. C 6-10 aryl group, benzyl group, phenethyl group, etc. 7-10 aralkyl groups, etc., in which there are further ester groups (-COO-), ether groups (-O-), thioether groups (-S-), etc., can also be used in combination with these components .
R1、R2、R4、R5、R6、R7及n係如上所述。 R 1 , R 2 , R 4 , R 5 , R 6 , R 7 and n are as described above.
以上述一般式(2)所示的胺基化合物,具體而言係可例示二甲基烯丙胺、二乙基烯丙胺、烯丙基甲基苯胺、烯丙基吡咯啶、烯丙基哌啶、烯丙基哌嗪、甲基烯丙基哌嗪、烯丙基嗎啉等。 The amino compound represented by the general formula (2), specifically, exemplified dimethylallylamine, diethylallylamine, allylmethylaniline, allylpyrrolidine, allylpiperidine , Allyl piperazine, methallyl piperazine, allyl morpholine and so on.
作為上述一般式(3)所示的含有巰基之有機氧矽烷化合物,具體而言係可例示巰基甲基三甲氧基矽烷、巰基甲基甲基二甲氧基矽烷、巰基甲基二甲基甲氧基矽烷、巰基甲基三乙氧基矽烷、巰基甲基甲基二乙氧基矽烷、巰基甲基二甲基乙氧基矽烷、3-巰基丙基三甲氧基矽烷、3-巰基丙基甲基二甲氧基矽烷、3-巰基丙基二甲基甲氧基矽烷、3-巰基丙基三乙氧基矽烷、3-巰基丙基甲基二乙氧基矽烷、3-巰基丙基二甲基乙氧基矽烷等。 As the mercapto group-containing organooxysilane compound represented by the general formula (3), specifically, mercaptomethyltrimethoxysilane, mercaptomethylmethyldimethoxysilane, mercaptomethyldimethylmethyl Oxysilane, mercaptomethyltriethoxysilane, mercaptomethylmethyldiethoxysilane, mercaptomethyldimethylethoxysilane, 3-mercaptopropyltrimethoxysilane, 3-mercaptopropyl Methyldimethoxysilane, 3-mercaptopropyldimethylmethoxysilane, 3-mercaptopropyltriethoxysilane, 3-mercaptopropylmethyldiethoxysilane, 3-mercaptopropyl Dimethyl ethoxy silane and so on.
以上述一般式(2)所示的胺基化合物、與以
上述一般式(3)所示的含有巰基之有機氧矽烷化合物之調配比係無特別限定,但由反應性、生產性之點而言,相對於以一般式(2)所示的化合物1莫耳,以將一般式(3)所示的化合物設為0.1~4莫耳,特別是0.2~2莫耳之範圍為理想。
The amine compound represented by the above general formula (2), and
The compounding ratio of the mercapto group-containing organic oxysilane compound represented by the general formula (3) is not particularly limited, but from the viewpoint of reactivity and productivity, it is less than the
為了使上述反應之反應速度提高,亦可將自由基產生劑作為觸媒使用。作為所使用的自由基產生劑,可例示t-丁基過氧化物、二t-丁基過氧化物、過氧化苯甲醯等之過氧化物、偶氮二異丁腈、2,2'-偶氮雙-(2-甲基丁腈)等之偶氮化合物等。 In order to increase the reaction rate of the above reaction, a free radical generator may also be used as a catalyst. As the radical generator used, peroxides such as t-butyl peroxide, di-t-butyl peroxide, benzoyl peroxide, azobisisobutyronitrile, 2,2' can be exemplified. -Azo compounds such as azobis-(2-methylbutyronitrile), etc.
觸媒之使用量係無特別限定,但由反應性、生產性之點而言,相對於以上述一般式(2)所示的化合物1莫耳,以0.0001~0.2莫耳,特別是0.001~0.1莫耳之範圍為理想。 The amount of catalyst used is not particularly limited, but from the viewpoint of reactivity and productivity, it is 0.0001 to 0.2 mol, especially 0.001 to 1 mol of the compound represented by the above general formula (2) The range of 0.1 mole is ideal.
上述反應之反應溫度係無特別限定,但以0~200℃,特別是20~150℃為理想,反應時間亦無特別限定,但以1~40小時,特別是1~20小時為理想。反應環境係以設為氮、氬等之惰性氣體環境為理想。 The reaction temperature of the above reaction is not particularly limited, but is preferably 0 to 200°C, especially 20 to 150°C, and the reaction time is not particularly limited, but is preferably 1 to 40 hours, especially 1 to 20 hours. The reaction environment is preferably an inert gas environment such as nitrogen or argon.
尚,上述反應可以無溶劑進行,但亦可使用溶劑。作為所使用的溶劑,可例示戊烷、己烷、環己烷、庚烷、異辛烷、苯、甲苯、二甲苯等之烴系溶劑、二乙醚、四氫呋喃、二噁烷等之醚系溶劑、乙酸乙酯、乙酸丁酯等之酯系溶劑、乙腈、N,N-二甲基甲醯胺、N-甲基吡咯啶酮等之非質子性極性溶劑、二氯甲烷、氯仿等之氯化烴 系溶劑。此等溶劑係可以單獨使用1種,亦可混合2種以上使用。 Still, the above reaction can be carried out without a solvent, but a solvent can also be used. Examples of the solvent used include hydrocarbon solvents such as pentane, hexane, cyclohexane, heptane, isooctane, benzene, toluene, and xylene, and ether solvents such as diethyl ether, tetrahydrofuran, and dioxane. , Ethyl acetate, butyl acetate and other ester solvents, acetonitrile, N,N-dimethylformamide, N-methylpyrrolidone and other aprotic polar solvents, methylene chloride, chloroform and other chlorine Hydrocarbon Department of solvents. These solvent systems may be used alone or in combination of two or more.
由上述反應,例如可得到以下述一般式(1')所示的含硫之胺基有機氧矽烷化合物
R3"係亦可含有氧原子、氮原子、硫原子等之雜原子的碳數3~20,特別是3~10之直鏈狀或分支狀之2價烴基,具體而言係可例示伸丙基、伸丁基、六亞甲基、亞辛基、伸癸基等之直鏈狀伸烷基、甲基伸丙基等之分支狀伸烷基、組合伸乙基、伸丙基等之直鏈狀伸烷基與伸環己基等之環狀伸烷基的基、伸丁基等之伸烯基、伸乙基伸苯基、伸甲基伸苯基伸乙基等之伸芳烷基等,特別是由原料之籌集容易性而言,伸丙基為佳。另外,作為含有雜原子者係可舉出以[-CH2CH2OCH2CH2CH2-]、[-CH2CH2OCH2CH(CH3)-]表示的基等。更進一步,此等成分之烴基之氫原子之一部分或全部亦可被取代,作為該取代基,具體而言係例如可舉出甲氧基、乙氧基、(異)丙氧基等之烷氧基;氟原子、氯原子、溴原子、碘原子等之鹵素原子;氰基;胺基;苯基、甲苯基等之碳數6~10之芳基、苄基、苯乙基等之碳數7~10之芳烷基、碳數2~10之醯基、各自之各烷基、各烷氧基為碳數1~5的三烷基矽 烷基、三烷氧基矽烷基、二烷基單烷氧基矽烷基或是單烷基二烷氧基矽烷基,其間更進一步存在有酯基(-COO-)、醚基(-O-)、硫醚基(-S-)等亦可,組合此等成分而使用亦可。 R 3" series may also contain heteroatoms such as oxygen atoms, nitrogen atoms, sulfur atoms and the like, having a carbon number of 3 to 20, especially a linear or branched divalent hydrocarbon group of 3 to 10, specifically, it can be exemplified by Straight-chain alkylene such as propyl, butylene, hexamethylene, octylene, decylene, etc., branched alkylene such as methylpropylene, combined ethylene, propylene, etc. Straight-chain alkylene groups and cyclic alkylene groups such as cyclohexyl groups, alkenyl groups such as butyl groups, ethylene groups such as ethyl groups, phenylene groups such as methyl groups In particular, the propyl group is preferable in terms of the ease of raising raw materials. In addition, examples of the heteroatom-containing system include [-CH 2 CH 2 OCH 2 CH 2 CH 2 -], [-CH 2 The group represented by CH 2 OCH 2 CH(CH 3 )-], etc. Furthermore, a part or all of the hydrogen atoms of the hydrocarbon group of these components may be substituted, and specific examples thereof include, for example, a Alkoxy groups such as oxy, ethoxy, (iso) propoxy, etc.; halogen atoms such as fluorine, chlorine, bromine, iodine; cyano; amine; phenyl, tolyl, etc. 6 to 10 aryl groups, benzyl groups, phenethyl groups, etc., having 7 to 10 carbon atoms, 2 to 10 carbon atoms, each alkyl group, and each alkoxy group have 1 to 5 carbon atoms Trialkylsilyl, trialkoxysilyl, dialkylmonoalkoxysilyl or monoalkyldialkoxysilyl, there are further ester groups (-COO-), ether groups (-O-), thioether group (-S-), etc. may be used in combination.
作為藉由上述反應而得到的本發明之含硫之胺基有機氧矽烷化合物,具體而言係可例示與作為一般式(1)之具體例所舉出者為同樣者,但特別是可作為在一般式(1')的R3"為含有以[-CH2CH2CH2-]所示的基者、與含有以[-CH2CH(CH3)-]所示的基者之混合物而得,例如以下述式(4)【化10】(H3C)2N-CH2CH2CH2-S-CH2CH2CH2-Si(OCH3)3 (4)所示的1-二甲基胺基-4-硫-庚基三甲氧基矽烷、與以下述式(5)【化11】(H3C)2N-CH2CH(CH3)-S-CH2CH2CH2-Si(OCH3)3 (5)所示的1-二甲基胺基-2-甲基-3-硫-己基三甲氧基矽烷之混合物;或以下述式(6)【化12】(H3C)2N-CH2CH2OCH2CH2CH2-S-CH2CH2CH2-Si(OCH3)3 (6)所示的1-二甲基胺基-3-側氧基-7-硫-癸基三甲氧基矽烷、與以下述式(7)【化13】(H3C)2N-CH2CH2OCH2CH(CH3)-S-CH2CH2CH2-Si(OCH3)3 (7)所示的1-二甲基胺基-5-甲基-3-側氧基-6-硫-壬基三甲氧基矽烷之混合物等。 As the sulfur-containing amine-based organooxysilane compound of the present invention obtained by the above reaction, specifically, it can be exemplified as the same as the specific example of the general formula (1), but particularly as In the general formula (1'), R 3" is a group containing a group represented by [-CH 2 CH 2 CH 2 -] and a group containing a group represented by [-CH 2 CH(CH 3 )-] The mixture is obtained, for example, by the following formula (4) [Chem 10] (H 3 C) 2 N-CH 2 CH 2 CH 2 -S-CH 2 CH 2 CH 2 -Si(OCH 3 ) 3 (4) 1-dimethylamino-4-thio-heptyltrimethoxysilane and the following formula (5) [Chem. 11] (H 3 C) 2 N-CH 2 CH(CH 3 )-S-CH 2 CH 2 CH 2 -Si(OCH 3 ) 3 A mixture of 1-dimethylamino-2-methyl-3-thio-hexyltrimethoxysilane represented by (5); or by the following formula (6) [Chemical 12] 1-dimethylamine represented by (H 3 C) 2 N-CH 2 CH 2 OCH 2 CH 2 CH 2 -S-CH 2 CH 2 CH 2 -Si(OCH 3 ) 3 (6) 3-Phenoxy-7-thio-decyltrimethoxysilane, and the following formula (7) [Chem. 13] (H 3 C) 2 N-CH 2 CH 2 OCH 2 CH(CH 3 )- S-CH 2 CH 2 CH 2 -Si(OCH 3 ) 3 (7) 1-dimethylamino-5-methyl-3-oxo-6-thio-nonyltrimethoxysilane represented by (7) Of mixtures, etc.
在此情況,生成一般式(1')的R3"為含有以[-CH2CH2CH2-]所示的基者、與含有以[-CH2CH(CH3)-]所示的基者的比例(質量%),通常為50:50~95:5,特別是65:35~90:10。 In this case, R 3" of the general formula (1') is represented by [-CH 2 CH 2 CH 2 -], and represented by [-CH 2 CH(CH 3 )-] The ratio (mass %) of the base is usually 50:50~95:5, especially 65:35~90:10.
另外,在本發明的上述一般式(1)所示的含硫之胺基有機氧矽烷化合物中,R3為碳數1或2之烴基的情況之製造方法,其係例如可舉出令使3-巰基丙基三甲氧基矽烷及碳酸鉀等之鹼混合而產生的硫醇鹽(thiolate)與二烷基胺基乙基氯化物進行反應的方法。 In addition, in the sulfur-containing amine-based organooxysilane compound represented by the general formula (1) of the present invention, R 3 is a hydrocarbon group having a carbon number of 1 or 2, the production method may be, for example, A method in which a thiolate produced by mixing bases such as 3-mercaptopropyltrimethoxysilane and potassium carbonate with dialkylaminoethyl chloride reacts.
以下,表示實施例而具體地說明本發明,但本發明不受限於下述之實施例。 Hereinafter, the present invention will be specifically described by showing examples, but the present invention is not limited to the following examples.
於具備攪拌機、回流器、滴液漏斗及溫度計的燒瓶、裝填3-巰基丙基三甲氧基矽烷78.5g(0.400莫耳),加溫至80℃。在內溫安定後,將二甲基烯丙胺42.5g(0.499莫耳)、和2,2'-偶氮雙(2-甲基丁腈)3.9g(0.019莫耳)之混合物以2小時滴下,以85℃攪拌1小時。將反應液進行蒸餾,得到12.4g之沸點121~122℃/0.4kPa之餾出物。 In a flask equipped with a stirrer, a refluxer, a dropping funnel and a thermometer, 78.5g (0.400 mol) of 3-mercaptopropyltrimethoxysilane was filled and heated to 80°C. After stabilization at the internal temperature, a mixture of 42.5 g (0.499 mol) of dimethylallylamine and 3.9 g (0.019 mol) of 2,2′-azobis(2-methylbutyronitrile) was dropped over 2 hours And stirred at 85°C for 1 hour. The reaction solution was distilled to obtain 12.4 g of distillate having a boiling point of 121 to 122° C./0.4 kPa.
測定所得到的餾出物之質譜、1H-NMR光譜、IR光譜。 The mass spectrum, 1 H-NMR spectrum and IR spectrum of the obtained distillate were measured.
質譜 Mass spectrometry
m/z 204,179,121,91,58 m/z 204,179,121,91,58
1H-NMR光譜(重氯仿溶劑) 1 H-NMR spectrum (heavy chloroform solvent)
於第1圖以圖表來表示。 The first figure is represented by a graph.
IR光譜 IR spectrum
於第2圖以圖表來表示。 The graph is shown in Figure 2.
藉由以上之結果,確認所得的化合物係1-二甲基胺基-4-硫-庚基三甲氧基矽烷55質量%與1-二甲基胺基-2-甲基-3-硫-己基三甲氧基矽烷45質量%。
From the above results, it was confirmed that the obtained compound was 1-dimethylamino-4-sulfo-
於具備攪拌機、回流器、滴液漏斗及溫度計的燒瓶、裝填3-巰基丙基甲基二甲氧基矽烷72.0g(0.400莫耳),加溫至80℃。在內溫安定後,將二甲基烯丙胺34.0g(0.399莫耳)、和2,2'-偶氮雙(2-甲基丁腈)3.9g(0.019莫耳)之混合物以1小時滴下,以85℃攪拌2小時。將反應液進行蒸餾,得到15.9g之沸點107~108℃/0.4kPa之餾出物。 In a flask equipped with a stirrer, a refluxer, a dropping funnel and a thermometer, 72.0 g (0.400 mol) of 3-mercaptopropylmethyldimethoxysilane was filled, and heated to 80°C. After stabilization at the internal temperature, a mixture of 34.0 g (0.399 mol) of dimethylallylamine and 3.9 g (0.019 mol) of 2,2′-azobis(2-methylbutyronitrile) was dropped in 1 hour And stirred at 85°C for 2 hours. The reaction liquid was distilled to obtain 15.9 g of distillate having a boiling point of 107 to 108° C./0.4 kPa.
測定所得到的餾出物之質譜、1H-NMR光譜、IR光譜。 The mass spectrum, 1 H-NMR spectrum and IR spectrum of the obtained distillate were measured.
質譜 Mass spectrometry
m/z 188,119,105,75,58 m/z 188,119,105,75,58
1H-NMR光譜(重氯仿溶劑) 1 H-NMR spectrum (heavy chloroform solvent)
於第3圖以圖表來表示。 It is represented by a graph in Figure 3.
IR光譜 IR spectrum
於第4圖以圖表來表示。 The graph is shown in Figure 4.
藉由以上之結果,確認所得的化合物係1-二甲基胺基-4-硫-庚基甲基二甲氧基矽烷51質量%與1-二甲基胺基-2-甲基-3-硫-己基甲基二甲氧基矽烷49質量%。 From the above results, it was confirmed that the obtained compound was 1-dimethylamino-4-thio-heptylmethyldimethoxysilane 51% by mass and 1-dimethylamino-2-methyl-3 -49% by mass of sulfur-hexylmethyldimethoxysilane.
於具備攪拌機、回流器、滴液漏斗及溫度計的燒瓶、裝填3-巰基丙基三甲氧基矽烷56.0g(0.285莫耳),加溫至80℃。在內溫安定後,將二甲基胺基乙基烯丙基醚36.6g(0.283莫耳)、和2,2'-偶氮雙(2-甲基丁腈)0.556g(0.00289莫耳)之混合物以1小時滴下,以95℃攪拌2小時。將反應液進行蒸餾,得到70.1g之沸點135~140℃/0.4kPa之餾出物。 In a flask equipped with a stirrer, a refluxer, a dropping funnel and a thermometer, 56.0 g (0.285 mole) of 3-mercaptopropyltrimethoxysilane was filled, and the temperature was raised to 80°C. After stabilization at internal temperature, 36.6 g (0.283 mol) of dimethylaminoethyl allyl ether and 0.556 g (0.00289 mol) of 2,2'-azobis(2-methylbutyronitrile) The mixture was dropped in 1 hour and stirred at 95°C for 2 hours. The reaction solution was distilled to obtain 70.1 g of distillate with a boiling point of 135 to 140° C./0.4 kPa.
測定所得到的餾出物之質譜、1H-NMR光譜、IR光譜。 The mass spectrum, 1 H-NMR spectrum and IR spectrum of the obtained distillate were measured.
質譜 Mass spectrometry
m/z 280,162,121,91,58 m/z 280,162,121,91,58
1H-NMR光譜(重氯仿溶劑) 1 H-NMR spectrum (heavy chloroform solvent)
於第5圖以圖表來表示。 The graph is shown in Figure 5.
IR光譜 IR spectrum
於第6圖以圖表來表示。 The graph is shown in Figure 6.
藉由以上之結果,確認所得的化合物係1-二甲基胺基-3-側氧基-7-硫-癸基三甲氧基矽烷85質量%與1-二甲基
胺基-5-甲基-3-側氧基-6-硫-壬基三甲氧基矽烷15質量%。
From the above results, it was confirmed that the obtained compound was 1-dimethylamino-3-pendoxy-7-thio-
於具備攪拌機、回流器、滴液漏斗及溫度計的燒瓶、裝填3-巰基丙基甲基二甲氧基矽烷51.8g(0.287莫耳),加溫至80℃。在內溫安定後,將二甲基胺基乙基烯丙基醚37.2g(0.288莫耳)、和2,2'-偶氮雙(2-甲基丁腈)0.5814g(0.003022莫耳)之混合物以1小時滴下,以95℃攪拌2小時。將反應液進行蒸餾,得到66.3g之沸點154~156℃/0.4kPa之餾出物。 In a flask equipped with a stirrer, a refluxer, a dropping funnel and a thermometer, 51.8 g (0.287 mol) of 3-mercaptopropylmethyldimethoxysilane was filled and heated to 80°C. After stabilization at internal temperature, 37.2 g (0.288 mol) of dimethylaminoethyl allyl ether and 0.5814 g (0.003022 mol) of 2,2′-azobis(2-methylbutyronitrile) The mixture was dropped in 1 hour and stirred at 95°C for 2 hours. The reaction liquid was distilled to obtain 66.3 g of distillate having a boiling point of 154 to 156° C./0.4 kPa.
測定所得到的餾出物之質譜、1H-NMR光譜、IR光譜。 The mass spectrum, 1 H-NMR spectrum and IR spectrum of the obtained distillate were measured.
質譜 Mass spectrometry
m/z 264,162,131,105,75,58 m/z 264,162,131,105,75,58
1H-NMR光譜(重氯仿溶劑) 1 H-NMR spectrum (heavy chloroform solvent)
於第7圖以圖表來表示。 The graph is shown in Figure 7.
IR光譜 IR spectrum
於第8圖以圖表來表示。 This is shown graphically in Figure 8.
藉由以上之結果,確認所得的化合物係1-二甲基胺基-3-側氧基-7-硫-癸基甲基二甲氧基矽烷(10-二甲基胺基-4-硫-8-側氧基-癸基甲基二甲氧基矽烷)88質量%與1-二甲基胺基-5-甲基-3-側氧基-6-硫-壬基甲基二甲氧基矽烷12質量%。 From the above results, it was confirmed that the obtained compound was 1-dimethylamino-3-pendoxy-7-sulfo-decylmethyldimethoxysilane (10-dimethylamino-4-sulfide -8- pendant-decylmethyldimethoxysilane) 88% by mass with 1-dimethylamino-5-methyl-3- pendant-6-thio-nonylmethyl dimethyl 12% by mass of oxysilane.
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