TWI668797B - Deposition ring and chuck components - Google Patents

Abstract

The present application discloses a deposition ring (50) and a chuck member using the same. A deposition ring (50) is used in the chuck member for use with the pressure ring and the base, comprising: an annular body (51) having an upper surface (52) and a lower surface (53); formed on the upper surface (52) An annular groove (55); wherein the deposition ring (50) further includes a snap portion (58) for snapping into the base. By snapping the deposition ring (50) to the pedestal, the risk of displacement and shedding of the deposition ring (50) can be reduced, increasing the effective working time of the deposition ring (50) and the chuck elements.

Description

Deposition ring and chuck components

The present invention relates to a deposition ring and a chuck member using the same, and more particularly to a deposition ring and a chuck member for use in a sputtering apparatus for integrated circuit fabrication.

In the preparation process of the integrated circuit, a physical vapor deposition (hereinafter referred to as PVD) device is required to complete the deposition film process, and a common technique is a magnetron sputtering method. A typical sputtering device is shown in FIG. The reaction chamber 1, the target 4, the insulating material 2, the insulating material 2 and the target 4 form a chamber and are filled with deionized water 3. During sputtering, the DC power source applies a bias voltage to the target 4, causing it to become a negative pressure with respect to the grounded reaction chamber 1, so that argon gas is discharged to generate plasma, and the negative bias voltage can simultaneously supply positively charged argon ions. Attracted to the target 4. When the energy of the argon ions is sufficiently high and bombards the target 4 under the action of the magnetic field formed by the rotating magnetron 5, the metal atoms escape the surface of the target 4 and are deposited on the wafer 10 by diffusion, in order to avoid A pressure ring 8 is provided to contaminate the reaction chamber 1. The susceptor 9 is disposed in the reaction chamber 1 for fixing, supporting and transferring the wafer 10 and achieving temperature control. In order to avoid the movement or misalignment of the wafer 10 during the process, the susceptor 9 tends to use a high temperature electrostatic chuck structure. Further, in order to prevent contamination of the high-temperature electrostatic chuck, a deposition ring 11 is provided to protect the electrostatic chuck from contamination by the film layer; when the deposition ring 11 is treated by sand blasting, the contaminant is more likely to adhere to the deposition ring 11 It does not fall off, so as to ensure the durability of the process; the additional design requirements of the deposition ring 11 are easy to assemble and disassemble, easy to replace, and can be cleaned regularly.

Fig. 2 shows an electrostatic chuck element used in a sputtering apparatus in the prior art. It includes an insulating layer 201, a susceptor 202, a deposition ring 203, and a pressure ring 204. The insulating layer 201 is used to support the wafer, The susceptor 202 is used to support the insulating layer 201, and can also be connected to an RF bias, and can also control the temperature of the wafer.

Fig. 3 is an enlarged view of Fig. 2 at I. As shown in Fig. 3, in order to prevent adhesion between the deposition ring 203 and the pressure ring 204, an annular projection 2041 is provided on the pressure ring 204, which causes a gap G between the pressure ring 204 and the deposition ring 203.

4 and 5 show a partial cross-sectional view and a perspective view, respectively, of the deposition ring 203 of Fig. 2. As shown in FIG. 4 and FIG. 5, the bottom surface of the deposition ring 203 is a flat surface and directly falls on the susceptor 202; and the top surface is formed with a groove 2031, and the groove 2031 is sandblasted to increase the film particle. The deposition area prevents particle contamination of the wafer while also extending the cleaning cycle of the deposition ring 203.

Although the prior art has employed the protrusions 2041 to prevent adhesion, when the sputtering process continues for a period of time T, adhesion between the pressure ring 204 and the deposition ring 203 may increase as the thickness of the plating film increases. When the pressure ring 204 is raised, the deposition ring 203 is also easily lifted by the presence of the adhesion phenomenon, causing the deposition ring 203 to be detached from the susceptor 202. In addition, the pressure ring 204 of the prior art merely falls on the deposition ring 203, and it is impossible to ensure that the two are concentric, which may cause the process result to shift.

The present invention is directed to at least one of the technical problems existing in the prior art, and provides a deposition ring and a chuck member using the same, which at least can reduce the risk of displacement and shedding of the deposition ring.

SUMMARY OF THE INVENTION It is an object of the present invention to achieve the above object to provide a deposition ring for use with a pressure ring and a base in a chuck member. The deposition ring includes: an annular body having an upper surface and a lower surface; an annular groove formed on the upper surface; wherein the deposition ring further includes a snap portion for engaging the deposition ring to the On the base, the deposition ring is fixed to the base.

SUMMARY OF THE INVENTION An object of the present invention to achieve the above object is to provide a chuck member including a pressure ring, a base, and a deposition ring for use with the pressure ring and the base, the deposition ring including an annular body having an upper surface and a lower surface And an annular groove formed on the upper surface; wherein the deposition ring further includes a snap portion for snapping the deposition ring to the base; the chuck member further includes a snap member, the buckle The member includes a lower side portion connected to the base, an upper side portion that is engaged with the engaging portion, and an intermediate portion that connects the lower side portion and the upper side portion.

By snapping the deposition ring to the pedestal, the risk of displacement and shedding of the deposition ring can be reduced, increasing the effective working time of the deposition ring and chuck components.

1‧‧‧Reactive amines

2‧‧‧Insulation materials

3‧‧‧Deionized water

4‧‧‧ Target

5‧‧‧Magnetron

8, 204, 60‧‧ ‧ pressure ring

9, 202, 40‧‧‧ base

10‧‧‧ wafer

11, 203, 50‧ ‧ sedimentary ring

201‧‧‧Insulation

2031‧‧‧ Groove

2041‧‧‧ bump

51‧‧‧ ring body

52‧‧‧ upper surface

53‧‧‧ lower surface

55‧‧‧ annular groove

56‧‧‧ bumps

57‧‧‧ dent

58‧‧‧ card joint

58A‧‧‧ Shape channel

58B‧‧‧ Hook

58C‧‧‧Sawtooth column

80, 80B, 80C‧‧‧ card fasteners

801‧‧‧ lower side

8011‧‧‧ mounting hole

802‧‧‧Intermediate

803‧‧‧ upper side

G‧‧‧ gap

P‧‧‧ area

The invention may be better understood by reference to the drawings and specification. The components in the figures are not necessarily drawn to scale, and are intended to illustrate the principles of the invention. In the drawings: FIG. 1 is a schematic view of a sputtering apparatus of the prior art; FIG. 2 is a schematic view of an electrostatic chuck component of the prior art; and FIG. 3 is a deposition ring and a pressure ring and a base of the prior art. Fig. 4 is a partially enlarged cross-sectional view of the deposition ring shown in Fig. 3; Fig. 5 is a perspective view of the deposition ring shown in Fig. 3; and Fig. 6 is a chuck member according to an embodiment of the present invention. A cross-sectional view of the chuck member including a susceptor, a deposition ring, and a pressure ring; and FIG. 7 is a partially enlarged view of FIG. 6 to more clearly show the cooperation of the deposition ring with the susceptor and the pressure ring; Figure 6 is a cross-sectional view of the deposition ring at the snap portion; Figures 9A and 9B are perspective views of the deposition ring and its snap-in portion according to one embodiment; and Figures 10 and 11 show the deposition ring. Other alternative designs for engaging a snap member; Figure 12 is a perspective view of a snap member of a chuck member in accordance with one embodiment of the present invention; Fig. 13 is a view showing a pre-installation state of the snap member according to an embodiment of the present invention.

The following description relates to a chuck member according to an example of the present invention, wherein FIG. 6 is a cross-sectional view of a chuck member including a susceptor 40, a deposition ring 50, and a pressure ring 60, in accordance with one embodiment of the present invention. Figure 7 is a partial enlarged view of the area II in Figure 6, which more clearly shows the cooperation of the deposition ring 50 with the base 40 and the pressure ring 60; Figure 8 is the deposition ring 50 shown in Figure 6 on the card A cross-sectional view at the joint. As shown in Figures 6 through 8, in the chuck member, the deposition ring 50 is used in conjunction with the pressure ring 60 and the base 40. The deposition ring 50 includes: an annular body 51 having an upper surface 52 and a lower surface 53; an annular groove 55 formed in the upper surface 52; further, the deposition ring 50 further includes a snap portion 58 for the snap portion 58 The deposition ring 50 is snapped onto the base 40 to secure the deposition ring 50 to the base 40. As an example, the number of the engaging portions 58 is two, and the two engaging portions 58 may be disposed on opposite sides of the deposition ring 50 along the circumferential direction of the deposition ring 50 (for example, the left and right in FIG. 6 Sides; alternatively, the number of the engaging portions 58 is two or more, and is disposed along the circumference of the base 40.

Since the deposition ring 50 is snapped onto the susceptor 40, the rise of the pressure ring 60 does not bring up the deposition ring 50 even when a slight adhesion of the deposition ring 50 and the pressure ring 60 occurs. Thereby, the risk of displacement and shedding of the deposition ring 50 can be reduced, the working time of the deposition ring 50 is prolonged, and the process results are improved.

Still referring to Figures 7 and 8, preferably, the deposition ring 50 further includes a projection 56 formed on the upper surface 52, the projection 56 mating with the pressure ring 60, for example, on the lower surface of the pressure ring 60. A recess recessed toward the upper surface thereof is provided at a position corresponding to the projection 56, and the position of the deposition ring 50 and the pressure ring 60 is concentrically arranged by the engagement of the projection 56 with the recess.

By adding protrusions 56 to the deposition ring 50, on the one hand the deposition ring 50 and the pressure ring 60 can be positioned concentric, and on the other hand the particles can be prevented from entering the deposition ring 50 and the pressure ring 60 radially outward of the protrusion 56. The area between. In addition, the deposition ring 50 and the pressure ring are located on the radially inner side of the protrusion 56. In the gap between 60, the present invention expands the gap width (i.e., the width of the slit in the vertical direction in the drawing) by reducing the thickness of the deposition ring 50. In fact, the thickness of the deposition ring 50 can be reduced. It is understood to increase the height of the projection 56 in the vertical direction. Thus, even if the chuck member has been operated for a period of time T, the thickness of the particles accumulated at the slit does not reach the extent that the deposition ring 50 is adhered to the pressure ring 60.

Preferably, in accordance with an embodiment of the present invention, the deposition ring 50 further includes a recess 57 formed on the upper surface 52 at a radially outer side of the protrusion 56, the recess 57 and the protrusion 56 being in the deposition ring 50 and the pressure ring A labyrinth structure is formed between 60, that is, the arrangement of the recesses 57 and the projections 56 causes the height of the upper surface of the deposition ring 50 to be staggered to form a labyrinth structure, thereby preventing the sputtered particles from reaching an undesired area.

Please refer to FIG. 7 , FIG. 8 , FIG. 9A and FIG. 9B together, wherein FIG. 9A is a perspective view of a deposition ring and a snap portion thereof according to an embodiment, and FIG. 9B is a view of FIG. 9A. A magnified view of the P area. Preferably, the latching portion 58 is formed in the annular body 51 according to an embodiment. Shape channel 58A, the The shaped passage 58A is a section of a pipe communicating between the opening end and the end opening of the section, and the sectional shape in the vertical direction is similar to the figure obtained by flipping the letter L 180 degrees in the vertical direction, which is referred to as " The specific direction is that it extends upward from the opening end opening of the lower surface of the annular body 51 and then rotates toward the radially outer side of the annular body 51 until reaching the end of the outer surface of the annular body 51. End opening.

Preferably, the The angle of the shaped passage 58A is 70° to 85°, that is, the horizontal section thereof is slightly inclined downward. This makes it easier to catch the corresponding components of the chuck member that cooperate therewith (i.e., the snap member 80 of Fig. 7, which will be described later in detail).

It should be noted that this embodiment should The horizontal section of the shaped passage 58A may also not necessarily extend to the outer surface of the annular body 51, that is, the end opening is not provided, such that The shape of the shaped passage 58A is such that it extends upward from the lower surface of the annular body 51 and then rotates toward the radially outer side of the annular body 51. In addition, the The horizontal section of the shaped passage 58A may also be extended to extend radially outward of the annular body 51 to extend toward the radially inner side of the annular body 51, ie, The shaped passage 58A is turned 180 degrees in the horizontal direction and becomes Shaped channel.

As another design example of the engaging portion 58, as shown in FIG. 10, the engaging portion 58 is formed on the lower side of the annular body 51. Shape hook 58B, the The cross-sectional shape of the hook 58B in the vertical direction is similar to the figure obtained by flipping the letter L 180 degrees in the horizontal direction, which is referred to as " The specific direction is that it extends downward along the lower side of the annular body 51 and then rotates toward the radially inner side of the annular body 51, and can catch the corresponding snap member 80B.

Preferably, the The hook 58B has an included angle of 70° to 85°, that is, its horizontal section is slightly inclined upward, and specifically, the one end of the horizontal section at the radially outer side of the annular body 51 is slightly lower than the radially inner side of the annular body 51. One end.

As another design example of the engaging portion 58, as shown in FIG. 11, the engaging portion 58 is a sawtooth row 58C arranged in the vertical direction formed on the lower side of the annular body 51, and at least partially sawtooth in the sawtooth row 58C The direction of the serration is set to be inclined upward from the serrated end to the serrated tip so as to give the corresponding supporting force of the engaging member 80C upward, thereby engaging the engaging member 80C. In order to provide greater support to the catch member 80C, preferably all of the serrations in the array of serrations are oriented to be inclined from the end of the serration to the serrated tip.

So whether it is through Shape channel Shape channel Hooks, serrations, or other designs that can be conceived based on the teachings of the present disclosure, the deposition ring of the present invention can be snapped onto the pedestal to avoid being stuck.

The present invention also provides a chuck member, which will be described in detail below with reference to the accompanying drawings.

Referring to Fig. 12, which is a perspective view of a catching member of a chuck member according to an embodiment of the present invention, and referring to Figs. 6 through 8 together, a chuck member according to an embodiment of the present invention will be described. The chuck member includes a pressure ring 60, a base 40, and is used in conjunction with the pressure ring 60 and the base 40. a deposition ring 50 comprising an annular body 51 having an upper surface 52 and a lower surface 53; an annular groove 55 formed in the upper surface 52; wherein the deposition ring 50 further comprises at least two for snapping a latching portion 58 to the base 40; the chuck member further includes a latching member 80, the latching member 80 includes a lower side portion 801 connected to the base 40, and an upper side that is engaged with the latching portion 58 The portion 803 and the intermediate portion 802 that connects the lower side portion 801 and the upper side portion 803.

As described above, since the deposition ring 50 is snapped to the susceptor 40 using the snap member 80, even if a slight adhesion occurs between the pressure ring 60 and the deposition ring 50, the rise of the pressure ring 60 is not The deposition ring 50 will be brought up. Thereby, the risk of displacement and shedding of the deposition ring 50 can be reduced, and the working time of the deposition ring 50 can be prolonged.

Preferably, the deposition ring 50 further includes a protrusion 56 formed on the upper surface 52, and a recess recessed toward the upper surface thereof is provided at a position of the lower surface of the pressure ring 60 corresponding to the protrusion 56. The engagement of the projection 56 with the recess causes the locations of the deposition ring 50 and the pressure ring 60 to be concentrically disposed.

Preferably, the deposition ring 50 further includes a recess 57 formed on the radially outer side of the protrusion 56 formed on the upper surface 52 of the deposition ring 50, the recess 57 cooperating with the protrusion 56 formed on the lower surface of the pressure ring 60 to A labyrinth structure is formed between the deposition ring 50 and the pressure ring 60.

Preferably, the engaging portion 58 is formed in the annular body 51. Shape channel 58A, the The shape of the shaped passage 58A is such that it extends upward from the opening end opening of the lower surface of the annular body 51 and then rotates toward the radially outer side of the annular body 51 until reaching the outer surface of the annular body 51. And the intermediate portion 802 of the latching member 80 is in the vertical direction, and the upper side portion 803 of the latching member 80 can enter the Shape channel 58A.

Referring to Fig. 13, there is shown a pre-installation state of the snap member in accordance with one embodiment of the present invention. In order to make the snap member 80 and the deposition ring 50 The shaped passage 58A is engaged, firstly pressing the snap member 80 so that the intermediate portion 802 is inclined radially inward to enter The vertical section of the shaped passage 58A; then, after the upper side portion 803 of the fastener 80 is brought into position, the pressing is released. Under the elastic force of the intermediate portion 802, the upper side portion 803 of the snap member 80 enters the The horizontal section of the shaped passage 58A catches the deposition ring 50 to reach the engaged state shown in Fig. 7.

Preferably, the The angle of the shaped passage 58A is 70° to 85°, that is, the horizontal section thereof is slightly inclined downward.

As an example of an alternative design of the engaging portion 58A, as shown in FIG. 10, the engaging portion 58 is formed on the lower side of the annular body 51. Shape hook 58B, the The shape of the hook 58B extends downward along the lower side of the annular body 51 and then extends toward the radially inner side of the annular body 51. Accordingly, the upper side of the snap member 80B has the upper side. A strip-shaped opening with a hook.

Preferably, the The hook 58B has an included angle of 70° to 85°, that is, its horizontal section is slightly inclined upward.

As another example of an alternative design of the engaging portion 58A, as shown in Fig. 11, the engaging portion is a sawtooth row 58C which is formed in a vertical direction with the lower side of the annular body 51, and the upper surface of the sawtooth of the sawtooth row 58C Parallel to the horizontal plane. Correspondingly, the upper side of the latching member 80C has a corresponding row of serrations, and the row of serrations of the latching member 80 can engage with the serrated row 58C of the latching portion 58.

Although in the above embodiments, a separate snap member is used to connect the deposition ring and the base, it will be understood by those skilled in the art that the snap member may be integrally formed with one of the deposition ring and the base, and then the card The other end of the fastener is snapped to the other side.

Still referring to FIG. 13, preferably, the lower side portion 801 of the latching member 80 is a curved piece having a mounting hole 8011 on both sides of the circumferential direction, through which the latching member 80 is It is detachably mounted to the base 40.

Such a curved lower side design has a shape that fits a partial contour of the base 40, and the locking member 50 can be securely mounted to the base 40 after being mounted to the base 40 through the mounting holes on both sides. .

In addition, although the snap member 80 in Fig. 13 is mounted to the base 40 and then snapped onto the deposition ring 50; it is conceivable that the snap member can also be designed to be mounted to the deposition ring and snapped onto the base. . In addition, a pin structure can also be used to prevent the deposition ring from being pulled up by the pressure ring due to adhesion.

Although various exemplary embodiments of the invention have been disclosed, it will be understood by those skilled in the art And improvement. It will be apparent to those skilled in the art that other components that perform the same function can be suitably substituted. It should be noted that features illustrated with reference to the specific figures may be combined with features of other figures, even if not explicitly mentioned.

Claims (17)

A deposition ring (50) for use with a pressure ring and a base in a chuck member, comprising: an annular body (51) having an upper surface (52) and a lower surface (53); An annular groove (55) of the upper surface (52); wherein the deposition ring (50) further comprises a snap portion (58) for engaging the deposition ring (50) Attaching to the base to fix the deposition ring (50) on the base; wherein the snap portion (58) is a one formed in the annular body (51) Shaped passage (58A); or the snap portion (58) is a one formed on the lower side of the annular body (51) The hook (58B); or the snap portion (58) is a sawtooth row (58C) arranged in the vertical direction formed on the lower side of the annular body (51). The deposition ring of claim 1, further comprising a protrusion (56) formed on the upper surface (52), the protrusion (56) cooperating with the pressure ring to make the deposition ring (50) ) and the pressure ring is set concentrically. The deposition ring of claim 2, further comprising a recess (57) formed on the upper surface (52) radially outward of the protrusion (56), the recess (57) and the protrusion The (56) forms a labyrinth structure between the deposition ring (50) and the pressure ring. a deposition ring as described in claim 1, wherein The shape of the shaped passage (58A) is such that it extends upwardly from the lower surface of the annular body 51 and then rotates toward the radially outer side of the annular body 51. a deposition ring as described in claim 4, wherein The angle of the shaped passage (58A) is 70° to 85°. a deposition ring as described in claim 1, wherein The shape of the hook (58B) is such that it extends downward along the lower side of the annular body 51 and then rotates toward the radially inner side of the annular body 51. a deposition ring as described in claim 6 of the patent application, wherein The hook (58B) has an included angle of 70° to 85°. The deposition ring of claim 1, wherein at least a portion of the serrations of the array of serrations (58C) are arranged to be inclined from the end of the serration to the serrated tip. A chuck member includes a pressure ring (60), a base (70), and a deposition ring (50) for use with the pressure ring (60) and the base (70), the deposition ring (50) An annular body (51) having an upper surface (52) and a lower surface (53); and an annular groove (55) formed in the upper surface (52); wherein the deposition ring (50) is further Included is a snap portion (58) for snapping the deposition ring (50) to the base (70); the chuck member further includes a snap member (80), the snap member (80) The utility model comprises a lower side portion (801) connected to the base (70), an upper side portion (803) which is engaged with the engaging portion (58), and a connecting the lower side portion (801) and the upper side portion (803) An intermediate portion (802); wherein the snap portion (58) is one formed in the annular body (51) Shaped passage (58A); or the snap portion (58) is a one formed on the lower side of the annular body (51) The hook (58B); or the snap portion (58) is a sawtooth row (58C) arranged in the vertical direction formed on the lower side of the annular body (51). The chuck member of claim 9, wherein the deposition ring (50) further comprises a protrusion (56) formed on the upper surface (52), the protrusion (56) being formed at the pressure The grooves on the lower surface of the ring (60) are fitted such that the deposition ring (50) and the pressure ring (60) are concentrically disposed. The chuck member of claim 10, wherein the deposition ring (50) further comprises a recess (57) formed on the upper surface (52) radially outward of the protrusion (56), The recess (57) cooperates with a projection formed on a lower surface of the pressure ring (60) to form a labyrinth structure between the deposition ring (50) and the pressure ring (60). The chuck component of claim 11, wherein the chuck component The shape of the shaped passage (58A) is such that it extends upward from a lower surface of the annular body 51 and then rotates toward the radially outer side of the annular body 51; the intermediate portion of the snap member (80) (802) ) extending in the vertical direction, the upper side portion (803) of the snap member (80) can enter the Shaped channel (58A). a chuck component according to claim 12, wherein the The angle of the shaped passage (58A) is 70° to 85°. The chuck component of claim 11, wherein the chuck component The shape of the hook (58B) is such that it extends downward along the lower side of the annular body 51 and then extends toward the radially inner side of the annular body 51; the upper side of the snap member (80) ( 803) has the capacity to accommodate The opening of the hook (58B). a chuck component according to claim 14, wherein the The hook (58B) has an included angle of 70° to 85°. The chuck member of claim 11, wherein at least a portion of the serrations of the serration row (58C) are oriented to be inclined upward from the serrated end toward the serrated tip; the upper side of the retaining member (80) The portion (803) has a sawtooth row, and the zigzag row of the snap member (80) is engageable with the zigzag row (58C) of the snap portion (58). The chuck member according to any one of claims 9 to 16, wherein the lower side portion (801) of the fastening member (80) is a curved piece, and the circumferential direction of the curved piece Both sides have a mounting hole (8011) through which the snap member (80) is detachably mounted to the base (70).