CN207176067U - Deposition ring and chuck assembly - Google Patents
Deposition ring and chuck assembly Download PDFInfo
- Publication number
- CN207176067U CN207176067U CN201720664540.9U CN201720664540U CN207176067U CN 207176067 U CN207176067 U CN 207176067U CN 201720664540 U CN201720664540 U CN 201720664540U CN 207176067 U CN207176067 U CN 207176067U
- Authority
- CN
- China
- Prior art keywords
- ring
- deposition
- deposition ring
- pedestal
- fastener
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
A kind of deposition ring of disclosure (50) and use its chuck assembly, it is used cooperatively in chuck assembly with bezel ring, and pedestal, including：Ring body (51) with upper surface (52) and lower surface (53)；It is formed at the annular groove (55) of the upper surface (52)；Wherein, the deposition ring also includes being used for the Access Division (58) for snapping fit onto the pedestal.By the way that deposition ring is snapped fit onto into pedestal, the displacement of deposition ring can be reduced and the danger that comes off, increase the effective time of deposition ring.
Description
Technical field
It the utility model is related to a kind of deposition ring and use its chuck assembly, be prepared by especially a kind of integrated circuit that is used for
Sputtering equipment in deposition ring and chuck assembly.
Background technology
, it is necessary to which physical vapour deposition (PVD) (hereinafter referred to as PVD) equipment completes deposition film in the preparation process of integrated circuit
Technique, conventional technology are magnetron sputtering modes, and typical sputtering equipment is as shown in figure 1, the equipment has reaction cavity 1, target
Chamber is formed among material 4, insulating materials 2, insulating materials 2 and target 4 and is full of deionized water 3.D/C power can apply during sputtering
Be biased into target 4, it is turned into negative pressure relative to the cavity of ground connection, thus argon gas discharging and produce plasma, back bias voltage is same
When the argon ion of positively charged can be attracted to target 4.When the energy of argon ion is sufficiently high and is formed in the magnetron 5 by rotating
When bombarding target 4 under magnetic fields, metallic atom can be made to escape target material surface, and by diffusional deposition on the wafer 10.To keep away
Exempt to pollute reaction cavity 1 and set bezel ring, 8.Reference 9 is the pedestal of bearing wafer, in integrated circuit (IC) manufacturing process mistake
Cheng Zhong, for fixation, support and transmit chip and realize temperature control, avoid occurring mobile or dislocation in technical process existing
As often using high temperature electrostatic chuck structure.Further in use, to prevent from polluting high temperature electrostatic chuck, it is provided with again
Deposition ring 11.It protects electrostatic chuck not by film layer Substances Pollution；When deposition ring is after the processing such as sandblasting, pollutant is easier
It is attached in deposition ring and does not fall off, so as to ensures the persistence of technique；The other design requirement of deposition ring also has dismounting side
Just, be easily changed, can fixed time cleaning etc..
Fig. 2 shows a kind of electrostatic chuck assembly being used in the prior art in sputtering equipment.It includes insulating barrier 201, base
Seat 202, deposition ring 203 and bezel ring, 204.Insulating barrier 201 is used for supporting chip, and pedestal 202 is then used for supporting insulating barrier 201, together
When can access RF bias, also can control chip temperature.
Fig. 3 is enlarged drawings of the Fig. 2 at I.As shown in figure 3, to prevent from producing adhesion between deposition ring 203 and bezel ring, 204,
The projection 2041 of annular is set on bezel ring, and this to produce gap G between bezel ring, 204 and deposition ring 203.
Partial section and the stereogram of Fig. 2 deposition ring 203 is shown respectively in Fig. 4 and Fig. 5.As illustrated, deposition ring 203
Bottom surface is plane, is directly put off on pedestal；And top surface forms fluted 2031, blasting treatment is carried out in groove, to increase film
The depositional area of layer particle, prevents particle contamination chip, while also extend the cleaning frequency of deposition ring 203.
Although prior art prevents adhesion using projection 2041, when sputtering technology persistently carries out a period of time T,
With thicknesses of layers increase is coated with, still there may be adhesion between bezel ring, 204 and deposition ring 203.When bezel ring, 204 is raised, by
In the presence of adhesion phenomenon, deposition ring is also easily come with rise, causes deposition ring 203 to depart from pedestal 202.It is in addition, existing
Bezel ring, 204 in technology is only to put off in deposition ring 203, can not ensure that the two with one heart, it is inclined to may result in process results
Move.
Utility model content
The purpose of this utility model is to provide a kind of deposition ring and uses its chuck assembly, and it at least reduces deposition ring
Displacement and the danger that comes off.
The utility model realizes that the scheme of above-mentioned purpose is to provide a kind of deposition ring, its in chuck assembly with bezel ring, and base
Seat is used cooperatively, and the deposition ring includes：Ring body with upper and lower surface；It is formed at the annular of the upper surface
Groove；In addition, the deposition ring also includes Access Division, the Access Division is used to the deposition ring snapping fit onto the pedestal,
So that the deposition ring is fixed on the pedestal.
The utility model realizes that the scheme of above-mentioned purpose is to provide a kind of chuck assembly, including makes with bezel ring, and pedestal cooperation
Deposition ring, the deposition ring include the ring body with upper and lower surface；It is formed at the annular of the upper surface
Groove；In addition, the deposition ring also includes Access Division, the Access Division is used to the deposition ring snapping fit onto the pedestal,
So that the deposition ring is fixed on the pedestal；The pedestal also includes fastener, and the fastener includes and the pedestal
Connected following side, with the upper lateral part of the Access Division phase clamping and being connected the following side and the centre of the upper lateral part
Portion.
By the way that pedestal will be snapped fit onto in deposition ring, the displacement of deposition ring can be reduced and the danger that comes off, increase deposition ring
Effective time.
Brief description of the drawings
The utility model may be better understood in refer to the attached drawing and specification.Part in accompanying drawing is painted not necessarily to scale
System, its purpose, which is only that, illustrates principle of the present utility model.In the accompanying drawings：
Fig. 1 is a kind of schematic diagram of sputtering equipment of prior art；
Fig. 2 is a kind of schematic diagram of electrostatic chuck assembly of prior art；
Fig. 3 is the schematic diagram that a kind of deposition ring of prior art is engaged with bezel ring, and pedestal；
Fig. 4 is the amplification sectional view of deposition ring shown in Fig. 3；
Fig. 5 is the stereogram of deposition ring shown in Fig. 3；
Fig. 6 is the sectional view according to the chuck assembly of the utility model one embodiment, the chuck assembly include pedestal,
Deposition ring and bezel ring,；
Fig. 7 is Fig. 6 partial enlarged drawing, is more clearly shown that the cooperation of deposition ring and base and cover ring；
Fig. 8 is sectional view of the deposition ring at Access Division shown in Fig. 6；
Fig. 9 is according to the deposition ring of one embodiment and its stereogram of Access Division；
Figure 10 shows that deposition ring forms an alternate design of clamping with fastener；
Figure 11 shows that deposition ring forms another alternate design of clamping with fastener；
Figure 12 is the stereogram according to the fastener of the chuck assembly of the utility model one embodiment；
Figure 13 shows state before the installation according to the fastener of the utility model one embodiment.
Embodiment
Following explanation is related to the chuck assembly according to an example of the present utility model, and wherein Fig. 6 is according to this practicality
The sectional view of the chuck assembly of new one embodiment, the chuck assembly include pedestal 40, deposition ring 50 and bezel ring, 60；Fig. 7
For Fig. 6 partial enlarged drawing, deposition ring 50 and the cooperation of pedestal 40 and bezel ring, 60 are more clearly shown that；Fig. 8 is to be deposited shown in Fig. 6
Sectional view of the ring at Access Division.As illustrated, in the chuck assembly, deposition ring 50 coordinates with bezel ring, 60 and pedestal 40 and made
With.Deposition ring 50 includes：Ring body 51 with upper surface 52 and lower surface 53；It is formed at the annular recessed of the upper surface 52
Groove 55；In addition, the deposition ring 50 also includes Access Division 58, the Access Division is described for the deposition ring 50 to be snapped fit onto
On pedestal 40, the deposition ring 50 is fixed on the pedestal 40.As an example, the Access Division 58 may be formed at deposition
The opposite sides (Fig. 6 left and right sides) of ring 50, or it is formed around more of pedestal.
Because deposition ring 50 snaps fit onto pedestal 40, when having a little adhesion situation to occur, the rise of bezel ring, 60 is not yet
Deposition ring 50 can be taken up.Thus, it is possible to reduce deposition ring displacement and the danger to come off, extend the working time of deposition ring 50.
Again referring to Fig. 7 and Fig. 8, it is preferable that deposition ring 50 also includes the projection 56 for being formed at the upper surface 52, raised
56 coordinate with the bezel ring, 60, so that the position of the deposition ring 50 and the bezel ring, 60 is concentric.
It is raised by increasing in deposition ring 50, deposition ring 50 and bezel ring, 60 can on the one hand be positioned as with one heart, it is another
Aspect also hinders particle to enter between the deposition ring 50 on the outside of projection and bezel ring, 60.In addition, for the radial direction positioned at projection 56
Gap between the deposition ring 50 and bezel ring, 60 of inner side, the utility model expand this by the way of reduction deposits ring thickness
The gap width at place.So, a period of time T even if chuck assembly has worked, the particle thickness accumulated at gap is not yet
Can reach makes the degree of deposition ring and bezel ring, adhesion.
Preferably, according to the utility model one embodiment, deposition ring 50 also includes the position for being formed at the upper surface 52
In the depression 57 of raised 56 radial outside, the depression 57 is with described raised 56 in the deposition ring 50 and the lid
Labyrinth structure is formed between ring 60.Thus, the particle of sputtering is hindered to reach undesirable region.
With reference to figure 9, its be according to the deposition ring of one embodiment and its stereogram of Access Division, and with reference to figure 7 and Fig. 8,
Preferably, according to one embodiment, the Access Division 58 is the ┏ shape passages 58A being formed in the ring body 51, described
Downside of the trend of ┏ shape passages along the ring body 51 goes to the radial outside of the ring body 51.
Preferably, the angle of the ┏ shapes passage 58A is 70 ° to 85 °, i.e. its horizontal segment is angled slightly downward.So may be used
To be easier to block the matched corresponding component (that is, the fastener 80 of Fig. 7, will be described in detail later) of chuck assembly.
As an example of Access Division 58A alternate design, as shown in Figure 10, the Access Division is to be formed at the ring
The ┛ shapes hook 58B of the downside of shape body 51, downside of the trend that the ┛ shapes are linked up with along the ring body 51 goes to described
The radially inner side of ring body 51, and corresponding fastener 80B can be blocked.
Preferably, the angle of the ┛ shapes hook 58B is 70 ° to 85 °, i.e. its horizontal segment tilts slightly upward.
As another example of Access Division 58A alternate design, as shown in figure 11, the Access Division is described to be formed at
The serration 58C vertically arranged of the downside of ring body 51, the upper surface of the sawtooth of the serration is parallel to level
Face is downwardly concaved, and can block corresponding fastener 80C.
Therefore, either by the way that ┏ shapes passage, ┛ shapes are linked up with, serration still can be thought by the teaching based on the disclosure
Other designs arrived, deposition ring of the present utility model can be snapped fit onto on pedestal, and avoids adhesion from taking up.
With reference to figure 12, it is referred to according to the stereogram of the fastener of the chuck assembly of the utility model one embodiment
Fig. 6-8, the chuck assembly according to the utility model one embodiment is described.The chuck assembly includes bezel ring, 60, pedestal 70, with
And the deposition ring 50 being used cooperatively with bezel ring, 60 and pedestal 70, the deposition ring 50 are included with upper surface 52 and lower surface 53
Ring body 51；It is formed at the annular groove 55 of the upper surface 52；Wherein, the deposition ring 50 is also used for including at least two
Snap fit onto the Access Division 58 of the pedestal 70；The pedestal 70 also includes fastener 80, and the fastener 80 includes and the base
The connected following sides 801 of seat 70, with the upper lateral part 803 of the clamping of Access Division 58 and being connected the following side 801 and described
The pars intermedia 802 of upper lateral part 803.
As noted previously, as deposition ring 50 is snapped fit onto into pedestal 40 using fastener 80, even in there is a little adhesion situation
During generation, the rise of bezel ring, 60 will not also take up deposition ring 50.Thus, it is possible to deposition ring displacement and the danger to come off are reduced,
And extend the working time of deposition ring 50
Preferably, the deposition ring 50 also includes the projection 56 for being formed at the upper surface 52, and projection 56 is with being formed at institute
The depression for stating bezel ring, lower surface coordinates, so that the position of the deposition ring 50 and the bezel ring, 60 is concentric.
Preferably, what the deposition ring 50 also included being formed at the upper surface 52 is located at raised 56 radial outside
Depression 57, it is described depression 57 with formed the bezel ring, lower surface male cooperations, with the deposition ring 50 and the lid
Labyrinth structure is formed between ring 60.
Preferably, the Access Division is the ┏ shape passages 58A being formed in the ring body 51, the ┏ shapes passage
Downside of the trend along the ring body 51 go to the radial outside of the ring body 51.The centre of the fastener 80
Vertically, the upper lateral part 803 of the fastener 80 can enter the ┏ shapes passage 58A in portion 802.
With reference to figure 13, it shows state before the installation according to the fastener of the utility model one embodiment.In order to allow card
Fastener 80 and the ┏ shape passage 58A clampings of deposition ring 50, the pars intermedia 802 for first having to press fastener 80 incline to radially inner side
Tiltedly, so as to the vertical section of entrance ┏ shape passages；Then, after the upper lateral part 803 of fastener 80 reaches appropriate location, releasing is pressed
Pressure.Under the elastic force effect of pars intermedia 802, the upper lateral part 803 of fastener 80 enters the horizontal segment and card of the ┏ shapes passage 58A
Firmly deposition ring 50, and reach the clamped condition shown in Fig. 7.
Preferably, the angle of the ┏ shapes passage 58A is 70 ° to 85 °, i.e. its horizontal segment is angled slightly downward.
As an example of Access Division 58A alternate design, as shown in Figure 10, the Access Division is to be formed at the ring
The ┛ shapes hook 58B of the downside of shape body 51, downside of the trend that the ┛ shapes are linked up with along the ring body 51 goes to described
The radially inner side of ring body 51；Correspondingly, there is the upper lateral part of the fastener 80B bar shaped for accommodating the ┛ shapes hook to open
Mouthful.
Preferably, the angle of the ┛ shapes hook 58B is 70 ° to 85 °, i.e. its horizontal segment tilts slightly upward.
As another example of Access Division 58A alternate design, as shown in figure 11, the Access Division is to be formed and annular
The serration 58C vertically arranged of the downside of body 51, the upper surface of the sawtooth of the serration parallel to horizontal plane or
It is downwardly concaved.Correspondingly, the upper lateral part of the fastener 80C has corresponding serration, the sawtooth of fastener 80
Row can engage with the serration of the Access Division.
Although in above-described embodiment, connect deposition ring and pedestal, people in the art using single fastener
Member is integrated it should be understood that can also form fastener with one of deposition ring and pedestal, then by fastener other end clamping
To the opposing party.
Again referring to Figure 13, it is preferable that the following side 801 of the fastener 80 is arc-like sheet, circumferential the two of the arc-like sheet
Side has mounting hole 8011, and by the mounting hole 8011, the fastener 80 is releasably attached on the pedestal 40.
Such arc-shaped lower portion design, its shape is bonded with the local configuration of pedestal 40, when the mounting hole by both sides
After being installed on pedestal, fastener 50 can be firmly fixed on pedestal 40.
In addition, although the fastener 80 in Figure 13 is mounted on pedestal 40, deposition ring 50 is then snapped fit onto；It can think
Arrive, fastener, which may be designed in, to be installed in deposition ring and snap fit onto on pedestal.In addition it is also possible to hindered using pin feature
Only due to adhesion, covered annulus rises deposition ring.
Although disclosing various exemplary embodiments of the present utility model, one of ordinary skill in the art will manage
Solution, in the case of without departing from spirit and scope of the present utility model, can make will realize it is of the present utility model some
The various changes of advantage and improvement.One of ordinary skill in the art substantially understands, can suitably substitute execution identical function
Miscellaneous part.It should be noted that with reference to the feature specifically illustrated can with the combinations of features of other accompanying drawings, even in
In the case of being not expressly mentioned.
Claims (17)
1. a kind of deposition ring (50), it is used cooperatively in chuck assembly with bezel ring, and pedestal, including：
Ring body (51) with upper surface (52) and lower surface (53)；
It is formed at the annular groove (55) of the upper surface (52)；
Characterized in that, the deposition ring also includes Access Division (58), the Access Division is used for the deposition ring (50) clamping
Onto the pedestal, the deposition ring (50) is fixed on the pedestal.
2. deposition ring according to claim 1, in addition to
The projection (56) of the upper surface (52) is formed at, the projection (56) coordinates with the bezel ring, so that the deposition ring
(50) and the bezel ring, position it is concentric.
3. deposition ring according to claim 2, in addition to
Be formed at the depression (57) of the radial outside positioned at raised (56) of the upper surface (52), the depression (57) with
The projection (56) forms labyrinth structure between the deposition ring (50) and the bezel ring,.
4. deposition ring according to claim 1, wherein
The Access Division (58) is the ┏ shapes passage (58A) being formed in the ring body (51), and the ┏ shapes passage is walked
To the radial outside that the ring body (51) are gone to along on the downside of the ring body (51).
5. deposition ring according to claim 4, wherein
The angle of the ┏ shapes passage (58A) is 70 ° to 85 °.
6. deposition ring according to claim 1, wherein
The Access Division is that the ┛ shapes being formed on the downside of the ring body (51) link up with (58B), the trend of the ┛ shapes hook
The radially inner side of the ring body (51) is gone to along on the downside of the ring body (51).
7. deposition ring according to claim 6, wherein
The angle of the ┛ shapes hook (58B) is 70 ° to 85 °.
8. deposition ring according to claim 1, wherein
The Access Division is to be formed at the serration (58C) vertically arranged on the downside of the ring body (51), described
The upper surface of the sawtooth of serration is parallel to horizontal plane or is downwardly concaved.
9. a kind of chuck assembly, including bezel ring, (60), pedestal (70), and coordinate with the bezel ring, (60) and the pedestal (70)
The deposition ring (50) used, the deposition ring (50) include the ring body (51) with upper surface (52) and lower surface (53)；
And it is formed at the annular groove (55) of the upper surface (52)；
Characterized in that, the deposition ring (50) also includes being used to snapping fit onto the deposition ring into the clamping on the pedestal (70)
Portion (58)；The pedestal also includes fastener (80), and the fastener (80) includes the following side being connected with the pedestal (70)
(801), with the upper lateral part (803) of the Access Division (58) phase clamping and being connected the following side (801) and the upper lateral part
(803) pars intermedia (802).
10. chuck assembly according to claim 9, wherein
The deposition ring (50) also includes the projection (56) for being formed at the upper surface (52), and the projection (56) is with being formed at institute
The depression for stating bezel ring, lower surface coordinates, so that the position of the deposition ring (50) and the bezel ring, (60) is concentric.
11. chuck assembly according to claim 10, wherein
The deposition ring (50) also includes the recessed of the radial outside positioned at raised (56) for being formed at the upper surface (52)
Fall into (57), the depression (57) is with forming male cooperation in the bezel ring, lower surface, with the deposition ring (50) and described
Bezel ring, forms labyrinth structure between (60).
12. chuck assembly according to claim 11, wherein
The Access Division (58) is the ┏ shapes passage (58A) being formed in the ring body (51), and the ┏ shapes passage is walked
To the radial outside that the ring body (51) are gone to along on the downside of the ring body (51)；
Vertically, the upper lateral part (803) of the fastener (80) can enter the pars intermedia (802) of the fastener (80)
The ┏ shapes passage (58A).
13. chuck assembly according to claim 12, wherein
The angle of the ┏ shapes passage (58A) is 70 ° to 85 °.
14. chuck assembly according to claim 11, wherein
The Access Division is that the ┛ shapes being formed on the downside of the ring body (51) link up with (58B), the trend of the ┛ shapes hook
The radially inner side of the ring body (51) is gone to along on the downside of the ring body (51)；
The upper lateral part of the fastener (80) has the opening for accommodating the ┛ shapes hook.
15. chuck assembly according to claim 14, wherein
The angle of the ┛ shapes hook (58B) is 70 ° to 85 °.
16. chuck assembly according to claim 11, wherein
The Access Division is to be formed at the serration (58C) vertically arranged on the downside of the ring body (51), described
The upper surface of the sawtooth of serration is parallel to horizontal plane or is downwardly concaved；The upper lateral part of the fastener (80) has sawtooth
Row, the serration of fastener (80) can engage with the serration of the Access Division.
17. according to any described chuck assembly in claim 9-16, wherein
The following side (801) of the fastener (80) is arc-like sheet, and the circumferential both sides of the arc-like sheet have mounting hole (8011),
By the mounting hole (8011), the fastener (80) is releasably attached on the pedestal (70).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720664540.9U CN207176067U (en) | 2017-06-08 | 2017-06-08 | Deposition ring and chuck assembly |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720664540.9U CN207176067U (en) | 2017-06-08 | 2017-06-08 | Deposition ring and chuck assembly |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN207176067U true CN207176067U (en) | 2018-04-03 |
Family
ID=61734673
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201720664540.9U Active CN207176067U (en) | 2017-06-08 | 2017-06-08 | Deposition ring and chuck assembly |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN207176067U (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109023287A (en) * | 2017-06-08 | 2018-12-18 | 北京北方华创微电子装备有限公司 | Deposition ring and chuck assembly |
| CN109402593A (en) * | 2018-11-02 | 2019-03-01 | 上海华力微电子有限公司 | A kind of method and deposition ring preventing deposition ring arc discharge |
| WO2020131551A1 (en) * | 2018-12-17 | 2020-06-25 | Applied Materials, Inc. | Process kit having tall deposition ring for pvd chamber |
| USD888903S1 (en) | 2018-12-17 | 2020-06-30 | Applied Materials, Inc. | Deposition ring for physical vapor deposition chamber |
| WO2023246561A1 (en) * | 2022-06-24 | 2023-12-28 | 北京北方华创微电子装备有限公司 | Semiconductor process apparatus and bearing device therefor |
-
2017
- 2017-06-08 CN CN201720664540.9U patent/CN207176067U/en active Active
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109023287A (en) * | 2017-06-08 | 2018-12-18 | 北京北方华创微电子装备有限公司 | Deposition ring and chuck assembly |
| CN109023287B (en) * | 2017-06-08 | 2024-05-17 | 北京北方华创微电子装备有限公司 | Deposition ring and chuck assembly |
| CN109402593A (en) * | 2018-11-02 | 2019-03-01 | 上海华力微电子有限公司 | A kind of method and deposition ring preventing deposition ring arc discharge |
| WO2020131551A1 (en) * | 2018-12-17 | 2020-06-25 | Applied Materials, Inc. | Process kit having tall deposition ring for pvd chamber |
| USD888903S1 (en) | 2018-12-17 | 2020-06-30 | Applied Materials, Inc. | Deposition ring for physical vapor deposition chamber |
| US11961723B2 (en) | 2018-12-17 | 2024-04-16 | Applied Materials, Inc. | Process kit having tall deposition ring for PVD chamber |
| USD1040304S1 (en) | 2018-12-17 | 2024-08-27 | Applied Materials, Inc. | Deposition ring for physical vapor deposition chamber |
| WO2023246561A1 (en) * | 2022-06-24 | 2023-12-28 | 北京北方华创微电子装备有限公司 | Semiconductor process apparatus and bearing device therefor |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN207176067U (en) | Deposition ring and chuck assembly | |
| US7618520B2 (en) | Physical vapor deposition target constructions | |
| CN101405431B (en) | Notched deposition ring | |
| US20180151401A1 (en) | Substrate support assembly having a plasma resistant protective layer | |
| US20150190835A1 (en) | Extended life deposition ring | |
| US20180204747A1 (en) | Substrate support assembly having surface features to improve thermal performance | |
| TW201906064A (en) | Carrying device and physical vapor deposition device | |
| CN109891570A (en) | Electrostatic chuck and its manufacturing method | |
| CN115074690B (en) | Semiconductor process equipment and bearing device thereof | |
| CN109023287A (en) | Deposition ring and chuck assembly | |
| TWM610049U (en) | Thin film deposition equipment capable of inhibiting dust and shielding component thereof | |
| CN109837518B (en) | Deposition ring fixing assembly, bearing device and reaction chamber | |
| CN109256357A (en) | High temperature electrostatic chuck | |
| CN201193242Y (en) | Wafer positioning device | |
| CN106702342A (en) | Clamp ring for target material sputtering process | |
| JP2001181845A5 (en) | Film forming apparatus and method of processing target object | |
| CN107916401B (en) | Evaporation crucible and evaporation device | |
| CN115821214B (en) | Tool fixture and fixture component for film forming | |
| CN221759970U (en) | Bearing support and vacuum coating machine | |
| KR20090002920A (en) | Clamp ring for wafer deposition apparatus | |
| CN219280007U (en) | Deposition cavity | |
| KR101609060B1 (en) | Vacuum pad and vacuum cup using the pad | |
| TW201428125A (en) | Reaction chamber structure of semiconductor sputtering equipment | |
| US20220270913A1 (en) | Wafer-holding device and thin-film-deposition equipment using the same | |
| JP2001295024A (en) | Member for thin film deposition system, and its manufacturing method |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant |