TWI663586B - Display device substrate, manufacturing method of display device substrate, and display device using the same - Google Patents

Abstract

A display device substrate according to an embodiment includes: a transparent substrate; and a black wiring, which is arranged on a transparent substrate and is disposed between a plurality of pixels, and includes a first conductive metal oxide layer and a first conductive metal oxide layer. An upper metal layer, a second conductive metal oxide layer disposed on the metal layer, and a black layer disposed on the second conductive metal oxide layer. The black wiring system extends in the first direction, and a plurality of black wirings are arranged at predetermined intervals in a second direction that is substantially orthogonal to the first direction. The black wiring includes routing wiring, and the routing wiring system extends to include a plurality of pixels. The display region is provided outside the display region, and a terminal portion having a second conductive metal oxide layer exposed is provided at an end portion. The metal layer is formed of copper or a copper alloy. The black layer uses carbon as the main color material. The first and second conductive metal oxide layers are formed of a mixed oxide of indium oxide, zinc oxide, and tin oxide. The first conductive metal oxide layer, the metal layer, the second conductive metal oxide layer, and the black layer have equal line widths.

Description

Display device substrate, manufacturing method of display device substrate, and display device using the same

The present invention relates to a display device substrate, a method for manufacturing the display device substrate, and a display device using the same.

In a portable device such as a smart phone or a tablet computer, a touch panel is generally attached to a display surface side of a display device. The touch panel uses an input means such as contact with a pointer such as a finger. The mainstream detection method of the touch panel pointer is to perform the change in the electrostatic capacitance of the contact portion.

However, from the viewpoint of increasing the thickness and weight, the touch panel is an unnecessary member of the display device. Recently, although a touch panel is mounted on a portable device such as a smart phone or a tablet computer, it is still difficult to prevent the thickness of the device from increasing. In addition, when the resolution of the display device is increased to provide high-quality pixels, it is difficult to perform input on the touch panel.

For example, when the resolution of the display device is set to 300 ppi (pixel per inch) and further to 500 ppi or higher image quality pixels, the pixel pitch is about 8 μm or more and 30 μm or less, which requires fine input (such as pen input). Therefore, it is desired to realize a touch panel that can respond to the pressure required by the input pen or the resolution of the pen front end, can respond to rapid input, and can sufficiently respond to high image quality. For example, 300ppi, further The line width of the black matrix of a touch panel with high-resolution pixels of 500 ppi or higher is preferably a thin line of about 1 μm to 6 μm.

On the other hand, in recent years, a touch sensing technology called “in-cell” that makes a liquid crystal cell or a display device have a touch sensing function without using a touch panel is being developed.

As described above, it is attempted to provide a touch electrode group on any one or both of a display device substrate provided with a color filter and an array substrate having an active element such as a thin film transistor (TFT), and use the The change in the electrostatic capacitance between the groups is used to embed touch sensing. However, in an organic thin film base touch panel, the substrate has a large expansion and contraction (for example, a thermal expansion coefficient), and includes fine pixels of about 8 μm to 30 μm in a pattern including red pixels, green pixels, blue pixels, or black matrix It is difficult to perform alignment, and it is difficult to adopt it as a display device substrate.

Patent Document 1 discloses a configuration in which a transparent conductive film and a light-shielding metal film are laminated on a plastic film. However, it is difficult to use this structure as an "embedded type". Since it is a base material of a thin film, it cannot be used as a high-quality color filter. Patent Document 1 does not suggest an in-line technology and integration with a color filter. For example, Patent Document 1 exemplifies aluminum as a light-shielding metal film layer. In the manufacturing steps of red pixels, green pixels, blue pixels, or black matrices, although a photo lithography method using an alkaline developer is used, the metal wiring of aluminum is corroded by the alkaline developer and is difficult to form. Color filters.

In addition, Patent Document 1 does not disclose what is included in the array substrate in which the light reflection on the surface of the light-shielding metal film is incident on the array substrate of the display device. A technology that uses the channel layer of a transistor and the possibility of erroneous operation of the transistor.

Patent Document 2 discloses a laminated structure of a light absorbing layer and a conductive layer having a low total reflectance, and a touch panel including the laminated structure. However, Patent Document 2 does not suggest the integration of the in-cell technology and the color filter. For example, Patent Literature 2 exemplifies aluminum as a material of a conductive pattern (or a conductive layer). In the manufacturing steps of red pixels, green pixels, blue pixels, or black matrices, although the light lithography method using an alkaline developer is used, the metal wiring of aluminum is easily corroded by the alkaline developer and it is difficult to form a color filter. .

In addition, Patent Document 2 discloses that the metal of the conductive layer is copper (Cu). However, for example, when the base material is a glass substrate such as alkali-free glass, copper, copper oxide, and copper oxynitride do not have sufficient adhesion to the substrate, and a cellophane tape or the like is adhered and peeled off. A degree of adhesion is simply peeled off, so it is not practical. Patent Literature 2 does not disclose a specific technique for improving the adhesion when the conductive layer is made of copper. In addition, copper easily forms copper oxides on the surface with time, and has low reliability in electrical installation. Patent Document 2 does not disclose a technique that takes into consideration an improvement method of mounting contact resistance and a pattern forming method for touch sensing wiring.

Patent Document 3 discloses a transparent conductive film containing an oxide of indium (In), tin (Sn), and zinc (Zn). However, Patent Document 3 does not disclose a touch sensing wiring structure for stable and highly reliable electrical connection, for example, a first conductive metal oxide layer, a metal composed of a copper layer or a copper alloy layer Layer, and a second conductive metal oxide layer, and The black layers made of carbon as the main color material are sequentially laminated with black wires of equal line width on a transparent substrate, forming a technology for touch sensing wiring. That is, the technology disclosed in Patent Document 3 does not consider the stability of electrical installation required for the touch sensing wiring and the visibility as a display device.

Patent Document 4 discloses a method of suppressing a decrease in image quality when performing sequential scanning of liquid crystal driven lines. Patent Document 4 uses a polycrystalline silicon semiconductor as an active element (TFT: Thin Film Transistor) for driving a liquid crystal. This technology uses a transfer circuit including a latch to maintain the potential to prevent the potential of the scanning signal line inherent to a polycrystalline silicon TFT with many off-leak currents from decreasing, and prevents liquid crystals. Display quality degradation technology.

Prior art literature Patent literature

Patent Document 1 Japanese Patent Application Publication No. 2011-65393

Patent Document 2 Japanese National Publication No. 2013-540331

Patent Document 3 JP 2012-26039

Patent Document 4 Japanese Patent Application Publication No. 2014-182203

The present invention was developed in view of the above-mentioned problems, and a first object of the present invention is to provide a display device substrate including touch sensing wiring in a state of high adhesion to a substrate belonging to an alkali-free glass and having good visibility .

A second object of the present invention is to provide a display device capable of responding to high-speed touch input with high resolution, a display device substrate used therefor, and a display device substrate provided with a color filter.

A third object of the present invention is to provide a display device substrate capable of stable electrical mounting.

To achieve the above object, a first aspect of the present invention includes the following constituent elements. That is, a display device substrate is provided which includes: a transparent substrate, which is an alkali-free glass; and black wiring, which is arranged on the transparent substrate and is disposed between a plurality of pixels, and includes a first conductive metal oxide. An object layer, a metal layer disposed on the first conductive metal oxide layer, a second conductive metal oxide layer disposed on the metal layer, and a black color disposed on the second conductive metal oxide layer The black wiring system extends in the first direction, and a plurality of the black wirings are arranged at predetermined intervals in a second direction that is substantially orthogonal to the first direction; the black wiring includes a routing wiring, and the routing system Extending to the outside of the display area including the plurality of pixels, the terminal portion is provided with an exposed end portion of the second conductive metal oxide layer; the metal layer is formed of copper or a copper alloy; and the black layer is formed of carbon. As the main color material; the first and second conductive metal oxide layers are formed of a mixed oxide of indium oxide and zinc oxide and tin oxide; The first conductive metal oxide layer, the metal layer, the second conductive metal oxide layer, and the black layer have equal line widths.

The second aspect of the present invention is characterized by the following aspects. That is, a method for manufacturing a display device substrate is provided. The display device substrate is provided with black wiring. The black wiring is a display area having a plurality of pixels on a transparent substrate belonging to an alkali-free glass. The plurality of pixels are distinguished from each other and extended. A terminal portion beyond the display area has a terminal portion. The method for manufacturing a display device substrate includes a film forming step of forming a first conductive metal oxide layer, a copper layer, or copper on a transparent substrate that is an alkali-free glass. A metal layer composed of an alloy layer and a second conductive metal oxide layer; the coating step includes applying a black photosensitive liquid containing at least carbon and an alkali-soluble acrylic resin to the second conductive metal oxide layer, and The black film is dried to form a black film. The patterning step of the black film is performed through a half-tone mask provided with the first pattern of the black wiring and the second pattern of the terminal portion having a light transmittance different from the first pattern. In addition, the black film on the transparent substrate is selectively removed using an alkaline developing solution, and a thick black film remains as the black wiring. Pattern to form a thin black film as the pattern of the terminal portion; the wet etching step is to use a wet etching method to remove the metal not formed by the first conductive metal oxide layer, the copper layer, or the copper alloy layer And the portions covered by the three black films of the aforementioned second conductive metal oxide layer are removed; and In the dry etching step, a part of the surface of the thick black film is removed in the film thickness direction by a dry etching method as a pattern of the black wiring, and the thin black film is removed as a pattern of the terminal portion so that the foregoing The surface of the second conductive oxide layer of the terminal portion is exposed; black wiring is formed on the transparent substrate, and the black wiring is a first conductive metal oxide layer, a metal layer composed of a copper layer or a copper alloy layer, and the first 2 The conductive metal oxide layer and the black layer with carbon as the main color material are sequentially laminated with equal line widths, respectively.

A third aspect of the present invention is characterized by the following aspects. That is, a display device is provided, comprising: a display device substrate; an array substrate fixed opposite to the display device substrate; and a liquid crystal layer disposed between the display device substrate and the array substrate; The array substrate is, in a plan view, provided with: an active element disposed at a position adjacent to a plurality of pixels and at a position overlapping the black wiring; a metal wiring electrically connected to the active element; and a black wiring Touch display metal wiring extending in a cross direction, wherein the display device substrate includes: a transparent substrate, the transparent substrate is an alkali-free glass; and black wiring, which is arranged on the transparent substrate and is arranged between a plurality of pixels, and includes a first 1 a conductive metal oxide layer, a metal layer disposed on the first conductive metal oxide layer, a second conductive metal oxide layer disposed on the metal layer, and a second conductive metal oxide Black layer on the physical layer; The black wiring system extends in a first direction, and a plurality of the black wiring systems are arranged at predetermined intervals in a second direction that is substantially orthogonal to the first direction. The black wiring system includes a routing wiring that extends to The outside of the display area including the plurality of pixels, and a terminal portion exposing the second conductive metal oxide layer is provided at an end portion; the metal layer is formed of copper or a copper alloy; and the black layer is mainly composed of carbon. Color material; the first and second conductive metal oxide layers are formed of a mixed oxide of indium oxide and zinc oxide and tin oxide; the first conductive metal oxide layer, the metal layer, and the second conductive material The linear metal oxide layer and the black layer have a uniform line width.

A fourth aspect of the present invention is characterized by the following aspects. That is, a display device is provided, in which a display device substrate and an array substrate are bonded to face each other across a liquid crystal layer; the display device is such that the display device substrate is on the transparent resin layer on a plane The view further includes a plurality of transparent conductive film wirings crossing the black wirings; the array substrate has an active element in a plan view at adjacent positions of the plurality of pixels and at positions overlapping with the black wirings, wherein the display device substrate It includes: a transparent substrate, which is an alkali-free glass; and black wiring, which is arranged on the transparent substrate and is arranged between a plurality of pixels, and includes a first conductive metal oxide layer and is arranged on the first 1 a metal layer on the conductive metal oxide layer, a second conductive metal oxide layer disposed on the metal layer, and a black layer disposed on the second conductive metal oxide layer; the black wiring system extends In the first direction, a plurality of the black wirings are arranged at a predetermined interval in a second direction that is substantially orthogonal to the first direction. The black wirings include routing wiring, and the routing wiring is extended to include the plurality of The pixel is provided outside the display area of the pixel, and a terminal portion is provided at the end portion thereof to expose the second conductive metal oxide layer; the metal layer is formed of copper or a copper alloy; and the black layer is made of carbon as a main color material; The first and second conductive metal oxide layers are formed of a mixed oxide of indium oxide, zinc oxide, and tin oxide; the first conductive metal oxide layer, the metal layer, and the second conductive metal oxide The layer and the black layer are of equal line width.

According to the present invention, it is possible to provide a display device substrate including a touch-sensing wiring in a state of high adhesion to a substrate belonging to an alkali-free glass and having good visibility.

Furthermore, according to the present invention, it is possible to provide a display device with high resolution and capable of responding to high-speed touch input, a display device substrate used therefor, and a display device substrate provided with a color filter.

Furthermore, according to the present invention, a display device substrate capable of stable electrical mounting can be provided.

1‧‧‧ the first conductive metal oxide layer

2‧‧‧ metal layer

3‧‧‧ 2nd conductive metal oxide layer

4‧‧‧ black layer

4a‧‧‧Black wiring pattern

4b‧‧‧Terminal part pattern

5‧‧‧Terminal

6‧‧‧ Black Wiring

6a‧‧‧Leading wiring (first wiring)

6b‧‧‧Virtual wiring (second wiring)

7‧‧‧ transparent conductive film wiring

8‧‧‧ black oxide layer

9‧‧‧ transparent resin layer

15, 25‧‧‧ transparent substrate

18‧‧‧ black layer

19‧‧‧ Rectangle display area

21 ~ 23‧‧‧ Insulation

25, 35, 45‧‧‧ array substrates

30‧‧‧LCD layer

32‧‧‧Common electrode

36‧‧‧pixel electrode

37, 42‧‧‧touch metal wiring

40‧‧‧source line

41‧‧‧Gate line

43‧‧‧Shading pattern

SE‧‧‧Source electrode

DE‧‧‧Drain electrode

GE‧‧‧Gate electrode

49‧‧‧channel floor

46‧‧‧Transistor (active element)

47‧‧‧ contact hole

100, 200‧‧‧ display device substrate

C1 ~ C5‧‧‧ electrostatic capacitor

FIG. 1 is a partial cross-sectional view of a display device substrate according to an embodiment of the present invention.

FIG. 2 is a partial cross-sectional view illustrating another example of a display device substrate according to this embodiment.

FIG. 3 is a schematic plan view of a display device substrate according to an embodiment of the present invention, showing an example of pixels such as red pixels, green pixels, and blue pixels, and black wiring that distinguishes these pixels and is arranged in the long-side direction.

4 is a schematic plan view illustrating an example of a terminal portion of a black wiring in a display device substrate according to an embodiment.

5 is a partial cross-sectional view of a terminal portion of a black wiring in a display device substrate according to an embodiment.

FIG. 6 is a partial cross-sectional view of a display device according to an embodiment of the present invention.

FIG. 7 is a plan view of the array substrate shown in FIG. 6, showing a position of a touch metal wiring and a light shielding pattern.

Fig. 8 is a diagram showing an example of a cross section taken along a line C-C 'of the array substrate shown in Fig. 7.

FIG. 9 is a cross-sectional view illustrating the electrostatic capacitance between the touch metal wirings held on the array substrate shown in FIG. 7 and the black wirings on the display device substrate.

FIG. 10 is a diagram showing an example of a configuration in which a color filter layer and a transparent resin layer are laminated on a black wiring in a display device substrate according to an embodiment of the present invention.

11 is a partial cross-sectional view of a display device including the display device substrate shown in FIG. 10.

FIG. 12 is a partial cross-sectional view of a display device substrate according to an embodiment of the present invention.

FIG. 13 is a partial cross-sectional view of a display device including the display device substrate 100 shown in FIG. 12.

FIG. 14 is a plan view of the display device substrate shown in FIG. 13 as viewed from the viewer's direction V. FIG.

15 is a partial cross-sectional view showing each manufacturing step of a display device substrate according to an embodiment of the present invention.

16 is a partial cross-sectional view of a display device substrate according to an embodiment of the present invention.

FIG. 17 is a partial cross-sectional view of a display device substrate according to an embodiment of the present invention.

18 is a partial cross-sectional view showing each manufacturing step of a display device substrate according to an embodiment of the present invention.

FIG. 19 is a diagram for explaining another example of a display device substrate according to an embodiment of the present invention.

20 is a partial cross-sectional view of a display device including an embodiment of the display device substrate shown in FIG. 19.

21 is a diagram for explaining another example of a display device substrate according to an embodiment of the present invention.

22 is a partial cross-sectional view of a display device including an embodiment of the display device substrate shown in FIG. 21.

[Form for Implementing Invention]

Hereinafter, embodiments of the present invention will be described with reference to the drawings.

In each embodiment described below, the features are described. For example, the description of the parts that are not different from the constituent elements of a normal display device is omitted. In addition, although the embodiments are described using the display device substrate of the present invention or a liquid crystal display device provided with the display device as an example, the display device substrate of the present invention can also be applied to an organic EL (Electro-Luminescence) display device And other display devices.

Hereinafter, a display device substrate 100 according to an embodiment of the present invention will be described with reference to the drawings. In addition, in all the drawings below, the ratio of the thickness or the size of each component is appropriately adjusted with priority given to ease of understanding.

FIG. 1 is a partial cross-sectional view of a display device substrate according to an embodiment of the present invention.

The display device substrate of this embodiment includes a transparent substrate 15 and a black wiring 6. The black wiring 6 includes a first conductive metal oxide layer 1, a metal layer 2, a second conductive metal oxide layer 3, and a black layer 4.

As shown in FIG. 1, a black wiring 6 including a first conductive metal oxide layer 1, a metal layer 2, a second conductive metal oxide layer 3, and a black layer 4 is provided on a transparent substrate 15. The black wiring 6 is arranged in a stripe pattern perpendicular to the paper surface, for example. There are multiple. The first conductive oxide layer 1, the metal layer 2, the second conductive metal oxide layer 3, and the black layer 4 are patterned using a well-known photolithography method. A method of forming the black wiring 6 will be described in detail later. The conductive metal oxide may be described as a mixed oxide or a composite oxide.

FIG. 2 is a partial cross-sectional view illustrating another example of a display device substrate according to this embodiment, and is a partial cross-sectional view of a display device substrate in which the transparent resin layer 9 is further laminated on the display device substrate shown in FIG. 1.

The display device substrate 100 shown in FIG. 2 has a transparent resin layer 9 laminated on the black wiring 6. The transparent resin layer 9 can be formed of an acrylic resin or the like having thermosetting properties. The film thickness of the transparent resin layer 9 can be arbitrarily set. The black layer 4 and the transparent resin layer 9 may be constituted by a plurality of layers having different optical characteristics such as a refractive index. Here, the position of the film surface on which the black wiring 6 is formed is set upside down from FIG. 1 due to the relationship of the description of a display device described later (for example, shown in FIGS. 6 and 16).

The base material of the transparent substrate 15 is an alkali-free glass having a small thermal expansion coefficient. As with the transparent substrate 25 used in the array substrate described later, a substrate made of a glass material is desirably used. For example, it is suitable for forming an active element such as a thin film transistor (TFT) and is used for a glass substrate of an organic EL display device or a liquid crystal display device. The alkali-free glass used as the base material of the transparent substrates 15 and 25 in this embodiment is a substrate material for a display device, and is typified by aluminosilicate glass that does not substantially contain an alkali component. Alkali-free glass refers to an alkali metal such as sodium (Na), potassium (K) or Those oxides having a content of 1,000 ppm or less in terms of an alkali element are defined as being substantially free of an alkali component. The lower the content of the alkali element, the better. In the following description, a substrate on which a liquid crystal driving transistor is formed is referred to as an array substrate. The transistor is sometimes called a thin film transistor or an active device.

The black wiring 6 is preferably the line width of the first conductive metal oxide layer 1 and the line width of the metal layer 2, the line width of the second conductive metal oxide layer 3, and the black layer 4 mainly composed of carbon. The line widths are approximately equal line widths, respectively.

The thickness of the black wiring 6 made of the first conductive metal oxide layer (adhesive layer) containing indium 1, the metal layer 2 made of a copper layer or a copper alloy layer, and the black layer 4 can be set to a total of 1 μm. the following. When the thickness of the black wiring 6 exceeds 2 μm, the unevenness of the black wiring 6 adversely affects the liquid crystal alignment, so it is desirable to set it to 1.5 μm or less.

The technology of this embodiment is directed to a display device with high-quality pixels of, for example, 300 ppi (pixel per inch) and further 500 ppi or more. When the display device substrate of this embodiment is used for a high-resolution pixel display device, the line width of the black matrix corresponding to the black wiring 6 must be patterned with thin lines in a range of 1 μm to 6 μm. For example, in a display device substrate, if there is a deviation of ± 1 μm or more of the 4 μm line width of the black wiring, the display quality surface will be uneven, and the pixel aperture ratio will be reduced, so it cannot be used as a substrate for a display device .

In addition, it is not practical to align the first conductive metal oxide layer 1, the metal layer 2, the second conductive metal oxide layer 3, and the black layer 4 that constitute the black wiring 6 in the respective manufacturing steps. condition. When the layers are aligned with each other in the manufacturing process, a deviation of about ± 1.5 μm or more may occur. Therefore, from the viewpoint of fine line formation, it is quite difficult to perform alignment so as not to affect the aperture ratio of the pixels of the display device and form the same pattern in a plurality of layers (a plurality of steps).

The so-called "equal line width" in this embodiment means that the center position of the line width of each layer forming the black wiring 6 (the center position in a direction substantially orthogonal to the direction in which the wiring extends) and the deviation of the line width fall within ± 0.4 μm. In addition, "equal line width" means a cross section of the black layer 4, the second conductive oxide layer 3, the metal layer 2, the first conductive oxide layer 1, and the black layer 18 as shown in Figs. 1 and 17. The shapes are approximately aligned in the vertical direction 2 (or thickness direction). For example, in a 500ppi high-quality pixel, the pixel pitch of the three colors of red (R), green (G), and blue (B) is about 17 μm, and in a black matrix (light shielding layer) with a line width of 4 μm, for example, consider When the respective registration tolerances are acceptable, the line width is about 10 μm. In this case, the pixel aperture ratio is about 35%, and it cannot be used as a display device. For example, when the line width of the black matrix is 4 ± 0.4 μm, the pixel aperture ratio becomes approximately 60%.

In FIGS. 1 and 2, the black wirings 6 are arranged in a stripe shape in a direction Y perpendicular to the paper surface. However, when forming a black matrix, the black wirings 6 may be formed in various patterns without forming a moire shape with the black matrix.

A plurality of pixel openings are formed in the rectangular display area 19 of the display device substrate (as shown in FIG. 3). The pixel openings may be strip-shaped, but they may be formed as polygons with at least two sides parallel. With 2 sides parallel As for the angle, it can be made into, for example, a rectangle, a hexagon, a doglegged shape, or the like. The pattern of the black wirings 6 may be electrically closed as a frame shape surrounding at least a part of the periphery of the polygonal pixels. These pattern shapes are electrically closed patterns or patterns that are partially open (parts that are not connected in appearance) in a plan view, whereby the manner of receiving electrical noise around the display device is changed. Or, the pattern shape or area of the black wiring 6 may change the way of receiving electrical noise around the display device.

In addition, in the rectangular display area 19, the openings of the pixels are distinguished by the black wiring 6 and the metal wiring or touch metal wiring on the array substrate side, and a polygonal pixel shape can be obtained in a plan view. Alternatively, as shown in the following embodiments, a black matrix (BM) may be separately provided. In this embodiment, the pixel opening is a polygon with at least two sides parallel to each other, and the black wiring 6 extends into a substantially linear shape that distinguishes the pixels in the longitudinal direction of the two sides. By forming in this manner, the electrical noise received by the black wiring 6 can be suppressed.

Hereinafter, a configuration example of each of the layers 1 to 4 of the black wiring 6 and the transparent resin layer 9 will be described.

(Black layer)

The black layer 4 is made of, for example, a coloring resin in which a black color material is dispersed. When it is a copper oxide or a copper alloy oxide, sufficient black or low reflectance cannot be obtained, but the reflectance of visible light on the surface of the black wiring 6 in this embodiment can be suppressed to 7% or less, and With the structure of the metal layer 2 described later, high light-shielding properties can be obtained at the same time.

The black wiring 6 is made of a structure covered with a transparent resin layer 9 having a refractive index of about 1.5, whereby the reflectance at the interface with the transparent resin can be set to a low reflection of 3% or less in the wavelength range of visible light. For example, the reflectance at the interface with the transparent resin is set to include low reflectance in the range of light wavelengths of 430 nm, 540 nm, and 620 nm, and a visible range of 400 nm to 700 nm and 0.1% to 3%.

The black color material is suitable for carbon, nano carbon tube or a mixture of a plurality of organic pigments. Carbon is used as a main color material whose amount is, for example, 51% by mass or more with respect to the entire color material. To adjust the reflection color, an organic pigment such as blue or red can be added and used. For example, the reproducibility of the black layer 4 can be improved by adjusting the carbon concentration (reducing the carbon concentration) in the photosensitive black coating liquid as a starting material.

Even if a large exposure device for a display device is used, the line width of the black wiring 6 can be patterned with, for example, thin lines of 1 μm to 6 μm. In addition, in the present embodiment, the carbon concentration is set to a range of 4 to 50% by mass with respect to the entire solid content including the resin, the hardener, and the pigment. Here, the carbon concentration may be set to a carbon amount exceeding 50% by mass, but when the carbon concentration exceeds 50% by mass with respect to the total solid content, the coating film adaptability tends to decrease. In addition, when the carbon concentration is 4% by mass or less, sufficient black cannot be obtained, and the reflection of the underlying metal layer 2 may be large, which may reduce visibility. In the following embodiments, when the carbon concentration of the black layer 4 is not indicated, the carbon concentration is about 40% by mass based on the total solid content.

The black layer 4 can be prioritized by the exposure or pattern alignment in the light lithography in the subsequent steps. For example, the The optical density in the transmission measurement is set to 2 or less. The black layer 4 may be formed using carbon, or a mixture of a plurality of organic pigments may be used as a black color adjustment. The reflectance of the black layer 4 is determined by considering the refractive index (approximately 1.5) of the substrate such as glass or transparent resin. It is desirable to adjust the content or type of the black color material, the resin used, and the film thickness so that the black layer 4 and others The reflectance at the interface of the substrate is 3% or less. Under these conditions, the reflectance at the interface with a substrate such as glass having a refractive index of about 1.5 is set to a low reflectance of 3% or less in the wavelength region of visible light. The reflectance of the black layer 4 is preferably set at 3% or less in consideration of preventing light from being reflected from the backlight unit or improving the visibility of the observer. In addition, the refractive index of acrylic resins and liquid crystal materials used for color filters generally falls within the range of 1.5 to 1.7. For example, the cover glass (protective glass) of the display device and the adhesive layer having a refractive index in the range of about 1.5 to 1.7 of the display device may be used as the resin.

(Metal layer)

The metal forming the metal layer 2 is copper or a copper alloy. When a copper thin film or a copper alloy thin film is used, when the film thickness of the metal layer 2 is 100 nm or more or 150 nm or more, the metal layer 2 hardly transmits visible light. Therefore, in the display device substrate of this embodiment, as long as the film thickness of the metal layer 2 is about 100 nm to 300 nm, the black wiring 6 cannot obtain sufficient light shielding properties.

Metal layer 2 is suitable for metal layers such as copper and copper alloys having alkali resistance. When alkali resistance is required, it is the case of the developing process using an alkaline developing solution in a subsequent process, for example. Specifically, it is In the case where the black wiring 6 is formed, a color filter, a black matrix, and the like are formed. When forming the terminal portion of the black wiring 6 described later, alkali resistance is also required.

In addition, chromium has alkali resistance, and can be suitably used as the metal layer 2 of the black wiring 6. However, the resistance value of chromium is large, and the chromium ions generated in the manufacturing steps are harmful, so it is difficult to apply it to actual production. From the viewpoint of a low resistance value, it is preferable to use copper or a copper alloy as the metal layer 2. Since copper and a copper alloy have good electrical conductivity, they are preferable as the metal layer 2.

The metal layer 2 may contain an alloy element of 3 at% or less in the form of a copper alloy. The alloy element may be one or more elements selected from magnesium, calcium, titanium, molybdenum, indium, tin, zinc, aluminum, beryllium, and nickel. By alloying copper, copper diffusion can be suppressed, and heat resistance can be improved in the form of a copper alloy. If an alloying element of more than 3 at% is added to the metal layer 2, the resistance value of the black wiring 6 will increase. When the resistance value of the black wiring 6 becomes high, there is a possibility that the waveform of the driving voltage for touch detection may be dulled or the signal may be delayed, which is not desirable. Copper is liable to cause migration and is not sufficient in terms of reliability. However, by adding the above-mentioned alloying elements of at least 0.1 at% to make a copper alloy, reliability can be improved. The alloying element-containing ratio can be set to 0.1 at% or more and 3 at% or less with respect to copper.

(Conductive metal oxide layer)

The first conductive metal oxide layer 1 is formed of a conductive metal oxide containing indium, for example. The second conductive metal oxide layer 3 is, for example, a mixed oxide (composite oxide) of indium oxide, zinc oxide, and tin oxide.

The first conductive metal oxide layer 1 and the second conductive metal oxide layer 3 mainly include improving the adhesion between the transparent substrate 15 and the black wiring 6, improving the adhesion between the metal layer 2 and the black layer 4, and the metal layer 2 Function to prevent disconnection when abrasion occurs.

The adhesion of copper, copper alloys, or these oxides and nitrides to the black layer 4 belonging to a transparent substrate such as glass or a dispersion of a black color material is generally poor. Therefore, when the conductive metal oxide layer is not provided, there is a possibility that peeling may occur at the interface between the metal layer 2 and the transparent substrate 15 and the interface between the metal layer 2 and the black layer 4. When copper or a copper alloy is used as a metal wiring for touch sensing (when a metal layer is patterned as a thin wiring), the first conductive oxide layer 1 is not formed as a base layer of a display device substrate, except for peeling In addition to the defects caused, there are also cases where defects caused by electrostatic damage occur in metal wiring, which is not practical. This electrostatic damage is because static electricity is stored in the wiring pattern in the subsequent steps such as color filter lamination, or bonding and cleaning steps with the array substrate, and the phenomenon of pattern shortage, disconnection, etc. occurs due to the electrostatic damage.

In addition, copper, copper alloys, or oxides and nitrides thereof are generally unstable in electrical connection and lack reliability. For example, copper oxide or copper sulfide formed on a copper surface approaches an insulator over time, which causes problems in electrical installation. In the terminal portion 5 (shown in FIG. 3) provided at the end portion of the black wiring 6, scratches are likely to occur on the metal layer 2 due to a defect in the electrical installation or processing. Since indium-containing conductive metal oxides also have hard ceramics, even if abrasion occurs in the metal layer, the conductive metal oxide layer is rarely disconnected.

In addition, the second conductive metal oxide layer 3 has a function of improving the electrical contact failure caused by the time-dependent change of the surface of the copper or copper alloy (formation of copper oxide). On the surface of the terminal portion 5, since the second conductive metal oxide layer 3 formed of, for example, a mixed oxide of indium oxide and zinc oxide and tin oxide is exposed, the contact resistance of the terminal portion 5 is low, which is suitable for Electrical installation.

Further, by setting the indium oxide in the mixed oxide forming the second conductive metal oxide layer 3 to an atomic ratio of indium, tin, and zinc to 0.8 or more, the resistance value as a wiring can be reduced. The atomic ratio of indium is more preferably set to 0.9 or more.

Each of the first conductive metal oxide layer 1 and the second conductive metal oxide layer 3 can be used as an oxide to form a film having a light absorption characteristic that is slightly deficient in oxygen.

The amount of zinc oxide and tin oxide in the mixed oxide forming the first conductive metal oxide layer 1 and the second conductive metal oxide layer 3 is preferably such that the atomic ratio of indium is 0.01 or more and less than In the range of 0.08.

If the amount of tin in the mixed oxide is not added in an amount exceeding 0.01, the low resistance of the conductive metal oxide layer cannot be obtained. When the amount of the mixed oxide of tin exceeds 0.08 in an atomic ratio, it becomes difficult to etch into the conductive metal oxide layer, and as a result, pattern formation of the metal layer 2 may be difficult in a manufacturing method described later.

The amount of zinc in the mixed oxide is preferably in a range of an atomic ratio of indium of 0.02 or more and less than 0.2. If the atomic ratio of zinc exceeds 0.2 and the atomic ratio of tin is less than 0.01, it will be difficult to form as "Equivalent line width" pattern for black wiring. When the amount of zinc oxide is increased, in the wet etching step, the layer formed by the mixed oxide is selectively etched, so that the line width of the metal layer becomes relatively large. Conversely, when the amount of tin oxide is increased, the metal layer is selectively etched during the wet etching step, so that the line width of the conductive metal oxide layer is relatively large. When the amount of tin oxide is excessive, etching does not enter the conductive metal oxide layer. The amount of zinc in the mixed oxide is preferably within a range of 0.02 or more and 0.13 or less.

That is, the atomic ratio shown by In / (In + Zn + Sn) of indium (In) and zinc (Zn) and (Sn) contained in the mixed oxide is greater than 0.8, and the atomic ratio of Zn / Sn is greater than 1 This is a condition that can reproduce "equal line width" black wiring.

Next, a display device including a display device substrate of this embodiment will be described with reference to the drawings.

FIG. 3 is a schematic plan view of a display device substrate according to this embodiment, and shows an example of the black wirings 6 which are divided into pixels such as red pixels R, green pixels G, and blue pixels B, and are arranged in the longitudinal direction. Figure.

FIG. 3 is a plan view of the rectangular display area 19 of the display device of FIG. 6 as viewed from the viewer's direction V. In addition, the display device substrate according to this embodiment has a configuration that does not include a color filter layer. The R, G, and B symbols shown in FIG. 3 are used to indicate the position of a pixel, and may be a structure in which a color filter is omitted.

A display device or a liquid crystal display device using the display device substrate of this embodiment is provided with each of image display and touch sensing. A control unit (not shown) for one of the controls. In the following description, the touch sensing system is based on the premise that, for example, an arrangement of a plurality of wirings extending in the first direction and a predetermined or constant interval (insulation) with these wirings are arranged and extended between and The capacitance change at the intersection of the wirings of the array of the plurality of wirings in the second direction orthogonal to the first direction is to determine whether there is an electrostatic capacitance method in which a pointer such as a finger touches. In FIG. 3, the black wiring 6 and the metal wiring 42 (hereinafter referred to as one of the electrodes used for touch sensing when the metal wiring is used to display the rectangular display area 19 and the surrounding area are referred to as a touch metal. The arrangement position of the wiring 42). The area surrounded by the black wiring 6 and the touch metal wiring 42 becomes a pixel opening area. In FIG. 3, for example, the black wiring 6 is a wiring extending in the first direction (Y direction), and the orthogonal touch metal wiring 42 is a wiring in the second direction (X direction). As shown in FIG. 3, in a plan view, the black wiring 6 is arranged in a second direction (X direction) with a plurality of wirings arranged at regular intervals. The touch metal wiring 42 is an arrangement in which a plurality of wirings are arranged in a first direction (Y direction) in a plan view.

The black wirings 6 are arranged so as to extend substantially parallel to each other in the Y direction. The black wiring 6 includes a lead wiring (first wiring) 6a extending from one end of the rectangular display area 19 to the other end, and a dummy wiring (second wiring) 6b extending from one end of the rectangular display area 19 to another side. In this embodiment, two dummy wirings 6b are provided between the lead wirings 6a. The dummy wiring 6b is formed in an electrically floating shape (floating pattern). The thinning number of the lead wires 6a (the number of the virtual wires 6b between the lead wires 6a), or the ratio of the number of the lead wires 6a to the number of the virtual wires 6b, should be matched with the purpose of the display device, etc. Set appropriately.

In addition, the role of the driving electrode to which the driving voltage of the touch sensing is applied may be any of the black wiring 6 and the touch metal wiring 42, and the role may be replaced.

The touch metal wiring 42 is arranged orthogonal to the black wiring 6 in a plan view. The touch metal wiring 42 is provided on an array substrate described later, and extends from one end of the rectangular display region 19 to the outside of the other end.

In addition, when the color filter layer is provided on the display device substrate, the color filter layer is formed in such a manner that pixels of the same color are displayed in the Y direction and pixels of different colors are displayed in the X direction.

In addition, even when a color filter layer is not provided on the display device substrate, the backlight unit can be provided with red, green, and blue LEDs, for example, and each time-division light emission and the synchronization of the liquid crystal layer Driven for color display. When a time-division backlight unit is used, for example, as shown in FIG. 3, a pixel arrangement is displayed in which the same color is displayed in the Y direction, and pixels of different colors are displayed adjacent to each other in the X direction.

4 is a schematic plan view illustrating an example of a terminal portion of a black wiring in a display device substrate according to an embodiment.

Fig. 5 is a partial cross-sectional view of a line A-A 'of a terminal portion of a black wiring in a display device substrate according to an embodiment.

The rectangular display area 19 and a part of its periphery are covered by the transparent resin layer 9. A terminal portion 5 is formed at one end of the black wiring 6 extending beyond the rectangular display area 19.

As shown in FIG. 5, the terminal portion 5 is configured such that the second conductive metal oxide layer 3 is exposed on the surface, and can be electrically contacted or mounted. Appearance. The surface of the second conductive metal oxide layer 3 is different from the surface of copper or a copper alloy, and a new oxide is formed without causing electrical contact failure. The surface of copper or copper alloys tends to form oxides or sulfides over time. The second conductive metal oxide layer formed of a mixed oxide is stable even with the passage of time, and can be subjected to ohmic contact for electrical mounting.

The shape of the terminal portion 5 in a plan view is not limited to FIG. 4. For example, after the terminal portion 5 is covered with the transparent resin layer 9, the upper portion of the terminal portion 5 is removed into a circle or a rectangle by means such as dry etching, so as to make the second conductive metal oxide layer 3 on the surface of the terminal portion 5. Exposed. In this case, in the sealing portion where the substrates of the display device are adhered to each other, the transfer from the display device substrate to the array substrate may be performed in the thickness direction of the sealing portion. This conduction transfer can be performed by disposing a conductor selected from an anisotropic conductive film, a fine metal ball, or a resin ball covered with a metal film in the sealing portion.

FIG. 6 is a partial cross-sectional view of a display device according to an embodiment of the present invention.

FIG. 6 is also a cross-sectional view in the D-D 'direction when the array substrate 35 and the display device substrate 100 of FIG. 7 are adhered to each other through the liquid crystal layer 30 facing each other. In addition, in the DD ′ cross section, the figure of the touch metal wiring 42 is not shown in detail. In FIG. 6, for the configuration in which the touch metal wiring 42 is provided on the back side of the paper, it is shown in dotted lines. position. In FIG. 6, illustrations of gate lines, source lines, and the like related to the active elements of the polarizing plate, the retardation plate, the alignment film, the backlight unit, and the transistor are omitted.

The display device of this embodiment includes a display device substrate 100, an array substrate 35, and a liquid crystal layer 30. The display device according to this embodiment is, for example, a liquid crystal display device in the FFS mode.

The array substrate 35 includes: a transparent substrate 25; insulating layers 21, 22, and 23; a common electrode 32; a pixel electrode 36; and a touch metal wiring 42.

The transparent substrate 25 is preferably made of, for example, an alkali-free glass having a small thermal expansion coefficient.

The base material of the transparent substrate 25 is, for example, an alkali-free glass having a small thermal expansion coefficient, and a glass substrate is preferably used. In this embodiment, an alkali-free glass used as a base material of the transparent substrates 15 and 25 is used as a substrate material for a display device, and an aluminosilicate glass which does not substantially contain an alkali component is representative.

A common electrode 32 is disposed on the transparent substrate 25 via the insulating layers 21 and 22. The common electrode 32 is arranged in a strip shape extending in the Y direction, for example, and is electrically connected to each other. The common electrode 32 is formed of a transparent conductive material such as ITO or IZO.

A pixel electrode 36 and a touch metal wiring 42 are arranged on the common electrode 32 via the insulating layer 23. The pixel electrode 36 is formed of a transparent conductive material such as ITO or IZO.

The liquid crystal of the liquid crystal layer 30 includes liquid crystal molecules aligned substantially horizontally with the substrate surface of the array substrate 35. The driving system of the liquid crystal is driven by a fringe electric field generated between the pixel electrode 36 and the common electrode 32. This liquid crystal driving method is called FFS (fringe field switching) or IPS (in plane switching). Driving voltage for driving the liquid crystal layer 30 An electric field in a direction substantially parallel to the substrate surface of the array substrate 35 is a so-called transverse electric field.

FIG. 7 is a plan view of the array substrate 35 shown in FIG. 6, showing a position of the touch metal wiring 42 and a light shielding pattern. FIG. 7 is a plan view of the array substrate 35 shown in FIG. 6 as viewed from the viewer's direction V. FIG.

The positions of the touch metal wiring 42 and the light shielding pattern 43 are shown in FIG. 7. The array substrate 35 further includes a light shielding pattern 43 disposed on the same layer as the pixel electrode 36 and the touch metal wiring 42, a source line 40, a gate line 41, and a transistor (active element) 46.

A pixel electrode 36 is arranged on each pixel. The pixel electrode 36 includes, for example, a plurality of stripe patterns extending in the Y direction. In other words, the pixel electrode 36 has a slit provided at a position facing the common electrode 32. The plurality of stripe patterns are electrically connected to each other through the light shielding pattern 43.

The source line 40 is arranged so as to extend in the Y direction between the pixel electrodes 36. The source line 40 is electrically connected to a driving circuit (not shown). An image signal is applied to the source line 40. The driving circuit is included in the aforementioned control section (not shown). This control section controls the image signal and gate signal related to image display, and the driving signal and touch detection signal related to touch sensing described later.

The gate lines 41 are arranged so as to extend in the X direction between the pixel electrodes 36. The gate line 41 is electrically connected to a driving circuit (not shown). A gate signal of a transistor described later is applied to the gate line 41.

The touch metal wiring 42 is disposed on the gate line 41 via the insulating layers 21, 22, and 23. Touch metal wiring 42 series and gate line 41 and the source line 40 are electrically independent. That is, the touch metal wiring 42 is arranged between the pixel electrodes 36 in the X direction. The touch metal wiring is electrically connected to a driving circuit (not shown). When touch sensing is performed, for example, a predetermined voltage or a predetermined pulse voltage is applied to the touch metal wiring 42.

In addition, the metal wiring such as the gate line 41 or the source line 40 of the array substrate 35 and the touch metal wiring 42 may also be formed with the same metal material and structure and in the same steps. In this case, the metal wiring and the touch metal wiring 42 formed by the same steps are electrically independent.

The black wiring 6 and the touch metal wiring 42 (or the gate line 41) can be used as an alternative to the black matrix of the display device in order to improve the contrast of the display. Since any of them can be formed of metal wiring, light from a backlight unit (not shown) has high light shielding properties.

The light-shielding pattern 43 is arranged in each pixel. The light shielding pattern 43 is disposed on the same layer as the touch metal wiring 42 and is formed in the same step. The light-shielding pattern 43 may be a metal layer in which a plurality of layers are laminated, or a reflection preventing film or a light-absorbing layer may be further laminated on the light-shielding pattern 43.

The light-shielding pattern 43 is formed on the channel layer 49 of an active device described later to prevent light from entering the channel layer 49. With this configuration, erroneous operation of the transistor 46 can be prevented.

Fig. 8 is a diagram showing an example of a cross section of a line C-C 'of the array substrate shown in Fig. 7.

FIG. 8 shows the structure of a transistor 46 having a channel layer 49 formed of an oxide semiconductor (In-Ga-Zn-O-based mixed oxide). As an active element of the display device of this embodiment. The transistor 46 is a thin film transistor. The metal wiring (gate line 41 and source line 40) electrically connected to this transistor 46 is shown, and the gate line 41 is parallel to the gate line via a plurality of insulating layers 21, 22, and 23 Disposed touch metal wiring 42 and the like.

In addition, FIG. 8 does not limit the number of layers of the insulating layer included in the array substrate 35. The transistor 46 shown in the figure has a bottom gate structure, but the active element used in the display device of this embodiment is not limited to a transistor with a bottom gate structure.

The transistor 46 includes a gate electrode GE, a source electrode SE, a drain electrode DE, and a channel layer 49.

The gate electrode GE is formed on the transparent substrate 25. The gate electrode GE is disposed on the same layer as the gate line 41 and is electrically connected (or integrated) with the corresponding gate line 41. The gate electrode GE is covered with an insulating layer 21.

The source electrode SE is disposed on the channel layer 49 on the insulating layer 21. The source electrode SE is disposed on the same layer as the source line 40 and is electrically connected (or integrated) with the corresponding source line 40. The source electrode SE is covered with an insulating layer 22.

The drain electrode DE is disposed on the channel layer 49 on the insulating layer 21. The drain electrode DE is disposed on the same layer as the source line 40 and the source electrode SE, and is electrically connected to the pixel electrode 36 through a contact hole 47 penetrating the insulating layers 22 and 23.

The channel layer 49 is located on the insulating layer 21 and is disposed at a position facing the gate electrode GE. The channel layer 49 can be formed of a silicon-based semiconductor such as polycrystalline silicon or an oxide semiconductor.

The transistor 46 is preferably an oxide semiconductor containing two or more metal oxides such as gallium called IGZO, indium, zinc, tin, germanium, magnesium, and aluminum. Since such a transistor 46 has high memory (less leakage current), it is easy to maintain the pixel capacitance after the liquid crystal driving voltage is applied. Therefore, a configuration in which the storage capacitor line (or the storage capacitor provided in each pixel) of the display device is omitted can be made.

For example, in the case of the point-reversal driving described later, if a transistor (active device) made of IGZO with good memory is used for the channel layer 49, the transparent electrode pattern may be omitted to set a constant voltage (constant potential). The storage capacitor (storage capacitor) required for constant voltage driving at). The transistor using IGZO as a channel layer is different from a transistor using a silicon semiconductor in that the leakage current is extremely small. Therefore, for example, a transfer circuit including a latch portion described in Patent Document 4 of the prior art document can be omitted. It has a simple wiring structure. In addition, a liquid crystal display device using an array substrate including a transistor having the following configuration has a small leakage current of the transistor, so that the voltage after the liquid crystal driving voltage is applied and the transmittance can be maintained. This transistor system is used An oxide semiconductor such as IGZO is used as a channel layer.

When an oxide semiconductor such as IGZO is used for the channel layer 49, the electron mobility of the transistor 46 is high. For example, a driving voltage corresponding to a required image signal can be applied to the pixel electrode 36 in a short time of 2 msec (msec) or less. For example, one frame of the double-speed drive (when the number of display scenes in one second is 120 frames) is about 8.3 msec. For example, 6 msec can be allocated to touch sensing.

When the driving electrodes belonging to the transparent electrode pattern are constant potential, the liquid crystal driving and the touch electrode driving may not be driven in a time-sharing manner. The driving frequency of the liquid crystal and the driving frequency of the touch metal wiring may be different. For example, in the case where the channel layer 49 is a transistor 46 using an oxide semiconductor such as IGZO, after the liquid crystal driving voltage is applied, in order to maintain the transmittance (or the holding voltage), it is different from the transistor of a polycrystalline silicon semiconductor. Refresh (rewrite of video signal) of video. Therefore, a display device using an oxide semiconductor such as IGZO can be driven with low power consumption.

Since oxide semiconductors such as IGZO have high electrical withstand voltage, they can drive liquid crystals at high voltages at high speeds, which is conducive to 3D image display capable of 3D display. As the channel layer 49, a thin film transistor 46 such as an IGZO oxide semiconductor is used, which has a high memory as described above. For example, even if the liquid crystal driving frequency is set to a low frequency of about 0.1 Hz to 30 Hz, flicker is not easy to occur (Display flicker). Using the transistor 46 with IGZO as the channel layer, and using low-frequency dot inversion driving and touch driving with a frequency different from the low-frequency, by this, it is possible to simultaneously obtain low-power consumption and high-quality image display and High-precision touch sensing.

In addition, the transistor 46 made of an oxide semiconductor is used for the channel layer 49. As described above, since the leakage current is small, the driving voltage applied to the pixel electrode 36 can be maintained for a long time. The source line 40, gate line 41 (and auxiliary capacitor line) of the active device are formed of copper wiring having a wiring resistance smaller than that of aluminum, and IGZO or the like which can be driven in a short time is used as the active device to thereby Can be fully set up for touch sensing Scanning period. That is, by applying an oxide semiconductor such as IGZO to an active device, the driving time of liquid crystals and the like can be shortened, and the time suitable for touch sensing can have sufficient margin in the image signal processing of the entire display screen. With this configuration, it is possible to detect a change in electrostatic capacitance that occurs with high accuracy.

Furthermore, by setting the channel layer 49 to an oxide semiconductor such as IGZO, the influence of coupling noise in dot inversion driving or row inversion driving can be substantially eliminated. This is because an active element system using an oxide semiconductor can apply a voltage corresponding to an image signal to the pixel electrode 36 in an extremely short time (for example, 2 msec), and maintains high memory of the pixel voltage after the image signal is applied. No new noise is generated during this hold period, which can reduce the impact on touch sensing.

The pixel electrode 36 is electrically connected to the drain electrode DE through the contact hole 47. The pixel electrode 36 is disposed on the same layer as the touch metal wiring 42 and the light shielding pattern 43. In this embodiment, the pixel electrode 36 and the light shielding pattern 43 are integrated. In other words, a part of the upper layer of the channel layer 49 located in the pixel electrode 36 is the light shielding pattern 43.

FIG. 9 is a cross-sectional view illustrating an electrostatic capacitance C1 held between the touch metal wiring 42 of the array substrate 35 and the black wiring 6 of the display device substrate 100.

In a plan view, the touch metal wirings 42 and the gate lines 41 located at overlapping positions extend in a direction (X direction) perpendicular to the paper surface in FIG. 9 and are arranged in parallel with each other. In addition, the black wiring 6 is actually located on the back side of the paper surface, and the cross-sectional view is not shown. However, it is shown by a dotted line for the sake of explanation, and schematically shows the structure for forming the capacitance C1.

In the configuration of the display device shown in FIG. 6 or FIG. 7, the liquid crystal driving of the common electrode 32 and the driving of the touch-sensitive metal wiring 42 for touch sensing may be performed in time-sharing driving or may not be time-sharing driving. Instead, the touch metal wiring 42 is driven at a different frequency from the liquid crystal drive. The touch metal wiring 42 can be used as a driving electrode or a detection electrode.

The capacitance C1 related to touch detection is formed between the black wiring 6 and the touch metal wiring 42 orthogonal to the black wiring 6 in a plan view. By this change in the electrostatic capacitance C1, it is possible to detect a position where an indicator such as a finger approaches or touches the display screen.

The black wirings 6 and the touch metal wirings 42 are substantially orthogonal as shown in FIG. 3, and a plurality of black wirings 6 are arranged respectively. However, all of the black wiring 6 and the touch metal wiring 42 may not be connected to a touch sensing controller (not shown) for driving or detection. The touch sensing controller is included in the aforementioned control unit (not shown).

For example, as illustrated in FIG. 3, the black wiring 6 may also be provided with virtual wiring 6b, and the driving or detection of the black wiring 6 and the touch metal wiring 42 may be performed every 3, 9 or 18, etc. The method of thinning the given number of pieces. The larger the number of thinning, the shorter the touch sensing scanning time, and the easier the high-speed touch detection.

Next, the functions that the black wiring 6 in the display device substrate and the display device of the present embodiment can play will be described.

As described above, the black wiring 6 is a conductive wiring composed of four layers including a first conductive metal oxide layer 1, a metal layer 2, a second conductive metal oxide layer 3, and a black layer 4. In this embodiment and with In the embodiment described below, the black wiring 6 is used as a touch electrode for touch sensing of an electrostatic capacitance method. The touch electrode refers to a general term of a driving electrode and a detection electrode used for touch sensing. In the description of the present invention, the drive electrode and the detection electrode may be described as a drive wiring, a detection wiring, or a black wiring, a touch metal wiring, or a transparent conductive film wiring, respectively.

The touch electrodes can be arranged by, for example, arranging a plurality of detection electrodes in a first direction (for example, direction X) in a plan view, and arranging a plurality of driving electrodes on an insulating layer in a lamination direction (direction Z). A configuration arranged in the second direction (for example, the Y direction). An AC pulse signal is applied to the driving electrode at a frequency of, for example, 1 KHz to 100 KHz. Generally, by applying the AC pulse signal, a certain output waveform can be maintained at the detection electrode. If an indicator such as a finger touches or approaches, the output waveform of the detection electrode at that location will change, and it can be determined whether there is touch. The distance from a pointer such as a finger to the display surface can be measured by the time from when the pointer approaches to the contact (usually several hundred μsec or more and several msec or less), and the number of output pulses counted during that time.

The black wiring 6 can be used as the above-mentioned drive electrode or detection electrode. As the touch electrode paired with the black wiring 6, a touch metal wiring 42 (or transparent) that is substantially orthogonal to the direction in which the black wiring 6 extends (for example, the Y direction) can be provided through an insulating layer such as the transparent resin layer 9. Conductive film wiring). The touch metal wiring 42 is a touch electrode paired with the black wiring 6 and is disposed on the array substrate side. The transparent conductive film wiring is a touch electrode paired with the black wiring 6, and is disposed on the display substrate side. In the configuration in which the touch metal wiring 42 (or transparent conductive film wiring) is provided, this can be Such wiring is used as a drive electrode or a detection electrode. In a third embodiment described later, a configuration including a transparent conductive film wiring will be described in detail, and the transparent conductive film wiring extends so as to be substantially orthogonal to the direction in which the black wiring 6 extends.

When the line width or pattern shape of the black layer 4 and the metal layer 2 constituting the black wiring 6 are the same, the black layer 4 is used as a resist pattern, and the second conductive metal oxide layer 3 and the metal layer 2 containing indium are used. By performing wet etching with the first conductive metal oxide layer 1, a pattern of the metal layer 2 having the same line width as the black layer 4 can be obtained. In this way, the black wiring 6 having the same line width or pattern shape as the black layer 4 and the metal layer 2 can be used to manufacture a color filter substrate in a simple process. In addition, through the above steps, the line widths of the first conductive metal oxide layer 1 and the metal layer 2 and the second conductive metal oxide layer 3 and the black layer 4 constituting the black wiring 6 can be made equal.

Since the black wiring 6 has a structure in which the visible light reflection of the metal layer 2 is covered with the black layer 4, the light from the backlight unit of the display device is not reflected on the metal layer 2 when the liquid crystal display device is manufactured. Therefore, it is possible to prevent light of a backlight incident from the array substrate 35 side from being incident on the channel layer 49 of the transistor 46, and to prevent erroneous operation of the transistor 46.

As described above, according to this embodiment, it is possible to provide a touch-sensing wiring that has a state of high adhesion to a substrate belonging to an alkali-free glass and can reduce re-reflection of light emitted from a light source of a display device such as a backlight. For a display device substrate, the touch sensing wiring is a low-resistance and alkali-resistant black wiring 6. That is, it can provide good visibility A good display device substrate for touch sensing wiring, the touch sensing wiring is in a state of high adhesion to a substrate belonging to alkali-free glass. In addition, according to this embodiment, a display device with high resolution and capable of responding to high-speed touch input, and a display device substrate used in the display device can be provided. In addition, according to this embodiment, a display device substrate capable of stable electrical mounting can be provided.

Next, a display device substrate and a display device according to a second embodiment will be described with reference to the drawings.

In addition, in the following description, the same reference numerals are assigned to the same configurations as those of the above-mentioned embodiment, and descriptions thereof are omitted.

FIG. 10 is a diagram showing an example of a configuration in which a color filter layer and a transparent resin layer 9 are laminated on the black wiring 6 in the display device substrate of this embodiment.

FIG. 11 is a partial cross-sectional view showing a display device including the display device substrate shown in FIG. 10. In addition, in FIG. 11, illustrations of a polarizing plate, a retardation plate, an alignment film, a backlight unit, a gate line or a source line connected to a transistor belonging to an active device of a display device are omitted.

The second embodiment relates to a structure in which a color filter layer (red pixel R, green pixel G, and blue pixel B) is further laminated on the display device substrate of the above-mentioned embodiment, and the technology regarding the liquid crystal layer 30 or liquid crystal driving is This is the same as the first embodiment.

A plan view of the display device according to this embodiment when viewed from the observer direction V is the same as that of FIG. 3. A means for forming a gapless and flat black wiring 6 and a color filter layer (red pixels R, green pixels G, and blue pixels B) with extremely thin wires, and it is a color that can be applied by, for example, the thermal reflow of WO 14/115367. Layer formation technology.

In this embodiment, the display device substrate 100 further includes a color filter layer (red pixels R, green pixels G, and blue pixels B) arranged on the black wiring 6. The color filter layer includes: a red coloring layer corresponding to the red pixel R and composed of a resin colored so as to transmit light having a dominant wavelength of red; and a green coloring layer corresponding to the green pixel G and It is composed of a resin colored to transmit light with a main wavelength of green; and a blue colored layer corresponds to the blue pixel B and is a resin colored to transmit light with a main wavelength of blue.

Forming a red colored layer, a green colored layer, a blue colored layer, and the like of each of the red pixel R, the green pixel G, and the blue pixel B, for example, disperses an organic pigment in a photosensitive transparent resin and Formed by photolithography. In addition to the coloring layer of the red coloring layer, the green coloring layer, and the blue coloring layer, the color filter layer may be added with other colors such as a light coloring layer, a complementary coloring layer, and a white layer (transparent layer).

In the display device substrate 100 of this embodiment, since the black wirings 6 extending in the Y direction are formed in a stripe pattern arranged in the X direction, each of the red pixels R, the green pixels G, and the blue pixels B is also It is possible to form a stripe pattern in which a plurality of patterns of the same color and continuous in the Y direction are arranged in the X direction. When the red pixels R, the green pixels G, and the blue pixels B are formed in a stripe pattern, the black wiring 6 and the touch metal wiring 42 (or the gate line 41) can be formed into a rectangular grid pattern in a plan view. Black matrix.

When the above-mentioned display device substrate 100 and the array substrate 35 are bonded, since the black wiring 6 and the touch metal wiring 42 (or the gate line 41) are stripe patterns, respectively, high-precision alignment (alignment; alignment), which can help improve the yield of the display device.

A transparent resin layer 9 is laminated on the color filter layer.

In FIGS. 10 and 11, the black wirings 6 extend in a direction (Y direction) perpendicular to the paper surface, and are arranged substantially parallel to each other. In addition, the touch metal wiring 42 is located on the back side of the paper surface, so it is not shown in the drawing, but it is indicated by a dotted line for illustration, and the structure for forming the electrostatic capacitance C2 is schematically shown. In the display device of this embodiment, similarly to the above-mentioned embodiment, by driving the black wiring 6 and the touch metal wiring 42 and detecting a change in the electrostatic capacitance C2 generated between these, it is possible to detect a fingertip or The distance or contact between the pen, etc. and the screen of the display device.

In a plan view, the black wirings 6 arranged parallel to the Y direction are orthogonal to the touch metal wirings 42. The touch metal wiring 42 is formed on the gate line 41 via the insulating layers 21, 22, and 23, and the gate line 41 and the source line 40 are electrically independent.

The black wiring 6 and the touch metal wiring 42 (or the gate line 41) can be used as an alternative to the black matrix of the display device in order to improve the contrast of the display. Since any of them can be formed of metal wiring, light from a backlight unit (not shown) has high light shielding properties.

As described above, according to the display device substrate and the display device of this embodiment, the same effects as those of the above embodiment can be obtained. That is, according to this embodiment, it is possible to provide a display device substrate having a touch sensing wiring that has a state of high adhesion to the substrate and can reduce re-reflection of light emitted from a light source of a display device such as a backlight. The touch-sensing wiring is a low-resistance and alkali-resistant black wiring 6, and the substrate is an alkali-free glass. That is, it is possible to provide a display device substrate having a touch sensing wiring having a state of high adhesion to the substrate and good visibility. The plate is alkali-free glass. In addition, according to this embodiment, a display device with high resolution and capable of responding to high-speed touch input, and a display device substrate used in the display device can be provided. In addition, according to this embodiment, a display device substrate capable of stable electrical mounting can be provided.

Next, a display device substrate and a display device according to a third embodiment will be described with reference to the drawings.

FIG. 12 is a partial cross-sectional view of a display device substrate 200 according to a third embodiment.

FIG. 13 is a partial cross-sectional view showing a liquid crystal display device including the display device substrate 200 shown in FIG. 12. In addition, in FIG. 13, illustrations of a polarizing plate, a retardation plate, an alignment film, a backlight unit, a gate line or a source line connected to a transistor belonging to an active device of a display device are omitted.

In this embodiment, the display device substrate 200 further includes a color filter layer (red pixels R, green pixels G, and blue pixels B) disposed on the black wiring 6 and a transparent resin disposed on the color filter layer. The layer 9 and the transparent conductive film wiring 7 arranged on the transparent resin layer 9.

The difference between this embodiment and the second embodiment is that the transparent conductive film wiring 7 is formed on the transparent resin layer 9 of the display device substrate 200, and the array substrate 45 does not have a common electrode.

Each of the black wirings 6 extends in a direction perpendicular to the paper surface (the Y direction) as in the first and second embodiments described above, and a plurality of black wirings 6 form a stripe pattern arranged in the X direction.

The color filter layer is provided with a red coloring layer corresponding to the red pixel R and transmitted by a light having a dominant wavelength of red. A colored resin layer; a green colored layer corresponding to the green pixel G and composed of a colored resin so as to transmit light having a dominant wavelength of green; and a blue colored layer corresponding to the blue pixel B and The colored resin is used to transmit light of the blue main wavelength. A transparent resin layer 9 is laminated on the color filter layer.

The transparent resin layer 9 may be formed of an acrylic resin or the like having thermosetting properties. In this example, the film thickness of the transparent resin layer 9 is set to 1.5 μm. The film thickness of the transparent resin layer 9 can be arbitrarily set within a range where the black wiring 6 and the transparent conductive film wiring 7 are electrically insulated. The black layer 4 or the transparent resin layer 9 may be constituted by a plurality of layers having mutually different optical characteristics such as a refractive index. The same applies to the first embodiment and the second embodiment described above, and the black layer 4 or the transparent resin layer 9 may be formed in a plurality of layers.

The transparent conductive film wiring 7 is arranged on the transparent resin layer 9. The transparent conductive film wiring 7 is formed of a transparent conductive material such as ITO or IZO. In addition, an auxiliary conductor such as a metal wiring may be laminated on the transparent conductive film wiring 7 so as to be in electrical contact therewith.

In the display device substrate and the display device of this embodiment, the black wiring 6 and the transparent conductive film wiring 7 are orthogonal to each other with the transparent resin layer 9 belonging to the dielectric body. For example, the pixel pitch in the direction X can be set to 21 μm, the width of the black wiring can be set to 4 μm, and the width of the transparent conductive film wiring 7 can be set to 123 μm (the pitch of the transparent conductive film wiring 7 is 126 μm).

In this embodiment, the capacitance C3 for touch sensing is formed between the black wiring 6 and the transparent conductive film wiring 7. also That is, in this embodiment, the transparent conductive film wiring 7 is a common electrode and functions as a detection electrode of the touch electrode, and the black wiring 6 is used as a driving electrode for touch sensing. Between the black wiring 6 and the transparent conductive film wiring 7, a substantially constant electrostatic capacitance C3 is formed. Due to the contact or proximity of an indicator such as a finger, the electrostatic capacitance C3 at the location will change and the touch position will be detected. The transparent conductive film wiring 7 or the black wiring 6 achieves high-speed touch sensing by thinning and detecting touch signals during touch sensing.

The liquid crystal layer 30 is driven by a voltage between the pixel electrode 36 and the transparent conductive film wiring 7. That is, the transparent conductive film wiring 7 becomes a common electrode for liquid crystal driving. Therefore, in the liquid crystal display device of this embodiment, the liquid crystal driving voltage is applied in the Z direction (thickness direction of the liquid crystal layer 30). That is, in the liquid crystal display device of this embodiment, the liquid crystal is driven by a so-called vertical electric field. The liquid crystal driving may also be a liquid crystal driving using a common inversion driving, or the common electrode may be set to a constant potential to invert the pixel electrode 36.

The array substrate 45 does not include a common electrode. The pixel electrode 36 is a substantially rectangular electrode arranged in each pixel. Similar to the first embodiment described above, the pixel electrode 36 is electrically connected to the active device via a contact hole.

FIG. 14 is a plan view of the display device substrate 200 shown in FIG. 13 as viewed from the viewer's direction V. FIG.

The black wiring 6 is similar to the example shown in FIG. 3, and includes a lead wiring 6a and a dummy wiring 6b. The lead wiring 6a extends from one end of the rectangular display area 19 to the outer surface of the other end. Virtual wiring 6b is from One end of the rectangular display area 19 extends to the other end. Between the routing wirings 6a, two dummy wirings 6b are arranged.

The transparent conductive film wirings 7 are arranged to extend in a direction (X direction) substantially orthogonal to the direction (Y direction) where the black wirings 6 extend, and the plurality of transparent conductive film wirings 7 form a stripe pattern arranged in the Y direction. In FIG. 14, the line width (the width in the Y direction) of the transparent conductive film wiring 7 is approximately the same as the width of the three columns of the pixels arranged in the X direction. The transparent conductive film wiring 7 is arranged to extend from one end of the rectangular display area 19 to the outside of the other end.

The black wiring 6 and the transparent conductive film wiring 7 are similar to the first embodiment and the second embodiment, and can be used as electrodes for touch sensing control (hereinafter, sometimes omitted as touch electrodes or touch wiring). Thinning drive is performed. The thinned wiring can be made into a floating shape (floating pattern), for example, electrically.

The floating pattern can also be switched to a detection electrode or a driving electrode by a switching element for high-quality touch sensing. Alternatively, the floating pattern may be switched in a manner of being electrically connected to the ground (ground to frame). In order to improve the S / N ratio of touch sensing, the signal wiring of active components such as TFTs is temporarily grounded to the ground (frame, etc.) during the touch sensing signal detection.

In addition, in the touch wiring that takes time to reset the electrostatic capacitance C3 detected by the touch sensing control, that is, in the touch wiring with a large time constant (product of capacitance and resistance value) under touch sensing Alternatively, for example, the odd and even columns can be used interactively for sensing, and driven by the adjusted time constant. Or, divide the plurality of touch wiring Group to drive or test. The grouping of the plurality of touch wirings may not adopt a line sequence, but adopt a one-time detection method in which the group unit is also called a self-detection method. Parallel driving can also be performed in groups. Alternatively, in order to eliminate noise such as parasitic capacitance, a difference detection method of detecting the difference between the detection signals of adjacent and adjacent touch wirings may be adopted.

The same applies to the first embodiment and the second embodiment described above. The black wiring 6 or the transparent conductive film wiring 7 can be used as a touch detection sensing electrode or a driving electrode. As long as one of the black wiring 6 and the transparent conductive film wiring 7 is a detection electrode, and the other is a driving electrode.

The transparent conductive film wiring 7 can be set to a common potential at a constant potential during touch sensing driving and liquid crystal driving. Alternatively, all the transparent conductive film wirings 7 can be grounded via a high resistance. In addition, the transparent conductive film wiring 7 which is set to a common potential during the touch sensing driving and the liquid crystal driving is used to distinguish the driving signals of the touch sensing driving and the liquid crystal driving. Function. The value of the high resistance can be set in a range of, for example, several giga ohms to several peta ohms. Typically, it can be set to 1 tera ohm or more and 50 tera ohm or less. However, when the channel layer 49 of the thin film transistor of the display device is an oxide semiconductor such as IGZO, a resistance lower than 1 giga ohm may be used in order to alleviate the state of the afterimage of the pixels of the display device. In addition, in touch sensing, in a simple control without a reset circuit of the electrostatic capacitance C3, for resetting the electrostatic capacitance C3, a resistance lower than 1 giga ohm can also be used. In a display device in which an oxide semiconductor such as IGZO is used as the channel layer 49 of the active device, various measures described above in touch sensing control can be performed.

In addition, if the thinning of the black wiring 6 is performed for low-density scanning, the driving frequency can be reduced, high-precision sensing can be performed, and power consumption can be reduced. Conversely, high-density scanning that reduces the thinning of the black wiring 6 can be used for fingerprint authentication or input using a stylus.

The constant potential applied to the transparent conductive film wiring 7 during touch sensing driving and liquid crystal driving does not necessarily mean "0 (zero)" volts, and can also be set to a constant potential in the middle of the driving voltage level, or it can be set to an offset Driving voltage. During the touch sensing driving and the liquid crystal driving, the transparent conductive film wiring 7 has a constant potential, so the pixel electrode 36 of the liquid crystal can also be driven at a different frequency to drive the transparent conductive film wiring 7.

In addition, the common potential Vcom, which is a common electrode driven by the liquid crystal, generally includes an AC rectangular signal inverted by liquid crystal-driven frames, for example, an AC voltage of ± 2.5V or ± 5V is applied for each frame. In this embodiment, the AC voltage required for such driving is not treated as a constant potential. In the technique of this embodiment, the voltage change of the constant potential must be a constant potential within a certain voltage fluctuation which is at least smaller than the threshold (Vth) of the liquid crystal driving.

In this embodiment, by setting the potential of the transparent conductive film wiring 7 to the same constant potential as the touch sensing driving and the liquid crystal driving, the touch sensing driving and the liquid crystal driving can be driven at different frequencies. The constant-potential transparent conductive film wiring 7 can serve as a shield for electrically separating the liquid crystal driving signal and the touch sensing driving signal.

In the display device substrate 200 of this embodiment, a large edge capacitance can be obtained, and the driving voltage for touch sensing can be reduced while maintaining a high S / N ratio, thereby reducing power consumption.

In addition, when the black wiring 6 is used as a driving electrode for touch sensing, and the transparent conductive film wiring 7 is used as a detection electrode, driving conditions for touch sensing and driving conditions (frequency, voltage, etc.) of the liquid crystal can be made different. By making the driving frequency of the touch sensing different from the driving frequency of the liquid crystal, each of them may not be easily affected by the driving. The driving frequency of touch sensing can be set to 1KHz or more and 100KHz or less, and the frequency of liquid crystal driving can be set to 0.1Hz to 480Hz. By creating a liquid crystal display device using a TFT array substrate using an oxide semiconductor such as IGZO as a channel layer, even if it is driven at a low frequency of 0.1 Hz to 30 Hz, it can display without flicker (flickering of the image) with low power consumption. .

Moreover, touch sensing driving and liquid crystal driving can also be performed in a time-sharing manner. When the black wiring 6 is used as a driving electrode (scanning electrode), the scanning frequency of the electrostatic capacitance detection can be arbitrarily adjusted in accordance with the required touch input speed.

Furthermore, in order to obtain quick response, the black wiring 6 may be scanned at intervals. In addition, the driving electrodes and the detection electrodes for touch sensing may be replaced, and the transparent conductive film wiring 7 may be used as a driving electrode (scanning electrode) for applying a voltage of a certain frequency. In addition, the voltage (AC signal) applied to the driving electrodes during touch sensing and liquid crystal driving can also be a reverse driving method that reverses the positive and negative voltages. The touch sensing driving and the liquid crystal driving system may be performed in a time-sharing manner, or may not be a time-sharing manner.

In addition, as for the voltage (AC signal) applied to the driving electrode, by reducing the voltage amplitude (amplitude) of the applied AC signal, the influence on the liquid crystal display can be reduced.

As described above, in the display device substrate and the display device of this embodiment, since the potential of the transparent conductive film wiring 7 is constant, it is possible to set black as a touch electrode without depending on the driving frequency and timing of the liquid crystal. The driving frequency of the electrodes and the timing of signal detection. The driving frequency of the touch electrodes can be set to a frequency different from the frequency of the liquid crystal driving or a higher driving frequency.

Generally speaking, the driving frequency of the liquid crystal is a driving frequency of 60 Hz or an integer multiple of this frequency. Generally, the touch sensing portion is affected by noise accompanying the frequency of the liquid crystal driving. In addition, the common household power source is an AC power source of 50 Hz or 60 Hz, and the touch sensing portion is prone to receive noise generated by electrical equipment operating with such an external power source. Therefore, by setting the frequency of the touch drive to a frequency shifted from a frequency of 50 Hz or 60 Hz or a different frequency after an integer multiple of the frequency, the influence of noise generated by the liquid crystal drive and external electronic equipment can be greatly reduced. . The amount of displacement is sufficient, for example, the amount of displacement from the noise frequency by ± 3% or more and ± 17% or less is sufficient, and interference with the noise frequency can be reduced. For example, the frequency of the touch drive can be selected from a range of 1 Hz to 100 kHz, and a different frequency that does not interfere with the above-mentioned liquid crystal driving frequency and power frequency. By selecting different frequencies that do not interfere with the liquid crystal drive frequency and power supply frequency, for example, the influence of noise such as coupling noise generated in dot inversion driving can be reduced.

In the case of a display device for 3D (stereoscopic image) display, in addition to the normal two-dimensional image display, in order to three-dimensionally display the image located on the front side and the image located on the back side, a plurality of image signals (for example, Video signal for right eye and video signal for left eye). because Therefore, the frequency of liquid crystal driving requires high-speed driving such as 240 Hz or 480 Hz and a large number of image signals. At this time, the advantage of this embodiment that can make the frequency of the touch sensing driving different from the frequency of the liquid crystal driving is more significant. For example, in a game machine that performs 3D display in this embodiment, high-speed and high-accuracy touch sensing can be performed. This embodiment is particularly useful on a display with a high frequency of touch input by a finger such as a game machine or an automatic teller machine.

In addition, in the touch sensing driving, instead of supplying the driving voltage to all the black wirings (driving electrodes) 6, the thinning is performed to detect the touch position, thereby reducing the power of the touch sensing. Consume.

The channel layer of the transistor of the active device (TFT) (not shown) may be an oxide semiconductor or a polycrystalline silicon semiconductor, and the oxide semiconductor may be a metal oxide such as IGZO.

By using an oxide semiconductor containing two or more metal oxides such as gallium, indium, zinc, tin, germanium, magnesium, and aluminum, such as IGZO, as the channel layer, the coupling noise generated during dot inversion driving can be reversed. The effect of (coupling noise) is largely eliminated. This is because an active element formed using an oxide semiconductor such as IGZO can process an image signal, ie, a rectangular signal driven by a liquid crystal, in an extremely short time (for example, 2 msec), and it has pixels capable of holding a liquid crystal display after the image signal is applied Therefore, no new noise is generated during the voltage holding period, which can further reduce the influence of noise generated by liquid crystal driving.

In addition, oxide semiconductors such as IGZO have high withstand voltages, so they can drive liquid crystals at high voltages at high speeds, which is particularly useful for 3D video displays such as 3D. The channel layer uses an oxide semiconductor transistor such as IGZO, which has high memory, so it has the advantage that flicker (display flicker) is not easy to occur when the liquid crystal driving frequency is at a low frequency of about 0.1 Hz to 30 Hz.

In addition, by using a transistor having a channel layer such as IGZO, and using a low-frequency dot inversion driving or a row inversion driving, and a touch driving driven at a frequency different from the frequency of the dot inversion driving, Low power consumption, while obtaining high-quality image display and high-precision touch sensing. In addition, an array substrate provided with an oxide semiconductor transistor such as IGZO as a channel layer is a liquid crystal display device applicable to a lateral electric field such as FFS, a liquid crystal display device such as a VA longitudinal field, or an organic EL display device.

In addition, when the dot-inversion driving or the row-inversion driving in the pixel electrode is used for the liquid crystal driving, if a good memory IGZO is used, the transparent electrode pattern can be omitted by setting a constant voltage (constant potential). Holding capacitor (storage capacitor) required for voltage driving. In addition to the dot inversion driving, the liquid crystal driving system may be a row inversion driving (source inversion driving) in which the transparent conductive film wiring 7 which is a common electrode is set to a constant potential. Alternatively, a line inversion driving in which the transparent conductive film wiring 7 is set to a constant potential and a point inversion driving in which the transparent conductive film wiring 7 is set to a constant potential may be combined.

In the liquid crystal display device of this embodiment, a driving voltage for liquid crystal is applied to the liquid crystal layer 30 between the transparent conductive film wiring 7 which is a common electrode and the pixel electrode 36 provided on the array substrate to drive the liquid. 晶 层 30. The crystal layer 30. In this embodiment, a liquid crystal driving method called a vertical electric field method is applied when a voltage is applied to the thickness direction (vertical direction) Z of the liquid crystal layer 30 and the transparent substrates 15 and 25.

Liquid crystal driving methods that can be applied to the vertical electric field method include VA (Vertical Alignment), HAN (Hybrid-aligned Nematic), TN (Twisted Nematic), OCB ( Optically Compensated Bend (Optical Compensated Bend), CPA (Continuous Pinwheel Alignment), ECB (Electrically Controlled Birefringence), TBA (Transverse Bent Alignment, Transverse Bent Alignment), etc., can be selected as appropriate. In addition, in the VA mode, excellent normal black display is realized. Therefore, in order to effectively use the black display, the VA mode is preferably used. In addition, from the viewpoint of the intensity of the front brightness and the intensity of the black level of the black display, the vertically aligned liquid crystal (VA) is superior to the horizontally aligned liquid crystal (FFS) mode.

Next, a method for manufacturing a display device substrate according to the first to third embodiments will be described.

15 is a partial cross-sectional view showing each manufacturing step of a display device substrate according to an embodiment of the present invention.

As shown in FIG. 15, on a transparent substrate 15, a ternary mixed oxide film (conductive composite oxide layer) including indium oxide, zinc oxide, and tin oxide (a conductive composite oxide layer) is continuously formed as a first conductive metal oxide layer 1. And the metal layer 2 and the second conductive oxide layer to have a structure shown in a (film formation step).

The first conductive metal oxide layer 1, the metal layer 2, and the second conductive oxide layer 3 are each formed with a film so as to substantially cover the surface of the transparent substrate 15. The film forming apparatus uses a sputtering apparatus to continuously form a film without breaking vacuum.

The composition of each of the indium oxide, zinc oxide, and tin oxide of the first conductive metal oxide layer 1 and the second conductive metal oxide layer 3 and the metal layer of the copper alloy is shown below. Either of them is the atomic percentage of the metal element in the mixed oxide (the calculation of only the metal element without calculating the oxygen element. Hereinafter, it is expressed in at%).

‧First conductive metal oxide layer; In: Zn: Sn 90: 8: 2

‧Second conductive metal oxide layer; In: Zn: Sn 91: 7: 2

‧Metal layer; Cu: Mg 99.5: 0.5

The amount of indium (In) contained in the first conductive metal oxide layer 1 and the second conductive metal oxide layer 3 must be more than 80 at%. The amount of indium (In) is preferably more than 80 at%. The amount of indium (In) is more preferably more than 90 at%. The amount of indium (In) is preferably more than 90 at%. When the amount of indium (In) is less than 80 at%, the resistivity of the formed conductive metal oxide layer becomes large, which is less desirable. When the amount of zinc (Zn) exceeds 20 at%, the alkali resistance of the conductive metal oxide (mixed oxide) is lowered, which is not preferable.

The amount of zinc (Zn) contained in the first conductive metal oxide layer 1 and the second conductive metal oxide layer 3 must be greater than the amount of tin (Sn). If the content of tin exceeds the content of zinc, defects may occur in the wet etching in the subsequent steps. In other words, the etching of a metal layer belonging to copper or a copper alloy becomes easier to enter from the conductive metal oxide layer, and the first conductive metal oxide The line widths of the layer 1 and the metal layer 2 and the second conductive metal oxide layer 3 are likely to be different.

The amount of tin (Sn) contained in the first conductive metal oxide layer 1 and the second conductive metal oxide layer 3 is preferably within a range from 0.5 at% to 6 at%. Compared with indium, tin contains 0.5at% to 6at% to reduce the resistance of the above-mentioned ternary mixed oxide film (conductive composite oxide layer) of indium, zinc and tin. coefficient. When the amount of tin exceeds 7 at%, the resistivity of the ternary mixed oxide film (conductive composite oxide layer) becomes excessively large with the addition of zinc. By adjusting the amount of zinc and tin within the above range, the resistivity can be converged to a small range of approximately 5 × 10 ^-4 Ωcm or more and 3 × 10 ^-4 Ωcm or less as a single-layer film of a mixed oxide film. Resistivity. A small amount of other elements such as titanium, zirconium, magnesium, aluminum, and germanium may be added to the mixed oxide.

Next, on the transparent substrate 15, as a main color material, a black coating liquid containing alkali-developing property and photosensitivity containing carbon is applied and dried to form a black layer 4 to form a structure shown in b ( Coating step). The dried coating film thickness of the black layer 4 was about 1.1 μm.

Next, using a half-tone mask including a region having a transmittance of 100%, a pattern of a terminal portion having a transmittance of 40%, and a region of a black wiring pattern having a transmittance of 0%, the substrate having the structure shown in b is exposed. In addition, the substrate of the mask is an artificial quartz substrate, and the transmittance is a transmittance based on the artificial quartz substrate as a reference. After exposure, alkali development is performed to produce a structure shown in c (pattern forming step). That is, a black wiring pattern 4a having a film thickness of about 2 μm and a film thickness of about 1 μm are prepared Of the terminal portion pattern 4b. In this state, the second conductive metal oxide layer 3 is exposed between the black wiring patterns 4 a and the periphery of the substrate.

Next, the exposed second conductive metal oxide layer 3 is wet-etched with an oxalic acid-based etchant, the metal layer 2 is wet-etched with a phosphoric acid-based etchant, and the first conductive metal is further etched with an oxalic acid-based etchant. The oxide layer 1 is subjected to wet etching to form a substrate having a structure shown in d (wet etching step). In this state, the first conductive metal oxide layer 1, the metal layer 2 and the second conductive metal oxide layer 3 between the black wiring patterns 4a are removed, and the transparent substrate 15 is exposed in this region.

Next, using a dry etching apparatus, dry etching was performed under the condition that the thickness of the black layer was etched by 0.6 μm. The gas introduced into the dry etching device is obtained by adding 8 vol% of oxygen to a base gas of argon. The terminal portion pattern 4b on the terminal portion 5 is completely removed by dry etching, the second conductive metal oxide layer 3 is exposed on the terminal portion 5, and a black layer 4 having a thickness of about 0.5 μm remains on the black wiring pattern A substrate having a structure shown by e (dry etching step). The line width of the black wiring pattern 4a is about 4 μm, and the line widths of the first conductive metal oxide layer 1 and the metal layer and the second conductive oxide layer are within ± 0.2 μm, which are equal line widths, respectively.

In addition, in the technology of this embodiment, since the alignment (alignment) of the black layer 4, the first conductive metal oxide layer 1, the metal layer 2, and the second conductive oxide layer 3 is not required, it is not necessary to use it. An alignment margin of ± 1.5 μm, which is usually necessary in a display device substrate or the like, is considered. Therefore, a high aperture ratio can be obtained.

In this example, although the film thickness of the first conductive metal oxide layer 1 of the black wiring 6 is approximately 0.025 μm, and the film thickness of the metal layer 2 is approximately 0.15 μm, the thickness of the first conductive metal oxide layer 1 is approximately 0.15 μm. The film thickness is about 0.025 μm, but these film thicknesses can be variously set including the film thickness of the black layer 4.

The color material used for the black layer 4 constituting the black wiring 6 is mainly preferably carbon. In order to adjust the reflection color generated by the black layer 4, a small amount of an organic pigment may be added to the photosensitive black coating liquid. However, for many organic pigments, metal systems are incorporated in the pigment structure. If a film containing such an organic pigment is dry-etched, contamination by the metal may occur. Taking this into consideration, the blending of the photosensitive black coating liquid is adjusted. Alternatively, it is preferably a color material that does not contain an organic pigment and is only carbon with good dry etching properties. A black layer containing more organic pigments tends to have a large surface roughness during dry etching.

As described above, in the method for manufacturing a display device substrate according to this embodiment, the steps using the light mask are performed once and then completed, which has the advantages of reducing the mask cost and the number of steps.

Next, a display device substrate, a display device, and a method for manufacturing a display device substrate according to the fourth embodiment will be described.

16 is a partial cross-sectional view of a display device substrate according to a fourth embodiment.

In the display device substrate of this embodiment, a black oxide layer 8 is inserted at the interface between the conductive metal oxide layer 1 and the metal layer 2 of the display device substrate 100 of the first embodiment described above. In addition, The display device substrate of this embodiment can provide a modification of the plurality of embodiments described above.

The display device substrate of this embodiment is provided at the interface between the first conductive metal oxide layer 1 and the metal layer 2 and includes a black oxide layer 8 for oxidizing the metal. The black oxide layer 8 is formed of a metal oxide capable of absorbing part of visible light. The metal oxide constituting the black oxide layer 8 can be selected from metal oxides having various light absorption properties. However, an oxide of copper or a copper alloy used for the metal layer is relatively simple. The black oxide layer 8 that oxidizes the metal can be easily formed by introducing oxygen during vacuum film formation such as sputtering or ion plating. In addition to the above, the metal used as the material of the black oxide layer 8 may be a metal material that can provide a function of absorbing light by oxidizing a copper-nickel alloy, a titanium alloy, or the like. The film thickness of the black oxide layer 8 may be, for example, 10 nm to 200 nm.

In this embodiment, the first conductive metal oxide layer is formed with a film thickness of 20 nm, and the metal layer 2 is formed with a copper-magnesium alloy containing magnesium (Mg) at 0.5 at% and a film thickness of 150 nm. A second conductive metal oxide layer was formed in a thin film having a thickness of 20 nm. The first and second conductive metal oxide layers are formed into an amorphous film by sputtering at room temperature, whereby wet etching can be easily performed. The metal layer 2 may not be a copper alloy, but may be formed of pure copper.

In the case where a metal layer is used as the black oxide layer 8, when forming a film by sputtering or the like of copper or a copper alloy, a method of forming a metal oxide film by introducing oxygen is simple in manufacturing steps. The first conductive metal oxide layer was sputtered using a target of ITZO (In-Sn-Zn-O) After being formed into a film, a sputtering target of a copper alloy is used, and further oxygen is added to argon to form a black oxide layer 8 with a thickness of, for example, 20 nm to 200 nm. Next, the introduction of only oxygen, and the use of only argon to stop forming the metal layer 2 with a copper alloy was stopped. Next, the second conductive metal oxide layer 3 was sputtered into a film using a target of ITZO (In-Sn-Zn-O) in the same manner as the first conductive metal oxide layer 1 without breaking the vacuum. The film can be formed in the order of the first conductive metal oxide layer 1 / the black oxide layer 8 / the metal layer 2 / the second conductive metal oxide layer 3.

After the film is formed in the above manner, as in the manufacturing methods of the first to third embodiments described above, exposure is performed using a half-tone mask, alkali development, wet etching, and then dry etching are performed to form a film of this embodiment. Display device substrate.

For example, in the display device shown in FIG. 6, when viewed from the viewer's direction V, light reflection from the metal layer 2 (reflection of outside light such as indoor light or sunlight) may occur, and visibility may be reduced. . In this embodiment, the above-mentioned light reflection can be suppressed by inserting the black oxide layer 8 into the interface between the first conductive metal oxide layer 1 and the metal layer 2.

That is, according to the display device substrate, the display device, and the method for manufacturing a display device substrate according to this embodiment, the same effects as those of the above embodiment can be obtained, and a decrease in visibility can be further avoided.

Next, a display device substrate according to a fifth embodiment, a display device, and a method for manufacturing a display device substrate will be described.

FIG. 17 is a partial cross-sectional view of a display device substrate according to a fifth embodiment.

The display device substrate of this embodiment is, for example, a second black layer 18 disposed between the transparent substrate 15 and the first conductive metal oxide layer 1 of the display device substrate shown in FIG. 1. The display device substrate of this embodiment can be provided as a modification of the plurality of embodiments described above.

In forming the second black layer 18, the same color material and transparent resin as the black layer 4 can be used. The reflectance at the interface between the transparent substrate 15 and the second black layer 18 can be suppressed to 3% or less in the visible region of light by adjusting the amount of color material and the thickness of the film.

The manufacturing method of this embodiment differs from the fourth embodiment only in that the coating of the second black layer 18 and the hard film step are added as the initial steps, and the remaining main steps are the same as those of the fourth embodiment.

18 is a partial cross-sectional view showing each manufacturing step of a display device substrate according to an embodiment of the present invention.

As shown in o of FIG. 18, the second black layer 18 is coated on the transparent substrate 15 and hardened. The hard coating may be used in combination with light, but it is simpler to harden the coating by, for example, a heat treatment at 250 ° C. The material of the second black layer 18 may be the same as that of the black layer 4 of the first embodiment. In this embodiment, the film thickness of the second black layer 18 is set to about 0.5 μm.

The steps shown in a to c of FIG. 18 are the same as the manufacturing method of the display device according to the first to third embodiments.

The film thickness of the black wiring pattern 4a shown in FIG. 18D is 1.1 μm, and the film thickness of the terminal portion pattern 4b of the terminal portion 5 corresponding to the 40% transmittance portion of the halftone mask is 0.5 μm. The thickness of the second black layer 18 exposed between the patterns of the black wiring patterns 4a shown in d of FIG. 18 It was 0.5 μm. For the display device substrate in this state, by setting the dry etching amount to 0.6 μm, the second black layer 18 exposed between the pattern corresponding to the terminal portion pattern 4b and the black wiring pattern 4a of the terminal portion 5 can be subjected to a dry etching step. Remove completely. The display device substrate shown in e in FIG. 18 is a display device substrate that has been subjected to this dry etching step.

For example, in the liquid crystal display device shown in FIG. 6, when viewed from the direction V of the viewer, light reflection from the metal layer 2 (reflection of external light such as indoor light and sunlight) may result in reduced visibility. In this embodiment, the second black layer 18 is added between the transparent substrate 15 and the first conductive metal oxide layer 1. When viewed from the direction V of the viewer, the transparent substrate 15 and Since the reflectance of light at the interface of the second black layer 18 is 3% or less, it can be said that it has an excellent structure from the viewpoint of visibility.

That is, according to the display device substrate, the display device, and the method for manufacturing a display device substrate according to this embodiment, the same effects as those of the above embodiment can be obtained, and a decrease in visibility can be further avoided.

Next, a display device substrate, a display device, and a method for manufacturing a display device substrate according to a sixth embodiment will be described.

FIG. 19 is a diagram for explaining a display device substrate according to a sixth embodiment, and is a display device substrate in which black wirings 6 and red pixels R, green pixels G, and blue pixels B of a color filter layer are disposed on different surfaces; FIG. Partial sectional view.

The display device substrate 100 of this embodiment includes a transparent substrate 15, black wirings 6, a black matrix BM, a color filter layer (red pixels R, green pixels G, and blue pixels B) and a transparent resin layer 9.

In the display device of the plurality of embodiments described herein including this embodiment, it can be applied to the surface of the display device substrate (upward of the deflection plate in the liquid crystal display device), and the strength can be adhered through an adhesive or the like. Structure that covers glass or polarizer.

In a modified example of the display device substrate of the present embodiment, the black wiring 6 and the color filter layer are disposed on upper layers on different surfaces of the transparent substrate 15. That is, the transparent substrate 15 has a pair of main surfaces facing each other, a black wiring 6 is arranged on one main surface, and a color filter layer is arranged on the other main surface. In this embodiment, the color filter layer is located on the liquid crystal layer side, and the black wiring 6 is located at the position where the black layer 4 can be recognized by the observer V through the transparent substrate 15.

The surface of the black layer 4 is covered with, for example, a polarizing plate (not shown) via an adhesive. In this case, as compared with when the surface of the black layer 4 is covered with air, the surface reflection of the black layer 4 itself becomes approximately half the reflectance. For example, the refractive index of the adhesive is about 1.5. The reflectance at the interface between the black layer 4 and the adhesive is a low reflectance of 3% or less in a visible region with a wavelength of light of 400 nm to 700 nm. In addition, the reflectance was measured using a micro spectrometer, and the reference was an aluminum plate.

The black matrix BM is arranged in a grid pattern on the transparent substrate 15. The portion of the black matrix BM extending in the Y direction is opposed to the black wiring 6 through the transparent substrate 15. The structure of the display device substrate of this embodiment other than the above is the same as that of the display device substrate of the first embodiment.

20 is a partial cross-sectional view of a display device including an embodiment of the display device substrate shown in FIG. 19.

The configurations of the array substrate 35 and the liquid crystal layer 30 are the same as those of the display device according to the first embodiment described above, except for the configuration of the touch metal wiring 37. The touch metal wiring 37 can be formed simultaneously with, for example, a gate electrode or a source electrode (or a drain electrode) of a transistor (active element) (not shown) in the same metal wiring manufacturing step.

The liquid crystal layer 30 can be aligned and controlled by an electric field generated by a voltage applied to the pixel electrode 36 and the common electrode 32 included in the array substrate 35. The liquid crystal driving system is the same FFS method as the first embodiment, and the liquid crystal layer 30 is aligned parallel to the surface of the array substrate 35.

In the liquid crystal display device of this embodiment, the capacitance C4 for touch sensing is formed between the black wiring 6 and the touch metal wiring 37 arranged on the array substrate 35. When the transistor is a top-gate structure, a metal layer may be formed at the same time as the touch metal wiring 37, and the metal layer forms a light-shielding layer covering a channel layer of the transistor. The channel layer of the active device is omitted, and an oxide semiconductor or a polycrystalline silicon semiconductor can be used.

In the touch sensing driving, the black wiring 6 and the touch metal wiring 37 can also be used as the detection electrodes and the driving electrodes.

In addition, in this embodiment, since the method of forming the black wiring 6 on the transparent substrate 15 is the same as that of the first to third embodiments, the description is omitted.

According to the display device substrate, the display device, and the method for manufacturing a display device substrate of this embodiment, it is possible to obtain the same effects as those of the above embodiment.

Next, a display device substrate, a display device, and a method for manufacturing a display device substrate according to a seventh embodiment will be described.

FIG. 21 is a diagram for explaining a display device substrate according to a seventh embodiment, and is a display device substrate in which the black wiring 6 and the red pixels R, green pixels G, and blue pixels B of the color filter layer are disposed on different surfaces. Partial sectional view.

The display device substrate 200 according to this embodiment has the same configuration as the display device substrate 100 shown in FIG. 19 except that it further includes a transparent conductive film wiring 7 disposed on the transparent resin layer 9.

22 is a partial cross-sectional view of a display device including an embodiment of a display device substrate shown in FIG. 21. In addition, in FIG. 22, the designations of a polarizing plate, a retardation plate, an alignment film, a backlight unit, a gate line and a source line connected to a transistor, that is, an active element, are omitted.

The array substrate 45 and the liquid crystal layer 30 of the display device of this embodiment have the same configuration as the array substrate 45 of the display device of the second embodiment shown in FIG. 13, for example. That is, the liquid crystal layer 30 is driven by a voltage applied between the pixel electrode 36 and the transparent conductive film wiring 7 which is a common electrode. The liquid crystal driving voltage applied between the pixel electrode 36 and the transparent conductive film wiring 7 is a so-called vertical electric field applied in the Z direction (thickness direction of the liquid crystal layer 30). The transparent conductive film wiring 7 is formed of a transparent conductive film called ITO.

The capacitance C5 related to touch sensing is formed between, for example, the black wiring 6 and the transparent conductive film wiring 7. The arrangement of the black wirings 6 is arranged in a stripe pattern shape in the Y direction perpendicular to the paper surface. Column. A plan view of the display device substrate 200 viewed from the viewer direction V is the same as that of FIG. 14. The channel layer of the active device is omitted, and an oxide semiconductor or a polycrystalline silicon semiconductor can be used.

According to the display device substrate, the display device, and the method for manufacturing a display device substrate of this embodiment, the same effects as those of the above embodiment can be obtained.

That is, according to the plurality of embodiments described above, it is possible to provide a touch sensing that is capable of reducing the re-reflection of light emitted from a light source of a display device such as a backlight in a state of high adhesion to a substrate belonging to alkali-free glass. A display device substrate with wiring, and the touch sensing wiring is a low-resistance and alkali-resistant black wiring.

In addition, according to the plurality of embodiments described above, it is possible to provide a display device with high resolution and capable of responding to high-speed touch input, a display device substrate used for the display device, and a display device substrate provided with a color filter.

In addition, according to the plurality of embodiments described above, it is possible to provide a display device substrate capable of stable electrical mounting.

The display device substrate, the display device, and the method for manufacturing a display device substrate of the plurality of embodiments described above can be applied in various changes without changing the spirit of the invention.

For example, the display device of the plurality of embodiments described above can have various applications. Examples of electronic devices that can be used as the display device of the plurality of embodiments include mobile phones, portable game consoles, personal digital assistants, personal computers, e-books, video cameras, and digital cameras. still camera), headset (head-mounted) displays, navigation systems, sound playback devices (car audio, digital audio player, etc.), photocopiers, fax machines, printers, multi-function business Machine, automatic vending machine, automatic teller machine (ATM), personal authentication device, optical communication device, etc. Each of the above embodiments can be used in any combination.

In short, the present invention is not limited to the embodiment described above, and the constituent elements can be modified and embodied within a range that does not depart from the gist of the implementation stage. In addition, various inventions can be formed by appropriately combining a plurality of constituent elements disclosed in the above embodiments. For example, several constituent elements may be deleted from all the constituent elements shown in the embodiment. Furthermore, constituent elements of different embodiments may be appropriately combined.

Claims (15)

A display device substrate includes a transparent substrate, which is an alkali-free glass, and black wiring, which is arranged on the transparent substrate, is disposed between a plurality of pixels, and includes a first conductive metal oxide layer, A metal layer disposed on the first conductive metal oxide layer, a second conductive metal oxide layer disposed on the metal layer, and a black layer disposed on the second conductive metal oxide layer; The black wiring is extended in the first direction, and a plurality of the black wirings are arranged at a predetermined interval in the second direction that is substantially orthogonal to the first direction. The black wiring includes a routing wire, and the routing wire extends to The outside of the display area including the plurality of pixels, and a terminal portion exposing the second conductive metal oxide layer is provided at an end portion; the metal layer is formed of copper or a copper alloy; and the black layer is mainly composed of carbon. Color material; the first and second conductive metal oxide layers are formed of a mixed oxide of indium oxide and zinc oxide and tin oxide; the first conductive metal oxide layer The metal layer, the second conductive metal oxide layer and the black layer system is line width and the like. For example, the display device substrate of claim 1, wherein the atomic ratio represented by In / (In + Zn + Sn) of indium (In) and zinc (Zn) and tin (Sn) contained in the foregoing mixed oxide is greater than 0.8, And the atomic ratio of Zn / Sn is greater than 1. For example, the display device substrate of claim 1, wherein the content of carbon contained in the black layer is within a range of 4% by mass to 50% by mass. The display device substrate according to claim 1, further comprising a black oxide layer for oxidizing a metal at an interface between the first conductive metal oxide layer and the metal layer. The display device substrate according to claim 1, further comprising a second black layer at an interface between the transparent substrate and the first conductive metal oxide layer, and the second black layer has an equal line width with the black wiring. The display device substrate according to claim 1, wherein a transparent resin layer is laminated on the black wiring so as to cover at least the display area. For example, the display device substrate of claim 1, wherein a color filter layer and a transparent resin layer are laminated on the upper layer of the black wiring, and the color filter layer includes a red color filter disposed on each of the plurality of pixels. The colored layer, the blue colored layer, and the green colored layer, and the transparent resin layer covers the display area on the color filter layer. A method for manufacturing a display device substrate. The display device substrate is provided with black wiring. The black wiring is provided with a display area of a plurality of pixels on a transparent substrate belonging to an alkali-free glass. The plurality of pixels are distinguished and extended to the display area. The outer end portion has a terminal portion, and the method for manufacturing a display device substrate includes a film forming step of forming a first conductive metal oxide layer on a transparent substrate belonging to an alkali-free glass and consisting of a copper layer or a copper alloy layer A metal layer and a second conductive metal oxide layer; the coating step includes coating a black photosensitive liquid containing at least carbon and an alkali-soluble acrylic resin on the second conductive metal oxide layer and drying it to produce Black film; the pattern forming step of the black film is performed by using a half-tone mask provided with the first pattern of the black wiring and the second pattern of the terminal portion having a light transmittance different from that of the first pattern, and using The alkaline developing solution selectively removes the black film on the transparent substrate, and a thick black film remains as a pattern of the black wiring. Forming a thin black film as a pattern of the terminal portion; the wet etching step is to wet-etch a metal layer that is not formed of the first conductive metal oxide layer, the copper layer or the copper alloy layer, and The part covered by the three black films of the second conductive metal oxide layer is removed; and in the dry etching step, a part of the surface of the thick black film is removed in the film thickness direction by the dry etching method to be used as the black color. Pattern of the wiring, and the thin black film is removed as the pattern of the terminal portion so that the surface of the second conductive oxide layer of the terminal portion is exposed; black wiring is formed on the transparent substrate, and the black wiring is the first 1 A conductive metal oxide layer, a metal layer composed of a copper layer or a copper alloy layer, a second conductive metal oxide layer, and a black layer mainly composed of carbon are sequentially laminated with a constant line width. A display device includes the display device substrate according to any one of claims 1 to 7, an array substrate fixed opposite to the display device substrate, and a display device disposed between the display device substrate and the array substrate. In the liquid crystal layer, the array substrate is in a plan view, and includes: an active element disposed adjacent to a plurality of pixels and overlapping the black wiring; a metal wiring electrically connected to the active element; and Touch metal wiring extending in a direction where the wiring crosses. The display device according to claim 9, wherein the active element is a transistor having a channel layer, and the channel layer is formed of two or more mixed metal oxides of gallium, indium, zinc, tin, germanium, magnesium, and aluminum. The display device according to claim 10, wherein the array substrate further includes a light shielding pattern covering the channel layer, and the touch metal wiring and the light shielding pattern are arranged on a same layer. The display device according to claim 9, wherein the alignment system of the liquid crystal layer is parallel to the surface of the array substrate. A display device includes a display device substrate of claim 6 or 7 and an array substrate bonded to each other across a liquid crystal layer. The display device substrate is in a plan view and further provided on the transparent resin layer. The plurality of transparent conductive film wirings intersecting the black wirings, and the array substrate has an active element at a position adjacent to the plurality of pixels and a position overlapping the black wirings in a plan view. The display device according to claim 13, wherein the active element is a transistor having a channel layer, and the channel layer is formed of two or more mixed metal oxides of gallium, indium, zinc, tin, germanium, magnesium, and aluminum. The display device according to claim 13, wherein the alignment system of the liquid crystal layer is perpendicular to the surface of the array substrate.