TWI661176B - Three-dimensional measurement device, three-dimensional measurement method, and manufacturing method of substrate - Google Patents
Three-dimensional measurement device, three-dimensional measurement method, and manufacturing method of substrate Download PDFInfo
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- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
- G01B11/25—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures by projecting a pattern, e.g. one or more lines, moiré fringes on the object
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- G—PHYSICS
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- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/04—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness specially adapted for measuring length or width of objects while moving
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- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B30/00—Optical systems or apparatus for producing three-dimensional [3D] effects, e.g. stereoscopic images
- G02B30/50—Optical systems or apparatus for producing three-dimensional [3D] effects, e.g. stereoscopic images the image being built up from image elements distributed over a 3D volume, e.g. voxels
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Abstract
提供一種可使採用光度立體攝影法的測定精度提升的三 次元測定裝置等。 Provided is a method for improving the measurement accuracy of photometric stereo photography. Dimensional measurement device, etc.
三次元測定裝置具有:高度測定部、三次元形狀測 定部、及補正部。前述高度測定部構成為:對測定對象物的預定位置的高度、或高度位移進行測定。前述三次元形狀測定部構成為:藉由光度立體攝影法,來測定前述測定對象物的三次元形狀。前述補正部構成為:根據以前述高度測定部所得的資料,補正以前述三次元形狀測定部所得的資料。 The three-dimensional measuring device includes a height measuring unit and a three-dimensional shape measuring device. Fixed part and correction part. The height measurement unit is configured to measure a height or a height displacement of a predetermined position of a measurement object. The three-dimensional shape measurement unit is configured to measure the three-dimensional shape of the measurement object by a photometric stereography method. The correction unit is configured to correct data obtained by the three-dimensional shape measurement unit based on data obtained by the height measurement unit.
Description
本技術是關於測定測定對象物的三次元形狀的三次元測定裝置等技術。 This technology relates to a technology such as a three-dimensional measurement device for measuring a three-dimensional shape of a measurement object.
自以往以來,有一種使用光度立體攝影法(Photometric Stereo)的三次元形狀的測定方法。在光度立體攝影法中,首先,藉由光的照射方向不同的3個以上的照明,對測定對象物輪流照射光,在每次切換照明時,即藉由攝像部對測定對象物進行攝像。接著,根據藉由攝像部所得的3枚以上的圖像,取得測定對象物的表面的各點中的法線方向作為法線圖。 Conventionally, there is a method for measuring a three-dimensional shape using a photometric stereo method (Photometric Stereo). In the photometric stereography method, first, the measurement object is irradiated with light in turn by three or more illuminations having different light irradiation directions. Each time the illumination is switched, the measurement object is imaged by the imaging unit. Next, based on three or more images obtained by the imaging unit, a normal direction at each point on the surface of the measurement target is obtained as a normal map.
藉此,可三次元地測定測定對象物。其中,若存在照射方向不同的光被照射在測定對象物而被攝像到的3枚以上的圖像,即可使用光度立體攝影法來測定測定對象物的三次元形狀。 Thereby, the measurement object can be measured in three dimensions. Among them, if there are three or more images captured by light with different irradiation directions on the measurement object, the three-dimensional shape of the measurement object can be measured using photometric stereography.
在專利文獻1中是揭示一種使用光度立體攝影法,來檢査被印刷焊材的基板、或裝載有電子零件的基板的外觀的外觀檢査裝置。 Patent Document 1 discloses an appearance inspection device for inspecting the appearance of a substrate on which a solder material is printed or a substrate on which electronic components are mounted using a photometric stereography method.
【專利文獻1】日本特開2010-237034號公報 [Patent Document 1] Japanese Patent Laid-Open No. 2010-237034
一般而言,適用光度立體攝影法時,以測定對象物的測定面進行擴散反射(朗伯反射(Lambertian reflectance))、及形狀變化呈線型作為條件。測定面的形態離該條件愈遠,藉由光度立體攝影法所致之測定資料的誤差愈大。 Generally, when the photometric stereography method is applied, it is conditional that diffuse reflection (Lambertian reflectance) is performed on the measurement surface of the measurement object and that the shape changes linearly. The further the morphology of the measurement surface is from this condition, the greater the error in the measurement data caused by the photometric stereography method.
本技術之目的在提供一種可使採用光度立體攝影法的測定精度提升的三次元測定裝置等。 An object of the present technology is to provide a three-dimensional measurement device and the like that can improve the measurement accuracy using a photometric stereophotography method.
為達成上述目的,本技術之三次元測定裝置是具備有:高度測定部、三次元形狀測定部、及補正部。 To achieve the above object, the three-dimensional measurement device of the present technology includes a height measurement section, a three-dimensional shape measurement section, and a correction section.
前述高度測定部是構成為:對測定對象物的預定位置的高度、或高度位移進行測定。 The height measurement unit is configured to measure a height or a height displacement of a predetermined position of a measurement object.
前述三次元形狀測定部是構成為:藉由光度立體攝影法,來測定前述測定對象物的三次元形狀。 The three-dimensional shape measurement unit is configured to measure the three-dimensional shape of the measurement object by a photometric stereography method.
前述補正部是構成為:根據以前述高度測定部所得的資料,補正以前述三次元形狀測定部所得的資料。 The correction unit is configured to correct data obtained by the three-dimensional shape measurement unit based on data obtained by the height measurement unit.
該三次元測定裝置是根據以前述高度測定部所得的高精度的資料,來補正在藉由光度立體攝影法所為之 測定所得的資料,因此可使採用光度立體攝影法的測定精度提升。 This three-dimensional measurement device is based on the high-accuracy data obtained by the height measurement unit, and compensates for the photometric stereo photography method. The data obtained by the measurement can improve the measurement accuracy by the photometric stereo method.
前述三次元形狀測定部亦可包含光度立體攝影圖像取得部,該光度立體攝影圖像取得部是構成為:以攝像元件對包含被藉由3個以上的光源分別個別地照射光的測定對象物的區域進行攝影,藉此取得3個以上的圖像。藉此,可進行藉由光度立體攝影法所為之三次元形狀的測定。 The three-dimensional shape measurement unit may include a photometric stereo image acquisition unit configured to use a camera element to measure an object including light that is individually irradiated by three or more light sources. An area of an object is photographed to obtain three or more images. Thereby, the measurement of the three-dimensional shape by the photometric stereography method can be performed.
前述三次元測定裝置亦可更具備有圖像處理部。 The three-dimensional measurement device may further include an image processing unit.
前述圖像取得部亦可構成為:以前述攝像元件對被包含藉由前述3個以上的光源進行之照射方向之光照射到的前述測定對象物進行攝影,藉此取得包含前述測定對象物的圖像。 The image acquisition unit may be configured to capture the measurement object including the measurement object by using the imaging element to capture the measurement object that is irradiated with light including an irradiation direction by the three or more light sources. image.
前述圖像處理部亦可構成為:擷取前述圖像取得部所得之包含前述測定對象物的圖像內的複數個區域。圖像處理部是藉由將包含測定對象物的圖像區分為複數個區域,可進行根據該等區域之藉由高度測定部及/或三次元形狀測定部所為之測定,可提高測定精度。 The image processing unit may be configured to capture a plurality of regions in the image including the measurement object obtained by the image acquisition unit. The image processing unit can divide an image including a measurement object into a plurality of regions, and can perform measurement by the height measurement unit and / or the three-dimensional shape measurement unit based on these regions, thereby improving measurement accuracy.
前述高度測定部亦可沿著橫穿在前述圖像處理部所得的前述複數個區域的線,測定前述測定對象物的高度。其中,若有2點以上作為測定點,即可構成線段,若有3點以上作為測定點,則可構成面,因此可更加提高精度。 The height measurement unit may measure the height of the measurement object along a line crossing the plurality of regions obtained by the image processing unit. Among them, if there are more than two points as the measurement points, a line segment can be formed, and if there are more than three points as the measurement points, a surface can be formed, so the accuracy can be further improved.
前述三次元形狀測定部亦可按每個藉由前述圖 像處理部所擷取的每個區域,測定前述三次元形狀。 The three-dimensional shape measurement unit may For each area captured by the image processing unit, the aforementioned three-dimensional shape is measured.
前述補正部亦可根據以前述高度測定部所得的資料、與以前述三次元形狀測定部所得的資料的差,對以前述三次元形狀測定部所得的資料進行補正。藉此,補正部是可求出以前述高度測定部所得的資料、與以前述三次元形狀測定部所得的資料的誤差,根據該誤差來進行補正。 The correction unit may correct the data obtained by the three-dimensional shape measurement unit based on a difference between the data obtained by the height measurement unit and the data obtained by the three-dimensional shape measurement unit. With this, the correction unit can obtain an error between the data obtained by the height measurement unit and the data obtained by the three-dimensional shape measurement unit, and correct the error based on the error.
前述補正部亦可由以前述三次元形狀測定部所得的資料,將前述差的部分去除。 The correction unit may remove the difference from the data obtained by the three-dimensional shape measurement unit.
前述高度測定部亦可具有位移計。藉由使用位移計,藉由高度測定部所致之測定精度會提升。 The height measurement unit may include a displacement meter. By using a displacement meter, the accuracy of measurement by the height measuring section is improved.
本技術之其他形態之三次元測定裝置是具備有:3個以上的光源、攝像元件、高度測定部、三次元形狀測定部、及補正部。 A three-dimensional measurement device according to another aspect of the present technology includes three or more light sources, an image sensor, a height measurement section, a three-dimensional shape measurement section, and a correction section.
接著,前述攝像元件是可對測定對象物進行攝影。 Next, the imaging element is capable of capturing an object to be measured.
接著,前述高度測定部是構成為:用以對前述測定對象物的預定位置的高度、或高度位移進行測定。 Next, the height measurement unit is configured to measure a height or a height displacement of a predetermined position of the measurement object.
接著,前述三次元形狀測定部是構成為:使用前述3個以上的光源及前述攝像元件,藉由光度立體攝影法,測定前述測定對象物的三次元形狀。接著,前述補正部是構成為:根據以前述高度測定部所得的資料,將以前述三次元形狀測定部所得的資料進行補正。 Next, the three-dimensional shape measurement unit is configured to measure the three-dimensional shape of the measurement target by a photometric stereo photographic method using the three or more light sources and the imaging element. Next, the correction unit is configured to correct the data obtained by the three-dimensional shape measurement unit based on the data obtained by the height measurement unit.
前述三次元測定裝置亦可更具備有:保持部,其是保持作為前述測定對象物的基板;支持部,其是被配置 在前述保持部上,且一體地支持前述攝像元件及前述3個以上的光源;及移動機構,其是使前述保持部及前述支持部作相對移動。 The three-dimensional measurement device may further include: a holding portion that holds a substrate as the measurement object; and a support portion that is disposed. The holding portion integrally supports the imaging element and the three or more light sources; and a moving mechanism that relatively moves the holding portion and the supporting portion.
本技術之三次元測定方法是包含對測定對象物的預定位置的高度、或高度位移進行測定。 The three-dimensional measurement method of the present technique includes measuring a height or a height displacement of a predetermined position of a measurement object.
接著,藉由光度立體攝影法,測定前述測定對象物的三次元形狀。 Next, the three-dimensional shape of the measurement object is measured by a photometric stereography method.
接著,根據以前述高度或高度位移測定所得的資料,對以前述三次元形狀的測定所得的資料進行補正。 Next, based on the data obtained by measuring the height or the height displacement, the data obtained by measuring the three-dimensional shape is corrected.
本技術之用以進行三次元測定的程式是使三次元測定裝置執行以下各步驟。該等步驟是測定測定對象物的預定位置的高度、或高度位移的步驟;藉由光度立體攝影法,測定前述測定對象物的三次元形狀的步驟;及根據以前述高度或高度位移測定所得的資料,對以前述三次元形狀的測定所得的資料進行補正的步驟。 The program used in this technology to perform three-dimensional measurement is to make the three-dimensional measurement device perform the following steps. These steps are a step of measuring the height or displacement of a predetermined position of the measurement object; a step of measuring the three-dimensional shape of the measurement object by a photometric stereo method; and Data, a step of correcting the data obtained by measuring the three-dimensional shape described above.
本技術之基板之製造方法是包含在基板上,安裝零件或形成焊材。 The manufacturing method of the substrate of the present technology is to include a component on a substrate, mount a component, or form a solder.
測定前述基板上的前述零件或前述焊材的預定位置的高度、或高度位移。 The height or the height displacement of a predetermined position of the component or the solder on the substrate is measured.
接著,藉由光度立體攝影法,測定前述零件或焊材的三次元形狀。 Next, the three-dimensional shape of the aforementioned part or welding material is measured by a photometric stereography method.
接著,根據以前述高度或高度位移測定所得的資料,對以前述三次元形狀的測定所得的資料進行補正。 Next, based on the data obtained by measuring the height or the height displacement, the data obtained by measuring the three-dimensional shape is corrected.
以上,藉由本技術,可使採用光度立體攝影法的測定精度提升。 As described above, with this technology, the measurement accuracy using the photometric stereo method can be improved.
其中,在此記載的效果必非受到限定者,亦可為在本揭示中所記載之任何效果。 However, the effects described herein are not necessarily limited, and may be any effects described in this disclosure.
1‧‧‧基板 1‧‧‧ substrate
3‧‧‧對準標記 3‧‧‧ alignment mark
10‧‧‧搬送部 10‧‧‧Transportation Department
11‧‧‧導件 11‧‧‧Guide
12‧‧‧腳部 12‧‧‧foot
13‧‧‧輸送帶 13‧‧‧ conveyor belt
15‧‧‧控制部 15‧‧‧Control Department
16‧‧‧圖像處理部 16‧‧‧Image Processing Department
17‧‧‧圖像記憶部 17‧‧‧Image Memory
20‧‧‧備用部 20‧‧‧ spare
21‧‧‧備用板 21‧‧‧spare board
22‧‧‧支持銷 22‧‧‧Support sales
30‧‧‧攝像單元 30‧‧‧ camera unit
31‧‧‧攝像元件 31‧‧‧ camera element
32‧‧‧照明部 32‧‧‧Lighting Department
32a‧‧‧圓頂構件 32a‧‧‧dome
32b‧‧‧照明 32b‧‧‧lighting
33‧‧‧雷射位移計 33‧‧‧laser displacement meter
40‧‧‧移動機構 40‧‧‧ mobile agency
100‧‧‧檢査裝置 100‧‧‧Inspection device
PA‧‧‧攝影區域 PA‧‧‧Photographing area
P1‧‧‧安裝面 P1‧‧‧Mounting surface
P2‧‧‧電子零件 P2‧‧‧Electronic parts
圖1是顯示適用本技術之三次元測定裝置的檢査裝置的斜視圖。 FIG. 1 is a perspective view showing an inspection device to which a three-dimensional measurement device of the present technology is applied.
圖2是以安裝基板的搬送方向觀看圖1所示之檢査裝置的圖。 FIG. 2 is a view of the inspection device shown in FIG. 1 when viewed from a conveyance direction of a mounting substrate.
圖3是以Z方向觀看的攝像單元的概略圖。 FIG. 3 is a schematic diagram of an imaging unit viewed in the Z direction.
圖4是以功能顯示檢査裝置的電性構成的區塊圖。 FIG. 4 is a block diagram showing an electrical configuration of a functional inspection device.
圖5是顯示藉由檢査裝置所為之動作的流程圖。 FIG. 5 is a flowchart showing operations performed by the inspection device.
圖6是顯示藉由攝像元件所得之攝影區域之例。 FIG. 6 shows an example of an imaging area obtained by an imaging element.
圖7是用以說明藉由步驟106所被擷取的圖像內的區域的分類的圖。 FIG. 7 is a diagram for explaining classification of regions in the image captured in step 106.
圖8是顯示測定對象物的測定面與空間的座標系的關係。 FIG. 8 shows the relationship between the measurement surface of the measurement object and the coordinate system of the space.
圖9是顯示利用藉由光度立體攝影法所被計算的梯度場的資料所得之曲線。 FIG. 9 is a graph showing data obtained using gradient field data calculated by a photometric stereo method.
圖10是顯示藉由補正後的梯度場的資料所得之曲線。 FIG. 10 is a graph showing data obtained from corrected gradient field data.
以下一邊參照圖示,一邊說明本技術之實施形態。 Hereinafter, embodiments of the present technology will be described with reference to the drawings.
1.適用三次元測定裝置的檢査裝置的構成 1. Structure of inspection device to which three-dimensional measurement device is applied
1)檢査裝置的構成 1) Configuration of inspection device
圖1是顯示適用本技術之三次元測定裝置的檢査裝置的斜視圖。圖2是以安裝基板的搬送方向觀看圖1所示之檢査裝置100的圖。 FIG. 1 is a perspective view showing an inspection device to which a three-dimensional measurement device of the present technology is applied. FIG. 2 is a diagram of the inspection device 100 shown in FIG. 1 when viewed from the conveyance direction of the mounting substrate.
該檢査裝置100是例如藉由安裝機而在安裝基板等基板安裝電子零件之後,檢查基板上的電子零件的安裝狀態的裝置。 The inspection apparatus 100 is an apparatus that inspects a mounting state of an electronic component on a substrate after the electronic component is mounted on a substrate such as a mounting substrate by a mounting machine.
檢査裝置100是具有沿著搬送方向(X方向)搬送基板1,使所被搬送的基板1停止在預定位置的搬送部10。檢査裝置100是具有由下方支持被停止在停止目標位置的基板1的備用部20。 The inspection apparatus 100 includes a transfer unit 10 that transfers a substrate 1 in a transfer direction (X direction) and stops the transferred substrate 1 at a predetermined position. The inspection apparatus 100 is a backup unit 20 having a substrate 1 that is stopped at a stop target position by being supported from below.
檢査裝置100是具有:攝像單元30、及使攝像單元30朝X及Y方向移動的移動機構40,該攝像單元30是具有:對被支持在備用部20的基板1照射光的照明部32、及對被照射到光的基板1進行攝影的攝像元件31。 The inspection device 100 includes an imaging unit 30 and a moving mechanism 40 that moves the imaging unit 30 in the X and Y directions. The imaging unit 30 includes an illumination unit 32 that irradiates light to the substrate 1 supported by the spare unit 20. And an imaging element 31 that images the substrate 1 irradiated with light.
成為藉由檢査裝置100所得之檢査對象的基板1係具有例如在平面視下呈矩形的形狀。在基板1上是設有複數個對準標記3(參照圖1)。在圖1中是顯示對準標記3被設在基板1之對角線上的角部近傍之情形之一例。 The substrate 1 to be an inspection target obtained by the inspection device 100 has a rectangular shape in a plan view, for example. The substrate 1 is provided with a plurality of alignment marks 3 (see FIG. 1). FIG. 1 shows an example of a case where the alignment mark 3 is provided near the corner of the diagonal line of the substrate 1.
搬送部10是具有:由兩側夾持基板1而將基板1沿著搬送方向進行導引的2個導件11。各導件11是具有朝基板1的搬送方向呈長形的形狀的板狀構件。在各導件11的下側是分別設有由下方支持導件11的複數個腳部12。各導件 11是透過該腳部12而被安裝在檢査裝置100的基台(未圖示)上。 The transfer unit 10 includes two guides 11 that sandwich the substrate 1 on both sides and guide the substrate 1 in the transfer direction. Each guide 11 is a plate-shaped member having a shape elongated in the conveying direction of the substrate 1. A plurality of leg portions 12 are respectively provided below the guides 11 to support the guides 11 below. Each guide Reference numeral 11 denotes a base (not shown) mounted on the inspection apparatus 100 through the leg portion 12.
備用部20是具有:構成為可升降的備用板21、及被立設在該備用板21上的複數個支持銷22。 The backup unit 20 includes a backup plate 21 configured to be movable up and down, and a plurality of support pins 22 erected on the backup plate 21.
在各導件11的內側的側面是分別設有可正反旋轉的輸送帶13。搬送部10是可藉由該輸送帶13的驅動,將基板1搬送至進行檢査處理的預定位置(配置備用部20的位置),或搬出已結束檢査的基板1。 Conveyor belts 13 that can rotate forward and backward are provided on the inner side surfaces of each guide 11. The transfer unit 10 can drive the substrate 1 to a predetermined position (a position where the standby unit 20 is disposed) for carrying out inspection processing by the drive of the conveyor belt 13 or to carry out the substrate 1 after the inspection has been completed.
各導件11是以上端部朝向內側被折曲的方式形成。導件11的上端部是當藉由備用部20,基板1被移動至上方時,將基板1抵接於上側,藉此可利用該上端部及備用部20來夾持基板1的兩側。藉此,基板1被保持,在被保持的狀態下,進行藉由攝像單元30所為之檢査處理。此時,搬送部10或備用部20是作為保持基板的「保持部」來發揮功能。 Each guide 11 is formed so that an upper end portion may be bent toward the inside. The upper end portion of the guide 11 is when the substrate 1 is moved upward by the standby portion 20, and the substrate 1 is abutted to the upper side, so that both sides of the substrate 1 can be clamped by the upper end portion and the standby portion 20. Thereby, the board | substrate 1 is hold | maintained, and the inspection process by the imaging unit 30 is performed in the hold | maintained state. At this time, the transfer section 10 or the standby section 20 functions as a “holding section” that holds a substrate.
圖3是以Z方向觀看的攝像單元30的概略圖。攝像單元30的照明部32是具有:在其頂部形成有開口的圓頂形狀的圓頂構件32a、及被配置在圓頂構件32a的內側的3個以上的照明(光源)32b。1個照明32b是例如藉由1個或複數個LED(Light Emitting Diode,發光二極體)所構成。照明32b是設有例如8個,被配置在以攝像單元30的主光軸(Z方向)為中心的圓周上。該等照明32b是例如以等角度間隔設置。 FIG. 3 is a schematic diagram of the imaging unit 30 viewed in the Z direction. The illumination unit 32 of the imaging unit 30 includes a dome-shaped dome member 32a with an opening formed on the top thereof, and three or more illuminations (light sources) 32b arranged inside the dome member 32a. One illumination 32b is configured by, for example, one or a plurality of LEDs (Light Emitting Diodes). The illumination 32 b is provided, for example, eight, and is arranged on a circumference centered on the main optical axis (Z direction) of the imaging unit 30. The illuminations 32b are provided at regular angular intervals, for example.
圓頂構件32a是作為一體地支持攝像元件31及複數個照明32b的「支持部」來發揮功能。 The dome member 32 a functions as a “support section” that integrally supports the imaging element 31 and the plurality of illuminations 32 b.
攝像元件31是在照明部32的圓頂構件32a的上側被固定在被設在圓頂構件32a的開口的位置,以其主光軸相對於基板1的檢査面呈垂直的方式作配置。攝像元件31是具有:CCD感測器(CCD:Charge Coupled Device,電荷耦合元件)、或CMOS感測器(CMOS:Complementary Metal Oxide Semiconductor,互補金屬氧化半導體)等攝像元件、及成像透鏡等光學系。 The imaging element 31 is fixed on the upper side of the dome member 32 a of the lighting unit 32 at a position provided in the opening of the dome member 32 a, and is arranged so that its main optical axis is perpendicular to the inspection surface of the substrate 1. The imaging element 31 is an optical system including an CCD sensor (CCD: Charge Coupled Device), a CMOS sensor (CMOS: Complementary Metal Oxide Semiconductor), and an imaging system such as an imaging lens. .
攝像元件31是按照後述控制部15的控制,對基板1上的對準標記3進行攝像,或對基板1的檢査面進行攝像。攝像元件31的攝影區域是被形成為例如35mm×35mm左右。當藉由攝像元件31對基板1的檢査面進行攝像時,攝像元件31是藉由移動機構40而朝X及Y軸方向移動,將必須進行檢査的基板1上的區域分為複數個次進行攝像。此外,攝像元件31是如後所述,被利用在後述測定對象物的三次元測定時。 The imaging element 31 images the alignment mark 3 on the substrate 1 or images the inspection surface of the substrate 1 according to the control of the control unit 15 described later. The imaging area of the imaging element 31 is formed to be, for example, about 35 mm × 35 mm. When the inspection surface of the substrate 1 is imaged by the imaging element 31, the imaging element 31 is moved in the X and Y axis directions by the moving mechanism 40, and the area on the substrate 1 that must be inspected is divided into a plurality of times Video. The imaging element 31 is used in the three-dimensional measurement of a measurement target to be described later, as described later.
在圖示之例中是顯示攝像單元30的數量為1個的情形,惟攝像單元30的數量亦可為2以上。 In the example shown in the figure, the number of the imaging units 30 is one, but the number of the imaging units 30 may be two or more.
檢査裝置100是具備有以可與攝像單元30一體地移動的方式而設置的雷射位移計33。例如雷射位移計33是被安裝在攝像元件31的側部。雷射位移計33是對作為基板1上的測定對象物的電子零件的預定位置中的高度、或高度位移進行測定。 The inspection apparatus 100 includes a laser displacement meter 33 provided so as to be movable integrally with the imaging unit 30. For example, the laser displacement meter 33 is mounted on the side of the imaging element 31. The laser displacement meter 33 measures a height or a height displacement of a predetermined position of an electronic component as a measurement target on the substrate 1.
2)檢査裝置的電性構成 2) Electrical configuration of the inspection device
圖4是以功能顯示檢査裝置100的電性構成的區塊圖。 FIG. 4 is a block diagram showing the electrical configuration of the functional inspection device 100.
檢査裝置100是具備有:控制部15、圖像處理部16、圖像記憶部17。此外,檢査裝置100是具備有:上述移動機構40、雷射位移計33、攝像元件31、及照明部32。 The inspection apparatus 100 includes a control unit 15, an image processing unit 16, and an image memory unit 17. The inspection device 100 includes the moving mechanism 40, a laser displacement meter 33, an imaging element 31, and an illumination unit 32.
圖像處理部16是按照藉由控制部15所為之控制,對在攝像元件31所得之基板1上的圖像進行處理。圖像記憶部17是記憶藉由圖像處理部16所被處理的圖像資料。 The image processing unit 16 processes the image on the substrate 1 obtained by the imaging element 31 in accordance with the control performed by the control unit 15. The image storage unit 17 stores image data processed by the image processing unit 16.
控制部15是至少具備有:例如CPU(Central Processing Unit,中央處理單元)及RAM(Random Access Memory,隨機存取記憶體)、ROM(Read Only Memory,唯讀記憶體)等電腦所使用的硬體要素。控制部15亦可藉由FPGA(Field Programmable Gate Array,現場可程式化邏輯閘陣列)等PLD(Programmable Logic Device,可程式化邏輯元件)、其他ASIC(Application Specific Integrated Circuit,特定應用積體電路)等元件來實現。 The control unit 15 is provided with at least hardware such as a CPU (Central Processing Unit, Central Processing Unit), RAM (Random Access Memory, Random Access Memory), and ROM (Read Only Memory). Body elements. The control unit 15 can also use PLD (Programmable Logic Device) such as FPGA (Field Programmable Gate Array), other ASIC (Application Specific Integrated Circuit) And other components to achieve.
控制部15是可將複數個照明32b個別地進行ON及OFF。控制部15是可例如將至少1個照明32b進行亮燈,亦可將8個全部照明32b同時亮燈。 The control unit 15 can turn on and off the plurality of illuminations 32b individually. The control unit 15 may light up at least one of the lightings 32b, for example, or may light up all eight lightings 32b at the same time.
2.檢査裝置的動作 2. Check the operation of the device
圖5是顯示屬於基板之製造方法的一部分之藉由檢査裝置100所為之動作的流程圖。 FIG. 5 is a flowchart showing operations performed by the inspection apparatus 100 as part of a method of manufacturing a substrate.
控制部15是使攝像單元30移動至藉由搬送部10所被搬入的基板1上,藉由攝像元件31,對基板1上的對準標記進行攝影。藉此,基板1及攝像單元30被相對進行定位(步驟101)。藉此,決定在檢査裝置100的系統內被統一的座 標系。 The control unit 15 moves the imaging unit 30 to the substrate 1 carried in by the carrying unit 10, and images the alignment marks on the substrate 1 by the imaging element 31. Thereby, the substrate 1 and the imaging unit 30 are relatively positioned (step 101). Thereby, it is decided that the seat to be unified in the system of the inspection apparatus 100 Superscript system.
控制部15是使照明32b1個1個地個別亮燈,使用位於一定位置的攝像元件31,在每次進行該亮燈的切換時,即對基板1上的預定區域進行攝影(步驟102)。 The control unit 15 turns on the lights 32b one by one individually, and uses the imaging element 31 located at a certain position to take a picture of a predetermined area on the substrate 1 each time the lighting is switched (step 102).
預定區域(攝影區域PA)是如圖6所示,指被安裝在基板1的安裝面P1上之包含成為測定對象的例如1以上的電子零件P2的區域。 The predetermined area (photographing area PA) is, as shown in FIG. 6, an area including, for example, one or more electronic components P2 to be measured, which is mounted on the mounting surface P1 of the substrate 1.
若存在複數個成為測定對象的電子零件時,亦會有因應此而攝影區域PA成為複數個的情形。或者,攝像元件31是可將包含複數個電子零件P2的1個區域作為1個攝影區域PA進行攝影,亦可將基板1的全體作為1個攝影區域PA進行攝影。亦即,藉由成為測定對象的電子零件的數量、大小、配置、攝像元件31所具有的視角或解析度,可適當設定攝影區域PA。 If there are a plurality of electronic parts to be measured, there may be a case where the imaging area PA is plural in response to this. Alternatively, the imaging element 31 may photograph one area including a plurality of electronic components P2 as one imaging area PA, and may also photograph the entire substrate 1 as one imaging area PA. That is, the imaging area PA can be appropriately set by the number, size, arrangement of the electronic components to be measured, and the viewing angle or resolution of the imaging element 31.
藉由步驟102,控制部15是取得藉由8個不同方向的光所致之測定對象物的8個攝影區域PA的圖像(步驟103)。為方便說明起見,以下是將該等複數個圖像設為「圖像A」。該等複數個(8個)圖像是被利用在供藉由光度立體攝影法所為之三次元形狀測定之用的計算。此時,控制部15是作為「光度立體攝影圖像取得部」來發揮功能。 In step 102, the control unit 15 acquires images of eight imaging areas PA of the measurement object caused by light in eight different directions (step 103). For convenience of explanation, the plurality of images are referred to as "image A" below. The plurality of (8) images are used in calculations for three-dimensional shape determination by photometric stereography. At this time, the control unit 15 functions as a "photometric stereo image acquisition unit".
控制部15是將所攝影到的圖像A透過圖像處理部16而記憶在圖像記憶部17。圖像A可為彩色圖像,亦可為灰階圖像。 The control unit 15 transmits the captured image A to the image storage unit 17 through the image processing unit 16. The image A may be a color image or a grayscale image.
此外,控制部15是在使所有照明32b亮燈的狀態, 亦即將包含8個照明32b的照射方向的光照射在測定對象物的狀態下,使用攝像元件31,對測定對象物進行攝影(步驟104)。藉此,控制部15是取得包含測定對象物的攝影區域PA的1個圖像(步驟105)。此時,控制部15是作為「圖像取得部」來發揮功能。為方便說明起見,以下是將該1個圖像設為「圖像B」。 In addition, the control unit 15 is in a state where all the illuminations 32b are turned on, That is, in a state where the light in the irradiation direction including the eight illuminations 32b is irradiated on the measurement object, the measurement object is photographed using the imaging element 31 (step 104). Accordingly, the control unit 15 acquires one image of the imaging area PA including the measurement target (step 105). In this case, the control unit 15 functions as an "image acquisition unit". For the sake of convenience, this image is referred to as "Image B".
圖像B並不一定為藉由8個所有照明32b的照射所得之圖像,亦可為在8個之中藉由例如位於以光軸為中心點的點對稱位置的預定數量的照明32b的照射所得之圖像。 The image B is not necessarily an image obtained by the irradiation of all eight illuminations 32b, but may also be an image of a predetermined number of illuminations 32b among eight out of which is located at a point-symmetrical position centered on the optical axis. The resulting image is illuminated.
控制部15是將所攝影到的圖像B,透過圖像處理部16而記憶在圖像記憶部17。圖像B可為彩色圖像,亦可為灰階圖像,以形成為與圖像A之該等的選擇為相同者為佳。 The control unit 15 stores the captured image B in the image storage unit 17 through the image processing unit 16. The image B may be a color image or a grayscale image, and it is preferable to form the same as those of the image A.
控制部15是藉由圖像處理部16對圖像B進行解析。圖6是如上所述顯示預定區域(攝影區域PA)的圖像(例如圖像B)之例。在該例中,電子零件P2是電阻等被動元件。圖像處理部16是藉由根據圖像B的像素值(亮度值)的邊緣處理等,由圖像B擷取複數個區域(步驟106)。該複數個區域是成為因位於攝影區域PA內的對象物的材質的不同而被區分的區域。亦即,因材質不同,照明光的反射率及反射方向等反射的形態會不同之故。 The control unit 15 analyzes the image B by the image processing unit 16. FIG. 6 is an example of an image (for example, image B) in which a predetermined area (shooting area PA) is displayed as described above. In this example, the electronic component P2 is a passive element such as a resistor. The image processing unit 16 extracts a plurality of regions from the image B by edge processing or the like based on the pixel values (brightness values) of the image B (step 106). The plurality of areas are areas that are distinguished by the materials of the objects located in the imaging area PA. That is, depending on the material, the reflectance of the illumination light and the reflection form of the reflection direction are different.
圖7是用以說明藉由步驟106所得之區域的分類的圖。區域(1)為基板1的表面(安裝面)P1、區域(2)及(4)為電子零件P2的電極部、區域(3)為電子零件P2的樹脂安裝體 部。 FIG. 7 is a diagram for explaining the classification of the regions obtained in step 106. The area (1) is the surface (mounting surface) P1 of the substrate 1, and the areas (2) and (4) are electrode portions of the electronic component P2, and the area (3) is a resin mounting body of the electronic component P2. unit.
接著,控制部15是藉由控制移動機構40的動作,以橫穿該等所被擷取的複數個區域(1)~(4)的方式,使被支持在攝像單元30的雷射位移計33移動。 Next, the control unit 15 controls the operation of the moving mechanism 40 to make the laser displacement meter supported by the imaging unit 30 traverse the captured areas (1) to (4). 33 moves.
控制部15是一邊將雷射位移計33如上所示進行掃描,一邊使用該雷射位移計33,測定電子零件P2離安裝面P1的高度(步驟107)。亦即,控制部15是測定該電子零件P2的高度(亦即高度位移)。此時,雷射位移計33及控制部15是作為「高度測定部」來發揮功能。 The control unit 15 measures the height of the electronic component P2 from the mounting surface P1 using the laser displacement meter 33 while scanning the laser displacement meter 33 as described above (step 107). That is, the control unit 15 measures the height (ie, the height displacement) of the electronic component P2. At this time, the laser displacement meter 33 and the control unit 15 function as a "height measuring unit".
圖8是顯示測定對象物的測定面R與空間的座標系的關係。控制部15是按每個在步驟106中所擷取的區域,使用光度立體攝影法,生成每個該等區域的梯度場C(p,q)(步驟108)。p=δz/δx、q=δz/δy。此時,至少控制部15是作為「三次元形狀測定部」來發揮功能。 FIG. 8 shows the relationship between the measurement surface R of the measurement object and the coordinate system of the space. The control unit 15 generates a gradient field C (p, q) for each of these regions using the photometric stereo photography method for each of the regions captured in step 106 (step 108). p = δz / δx, q = δz / δy. At this time, at least the control unit 15 functions as a “three-dimensional shape measurement unit”.
具體而言,控制部15是使用已知的各照明32b的相對位置及藉由已知的各照明32b所得之照射方向,根據所被擷取的各區域(1)~(4)內的亮度值等,按每個該等區域,計算p=δz/δx、q=δz/δy。測定點是在例如圖7所示之線段上,按每個區域形成為至少1個點(像素)。 Specifically, the control unit 15 uses the known relative position of each of the illuminations 32b and the irradiation direction obtained by the known each of the illuminations 32b, according to the brightness in each of the captured regions (1) to (4). For each of these areas, p = δz / δx and q = δz / δy are calculated. The measurement point is, for example, a line segment shown in FIG. 7 and is formed into at least one point (pixel) for each region.
在步驟108中所得之梯度場p、q的資料表示包含安裝面P1的電子零件P2的形狀。圖9是顯示根據該梯度場p、q的資料的曲線。該曲線形狀具有與各區域(1)~(4)相對應的形狀。 The data of the gradient fields p and q obtained in step 108 indicates the shape of the electronic component P2 including the mounting surface P1. FIG. 9 is a graph showing data from the gradient fields p, q. The curved shape has a shape corresponding to each of the regions (1) to (4).
接著,控制部15是根據以雷射位移計33所得的資 料,對梯度場p、q進行補正(步驟109)。此時,控制部15是作為「補正部」來發揮功能。將取得按每個區域所被分斷的圖7所示之線上之以雷射位移計33所得的測定資料(pm、qm)、與和該等相對應的梯度場(p、q)的差(誤差)者的集合,分別作為(ep、eq)(參照下式)。n為測定次數,亦即測定點的數量。 Next, the control unit 15 is based on the data obtained by the laser displacement meter 33. It is expected that the gradient fields p and q are corrected (step 109). At this time, the control unit 15 functions as a "correction unit". The measured data (pm, qm) obtained by the laser displacement meter 33 on the line shown in FIG. 7 that is divided for each area will be obtained, and the difference between the measured data (pm, qm) and the corresponding gradient field (p, q) The set of (error) persons is respectively (ep, eq) (refer to the following formula). n is the number of measurements, that is, the number of measurement points.
【數1】ep 1..n=p(x 1..n,y 1..n)-pm(x 1..n,y 1..n) eq 1..n=q(x 1..n,y 1..n)-qm(x 1..n,y 1..n) [Number 1] ep 1..n = p (x 1..n, y 1..n) - pm (x 1..n, y 1..n) eq 1..n = q (x 1. .n , y 1..n ) -qm ( x 1..n , y 1..n )
將根據點列ep1..n、eq1..n所算出的近似式分別設為e(x)、e(y),控制部15是使用下式,來對梯度場C(p,q)進行補正。將所被補正的梯度場設為pf、qf。亦即,所被補正的梯度場pf、qf是表示由藉由光度立體攝影法所得之三次元形狀的測定的資料,去除上述誤差的部分的值。 The approximate expressions calculated from the point sequences ep1..n and eq1..n are respectively set to e (x) and e (y), and the control unit 15 uses the following formula to perform the gradient field C (p, q). Correction. Let the corrected gradient fields be pf and qf. That is, the corrected gradient fields pf and qf are values representing the measurement data of the three-dimensional shape obtained by the photometric stereography method, and the values obtained by removing the above-mentioned errors.
【數2】pf(x,y)=p(x,y)-e(x) qf(x,y)=q(x,y)-e(y) [Number 2] pf ( x , y ) = p ( x , y ) -e ( x ) qf ( x , y ) = q ( x , y ) -e ( y )
用以求出上述近似式e(x)、e(y)的近似方法並未特別限定,但是可適用例如平均法、雙線性法、或n次近似(例如2次近似)等。 An approximation method for obtaining the approximation formulas e (x) and e (y) is not particularly limited, but an average method, a bilinear method, or an n-th approximation (for example, a second-order approximation) can be applied.
所被補正的梯度場pf、qf是例如圖10所示,與圖9所示者相比,顯示其高度資訊被補正的曲線。 The corrected gradient fields pf and qf are, for example, those shown in FIG. 10, and a curve in which height information is corrected compared with those shown in FIG. 9.
3.結論 3. Conclusion
本實施形態之檢査裝置100是根據以雷射位移計33所得的高精度資料,對以藉由光度立體攝影法所為之測定所得的資料進行補正,因此可使採用光度立體攝影法的測定精度提升。 The inspection device 100 of this embodiment corrects the data obtained by the photometric stereophotography method based on the high-precision data obtained with the laser displacement meter 33, so that the measurement accuracy using the photometric stereophotography method can be improved. .
尤其,包含不同的複數種材質的區域是分別具有不同的反射率,因此若適用光度立體攝影法,並無法取得高精度的三次元形狀的資料。但是,藉由使用以雷射位移計33所得的高精度資料,即使測定對象物具有不同的複數種材質,亦可提高藉由光度立體攝影法所得之測定資料的精度。 In particular, regions containing different plural kinds of materials have different reflectances respectively, so if photometric stereo photography is applied, high-precision data of three-dimensional shapes cannot be obtained. However, by using the high-precision data obtained with the laser displacement meter 33, even if the measurement object has different plural kinds of materials, the accuracy of the measurement data obtained by the photometric stereography method can be improved.
例如,與使用1次元雷射位移計,在2次元區域全體內對其進行掃描,藉此測定三次元形狀的方法相比,藉由本實施形態之三次元測定,可高速測定三次元形狀。此外,由於亦不需要使用2次元雷射位移計等昂貴的測定器,因此可廉價地進行三次元形狀的測定。 For example, compared with the method of measuring the three-dimensional shape by scanning the entire two-dimensional area using a one-dimensional laser displacement meter, the three-dimensional shape of the present embodiment can measure the three-dimensional shape at a high speed. In addition, since it is not necessary to use an expensive measuring device such as a two-dimensional laser displacement meter, the three-dimensional shape can be measured at low cost.
藉由將本技術的三次元測定的方法適用在檢査裝置100,除了藉由習知之檢査裝置100所得之檢査項目以外,亦可進行藉由該三次元形狀的測定所為之檢査。因此,可以1台檢査裝置100實現多樣的檢査處理,可提高製品的可靠性。 By applying the three-dimensional measurement method of the present technology to the inspection device 100, in addition to the inspection items obtained by the conventional inspection device 100, inspection by the three-dimensional shape measurement can also be performed. Therefore, a single inspection apparatus 100 can implement various inspection processes, and the reliability of a product can be improved.
4.其他實施形態 4. Other embodiments
本技術並非限定於以上說明的實施形態,可實現其他各種實施形態。 This technology is not limited to the embodiments described above, and various other embodiments can be realized.
上述實施形態之檢査裝置100尤其是檢查被安裝在基板1上的電子零件的狀態者,但是亦可為例如檢査被形成在基板1上的焊材狀態者。此時,檢査焊材狀態的檢査裝置亦可使用其三次元形狀的測定的資料,來算出焊材的體積。 The inspection device 100 of the above-mentioned embodiment is particularly one that inspects the state of the electronic components mounted on the substrate 1, but may be, for example, one that inspects the state of the solder material formed on the substrate 1. At this time, the inspection device for inspecting the state of the welding material may also use the data of the measurement of its three-dimensional shape to calculate the volume of the welding material.
以測定對象物而言,亦可非為如上所述為被動元件,可將本技術適用在亦包含主動元件的各種者。 The measurement object may be a passive element as described above, and this technique can be applied to various types that also include an active element.
或者,三次元測定裝置亦可為具有三次元測定的單獨功能的裝置,而非為三次元測定裝置被適用在檢査裝置100。例如本技術亦可適用在醫療領域或其他產業領域中被利用的三次元測定裝置。 Alternatively, the three-dimensional measurement device may be a device having a separate function of three-dimensional measurement, and the three-dimensional measurement device may be applied to the inspection device 100 instead of the three-dimensional measurement device. For example, this technology can also be applied to a three-dimensional measurement device used in the medical field or other industrial fields.
如圖7所示,掃描雷射位移計33的方向為X方向,但是亦可為包含X及Y之二方向的成分的掃描方向。藉此,可增多測定點的數量,且可提高計算的正確性。或者,亦可在1個測定對象物內,沿著複數個方向的線進行掃描。 As shown in FIG. 7, the direction in which the laser displacement meter 33 is scanned is the X direction, but it may be a scanning direction including components in both the X and Y directions. Thereby, the number of measurement points can be increased, and the accuracy of calculation can be improved. Alternatively, scanning may be performed along a plurality of lines in one measurement object.
在圖6所示之例中,藉由攝像元件31所得之攝影區域PA為包含1個電子零件P2的圖像的區域。但是,例如若該攝影區域包含複數個電子零件的圖像時,控制部15亦可具有對應該複數個電子零件的相對配置、姿勢、方向等的位移計的掃描處理的演算法。藉此,可提高檢査的時間效率。 In the example shown in FIG. 6, the imaging area PA obtained by the imaging element 31 is an area including an image of one electronic component P2. However, for example, if the imaging area includes images of a plurality of electronic components, the control unit 15 may include an algorithm for scanning processing of a displacement meter corresponding to the relative arrangement, posture, or direction of the plurality of electronic components. Thereby, the time efficiency of inspection can be improved.
在上述實施形態中,是使用雷射位移計,但是亦可為利用光干擾的位移計、或利用超音波的位移計、接觸式位移計等。並非侷限於位移計,若有例如光切法等例如 可將至少一次元狀的光照射在測定對象物而檢測該光的反射狀態的感測器,亦可為任何機器。 In the above embodiment, a laser displacement meter is used, but it may be a displacement meter using light interference, a displacement meter using ultrasonic waves, a contact type displacement meter, or the like. It is not limited to displacement meters, if there is, for example, light section method, etc. The sensor may be any device that can illuminate at least one-dimensional light onto a measurement object to detect the reflection state of the light.
圖5所示之步驟102(及103)、及步驟104(及105)的順序亦可為相反。 The order of steps 102 (and 103) and 104 (and 105) shown in FIG. 5 may be reversed.
或者,該等步驟102及104亦可分別改變照明光的波長而同時進行。此時,例如用以取得圖像A的攝影是使用可見光,用以取得圖像B的攝影是使用紅外線,藉此可對該等同時進行攝影。此時,攝像元件是必須具備可分別檢測該等不同波長的光的影像感測器。 Alternatively, the steps 102 and 104 may be performed simultaneously while changing the wavelength of the illumination light. At this time, for example, the photography used to obtain the image A uses visible light, and the photography used to obtain the image B uses infrared light, so that these can be photographed simultaneously. In this case, the image pickup device must be provided with an image sensor capable of detecting light of these different wavelengths, respectively.
或者,圖像處理部16亦可藉由對在步驟102(及103)中所得的圖像A進行處理,來生成圖像B。此時,並不需要步驟104及105。 Alternatively, the image processing unit 16 may generate the image B by processing the image A obtained in step 102 (and 103). At this time, steps 104 and 105 are not required.
上述實施形態是攝像單元為相對於被保持在搬送部10的基板進行移動的構成,但是亦可為攝像單元為固定,而保持基板的保持部為相對於攝像單元進行移動的構成。 In the above-mentioned embodiment, the imaging unit is configured to move with respect to the substrate held by the transport unit 10, but the imaging unit may be fixed and the holding portion holding the substrate may be configured to move with respect to the imaging unit.
在上述實施形態中,成為光源的照明32b的數量為8個,可為至少3個,亦可為9個以上。 In the above-mentioned embodiment, the number of the illuminations 32b serving as the light source is eight, which may be at least three, or may be nine or more.
在上述實施形態中,雷射位移計33被一體地支持在攝像單元30,但是亦可由檢査裝置配備使該等個別移動的機構。 In the embodiment described above, the laser displacement meter 33 is integrally supported by the imaging unit 30, but the inspection device may be provided with a mechanism for moving these individual units.
在上述實施形態中,作為雷射位移計33的高度測定部是橫穿電子零件的複數個區域(1)~(4),來測定高度位移。高度測定部亦可例如按每個該等區域,以至少1點1點 的測定點來測定高度,而非侷限於如上所示之測定方法。 In the above-mentioned embodiment, the height measuring section of the laser displacement meter 33 is a plurality of areas (1) to (4) crossing the electronic component to measure the height displacement. The height measurement unit may be, for example, at least 1 point for each of these areas. The height is not limited to the measurement method shown above.
在以上說明之各形態的特徵部分之中,亦可至少組合2個特徵部分。 Among the characteristic parts of each aspect described above, at least two characteristic parts may be combined.
本技術亦可採取以下所示之構成。 This technology can also take the following configurations.
(1)一種三次元測定裝置,其是具備:高度測定部,其是構成為:對測定對象物的預定位置的高度、或高度位移進行測定;三次元形狀測定部,其是構成為:藉由光度立體攝影法,來測定前述測定對象物的三次元形狀;及補正部,其是構成為:根據以前述高度測定部所得的資料,補正以前述三次元形狀測定部所得的資料。 (1) A three-dimensional measurement device comprising: a height measurement unit configured to measure a height or a height displacement of a predetermined position of a measurement object; and a three-dimensional shape measurement unit configured to: The three-dimensional shape of the measurement object is measured by a photometric stereography method; and the correction unit is configured to correct the data obtained by the three-dimensional shape measurement unit based on the data obtained by the height measurement unit.
(2)如(1)所記載之三次元測定裝置,其中,前述三次元形狀測定部是包含光度立體攝影圖像取得部,其是構成為:以攝像元件對包含被藉由3個以上的光源分別個別地照射光的測定對象物的區域進行攝影,藉此取得3個以上的圖像。 (2) The three-dimensional measurement device according to (1), wherein the three-dimensional shape measurement unit is a photometric stereo image acquisition unit, and is configured such that three or more image sensor element pairs are used. The light source individually irradiates the areas of the measurement object with light to capture three or more images.
(3)如(2)所記載之三次元測定裝置,其中,另外具備有:圖像取得部,其是構成為:以前述攝像元件對被照射到包含藉由前述3個以上的光源所致之照射方向的光的前述測定對象物進行攝影,藉此取得包含前述測定對象物的圖像;及圖像處理部,其是構成為:擷取前述圖像取得部所得之包含前述測定對象物的圖像內的複數個區域。 (3) The three-dimensional measurement device according to (2), further comprising: an image acquisition unit configured to be irradiated with the imaging element pair including the light source including the three or more light sources The image of the measurement object is obtained by photographing the measurement object of the light in the irradiation direction; and an image processing unit configured to capture the measurement object including the measurement object obtained by the image acquisition unit Multiple regions within the image.
(4)如(3)所記載之三次元測定裝置,其中,前述高度測定部是沿著橫穿在前述圖像處理部所得的前述複數個區域的線,測定前述測定對象物的高度。 (4) The three-dimensional measurement device according to (3), wherein the height measurement unit measures a height of the measurement object along a line crossing the plurality of regions obtained by the image processing unit.
(5)如(3)或(4)所記載之三次元測定裝置,其中,前述三次元形狀測定部是按每個藉由前述圖像處理部所被擷取的每個區域,測定前述三次元形狀。 (5) The three-dimensional measurement device according to (3) or (4), wherein the three-dimensional shape measurement section measures the three-dimensional measurement for each area captured by the image processing section. Element shape.
(6)如(1)至(5)中任一者所記載之三次元測定裝置,其中,前述補正部是根據以前述高度測定部所得的資料、與以前述三次元形狀測定部所得的資料的差,對以前述三次元形狀測定部所得的資料進行補正。 (6) The three-dimensional measurement device according to any one of (1) to (5), wherein the correction unit is based on data obtained by the height measurement unit and data obtained by the three-dimensional shape measurement unit. The data obtained by the aforementioned three-dimensional shape measurement unit is corrected.
(7)如(6)所記載之三次元測定裝置,其中,前述補正部是由以前述三次元形狀測定部所得的資料,將前述差的部分去除。 (7) The three-dimensional measurement device according to (6), wherein the correction unit is obtained from data obtained by the three-dimensional shape measurement unit, and the difference is removed.
(8)如(1)至(7)中任一者所記載之三次元測定裝置,其中,前述高度測定部是具有位移計。 (8) The three-dimensional measurement device according to any one of (1) to (7), wherein the height measurement unit includes a displacement meter.
(9)一種三次元測定裝置,其是具備:3個以上的光源;攝像元件,其是可對測定對象物進行攝影;高度測定部,其是構成為:對前述測定對象物的預定位置的高度、或高度位移進行測定;三次元形狀測定部,其是構成為:使用前述3個以上的光源及前述攝像元件,藉由光度立體攝影法,測定前述測定對象物的三次元形狀;及補正部,其是構成為:根據以前述高度測定部所得的 資料,將以前述三次元形狀測定部所得的資料進行補正。 (9) A three-dimensional measurement device including: three or more light sources; an imaging element that can photograph an object to be measured; and a height measuring unit that is configured to: The height or height displacement is measured; the three-dimensional shape measurement unit is configured to measure the three-dimensional shape of the measurement object by photometric stereo photography using the three or more light sources and the imaging element; and correction The part is configured to be obtained from the height measuring part described above. The data will be corrected based on the data obtained by the three-dimensional shape measurement section.
(10)如(9)所記載之三次元測定裝置,其中,另外具備有:保持部,其是保持作為前述測定對象物的基板;支持部,其是被配置在前述保持部上,且一體地支持前述攝像元件及前述3個以上的光源;及移動機構,其是使前述保持部及前述支持部作相對移動。 (10) The three-dimensional measurement device according to (9), further comprising: a holding portion that is a substrate for holding the measurement target; and a support portion that is integrally disposed on the holding portion. Ground to support the imaging element and the three or more light sources; and a moving mechanism that relatively moves the holding portion and the supporting portion.
(11)一種三次元測定方法,其是對測定對象物的預定位置的高度、或高度位移進行測定,藉由光度立體攝影法,測定前述測定對象物的三次元形狀,根據以前述高度或高度位移測定所得的資料,對以前述三次元形狀的測定所得的資料進行補正。 (11) A three-dimensional measurement method for measuring a height or a height displacement of a predetermined position of a measurement object, and measuring a three-dimensional shape of the measurement object by a photometric stereo method, based on the height or the height The data obtained by the displacement measurement are corrected for the data obtained by the aforementioned three-dimensional shape measurement.
(12)一種基板之製造方法,其是在基板上,安裝零件或形成焊材,測定前述基板上的前述零件或前述焊材的預定位置的高度、或高度位移,藉由光度立體攝影法,測定前述零件或焊材的三次元形狀,根據以前述高度或高度位移測定所得的資料,對以前述三次元形狀的測定所得的資料進行補正。 (12) A method for manufacturing a substrate, in which a component is mounted on a substrate or a solder material is formed, and a height or a displacement of a predetermined position of the component or the solder material on the substrate is measured, and a photometric stereography method is used, The three-dimensional shape of the part or welding material is measured, and the data obtained by measuring the three-dimensional shape is corrected based on the data obtained by measuring the height or height displacement.
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TW201520511A (en) | 2015-06-01 |
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