TWI659119B - Nickel-rhenium alloy sputtering target and method of preparing the same - Google Patents

Nickel-rhenium alloy sputtering target and method of preparing the same Download PDF

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TWI659119B
TWI659119B TW106129465A TW106129465A TWI659119B TW I659119 B TWI659119 B TW I659119B TW 106129465 A TW106129465 A TW 106129465A TW 106129465 A TW106129465 A TW 106129465A TW I659119 B TWI659119 B TW I659119B
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nickel
metal component
atomic percent
alloy target
rhenium alloy
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TW201912821A (en
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唐志文
劉宜隴
黃威智
羅尚賢
鄭惠文
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光洋應用材料科技股份有限公司
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Abstract

本創作提供一種鎳錸合金靶材及其製法。該鎳錸合金靶材包括鎳、錸及第一金屬成分,第一金屬成分包含鋁、鋯或其組合,以該鎳錸合金靶材之原子總數為基準,錸之含量大於0原子百分比且小於或等於7原子百分比,第一金屬成分之總含量大於0原子百分比且小於或等於3原子百分比,且錸及第一金屬成分之總含量大於0原子百分比且小於10原子百分比。藉由控制鎳錸合金靶材之組成,本創作之鎳錸合金靶材靶材能適用於濺鍍形成垂直式磁記錄媒體的晶種層,從而提升其記錄密度。This creation provides a nickel-rhenium alloy target and its manufacturing method. The nickel-rhenium alloy target includes nickel, hafnium, and a first metal component. The first metal component includes aluminum, zirconium, or a combination thereof. Based on the total number of atoms of the nickel-rhenium alloy target, the content of hafnium is greater than 0 atomic percent and less than Or equal to 7 atomic percent, the total content of the first metal component is greater than 0 atomic percent and less than or equal to 3 atomic percent, and the total content of rhenium and the first metal component is greater than 0 atomic percent and less than 10 atomic percent. By controlling the composition of the nickel-rhenium alloy target, the original nickel-rhenium alloy target can be applied to sputtering to form a seed layer of a perpendicular magnetic recording medium, thereby improving its recording density.

Description

鎳錸合金靶材及其製法Nickel-rhenium alloy target and preparation method thereof

本創作關於一種磁記錄媒體之靶材及其製法,尤指一種可適用於垂直式磁記錄媒體之晶種層的鎳錸合金靶材及其製法。 This creation relates to a target of a magnetic recording medium and a manufacturing method thereof, and more particularly to a nickel-rhenium alloy target applicable to a seed layer of a perpendicular magnetic recording medium and a manufacturing method thereof.

隨著人們對於磁記錄媒體之資訊儲存容量的需求越來越高,如何提升磁記錄媒體的記錄品質一直是業者積極開發的研究課題。根據磁頭磁化的方向,現有技術之磁記錄媒體可區分為水平式磁記錄媒體及垂直式磁記錄媒體。其中,水平式磁記錄媒體之記錄密度已發展至極限;因此,現有技術轉而投入垂直式磁記錄媒體之研究,透過細化記錄單元及疊設垂直式的層狀結構,設法提升磁記錄媒體之記錄密度。 With the increasing demand for information storage capacity of magnetic recording media, how to improve the recording quality of magnetic recording media has been a research topic actively developed by industry players. According to the magnetization direction of the magnetic head, the magnetic recording media of the prior art can be divided into horizontal magnetic recording media and vertical magnetic recording media. Among them, the recording density of the horizontal magnetic recording medium has developed to the limit; therefore, the existing technology has turned to the research of the vertical magnetic recording medium, trying to improve the magnetic recording medium by refining the recording unit and stacking the vertical layered structure. Its recording density.

一般垂直式磁記錄媒體之層狀結構由下至上包含基板、附著層、軟磁層(soft underlayer)、晶種層(seed layer)、中間層(intermediate layer)、磁記錄層(magnetic recording layer)、覆蓋層以及潤滑層。 The layered structure of a normal perpendicular magnetic recording medium includes a substrate, an adhesion layer, a soft underlayer, a seed layer, an intermediate layer, a magnetic recording layer, Covering layer and lubricating layer.

為確保晶種層獲得面心立方(face-centered cubic,FCC)之結晶結構,現有技術多半選用鎳鎢合金、鎳鐵鎢合金或鎳錸合金作為晶種層之主要成分。然而,現有技術之晶種層卻多半存在晶粒粗大(即,平均晶粒粒徑尺寸為100微米至150微米)、粒徑尺寸變異較大(即,平均晶粒粒徑尺寸之均勻度約25%至40%)以及結晶性不足(即,FCC結構中(111)晶體方向的強度比例低於60%)等問題,致使沉積在晶種層上的磁記錄層連帶受到影響,也存在晶粒粗 大、粒徑尺寸變異較大以及結晶性較差之缺陷,甚而降低磁記錄媒體的記錄密度。 In order to ensure that the seed layer obtains a crystalline structure of a face-centered cubic (FCC), in the prior art, nickel-tungsten alloy, nickel-iron-tungsten alloy, or nickel-rhenium alloy is mostly used as the main component of the seed layer. However, the seed layer of the prior art mostly has coarse grains (that is, the average grain size is 100 μm to 150 μm), and the particle size varies greatly (that is, the uniformity of the average grain size is about 25% to 40%) and insufficient crystallinity (that is, the intensity ratio of the (111) crystal direction in the FCC structure is less than 60%), causing the magnetic recording layer deposited on the seed layer to be affected, and crystals also exist. Coarse grain Defects such as large particle size variation and poor crystallinity even reduce the recording density of magnetic recording media.

有鑑於此,目前仍需設法細緻化與均勻化晶種層的晶粒粒徑尺寸,並且同時嘗試著提升晶種層的結晶性,藉以改善形成在晶種層的磁記錄層之膜層品質,進而實現提升磁記錄媒體的記錄密度之目的。 In view of this, it is still necessary to try to refine and uniformize the grain size of the seed layer, and at the same time, try to improve the crystallinity of the seed layer, thereby improving the quality of the magnetic recording layer formed on the seed layer. , Thereby achieving the purpose of improving the recording density of the magnetic recording medium.

有鑑於現有技術存在之缺陷,本創作一目的在於細緻化及均勻化鎳錸合金靶材之晶粒粒徑,藉此令該鎳錸合金靶材所濺鍍而成之晶種層具有更為細緻化及均勻化的晶粒粒徑尺寸之效果。據此,此種晶種層應用於磁記錄媒體時,能有助於細緻化及均勻化沉積於晶種層上的磁記錄層的晶粒粒徑尺寸,甚而增進磁記錄媒體的記錄密度。 In view of the shortcomings of the prior art, one purpose of this creation is to refine and homogenize the grain size of the nickel-rhenium alloy target, so as to make the seed layer formed by sputtering of the nickel-rhenium alloy target more effective. Effect of refinement and homogenization of grain size. Accordingly, when such a seed layer is applied to a magnetic recording medium, it can help to refine and uniformize the grain size of the magnetic recording layer deposited on the seed layer, and even improve the recording density of the magnetic recording medium.

本創作另一目的在於提升鎳錸合金靶材結晶性,藉此令該鎳錸合金靶材所濺鍍而成之晶種層也能具備較佳的結晶性;故當晶種層應用於磁記錄媒體時,能有助於提升沉積於晶種層上的磁記錄層的結晶性,藉以增進磁記錄媒體的記錄密度。 Another purpose of this creation is to improve the crystallinity of the nickel-rhenium alloy target, so that the seed layer formed by sputtering the nickel-rhenium alloy target can also have better crystallinity; therefore, when the seed layer is applied to magnetic When recording a medium, it can help improve the crystallinity of the magnetic recording layer deposited on the seed layer, thereby improving the recording density of the magnetic recording medium.

為達成前述目的,本創作提供一種鎳錸合金靶材,其包括鎳、錸及第一金屬成分,第一金屬成分包含鋁、鋯或其組合,以該鎳錸合金靶材之原子總數為基準,錸之含量大於0原子百分比(at%)且小於或等於7at%,第一金屬成分之總含量大於0at%且小於或等於3at%,其餘為鎳,且錸及第一金屬成分之總含量大於0at%且小於10at%。 In order to achieve the foregoing object, the present invention provides a nickel-rhenium alloy target, which includes nickel, rhenium, and a first metal component. The first metal component includes aluminum, zirconium, or a combination thereof, based on the total number of atoms of the nickel-rhenium alloy target. , The content of rhenium is greater than 0 atomic percent (at%) and less than or equal to 7at%, the total content of the first metal component is greater than 0at% and less than or equal to 3at%, the rest is nickel, and the total content of rhenium and the first metal component More than 0at% and less than 10at%.

根據本創作,藉由令該鎳錸合金靶材中含有適量的錸作為細化金屬,能有助於細緻化及均勻化鎳錸合金靶材的晶粒粒徑尺寸,確保該鎳錸合金靶材的平均晶粒粒徑尺寸小於或等於30微米、平均晶粒粒徑尺寸的均勻度小於或等於20%;據此,相較於現有技術之鎳基靶材,本創作能具體解決鎳基靶 材晶粒粗大以及晶粒粒徑尺寸變異較大等問題。同時,藉由令鎳錸合金靶材中含有特定種類的第一金屬成分以及含有適量的第一金屬成分,除了能維持細緻化及均勻化鎳錸合金靶材之晶粒粒徑尺寸的效果之外,更能同時提升鎳錸合金靶材的結晶性,使鎳錸合金靶材的面心立方結晶結構(face centered cubic structure,FCC structure)中(111)晶體方向的強度比例超過62%以上。 According to this creation, by including an appropriate amount of rhenium in the nickel-rhenium alloy target material as a refining metal, it can help refine and uniformize the grain size of the nickel-rhenium alloy target material, ensuring the nickel-rhenium alloy target. The average grain size of the material is less than or equal to 30 microns, and the uniformity of the average grain size is less than or equal to 20%. Based on this, compared with the nickel-based target material of the prior art, this creation can specifically solve the nickel-based target There are some problems such as coarse grains and large variation in grain size. At the same time, by including a specific kind of first metal component and a proper amount of the first metal component in the nickel-rhenium alloy target, in addition to the effect of maintaining the fineness and uniformity of the grain size of the nickel-rhenium alloy target In addition, the crystallinity of the nickel-rhenium alloy target can be improved at the same time, so that the strength ratio of the (111) crystal direction in the face-centered cubic structure (FCC structure) of the nickel-rhenium alloy target exceeds 62%.

據此,本創作之鎳錸合金靶材能適用於濺鍍形成磁記錄媒體的晶種層,使晶種層能獲得較為細緻化及均勻化的晶粒粒徑尺寸,同時兼具較佳的結晶性,致使沉積在晶種層上的磁記錄層也能獲得較為細緻化及均勻化的晶粒粒徑尺寸以及較佳的結晶性,從而提升磁記錄媒體的記錄密度。 According to this, the nickel-rhenium alloy target material created by this invention can be applied to form a seed layer for magnetic recording media by sputtering, so that the seed layer can obtain a relatively fine and uniform grain size, and at the same time has a better The crystallinity causes the magnetic recording layer deposited on the seed layer to obtain a more refined and uniform grain size and better crystallinity, thereby improving the recording density of the magnetic recording medium.

依據本創作,所述鎳錸合金靶材中的第一金屬成分可由鋁所組成,亦可由鋯所組成,也可以是鋁和鋯的組合。當第一金屬成分由單一金屬成分所組成時,第一金屬成分之總含量等同於該單一金屬成分之個別含量,此時,此第一金屬成分之個別含量大於0at%且小於或等於3at%,且錸及第一金屬成分之總含量大於0at%且小於10at%。當第一金屬成分為鋁及鋯的組合時,鋁的個別含量與鋯的個別含量之總合等同於該第一金屬成分之總含量,此時,此第一金屬成分之總含量大於0at%且小於或等於3at%,且錸及第一金屬成分之總含量大於0at%且小於10at%。 According to this creation, the first metal component in the nickel-rhenium alloy target may be composed of aluminum, zirconium, or a combination of aluminum and zirconium. When the first metal component is composed of a single metal component, the total content of the first metal component is equal to the individual content of the single metal component. At this time, the individual content of the first metal component is greater than 0at% and less than or equal to 3at%. And the total content of rhenium and the first metal component is greater than 0 at% and less than 10 at%. When the first metal component is a combination of aluminum and zirconium, the sum of the individual content of aluminum and the individual content of zirconium is equivalent to the total content of the first metal component. At this time, the total content of the first metal component is greater than 0 at% And less than or equal to 3 at%, and the total content of rhenium and the first metal component is greater than 0 at% and less than 10 at%.

較佳的,當鎳錸合金靶材中的第一金屬成分為鋁時,第一金屬成分之總含量(即,鋁之個別含量)大於或等於0.5at%且小於或等於2at%;當鎳錸合金靶材中的第一金屬成分為鋯時,第一金屬成分之總含量(即,鋯之個別含量)大於或等於0.5at%且小於或等於2.8at%;當鎳錸合金靶材中的第一金屬成分為鋁及鋯的組合時,第一金屬成分之總含量(即,鋁和鋯之含量和)大於或等於0.5at%且小於或等於3at%。 Preferably, when the first metal component in the nickel-rhenium alloy target is aluminum, the total content of the first metal component (ie, the individual content of aluminum) is greater than or equal to 0.5 at% and less than or equal to 2 at%; when nickel When the first metal component in the samarium alloy target is zirconium, the total content of the first metal component (ie, the individual zirconium content) is greater than or equal to 0.5 at% and less than or equal to 2.8 at%; When the first metal component is a combination of aluminum and zirconium, the total content of the first metal component (ie, the sum of the contents of aluminum and zirconium) is greater than or equal to 0.5 at% and less than or equal to 3 at%.

較佳的,以該鎳錸合金靶材之原子總數為基準,所述鎳錸合金靶材中的第一金屬成分之總含量大於0at%且小於或等於2.9at%。更佳的,以該鎳錸合金靶材之原子總數為基準,所述鎳錸合金靶材中的第一金屬成分之總含量大於或等於0.5at%且小於或等於2.5at%。 Preferably, based on the total number of atoms of the nickel-rhenium alloy target, the total content of the first metal component in the nickel-rhenium alloy target is greater than 0 at% and less than or equal to 2.9 at%. More preferably, based on the total number of atoms of the nickel-rhenium alloy target, the total content of the first metal component in the nickel-rhenium alloy target is greater than or equal to 0.5 at% and less than or equal to 2.5 at%.

依據本創作,所述鎳錸合金靶材除了含有前述鎳、錸及特定種類的第一金屬成分外,更可選擇性地添加適量的第二金屬成分,以進一步細緻化鎳錸合金靶材的晶粒粒徑尺寸、增強(111)晶體方向的強度比例。 According to this creation, in addition to the nickel-rhenium alloy target material containing the aforementioned nickel, rhenium, and a specific kind of first metal component, an appropriate amount of a second metal component can be optionally added to further refine the nickel-rhenium alloy target material. Crystal grain size and strength ratio of (111) crystal direction.

較佳的,以該鎳錸合金靶材之原子總數為基準,錸及第一金屬成分之總含量大於或等於2at%且小於或等於9at%;更佳的,以該鎳錸合金靶材之原子總數為基準,錸及第一金屬成分之總含量大於或等於4at%且小於或等於9at%。 Preferably, based on the total number of atoms of the nickel-rhenium alloy target, the total content of rhenium and the first metal component is greater than or equal to 2 at% and less than or equal to 9 at%; more preferably, the nickel-rhenium alloy target is used. Based on the total number of atoms, the total content of rhenium and the first metal component is 4at% or more and 9at% or less.

較佳的,所述第二金屬成分包含鈦、鋨、銥、釔、鉭、鈮、鉬或其組合;更佳的,第二金屬成分可為鈦、鈮、鉬或其組合。 Preferably, the second metal component includes titanium, osmium, iridium, yttrium, tantalum, niobium, molybdenum, or a combination thereof; more preferably, the second metal component may be titanium, niobium, molybdenum, or a combination thereof.

較佳的,以該鎳錸合金靶材之原子總數為基準,第二金屬成分之總含量大於或等於0at%且小於或等於5at%,且錸、第一金屬成分及第二金屬成分之總含量大於0at%且小於10at%。藉由控制第二金屬成分之含量,能在確保細緻化及均勻化晶粒粒徑尺寸的前提下,進一步提升鎳錸合金靶材的結晶性。 Preferably, based on the total number of atoms of the nickel-rhenium alloy target, the total content of the second metal component is greater than or equal to 0 at% and less than or equal to 5 at%, and the total of thorium, the first metal component, and the second metal component The content is greater than 0at% and less than 10at%. By controlling the content of the second metal component, the crystallinity of the nickel-rhenium alloy target can be further improved on the premise of ensuring the refinement and uniformity of the grain size.

較佳的,以該鎳錸合金靶材之原子總數為基準,錸、第一金屬成分及第二金屬成分之總含量大於或等於0.5at%且小於或等於9.9at%;更佳的,以該鎳錸合金靶材之原子總數為基準,錸、第一金屬成分及第二金屬成分之總含量大於或等於5at%且小於或等於9.9at%。 Preferably, based on the total number of atoms of the nickel-rhenium alloy target, the total content of rhenium, the first metal component, and the second metal component is greater than or equal to 0.5 at% and less than or equal to 9.9 at%; more preferably, The total number of atoms of the nickel-rhenium alloy target is based on the total content of rhenium, the first metal component and the second metal component being greater than or equal to 5 at% and less than or equal to 9.9 at%.

較佳的,當鎳錸合金靶材中的第二金屬成分為鈦時,第二金屬成分之總含量(即,鈦之個別含量)大於或等於0.5at%且小於或等於3at%;當鎳 錸合金靶材中的第二金屬成分為鈮時,第二金屬成分之總含量(即,鈮之個別含量)大於或等於0.5at%且小於或等於3at%;當鎳錸合金靶材中的第二金屬成分為鉬時,第二金屬成分之總含量(即,鉬之個別含量)大於或等於0.5at%且小於或等於3at%。 Preferably, when the second metal component in the nickel-rhenium alloy target is titanium, the total content of the second metal component (that is, the individual content of titanium) is greater than or equal to 0.5 at% and less than or equal to 3 at%; when nickel When the second metal component in the samarium alloy target is niobium, the total content of the second metal component (ie, the individual content of niobium) is greater than or equal to 0.5 at% and less than or equal to 3 at%; When the second metal component is molybdenum, the total content of the second metal component (ie, the individual content of molybdenum) is greater than or equal to 0.5 at% and less than or equal to 3 at%.

較佳的,該鎳錸合金靶材可進一步摻混有鐵,以該鎳錸合金靶材之原子總數為基準,鐵之含量可大於0at%且小於或等於30at%。較佳的,鐵之含量可大於或等於15at%且小於或等於25at%。藉由控制鐵的含量,能在確保細緻化及均勻化晶粒粒徑尺寸的前提下,進一步提升鎳錸合金靶材的結晶性,避免因為添加過量的鐵而劣化鎳錸合金靶材的結晶性。 Preferably, the nickel-rhenium alloy target may be further blended with iron, and based on the total number of atoms of the nickel-rhenium alloy target, the iron content may be greater than 0 at% and less than or equal to 30 at%. Preferably, the content of iron may be greater than or equal to 15 at% and less than or equal to 25 at%. By controlling the content of iron, the crystallinity of the nickel-rhenium alloy target can be further improved under the premise of ensuring the refinement and uniformity of the grain size of the nickel-rhenium alloy target, and avoiding the deterioration of the crystal of the nickel-rhenium alloy target by adding excessive iron. Sex.

較佳的,所述鎳錸合金靶材之結晶結構含有FCC相,故能有利於濺鍍形成應用於垂直式記錄媒體之晶種層。更佳的,所述鎳錸合金靶材之結晶結構係由FCC相所組成。 Preferably, the crystal structure of the nickel-rhenium alloy target material contains an FCC phase, so it can be beneficial to sputtering to form a seed layer applied to a vertical recording medium. More preferably, the crystal structure of the nickel-rhenium alloy target is composed of an FCC phase.

為達成前述目的,本創作另提供一種鎳錸合金靶材之製法,其包含:先於1×10-2托耳至1×10-4托耳之真空環境下,以真空感應熔煉法熔煉一金屬原料,並以1500℃至1750℃之澆溫澆鑄得到一預合金鑄錠;霧化該預合金鑄錠,以得到一預合金粉末;再於1000℃至1300℃之燒結溫度下,燒結該預合金粉末,以得到該鎳錸合金靶材。 In order to achieve the aforesaid objective, the present invention also provides a method for manufacturing a nickel-rhenium alloy target material, which includes: smelting a vacuum induction melting method under a vacuum environment of 1 × 10 -2 Torr to 1 × 10 -4 Torr A metal raw material is cast at a temperature of 1500 ° C to 1750 ° C to obtain a pre-alloy ingot; the pre-alloy ingot is atomized to obtain a pre-alloy powder; and the sintering temperature is sintered at a sintering temperature of 1000 to 1300 ° C. Pre-alloyed powder to obtain the nickel-rhenium alloy target.

於此,所述金屬原料的組成可如同上述鎳錸合金靶材的組成,以確保所述金屬原料經由本創作之製法後能獲得特定組成之鎳錸合金靶材。具體而言,該金屬原料可含有鎳、錸及第一金屬成分,第一金屬成分包含鋁、鋯或其組合,以該金屬原料之原子總數為基準,錸之含量大於0at%且小於或等於7at%,第一金屬成分之總含量大於0at%且小於或等於3at%,且錸及第一金屬成分之總含量大於0at%且小於10at%。 Here, the composition of the metal raw material may be the same as that of the above-mentioned nickel-rhenium alloy target material, so as to ensure that the nickel-rhenium alloy target material with a specific composition can be obtained after the metal raw material passes the production method of the present invention. Specifically, the metal raw material may contain nickel, hafnium, and a first metal component. The first metal component includes aluminum, zirconium, or a combination thereof. Based on the total number of atoms of the metal raw material, the content of hafnium is greater than 0 at% and less than or equal to 7at%, the total content of the first metal component is greater than 0at% and less than or equal to 3at%, and the total content of the first metal component is greater than 0at% and less than 10at%.

如上述鎳錸合金靶材之組成,該金屬原料也可以更進一步含有第二金屬成分,第二金屬成分包含鈦、鋨、銥、釔、鉭、鈮、鉬或其組合,以該金屬原料之原子總數為基準,第二金屬成分之總含量大於0at%且小於或等於5at%,且錸、第一金屬成分及第二金屬成分之總含量大於0at%且小於10at%。 According to the above composition of the nickel-rhenium alloy target, the metal raw material may further contain a second metal component, and the second metal component includes titanium, osmium, iridium, yttrium, tantalum, niobium, molybdenum, or a combination thereof. Based on the total number of atoms, the total content of the second metal component is greater than 0 at% and less than or equal to 5 at%, and the total content of thorium, the first metal component, and the second metal component is greater than 0 at% and less than 10 at%.

如上述鎳錸合金靶材之組成,該金屬原料也可以更進一步含有鐵,以該金屬原料之原子總數為基準,鐵之含量大於或等於0at%且小於或等於30at%。 Like the above-mentioned nickel-rhenium alloy target material, the metal raw material may further contain iron. Based on the total number of atoms of the metal raw material, the iron content is greater than or equal to 0 at% and less than or equal to 30 at%.

較佳的,該製法係於1×10-2托耳至1×10-4托耳之真空環境下,先以高於澆溫100℃之溫度下持溫後,再以1500℃至1750℃之澆溫澆鑄得到該預合金鑄錠。 Preferably, the manufacturing method is in a vacuum environment of 1 × 10 -2 Torr to 1 × 10 -4 Torr, and the temperature is first maintained at a temperature higher than the pouring temperature of 100 ° C, and then the temperature is maintained at 1500 ° C to 1750 ° C. The pre-alloyed ingot is obtained by casting at a temperature.

較佳的,所述霧化步驟可於1×10-2托耳至1×10-5托耳之真空環境下進行,並以1500℃至1750℃之霧化溫度及7MPa至9MPa之霧化壓力進行霧化步驟,以得到預合金粉末。 Preferably, the atomizing step may be performed in a vacuum environment of 1 × 10 -2 Torr to 1 × 10 -5 Torr, and an atomizing temperature of 1500 ° C to 1750 ° C and an atomizing temperature of 7MPa to 9MPa. The atomization step is performed under pressure to obtain a pre-alloyed powder.

於此,所述預合金粉末可為單一預合金粉末或至少二種不同的預合金粉末。換言之,於其中一實施態樣中,前述燒結步驟係單獨燒結一種單一預合金粉末,得到該鎳錸合金靶材;或者,於另一實施態樣中,前述燒結步驟係同時燒結至少二種不同的預合金粉末,以得到該鎳錸合金靶材。 Here, the pre-alloy powder may be a single pre-alloy powder or at least two different pre-alloy powders. In other words, in one embodiment, the aforementioned sintering step is sintering a single prealloy powder separately to obtain the nickel-rhenium alloy target; or, in another embodiment, the aforementioned sintering step is sintering at least two different types simultaneously Pre-alloyed powder to obtain the nickel-rhenium alloy target.

較佳的,所述燒結步驟可採用熱壓法(hot press,HP)、熱均壓法(hot isostatic pressing,HIP)或其組合來完成,但並非僅限於此。更佳的,本創作之製法可先採用熱壓法再採用熱均壓法燒結預合金粉末,以得到該鎳錸合金靶材。 Preferably, the sintering step may be completed by a hot press method (HP), a hot isostatic pressing method (HIP), or a combination thereof, but is not limited thereto. More preferably, the production method of the present invention can first use the hot pressing method and then the hot equalizing method to sinter the prealloy powder to obtain the nickel-rhenium alloy target.

於前述燒結步驟中,當採用熱壓法燒結預合金粉末時,其燒結溫度較佳為1000℃至1300℃,燒結壓力較佳為300bar至400bar。 In the aforementioned sintering step, when the pre-alloy powder is sintered by the hot pressing method, the sintering temperature is preferably 1000 ° C. to 1300 ° C., and the sintering pressure is preferably 300 bar to 400 bar.

於前述燒結步驟中,當採用熱均壓法燒結預合金鑄錠或預合金粉末時,其燒結溫度較佳為1000℃至1300℃,燒結壓力較佳為130MPa至200MPa。 In the aforementioned sintering step, when the pre-alloy ingot or pre-alloy powder is sintered by the hot equalizing method, the sintering temperature is preferably 1000 ° C. to 1300 ° C., and the sintering pressure is preferably 130 MPa to 200 MPa.

圖1A至圖1C依序為實施例6、8、9之鎳錸合金靶材的光學顯微鏡影像圖。 1A to FIG. 1C are optical microscope image diagrams of the nickel-rhenium alloy targets of Examples 6, 8, and 9, in order.

圖2A及圖2B依序為比較例1之鎳鎢合金靶材及比較例6之鎳錸合金靶材的光學顯微鏡影像圖。 2A and 2B are optical microscope image diagrams of the nickel-tungsten alloy target of Comparative Example 1 and the nickel-rhenium alloy target of Comparative Example 6, respectively.

圖3為實施例6、8、9之鎳錸合金靶材、比較例1之鎳鎢合金靶材及比較例6及8之鎳錸合金靶材的X光繞射圖譜。 3 is an X-ray diffraction pattern of the nickel-rhenium alloy target of Examples 6, 8, and 9, the nickel-tungsten alloy target of Comparative Example 1, and the nickel-rhenium alloy targets of Comparative Examples 6 and 8.

為驗證鎳錸合金靶材之組成對其晶粒粒徑尺寸與均勻性及結晶性之影響,以下列舉數種具有不同組成之鎳錸合金靶材作為實施例,說明本創作之實施方式,另結合其他鎳基合金靶材作為比較例,說明各實施例與比較例之特性差異;熟習此技藝者可經由本說明書之內容輕易地了解本創作所能達成之優點與功效,並且於不悖離本創作之精神下進行各種修飾與變更,以施行或應用本創作之內容。 In order to verify the effect of the composition of the nickel-rhenium alloy target on its grain size, uniformity, and crystallinity, several nickel-rhenium alloy targets with different compositions are listed below as examples to explain the implementation of this creation. In combination with other nickel-based alloy targets as comparative examples, the differences in characteristics between the examples and comparative examples will be explained; those skilled in the art can easily understand the advantages and effects that can be achieved by this creation through the content of this manual, and will not deviate from it. Various modifications and changes are made in the spirit of this creation to implement or apply the content of this creation.

實施例1至19:鎳錸合金靶材Examples 1 to 19: nickel-rhenium alloy targets

根據如下表1所示之鎳錸合金靶材的組成,秤取並混合適量的鎳(Ni)、錸(Re)、鐵(Fe)、第一金屬成分(M1)及第二金屬成分(M2)等原料,利用真空感應熔煉法,於5×10-2托耳之真空環境、高於澆溫100℃之反應條件持溫後,以1650℃至1670℃之澆溫澆鑄得到一預合金鑄錠。於此,第一金屬成分可為鋁(Al)、鋯(Zr)或其組合,第二金屬成分包含鈦(Ti)、鋨(Os)、銥(Ir)、釔(Y)、鉭(Ta)、鈮(Nb)、鉬(Mo)或其組合。 According to the composition of the nickel-rhenium alloy target shown in Table 1 below, weigh and mix an appropriate amount of nickel (Ni), rhenium (Re), iron (Fe), the first metal component (M1), and the second metal component (M2). ) And other raw materials, using a vacuum induction melting method, in a vacuum environment of 5 × 10 -2 Torr, and a reaction temperature higher than the pouring temperature of 100 ° C, the temperature is maintained, and the casting temperature of 1650 ° C to 1670 ° C to obtain a pre-alloy casting ingot. Here, the first metal component may be aluminum (Al), zirconium (Zr), or a combination thereof, and the second metal component includes titanium (Ti), hafnium (Os), iridium (Ir), yttrium (Y), tantalum (Ta ), Niobium (Nb), molybdenum (Mo), or a combination thereof.

之後,利用霧化造粒設備,於1×10-2托耳至1×10-5托耳之真空環境、1680℃至1740℃之霧化溫度及8MPa之霧化壓力下,將預合金鑄錠霧化成一預合金粉末。 After that, the pre-alloy was cast under a vacuum environment of 1 × 10 -2 Torr to 1 × 10 -5 Torr, an atomization temperature of 1680 ° C. to 1740 ° C., and an atomization pressure of 8 MPa using an atomizing and granulating equipment. The ingot is atomized into a pre-alloyed powder.

接著,將前述預合金粉末過篩後,以1200℃之溫度及350bar之壓力,持續熱壓燒結2小時,得到一燒結體。 Next, the pre-alloy powder is sieved, and then hot-pressed and sintered at a temperature of 1200 ° C and a pressure of 350 bar for 2 hours to obtain a sintered body.

最後,以1100℃之溫度及175MPa之壓力,持續熱均壓前述燒結體1小時;後續再以線切割與電腦數值控制(computer numerical control,CNC)車床加工,即製得各實施例及比較例之圓餅形鎳錸合金靶材(直徑165mm、厚度4mm之圓餅形靶材)。 Finally, the sintered body was continuously hot-pressed at a temperature of 1100 ° C and a pressure of 175 MPa for 1 hour; subsequently, it was processed by wire cutting and computer numerical control (CNC) lathe to obtain the examples and comparative examples. Pie-shaped nickel-rhenium alloy target (pie-shaped target with a diameter of 165 mm and a thickness of 4 mm).

如下表1所示,各實施例及比較例之鎳錸合金靶材的組成可由如Ni-aRe-b1Al-b2Zr-c1Ti-c2Nb-c3Mo-c4Ta-c5Os-c6Ir-c7Y-dFe之通式所示;a代表錸相對於鎳錸合金靶材之原子總數的含量比例,b1、b2依序代表鋁、鋯相對於鎳錸合金靶材之原子總數的含量比例,c1、c2、c3、c4、c5、c6、c7依序代表鈦、鈮、鉬、鉭、鋨、銥、釔相對於鎳錸合金靶材之原子總數的含量比例,d代表鐵相對於鎳錸合金靶材之原子總數的含量比例,其單位為原子百分比(at%)。其中,b1及b2之總和代表第一金屬成分之總含量,c1至c7之總和則代表第二金屬成分之總含量。 As shown in Table 1 below, the composition of the nickel-rhenium alloy targets of the examples and comparative examples can be represented by the general formula such as Ni-aRe-b1Al-b2Zr-c1Ti-c2Nb-c3Mo-c4Ta-c5Os-c6Ir-c7Y-dFe ; A represents the content ratio of thorium relative to the total number of atoms of the nickel-rhenium alloy target, b1 and b2 sequentially represent the content ratio of aluminum and zirconium relative to the total number of atoms of the nickel-rhenium alloy target, c1, c2, c3, c4, c5 , C6, c7 sequentially represent the content ratio of titanium, niobium, molybdenum, tantalum, osmium, iridium, yttrium relative to the total number of atoms of the nickel-rhenium alloy target, and d represents the content ratio of iron relative to the total number of atoms of the nickel-rhenium alloy target , Its unit is atomic percentage (at%). The sum of b1 and b2 represents the total content of the first metal component, and the sum of c1 to c7 represents the total content of the second metal component.

於本說明書中,所述「第一金屬成分之總含量」係指b1與b2之總合,所述「錸及第一金屬成分之總含量」係指a、b1及b2之總合;所述「第二金屬成分之總含量」係指c1、c2、c3、c4、c5、c6及c7之總合,所述「錸、第一金屬成分及第二金屬成分之總含量」係指a、b1、b2、c1、c2、c3、c4、c5、c6及c7之總合。 In this specification, the "total content of the first metal component" refers to the total of b1 and b2, and the "total content of rhenium and the first metal component" refers to the total of a, b1, and b2; The "total content of the second metal component" refers to the total of c1, c2, c3, c4, c5, c6, and c7, and the "total content of thorium, the first metal component, and the second metal component" means a , B1, b2, c1, c2, c3, c4, c5, c6, and c7.

比較例1:鎳鎢合金靶材Comparative Example 1: Nickel-Tungsten Alloy Target

本比較例採用鎳及鎢作為原料,根據如前述實施例所述之製法依序經過真空感應熔煉、霧化、燒結及後段車床加工步驟後,獲得比較例1之鎳鎢合金靶材。所述比較例1之鎳鎢合金靶材的組成可由Ni-5W所示,其中鎢相對於鎳鎢合金靶材之原子總數的含量為5at%,其餘為鎳。亦即,本比較例之鎳鎢合金靶材中不含有任何錸及第一金屬成分;更進一步而言,本比較例之鎳鎢合金靶材中也不含有第二金屬成分。 In this comparative example, nickel and tungsten are used as raw materials, and the nickel-tungsten alloy target material of Comparative Example 1 is obtained after vacuum induction melting, atomization, sintering, and subsequent lathe processing steps according to the manufacturing method described in the previous embodiment. The composition of the nickel-tungsten alloy target of Comparative Example 1 can be shown by Ni-5W, wherein the content of tungsten relative to the total number of atoms of the nickel-tungsten alloy target is 5 at%, and the rest is nickel. That is, the nickel-tungsten alloy target of the comparative example does not contain any rhenium and the first metal component; further, the nickel-tungsten alloy target of the comparative example does not include the second metal component.

比較例2:鎳錸合金靶材Comparative Example 2: Nickel-rhenium alloy target

本比較例採用鎳及錸作為原料,根據如前述實施例所述之製法依序經過真空感應熔煉、霧化、燒結及後段車床加工步驟後,獲得比較例2之鎳錸合金靶材。所述比較例2之鎳錸合金靶材的組成可由Ni-5Re所示,其中錸相對於鎳錸合金靶材之原子總數的含量為5at%,其餘為鎳。由比較例2之鎳錸合金靶材的組成可見,本比較例之鎳錸合金靶材中不含有任何第一金屬成分;更進一步而言,本比較例之鎳鎢合金靶材中也不含有第二金屬成分。 This comparative example uses nickel and rhenium as raw materials, and according to the manufacturing method described in the previous embodiment, after sequentially undergoing the steps of vacuum induction melting, atomization, sintering, and back-end lathe processing, the nickel-rhenium alloy target of Comparative Example 2 is obtained. The composition of the nickel-rhenium alloy target of Comparative Example 2 can be shown by Ni-5Re, in which the content of rhenium with respect to the total number of atoms of the nickel-rhenium alloy target is 5 at%, and the rest is nickel. From the composition of the nickel-rhenium alloy target of Comparative Example 2, it can be seen that the nickel-rhenium alloy target of this comparative example does not contain any first metal component; further, the nickel-tungsten alloy target of this comparative example does not contain The second metal component.

比較例3及4:鎳鐵合金靶材Comparative examples 3 and 4: nickel-iron alloy targets

本比較例主要採用鎳及鐵作為主要原料,另添加如下表1所示之其他金屬成分,根據如前述實施例所述之製法依序經過真空感應熔煉、燒結及後段車床加工步驟後,分別獲得比較例3及4之鎳鐵合金靶材。所述比較例3之鎳鐵合金靶材的組成可由Ni-1Al-25Fe所示,其中鋁相對於鎳鐵合金靶材之原子總數的含量為1at%,鐵相對於鎳鐵合金靶材之原子總數的含量為25at%,其餘為鎳。比較例4之鎳鐵合金靶材的組成可由Ni-2Al-2Zr-1Ti-25Fe所示,其中鋁相對於鎳鐵合金靶材之原子總數的含量為2at%,鋯相對於鎳鐵合金靶材之原子總數的含量為2at%,鈦相對於鎳鐵合金靶材之原子總數的含量為1at%,鐵相對於鎳鐵合金靶材之原子總數的含量為25at%,其餘為鎳。 This comparative example mainly uses nickel and iron as the main raw materials. In addition, other metal components shown in Table 1 are added. After the vacuum induction melting, sintering, and back-end lathe processing steps are sequentially performed according to the manufacturing method described in the previous embodiment, they are obtained separately. Nickel-iron alloy targets of Comparative Examples 3 and 4. The composition of the nickel-iron alloy target of Comparative Example 3 can be shown by Ni-1Al-25Fe, wherein the content of aluminum relative to the total number of atoms of the nickel-iron alloy target is 1 at%, and the content of iron relative to the total number of atoms of the nickel-iron alloy target 25at%, the rest is nickel. The composition of the nickel-iron alloy target of Comparative Example 4 can be shown by Ni-2Al-2Zr-1Ti-25Fe, wherein the content of aluminum relative to the total number of atoms of the nickel-iron alloy target is 2at%, and the total number of atoms of zirconium relative to the nickel-iron alloy target The content of iron is 2at%, the content of titanium relative to the total number of atoms of the nickel-iron alloy target is 1at%, the content of iron relative to the total number of atoms of the nickel-iron alloy target is 25at%, and the rest is nickel.

由下表1之組成可見,比較例3及4之鎳鐵合金靶材皆不含有錸金屬;比較例4之鎳鐵合金靶材雖含有鋁及鋯作為第一金屬成分、鈦作為第二金屬成分,但其第一金屬成分之總含量已超出3at%。更進一步而言,比較例3之鎳鐵合金靶材不含有任何第二金屬成分。 It can be seen from the composition of Table 1 below that none of the nickel-iron alloy targets of Comparative Examples 3 and 4 contains hafnium metal; although the nickel-iron alloy targets of Comparative Example 4 contain aluminum and zirconium as the first metal component and titanium as the second metal component, However, the total content of its first metal component has exceeded 3at%. Furthermore, the nickel-iron alloy target of Comparative Example 3 does not contain any second metal component.

比較例5至9:鎳錸合金靶材Comparative examples 5 to 9: nickel-rhenium alloy target

比較例5至9之鎳錸合金靶材主要採用鎳及錸,另添加如下表1所示之其他金屬成分,根據如前述實施例所述之製法依序經過真空感應熔煉、霧化、燒結及後段車床加工步驟後,分別獲得比較例5至9之鎳錸合金靶材。 The nickel-rhenium alloy targets of Comparative Examples 5 to 9 mainly use nickel and rhenium, in addition to other metal components shown in Table 1 below, and are sequentially subjected to vacuum induction melting, atomization, sintering, and After the subsequent lathe processing steps, the nickel-rhenium alloy targets of Comparative Examples 5 to 9 were obtained.

由下表1之組成可見,比較例5之鎳錸合金靶材中錸的含量已超出7at%;比較例6、7之鎳錸合金靶材則不含有任何第一金屬成分;比較例8之鎳錸合金靶材則不含有第二金屬成分,且其第一金屬成分之總含量已超出3at%,錸及第一金屬成分之總含量已高達10at%;比較例9之鎳錸合金靶材雖含有鈦作為第二金屬成分,但比較例9之鎳錸合金靶材中第一金屬成分之總含量已超出3at%,且錸及第一金屬成分之總含量已超出10at%。 As can be seen from the composition of Table 1 below, the content of rhenium in the nickel-rhenium alloy target of Comparative Example 5 has exceeded 7at%; the nickel-rhenium alloy targets of Comparative Examples 6 and 7 do not contain any first metal component; The nickel-rhenium alloy target does not contain a second metal component, and the total content of the first metal component has exceeded 3at%, and the total content of the rhenium and the first metal component has reached 10at%; the nickel-rhenium alloy target of Comparative Example 9 Although titanium is contained as the second metal component, the total content of the first metal component in the nickel-rhenium alloy target of Comparative Example 9 has exceeded 3 at%, and the total content of the hafnium and the first metal component has exceeded 10 at%.

更進一步而言,比較例7之鎳錸合金靶材中第二金屬成分之總含量已超出5at%,致使錸及第二金屬成分之總含量也已超出10at%;比較例9之鎳錸合金靶材中錸、第一金屬成分及第二金屬成分之總含量已超出10at%。 Furthermore, the total content of the second metal component in the nickel-rhenium alloy target of Comparative Example 7 has exceeded 5 at%, so that the total content of the europium and the second metal component has also exceeded 10 at%; the nickel-rhenium alloy of Comparative Example 9 The total content of tritium, the first metal component and the second metal component in the target has exceeded 10 at%.

試驗例1:靶材微結構Test example 1: target microstructure

本試驗例係利用光學顯微鏡觀察上述各實施例及比較例之靶材之微結構,以確認控制鎳錸合金靶材之組成能否達成細緻化及均勻化晶粒粒徑尺寸之效果。 This test example uses an optical microscope to observe the microstructure of the targets in the above examples and comparative examples to confirm whether the composition of the nickel-rhenium alloy target can be controlled to achieve the effects of refinement and uniform grain size.

以實施例6、8及9之鎳錸合金靶材、比較例1之鎳鎢合金靶材、比較例6及8之鎳錸合金靶材所得之光學顯微鏡影像圖進行示範性說明;由圖1A至圖1C以及圖2A及圖2B之比較結果可知,控制鎳錸合金靶材之組成能有利於細緻化及均勻化實施例6、8及9之鎳錸合金靶材的晶粒粒徑尺寸,相較之下,比較例1之鎳鎢合金靶材的組成中因不含有適量的錸及第一金屬成分,致使比較例1之鎳鎢合金靶材明顯存在晶粒粗大之問題,而比較例6之鎳錸合金靶材則因不含有任何第一金屬成分,致使比較例6之鎳錸合金靶材存在晶粒粒徑尺寸較不均勻的問題。 Exemplary illustrations are made using optical microscope image diagrams of the nickel-rhenium alloy targets of Examples 6, 8 and 9, the nickel-tungsten alloy targets of Comparative Example 1, and the nickel-rhenium alloy targets of Comparative Examples 6 and 8; from FIG. 1A From the comparison results of FIG. 1C and FIG. 2A and FIG. 2B, it can be known that controlling the composition of the nickel-rhenium alloy target material can help to refine and homogenize the grain size of the nickel-rhenium alloy target materials of Examples 6, 8, and 9, In contrast, the composition of the nickel-tungsten alloy target of Comparative Example 1 does not contain an appropriate amount of rhenium and the first metal component, which causes the problem of coarse grains in the nickel-tungsten alloy target of Comparative Example 1 to be apparent. Since the nickel-rhenium alloy target of 6 does not contain any first metal component, the nickel-rhenium alloy target of Comparative Example 6 has a problem that the grain size is relatively uneven.

根據本試驗例之結果可見,藉由適當控制鎳錸合金靶材之組成及製法,利用此種鎳錸合金靶材所濺鍍而成之鎳錸合金層的晶粒粒徑尺寸較為細緻,且晶粒粒徑尺寸的均勻性也較佳,故能解決以往鎳基合金靶材存在晶粒粗大以及粒徑尺寸變異較大等問題。 According to the results of this test example, by appropriately controlling the composition and manufacturing method of the nickel-rhenium alloy target, the grain size of the nickel-rhenium alloy layer sputtered by using this nickel-rhenium alloy target is relatively fine, and The uniformity of the grain size is also better, so it can solve the problems of conventional nickel-based alloy targets that have coarse grains and large variations in grain size.

試驗例2:平均晶粒粒徑及晶粒粒徑均勻度Test Example 2: Average grain size and uniformity of grain size

為再次驗證本創作之技術手段能同時細緻化及均勻化鎳錸合金靶材之晶粒粒徑,本試驗例係以上述各實施例及比較例之靶材為待測樣品,並將各待測樣品依據如下所述之相同方法進行分析:以線切割方式,於各靶材之中心、靶材之二分之一半徑(r/2)及邊緣(r)處取大小約10毫米×10毫米之試片。接著,以純水、鹽酸、硝酸及雙氧水之混合蝕刻溶液蝕刻靶材之頂面;於500倍之倍率下,使用光學顯微鏡在各試片上取5個不同的位置(包含試片的中心以及該中心的上、下、左、右處)觀察 各靶材之微結構,得到15張光學顯微鏡影像圖,所述15張光學顯微鏡影像圖的觀察區域相互錯開。 In order to verify again that the technical means of this creation can simultaneously refine and homogenize the grain size of nickel-rhenium alloy target materials, this test example uses the target materials of the above examples and comparative examples as the test samples, and The test samples are analyzed according to the same method as described below: by wire cutting, take a size of about 10 mm × 10 at the center of each target, half the radius (r / 2) and edge (r) of the target Test pieces in millimeters. Next, the top surface of the target is etched with a mixed etching solution of pure water, hydrochloric acid, nitric acid, and hydrogen peroxide; at a magnification of 500 times, use an optical microscope to take 5 different positions on each test strip (including the center of the test strip and the (Upper, lower, left, and right of the center) The microstructure of each target material is obtained by 15 optical microscope image images, and the observation areas of the 15 optical microscope image images are staggered from each other.

接著,於各光學顯微鏡影像圖上畫四條截線,其中二條截線為影像圖之對角線,另外兩條截線分別為平行於長邊之中心線及平行於短邊之中心線,四條截線於各影像圖上呈米字型排列。 Next, draw four cut lines on each optical microscope image, two of which are diagonal lines of the image, and the other two cut lines are respectively the center line parallel to the long side and the center line parallel to the short side. The cut lines are arranged in a m-shape on each image.

後續,以此抽樣統計四條截線上的晶粒總數,若截線的其中一端已計算一顆晶粒,則此截線的另一端即便貫穿一顆晶粒也不列入計算。統計各截線上的晶粒總數後,再將各截線於靶材上的實際長度(即光學顯微鏡影像圖上的截線長度乘以比例尺)除以晶粒總數得到各截線上之晶粒粒徑尺寸。 Subsequently, the total number of grains on the four cut lines is counted by this sampling. If one grain has been calculated on one end of the cut line, the other end of the cut line is not included in the calculation even if one grain passes through. After counting the total number of grains on each section, the actual length of each section on the target (that is, the length of the section on the optical microscope image multiplied by the scale) is divided by the total number of grains to obtain the grains on each section.径 Dimensions.

然後,以前述計算得到各截線上的晶粒粒徑尺寸的數據(各待測樣品共有60組數據)計算所有截線之平均晶粒粒徑尺寸與其標準差。 Then, the data of the crystal grain size on each section line (a total of 60 sets of data for each sample to be tested) are calculated according to the foregoing calculation, and the average crystal grain size and the standard deviation of all the sections are calculated.

於此,各待測樣品的平均晶粒粒徑尺寸係由以下計算方式所得。首先,將各待測樣品的中心試片的第一觀察區域所截取到的4組晶粒粒徑尺寸的數據取平均值,得到d1;再將各待測樣品的中心試片的第二觀察區域所截取到的4組晶粒粒徑尺寸的數據取平均值,得到d2;依此類推於中心試片得到d3、d4及d5。接著,再將各待測樣品於靶材之二分之一半徑的試片的第一觀察區域所截取到的4組晶粒粒徑尺寸的數據取平均值,得到d6;再將各待測樣品於靶材之二分之一半徑的試片的第二觀察區域所截取到的4組晶粒粒徑尺寸的數據取平均值,得到d7;依此類推於靶材之二分之一半徑的試片得到d8、d9及d10。同理,將各待測樣品的邊緣試片的第一觀察區域所截取到的4組晶粒粒徑尺寸的數據取平均值,得到d11;再將各待測樣品的邊緣試片的第二觀察區域所截取到的4組晶粒粒徑尺寸的數據取平均值,得到d12;依此類推於中心試片得到d13、d14及d15。將前述d1至d15取平均值,得到各待測樣品的平均晶粒粒徑尺寸。 Here, the average grain size of each sample to be measured is obtained by the following calculation method. First, the four groups of grain size data intercepted from the first observation area of the central test piece of each test sample are averaged to obtain d 1 ; then the second of the central test piece of each test sample is obtained. The data of the four groups of grain size data intercepted in the observation area are averaged to obtain d 2 ; and so on, the d 3 , d 4 and d 5 are obtained by analogy on the central test piece. Next, the data of the 4 groups of grain size of the sample to be measured in the first observation area of the test piece with a half radius of the target are averaged to obtain d 6 ; The data of the four groups of grain size measured by the sample in the second observation area of the test piece with a half radius of the target are averaged to obtain d 7 ; and so on at half of the target A radius test piece obtained d 8 , d 9 and d 10 . In the same way, the data of the four groups of grain size sizes intercepted by the first observation area of the edge test piece of each test sample are averaged to obtain d 11 ; and then the first The data of the four groups of grain size data intercepted in the two observation areas were averaged to obtain d 12 ; and so on were obtained on the central test piece to obtain d 13 , d 14 and d 15 . The above d 1 to d 15 are averaged to obtain the average grain size of each sample to be measured.

將標準差除以平均晶粒粒徑尺寸所計算而得之百分比代表正歸化之晶粒粒徑尺寸之均勻度(normalized uniformity of grain size)。晶粒粒徑尺寸之均勻度之百分比越大代表變異程度越嚴重,亦即,該待測樣品之晶粒粒徑尺寸越不均勻。各實施例及比較例之靶材的平均晶粒粒徑尺寸及晶粒粒徑尺寸之均勻度的分析結果統一列於上表1中。 The percentage calculated by dividing the standard deviation by the average grain size represents the normalized uniformity of grain size. The larger the percentage of the uniformity of the grain size, the more serious the degree of variation, that is, the more uneven the grain size of the sample to be tested. The analysis results of the average grain size and the uniformity of the grain size of the targets of the respective examples and comparative examples are listed in Table 1 above.

試驗例3:(111)晶體方向的強度比例Test example 3: (111) ratio of intensity in the crystal direction

本試驗例以實施例1至19之鎳錸合金靶材、比較例1之鎳鎢合金靶材、比較例3及4之鎳鐵合金靶材以及比較例2及5至9之鎳錸合金靶材為待測樣品,利用X光繞射儀(XRD)分析各待測樣品的結晶型態及其(111)晶體方向的強度。 This test example uses the nickel-rhenium alloy targets of Examples 1 to 19, the nickel-tungsten alloy targets of Comparative Example 1, the nickel-iron alloy targets of Comparative Examples 3 and 4, and the nickel-rhenium alloy targets of Comparative Examples 2 and 5 to 9. For the samples to be tested, the X-ray diffractometer (XRD) was used to analyze the crystal form of each sample to be tested and its (111) crystal direction intensity.

於本試驗例中,先以砂紙號數#60、#120、#240、#320、#600、#1000、#1500、#2000、#4000依序研磨各待測樣品,並以氧化鋁拋光液進行拋光至鏡面,再置入XRD機台中,以0.04°之步進角度,於20°至80°之掃描範圍下進行量測。 In this test example, each sample to be tested is sequentially ground with sandpaper numbers # 60, # 120, # 240, # 320, # 600, # 1000, # 1500, # 2000, and # 4000, and polished with alumina. The liquid is polished to a mirror surface, and then placed in an XRD machine, and measured at a step angle of 0.04 ° in a scanning range of 20 ° to 80 °.

以實施例6、8、9之鎳錸合金靶材、比較例1之鎳鎢合金靶材以及比較例6及8之鎳錸合金靶材為例,其XRD光譜如圖3所示。於圖3中,2θ落在44.58°、51.89°及76.61°處分別為FCC結晶結構中(111)晶體方向、(200)晶體方向及(220)晶體方向之特徵峰。 Taking the nickel-rhenium alloy targets of Examples 6, 8, and 9, the nickel-tungsten alloy targets of Comparative Example 1, and the nickel-rhenium alloy targets of Comparative Examples 6 and 8 as examples, the XRD spectra are shown in FIG. 3. In FIG. 3, 2θ falls at 44.58 °, 51.89 °, and 76.61 ° are characteristic peaks of the (111) crystal direction, (200) crystal direction, and (220) crystal direction in the FCC crystal structure, respectively.

由圖3可見,相較於比較例1之鎳鎢合金靶材、比較例6及8之鎳錸合金靶材的XRD光譜中(111)晶體方向的特徵峰,實施例6、8、9之鎳錸合金靶材的XRD光譜中(111)晶體方向的特徵峰強度較為明顯。此外,於比較例8之之鎳錸合金靶材的XRD光譜更可觀察到有ZrO2析出相、ZrO析出相、Al2O3析出相的形成,如圖3中箭頭所指。 It can be seen from FIG. 3 that the characteristic peaks in the (111) crystal direction in the XRD spectra of the nickel-tungsten alloy targets of Comparative Example 1 and the nickel-rhenium alloy targets of Comparative Examples 6 and 8 are compared with the characteristic peaks of (111) crystal directions in Examples 6, 8, and 9. The characteristic peak intensity of the (111) crystal direction in the XRD spectrum of the nickel-rhenium alloy target is obvious. In addition, in the XRD spectrum of the nickel-rhenium alloy target of Comparative Example 8, the formation of ZrO 2 precipitated phase, ZrO precipitated phase, and Al 2 O 3 precipitated phase can be further observed, as indicated by arrows in FIG. 3.

為進一步量化(111)晶體方向的強度比例,本試驗例另將各實施例及比較例所測得之XRD光譜中,(111)晶體方向、(200)晶體方向及(220)晶體方向之特徵峰強度經過如下所示之計算式換算,得到(111)晶體方向的強度比例,其結果如上表1所示。 In order to further quantify the intensity ratio of the (111) crystal direction, the characteristics of the (111) crystal direction, (200) crystal direction, and (220) crystal direction in the XRD spectrum measured in each of the examples and comparative examples are also included in this test example. The peak intensity was converted by the calculation formula shown below to obtain the intensity ratio in the (111) crystal direction. The results are shown in Table 1 above.

根據上述計算式能得到(111)晶體方向的強度比例,(111)晶體方向的強度比例越大代表靶材的結晶性越佳;利用結晶性越好的鎳錸合金靶材濺鍍形成垂直磁記錄媒體的晶種層,能確保形成在該晶種層上的磁記錄層的結晶結構,從而提升垂直磁記錄媒體之記錄密度。 According to the above calculation formula, the intensity ratio in the (111) crystal direction can be obtained. The larger the intensity ratio in the (111) crystal direction is, the better the crystallinity of the target material is. The nickel-rhenium alloy target material with better crystallinity is sputtered to form the vertical magnetism. The seed layer of the recording medium can ensure the crystal structure of the magnetic recording layer formed on the seed layer, thereby improving the recording density of the perpendicular magnetic recording medium.

實驗結果討論Discussion of experimental results

綜觀上述試驗例1至3之結果可見,實施例1至19之鎳錸合金靶材之組成因同時含有鎳、錸及特定種類的第一金屬成分,錸之含量大於0at%且小於或等於7at%,第一金屬成分之總含量大於或等於0at%且小於或等於3at%,且錸及第一金屬成分之總含量大於0at%且小於10at%;故能同時具備(a)平均晶粒粒徑尺寸可細微至30微米以下、(b)平均粒徑尺寸之均勻度可控制在20%以下、(c)(111)晶體方向之強度比例超過62%上述三者特性。反觀各比較例之靶材,則無法同時獲得前述(a)至(c)三者特性,因而無法適用於濺鍍形成垂直磁記錄媒體的晶種層,也無法如期提升垂直磁記錄媒體之記錄密度。 Looking at the results of the above test examples 1 to 3, it can be seen that the composition of the nickel-rhenium alloy targets of Examples 1 to 19 contains nickel, rhenium, and a specific kind of first metal component. The content of rhenium is greater than 0at% and less than or equal to 7at. %, The total content of the first metal component is greater than or equal to 0at% and less than or equal to 3at%, and the total content of the first metal component is greater than 0at% and less than 10at%; therefore, it can have (a) average grain size at the same time The diameter size can be as fine as 30 microns or less, (b) the uniformity of the average particle size can be controlled below 20%, and (c) the (111) crystal direction strength ratio exceeds 62%. In contrast, the targets of each comparative example cannot simultaneously obtain the above three characteristics (a) to (c), and therefore cannot be applied to the seed layer for sputtering to form a perpendicular magnetic recording medium, nor can the recording of the perpendicular magnetic recording medium be improved as scheduled. density.

進一步細究比較例1之鎳鎢合金靶材及比較例3、4之鎳鐵合金靶材之組成可見,由於這些比較例之靶材中並未含有錸的成分,致使其靶材中的 粒徑粗大至50μm以上,且晶粒粒徑均勻度不佳、(111)晶體方向之強度比例也未達60%,顯然無法獲得細緻化與均勻化靶材的晶粒粒徑以及提升結晶性等目的。 It can be seen that the composition of the nickel-tungsten alloy target of Comparative Example 1 and the nickel-iron alloy target of Comparative Examples 3 and 4 are further studied. Because the targets of these comparative examples do not contain the thorium component, the The particle size is coarser than 50 μm, and the uniformity of the grain size is not good, and the strength ratio of the (111) crystal direction is less than 60%. Obviously, it is not possible to obtain a refined and uniform target grain size and improve the crystallinity. And other purposes.

再觀比較例2、6、7之鎳錸合金靶材,即便靶材中含有錸的成分,但若未同時含有第一金屬成分,此種鎳錸合金靶材仍存在晶粒粗大、粒徑均勻度不佳以及結晶性不足的問題;且由比較例8、9之鎳錸合金靶材可見,即便鎳錸合金靶材中同時含有鎳、錸及第一金屬成分,但若第一金屬成分的含量過高,仍會存在前述問題,而無法獲得前述(a)至(c)三者特性。 Looking again at the nickel-rhenium alloy targets of Comparative Examples 2, 6, and 7, even if the target contains a rhenium component, if the first metal component is not simultaneously contained, such nickel-rhenium alloy targets still have coarse grains and particle sizes. The problems of poor uniformity and insufficient crystallinity; and from the nickel-rhenium alloy targets of Comparative Examples 8 and 9, it can be seen that even if the nickel-rhenium alloy target contains both nickel, rhenium, and the first metal component, if the first metal component If the content is too high, the aforementioned problems will still exist, and the above three characteristics (a) to (c) cannot be obtained.

針對實施例2、7至12、14、16、17及19之鎳錸合金靶材,當其組成更含有特定種類的第二金屬成分,進一步控制第二金屬成分之總含量大於0at%且小於或等於5at%,且錸、第一金屬成分及第二金屬成分之總含量大於0at%且小於10at%時,此種鎳錸合金靶材也能同時獲得前述(a)至(c)三者特性。反觀比較例5、7、8、9、10、13之鎳錸合金靶材,由於其錸、第一金屬成分及第二金屬成分之總含量已高達10at%以上,致使這些鎳錸合金靶材仍無法同時獲得前述(a)至(c)三者特性,尤其存在無法改善結晶性不足的問題。 For the nickel-rhenium alloy targets of Examples 2, 7 to 12, 14, 16, 17, and 19, when the composition further contains a specific type of second metal component, the total content of the second metal component is further controlled to be greater than 0 at% and less than Or equal to 5at%, and the total content of rhenium, the first metal component and the second metal component is greater than 0at% and less than 10at%, this nickel-rhenium alloy target can also obtain the above three (a) to (c) simultaneously characteristic. In contrast, the nickel-rhenium alloy targets of Comparative Examples 5, 7, 8, 9, 10, and 13 have a total content of rhenium, a first metal component, and a second metal component of more than 10 at%, which makes these nickel-rhenium alloy targets The three characteristics (a) to (c) described above cannot be obtained at the same time. In particular, there is a problem that the crystallinity cannot be improved.

再特別細究實施例3至18之鎳錸合金靶材之組成可見,當其含有鐵,且鐵的含量大於0at%且小於或等於30at%時,此種鎳錸合金靶材也能同時獲得前述(a)至(c)三者特性。 In particular, the composition of the nickel-rhenium alloy targets of Examples 3 to 18 can be seen. When it contains iron, and the iron content is greater than 0at% and less than or equal to 30at%, this nickel-rhenium alloy target can also obtain the foregoing. (a) to (c) Three characteristics.

綜合上述試驗例1至3之分析結果,本創作藉由控制鎳錸合金靶材之組成及其製法,能具體實現細緻化及均勻化鎳錸合金靶材的晶粒粒徑以及提升結晶性等目的,故本創作之鎳錸合金靶材能適用於垂直磁記錄媒體的製程中,用以濺鍍形成垂直磁記錄媒體的晶種層,進而提升垂直磁記錄媒體之記錄密度。 Based on the analysis results of the above test examples 1 to 3, by controlling the composition of the nickel-rhenium alloy target and its manufacturing method, the present invention can specifically realize the refinement and homogenization of the grain size of the nickel-rhenium alloy target and improve the crystallinity. For this reason, the nickel-rhenium alloy target material created by this invention can be applied to the process of perpendicular magnetic recording media, and is used for sputtering to form a seed layer of the perpendicular magnetic recording medium, thereby improving the recording density of the perpendicular magnetic recording medium.

Claims (10)

一種鎳錸合金靶材,其包括鎳、錸及第一金屬成分,第一金屬成分包含鋁、鋯或其組合,以該鎳錸合金靶材之原子總數為基準,錸之含量大於0原子百分比且小於或等於7原子百分比,第一金屬成分之總含量大於0原子百分比且小於或等於3原子百分比,且錸及第一金屬成分之總含量大於0原子百分比且小於10原子百分比。A nickel-rhenium alloy target includes nickel, rhenium, and a first metal component. The first metal component includes aluminum, zirconium, or a combination thereof. Based on the total number of atoms of the nickel-rhenium alloy target, the content of rhenium is greater than 0 atomic percent. It is less than or equal to 7 atomic percent, the total content of the first metal component is greater than 0 atomic percent and less than or equal to 3 atomic percent, and the total content of rhenium and the first metal component is greater than 0 atomic percent and less than 10 atomic percent. 如請求項1所述之鎳錸合金靶材,其中鎳錸合金靶材包括第二金屬成分,第二金屬成分包含鈦、鋨、銥、釔、鉭、鈮、鉬或其組合。The nickel-rhenium alloy target according to claim 1, wherein the nickel-rhenium alloy target includes a second metal component, and the second metal component includes titanium, osmium, iridium, yttrium, tantalum, niobium, molybdenum, or a combination thereof. 如請求項2所述之鎳錸合金靶材,其中以該鎳錸合金靶材之原子總數為基準,第二金屬成分之總含量大於0原子百分比且小於或等於5原子百分比,且錸、第一金屬成分及第二金屬成分之總含量大於0原子百分比且小於10原子百分比。The nickel-rhenium alloy target according to claim 2, wherein based on the total number of atoms of the nickel-rhenium alloy target, the total content of the second metal component is greater than 0 atomic percent and less than or equal to 5 atomic percent; The total content of the first metal component and the second metal component is greater than 0 atomic percent and less than 10 atomic percent. 如請求項1至3中任一項所述之鎳錸合金靶材,其中第一金屬成分之總含量大於0原子百分比且小於或等於2.9原子百分比。The nickel-rhenium alloy target according to any one of claims 1 to 3, wherein the total content of the first metal component is greater than 0 atomic percent and less than or equal to 2.9 atomic percent. 如請求項1至3中任一項所述之鎳錸合金靶材,其中鎳錸合金靶材包括鐵,以該鎳錸合金靶材之原子總數為基準,鐵之含量大於0原子百分比且小於或等於30原子百分比。The nickel-rhenium alloy target according to any one of claims 1 to 3, wherein the nickel-rhenium alloy target includes iron, and based on the total number of atoms of the nickel-rhenium alloy target, the iron content is greater than 0 atomic percent and less than Or equal to 30 atomic percent. 如請求項4所述之鎳錸合金靶材,其中鎳錸合金靶材包括鐵,以該鎳錸合金靶材之原子總數為基準,鐵之含量大於0原子百分比且小於或等於30原子百分比。The nickel-rhenium alloy target according to claim 4, wherein the nickel-rhenium alloy target includes iron, and based on the total number of atoms of the nickel-rhenium alloy target, the iron content is greater than 0 atomic percent and less than or equal to 30 atomic percent. 一種鎳錸合金靶材之製法,其包含:於1×10-2托耳至1×10-4托耳之真空環境下,以真空感應熔煉法熔煉一金屬原料,並以1500℃至1750℃之澆溫澆鑄得到一預合金鑄錠;霧化該預合金鑄錠,以得到一預合金粉末;於1000℃至1300℃之燒結溫度下,燒結該預合金粉末,以得到該鎳錸合金靶材;其中該金屬原料含有鎳、錸及第一金屬成分,第一金屬成分包含鋁、鋯或其組合,以該金屬原料之原子總數為基準,錸之含量大於0原子百分比且小於或等於7原子百分比,第一金屬成分之總含量大於0原子百分比且小於或等於3原子百分比,且錸及第一金屬成分之總含量大於0原子百分比且小於10原子百分比。A method for manufacturing a nickel-rhenium alloy target material, comprising: smelting a metal raw material by a vacuum induction melting method under a vacuum environment of 1 × 10 -2 Torr to 1 × 10 -4 Torr, and a temperature of 1500 ° C to 1750 ° C A pre-alloyed ingot is obtained by casting at a temperature; the pre-alloyed ingot is atomized to obtain a pre-alloyed powder; the pre-alloyed powder is sintered at a sintering temperature of 1000 ° C to 1300 ° C to obtain the nickel-rhenium alloy target The metal raw material contains nickel, hafnium and a first metal component, and the first metal component contains aluminum, zirconium or a combination thereof; based on the total number of atoms of the metal raw material, the content of hafnium is greater than 0 atomic percent and less than or equal to 7 Atomic percentage, the total content of the first metal component is greater than 0 atomic percent and less than or equal to 3 atomic percent, and the total content of rhenium and the first metal component is greater than 0 atomic percent and less than 10 atomic percent. 如請求項7所述之製法,其中燒結該預合金粉末之方法包括熱壓法、熱均壓法或其組合。The method according to claim 7, wherein the method for sintering the prealloy powder includes a hot pressing method, a hot equalizing method, or a combination thereof. 如請求項7或8所述之製法,其中該金屬原料更含有第二金屬成分,第二金屬成分包含鈦、鋨、銥、釔、鉭、鈮、鉬或其組合,以該金屬原料之原子總數為基準,第二金屬成分之總含量大於0原子百分比且小於或等於5原子百分比,且錸、第一金屬成分及第二金屬成分之總含量大於0原子百分比且小於10原子百分比。The method according to claim 7 or 8, wherein the metal raw material further contains a second metal component, and the second metal component contains titanium, osmium, iridium, yttrium, tantalum, niobium, molybdenum, or a combination thereof, and the atom of the metal raw material is Based on the total, the total content of the second metal component is greater than 0 atomic percent and less than or equal to 5 atomic percent, and the total content of rhenium, the first metal component, and the second metal component is greater than 0 atomic percent and less than 10 atomic percent. 如請求項7或8所述之製法,其中該金屬原料更含有鐵,以該金屬原料之原子總數為基準,鐵之含量大於0原子百分比且小於或等於30原子百分比。The method according to claim 7 or 8, wherein the metal raw material further contains iron, and based on the total number of atoms of the metal raw material, the iron content is greater than 0 atomic percent and less than or equal to 30 atomic percent.
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Publication number Priority date Publication date Assignee Title
US20080131735A1 (en) * 2006-12-05 2008-06-05 Heraeus Incorporated Ni-X, Ni-Y, and Ni-X-Y alloys with or without oxides as sputter targets for perpendicular magnetic recording
TW201103999A (en) * 2009-07-22 2011-02-01 China Steel Corp Method for manufacturing nickel alloy target
TW201726936A (en) * 2016-01-22 2017-08-01 光洋應用材料科技股份有限公司 Nickel alloy sputtering target and nickel alloy layer

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080131735A1 (en) * 2006-12-05 2008-06-05 Heraeus Incorporated Ni-X, Ni-Y, and Ni-X-Y alloys with or without oxides as sputter targets for perpendicular magnetic recording
TW201103999A (en) * 2009-07-22 2011-02-01 China Steel Corp Method for manufacturing nickel alloy target
TW201726936A (en) * 2016-01-22 2017-08-01 光洋應用材料科技股份有限公司 Nickel alloy sputtering target and nickel alloy layer

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