TWI558819B - Nickel alloy sputtering target and nickel alloy layer - Google Patents

Description

Nickel alloy target and nickel alloy layer

The present invention relates to a target and material for a magnetic recording medium, and more particularly to a nickel alloy target and a nickel alloy layer which are applicable to a seed layer of a vertical magnetic recording medium.

As people's demand for information storage capacity of magnetic recording media is increasing, how to improve the recording quality of magnetic recording media has been a research topic actively developed by the industry. The magnetic recording medium of the prior art can be classified into a horizontal magnetic recording medium and a vertical magnetic recording medium according to the direction of magnetization of the magnetic head. Among them, the recording density of the horizontal magnetic recording medium has been developed to the limit; therefore, the prior art has turned into the research of the vertical magnetic recording medium, and the magnetic recording medium is further improved by refining the recording unit and stacking the vertical layered structure. Record the density.

The layered structure of a general vertical magnetic recording medium includes a substrate, an adhesion layer, a soft underlayer, a seed layer, an intermediate layer, a magnetic recording layer, and a bottom layer. Cover layer and lubricating layer.

In order to ensure that the seed layer obtains the crystal structure of face-centered cubic (FCC), most of the prior art uses nickel as the main component of the seed layer; however, the seed layer sputtered by the nickel target is There are problems such as coarse grain size and large variation in particle size size, so that the magnetic recording layer deposited on the seed layer also has defects of coarse crystal grains and uneven particle size, and it is difficult to specifically increase the recording density of the magnetic recording medium.

In view of this, it is still necessary to try to refine the grain size of the nickel metal layer, and at the same time homogenize the grain size distribution of the nickel metal layer, so that the nickel metal layer can be applied to a vertical magnetic recording medium and serve as a seed layer. use.

The purpose of this creation is to refine and homogenize the grain size of the nickel alloy target, whereby the nickel alloy layer sputtered by the nickel alloy target also has the effect of grain refinement and homogenization.

Another purpose of the present invention is to control the nickel alloy target to be composed of a single FCC phase, whereby the nickel alloy layer sputtered by the nickel alloy target is also composed of a single FCC phase.

In order to achieve the foregoing object, the present invention provides a nickel alloy target comprising nickel and a refined metal, and the content of the refined metal is greater than or equal to 5 atomic percent based on the total number of atoms of the nickel alloy target. And less than or equal to 15 atomic percent, the refined metal contains cerium.

Accordingly, by adding an appropriate amount of bismuth to the nickel alloy target, not only can the nickel alloy target be composed of a single FCC phase, but also the fineness and uniformization of the grain size of the nickel alloy target can be facilitated. The average grain size of the nickel alloy target is less than 100 μm, and the grain size uniformity is 20% or less.

In the nickel alloy target, the content of the ruthenium as the refining metal may be greater than or equal to 5 atomic percent and less than or equal to 10 atomic percent.

According to the present invention, in addition to the foregoing niobium as one of the refining metals, the refining metal further includes: ruthenium (Ru), tungsten (W), tantalum (Ta), niobium (Nb), molybdenum (Mo), titanium. (Ti) or a combination thereof. Preferably, the refining metal comprises niobium, tungsten or a combination thereof in addition to niobium.

In one embodiment, the refining metal may be a combination of niobium and nickel; a combination of niobium and tungsten; a combination of niobium, nickel, and tungsten, but is not limited thereto. In this embodiment, the total content of the refined metal is greater than or equal to 10 atomic percent and less than or equal to 15 atomic percent based on the total number of atoms of the nickel alloy target, wherein the content of cerium is greater than 0 atomic percent and less than Or equal to 10 atomic percent; preferably, the total content of the refined metal is greater than or equal to 10 atomic percent and less than or equal to 15 atomic percent based on the total number of atoms of the nickel alloy target, wherein the content of cerium is greater than 0 atom Percentage and less than or equal to 8 atomic percent.

In another embodiment, the refined metal is composed of tantalum. In this embodiment, the content of ruthenium is greater than 6 atomic percent and less than or equal to 8 atomic percent based on the total number of atoms of the nickel alloy target.

Preferably, the nickel alloy target further comprises iron, and the iron content may be greater than 0 atomic percent and less than or equal to 30 atomic percent based on the total number of atoms of the nickel alloy target. Preferably, the iron content may be greater than or equal to 15 atomic percent and less than or equal to 30 atomic percent; more preferably, the iron content may be greater than or equal to 25 atomic percent and less than or equal to 30 atomic percent.

Preferably, the content of cerium is greater than or equal to 5 atomic percent and less than or equal to 8 atomic percent based on the total number of atoms of the nickel alloy target, and the iron content is greater than or equal to 15 atomic percent and less than or equal to 28 atomic percent. .

In still another embodiment, the nickel alloy target further comprises iron, the refined metal may be a combination of niobium and nickel; a combination of niobium and tungsten; a combination of niobium, nickel and tungsten, but is not limited thereto. In this embodiment, the total content of the refined metal is greater than 5 atomic percent and less than or equal to 15 atomic percent based on the total number of atoms of the nickel alloy target, and the germanium content is greater than or equal to 5 atomic percent and less than or Equal to 10 atomic percent, the iron content is as described above.

In still another embodiment, the nickel alloy target further comprises iron, and the refined metal system is composed of tantalum. In this embodiment, the content of ruthenium is greater than or equal to 5 atomic percent and less than 10 atomic percent based on the total number of atoms of the nickel alloy target, and the iron content is also as described above.

Preferably, the phase composition of the nickel alloy target is composed of a face-centered cubic crystal structure, so that the seed layer applied to the vertical recording medium can be favorably formed by sputtering.

Preferably, the nickel alloy target has an average grain size of less than or equal to 100 microns. Compared with the pure nickel target of the prior art, the present invention can specifically solve the problem of coarse grain of the target, so the nickel alloy layer sputtered by the nickel alloy target of the present invention can be applied to the vertical recording medium. , thereby increasing its recording density.

To achieve the foregoing objects, the present invention further provides a nickel alloy layer which is sputtered from various nickel alloy targets as described above. Specifically, the nickel alloy layer includes nickel and a refined metal, and the content of the refined metal is greater than or equal to 5 atomic percent and less than or equal to 15 atomic percent based on the total number of atoms of the nickel alloy layer, the refinement The metal contains antimony.

Accordingly, by controlling the composition of the nickel alloy layer, the nickel alloy layer can be applied to a seed layer as a vertical magnetic recording medium, thereby increasing the recording density of the vertical magnetic recording medium.

In the nickel alloy layer, the content of the ruthenium as the refining metal may be greater than or equal to 5 atomic percent and less than or equal to 10 atomic percent.

In one embodiment, the refining metal may be a combination of niobium and nickel; a combination of niobium and tungsten; a combination of niobium, nickel, and tungsten, but is not limited thereto. In this embodiment, the total content of the refined metal is greater than or equal to 10 atomic percent and less than or equal to 15 atomic percent based on the total number of atoms of the nickel alloy layer, wherein the content of cerium is greater than 0 atomic percent and less than or Is equal to 10 atomic percent; preferably, the total content of the refined metal is greater than or equal to 10 atomic percent and less than or equal to 15 atomic percent based on the total number of atoms of the nickel alloy layer, wherein the content of cerium is greater than 0 atomic percent and Less than or equal to 8 atomic percent.

In another embodiment, the refined metal is composed of tantalum. In this embodiment, the content of ruthenium is greater than 6 atomic percent and less than or equal to 8 atomic percent based on the total number of atoms of the nickel alloy layer.

Preferably, the nickel alloy layer further comprises iron, and the iron content may be greater than 0 atomic percent and less than or equal to 30 atomic percent based on the total number of atoms of the nickel alloy layer. Preferably, the iron content may be greater than or equal to 15 atomic percent and less than or equal to 30 atomic percent; more preferably, the iron content may be greater than or equal to 25 atomic percent and less than or equal to 30 atomic percent.

Preferably, the content of cerium is greater than or equal to 5 atomic percent and less than or equal to 8 atomic percent based on the total number of atoms of the nickel alloy layer, and the iron content is greater than or equal to 15 atomic percent and less than or equal to 28 atomic percent.

In still another embodiment, the nickel alloy layer further comprises iron, the refined metal may be a combination of niobium and nickel; a combination of niobium and tungsten; and a combination of niobium, nickel and tungsten, but is not limited thereto. In this embodiment, the total content of the refined metal is greater than 5 atomic percent and less than or equal to 15 atomic percent based on the total number of atoms of the nickel alloy layer, and the germanium content is greater than or equal to 5 atomic percent and less than or equal to 10 atomic percent, the iron content is as described above.

In still another embodiment, the nickel alloy layer further comprises iron, and the refined metal system is composed of tantalum. In this embodiment, the content of ruthenium is greater than or equal to 5 atomic percent and less than 10 atomic percent based on the total number of atoms of the nickel alloy layer, and the iron content is also as described above.

Preferably, the phase composition of the nickel alloy layer is composed of a face-centered cubic crystal structure, so that the seed layer applied to the vertical recording medium can be favorably formed by sputtering.

Preferably, the nickel alloy layer has an average grain size of less than or equal to 100 microns. Compared with the seed layer of the prior art, the present invention can specifically solve the problem of coarse grain of the seed layer in the prior art, thereby improving the recording density of the vertical magnetic recording medium.

In order to verify the influence of the composition of the nickel alloy target on its grain size and uniformity and phase composition, several nickel alloy targets with different compositions are listed below as examples to illustrate the implementation of the present invention, and other combinations. The nickel alloy target is used as a comparative example to explain the difference in characteristics between the examples and the comparative examples. Those skilled in the art can easily understand the advantages and effects of the present invention through the contents of the present specification, and do not deviate from the creation. Various modifications and changes are made in the spirit to implement or apply the content of this creation.

Example 1 and 2 : Ni-Re Target

According to the composition of the nickel alloy target shown in Table 1 below, an appropriate amount of nickel and tantalum raw materials were weighed and mixed, and vacuum induction melting method was used in a vacuum environment of 5×10 ^-2 Torr, a temperature of 1750 ° C, and Under the reaction condition that the temperature is higher than the temperature of 100 ° C, the wire-cutting and computer numerical control (CNC) lathe processing is followed, and the round-shaped nickel alloy targets of the examples 1 and 2 are obtained. A 165 mm, 4 mm thick pie-shaped target, referred to as Ni-Re target).

As shown in Table 1 below, the compositions of the nickel alloy targets of Examples 1 and 2 (abbreviated as Ni-Re targets) are represented by the general formula of aNi-b1Re; a and b1 sequentially represent nickel and rhodium relative to nickel. The content ratio of the total number of atoms of the alloy target, the unit of which is atomic percentage (at%).

Example 3 to 5 : Ni-Re-W Target

According to the composition of the nickel alloy target shown in Table 1 below, weigh and mix the appropriate amount of nickel, tantalum and tungsten raw materials, and use vacuum induction melting method to pour in a vacuum environment of 5×10 ^-2 Torr and 1750 °C. Under the reaction conditions of temperature and temperature above 100 °C, the wire-cutting and computer numerical control (CNC) lathe processing is followed, and the round-shaped nickel alloy targets of Examples 3 to 5 are obtained. (Circular-shaped target with a diameter of 165 mm and a thickness of 4 mm, referred to as Ni-Re-W target).

As shown in Table 1 below, the compositions of the Ni-Re-W targets of Examples 3 to 5 are represented by the general formula of aNi-b1Re-b2W; a, b1 and b2 sequentially represent nickel, ruthenium and tungsten relative to The content ratio of the total number of atoms of the nickel alloy target, the unit of which is at%.

Example 6 : Ni-Re-Ru Target

According to the composition of the nickel alloy target shown in Table 1 below, weigh and mix the appropriate amount of nickel, niobium and tantalum raw materials, and use vacuum induction melting method in a vacuum environment of 5×10 ^-2 Torr and pouring at 1750 °C. Under the reaction conditions of temperature and temperature above 100 °C, the wire-cutting and computer numerical control (CNC) lathe processing is followed, and the round-shaped nickel alloy target of Example 6 is obtained. A 165 mm, 4 mm thick pie-shaped target, referred to as Ni-Re-Ru target).

As shown in Table 1 below, the composition of the Ni-Re-Ru target of Example 6 is represented by the general formula of aNi-b1Re-b3Ru; a, b1 and b3 sequentially represent nickel, ruthenium and iridium relative to the nickel alloy. The content ratio of the total number of atoms of the target, the unit of which is at%.

Example 7 : Ni-Re-W-Ru Target

According to the composition of the nickel alloy target shown in Table 1 below, the appropriate amount of nickel, tantalum, tungsten and niobium materials were weighed and mixed, and vacuum induction melting method was used in a vacuum environment of 5×10 ^-2 Torr, 1750 ° C. Under the reaction conditions of the pouring temperature and the holding temperature higher than the pouring temperature of 100 ° C, the wire cutting and computer numerical control (CNC) lathe processing is followed, and the round cake-shaped nickel alloy target of the embodiment 7 is obtained. (A round pie-shaped target with a diameter of 165 mm and a thickness of 4 mm, referred to as Ni-Re-W-Ru target for short).

As shown in Table 1 below, the composition of the Ni-Re-W-Ru target of Example 7 is represented by the general formula of aNi-b1Re-b2W-b3Ru; a, b1, b2, and b3 sequentially represent nickel and ruthenium. The ratio of the content of tungsten and rhenium to the total number of atoms of the nickel alloy target is in%.

Example 8 to 10 : Ni-Fe-Re Target

According to the composition of the nickel alloy target shown in Table 1 below, weigh and mix the appropriate amount of nickel, iron and tantalum raw materials, and use vacuum induction melting method in a vacuum environment of 5×10 ^-2 Torr and pouring at 1750 °C. Under the reaction conditions of temperature and temperature above 100 ° C, the wire-cutting and computer numerical control (CNC) lathe processing is followed, and the round-shaped nickel alloy targets of Examples 8 to 10 are obtained. (Circular-shaped target with a diameter of 165 mm and a thickness of 4 mm, referred to as Ni-Fe-Re target).

As shown in Table 1 below, the compositions of the Ni-Fe-Re targets of Examples 8 to 10 are represented by the general formula of aNi-cFe-b1Re; a, b1 and c sequentially represent nickel, ruthenium and iron relative to The content ratio of the total number of atoms of the nickel alloy target, the unit of which is at%.

Example 11 and 12 : Ni-Fe-Re-W-Ru Target

According to the composition of the nickel alloy target shown in Table 1 below, the appropriate amount of nickel, iron, bismuth, tungsten and antimony materials were weighed and mixed, and vacuum induction melting method was used in a vacuum environment of 5×10 ^-2 Torr, 1750. Under the reaction conditions of °C and the holding temperature of 100 °C, the wire cutting and computer numerical control (CNC) lathe processing were carried out, and the round cakes of Examples 11 and 12 were obtained. Nickel alloy target (a round pie-shaped target with a diameter of 165 mm and a thickness of 4 mm, referred to as Ni-Fe-Re-W-Ru target).

As shown in Table 1 below, the compositions of the Ni-Fe-Re-W-Ru targets of Examples 11 and 12 are represented by the general formula of aNi-cFe-b1Re-b2W-b3Ru; a, b1, b2, b3 And c sequentially represents the content ratio of nickel, ruthenium, tungsten, ruthenium and iron relative to the total number of atoms of the nickel alloy target, and the unit is at%.

Example 13 to 15 : Ni-Fe-Re-Ru Target

According to the composition of the nickel alloy target shown in Table 1 below, weigh and mix the appropriate amount of nickel, iron, bismuth and antimony materials, using vacuum induction melting method, in a vacuum environment of 5 × 10 ^-2 Torr, 1750 ° C Under the reaction conditions of the pouring temperature and the holding temperature higher than the pouring temperature of 100 ° C, the wire cutting and computer numerical control (CNC) lathe processing is followed, and the round cake-shaped nickel alloys of Examples 13 to 15 are obtained. Target (a round pie-shaped target with a diameter of 165 mm and a thickness of 4 mm, abbreviated as Ni-Fe-Re-Ru target).

As shown in Table 1 below, the compositions of the Ni-Fe-Re-Ru targets of Examples 13 to 15 are represented by the general formula of aNi-cFe-b1Re-b3Ru; a, b1, b3 and c represent nickel in sequence. The ratio of the content of yttrium, lanthanum and iron to the total number of atoms of the nickel alloy target is in%.

Example 16 to twenty one : Ni-Fe-Re-W Target

According to the composition of the nickel alloy target shown in Table 1 below, the appropriate amount of nickel, iron, tantalum and tungsten raw materials were weighed and mixed, and vacuum induction melting method was used in a vacuum environment of 5×10 ^-2 Torr, 1750 ° C. Under the reaction conditions of the pouring temperature and the holding temperature higher than the pouring temperature of 100 ° C, the wire-cutting and computer numerical control (CNC) lathe processing is followed, and the round-shaped nickel alloys of Examples 16 to 21 are obtained. Target (a round pie-shaped target with a diameter of 165 mm and a thickness of 4 mm, referred to as Ni-Fe-Re-W target).

As shown in Table 1 below, the compositions of the Ni-Fe-Re-W targets of Examples 16 to 21 are represented by the general formula of aNi-cFe-b1Re-b2W; a, b1, b2 and c represent nickel in sequence. The ratio of the content of yttrium, tungsten, and iron to the total number of atoms of the nickel alloy target is in%.

Comparative example 1 : pure nickel target

This comparative example does not contain any refining metal (such as lanthanum, cerium or tungsten), but uses nickel as a raw material alone, in a vacuum environment of 5 × 10 ^-2 Torr, a pouring temperature of 1750 ° C and a holding temperature higher than Under the reaction conditions of pouring temperature of 100 ° C, the initial ingot was formed; followed by wire cutting and computer numerical control lathe processing to obtain the round-shaped pure nickel target of Comparative Example 1.

Comparative example 2 and 3 : Ni-Re Target

The nickel alloy targets of Comparative Examples 2 and 3 (abbreviated as Ni-Re targets) were used for comparison with the Ni-Re targets of Examples 1 and 2; the Ni-Re targets of Comparative Examples 2 and 3 were substantially According to the methods of Examples 1 and 2, the comparative examples are different from Examples 1 and 2 in that the composition of the Ni-Re target of Comparative Examples 2 and 3 is relative to the nickel alloy target. The content ratio of the total number of atoms exceeds the range of 6 at% to 8 at%, and the specific composition thereof is shown in Table 1 below.

Comparative example 4 : Ni-Fe Target

This comparative example does not contain any refining metal, but uses nickel and iron as raw materials in combination, and uses vacuum induction melting method in a vacuum environment of 5×10 ^-2 Torr, a pouring temperature of 1750 ° C, and a holding temperature higher than that of pouring. Under the reaction conditions of temperature 100 ° C, the initial ingot was formed; followed by wire cutting and computer numerical control lathe processing to obtain the round pie-shaped Ni-Fe target of Comparative Example 4.

Comparative example 5 : Ni-Re-W Target

The nickel alloy target of Comparative Example 5 (abbreviated as Ni-Re-W target) was used for comparison with the Ni-Re-W targets of Examples 3 to 5; the Ni-Re-W target of Comparative Example 5 was used. It is roughly obtained by the methods as in Examples 3 to 5, which is different from Examples 3 to 5 in that the composition of the Ni-Re-W target of Comparative Example 5 is relative to the nickel alloy target. The proportion of the total number of atoms exceeds 8 at%, and its specific composition is shown in Table 1 below.

Comparative example 6 : Ni-Re-Ru Target

The nickel alloy target of Comparative Example 6 (abbreviated as Ni-Re-Ru target) was used for comparison with the Ni-Re-Ru target of Example 6; the Ni-Re-Ru target of Comparative Example 6 was substantially The difference was obtained by the method of Example 6, which differs from Example 6 in that the total content of lanthanum relative to the total number of atoms of the nickel alloy target in the composition of the Ni-Re-Ru target of Comparative Example 6. The ratio exceeds 8 at%, and its specific composition is shown in Table 1 below.

Comparative example 7 : Ni-Re-W-Ru Target

The nickel alloy target of Comparative Example 7 (abbreviated as Ni-Re-W-Ru target) was used for comparison with the Ni-Re-W-Ru target of Example 6; Ni-Re-W- of Comparative Example 7 The Ru target was roughly prepared by the method of Example 7, which differs from Example 7 in that the composition of the Ni-Re-W-Ru target of Comparative Example 7, tantalum, tungsten and rhenium The ratio of the total content of the total number of atoms relative to the nickel alloy target has exceeded 15 at%, and the specific composition thereof is shown in Table 1 below.

Comparative example 8 and 9 : Ni-Fe-Re Target

The nickel alloy targets of Comparative Examples 8 and 9 (abbreviated as Ni-Fe-Re targets) were used for comparison with the Ni-Fe-Re targets of Examples 8 to 10; Ni-Fe- of Comparative Examples 8 and 9 The Re target system was roughly prepared by the methods as described in Examples 8 to 10, and the comparative examples were different from Examples 8 to 10 in the composition of the Ni-Fe-Re targets of Comparative Examples 7 and 8. In the middle, the content ratio of lanthanum to the total number of atoms of the nickel alloy target has exceeded 8 at%, and the specific composition thereof is shown in Table 1 below.

Comparative example 10 and 11 : Ni-Fe-Re-W-Ru Target

The nickel alloy targets of Comparative Examples 10 and 11 (abbreviated as Ni-Fe-Re-W-Ru target) were used for comparison with the Ni-Fe-Re-W-Ru targets of Examples 11 and 12; Comparative Examples The Ni-Fe-Re-W-Ru target of 10 and 11 was prepared substantially by the methods as described in Examples 11 to 12, and the comparative examples were different from Examples 11 and 12 in Comparative Example 10 In the composition of the Ni-Fe-Re-W-Ru target of 11 and 11, the total content of lanthanum, tungsten and lanthanum relative to the total number of atoms of the nickel alloy target has exceeded 15 at%, and the specific composition thereof is shown in Table 1 below.

Comparative example 12 : Ni-Fe-Re-Ru Target

The nickel alloy target of Comparative Example 12 (abbreviated as Ni-Fe-Re-Ru target) was used for comparison with the Ni-Fe-Re-Ru target of Examples 13 to 15; Ni-Fe- of Comparative Example 12 The Re-Ru target was roughly obtained by the method as described in Examples 13 to 15, which was different from Examples 13 to 15 in the Ni-Fe-Re-Ru target of Comparative Example 12. In the composition, the total content of lanthanum and cerium relative to the total number of atoms of the nickel alloy target has exceeded 15 at%, and the specific composition thereof is shown in Table 1 below. Table 1: Composition, average grain size, and uniformity and phase composition analysis results of the nickel alloy target of Examples 1 to 21, the pure nickel target of Comparative Example 1, and the nickel alloy target of Comparative Examples 2 to 12.         <TABLE border="1" borderColor="#000000" width="_0002"><TBODY><tr><td> </td><td> Composition of nickel alloy target</td><td> average crystal Particle size (μm) </td><td> Grain size uniformity (%) </td><td> Phase composition</td></tr><tr><td> Example 1 </ Td><td> 93.5Ni-6.5Re </td><td> 95.82 </td><td> 18.84% </td><td> FCC phase</td></tr><tr><td> Example 2 </td><td> 92Ni-8Re </td><td> 89.37 </td><td> 14.33% </td><td> FCC phase</td></tr><tr> <td> Example 3 </td><td> 88Ni-8Re-4W </td><td> 61.34 </td><td> 19.36% </td><td> FCC phase</td></ Tr><tr><td> Example 4 </td><td> 87Ni-5Re-8W </td><td> 59.78 </td><td> 17.11% </td><td> FCC phase< /td></tr><tr><td> Example 5 </td><td> 85Ni-7Re-8W </td><td> 58.43 </td><td> 17.74% </td>< Td> FCC phase</td></tr><tr><td> Example 6 </td><td> 87Ni-8Re-5Ru </td><td> 51.09 </td><td> 19.43% </td><td> FCC phase</td></tr><tr><td> Example 7 </td><td> 86Ni-5Re-4W-5Ru </td><td> 14.45 </ Td><td> 16.68% </td><td> FCC phase</td></tr><tr><td> Example 8 </td><td> 70Ni-25Fe-5Re </td>< Td> 59.39 </td><td> 19.80% </td><td> FCC phase</td></tr><tr><td> Example 9 </td><td> 74Ni-18Fe-8Re </td><td> 53.64 </td> <td> 14.41% </td><td> FCC phase</td></tr><tr><td> Example 10 </td><td> 67Ni-25Fe-8Re </td><td> 33.48 </td><td> 13.85% </td><td> FCC phase</td></tr><tr><td> Example 11 </td><td> 61Ni-25Fe-5Re-4W -5Ru </td><td> 19.43 </td><td> 14.58% </td><td> FCC phase</td></tr><tr><td> Example 12 </td>< Td> 60Ni-25Fe-6Re-4W-5Ru </td><td> 23.23 </td><td> 15.90% </td><td> FCC phase</td></tr><tr><td > Example 13 </td><td> 62Ni-25Fe-8Re-5Ru </td><td> 18.55 </td><td> 17.69% </td><td> FCC phase</td></ Tr><tr><td> Example 14 </td><td> 60Ni-25Fe-10Re-5Ru </td><td> 14.14 </td><td> 5.72% </td><td> FCC Phase </td></tr><tr><td> Example 15 </td><td> 55Ni-30Fe-5Re-10Ru </td><td> 16.52 </td><td> 17.51% < /td><td> FCC phase</td></tr><tr><td> Example 16 </td><td> 66Ni-25Fe-5Re-4W </td><td> 21.46 </td ><td> 14.76% </td><td> FCC phase</td></tr><tr><td> Example 17 </td><td> 63Ni-25Fe-8Re-4W </td> <td> 28.80 </td><td> 18.34% </td><td> FCC phase</td> </tr><tr><td> Example 18 </td><td> 62Ni-25Fe-5Re-8W </td><td> 27.24 </td><td> 13.29% </td><td > FCC phase</td></tr><tr><td> Example 19 </td><td> 60Ni-25Fe-7Re-8W </td><td> 25.89 </td><td> 13.92 % </td><td> FCC phase</td></tr><tr><td> Example 20 </td><td> 58Ni-30Fe-8Re-4W </td><td> 28.80 < /td><td> 18.34% </td><td> FCC phase</td></tr><tr><td> Example 21 </td><td> 56Ni-30Fe-10Re-4W </ Td><td> 14.31 </td><td> 8.85% </td><td> FCC phase</td></tr><tr><td> Comparative Example 1 </td><td> Ni < /td><td> 724.00 </td><td> 64.30% </td><td> FCC phase</td></tr><tr><td> Comparative Example 2 </td><td> 95Ni -5Re </td><td> 131.38 </td><td> 24.77% </td><td> FCC phase</td></tr><tr><td> Comparative Example 3 </td>< Td> 90Ni-10Re </td><td> 88.20 </td><td> 22.79% </td><td> FCC phase and HCP phase</td></tr><tr><td> Comparative example 4 </td><td> 75Ni-25Fe </td><td> 385.47 </td><td> 15.85% </td><td> FCC phase</td></tr><tr><td > Comparative Example 5 </td><td> 86Ni-10Re-4W </td><td> 46.86 </td><td> 12.68% </td><td> FCC phase and HCP phase</td>< /tr><tr><td> Comparative Example 6 </td><td> 85Ni-10Re-5Ru </t d><td> 46.68 </td><td> 21.52% </td><td> FCC phase and HCP phase</td></tr><tr><td> Comparative Example 7 </td><td > 72Ni-10Re-8W-10Ru </td><td> 30.44 </td><td> 21.51% </td><td> FCC phase and HCP phase</td></tr><tr><td > Comparative Example 8 </td><td> 72Ni-18Fe-10Re </td><td> 41.99 </td><td> 10.73% </td><td> FCC phase and HCP phase</td>< /tr><tr><td> Comparative Example 9 </td><td> 65Ni-25Fe-10Re </td><td> 16.20 </td><td> 7.89% </td><td> FCC phase And HCP phase</td></tr><tr><td> Comparative Example 10 </td><td> 58Ni-25Fe-8Re-4W-5Ru </td><td> 30.83 </td><td > 18.52% </td><td> FCC phase and HCP phase</td></tr><tr><td> Comparative Example 11 </td><td> 57Ni-25Fe-5Re-8W-5Ru </ Td><td> 20.31 </td><td> 11.48% </td><td> FCC phase and HCP phase</td></tr><tr><td> Comparative Example 12 </td><td > 58Ni-25Fe-12Re-5Ru </td><td> 33.75 </td><td> 22.94% </td><td> FCC phase and HCP phase</td></tr></TBODY>< /TABLE>

Test case 1 : Target microstructure

In this test example, the microstructures of the targets of the above respective examples and comparative examples were observed by an optical microscope to confirm whether the composition of the nickel alloy target can be controlled to achieve the effect of refining and uniformizing the grain size.

An optical microscope image obtained by using the nickel alloy target of Examples 3, 4, 6, 7, and 16, the pure nickel target of Comparative Example 1, and the nickel alloy target of Comparative Examples 2 to 4 is taken as an example; 1E and 2A to 2D, it can be seen that controlling the composition of the nickel alloy target can facilitate the miniaturization and homogenization of the grain size of the nickel alloy target of Examples 3, 4, 6, 7, and 16. In comparison, the grain size of the pure nickel target of Comparative Example 1 and the nickel alloy target of Comparative Examples 2 and 4 was coarser, and the grain size of the nickel alloy target of Comparative Example 1 was present. The problem of uneven distribution.

In short, when the sputtering process is performed using the nickel alloy targets as in Examples 3, 4, 6, 7, and 16, the grain size of the formed nickel alloy layer can be finer and the grain size is The uniformity is also preferred; therefore, when such a nickel alloy layer is applied to a perpendicular magnetic recording medium and serves as a seed layer, the magnetic recording layer formed on the seed layer can relatively obtain a finer and uniform crystal. Granules, thereby increasing the recording density of the perpendicular magnetic recording medium.

Test case 2 : Crystalline type

This test example uses the X-ray diffractometer to analyze the phase composition of the nickel alloy target of Examples 1 to 21, the pure nickel target of Comparative Example 1, and the nickel alloy target of Comparative Examples 2 to 12; The X-ray diffraction pattern of the nickel metal and the HCP phase bismuth metal confirmed the phase composition of the nickel alloy target of Examples 1 to 21, the pure nickel target of Comparative Example 1, and the nickel alloy target of Comparative Examples 2 to 12, The results are shown in Table 1 above.

According to the standard X-ray diffraction pattern of FCC phase nickel metal, the characteristic peaks of (111) plane, (200) plane and (220) plane are located at 2θ of 44.58°, 51.89° and 76.61°, respectively; according to HCP phase The X-ray diffraction pattern of the base metal has characteristic peaks of (002) plane, (101) plane, (102) plane, (103) plane, (112) plane and (202) plane at 2θ of 37.46°, respectively. 40.24°, 42.64°, 56.05°, 67.34° and 75.38°.

Referring further to the drawings, referring to the X-ray diffraction pattern of the Ni-Re target of Examples 1 and 2, the X-ray diffraction pattern of the Ni-Re target of Comparative Example 3 is shown in FIG. 3A. The (002) surface characteristic peak of the HCP phase is more, indicating that the Ni-Re target of Comparative Example 3 is not composed of a single FCC phase, but is composed of an FCC phase and an HCP phase.

It can be seen that in the Ni-Re material system, when the content ratio of lanthanum to nickel alloy target falls within the range of 6 at% to 8 at%, such a nickel alloy target can be ensured (as in Example 1 and 2) The phase composition is a single FCC phase, so it can be used for sputtering to form a nickel alloy layer of a single FCC phase, and the nickel alloy layer is suitable for a seed layer of a vertical magnetic recording medium.

Referring to FIG. 3B again, compared with the X-ray diffraction pattern of the Ni-Re-W target of Examples 3 to 5, the X-ray diffraction pattern of the Ni-Re-W target of Comparative Example 5 is more The characteristic peaks of the (002) plane and the (101) plane in the HCP phase show that the Ni-Re-W target of Comparative Example 5 is not composed of a single FCC phase, but is composed of an FCC phase and an HCP phase. Further, as shown in FIG. 3C, the X-ray diffraction pattern of the Ni-Re-Ru target of Example 6 has an HCP phase in the X-ray diffraction pattern of the Ni-Re-Ru target of Comparative Example 6. The characteristic peaks of the middle (002) plane and the (103) plane show that the Ni-Re target of Comparative Example 6 is not composed of a single FCC phase, but is composed of an FCC phase and an HCP phase. 3D, in the X-ray diffraction pattern of the Ni-Re-W-Ru target of Comparative Example 7, compared to the X-ray diffraction pattern of the Ni-Re-W-Ru target of Example 7. The characteristic peak of the (101) plane of the HCP phase is increased, and it is shown that the Ni-Re-W-Ru target of Comparative Example 7 is not composed of a single FCC phase, but is composed of an FCC phase and an HCP phase.

The results of the experiments of FIGS. 3B and 3D above show that, in the Ni-Re-W, Ni-Re-Ru or Ni-Re-W-Ru material systems, the metal is refined (as in Examples 3 to 5). The ratio of total content of niobium and tantalum contained in Example 6, and niobium and tantalum contained in Example 7 or niobium, tungsten and niobium contained in Example 7 to the nickel alloy target is less than or equal to 15 at% and When the ratio of the total content of ruthenium to the nickel alloy target is less than or equal to 8 at%, it is ensured that the phase composition of such a nickel alloy target (such as Examples 3 to 7) is a single FCC phase.

Further, referring to FIG. 3F, the Ni-Fe-Re- of Comparative Examples 10 to 11 is compared with the X-ray diffraction patterns of the Ni-Fe-Re-W-Ru targets of Examples 11 and 12. The (002) surface characteristic peak in the HCP phase is more in the X-ray diffraction pattern of the W-Ru target, and the Ni-Fe-Re-W-Ru target of Comparative Examples 10 to 12 is not composed of a single FCC phase. It is composed of the FCC phase and the HCP phase. Further, as shown in FIG. 3G, the X-ray diffraction pattern of the Ni-Fe-Re-Ru target of Comparative Example 12 was compared with the X-ray diffraction pattern of the Ni-Fe-Re-Ru target of Examples 13 to 15. The characteristic peaks of the (002) plane and the (112) plane in the HCP phase are more in the map, indicating that the Ni-Fe-Re-Ru target of Comparative Example 12 is not composed of a single FCC phase, but is composed of FCC phase and HCP phase. Composed of. As shown in FIG. 3E, only the characteristic peaks of the FCC phase were observed in the X-ray diffraction pattern of the Ni-Fe-Re target of Examples 8 to 10, and no characteristic peak corresponding to the HCP phase was found; Similar results were observed for the X-ray diffraction pattern of the Ni-Fe-Re-W target of Examples 16 to 21 (shown in Figure 3H).

The results of the above experiments of FIG. 3E to FIG. 3H show that, regardless of the Ni-Fe-Re, Ni-Fe-Re-W, Ni-Fe-Re-Ru, Ni-Fe-Re-W-Ru material systems, The nickel alloy target can be ensured when the ratio of the total content of the refined metal to the nickel alloy target is less than or equal to 15 at% and the ratio of the total content of lanthanum to the nickel alloy target is less than or equal to 10 at%. The phase composition of the materials (as in Examples 8 to 21) is a single FCC phase.

Accordingly, the present invention ensures that the phase composition consists of only a single FCC phase and does not contain the HCP phase by controlling the composition of the nickel alloy target; therefore, the nickel alloy target of the present invention can be used for sputtering to form a single FCC phase. The nickel alloy layer makes the nickel alloy layer suitable for use as a seed layer for a vertical magnetic recording medium.

Test case 3 : Average grain size and grain size uniformity

In order to verify again that the technical means of the creation can simultaneously refine and homogenize the grain size of the nickel alloy target, the test examples are the samples to be tested according to the above examples and comparative examples, and each sample to be tested is Analyze in the same way as described below:

A test piece having a size of about 10 mm × 10 mm was taken at the center of each target, at a half radius (r/2) of the target, and at the edge (r) by wire cutting. Next, the top surface of the target is etched with a mixed etching solution of pure water, hydrochloric acid, nitric acid, and hydrogen peroxide; at a magnification of 500 times, 10 to 12 different positions are taken on each test piece using an optical microscope to observe the microscopic targets. Structure, 30 to 36 optical microscope images were obtained.

Next, draw four cut lines on each optical microscope image, two of which are diagonal lines of the image, and the other two lines are parallel to the center line of the long side and parallel to the center line of the short side, four The cut lines are arranged in a meter shape on each image map.

Then, the total number of crystal grains on the four cut lines is sampled, and the length of each cut line is divided by the total number of crystal grains to obtain the grain size of each cut line; then, the grain grains on each cut line are obtained by the foregoing calculation. The diameter size data calculates the average grain size size of all the cut lines and their standard deviation. The percentage calculated by dividing the standard deviation by the average grain size size represents the normalized uniformity of grain size. The greater the percentage of grain size uniformity, the more severe the degree of variation, and the more uniform the grain size of the sample to be tested (target). The average grain size and the grain size uniformity analysis results of the targets of the respective examples and comparative examples are shown in Table 1 above.

In order to further explain the analysis method of the test example, the following example 16 is taken as an example, and the analysis method thereof is specifically described in combination with the optical microscope image:

Take the Ni-Fe-Re-W target of Example 16 and take a wire cutting method at the center of the target, the center of the Ni-Fe-Re-W target, the radius of one half and the edge to take about 10 A test piece of mm × 10 mm; and the microstructure of each test piece was observed using an optical microscope at a magnification of 500 times, and the results are shown in Figs. 4A to 4C.

Next, taking the central test piece of the nickel alloy target as an example, four cut lines L1, L2, L3, and L4 are drawn on the optical microscope image (observation area 1) of FIG. 3A, wherein the lengths of the cut lines L1 and L2 are 325. Micron (μm), the length of the cut line L3 is 195 μm, the length of the cut line L4 is 260 μm; the total number of grains and the average grain size calculated from the four cut lines L1, L2, L3 and L4 in Fig. 3A The dimensions are shown in the observation area 1 in Table 2 below.

Then, the other 11 positions were repeatedly observed on the center test piece, and the measurement results of the observation areas 2 to 12 were obtained by the same method as described above. The lengths of the cut lines L1, L2, L3, and L4 drawn in one of the observation areas are the same as the lengths of the cut lines L1, L2, L3, and L4 drawn in the other observation areas, that is, in the respective observation areas. The length of the cut line L1 is the same, and the cut lines L2, L3 and L4 have similar situations.

According to the above sampling statistics, the average grain size of 12 groups on each of the cut lines L1, L2, L3 and L4 measured by the above observation areas 1 to 12, and the average size of the 12 groups of average grain sizes are averaged again to obtain each The overall average of the grain sizes on the cut lines L1, L2, L3 and L4 is shown in Table 3 below. Calculated from the overall average of the grain sizes calculated from the respective cut lines L1, L2, L3 and L4, the average grain size of the entire central test piece of the nickel alloy target of Example 16 was 21.6 μm, the standard deviation For 1.458, the grain size uniformity was 14.81%.

Thereafter, the method of measuring the center test piece as described above was repeated on the r/2 test piece and the edge test piece of the nickel alloy target to obtain the average grain size of the whole r/2 test piece of the nickel alloy target of Example 16. The particle size was 21.1 μm, and the average grain size of the overall edge test piece was 21.5 μm.

According to the above measurement results, the average grain size of the nickel alloy target of Example 16 was 21.46 μm, the overall standard deviation was 1.454, and the grain size uniformity was 14.76%.         <TABLE border="1" borderColor="#000000" width="_0003"><TBODY><tr><td> observation area</td><td> section line (L1) </td><td> section Line (L2) </td><td> Section (L3) </td><td> Section (L4) </td></tr><tr><td> Total number of grains</td>< Td> average grain size </td><td> total number of grains</td><td> average grain size </td><td> total number of grains</td><td> average grain size </td><td> Total grain size </td><td> Average grain size </td></tr><tr><td> 1 </td><td> 14 </td> <td> 23.4 μm </td><td> 19 </td><td> 16.7 μm </td><td> 8 </td><td> 25.0 μm </td><td> 9 </td ><td> 30.0 μm </td></tr><tr><td> 2 </td><td> 15 </td><td> 21.9 μm </td><td> 20 </td> <td> 15.9 μm </td><td> 9 </td><td> 21.9 μm </td><td> 11 </td><td> 23.4 μm </td></tr><tr> <td> 3 </td><td> 15 </td><td> 21.9 μm </td><td> 15 </td><td> 21.9 μm </td><td> 10 </td> <td> 19.5 μm </td><td> 10 </td><td> 25.0 μm </td></tr><tr><td> 4 </td><td> 14 </td>< Td> 23.4 μm </td><td> 15 </td><td> 21.9 μm </td><td> 12 </td><td> 16.7 μm </td><td> 10 </td> <td> 25.0 μm </td></tr><tr><td> 5 </ Td><td> 13 </td><td> 25.0 μm </td><td> 14 </td><td> 23.4 μm </td><td> 12 </td><td> 15.9 μm < /td><td> 12 </td><td> 21.9 μm </td></tr><tr><td> 6 </td><td> 13 </td><td> 25.0 μm </ Td><td> 13 </td><td> 25.0 μm </td><td> 9 </td><td> 21.9 μm </td><td> 13 </td><td> 19.5 μm < /td></tr><tr><td> 7 </td><td> 15 </td><td> 21.9 μm </td><td> 15 </td><td> 21.9 μm </ Td><td> 9 </td><td> 21.9 μm </td><td> 16 </td><td> 16.7 μm </td></tr><tr><td> 8 </td ><td> 17 </td><td> 19.5 μm </td><td> 14 </td><td> 23.4 μm </td><td> 8 </td><td> 23.4 μm </ Td><td> 16 </td><td> 15.9 μm </td></tr><tr><td> 9 </td><td> 19 </td><td> 16.7 μm </td ><td> 13 </td><td> 25.0 μm </td><td> 9 </td><td> 21.9 μm </td><td> 12 </td><td> 21.9 μm </ Td></tr><tr><td> 10 </td><td> 20 </td><td> 15.9 μm </td><td> 13 </td><td> 25.0 μm </td ><td> 9 </td><td> 21.9 μm </td><td> 13 </td><td> 19.5 μm </td></tr><tr><td> 11 </td> <td> 15 </td><td> 21.9 μm </td><td> 15 </td><td> 21.9 μm </td><td> 9 </td><td> 21.9 μm </td ><td> 11 </t d><td> 23.4 μm </td></tr><tr><td> 12 </td><td> 15 </td><td> 21.9 μm </td><td> 17 </td ><td> 19.5 μm </td><td> 8 </td><td> 25.0 μm </td><td> 16 </td><td> 15.9 μm </td></tr></ TBODY></TABLE> Table 2: Measurement results of the total number of crystal grains and the average grain size of the central test piece of the nickel alloy target of Example 16 calculated on each cut line. Table 3: The measurement results obtained in the observation areas 1 to 12 in the above Table 2 were averaged to obtain the overall average value of the grain sizes on the respective cut lines.         <TABLE border="1" borderColor="#000000" width="85%"><TBODY><tr><td> observation area</td><td> section line (L1) </td><td> Cut line (L2) </td><td> Cut line (L3) </td><td> Cut line (L4) </td></tr><tr><td> Overall average grain size Value </td><td> 21.5 μm </td><td> 21.8 μm </td><td> 21.4 μm </td><td> 21.5 μm </td></tr></TBODY>< /TABLE>

As shown in Table 1 above, the average grain size of the nickel alloy target of Examples 1 to 21 can be controlled to be less than 100 μm, and the grain size uniformity can be controlled to be less than 20%, thereby achieving specific refinement and The purpose of homogenizing the grain size of the nickel alloy target.

Specifically, in the Ni-Re material system, when the content ratio of ruthenium to the nickel alloy target falls within the range of 6 at% to 8 at%, the nickel alloy target of Examples 1 and 2 can be made finer. And homogenize the grains. In contrast, the analysis results of the pure nickel target of Comparative Example 1 showed that the pure nickel target of Comparative Example 1 had the defects of coarse crystal grains and uneven particle size size because it did not contain any refining metal; 2 The experimental results show that even if a small amount of lanthanum is added to the nickel material system to improve the grain size of the pure nickel target, the content of the ruthenium metal is too low, so that the nickel alloy target can not be refined and homogenized. The purpose of grain size; again, the experimental results of Comparative Example 3, if the content of bismuth metal is too high, it will affect the grain size size uniformity of the nickel alloy target, and it is not suitable for sputtering to form crystal grains. Refined and homogenized nickel alloy layer. If an appropriate amount of iron is added to the nickel material system, and the grain size of the nickel alloy target cannot be effectively refined, the average grain size of the nickel alloy target of Comparative Example 4 is still as high as 385 μm.

In addition, in the Ni-Re-Ru or Ni-Re-W-Ru material system, when the total content of the refined metal relative to the nickel alloy target falls within the range of 10 at% to 15 at% and yttrium relative to nickel When the total content ratio of the alloy target is less than or equal to 8 at%, it is ensured that the nickel alloy targets of Examples 6 and 7 are refined and homogenized. In contrast, in the nickel alloy targets of Comparative Examples 6 and 7, since the content of the base metal in the nickel alloy target of Comparative Example 6 was too high, and the total content of the refined metal in the nickel alloy target of Comparative Example 7 was too high, such that Nickel alloy targets have the disadvantage of poor uniformity of grain size.

Furthermore, in the Ni-Fe-Re-Ru material system, when the total content of the refined metal relative to the nickel alloy target falls within the range of 10 at% to 15 at% and the total amount of lanthanum relative to the nickel alloy target When the content ratio is less than or equal to 10 at%, it is ensured that the nickel alloy targets of Examples 13 to 15 are refined and homogenized. In contrast, in Comparative Example 12, since the total content of the refined metal relative to the nickel alloy target exceeded 15 at%, and the content of the base metal was too high, the grain size of the nickel alloy target could not be effectively uniformized.

Further comparing the results of Example 2, Example 3, and Example 6, it can be seen that when the content of lanthanum relative to the nickel alloy target is 8 at%, adding tungsten or ruthenium to the nickel alloy target can contribute to The grain size of the nickel alloy target was refined so that the average grain size of the nickel alloy targets of Examples 3 and 6 was smaller than the average grain size of the nickel alloy target of Example 2. Similarly, by further comparing Examples 9 and 10 with Examples 13, 17, and 20, or comparing Example 8 with Examples 11, 15, 16 and 18, similar experimental results were obtained.

By synthesizing the analysis results of the above Test Examples 1 to 3, by controlling the composition of the nickel alloy target, it is possible to ensure not only that the phase composition of the nickel alloy target is composed of only a single FCC phase, but also a finer and uniform crystal. The particle size of the particles; therefore, the nickel alloy layer sputtered by such a nickel alloy target can also have a phase composition of a single FCC phase, and a fine and uniform crystal grain size can be obtained. Therefore, the nickel alloy layer can be applied to a seed layer as a vertical magnetic recording medium, thereby achieving an effect of improving the recording density of a vertical magnetic recording medium.

L1, L2, L3, L4‧‧‧ cut lines

1A to 1E are Ni-Re-W targets of Examples 3 and 4, Ni-Re-Ru target of Example 6, and Ni-Re-W-Ru target of Example 7 and examples thereof. An optical microscope image of a test piece taken at a radius of one-half of the Ni-Fe-Re-W target of 16. 2A to 2D are optical microscope images of test pieces taken at a half radius of the nickel alloy target of Comparative Examples 1 to 4. 3A is an X-ray of the Ni-Re target of Examples 1 and 2, the Ni-Re target of Comparative Example 3, the standard FCC phase nickel metal, and the standard hexagonal close-packed (HCP) phase tantalum metal. Diffraction map. 3B is an X-ray diffraction pattern of the Ni-Re-W target of Examples 3 to 5, the Ni-Re-W target of Comparative Example 5, the standard FCC phase nickel metal, and the standard HCP phase bismuth metal. 3C is an X-ray diffraction pattern of the Ni-Re-Ru target of Example 6, the Ni-Re-Ru target of Comparative Example 6, the standard FCC phase nickel metal, and the standard HCP phase bismuth metal. 3D is an X-ray diffraction pattern of the Ni-Re-W-Ru target of Example 7, the Ni-Re-W-Ru target of Comparative Example 7, the standard FCC phase nickel metal, and the standard HCP phase tantalum metal. 3E is an X-ray diffraction pattern of Ni-Fe-Re targets, standard FCC phase nickel metals, and standard HCP phase bismuth metals of Examples 8-10. 3F is a Ni-Fe-Re-W-Ru target of Examples 11 and 12, a Ni-Fe-Re-W-Ru target of Comparative Examples 10 to 11, a standard FCC phase nickel metal, and a standard HCP phase tantalum metal. X-ray diffraction pattern. 3G is an X-ray diffraction pattern of the Ni-Fe-Re-Ru target of Examples 13 to 15, the Ni-Fe-Re-Ru target of Comparative Example 12, the standard FCC phase nickel metal, and the standard HCP phase bismuth metal. . 3H is an X-ray diffraction pattern of Ni-Fe-Re-W target, standard FCC phase nickel metal, and standard HCP phase tantalum metal of Examples 16-21. 4A to 4C are optical microscope images of the test piece taken at the center, the half radius, and the edge of the nickel alloy target of Example 16.

no.

Claims (12)

A nickel alloy target comprising nickel and a refined metal, the fine metal content being greater than or equal to 5 atomic percent and less than or equal to 15 atomic percent based on the total number of atoms of the nickel alloy target The metal contains niobium, and the phase composition of the nickel alloy target is composed of a face-centered cubic crystal structure. The nickel alloy target of claim 1, wherein the refined metal further comprises tantalum, tungsten, niobium, tantalum, molybdenum, titanium or a combination thereof. The nickel alloy target according to claim 2, wherein the total content of the refined metal is greater than or equal to 10 atomic percent and less than or equal to 15 atomic percent based on the total number of atoms of the nickel alloy target, and the content of the cerium is greater than 0 atomic percent and less than or equal to 10 atomic percent. The nickel alloy target according to claim 3, wherein the total content of the refined metal is greater than or equal to 10 atomic percent and less than or equal to 15 atomic percent based on the total number of atoms of the nickel alloy target, and the content of cerium is greater than 0 atomic percent and less than or equal to 8 atomic percent. The nickel alloy target according to claim 1, wherein the refined metal is composed of ruthenium, and the content of ruthenium is more than 6 atomic percent and less than or equal to 8 atomic percent based on the total number of atoms of the nickel alloy target. The nickel alloy target according to any one of claims 1 to 5, wherein the nickel alloy target further comprises iron, and the iron content is greater than 0 atomic percentage and less than the total number of atoms of the nickel alloy target. Or equal to 30 atomic percent. The nickel alloy target according to claim 2, wherein the nickel alloy target further comprises iron, and the total content of the refined metal is greater than 5 atomic percent and less than or equal to the total number of atoms of the nickel alloy target. 15 atomic percent, the content of cerium is greater than or equal to 5 atomic percent and less than or equal to 10 atomic percent, and the iron content is greater than 0 atomic percent and less than or equal to 30 atomic percent. The nickel alloy target according to claim 7, wherein the content of iron is greater than or equal to 25 atomic percent and less than or equal to 30 atomic percent based on the total number of atoms of the nickel alloy target. The nickel alloy target according to claim 1, wherein the refined metal is composed of ruthenium, the nickel alloy target further comprising iron, and the content of ruthenium is greater than or equal to the total number of atoms of the nickel alloy target. 5 atomic percent and less than 10 atomic percent, and the iron content is greater than 0 atomic percent and less than or equal to 30 atomic percent. The nickel alloy target according to claim 7, wherein the content of ruthenium is greater than or equal to 5 atomic percent and less than or equal to 8 atomic percent, and the iron content is greater than or equal to 15 based on the total number of atoms of the nickel alloy target. Atomic percentage and less than or equal to 28 atomic percent. The nickel alloy target according to any one of claims 1 to 5, wherein the nickel alloy target has an average grain size of less than or equal to 100 μm. A nickel alloy layer which is sputtered from a nickel alloy target according to any one of claims 1 to 11.