TWI658130B - Self-repairing material, producing method and application thereof - Google Patents

Self-repairing material, producing method and application thereof Download PDF

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TWI658130B
TWI658130B TW106121890A TW106121890A TWI658130B TW I658130 B TWI658130 B TW I658130B TW 106121890 A TW106121890 A TW 106121890A TW 106121890 A TW106121890 A TW 106121890A TW I658130 B TWI658130 B TW I658130B
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acrylate
methacrylate
self
healing
parts
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TW201905151A (en
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陳英孝
張凱捷
林煒
柯志穎
林柄良
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財團法人塑膠工業技術發展中心
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Abstract

本發明提供一種以氫鍵方式癒合的自癒合材料,不需要額外暴露於熱、光或特定聲音下,即具有自我修復的能力,係一種主動式的自癒合材料,其配方包含:30~79重量份之丙烯酸酯類單體;20~60重量份之含2-脲基-4-嘧啶酮單元的丙烯酸;1~10重量份之丙烯酸之光引發劑及1~5重量份自由基引發劑;其中,該自癒合材料照射紫外光後產生光固化反應;以及該自癒合材料具有分子間產生氫鍵鍵結之自癒合特性。The invention provides a self-healing material that heals in a hydrogen bond manner, and does not require additional exposure to heat, light, or specific sounds, that is, has the ability of self-healing. It is an active self-healing material. Its formula contains: 30 ~ 79 Parts by weight of acrylic monomers; 20 to 60 parts by weight of acrylic acid containing 2-ureido-4-pyrimidinone units; 1 to 10 parts by weight of acrylic acid photoinitiator and 1 to 5 parts by weight of free radical initiator Wherein, the self-healing material generates a photo-curing reaction after being irradiated with ultraviolet light; and the self-healing material has a self-healing property of intermolecular hydrogen bonding.

Description

自癒合材料、其製造方法及應用Self-healing material, its manufacturing method and application

一種自癒合材料,特別是一種以氫鍵聚合產生自癒合效果的材料。A self-healing material, especially a material that produces self-healing effect by hydrogen bonding polymerization.

消費性電子產品,如手機、平板等,其液晶螢幕相當脆弱,容易因為使用不當而造成表面刮傷或損壞,進而影響液晶螢幕顯示的畫質與美觀,因此大多數的使用者會貼覆螢幕保護貼於液晶螢幕表面,借此保護與避免液晶螢幕被刮傷或破壞。Consumer electronics products, such as mobile phones and tablets, have very fragile LCD screens, which can easily cause scratches or damage to the surface due to improper use, which affects the picture quality and aesthetics of LCD screen displays. Therefore, most users will overlay the screen. The protection is attached to the surface of the LCD screen to protect and prevent the LCD screen from being scratched or damaged.

然而,當螢幕保護貼使用到相當程度時,使用者就必須更換新的螢幕保護貼,使得螢幕保護貼成為一種消耗性產品,不僅昂貴且廢棄的螢幕保護貼可能造成垃圾污染等環保問題。However, when the screen protector is used to a considerable extent, the user must replace the screen protector with a new one, making the screen protector a consumable product. Not only the expensive and obsolete screen protector may cause environmental pollution issues such as garbage pollution.

隨著使用者需求與科技的演進,逐漸發展出一種具有自我修復功能的材料,稱為自癒合材料,或可稱自我修復材料(Self-repairing material或 Self-healing material),自癒合材料是可將自身因外力而造成損壞的部分,以分子重新鍵結組合為原來樣式的方式,達到自我修復的效果。With the evolution of user needs and technology, a material with self-healing function has been gradually developed, called self-healing material, or self-repairing material (Self-healing material). The self-healing effect is achieved by using the molecules to re-combine the damaged parts due to external forces to the original style.

目前自癒合材料產生自我修復的機制主要是透過熱、光或是特定聲音的等外在刺激下,使分子間重新鍵結聚合,使損壞的區域得以恢復,雖然可解決既有螢幕保護貼無法自我修復的問題並增加使用週期,但此種需要透過熱、光或特定聲音等外界刺激之被動式自我修復能力,依然存在著使用上不便,現階段缺乏可主動產生自我修復能力的自癒合材料。At present, the self-healing mechanism of self-healing materials is mainly through external stimuli such as heat, light, or specific sounds to re-bond and polymerize molecules to restore damaged areas, although it can solve the problem that existing screen protectors cannot. The problem of self-healing and increasing the use cycle, but this kind of passive self-healing ability that requires external stimuli such as heat, light or specific sounds still has inconvenience in use. At the current stage, there is a lack of self-healing materials that can actively generate self-healing ability.

為了解決既有自癒合材料需要透過熱、光或接收到聲音的外在刺激下,才能產生自修復效果,缺乏可主動產生自我修復能力的缺點,本發明提供一種以氫鍵鍵結癒合的自癒合材料,不需要額外暴露於熱、光或特定聲音下,即具有自我修復的能力,係一種主動式的自癒合材料,其配方包含: 30~79重量份之丙烯酸酯類單體;20~60重量份之含2-脲基-4-嘧啶酮單元的丙烯酸;1~10重量份丙烯酸光引發劑及1~5重量份自由基引發劑;其中,該自癒合材料照射紫外光後產生光固化反應;以及該自癒合材料具有分子間產生氫鍵鍵結之自癒合特性。In order to solve the problem that existing self-healing materials need to pass through heat, light, or external stimuli to receive sound to produce self-healing effects, and lack the ability to actively generate self-healing capabilities, the present invention provides a self-healing material that is hydrogen bonded. The healing material does not require additional exposure to heat, light, or specific sounds, that is, has the ability to self-repair. It is an active self-healing material. Its formula contains: 30 to 79 parts by weight of acrylate monomers; 20 to 60 parts by weight of acrylic acid containing 2-ureido-4-pyrimidinone units; 1 to 10 parts by weight of acrylic photoinitiator and 1 to 5 parts by weight of free radical initiator; wherein the self-healing material generates light after being irradiated with ultraviolet light Curing reaction; and the self-healing material has a self-healing property of intermolecular hydrogen bonding.

其中,該丙烯酸酯類單體包含丙烯酸甲酯、丙烯酸乙酯、丙烯酸丙酯、丙烯酸異丙酯、丙烯酸正丁酯、丙烯酸異丁酯、丙烯酸2- 丁酯、丙烯酸正戊酯、丙烯酸 2-戊酯、丙烯酸異戊酯、丙烯酸2-甲基戊酯、丙烯酸正己酯、丙烯酸2-己酯、丙烯酸2-甲基己酯、丙烯酸2-乙基己酯、丙烯酸正庚酯、丙烯酸2-庚酯、丙烯酸2-甲基庚酯、丙烯酸 2-丙基庚酯、丙烯酸正辛酯、丙烯酸異辛酯、丙烯酸正壬酯、丙烯酸異壬酯、丙烯酸正癸酯、丙烯酸異癸酯、甲基丙烯酸甲酯、甲基丙烯酸乙酯、甲基丙烯酸丙酯、甲基丙烯酸異丙酯、甲基丙烯酸正丁酯、甲基丙烯酸異丁酯、甲基丙烯酸2- 丁酯、甲基丙烯酸正戊酯、甲基丙烯酸 2-戊酯、甲基丙烯酸異戊酯、甲基丙烯酸2-甲基戊酯、甲基丙烯酸正己酯、甲基丙烯酸2-己酯、甲基丙烯酸2-甲基己酯、甲基丙烯酸2-乙基己酯、甲基丙烯酸正庚酯、甲基丙烯酸2-庚酯、甲基丙烯酸2-甲基庚酯、甲基丙烯酸 2-丙基庚酯、甲基丙烯酸正辛酯、甲基丙烯酸異辛酯、甲基丙烯酸正壬酯、甲基丙烯酸異壬酯、甲基丙烯酸正癸酯、甲基丙烯酸異癸酯或前述單體的混合物;該丙烯酸之光引發劑包含含丙烯鍵式不飽和基團或甲基丙烯鍵式不飽和基團接枝於苯環上之苯乙酮衍生物或二苯甲酮衍生物;以及該自由基引發劑包含偶氮類化合物、過氧化二醯化合物、過氧化二烷類化合物、過氧化酯類化合物、過氧化碳酸酯類化合物、過氧化二碳酸酯類化合物或過氧化氫類化合物。The acrylate monomers include methyl acrylate, ethyl acrylate, propyl acrylate, isopropyl acrylate, n-butyl acrylate, isobutyl acrylate, 2-butyl acrylate, n-amyl acrylate, and 2- Amyl, isoamyl acrylate, 2-methylpentyl acrylate, n-hexyl acrylate, 2-hexyl acrylate, 2-methylhexyl acrylate, 2-ethylhexyl acrylate, n-heptyl acrylate, 2- Heptyl, 2-methylheptyl acrylate, 2-propylheptyl acrylate, n-octyl acrylate, isooctyl acrylate, n-nonyl acrylate, isononyl acrylate, n-decyl acrylate, isodecyl acrylate, formazan Methyl acrylate, ethyl methacrylate, propyl methacrylate, isopropyl methacrylate, n-butyl methacrylate, isobutyl methacrylate, 2-butyl methacrylate, n-methacrylate Amyl ester, 2-pentyl methacrylate, isoamyl methacrylate, 2-methylpentyl methacrylate, n-hexyl methacrylate, 2-hexyl methacrylate, 2-methylhexyl methacrylate Ester, 2-ethylhexyl methacrylate, methyl propane N-heptyl acid, 2-heptyl methacrylate, 2-methylheptyl methacrylate, 2-propylheptyl methacrylate, n-octyl methacrylate, isooctyl methacrylate, methacrylic acid N-nonyl ester, isononyl methacrylate, n-decyl methacrylate, isodecyl methacrylate, or a mixture of the foregoing monomers; the acrylic photoinitiator contains a propylene bond-containing unsaturated group or methacrylic acid An acetophenone derivative or a benzophenone derivative in which a bond unsaturated group is grafted on a benzene ring; and the free radical initiator includes an azo compound, a difluorene compound, and a dioxane compound , Peroxyester-based compounds, peroxycarbonate-based compounds, peroxydicarbonate-based compounds, or hydrogen peroxide-based compounds.

其中,該偶氮類化合物包含2,2’-偶氮雙異丁腈、2,2’-偶氮雙(2-甲基丁腈)或2,2’-偶氮雙(2,4-二甲基戊腈);該過氧化二醯化合物包含過氧化二月桂醯、過氧化二十醯或過氧化二苯甲醯;該過氧化二烷類化合物包含2,5-二甲基-2,5-叔丁基過氧己烷、過氧化異丙苯或1,3-雙(叔丁基過氧異丙基)苯;該過氧化酯類化合物包含叔丁基過氧新戊酸酯或2,5-二甲基-2,5-二(2-乙基己醇過氧化)己烷;該過氧化碳酸酯類化合物包含2-乙基己基叔戊基過氧化碳酸酯或2-乙基己基叔丁基過氧化碳酸酯;該過氧化二碳酸酯類化合物包含二肉豆蔻基過氧化二碳酸酯或二(4-叔丁基環己基)過氧化二碳酸酯;該過氧化二碳酸酯類化合物包含二肉豆蔻基過氧化二碳酸酯或二(4-叔丁基環己基)過氧化二碳酸酯;以及該過氧化氫類化合物包含叔丁基過氧化氫或異丙基異丙苯基過氧化氫。Wherein, the azo compound includes 2,2'-azobisisobutyronitrile, 2,2'-azobis (2-methylbutyronitrile), or 2,2'-azobis (2,4- Dimethylvaleronitrile); the dihydrazone peroxide compound includes dilauric acid peroxide, icosamidine peroxide, or dibenzoyl peroxide; the dioxane compounds include 2,5-dimethyl-2 , 5-tert-butylperoxyhexane, cumene peroxide or 1,3-bis (tert-butylperoxyisopropyl) benzene; the peroxyester compounds include tert-butylperoxypivalate Or 2,5-dimethyl-2,5-bis (2-ethylhexanol peroxy) hexane; the percarbonate compounds include 2-ethylhexyl tert-pentyl peroxycarbonate or 2- Ethylhexyl tert-butyl peroxycarbonate; the peroxydicarbonate-based compounds include dimyristoyl peroxydicarbonate or bis (4-tert-butylcyclohexyl) peroxydicarbonate; the peroxydicarbonate The carbonate-based compound includes dimyristoylperoxydicarbonate or bis (4-tert-butylcyclohexyl) peroxydicarbonate; and the hydrogen peroxide-based compound includes tert-butylhydroperoxide or isopropyl isopropyl Propyl Hydrogen Peroxide

其中,該活性稀釋劑包含丙烯酸正丁酯、丙烯酸異辛酯、丙烯酸異癸酯、丙烯酸月桂酯、丙烯酸羥乙酯、甲基丙烯酸羥乙酯、丙烯酸羥丙酯、甲基丙烯酸羥丙酯、帶有環狀結構的丙烯酸酯或帶有環狀結構的甲基丙烯酸酯。Wherein, the reactive diluent includes n-butyl acrylate, isooctyl acrylate, isodecyl acrylate, lauryl acrylate, hydroxyethyl acrylate, hydroxyethyl methacrylate, hydroxypropyl acrylate, hydroxypropyl methacrylate, Acrylic ester with cyclic structure or methacrylic ester with cyclic structure.

本發明進一步提供前述自癒合材料的製造方法,其步驟包含:熱聚合步驟:依序將79~30重量份之丙烯酸酯類單體、20~60重量份之含2-脲基-4-嘧啶酮單元之丙烯酸與1~10重量份之丙烯酸之光引發劑置入反應容器內,再將1~5重量份之自由基引發劑加入反應容器中攪拌均勻,將反應器溫度升到70~90o C並反應約3~6小時,待降溫後得丙烯酸酯預聚物;以及光固化步驟:將所得之丙烯酸酯預聚物塗佈於一基材上,經由紫外線照射後光固化成膜得該自癒合材料,該自癒合材料具有分子間產生氫鍵鍵結之自癒合特性。The present invention further provides a method for manufacturing the self-healing material, the steps include: a thermal polymerization step: sequentially 79 to 30 parts by weight of an acrylate monomer, and 20 to 60 parts by weight of 2-ureido-4-pyrimidine The acrylic acid of the ketone unit and the photoinitiator of 1 to 10 parts by weight of acrylic acid were placed in the reaction container, and then 1 to 5 parts by weight of the free radical initiator was added to the reaction container and stirred uniformly. o C and react for about 3 to 6 hours. After the temperature is lowered, the acrylate prepolymer is obtained; and the photocuring step: the obtained acrylate prepolymer is coated on a substrate, and then cured by ultraviolet light to form a film. The self-healing material has the self-healing property of intermolecular hydrogen bonding.

其中,該丙烯酸酯類單體為甲基丙烯酸酯類單體;該含2-脲基-4-嘧啶酮單元之丙烯酸為含2-脲基-4-嘧啶酮單元之甲基丙烯酸;該丙烯酸光引發劑為甲基丙烯酸光引發劑;以及該基材包含聚乙烯對苯二甲酸酯基材。Wherein, the acrylate monomer is a methacrylate monomer; the acrylic acid containing a 2-ureido-4-pyrimidone unit is a methacrylic acid containing a 2-ureido-4-pyrimidone unit; the acrylic acid The photoinitiator is a methacrylic photoinitiator; and the substrate includes a polyethylene terephthalate substrate.

另外,本發明更進一步提供一種自癒合保護膜,其包含:一基材,該基材為平面片狀,並具有一上表面及一下表面;一自癒合層,該自癒合層設置於該基材之該上表面;一黏膠層,該黏膠層設置於該基材之該下表面;其中:該自癒合層係由一自癒合材料塗佈於該基材上後,照射紫外線光固化形成;該自癒合材料配方包含:79~30重量份之丙烯酸酯類單體、20~60重量份之含2-脲基-4-嘧啶酮單元的丙烯酸、1~10重量份之丙烯酸之光引發劑及1~5重量份之自由基引發劑,以及該自癒合材料具有分子間產生氫鍵鍵結之自癒合特性。In addition, the present invention further provides a self-healing protective film, comprising: a substrate, the substrate is a flat sheet, and has an upper surface and a lower surface; a self-healing layer, the self-healing layer is disposed on the substrate The upper surface of the material; an adhesive layer disposed on the lower surface of the substrate; wherein: the self-healing layer is coated with a self-healing material on the substrate and cured by irradiation with ultraviolet light Formed; the self-healing material formula contains: 79-30 parts by weight of acrylic monomers, 20-60 parts by weight of acrylic acid containing 2-ureido-4-pyrimidinone units, and 1-10 parts by weight of acrylic light An initiator and a free-radical initiator of 1 to 5 parts by weight, and the self-healing material has a self-healing property of intermolecular hydrogen bonding.

其中,該丙烯酸酯類單體為甲基丙烯酸酯類單體;該含2-脲基-4-嘧啶酮單元之丙烯酸為含2-脲基-4-嘧啶酮單元之甲基丙烯酸;該丙烯酸光引發劑為甲基丙烯酸光引發劑;以及該自癒合層中包含一抗靜電劑粒子或活性稀釋劑。Wherein, the acrylate monomer is a methacrylate monomer; the acrylic acid containing a 2-ureido-4-pyrimidone unit is a methacrylic acid containing a 2-ureido-4-pyrimidone unit; the acrylic acid The photoinitiator is a methacrylic photoinitiator; and the self-healing layer includes an antistatic agent particle or a reactive diluent.

其中,該黏膠層設置於該基材之另一側進一步設有一離型層。Wherein, the adhesive layer is disposed on the other side of the substrate, and a release layer is further provided.

藉由上述說明可知,本發明具有以下功效:According to the above description, the present invention has the following effects:

1.本發明自我修復的機制是透過分子間2-脲基-4-嘧啶酮基團相互產生氫鍵聚合,此反應機制於自然狀態下即會自動發生,不需額外暴露於特定光線或熱源,即可產生自癒合的效果,係一主動式的自癒合材料。當本發明作為螢幕保護貼或是電器用品外殼保護膜時,可增加目前保護貼或保護膜的使用壽命,提升保護膜之耐壽時間。1. The self-healing mechanism of the present invention is through intermolecular 2-ureido-4-pyrimidinone groups to generate hydrogen bond polymerization with each other. This reaction mechanism occurs automatically in the natural state without additional exposure to specific light or heat sources. , Can produce self-healing effect, is an active self-healing material. When the present invention is used as a screen protective film or a protective film for an electrical appliance shell, the service life of the current protective film or the protective film can be increased, and the life time of the protective film can be improved.

2.進一步地,本發明透過將2-脲基-4-嘧啶酮、光引發劑與活性稀釋劑的聚合單體改質帶有丙烯酸或甲基丙烯酸官能基,使得該些成分與丙烯酸酯類單體或甲基丙烯酸單體聚合時,不需要使用有機溶劑即可產生高效率的聚合效果,相對環保與環境友善,且可進一步提昇後續光固化的效能,本發明製備時程短、具有透明性、流動性好、耐化學品性優異及優異的自癒合特性。2. Further, the present invention modifies the polymerization monomers of 2-ureido-4-pyrimidinone, photoinitiator and reactive diluent with acrylic or methacrylic functional groups, so that these components and acrylates When monomers or methacrylic monomers are polymerized, no organic solvent is needed to produce a high-efficiency polymerization effect, which is relatively environmentally friendly and environmentally friendly, and can further improve the subsequent photo-curing efficiency. The preparation process of the invention is short and transparent Good fluidity, good chemical resistance, and excellent self-healing properties.

本發明是一種自癒合材料,其配方包含:30~79重量份之丙烯酸酯類單體、20~60重量份之含2-脲基-4-嘧啶酮單元的丙烯酸、1~10重量份丙烯酸光引發劑及1~5重量份之自由基引發劑,其中,該自癒合材料照射紫外光後產生光固化反應,且該自癒合材料具有分子間產生氫鍵鍵結之自癒合特性。進一步地,該自癒合材料中可透過添加活性稀釋劑1~20重量份,作為調整黏度之添加劑。The invention is a self-healing material, and its formula comprises: 30 to 79 parts by weight of an acrylate monomer, 20 to 60 parts by weight of acrylic acid containing a 2-ureido-4-pyrimidone unit, and 1 to 10 parts by weight of acrylic acid. A photoinitiator and a free-radical initiator of 1 to 5 parts by weight, wherein the self-healing material produces a photo-curing reaction after being irradiated with ultraviolet light, and the self-healing material has a self-healing property of intermolecular hydrogen bonding. Further, the self-healing material can be added as an additive for adjusting viscosity by adding 1 to 20 parts by weight of an active diluent.

前述該自癒合材料的製造方法,步驟包含:The aforementioned method for manufacturing the self-healing material includes the following steps:

1. 熱聚合步驟:依序將丙烯酸酯類單體、含2-脲基-4-嘧啶酮單元之丙烯酸與丙烯酸光引發劑置入反應容器內,再將自由基引發劑加入反應容器中並攪拌均勻,將反應器溫度升到70~90o C並反應約3~6小時,待降溫後得丙烯酸酯預聚物。1. Thermal polymerization step: sequentially put acrylate monomers, acrylic acid containing 2-ureido-4-pyrimidone units and acrylic photoinitiator into the reaction vessel, and then add a free radical initiator into the reaction vessel and Stir well, raise the reactor temperature to 70 ~ 90 o C and react for about 3 ~ 6 hours. After the temperature is lowered, the acrylate prepolymer is obtained.

2. 光固化步驟:將步驟1所得之丙烯酸酯預聚物塗佈於一基材,例如聚乙烯對苯二甲酸酯(PET)基材上,經由紫外線(UV light)照射後光固化成膜得本發明之自癒合材料。2. Photo-curing step: the acrylate prepolymer obtained in step 1 is coated on a substrate, such as a polyethylene terephthalate (PET) substrate, and is photo-cured by UV light The film is a self-healing material of the present invention.

進一步地,可於光固化步驟時加入活性稀釋劑,作為調整該丙烯酸酯預聚物塗佈於該基材上的黏度調整劑。Further, a reactive diluent may be added during the photo-curing step as a viscosity adjuster for adjusting the coating of the acrylate prepolymer on the substrate.

上述之該丙烯酸酯類單體較佳包含丙烯酸甲烷基酯至丙烯酸十二烷基酯(C1-C12),較佳是丙烯酸甲烷基酯至丙烯酸辛烷基酯(C1-8)的範圍內。例如丙烯酸甲酯、丙烯酸乙酯、丙烯酸丙酯、丙烯酸異丙酯、丙烯酸正丁酯、丙烯酸異丁酯、丙烯酸2- 丁酯、丙烯酸正戊酯、丙烯酸 2-戊酯、丙烯酸異戊酯、丙烯酸2-甲基戊酯、丙烯酸正己酯、丙烯酸2-己酯、丙烯酸2-甲基己酯、丙烯酸2-乙基己酯、丙烯酸正庚酯、丙烯酸2-庚酯、丙烯酸2-甲基庚酯、丙烯酸 2-丙基庚酯、丙烯酸正辛酯、丙烯酸異辛酯、丙烯酸正壬酯、丙烯酸異壬酯、丙烯酸正癸酯、丙烯酸異癸酯以及這些單體的混合物。The above-mentioned acrylate monomer preferably includes a methyl alkyl acrylate to a dodecyl acrylate (C1-C12), and more preferably a methyl alkyl acrylate to an octyl acrylate (C1-8). For example, methyl acrylate, ethyl acrylate, propyl acrylate, isopropyl acrylate, n-butyl acrylate, isobutyl acrylate, 2-butyl acrylate, n-amyl acrylate, 2-pentyl acrylate, isoamyl acrylate, 2-methylpentyl acrylate, n-hexyl acrylate, 2-hexyl acrylate, 2-methylhexyl acrylate, 2-ethylhexyl acrylate, n-heptyl acrylate, 2-heptyl acrylate, 2-methyl acrylate Heptyl, 2-propylheptyl acrylate, n-octyl acrylate, isooctyl acrylate, n-nonyl acrylate, isononyl acrylate, n-decyl acrylate, isodecyl acrylate and mixtures of these monomers.

其中,該丙烯酸酯類單體亦可為甲基丙烯酸酯類單體,例如甲基丙烯酸甲烷基酯至甲基丙烯酸十二烷基酯(C1-C12),較佳是甲基丙烯酸甲烷基酯至甲基丙烯酸辛烷基酯(C1-8)的範圍內。例如甲基丙烯酸甲酯、甲基丙烯酸乙酯、甲基丙烯酸丙酯、甲基丙烯酸異丙酯、甲基丙烯酸正丁酯、甲基丙烯酸異丁酯、甲基丙烯酸2- 丁酯、甲基丙烯酸正戊酯、甲基丙烯酸 2-戊酯、甲基丙烯酸異戊酯、甲基丙烯酸2-甲基戊酯、甲基丙烯酸正己酯、甲基丙烯酸2-己酯、甲基丙烯酸2-甲基己酯、甲基丙烯酸2-乙基己酯、甲基丙烯酸正庚酯、甲基丙烯酸2-庚酯、甲基丙烯酸2-甲基庚酯、甲基丙烯酸 2-丙基庚酯、甲基丙烯酸正辛酯、甲基丙烯酸異辛酯、甲基丙烯酸正壬酯、甲基丙烯酸異壬酯、甲基丙烯酸正癸酯、甲基丙烯酸異癸酯以及這些單體的混合物。The acrylate monomer may also be a methacrylate monomer, such as a methyl methacrylate to a dodecyl methacrylate (C1-C12), preferably a methyl methacrylate Within the range of octyl methacrylate (C1-8). For example, methyl methacrylate, ethyl methacrylate, propyl methacrylate, isopropyl methacrylate, n-butyl methacrylate, isobutyl methacrylate, 2-butyl methacrylate, methyl N-pentyl acrylate, 2-pentyl methacrylate, isoamyl methacrylate, 2-methylpentyl methacrylate, n-hexyl methacrylate, 2-hexyl methacrylate, 2-methyl methacrylate Hexyl ester, 2-ethylhexyl methacrylate, n-heptyl methacrylate, 2-heptyl methacrylate, 2-methylheptyl methacrylate, 2-propylheptyl methacrylate, methyl formate N-octyl methacrylate, isooctyl methacrylate, n-nonyl methacrylate, isononyl methacrylate, n-decyl methacrylate, isodecyl methacrylate and mixtures of these monomers.

其中,該含2-脲基-4-嘧啶酮單元丙烯酸接枝於該丙烯酸酯類單體,如下式1所示。Wherein, the 2-ureido-4-pyrimidinone unit-containing acrylic acid is grafted onto the acrylate monomer, as shown in the following formula 1.

式1 Formula 1

式1中R1為氫原子或甲基,當R1為氫原子時,即為丙烯酸酯類單體聚合,若R1為甲基時,則為甲基丙烯酸酯類單體聚合;R2為具有至少2~10個碳原子,優選4~6個碳原子。In Formula 1, R1 is a hydrogen atom or a methyl group, and when R1 is a hydrogen atom, the acrylate monomer is polymerized; if R1 is a methyl group, the methacrylate monomer is polymerized; R2 is a polymer having at least 2 ~ 10 carbon atoms, preferably 4 ~ 6 carbon atoms.

其中,該丙烯酸之光引發劑較佳包含含丙烯鍵式不飽和基團,或是甲基丙烯酸鍵式不飽和基團可以直接連接於所述苯乙酮衍生物或二苯甲酮衍生物的苯環上。Among them, the acrylic photoinitiator preferably contains a propylene bond unsaturated group or a methacrylic bond unsaturated group which can be directly connected to the acetophenone derivative or benzophenone derivative. Benzene ring.

而該自由基引發劑又可稱熱起始劑,其特性較佳為10小時半衰期溫度40~120℃的自由基起始劑,更佳為50~90℃,材料種類可包含偶氮類化合物,例如:2,2’-偶氮雙異丁腈(2,2’-Azobis-(isobutyronitrile),簡稱為AIBN)、2,2’-偶氮雙(2-甲基丁腈)(2,2’-Azobis-(2-methylbutyronitrile),簡稱為AMBN)、2,2’-偶氮雙(2,4-二甲基戊腈)(2,2’-Azobis-(2,4-dimethylvaleronitrile),簡稱為ADVN)等;過氧化二醯(Diacyl peroxides)類化合物,例如:過氧化二月桂醯(Dilauroyl peroxide)、過氧化二十醯(Decanoyl peroxide)、過氧化二苯甲醯(Dibenzoyl peroxide,簡稱為BPO)等;過氧化二烷(Dialkyl peroxides)類化合物,例如:2,5-二甲基-2,5-叔丁基過氧己烷(2,5-Dimethyl-2,5-di-(t-butylperoxy)hexane)、過氧化異丙苯(Dicumyl peroxide)、1,3-雙(叔丁基過氧異丙基)苯(1,3-Bis-(t-butyl peroxyisopropyl)benzene)等;過氧化酯(Peroxyesters)類化合物,例如:叔丁基過氧新戊酸酯(t-butylperoxypivalate)、2,5-二甲基-2,5-二(2-乙基己醇過氧化)己烷(2,5-Dimethyl-2,5-di(2-ethylhexanoylperoxy)hexane)等;過氧化碳酸酯(peroxycarbonates)類化合物,例如:2-乙基己基叔戊基過氧化碳酸酯(tert-Amylperoxy 2-ethylhexyl carbonate)、2-乙基己基叔丁基過氧化碳酸酯(tert-Butylperoxy 2-ethylhexyl carbonate)等;過氧化二碳酸酯(peroxydicarbonates)類化合物,例如:二肉豆蔻基過氧化二碳酸酯(Dimyristylperoxydicarbonate)、二(4-叔丁基環己基)過氧化二碳酸酯(Di(4-tert-butylcyclohexyl)peroxydicarbonate等;過氧化氫(Hydroperoxides)類化合物,例如:叔丁基過氧化氫(t-Butyl hydroperoxide)、異丙基異丙苯基過氧化氫(Isopropylcumylhydroperoxide)等。。The free radical initiator can also be called a thermal initiator. Its characteristics are preferably a free radical initiator with a 10-hour half-life temperature of 40 to 120 ° C, and more preferably 50 to 90 ° C. The type of material may include azo compounds. For example: 2,2'-azobisisobutyronitrile (2,2'-Azobis- (isobutyronitrile), abbreviated as AIBN), 2,2'-azobis (2-methylbutyronitrile) (2, 2'-Azobis- (2-methylbutyronitrile), abbreviated as AMBN), 2,2'-azobis (2,4-dimethylvaleronitrile) (2,2'-Azobis- (2,4-dimethylvaleronitrile) (Referred to as ADVN), etc .; Diacyl peroxides compounds, such as: Dilauroyl peroxide, Decanoyl peroxide, Dibenzoyl peroxide, Abbreviated as BPO), etc .; Dialkyl peroxides compounds, such as: 2,5-dimethyl-2,5-tert-butylperoxyhexane (2,5-Dimethyl-2,5-di -(t-butylperoxy) hexane), Dicumyl peroxide, 1,3-Bis- (t-butyl peroxyisopropyl) benzene) Etc; Peroxyesters , Such as: t-butylperoxypivalate (t-butylperoxypivalate), 2,5-dimethyl-2,5-bis (2-ethylhexanol peroxy) hexane (2,5-Dimethyl- 2,5-di (2-ethylhexanoylperoxy) hexane), etc .; Peroxycarbonates compounds, for example: 2-ethylhexyl-tert-amyloxycarbonate (tert-Amylperoxy 2-ethylhexyl carbonate), 2- Tert-Butylperoxy 2-ethylhexyl carbonate, etc .; peroxydicarbonates, for example: Dimyristylperoxydicarbonate, di (4 -Di (4-tert-butylcyclohexyl) peroxydicarbonate, etc .; Hydroperoxides, for example: t-Butyl hydroperoxide, isopropyl Isopropylcumylhydroperoxide and the like. .

該活性稀釋劑則包含丙烯酸甲烷基酯至丙烯酸十二烷基酯(C1-C12),較佳是丁烷基酯至十二烷基酯(C4-12),例如:丙烯酸正丁酯(BA)、丙烯酸異辛酯(2-EHA)、丙烯酸異癸酯(IDA)、丙烯酸月桂酯(LA)、丙烯酸羥乙酯、甲基丙烯酸羥乙酯、丙烯酸羥丙酯、甲基丙烯酸羥丙酯、帶有環狀結構的丙烯酸酯或是帶有環狀結構的甲基丙烯酸酯。The reactive diluent comprises methyl alkyl acrylate to dodecyl acrylate (C1-C12), preferably butyl to dodecyl acrylate (C4-12), for example: n-butyl acrylate (BA ), Isooctyl acrylate (2-EHA), isodecyl acrylate (IDA), lauryl acrylate (LA), hydroxyethyl acrylate, hydroxyethyl methacrylate, hydroxypropyl acrylate, hydroxypropyl methacrylate Acrylate with cyclic structure or methacrylate with cyclic structure.

本發明透過將2-脲基-4-嘧啶酮、光引發劑與活性稀釋劑的聚合單體改質帶有丙烯酸官能基或甲基丙烯酸官能基,使得該些成分與丙烯酸酯類單體或甲基丙烯酸酯類單體聚合時,不需要使用有機溶劑即可產生高效率的聚合效果,且可進一步提昇後續光固化的效能。In the present invention, by modifying the polymerization monomers of 2-ureido-4-pyrimidone, a photoinitiator, and a reactive diluent to carry an acrylic functional group or a methacrylic functional group, these components can be combined with an acrylic monomer or When methacrylate monomers are polymerized, it does not require the use of organic solvents to produce a high-efficiency polymerization effect, and can further improve the subsequent photo-curing performance.

請參考以下式2,本發明產生自我修復的機制是透過分子間2-脲基-4-嘧啶酮基團相互產生氫鍵聚合(氫鍵如式2中虛線所示),此反應機制於自然狀態下即會自動產生,不需額外暴露於特定光線或熱源。Please refer to the following formula 2. The self-healing mechanism of the present invention is through intermolecular 2-ureido-4-pyrimidinone groups to generate hydrogen bond polymerization with each other (hydrogen bonds are shown by the dashed lines in formula 2). This reaction mechanism is natural. It will be generated automatically under the condition without additional exposure to specific light or heat source.

式2 Equation 2

其中,式2中R1為氫原子或甲基,當R1為氫原子時,即為丙烯酸酯類單體聚合,若R1為甲基時,則為甲基丙烯酸酯類單體聚合;R2為具有至少2~10個碳原子,優選4~6個碳原子;R3為具有至少2~12個碳原子,優選2~8個碳原子。Among them, in Formula 2, R1 is a hydrogen atom or a methyl group, and when R1 is a hydrogen atom, the acrylate monomer is polymerized; if R1 is a methyl group, the methacrylate monomer is polymerized; R2 is At least 2 to 10 carbon atoms, preferably 4 to 6 carbon atoms; R3 has at least 2 to 12 carbon atoms, preferably 2 to 8 carbon atoms.

本發明的材料配方與製造方法一較佳實施例:先將60 份之甲基丙烯酸酯類單體、35份之含2-脲基-4-嘧啶酮單元的甲基丙烯酸單體,5份之甲基丙烯酸之光引發劑加入500mL圓底反應器中,攪拌均勻後再加入3份之自由基引發劑加熱升溫至90°C,氮氣下反應6小時後,放置使其溫度降到40 °C,然後逐步加入15份之活性稀釋劑,攪拌均勻,此反應過程較佳是在氮氣下進行。最後在將反應產物塗佈於面積大小為5cm*5cm的PET基材上,再置入紫外線燈箱進行光固合反應,得到厚度約為25μm之自癒合材料保護層。A preferred embodiment of the material formulation and manufacturing method of the present invention: 60 parts of methacrylate monomers, 35 parts of methacrylic acid monomers containing 2-ureido-4-pyrimidone units, and 5 parts The photoinitiator of methacrylic acid was added to a 500 mL round bottom reactor, and after stirring well, 3 parts of the free radical initiator was added and heated to 90 ° C. After 6 hours of reaction in nitrogen, it was left to cool to 40 ° C, and then gradually add 15 parts of the active diluent and stir well. This reaction process is preferably performed under nitrogen. Finally, the reaction product is coated on a PET substrate having an area of 5 cm * 5 cm, and then placed in an ultraviolet light box to perform a photo-solidification reaction to obtain a protective layer of a self-healing material with a thickness of about 25 μm.

請參考圖1(a)~圖1(b),其為將本實施例製得的之自癒合材料保護層,用刀片在其表面上劃一切痕,隨即用光學顯微鏡觀察(SEM)和拍攝在不同修復時間的切痕修復狀況,圖1(a)及圖1(b)分別是樣品表面的切痕在修復時間為0分鐘和10分鐘時的照片。與圖1(a)所示的未修復照片相比,當修復時間為10分鐘時,如圖1(b),樣品表面的切痕明顯地得到了修復,顯示本發明優異且快速的自我修復效果,且不需照射任何熱、光源或特定聲音下,即具有自癒合效果。Please refer to FIG. 1 (a) to FIG. 1 (b), which are the protective layer of the self-healing material prepared in this embodiment. The surface is scratched with a blade, and then observed with an optical microscope (SEM) and photographed. Fig. 1 (a) and Fig. 1 (b) are the repair conditions of the cuts at different repair time. Figures 1 (a) and 1 (b) are the photos of the cuts on the sample surface when the repair time is 0 minutes and 10 minutes, respectively. Compared with the unrepaired photo shown in Fig. 1 (a), when the repair time is 10 minutes, as shown in Fig. 1 (b), the cuts on the surface of the sample are obviously repaired, showing the excellent and rapid self-repair of the present invention Effect, without the need to irradiate any heat, light source or specific sound, it has a self-healing effect.

請參考圖2,本發明進一步提供一種自癒合保護膜10,其第一較佳實施例包含一基材11、以前述該自癒合材料所形成之一自癒合層13及一黏膠層15,該基材11為平面片狀,並具有一上表面111及一下表面113,該自癒合層13設置於該基材11之該上表面111,該黏膠層15設置於該基材11之該下表面113。Please refer to FIG. 2, the present invention further provides a self-healing protective film 10. The first preferred embodiment includes a substrate 11, a self-healing layer 13 and an adhesive layer 15 formed of the self-healing material. The substrate 11 is planar and has an upper surface 111 and a lower surface 113. The self-healing layer 13 is disposed on the upper surface 111 of the substrate 11, and the adhesive layer 15 is disposed on the substrate 11. Lower surface 113.

另外,請參考圖3,由於一般塑膠材料具有電絕性(導電聚合物除外),若與其他材料接觸或摩擦時會產生靜電積累,積累的靜電如不及時消除,可能導致靜電吸附、吸塵、火化放電等,引起燃燒、爆炸。因此,本發明該自癒合保護膜10第二較佳實施例係於該自癒合層20中,進一步添加1~6重量份之一抗靜電劑粒子131,減少或加速消除積累的靜電。In addition, please refer to Figure 3, because general plastic materials have electrical insulation (except conductive polymers), if they are in contact with or rubbed with other materials, static electricity will accumulate. If the accumulated static electricity is not eliminated in time, it may cause electrostatic adsorption, dust collection, Cremation and discharge, etc., cause combustion and explosion. Therefore, the second preferred embodiment of the self-healing protective film 10 of the present invention is based on the self-healing layer 20, and further adds 1 to 6 parts by weight of antistatic agent particles 131 to reduce or accelerate the elimination of accumulated static electricity.

請參考圖3,該黏膠層15可以是矽膠材質或黏劑,使該自癒合保護膜10可黏貼於任意表面上,進一步地,為了使用的方便性,該黏膠層15上可設有一離型層17,作為暫時性覆蓋與阻隔黏性的用途,使用時將該離型層17撕除後,即可將本發明黏貼於任意表面。Please refer to FIG. 3, the adhesive layer 15 can be made of silicon material or adhesive, so that the self-healing protective film 10 can be adhered to any surface. Further, for convenience, an adhesive layer 15 can be provided with a The release layer 17 is used for temporary covering and blocking adhesion. After the release layer 17 is peeled off during use, the present invention can be adhered to any surface.

請參考圖4,以該黏膠層15黏貼於一電子產品20之螢幕上,該自癒合層13設於最外層與外界接觸,本發明該自癒合保護膜10可作為該電子產品20的螢幕保護貼,當任何機械外力施加於該自癒合層13而造成括痕破損的情形,該自癒合層13可透過其自我修復能力恢復修補括痕破損處,不僅可增加螢幕保護貼的使用週期,更能減少垃圾產生,達到環保與環境友善的功效。Please refer to FIG. 4, the adhesive layer 15 is adhered to the screen of an electronic product 20, and the self-healing layer 13 is disposed at the outermost layer to contact the outside world. The self-healing protective film 10 of the present invention can be used as the screen of the electronic product 20 The protective patch, when any mechanical external force is applied to the self-healing layer 13 to cause damage to the brackets, the self-healing layer 13 can recover and repair the damaged brackets through its self-repairing ability, which not only can increase the life cycle of the screen protector, It can reduce waste generation and achieve environmental protection and environmental friendliness.

本發明所述之該電子產品20可以是手機、平板電腦、相機等,但除了應用於該電子產品20外,亦可使用於電器類產品之外殼。The electronic product 20 according to the present invention may be a mobile phone, a tablet computer, a camera, etc., but in addition to being applied to the electronic product 20, it may also be used in the casing of an electrical product.

上述僅為本發明的較佳實施例而已,並非用以限定本發明主張的權利範圍,凡其它未脫離本發明所揭示的精神所完成的等效改變或修飾,均應包括在本發明的主張範圍內。The above are merely preferred embodiments of the present invention, and are not intended to limit the scope of the claims of the present invention. Any other equivalent changes or modifications made without departing from the spirit of the present invention should be included in the claims of the present invention Within range.

10‧‧‧自癒合保護膜10‧‧‧ Self-healing protective film

11‧‧‧基材11‧‧‧ Substrate

111‧‧‧上表面111‧‧‧ top surface

113‧‧‧下表面113‧‧‧ lower surface

13‧‧‧自癒合層13‧‧‧Self-healing layer

131‧‧‧抗靜電劑粒子131‧‧‧Antistatic agent particles

15‧‧‧黏膠15‧‧‧Viscose

20‧‧‧電子產品20‧‧‧Electronic products

圖1(a)與圖1(b)分別是本發明較佳實施例表面的切痕在修復時間為0分鐘和10分鐘時的光學顯微鏡照片(SEM)。 圖2本發明該自癒合保護膜第一較佳實施例之示意圖。 圖3為本發明該自癒合保護膜第二較佳實施例之剖面圖。 圖4為本發明該自癒合保護膜之使用示意圖及局部放大圖。FIG. 1 (a) and FIG. 1 (b) are optical microscope photographs (SEM) of the cuts on the surface of the preferred embodiment of the present invention when the repair time is 0 minutes and 10 minutes, respectively. FIG. 2 is a schematic diagram of a first preferred embodiment of the self-healing protective film of the present invention. 3 is a cross-sectional view of a second preferred embodiment of the self-healing protective film of the present invention. FIG. 4 is a schematic diagram and a partially enlarged view of the self-healing protective film of the present invention.

Claims (8)

一種自癒合材料,其配方包含:30~79重量份之丙烯酸酯類單體;20~60重量份之含2-脲基-4-嘧啶酮單元的丙烯酸;1~10重量份丙烯酸光引發劑及1~5重量份自由基引發劑;1~20重量份一活性稀釋劑,該活性稀釋劑包含丙烯酸正丁酯、丙烯酸異辛酯、丙烯酸異癸酯、丙烯酸月桂酯、丙烯酸羥乙酯、甲基丙烯酸羥乙酯、丙烯酸羥丙酯、甲基丙烯酸羥丙酯、帶有環狀結構的丙烯酸酯或帶有環狀結構的甲基丙烯酸酯;其中,該自癒合材料照射紫外光後產生光固化反應;以及該自癒合材料具有分子間產生氫鍵鍵結之自癒合特性。A self-healing material whose formula comprises: 30 to 79 parts by weight of an acrylate monomer; 20 to 60 parts by weight of acrylic acid containing a 2-ureido-4-pyrimidone unit; and 1 to 10 parts by weight of an acrylic photoinitiator And 1 to 5 parts by weight of a free radical initiator; 1 to 20 parts by weight of a reactive diluent, the reactive diluent includes n-butyl acrylate, isooctyl acrylate, isodecyl acrylate, lauryl acrylate, hydroxyethyl acrylate, Hydroxyethyl methacrylate, hydroxypropyl acrylate, hydroxypropyl methacrylate, acrylate with a cyclic structure or methacrylate with a cyclic structure; wherein the self-healing material is generated after irradiating ultraviolet light Photo-curing reaction; and the self-healing material has self-healing properties of intermolecular hydrogen bonding. 如申請專利範圍第1項之自癒合材料,其中:該丙烯酸酯類單體包含丙烯酸甲酯、丙烯酸乙酯、丙烯酸丙酯、丙烯酸異丙酯、丙烯酸正丁酯、丙烯酸異丁酯、丙烯酸2-丁酯、丙烯酸正戊酯、丙烯酸2-戊酯、丙烯酸異戊酯、丙烯酸2-甲基戊酯、丙烯酸正己酯、丙烯酸2-己酯、丙烯酸2-甲基己酯、丙烯酸2-乙基己酯、丙烯酸正庚酯、丙烯酸2-庚酯、丙烯酸2-甲基庚酯、丙烯酸2-丙基庚酯、丙烯酸正辛酯、丙烯酸異辛酯、丙烯酸正壬酯、丙烯酸異壬酯、丙烯酸正癸酯、丙烯酸異癸酯、甲基丙烯酸甲酯、甲基丙烯酸乙酯、甲基丙烯酸丙酯、甲基丙烯酸異丙酯、甲基丙烯酸正丁酯、甲基丙烯酸異丁酯、甲基丙烯酸2-丁酯、甲基丙烯酸正戊酯、甲基丙烯酸2-戊酯、甲基丙烯酸異戊酯、甲基丙烯酸2-甲基戊酯、甲基丙烯酸正己酯、甲基丙烯酸2-己酯、甲基丙烯酸2-甲基己酯、甲基丙烯酸2-乙基己酯、甲基丙烯酸正庚酯、甲基丙烯酸2-庚酯、甲基丙烯酸2-甲基庚酯、甲基丙烯酸2-丙基庚酯、甲基丙烯酸正辛酯、甲基丙烯酸異辛酯、甲基丙烯酸正壬酯、甲基丙烯酸異壬酯、甲基丙烯酸正癸酯、甲基丙烯酸異癸酯或前述單體的混合物;該丙烯酸之光引發劑包含含丙烯鍵式不飽和基團或甲基丙烯鍵式不飽和基團接枝於苯環上之苯乙酮衍生物或二苯甲酮衍生物;以及該自由基引發劑包含偶氮類化合物、過氧化二醯化合物、過氧化二烷類化合物、過氧化酯類化合物、過氧化碳酸酯類化合物、過氧化二碳酸酯類化合物或過氧化氫類化合物。For example, the self-healing material of the first patent application scope, wherein the acrylate monomer includes methyl acrylate, ethyl acrylate, propyl acrylate, isopropyl acrylate, n-butyl acrylate, isobutyl acrylate, and acrylic acid 2 -Butyl, n-pentyl acrylate, 2-pentyl acrylate, isoamyl acrylate, 2-methylpentyl acrylate, n-hexyl acrylate, 2-hexyl acrylate, 2-methylhexyl acrylate, 2-ethyl acrylate Hexyl hexyl, n-heptyl acrylate, 2-heptyl acrylate, 2-methylheptyl acrylate, 2-propylheptyl acrylate, n-octyl acrylate, isooctyl acrylate, n-nonyl acrylate, isononyl acrylate , N-decyl acrylate, isodecyl acrylate, methyl methacrylate, ethyl methacrylate, propyl methacrylate, isopropyl methacrylate, n-butyl methacrylate, isobutyl methacrylate, 2-butyl methacrylate, n-pentyl methacrylate, 2-pentyl methacrylate, isoamyl methacrylate, 2-methylpentyl methacrylate, n-hexyl methacrylate, methacrylic acid 2 -Hexyl ester, 2-methylhexyl methacrylate 2-ethylhexyl methacrylate, n-heptyl methacrylate, 2-heptyl methacrylate, 2-methylheptyl methacrylate, 2-propylheptyl methacrylate, n-octyl methacrylate Ester, isooctyl methacrylate, n-nonyl methacrylate, isononyl methacrylate, n-decyl methacrylate, isodecyl methacrylate or a mixture of the foregoing monomers; the photoinitiator of acrylic acid comprises An acetophenone derivative or a benzophenone derivative containing a propylene bond unsaturated group or a methacrylic bond unsaturated group grafted on a benzene ring; and the radical initiator includes an azo compound, Dioxin peroxide compounds, dioxane peroxide compounds, peroxide ester compounds, peroxide carbonate compounds, peroxide dicarbonate compounds, or hydrogen peroxide compounds. 如申請專利範圍第2項之自癒合材料,其中:該偶氮類化合物包含2,2’-偶氮雙異丁腈、2,2’-偶氮雙(2-甲基丁腈)或2,2’-偶氮雙(2,4-二甲基戊腈);該過氧化二醯化合物包含過氧化二月桂醯、過氧化二十醯或過氧化二苯甲醯;該過氧化二烷類化合物包含2,5-二甲基-2,5-叔丁基過氧己烷、過氧化異丙苯或1,3-雙(叔丁基過氧異丙基)苯;該過氧化酯類化合物包含叔丁基過氧新戊酸酯或2,5-二甲基-2,5-二(2-乙基己醇過氧化)己烷;該過氧化碳酸酯類化合物包含2-乙基己基叔戊基過氧化碳酸酯或2-乙基己基叔丁基過氧化碳酸酯;該過氧化二碳酸酯類化合物包含二肉豆蔻基過氧化二碳酸酯或二(4-叔丁基環己基)過氧化二碳酸酯;以及該過氧化氫類化合物包含叔丁基過氧化氫或異丙基異丙苯基過氧化氫。For example, the self-healing material in the second scope of the patent application, wherein: the azo compound contains 2,2'-azobisisobutyronitrile, 2,2'-azobis (2-methylbutyronitrile) or 2 , 2'-Azobis (2,4-dimethylvaleronitrile); the difluorene peroxide compound comprises dilauric acid peroxide, icosamidine peroxide, or dibenzofluorene peroxide; the dioxane peroxide Compounds include 2,5-dimethyl-2,5-tert-butylperoxyhexane, cumene peroxide or 1,3-bis (tert-butylperoxyisopropyl) benzene; the peroxide ester The compounds include tert-butyl peroxypivalate or 2,5-dimethyl-2,5-bis (2-ethylhexanol peroxy) hexane; the percarbonate compounds include 2-ethyl Hexyl tert-pentyl peroxycarbonate or 2-ethylhexyl tert-butyl peroxycarbonate; the peroxydicarbonate compounds include dimyristoyl peroxydicarbonate or bis (4-tert-butyl ring) Hexyl) dicarbonate; and the hydrogen peroxide-based compound includes tert-butyl hydroperoxide or cumyl cumyl hydroperoxide. 一種自癒合材料的製造方法,其步驟包含:熱聚合步驟:依序將79~30重量份之丙烯酸酯類單體、20~60重量份之含2-脲基-4-嘧啶酮單元之丙烯酸與1~10重量份之丙烯酸之光引發劑置入反應容器內,再將1~5重量份之自由基引發劑加入反應容器中攪拌均勻,將反應器溫度升到70~90℃並反應約3~6小時,待降溫後得丙烯酸酯預聚物;以及光固化步驟:將所得之丙烯酸酯預聚物塗佈於一基材上,經由紫外線照射後光固化成膜得該自癒合材料,該自癒合材料具有分子間產生氫鍵鍵結之自癒合特性。A method for manufacturing a self-healing material, the steps include: a thermal polymerization step: sequentially 79 to 30 parts by weight of an acrylate monomer and 20 to 60 parts by weight of acrylic acid containing a 2-ureido-4-pyrimidone unit Put 1 ~ 10 parts by weight of acrylic photoinitiator into the reaction container, and then add 1 ~ 5 parts by weight of free radical initiator into the reaction container and stir evenly, raise the reactor temperature to 70 ~ 90 ℃ and react for about 3 to 6 hours, the acrylate prepolymer is obtained after the temperature is lowered; and the photocuring step: the obtained acrylate prepolymer is coated on a substrate, and is photocured into a film after ultraviolet irradiation to obtain the self-healing material, The self-healing material has the self-healing property of intermolecular hydrogen bonding. 如申請專利範圍第4項之自癒合材料的製造方法,其中:該丙烯酸酯類單體為甲基丙烯酸酯類單體;該含2-脲基-4-嘧啶酮單元之丙烯酸為含2-脲基-4-嘧啶酮單元之甲基丙烯酸;該丙烯酸光引發劑為甲基丙烯酸光引發劑;以及該基材包含聚乙烯對苯二甲酸酯基材。For example, the method for manufacturing a self-healing material according to item 4 of the application, wherein: the acrylate monomer is a methacrylate monomer; the acrylic acid containing 2-ureido-4-pyrimidinone unit contains 2- Methacrylic acid of a ureido-4-pyrimidinone unit; the acrylic photoinitiator is a methacrylic photoinitiator; and the substrate comprises a polyethylene terephthalate substrate. 一種自癒合保護膜,其包含:一基材,該基材為平面片狀,並具有一上表面及一下表面;一自癒合層,該自癒合層設置於該基材之該上表面;一黏膠層,該黏膠層設置於該基材之該下表面;其中:該自癒合層係由一自癒合材料塗佈於該基材上後,照射紫外線光固化形成;該自癒合材料配方包含:79~30重量份之丙烯酸酯類單體、20~60重量份之含2-脲基-4-嘧啶酮單元的丙烯酸、1~10重量份之丙烯酸之光引發劑、1~20重量份一活性稀釋劑,該活性稀釋劑包含丙烯酸正丁酯、丙烯酸異辛酯、丙烯酸異癸酯、丙烯酸月桂酯、丙烯酸羥乙酯、甲基丙烯酸羥乙酯、丙烯酸羥丙酯、甲基丙烯酸羥丙酯、帶有環狀結構的丙烯酸酯或帶有環狀結構的甲基丙烯酸酯及1~5重量份之自由基引發劑,以及該自癒合材料具有分子間產生氫鍵鍵結之自癒合特性。A self-healing protective film includes: a substrate, the substrate is a flat sheet, and has an upper surface and a lower surface; a self-healing layer, the self-healing layer is disposed on the upper surface of the substrate; Adhesive layer, the adhesive layer is disposed on the lower surface of the substrate; wherein: the self-healing layer is formed by coating a self-healing material on the substrate and curing by irradiating ultraviolet light; the self-healing material formula Contains: 79 ~ 30 parts by weight of acrylate monomer, 20 ~ 60 parts by weight of acrylic acid containing 2-ureido-4-pyrimidone unit, 1 ~ 10 parts by weight of acrylic acid photoinitiator, 1 ~ 20 parts by weight A reactive diluent containing n-butyl acrylate, isooctyl acrylate, isodecyl acrylate, lauryl acrylate, hydroxyethyl acrylate, hydroxyethyl methacrylate, hydroxypropyl acrylate, and methacrylic acid Hydroxypropyl ester, acrylate with cyclic structure or methacrylate with cyclic structure, and 1 to 5 parts by weight of a free radical initiator, and the self-healing material has an intermolecular hydrogen bonding bond. Healing properties. 如申請專利範圍第6項之自癒合保護膜,其中:該丙烯酸酯類單體為甲基丙烯酸酯類單體;該含2-脲基-4-嘧啶酮單元之丙烯酸為含2-脲基-4-嘧啶酮單元之甲基丙烯酸;該丙烯酸光引發劑為甲基丙烯酸光引發劑;以及該自癒合層中包含一抗靜電劑粒子或活性稀釋劑。For example, the self-healing protective film according to item 6 of the application, wherein: the acrylate monomer is a methacrylate monomer; the acrylic acid containing a 2-ureido-4-pyrimidone unit is a 2-urea group Methacrylic acid of a 4-pyrimidinone unit; the acrylic photoinitiator is a methacrylic photoinitiator; and the self-healing layer contains an antistatic agent particle or a reactive diluent. 如申請專利範圍第6或7項之自癒合保護膜,該黏膠層設置於該基材之另一側進一步設有一離型層。For example, if the self-healing protective film of item 6 or 7 is applied for, the adhesive layer is disposed on the other side of the substrate, and a release layer is further provided.
TW106121890A 2017-06-30 2017-06-30 Self-repairing material, producing method and application thereof TWI658130B (en)

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