TWI652254B - Method for preparing compound and method for preparing polymer employing the same - Google Patents
Method for preparing compound and method for preparing polymer employing the same Download PDFInfo
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Abstract
本揭露提供一種化合物的製備方法及包含其之聚合物製備方法。該化合物的製備方法包含:將式(I)所示結構的化合物在式(II)所示結構的化合物存在下與式(III)所示結構的化合物進行反應,得到式(IV)所示結構的化合物
Description
本揭露關於一種化合物的製備方法及包含其之聚合物製備方法。 The present invention relates to a process for the preparation of a compound and a process for the preparation of a polymer comprising the same.
聚醚碸(polyether sulfone、PES)或聚硫醚碸(polythioether sulfone、PTES)具有出色的物理特性,例如耐熱性、耐化學性、耐火性、無毒性、及電絕緣特性,因此廣泛用於電腦零組件、汽車零組件、食品容器、以及具有耐化學性的工業纖維。 Polyether sulfone (PES) or polythioether sulfone (PTES) has excellent physical properties such as heat resistance, chemical resistance, fire resistance, non-toxicity, and electrical insulation properties, so it is widely used in computers. Components, automotive components, food containers, and industrial fibers with chemical resistance.
然而,由於傳統聚醚碸、聚硫醚碸、或其單體的製備方法主要係以鹵製程為主,除了低的產率外,還會產生無法回收的含鹵副產物,造成環境汙染。 However, since the conventional polyether oxime, polythioxanthene, or a monomer thereof is mainly prepared by a halogen process, in addition to a low yield, a halogen-containing by-product which cannot be recovered is generated, causing environmental pollution.
根據本揭露實施例,本揭露提供一種化合物的製備方法,包含:將式(I)所示結構的化合物在式(II)所示結構的化合物存在下與式(III)所示結構的化合物進行反應,得到式(IV)所示結構的化合物
根據本揭露實施例,本揭露亦提供一種聚合物的製備方法,包含將式(I)所示結構的化合物在式(II)所示結構的化合物存在下與式(III)所示結構的化合物進行反應,得到式(IV)所示結構的化合物;將式(IV)所示結構的化合物與一化合物A反應,得到式(V)所示結構的化合物,其中該化合物A為硝酸、硫酸、醋酸、雙氧水、或上述之混合;以及,將式(V)所示結構的化合物與式(VI)所示結構的化合物反應,得到一具有式(VII)所示結構重複單元之聚合物
本揭露實施例提供一種化合物的製備方法,該化合物製備方法所使用的反應起始物或是催化劑皆不含鹵素,除了可避免產生含鹵副產物,還可避免殘留含鹵化合物於所得化合物中。因此,本揭露所述化合物的製備方法無需使用額外步驟來去除含鹵副產物或殘留的鹵化合物,可降低生產成本並增加製程產率,得到可用於後續聚合製程的無鹵單體。 The present disclosure provides a method for preparing a compound. The reaction starting material or the catalyst used in the preparation method of the compound does not contain halogen, except that halogen-containing by-products can be avoided, and residual halogen-containing compounds can be avoided in the obtained compound. . Therefore, the method for preparing the compound of the present disclosure does not require an additional step to remove the halogen-containing by-product or the residual halogen compound, which can reduce the production cost and increase the process yield, and obtain a halogen-free monomer which can be used in the subsequent polymerization process.
此外,本揭露實施例亦提供一種聚合物(例如聚醚碸(polyether sulfone、PES)或聚硫醚碸(polythioether sulfone、PTES))的製備方法,該聚合物的單體之製備方法及該聚合物的製備方法所使用的反應起始物不含鹵素,除了可避免產生含鹵副產物,還可避免殘留 含鹵化合物於所得化合物中。因此,本揭露所述聚合物的製備方法無需使用額外步驟來去除含鹵副產物或殘留的鹵化合物,可降低生產成本並增加製程產率,得到無鹵聚合物。此外,本揭露所述聚合物的製備方法,係在酸性環境下對反應單體進行親電聚合反應,並搭配聚合後氧化技術,可大幅提昇所得聚合物的分子量,且所得之聚合物具有較低的分子量分佈值(polydispersity index、PDI)。 In addition, the present disclosure also provides a method for preparing a polymer (for example, polyether sulfone (PES) or polythioether sulfone (PTES)), a method for preparing the monomer of the polymer, and the polymerization. The reaction starting materials used in the preparation method do not contain halogen, except that halogen-containing by-products can be avoided, and residues can be avoided. A halogen-containing compound is included in the obtained compound. Therefore, the method for preparing the polymer of the present disclosure does not require an additional step to remove the halogen-containing by-product or the residual halogen compound, which can reduce the production cost and increase the process yield, thereby obtaining a halogen-free polymer. In addition, the preparation method of the polymer disclosed in the present invention is an electrophilic polymerization reaction of a reactive monomer in an acidic environment, and combined with a post-polymerization oxidation technique, the molecular weight of the obtained polymer can be greatly improved, and the obtained polymer has a comparatively high molecular weight. Low molecular weight distribution (PDI).
根據本揭露實施例,本揭露提供一種化合物的製備方法,該化合物可作為一後續聚合製程(例如聚醚碸(polyether sulfone、PES)或聚硫醚碸(polythioether sulfone、PTES)的聚合製程)的反應單體。該化合物的製備方法包含:將式(I)所示結構的化合物在式(II)所示結構的化合物存在下與式(III)所示結構的化合物進行反應,得到式(IV)所示結構的化合物
根據本揭露實施例,其中Ar1可為取代或未取代之苯基(phenyl group)、聯苯基(biphenyl group)、萘基(naphthyl group)、噻吩基(thienyl group)、吲哚基(indolyl)、菲基(phenanthrenyl)、茚基(indenyl)、蒽基(anthracenyl)、或芴基(fluorenylene)。其中,取代之苯基(phenyl group)、聯苯基(biphenyl group)、萘基(naphthyl group)、噻吩基(thienyl group)、吲哚基(indolyl)、菲基(phenanthrenyl)、茚基(indenyl)、蒽基(anthracenyl)、或芴基(fluorenylene)係指該等芳香基團之至少一者碳上的氫被C1-6烷基所取代。 According to an embodiment of the present disclosure, wherein Ar 1 may be a substituted or unsubstituted phenyl group, a biphenyl group, a naphthyl group, a thienyl group, an indolyl group. ), phenanthrenyl, indenyl, anthracenyl, or fluorenylene. Wherein, substituted phenyl group, biphenyl group, naphthyl group, thienyl group, indolyl, phenanthrenyl, indenyl , anthracenyl, or fluorenylene means that the hydrogen on at least one of the aromatic groups is replaced by a C 1-6 alkyl group.
根據本揭露實施例,C1-6烷基可為直鏈或分支(linear or branched)鏈的烷基,例如甲基(methyl)、乙基(ethyl)、丙基(propyl)、異丙基(isopropyl)、正丁基(n-butyl)、叔丁基(t-butyl)、仲丁基(sec-butyl)、異丁基(isobutyl)、戊基(pentyl)、或己基(hexyl)。 According to an embodiment of the present disclosure, the C 1-6 alkyl group may be a linear or branched chain alkyl group such as methyl, ethyl, propyl, isopropyl. (isopropyl), n-butyl, t-butyl, sec-butyl, isobutyl, pentyl, or hexyl.
根據本揭露實施例,R1可獨立為氫、甲基(methyl)、乙基(ethyl)、丙基(propyl)、異丙基(isopropyl)、正丁基(n-butyl)、叔丁基(t-butyl)、仲丁基(sec-butyl)、異丁基(isobutyl)、戊基(pentyl)、或己基(hexyl)。 According to an embodiment of the present disclosure, R 1 may independently be hydrogen, methyl, ethyl, propyl, isopropyl, n-butyl, tert-butyl. (t-butyl), sec-butyl, isobutyl, pentyl, or hexyl.
根據本揭露實施例,R2可為羥基、甲基(methyl)、乙基(ethyl)、丙基(propyl)、異丙基(isopropyl)、正丁基(n-butyl)、叔丁基(t-butyl)、仲丁基(sec-butyl)、異丁基(isobutyl)、戊基(pentyl)、己基(hexyl)、苯基、或甲苯基(tolyl)。 According to an embodiment of the present disclosure, R 2 may be a hydroxyl group, a methyl group, an ethyl group, a propyl group, an isopropyl group, an n-butyl group, a t-butyl group ( T-butyl), sec-butyl, isobutyl, pentyl, hexyl, phenyl, or tolyl.
根據本揭露實施例,R3可獨立為甲基(methyl)、乙基(ethyl)、丙基(propyl)、異丙基(isopropyl)、正丁基(n-butyl)、叔丁基(t-butyl)、仲丁基(sec-butyl)、異丁基(isobutyl)、戊基(pentyl)、己基 (hexyl)、環戊基、環己基、環庚基、環辛基、或,其中1≦n≦5、0≦m≦4、且1≦n+m≦5。 According to an embodiment of the present disclosure, R 3 may independently be methyl, ethyl, propyl, isopropyl, n-butyl, t-butyl (t -butyl), sec-butyl, isobutyl, pentyl, hexyl, cyclopentyl, cyclohexyl, cycloheptyl, cyclooctyl, or , where 1≦n≦5, 0≦m≦4, and 1≦n+m≦5.
根據本揭露實施例,式(I)所示結構的化合物可為
根據本揭露實施例,R4可獨立為氫、甲基(methyl)、乙基(ethyl)、丙基(propyl)、異丙基(isopropyl)、正丁基(n-butyl)、叔丁基(t-butyl)、仲丁基(sec-butyl)、異丁基(isobutyl)、戊基(pentyl)、或 己基(hexyl)。 According to an embodiment of the present disclosure, R 4 may independently be hydrogen, methyl, ethyl, propyl, isopropyl, n-butyl, t-butyl. (t-butyl), sec-butyl, isobutyl, pentyl, or hexyl.
根據本揭露實施例,式(II)所示結構的化合物可為硫酸(sulfuric acid)、甲基磺酸(methanesulfonic acid)、苯磺酸(benzenesulfonic acid)、對甲苯磺酸(p-toluenesulfonic acid)、或上述之組合。 According to an embodiment of the present disclosure, the compound of the structure represented by the formula (II) may be sulfuric acid, methanesulfonic acid, benzenesulfonic acid, p-toluenesulfonic acid. Or a combination of the above.
根據本揭露實施例,式(III)所示結構的化合物可為
根據本揭露實施例,本揭露提供一種式(IV)所示結構的化合物之製備方法,其中式(IV)所示結構的化合物可為
根據本揭露實施例,本揭露所述式(IV)所示結構的化合物之製備方法,可包含將式(I)所示結構的化合物及式(II)所示結構的化合物溶於一溶劑中,得到一混合物。接著,將式(III)所示結構的化合物加入該混合物中,經反應後得到式(IV)所示結構的化合物。上述化合物之製備方法可以以下化學反應式表示:
根據本揭露實施例,在本揭露所述的化合物之製備方法中,式(II)所示結構的化合物與式(I)所示結構的化合物之莫耳比可約為0.5至5;此外,在本揭露所述的化合物之製備方法中,式(I)所示結構的化合物與式(III)所示結構的化合物之莫耳比可約為1至20,例如可約為1至3、或可約為1至10。 According to an embodiment of the present disclosure, in the preparation method of the compound of the present disclosure, the molar ratio of the compound of the structure represented by the formula (II) to the compound of the structure of the formula (I) may be about 0.5 to 5; In the preparation method of the compound of the present disclosure, the molar ratio of the compound of the formula (I) to the compound of the structure of the formula (III) may be about 1 to 20, for example, about 1 to 3, Or it can be about 1 to 10.
根據本揭露某些實施例,該化合物的製備方法,在製備式(IV)所示結構的化合物後,更包含將式(IV)所示結構的化合物與一化合物A反應,得到式(V)所示結構的化合物
根據本揭露實施例,本揭露提供一種式(V)所示結構的化合物之製備方法,其中式(V)所示結構的化合物可為
根據本揭露實施例,本揭露所述式(V)所示結構的化合物之製備方法,可包含將式(I)所示結構的化合物及式(II)所示結構的化合物溶於一第一溶劑中,得到一混合物。接著,將式(III)所示結構的化合物加入該混合物中,經反應後得到式(IV)所示結構的化合物。接著,將式(IV)所示結構的化合物溶於一第二溶劑中,並加入化合物A(compound A),反應後得到式(V)所示結構的化合物。上述化合物之製備方法可以以下化學反應式表示:
根據本揭露實施例,所使用的第一溶劑可為任何可用來溶解式(I)所示結構的化合物及式(II)所示結構的化合物的溶劑,所使用的第二溶劑可為任何可用來溶解式(IV)所示結構的化合物。根據本揭露實施例,可使用不含鹵素的有機溶劑作為第一溶劑或第二溶劑。此外,易於在反應完畢後移除且不會參與反應的含鹵素有機溶劑亦可考慮使用。根據本揭露實施例,該第一溶劑或第二溶劑可為非質子溶劑,包括:乙腈、直鏈或環狀的烷類(例如丙烷、丁烷、環己烷)、鹵烷類(二氯甲烷、三氯甲烷、二氯乙烷)、或者不添加溶劑。根據本揭露實施例,式(IV)所示結構的化合物與化合物A之莫耳比可約為0.8至30。 According to an embodiment of the present disclosure, the first solvent used may be any solvent which can be used to dissolve the compound of the structure represented by the formula (I) and the compound of the structure represented by the formula (II), and the second solvent used may be any useful To dissolve the compound of the structure shown in the formula (IV). According to an embodiment of the present disclosure, a halogen-free organic solvent may be used as the first solvent or the second solvent. Further, a halogen-containing organic solvent which is easy to remove after the completion of the reaction and does not participate in the reaction can also be considered. According to an embodiment of the present disclosure, the first solvent or the second solvent may be an aprotic solvent, including: acetonitrile, a linear or cyclic alkane (such as propane, butane, cyclohexane), a halogenated alkane (dichloro Methane, chloroform, dichloroethane), or no added solvent. According to an embodiment of the present disclosure, the molar ratio of the compound of the formula (IV) to the compound A may be about 0.8 to 30.
根據本揭露實施例,本揭露提供一種聚合物的製備方法。該聚合物的製備方法包含:將式(I)所示結構的化合物在式(II)所示結構的化合物存在下與式(III)所示結構的化合物進行反應,得到式(IV)所示結構的化合物;將式(IV)所示結構的化合物與一化合物A反應,得到式(V)所示結構的化合物,其中該化合物A為硝酸、硫酸、醋酸、雙氧水、或上述之混合;以及,將式(V)所示結構的化合物與式(VI)所示結構的化合物反應,得到一具有式(VII)所示結構重複單元之聚合物
根據本揭露實施例,R5可為羥基、甲基(methyl)、乙基(ethyl)、丙基(propyl)、異丙基(isopropyl)、正丁基(n-butyl)、叔丁基(t-butyl)、仲丁基(sec-butyl)、異丁基(isobutyl)、戊基(pentyl)、己基(hexyl)、苯基、或甲苯基(tolyl)。 According to an embodiment of the present disclosure, R 5 may be hydroxy, methyl, ethyl, propyl, isopropyl, n-butyl, t-butyl ( T-butyl), sec-butyl, isobutyl, pentyl, hexyl, phenyl, or tolyl.
根據本揭露實施例,本揭露所述取代之二價芳香基係指該二價芳香基之至少一者碳上的氫被C1-6烷基所取代。 According to an embodiment of the present disclosure, the substituted divalent aromatic group of the present disclosure means that the hydrogen on at least one of the divalent aromatic groups is substituted by a C 1-6 alkyl group.
根據本揭露實施例,Ar2可為取代或未取代伸苯基(phenylene group)、聯苯伸基(biphenylene group)、伸萘基(naphthylene group)、伸噻吩基(thienylene group)、伸吲哚基(indolylene)、伸菲基(phenanthrenylene)、伸茚基(indenylene)、伸蒽基(anthracenylene)、或伸芴基(fluorenylene),其中取代之伸苯基(phenylene group)、聯苯伸基(biphenylene group)、伸萘基(naphthylene group)、伸噻吩基(thienylene group)、伸吲哚基(indolylene)、伸菲基(phenanthrenylene)、伸茚基(indenylene)、伸蒽基(anthracenylene)、或伸芴基(fluorenylene)係指該等二價芳香基團之至少一者碳上的氫被C1-6烷基所取代。 According to an embodiment of the present disclosure, Ar 2 may be a substituted or unsubstituted phenylene group, a biphenylene group, a naphthylene group, a thienylene group, and a stilbene group. Indolylene, phenanthrenylene, indenylene, anthracenylene, or fluorenylene, in which a substituted phenylene group or a biphenyl group ( Biphenylene group), naphthylene group, thienylene group, indolylene, phenanthrenylene, indenylene, anthracenylene, or Fluorylene means that hydrogen on at least one of the divalent aromatic groups is replaced by a C 1-6 alkyl group.
根據本揭露實施例,在本揭露所述的聚合物之製備方法中,式(II)所示結構的化合物與式(I)所示結構的化合物之莫耳比可約為0.5至5;此外,在本揭露所述的化合物之製備方法中,式(I)所示結構的化合物與式(III)所示結構的化合物之莫耳比可約為1至20,例如可約為1至3、或可約為1至10。式(IV)所示結構的化合物與化合物A(硝酸、硫酸、醋酸、雙氧水、或上述之混合)之莫耳比可約為0.8至30;以及,式(V)所示結構的化合物與式(VI)所示結構的化合物之莫耳比可 約為0.8至20,例如可約為1.2至5。此外,上述式(VI)所示結構的化合物除了與式(V)所示結構的化合物反應外,亦可添加過量以作為溶劑。 According to an embodiment of the present disclosure, in the preparation method of the polymer of the present disclosure, the molar ratio of the compound of the structure represented by the formula (II) to the compound of the structure of the formula (I) may be about 0.5 to 5; In the preparation method of the compound of the present disclosure, the molar ratio of the compound of the formula (I) to the compound of the structure of the formula (III) may be about 1 to 20, for example, about 1 to 3. Or it can be about 1 to 10. The molar ratio of the compound of the formula (IV) to the compound A (nitric acid, sulfuric acid, acetic acid, hydrogen peroxide, or the like) may be about 0.8 to 30; and the compound and formula of the structure represented by the formula (V) The molar ratio of the compound of the structure shown in (VI) It is about 0.8 to 20, for example, about 1.2 to 5. Further, in addition to the reaction with the compound of the structure represented by the formula (V), the compound of the structure represented by the above formula (VI) may be added in excess as a solvent.
根據本揭露實施例,式(VI)所示結構的化合物可為硫酸(sulfuric acid)、甲基磺酸(methanesulfonic acid)、苯磺酸(benzenesulfonic acid)、對甲苯磺酸(p-toluenesulfonic acid)、三氟甲磺酸(trifluoromethanesulfonic acid)或上述之組合。此外,根據本揭露實施例,式(II)所示結構的化合物與式(VI)所示結構的化合物可為相同或不同之化合物。 According to an embodiment of the present disclosure, the compound of the structure represented by the formula (VI) may be sulfuric acid, methanesulfonic acid, benzenesulfonic acid, p-toluenesulfonic acid. , trifluoromethanesulfonic acid or a combination of the above. Further, according to the embodiments of the present disclosure, the compound of the structure represented by the formula (II) and the compound of the structure represented by the formula (VI) may be the same or different compounds.
根據本揭露實施例,本揭露所述的聚合物製備方法,可用來製備具有式(VII)所示結構重複單元的聚合物。舉例來說,式(VII)
所示結構重複單元可為、
根據本揭露實施例,本揭露所述具有式(VII)所示結構重複單元的聚合物之製備方法,可包含將式(I)所示結構的化合物及式(II)所示結構的化合物溶於一第一溶劑中,得到一混合物。接著,將式(III)所示結構的化合物加入該混合物中,經反應後得到式(IV)所示結構的化合物。接著,將式(IV)所示結構的化合物溶於一第二溶劑中,並加入化合物A,反應後得到式(V)所示結構的化合物。接著,將式(V)所示結構的化合物與式(VI)所示結構的化合物反應,得到一具有式(VII)所示結構重複單元之聚合物。上述聚合物之製備方法可以以下化學反應式表示:
根據本揭露實施例,在製備具有式(VII)所示結構重複單元之聚合物後,該聚合物的製備方法更包含將一親核試劑與該具有式(VII)所示結構重複單元之聚合物反應,得到具有式(VIII)所示結構重複單元之聚合物
上述具有式(VIII)所示結構重複單元之聚合物的製備方法可以以下化學反應式表示:
根據本揭露實施例,該親核試劑(nucleophile)可為具有取代/非取代基的吡啶或其衍生物(例如:吡啶、4-甲基吡啶)、胺類(如:三乙胺)、鹵化鹽類(例如:氯化鉀)、醇類(例如:甲醇、乙醇)、醯胺類(例如:二甲基甲醯胺、二甲基乙醯胺、N-甲基吡咯酮)、或上述之組合。該親核試劑與具有式(VII)所示結構重複單元之聚合物之 基團的當量數比可為1至10。根據本揭露實施例,該親核試劑與該具有式(VII)所示結構重複單元之聚合物可視需要先溶解於一有機溶劑中,再進行反應。 According to an embodiment of the present disclosure, the nucleophile may be a substituted/unsubstituted pyridine or a derivative thereof (eg, pyridine, 4-methylpyridine), an amine (eg, triethylamine), halogenated. Salts (eg potassium chloride), alcohols (eg methanol, ethanol), guanamines (eg dimethylformamide, dimethylacetamide, N-methylpyrrolidone), or The combination. The nucleophile and the polymer having a repeating unit of the structure represented by the formula (VII) The equivalent ratio of the groups may be from 1 to 10. According to the embodiment of the present disclosure, the nucleophilic reagent and the polymer having the structural repeating unit represented by the formula (VII) may be dissolved in an organic solvent as needed, and then reacted.
根據本揭露實施例,當具有式(VIII)所示結構重複單元之聚合物之X為-O-或-NH-時(即該式(VIII)所示結構重複單元為
或,其中Ar2、以及R1的定義與上述相同),在製備具有式(VII)所示結構重複單元之聚合物後,該聚合物的製備方法可更包含:將具有式(VIII)所示結構重複單元之聚合物與過氧化氫反應,得到具有式(X)所示結構重複單元之聚合物。或者,將具有式(VIII)所示結構重複單元之聚合物在式(IX)所示的化合物存在下與過氧化氫(H2O2)反應,得到具有式(X)所示結構重複單元之聚合物
根據本揭露其他實施例,本揭露具有式(X)所示結構重複單元之聚合物的製備方法,可將具有式(VIII)所示結構重複單元之聚合物、式(IX)所示的化合物、與過氧化氫反應先與一溶劑混合,再進行反應。舉例來說,該溶劑可例如為醯胺類溶劑或碸類溶劑。 According to other embodiments of the present disclosure, there is disclosed a method for preparing a polymer having a repeating unit of the structure represented by the formula (X), which may have a polymer having a repeating unit of the formula (VIII) and a compound represented by the formula (IX). The reaction with hydrogen peroxide is first mixed with a solvent, and then the reaction is carried out. For example, the solvent may be, for example, a guanamine solvent or a guanidine solvent.
根據本揭露實施例,R6可獨立為氫、甲基(methyl)、乙基(ethyl)、丙基(propyl)、異丙基(isopropyl)、正丁基(n-butyl)、叔丁基(t-butyl)、仲丁基(sec-butyl)、異丁基(isobutyl)、戊基(pentyl)、或己基(hexyl)。 According to an embodiment of the present disclosure, R 6 may independently be hydrogen, methyl, ethyl, propyl, isopropyl, n-butyl, tert-butyl. (t-butyl), sec-butyl, isobutyl, pentyl, or hexyl.
根據本揭露實施例,當具有式(VII)所示結構重複單元之聚合物之X為-S-時(即該式(VII)所示結構重複單元為 ,其中Ar2、R1、以及R3的定義與上述相同),在製備具有式(VII)所示結構重複單元之聚合物後,該聚合物的製備方法可更包含:將具有式(VII)所示結構重複單元之聚合物與過氧化氫反應,得到具有式(XI)所示結構重複單元之聚合物。或者,將具有式(VII)所示結構重複單元之聚合物在式(IX)所示的化合物存在下與過氧化氫反應,得到具有式(XI)所示結構重複單元之聚合物。 According to an embodiment of the present disclosure, when the polymer of the polymer having the structural repeating unit represented by the formula (VII) is -S- (that is, the structural repeating unit represented by the formula (VII) is , wherein Ar 2 , R 1 , and R 3 have the same meanings as defined above), after preparing the polymer having the structural repeating unit of the formula (VII), the method for preparing the polymer may further comprise: having the formula (VII) The polymer of the structural repeat unit shown is reacted with hydrogen peroxide to obtain a polymer having a repeating unit of the structure represented by the formula (XI). Alternatively, a polymer having a structural repeating unit represented by the formula (VII) is reacted with hydrogen peroxide in the presence of a compound represented by the formula (IX) to obtain a polymer having a structural repeating unit represented by the formula (XI).
根據本揭露其他實施例,本揭露具有式(XI)所示結構重複單元之聚合物的製備方法,可將具有式(VII)所示結構重複單元之聚合物與過氧化氫反應先與一溶劑混合,再進行反應。舉例來說,該溶劑可例如為腈類、醯胺類或碸類溶劑。此外,該具有式(VII)所示結構重複單元之聚合物可在式(IX)所示的化合物與過氧化氫反應先與一溶劑混合,再進行反應。 According to other embodiments of the present disclosure, the present invention discloses a method for preparing a polymer having a repeating unit of the structure represented by the formula (XI), which can react a polymer having a repeating unit of the formula (VII) with hydrogen peroxide with a solvent. Mix and react again. For example, the solvent can be, for example, a nitrile, a guanamine or an anthraquinone solvent. Further, the polymer having a repeating unit of the structure represented by the formula (VII) can be reacted with a solvent by reacting a compound represented by the formula (IX) with hydrogen peroxide.
根據本揭露實施例,在製備具有式(XI)所示結構重複單元之聚合物後,該聚合物的製備方法可更包含:將一親核試劑與該具有式(XI)所示結構重複單元之聚合物反應,得到具有式(XII)所示結構重複單元之聚合物
根據本揭露實施例,該親核試劑(nucleophile)可為具有取代/非取代基的吡啶或其衍生物(例如:吡啶、4-甲基吡啶)、胺類(如:三乙胺)、鹵化鹽類(例如:氯化鉀)、醇類(例如:甲醇、乙醇)、醯胺類(例如:二甲基甲醯胺、二甲基乙醯胺、N-甲基吡咯酮)、或上述之組合。該親核試劑與具有式(XI)所示結構重複單元之聚合物之基團的當量數比可為1至10。根據本揭露實施例,該親核試劑與該具有式(VII)所示結構重複單元之聚合物可視需要先溶解於一有機溶劑中,再進行反應。 According to an embodiment of the present disclosure, the nucleophile may be a substituted/unsubstituted pyridine or a derivative thereof (eg, pyridine, 4-methylpyridine), an amine (eg, triethylamine), halogenated. Salts (eg potassium chloride), alcohols (eg methanol, ethanol), guanamines (eg dimethylformamide, dimethylacetamide, N-methylpyrrolidone), or The combination. The nucleophile and the polymer having the repeating unit of the structure represented by the formula (XI) The equivalent ratio of the groups may be from 1 to 10. According to the embodiment of the present disclosure, the nucleophilic reagent and the polymer having the structural repeating unit represented by the formula (VII) may be dissolved in an organic solvent as needed, and then reacted.
為了讓本揭露之上述和其他目的、特徵、和優點能更明顯易懂,下文特舉數實施例及比較實施例,作詳細說明如下: The above and other objects, features and advantages of the present invention will become more apparent and understood.
實施例1: Example 1:
取5克之二苯醚(diphenyl ether)、11.7克之苯磺酸(benzenesulfonic acid)與50毫升之二氯甲烷(dichloromethane),在氮氣下加入一反應瓶中,並降溫至15℃。接著,緩慢加入5.54克之二甲基二硫(1,2-dimethyldisulfane)於該反應瓶中。在15℃下反應20小時後,
將產物倒入50毫升氫氧化鈉水溶液(氫氧化鈉與水的重量比為1:10)中。攪拌0.5小時後,以二氯甲烷與及去離子水進行萃取三次。取有機層抽乾及除水後,得到化合物(1)。上述反應之反應式如下所示:
利用核磁共振光譜分析化合物(1),所得之光譜資訊如下:1H NMR(400MHz,ppm,CDCl3):2.50(-CH3,3H,s),7.00(phenyl,4H,m),7.14(phenyl,1H,t),7.32-7.41(phenyl,4H,m)。 The compound (1) was analyzed by nuclear magnetic resonance spectroscopy, and the obtained spectral information was as follows: 1 H NMR (400 MHz, ppm, CDCl 3 ): 2.50 (-CH 3 , 3H, s), 7.00 (phenyl, 4H, m), 7.14 ( Phenyl, 1H, t), 7.32-7.41 (phenyl, 4H, m).
實施例2: Example 2:
將0.73克之化合物(1)、12毫升硝酸水溶液(濃度為20%)、及4毫升的氰基甲烷(acetonitrile)加入一反應瓶中。在室溫下攪拌4小時後,將10毫升的氫氧化鈉水溶液(濃度為3%)加入反應瓶中。接著,在反應完全後,將所得物抽乾及除水,得到化合物(2)(橘色粉末)。上述反應之反應式如下所示:
利用核磁共振光譜分析化合物(2),所得之光譜資訊如下:1H NMR(400MHz,ppm,CD3CO):2.71(-CH3,3H,s),7.10-7.25(phenyl,5H,m),7.44-7.48(phenyl,2H,t),7.70-7.72(phenyl,2H,d)。 The compound (2) was analyzed by nuclear magnetic resonance spectroscopy, and the obtained spectral information was as follows: 1 H NMR (400 MHz, ppm, CD 3 CO): 2.71 (-CH 3 , 3H, s), 7.10-7.25 (phenyl, 5H, m) , 7.44 - 7.48 (phenyl, 2H, t), 7.70 - 7.72 (phenyl, 2H, d).
實施例3: Example 3:
取0.65克之化合物(2)置於一反應瓶中。接著,在冰浴下將3毫升的甲基磺酸(CH3SO3H)加入反應瓶中。反應1小時後,將反應瓶昇溫至室溫,並在室溫下繼續反應20小時,得到包含聚合物(1)的溶
液。接著,將包含聚合物(1)的溶液滴入100毫升的乙醚(ethyl ether)中並攪拌30分鐘。接著,在氮氣環境下加入6毫升的4-甲基吡啶(4-methylpyridine)並在100℃下攪拌4-6小時。反應結束後,將產物滴入100毫升的鹽酸水溶液中(濃度為10%),並攪拌10分鐘。過濾抽乾後,得到聚合物(2)。上述反應之反應式如下所示:
利用核磁共振光譜分析聚合物(2),所得之光譜資訊如下:1H NMR(400MHz,ppm,(CD3)SO):7.04(phenyl,d),7.36(phenyl,d)。 The polymer (2) was analyzed by nuclear magnetic resonance spectroscopy, and the obtained spectral information was as follows: 1 H NMR (400 MHz, ppm, (CD 3 ) SO): 7.04 (phenyl, d), 7.36 (phenyl, d).
實施例4: Example 4:
將0.2克之的聚合物(2)、10毫升的醋酸、0.9克之雙氧水水溶液(濃度為30%)及2毫升二甲基乙醯胺(dimethylacetamide、DMAc)加入一反應瓶中,並在80℃下攪拌6小時。接著,將產物過濾抽乾後,得到聚合物(3)。上述反應之反應式如下所示:
利用核磁共振光譜分析聚合物(3),所得之光譜資訊如下:1H NMR(400MHz,ppm,(CD3)SO):7.28(phenyl,d),7.99(phenyl,d)。接著,以紅外線光譜儀(FT-IR)量測聚合物(3),結果如下:1483-1(苯 環振動訊號)、1575cm-1(苯環振動訊號)、1295cm-1(S=O不對稱振動)、1318cm-1(S=O不對稱振動)、1145cm-1(S=O對稱振動訊號)。使用示差掃描量熱儀(differential scanning calorimetry、DSC)量測所得聚合物(3),得知其玻璃轉換溫度(Tg)達210℃。經由膠透層析儀(Gel Permeation Chromatography;GPC)分析,聚合物的(3)的重量平均分子量(Mw)約為128,287、數目平均分子量(Mn)約為85435、以及分子量分佈值(PDI)為1.50。 The polymer (3) was analyzed by nuclear magnetic resonance spectroscopy, and the obtained spectral information was as follows: 1H NMR (400 MHz, ppm, (CD3)SO): 7.28 (phenyl, d), 7.99 (phenyl, d). Subsequently, the infrared spectroscopy (FT-IR) measurement of the polymer (3), the following results: 1483-1 (vibration signal benzene ring), 1575 cm-1 (vibration signal benzene ring), 1295cm -1 (S = O asymmetric Vibration), 1318 cm -1 (S = O asymmetric vibration), 1145 cm -1 (S = O symmetric vibration signal). The obtained polymer (3) was measured by differential scanning calorimetry (DSC), and its glass transition temperature (Tg) was found to be 210 °C. The polymer (3) has a weight average molecular weight (Mw) of about 128,287, a number average molecular weight (Mn) of about 85,435, and a molecular weight distribution value (PDI) of, by gel permeation chromatography (GPC) analysis. 1.50.
實施例5:取5.58g之二苯硫醚與5.64g之二甲基二硫置於反應瓶中,加入50ml二氯甲烷作為溶劑,再緩慢滴入11.7g苯磺酸,在15℃下反應44hr,利用150ml正己烷與去離子水進行3次萃取,利用管柱層析法純化後得到產物為0.76g,產率:10.9%;利用核磁共振光譜分析產物,所得之光譜資訊如下:1H NMR(400MHz,ppm,CDCl3):2.50(-CH3,3H,s),7.21-7.34(phenyl,9H,m)。 Example 5: 5.58 g of diphenyl sulfide and 5.64 g of dimethyl disulfide were placed in a reaction flask, 50 ml of dichloromethane was added as a solvent, and 11.7 g of benzenesulfonic acid was slowly added dropwise thereto, and the reaction was carried out at 15 ° C. After 44 hr, extraction with 150 ml of n-hexane and deionized water for 3 times, and purification by column chromatography to obtain a product of 0.76 g, yield: 10.9%; the product was analyzed by nuclear magnetic resonance spectroscopy, and the obtained spectral information was as follows: 1 H NMR (400MHz, ppm, CDCl 3 ): 2.50 (-CH 3, 3H, s), 7.21-7.34 (phenyl, 9H, m).
實施例6:取5.07g之甲硫基(對-二苯硫醚)置於反應瓶中,加入20ml乙腈作為溶劑,再緩慢滴入60ml 20%硝酸,在室溫下反應4hr,反應結束加入12g氫氧化鈉中和反應溶液,隨後利用150ml二氯甲烷對產物溶液進行3次萃取,得到產物為5.15g,產率:95%;利用核磁共振光譜分析產物,所得之光譜資訊如下:1H NMR(400MHz,ppm,CDCl3):2.73(-CH3,3H,s),7.34-7.49(phenyl,9H,m)。 Example 6: 5.07 g of methylthio (p-diphenyl sulfide) was placed in a reaction flask, 20 ml of acetonitrile was added as a solvent, and 60 ml of 20% nitric acid was slowly added dropwise thereto, and reacted at room temperature for 4 hr, and the reaction was completed. The reaction solution was neutralized with 12 g of sodium hydroxide, and then the product solution was subjected to extraction three times with 150 ml of dichloromethane to obtain a product of 5.15 g, yield: 95%; the product was analyzed by nuclear magnetic resonance spectroscopy, and the obtained spectral information was as follows: 1 H NMR (400MHz, ppm, CDCl 3 ): 2.73 (-CH 3, 3H, s), 7.34-7.49 (phenyl, 9H, m).
實施例7:取3g甲基(對-二苯硫醚基)亞碸,置於反應瓶中,在15℃下緩慢加入10ml甲基磺酸,持續反應20hr,反應結束後利用50ml去離子水進行再沉澱,可得到白色固體;將此固體溶於46ml氯仿與46ml三氟醋酸混和溶劑中,緩慢滴入4.14g 30%雙氧水,在60℃持續反應5hr,反應結束後將產物倒入5%食鹽水或去離子水中再沉澱,可得到白色固體產物2.91g,產率:97%;利用核磁共振光譜分析產物,所得之光譜資訊如下:1H NMR(400MHz,ppm,d6-DMSO):7.56(Phenyl,4H,s),7.93(phenyl,4H,s);使用示差掃描量熱儀(differential scanning calorimetry、DSC)量測所得產物,得知其玻璃轉換溫度(Tg)達222℃。 Example 7: 3 g of methyl (p-diphenyl sulfide) hydrazine was taken, placed in a reaction flask, and 10 ml of methanesulfonic acid was slowly added at 15 ° C for 20 hr. After the reaction, 50 ml of deionized water was used. Reprecipitation was carried out to obtain a white solid; this solid was dissolved in 46 ml of chloroform and 46 ml of trifluoroacetic acid. The mixture was slowly added dropwise to 4.14 g of 30% hydrogen peroxide, and the reaction was continued at 60 ° C for 5 hr. After the reaction was over, the product was poured into 5%. Reprecipitation in brine or deionized water gave 2.91 g of the product as a white solid, yield: 97%. The product was analyzed by NMR spectroscopy. The obtained spectral information is as follows: 1 H NMR (400 MHz, ppm, d 6 -DMSO): 7.56 (Phenyl, 4H, s), 7.93 (phenyl, 4H, s); the obtained product was measured by differential scanning calorimetry (DSC), and its glass transition temperature (Tg) was found to be 222 °C.
基於上述,本揭露實施例提供一種化合物的製備方法,該化合物製備方法所使用的反應起始物或是催化劑皆不含鹵素,除了可避免產生含鹵副產物,還可避免殘留含鹵化合物於所得化合物中。因此,本揭露所述化合物的製備方法無需使用額外步驟來去除含鹵副產物或殘留的鹵化合物,可降低生產成本並增加製程產率,得到可用於後續聚合製程的無鹵單體。此外,本揭露實施例亦提供一種聚合物(例如聚醚碸(polyether sulfone、PES)或聚硫醚碸(polythioether sulfone、PTES))的製備方法,係在酸性環境下對反應單體進行親電聚 合反應,並搭配聚合後氧化技術,可大幅提昇所得聚合物的分子量,且所得之聚合物具有較低的分子量分佈值(polydispersity index、PDI)。 Based on the above, the present disclosure provides a method for preparing a compound. The reaction starting material or the catalyst used in the preparation method of the compound does not contain halogen, except that halogen-containing by-products are avoided, and residual halogen-containing compounds can be avoided. Among the obtained compounds. Therefore, the method for preparing the compound of the present disclosure does not require an additional step to remove the halogen-containing by-product or the residual halogen compound, which can reduce the production cost and increase the process yield, and obtain a halogen-free monomer which can be used in the subsequent polymerization process. In addition, the present disclosure also provides a method for preparing a polymer (for example, polyether sulfone (PES) or polythioether sulfone (PTES)), which is electrophilic to a reactive monomer in an acidic environment. Gather The combined reaction and the post-polymerization oxidation technique can greatly increase the molecular weight of the obtained polymer, and the obtained polymer has a lower molecular weight distribution value (PDI).
雖然本揭露已以數個實施例揭露如上,然其並非用以限定本揭露,任何本技術領域中具有通常知識者,在不脫離本揭露之精神和範圍內,當可作任意之更動與潤飾,因此本揭露之保護範圍當視後附之申請專利範圍所界定者為準。 The present disclosure has been disclosed in the above several embodiments, but it is not intended to limit the disclosure, and any one skilled in the art can make any changes and refinements without departing from the spirit and scope of the disclosure. Therefore, the scope of protection of this disclosure is subject to the definition of the scope of the patent application.
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CN101033294A (en) | 2007-04-04 | 2007-09-12 | 同济大学 | Method of synthesizing poly-pyrrole nano partical by diphenylamine sulfonic acid copolymerization method |
CN101774953A (en) | 2010-01-21 | 2010-07-14 | 青岛科技大学 | Preparation method for substituted diphenyl sulfide |
CN102516139A (en) | 2011-11-02 | 2012-06-27 | 浙江工业大学 | Synthesis method of phenyl sulfide compound |
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CN101033294A (en) | 2007-04-04 | 2007-09-12 | 同济大学 | Method of synthesizing poly-pyrrole nano partical by diphenylamine sulfonic acid copolymerization method |
CN101774953A (en) | 2010-01-21 | 2010-07-14 | 青岛科技大学 | Preparation method for substituted diphenyl sulfide |
CN102516139A (en) | 2011-11-02 | 2012-06-27 | 浙江工业大学 | Synthesis method of phenyl sulfide compound |
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