TWI652223B - Apparatus and method for producing a nanostructure composed of carbon - Google Patents

Abstract

The present invention relates to a device for manufacturing a nanostructure made of carbon, such as a single layer, a multilayer sheet structure, a small tube, or a fiber. The device has an air inlet element (2), which is A shell wall (3, 3 ', 3 ") encloses a shell cavity (5), and an air supply pipe (6) leads into the shell cavity (5), a gaseous, especially carbon The starting material can be fed into the housing cavity (5) through the air supply pipe (6), and the device has a component (8, 9, 10) at least partially disposed in the housing cavity (5). ) A plasma generator having at least one plasma electrode (9) to which a voltage can be applied to apply energy to the gaseous starting material by igniting a plasma and thereby convert it into a Gaseous intermediate product, and the device has an exhaust surface (4) having a plurality of exhaust ports (7), and the gaseous intermediate product can pass from the cavity (5) through the exhaust port (7) A gas heating unit (11) for assisting the conversion is provided downstream of the components (8, 9, 10).

Description

Device and method for manufacturing carbon nanostructure

The invention first relates to a device for manufacturing a nanostructure made of carbon, such as a single layer, a multilayer structure or a small tube or fiber. The device has an air inlet element which is enclosed by a shell wall A casing cavity, and a gas supply pipe leading into the casing cavity, for example, a gas mixture containing gaseous and carbon-containing starting materials can be transported into the casing cavity through the gas supply pipe, the device There is a plasma generator disposed in the cavity of the casing, the plasma generator has at least one plasma electrode capable of applying a voltage for converting a gaseous starting material into a gaseous state by applying energy. Intermediate products, and the device has an exhaust surface with a large number of exhaust ports (7), and the gaseous intermediate products can be discharged from the cavity of the housing through the exhaust ports (7).

In addition, the present invention relates to a method for manufacturing a nanostructure made of carbon using the device.

Carbon can be deposited in different crystal structures. For example, in the form of a diamond structure, as a single layer, a multilayer structure (multilayer sheet) (such as graphene), as a small tube (such as "carbon nanotube") or as fullerene or as a fiber. A CVD (Chemical Vapor Deposition) device is used to deposit such a carbon structure, especially a nanostructure, which has a structure size from less than one nanometer to several hundred nanometers in at least one dimension. Here, a carbon-containing starting material (e.g., methane or acetylene) is introduced into a CVD reaction with a carrier gas (e.g., argon or hydrogen). Processing chamber. It is known to activate or dissociate the introduced carbon-containing starting material thermally or by means of a plasma. For example, US 8,398,927 B2 describes a plasma enhanced CVD (PE-CVD), and US 2006/0185595 A1 describes a hot-wire CVD (HF-CVD). In the case of PE-CVD, the plasma is ignited inside the gas inlet element. For this purpose, the device has a plasma electrode which can be applied with a voltage. As a result, free radicals are generated, which can enter the processing chamber via the exhaust port of the air-intake element, where they are deposited on a substrate arranged on the heating element with the formation of a nanostructure. In the case of HF-CVD, a hot wire is used to heat the carbon-containing starting material inside or outside the air intake element. In the case of HF-CVD, it is also possible to ignite the plasma directly above the substrate and use the plasma to generate free radicals. However, igniting the plasma directly above the substrate has disadvantages because high-energy ions are formed in the plasma, and these high-energy ions have an etching effect on the substrate.

Also known from US 6,499,425 or US 6,161,499 are devices using plasma to deposit carbon-containing structures.

The present invention is based on the objective of improving a known device or method in order to improve the manufacture of a nanostructure made of carbon.

This goal is achieved by the invention specified in the technical solution. According to the invention, the plasma is ignited inside the air intake element. In addition, a gas heating device is used for binding or dissociating a gaseous starting material. To a certain extent, the advantages of HF-CVD and PE-CVD are used in order to combine plasma dissociation of gaseous starting materials and thermal activation / reaction or heat treatment of gases to form reaction products in the gas phase. The use of carbon-containing starting materials preferably results in the formation of polymeric and / or aromatic components. In particular, polymerized and / or aromatic free radicals are formed. It is preferred that the plasma generator has a grounded protective electrode, which can be used to neutralize or capture ions formed during the dissociation process. The use of a guard electrode also causes a reduction in the energy of the ions. The air intake element according to the invention or the gas distributor used according to the invention is preferably implemented as a "shower head". Attributed to the use of both plasma and heat transfer to generate free radicals. Which enables It is produced by a plurality of grid-shaped plates, in which a plasma electrode to which a voltage can be applied and a protective electrode arranged upstream and / or downstream of the plasma electrode are formed into a plate having a plurality of holes. The holes of the plates can be arranged offset from one another, resulting in an improved gas mixture. The gas heating device is also formed by a grid-shaped structure, but it has two electrodes for guiding a current heated by the plate through the plate. However, the gas heating device may also be formed in a round shape, however, it may be formed as a coil and have two or more electrodes so that the heating element can be heated using an electric current. All the plates are arranged transversely to the flow direction of the gas and preferably extend over the entire cross section of the air intake element. The gas heating device is especially a flat object arranged transversely to the flow direction. The gas heating device can be arranged inside the intake element, in the area of the exhaust surface or directly downstream of the exhaust surface. The extending direction of the gas heating device is transverse to the flow direction of the air flow. The plate has uniformly arranged holes. The holes may have a rectangular, circular or elongated cross section. The gas heating device can heat the gas passing therethrough, so that the temperature of the gas is increased.

In a first variant, the plasma electrode can form a heating element at the same time. In this case, it is not only possible to apply a high voltage to the plasma electrode to generate a plasma. It is also possible to direct an electric current through the board, which heats the board so that using the heated board not only makes the plasma, but also heats the gas. Therefore, plasma activation and thermal activation occur at the same location.

In a second variation of the present invention, the plasma electrode and the heating unit are spatially separated. The heating unit may be arranged downstream of the plasma generator. The plates forming the electrodes can be made of metal, especially highly reflective metal. The wall plate of the exhaust surface facing the cavity of the housing may also be formed as heat reflecting. A pre-applied plasma electrode can be placed between two grounded protective electrodes. In this way, the outer region of the housing cavity can be protected from ion bombardment.

In a third variant, the gas heating device is located directly downstream of the exhaust surface. A plate with a hole is located downstream of the gas heating device and is made of an insulating material. The exhaust surface and the side wall of the air intake element are made of a conductive material and are grounded like two shield plates arranged downstream of the plasma electrode inside the air intake element. An orifice plate made of an insulating material may be located between the grounded protective electrodes disposed upstream of the plasma electrode.

In a fourth variant of the invention, the air inlet element is formed by a conductive hollow body. The hollow body has a cylindrical shape and a circular planar outline. The upper end surface of the cylinder is lined with an insulating plate on its inner side. The insulating plate can also form the cover of the air intake element more or less. The insulating plate carries a plasma electrode on its inner side, to which an AC voltage or a DC voltage (especially, a high voltage) can be applied. In this exemplary embodiment, gas does not flow through the plasma electrode. Two plates, which are parallel to each other and extend parallel to the end wall of the air intake element, are made of a conductive material and have an exhaust port, and are located inside the cavity of the housing of the air intake element. The plate is fastened to the cover plate of the air intake element using a holding rod and grounded via the holding rod. In this case, the holding rod passes through the plasma electrode and engages with a hole in the insulator abutting the plasma electrode. The gas heating unit is located here outside the air intake element. The heating unit is formed by a flat metal slat structured in a plane extending parallel to the plane of the gas outlet. The metal slats can extend in a round shape. However, it can also spirally extend around the center of the disc-shaped heating plate. In this exemplary embodiment, the cover plate of the processing chamber is formed of an insulating plate having a vent. This plate also has a disc shape. The plate is located directly downstream of the gas heating surface. The plate is made of insulating material. The base is located under the plate, and the base can be heated by a heating unit or cooled by a cooling unit. The substrate is located on a temperature-adjustable base.

The gas inlet element according to the present invention is part of a CVD reactor, which has a gas-tight reactor housing, and the gas inlet element is located in the reactor housing. The air intake element has an exhaust surface on its lower side, and the exhaust surface has a plurality of exhaust ports so that the air intake element has a shower head shape. Gas distribution using air intake elements. The processing chamber is located below the air intake element, and the bottom of the processing chamber is implemented by a heatable base. At least one substrate is located on the base, and the substrate may be composed of glass. Carbon nanostructures, such as graphene or "carbon nanotubes", are deposited on a substrate. The substrate may also be a wafer or a thin film. It can also be made of glass, quartz, metal, ceramic or polymer and silicon.

To perform the method, a gas mixture is fed into the air intake element via a gas supply pipe. The gas mixture may be a carrier gas, such as hydrogen or argon. In addition, The element is fed into a carbon support, such as methane or acetylene. The gaseous starting material is chemically converted in the reaction chamber of the intake element. In particular, conversion of the carbon-containing starting material occurs. This is performed, for example, by applying heat to methane or by plasma. In this case, intermediate products such as atomic or ionized free radicals are produced. In this case, these may be aromatic or polymeric intermediates. These carbon atom-containing intermediate products are introduced through the exhaust port into the processing chamber using a carrier gas, which is deposited on the substrate at the processing chamber. To this end, the substrate is heated to a temperature between 300 ° C and 1200 ° C. The gas feed of the carbon-containing starting material can occur in pulses. However, it can also be provided that a carbon-containing starting material is continuously fed into the air intake element. Plasma can be generated continuously by AC voltage or by DC voltage. However, it is also possible to ignite the plasma only in pulses. To generate a plasma, the plasma electrode is placed at a voltage between 300V and 1500V. If the plasma electrode is a heating element at the same time, the heating voltage has a correspondingly high potential, because the plasma power source and the heating power source are connected to each other. It is also possible to use a plasma generator and a gas heating unit to generate clean gas. A cleaning step is performed before or after the coating step, during which a neutral gas is converted into a clean free radical, for example, inside the air intake element. Using these clean free radicals, particles accumulated in the processing chamber or in the housing cavity of the air intake element can be removed. A typical method may have one of the following processing steps: a) an oxidation step in which oxygen atoms or ions are formed using the air-intake element according to the present invention to oxidize a substrate or a layer deposited on the substrate; b) a reduction step, Wherein a reducing agent such as hydrogen or ammonia is converted into atoms, ions or radicals for reducing a substrate or a layer deposited on the substrate; c) a growth step in which a gas mixture (which contains a carbon-containing component such as methane, Ethylene or acetylene) is converted into atomic, ionic, aromatic free radicals or polymerized free radicals to deposit carbon nanomaterials; d) a post-treatment step in which a reduced or doped gas is used.

1‧‧‧reactor housing

2‧‧‧Air intake element / shower head

3‧‧‧ siding

3'‧‧‧ siding

3 "‧‧‧Siding

4‧‧‧ exhaust surface

5‧‧‧shell cavity

6‧‧‧ air supply pipe

7‧‧‧ exhaust port

8‧‧‧Board / Protective electrode / Cover plate / Insulation plate

8'‧‧‧hole

9‧‧‧ Plasma electrode / plate

10‧‧‧plate / protective electrode / metal plate

10'‧‧‧through hole

11‧‧‧Heating element / plate / shape / coil / gas heating unit

12‧‧‧Contact

13‧‧‧Contact

14‧‧‧High-voltage power supply / plasma voltage source

15‧‧‧Heating voltage source / Heating current source

16‧‧‧ substrate

17‧‧‧ base

18‧‧‧ Insulation board

19‧‧‧Metal sheet / plate

19'‧‧‧through hole

20‧‧‧Conductive rod / retaining rod

21‧‧‧Conductive rod / retaining rod

22‧‧‧ holding rod

23‧‧‧Insulation board / plate

23'‧‧‧hole

24‧‧‧ holding rod

Exemplary embodiments of the present invention are explained below based on the drawings. In the picture: FIG. 1 shows a diagrammatic illustration of a CVD reactor according to a first exemplary embodiment, FIG. 2 shows a diagrammatic illustration of a CVD reactor according to a second exemplary embodiment, and FIG. 3 shows a third exemplary embodiment of the present invention, and FIG. 4 shows a fourth exemplary embodiment of the present invention.

The CVD reactors illustrated in the drawings each have an airtight reactor housing 1. A susceptor 17 is located inside the reactor housing 1, and the susceptor can be heated to a processing temperature between 300 ° C and 1200 ° C. The substrate 16 is located on the upper and upper side of the base 17, and a carbon nanostructure in the form of graphene or carbon nanotubes will be deposited on the upper and upper side of the substrate 17, or a single layer of graphene or graphene will also be deposited. Multiple sheets or fibers.

The exhaust surface 4 of the air intake element 2 is above the base and extends at a distance from the base. The exhaust surface 4 has a plurality of exhaust ports 7 arranged in a grid network. The air intake element 2 has a design similar to a shower head, so that the air intake element 2 is also called a shower head.

The air supply pipe 6 opens into the air intake element 2. If a plurality of mutually different processing gases are fed into the air intake element 2, a plurality of gas supply pipes may also exist. A process gas is provided in a gas mixing system (not shown).

The air inlet element 2 is completely enclosed by the wall plates 3, 3 ', 3 ". The housing cavity 5 is located in the wall plates 3, 3', 3", 4 of the air inlet element 2, which represents the reaction chamber The body reacts before a gas occurs within it, during which, for example, a carbon-containing gas is dissociated and an aromatic or polymeric intermediate is formed. Specifically, the intermediate product is a free radical. It is transported to the substrate 16 by means of a carrier gas via an exhaust port 7 where it is deposited while forming a nanostructure made of carbon, in particular a graphene layer or a small tube.

A plurality of plates 8, 9, 10, 11 extending parallel to each other and parallel to the exhaust surface 4 are located inside the housing cavity 5 of the air intake element 2. These plates extend over the entire cross section of the housing cavity 5 and have a plurality of uniformly arranged holes. In order to improve the gas mixing, the holes are different from each other and adjacent plates are arranged offset from each other.

The plate 9 is insulated from the casing of the air intake element 2 and a high-voltage AC current or a DC current is applied by a high-voltage power source 14 so that a plasma can be formed inside the casing cavity 5. The plasma electrode 9 is located between two protective electrodes 8 and 10 which are respectively grounded.

A heating element 11 is provided. The heating element 11 has two contacts 12, 13 which are connected to a heating voltage source 15 so that a current can flow through the heating element 11 and the current heats the heating element 11 due to its resistance. The inner wall of the plate 8 or 10 and the exhaust surface 4 directly adjacent to the heating element 11 may be implemented as heat-reflective.

In the exemplary embodiment illustrated in FIG. 1, the heating element is formed by the plasma electrode 9 itself. The heating current source 15 is connected in series with the plasma voltage source 14 so that the current for heating the plasma electrode 9 can flow through the plasma electrode 9 having the terminal electrodes 12 and 13.

In the exemplary embodiment illustrated in FIG. 2, the plasma electrode 9 and the heating element 11 are spatially separated from each other. Here, the heating element 11 is located between the lower protective electrode 10 and an exhaust surface 4 extending parallel to the protective electrode 10 and formed by the lower wall of the air intake element 2. Here, the current source 15 is also separated from the voltage source 14.

In the exemplary embodiment illustrated in FIG. 1, the guard electrodes 8, 10 are used as reflectors for the heat emitted from the heating element 11, while in the exemplary embodiment illustrated in FIG. 2, the guard electrode 10 and the air intake The lower wall of element 2 is used as a reflector.

The heating element 11 may be a plate, or may be a round-shaped element or a coil, specifically, a flat coil.

The third exemplary embodiment shown in FIG. 3 has a reactor housing 1 which may have a cylindrical shape with a circular footprint. A base 17 is located inside the reactor housing 1, which base may have a heating device or a cooling unit.

The substrate 16 to be coated is located on the base 17.

The plate 23 having an exhaust port and made of an insulating material extends over the base 17 at a vertical distance over the entire plane of the base 17. A metal, flat, spiral, or meandering slat extends at a small distance above the plate 23, the slat making contact at its ends Pieces 12,13. The slat forms a heating element 11 extending on a cylindrical surface, which heating element can be powered by a heating voltage source 15.

Above the heating element 11 extending parallel to the plate 23, the exhaust surface 4 of the air intake element 2 extends in a parallel layer. The exhaust surface 4 has a plurality of exhaust ports 7. The housing of the air intake element 2 is made of metal and is grounded.

Directly above the exhaust opening 7, that is, in the housing cavity 5 of the air intake element 2, two grounded metal plates 10, 19 extend parallel to the exhaust surface 4. A plasma electrode 9 extends upstream of the pair of protective plates 10 and 19, and the plasma electrode is powered by a high-voltage power source 14 for forming a plasma in the cavity 5 of the housing of the air intake element 2.

The plasma electrode 9 extends over the entire cross-section of the cavity 5 of the casing, and another insulating plate 18 with a gas through hole is located upstream of the plasma electrode. Another metal ground plate also having a through hole is located upstream of the edge plate 18.

The gas stream containing the processing gas introduced through the gas supply pipe 6 enters the housing cavity 5 and passes through the holes of the plates 8, 18, 9, 10, 19 disposed in the housing cavity 5 and passes through the exhaust port 7 It is discharged from the air intake element 2. A plasma electrode 9 provided in the cavity 5 of the housing is used to generate a plasma. This plasma is spatially limited to the area between the ground plates 8 and 10, and the plasma electrode 9 is located between the two ground electrodes 8, 10, of which the insulating plate 18 made of an insulating material is located at the plasma electrode Between the ground protection plate 8 above the plasma electrode 9. Use this plasma to perform physical decomposition, or at least ionize the process gas. The processing gas dissociated or excited in this manner flows out of the exhaust surface 4 from the exhaust port 7 and is thermally activated as it passes through the gap between the heated planar pieces of the heating element 11. The starting material thermally activated in this way passes through the exhaust port of the insulating plate 23 and enters the processing chamber, which is located between the insulating plate 23 and the base 17.

In the fourth exemplary embodiment illustrated in FIG. 4, the air intake element 2 is also composed of a metal hollow body having an exhaust port 7 on its end side. The two protective electrodes 10, 19 spaced from each other and made of metal are also located inside the housing cavity 5. These protective electrodes are fastened to a conductive and grounded cover plate 8 using conductive rods 20,21.

A plate 18 made of an insulating material extends below the cover plate 8. The plate 18 is in contact with it on the cover plate 8.

The planar plasma electrode 9 to which the voltage source can apply a voltage is in contact with it on the insulating plate 18. The plasma electrode 9 and the insulating plate 18 have holes, and the holding rod 21 passes through the holes. These holes are not shown in FIG. 4.

In this exemplary embodiment, the gas heating device is disposed outside the air intake element 2. The gas heating device is composed of a thin metal plate having a slit extending in a round shape or a spiral shape. In this way, a thin metal slat is produced, which is fastened to the end contacts 12, 13 at its ends. The end contacts 12 and 13 may be located at the ends of the holding rods 24, and the heating elements 11 are held below the exhaust port 7 by a small distance using these holding rods. The power supply of the heating element 11 is performed via the holding rod 24. The holding rod 24 can be surrounded by insulation (not shown) and penetrates the plate 8 in an insulated form, so that current can be guided through the holding rod 24 from the outside.

A plate 23 in the form of a disk made of an insulating material and also fixed using a holding rod extends between the surface of the base 17 and the heating element 11. The insulating plate 23 has holes 23 ′ through which dissociated or thermally excited processing gas can flow in a direction toward the substrate 16 on the base 17.

The introduction of the processing gas into the housing cavity 5 of the air intake element 2 is also performed here via the gas supply pipe 6. A plasma is formed between the grounded plates 10, 19 and the plasma electrodes 9 insulated therefrom. The ionized or dissociated starting material is discharged from the exhaust port 7 and enters the thermal excitation zone where the heating element 11 is located. The thermally excited region is bounded by the insulating plate 23 in the direction toward the base 17, and the thermally activated starting material is discharged in the direction toward the substrate 16 through the hole 23 ′ of the insulating plate. In this exemplary embodiment, the plasma electrode 9 also has at least one hole through which the processing gas can pass.

The above description is used to explain the invention included in the present application as a whole. The present invention independently improves the prior art by at least the following feature combinations, as follows: A device characterized by a gas heating unit 11 for assisting conversion, which gas heating unit is arranged downstream of the components 8, 9, 10.

A device, characterized in that an air inlet element 2 is arranged in a processing chamber of a CVD reactor 1, the CVD reactor having a heatable base 17 which is a carrier for accommodating one or more substrates 16 Wherein, the base 17 is associated with the bottom of the processing chamber, and the exhaust surface 4 is associated with the cover plate of the processing chamber, the processing chamber is formed so that the gaseous intermediate products discharged from the exhaust surface 4 pass through Transported to at least one substrate 16 on which nanostructures are deposited.

A device is characterized in that the plasma electrode 9 has the form of a grid or a plate, which is arranged in the flow path of the gaseous starting material or on the wall plate 3 above the air inlet element 2.

A device characterized by one or more guard electrodes 10, 19 or plates 10, 19 having through holes 10 ', 19' in the form of a grid arranged in a flow path of a gaseous starting material, wherein At least one guard electrode 8 is disposed upstream of the plasma electrode 9 and / or at least one guard electrode 10, 19 is disposed downstream of the plasma electrode 9.

A device characterized in that the gas heating unit 11 has the shape of a plate, a grid, a meander or a coil, and the heating unit is arranged in detail in a flow path of a gaseous starting material, which is transverse to a plane extending through the flow Wherein, the gas heating unit 11 has terminal electrodes 12 and 13 for guiding a current through the gas heating unit 11.

A device, characterized in that the protective electrodes 8, 10, the plasma electrode 9, and / or the gas heating device 11 are formed of plates, each of which has a plurality of holes, and for the purpose of gas mixing, adjacent plates The holes are arranged offset from each other.

A device, characterized in that the inside of one or more plates forming the electrodes 8, 9, 10 and / or the wall plate of the air intake element 2 having the exhaust port 7 has a heat reflection property.

A device, characterized in that the gas heating unit 11 arranged in a plane is directly arranged behind the exhaust surface 4 in the flow direction of the gas, and / or the protective electrode 8 is directly opposite the substrate 16, wherein the protective electrode 8 With holes 8 'for gas passage.

The device according to one or more of the foregoing technical solutions, wherein the wall plate 3 above the air inlet element 2 is an insulating plate 18, and the plasma electrode 9 extends along the insulating plate 18.

A device, characterized in that two protective electrodes 10, 19 are spaced apart from each other and are disposed inside the cavity 5 of the housing, and the conductive electrodes 10, 19 are connected to the ground using conductive holding rods 20, 21 Electrode 8.

A method, characterized in that, together with a carrier gas, a mixture containing at least one oxidized or reduced or carbon-containing gaseous starting material or a cleaning gas is fed into the housing cavity 5 via a gas supply pipe 6, where Energy is applied to the gas mixture by both the plasma generators 8, 9, 10 and also by the gas heating device 11.

A method, characterized in that the gaseous starting material is simultaneously charged in the cavity of the housing by supplying heat generated by the heating unit 11 and by plasma generated by the plasma generators 8, 9, 10 Activation or dissociation such that atomic or ionized free radicals, gaseous polymers or aromatic intermediates are formed, in particular, in the form of free radicals.

A method, characterized in that the plasma is continuously and / or pulsed and / or the gaseous starting material is fed into the air-intake element 2 continuously or pulsed.

A method, characterized in that a cleaning step is performed before or after a method step of depositing a nanostructure made of carbon on a substrate 16 disposed in a processing chamber, and during the cleaning step, it is fed into a housing cavity The cleaning gas in 5 is activated by applying a plasma and / or by heating, wherein in detail, the cleaning step is performed periodically before or after the sedimentation step.

A method characterized by using elements (such as a guard electrode 10 and / or a grounded exhaust surface 4) that are particularly grounded and disposed downstream of the plasma electrode 9 and / or the heating unit 13 to capture the formation during the conversion reaction Of particles.

All the disclosed features are necessary (either individually or also in combination) with the present invention. In the disclosure of this application, the disclosure of the associated / subsidiary priority document (a copy of the previous application) is also incorporated herein in its entirety, in order to include the features of these documents in Purpose within the scope of patent application for this application. The subsidiary claim is characterized by an independent improvement on the features of the invention according to the prior art, and in particular, a divisional application is made based on the scope of these patent applications.

Claims (15)

A device for manufacturing a nanostructure made of carbon, such as a single-layer, multi-layer sheet structure, a small tube, or a fiber, the device having an air-intake element (2) having a housing wall The plate (3, 3 ', 3 ") encloses a shell cavity (5), an air supply pipe (6) leads into the shell cavity (5), and a gaseous carbon-containing starting material passes through The air supply pipe (6) can be fed into the housing cavity (5), and the device has a power supply having components (8, 9, 10) at least partially arranged in the housing cavity (5). A plasma generator having at least one plasma electrode (9) capable of applying a voltage, by applying energy to the gaseous starting material by igniting a plasma and thereby converting it into a gaseous intermediate Product, and the device has an exhaust surface (4) having a plurality of exhaust ports (7), the gaseous intermediate product can be discharged from the housing cavity (5) through the exhaust port (7), It is characterized by a gas heating unit (11) for assisting the conversion, the gas heating unit (11) is arranged downstream of the components (8, 9, 10), wherein the gas heating unit (11) is arranged in a plasma Electricity Downstream of the electrode (9) and the ground electrode (10, 19) and upstream of the opening (23 ') of an insulating plate (23), the insulating plate (23) is arranged on the exhaust surface (4) and a base Between seats (17). The device of claim 1, wherein the gas inlet element (2) is arranged in a processing chamber of a CVD reactor (1), the CVD reactor having the heatable base (17), the base (17) ) Is a carrier for accommodating one or more substrates (16), wherein the base (17) is associated with the bottom of a processing chamber, and the exhaust surface (4) is associated with a cover plate of the processing chamber The processing chamber is implemented so that the gaseous intermediate product discharged from the exhaust surface (4) is transported to at least one substrate (16), and the nanostructures are deposited on the substrate (16). The device of claim 2, wherein the plasma electrode (9) has the form of a grid or a plate, which is arranged in the flow path of the gaseous starting material or on the gas inlet element (2). Siding (3). The device according to claim 3, characterized by one or more protective electrodes (10, 19) in the form of a grid arranged in the flow path of the gaseous starting material or having through holes (10 ', 19 ') one of the plates (10, 19), wherein at least one guard electrode (8) is disposed upstream of the plasma electrode (9), and / or at least one guard electrode (10, 19) is disposed on the electrode Downstream of the paddle electrode (9). The device according to claim 1, wherein the gas heating unit (11) has the form of a plate, a grid, a loop or a coil, and the heating unit is particularly arranged in the flow path of the gaseous starting material. In a plane extending transverse to the flow, the gas heating unit (11) has terminal electrodes (12, 13) for guiding an electric current through the gas heating unit (11). The device according to claim 4, wherein the protective electrodes (8, 10), the plasma electrodes (9) and / or the gas heating device (11) are formed of a plate, each of which has a plurality of holes, of which For the purpose of gas mixing, the holes of adjacent plates are arranged offset from each other. If the device of claim 6, one or more of the plates forming the electrodes (8, 9, 10) and / or the walls of the air inlet element (2) with the exhaust ports (7) The inside of the board has heat reflecting properties. The device according to claim 2, wherein the gas heating unit (11) arranged in a plane is arranged directly behind the exhaust surface (4) in the flow direction of the gas, and / or a protective electrode (8) directly communicates with The substrate (16) is opposite, wherein the protective electrode (8) has a hole (8 ') for gas passage. The device according to claim 1, wherein the upper wall plate (3) of the air inlet element (2) is the insulating plate (18), and the plasma electrode (9) extends along the insulating plate (18). The device according to claim 1, characterized in that two protective electrodes (10, 19) are spaced apart from each other and are arranged inside the cavity (5) of the housing, and a conductive holding rod is used (20, 21) The two protective electrodes (10, 19) are connected to a grounded electrode (8). A method for manufacturing a carbon, such as a single-layer, multi-layer sheet structure, a small tube, or a nanostructure of a fiber, in a device as claimed in any one of claims 1 and 4, characterized in that, if appropriate, the same Carrier gas, a mixture containing at least one oxidized or reduced or carbon-containing gaseous starting material or a clean gas is fed into the housing cavity (5) via a gas supply pipe (6), which is generated by the plasma The heater (8, 9, 10) and the gas mixture also applies energy to the gas mixture. The method as claimed in item 11, wherein the gaseous starting material is simultaneously supplied in the housing cavity by the heat generated by the heating unit (11) and by the plasma generator (8, 9, 10). ) Generates a plasma and is activated or dissociated, so that atomic or ionized free radicals, gaseous polymers or aromatic intermediates are formed. The method of claim 12, wherein the plasma is continuously and / or pulsed, and / or the gaseous starting material is continuously or pulsed into the air inlet element (2). The method as claimed in claim 11, wherein a cleaning step is performed before or after the method step of depositing a nanostructure made of carbon on the substrate (16) disposed in the processing chamber, and during the cleaning step, it is fed to A cleaning gas in the housing cavity (5) is activated by applying a plasma and / or by heating, wherein in particular, the cleaning step is performed periodically before or after a deposition step. A method as claimed in item 11 in which a component, such as a protective electrode (10) and / or a grounded exhaust surface (4), is used which is particularly grounded and is arranged downstream of the plasma electrode (9) and / or the heating unit (13), Captures particles formed during the conversion reaction.