TWI652155B - Substrate, method for making the same, and housing having the same - Google Patents

Substrate, method for making the same, and housing having the same Download PDF

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Publication number
TWI652155B
TWI652155B TW104128721A TW104128721A TWI652155B TW I652155 B TWI652155 B TW I652155B TW 104128721 A TW104128721 A TW 104128721A TW 104128721 A TW104128721 A TW 104128721A TW I652155 B TWI652155 B TW I652155B
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substrate
molding
processing
defects
mold
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TW104128721A
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Chinese (zh)
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TW201707919A (en
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蔡榮峰
劉昱辰
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正達國際光電股份有限公司
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Abstract

一種基材表面加工方法,包括如下步驟:提供一模具,該模具包括至少一成型面,每一成型面為一具有若干微結構的非光滑表面;將表面具有缺陷的一待成型基材放置於該模具內,並使該基材具有所述缺陷的表面與該模具的其中一成型面相對;以及對該基材進行成型,使該成型面上的微結構轉印至該基材具有缺陷的表面,且至少部分微結構與所述缺陷位置重疊。本發明還提供一種基材以及由該基材製得的殼體。 A method for processing a surface of a substrate, comprising the steps of: providing a mold comprising at least one molding surface, each molding surface being a non-smooth surface having a plurality of microstructures; and placing a substrate to be formed having defects on the surface Inside the mold, the surface of the substrate having the defect is opposed to one of the molding faces of the mold; and molding the substrate to transfer the microstructure on the molding surface to the substrate having defects a surface, and at least a portion of the microstructure overlaps the defect location. The invention also provides a substrate and a housing made from the substrate.

Description

基材及其表面加工方法、製得的殼體 Substrate and surface processing method thereof, and obtained shell

本發明涉及一種基材及其表面加工方法、以及由該基材製得的殼體。 The present invention relates to a substrate and a method of processing the same, and a housing made of the substrate.

在熱壓成型模具或衝壓成型模具等成型模具的製造過程中,通常需要將模具的成型面研磨至光滑狀態,使基材在成型後可以形成光滑的表面。然而,由於環境粉塵或基材特性等原因容易使基材表面產生缺陷(如麻點、裂痕等),即便將模具的成型面研磨至光滑狀態,由於表面缺陷的存在,也無法保證基材在成型後形成光滑的表面。如此,使用該類基材製備電子裝置的外殼無疑會在很大程度上影響電子裝置的外觀。 In the manufacturing process of a molding die such as a hot press forming die or a press forming die, it is usually necessary to grind the molding face of the die to a smooth state so that the substrate can form a smooth surface after molding. However, due to environmental dust or substrate characteristics, etc., it is easy to cause defects (such as pitting, cracks, etc.) on the surface of the substrate. Even if the molding surface of the mold is ground to a smooth state, the substrate cannot be guaranteed due to the presence of surface defects. A smooth surface is formed after molding. Thus, the use of such a substrate to prepare an outer casing of an electronic device will undoubtedly affect the appearance of the electronic device to a large extent.

有鑑於此,有必要提供一種基材及基材表面加工方法,能夠解決以上問題。 In view of the above, it is necessary to provide a method for processing a substrate and a substrate surface, which can solve the above problems.

另,還有必要提供一種由上述基材製得的殼體。 In addition, it is also necessary to provide a casing made of the above substrate.

本發明提供一種基材表面加工方法,包括如下步驟:提供一模具,該模具包括至少一成型面,每一成型面為一具有若干微結構的非光滑表面;將表面具有缺陷的一待成型基材放置於該模具內,並使該基材具有所述缺陷的表面與該模具的其中一成型面相對;以及對該基材進行成型,使該成型面上的微結構轉印至該基材具有缺陷的表面,且至少部分微結構與所述缺陷位置重疊。 The invention provides a method for processing a surface of a substrate, comprising the steps of: providing a mold comprising at least one molding surface, each molding surface being a non-smooth surface having a plurality of microstructures; and a molding base having defects on the surface a material placed in the mold, and the surface of the substrate having the defect is opposite to one of the molding surfaces of the mold; and molding the substrate to transfer the microstructure on the molding surface to the substrate A surface having a defect, and at least a portion of the microstructure overlaps the defect location.

本發明還提供一種基材,包括具有缺陷的至少一表面,每一表面還包括若干微結構,且至少部分微結構與所述缺陷位置重疊。 The present invention also provides a substrate comprising at least one surface having defects, each surface further comprising a plurality of microstructures, and at least a portion of the microstructures overlapping the defect locations.

本發明還提供一種殼體,包括一基材,所述基材包括具有缺陷的至少一表面,每一表面還包括若干微結構,且至少部分微結構與所述缺陷位置 重疊。 The present invention also provides a housing comprising a substrate, the substrate comprising at least one surface having defects, each surface further comprising a plurality of microstructures, and at least a portion of the microstructures and the defect locations overlapping.

相較於現有技術,本發明的基材表面加工方法將模具的成型面上的微結構轉印至該基材具有缺陷的表面,使得該基材具有缺陷的表面具有一定的粗糙度,因此,光線將在該表面上產生散射,使得人眼無法辨識出該表面具有的缺陷。 Compared with the prior art, the surface processing method of the substrate of the present invention transfers the microstructure on the molding surface of the mold to the surface of the substrate having defects, so that the surface of the substrate having defects has a certain roughness, and therefore, Light will scatter on the surface so that the human eye cannot recognize the defects that the surface has.

S1~S4‧‧‧基材表面加工方法 S1~S4‧‧‧ substrate surface processing method

圖1為本發明較佳實施方式的基材表面加工方法的流程圖。 1 is a flow chart of a method for processing a surface of a substrate according to a preferred embodiment of the present invention.

請參照圖1,本發明較佳實施方式提供一種基材表面加工方法,其包括如下步驟: Referring to FIG. 1 , a preferred embodiment of the present invention provides a method for processing a surface of a substrate, which includes the following steps:

步驟S1:提供一模具,該模具包括至少一成型面,每一成型面為一具有若干微結構的非光滑表面。該模具的材質可選自六方氮化硼(HBN)、氧化矽(SiO2)、氧化鋁(Al2O3)以及六方晶系層碳中的至少一種。在本實施方式中,所述成型面上的微結構可藉由研磨棒加工後獲得,研磨棒的細微性根據待成型基材表面所需的微結構進行變更,優選的,所述研磨棒的細微性為400~800目。更具體的,所述研磨棒的材質可選自不銹鋼、碳化鎢、鐵以及鑽石中的其中一種。 Step S1: providing a mold comprising at least one molding surface, each molding surface being a non-smooth surface having a plurality of microstructures. The material of the mold may be selected from at least one of hexagonal boron nitride (HBN), cerium oxide (SiO2), aluminum oxide (Al2O3), and hexagonal layer carbon. In this embodiment, the microstructure on the molding surface can be obtained by processing the grinding rod, and the fineness of the grinding rod is changed according to the microstructure required on the surface of the substrate to be molded. Preferably, the grinding rod is The nuance is 400~800 mesh. More specifically, the material of the grinding rod may be selected from one of stainless steel, tungsten carbide, iron, and diamond.

步驟S2:將表面具有缺陷的一待成型基材放置於該模具內,並使該基材具有所述缺陷的表面與該模具的其中一成型面相對。其中,所述基材的材質可選自玻璃、塑膠、鐵、不銹鋼、鋁以及鎂鋁合金中的至少一種。所述缺陷可為劃痕、裂痕、麻點、氣泡等。所述缺陷可以為基材原先帶有的,也可以為基材在加工過程中形成的。 Step S2: placing a substrate to be molded having a defect on the surface in the mold, and making the surface of the substrate having the defect opposite to one of the molding faces of the mold. The material of the substrate may be selected from at least one of glass, plastic, iron, stainless steel, aluminum, and magnesium aluminum alloy. The defects may be scratches, cracks, pitting, bubbles, and the like. The defect may be originally carried by the substrate, or may be formed during processing of the substrate.

在本實施方式中,該基材具有缺陷的表面包括該基材的正面以及與該正面相對應的反面,相應的,該模具包括兩個成型面,使得在該基材放置於該模具內時,該基材的正面和反面可分別與所述兩個成型面相對。 In this embodiment, the surface of the substrate having defects includes a front surface of the substrate and a reverse surface corresponding to the front surface. Correspondingly, the mold includes two molding surfaces such that when the substrate is placed in the mold The front side and the back side of the substrate may be opposite to the two forming faces, respectively.

步驟S3:對該基材進行成型,使該成型面上的微結構轉印至該基材具有缺陷的表面,且至少部分微結構與所述缺陷位置重疊。在本實施方式中,該基材具有缺陷和微結構的表面的粗糙度Rz為0.2~15μm。本實施方式中,所述 微結構分佈於該基材具有缺陷的整個表面。其中,該基材可藉由熱壓成型、衝壓成型或真空輔助成型等方式進行成型。 Step S3: molding the substrate such that the microstructure on the molding surface is transferred to the surface of the substrate having defects, and at least a portion of the microstructure overlaps the defect position. In the present embodiment, the surface roughness Rz of the substrate having defects and microstructures is 0.2 to 15 μm. In this embodiment, the The microstructure is distributed over the entire surface of the substrate that has defects. The substrate can be formed by hot press forming, press forming, or vacuum assisted molding.

可以理解的,由於該成型面上的微結構轉印至該基材具有缺陷的表面,使得該基材具有缺陷的表面具有一定的粗糙度。因此,光線將在該表面上產生散射,使得人眼無法辨識出該表面具有的缺陷。 It can be understood that since the microstructure on the molding surface is transferred to the surface of the substrate having defects, the surface of the substrate having defects has a certain roughness. Therefore, light will scatter on the surface, making it impossible for the human eye to recognize the defects that the surface has.

在本實施方式中,所述基材表面加工方法還進一步包括如下步驟: In this embodiment, the substrate surface processing method further includes the following steps:

步驟S4:對上述形成有微結構的基材進行後續加工。其中,所述後續加工可包括貼膜、印刷、噴塗、塗膠以及表面強化中的至少一種。所述表面強化可以為表面熱處理或表面化學處理等。 Step S4: Subsequent processing is performed on the substrate on which the microstructure is formed. Wherein, the subsequent processing may include at least one of filming, printing, spraying, gluing, and surface strengthening. The surface strengthening may be surface heat treatment or surface chemical treatment or the like.

本發明還提供一種由上述基材表面加工方法製備的基材,其可應用於電子裝置(如智慧手機或平板電腦等)或車載電子產品的殼體中。所述基材包括具有缺陷的至少一表面。每一表面還包括若干微結構,且至少部分微結構與所述缺陷位置重疊。其中,所述微結構可為凸設於該基材具有缺陷的表面的或相對於所述表面凹陷的若干棱柱。 The present invention also provides a substrate prepared by the above-described substrate surface processing method, which can be applied to an electronic device (such as a smart phone or a tablet computer) or a housing of an in-vehicle electronic product. The substrate includes at least one surface having a defect. Each surface also includes a plurality of microstructures, and at least a portion of the microstructures overlap the defect locations. Wherein, the microstructure may be a plurality of prisms protruding from a surface of the substrate having defects or recessed relative to the surface.

本技術領域的普通技術人員應當認識到,以上的實施方式僅為用來說明本發明,而並非用作為對本發明的限定,只要在本發明的實質精神範圍之內,對以上實施例所作的適當改變和變化都落在本發明要求保護的範圍之內。 It is to be understood by those skilled in the art that the above embodiments are only intended to illustrate the invention, and are not intended to limit the invention, as long as the scope of the invention is Changes and modifications are intended to fall within the scope of the invention.

Claims (10)

一種基材表面加工方法,包括如下步驟:提供一模具,該模具包括至少一成型面,每一成型面為一具有若干微結構的非光滑表面;將表面具有缺陷的一待成型基材放置於該模具內,並使該基材具有所述缺陷的表面與該模具的其中一成型面相對;以及對該基材進行成型,使該成型面上的微結構轉印至該基材具有缺陷的表面,且至少部分微結構與所述缺陷於所述表面上位置重疊。 A method for processing a surface of a substrate, comprising the steps of: providing a mold comprising at least one molding surface, each molding surface being a non-smooth surface having a plurality of microstructures; and placing a substrate to be formed having defects on the surface Inside the mold, the surface of the substrate having the defect is opposed to one of the molding faces of the mold; and molding the substrate to transfer the microstructure on the molding surface to the substrate having defects a surface, and at least a portion of the microstructure overlaps the location of the defect on the surface. 如申請專利範圍第1項所述的基材表面加工方法,其中,還包括:對上述形成有微結構的基材進行後續加工。 The method for processing a surface of a substrate according to claim 1, further comprising: performing subsequent processing on the substrate on which the microstructure is formed. 如申請專利範圍第2項所述的基材表面加工方法,其中,所述後續加工包括貼膜、印刷、噴塗、塗膠以及表面強化中的至少一種。 The method of processing a substrate surface according to claim 2, wherein the subsequent processing comprises at least one of filming, printing, spraying, gluing, and surface strengthening. 如申請專利範圍第1項所述的基材表面加工方法,其中,該模具的材質選自六方氮化硼、氧化矽、氧化鋁以及六方晶系層碳中的至少一種。 The substrate surface processing method according to claim 1, wherein the material of the mold is at least one selected from the group consisting of hexagonal boron nitride, cerium oxide, aluminum oxide, and hexagonal layer carbon. 如申請專利範圍第1項所述的基材表面加工方法,其中,所述成型面上的微結構藉由研磨棒加工後獲得,研磨棒的細微性為400~800目。 The method for processing a surface of a substrate according to claim 1, wherein the microstructure on the molding surface is obtained by processing a polishing rod, and the fineness of the polishing rod is 400 to 800 mesh. 如申請專利範圍第5項所述的基材表面加工方法,其中,該基材具有缺陷和微結構的表面的粗糙度Rz為0.2~15μm。 The substrate surface processing method according to claim 5, wherein the surface roughness Rz of the substrate having defects and microstructures is 0.2 to 15 μm. 如申請專利範圍第1項所述的基材表面加工方法,其中,所述基材的材質選自玻璃、塑膠、鐵、不銹鋼、鋁以及鎂鋁合金中的至少一種。 The method for processing a surface of a substrate according to claim 1, wherein the material of the substrate is at least one selected from the group consisting of glass, plastic, iron, stainless steel, aluminum, and magnesium alloy. 如申請專利範圍第1項所述的基材表面加工方法,其中,該基材具有缺陷的表面包括該基材的正面以及與該正面相對應的反面,該模具包括兩個成型面,使得在該基材放置於該模具內時,該基材的正面和反面分別與所述兩個成型面相對。 The method of processing a substrate surface according to claim 1, wherein the surface of the substrate having a defect comprises a front surface of the substrate and a reverse surface corresponding to the front surface, the mold comprising two molding surfaces, such that When the substrate is placed in the mold, the front and back sides of the substrate are opposed to the two molding faces, respectively. 一種基材,包括具有缺陷的至少一表面,每一表面還包括若干微結構,且至少部分微結構與所述缺陷於所述表面上位置重疊。 A substrate comprising at least one surface having defects, each surface further comprising a plurality of microstructures, and at least a portion of the microstructures overlapping the locations of the defects on the surface. 一種殼體,包括一基材,其改良在於,所述基材包括具有缺陷的至少一表面,每一表面還包括若干微結構,且至少部分微結構與所述缺陷於所述 表面上位置重疊。 A housing comprising a substrate, wherein the substrate comprises at least one surface having defects, each surface further comprising a plurality of microstructures, and at least a portion of the microstructures and the defects are The positions on the surface overlap.
TW104128721A 2015-08-31 2015-08-31 Substrate, method for making the same, and housing having the same TWI652155B (en)

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Citations (5)

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Publication number Priority date Publication date Assignee Title
US4076566A (en) 1976-01-28 1978-02-28 Formica Corporation Method of preparing decorative textured laminates
FR2418084A1 (en) 1978-02-27 1979-09-21 Formica Corp Textured decorative laminate prodn. - using peened metal press plate to texturise decorative cellulosic sheet impregnated with melamine-formaldehyde! resin
US6153283A (en) 1998-02-11 2000-11-28 Steelwood Extruding Corp. Structure having at least one improved surface and a method of making the structure
JP2007283622A (en) 2006-04-17 2007-11-01 Dainippon Printing Co Ltd Embossing apparatus, embossing method, and combination of embossing molds, and sheet-like substrate
TWI415735B (en) 2006-10-25 2013-11-21 Agency Science Tech & Res Modification of surface wetting properties of a substrate

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4076566A (en) 1976-01-28 1978-02-28 Formica Corporation Method of preparing decorative textured laminates
FR2418084A1 (en) 1978-02-27 1979-09-21 Formica Corp Textured decorative laminate prodn. - using peened metal press plate to texturise decorative cellulosic sheet impregnated with melamine-formaldehyde! resin
US6153283A (en) 1998-02-11 2000-11-28 Steelwood Extruding Corp. Structure having at least one improved surface and a method of making the structure
JP2007283622A (en) 2006-04-17 2007-11-01 Dainippon Printing Co Ltd Embossing apparatus, embossing method, and combination of embossing molds, and sheet-like substrate
TWI415735B (en) 2006-10-25 2013-11-21 Agency Science Tech & Res Modification of surface wetting properties of a substrate

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