TWI650851B - Wafer level optical module and manufacturing method thereof - Google Patents

Wafer level optical module and manufacturing method thereof Download PDF

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TWI650851B
TWI650851B TW103142605A TW103142605A TWI650851B TW I650851 B TWI650851 B TW I650851B TW 103142605 A TW103142605 A TW 103142605A TW 103142605 A TW103142605 A TW 103142605A TW I650851 B TWI650851 B TW I650851B
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substrate wafer
wafer
optical elements
optical
substrate
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TW201535694A (en
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馬克思 羅西
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新加坡商新加坡恒立私人有限公司
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01SRADIO DIRECTION-FINDING; RADIO NAVIGATION; DETERMINING DISTANCE OR VELOCITY BY USE OF RADIO WAVES; LOCATING OR PRESENCE-DETECTING BY USE OF THE REFLECTION OR RERADIATION OF RADIO WAVES; ANALOGOUS ARRANGEMENTS USING OTHER WAVES
    • G01S7/00Details of systems according to groups G01S13/00, G01S15/00, G01S17/00
    • G01S7/48Details of systems according to groups G01S13/00, G01S15/00, G01S17/00 of systems according to group G01S17/00
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Abstract

用於製造複數個光學模組的方法,每一光學模組包括第一光學元件(C1)及第二光學元件(C2),該方法包括以下的步驟a)提供第一基板晶圓(S1),複數個第一光學元件(C1)存在於第一基板晶圓上的頂側上;b)提供具有材料區域的第二基板晶圓(S2),材料區域為連續橫向地界定的區域,第二基板的材料存在於材料區域中,其中,複數個第二光學元件(C2)存在於材料區域中;c)實現第一基板晶圓(S1)與第二基板晶圓(S2)的橫向對齊,使得每一個第一光學元件(C1)存在於不與材料區域重疊的橫向地界定的區域中;d)在橫向對齊的狀態下使第一基板晶圓與第二基板晶圓互連,使得第一基板晶圓的頂側面對第 二基板晶圓的底側,且在第一基板晶圓與第二基板晶圓之間不具有進一步的晶圓。 A method for manufacturing a plurality of optical modules, each optical module including a first optical element (C1) and a second optical element (C2), the method includes the following steps a) providing a first substrate wafer (S1) A plurality of first optical elements (C1) exist on the top side of the first substrate wafer; b) providing a second substrate wafer (S2) having a material region, the material region is a continuously laterally defined region, and the first The materials of the two substrates exist in the material region, wherein a plurality of second optical elements (C2) exist in the material region; c) the lateral alignment of the first substrate wafer (S1) and the second substrate wafer (S2) is achieved , So that each first optical element (C1) exists in a laterally defined area that does not overlap the material area; d) interconnect the first substrate wafer and the second substrate wafer in a state of lateral alignment so that The top side of the first substrate wafer faces the first The bottom side of the two substrate wafer, and there is no further wafer between the first substrate wafer and the second substrate wafer.

以此方式,第一和第二光學元件可被放置成特別地靠近彼此。 In this way, the first and second optical elements may be placed particularly close to each other.

Description

晶圓級光學模組及其製造方法 Wafer-level optical module and manufacturing method thereof

本發明關於光學器件的領域,且更精確地,關於光學或光電元件的製造的領域。更具體地,本發明關於光學模組,尤其是光電模組(opto-electronic module),及其製造方法,以及包含這種模組的晶圓堆疊及裝置,以及有關於此方法及此模組的使用。本發明關於根據申請專利範圍之開放式子句的方法及設備。 The invention relates to the field of optical devices, and more precisely to the field of manufacture of optical or optoelectronic elements. More specifically, the present invention relates to an optical module, especially an opto-electronic module, and a manufacturing method thereof, and a wafer stack and a device including the module, and to the method and the module. usage of. The invention relates to an open clause method and device according to the scope of patent application.

名詞定義 Noun definition

「主動式光學元件」:光感測或發光元件。例如,光二極體、影像感測器、LED、OLED、雷射晶片。主動式光學元件可能作為裸片(bare die)存在或存在於封裝中,亦即,作為封裝元件。 "Active optical element": a light sensing or light emitting element. For example, photodiodes, image sensors, LEDs, OLEDs, and laser chips. Active optical elements may exist as a bare die or in a package, that is, as a packaged element.

「被動式光學元件」:藉由折射及/或繞射及/或(內部的及/或外部的)反射使光重新導向的光學元件,例如,透鏡、稜鏡、鏡、或光學系統,其中,光學系統為有可能還包含像是孔徑光闌(aperture stop)、影像屏幕(image screen)、支架的機械性元件的這種光學元件的 集合。 "Passive optical element": An optical element that redirects light by refraction and / or diffraction and / or (internal and / or external) reflections, such as a lens, chirp, mirror, or optical system, where, The optical system is an optical element that may include mechanical elements such as an aperture stop, an image screen, and a stand. set.

「光電模組」:至少一主動式和至少一被動式光學元件被包含於其中的組件。 "Photoelectric module": a component in which at least one active and at least one passive optical element are included.

「複製」:藉由使給定的結構或其負片再現的技術。例如,蝕刻、浮雕(embossing)(壓印法(imprinting))、鑄造(casting)、模製(molding)。 "Copy": A technique by which a given structure or its negatives are reproduced. For example, etching, embossing (imprinting), casting, and molding.

「晶圓」:大致呈碟狀或片狀的物件,其在一個方向上(z方向或垂直方向或堆疊方向)的延伸相較於其在另外兩個方向上(x及y方向或橫向方向)的延伸為小的。一般而言,在晶圓上,複數個類似的結構或物件可被佈置或設置於其中,通常在矩形柵格上。晶圓可具有開口或孔,且晶圓甚至可在其側向區域的主要部分為沒有材料的。晶圓可具有任意的橫向形狀,其中,圓形及矩形為非常常見的。僅管在許多情況下,晶圓被理解為主要地是由半導體材料所製成的,但在本專利申請案中,這明確地並不構成限制。據此,晶圓可主要地由,例如,半導體材料、聚合物材料、包含金屬及聚合物或聚合物及玻璃材料的複合材料,所製成。特別是,可硬化的材料,例如,熱或紫外線固化聚合物,為結合本發明一起使用之感興趣的晶圓材料。 "Wafer": An object that is generally dish-shaped or sheet-shaped, which extends in one direction (z direction or vertical direction or stacking direction) compared to its extension in the other two directions (x and y directions or lateral directions) ) Is small. Generally speaking, on a wafer, a plurality of similar structures or objects can be arranged or arranged therein, usually on a rectangular grid. The wafer may have openings or holes, and the wafer may even be free of material in a major portion of its lateral area. Wafers can have any lateral shape, with circles and rectangles being very common. Although in many cases wafers are understood to be made primarily of semiconductor materials, this is clearly not a limitation in this patent application. Accordingly, a wafer may be mainly made of, for example, a semiconductor material, a polymer material, a composite material including a metal and a polymer, or a polymer and a glass material. In particular, hardenable materials, such as thermal or ultraviolet curable polymers, are wafer materials of interest for use with the present invention.

「橫向」:參照「晶圓」。 "Horizontal": Refer to "Wafer".

「垂直」:參照「晶圓」。 "Vertical": Refer to "Wafer".

「光」:大部分為電磁輻射;尤其是,電磁頻譜(electromagnetic spectrum)的紅外光、可見光或紫外光 部分的電磁輻射。 "Light": mostly electromagnetic radiation; especially infrared, visible, or ultraviolet light in the electromagnetic spectrum Part of electromagnetic radiation.

在WO 2013/010284 A2中,光學模組及其製造方法被呈現出來。在光學模組的內部,光基本上沿著垂直路徑行進,亦即,沿著包含在模組中的基板之堆疊方向行進。據此,存在於模組中的光學元件被垂直地對齊。 In WO 2013/010284 A2, an optical module and a manufacturing method thereof are presented. Inside the optical module, light travels substantially along a vertical path, that is, along the stacking direction of the substrates contained in the module. Accordingly, the optical elements existing in the module are vertically aligned.

從US 8 045 159 B2中,光學設備為已知的,其中,光沿著有角度的路徑行進。 From US 8 045 159 B2, optical devices are known, in which light travels along an angled path.

本發明的目的之一在於創造一種製造光學模組,尤其是晶圓級的光學模組,的新方法。此外,應與包含光學模組的裝置以及方法的使用同時提供對應的光學模組和晶圓堆疊。 One of the objectives of the present invention is to create a new method for manufacturing an optical module, especially a wafer-level optical module. In addition, corresponding optical modules and wafer stacks should be provided with the use of devices and methods that include optical modules.

本發明的另一目的在於提供尤其是極小的光學模組。 Another object of the present invention is to provide an optical module that is extremely small.

本發明的另一目的在於提供一種以特別高的精確度大量製造光學模組的方法,尤其是以特別高的橫向定位精確度。 Another object of the present invention is to provide a method for mass-producing optical modules with particularly high accuracy, especially with particularly high lateral positioning accuracy.

本發明的另一目的在於提供以特別高的良率大量製造光學模組的方法。 Another object of the present invention is to provide a method for manufacturing optical modules in large quantities with a particularly high yield.

本發明的另一目的在於提供一種使得光學模組的光學元件被定位成特別地靠近於彼此為可能的方法。 Another object of the present invention is to provide a method that makes it possible for the optical elements of the optical module to be positioned particularly close to each other.

進一步的目的從以下的實施例和說明來呈現。 Further objects are presented from the following examples and descriptions.

藉由根據本案申請專利範圍的設備及方法,至少部分地達成這些目的中的至少一者。 At least one of these aims is achieved, at least in part, by a device and method according to the scope of the present patent application.

在光學模組的晶圓級製造當中,在大多數的情況下提供的是垂直地行進的光學路徑,亦即,沿著堆疊方向,且據此,對於每個模組,光學元件被沿著垂直線一個接一個地佈置。然而,亦可能提供的是,光學路徑在模組中沿著相對於垂直方向傾斜(至少部分地)的光學路徑行進。 In wafer-level manufacturing of optical modules, in most cases an optical path that travels vertically is provided, that is, along the stacking direction, and accordingly, for each module, the optical components are routed along The vertical lines are arranged one after the other. However, it may also be provided that the optical path travels in the module along an optical path that is inclined (at least partially) relative to the vertical direction.

特別是在後者的情況下,每個模組的兩個光學元件(第一及第二光學元件)可能必須被定位在橫向上不同的區域當中,且這可能藉由使兩個光學元件(每個模組)存在於一個相同的晶圓(在單一化之後,最終在一個相同的基板)來達成。然而,例如,考慮到定位公差(尤其是橫向定位公差)及/或考慮到所應用的製造方法及/或若光學元件應該要被特別的靠近於彼此(橫向地),發明人認為這樣做可能為不利的。因此,他們認為可能以第一光學元件存在於第一晶圓上且第二光學元件存在於第二晶圓或第二晶圓內的方式來分配第一和第二光學元件。 Especially in the latter case, the two optical elements (first and second optical elements) of each module may have to be positioned in different regions in the lateral direction, and this may be achieved by making two optical elements (each Modules) exist on the same wafer (after singulation, and finally on the same substrate) to achieve. However, for example, considering the positioning tolerances (especially the lateral positioning tolerances) and / or the applied manufacturing method and / or if the optical elements should be particularly close to each other (laterally), the inventors believe that it is possible to do so Disadvantageous. Therefore, they believe that it is possible to distribute the first and second optical elements in such a manner that the first optical element exists on the first wafer and the second optical element exists on the second wafer or in the second wafer.

例如,在每個光學模組應包含被動式光學元件作為第二光學元件的情況下,可藉由晶圓級的複製非常有效率的製造這些元件,尤其是藉由將被動式光學元件複製到晶圓上,在該晶圓上,它們應該保持為仍然位在最終的光學模組內部。浮雕可為完成複製之特別適合的方式;使用浮雕,要被設置到一晶圓或一晶圓上之所有的第二光學元件可在單一的浮雕過程中被製造。然而,為了實現特別小的 光學模組或具體的光學路徑(例如,光學路徑或光學路徑的區段包圍相對於垂直方向之相當小的非零度角),在一個光學模組中之第一和第二光學元件之間必須提供特定的最小橫向距離。此可能主要為這些情況,例如,由於為了在第一光學元件已存在於其上的晶圓上藉由複製來製造第二光學元件,必須遵守到第一光學元件之預設最小距離,及/或必須遵守對於第一光學元件的預設高度限制。反之,在第一光學元件存在於晶圓上之前藉由在晶圓上的複製來製造第二光學元件的情況下,必須遵守到第二光學元件的預設最小距離,以在晶圓或晶圓上放置或製造第一光學元件。 For example, in the case where each optical module should include a passive optical element as a second optical element, these elements can be manufactured very efficiently by wafer-level replication, especially by copying the passive optical element to the wafer On the wafer, they should remain inside the final optical module. Embossing can be a particularly suitable way to accomplish reproduction; using relief, all second optical elements to be placed on a wafer or a wafer can be manufactured in a single relief process. However, in order to achieve particularly small An optical module or a specific optical path (for example, an optical path or a section of an optical path encloses a relatively small non-zero angle with respect to the vertical direction) must be between the first and second optical elements in an optical module Provides a specific minimum lateral distance. This may be mainly the case, for example, because in order to make a second optical element by copying on a wafer on which the first optical element already exists, a preset minimum distance to the first optical element must be adhered to, and / Or the preset height restrictions for the first optical element must be observed. Conversely, in the case where the second optical element is manufactured by copying on the wafer before the first optical element exists on the wafer, a preset minimum distance to the second optical element must be observed in order to Place or make a first optical element on a circle.

當第一光學元件存在於第一晶圓,且第二光學元件存在於第二晶圓時,尤其是在使第一及第二晶圓互連之前,這樣的問題可被解決或至少被緩和。這可藉由將預先製造的光學元件放置在各別的晶圓上或藉由直接在各別的晶圓上製造光學元件來實現,例如,藉由複製、或是藉由與各別的晶圓一起製造光學元件(例如,使用模製技術)。 When the first optical element exists on the first wafer and the second optical element exists on the second wafer, especially before the first and second wafers are interconnected, such problems can be solved or at least alleviated. . This can be achieved by placing pre-manufactured optical elements on individual wafers or by fabricating optical elements directly on individual wafers, for example, by copying, or by interacting with individual crystals. The optical elements are manufactured together (for example, using molding techniques).

此外,可能為較佳的是避免第一光學元件被運用於處理第二光學元件所需的條件(例如,用於將第二光學元件附接到晶圓、或用於在第二晶圓上或與第二晶圓一起地製造第二光學元件所需的條件),或者避免第一光學元件被運用於處理第二晶圓所需的條件(例如,用於將另外的晶圓附接到第二晶圓所需的條件)。以及,反之,可能為較佳的是避免第二光學元件被運用於對應的處理第一光學元 件或第一晶圓所需的條件。對應的處理步驟可能包括熱的應用及/或像是UV輻射的輻射的應用。 In addition, it may be preferable to avoid conditions necessary for the first optical element to be used to process the second optical element (e.g., for attaching the second optical element to a wafer, or for use on a second wafer Or the conditions required to manufacture the second optical element with the second wafer), or to avoid the conditions required for the first optical element to be used to process the second wafer (e.g., to attach another wafer to Conditions required for the second wafer). And, conversely, it may be better to prevent the second optical element from being used for corresponding processing of the first optical element Conditions for the first wafer or first wafer. Corresponding processing steps may include the application of heat and / or the application of radiation like UV radiation.

同樣在此情況下,可能藉由使得第一及第二晶圓以第一晶圓承載第一光學元件且第二晶圓承載第二光學元件的方式來設置,並在這之後製造出晶圓堆疊,來避免潛在的問題。 Also in this case, it is possible to set the first and second wafers such that the first wafer carries the first optical element and the second wafer carries the second optical element, and the wafer is manufactured after that Stack to avoid potential problems.

這種第一及第二晶圓事先被分別地準備,且接著,例如,藉由透過黏合劑(例如,環氧樹脂)將其相互黏合、或藉由提供形狀配合(form fit),例如,扣合(snap fit),而被互連。通常,會提供的是,第一晶圓的頂側不僅面對第二晶圓的底側,且它們還因為互連方法而能夠盡量的相互靠近。第一晶圓的頂側通常面對第二晶圓的底側,且可能除了黏著劑之外,沒有其他元件存在於它們之間。 Such first and second wafers are separately prepared in advance, and then, for example, by adhering them to each other through an adhesive (for example, epoxy resin), or by providing a form fit, for example, Snap fit while being interconnected. Generally, it will be provided that the top side of the first wafer not only faces the bottom side of the second wafer, but also that they can be as close to each other as possible due to the interconnection method. The top side of the first wafer usually faces the bottom side of the second wafer, and there may be no other components between them except the adhesive.

提供具有第一光學元件的第一晶圓以及獨立地提供具有第二光學元件的第二晶圓的優點為可在光學裝置的製造過程中得到提升的良率。更具體地,在將第一和第二晶圓互連之前,第一及/或第二晶圓可被檢驗或檢查,且僅有已達到預定(預設)參數,亦即,具有足夠的品質(例如,展現出適當的光學特性),的這種第一及/或第二晶圓可被使用。並且,可額外地或替代地提供的是,在將第一和第二晶圓互連之前,檢驗或檢查第二光學元件,以及第一光學元件僅被安裝或製造於第一晶圓上的特定位置中,此特定位置係依據檢驗或檢查的結果而被選出。例 如,檢驗或檢查的結果可為這些具體的光學模組(或更具體地,這些光學模組的橫向位置)之指標,其所應用的是,關聯到各個光學模組之一個或多個第二光學元件(亦即,第二光學元件被包含在各個光學模組中)達到預定(預設)參數,以及第一光學元件僅在關聯於這些具體的光學模組之位置被附接到第一晶圓或被製造於第一晶圓上。 The advantage of providing a first wafer with a first optical element and independently providing a second wafer with a second optical element is that an improved yield can be obtained during the manufacturing process of the optical device. More specifically, the first and / or second wafer may be inspected or inspected before the first and second wafers are interconnected, and only predetermined (preset) parameters have been reached, that is, have sufficient Quality (e.g., exhibiting appropriate optical characteristics), such first and / or second wafers can be used. And, it may additionally or alternatively be provided that the second optical element is inspected or inspected before the first and second wafers are interconnected, and the first optical element is only mounted or manufactured on the first wafer Among the specific locations, this specific location is selected based on the results of inspection or inspection. example For example, the result of the inspection or inspection may be an indicator of these specific optical modules (or more specifically, the lateral position of these optical modules), which is applied to one or more first The two optical elements (that is, the second optical element is included in each optical module) reach a predetermined (preset) parameter, and the first optical element is attached to the first optical element only at a position associated with these specific optical modules. A wafer may be fabricated on the first wafer.

此外,一個或多個導體路徑(conductor path)可存在於第一基板的頂側或頂側上,尤其是在第二光學元件存在於光學模組中的橫向地界定的區域中。由於使用複製來在具有導體路徑的基板上創造光學元件可能為困難的,第二基板的提供可為有利的,特別是若複製的第二光學元件存在於第二基板晶圓處或第二基板晶圓上。 Furthermore, one or more conductor paths may exist on the top side or the top side of the first substrate, especially in a laterally defined area where the second optical element is present in the optical module. Since it may be difficult to use replication to create optical elements on a substrate with a conductor path, the provision of a second substrate may be advantageous, especially if the duplicated second optical element is present at the second substrate wafer or the second substrate On the wafer.

在具體的應用中,第一光學元件為主動式光學元件,且第二光學元件為被動式光學元件。在此情況下,因為第一晶圓通常會設置跨越其垂直延伸的電氣連接且可能為,例如,印刷電路板,且第二晶圓通常不需要這樣的特性且可能為,例如,主要地由玻璃或聚合物所製成的晶圓,第一及第二晶圓通常為不同類型的晶圓。 In specific applications, the first optical element is an active optical element, and the second optical element is a passive optical element. In this case, because the first wafer will typically be provided with electrical connections that extend vertically across it and may be, for example, a printed circuit board, and the second wafer typically does not require such characteristics and may be, for example, mainly composed of Glass or polymer wafers. The first and second wafers are usually different types of wafers.

第二晶圓具有許多的開口,例如,通孔,以在當互連第一和第二晶圓時,提供第一光學元件所需的空間。當第一和第二晶圓被互連時,第一光學元件突出到開口或穿過開口。一般而言,沒有第二晶圓的材料存在於第一光學元件被定位於其中的橫向地界定的區域中。且通常,也沒有 存在於第二晶圓中或與第二晶圓為一體的光學元件存在於第一光學元件被定位於其中的橫向地界定的區域中。 The second wafer has many openings, such as through holes, to provide the space required for the first optical element when interconnecting the first and second wafers. When the first and second wafers are interconnected, the first optical element protrudes into or through the opening. Generally speaking, no material of the second wafer is present in a laterally defined area in which the first optical element is positioned. And usually, there is no An optical element that is present in or integrated with the second wafer exists in a laterally defined area in which the first optical element is positioned.

然而,可能提供的是,存在於第一晶圓的更多的光學元件(不同於第一光學元件)被定位在第二光學元件被定位於其中的橫向地界定的區域中,尤其是在第二光學元件為透射光學元件的情況下。但這並不需要是這種情況且僅僅為一個選項,且特別是,這種更多的光學元件通常不會從第一晶圓的頂面突出。它們為整合到或存在於第一晶圓及/或存在於第一晶圓的底側上或被附接到第一晶圓的底側(底側為相對於頂側)。 However, it may be provided that more optical elements (different from the first optical element) present on the first wafer are positioned in the laterally defined area in which the second optical element is positioned, especially in the first When the two optical elements are transmission optical elements. But this need not be the case and is only an option, and in particular, such more optical elements usually do not protrude from the top surface of the first wafer. They are integrated into or present on the first wafer and / or present on or attached to the bottom side of the first wafer (the bottom side is opposite to the top side).

光學模組可額外包括第三基板及間隔物,該間隔物可被整合到第三基板中或為從第三基板分離的。且據此,對於製造而言,第三晶圓,尤其是第三基板晶圓,將被提供,且亦選擇性地提供(分離的)間隔晶圓。間隔晶圓(我們將稱作第一間隔晶圓)將第三基板晶圓與第一及/或第二晶圓互連,且藉由此間隔晶圓,第三基板晶圓與第一及/或第二晶圓之間的距離被確定。現在,我們應當更具體地引用第一及第二晶圓作為第一及第二基板晶圓。 The optical module may additionally include a third substrate and a spacer, and the spacer may be integrated into or separated from the third substrate. And according to this, for manufacturing, a third wafer, especially a third substrate wafer, will be provided, and a (separated) spacer wafer is also selectively provided. The spacer wafer (we will be referred to as the first spacer wafer) interconnects the third substrate wafer with the first and / or second wafer, and by this distance wafer, the third substrate wafer and the first and / or second wafers are interconnected. / Or The distance between the second wafers is determined. Now, we should more specifically refer to the first and second wafers as the first and second substrate wafers.

在許多情況下,第三光學元件,例如,被動式光學元件,可能存在於第三基板晶圓,例如,被整合到第三基板晶圓中或被附接到第三基板晶圓。特別是在此情況下,但也可以在其他情況下,第二光學元件可為反射光學元件。 In many cases, a third optical element, such as a passive optical element, may be present on a third substrate wafer, for example, integrated into a third substrate wafer or attached to a third substrate wafer. Especially in this case, but also in other cases, the second optical element may be a reflective optical element.

第一和第二基板晶圓通常在連接第三基板晶圓之前被互連。但亦可能同時地互連第一、第二及第三基板晶圓。 The first and second substrate wafers are typically interconnected before the third substrate wafer is connected. However, it is also possible to interconnect the first, second and third substrate wafers simultaneously.

並且,亦可能存在有被稱作第二間隔晶圓的另一晶圓,使得在各個光學模組中存在有另一晶圓(第二間隔物)。第二間隔晶圓是與第二基板晶圓為連續的,例如,在相同的製程中(像是模製製程)被製造、或是被附接到第二間隔晶圓,尤其是附接到第二間隔晶圓的頂側。間隔物通常不會為了界定出兩個晶圓(如第一間隔物通常為之的)之間的距離而被設置,但會為了界定或控制在各個光學模組中的光學路徑而被設置,例如,作用為一個或多個遮罩、擋板或孔徑。 Also, there may be another wafer called a second spacer wafer, so that another wafer (second spacer) exists in each optical module. The second spacer wafer is continuous with the second substrate wafer, for example, is manufactured in the same process (such as a molding process), or is attached to the second spacer wafer, especially to The top side of the second spacer wafer. Spacers are not usually set to define the distance between two wafers (such as the first spacer is usually), but they are set to define or control the optical path in each optical module. For example, acts as one or more masks, baffles, or apertures.

如同前面已經指出的,所說明的兩個(直接)附接的基板或基板晶圓的使用可以使得將第一和第二光學元件定位成特別地彼此靠近(在橫向上)為可能的。特別是,相較於可能位在單一晶圓上的情況,可以使它們被定位為更靠近的,及/或相較於若第一及/或第二光學元件在將晶圓互連之前可能未存在於各自的晶圓或各自的晶圓上的情況,可以使它們被定位為更靠近的。 As already indicated previously, the use of the two (directly) attached substrates or substrate wafers illustrated may make it possible to position the first and second optical elements particularly close to each other (in the lateral direction). In particular, they can be positioned closer together than if they might be on a single wafer, and / or compared to if the first and / or second optical components were possible before interconnecting the wafers. The fact that they are not present on the respective wafers or on the respective wafers may cause them to be positioned closer together.

在將晶圓互連之前,亦可能去移除(例如,切去)與對應的第一或(更具體地)第二光學元件為連續的材料之部分。這種材料可為,例如,當製造各別的光學元件時(例如,使用複製技術)無法避免地被製造出來的材料。這種材料的移除可在一個相同的製程中藉由從對應的晶圓移除材料而被實現,尤其是藉由從對應的晶圓移除材料以在對應的晶圓中創造出開口。同樣地,這使得其能夠具有被定位成特別地靠近於彼此的第一及第二光學元件。 Prior to interconnecting the wafers, it is also possible to remove (eg, cut away) portions of the material that are continuous with the corresponding first or (more specifically) second optical element. Such a material may be, for example, a material that is unavoidably manufactured when manufacturing individual optical elements (for example, using replication technology). This material removal can be achieved in a same process by removing material from the corresponding wafer, especially by removing material from the corresponding wafer to create an opening in the corresponding wafer. As such, this enables it to have first and second optical elements positioned particularly close to each other.

達成第一及第二光學元件之(橫向地)靠近的位置的又另一個方式為建構第二基板使得其在第一基板的頂側上方提供底切槽(當第一和第二基板被互連時)。 Yet another way to achieve the (laterally) close positions of the first and second optical elements is to construct a second substrate such that it provides undercuts above the top side of the first substrate (when the first and second substrates are Even time).

此外,為了具有特別的靠近於彼此的第一和第二光學元件(通常為成對的),應避免在對應的第一和第二光學元件之間存在進一步的物件,像是光學模組的進一步元件。特別是,在對應的第一和第二光學元件之間的空間中,不應該接著存在有光學模組的光學元件和不同於第一及第二基板的基板的零件。 In addition, in order to have first and second optical elements that are particularly close to each other (usually in pairs), there should be no further objects between the corresponding first and second optical elements, such as those of optical modules Further components. In particular, in the space between the corresponding first and second optical elements, there should not be an optical element of the optical module and a component different from the substrate of the first and second substrates.

該方法的特徵大致如下,其中,亦說明各種實施例及改進。 The characteristics of this method are as follows, among which various embodiments and improvements are also explained.

一種用於製造複數個光學模組的方法,每一光學模組包括第一和第二光學元件,其中,該方法包括以下的步驟a)提供第一基板晶圓,複數個第一光學元件存在於第一基板晶圓的頂側上;b)提供具有材料區域的第二基板晶圓,該材料區域為連續橫向地界定的區域,第二基板的材料存在於此區域中,其中,複數個第二光學元件存在於該材料區域中;c)實現第一和第二基板晶圓的橫向對齊,使得每一個第一光學元件存在於未與材料區域重疊的橫向地界定的區域中;d)在橫向對齊的狀態下使第一和第二基板晶圓互連,使得第一基板晶圓的頂側面對第二基板晶圓 的底側,且在它們之間不具有進一步的晶圓。 A method for manufacturing a plurality of optical modules, each optical module includes first and second optical elements, wherein the method includes the following steps a) providing a first substrate wafer, a plurality of first optical elements exist On the top side of the first substrate wafer; b) providing a second substrate wafer having a material region, the material region being a continuously laterally defined region in which the material of the second substrate exists, wherein a plurality of A second optical element is present in the material region; c) achieving lateral alignment of the first and second substrate wafers such that each first optical element is present in a laterally defined region that does not overlap the material region; d) Interconnect the first and second substrate wafers in a laterally aligned state so that the top side of the first substrate wafer faces the second substrate wafer Bottom side without further wafers between them.

如同上面已經說明的,此方式可達成各種可能的優勢及效果,尤其是藉由在將晶圓互連之前使光學元件存在於各別的晶圓上。 As already explained above, this method can achieve various possible advantages and effects, especially by allowing the optical elements to exist on separate wafers before interconnecting the wafers.

可被提供的是,在材料區域外,沒有光學元件存在於第二基板晶圓,更具體地:在材料區域外,沒有光學元件被整合到、或被附接到、或例如,被安裝到第二基板晶圓。 It may be provided that no optical elements are present outside the material region on the second substrate wafer, more specifically: no optical elements are integrated into, or attached to, or, for example, mounted to, outside the material region The second substrate wafer.

通常提供的是,從頂側突出的第一光學元件。 Usually provided is a first optical element protruding from the top side.

一般而言,第一和第二光學元件存在於(且有助於形成)各別的光學模組中的光學路徑,且光學路徑通常包括相對於垂直方向傾斜的至少一個區段,尤其是其中,第一和第二光學元件存在於(且有助於形成)各別的光學模組中的相同的這種光學路徑。然而,第一和第二光學元件可能存在於光學模組中的不同的光學路徑。 Generally speaking, the first and second optical elements exist in (and contribute to) the optical path in the respective optical module, and the optical path usually includes at least one section inclined with respect to the vertical direction, especially among them The first and second optical elements exist in (and contribute to) the same such optical path in the respective optical module. However, the first and second optical elements may exist in different optical paths in the optical module.

材料區域為「連續」橫向地界定的區域,這指的是,其為完整的或單一的區域,且非兩個或多個分離(未互連)橫向地界定的區域。 A material area is a "continuous" laterally defined area, which means that it is a complete or single area and is not two or more separate (not interconnected) laterally defined areas.

一般而言,第一光學元件名義上為相同的零件。 Generally, the first optical element is nominally the same part.

一般而言,第二光學元件名義上為相同的零件。 In general, the second optical element is nominally the same part.

該方法可包括下列步驟的一者或兩者a1)提供具有複數個第一光學元件的第一基板晶圓,例如,藉由與第一基板晶圓一起地來製造複數個第一光學元件、或在第一基板晶圓上製造複數個 第一光學元件、或將複數個第一光學元件附接到第一基板晶圓;以及b1)提供具有複數個第二光學元件的第二基板晶圓,例如,藉由與第一基板晶圓一起地來製造複數個第二光學元件、或在第一基板晶圓上製造複數個第二光學元件、或將複數個第二光學元件附接到第一基板晶圓。 The method may include one or both of the following steps a1) providing a first substrate wafer having a plurality of first optical elements, for example, by manufacturing a plurality of first optical elements together with the first substrate wafer, Or make multiple on the first substrate wafer A first optical element, or attaching a plurality of first optical elements to a first substrate wafer; and b1) providing a second substrate wafer having a plurality of second optical elements, for example, by communicating with the first substrate wafer The plurality of second optical elements are manufactured together, or the plurality of second optical elements are manufactured on the first substrate wafer, or the plurality of second optical elements are attached to the first substrate wafer.

在一實施例中,第一光學元件從第一基板晶圓的頂側突出超過第二基板晶圓的頂側。換言之,第一光學元件延伸到第二基板晶圓上方的垂直高度。 In one embodiment, the first optical element protrudes from the top side of the first substrate wafer beyond the top side of the second substrate wafer. In other words, the first optical element extends to a vertical height above the second substrate wafer.

在一實施例中,第二基板晶圓包括複數個開放區域,其係為沒有第二基板的材料存在於其中的橫向地界定的區域,且其中,每一個第一光學元件係存在於這些開放區域中的一者中。 In one embodiment, the second substrate wafer includes a plurality of open regions, which are laterally defined regions in which no material of the second substrate exists, and wherein each first optical element exists in these open regions. In one of the zones.

一般而言,每一個開放區域被材料區域橫向地包圍。 In general, each open area is laterally surrounded by a material area.

在一實施例中,第一光學元件分別被橫向地定位在複數個第一區域中的一者中,且第二光學元件分別被橫向地定位在複數個第二區域中的一者中,其中,沒有一個第一區域是與任何一個第二區域重疊的。且更具體地,被附接到或被整合到第二基板晶圓的光學元件未存在於這些第一區域的一者中。 In an embodiment, the first optical element is respectively positioned laterally in one of the plurality of first regions, and the second optical element is positioned laterally in one of the plurality of second regions, respectively, wherein , No first region overlaps any second region. And more specifically, the optical element attached to or integrated into the second substrate wafer does not exist in one of these first regions.

在一實施例中,第二基板晶圓構成一體地形成的部件。甚至可能提供的是,第二基板晶圓與第二光學元件一起構成一個整體的部件,例如,包含一種或多種具合物或 實質上由一種或多種聚合物所構成的部件。這可能,藉由,例如,在複製製程中製造第二基板晶圓與第二光學元件兩者(例如,藉由模製),來加以實現。 In one embodiment, the second substrate wafer constitutes an integrally formed component. It may even be provided that the second substrate wafer and the second optical element together form a unitary component, for example, containing one or more compounds or A component consisting essentially of one or more polymers. This may be achieved, for example, by manufacturing both the second substrate wafer and the second optical element (e.g., by molding) in a replication process.

在一實施例中,第二基板晶圓與沿著相反於從第二基板晶圓的底側指向第一基板晶圓的頂側的方向之方向上突出的複數個突出物為連續的(或一體地形成的)。 In one embodiment, the second substrate wafer and the plurality of protrusions protruding in a direction opposite to the direction from the bottom side of the second substrate wafer to the top side of the first substrate wafer are continuous (or Integrally formed).

這些突出物可作為間隔物且通常存在於橫向地界定之區域中,且此區域並未重疊於第二光學元件存在於其中的橫向地界定之區域。 These protrusions can act as spacers and usually exist in a laterally defined area, and this area does not overlap the laterally defined area in which the second optical element exists.

然而,亦能夠提供分離的間隔晶圓。 However, separate spacer wafers can also be provided.

在一實施例中,方法包含以下的步驟g)提供第三基板晶圓,其中,複數個第三光學元件存在於第三基板晶圓或第三基板晶圓上,及/或第三基板晶圓包括複數個橫向地界定的透明區域;以及h)經由稱作第一間隔晶圓的晶圓將第三基板晶圓連接到第一基板晶圓及/或第二基板晶圓,使得第二基板晶圓被佈置在第一基板晶圓與第三基板晶圓之間,其中,第一間隔晶圓與第三間隔晶圓為選擇性地連續的(或一體地形成的);其中,步驟h)在步驟d)之後或與步驟d)同時被執行。 In one embodiment, the method includes the following step g) providing a third substrate wafer, wherein a plurality of third optical elements are present on the third substrate wafer or the third substrate wafer, and / or the third substrate crystal The circle includes a plurality of laterally defined transparent regions; and h) a third substrate wafer is connected to the first substrate wafer and / or the second substrate wafer via a wafer called a first spacer wafer such that the second The substrate wafer is arranged between the first substrate wafer and the third substrate wafer, wherein the first spacer wafer and the third spacer wafer are selectively continuous (or integrally formed); wherein, the steps h) is performed after or simultaneously with step d).

在此情況下,第一間隔晶圓典型地被佈置在第一基板晶圓和第三基板晶圓之間,且可更具體地被佈置在第二基 板晶圓與第三基板晶圓之間。 In this case, the first spacer wafer is typically arranged between the first substrate wafer and the third substrate wafer, and may be more specifically arranged on the second substrate wafer. Between the plate wafer and the third substrate wafer.

第一間隔晶圓可與第三基板晶圓為連續的,尤其是它們可為連續的(構成一體成型的部件),但亦可能提供第一間隔晶圓和第三基板晶圓為分離的部件,尤其是並未在步驟h)前建立互連(但在步驟h)的過程中建立互連)的分離的部件。 The first spacer wafer may be continuous with the third substrate wafer, especially they may be continuous (constituting an integrally formed component), but it is also possible to provide the first spacer wafer and the third substrate wafer as separate components. , Especially separate components that have not been interconnected before step h) (but interconnects were established during step h)).

在一實施例中,第一光學元件為主動式光學元件,且第二光學元件為被動式光學元件。在這種「混合」封裝或「混合」光學模組(其亦構成光電模組)中,第一基板晶圓一般係為印刷電路板,尤其是建立有跨越其垂直延伸的電氣連接的一種印刷電路板。 In one embodiment, the first optical element is an active optical element, and the second optical element is a passive optical element. In such a "hybrid" package or "hybrid" optical module (which also constitutes a photovoltaic module), the first substrate wafer is generally a printed circuit board, especially a type of print with electrical connections extending vertically across it Circuit board.

在一實施例中,方法包含以下的步驟r)在第二基板晶圓上複製第二光學元件。 In one embodiment, the method includes the following steps: r) Copying the second optical element on the second substrate wafer.

複製技術可使得能夠在一個晶圓上同時地創造複數個光學元件,例如,在第二基板晶圓上同時地創造複數個第二光學元件中的所有的第二光學元件。這可使用單一的複製工具來實現。 The replication technology may enable the simultaneous creation of a plurality of optical elements on one wafer, for example, the simultaneous creation of all the second optical elements of the plurality of second optical elements on a second substrate wafer. This can be achieved using a single copy tool.

藉由步驟r),第二光學元件可同時地被製造於或附接到第二基板晶圓,特別是第二基板晶圓的頂側。 With step r), the second optical element can be simultaneously manufactured on or attached to the second substrate wafer, especially the top side of the second substrate wafer.

一般而言,步驟r)在步驟c)及d)之前被執行。 In general, step r) is performed before steps c) and d).

在一實施例中,方法包括將第二光學元件附接到第二基板晶圓的步驟。這可以是,例如,特別是使用取放的方式,來達成。第二光學元件在此情況下通常被附接到第二基板晶圓的頂側。 In one embodiment, the method includes the step of attaching a second optical element to a second substrate wafer. This can be achieved, for example, using pick and place in particular. The second optical element is usually attached to the top side of the second substrate wafer in this case.

不僅是第二光學元件可被安裝到基板晶圓(例如,使用取放的方式),且第一光學元件亦可藉由此方式被附接到第一基板晶圓。 Not only can the second optical element be mounted to the substrate wafer (for example, using a pick-and-place method), but the first optical element can also be attached to the first substrate wafer in this manner.

如同前面已經指出的,該方法可使得具有相較於其他情況被定位(橫向地)成更靠近的光學元件為可能的。在下文中,「其他情況」以更詳細的方式來表示,亦即,藉由參照(嘗試)來製造這種光學模組的替代方法以及所使用的製造過程之空間需求。 As already pointed out previously, this method may make it possible to have optical elements that are positioned (laterally) closer than in other cases. In the following, "other cases" are expressed in a more detailed manner, that is, by referring (trying) an alternative method of manufacturing such an optical module and the space requirements of the manufacturing process used.

在一實施例中,第一光學元件中的其中之一在第一特定位置及方向中使用第一製程與第一基板晶圓一起被製造、或被製造在第一基板晶圓上、或被附接到第一基板晶圓,且第二光學元件中的其中之一在第二特定位置及方向中使用第二製程與第二基板晶圓一起被製造、或被製造在第二基板晶圓上、或被附接到第二基板晶圓,且該第一及第二特定位置係非常靠近地相互橫向地隔開,第一及第二製程在建立第一基板晶圓和第二基板晶圓之間的互連之後的空間需求,排除下列至少一種情況- 在第一特定位置及方向中使用第一製程與第一基板晶圓一起製造第一光學元件的其中之一、或於第一基板晶圓上製造第一光學元件的其中之一、或將第一光學元件的其中之一附接到第一基板晶圓,且同時,在第二特定位置及方向中使用二製程與第二基板晶圓一起製造第二光學元件的其中之一、或於第二基板晶圓上製造 第二光學元件的其中之一、或將第二光學元件的其中之一附接到第二基板晶圓;- 先在第一特定位置及方向中使用第一製程與第一基板晶圓一起製造第一光學元件的其中之一、或於第一基板晶圓上製造第一光學元件的其中之一、或將第一光學元件的其中之一附接到第一基板晶圓,並接著,在第二特定位置及方向中使用二製程與第二基板晶圓一起製造第二光學元件的其中之一、或於第二基板晶圓上製造第二光學元件的其中之一、或將第二光學元件的其中之一附接到第二基板晶圓;- 先在第二特定位置及方向中使用二製程與第二基板晶圓一起製造第二光學元件的其中之一、或於第二基板晶圓上製造第二光學元件的其中之一、或將第二光學元件的其中之一附接到第二基板晶圓,並接著,在第一特定位置及方向中使用第一製程與第一基板晶圓一起製造第一光學元件的其中之一、或於第一基板晶圓上製造第一光學元件的其中之一、或將第一光學元件的其中之一附接到第一基板晶圓。 In one embodiment, one of the first optical elements is manufactured together with the first substrate wafer in the first specific position and direction using the first process, or is fabricated on the first substrate wafer, or is Attach to the first substrate wafer, and one of the second optical elements is manufactured together with the second substrate wafer using the second process in the second specific position and direction, or is manufactured on the second substrate wafer On or attached to the second substrate wafer, and the first and second specific locations are laterally spaced very close to each other. The first and second processes create the first substrate wafer and the second substrate wafer. Space requirements after interconnection between circles, excluding at least one of the following conditions-using the first process in the first specific position and direction to manufacture one of the first optical elements together with the first substrate wafer, or the first One of the first optical elements is manufactured on the substrate wafer, or one of the first optical elements is attached to the first substrate wafer, and at the same time, the two processes and the second process are used in the second specific position and direction. Substrate wafer together manufacturing second One of the optical element, or on the second substrate producing wafer One of the second optical elements, or one of the second optical elements is attached to the second substrate wafer;-first manufactured together with the first substrate wafer in a first specific position and orientation using a first process One of the first optical elements, or one of the first optical elements manufactured on the first substrate wafer, or one of the first optical elements attached to the first substrate wafer, and then, in In the second specific position and direction, two processes are used to manufacture one of the second optical elements together with the second substrate wafer, or one of the second optical elements is manufactured on the second substrate wafer, or the second optical element is manufactured. One of the elements is attached to the second substrate wafer;-one of the second optical elements is manufactured together with the second substrate wafer using the two processes in the second specific position and direction, or the second substrate is crystallized Manufacture one of the second optical elements on the circle, or attach one of the second optical elements to the second substrate wafer, and then use the first process and the first substrate in the first specific position and direction Wafer manufacturing first light together One of the first optical element, one of the first optical element manufactured on the first substrate wafer, or one of the first optical element attached to the first substrate wafer.

在表達此實施例的一個面向的嘗試中,可以說的是,倘若是使用對應的製程,亦即,工具、材料和製程參數,第一和第二光學元件被(橫向地)定位成相當靠近,以至於在令對應的光學元件存在於其上或位於其上之前,不可 能去將第一和第二基板晶圓互連。並未排除可能利用不同的製程來實現此作業;但這種不同的製程可能為更耗費時間的、更昂貴的、或是更複雜的,例如,具有較小的公差之製程。 In an oriented attempt to express this embodiment, it can be said that if a corresponding process is used, that is, tools, materials, and process parameters, the first and second optical elements are positioned (laterally) fairly close , So that until the corresponding optical element exists or is located thereon, The first and second substrate wafers can be interconnected. It is not excluded that different processes may be used to achieve this operation; but such different processes may be more time consuming, more expensive, or more complex, for example, processes with smaller tolerances.

所說明的不可能性是起因於製程的空間需求。用於建立或附接光學元件的製程具有空間需求,亦即,在元件被建立或附接的區域中,必須存在預設的自由空間,例如,供所使用的工具利用。舉例來說,第一製程在第一光學元件的區域中可能需要這麼多的空間,此空間與由第二光學元件所佔去的空間重疊。並且/或是,反之,第二製程在第二光學元件的區域中可能需要這麼大的空間,此空間與由第一光學元件所佔去的空間重疊。 The impossibility illustrated is due to the space requirements of the process. The process for creating or attaching an optical element has space requirements, that is, there must be a preset free space in the area where the element is created or attached, for example, for use by the tools used. For example, the first process may require so much space in the area of the first optical element that this space overlaps with the space occupied by the second optical element. And / or, conversely, the second process may require such a large space in the area of the second optical element, and this space overlaps with the space occupied by the first optical element.

上述建立的互連是為了發生在沒有複數個第一光學元件及/或複數個第二光學元件分別存在於第一及第二間隔晶圓或第一及第二間隔晶圓上的情況下;但可能藉由類似在步驟d)中所說明之其他的方法來實現,尤其是使得第一基板晶圓的頂側面對第二基板晶圓的底側,且在第一基板晶圓和第二基板晶圓之間沒有進一步的晶圓。特別是,上述建立的互連是為了發生在沒有複數個第一光學元件及/或複數個第二光學元件分別存在於第一及第二間隔晶圓或第一及第二間隔晶圓上的情況下。 The above-mentioned interconnection is established in a case where there are no first optical elements and / or a plurality of second optical elements existing on the first and second spacer wafers or the first and second spacer wafers, respectively; However, it may be achieved by other methods similar to those described in step d), especially with the top side of the first substrate wafer facing the bottom side of the second substrate wafer, and between the first substrate wafer and the second substrate wafer. There are no further wafers between the substrate wafers. In particular, the above-mentioned interconnections are established to occur when no first optical elements and / or second optical elements exist on the first and second spacer wafers or the first and second spacer wafers, respectively. Case.

如同前面已經指出的,此方法可以使得令第一和第二光學元件被(橫向地)定位成相較於其他情況更靠近彼此為可能的。此處,「其他情況」在下文中以其他的方式更 詳細地表示,亦即,藉由參照(嘗試)來製造類似的光學模組(具有存在於一個相同的晶圓上或位在一個相同的晶圓之第一和第二光學元件)的替代方法,以及參照所使用的製造過程之空間需求。 As already pointed out previously, this method makes it possible to have the first and second optical elements positioned (laterally) closer to each other than in other cases. Here, the "other situation" is changed in other ways in the following Show in detail, that is, an alternative method of manufacturing similar optical modules (with first and second optical elements that exist on the same wafer or on the same wafer) by reference (try) , And reference to the space requirements of the manufacturing process used.

在一實施例中,第一光學元件中的其中之一在第一特定位置及方向中使用第一製程與第一基板晶圓一起被製造、或被製造在第一基板晶圓上、或被附接到第一基板晶圓,且第二光學元件中的其中之一在第二特定位置及方向中使用第二製程與第二基板晶圓一起被製造、或被製造在第二基板晶圓上、或被附接到第二基板晶圓,且其中,該第一及第二特定位置係非常靠近地相互橫向地隔開,第一及第二製程的空間需求排除下列至少一種情況- 在對應於第一特定位置及方向之位置及方向中使用第一製程與一個單一的基板晶圓一起製造第一光學元件的其中之一、或於該一個單一的基板晶圓上製造第一光學元件的其中之一、或將第一光學元件的其中之一附接到該一個單一的基板晶圓,且同時,在對應於第二特定位置及方向之位置及方向中使用二製程與該一個單一的基板晶圓一起製造第二光學元件的其中之一、或於該一個單一的基板晶圓上製造第二光學元件的其中之一、或將第二光學元件的其中之一附接到該一個單一的基板晶圓;- 先在對應於第一特定位置及方向之位置及方向 中使用第一製程與一個單一的基板晶圓一起製造第一光學元件的其中之一、或於該一個單一的基板晶圓上製造第一光學元件的其中之一、或將第一光學元件的其中之一附接到該一個單一的基板晶圓,並接著,在對應於第二特定位置及方向之位置及方向中使用二製程與該一個單一的基板晶圓一起製造第二光學元件的其中之一、或於該一個單一的基板晶圓上製造第二光學元件的其中之一、或將第二光學元件的其中之一附接到該一個單一的基板晶圓;- 先在對應於第二特定位置及方向之位置及方向中使用二製程與一個單一的基板晶圓一起製造第二光學元件的其中之一、或於該一個單一的基板晶圓上製造第二光學元件的其中之一、或將第二光學元件的其中之一附接到該一個單一的基板晶圓,並接著,在對應於第一特定位置及方向之位置及方向中使用第一製程與該一個單一的基板晶圓一起製造第一光學元件的其中之一、或於該一個單一的基板晶圓上製造第一光學元件的其中之一、或將第一光學元件的其中之一附接到該一個單一的基板晶圓。 In one embodiment, one of the first optical elements is manufactured together with the first substrate wafer in the first specific position and direction using the first process, or is fabricated on the first substrate wafer, or is Attach to the first substrate wafer, and one of the second optical elements is manufactured together with the second substrate wafer using the second process in the second specific position and direction, or is manufactured on the second substrate wafer On or attached to the second substrate wafer, and wherein the first and second specific locations are laterally spaced very close to each other, the space requirements of the first and second processes exclude at least one of the following conditions-in One of the first optical element is manufactured in a position and direction corresponding to the first specific position and direction using a first process together with a single substrate wafer, or the first optical element is manufactured on the single substrate wafer One of the first optical elements, or one of the first optical elements is attached to the one single substrate wafer, and at the same time, the two processes and the one single To manufacture one of the second optical elements together, or to manufacture one of the second optical elements on the single substrate wafer, or to attach one of the second optical elements to the one A single substrate wafer;-first at a position and direction corresponding to the first specific position and direction In the first process, one of the first optical elements is manufactured together with a single substrate wafer, or one of the first optical elements is manufactured on the single substrate wafer. One of them is attached to the one single substrate wafer, and then, the second optical element is manufactured together with the one single substrate wafer using two processes in a position and direction corresponding to the second specific position and direction. One of them, or manufacturing one of the second optical elements on the single substrate wafer, or attaching one of the second optical elements to the single substrate wafer; One of the two positions and directions uses two processes to manufacture one of the second optical elements together with a single substrate wafer or one of the second optical elements on the single substrate wafer. Or attach one of the second optical elements to the single substrate wafer and then use the first system in a position and direction corresponding to the first specific position and direction Manufacturing one of the first optical elements with the single substrate wafer, or manufacturing one of the first optical elements on the single substrate wafer, or attaching one of the first optical elements To the single substrate wafer.

在表達此實施例的一個面向的嘗試中,可以說的是,倘若是使用對應的製程,亦即,工具、材料和製程參數,第一和第二光學元件被(橫向地)定位成相當靠近,以至 於不可能將它們製造於一個單一的基板晶圓上。並未排除可能利用不同的製程來實現此作業;但這種不同的製程可能為更耗費時間的、更昂貴的、或是更複雜的,例如,具有較小的公差之製程。該一個單一的基板晶圓,在某種程度上,基本上是為用於比較原因的參考。其可能,例如,被想像為一種(雙側為平坦的)晶圓,且光學元件將會表示為以如同其分別在第一和第二間隔晶圓上之橫向上相同的距離(以及對應的位置)以及相同的方向而存在於一個單一個晶圓上或是位在一個單一的晶圓上。然而,為了實現使光學元件以上述的方式存在,如果有可能的話,一個或多個不同的製程將為必須的。 In an oriented attempt to express this embodiment, it can be said that if a corresponding process is used, that is, tools, materials, and process parameters, the first and second optical elements are positioned (laterally) fairly close , And even It is impossible to fabricate them on a single substrate wafer. It is not excluded that different processes may be used to achieve this operation; but such different processes may be more time consuming, more expensive, or more complex, for example, processes with smaller tolerances. This single substrate wafer is, to some extent, basically a reference for comparison reasons. It could, for example, be imagined as a (flat on both sides) wafer, and the optical element would be represented at the same distance in the lateral direction as it would on the first and second spacer wafers (and corresponding Location) and the same direction exist on a single wafer or on a single wafer. However, in order to enable the optical element to exist in the manner described above, if possible, one or more different processes will be necessary.

關於所說明的歸因於製程的空間要求的不可能性,如上述的說明同樣適用之。 Regarding the impossibility of the space requirements attributable to the process, the same applies as described above.

在一實施例中,複數個第一光學元件中的特定一個與複數個第二光學元件中的特定一個之間的橫向距離為小於800微米,特別是,其中,下列情形中的一者係適用:- 該特定的第一光學元件及該特定的第二光學元件均為主動式光學元件,且其中,該橫向距離為小於800微米,特別是小於400微米;- 該特定的第一光學元件及該特定的第二光學元件均為複製的被動式光學元件,且其中,該橫向距離為小於800微米,特別是小於500微米;- 該特定的第一光學元件為主動式光學元件,且該特定的第二光學元件為複製的被動式光學元件, 且其中,該橫向距離為小於800微米,特別是小於600微米,甚至是小於350微米。 In an embodiment, the lateral distance between a specific one of the plurality of first optical elements and a specific one of the plurality of second optical elements is less than 800 micrometers. In particular, one of the following situations applies :-The specific first optical element and the specific second optical element are both active optical elements, and wherein the lateral distance is less than 800 microns, especially less than 400 microns;-the specific first optical element and The specific second optical element is a duplicated passive optical element, and wherein the lateral distance is less than 800 microns, especially less than 500 microns;-the specific first optical element is an active optical element, and the specific The second optical element is a duplicated passive optical element, And, the lateral distance is less than 800 microns, especially less than 600 microns, and even less than 350 microns.

有關於第一及第二基板晶圓的方法可使得令第一和第二光學元件靠近到1毫米以下為可能的,例如,在晶圓級的大量製造中,靠近到300微米以下。 The method related to the first and second substrate wafers makes it possible to bring the first and second optical elements closer to 1 mm, for example, in wafer-level mass manufacturing, closer to 300 microns.

距離通常指得是關於(最接近的)邊緣到邊緣的距離。 Distance is usually referred to as the (closest) edge-to-edge distance.

主動式光學元件可,例如,使用取放的方式(pick-and-place)被放置在晶圓上。 Active optical elements can be placed on a wafer, for example, using a pick-and-place method.

複製的光學元件使用複製技術(例如,模製或浮雕)而被製造出來。 Replicated optical elements are manufactured using replication techniques (eg, molding or embossing).

在一實施例中,第二光學元件為複製的光學元件,每一個第二光學元件係與至少部分地圍繞對應的光學元件之圍繞部一體地形成,在製造對應的第二光學元件的過程中,每一個圍繞部在所應用之相同的複製製程中被製造出來,該方法包括以下的步驟m)在第二基板晶圓中創造複數個開口;其中,藉由執行步驟m),每一個圍繞部的至少一部分被移除。 In one embodiment, the second optical element is a duplicated optical element, and each second optical element is integrally formed with a surrounding portion that at least partially surrounds the corresponding optical element. In the process of manufacturing the corresponding second optical element Each surrounding portion is manufactured in the same copying process as applied. The method includes the following steps m) creating a plurality of openings in the second substrate wafer; wherein, by performing step m), each surrounding portion At least a portion of the part was removed.

尤其是,複製的光學元件可為透鏡元件。 In particular, the reproduced optical element may be a lens element.

可提供的是,所有的第二光學元件及所有的圍繞部使用一個相同的複製製程而被製造出來,例如,在浮雕製程中。 It can be provided that all the second optical elements and all the surrounding parts are manufactured using a same replication process, for example, in a relief process.

特別是,可以在步驟c)所提及的橫向地界定的區域 中創造開口,或是開口的橫向延伸包括在步驟c)所提及的橫向地界定的區域。尤其是,開口的橫向延伸可與前述的開放區域重合。 In particular, the laterally defined areas mentioned in step c) Creating the opening, or the lateral extension of the opening, includes the laterally defined area mentioned in step c). In particular, the lateral extension of the opening may coincide with the aforementioned open area.

該方法可包括使用複製技術來製造第二光學元件的步驟。所有的第二光學元件和所有的圍繞部可使用一個相同的複製製程而被製造出來。 The method may include the step of manufacturing a second optical element using a replication technique. All the second optical elements and all the surrounding parts can be manufactured using a same replication process.

用於此範例的步驟m)使用雷射切割、機械加工、微機械加工、鑽孔中的至少一者來實現。 Step m) for this example is implemented using at least one of laser cutting, machining, micromachining, and drilling.

可提供的是,沿著創造出開口的線的區段(且其限定出開口)穿過圍繞部。 It may be provided that the section along the line that creates the opening (and which defines the opening) passes through the surrounding portion.

需注意的是,「一體地形成」的部分(整體部分)亦可被描述為連續的(完整的)部分,以及描述為至少在其鄰接之處被由相同的材料所製成的部分。 It should be noted that the “integrated” part (the whole part) can also be described as a continuous (complete) part, and a part made of the same material at least at its abutment.

圍繞部的存在尤其可以歸因於製造第二光學元件的方式,例如,當像是浮雕製程的複製製程被使用來製造第二光學元件時。 The presence of the surrounding part can be attributed in particular to the manner in which the second optical element is manufactured, for example, when a replication process like a relief process is used to manufacture the second optical element.

在光學模組中,圍繞部通常沒有或至少沒有所需的光學功能。 In an optical module, the surrounding portion usually does not have or at least does not have the required optical functions.

在此實施例中(包含步驟m)),在第二基板晶圓中的開口通常在第二光學元件被建立於第二基板晶圓、或附接到第二基板晶圓、或位在第二基板晶圓之後才被創造。 In this embodiment (including step m)), the opening in the second substrate wafer is usually formed when the second optical element is built on the second substrate wafer, or is attached to the second substrate wafer, or located on the second substrate wafer. Two substrate wafers were created later.

然而,一般來說,可選擇性地提供的是,第二光學元件僅在第二基板晶圓中的開口被創造之後被建立於第二基板晶圓、或附接到第二基板晶圓、或位在第二基板晶圓。 However, in general, it is optionally provided that the second optical element is built on the second substrate wafer or attached to the second substrate wafer only after the opening in the second substrate wafer is created, Or located on the second substrate wafer.

在一實施例中,導體路徑於材料區域中存在於第一基板晶圓的頂側上。更具體地,導體路徑可存在於被第二光學元件所佔據之橫向地界定的區域中。 In one embodiment, the conductor path exists on the top side of the first substrate wafer in the material region. More specifically, the conductor path may exist in a laterally defined area occupied by the second optical element.

這通常意味著是步驟d)之後,或在步驟d)中所提到的橫向對齊的情況。 This usually means the situation after step d), or the lateral alignment mentioned in step d).

由於在導體路徑上的複製可能造成困難,本實施例特別是在第二光學元件為複製的光學元件的情況下可為有利的。 Since replication on a conductor path may cause difficulties, this embodiment may be advantageous particularly if the second optical element is a duplicated optical element.

在一實施例中,在步驟d)所提及的橫向對齊中,一個相同的光學模組之第一和第二光學元件之間的空間不存在光學模組的任何進一步的零件或部件,至少遠離第二基板晶圓之選擇性地存在的部分,及/或遠離選擇性地存在於第一基板晶圓的頂側之黏合劑。 In an embodiment, in the lateral alignment mentioned in step d), the space between the first and second optical elements of the same optical module does not have any further parts or components of the optical module, at least A portion that is selectively present away from the second substrate wafer and / or an adhesive that is selectively present on the top side of the first substrate wafer.

以此方式,相較於某些物件存在於第一及第二光學元件之間的情況,第一及第二光學元件通常可被定位成更靠近彼此。 In this way, the first and second optical elements can generally be positioned closer to each other than if some objects exist between the first and second optical elements.

尤其是,可提供的是,在一個相同的光學模組之第一和第二光學元件之間不存在有進一步的光學元件。 In particular, it may be provided that there are no further optical elements between the first and second optical elements of the same optical module.

還可能提供的是,在一個相同的光學模組之第一和第二光學元件之間(的空間中),不存在有更多晶圓的部分。 It may also be provided that between the first and second optical elements of the same optical module (in the space), there is no portion where there are more wafers.

在一實施例中,第二基板晶圓具有一輪廓,其具備相對於垂直方向傾斜的切割線。 In one embodiment, the second substrate wafer has a profile including a cutting line inclined with respect to a vertical direction.

特別是,可提供的是,在第二基板晶圓和第一基板晶 圓的頂側之間建立底切槽。 In particular, it can be provided that the second substrate wafer and the first substrate crystal Undercuts are created between the top and side of the circle.

垂直方向指得是由第二基板所界定出的垂直方向。 The vertical direction refers to a vertical direction defined by the second substrate.

輪廓(在包含垂直的平面中)可為使得下部邊緣(其更靠近第一基板晶圓,位在第二基板晶圓的底側)相較於上部邊緣(在第二基板晶圓的頂側)突出較少到第二基板晶圓中的開口內。 The profile (in a plane containing a vertical plane) may be such that the lower edge (which is closer to the first substrate wafer and located on the bottom side of the second substrate wafer) than the upper edge (on the top side of the second substrate wafer) ) Protrudes less into the opening in the second substrate wafer.

這可使得將第一及第二光學元件定位成非常靠近於彼此為可能的。 This may make it possible to position the first and second optical elements very close to each other.

單一化的步驟(或切割步驟)可被執行,以從晶圓堆疊得到獨立的(單一的)光學模組。 A singulation step (or dicing step) can be performed to obtain a separate (single) optical module from the wafer stack.

用途為在此所說明的方法的使用(參照特別是上述的說明),用於減少一個相同的光學模組之第一和第二光學元件之間的橫向距離,或是用於使一個相同的光學模組之第一和第二光學元件之間的橫向距離小於僅使用單一的晶圓(在此單一的晶圓上,第一和第二光學元件由於對應的製程而存在且位在對應的位置和方向)所能達成的距離。 The purpose is to use the method described herein (refer to the above description in particular), to reduce the lateral distance between the first and second optical elements of an identical optical module, or to make an identical The lateral distance between the first and second optical elements of the optical module is less than using only a single wafer (on this single wafer, the first and second optical elements exist due to the corresponding process and are located in the corresponding Location and direction).

換言之,藉由兩個基板晶圓的使用,特別是如上所述的,光學元件可被(橫向地)盡可能地相互靠近,如同僅在單一晶圓(取代所提出的兩個互連的晶圓)上可達成的一般(前提是沒有其他用於附接或製造光學元件的技術被使用在單一晶圓上)。 In other words, with the use of two substrate wafers, especially as described above, the optical elements can be (horizontally) as close to each other as possible, as if only on a single wafer (instead of the proposed two interconnected crystals) Circle) (provided no other techniques for attaching or manufacturing optical components are used on a single wafer).

因此,所說明的方法可被使用來實現的是,一個相同的光學模組之第一和第二光學元件被以特別小的相互距離來定位,亦即,小於在僅有單一的晶圓將被用於第一和第 二光學元件兩者的情況下可達成的距離。 Therefore, the method described can be used to achieve that the first and second optical elements of an identical optical module are positioned with a particularly small mutual distance, that is, less than that in a single wafer Used for first and second The distance that can be achieved in the case of both optical elements.

此外,此距離亦可為小於在將第一和第二基板晶圓互連之後(參照上述的步驟d)),將第一和第二光學元件分別與第一和第二基板晶圓一起製造、或分別製造於第一和第二基板晶圓上、或分別附接於第一和第二基板晶圓的情況下的距離。 In addition, this distance may be smaller than that after the first and second substrate wafers are interconnected (refer to step d) above), the first and second optical elements are manufactured together with the first and second substrate wafers, respectively. , Or the distances in the case of being manufactured on the first and second substrate wafers, or being attached to the first and second substrate wafers, respectively.

本發明還包括光學模組。 The invention also includes an optical module.

光學模組包括- 第一基板,具有第一光學元件存在於其上的頂側;- 第二基板,具有底側;其中,第一基板和第二基板被互連,使得第一基板的頂側面對第二基板的底側,且第二基板在被稱作垂直方向的方向上被堆疊到第一基板上;其中,第二基板具有- 材料區域,其為第二基板的材料存在於其中的橫向地界定的區域,且第二光學元件存在於材料區域中;以及- 至少一開放區域,其為沒有第二基板的材料存在於其中的橫向地界定的區域;其中,第一光學元件被橫向地定位在開放區域中。 The optical module includes-a first substrate having a top side on which the first optical element is present;-a second substrate having a bottom side; wherein the first substrate and the second substrate are interconnected such that the top of the first substrate The side faces the bottom side of the second substrate, and the second substrate is stacked on the first substrate in a direction called a vertical direction; wherein the second substrate has a material region in which the material of the second substrate exists And a second optical element exists in the material region; and-at least one open region is a laterally defined region in which no material of the second substrate exists; wherein the first optical element is Positioned laterally in the open area.

「橫向」指得是垂直於垂直方向的方向。 "Landscape" refers to the direction perpendicular to the vertical direction.

第二基板特別是橫向地成形為留下用於第一光學元件的開放空間。 The second substrate is shaped in particular laterally to leave an open space for the first optical element.

材料區域及開放區域通常是為了互補由第一基板所佔據的橫向區域及/或互補由光學模組所佔據的橫向區域。 The material region and the open region are generally used to complement the lateral region occupied by the first substrate and / or to complement the lateral region occupied by the optical module.

通常,第二基板具有不超過一個的單一連續的材料區域。 Generally, the second substrate has no more than a single continuous material region.

一般而言,第二光學元件存在於第二基板,例如,存在於第二基板上或第二基板中。例如,第二光學元件被安裝於第二基板的頂側上,其中,該頂側係相對於第二基板的底側;或者,第二光學元件被整合到或附接於第二基板,例如,至少部分地被垂直地定位在第二基板的頂側和底側之間。 Generally, the second optical element is present on the second substrate, for example, on or in the second substrate. For example, the second optical element is mounted on a top side of the second substrate, wherein the top side is opposite to the bottom side of the second substrate; or, the second optical element is integrated into or attached to the second substrate, such as Is at least partially vertically positioned between the top and bottom sides of the second substrate.

第一基板和第二基板之間的互連可,例如,藉由黏合或藉由提供形狀配合(form-fitting)連接,而被實現。 The interconnection between the first substrate and the second substrate may be achieved, for example, by gluing or by providing a form-fitting connection.

在一實施例中,第一光學元件被橫向地定位在第一區域中,且第二光學元件被橫向地定位在第二區域中,其中,第一區域與第二區域並未重疊。 In an embodiment, the first optical element is positioned laterally in the first region, and the second optical element is positioned laterally in the second region, wherein the first region and the second region do not overlap.

在一實施例中,光學模組還包括第三基板和第一間隔物,其中,第一間隔物存在於第一基板和第三基板之間,更具體地存在於第二基板和第三基板之間,且其中,第一間隔物為選擇性地與第三基板為連續的,例如,與第三基板為一體地形成的。 In an embodiment, the optical module further includes a third substrate and a first spacer, wherein the first spacer exists between the first substrate and the third substrate, and more specifically exists between the second substrate and the third substrate. Between, and wherein, the first spacer is selectively continuous with the third substrate, for example, integrally formed with the third substrate.

在一實施例中,光學模組包括第二間隔物,第二間隔物從相對於第二基板的底側之第二基板的頂側延伸到相對於從第二基板的底側指向第一基板的頂側之方向的方向中,其中,第二間隔物為選擇性地與第二基板為連續的, 尤其是與第二基板為一體地形成的。 In an embodiment, the optical module includes a second spacer extending from a top side of the second substrate opposite to a bottom side of the second substrate to pointing toward the first substrate from a bottom side of the second substrate. In the direction of the top-side direction, wherein the second spacer is selectively continuous with the second substrate, In particular, it is formed integrally with the second substrate.

在參照最後兩個強調的實施例中的一個實施例中,第二間隔物與第三基板間隔一距離。 In one of the embodiments highlighted with reference to the last two, the second spacer is spaced a distance from the third substrate.

在一實施例中,沒有光學模組的零件或部件存在於第一和第二光學元件之間,至少遠離第二基板之選擇性地存在的部分、及/或遠離選擇性地存在於第一基板的頂側上之黏合劑。 In an embodiment, no part or component of the optical module exists between the first and second optical elements, at least away from the selectively existing part of the second substrate, and / or away from the first selectively existing part. Adhesive on the top side of the substrate.

更具體地,可提供的是,沒有模組的零件或部件存在於在第一基板的頂側上或在第二基板的頂側上的第一及第二光學元件之間;同樣除了可能選擇性地存在的黏合劑以外。 More specifically, it can be provided that no parts or components of the module exist between the first and second optical elements on the top side of the first substrate or on the top side of the second substrate; likewise except that it is possible to choose Except for adhesives that are present sexually.

第二基板的頂側相對於第二基板的底側。 The top side of the second substrate is opposite to the bottom side of the second substrate.

類似地,也可以說第一及第二光學元件之間的空間不存在任何光學模組的零件或部件,除了可能用於第二基板的部分或黏合劑以外,特別是,在第一和第二光學元件之間的該空間中,第一基板的頂側和第二基板的頂側不存在任何光學模組的零件或部件,除了可能用於第二基板的部分或黏合劑以外。 Similarly, it can also be said that there is no part or component of the optical module in the space between the first and second optical elements, except for the part or adhesive that may be used for the second substrate, in particular, the first and second In this space between the two optical elements, there are no optical module parts or components on the top side of the first substrate and the top side of the second substrate, except for the part or adhesive that may be used for the second substrate.

特別是,上面所述之「光學模組的零件或部件」可能表示光學模組的基板的一部分及/或光學模組的另一光學元件。未排除可能存在的黏合劑存在於第一及第二光學元件之間的可能性。 In particular, the “part or component of an optical module” described above may represent a part of a substrate of an optical module and / or another optical element of the optical module. The possibility that a possible adhesive is present between the first and second optical elements is not excluded.

本發明還包括具備根據本發明之對應的方法的特徵之光學模組,且反之,本發明亦包括具備根據本發明之對應 的光學模組的特徵之方法。 The present invention also includes an optical module having the features of the corresponding method according to the present invention, and conversely, the present invention also includes a corresponding Method of optical module characteristics.

本發明亦包括晶圓堆疊,一方面,晶圓堆疊包括複數個根據本發明之光學模組;另一方面:晶圓堆疊包括- 第一基板晶圓,複數個第一光學元件存在於第一基板晶圓的頂側上;- 第二基板晶圓,具有材料區域,其係為第二基板的材料存在於其中之連續橫向地界定的區域,其中,複數個第二光學元件存在於此材料區域中;其中,第一基板晶圓的頂側面對第二基板晶圓的底側,且在其間沒有其他的晶圓,且其中,第一光學元件的每一者存在於不與材料區域重疊之橫向地界定的區域中。 The present invention also includes wafer stacking. On the one hand, the wafer stack includes a plurality of optical modules according to the present invention; on the other hand: the wafer stack includes-a first substrate wafer, and a plurality of first optical elements exist in the first On the top side of the substrate wafer;-a second substrate wafer having a material region which is a continuously laterally defined region in which the material of the second substrate is present, wherein a plurality of second optical elements are present in this material Region; wherein the top side of the first substrate wafer faces the bottom side of the second substrate wafer, and there are no other wafers therebetween, and wherein each of the first optical elements exists in a region that does not overlap the material In a laterally defined area.

本發明還包括晶圓堆疊,其具備對應的方法之特徵或根據本發明的光學模組,且反之,本發明亦包括具備根據本發明之對應的晶圓堆疊的特徵之方法及光學模組。 The invention also includes a wafer stack, which has the features of the corresponding method or the optical module according to the invention, and conversely, the invention also includes a method and the optical module, which have the features of the corresponding wafer stack according to the invention.

並且,本發明包括包含根據本發明的光學模組或使用根據本發明的方法來製造的光學模組之裝置。 Further, the present invention includes a device including an optical module according to the present invention or an optical module manufactured using the method according to the present invention.

在一實施例中,裝置還包括印刷電路板,光學模組係安裝於此印刷電路板上。 In one embodiment, the device further includes a printed circuit board, and the optical module is mounted on the printed circuit board.

尤其是,裝置可為下列之至少一者- 攜帶式或行動計算裝置;- 智慧型手機;- 平板電腦;- 數位閱讀器; - 攝像裝置;- 數位相機;- 遊戲控制器;- 感測裝置;- 感測器。 In particular, the device may be at least one of the following:-a portable or mobile computing device;-a smartphone;-a tablet computer;-a digital reader; -Camera;-Digital camera;-Game controller;-Sensing device;-Sensor.

進一步的實施例及優勢從申請專利範圍的附屬項及圖式來呈現。 Further embodiments and advantages are presented from the dependent items and drawings of the patent application scope.

50‧‧‧開口 50‧‧‧ opening

55‧‧‧開口 55‧‧‧ opening

60‧‧‧圍繞部 60‧‧‧surrounding

70‧‧‧切割線 70‧‧‧cut line

77‧‧‧底切槽 77‧‧‧ Undercut

81‧‧‧取放工具 81‧‧‧Pick and place tools

82‧‧‧複製工具 82‧‧‧ Copy Tool

C1‧‧‧光學元件 C1‧‧‧optical element

C1’‧‧‧光學元件 C1’‧‧‧Optical Element

C2‧‧‧光學元件 C2‧‧‧optical element

C3‧‧‧光學元件 C3‧‧‧optical element

C3’‧‧‧光學元件 C3’‧‧‧Optical element

d‧‧‧橫向距離 d‧‧‧horizontal distance

M‧‧‧光學模組 M‧‧‧ Optical Module

P1‧‧‧間隔晶圓 P1‧‧‧spaced wafer

S1‧‧‧第一基板晶圓 S1‧‧‧First substrate wafer

S2‧‧‧第二基板晶圓 S2‧‧‧Second substrate wafer

S2’‧‧‧母材 S2’‧‧‧ mother material

S3‧‧‧基板晶圓 S3‧‧‧ substrate wafer

Sx‧‧‧晶圓 Sx‧‧‧ Wafer

t1‧‧‧透明部 t1‧‧‧Transparent Department

t2‧‧‧透明部 t2‧‧‧Transparent Department

tx‧‧‧透明部 tx‧‧‧Transparent Department

W‧‧‧晶圓堆疊 W‧‧‧ Wafer Stack

以下,本發明藉由範例及所包含的圖式被詳細地說明。圖式示意性地顯示:圖1為包含第一和第二基板晶圓的晶圓堆疊之細節的俯視圖;圖2為可從圖1的晶圓堆疊得到的光學模組之部分的側視圖;圖3為可從圖1的晶圓堆疊得到的光學模組之部分的截面圖;圖4為可從包含圖1的晶圓堆疊之晶圓堆疊得到的光學模組之側視圖;圖5為可從包含圖1的晶圓堆疊之晶圓堆疊得到的光學模組之截面圖;圖6為包含第一和第二基板晶圓的晶圓堆疊之細節的俯視圖;圖7為可從圖6的晶圓堆疊得到的光學模組之部分的 側視圖;圖8為可從包含圖6的晶圓堆疊之晶圓堆疊得到的光學模組之側視圖;圖9為可從包含圖6的晶圓堆疊之晶圓堆疊得到的光學模組之側視圖;圖10為包含第一和第二基板晶圓的晶圓堆疊之細節的俯視圖;圖11為可從圖10的晶圓堆疊得到的光學模組之部分的側視圖;圖12為可從包含圖10的晶圓堆疊之晶圓堆疊得到的光學模組之側視圖;圖13為可從包含圖10的晶圓堆疊之晶圓堆疊得到的光學模組之側視圖;圖14為包含第一和第二基板之光學模組的部分之截面圖;圖15為包含第一和第二基板之光學模組的部分之截面圖;圖16為包含第一和第二基板之光學模組的部分之截面圖;圖17為用於顯示空間需求之光學模組的部分之俯視圖;圖18為用於顯示空間需求之晶圓堆疊的部分之截面圖;圖19為用於顯示空間需求之晶圓堆疊的部分之截面 圖;圖20為用於顯示空間需求之晶圓堆疊的部分之截面圖;圖21為具有於其上被製造之第二光學元件的第二基板晶圓之母材的部分之截面圖;圖22為其上具有第二光學元件之圖21的第二基板晶圓之部分的截面圖,用於顯示開口的創造及同時移除第二光學元件的圍繞部之部分;圖23為包含具有圖22之於其上被製造之第二光學元件的第二基板晶圓的部分之光學模組的部分之截面圖;圖24為具有建立底切槽的第二基板之光學模組的部分之截面圖;所說明的實施例僅用作範例,且不應限制本發明。 Hereinafter, the present invention will be described in detail with examples and drawings included. The drawing schematically shows: FIG. 1 is a top view of a detail of a wafer stack including first and second substrate wafers; FIG. 2 is a side view of a portion of an optical module obtainable from the wafer stack of FIG. 1; 3 is a cross-sectional view of a portion of an optical module that can be obtained from the wafer stack of FIG. 1; FIG. 4 is a side view of the optical module that can be obtained from a wafer stack including the wafer stack of FIG. 1; A cross-sectional view of an optical module that can be obtained from a wafer stack including the wafer stack of FIG. 1; FIG. 6 is a top view of a detail of a wafer stack including first and second substrate wafers; Of the optical module obtained by stacking the wafers FIG. 8 is a side view of an optical module obtainable from a wafer stack including the wafer stack of FIG. 6; FIG. 9 is a view of an optical module obtainable from a wafer stack including the wafer stack of FIG. 6; Side view; FIG. 10 is a top view of a detail of a wafer stack including first and second substrate wafers; FIG. 11 is a side view of a portion of an optical module that can be obtained from the wafer stack of FIG. 10; Fig. 13 is a side view of an optical module obtained from a wafer stack including the wafer stack of Fig. 10; Fig. 13 is a side view of an optical module obtained from a wafer stack including the wafer stack of Fig. 10; A cross-sectional view of a portion of an optical module of a first and second substrate; FIG. 15 is a cross-sectional view of a portion of an optical module including a first and second substrate; FIG. 16 is an optical module including a first and second substrate 17 is a plan view of a portion of an optical module used to display space requirements; FIG. 18 is a cross-sectional view of a portion of a wafer stack used to display space requirements; and FIG. 19 is used to display space requirements. Cross section of a wafer stack FIG. 20 is a cross-sectional view of a portion of a wafer stack used to show space requirements; FIG. 21 is a cross-sectional view of a portion of a base material of a second substrate wafer having a second optical element manufactured thereon; 22 is a cross-sectional view of a portion of the second substrate wafer of FIG. 21 having a second optical element thereon, and is used to show the creation of an opening and a portion of a surrounding portion where the second optical element is removed at the same time; 22 is a sectional view of a portion of an optical module of a portion of a second substrate wafer on which a second optical element is manufactured; FIG. 24 is a sectional view of a portion of an optical module of a second substrate having an undercut groove Figures; the illustrated embodiments are for illustration only and should not limit the invention.

圖1示意性地顯示包含第一基板晶圓S1和第二基板晶圓S2的晶圓堆疊W之細節的俯視圖。圖2為可從圖1的晶圓堆疊得到的光學模組M之部分的側視示意圖。且圖3為可從圖1的晶圓堆疊得到的光學模組M之部分的截面示意圖。藉由虛線及空心的箭頭在圖1中指示出截面的大概位置。 FIG. 1 schematically shows a top view of a detail of a wafer stack W including a first substrate wafer S1 and a second substrate wafer S2. FIG. 2 is a schematic side view of a portion of the optical module M that can be obtained from the wafer stack of FIG. 1. 3 is a schematic cross-sectional view of a portion of an optical module M that can be obtained from the wafer stack of FIG. 1. The approximate position of the cross section is indicated in FIG. 1 by dashed and hollow arrows.

圖1、6及10中外部的箭頭指示分離線(separation line),亦稱作為切割線(dicing line),其同樣被繪示於各圖式中。 The external arrows in Figures 1, 6, and 10 indicate the separation line, also known as the dicing line, which is also shown in the drawings.

藉由將晶圓堆疊分離所得到的在光學模組中的晶圓部分被參照到各晶圓的標號。這些晶圓部分亦稱作為基板(在基板晶圓的情況下)或稱作為間隔物(在間隔晶圓的情況下)。 The wafer portion in the optical module obtained by separating and stacking the wafers is referred to the number of each wafer. These wafer portions are also referred to as a substrate (in the case of a substrate wafer) or as a spacer (in the case of a spacer wafer).

在晶圓S1上,存在光學元件C1,而在晶圓S2上,存在光學元件C2。晶圓S1、S2藉由,例如,將其相互貼合(例如,使用黏合劑),而被互連。晶圓S1的頂面面對晶圓S2的底面,且在所繪示的情況下,甚至是接觸晶圓S2的底面,其中,黏合劑可能存在於晶圓S1和晶圓S2之間。為了提供用於光學元件C1的空間,開口50(尤其是,通孔)設置在晶圓S2中。光學元件C1(或其至少部分)係被晶圓S2的材料橫向地圍繞。光學元件C1突出到開口50中。 On the wafer S1, there is an optical element C1, and on the wafer S2, there is an optical element C2. The wafers S1 and S2 are interconnected by, for example, attaching them to each other (for example, using an adhesive). The top surface of the wafer S1 faces the bottom surface of the wafer S2, and in the case shown, even contacts the bottom surface of the wafer S2, wherein an adhesive may exist between the wafer S1 and the wafer S2. In order to provide a space for the optical element C1, an opening 50 (especially, a through hole) is provided in the wafer S2. The optical element C1 (or at least a portion thereof) is laterally surrounded by the material of the wafer S2. The optical element C1 projects into the opening 50.

晶圓S1及S2可被個別地製造,且在形成包含晶圓S1及S2的晶圓堆疊W之前,可在晶圓S1及S2分別設有各自的光學元件C1、C2。 The wafers S1 and S2 may be individually manufactured, and before forming the wafer stack W including the wafers S1 and S2, respective optical elements C1 and C2 may be provided on the wafers S1 and S2, respectively.

圖4為可從包含圖1的晶圓堆疊W的晶圓堆疊所得到的光學模組M之側視示意圖。圖5為圖4之光學模組M的截面示意圖。在此情況下,在將晶圓堆疊分離成複數個光學模組M之前,兩個進一步的晶圓,也就是另一個基板晶圓S3以及間隔晶圓P1,被設置(且堆疊在晶圓S1、S2上)。基板S3通常包括至少一個光學元件C3,且在圖4及圖5的範例中,基板S3包括兩個光學元件C3、C3’。 FIG. 4 is a schematic side view of an optical module M obtainable from a wafer stack including the wafer stack W of FIG. 1. FIG. 5 is a schematic cross-sectional view of the optical module M of FIG. 4. In this case, before the wafer stack is separated into a plurality of optical modules M, two further wafers, that is, another substrate wafer S3 and a spacer wafer P1, are set (and stacked on the wafer S1). , S2). The substrate S3 generally includes at least one optical element C3, and in the examples of FIGS. 4 and 5, the substrate S3 includes two optical elements C3, C3 '.

間隔晶圓P1從晶圓S2(更精確地,從晶圓S2的頂側)垂直地延伸到晶圓S3(更精確地,到晶圓S3的底側),且因此界定出晶圓S2與晶圓S3之間的垂直距離,其中,亦可能存在黏合劑。 The spacer wafer P1 extends vertically from the wafer S2 (more precisely, from the top side of the wafer S2) to the wafer S3 (more precisely, to the bottom side of the wafer S3), and thus defines the wafer S2 and The vertical distance between the wafers S3, wherein an adhesive may also be present.

此外,間隔晶圓P1具有開口55,或更具體地,具有通孔,光學元件C2存在於其中。更具體地,光學元件C2(或其至少部分)被間隔晶圓P1橫向地圍繞。光學元件C3’亦存在於開口55內。 Further, the spacer wafer P1 has an opening 55, or more specifically, a through hole, and an optical element C2 is present therein. More specifically, the optical element C2 (or at least a portion thereof) is laterally surrounded by the spacer wafer P1. An optical element C3 'is also present in the opening 55.

光之折疊的光學路徑可藉由光學元件C1、C2、C3、C3’被界定出來。 The optical path of the folded light can be defined by the optical elements C1, C2, C3, C3 '.

光學元件C1可為,例如,像是光二極體的光偵測器、或影像感測器。 The optical element C1 may be, for example, a light detector such as a photodiode, or an image sensor.

光學元件C2可為,例如,鏡或光柵。 The optical element C2 may be, for example, a mirror or a grating.

光學元件C3可為,例如,透鏡或透鏡元件。 The optical element C3 may be, for example, a lens or a lens element.

光學元件C3’可為,例如,曲面鏡或曲面光柵。 The optical element C3 'may be, for example, a curved mirror or a curved grating.

可能提供的是,沒有光學元件存在於這些晶圓之一的側部,此側部在分離為單一光學模組之後為光學模組的外側。特別是,例如,在圖4及圖5的範例中,晶圓S1及S3之最頂部的晶圓的頂側和最底部晶圓的底側分別可不具有光學元件。例如,參照圖4及圖5,光學元件C3可以是完全不存在或可被配置在開口55內。這種光學模組可為特別堅固的。 It may be provided that no optical element exists on the side of one of these wafers, and this side is the outside of the optical module after being separated into a single optical module. In particular, for example, in the examples of FIGS. 4 and 5, the top side of the topmost wafer and the bottom side of the bottommost wafer of the wafers S1 and S3 may not have optical elements, respectively. For example, referring to FIGS. 4 and 5, the optical element C3 may be completely absent or may be disposed in the opening 55. Such an optical module may be particularly robust.

需注意的是,可以提供的是,光學模組M的外殼主要或甚至是完全地藉由模組的晶圓之區段來建立,例如, 藉由模組的基板及/或間隔物。這種光學模組可進一步地被密封封閉。 It should be noted that it can be provided that the housing of the optical module M is mainly or even completely established by the section of the wafer of the module, for example, By the substrate and / or spacer of the module. Such an optical module can be further hermetically sealed.

在圖4及圖5的範例中,外殼係實質上由晶圓S1、S2、S3及P1的區段來建立。 In the examples of FIGS. 4 and 5, the housing is substantially established by the sections of the wafers S1, S2, S3 and P1.

如圖1至5的範例所示,可提供的是,晶圓S2延伸通過所有的切割線,及/或僅在分離線外部具有開口5(或開口部)。例如,晶圓S2具有僅用於存在於晶圓S1上的光學元件之開口,且這些開口橫向地完全圍繞這些光學元件(像是圖1中的光學元件C1),尤其是在各個光學模組M當中。 As shown in the examples of FIGS. 1 to 5, it can be provided that the wafer S2 extends through all the cutting lines and / or has an opening 5 (or an opening portion) only outside the separation line. For example, wafer S2 has openings only for optical elements existing on wafer S1, and these openings completely surround these optical elements laterally (such as optical element C1 in FIG. 1), especially in each optical module M.

這種基板S2可具有相當高的機械穩定性,但其包括相對大量的材料。 Such a substrate S2 may have relatively high mechanical stability, but it includes a relatively large amount of material.

圖6和7以及圖10和11顯示基板晶圓S2的範例,其係橫向地佔據相對少的空間,且其包括相對少量的材料(相較於圖1的範例)。 FIGS. 6 and 7 and FIGS. 10 and 11 show examples of the substrate wafer S2, which occupy a relatively small amount of space laterally and include a relatively small amount of material (compared to the example of FIG. 1).

圖6為對於包含第一及第二基板晶圓S1、S2之晶圓堆疊W的細節之俯視示意圖。圖7為可從圖6之晶圓堆疊得到的光學模組M的部分之側視圖。 FIG. 6 is a schematic top plan view of details of a wafer stack W including first and second substrate wafers S1, S2. FIG. 7 is a side view of a portion of the optical module M that can be obtained from the wafer stack of FIG. 6.

相較於每個光學元件僅一個開口50,圖6的晶圓S2具有更多的開口。且這些開口50中僅一個開口50圍繞光學元件C1,且並非完全圍繞而僅僅是部分圍繞。 Compared to only one opening 50 per optical element, the wafer S2 of FIG. 6 has more openings. And only one of the openings 50 surrounds the optical element C1 and is not completely surrounded but only partially surrounded.

圖8及圖9為可從包含圖6的光學堆疊之光學堆疊得到的光學模組之側視示意圖。類似於圖4所顯示的情形,間隔晶圓P1及第三基板晶圓S3被提供。 8 and 9 are schematic side views of an optical module obtainable from an optical stack including the optical stack of FIG. 6. Similar to the situation shown in FIG. 4, a spacer wafer P1 and a third substrate wafer S3 are provided.

類似於圖4的情形,間隔晶圓P1可坐落在基板晶圓S2上,且延伸到晶圓S3。但考慮到基板S2的形狀,參照圖6,可能導致低的機械穩定性。因此,間隔晶圓P1可靠在晶圓S1及晶圓S2兩者上,如圖8所示,或者間隔晶圓P1可僅靠在晶圓S1上,如圖9所示。 Similar to the situation of FIG. 4, the spacer wafer P1 may be located on the substrate wafer S2 and extended to the wafer S3. However, considering the shape of the substrate S2, referring to FIG. 6, it may result in low mechanical stability. Therefore, the spacer wafer P1 is reliably on both the wafer S1 and the wafer S2, as shown in FIG. 8, or the spacer wafer P1 can only rest on the wafer S1, as shown in FIG.

圖10為對於包含第一及第二基板晶圓S1、S2之晶圓堆疊W的細節之俯視示意圖。圖11為可從圖10之晶圓堆疊得到的光學模組的部分之側視圖。 FIG. 10 is a schematic top plan view of details of a wafer stack W including first and second substrate wafers S1, S2. FIG. 11 is a side view of a portion of an optical module that can be obtained from the wafer stack of FIG. 10.

圖12及圖13為可從包含圖10的光學堆疊之光學堆疊得到的光學模組之側視示意圖。類似於圖4及圖8和9所顯示的情形,間隔晶圓P1及第三基板晶圓S3被提供。 12 and 13 are schematic side views of an optical module that can be obtained from an optical stack including the optical stack of FIG. 10. Similar to the situation shown in FIG. 4 and FIGS. 8 and 9, a spacer wafer P1 and a third substrate wafer S3 are provided.

類似於圖4的情形,間隔晶圓P1可坐落在基板晶圓S2上,且延伸到晶圓S3。但考慮到基板S2的形狀,參照圖10,可能導致低的機械穩定性。因此,間隔晶圓P1可靠在晶圓S1及晶圓S2兩者上,如圖12所示,或者間隔晶圓P1可僅靠在晶圓S1上,如圖13所示。 Similar to the situation of FIG. 4, the spacer wafer P1 may be located on the substrate wafer S2 and extended to the wafer S3. However, considering the shape of the substrate S2, referring to FIG. 10, low mechanical stability may be caused. Therefore, the spacer wafer P1 is reliably on both the wafer S1 and the wafer S2, as shown in FIG. 12, or the spacer wafer P1 can only rest on the wafer S1 as shown in FIG.

圖14至16示意性地顯示包含第一及第二基板S1、S2之光學模組的部分之截面圖。這些圖式主要應顯示光學元件C1、C2的不同類型及位置(定位),以及其他可能的特徵。所描述的特性及特徵可被獨立地應用或提供,亦即,它們不一定要以所顯示的方式被組合。 14 to 16 schematically show cross-sectional views of portions of an optical module including first and second substrates S1, S2. These drawings should mainly show the different types and positions (positioning) of the optical elements C1, C2, and other possible features. The described features and characteristics may be applied or provided independently, that is, they do not necessarily have to be combined in the manner shown.

圖14顯示被整合到基板S2中的光學元件C2。還顯示出存在於基板S2的頂面和底面之間的光學元件C2。此外,圖14顯示反射光學元件C2的範例,C2為,例如, 曲面鏡。 FIG. 14 shows the optical element C2 integrated into the substrate S2. Also shown is an optical element C2 present between the top and bottom surfaces of the substrate S2. In addition, FIG. 14 shows an example of the reflective optical element C2, which is, for example, Curved mirror.

此外,圖14顯示延伸或突出通過基板S2中的開口50之光學元件C1。 In addition, FIG. 14 shows the optical element C1 extending or protruding through the opening 50 in the substrate S2.

圖15顯示透射光學元件C1的範例。且其顯示光學元件C1為被動式光學元件(像是所顯示的透鏡元件)的範例。 FIG. 15 shows an example of the transmission optical element C1. The display optical element C1 is an example of a passive optical element (such as a displayed lens element).

此外,圖15顯示基板S1具有透明部t1的範例,透明部t1可為開口或由像是玻璃或透明的聚合物之透明的固體材料所製成的。 In addition, FIG. 15 shows an example in which the substrate S1 has a transparent portion t1. The transparent portion t1 may be an opening or made of a transparent solid material such as glass or a transparent polymer.

圖16顯示基板S1具有透明部t1以及晶圓S2具有橫向地對齊之透明部t2的範例。 FIG. 16 shows an example in which the substrate S1 has a transparent portion t1 and the wafer S2 has a transparent portion t2 aligned laterally.

圖16亦顯示透射光學元件C2的範例。且其顯示出光學元件C2為像是所顯示的透鏡元件之被動式光學元件的範例。 FIG. 16 also shows an example of the transmission optical element C2. And it shows that the optical element C2 is an example of a passive optical element like a displayed lens element.

此外,圖16顯示在基板S1上提供(尤其是在其底側)另一光學元件C1’的可能性的範例。 In addition, FIG. 16 shows an example of the possibility of providing another optical element C1 'on the substrate S1, especially on its bottom side.

圖17為對於用於顯示空間需求的光學模組之部分的俯視示意圖。第二光學元件C2具有到第一光學元件C1的橫向距離d。藉由先提供分別具有第一及第二光學元件C1、C2的第一及第二基板晶圓S1、S2,並接著將第一及第二基板晶圓S1、S2互連,能夠實現距離d,其小於在第一及/或第二光學元件於互連晶圓S1、S2之後與各自的晶圓一起被製造、或被製造於各自的晶圓上、或被附接到各自的晶圓的情況下可實現的距離。並且,可能實現距 離d,其係小於在第一及第二光學元件與單一晶圓一起被製造、或被製造於單一晶圓上、或被附接到單一晶圓的情況下可實現的距離。 FIG. 17 is a schematic top view of a part of an optical module for displaying space requirements. The second optical element C2 has a lateral distance d to the first optical element C1. By first providing first and second substrate wafers S1, S2 having first and second optical elements C1, C2, respectively, and then interconnecting the first and second substrate wafers S1, S2, the distance d can be achieved , Which is smaller than that when the first and / or second optical elements are manufactured with the respective wafers after the interconnecting wafers S1, S2, or are manufactured on the respective wafers, or are attached to the respective wafers The achievable distance. And, it is possible to achieve distance The distance d is smaller than the distance that can be achieved if the first and second optical elements are manufactured together with a single wafer, or are manufactured on a single wafer, or are attached to a single wafer.

這可歸因於所使用的製程之空間需求。在圖17中,分別圍繞光學元件C1及C2的虛線圓圈非常示意性地繪示出這樣的空間需求,或更精確而言,繪示出這樣的空間需求下之橫向元件。空間需求可能具有各式各樣的三維形狀,例如,可能在不同的橫向方向為不同的大小,且可能在不同的垂直面上為不同的。 This can be attributed to the space requirements of the process used. In FIG. 17, the dotted circles around the optical elements C1 and C2, respectively, very schematically illustrate such a space requirement, or more precisely, the lateral elements under such a space requirement. Space requirements may have a variety of three-dimensional shapes, for example, may be different sizes in different lateral directions, and may be different in different vertical planes.

空間需求可能歸因於,例如,為了各個製程的公差以及為了由在各個製程中所使用的工具所佔據的空間。 The space requirements may be attributable, for example, to the tolerances of the individual processes and to the space occupied by the tools used in the individual processes.

在圖17中重疊的圓圈之事實指示出在晶圓被互連時,不可能同時地去將光學元件C1及C2設置於其各自的基板晶圓S1、S2上。在圖17中重疊的圓圈的事實可能進一步地被視為無法同時將光學元件C1及C2設置在單一基板晶圓上的一種指示。 The fact that the circles overlap in FIG. 17 indicates that when the wafers are interconnected, it is impossible to simultaneously place the optical elements C1 and C2 on their respective substrate wafers S1, S2. The fact that the circles overlap in FIG. 17 may be further regarded as an indication that the optical elements C1 and C2 cannot be arranged on a single substrate wafer at the same time.

圖18至20為用於說明空間需求的晶圓堆疊W之部分的截面示意圖。 18 to 20 are schematic cross-sectional views of a portion of a wafer stack W for explaining space requirements.

在圖18至20中,假定在各自的基板晶圓(圖18及圖20中的S1、圖19中的Sx)上使用取放機器(pick-and-place machine)放置多個光學元件C1,而在各自的基板晶圓(圖18及圖20中的S2、圖19中的Sx)上使用複製技術(稱為浮雕(embossing))製造多個光學元件C2。取放工具被繪示成虛線且標號為81,而複製工具被 繪示成細線且標號為82。 In FIGS. 18 to 20, it is assumed that a plurality of optical elements C1 are placed on a respective substrate wafer (S1 in FIG. 18 and FIG. 20 and Sx in FIG. 19) using a pick-and-place machine. On the respective substrate wafers (S2 in FIG. 18 and FIG. 20, Sx in FIG. 19), a plurality of optical elements C2 are manufactured using a replication technique (called embossing). The pick and place tool is shown as a dashed line with the number 81, and the copy tool is It is drawn in thin lines and labeled 82.

圖18至20顯示連續的第二光學元件C2,以及橫向地圍繞各個第二光學元件C2的圍繞部60。這種圍繞部60可以是歸因於製造第二光學元件的方式,如同從顯示於圖18至20之例示性情況可推斷出來的。光學元件C1、C2之間的橫向距離d被繪示於圖18至20中。在圖18至20中,圍繞部60的提供為選擇性的,而在圖21至23中(參照以下的情況)則否。 18 to 20 show continuous second optical elements C2 and a surrounding portion 60 that surrounds each second optical element C2 laterally. This surrounding portion 60 may be attributed to the manner in which the second optical element is manufactured, as can be inferred from the exemplary situation shown in FIGS. 18 to 20. The lateral distance d between the optical elements C1 and C2 is illustrated in FIGS. 18 to 20. In FIGS. 18 to 20, the provision of the surrounding portion 60 is optional, while in FIGS. 21 to 23 (refer to the following cases), it is not.

如同從圖18清楚可見的,工具81及82無法被同時地使用(在被互連的晶圓S1、S2上)。由工具81及82所佔據的空間會重疊,使得同時使用是不可能的。如同亦可見於圖18中的,在基板晶圓S1已經被互連於晶圓S2且已經被設置有第一光學元件C1之後,不可能去使用工具82。工具81所需的空間會與由光學元件C1所佔去的空間重疊,因此而為不可能的。 As is clear from FIG. 18, the tools 81 and 82 cannot be used simultaneously (on the interconnected wafers S1, S2). The space occupied by the tools 81 and 82 will overlap, making simultaneous use impossible. As can also be seen in FIG. 18, after the substrate wafer S1 has been interconnected to the wafer S2 and has been provided with the first optical element C1, it is impossible to use the tool 82. The space required by the tool 81 overlaps with the space occupied by the optical element C1, and is therefore impossible.

但在晶圓S1及S2已被互連且晶圓S2已設有光學元件C2之後,仍可能使用工具81來設置具有光學元件C1的基板S1。然而,製程公差(process tolerance)(未顯示於圖18中)亦可能使這種處理方式為不可能的。 However, after the wafers S1 and S2 have been interconnected and the wafer S2 has been provided with the optical element C2, it is still possible to use the tool 81 to set the substrate S1 with the optical element C1. However, process tolerance (not shown in Figure 18) may also make this approach impossible.

然而,可能先提供具有光學元件C1的晶圓S1並提供具有光學元件C2的晶圓S2,並接著將晶圓互連,以建立所繪示的晶圓堆疊W。 However, it is possible to provide the wafer S1 with the optical element C1 and the wafer S2 with the optical element C2 first, and then interconnect the wafers to establish the illustrated wafer stack W.

圖19繪示在說明光學元件的靠近程度或其距離時,利用參照被稱作Sx之單一(類虛擬)晶圓的使用,可以 是有意義的。晶圓Sx包括透明部tx。 FIG. 19 illustrates the use of a single (virtual-like) wafer referred to as Sx when explaining the proximity or distance of an optical element. Makes sense. The wafer Sx includes a transparent portion tx.

在最初的計畫是要使第一及第二光學元件C1、C2位在像是所繪示的晶圓Sx之一個單一晶圓上的情況下,至少在如圖19所示之光學元件C1將在光學元件C2被處理之前被附接到晶圓Sx的情況下,此課題可能會變成是不可能的(所提供的是,存在對於光學元件的製程)-其中,製程公差亦可能使這種處理方式為不可能的。 In the case where the first plan was to position the first and second optical elements C1 and C2 on a single wafer such as the illustrated wafer Sx, at least the optical element C1 shown in FIG. 19 In the case where the optical element C2 will be attached to the wafer Sx before it is processed, this issue may become impossible (provided that there is a process for optical elements)-among which process tolerances may also make this This treatment is impossible.

如同從圖19清楚可見的,工具82與光學元件C1之間的「碰撞」將排除先提供具有光學元件C1的基板Sx並接著使其具備光學元件C2的情況。並且,同時提供具備光學元件C1、C2兩者之晶圓Sx亦為不可能的。 As is clear from Fig. 19, the "collision" between the tool 82 and the optical element C1 will preclude the case where the substrate Sx having the optical element C1 is first provided and then provided with the optical element C2. It is also impossible to provide a wafer Sx including both the optical elements C1 and C2.

在將晶圓S1、S2互連之前,使用設有各自的光學元件C1、C2之兩個初始分離的晶圓S1、S2可解決此問題,如可從圖18中推斷出來的。 Before interconnecting the wafers S1 and S2, using two initially separated wafers S1 and S2 provided with respective optical elements C1 and C2 can solve this problem, as can be inferred from FIG. 18.

圖20以類似於圖18的方式繪示當僅在晶圓S1、S2已設有各自的光學元件C1、C2後將晶圓S1、S2互連時所提供的可能性。 FIG. 20 illustrates a possibility provided when wafers S1 and S2 are interconnected only after wafers S1 and S2 have been provided with respective optical elements C1 and C2 in a manner similar to FIG. 18.

在圖20的範例中,顯然無法同時將個別的光學元件C1、C2設置到包含晶圓S1、S2的晶圓堆疊W上,或在包含晶圓S1、S2的晶圓堆疊W設置個別的光學元件C1、C2。 In the example of FIG. 20, it is clear that it is not possible to set individual optical elements C1 and C2 to the wafer stack W including the wafers S1 and S2 or to set individual optical elements on the wafer stack W including the wafers S1 and S2 Element C1, C2.

並且,亦無法在已設置光學元件C2且已建立包含晶圓S1及S2的晶圓堆疊W之後設置光學元件C1。從圖20所示之工具81與光學元件C2重疊看來,這是明顯的。 Moreover, it is also impossible to set the optical element C1 after the optical element C2 has been set and the wafer stack W including the wafers S1 and S2 has been established. This is apparent from the fact that the tool 81 shown in FIG. 20 overlaps the optical element C2.

即使在圖20所繪示的情況中,由光學元件C1、C2所佔據的空間以及由工具81、82所佔據的空間明顯地並未排除在晶圓堆疊上去複製光學元件C2(包括其圍繞部60)的可能性,其中,間隔物C1已藉由光學元件C1來提供,但其可被理所當然地假定為,晶圓S2設有光學部件C2的複製製程之製程公差(未顯示於圖20中)亦將此處理方式排除。 Even in the case shown in FIG. 20, the space occupied by the optical elements C1, C2 and the space occupied by the tools 81, 82 obviously do not exclude the reproduction of the optical element C2 (including its surroundings) on the wafer stack 60) possibility, in which the spacer C1 has been provided by the optical element C1, but it can be taken for granted that the wafer S2 is provided with the process tolerance of the replication process of the optical component C2 (not shown in FIG. 20) ) Also excludes this treatment.

然而,藉由僅在已將光學元件C1、C2設置在其各自的晶圓之後將晶圓S1、S2互連之所建議的處理方式使得有可能成功地製造出所繪示的晶圓堆疊(以及最後源自於此晶圓堆疊的光學模組)。 However, the proposed processing method of interconnecting the wafers S1, S2 only after the optical elements C1, C2 have been placed on their respective wafers makes it possible to successfully manufacture the illustrated wafer stack (and Finally comes from the optical module of this wafer stack).

圖21為其上具有第二光學元件S2的第二基板晶圓之母材(precursor)S2’的部分之截面示意圖。第二光學元件C2與橫向地圍繞在其周圍的圍繞部60為連續的。圍繞部60並非任何的光學元件或至少不具有所需的光學功能。 FIG. 21 is a schematic cross-sectional view of a portion of a precursor S2 'of a second substrate wafer having a second optical element S2 thereon. The second optical element C2 is continuous with the surrounding portion 60 that surrounds the second optical element C2 laterally. The surrounding portion 60 is not any optical element or at least does not have a required optical function.

如已繪示於圖18的,所具有的圍繞部60可能從光學元件C2被製造的方式產生。 As shown in FIG. 18, the surrounding portion 60 may be generated from the manner in which the optical element C2 is manufactured.

由於圍繞部60可免除,因其可被至少部分地移除。此能夠允許使光學元件C1、C2之特別相互側向地靠近的定位為可能的。 Since the surrounding portion 60 is exempt, it can be removed at least partially. This can allow positioning of the optical elements C1, C2 particularly close to each other laterally is possible.

圖21中的垂直虛線顯示材料,例如,藉由切割或雷射切割,同時地從圍繞部60以及從母材S2’被移除。 The vertical dashed line in FIG. 21 shows that the material is simultaneously removed from the surrounding portion 60 and from the base material S2 ', for example, by cutting or laser cutting.

在於母材S2’中建立開口50的期間,可能將圍繞部 60的至少一部分移除,以得到如圖22所示之基板S2。 While the opening 50 is established in the base material S2 ', the surrounding portion may be At least a part of 60 is removed to obtain a substrate S2 as shown in FIG. 22.

隨著在基板晶圓S2中被創造出來的開口50,晶圓堆疊W可藉由將晶圓S2與光學元件C1存在於其上的晶圓S1互連來形成。圖23為包含如圖22所示之第二光學元件C2於其上被製造的第二基板晶圓S2之部分之光學模組的部分(亦即,晶圓堆疊W的部分)之截面示意圖。 With the opening 50 created in the substrate wafer S2, the wafer stack W can be formed by interconnecting the wafer S2 with the wafer S1 on which the optical element C1 exists. FIG. 23 is a schematic cross-sectional view of a portion of an optical module (ie, a portion of a wafer stack W) including a portion of a second substrate wafer S2 on which the second optical element C2 shown in FIG. 22 is manufactured.

圖24為具有建立底切槽(undercut)77之第二基板S2之光學模組的部分之截面示意圖。如圖所示之可見於輪廓中的切割線70可能源自於在基板晶圓S2中創造出的開口50,且為具有垂直的角度。這種具有傾斜的側壁的開口可使用,例如,微機械加工(micromachining)或雷射切割,而被製造出來。 FIG. 24 is a schematic cross-sectional view of a portion of an optical module having a second substrate S2 that establishes an undercut 77. As shown in the figure, the cutting line 70 visible in the outline may originate from the opening 50 created in the substrate wafer S2 and have a vertical angle. Such an opening with inclined sidewalls can be manufactured using, for example, micromachining or laser cutting.

在光學元件C1沿著從第一基板S1指向第二基板S2的方向漸縮(縮減)的情況下,這可能是特別有用的。這可能為,例如,若光學元件C1如上所述地使用複製技術來製造及/或具有圍繞部60,的情況。 This may be particularly useful in a case where the optical element C1 is tapered (reduced) in a direction from the first substrate S1 to the second substrate S2. This may be the case, for example, if the optical element C1 is manufactured using a replication technique as described above and / or has a surrounding portion 60 ′.

設置這種底切槽77及/或對應的切割線70可能使具有特別地相互靠近(橫向地)的光學元件為可能的。 The provision of such undercut grooves 77 and / or corresponding cutting lines 70 may make it possible to have optical elements that are particularly close to each other (laterally).

需注意的是,為了使第一及第二光學元件的相互排列盡可能的為靠近的,光學模組之相鄰的第一及第二光學元件之間的空間為空的,亦即,除了第二基板的部分及/或黏合劑可能存在於此以外,不存在光學模組之進一步的零件或部件,如在多數所繪示的範例中的情形。然而,在第一及第二光學元件可能間隔足夠遠的距離的情況下,可提 供的是,另一光學元件、或另一基板之部分、或光學模組的間隔物可能存在於光學模組之相鄰的第一及第二光學元件之間的空間中。 It should be noted that in order to make the arrangement of the first and second optical elements as close to each other as possible, the space between the adjacent first and second optical elements of the optical module is empty, that is, except A part of the second substrate and / or an adhesive may exist beyond this, and there are no further parts or components of the optical module, as is the case in most of the illustrated examples. However, where the first and second optical elements may be sufficiently far apart, It is provided that another optical element, a part of another substrate, or a spacer of the optical module may exist in a space between adjacent first and second optical elements of the optical module.

Claims (35)

一種用於製造複數個光學模組的方法,每一個該光學模組包括第一光學元件及第二光學元件,該方法包括以下的步驟:a)提供第一基板晶圓,複數個該第一光學元件存在於該第一基板晶圓上的頂側上,其中每一個該第一光學元件包含光偵測器;b)提供具有材料區域的第二基板晶圓,該材料區域為連續橫向地界定的區域,該第二基板晶圓的材料存在於該材料區域中,其中,複數個該第二光學元件存在於該材料區域中,其中每一個該第二光學元件包含鏡或光柵;c)實現該第一基板晶圓與該第二基板晶圓的橫向對齊,使得每一個該第一光學元件存在於不與該材料區域重疊的橫向地界定的區域中;d)在該橫向對齊的狀態下使該第一基板晶圓與該第二基板晶圓互連,使得該第一基板晶圓的該頂側面對該第二基板晶圓的底側,且在該第一基板晶圓與該第二基板晶圓之間沒有進一步的晶圓。A method for manufacturing a plurality of optical modules, each of which includes a first optical element and a second optical element, the method includes the following steps: a) providing a first substrate wafer, a plurality of the first Optical elements are present on the top side of the first substrate wafer, wherein each of the first optical elements includes a photodetector; b) a second substrate wafer having a material region, the material region being continuous laterally A defined area in which the material of the second substrate wafer exists in the material area, wherein a plurality of the second optical elements exist in the material area, wherein each of the second optical elements includes a mirror or a grating; c) Achieving lateral alignment of the first substrate wafer and the second substrate wafer, so that each of the first optical elements exists in a laterally defined area that does not overlap the material area; d) in the laterally aligned state The first substrate wafer and the second substrate wafer are interconnected so that the top side surface of the first substrate wafer faces the bottom side of the second substrate wafer, and the first substrate wafer and the second substrate wafer Second substrate crystal No further wafer between. 如申請專利範圍第1項之方法,其中,該第二基板晶圓包括複數個開放區域,該等開放區域為該第二基板晶圓的材料未存在於其中之橫向地界定的區域,且其中,每一個該第一光學元件存在於該等開放區域中的一者中。For example, the method of claim 1 in the patent scope, wherein the second substrate wafer includes a plurality of open areas, and the open areas are laterally defined areas in which the material of the second substrate wafer does not exist, and wherein Each of the first optical elements exists in one of the open areas. 如申請專利範圍第1項之方法,其中,該等第一光學元件的每一者被橫向地定位在複數個第一區域中的一者內,且該等第二光學元件的每一者被橫向地定位在複數個第二區域中的一者內,其中,該等第一區域沒有與該等第二區域的任一者重疊。For example, the method of claiming a patent scope item 1, wherein each of the first optical elements is laterally positioned in one of the plurality of first regions, and each of the second optical elements is Positioned laterally within one of the plurality of second regions, wherein the first regions do not overlap with any of the second regions. 如申請專利範圍第1項之方法,其中,該第二基板晶圓構成一體地形成的部件。The method of claim 1, wherein the second substrate wafer constitutes an integrally formed component. 如申請專利範圍第1項之方法,其中,該第二基板晶圓為連續地具有複數個突出物,該複數個突出物在相反於從該第二基板晶圓的該底側向該第一基板晶圓的該頂側指向的方向之方向上突出。The method of claim 1, wherein the second substrate wafer has a plurality of protrusions continuously, and the plurality of protrusions are opposite to the first substrate wafer from the bottom side toward the first substrate wafer. The substrate wafer protrudes in a direction in which the top side is directed. 如申請專利範圍第1項之方法,包括以下的步驟e)提供作為第二間隔晶圓的晶圓;以及f)將該第二基板晶圓與該第二間隔晶圓互連;其中,步驟f)在步驟d)之前、或在步驟d)期間、或在步驟d)之後被執行,且其中,在步驟d)之後,該第二基板晶圓被佈置在該第一基板晶圓與該第二間隔晶圓之間。For example, the method of claim 1 includes the following steps: e) providing a wafer as a second spacer wafer; and f) interconnecting the second substrate wafer with the second spacer wafer; wherein, step f) is performed before step d), during step d), or after step d), and after step d), the second substrate wafer is arranged between the first substrate wafer and the Between the second wafers. 如申請專利範圍第1項之方法,包括以下的步驟g)提供第三基板晶圓,其中,複數個第三光學元件存在於該第三基板晶圓或其上,且/或該第三基板晶圓包括複數個橫向地界定的透明區域;以及h)經由稱作第一間隔晶圓的晶圓將該第三基板晶圓連接到該第一基板晶圓及/或該第二基板晶圓,使得該第二基板晶圓被佈置在該第一基板晶圓與該第三基板晶圓之間,其中,該第一間隔晶圓與該第三基板晶圓為選擇性地連續的;其中,步驟h)係在步驟d)之後或與步驟d)同時被執行。For example, the method of claim 1 includes the following step g) providing a third substrate wafer, wherein a plurality of third optical elements are present on or on the third substrate wafer, and / or the third substrate The wafer includes a plurality of laterally defined transparent regions; and h) connecting the third substrate wafer to the first substrate wafer and / or the second substrate wafer via a wafer called a first spacer wafer So that the second substrate wafer is arranged between the first substrate wafer and the third substrate wafer, wherein the first spacer wafer and the third substrate wafer are selectively continuous; wherein Step h) is performed after step d) or simultaneously with step d). 如申請專利範圍第7項之方法,其中,在步驟h)之後,該第二基板晶圓存在於該第一基板晶圓與該第一間隔晶圓之間,且其中,該第一間隔晶圓從該第二基板晶圓垂直地延伸到該第三基板晶圓,使得該第二基板晶圓與該第三基板晶圓之間的垂直距離係由該第一間隔晶圓的垂直延伸來界定。The method according to item 7 of the patent application, wherein, after step h), the second substrate wafer exists between the first substrate wafer and the first spacer wafer, and wherein the first spacer wafer The circle extends vertically from the second substrate wafer to the third substrate wafer, so that the vertical distance between the second substrate wafer and the third substrate wafer is vertically extended by the first spaced wafer. Define. 如申請專利範圍第1項之方法,其中,該等第一光學元件為主動式光學元件,且該等第二光學元件為被動式光學元件。For example, the method of claim 1 in the patent scope, wherein the first optical elements are active optical elements, and the second optical elements are passive optical elements. 如申請專利範圍第1項之方法,包括以下的步驟r)在該第二基板晶圓上複製該等第二光學元件。For example, the method of applying for the first item of the patent scope includes the following steps: r) Copying the second optical elements on the second substrate wafer. 如申請專利範圍第1項之方法,包括將該等第二光學元件附接到該第二基板晶圓的步驟。The method of claim 1 includes the step of attaching the second optical elements to the second substrate wafer. 如申請專利範圍第1項之方法,其中,該等第一光學元件的其中之一係在第一特定位置及方向中使用第一製程與該第一基板晶圓一起被製造、或被製造於該第一基板晶圓上、或被附接到該第一基板晶圓,且該等第二光學元件的其中之一係在第二特定位置及方向中使用第二製程與該第二基板晶圓一起被製造、或被製造於該第二基板晶圓上、或被附接到該第二基板晶圓,且其中,該第一特定位置與該第二特定位置係非常靠近地相互橫向地隔開,該第一製程與該第二製程在建立該第一基板晶圓與該第二基板晶圓之間的互連之後的空間需求,排除下列至少一種情況- 在該第一特定位置及方向中使用該第一製程與該第一基板晶圓一起製造該等第一光學元件的其中之一、或於該第一基板晶圓上製造該等第一光學元件的其中之一、或將該等第一光學元件的其中之一附接到該第一基板晶圓,且同時,在該第二特定位置及方向中使用該二製程與該第二基板晶圓一起製造該等第二光學元件的其中之一、或於該第二基板晶圓上製造該等第二光學元件的其中之一、或將該等第二光學元件的其中之一附接到該第二基板晶圓;- 先在該第一特定位置及方向中使用該第一製程與該第一基板晶圓一起製造該等第一光學元件的其中之一、或於該第一基板晶圓上製造該等第一光學元件的其中之一、或將該等第一光學元件的其中之一附接到該第一基板晶圓,並接著,在該第二特定位置及方向中使用該二製程與該第二基板晶圓一起製造該等第二光學元件的其中之一、或於該第二基板晶圓上製造該等第二光學元件的其中之一、或將該等第二光學元件的其中之一附接到該第二基板晶圓;- 先在該第二特定位置及方向中使用該二製程與該第二基板晶圓一起製造該等第二光學元件的其中之一、或於該第二基板晶圓上製造該等第二光學元件的其中之一、或將該等第二光學元件的其中之一附接到該第二基板晶圓,並接著在該第一特定位置及方向中使用該第一製程與該第一基板晶圓一起製造該等第一光學元件的其中之一、或於該第一基板晶圓上製造該等第一光學元件的其中之一、或將該等第一光學元件的其中之一附接到該第一基板晶圓。For example, the method of claim 1 in the patent scope, wherein one of the first optical elements is manufactured together with the first substrate wafer in the first specific position and direction using the first process, or is manufactured in The first substrate wafer is attached to or attached to the first substrate wafer, and one of the second optical elements is in a second specific position and direction using a second process and the second substrate crystal. The circles are manufactured together, or are fabricated on the second substrate wafer, or are attached to the second substrate wafer, and wherein the first specific position and the second specific position are laterally adjacent to each other very closely. Space, the first process and the second process require space after the interconnection between the first substrate wafer and the second substrate wafer is established, excluding at least one of the following situations-at the first specific location and In the direction, the first process is used to manufacture one of the first optical elements together with the first substrate wafer, or to manufacture one of the first optical elements on the first substrate wafer, or to One of the first optical elements Received the first substrate wafer, and at the same time, using the two processes in the second specific position and direction to manufacture one of the second optical elements together with the second substrate wafer, or the second optical element Manufacture one of the second optical elements on a substrate wafer or attach one of the second optical elements to the second substrate wafer;-first use in the first specific position and orientation The first process manufactures one of the first optical elements with the first substrate wafer, or manufactures one of the first optical elements on the first substrate wafer, or One of an optical element is attached to the first substrate wafer, and then, the two processes are used in the second specific position and direction to manufacture one of the second optical elements together with the second substrate wafer. One of them, or manufacturing one of the second optical elements on the second substrate wafer, or attaching one of the second optical elements to the second substrate wafer; Using the two processes and the second in a second specific position and direction Plate wafers together to manufacture one of the second optical elements, or to manufacture one of the second optical elements on the second substrate wafer, or to attach one of the second optical elements Receiving the second substrate wafer, and then using the first process in the first specific position and direction to manufacture one of the first optical elements together with the first substrate wafer or the first optical element One of the first optical elements is manufactured on a substrate wafer, or one of the first optical elements is attached to the first substrate wafer. 如申請專利範圍第1項之方法,其中,該等第一光學元件的其中之一係在第一特定位置及方向中使用第一製程與該第一基板晶圓一起被製造、或被製造於該第一基板晶圓上、或被附接到該第一基板晶圓,且該等第二光學元件的其中之一係在第二特定位置及方向中使用第二製程與該第二基板晶圓一起被製造、或被製造於該第二基板晶圓上、或被附接到該第二基板晶圓,且其中,該第一特定位置與該第二特定位置係非常靠近地相互橫向地隔開,該第一製程與該第二製程的空間需求排除下列至少一種情況- 在對應該第一特定位置及方向的位置及方向中使用該第一製程與一個單一的基板晶圓一起製造該等第一光學元件的其中之一、或於該一個單一的基板晶圓上製造該等第一光學元件的其中之一、或將該等第一光學元件的其中之一附接到該單一基板晶圓,且同時,在對應該第二特定位置及方向的位置及方向中使用該二製程與該一個單一的基板晶圓一起製造該等第二光學元件的其中之一、或於該一個單一的基板晶圓上製造該等第二光學元件的其中之一、或將該等第二光學元件的其中之一附接到該一個單一的基板晶圓;- 先在對應該第一特定位置及方向的位置及方向中使用該第一製程與一個單一的基板晶圓一起製造該等第一光學元件的其中之一、或於該一個單一的基板晶圓上製造該等第一光學元件的其中之一、或將該等第一光學元件的其中之一附接到該一個單一的基板晶圓,並接著,在對應該第二特定位置及方向的位置及方向中使用該二製程與該一個單一的基板晶圓一起製造該等第二光學元件的其中之一、或於該一個單一的基板晶圓上製造該等第二光學元件的其中之一、或將該等第二光學元件的其中之一附接到該一個單一的基板晶圓;- 先在對應該第二特定位置及方向的位置及方向中使用該二製程與一個單一的基板晶圓一起製造該等第二光學元件的其中之一、或於該一個單一的基板晶圓上製造該等第二光學元件的其中之一、或將該等第二光學元件的其中之一附接到該一個單一的基板晶圓,並接著,在對應該第一特定位置及方向的位置及方向中使用該第一製程與該一個單一的基板晶圓一起製造該等第一光學元件的其中之一、或於該一個單一的基板晶圓上製造該等第一光學元件的其中之一、或將該等第一光學元件的其中之一附接到該一個單一的基板晶圓。For example, the method of claim 1 in the patent scope, wherein one of the first optical elements is manufactured together with the first substrate wafer in the first specific position and direction using the first process, or is manufactured in The first substrate wafer is attached to or attached to the first substrate wafer, and one of the second optical elements is in a second specific position and direction using a second process and the second substrate crystal. The circles are manufactured together, or are fabricated on the second substrate wafer, or are attached to the second substrate wafer, and wherein the first specific position and the second specific position are laterally adjacent to each other very closely. Separately, the space requirements of the first process and the second process exclude at least one of the following conditions-using the first process in a position and direction corresponding to the first specific position and direction to manufacture the same with a single substrate wafer Waiting for one of the first optical elements, or manufacturing one of the first optical elements on the single substrate wafer, or attaching one of the first optical elements to the single substrate Wafer and same Using one of the two processes together with the one single substrate wafer in the position and direction corresponding to the second specific position and direction to manufacture one of the second optical elements or on the single substrate wafer Manufacture one of the second optical elements or attach one of the second optical elements to the single substrate wafer;-first in a position and direction corresponding to the first specific position and direction Using the first process together with a single substrate wafer to manufacture one of the first optical elements, or manufacturing one of the first optical elements on the single substrate wafer, or One of the first optical elements is attached to the single substrate wafer, and then the two processes and the single substrate wafer are used in a position and direction corresponding to a second specific position and direction. Manufacture one of the second optical elements together, or one of the second optical elements on the single substrate wafer, or attach one of the second optical elements To receive a single substrate wafer;-first use the two processes in a position and direction corresponding to the second specific position and direction to manufacture one of the second optical elements together with a single substrate wafer, Or one of the second optical elements is manufactured on the single substrate wafer, or one of the second optical elements is attached to the single substrate wafer, and then, The first process should be used in the position and direction of the first specific position and direction to manufacture one of the first optical elements together with the single substrate wafer, or to manufacture the one on the single substrate wafer. Wait for one of the first optical elements, or attach one of the first optical elements to the single substrate wafer. 如申請專利範圍第1項之方法,其中,該複數個第一光學元件中的特定一個與該複數個第二光學元件中的特定一個之間的橫向距離為小於800微米。For example, the method of claim 1, wherein a lateral distance between a specific one of the plurality of first optical elements and a specific one of the plurality of second optical elements is less than 800 μm. 如申請專利範圍第1至14項任一項之方法,其中,該等第二光學元件為複製的光學元件,其每一者係與至少部分地圍繞對應的光學元件之圍繞部一體地形成,在製造對應的第二光學元件的過程中,每一圍繞部在所應用之相同的複製製程中被製造,該方法包括以下的步驟m)在該第二基板晶圓中創造複數個開口;其中,藉由執行步驟m),該等圍繞部的每一者之至少部分被移除。If the method according to any one of the claims 1 to 14 is applied, wherein the second optical elements are duplicate optical elements, each of which is integrally formed with a surrounding portion that at least partially surrounds the corresponding optical element, In the process of manufacturing the corresponding second optical element, each surrounding portion is manufactured in the same replication process applied. The method includes the following steps: m) creating a plurality of openings in the second substrate wafer; By performing step m), at least part of each of the surrounding portions is removed. 如申請專利範圍第1項之方法,其中,導體路徑在該材料區域內存在於該第一基板晶圓的該頂側上。The method of claim 1, wherein the conductor path exists in the material region on the top side of the first substrate wafer. 如申請專利範圍第1項之方法,其中,在該橫向對齊的狀態下,在一相同的光學模組之第一和第二光學元件之間的空間不存在該光學模組之任何進一步的零件或部分,至少遠離該第二基板晶圓之選擇性地存在的部分及/或遠離選擇性地存在於該第一基板晶圓的該頂側之黏合劑。For example, the method of claim 1 in the patent scope, wherein in the laterally aligned state, there is no further part of the optical module in the space between the first and second optical elements of the same optical module Or, at least away from the selectively existing part of the second substrate wafer and / or away from the adhesive selectively existing on the top side of the first substrate wafer. 如申請專利範圍第1項之方法,其中,該第二基板晶圓具有輪廓,該輪廓具有相對於該第二基板晶圓的垂直方向傾斜的切割線。The method of claim 1, wherein the second substrate wafer has a contour, and the contour has a cutting line inclined with respect to a vertical direction of the second substrate wafer. 如申請專利範圍第1項之方法,用於減少一個相同的光學模組之第一及第二光學元件之間的橫向距離,或用於達成一個相同的光學模組之第一及第二光學元件之間的橫向距離,由於對應的處理且在對應的位置及方向中,該橫向距離小於使用該第一及第二光學元件存在於其上的單一基板晶圓可達成的橫向距離。For example, the method of the first scope of the patent application is used to reduce the lateral distance between the first and second optical elements of an identical optical module, or to achieve the first and second optics of an identical optical module. Due to the corresponding processing and the corresponding position and direction, the lateral distance between the elements is smaller than the lateral distance that can be achieved using a single substrate wafer on which the first and second optical elements exist. 一種光學模組,包括:- 第一基板晶圓,具有第一光學元件存在於其上之頂側,其中該第一光學元件包含光偵測器;- 第二基板晶圓,具有底側;其中,該第一基板晶圓和該第二基板晶圓被互連,使得該第一基板晶圓的該頂側面對該第二基板晶圓的該底側,且該第二基板晶圓在被稱作為垂直方向的方向上被堆疊在該第一基板晶圓上;其中,該第二基板晶圓具有- 材料區域,其係為該第二基板晶圓的材料存在於其中之橫向地界定的區域,且第二光學元件存在於其中,其中該第二光學元件包含鏡或光柵;以及- 至少一開放區域,其係為沒有該第二基板晶圓的材料存在於其中之橫向地界定的區域;其中,該第一光學元件被橫向地定位在該開放區域內。An optical module comprising:-a first substrate wafer having a top side on which a first optical element exists, wherein the first optical element includes a light detector;-a second substrate wafer having a bottom side; Wherein, the first substrate wafer and the second substrate wafer are interconnected such that the top side surface of the first substrate wafer faces the bottom side of the second substrate wafer, and the second substrate wafer is at It is stacked on the first substrate wafer in a direction called a vertical direction; wherein the second substrate wafer has a material region which is laterally defined in which the material of the second substrate wafer exists. Region, and the second optical element exists therein, wherein the second optical element includes a mirror or a grating; and-at least one open region, which is laterally defined without the material of the second substrate wafer present therein Area; wherein the first optical element is positioned laterally within the open area. 如申請專利範圍第20項之光學模組,其中,該第一光學元件被橫向地定位在第一區域內,且該第二光學元件被橫向地定位在第二區域內,其中,該第一區域及該第二區域並未重疊。For example, the optical module of claim 20, wherein the first optical element is positioned laterally in the first region, and the second optical element is positioned laterally in the second region, wherein the first optical element The area and the second area do not overlap. 如申請專利範圍第20項之光學模組,其中,該第一光學元件被佈置成使得其垂直地延伸超過該第二基板晶圓的該底側。For example, the optical module of claim 20, wherein the first optical element is arranged so that it extends vertically beyond the bottom side of the second substrate wafer. 如申請專利範圍第20項之光學模組,其中,該第一光學元件被該材料區域及該開放區域之間的邊界圍繞。For example, the optical module of claim 20, wherein the first optical element is surrounded by a boundary between the material region and the open region. 如申請專利範圍第20項之光學模組,還包括第三基板晶圓及第一間隔物,其中,該第一間隔物存在於該第一基板晶圓及該第三基板晶圓之間,且其中,該第一間隔物係選擇性地與該第三基板晶圓為連續的。For example, the optical module of the 20th patent application scope further includes a third substrate wafer and a first spacer, wherein the first spacer exists between the first substrate wafer and the third substrate wafer, And, the first spacer is selectively continuous with the third substrate wafer. 如申請專利範圍第20至24項任一項之光學模組,包括第二間隔物,該第二間隔物從與該第二基板晶圓的該底側相反之該第二基板晶圓的頂側延伸到與從該第二基板晶圓的該底側指向到該第一基板晶圓的該頂側的方向相反之方向中,其中,該第二間隔物係選擇性地與該第二基板晶圓為連續的。For example, the optical module according to any one of claims 20 to 24 includes a second spacer, and the second spacer is from the top of the second substrate wafer opposite to the bottom side of the second substrate wafer. The side extends into a direction opposite to the direction from the bottom side of the second substrate wafer to the top side of the first substrate wafer, wherein the second spacer is selectively connected to the second substrate. The wafer is continuous. 如申請專利範圍第25項之光學模組,還包括第三基板晶圓及第一間隔物,其中,該第一間隔物存在於該第一基板晶圓及該第三基板晶圓之間,且其中,該第一間隔物係選擇性地與該第三基板晶圓為連續的,並且該第二間隔物與該第三基板晶圓間隔一距離。For example, the optical module of the scope of application for patent No. 25 further includes a third substrate wafer and a first spacer, wherein the first spacer exists between the first substrate wafer and the third substrate wafer, And, the first spacer is selectively continuous with the third substrate wafer, and the second spacer is spaced apart from the third substrate wafer by a distance. 如申請專利範圍第20項之光學模組,其中,至少一導體路徑在該材料區域中存在於該第一基板晶圓的該頂側上。For example, the optical module of claim 20, wherein at least one conductor path exists on the top side of the first substrate wafer in the material region. 如申請專利範圍第20項之光學模組,其中,該光學模組之零件或部件不存在於該第一光學元件和該第二光學元件之間,至少遠離該第二基板晶圓之選擇性地存在的部分及/或遠離選擇性地存在於該第一基板晶圓的該頂側之黏合劑。For example, the optical module of the scope of application for patent No. 20, wherein the component or part of the optical module does not exist between the first optical element and the second optical element, at least away from the selectivity of the second substrate wafer Ground portions and / or away from adhesives that are selectively present on the top side of the first substrate wafer. 如申請專利範圍第20項之光學模組,其中,該第二基板晶圓以在該第二基板晶圓和該第一基板晶圓的該頂側之間建立底切槽的方式被建構。For example, the optical module of claim 20, wherein the second substrate wafer is constructed by establishing an undercut groove between the second substrate wafer and the top side of the first substrate wafer. 如申請專利範圍第20項之光學模組,其中,該第一光學元件和該第二光學元件之間的橫向距離為小於800微米。For example, the optical module according to claim 20, wherein the lateral distance between the first optical element and the second optical element is less than 800 microns. 一種晶圓堆疊,包括複數個如申請專利範圍第20至30項任一項之光學模組。A wafer stack includes a plurality of optical modules according to any one of claims 20-30. 一種晶圓堆疊,包括- 第一基板晶圓,複數個第一光學元件存在於該第一基板晶圓的頂側上,其中每一個該第一光學元件包含光偵測器;- 第二基板晶圓,具有材料區域,該材料區域為該第二基板晶圓的材料存在於其中之連續橫向地界定的區域,其中,複數個第二光學元件存在於該材料區域中,其中每一個該第二光學元件包含鏡或光柵;其中,該第一基板晶圓的該頂側面對該第二基板晶圓的底側,且在該第一基板晶圓與該第二基板晶圓之間沒有進一步的晶圓,且其中,該些第一光學元件的每一者存在於未與該材料區域重疊之橫向地界定的區域中。A wafer stack includes-a first substrate wafer, a plurality of first optical elements existing on a top side of the first substrate wafer, wherein each of the first optical elements includes a light detector;-a second substrate A wafer having a material region, the material region being a continuously laterally defined region in which material of the second substrate wafer exists, wherein a plurality of second optical elements exist in the material region, each of which The two optical elements include a mirror or a grating; wherein the top side of the first substrate wafer faces the bottom side of the second substrate wafer, and there is no further distance between the first substrate wafer and the second substrate wafer. And each of the first optical elements exists in a laterally defined area that does not overlap the material area. 一種電子裝置,包括如申請專利範圍第20至30項任一項之光學模組、或由如申請專利範圍第1至18項任一項之方法所製造出來的光學模組。An electronic device includes an optical module such as any one of claims 20 to 30, or an optical module manufactured by a method such as any of claims 1 to 18. 如申請專利範圍第33項之電子裝置,還包括印刷電路板,該光學模組安裝在該印刷電路板上。For example, the electronic device under the scope of patent application 33 further includes a printed circuit board, and the optical module is mounted on the printed circuit board. 如申請專利範圍第33項之電子裝置,其中,該裝置係為下列裝置之至少一者- 攜帶式或行動計算裝置;- 智慧型手機;- 平板電腦;- 數位閱讀器;- 攝像裝置;- 數位相機;- 遊戲控制器;- 感測裝置;- 感測器。For example, the electronic device under the scope of patent application No. 33, wherein the device is at least one of the following devices-portable or mobile computing devices;-smart phones;-tablet computers;-digital readers;-camera devices;- Digital cameras;-game controllers;-sensing devices;-sensors.
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