TWI647302B - The zwitterionic surfactant-based cleaning composition - Google Patents

Abstract

The invention provides a cleaning composition for a zwitterionic surfactant, comprising: a zwitterionic surfactant; an acid-base buffer solution; and an aqueous solution, wherein the zwitterionic surfactant has a weight percentage of 1~ 90%, the weight percentage of the acid-base buffer solution is 0.2-20%, and the pH of the cleaning composition of the zwitterionic surfactant is between 3.0 and 6.6. The cleaning composition of the zwitterionic surfactant provided by the invention provides the antibacterial effect by controlling the zwitterionic surfactant under acidic conditions by an acid-base buffer solution to achieve an antibacterial effect, and the invention The cleaning composition of the zwitterionic surfactant has much less skin irritation than other surfactants, and can be widely applied to human antibacterial articles.

Description

Zwitterionic surfactant cleaning composition

The present invention relates to a cleaning composition, and more particularly to a cleaning composition for a zwitterionic surfactant.

Nowadays, the population of the outside world has increased, and food hygiene and safety have become an important issue that the public cannot ignore and value. Those who are engaged in catering and related food industries often need to operate foods by both hands. The cleaning and sanitation of hands becomes the most important task of maintaining food safety and hygiene before and after work. Therefore, it has become a modern method to deal with the cleaning of hands by using various cleaning agents. Part of the life that people have to face every day.

The hand-cleaning agent generally available for the purpose of antibacterial purposes mainly comprises an organic solvent such as alcohol or an antibacterial agent, wherein the alcohol is capable of denaturation of proteins or enzymes, dissolution of lipids and dehydration. Characteristics such as action, so that the lipid of the cell membrane or cell wall of the microorganism can be dissolved or caused to dehydrate the microorganism. Antibacterial agents (such as sodium trichlorate and amine acid) are also sterilized by destroying the cell membrane and cell wall of the bacteria.

In addition, the cation sterilization method is another new technology developed in recent years that is different from high temperature sterilization and chemical sterilization. The way of sterilization is due to the fact that the cell wall and cell membrane of the bacteria are composed of phospholipid bilayer membranes, and according to the principle of physical anisotropy charge attraction, Into the cationic bactericide, the negatively charged cell wall will be attracted by the positive charge of the cation, and the cell wall and cell membrane will be completely deformed and ruptured, and the bacteria will lose their reproductive and viability and die.

However, although the above-mentioned detergent has an antibacterial effect, it has an effect on human skin irritation, and in view of this, there is a need to provide a cleaning composition of a zwitterionic surfactant which can be solved. The aforementioned problem.

The problem to be solved by the present invention is to provide a cleaning composition for a zwitterionic surfactant which is milder and less irritating to human skin and has a better antibacterial effect than a commercially available detergent.

In order to achieve the above object, the present invention discloses a zwitterionic surfactant cleaning composition comprising: a zwitterionic surfactant; an acid-base buffer solution; and an aqueous solution, wherein the zwitterionic interface activity The weight percentage of the agent is 1 to 90%, the weight percentage of the acid-base buffer solution is 0.2 to 20%, and the pH of the cleaning composition of the zwitterionic surfactant is between 3.0 and 6.6.

Another object of the present invention is to disclose a method for preparing a cleaning composition for a zwitterionic surfactant, comprising the steps of: (1) adding a weight percentage of 1-90% zwitterionic interface at room temperature; An active agent and a weight percentage of 0.2-20% acid-base buffer solution into a container, stirred and dissolved to form a first mixed solution; (2) adjusting the pH of the first mixed solution to make the first mixed solution a pH between 3.0 and 6.6 to form a second mixed solution; and (3) adding water to the second mixed solution to bring the weight percentage of the composition to 100%, followed by continuous stirring until completely dissolved, That is, a cleaning composition of a two-ionic surfactant is obtained.

The efficacy of the invention is mainly embodied in: 1. It can effectively provide the effect of sterilization and cleaning; 2. The cleaning composition of the zwitterionic surfactant provided by the invention does not cause damage to human skin, and belongs to a mild type. Cleaning composition; 3. Its production process is simple and low cost.

S100~S300‧‧‧Steps for preparing a cleaning composition for a zwitterionic surfactant

1 is a flow chart of a method for preparing a cleaning composition of a zwitterionic surfactant according to the present invention; FIG. 2 is an analysis diagram of an Escherichia coli colony of an antibacterial hand-washing mousse according to Embodiment 1 of the present invention; FIG. 3 is an antibacterial hand washing according to Embodiment 1 of the present invention; A Pseudomonas aeruginosa colony analysis chart of Mousse; and FIG. 4 is an analysis diagram of Klebsiella pneumoniae colony of the antibacterial hand washing mousse of Example 1 of the present invention.

The present invention is intended to provide a preferred embodiment or embodiment of the present invention, and is not intended to limit the scope of the present invention, that is, the scope of the patent application of the present invention, or the scope of the patent of the present invention. Equal changes and modifications are covered by the invention patent.

The invention provides a cleaning composition for a zwitterionic surfactant, which comprises: a zwitterionic surfactant; an acid-base buffer solution; and an aqueous solution, wherein the weight of the zwitterionic surfactant The percentage is from 1 to 90%, the weight percentage of the acid-base buffer solution is from 0.2 to 20%, and the pH of the cleaning composition of the zwitterionic surfactant is between 3.0 and 6.6. The features of the present invention are further described below.

About zwitterionic surfactants:

The zwitterionic surfactant used in the present invention is selected from the group consisting of betaine At least a surfactant (Betaine) type surfactant, an amine oxide type surfactant, an ammonium carboxylate type (Polyquaternium) type surfactant, an imidazoline type surfactant, and an amino acid type surfactant A group of one.

Among them, Betaine type surfactant can be dissolved in acidic, neutral or alkaline aqueous solution, and has the characteristics of no precipitation at the isoelectric point, and its permeability, detergency and antistatic properties. Good, can also be used as an emulsifier and softener.

As described above, the composition of the Betaine type surfactant can be mainly divided into three major categories, such as carboxylic acid-based betaine, sulfobetaine, and phospholipid betaine, including: Lauryl Betaine, Cocoamidopropyl Betaine, Lauramidopropyl Betaine, Decyl betaine, Alkyl betaine, Coco-beet ( Coco-betaine), Cetyl betaine, Tallow betaine, Behenyl betaine, Stearyl betaine, and nutmeg-based beet Myristyl betaine), Cocamidoethyl betaine, Soyamidopropyl betaine, Oleamidopropyl betaine, sesamelamidopropyl betaine Sesamidopropyl betaine), Oatamidopropyl Betaine, Palmamidopropyl betaine, Cocamidopropyl hydroxysul Taine) and Lauryl hydroxysultaine.

In the part of the amine oxide type surfactant, the composition includes: Lauryl Dimethyl Amine Oxide, Cocamine oxide, Oleamine oxide. , Lauramine oxide, Behenamine oxide, Stearamine oxide, Decylamine oxide, Tallowamine oxide, Palmitamine oxide, Myristamine oxide, Trimethylamine Oxide, PEG-3 Lauramine oxide, Sesamidopropylamine oxide ), Cocamidopropylamine oxide, Soyamidopropylamine Oxid, Oleamidopropylamine oxide, Olivamidopropylamine Oxide) and disodium cocoamphodipropionate.

In addition, in the part of the ammonium carboxylic acid salt type (Polyquaternium) type surfactant, the composition includes: polyquaternium-39 (polyquaternium-39), trisodium ethylenediamine disuccinate And polyquaternium-51 (Polyquaternium-51).

Regarding an Imidazoline type surfactant, a structure containing a ring and a pentavalent nitrogen atom in its molecule. The parent structure of imidazoline is imidazole, reflecting a molecular structure of a five-membered heterocyclic ring containing tertiary nitrogen and imine groups. It is highly effective, non-toxic, low irritant, and has excellent biodegradability.

The composition of the imidazoline type surfactant includes: sodium cocoamphoacetate, sodium lauroamphoacetate, disodium cocoamphodiacetate (Disodium Cocoamphodiacetate) and sodium cocoamphopropionate.

Furthermore, the aforementioned zwitterionic surfactant can further be an amino acid type. A series of zwitterionic surfactants, wherein the composition of the amino acid surfactant comprises: Acetyl Hexapeptide-8, Hydrolyzed Oat Protein, Hydrolyzed Conchiolin Protein And a pentacyclic polypeptide (Palmitoyl pentapeptide-4).

Further, the zwitterionic surfactant is a main component of the whole cleaning composition, and the weight percentage thereof is 1 to 90% of the total, and further may be 5 to 30% of the total weight, and further Can be 8~20% of the total weight percentage.

About acid-base buffer solution:

The acid-base buffer solution used in the present invention is mainly a conjugate acid-base buffer solution, which comprises: a Citric acid buffer, a citrate buffer, and an Acetic acid buffer. Phosphate acid buffer and Glycine buffer.

The pH of the above acid-base buffer solution should be between 3.0 and 6.6. The concentration ratio and range of the various acid-base buffer solutions are further exemplified below.

1. Citric acid buffer, the solution concentration of which is controlled at 0.01-5 mol concentration (mol/l), preferably 0.1 mol concentration (mol/l). The Citric acid buffer is composed of Citric acid (citric acid) and di sodium hydrogen phosphate (dihydrogen phosphate). When Citric acid (citric acid) is X=27.9~80.3%, , disodium hydrogen phosphate (disodium hydrogen phosphate) is (100-X)%.

According to the above, disodium hydrogen phosphate (disodium hydrogen phosphate) can be further substituted with sodium phosphate (sodium phosphate).

2. Citrate buffer, its solution concentration is also controlled At a concentration of 0.01 to 5 moles (mol/l), a preferred concentration of 0.1 mole (mol/l) is preferred. The citrate buffer solution is a mixture of di-sodium citrate (dicalcium citrate) and HCl (hydrochloric acid). When di-sodium citrate (disodium citrate) is X=39.9~100 When it is %, HCl (hydrochloric acid) is (100-X)%, and its pH is preferably recommended to be between 3.0 and 5.0.

3. Acetic acid buffer, the solution concentration is also controlled at 0.01-5 molar concentration (mol/l), preferably 0.1 mole concentration (mol/l). Acetic acid buffer is a mixture of sodium Acetic acid and Acetic acid. When sodium Acetic acid is X=10.9~89.3%, Acetic acid (Acetic acid) Acetic acid) is (100-X)%, and its pH is preferably recommended to be between 3.8 and 5.8.

4. Phosphate acid buffer, the solution concentration is also controlled at 0.01-5 molar concentration (mol/l), preferably 1/15 molar concentration (mol/l). Phosphate acid buffer is a mixture of potassium dihydrogen phosphate acid (dihydrogen phosphate) and di-sodium dihydrogen phosphate acid (potassium dihydrogen phosphate). When X=65.3~99.2%, di-sodium dihydrogen phosphate acid is (100-X)%, and the pH value is preferably between 5.0 and 6.6.

5. Glycine buffer, the solution concentration is also controlled at 0.01-5 molar concentration (mol/l), preferably 0.1 mole concentration (mol/l). The glycine buffer solution (Glycine buffer) is a mixture of glycine (glycine) and NaCl (sodium chloride). When glycine (glycine) is X=81~90.3%, NaCl (sodium chloride) is ( 100-X)%, and its pH is preferably recommended to be between 3.0 and 5.0.

Further, the weight percentage of the acid-base buffer solution accounts for the total 0.2~20%, further can be 0.2~15% of the total weight percentage, and further can be 0.2~10% of the total weight percentage.

In summary, the acid-base buffer solution provided by the present invention is mainly used for adjusting the pH of the whole cleaning composition, so that the cleaning composition of the zwitterionic surfactant can be in an acidic environment to provide a cation. In order to achieve antibacterial effect, and can change the acidity of the cleaning products according to the project, for example: the pH value for the human body will be adjusted to be weakly acidic, the pH value is between about 5.0 and 6.6; if it is used at home The detergent product can have a pH between 3.0 and 6.6.

Further, the cleaning composition of the zwitterionic surfactant provided by the present invention may further comprise various waxes, thickeners and oils, which can be mainly used according to the presentation of the cleaning product dosage form, such as hand washing cream. .

Furthermore, the cleaning composition of the zwitterionic surfactant may further comprise a coloring agent, a preservative, a fragrance and an antioxidant.

Another object of the present invention is to provide a method for preparing a cleaning composition for a zwitterionic surfactant, which is specifically as follows: Please refer to FIG. 1 , which illustrates a method for preparing a cleaning composition of a zwitterionic surfactant according to the present invention. flow chart. First, the first step (S100) is carried out: adding a weight percentage of 1-90% zwitterionic surfactant and a weight percentage of 0.2-20% acid-base buffer solution to a container at room temperature, stirring and dissolving to form a first mixed solution; followed by step two (S200): adjusting the pH of the first mixed solution, the pH of the first mixed solution is between 3.0 and 6.6 to form a second mixed solution; and the step Three (S300): adding water to the second mixed solution to make the weight percentage of the composition reach 100%, and then continuously stirring until completely dissolved, that is, a zwitterionic type A cleaning composition for a surfactant.

Wherein in step two (S200), Citric acid (citric acid), HCl (hydrochloric acid), Acetic acid (acetic acid), potassium dihydrogen phosphate acid (potassium dihydrogen phosphate) in the acid-base buffer solution mentioned above is used. And any of the glycine (glycine) acid as an acid regulator, and the alkaline regulator is mainly sodium hydroxide (NaOH).

In summary, the present invention uses an acid-base buffer solution to control the pH of the zwitterionic surfactant to an acidic condition, and maintains the zwitterionic surfactant in a cationic state in an acidic environment to have a cationic interface activity. The antibacterial ability of the agent, because the skin irritation of the zwitterionic surfactant is much smaller than that of the cationic surfactant and other chemical antibacterial agents or fungicides, it is very suitable for use in human body cleaning and antibacterial use.

Example 1 - Antibacterial Test of Antibacterial Hand Wash Mousse

2 to 4, FIG. 2 is an analysis diagram of the Escherichia coli colony of the antibacterial hand washing mousse according to the first embodiment of the present invention, and FIG. 3 is an analysis diagram of the Pseudomonas aeruginosa colony of the antibacterial hand washing mousse according to the first embodiment of the present invention and FIG. It is an analysis chart of Klebsiella colonies of the antibacterial hand washing mousse of Example 1 of the present invention. The results showed that the antibacterial hand-washing mousse was reacted with Escherichia coli, Pseudomonas aeruginosa and Klebsiella bacteria for 10 seconds, and the colonies without E. coli were grown on the medium, indicating the antibacterial hand washing mousse of Example 1 of the present invention. It has an antibacterial effect, wherein the left medium shown in Fig. 2 to Fig. 4 is a control group, and the right medium is an experimental group (antibacterial hand washing mousse).

The method of testing is further explained below:

Test strain: Escherichia coli (ATCC 8739), Pseudomonas aeruginosa and Klebsiella

Action conditions: 25 ± 2 ° C; for 10 seconds.

Culture conditions: 35 ± 2 ° C; culture for 48 hours.

Test group: control group: 0.85% sterile physiological saline; experimental group: antibacterial hand washing mousse.

The antibacterial test method for the antibacterial hand-washing silk of the first embodiment of the present invention is based on the method of JIS Z2801:2010. First, the bacterial concentration is set to a desired bacterial count of about 10 ⁷ CFU/mL, and 0.1 mL of the bacterial suspension is taken. The control group and the experimental group were added to the control group and the experimental group, and then the control group and the experimental group were inoculated with the bacterial solution at 25±2° C. for 10 seconds, and the control group and the experimental group were serially diluted 10 times with 9 mL of sterile experimental water. Finally, after serial dilution, the cells were inoculated on an appropriate medium, and the medium was cultured under the conditions described in the culture conditions, and the growth state was observed and the number of colonies was recorded. The formula for calculating the antibacterial ability is as follows: antibacterial rate (%) = (remaining bacteria in the control group - residual bacteria in the experimental group) / residual bacteria in the control group * 100%

Then refer to Table 1. Table 1 shows the antibacterial effect of antibacterial hand-washing mousse and different strains. The results show that after 10 seconds of antibacterial hand-washing mousse and bacterial solution, against Escherichia coli, Pseudomonas aeruginosa and Kreb The antibacterial rate is >99.99%.

Further, the antibacterial hand-washing mousse was also treated with the drug-resistant Staphylococcus aureus and the Salmonella enterica bacteria for the antibacterial test, and it was found that the antibacterial hand-washing mousse had an antibacterial effect against Salmonella, while the drug-resistant Staphylococcus aureus was resistant. The antibacterial ability is ineffective (as shown in Table 2). This result indicates that the antibacterial effect of antibacterial hand washing mousse may be mainly reflected in the part of the bacteria.

As described above, with reference to the composition ratio of the antibacterial hand-washing mousse of the embodiment 1 of the present invention, please refer to Table 3.

Claims (10)

An antibacterial type zwitterionic surfactant cleaning composition comprising: a zwitterionic surfactant, wherein the zwitterionic surfactant is in a cationic form; an acid-base buffer solution for controlling the The zwitterionic surfactant has a pH between 3.0 and 6.6; and one water, wherein the zwitterionic surfactant has a weight percentage of 1 to 90%, and the acid-base buffer solution has a weight percentage of 0.2 to 20 %, the cleaning composition of the zwitterionic surfactant has a pH between 3.0 and 6.6. The antibacterial type zwitterionic surfactant cleaning composition according to claim 1, wherein the zwitterionic surfactant is selected from the group consisting of a betaine type surfactant, nitric oxide ( A group consisting of at least one of an Amine oxide type surfactant, a polyquaternium type surfactant, an Imidazoline type surfactant, and an amino acid type surfactant. The antibacterial type zwitterionic surfactant cleaning composition according to claim 2, wherein the composition of the betaine type surfactant comprises: lauryl betaine, coconut Cocoamidopropyl Betaine, Lauramidopropyl Betaine, Decyl betaine, Alkyl betaine, Coco-betaine (Coco) -betaine), Cetyl betaine, Tallow betaine, Behenyl betaine, Stearyl betaine, Myristyl betaine, Cocamidoethyl betaine, Soyamidopropyl betaine, sulphate Oleamidopropyl betaine, Sesamidopropyl betaine, Oatamidopropyl Betaine, Palmamidopropyl betaine, Cocoamine Cocamidopropyl hydroxysultaine and Lauryl hydroxysultaine. The antibacterial type zwitterionic surfactant cleaning composition according to claim 2, wherein the composition of the amine oxide type surfactant comprises: lauryl dimethylamine (Lauryl Dimethyl) Amine Oxide), Cocamine oxide, Oleamine oxide, Behenamine oxide, Stearamine oxide, decylamine oxide Decylamine oxide, Tallowamine oxide, Palmitamine oxide, Myristamine oxide, Trimethylamine Oxide, PEG-3 distearate PEG-3 Lauramine oxide, Sesamidopropylamine oxide, Cocamidopropylamine oxide, Soyamidopropylamine Oxid), Oleamidopropylamine oxide and Olivamidopropylamine oxide. A cleaning composition for an antibacterial zwitterionic surfactant as described in claim 2, wherein The composition of the polyquaternium type surfactant includes: polyquaternium-39 and polyquaternium-51. The antibacterial type zwitterionic surfactant cleaning composition according to claim 2, wherein the composition of the imidazoline type surfactant comprises: sodium cocoamphoacetate (Sodium cocoamphoacetate) ), Sodium lauroamphoacetate, Disodium Cocoamphodiacetate, Sodium Cocoamphopropionate, Cocoa amphoteric dipropionate And trisodium ethylenediamine disuccinate. The antibacterial type zwitterionic surfactant cleaning composition according to claim 2, wherein the amino acid type surfactant comprises: Acetyl Hexapeptide-8, hydrolyzed oatmeal Hydrolyzed Oat Protein, Hydrolyzed Conchiolin Protein, and Palmitoyl Pentapeptide-4. The cleaning composition of the antibacterial zwitterionic surfactant according to claim 1, wherein the pH of the acid-base buffer solution is between 3.0 and 6.6, and the acid-base buffer solution comprises: Citric acid buffer, citrate buffer, Acetic acid buffer, Phosphate acid buffer, and Glycine buffer. The antibacterial type zwitterionic surfactant cleaning composition according to claim 1, wherein the composition further comprises a wax, a thickener, an oil agent, a colorant, a preservative, Fragrance and antioxidants. A method for preparing a cleaning composition for an antibacterial zwitterionic surfactant according to claim 1, which comprises the steps of: (1) adding a weight percentage of 1-90% at room temperature; a zwitterionic surfactant and a weight percentage of 0.2-20% acid-base buffer solution into a container, stirred and dissolved to form a first mixed solution; (2) adjusting the pH of the first mixed solution to make the first a mixed solution having a pH between 3.0 and 6.6 to form a second mixed solution; and (3) adding water to the second mixed solution to bring the composition to 100% by weight, followed by continuous stirring To complete dissolution, a cleaning composition of a two-ionic surfactant is obtained.