TWI635130B - Resin composition - Google Patents

Abstract

An object of the present invention is to provide a resin composition which can obtain a cured product having a low dielectric loss tangent and which can suppress stains in a via hole after roughening treatment.

The solution is a resin composition comprising an epoxy resin, an active ester compound, and one or more resins selected from the group consisting of alkylated melamine resins and alkoxyalkylated phenol resins.

Description

Resin composition

The present invention relates to a resin composition. Further, it relates to a sheet laminate, a multilayer printed wiring board, and a semiconductor device.

In recent years, as electronic devices have been developed to be smaller and higher in performance, wiring of the multilayer printed wiring board has been required to be finer and higher in density. In addition, in order to reduce the transmission loss, the insulating layer is required to use an insulating material having a lower dielectric loss tangent.

A known manufacturing method of a multilayer printed wiring board is a manufacturing method in which a circuit board is used to alternately laminate an insulating layer and a conductor layer. In the manufacturing method of the assembly method, the insulating layer is formed, for example, by laminating a layer of a resin composition on a circuit board using a sheet-like laminate containing a resin composition, and then thermally curing the resin composition. Next, the formed insulating layer is subjected to a hole punching process to form a via hole (for example, Patent Document 1).

Prior technical literature Patent literature

Patent Document 1: JP-A-2008-37957

When the insulating layer is holed, resin residue (stain) occurs in the through hole and the stain is removed by roughening. However, the present inventors have found that when a multilayer printed wiring board is produced using a resin composition having a low dielectric loss tangent containing an active ester compound, it is difficult to remove the channel even if the insulating layer is subjected to a roughening treatment in the through hole after hole processing. The stain inside.

Therefore, an object of the present invention is to provide a resin composition which can obtain a cured product having a low dielectric loss tangent and which can suppress stains in the through holes after the roughening treatment.

In order to solve the above problems, the inventors of the present invention have found that a specific resin composition containing an alkylated melamine resin and/or an alkoxyalkylated phenol resin in addition to an epoxy resin and an active ester compound can solve the above problems. The present invention has been completed.

That is, the present invention encompasses the following.

[1] A resin composition comprising (A) an epoxy resin, and (B) an active ester compound, and (C) an alkylated melamine resin and an alkoxyalkylated phenol resin. More than one resin selected.

[2] The resin composition according to [1], wherein the total amount of the component (A) and the component (B) in the resin composition is 100% by mass, the component (C) The content is from 0.1% by mass to 30% by mass.

[3] The resin composition according to [1] or [2], wherein the content of the component (B) is from 1% by mass to 30% by mass based on 100% by mass of the nonvolatile component in the resin composition.

[4] The resin composition according to any one of [1] to [3] wherein the alkylated melamine resin is a melamine resin containing a structural unit represented by the following formula (1).

[wherein, X ¹ , X ² , X ³ , X ⁴ , X ⁵ and X ⁶ represent a respective independent hydrogen atom, a group represented by the formula: -CH ₂ OH, and a formula: -CH ₂ -OR ¹ a group represented by the formula -CH ₂ -*, wherein R ¹ is an alkyl group, and * is a bonding bond; but at least one of X ¹ , X ² , X ³ , X ⁴ , X ⁵ and X ⁶ is Formula: -CH _{2 -} the group represented by OR ¹ ].

[5] The resin composition according to any one of [1] to [4] wherein the alkoxyalkylated phenol resin is a phenol resin containing a structural unit represented by the following formula (2).

Wherein Y represents a hydrogen atom or a group represented by the formula: -R ² -*, wherein R ² is an alkylene group or a single bond, * is a bond, and Z ¹ represents a formula: -CH(R ³ ) a group represented by -OR ⁴ , wherein R ³ is a hydrogen atom, an alkyl group, a phenyl group or a hydroxyphenyl group, R ⁴ is an alkyl group, and Z ² represents a group represented by the formula: -R ⁵ -* or a formula: -R ⁶ (-*) ₂ represents a group, wherein R ⁵ is an alkylene group or a single bond, R ⁶ is an alkanetriyl group, * is a bond, and Z ³ represents an alkyl group which may have a substituent, m and n are integers corresponding to 2≦l+m+n≦5 and 1≦l].

[6] The resin composition according to any one of [1] to [5], further comprising (D) an inorganic filler.

[7] The resin composition according to [6], wherein (D) the inorganic filler has an average particle diameter of from 0.01 μm to 5 μm.

[8] The resin composition according to [6] or [7], wherein the content of the component (D) is from 50% by mass to 85% by mass based on 100% by mass of the nonvolatile component in the resin composition.

[9] The resin composition according to any one of [1] to [8] which is a resin composition for an insulating layer of a multilayer printed wiring board.

[10] The resin composition as described in any one of [1] to [9] which is A resin composition for an assembly layer of a multilayer printed wiring board.

[11] A sheet-like laminate comprising the resin composition according to any one of [1] to [10].

[12] A multilayer printed wiring board comprising an insulating layer formed of a cured product of the resin composition according to any one of [1] to [10].

[13] A semiconductor device comprising the multilayer printed wiring board according to [12].

[14] A method of producing a multilayer printed wiring board, wherein the sheet-like laminate according to [11] is laminated on a circuit board, and the resin composition is thermally cured to form an insulating layer, and then formed on the circuit substrate. The upper insulating layer is subjected to a hole punching process to form a through hole.

The resin composition of the present invention can obtain a cured product having a low dielectric loss tangent, and can suppress stains in the through holes after the roughening treatment by punching the cured product.

Form of implementing the invention [Resin composition]

The resin composition of the present invention is characterized in that it contains (A) an epoxy resin, and (B) an active esterified product, and (C) an alkylated melamine resin and an alkoxyalkylated phenol resin. More than one resin selected.

<(A) component>

The component (A) contained in the resin composition of the present invention is an epoxy resin. The epoxy resin is not particularly limited, but is preferably an epoxy resin having two or more epoxy groups in one molecule. Specifically, for example, bisphenol A type epoxy resin, bisphenol F type epoxy resin, bisphenol S type epoxy resin, bisphenol AF type epoxy resin, phenol novolac type epoxy resin, tert-butyl-儿儿Phenolic epoxy resin, naphthol epoxy resin, naphthalene epoxy resin, naphthalene ether epoxy resin, glycidylamine epoxy resin, glycidyl epoxy resin, cresol novolac ring Oxygen resin, biphenyl type epoxy resin, dicyclopentadiene type epoxy resin, fluorene type epoxy resin, linear aliphatic epoxy resin, epoxy resin having butadiene structure, alicyclic epoxy resin , Heterocyclic epoxy resin, epoxy resin containing spiro ring, cyclohexane dimethanol type epoxy resin, trimethylol type epoxy resin, halogenated epoxy resin, and the like. The epoxy resins may be used alone or in combination of two or more.

Among them, bisphenol A type epoxy resin, bisphenol F type epoxy resin, bisphenol AF type epoxy resin, naphthalene are preferred from the viewpoints of improving heat resistance, improving insulation reliability, and improving adhesion to a conductor layer. Phenolic epoxy resin, naphthalene epoxy resin, biphenyl epoxy resin, dicyclopentadiene epoxy resin, naphthalene ether epoxy resin, glycidyl ester epoxy resin, fluorene epoxy resin, An epoxy resin having a butadiene structure. Specifically, bisphenol A type epoxy resin ("JER828EL" and "YL980" manufactured by Mitsubishi Chemical Corporation), bisphenol F type epoxy resin ("JER806H" and "YL983U" manufactured by Mitsubishi Chemical Corporation), double Phenol type AF epoxy resin ("ZX1059" manufactured by Nippon Steel & Sumitomo Chemical Co., Ltd.) and naphthalene type bifunctional epoxy resin (HP4032 manufactured by DIC Co., Ltd.) "HP4032D" and "HP4032SS"), naphthalene type tetrafunctional epoxy resin ("HP4700" and "HP4710" made by DIC), and naphthol type epoxy resin (ESN-475V manufactured by Tohto Kasei Co., Ltd.) ") Epoxy resin having a butadiene structure ("PB-3600" manufactured by Daischer Chemical Industries Co., Ltd.) and biphenyl type epoxy resin ("NC3000H" and "NC3000L" manufactured by Nippon Kayaku Co., Ltd. "NC3100", Mitsubishi Chemical Co., Ltd. "YX4000", "YL6121"), bis-xylenol type epoxy resin ("XX4000H", "YX4000HK" manufactured by Mitsubishi Chemical Corporation), and dicyclopentadiene type Epoxy resin ("HP-7200HH" manufactured by DIC Co., Ltd.), bismuth epoxy resin ("YX8800" manufactured by Mitsubishi Chemical Corporation), and naphthalene ether epoxy resin (DIC) "EXA-7310". "EXA-7311", "EXA-7311L", "EXA7311-G3", "EXA7311-G4", "EXA7311-G4S"), and glycidyl ester epoxy resin ("EX711" manufactured by Nagase Co., Ltd." EX721", Principal "R540", etc.

Further, a liquid epoxy resin and a solid epoxy resin are preferably used in combination, and more preferably an aromatic epoxy resin having two or more epoxy groups in one molecule and a liquid at a temperature of 20 ° C (hereinafter referred to as The "liquid epoxy resin" is a state in which a solid epoxy resin (hereinafter referred to as "solid epoxy resin") having three or more epoxy groups in one molecule and having a temperature of 20 ° C kind. The aromatic epoxy resin of the present invention refers to an epoxy resin having an aromatic ring structure in its molecule. When the epoxy resin and the solid epoxy resin are used together with the epoxy resin, the resin composition is used in the form of a sheet-like laminate, and the resin has a moderate flexibility and a cured product of the resin composition has a moderate breaking strength. The addition ratio (liquid epoxy resin: solid epoxy resin) is preferably in the range of mass ratio 1:0.1 to 1:6, and is also 1: The range of 0.1 to 1:5 is better, more preferably 1 to 0.3 to 1:4.5, and particularly preferably 1:0.6 to 1:4.

In the resin composition of the present invention, the content of the component (A) is preferably from 3% by mass to 40% by mass, and further preferably from 5% by mass to 35, from the viewpoint of improving the mechanical strength and the insulating reliability of the cured product of the resin composition. The mass % is preferably more preferably 10% by mass to 30% by mass.

In addition, the content of each component in the resin composition in the present invention is a value of 100% by mass based on the total of the nonvolatile components in the composition, unless otherwise noted.

The epoxy equivalent of the epoxy resin is preferably from 50 to 3,000, more preferably from 80 to 2,000, still more preferably from 110 to 1,000. When it is in this range, an insulating layer having a low surface roughness of a sufficiently hardened crosslink density can be obtained. Further, the epoxy equivalent can be measured in accordance with JIS K7236 and is a resin mass containing 1 equivalent of an epoxy group.

The weight average molecular weight of the epoxy resin is preferably from 100 to 5,000, more preferably from 250 to 3,000, still more preferably from 400 to 1,500. The weight average molecular weight of the epoxy resin is a weight average molecular weight in terms of polystyrene measured by a gel permeation chromatography (GPC) method.

<(B) component>

The component (B) contained in the resin composition of the present invention is an active ester compound. The active ester compound is a compound having one or more active ester groups in one molecule, and can reduce the dielectric loss tangent of the resin composition. Further, the active ester compound can reduce the cured product of the cured product of the resin composition after being roughened The square root mean square roughness Rq of the surface. The active ester compound is preferably a compound which can react with an epoxy resin or the like and has two or more active ester groups in one molecule. The active ester compound is generally a compound having two or more reactive groups having a high reactivity in one molecule such as a phenol ester, a thiophenol ester, an N-hydroxylamine, or an ester of a heterocyclic hydroxy compound. good. The active ester compounds may be used alone or in combination of two or more.

From the viewpoint of improving heat resistance, an active ester compound obtained by condensation reaction of a carboxylic acid compound and/or a sulfuric acid compound with a hydroxy compound and/or a thiol compound is preferred. Further, the carboxylic acid compound is preferably an active ester compound obtained by reacting one or more selected from the group consisting of a phenol compound, a naphthol compound and a sulfuric acid compound, more preferably a carboxylic acid compound, and reacting with an aromatic compound having a phenolic hydroxyl group. An aromatic compound having two or more active ester groups in one molecule, particularly preferably a carboxylic acid compound having at least two or more carboxyl groups in one molecule, and an aromatic compound obtained by reacting an aromatic compound having a phenolic hydroxyl group An aromatic compound having two or more active ester groups in one molecule of the aromatic compound. The active ester compound may be linear or branched. Further, when a carboxylic acid compound having at least two or more carboxyl groups in one molecule is a compound containing an aliphatic chain, compatibility with a resin composition can be improved, and when it is a compound having an aromatic ring, heat resistance can be improved.

The carboxylic acid compound is, for example, an aliphatic carboxylic acid having 1 to 20 carbon atoms (preferably 2 to 10, more preferably 2 to 8) or an aromatic carboxylic acid having 7 to 20 (preferably 7 to 10) carbon atoms. acid. Aliphatic carboxylic acids such as acetic acid, malonic acid, succinic acid, maleic acid, itaconic acid and the like. Aromatic carboxylic acids such as benzoic acid and citric acid , isophthalic acid, terephthalic acid, pyromellitic acid, and the like. Among them, succinic acid, maleic acid, itaconic acid, citric acid, isophthalic acid, terephthalic acid, and more preferably isophthalic acid or terephthalic acid are preferred from the viewpoint of heat resistance.

The sulfur carboxylic acid compound is not particularly limited, and examples thereof include sulfuric acid, thiobenzoic acid, and the like.

The phenol compound is, for example, a phenol compound having 6 to 40 carbon atoms (preferably 6 to 30, preferably 6 to 23, more preferably 6 to 22), preferably, for example, hydroquinone or resorcinol. Bisphenol A, bisphenol F, bisphenol S, phenol porphyrin, methylated bisphenol A, methylated bisphenol F, methylated bisphenol S, phenol, o-cresol, m-cresol, p- Cresol, catechol, dihydroxybenzophenone, trihydroxybenzophenone, tetrahydroxybenzophenone, pyrogallol, benzenetriol, dicyclopentadiene diphenol, and the like. A phenol novolac can be used as the phenol compound.

The naphthol compound is, for example, a naphthol compound having 10 to 40 carbon atoms (preferably 10 to 30, more preferably 10 to 20), preferably, for example, α-naphthol, β-naphthol, 1,5- Dihydroxynaphthalene, 1,6-dihydroxynaphthalene, 2,6-dihydroxynaphthalene, and the like. A naphthol novolak can also be used as the naphthol compound.

Among them, bisphenol A, bisphenol F, bisphenol S, methylated bisphenol A, methylated bisphenol F, methylated bisphenol S, and catechu are preferred in terms of improving heat resistance and improving solubility. Phenol, α-naphthol, β-naphthol, 1,5-dihydroxynaphthalene, 1,6-dihydroxynaphthalene, 2,6-dihydroxynaphthalene, dihydroxybenzophenone, trihydroxybenzophenone, Tetrahydroxynaphthyl ketone, phenol porphyrin, benzene diol, dicyclopentadiene type diphenol, phenol novolac, catechol, 1,5-dihydroxynaphthalene, 1,6-dihydroxynaphthalene, 2 ,6-dihydroxynaphthalene, dihydroxybenzophenone Ketone, trihydroxybenzophenone, tetrahydroxybenzophenone, phenol porphyrin, benzenediol, dicyclopentadiene diphenol, phenol novolac, preferably 1,5-dihydroxynaphthalene, 1 ,6-dihydroxynaphthalene, 2,6-dihydroxynaphthalene, dihydroxybenzophenone, trihydroxybenzophenone, tetrahydroxybenzophenone, dicyclopentadiene diphenol, phenol novolac, 1,5-dihydroxynaphthalene, 1,6-dihydroxynaphthalene, 2,6-dihydroxynaphthalene, dicyclopentadiene-type diphenol, phenol novolac, more preferably 1,5-dihydroxynaphthalene 1,6-dihydroxynaphthalene, 2,6-dihydroxynaphthalene, dicyclopentadiene-type diphenol, preferably dicyclopentadiene-type diphenol.

The thiol compound is not particularly limited, and examples thereof include benzene thiol and triazine dithiol.

Preferred examples of the active ester hardener are, for example, an active ester compound containing a dicyclopentadiene type diphenol structure, an active ester compound containing a naphthalene structure, an active ester compound containing an acetylated phenol novolak, and a phenol novolac. The active ester compound of benzoquinone is preferably an active ester compound containing a naphthalene structure or an active ester compound containing a dicyclopentadiene type diphenol structure. In the present invention, the "dicyclopentadiene type diphenol structure" means a divalent structural unit formed by stretching a phenyl-dicyclopentene-phenylene group.

The active ester compound containing a dicyclopentadiene type diphenol structure is more specifically a compound of the following formula (a).

(wherein R is a phenyl group or a naphthyl group, k is 0 or 1, and n is 0.05 to 2.5 of the average of the repeated units).

From the viewpoint of lowering dielectric loss tangent and improving heat resistance, R is preferably a naphthyl group, k is preferably 0, and n is preferably 0.25 to 1.5.

As the component (B), the active ester compound disclosed in JP-A-2004-277460 can be used, and a commercially available active ester compound can also be used. Commercially available active ester compound, such as EXB9451, EXB9460, EXB9460S, HPC-8000-65T (manufactured by DIC), which is an active ester-based curing agent containing a dicyclopentadienyl diphenol structure, and contains a naphthalene structure. EXB9416-70BK (manufactured by DIC Co., Ltd.) for active ester-based curing agent, DC808 (manufactured by Mitsubishi Chemical Corporation), which is an active ester-based curing agent for acetylated phenol novolak, as a phenol novolac YLH1026 (manufactured by Mitsubishi Chemical Corporation) for the active ester-based curing agent of benzoquinone.

The content of the component (B) is preferably 30% by mass or less, more preferably 20% by mass or less, and still more preferably 15% by mass or less from the viewpoint of improving heat resistance and suppressing generation of stains. Further, from the viewpoint of enhancing the peeling strength, the lower limit of the content of the component (B) is preferably 1% by mass or more, more preferably 3% by mass or more, and still more preferably 5% by mass or more.

Further, when the number of epoxy groups of the (A) epoxy resin is 1, the reaction group of the active ester compound is preferably from 0.2 to 2, and from 0.3 to 1.5, from the viewpoint of improving the mechanical properties of the resin composition. Better, better 0.4~1. In this case, the "epoxy group number of epoxy resin" means the mass of the solid content of each epoxy resin present in the resin composition of all the epoxy resins divided by the epoxy resin. The total value of the value of the equivalent. Further, the "reactive group" means a functional group reactive with an epoxy group, and "the number of reactive groups of the active ester compound" means the total of the mass of the solid component of the active ester compound present in the resin composition divided by the equivalent of the reactive group equivalent. value.

<(C) component>

The component (C) contained in the resin composition of the present invention is one or more resins selected from the group consisting of alkyl melamine resins and alkoxyalkylated phenol resins. By using the component (C), even when a multilayer printed wiring board is produced using a resin composition containing a low dielectric loss tangent of an active ester compound, the cured product of the resin composition can be prevented from being roughened after being punched. Stain in the through hole after treatment. In this case, the "stain suppression" of the present invention means that the amount of stain generated during the hole punching process is reduced, and the stain at the time of the roughening treatment is more easily removed.

-alkylated melamine resin -

The alkylated melamine resin is obtained by reacting melamine with formaldehyde to replace some or all of the hydrogen atoms of the amine group with a methylol group, and then reacting with the ethanol compound to convert some or all of the methylol groups into alkoxy groups. Methyl yield.

The alkylated melamine resin has a functional group represented by one or more formulas: -N(-CH ₂ -OR ¹ ) ₂ , and a functional group represented by the formula: -N(-CH ₂ -OR ¹ )CH ₂ OH A functional group represented by the formula: -N(CH ₂ -OR ¹ )H. In this case, R ¹ in the above functional group is an alkyl group, and is preferably exemplified as described later. For example, when R ¹ is a methyl group, it is called a methylated melamine resin, and when R ¹ is a butyl group, it is called a butylated melamine resin.

In one embodiment, the alkoxylated melamine resin is a melamine resin containing a structural unit represented by the following formula (1).

[wherein, X ¹ , X ² , X ³ , X ⁴ , X ⁵ and X ⁶ represent a respective independent hydrogen atom, a group represented by the formula: -CH ₂ OH, and a formula: -CH ₂ -OR ¹ a group represented by the formula: -CH ₂ -*, wherein R ¹ is an alkyl group, and * is a bonding bond, but at least 1 of X ¹ , X ² , X ³ , X ⁴ , X ⁵ and X ⁶ The formula is: the base represented by -CH ₂ -OR ¹ ].

In the group represented by -CH ₂ -OR ¹ , R ¹ is an alkyl group, preferably an alkyl group having 1 to 20 carbon atoms, more preferably an alkyl group having 1 to 10 carbon atoms, more preferably carbon. The alkyl group having 1 to 6 atomic atoms is particularly preferably an alkyl group having 1 to 4 carbon atoms, an alkyl group having 1 to 2 carbon atoms, or an alkyl group having 1 carbon atom. The alkyl group may be linear or branched. Preferred examples of the alkyl group are, for example, methyl, ethyl, propyl, isopropyl, butyl, sec-butyl, isobutyl, tert-butyl.

In the formula (1), at least one of X ¹ , X ² , X ³ , X ⁴ , X ⁵ and X ⁶ is a group represented by -CH ₂ -OR ¹ . In a preferred embodiment, it is preferable that two or more of X ¹ , X ² , X ³ , X ⁴ , X ⁵ and X ⁶ are used, and more preferably three or more, more preferably four or more, and the formula: -CH _{2 -} The base represented by OR ¹ . When the plural R ¹ is present in the formula (1), the number of carbon atoms may be the same or different.

In a preferred embodiment, the alkylated melamine resin contains a structural unit represented by the following formula (1-1) as a basic skeleton. In this case, when the alkylated melamine resin is a melamine resin (monomer) formed of a structural unit represented by the following formula (1-1), the "containing as a basic skeleton" includes two or more of the following. When the melamine (condensation polymer) formed by the condensation condensation of the structural unit represented by the formula (1-1), both of them also contain a mixture of the monomer and the condensation polymer. The same applies to the "containment as a basic skeleton" of the structural unit of the resin.

[wherein R' represents an alkyl group].

The alkyl group represented by R' in the formula (1-1) preferably has 1 to 20 carbon atoms, more preferably 1 to 10, still more preferably 1 to 6, and particularly preferably 1 to 4, 1 to 2 Or 1. Preferred examples of the alkyl group represented by R' are a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, a sec-butyl group, an isobutyl group, and a tert-butyl group. R' The number of carbon atoms may be the same or different.

In another preferred embodiment, the alkylated melamine resin is a structural unit represented by the following formula (1-2) as a basic skeleton.

[wherein R' is synonymous with the above].

In another preferred embodiment, the alkylated melamine resin is a structural unit represented by the following formula (1-3) as a basic skeleton.

[wherein R' is synonymous with the above].

In another preferred embodiment, the alkylated melamine The resin is a structural unit represented by the following formula (1-4) as a basic skeleton.

[wherein R' is synonymous with the above].

Further, the alkylated melamine resin may contain two or more of the structural units represented by the above formulas (1-1) to (1-4) as a basic skeleton. Therefore, in a preferred embodiment, the alkylated melamine resin is one or more structural units selected from the group consisting of the structural units represented by the above formulas (1-1) to (1-4). skeleton.

The weight average molecular weight of the alkylated melamine resin is preferably 300 or more, more preferably 350 or more, still more preferably 400 or more, still more preferably 450 or more, and particularly preferably 500 or more. The upper limit of the weight average molecular weight is preferably 10,000 or less, more preferably 5,000 or less, still more preferably 3,000 or less, and particularly preferably 2,000 or less. The weight average molecular weight of the alkylated melamine resin can be measured, for example, by gel permeation chromatography (GPC) method (in terms of polystyrene).

For the alkylated melamine resin, a commercially available product, a commercially available product of methylated melamine resin, such as "Nikara" manufactured by Sanwa Chemical Co., Ltd., may be used. MW-390", "Nikala MW-100LM" and "Nicara MX-750LM", "Spabe ELM-754" by DIC (shares), "Semel" by Orne (share). A commercially available product of a butylated melamine resin is, for example, "Spabe ELM-753" manufactured by DIC Corporation. Commercial products of the isobutylated melamine resin are, for example, "Spabe ELM-752" and "Spabe E-2125" manufactured by DIC Corporation.

- alkoxyalkylated phenol resin -

The alkoxyalkylated phenol resin contains a functional group represented by the formula: -CN(R ³ )-OR ⁴ (wherein R ³ is a hydrogen atom, an alkyl group, a phenyl group or a hydroxyphenyl group, R ⁴ A phenolic resin of a phenol skeleton which is an alkyl group. Preferred examples of R ³ and R ^{4 in} the above functional group at this time are as described later. For example, when R ³ is a hydrogen atom, it is called an alkoxymethylated phenol resin.

In one embodiment, the alkoxyalkylated phenol resin is a phenol resin containing a structural unit represented by the following formula (2).

Wherein Y represents a hydrogen atom or a group represented by the formula: -R ² -*, in which case R ² is an alkylene group or a single bond, * is a bonded chain, and Z ¹ represents a formula: -CH(R ³ a group represented by -OR ⁴ , wherein R ³ is a hydrogen atom, an alkyl group, a phenyl group or a hydroxyphenyl group, R ⁴ is an alkyl group, and Z ² represents a group or a formula represented by the formula: -R ⁵ -*: a group represented by -R ⁶ -(-*) ₂ , wherein R ⁵ is an alkylene group or a single bond, R ⁶ is an alkanetriyl group, * is a bond, and Z ³ represents an alkyl group which may have a substituent. The base, l, m and n are integers corresponding to 2≦l+m+n≦5 and 1≦l].

In the formula (2), Y represents a hydrogen atom or a group represented by the formula: -R ² -*. At this time, R ² is an alkyl group or a single bond, and * is a bond. The alkylene group represented by R ² may be linear or branched. The number of carbon atoms of the alkylene group represented by R ² is preferably from 1 to 10, more preferably from 1 to 6, more preferably from 1 to 4, particularly preferably from 1 or 2.

In a preferred embodiment, Y is a hydrogen atom.

In the formula (2), Z ¹ represents a group represented by the formula: -CH(R ³ )-OR ⁴ . In this case, R ³ is a hydrogen atom, an alkyl group, a phenyl group or a hydroxyphenyl group, and R ⁴ is an alkyl group. The alkyl group represented by R ³ may be linear or branched. The alkyl group represented by R ³ preferably has 1 to 3 carbon atoms, more preferably 1 or 2. R ^{3 is} preferably a hydrogen atom or an alkyl group having 1 to 3 carbon atoms, more preferably a hydrogen atom. The alkyl group represented by R ⁴ may be linear or branched. The alkyl group represented by R ⁴ preferably has 1 to 20 carbon atoms, more preferably 1 to 10, still more preferably 1 to 6, and particularly preferably 1 to 4, 1 to 2 or 1.

In the formula (2), Z ² represents a group represented by the formula: -R ⁵ -* or a group represented by the formula: -R ⁶ (-*) ₂ . At this time, R ⁵ is an alkylene group or a single bond, R ⁶ is an alkane triyl group, and * is a bond bond. The alkylene group represented by R ⁵ may be linear or branched. The number of carbon atoms of the alkylene group represented by R ⁵ is preferably from 1 to 10, more preferably from 1 to 6, more preferably from 1 to 4, particularly preferably from 1 or 2. The alkanetriyl group represented by R ⁶ may be linear or branched. The number of carbon atoms of the alkanetriyl group represented by R ⁶ is preferably from 1 to 10, more preferably from 1 to 6, more preferably from 1 to 4, particularly preferably from 1 or 2.

In the formula (2), Z ³ represents an alkyl group which may have a substituent. The alkyl group in R ³ may be linear or branched. The carbon number of the alkyl group in Z ³ is preferably from 1 to 20, more preferably from 1 to 10, still more preferably from 1 to 6, and particularly preferably from 1 to 4. The number of carbon atoms does not include the number of carbon atoms of the substituent.

The substituent which the alkyl group in Z ³ may have is particularly limited, and is, for example, a cycloalkyl group, an aryl group, or a structural unit represented by the formula (2).

The number of carbon atoms of the cycloalkyl group used as the substituent is preferably from 3 to 20, more preferably from 3 to 12, still more preferably from 3 to 6. The cycloalkyl group is, for example, a cyclopropyl group, a cyclobutyl group, a cyclopentyl group and a cyclohexyl group.

The aryl group used as a substituent is a group obtained by removing a hydrogen atom on one aromatic ring from an aromatic hydrocarbon. The number of carbon atoms of the aryl group used as the substituent is preferably 6 to 24, more preferably 6 to 18, still more preferably 6 to 14, and particularly preferably 6 to 10. The aryl group is phenyl, naphthyl and anthracenyl.

The alkyl group in Z ³ may have a plurality of substituents. The two substituents adjacent to each other may be bonded to each other to form a ring. For example, when Z ³ is a methyl group having two phenyl groups as a substituent, two phenyl groups may be bonded to each other to form a 9H-fluoren-9-yl group.

The above substituent may have a substituent (hereinafter referred to as "secondary substituent"). The secondary substituent is not specifically described, and can be used as described above. The same thing as the base.

In the formula (2), l, m and n are integers satisfying 2≦l+m+n≦5 and 1≦l. The upper limit of the value of l+m+n is preferably 4 or less. l is preferably 1, 2 or 3, more preferably 1 or 2. m is preferably 0, 1, 2 or 3, more preferably 0, 1 or 2. n is preferably 0, 1 or 2, more preferably 0 or 1.

In a preferred embodiment, in the formula (2), a) l=1, m=1, n=0, Y is a hydrogen atom, and Z ² is a group represented by the formula: -R ⁶ (-*) ₂ , or b) l = 1, m = 2, n = 1, Y is a hydrogen atom, Z ² is a group represented by the formula: -R ⁵ - *, or c) l = 2, m = 0, n = 1, Y Is a hydrogen atom, or d) l = 1, m = 2, n = 0, Y is a hydrogen atom, Z ² is a group represented by the formula: -R ⁵ - *, or e) l = 1, m = 1, n=1, Y is a hydrogen atom, Z ² is a group represented by the formula: -R ⁵ -*, or f) l=2, m=1, n=0, Y is a formula: -R ² -* The base, Z ² is a group represented by the formula: -R ⁵ -*.

The alkoxyalkylated phenol resin may contain other structural units in addition to the structural unit represented by the formula (2). The other structural unit is not particularly limited, and is, for example, a structural unit represented by the formula (3) or a structural unit represented by the formula (4).

[wherein, Y, Z ² , Z ³ , n and m are synonymous with the above].

[wherein, Z ² , Z ³ , n and m are synonymous with the above].

When the alkoxyalkylated phenol resin contains a structural unit other than the structural unit represented by the formula (2), when the total mass of the alkoxyalkylated phenol resin is 100% by mass, the formula (2) is represented by The content of the structural unit is preferably 10% by mass or more, more preferably 20% by mass or more, still more preferably 30% by mass or more, still more preferably 40% by mass or more, and particularly preferably 50% by mass or more and 60% by mass or more. 70% by mass or more, 80% by mass or more, or 90% by mass or more. The upper limit of the content of the structural unit represented by the formula (2) is not particularly limited and may be 100% by mass.

The molecular weight of the alkoxyalkylated phenol resin (having a weight average molecular weight when distributed) is preferably 200 or more, more preferably 250 or more. The upper limit of the molecular weight is preferably 20,000 or less, more preferably 10,000 or less, still more preferably 5,000 or less. The molecular weight of the alkoxyalkylated phenol resin is as follows It can be determined by gel permeation chromatography (GPC).

The alkoxyalkylated phenol resin can be produced by any method previously known. Further, a commercially available product can be used as the alkoxyalkylated phenol resin. A commercially available product of an alkoxyalkylated phenol resin can be obtained, for example, from a source such as Group Chemical Industry Co., Ltd., Honshu Chemical Industry Co., Ltd., and Asahi Organic Materials Co., Ltd.

In the resin composition of the present invention, the content of the component (C) is preferably 30% by mass or less, and more preferably 30% by mass or less, in terms of the total amount of the component (A) and the component (B). It is preferably 25 mass% or less, more preferably 20 mass% or less, and particularly preferably 15 mass% or less. In addition, when the content of the component (C) is 100% by mass based on the total amount of the component (A) and the component (B), the content of the component (C) is preferably 0.1% by mass or more and 0.5% by mass or more. More preferably, it is 1% by mass or more, more preferably 1.5% by mass or more, and particularly preferably 2% by mass or more, 2.5% by mass or more, or 3% by mass or more.

<(D) Inorganic Filler>

The resin composition of the present invention may further contain (D) an inorganic filler in order to lower the linear thermal expansion coefficient and improve the stain removal property during the roughening treatment. Inorganic filler materials such as cerium oxide, aluminum oxide, glass, cordierite, ceric acid, barium sulfate, talc, clay, mica powder, aluminum hydroxide, magnesium hydroxide, calcium carbonate, magnesium carbonate, magnesium oxide, nitriding Boron, aluminum nitride, manganese nitride, aluminum borate, barium titanate, barium titanate, calcium titanate, magnesium titanate, barium titanate, titanium oxide, barium zirconate, calcium zirconate, zirconium phosphate and tungstic acid zirconium. Which Ceria is preferred. The cerium oxide is preferably amorphous cerium oxide, pulverized cerium oxide, molten cerium oxide, crystalline cerium oxide, synthetic cerium oxide, hollow cerium oxide or the like, more preferably molten cerium oxide. Further, the cerium oxide is preferably spherical cerium oxide (spherical cerium oxide). These may be used alone or in combination of two or more. Commercially available spherical molten cerium oxide, for example, "SO-C2" and "SO-C1" manufactured by Edelman Co., Ltd.

The average particle diameter of the inorganic filler is not particularly limited, but is preferably 5 μm or less from the viewpoint of suppressing the formation of fine wiring on the insulating layer and suppressing the occurrence of stains during the hole punching process under the total surface area of the inorganic filler. It is preferably 3 μm or less, more preferably 1 μm or less, further preferably 0.7 μm or less, particularly preferably 0.5 μm or less, and particularly preferably 0.4 μm or less, and most preferably 0.3 μm or less. In addition, the lower limit of the average particle diameter of the inorganic filler is preferably 0.01 μm or more, and preferably 0.03 μm or more, from the viewpoint of preventing the viscosity of the paint from rising and reducing the handleability when the resin composition is used as a paint. It is preferably 0.05 μm or more, more preferably 0.07 μm or more, and particularly preferably 0.1 μm or more. The average particle diameter of the above inorganic filler material can be determined by a laser diffraction or scattering method based on the Mie scattering theory, and specifically, the inorganic filler material can be produced by a laser diffraction scattering particle size distribution measuring device on a volume basis. The particle size distribution was measured for the same diameter as the average particle diameter. The measurement sample is preferably one in which an inorganic filler is dispersed in water by ultrasonic waves. As the laser diffraction scattering type particle size distribution measuring apparatus, LA-500, 750, 950, etc., manufactured by Horiba, Ltd., can be used.

The content of the inorganic filler is not particularly limited, but the flexibility when the resin composition is used in the form of a sheet-like laminate is prevented from being lowered. When the nonvolatile content in the resin composition is 100% by mass, it is preferably 85% by mass or less, more preferably 80% by mass or less, and still more preferably 75% by mass or less. Further, from the viewpoint of lowering the thermal expansion coefficient of the insulating layer, and increasing the total surface area of the inorganic filler to suppress staining during the hole punching process, the stain is easily removed during the roughening treatment, and the nonvolatile matter in the resin composition is used. When it is 100% by mass, it is preferably 50% by mass or more, more preferably 55% by mass or more, still more preferably 60% by mass or more, and particularly preferably 65% by mass or more.

The inorganic filler is preferably an amine-based decane-based coupling agent, a ureido decane-based coupling agent, an epoxy decane-based coupling agent, a mercapto decane-based coupling agent, or a decane-based coupling agent, from the viewpoint of improving moisture resistance and dispersibility. Surface of a vinyl decane coupling agent, a styryl decane coupling agent, an acrylate decane coupling agent, an isocyanate decane coupling agent, a sulfide decane coupling agent, an organic decazane compound, a titanate coupling agent, and the like Treatment agent surface treatment. Further, after the inorganic filler is surface-treated with an organic decazane compound, and then surface-treated with a decane coupling agent, the moisture resistance and dispersibility of the inorganic filler can be further improved. These may be used alone or in combination of two or more.

Surface treatment agents such as 3-aminopropyltrimethoxydecane, 3-aminopropyltriethoxydecane, 3-aminopropyldiethoxymethyldecane, N-phenyl-3-amine Propyltrimethoxydecane, N-methylaminopropyltrimethoxydecane, N-(2-aminoethyl)-3-aminopropyltrimethoxydecane, N-(2-amino group Amino decane coupling such as ethyl)-3-aminopropyldimethoxymethyl decane or ureido nesane coupling such as 3-ureidopropyltriethoxydecane Agent, 3-glycidoxypropyltrimethoxydecane, 3-glycidoxypropyltriethoxydecane, 3-glycidoxypropylmethyldiethoxydecane, 3- Epoxy epoxypropyl propyl (dimethoxy) methyl decane, epoxy propyl trimethoxy decane, 2-(3,4-epoxycyclohexyl)ethyl trimethoxy decane Decane coupler, 3-mercaptopropyltrimethoxydecane, 3-mercaptopropyltriethoxydecane, 3-mercaptopropylmethyldimethoxydecane, 11-decylundecyltrimethoxydecane And other decyl decane coupling agents, methyl trimethoxy decane, octadecyl trimethoxy decane, phenyl trimethoxy decane, methacryloxypropyl trimethoxy decane, imidazolium, triazine decane, a vinyl decane coupling agent such as a tert-butyl trimethoxy decane or a decane coupling agent such as vinyl trimethoxy decane, vinyl triethoxy decane or vinyl methyl diethoxy decane, p- Styryl decane coupling agent such as styryltrimethoxydecane, 3-propenyloxypropyltrimethoxydecane, 3-methylpropoxypropyltrimethoxyfluorene An acrylate decane such as 3-methacryloxypropyldimethoxydecane, 3-methylpropoxypropyltriethoxydecane or 3-methylpropoxypropyldiethoxydecane Isocyanate decane coupling agent such as a coupling agent, 3-isocyanate propyl trimethoxy decane, bis(triethoxydecylpropyl) disulfide, bis(triethoxydecylpropyl) tetrasulfide Sulfide decane coupling agent, hexamethyl decazane, 1,3-divinyl-1,1,3,3-tetramethyldioxane, hexaphenyldioxane, triterpenoid Azane, cyclotriazane, 2,2,4,4,6,6-hexamethylcyclotriazane, octamethylcyclotetraazane, hexabutyldioxane, hexaoctyl Dioxazane, 1,3-diethyltetramethyldiazepine, 1,3-di-n-octyltetramethyldiazepine, 1,3-diphenyltetramethyldifluorene Azane, 1,3-dimethyltetrazene Dioxazane, 1,3-diethyltetramethyldiazepine, 1,1,3,3-tetraphenyl-1,3-dimethyldioxane, 1,3-two An organic sulfonium compound such as propyltetramethyldiazepine, hexamethylcyclotriazane, dimethylaminotrimethylsulfazane or tetramethyldiazepine, tetra-n- Butyl titanate dimer, titanium-i-propoxy octyl glycolate, tetra-n-butyl titanate, titanium octyl glycolate, diisopropoxy titanium bis (triethanolamine) Acid ester), dihydroxy titanium dilactate, dihydroxy bis(ammonium lactate) titanium, bis(dioctyl pyrophosphate) extended ethyl titanate, bis(dioctyl pyrophosphate)oxy Acetate titanate, tri-n-butoxytitanium monostearate, tetra-n-butyl titanate, tetrakis(2-ethylhexyl) titanate, tetraisopropyl bis (di) Octyl phosphite) titanate, tetraoctyl bis(di-tridecyl phosphite) titanate, tetrakis(2,2-diallyloxymethyl-1-butyl) bis ( Ditridecyl)phosphite titanate, isopropyltrioctylphosphonate, isopropyltricumylphenyl titanate, isopropyltriisostearate titanate, isopropyl Isostearyl bispropenyl titanate Ester, isopropyl dimethyl propylene stearate, isopropyl tris(dioctyl phosphate) titanate, isopropyl tri-dodecyl benzene sulfonate titanate, isopropyl A titanate coupling agent such as tris(dioctyl pyrophosphate) titanate or isopropyl tris(N-amine oxime ethyl amide ethyl) titanate. Among them, an amine-based decane-based coupling agent is preferred because it has excellent moisture resistance, dispersibility, and properties of a cured product, and an organic decazane compound preferably has an excellent resin paint dispersibility. Commercial products of the surface treatment agent, such as "KBM403" (3-glycidoxypropyltrimethoxydecane) manufactured by Shin-Etsu Chemical Co., Ltd., "KBM803" (3-Mercaptopropylamine) manufactured by Shin-Etsu Chemical Co., Ltd. "M-trimethoxydecane", Shin-Etsu Chemical Co., Ltd. "KBE903" (3-aminopropyltriethoxydecane), Shin-Etsu Chemical Co., Ltd. "KBM573" (N-phenyl-3-aminopropyltrimethoxydecane) and the like.

The degree of surface treatment by the surface treatment agent can be evaluated by the amount of carbon per unit surface area of the inorganic filler material. The amount of carbon per unit surface area of the inorganic filler increases the dispersibility of the inorganic filler and stabilizes the square root mean square roughness of the cured product after the roughening treatment, preferably 0.02 mg/m ² or more. It is preferably 0.1 mg/m ² or more, more preferably 0.2 mg/m ² or more. Further, from the viewpoint of preventing the melt viscosity of the resin paint and the melt viscosity in the form of the sheet-like laminate, it is preferably 1 mg/m ² or less, more preferably 0.8 mg/m ² or less, still more preferably 0.5 mg/ Below m ² .

The amount of carbon per unit surface area of the inorganic filler can be measured by washing the surface-treated inorganic filler with a solvent such as methyl ethyl ketone (MEK). Specifically, a sufficient amount of MEK can be added as a solvent to the inorganic filler after surface treatment of the surface treatment agent, and ultrasonically washed at 25 ° C for 5 minutes, after removing the supernatant liquid, the solid component is dried, and then the carbon analyzer is used. The amount of carbon per unit surface area of the inorganic filler was measured. For the carbon analyzer, "EMIA-320V" manufactured by Horiba, Ltd. can be used.

<(E) hardening accelerator>

The resin composition of the present invention may further contain (E) a curing accelerator for adjusting the curing time, the curing temperature, and the like. The curing accelerator is not particularly limited, and examples thereof include an imidazole-based hardening accelerator, an amine-based curing accelerator, an organic phosphine compound, and an organic phosphonium salt compound. These may be used alone or in combination of two or more.

Imidazole hardening accelerators such as 2-methylimidazole and 2-undecane Imidazole, 2-heptadecylimidazole, 1,2-dimethylimidazole, 2-ethyl-4-methylimidazole, 1,2-dimethylimidazole, 2-ethyl-4-methylimidazole , 2-phenylimidazole, 2-phenyl-4-methylimidazole, 1-benzyl-1-methylimidazole, 1-benzyl-2-phenylimidazole, 1-cyanoethyl-2-methyl Imidazole, 1-cyanoethyl-2-undecylimidazole, 1-cyanoethyl-2-ethyl-4-methylimidazole, 1-cyanoethyl-2-phenylimidazole, 1 - cyanoethyl-2-undecylimidazolium trimellitate, 1-cyanoethyl-2-phenylimidazolium trimellitate, 2,4-diamino-6-[ 2'-Methylimidazolyl-1(1')]-ethyl-s-triazine, 2,4-diamino-6-[2'-undecylimidazolyl-(1')]- Ethyl-s-triazine, 2,4-diamino-6-[2'-ethyl-4'-methylimidazolyl-(1')]-ethyl-s-triazine, 2,4 -Diamino-6-[2'-methylimidazolyl-(1')]-ethyl-s-triazine trimeric isocyanate adduct, 2-phenylimidazole trimer isocyanate addition , 2-phenyl-4,5-dihydroxymethylimidazole, 2-phenyl-4-methyl-5-hydroxymethylimidazole, 2,3-dihydro-1H-pyrrolo[1,2- a] benzimidazole, 1-dodecyl-2-methyl-3-benzylimidazolium chloride, 2-methyl Oxazoline, 2-phenyl imidazole and imidazoline compounds and the imidazole adduct epoxy compound. These may be used alone or in combination of two or more.

An amine-based hardening accelerator such as trialkylamine such as triethylamine or tributylamine, 4-dimethylaminopyridine, benzyldimethylamine, 2,4,6-tris(dimethyl An amine compound such as aminomethyl)phenol or 1,8-diazabicyclo(5,4,0)-undecene (hereinafter abbreviated as DBU). These may be used alone or in combination of two or more.

An organic phosphine compound or an organic phosphonium salt compound such as TPP, TPP-K, TPP-S, TPTP-S, TBP-DA, TPP-SCN, TPTP-SCN (Beixing Chemical Industry Co., Ltd.). These can be a single or two The above combination is used.

The content of the hardening accelerator is preferably from 0.01% by mass to 3% by mass, more preferably 0.05% by weight, when the non-volatile content of the resin composition is 100% by mass, from the viewpoint of the storage stability of the resin varnish and the efficiency of curing. %~2% by mass.

<(F) thermoplastic resin>

The thermoplastic resin of the present invention may additionally contain (F) a thermoplastic resin. By adjusting the viscosity of the resin varnish obtained from the resin composition to a preferred range by containing a thermoplastic resin, the flexibility of the cured product can be improved. The thermoplastic resin is not particularly limited, and examples thereof include a phenoxy resin, a polyvinyl acetal resin, a polyimide resin, a polyamide amide resin, a polyamide resin, a polyether oxime resin, a polyfluorene resin, and a polyphenylene group. An ether resin, a polyolefin resin, a polybutadiene resin, an ABS resin, or the like. Among them, from the viewpoint of improving the flexibility of the cured product and imparting adhesion to the conductor layer, a phenoxy resin or a polyvinyl acetal resin is preferable, and a phenoxy resin is more preferable. These may be used alone or in combination of two or more. The thermoplastic resin is preferably one having a glass transition temperature of 80 ° C or higher.

The weight average molecular weight of the thermoplastic resin is preferably in the range of 5,000 to 800,000, more preferably in the range of 10,000 to 200,000, still more preferably in the range of 15,000 to 150,000, and particularly preferably in the range of 20,000 to 100,000. In this range, the film forming ability and the mechanical strength can be improved, and the compatibility with the epoxy resin can be improved. Further, the weight average molecular weight of the present invention is measured by a gel permeation chromatography (GPC) method (in terms of polystyrene). The weight average molecular weight by the GPC method can be specifically determined by Shimadzu As a measuring device, LC-9A/RID-6A is used as a measuring device, and Shodex K-800P/K-804L/K-804L manufactured by Showa Denko Co., Ltd. is used as a column, and chloroform or the like is used as a mobile phase. After measuring at a column temperature of 40 ° C, it was calculated using a calibration curve of standard polystyrene.

The phenoxy resin has, for example, a bisphenol A skeleton, a bisphenol lower skeleton, a bisphenol S skeleton, a bisphenol acetonitrile skeleton, a novolak skeleton, a biphenyl skeleton, an anthracene skeleton, a dicyclopentadiene skeleton, norbornene. One or more skeletons selected from the skeleton, the naphthalene skeleton, the anthracene skeleton, the adamantane skeleton, the terpene skeleton, and the trimethylcyclohexane skeleton. The phenoxy resin may be used in combination of two or more kinds. The terminal of the phenoxy resin may be any functional group such as a phenolic hydroxyl group or an epoxy group. Commercial products such as Mitsubishi Chemical Co., Ltd. 1256, 4250 (phenoxy resin containing bisphenol A skeleton), Mitsubishi Chemical Co., Ltd. YX8100 (phenoxy resin containing bisphenol S skeleton), Mitsubishi Chemical Co., Ltd. YX6954 (phenoxy resin containing bisphenol acetonitrile skeleton). Commercial products such as FX280 and FX273 are manufactured by Nippon Steel & Sumitomo Metal Chemical Co., Ltd. Mitsubishi Chemical (stock) system YL7553, YL6954, YL6794, YL7213, YL7290, YL7482 and so on.

Specific examples of the polyvinyl acetal resin, for example, electro-chemical butyral 4000-2, 5000-A, 6000-C, 6000-EP, and Sekisui Chemical Industry Co., Ltd. , BX series, KS series, BL series, BM series, etc. Specific examples of the polyimine resin are, for example, the poly-imine of the Japanese physicochemical company, "Rika SN20" and "Ricardo PN20". In addition, a linear polyimine obtained by reacting a polyfunctional hydroxy terminal polybutadiene, a diisocyanate compound, and a tetrabasic acid anhydride (the one described in JP-A-2006-37083) contains a polyoxyalkylene skeleton. Gather A modified polyimine such as yttrium imine (the one described in JP-A-2002-12667, JP-A-2000-319386). Specific examples of the polyamidoximine resin, for example, the polyamido quinone imine produced by Toyobo Co., Ltd. "Bellman HR11NN" and "Bellman HR16NN" are as well as the products of Hitachi Chemical Industry Co., Ltd. A modified polyamidoquinone imine of a polyoxamine quinone imine "KS9100" or "KS9300". Specific examples of the polyether oxime resin include polyether oxime "PES5003P" manufactured by Sumitomo Chemical Co., Ltd., and the like. Specific examples of the polyanthracene resin are "P1700" and "P3500" which are made by Solban.

The content of the thermoplastic resin is not particularly limited, and from the viewpoint of adjusting the melt viscosity of the sheet-like laminate and the viscosity of the resin varnish, when the non-volatile content in the resin composition is 100% by mass, it is preferably 0.5% by mass to 30% by mass. More preferably, it is 1% by mass to 20% by mass.

<(G) hardener>

The resin composition of the present invention may further contain (G) a curing agent (except for the component (B)). By including a hardener, the insulation reliability, tear strength, and mechanical properties of the cured product of the resin composition can be improved. The curing agent is not particularly limited, and examples thereof include a phenol curing agent, a cyanate ester curing agent, a benzoxazine curing agent, and an acid anhydride curing agent. These may be used alone or in combination of two or more. Among them, from the viewpoint of improving the decontamination property and improving the dielectric properties, a phenol-based curing agent and a cyanate ester-based curing agent are preferable.

The phenolic hardener is not particularly limited, and examples thereof include a phenol novolak resin, a phenol novolak resin containing a triazine skeleton, and a naphthol novolac A lacquer resin, a naphthol aralkyl type resin, a naphthol resin containing a triazine skeleton, a biphenyl aralkyl type phenol resin, or the like. For example, "MEH-7700", "MEH-7810", "MEH-7851" (Mingwa Chemical Co., Ltd.), "NHN", "CBN", "GPH" (Japanese) of biphenyl aralkyl type phenol resin "SN170", "SN180", "SN190", "SN475", "SN485", "SN495", "SN375", "SN395" (Dongdu Huacheng) "Stock"), "TD2090" (made by DIC) of phenol novolac resin, "LA3018", "LA7052", "LA7054", "LA1356" (DIC (share) of phenol novolak resin containing triazine skeleton) ))). The phenolic hardeners may be used alone or in combination of two or more.

The cyanate ester-based curing agent is not particularly limited, and examples thereof include a novolak type (phenol novolak type, alkylphenol phenol varnish type, etc.) cyanate ester type curing agent and a dicyclopentadiene type cyanate ester type curing agent. A bisphenol type (bisphenol A type, bisphenol F type, bisphenol S type, etc.) cyanate ester type curing agent, and such partially triazineated prepolymer. The weight average molecular weight of the cyanate ester-based curing agent is not particularly limited, but is preferably 500 to 4,500, more preferably 600 to 3,000, and specific examples of the cyanate ester-based curing agent, for example, bisphenol A dicyanate, polyphenol Cyanate ester (oligo(3-methyl-1,5-phenylene)), 4,4'-methyl(2,6-dimethylphenylcyanate), 4,4'-ethylidene diphenyl dicyanate, hexafluorobisphenol A dicyanate, 2,2-bis(4-cyanate) phenylpropane, 1,1-bis (4- Cyanate ester phenylmethane), bis(4-cyanate-3,5-dimethylphenyl)methane, 1,3-bis(4-cyanate phenyl-1-(methylethylene) )) benzene, bis(4-cyanate phenyl) sulfide, bis(4-cyanate phenyl) ether, etc. a difunctional cyanate resin, a polyfunctional cyanate resin derived from a phenol novolac, a cresol novolak, a phenol resin containing a dicyclopentadiene structure, or the like, the cyanate resins being partially triazineized Prepolymer, etc. These may be used alone or in combination of two or more. Commercially available cyanate ester resins such as phenol novolac type polyfunctional cyanate ester resin (PT30 manufactured by Longzhaji Co., cyanide equivalent 124), bisphenol A dicyanate partially or completely Prepolymer which is a zirconium to form a trimer (BA230 manufactured by Longzhaji Co., Ltd., cyanate equivalent 232), and a cyanate ester resin containing a dicyclopentadiene structure (Dalmatian Co., Ltd.) -4000, DT-7000), etc.

The benzoxazine-based curing agent is not particularly limited, and examples thereof include F-a, P-d (manufactured by Shikoku Kasei Co., Ltd.), and HFB2006M (manufactured by Showa Polymer Co., Ltd.).

The content of the curing agent is not particularly limited, and from the viewpoint of preventing embrittlement of the cured resin composition, the nonvolatile content in the resin composition is preferably from 0.5% by mass to 10% by mass, more preferably from 1% by mass to 10% by mass. Mass%~6 mass%.

<Other ingredients>

The resin composition of the present invention may further contain other components within the range which does not impair the effects of the present invention. The other component is a thermosetting component such as a maleic imide compound, a bisallyl naked quinone imine compound, a vinyl benzyl resin or a vinyl benzyl ether resin, a cerium powder, a nylon powder, a fluorine powder or the like. Adhesives such as organic fillers, binders, bentonite, polyfluorene-based, fluorine-based, polymeric defoamers or coating agents, imidazoles, thiazoles, triazoles A flame retardant such as an adhesion imparting agent such as a decane coupling agent, a phosphorus compound or a metal hydroxide.

The resin composition of the present invention can be mixed by appropriately mixing the above components, and if necessary, by a kneading method (for example, a three-seat roller, a ball mill, a bead mill, a sand mill, etc.) or a stirring method (for example, an ultra-mixer, a planetary mixing). Machine, etc.) can be used as a resin paint by kneading or mixing. The resin composition of the present invention can obtain a cured product having a low dielectric loss tangent, and can suppress stains in the through holes after the roughening treatment by punching the cured product.

The dielectric loss tangent of the cured product of the resin composition of the present invention can be measured by the method described in "Dielectric loss tangent measurement" described later. Specifically, it was measured by a cavity resonator perturbation method at a cycle number of 5.8 GHz and a measurement temperature of 23 °C. From the viewpoint of preventing heat generation at a high frequency, reducing signal delay, and signal noise, the dielectric loss tangent is preferably 0.05 or less, more preferably 0.04 or less, still more preferably 0.03 or less, still more preferably 0.02 or less, and particularly preferably 0.01 or less. . Further, the lower limit of the dielectric loss tangent is not particularly limited, but is preferably 0.001 or more.

The arithmetic mean roughness Ra of the cured product of the resin composition of the present invention can be measured by the method described in [Arithmetic mean roughness (Ra) and square root mean square roughness (Rq) described later]. The surface of the insulating layer after the roughening treatment reduces the leakage of the electrical signal, and it is preferable to reduce the surface unevenness. Specifically, after the resin composition is cured to form an insulating layer, the surface of the insulating layer is roughened, and the arithmetic mean roughness Rq of the surface of the insulating layer is preferably 400 nm or less, more preferably 350 nm or less. It is 300 nm or less, more preferably 250 nm or less, and particularly preferably 200 nm or less. . Further, the lower limit of the arithmetic mean roughness Ra has a good adhesion to the conductor layer, and is preferably 5 nm or more, more preferably 10 nm or more, and still more preferably 15 nm or more.

The square root mean square roughness Rq of the cured product of the resin composition of the present invention can be measured by the method described in [Arithmetic mean roughness (Ra) and square root mean square roughness (Rq) described later]. The surface of the insulating layer after the roughening treatment is intended to reduce the leakage of electrical signals, and it is preferable to make the surface unevenness fine. The unevenness of the surface of the insulating layer is expressed as a square root mean square roughness Rq. The index is not only a simple average value of the unevenness on the surface of the insulating layer, but also whether or not the surface of the insulating layer has a fine uneven shape. Specifically, after the resin composition is cured to form an insulating layer, the surface of the insulating layer is roughened, and the square root mean square roughness Rq of the surface of the obtained insulating layer is preferably 500 nm or less, and more preferably 400 nm or less. Preferably, it is 300 nm or less, more preferably 250 nm or less, and particularly preferably 200 nm or less. Further, the lower limit of the square root mean square roughness Rq has a good adhesion to the conductor layer, and is preferably 7 nm or more, more preferably 15 nm or more, and still more preferably 20 nm or more.

The linear thermal expansion coefficient of the cured product of the resin composition of the present invention can be measured by the method described in [Line Thermal Expansion Coefficient] described later. Specifically, the thermoelastic analysis was carried out by a tensile weighting method, and the average linear thermal expansion coefficient in the plane direction at 25 ° C to 150 ° C was measured. The resin composition of the present invention can obtain a cured product having a low linear thermal expansion coefficient, and is advantageous for suppressing cracking and circuit variation caused by a difference in thermal linear expansion coefficient between the insulating layer and the conductor layer. The cured product of the resin composition of the present invention preferably has a line of 25 ppm or less. Thermal expansion coefficient. The lower limit of the coefficient of thermal expansion of the wire is not particularly limited and is generally 1 ppm or less.

The tearing strength of the cured product of the resin composition of the present invention can be measured by the method described in [Measurement of peeling strength (tear strength) of the electroplated conductor layer described later]. Specifically, when the resin composition is cured to form an insulating layer and then roughened, and then the conductor layer is formed by electroplating on the surface of the insulating layer, the peeling strength of the obtained conductor layer and the insulating layer is preferably 0.4 kgf/cm or more. It is preferably 0.45 kgf/cm or more, more preferably 0.5 kgf/cm or more. Further, the upper limit is not particularly limited, and is generally 1.2 kgf/cm or less.

The use of the resin composition of the present invention is not particularly limited, and it can be used for a sheet-like laminate material such as an adhesive film or a prepreg, a circuit board (for laminate use, a multilayer suppression wiring board application, etc.), a solder resist, and the like. A wide range of applications such as a sealing agent, a wafer bonding agent, a semiconductor sealing agent, a buried resin, a component filling resin, and the like are required. The resin composition of the present invention can suppress stains in the through holes after the roughening treatment by punching the cured product. Thereby, the plating adhesion force in the through hole can be improved, and voids in the through hole can be prevented, so that the communication communication between the insulating layers of the multilayer printed wiring board formed in a plurality of stages can be ensured. Therefore, the resin composition of the present invention is preferably used as a resin composition for forming an insulating layer (a resin composition for an insulating layer of a multilayer printed wiring board) when a multilayer printed wiring board is manufactured, and is more suitably used as a resin composition for forming an assembled layer ( The resin composition for the assembly layer of the multilayer printed wiring board is particularly suitable as a resin composition for forming a conductor layer by electroplating (a resin composition for an insulating layer of a multilayer printed wiring board in which a conductor layer is formed by electroplating). The softening point of the resin composition is based on the laminability of the sheet-like laminate described later. Good for 40~150°C.

<Sheet laminate>

The resin composition of the present invention can be applied to a circuit board in a lacquer state to form an insulating layer, but it is generally industrially used in the form of a sheet-like laminate such as an adhesive film or a prepreg. That is, the sheet-like laminate of the present invention contains the resin composition of the present invention.

(adhesive film)

In one embodiment, the sheet laminate of the present invention is an adhesive film comprising a support and a resin composition layer formed on the support. The adhesive film can be prepared by a method known to a known one, for example, by dissolving the resin composition of the present invention in an organic solvent to prepare a resin varnish, and then applying the resin varnish to the support using a plastic film machine or the like, and heating or The organic solvent is dried by blowing in hot air or the like to form a resin composition layer.

Organic solvents such as ketones such as acetone, methyl ethyl ketone, cyclohexanone, ethyl acetate, butyl acetate, cellosolve acetate, propylene glycol monomethyl ether acetate, carbitol acetate Acetate, cellosolve, carbitol, aryl alcohol, etc., aromatic hydrocarbons such as toluene and xylene, dimethylformamide, dimethylacetamide, N-A A guanamine-based solvent such as a pyrrolidone or the like. The organic solvents may be used alone or in combination of two or more.

The drying conditions are not particularly limited, and it is preferred that the content of the organic solvent in the resin composition layer is 10% by mass or less, and preferably 5% by mass or less. Also, it will be due to the amount of organic solvent in the paint and the boiling of the organic solvent. The lacquer containing, for example, 30% by mass to 60% by mass of the organic solvent can be dried by drying at 50 ° C to 150 ° C for 3 minutes to 10 minutes to form a resin composition layer.

The thickness of the resin composition layer is preferably equal to or greater than the thickness of the conductor layer. Since the thickness of the conductor layer of the circuit board is generally in the range of 5 μm to 70 μm, the thickness of the resin composition layer is preferably in the range of 10 μm to 100 μm. The thickness of the resin composition layer is more preferably in the range of 15 μm to 80 μm from the viewpoint of thinning the layer.

The support material is a film of a polyolefin such as polyethylene, polypropylene or polyvinyl chloride, or a polyester such as polyethylene terephthalate (hereinafter referred to as "PET") or polyethylene naphthalate. Various plastic films such as film, polycarbonate film, and polyimide film. As the support, a metal foil such as a release paper, a copper foil, an aluminum foil, or the like can be used. Among them, the viewpoint of versatility is preferably a plastic film, more preferably a polyethylene terephthalate film. The support and various protective films described later can be subjected to surface treatment such as matte treatment or corona treatment. Further, the mold release treatment can be carried out by using a polyoxyxylene resin release agent, an alkyd resin release agent, or a fluororesin release agent.

The thickness of the support is not particularly limited, and when the hole is punched in the support, the laser irradiation energy is large and the resin residue is hard to be retained, and the viewpoint of occurrence of stains can be suppressed, and preferably 10 μm or more and 20 μm or more. Preferably, it is more preferably 30 μm or more. Further, the viewpoint of improving the degree of completion of the cost and the hole punching in the support can be performed efficiently, preferably 150 μm or less, more preferably 100 μm or less, and still more preferably 50 μm or less.

On the surface of the resin composition layer that is not in contact with the support (ie, the opposite side of the surface contacting the support), a protective film based on the support may be laminated. At this time, the adhesive film contains a support, a resin composition layer formed on the support, and a protective film formed on the resin composition layer. The thickness of the protective film is not particularly limited and may be, for example, 1 μm to 40 μm. By laminating the protective film, it is possible to prevent dust and damage from adhering to the surface of the resin composition layer. The adhesive film can be rolled into a roll shape for storage.

(prepreg)

In one embodiment, the sheet laminate of the present invention is a prepreg. The prepreg can be obtained by subjecting the sheet-shaped reinforcing substrate to the resin composition of the present invention by a hot melt method or a solvent method, followed by heating and semi-hardening. That is, the prepreg is molded by impregnating the resin composition of the present invention with a sheet-like reinforcing substrate. The sheet-like reinforcing substrate is generally used as a substrate for prepreg, such as a glass fiber woven fabric, an aromatic polyamide woven fabric, or a liquid crystal polymer nonwoven fabric. The prepreg is preferably used in a state in which the prepreg is placed on the support.

In the hot melt method, the resin composition is not dissolved in an organic solvent, once coated on a support, and then pressed onto a sheet-like reinforcing substrate, or directly applied to a sheet-like reinforcing substrate by a die coater. The method of making a prepreg. Further, the solvent method is a method in which a resin similar to an adhesive film is dissolved in an organic solvent to prepare a resin varnish, and then a sheet-shaped reinforcing substrate is immersed in the varnish, and the sheet-shaped reinforcing substrate is impregnated with the resin varnish and then dried. Further, the adhesive film can be continuously thermally laminated on both sides of the sheet-shaped reinforcing substrate under heat and pressure to prepare a prepreg. The support and the protective film can be used in the same manner as the above-mentioned bonding film Things.

<Multilayer Printed Wiring Board Using Sheet Laminates>

Next, an example of manufacturing a multilayer printed wiring board using the sheet-like laminate of the present invention will be described.

The sheet laminate is first laminated (laminated) on one or both sides of the circuit substrate using a vacuum laminator. Specifically, the sheet-like laminate is laminated on one side or both sides of the circuit board in such a manner that the resin composition layer or the prepreg is bonded to the circuit board. The substrate used for the circuit board is, for example, a glass epoxy substrate, a metal substrate, a polyester substrate, a polyimide substrate, a BT resin substrate, a thermosetting polyphenylene ether substrate, or the like. The circuit board is a material in which a patterned conductor layer (circuit) is formed on one surface or both surfaces of the above-described substrate. Further, when the multilayer conductor printed wiring board is produced by alternately laminating the conductor layer and the insulating layer, the circuit board also includes a multilayer printed wiring board having a patterned conductor layer (circuit) on one side or both sides of the outermost layer. The surface of the conductor layer may be subjected to a roughening treatment such as blackening treatment or copper etching.

When the sheet-like laminate material has a protective film, the sheet-like laminate material and the circuit substrate can be preheated if necessary after the protective film is removed, and the sheet-like laminate material is laminated on the circuit board while being heated under pressure. In a preferred embodiment, the sheet laminate of the present invention is laminated on a circuit board under reduced pressure by a vacuum lamination method. The laminating conditions are not particularly limited. For example, the pressing temperature (lamination temperature) is preferably from 70 ° C to 140 ° C, and the pressing pressure (lamination pressure) is preferably from 1 kgf / cm ² to 11 kgf / cm ² (0.098 MPa to 1.078). MPa), the pressing time (lamination time) is preferably from 5 seconds to 180 seconds, and it is preferably laminated under reduced pressure of air pressure of 20 mmHg (26.7 hPa). Also, the lamination method may be batchwise or continuous. Vacuum lamination can be carried out using a commercially available vacuum laminator. Commercially available vacuum laminating machine, such as vacuum reinforcement made by Nigel (stock), reinforced laminating machine made by Nichigo (share), vacuum pressure laminating machine made by famous machine manufacturer, Hitachi Inda Roller type dry coater, Hitachi Aisi (stock) vacuum laminator, etc.

After lamination, it is preferred to subject the laminated sheet-like laminate to a smoothing treatment under normal pressure (at atmospheric pressure), for example, by hot-pressing a sheet-like laminate. The conditions of the smoothing treatment may be the same as those of the above-described lamination heating press-bonding conditions. The smoothing treatment can be carried out using a commercially available laminating machine. Further, the lamination treatment and the smoothing treatment can be continuously carried out using the above-mentioned commercially available vacuum laminator.

After laminating the sheet-like laminate material on the circuit board, it is cooled to near room temperature, and after peeling off the support, the resin composition is thermally cured to form an insulating layer. Thereby, an insulating layer can be formed on the circuit substrate. The heat hardening condition can be appropriately selected depending on the kind and content of the resin component in the resin composition, and is preferably from 20 minutes to 180 minutes at 150 ° C to 220 ° C, more preferably from 30 minutes to 120 ° C at 160 ° C to 210 ° C. minute. At this time, the heat hardening temperature is not required to be fixed to a certain temperature within the above temperature range, and may be changed over time by forming a suitable insulating layer or hardening at a different stage of different hardening temperature fractions. After the formation of the insulating layer, the support may be peeled off if necessary without peeling off the support before hardening.

Further, the sheet laminate may be laminated on one or both sides of the circuit board using a vacuum press. The laminating step of heating and pressurizing under reduced pressure can be carried out using a general vacuum hot press. For example, it can be carried out by pressurizing a metal plate such as a heated SUS plate from the side of the support layer. The pressurization conditions are generally such that the degree of pressure reduction is 1 × 10 ^-2 MPa or more, preferably 1 × 10 ^-3 MPa or less. Heating and pressurization can be carried out in a single step, but from the viewpoint of suppressing contamination of the resin, it is preferred to carry out the conditions in two or more stages. For example, the first stage is pressurized at a temperature of 70 ° C to 150 ° C and a pressure of 1 kgf / cm ² to 15 kgf / cm ² , and the second stage is at a temperature of 150 ° C to 200 ° C. It is preferred to carry out the pressurization in a range of a pressure of 1 kgf/cm ² to 40 kgf/cm ² . The time of each stage is preferably from 30 minutes to 120 minutes. By thermally curing the resin composition by this method, an insulating layer can be formed on the circuit substrate. Commercially available vacuum hot presses such as MNPC-V-750-5-200 (made by Nihon Seiki Co., Ltd.) and VH1-1603 (made by Kitagawa Seiki Co., Ltd.).

Next, the insulating layer formed on the circuit substrate is subjected to a hole punching process to form a through hole and a through hole. The hole punching process can be performed by a known method such as a cutter, a laser, a plasma, or the like if necessary. The most common method is to use a laser such as a carbon dioxide gas laser or a YAG laser to perform hole punching. Further, after laminating the sheet-like laminate of the present invention on a circuit board, the resin composition is thermally cured to form an insulating layer, and secondly, the insulating layer formed on the circuit substrate is punched by the support to form a through hole. A multi-layer printed wiring board is preferred, and a peeling support is preferred after the hole processing. By performing hole punching on the support by this type to form a through hole, it is possible to suppress the occurrence of stains. Further, in order to reduce the thickness of the multilayer printed wiring board, the maximum diameter (diameter) of the through hole is preferably 15 μm to 70 μm, more preferably 20 μm to 65 μm, still more preferably 25 μm to 60 μm.

Next, the surface of the insulating layer is roughened. The dry roughening treatment is, for example, plasma treatment, and the wet roughening treatment is performed by sequentially performing a swelling treatment using a swelling liquid, a roughening treatment using an oxidizing agent, and a neutralization treatment using a neutralization liquid. Further, any roughening treatment in the dry type or the wet type may be employed, but it is preferable to form the uneven anchor on the surface of the insulating layer by the wet roughening treatment method, and to remove the contaminants in the through holes. The swelling treatment using the swelling liquid can be carried out, for example, by immersing the insulating layer in the swelling liquid at 50 ° C to 80 ° C for 5 minutes to 20 minutes (preferably 55 minutes to 70 ° C for 8 minutes to 15 minutes). The swelling liquid such as an alkali solution, a surfactant solution or the like is preferably an alkali solution. The alkali solution is, for example, a sodium hydroxide solution, a potassium hydroxide solution or the like. Commercially available swelling liquids, such as Swelling Dip Securiganth P, Swelling Dip Securiganth SBU, and the like. The roughening treatment using an oxidizing agent can be carried out by, for example, immersing the insulating layer in an oxidizing agent solution at 60 ° C to 80 ° C for 10 minutes to 30 minutes (preferably at 70 ° C to 80 ° C for 15 minutes to 25 minutes). An oxidizing agent such as an alkaline permanganic acid solution obtained by dissolving potassium permanganate or sodium permanganate in an aqueous solution of sodium hydroxide, dichromate, ozone, hydrogen peroxide/sulfuric acid, nitric acid or the like. Further, the concentration of the permanganate in the alkaline permanganic acid solution is preferably 5% by weight to 10% by weight. Commercially available oxidizing agents such as Acetate CP, Dejingu P and other alkaline permanganic acid solutions. Neutralization using a neutralizing solution can be performed by, for example, immersing the insulating layer in the neutralizing solution for 3 minutes to 10 minutes (preferably 3 minutes to 8 minutes at 35 ° C to 45 ° C) at 30 ° C to 50 ° C. Way to proceed. The neutralizing liquid is preferably an acidic aqueous solution, and a commercial product such as Ritaku P manufactured by Aite.

Then by dry plating or wet plating on the insulating layer Into a conductor layer. Dry plating can be carried out by a known method such as vapor deposition, sputtering, or ion plating. Wet plating, for example, a method in which electroless plating and electrolytic plating are combined to form a conductor layer, and a plating resist having a pattern opposite to that of the conductor layer is formed, and only a conductor layer is formed by electroless plating. For the method of forming the circuit pattern, for example, a subtractive method, a semideiteibu method, or the like known to the industry can be used. Further, the multilayer printed wiring board of the multi-layer laminated assembly layer can be manufactured by repeating the above-described series of steps several times. The invention can suppress the occurrence of stains, so that the communication communication between layers can be ensured. Therefore, the sheet laminate of the present invention is suitable for forming an assembly layer of a multilayer printed wiring board. The multilayer printed wiring board thus produced is an insulating layer containing a cured product of the resin composition of the present invention.

<semiconductor device>

A semiconductor device can be manufactured using the multilayer printed wiring board of the present invention. A semiconductor device can be manufactured by mounting a semiconductor wafer on the conduction of the multilayer printed wiring board of the present invention. "Conduit" means "where electrical signals are conducted in a multilayer printed wiring board", which may be any of the surface or landfill. Further, the semiconductor wafer may be an electrical circuit element made of a semiconductor material, and is not particularly limited. The semiconductor device of the present invention comprises the multilayer printed wiring board of the present invention, and specifically comprises a multilayer printed wiring board of the present invention and a semiconductor wafer mounted on the conductive portion of the multilayer printed wiring board.

The semiconductor wafer mounting method in the manufacture of the semiconductor device of the present invention is not particularly limited as long as the function of the semiconductor wafer can be effectively utilized, such as a wire bonding mounting method, a flip chip mounting method, and a non-impacting method. The mounting method of the assembled layer (BBUL), the mounting method by the anisotropic conductive film (ACF), the mounting method by the non-conductive film (NCF), and the like.

Example

The invention will now be described in more detail by way of examples, but the invention is not limited to the examples. In addition, in the following descriptions, "parts" and "%" are each "mass parts" and "% by mass".

<Measurement, evaluation method>

First, the measurement and evaluation methods of the physical property evaluation in this specification will be explained.

[Modulation and evaluation substrate] (1) Underlying processing of circuit board

Using a micro-etching agent (CZ8100), the glass cloth substrate epoxy resin on which the circuit is formed is double-sidedly laminated with copper (the thickness of the copper foil is 18 μm, the thickness of the substrate is 0.3 mm, Panatho (R1515A) (manufactured by the company)) After etching 1 μm, the copper surface was roughened.

(2) laminated adhesive film

The adhesive film produced by the examples and the comparative examples was peeled off from the protective film. A batch-type vacuum pressure laminator (Nippy Co., Ltd. 2-stage assembly laminator "CVP700" was used, and the resin composition layer was used to bond the circuit board to the tree. The adhesive film in which the lipid composition layer is exposed is laminated on both sides of the circuit board. The lamination was carried out by decompressing for 30 seconds until the gas pressure was 13 hPa or less, and then pressing at 110 ° C under a pressure of 0.74 MPa for 30 seconds. Next, the laminated adhesive film was heat-pressed at 110 ° C and a pressure of 0.5 MPa under atmospheric pressure for 60 seconds to be smoothed.

(3) Hardened resin composition layer

The resin composition layer of the laminated adhesive film was cured under the conditions of hardening at 180 ° C for 30 minutes at 100 ° C for 30 minutes to form an insulating layer.

(4) Forming a channel

A CO ₂ laser processing machine ("LC-2E21B/1C" manufactured by Hitachi Channel Co., Ltd.) was used, with a mask diameter of 1.60 mm, a focal length deviation value of 0.050, a pulse width of 25 μs, a power of 0.66 W, a lens aperture of 13, and a note. The number 2 and the burst type condition hole the insulating layer to form a through hole. The maximum diameter (diameter) of the through hole on the surface of the insulating layer was 50 μm. The PET film was peeled off after the through hole was formed.

(5) roughening treatment

The circuit board on which the insulating layer is formed is sequentially immersed in a swelling liquid ("Syrin P" manufactured by Attite Co., Ltd., an aqueous solution containing diethylene glycol monobutyl ether and sodium hydroxide) for 10 minutes at 60 ° C. , roughening solution (Kentite CP), KMnO ₄ : 60g / L, NaOH: 40g / L aqueous solution) at 80 ° C for 2 minutes, and finally neutralized liquid (Ateti The product (Ridaku P), aqueous sulfuric acid solution was dried at 40 ° C for 5 minutes and then dried at 80 ° C for 30 minutes. The obtained substrate was used as the evaluation substrate A.

(6) Forming a conductor layer by the semiedeiteibu method

A conductor layer having a desired circuit pattern is formed on the surface of the insulating layer in the following steps.

The evaluation substrate A was sequentially immersed in an electroless plating solution containing PdCl ₂ at 40 ° C for 5 minutes, and in an electroless copper plating solution at 25 ° C for 20 minutes. The obtained substrate was heated at 150 ° C for 30 minutes and then annealed to form an etching photoresist. After etching the photoresist to form a pattern, copper sulfate electrolytic plating was performed to form a conductor layer having a thickness of 30 μm. The substrate of the conductor layer was formed by heating at 190 ° C for 60 minutes, and then annealed. The obtained substrate was used as the evaluation substrate B.

[Measurement of arithmetic mean roughness (Ra) and square root mean square roughness (Rq)]

Using a non-contact type surface roughness meter ("WYKONT3300" manufactured by Pico Co., Ltd.), the measurement range of the substrate A was measured by a VSI contact type and a 50-fold lens to measure the value of 121 μm × 92 μm, and the Ra value and the Rq value were obtained. Further, the average value of 10 points which were randomly selected was used as the measured value.

[Determination of the peeling strength (tear strength) of the electroplated conductor layer]

After cutting out a portion having a width of 10 mm and a length of 100 nm in the conductor layer of the evaluation substrate B, the end of the strip was removed by a peeling cooker (TSE AG automatic type testing machine "AC-50C-SL"), and 50 mm was measured at room temperature. The speed of /min is pulled in the vertical direction at a load of 35 mm (kgf/cm). The evaluation criteria are as follows Said.

Evaluation criteria:

○: tearing strength exceeds 0.45kgf/cm

△: tearing strength is 0.4kgf/cm or more and 0.45kgf/cm or less

×: tearing strength is less than 0.4kgf/cm

[Evaluating the stain at the bottom of the through hole]

The periphery of the bottom of the through hole was observed using a scanning electron microscope (SEM), and the maximum stain length of the wall surface at the bottom of the through hole was measured from the obtained image. The evaluation criteria are as follows.

Evaluation criteria:

○: The maximum stain length is less than 3μm

×: The maximum stain length is 3 μm or more

[Measurement coefficient of linear expansion]

The adhesive film produced in the examples and the comparative examples was heated at 200 ° C for 90 minutes to thermally cure the resin composition layer, and then the PET film was peeled off to obtain a sheet-like cured product. A test piece having a width of 5 mm and a length of 15 mm was cut out from the cured product, and then subjected to thermomechanical distribution by a tensile weighting method using a thermomechanical analyzer ("Thermo Plus TMA8310" manufactured by Rigaku Co., Ltd.). The test piece was attached to the above apparatus, and the measurement piece was continuously measured twice under the measurement conditions of a load of 1 g and a temperature increase rate of 5 ° C /min. Calculate the average linear thermal expansion system from 25 ° C to 150 ° C in the second measurement Number (ppm). The evaluation criteria are as follows.

Evaluation criteria:

○: The average linear thermal expansion coefficient is 25 ppm or less

×: The average linear thermal expansion coefficient is greater than 25 ppm

[Measurement dielectric loss tangent]

The adhesive film produced in the examples and the comparative examples was heated at 200 ° C for 90 minutes to thermally cure the resin composition layer, and then the PET film was peeled off to obtain a sheet-like cured product. After the test piece having a width of 2 mm and a length of 80 mm was cut out from the cured product, a cavity resonator perturbation dielectric constant measuring device ("CP521" manufactured by Kanto Applied Electronics Co., Ltd.) and a network analyzer (Ajilian) were used. (E8362B) (manufactured by the company), the dielectric loss tangent (tan δ) of the measurement of the number of cycles of 5.8 GHz was measured by the cavity resonance method. The average value was calculated after measuring two test pieces.

[Preparation Example 1] (Modulation of Resin Paint 1)

Stirring a bisphenol type epoxy resin (ZX1059, manufactured by Nippon Steel & Sumitomo Chemical Co., Ltd.) in an amount of 30 parts of solvent oil, an epoxy equivalent of about 169, a mixture of bisphenol A and bisphenol F of 1:1. 5 parts, bis xylenol type epoxy resin ("XX4000HK" manufactured by Mitsubishi Chemical Co., Ltd., epoxy equivalent: 185) 10 parts, biphenyl type epoxy resin ("30003000" manufactured by Nippon Kayaku Co., Ltd.) Oxygen equivalent: 269) 5 parts, dicyclopentadiene type epoxy resin ("HP-7200HH" manufactured by DIC Co., Ltd., epoxy equivalent 280) 5 parts, and phenoxy resin ("755755BH30" manufactured by Mitsubishi Chemical Corporation) The solid component 30% by mass of cyclohexanone: a 1:1 solution of methyl ethyl ketone (MEK)) was dissolved while being dissolved in 8 parts. After cooling to room temperature, an active ester compound ("HPC8000-65T" manufactured by DIC Co., Ltd., a toluene solution of 65 mass% of a nonvolatile content of about 223) was mixed with 35 parts of an alkylated melamine resin (Sanwa Chemical). (Nikkara MX-750LM), non-volatile content 82% by mass, methylated melamine resin, monomer content 35~45%) 5 parts, hardening accelerator (4-dimethylaminopyridine (DMAP) ), 2 parts by mass of MEK solution of solid content), a hardening accelerator (1-benzyl-2-phenylimidazole (1B2PZ), a solid content of 10% by mass of MEK solution), 1 part, flame retardant (three light ( "HCA-HQ", 10-(2,5-dihydroxyphenyl)-10-hydrogen-9-oxo-10-phosphorylphenanthrene-10-oxide, average particle size 2 μm) 2 parts, Amino decane-based coupling agent ("KBM573" manufactured by Shin-Etsu Chemical Co., Ltd.), spherical cerium oxide after surface treatment ("SOC1" manufactured by Yadman Co., Ltd., average particle diameter 0.24 μm, carbon amount per unit surface area) After 0.36 parts of 0.36 mg/m ² ), the resin paint 1 was produced by uniformly dispersing using a high-speed rotary mixer.

[Preparation Example 2] (Modulation Resin Paint 2)

In addition to the use of alkylated melamine resin ("spabe ELM-752" made by DIC), weight average molecular weight of about 1500, non-volatile content of 60% by mass, isobutylated melamine resin) 3 parts, substituted alkylated melamine Resin 2 was prepared in the same manner as in Preparation Example 1 except that the resin (Nikala MX-750LM, manufactured by Sanwa Chemical Co., Ltd., 82% by mass of nonvolatile matter) was used.

[Preparation Example 3] (Modulation Resin Paint 3)

In addition to the use of an alkoxyalkylated phenol resin (4-(1,1-dimethylethyl)-2,6-bis(methoxymethyl)-phenol, the solid component is 65 mass% of methyl isobutyl 10 parts of a ketone solution, an alkoxymethylated phenol resin having a structure represented by the following formula, substituted alkylated melamine resin ("Nikara MX-750LM" manufactured by Sanwa Chemical Co., Ltd.), nonvolatile content The resin varnish 3 was prepared in the same manner as in Preparation Example 1 except that the amount was 82% by mass.

[Preparation Example 4] (Modulation Resin Paint 4)

The resin varnish 4 was prepared in the same manner as in Preparation Example 1, except that the alkylated melamine resin ("Nikala MX-750LM" manufactured by Sanwa Chemical Co., Ltd., and the nonvolatile content of 82% by mass) was added.

[Preparation Example 5] (Modulation Resin Paint 5)

In addition to the use of alkylated benzoguanamine resin (Spabe E-1128, manufactured by DIC), 60% by mass of non-volatile components, isobutylated benzene 3 parts of the guanamine resin, the same as the preparation example 1 of the melamine resin ("Nikara MX-750LM" manufactured by Sanwa Chemical Co., Ltd., non-volatile content 82% by mass)) 5.

<Example 1> (Production of adhesive film 1)

A PET film ("AL5", manufactured by Cup Co., Ltd., 38 μm thick) having an alkyd resin-separated layer as a support was prepared. The resin varnish 1 was uniformly applied onto the release layer of the support, and after drying, the thickness of the resin composition layer was 25 μm, and then dried at 80 to 120 ° C (average 100 ° C) for 4 minutes. Next, the smooth side of the protective film (Yalfang MA-411, manufactured by Oji Paper Co., Ltd., 15 μm thick, polypropylene resin) was bonded to the resin composition layer to prepare a protective film/resin composition layer/ Adhesive film 1 of the layer structure of the support.

<Example 2> (Production of Adhesive Film 2)

The adhesive film 2 was produced in the same manner as in Example 1 using Resin Paint 2.

<Example 3> (Production of Adhesive Film 3)

The adhesive film 3 was produced in the same manner as in Example 1 using Resin Paint 3.

<Comparative Example 1> (Production of Adhesive Film 4)

The adhesive film 4 was produced in the same manner as in Example 1 using Resin Paint 4.

<Comparative Example 2> (Production of Adhesive Film 5)

The adhesive film 5 was produced in the same manner as in Example 1 using Resin Paint 5.

The evaluation results are as described in Table 1.

It is confirmed from Table 1 that the resin compositions of Examples 1 to 3 can obtain a cured product having a low dielectric loss tangent, and have excellent characteristics of suppressing stains in the through holes. Further, it was confirmed that the resin compositions of Examples 1 to 3 can obtain a cured product having a low linear thermal expansion coefficient. Further, in the resin compositions of Comparative Examples 1 and 2, a cured product having a low dielectric loss tangent was obtained, but as a result, stains remained in the through holes. The cured product of the resin composition of Comparative Example 2 has a result that the coefficient of linear thermal expansion is deteriorated. .

[Industry use possibility]

The present invention can provide a resin composition capable of obtaining a cured product having a low dielectric loss tangent and capable of suppressing stains in the through holes by punching and roughening the cured product. Further, a sheet-like laminate, a multilayer printed wiring board, and a semiconductor device can be provided by using the resin composition. In addition, it is also possible to provide electrical equipment such as computers, mobile phones, digital cameras, televisions, and the like, as well as electric bicycles, electric vehicles, electric trains, ships, aircraft and other portable tools.

Claims (15)

A resin composition comprising (A) an epoxy resin, and (B) an active ester compound, and (C) an alkoxyalkylated melamine resin and an alkoxyalkylated phenol resin. More than one resin selected. In the resin composition of claim 1, wherein the total amount of the component (A) and the component (B) in the resin composition is 100% by mass, the content of the component (C) is from 0.1% by mass to 30% by mass. In the resin composition of claim 1, wherein the non-volatile component in the resin composition is 100% by mass, the content of the component (B) is from 1% by mass to 30% by mass. The resin composition of claim 1, wherein the alkoxyalkylated melamine resin is a melamine resin containing a structural unit represented by the following formula (1) [wherein, X ¹ , X ² , X ³ , X ⁴ , X ⁵ and X ⁶ represent a respective independent hydrogen atom, a group represented by the formula: -CH ₂ OH, and a formula: -CH ₂ -OR ¹ a group represented by the formula -CH ₂ -*, wherein R ¹ is an alkyl group having 1 to 20 carbon atoms, and * is a bonding bond; but X ¹ , X ² , X ³ , X ⁴ , X ⁵ and At least one of X ⁶ is a formula: a group represented by -CH ₂ -OR ¹ ]. The resin composition of claim 1, wherein the alkoxyalkylated phenol resin is a phenol resin containing a structural unit represented by the following formula (2) Wherein Y represents a hydrogen atom or a group represented by the formula: -R ² -*, wherein R ² is an alkylene group having a carbon number of 1 to 10 or a single bond, * is a bond, and Z ¹ is a formula A group represented by -CH(R ³ )-OR ⁴ wherein R ³ is a hydrogen atom, an alkyl group having 1 to 3 carbon atoms, a phenyl group or a hydroxyphenyl group, and R ⁴ is an alkane having 1 to 20 carbon atoms. group, Z ² represents the formula: -R ⁵ - * or a group represented by the formula: -R ⁶ (- *) ₂ represented by the group, wherein R ⁵ is from 1 to 10 carbon atoms, alkyl of extension or PUSH , R ⁶ is an alkane triyl group having 1 to 10 carbon atoms, * is a bonding bond, and Z ³ represents an alkyl group having 1 to 20 carbon atoms which may have a substituent, and l, m and n are in accordance with 2≦l +m+n≦5 and an integer of 1≦l]. The resin composition of claim 1, which further contains (D) an inorganic filler. The resin composition of claim 6, wherein the (D) inorganic filler has an average particle diameter of from 0.01 μm to 5 μm. In the resin composition of claim 6, wherein the non-volatile content in the resin composition is 100% by mass, the content of the component (D) is from 50% by mass to 85% by mass. The resin composition of claim 1, which is a resin composition for an insulating layer of a multilayer printed wiring board. The resin composition of claim 1, which is a resin composition for an assembly layer of a multilayer printed wiring board. A cured product obtained by thermally curing the resin composition according to any one of claims 1 to 10. A sheet-like laminate comprising the resin composition according to any one of claims 1 to 10. A multilayer printed wiring board which is an insulating layer formed of a cured product of the resin composition according to any one of claims 1 to 10 or a cured product of claim 11. A semiconductor device comprising the multilayer printed wiring board of claim 13. A method of manufacturing a multilayer printed wiring board, comprising laminating a sheet-like laminate material according to claim 12 on a circuit substrate, thermally curing the resin composition to form an insulating layer, and then forming an insulating layer formed on the circuit substrate The hole is machined to form a through hole.