TWI623653B - Treatment for electroplating racks to avoid rack metallization - Google Patents

Treatment for electroplating racks to avoid rack metallization Download PDF

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TWI623653B
TWI623653B TW104101271A TW104101271A TWI623653B TW I623653 B TWI623653 B TW I623653B TW 104101271 A TW104101271 A TW 104101271A TW 104101271 A TW104101271 A TW 104101271A TW I623653 B TWI623653 B TW I623653B
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ether acetate
aqueous solution
rack
metallization
zinc
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TW201534768A (en
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羅德里克D 赫德曼
羅山V 查帕內里
艾莉森 西斯洛普
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麥克達米德尖端股份有限公司
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    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/06Suspending or supporting devices for articles to be coated
    • C25D17/08Supporting racks, i.e. not for suspending
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601Process or apparatus
    • C23C18/1619Apparatus for electroless plating
    • C23C18/1628Specific elements or parts of the apparatus
    • C23C18/163Supporting devices for articles to be coated

Abstract

本發明係描述一種在電沉積製程中用於支撐非導電性基材之電鍍掛架。該電鍍掛架被一種不導電材料塗層,該不導電材料例如PVC塑性溶膠。該電鍍掛架在電沉積製程之前先經過含金屬化抑制劑之非水性溶液處理,以便在使用不含鉻酸之蝕刻液時,抑制掛架被鍍覆。 The present invention describes a plating rack for supporting a non-conductive substrate in an electrodeposition process. The plating rack is coated with a non-conductive material such as a PVC plastisol. The plating rack is treated with a non-aqueous solution containing a metallization inhibitor prior to the electrodeposition process to inhibit the pylon from being plated when an etchant-free etchant is used.

Description

電鍍掛架及避免掛架金屬化之電鍍掛架處理 Plating rack and plating rack for avoiding metallization of the rack

本發明主要係關於處理在金屬化步驟中用於支撐非導電性基材之電鍍掛架之方法。 The present invention is primarily directed to a method of treating a plating rack for supporting a non-conductive substrate in a metallization step.

多年來,已有許多方法可用來幫助經電沉積之金屬於塑膠基材上的沉積作用。此類方法通常包括以下步驟:1)在適當的蝕刻溶液中蝕刻塑膠,使塑膠表面粗化並且濕潤,以便於後續塗布之沉積物具有良好的附著性;2)使用能夠啟動自催化塗布之金屬塗層(例如銅或鎳)沉積作用的金屬(通常為鈀)之膠態或離子溶液來活化塑膠的表面;3)沉積出自催化塗布之金屬的薄層;以及4)在金屬化的塑膠基材上進行金屬的電沉積。 Many methods have been used over the years to aid in the deposition of electrodeposited metals on plastic substrates. Such methods generally include the following steps: 1) etching the plastic in a suitable etching solution to roughen and wet the plastic surface to facilitate good adhesion of the subsequently applied deposit; 2) using a metal capable of initiating autocatalytic coating a colloidal or ionic solution of a metal (usually palladium) deposited by a coating such as copper or nickel to activate the surface of the plastic; 3) a thin layer of self-catalyzed coated metal; and 4) a metallized plastic base Electrodeposition of the metal is performed on the material.

一般而言,塗布銅、鎳和/或鉻層以產生成品。 In general, a layer of copper, nickel and/or chrome is applied to produce a finished product.

最廣泛使用的塑膠基材為丙烯腈/丁二烯/苯乙烯共聚物(ABS)或摻混了聚碳酸酯的ABS(ABS/PC)。藉由射出成型方法,這些材料可以很容易地形成組件。ABS含有相當硬的丙烯腈/丁二烯/苯乙烯共聚物基質, 並且丁二烯聚合以形成分離相。這種較軟的聚丁二烯之相(在聚合物主鏈中含有雙鍵)可以利用各種不同的技術很容易地進行蝕刻。 The most widely used plastic substrates are acrylonitrile/butadiene/styrene copolymer (ABS) or ABS (ABS/PC) blended with polycarbonate. These materials can be easily formed into components by injection molding. ABS contains a fairly hard acrylonitrile/butadiene/styrene copolymer matrix. And butadiene polymerizes to form a separate phase. This softer polybutadiene phase (containing double bonds in the polymer backbone) can be easily etched using a variety of different techniques.

傳統上,蝕刻係利用鉻酸和硫酸之混合物在高溫操作的情況下來進行。鉻酸能夠藉由聚丁二烯聚合物主鏈中雙鍵的氧化作用讓ABS的聚丁二烯相溶解,經過證明,其對於廣泛的ABS和ABS/PC塑料是相當可靠且有效的。然而,由於鉻酸之毒性和致癌性本質,其在使用上已受到愈來愈多的管制。基於此,有相當多研究是針對蝕刻ABS塑料的其它方式,並且有一些方法已可達到此目的。 Traditionally, etching has been carried out using a mixture of chromic acid and sulfuric acid at high temperatures. Chromic acid is capable of dissolving the polybutadiene phase of ABS by the oxidation of double bonds in the polybutadiene polymer backbone, which has proven to be quite reliable and effective for a wide range of ABS and ABS/PC plastics. However, due to the toxicity and carcinogenic nature of chromic acid, it has been increasingly regulated in use. Based on this, there is considerable research on other ways of etching ABS plastics, and there are some ways to achieve this.

舉例而言,酸性過錳酸鹽能夠氧化聚丁二烯中的雙鍵。接著,藉由與過碘酸鹽離子的進一步氧化,可以達到鏈斷裂的作用。臭氧也可以氧化聚丁二烯。然而,臭氧在使用上相當危險,並且具有高度的毒性。同樣的,三氧化硫可以用來蝕刻ABS,但在典型的電鍍產線上,無法成功的達成蝕刻。用於蝕刻ABS塑料之技術的其它實例可參考Bengston的美國專利公開號2005/0199587、Sakou等人的美國專利公開號2009/0092757及Gordhanbai等人的美國專利號5,160,600中所描述之內容,每一篇的內容皆經由引用完全併入本文參照。 For example, acidic permanganate is capable of oxidizing double bonds in polybutadiene. Then, by further oxidation with periodate ions, the effect of chain scission can be achieved. Ozone can also oxidize polybutadiene. However, ozone is quite dangerous to use and highly toxic. Similarly, sulfur trioxide can be used to etch ABS, but on typical plating lines, etching cannot be successfully achieved. Other examples of techniques for etching ABS plastics can be found in U.S. Patent Publication No. 2005/0199587 to Bengston, U.S. Patent Publication No. 2009/0092,757 to Sa., et al., and U.S. Patent No. 5,160,600 to Gordhanbai et al. The contents of this article are fully incorporated herein by reference.

最近,已發現可以在含有錳(III)離子於強硫酸中的溶液中蝕刻ABS和ABS/PC塑料,如Pearson等人的美國專利公開號2013/0186774中所述,其內容經由引用完全併入本文參照。 Recently, it has been found that ABS and ABS/PC plastics can be etched in a solution containing manganese (III) ions in strong sulfuric acid, as described in U.S. Patent Publication No. 2013/0186774 to Pearson et al. This article refers to.

為了電鍍塑膠組件,將其附接於電鍍掛架上,該掛架可傳送電流以使得塑膠組件敏化及金屬化。這些掛架通常會至少部分被不導電材料塗層,以避免掛架在電鍍製程中完全被金屬包覆,而最常見的掛架塗層為PVC塑性溶膠。在活化之前,於蝕刻階段中使用鉻酸,可有效修飾塑性溶膠塗層的表面,使其在被鈀活化劑(通常是鈀和錫的膠體)塗層之後能抵擋金屬化作用。當以其它蝕刻技術(例如,使用含過錳酸鹽或錳(III)的製程)來取代鉻酸時,電鍍掛架的塑性溶膠塗層變成被活化劑塗層,接著在無電鍍階段中變成被鎳或銅層塗層。因此,所有目前已知非使用鉻酸之方法所面臨的主要問題是,掛架塗層容易在後續的無電鍍階段中被鍍覆。這個現象被稱為“掛架鍍覆”,並且此為任何形式之無鉻蝕刻技術的主要問題。 To plate the plastic component, it is attached to a plating rack that carries current to sensitize and metallize the plastic component. These pylons are typically at least partially coated with a non-conductive material to prevent the pylon from being completely covered by metal during the electroplating process, and the most common pylon coating is a PVC plastisol. The use of chromic acid in the etching stage prior to activation effectively modifies the surface of the plastisol coating to resist metallization after being coated with a palladium activator (typically a colloid of palladium and tin). When chromic acid is replaced by other etching techniques (for example, using a process containing permanganate or manganese (III)), the plastisol coating of the plating rack becomes coated with an activator, and then becomes in the electroless plating stage. It is coated with a layer of nickel or copper. Therefore, the main problem faced by all currently known methods of not using chromic acid is that the pylon coating is easily plated in the subsequent electroless plating stage. This phenomenon is known as "hanger plating" and this is a major problem with any form of chromium-free etching technology.

本發明的目的之一是抑制電鍍非導電性基材製程中的掛架鍍覆。 One of the objects of the present invention is to suppress the galvanic plating in the electroplated non-conductive substrate process.

本發明的另一個目的是抑制電鍍非導電性基材製程中的掛架鍍覆,其中非導電性基材係使用無鉻蝕刻劑來蝕刻。 Another object of the present invention is to inhibit pylon plating in the electroplated non-conductive substrate process wherein the non-conductive substrate is etched using a chromium-free etchant.

本發明還有另一個目的是提供一種電鍍掛架的處理方法,其中該掛架係在電鍍製程中用於支撐非導電性基材。 Still another object of the present invention is to provide a method of processing a plating rack, wherein the rack is used to support a non-conductive substrate in an electroplating process.

為此,在一個實施實例中,本發明主要係關於一種在電沉積製程中用於支撐非導電性基材之電鍍掛架, 其中該電鍍掛架至少部分被不導電材料塗層;並且其中該電鍍掛架經含金屬化抑制劑之非水性溶液處理。 To this end, in one embodiment, the present invention is primarily directed to a plating rack for supporting a non-conductive substrate in an electrodeposition process, Wherein the plating rack is at least partially coated with a non-conductive material; and wherein the plating rack is treated with a non-aqueous solution containing a metallization inhibitor.

在另一個實施實例中,本發明主要係關於一種處理在電沉積製程中用於支撐非導電性基材之電鍍掛架的方法,其中該電鍍掛架至少部分被不導電材料塗層,該方法包括: 使電鍍掛架與含金屬化抑制劑之非水性溶液接觸。 In another embodiment, the present invention is generally directed to a method of treating a plating rack for supporting a non-conductive substrate in an electrodeposition process, wherein the plating rack is at least partially coated with a non-conductive material, the method include: The plating rack is brought into contact with a non-aqueous solution containing a metallization inhibitor.

本發明能用於處理在金屬化步驟期間用於支撐非導電性基材的目的之電鍍掛架。本文所描述的方法可以有效活化未使用鉻酸進行蝕刻之經蝕刻塑料,同時又能避免在使用無鉻酸蝕刻劑進行塑料初始粗化時所發生之掛架”鍍覆”的常見問題。除此之外,本發明主要係關於如ABS和ABS/PC之塑料的催化及後續金屬化,這些塑料已在不含鉻酸的製程溶液中被蝕刻,並且在被至少部分塗層的掛架上沒有”鍍覆”的問題。 The present invention can be used to treat plating hangers for the purpose of supporting a non-conductive substrate during the metallization step. The methods described herein are effective in activating etched plastics that are not etched using chromic acid, while avoiding the common problems of pylon "plating" that occurs when using a chromic acid-free etchant for initial roughening of the plastic. In addition, the present invention relates primarily to the catalysis and subsequent metallization of plastics such as ABS and ABS/PC, which have been etched in a process solution containing no chromic acid and in an at least partially coated pylon There is no problem with "plating".

在一個較佳實施實例中,該方法一般包括的步驟為:1)將被不導電材料部分塗層的掛架浸入含有金屬化抑制劑的溶液中;2)沖洗掛架並予以乾燥;3)將欲金屬化的零件安裝在掛架上; 4)將安裝在經處理掛架上的塑膠組件於不含鉻酸的蝕刻溶液(包括,例如,以過錳酸鹽或錳(III)為基礎的蝕刻溶液)中進行蝕刻;5)藉由將電鍍掛架浸入含有膠態鈀/錫或離子鈀的溶液中而活化塑料的表面;6)將掛架浸入加速製程,以從表面移除保護性的氧化錫(如果是膠態鈀/錫活化)或者是將掛架浸入還原製程,以在表面上形成鈀金屬(如果是離子鈀);7)將包含經蝕刻及活化零件的掛架浸入金屬化浴液中,以將鎳或者是銅化學沉積於經活化零件的表面上;以及8)電鍍該零件,通常是鍍銅、鎳和/或鉻。 In a preferred embodiment, the method generally comprises the steps of: 1) immersing a pylon partially coated with a non-conductive material into a solution containing a metallization inhibitor; 2) rinsing the pylon and drying it; 3) Mount the parts to be metallized on the hanger; 4) etching the plastic component mounted on the treated pylon in an etching solution containing no chromic acid (including, for example, a permanganate or manganese (III)-based etching solution); 5) Immerse the plating rack in a solution containing colloidal palladium/tin or ionic palladium to activate the surface of the plastic; 6) immerse the pylon in an accelerated process to remove protective tin oxide from the surface (if colloidal palladium/tin Activation) either by immersing the pylon in a reduction process to form palladium metal on the surface (if ionic palladium); 7) immersing the etched and activated part pylon into the metallization bath to nickel or copper Chemically deposited on the surface of the activated part; and 8) electroplated the part, typically copper, nickel and/or chromium.

因此,在一個實施實例中,本發明主要係關於一種在電沉積製程中用於支撐非導電性基材的電鍍掛架,其中該電鍍掛架至少部分被不導電材料塗層;並且其中該電鍍掛架經含金屬化抑制劑之非水性溶液處理。 Accordingly, in one embodiment, the present invention is generally directed to a plating rack for supporting a non-conductive substrate in an electrodeposition process, wherein the plating rack is at least partially coated with a non-conductive material; and wherein the plating The pylon is treated with a non-aqueous solution containing a metallization inhibitor.

如本文中所述,電鍍掛架通常係以PVC塑性溶膠或者是另一種不導電材料來塗層。 As described herein, the plating rack is typically coated with a PVC plastisol or another non-conductive material.

非水性溶液一般含有約5克/升至約40克/升的金屬化抑制劑,更佳為約15克/升至約25克/升的金屬化抑制劑,並且最佳為約10克/升至約20克/升的金屬化抑制劑。 The non-aqueous solution typically contains from about 5 grams per liter to about 40 grams per liter of metallization inhibitor, more preferably from about 15 grams per liter to about 25 grams per liter of metallization inhibitor, and most preferably about 10 grams per liter. Raise to about 20 grams per liter of metallization inhibitor.

非水性溶液的溫度較佳係維持在約25℃至約75℃之間,更佳的溫度是在約35℃至約65℃之間, 在此期間,電鍍掛架是浸在非水性溶液中。此外,電鍍掛架浸在非水性溶液中的時間須足以處理經PVC塑性溶膠塗層的掛架,以避免掛架被鍍覆。也就是說,電鍍掛架浸在非水性溶液中較佳在約1分鐘至約60分鐘之間,更佳在約2分鐘至約30分鐘之間。 The temperature of the non-aqueous solution is preferably maintained between about 25 ° C and about 75 ° C, and more preferably between about 35 ° C and about 65 ° C. During this time, the plating rack was immersed in a non-aqueous solution. In addition, the plating rack should be immersed in a non-aqueous solution for a time sufficient to treat the PVC plastisol-coated pylon to prevent the pylon from being plated. That is, the plating rack is preferably immersed in the non-aqueous solution for between about 1 minute and about 60 minutes, more preferably between about 2 minutes and about 30 minutes.

本發明人發現,實質上可溶於水性介質中的金屬化抑制劑並不適合本文中所述的製程,因為它們很容易慢慢地瀝濾(leach)至後續的製程溶液中,並且阻止零件的金屬化。金屬化抑制劑較佳是至少基本上不溶於水性介質中。因此,含有金屬化抑制劑的溶液為非水性溶液。 The inventors have discovered that metallization inhibitors that are substantially soluble in aqueous media are not suitable for the processes described herein because they are readily leached into subsequent process solutions and prevent parts from being Metalization. The metallization inhibitor is preferably at least substantially insoluble in the aqueous medium. Therefore, the solution containing the metallization inhibitor is a non-aqueous solution.

適合之不溶於水的金屬化抑制劑通常為含有2價硫的有機化合物,並且包括,但非侷限於,雙取代之二硫胺基甲酸鹽的過渡金屬鹽和四取代之硫化甲硫碳醯胺。適合的二硫胺基甲酸鹽包括,例如,二甲基二硫胺基甲酸鋅(ZDMC)、二乙基二硫胺基甲酸鋅(ZDEC)、二丁基二硫胺基甲酸鋅(ZDBC)、乙基苯基二硫胺基甲酸鋅(ZEPC)、二苄基二硫胺基甲酸鋅(ZBEC)、伸戊基二硫胺基甲酸鋅(Z5MC)、二乙基二硫胺基甲酸碲、二丁基二硫胺基甲酸鎳、二甲基二硫胺基甲酸鎳和二異壬基二硫胺基甲酸鋅。較佳的四取代硫化甲硫碳醯胺包括,例如,二硫化四苄基甲硫碳醯胺、巰基苯并噻唑、巰基噻唑啉、巰基苯并咪唑、巰基咪唑、巰基苯并唑、巰基噻唑、巰基三唑、二硫三聚氰酸和三硫三聚氰酸。也可使用一或多種金屬抑制劑的組合。在一個較佳實施實例中,金 屬化抑制劑包含二丁基二硫胺基甲酸鎳或二硫化四苄基甲硫碳醯胺。 Suitable water-insoluble metallization inhibitors are generally organic compounds containing divalent sulfur, and include, but are not limited to, transition metal salts of disubstituted dithiocarbamate and tetrasubstituted sulfur methyl sulfide Guanamine. Suitable dithiocarbamates include, for example, zinc dimethyldithiocarbamate (ZDMC), zinc diethyldithiocarbamate (ZDEC), zinc dibutyldithiocarbamate (ZDBC) ), ethyl phenyl dithiocarbamate (ZEPC), zinc dibenzyl dithiocarbamate (ZBEC), zinc pentyl dithiocarbamate (Z5MC), diethyl dithiocarbamate Nickel, dibutyl dithiocarbamate, nickel dimethyldithiocarbamate and zinc diisodecyldithiocarbamate. Preferred tetra-substituted sulfurized methylsulfonium carbenes include, for example, tetrabenzylcarbithione disulfide, mercaptobenzothiazole, mercaptothiazoline, mercaptobenzimidazole, mercapto imidazole, mercaptobenzoene Oxazole, mercaptothiazole, mercaptotriazole, dithiocyanuric acid and trithiocyanuric acid. Combinations of one or more metal inhibitors can also be used. In a preferred embodiment, the metallization inhibitor comprises nickel dibutyl dithiocarbamate or tetrabenzyl methylthiocarbamate disulfide.

適合之非水性溶劑包括,但非侷限於,碳酸伸丁酯、碳酸伸丙酯、碳酸伸乙酯、碳酸二甲酯、碳酸二乙酯、碳酸乙酯甲酯、乳酸丙酯、γ-丁內酯、3-乙氧丙酸乙酯以及二乙二醇一甲醚乙酸酯、乙二醇一甲醚乙酸酯、乙二醇一乙醚乙酸酯、二乙二醇一乙醚乙酸酯、二乙二醇一正丁醚乙酸酯、丙二醇一甲醚乙酸酯、丙二醇一乙醚乙酸酯、丙二醇一丙醚乙酸酯、丙二醇一丁醚乙酸酯、二丙二醇一甲醚乙酸酯、二丙二醇一乙醚乙酸酯、乙二醇二乙酸酯,以上僅為舉例而非限制。 Suitable non-aqueous solvents include, but are not limited to, butylene carbonate, propyl carbonate, ethyl carbonate, dimethyl carbonate, diethyl carbonate, ethyl methyl carbonate, propyl lactate, γ-butyl Lactone, ethyl 3-ethoxypropionate and diethylene glycol monomethyl ether acetate, ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, diethylene glycol monoethyl ether acetate Ester, diethylene glycol mono-n-butyl ether acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol monopropyl ether acetate, propylene glycol monobutyl ether acetate, dipropylene glycol monomethyl ether Acetate, dipropylene glycol monoethyl ether acetate, ethylene glycol diacetate, the above are by way of example only and not limitation.

溶劑混合物必須能夠溶解有效量的金屬化抑制劑,可以輕易地自經處理的掛架上沖掉,並且較佳為非揮發性,以及在毒性和可燃性方面能夠安全處理。此外,溶劑混合物必須不會破壞掛架的塗層。已發現,非常容易溶於水的溶劑很難將不溶於水的金屬化抑制劑溶解,因此無法提供有效的金屬化抑制。然而,能夠輕易地溶解抑制劑並且提供較佳的抑制程度之實質上不溶於水的溶劑可對掛架塗層產生較大程度的攻擊,並且在處理之後,也更難自掛架上沖掉。 The solvent mixture must be capable of dissolving an effective amount of metallization inhibitor, can be easily flushed from the treated pylon, and is preferably non-volatile, and can be safely handled in terms of toxicity and flammability. In addition, the solvent mixture must not damage the coating of the pylon. Solvents which are very soluble in water have been found to be difficult to dissolve in water-insoluble metallization inhibitors and thus do not provide effective metallization inhibition. However, a solvent that is capable of easily dissolving the inhibitor and providing a better degree of inhibition of the substantially water-insoluble solvent can cause a greater degree of attack on the pylon coating and, after processing, is more difficult to flush off the pylon. .

對掛架塗層的攻擊程度係與金屬化抑制劑擴散至掛架塗層表面的程度有關,因此,溶劑的選擇對於製程的成功與否相當重要。 The degree of attack on the pylon coating is related to the extent to which the metallization inhibitor diffuses to the surface of the pylon coating. Therefore, the choice of solvent is important for the success of the process.

本文所述的金屬化抑制劑在一般處理程序中可以很容易地塗布於掛架上,而由接觸點的頂端移除不想要的金屬沉積物。 The metallization inhibitors described herein can be easily applied to the pylon in a typical processing procedure while removing unwanted metal deposits from the top of the contact points.

本發明將藉由以下的非限制性實施例而說明。 The invention will now be illustrated by the following non-limiting examples.

比較實施例1:Comparative Example 1:

將ABS測試板和新的經PVC塑性溶膠塗層的測試片經過標準預處理順序處理,其包含下列階段:1)在含有400克/升鉻酸、350克/升硫酸和0.1克/升全氟辛基磺酸的溶液中蝕刻測試片(在65℃下進行8分鐘);2)沖洗;3)以含有氫氯酸羥胺和鹽酸之水溶液對測試片施以還原階段;4)沖洗;5)在進行活化之前,將測試片浸入作為預浸液之30%鹽酸溶液中;6)將測試片在30℃下浸入傳統的鈀/錫活化劑(MacDermid Macuplex D34C)中3分鐘;7)沖洗;8)將測試片在50℃下浸入傳統的加速劑溶液(MacDermid Ultracel 9369)中2分鐘;9)沖洗;10)將測試片在30℃下浸入設計用於鍍覆塑膠用品之無電鍍鎳製程(MacDermid Macuplex J64)中達7分鐘。 The ABS test panel and the new PVC plastisol coated test piece were subjected to a standard pretreatment sequence comprising the following stages: 1) containing 400 g/L chromic acid, 350 g/L sulfuric acid and 0.1 g/L full The test piece was etched in a solution of fluorooctane sulfonic acid (for 8 minutes at 65 ° C); 2) rinsing; 3) the test piece was subjected to a reduction stage with an aqueous solution containing hydroxylamine hydrochloride and hydrochloric acid; 4) rinsing; Before immersing, the test piece was immersed in a 30% hydrochloric acid solution as a prepreg; 6) The test piece was immersed in a conventional palladium/tin activator (MacDermid Macuplex D34C) at 30 ° C for 3 minutes; 7) Rinse 8) The test piece was immersed in a conventional accelerator solution (MacDermid Ultracel 9369) for 2 minutes at 50 ° C; 9) rinsed; 10) The test piece was immersed at 30 ° C in electroless nickel designed for plating plastic articles The process (MacDermid Macuplex J64) takes up to 7 minutes.

在進行此處理之後,檢驗測試片。結果發現ABS測試板被無電鍍鎳完全覆蓋,沒有明顯的孔隙。此測試板的後續電鍍結果可產生完全包覆和良好的附著 性。經PVC塑性溶膠塗層的測試片顯示沒有無電鍍鎳包覆。ABS和PVC測試片進行步驟1-10的重複循環不斷顯示ABS有完全無電鍍鎳包覆,而PVC則是沒有無電鍍鎳包覆。 After this treatment, the test piece was inspected. As a result, it was found that the ABS test plate was completely covered by electroless nickel and had no significant pores. Subsequent plating results from this test board produce complete coverage and good adhesion Sex. The test piece coated with PVC plastisol showed no electroless nickel coating. Repeated cycles of steps 1-10 for ABS and PVC test pieces continue to show that ABS has a completely electroless nickel coating, while PVC is not coated with an electroless nickel.

比較實施例2:Comparative Example 2:

將ABS測試板和新的經PVC塑性溶膠塗層的測試片經過預處理順序處理,其包含下列階段:1)將測試片在35℃下浸入含有100毫升/升碳酸伸丙酯和50毫升/升γ-丁內酯的溶劑預浸液中2分鐘;2)沖洗;3)在68℃下,於含有0.04M硫酸錳及0.02M錳(III)離子的12.5M硫酸溶液中蝕刻測試片20分鐘;4)沖洗;5)以含有抗壞血酸之水溶液對測試片施以還原階段;以及6)進行比較實施例1的階段4至10。 The ABS test panel and the new PVC plastisol coated test piece were subjected to a pretreatment sequence comprising the following stages: 1) The test piece was immersed at 35 ° C containing 100 ml / liter of propylene carbonate and 50 ml / 2 minutes of solvent pre-dip of γ-butyrolactone; 2) rinsing; 3) etching test piece 20 at 68 ° C in 12.5 M sulfuric acid solution containing 0.04 M manganese sulfate and 0.02 M manganese (III) ion Minutes; 4) rinsing; 5) applying a reduction phase to the test piece with an aqueous solution containing ascorbic acid; and 6) performing stages 4 to 10 of Comparative Example 1.

在進行此處理之後,檢驗測試片。結果發現ABS測試板被無電鍍鎳完全覆蓋,沒有明顯的孔隙。此測試板的後續電鍍結果可產生完全包覆和良好的附著性。經PVC塑性溶膠塗層的測試片顯示出無電鍍鎳的大量包覆,其據觀察覆蓋了10%至50%的表面積。這在商業實務上,預期將造成相當大的問題。ABS和經PVC塑性溶膠塗層的測試片進行步驟1-6的重複循環不斷顯示ABS有完全無電鍍鎳包覆,而經PVC塑性溶膠塗層的測試片則是有漸增量的無電鍍鎳覆蓋。 After this treatment, the test piece was inspected. As a result, it was found that the ABS test plate was completely covered by electroless nickel and had no significant pores. Subsequent plating results of this test panel resulted in complete coating and good adhesion. The test piece coated with PVC plastisol showed a large amount of coating of electroless nickel, which was observed to cover a surface area of 10% to 50%. This is expected to cause considerable problems in business practice. Repeated cycles of ABS and PVC plastisol coated test pieces in steps 1-6 continuously show that ABS has completely electroless nickel coating, while PVC plastisol coated test pieces have progressively increased electroless nickel plating. cover.

比較實施例3:Comparative Example 3:

將已在製造設備中使用六價鉻處理溶液循環數百次之舊的經PVC塑性溶膠塗層的測試片在熱水中瀝濾數小時,以去除表面上任何殘留的六價鉻(本發明人已確認此瀝濾操作可有效消除PVC塑性溶膠中的六價鉻所提供的任何金屬化抑制作用)。 The old PVC plastisol coated test piece which has been circulated hundreds of times in the manufacturing equipment using the hexavalent chromium treatment solution is leached in hot water for several hours to remove any residual hexavalent chromium on the surface (this invention It has been confirmed that this leaching operation is effective in eliminating any metallization inhibition provided by hexavalent chromium in the PVC plastisol).

將ABS測試板和該舊的經PVC塑性溶膠塗層的測試片經過比較實施例2的階段1-6之處理。 The ABS test panel and the old PVC plastisol coated test piece were subjected to the treatment of Stages 1-6 of Comparative Example 2.

在進行此處理之後,檢驗測試片。ABS測試板被無電鍍鎳完全覆蓋,沒有明顯的孔隙。此測試板的後續電鍍結果可產生完全包覆和良好的附著性。經PVC塑性溶膠塗層的測試片顯示塑性溶膠測試片的整個表面上有無電鍍鎳的完全包覆。這在商業實務上是完全無法接受的。 After this treatment, the test piece was inspected. The ABS test board is completely covered by electroless nickel and has no visible porosity. Subsequent plating results of this test panel resulted in complete coating and good adhesion. The test piece coated with PVC plastisol showed complete coating of electroless nickel on the entire surface of the plastisol test piece. This is totally unacceptable in business practice.

比較實施例4:Comparative Example 4:

將新的經PVC塑性溶膠塗層的測試片依以下方式處理:A.將該經塑性溶膠塗層的測試片在65℃下浸入γ-丁內酯中10分鐘;B.沖洗測試片並予以乾燥。 The new PVC plastisol coated test piece was treated as follows: A. The plastisol coated test piece was immersed in γ-butyrolactone at 65 ° C for 10 minutes; B. The test piece was rinsed and given dry.

將ABS測試板和經處理的經PVC塑性溶膠塗層的測試片經由下列階段來處理:1)將測試片在35℃下浸入含有100毫升/升碳酸伸丙酯和50毫升/升γ-丁內酯的溶劑預浸液中2分鐘;2)沖洗; 3)在68℃下,於含有0.04M硫酸錳及0.02M錳(III)離子的12.5M硫酸溶液中蝕刻測試片20分鐘;4)沖洗;5)以含有抗壞血酸之水溶液對測試片施以還原階段;以及6)進行比較實施例1的階段4至10。 The ABS test panel and the treated PVC plastisol coated test piece were processed through the following stages: 1) The test piece was immersed at 35 ° C with 100 ml / liter of propylene carbonate and 50 ml / liter of γ-butyl Solvent prepreg of lactone for 2 minutes; 2) rinse; 3) Etching the test piece for 20 minutes at 68 ° C in a 12.5 M sulfuric acid solution containing 0.04 M manganese sulfate and 0.02 M manganese (III) ion; 4) Rinse; 5) Applying the test piece to an aqueous solution containing ascorbic acid Stages; and 6) Stages 4 to 10 of Comparative Example 1 were carried out.

在進行此處理之後,檢驗測試片。結果發現ABS測試板被無電鍍鎳完全覆蓋,沒有明顯的孔隙。此測試板的後續電鍍結果可產生完全包覆和良好的附著性。經PVC塑性溶膠塗層的測試片顯示出無電鍍鎳的大量包覆,其據觀察覆蓋了10%至50%的表面積。在溶劑中處理過之經PVC塑性溶膠塗層的測試片和未在溶劑中處理過之經PVC塑性溶膠塗層的測試片之間並未觀察到明顯的差異。 After this treatment, the test piece was inspected. As a result, it was found that the ABS test plate was completely covered by electroless nickel and had no significant pores. Subsequent plating results of this test panel resulted in complete coating and good adhesion. The test piece coated with PVC plastisol showed a large amount of coating of electroless nickel, which was observed to cover a surface area of 10% to 50%. No significant difference was observed between the PVC plastisol coated test piece treated in the solvent and the PVC plastisol coated test piece not treated in the solvent.

這些比較實施例說明了,當使用無鉻的預處理程序時,伴隨的掛架鍍覆的問題,以及說明了,當沒有六價鉻存在時,舊的使用過的PVC塑性溶膠表面比新的PVC塑性溶膠表面更容易金屬化。比較實施例4則是說明,以沒有抑制劑的溶劑來進行處理是沒有效果的。 These comparative examples illustrate the problem of accompanying pylon plating when using a chrome-free pretreatment procedure, and illustrate that when used without hexavalent chromium, the old used PVC plastisol surface is newer than the new one. The surface of the PVC plastisol is easier to metallize. Comparative Example 4 is illustrative of the fact that treatment with a solvent without an inhibitor is ineffective.

實施例1:Example 1:

將新的經PVC塑性溶膠塗層的測試片依以下方式處理:A.將該經塑性溶膠塗層的測試片在65℃下浸入含有20克/升二丁基二硫胺基甲酸鎳的γ-丁內酯溶液中10分鐘;B.沖洗測試片並予以乾燥。 The new PVC plastisol coated test piece was treated as follows: A. The plastisol coated test piece was immersed in a γ containing 20 g/L of dibutyl dithiocarbamate at 65 ° C. - Butyrolactone solution for 10 minutes; B. Rinse the test piece and dry.

將ABS測試板和經處理的經PVC塑性溶膠塗層的測試片經由下列階段來處理:1)將測試片在35℃下浸入含有100毫升/升碳酸伸丙酯和50毫升/升γ-丁內酯的溶劑預浸液中2分鐘;2)沖洗;3)在68℃下,於含有0.04M硫酸錳及0.02M錳(III)離子的12.5M硫酸溶液中蝕刻測試片20分鐘;4)沖洗;5)以含有抗壞血酸之水溶液對測試片施以還原階段;以及6)進行比較實施例1的階段4至10。 The ABS test panel and the treated PVC plastisol coated test piece were processed through the following stages: 1) The test piece was immersed at 35 ° C with 100 ml / liter of propylene carbonate and 50 ml / liter of γ-butyl Solvent prepreg of lactone for 2 minutes; 2) rinsing; 3) etching the test piece in a 12.5 M sulfuric acid solution containing 0.04 M manganese sulfate and 0.02 M manganese (III) ion at 68 ° C for 20 minutes; 4) Rinsing; 5) applying a reduction stage to the test piece with an aqueous solution containing ascorbic acid; and 6) performing stages 4 to 10 of Comparative Example 1.

在進行此處理之後,檢驗測試片。結果發現ABS測試板被無電鍍鎳完全覆蓋,沒有明顯的孔隙。此測試板的後續電鍍結果可產生完全包覆和良好的附著性。除此之外,經PVC塑性溶膠塗層的測試片則是顯示出沒有無電鍍鎳包覆。 After this treatment, the test piece was inspected. As a result, it was found that the ABS test plate was completely covered by electroless nickel and had no significant pores. Subsequent plating results of this test panel resulted in complete coating and good adhesion. In addition, the test piece coated with PVC plastisol showed no electroless nickel coating.

ABS和經處理的PVC塑性溶膠測試片進行步驟1-6的重複循環不斷顯示ABS有完全無電鍍鎳包覆,經處理的經PVC塑性溶膠塗層的測試片則是直到第3次循環仍沒有無電鍍鎳包覆。在第3次循環之後,在PVC塑性溶膠上可看到大約10%的金屬化。在這個階段,將經PVC塑性溶膠塗層的測試片在抑制劑溶液中進行第二次處理,然後再次重複循環進行步驟1到6。至少再經過另外3次循環,在經處理的PVC塑性溶膠上未發現金屬化現象,在此同時,ABS測試板上已獲得完全無電鍍 鎳包覆。PVC塑性溶膠的外觀仍令人滿意,其與初始外觀的差異很小或根本無差異。 The repeated cycles of ABS and treated PVC plastisol test pieces in steps 1-6 continuously show that ABS has completely electroless nickel coating, and the treated PVC plastisol coated test piece is not until the third cycle. Electroless nickel coated. After the third cycle, about 10% metallization was seen on the PVC plastisol. At this stage, the test piece coated with PVC plastisol was subjected to a second treatment in the inhibitor solution, and then the cycle was repeated again to carry out steps 1 to 6. At least another 3 cycles, no metallization was observed on the treated PVC plastisol. At the same time, the ABS test panel was completely electroless. Nickel coated. The appearance of the PVC plastisol is still satisfactory, with little or no difference from the initial appearance.

實施例2:Example 2:

將新的經PVC塑性溶膠塗層的測試片依以下方式處理:A.將該經塑性溶膠塗層的測試片在42℃下浸入含有20克/升二丁基二硫胺基甲酸鎳的3-乙氧丙酸乙酯溶液中30分鐘;B.沖洗測試片並予以乾燥。 The new PVC plastisol coated test piece was treated as follows: A. The plastisol coated test piece was immersed at 42 ° C in a powder containing 20 g / liter of dibutyl dithiocarbamate - Ethyl ethionate solution for 30 minutes; B. Rinse the test piece and dry.

將ABS測試板和經處理的經PVC塑性溶膠塗層的測試片經由實施例1所述的階段1-6來處理。 The ABS test panels and the treated PVC plastisol coated test pieces were processed via Stages 1-6 as described in Example 1.

在進行此處理之後,檢驗測試片。結果發現ABS測試板被無電鍍鎳完全覆蓋,沒有明顯的孔隙。此測試板的後續電鍍結果可產生完全包覆和良好的附著性。經處理的經PVC塑性溶膠塗層的測試片則是顯示出沒有無電鍍鎳包覆。 After this treatment, the test piece was inspected. As a result, it was found that the ABS test plate was completely covered by electroless nickel and had no significant pores. Subsequent plating results of this test panel resulted in complete coating and good adhesion. The treated PVC plastisol coated test piece showed no electroless nickel coating.

ABS和經處理的PVC塑性溶膠塗層測試片進行實施例1所述之步驟1-6的重複循環不斷顯示ABS有完全無電鍍鎳包覆,而經處理的PVC塑性溶膠測試片到了第4次循環仍沒有無電鍍鎳包覆。 The ABS and treated PVC plastisol coated test pieces were subjected to the repeated cycles of steps 1-6 described in Example 1 to continuously show that the ABS had a completely electroless nickel coating, and the treated PVC plastisol test piece reached the fourth time. The cycle is still not coated with electroless nickel.

PVC塑性溶膠的外觀仍令人滿意,但比初始塗層更為柔軟。 The appearance of the PVC plastisol is still satisfactory, but it is softer than the initial coating.

實施例3:Example 3:

將新的經PVC塑性溶膠塗層的測試片依以下方式處理: A.將該經塑性溶膠塗層的測試片在40℃下浸入含有10克/升二硫化四苄基甲硫碳醯胺的3-乙氧丙酸乙酯溶液中10分鐘;B.沖洗測試片並予以乾燥。 The new PVC plastisol coated test piece was treated as follows: A. The plastisol-coated test piece was immersed in a solution of 10 g / liter of tetrabenzylthiocarbamate disulfide in ethyl 3-ethoxypropionate for 10 minutes at 40 ° C; B. rinse test The tablets are dried.

將ABS測試板和經處理的經PVC塑性溶膠塗層的測試片經由實施例1所述的階段1-6來處理。 The ABS test panels and the treated PVC plastisol coated test pieces were processed via Stages 1-6 as described in Example 1.

在進行處理之後,檢驗測試片。結果發現ABS測試板被無電鍍鎳完全覆蓋,沒有明顯的孔隙。此測試板的後續電鍍結果可產生完全包覆和良好的附著性。經處理的經PVC塑性溶膠塗層的測試片則是顯示出沒有無電鍍鎳包覆。 After the treatment, the test piece was inspected. As a result, it was found that the ABS test plate was completely covered by electroless nickel and had no significant pores. Subsequent plating results of this test panel resulted in complete coating and good adhesion. The treated PVC plastisol coated test piece showed no electroless nickel coating.

ABS和經處理的經PVC塑性溶膠塗層的測試片進行實施例1所述之步驟1-6的重複循環不斷顯示ABS有完全無電鍍鎳包覆,經處理的PVC塑性溶膠則是到了第6次循環仍沒有無電鍍鎳包覆。在第6次循環之後,在PVC塑性溶膠上可看到少量的金屬化。在這個階段,經PVC塑性溶膠塗層的測試片在抑制劑溶液中進行第二次處理,然後再次重複循環進行實施例1所述的步驟1到6的。至少再經過另外六次循環,在經處理的PVC塑性溶膠上未發現金屬化現象,在此同時,ABS測試板上已獲得完全無電鍍鎳包覆。 ABS and treated PVC plastisol coated test pieces were subjected to the repeated cycles of steps 1-6 described in Example 1 to continuously show that ABS was completely electroless nickel coated, and the treated PVC plastisol was reached the sixth. The secondary cycle is still not coated with electroless nickel. After the 6th cycle, a small amount of metallization was observed on the PVC plastisol. At this stage, the test piece coated with PVC plastisol was subjected to a second treatment in the inhibitor solution, and then the cycle was repeated again to carry out the steps 1 to 6 described in Example 1. At least another six cycles, no metallization was observed on the treated PVC plastisol, while a completely electroless nickel coating was obtained on the ABS test panel.

PVC塑性溶膠的外觀仍令人滿意,其與初始外觀的差異很小或根本無差異。 The appearance of the PVC plastisol is still satisfactory, with little or no difference from the initial appearance.

實施例4:Example 4:

將新的經PVC塑性溶膠塗層的測試片依以下方式處理:A.將該經塑性溶膠塗層的測試片在40℃下浸入含有10克/升二硫化四苄基甲硫碳醯胺的3-乙氧丙酸乙酯溶液中30分鐘;B.沖洗測試片並予以乾燥。 The new PVC plastisol coated test piece was treated as follows: A. The plastisol coated test piece was immersed at 40 ° C with 10 g / liter of tetrabenzylcarbocarbazide disulfide. The solution was dissolved in ethyl 3-ethoxypropionate for 30 minutes; B. The test piece was rinsed and dried.

將ABS測試板和經處理的經PVC塑性溶膠塗層的測試片經由實施例1所述的階段1-6來處理。 The ABS test panels and the treated PVC plastisol coated test pieces were processed via Stages 1-6 as described in Example 1.

在進行此處理之後,檢驗測試片。結果發現ABS測試板被無電鍍鎳完全覆蓋,沒有明顯的孔隙。此測試板的後續電鍍結果可產生完全包覆和良好的附著性。經處理的經PVC塑性溶膠塗層的測試片則是顯示出沒有無電鍍鎳包覆。 After this treatment, the test piece was inspected. As a result, it was found that the ABS test plate was completely covered by electroless nickel and had no significant pores. Subsequent plating results of this test panel resulted in complete coating and good adhesion. The treated PVC plastisol coated test piece showed no electroless nickel coating.

ABS和經處理的經PVC塑性溶膠塗層的測試片進行前述步驟A和B以及接著進行實施例1所述的步驟1-6的重複循環(亦在每一次蝕刻和金屬化循環之前,在抑制劑溶液中處理PVC塑性溶膠)不斷顯示ABS有完全無電鍍鎳包覆,而經處理的PVC塑性溶膠到了第10次循環仍沒有或僅有極少量的無電鍍鎳包覆,在PVC塑性溶膠上可看到少量的金屬化。 The ABS and the treated PVC plastisol coated test piece were subjected to the above steps A and B and then to the repeated cycles of steps 1-6 described in Example 1 (also before each etching and metallization cycle, in the inhibition) The treatment of PVC plastisol in the solution) continuously shows that ABS has completely electroless nickel coating, while the treated PVC plastisol has no or only a small amount of electroless nickel coating on the 10th cycle, on PVC plastisol. A small amount of metallization can be seen.

PVC塑性溶膠的外觀仍令人滿意,但比初始塗層更為柔軟。 The appearance of the PVC plastisol is still satisfactory, but it is softer than the initial coating.

實施例5:Example 5:

將已在製造設備中使用六價鉻處理溶液循環循環數百次之舊的塑性溶膠測試片在熱水中瀝濾數小時,以去除表面上殘留的六價鉻。 The old plastisol test piece, which has been circulated hundreds of times in a manufacturing facility using a hexavalent chromium treatment solution, was leached in hot water for several hours to remove residual hexavalent chromium on the surface.

將該舊的經PVC塑性溶膠塗層的測試片依以下方式處理:A.將該經塑性溶膠塗層的測試片在40℃下浸入含10克/升二硫化四苄基甲硫碳醯胺之乳酸正丙酯和3-乙氧丙酸乙酯的溶液中5分鐘;B.沖洗測試片並予以乾燥。 The old PVC plastisol coated test piece was treated as follows: A. The plastisol coated test piece was immersed at 40 ° C with 10 g / liter of tetrabenzylcarbocarbazide disulfide The solution of n-propyl lactate and ethyl 3-ethoxypropionate was allowed to stand for 5 minutes; B. The test piece was rinsed and dried.

將ABS測試板和經處理的經PVC塑性溶膠塗層的測試片經由實施例1所述的階段1-6來處理。 The ABS test panels and the treated PVC plastisol coated test pieces were processed via Stages 1-6 as described in Example 1.

在進行處理之後,檢驗測試片。結果發現ABS測試板被無電鍍鎳完全覆蓋,沒有明顯的孔隙。此測試板的後續電鍍結果可產生完全包覆和良好的附著性。經處理的經PVC塑性溶膠塗層的測試片顯示出沒有被無電鍍鎳包覆,雖然其為具有裂痕及粗糙的表面之已經多次使用並老化的塗層。 After the treatment, the test piece was inspected. As a result, it was found that the ABS test plate was completely covered by electroless nickel and had no significant pores. Subsequent plating results of this test panel resulted in complete coating and good adhesion. The treated PVC plastisol coated test piece showed no coating by electroless nickel, although it was a coating that had been used and aged multiple times with cracked and rough surfaces.

ABS和經處理的經PVC塑性溶膠塗層的測試片進行前述步驟A和B以及接著進行實施例1所述的步驟1-6的重複循環(在此實施例中,於每一次蝕刻和金屬化循環之前,在抑制劑溶液中處理塑性溶膠塗層)不斷顯示ABS有完全無電鍍鎳包覆,而經處理的PVC塑性溶膠到了第25次循環仍沒有無電鍍鎳包覆。 The ABS and the treated PVC plastisol coated test piece were subjected to the above-described steps A and B and then to the repeated cycles of steps 1-6 described in Example 1 (in this embodiment, each etching and metallization) Prior to cycling, the plastisol coating was treated in the inhibitor solution. It was consistently shown that ABS had a completely electroless nickel coating, while the treated PVC plastisol did not have an electroless nickel coating until the 25th cycle.

實施例6:Example 6

將新的經PVC塑性溶膠塗層的測試片依以下方式處理:A.將該經塑性溶膠塗層測試片在40℃下浸入含10克/升二硫化四苄基甲硫碳醯胺之乳酸正丙酯和3-乙氧丙酸乙酯的溶液中2分鐘;B.沖洗測試片並予以乾燥。 The new PVC plastisol coated test piece was treated as follows: A. The plastisol coated test piece was immersed at 40 ° C in lactic acid containing 10 g / liter of tetrabenzylcarbocarbazide disulfide A solution of n-propyl ester and ethyl 3-ethoxypropionate for 2 minutes; B. Rinse the test piece and dry.

將ABS測試板和經處理的經PVC塑性溶膠塗層的測試片經由實施例1所述的階段1-6來處理。 The ABS test panels and the treated PVC plastisol coated test pieces were processed via Stages 1-6 as described in Example 1.

在進行處理之後,檢驗測試片。結果發現ABS測試板被無電鍍鎳完全覆蓋,沒有明顯的孔隙。此測試板的後續電鍍結果可產生完全包覆和良好的附著性。經處理的經PVC塑性溶膠塗層的測試片則是顯示出沒有無電鍍鎳包覆。 After the treatment, the test piece was inspected. As a result, it was found that the ABS test plate was completely covered by electroless nickel and had no significant pores. Subsequent plating results of this test panel resulted in complete coating and good adhesion. The treated PVC plastisol coated test piece showed no electroless nickel coating.

ABS和經處理的經PVC塑性溶膠塗層的測試片進行前述步驟A和B以及接著進行實施例1所述的步驟1-6的重複循環(在此實施例中,於每一次蝕刻和金屬化循環之前,在抑制劑溶液中處理PVC塑性溶膠塗層)不斷顯示ABS有完全無電鍍鎳包覆,而經處理的PVC塑性溶膠到了第25次循環仍沒有無電鍍鎳包覆。 The ABS and the treated PVC plastisol coated test piece were subjected to the above-described steps A and B and then to the repeated cycles of steps 1-6 described in Example 1 (in this embodiment, each etching and metallization) Prior to cycling, the treatment of PVC plastisol coatings in the inhibitor solution continued to show that ABS had a completely electroless nickel coating, while the treated PVC plastisol did not have an electroless nickel coating until the 25th cycle.

PVC塑性溶膠的外觀仍令人滿意,其與初始外觀的差異很小或根本無差異。 The appearance of the PVC plastisol is still satisfactory, with little or no difference from the initial appearance.

Claims (23)

一種電鍍掛架,其係在鍍覆製程中用於支撐非導電性基材,其中該電鍍掛架至少部分被塗覆PVC塑性溶膠;並且其中該電鍍掛架經含金屬化抑制劑之非水性溶液處理;其中該經含金屬化抑制劑之非水性溶液處理的電鍍掛架,係在無鉻蝕刻劑中進行製程;其中該金屬化抑制劑係選自由二甲基二硫胺基甲酸鋅、二乙基二硫胺基甲酸鋅、二丁基二硫胺基甲酸鋅、乙基苯基二硫胺基甲酸鋅、二苄基二硫胺基甲酸鋅、伸戊基二硫胺基甲酸鋅、二乙基二硫胺基甲酸碲、二丁基二硫胺基甲酸鎳、二甲基二硫胺基甲酸鎳、二異壬基二硫胺基甲酸鋅、二硫化四苄基甲硫碳醯胺(tetrabenzylthium disulfide)、巰基苯并噻唑、巰基噻唑啉、巰基苯并咪唑、巰基咪唑、巰基苯并唑、巰基噻唑、巰基三唑、二硫三聚氰酸、三硫三聚氰酸、及前述一種或以上之組合所組成之群組;其中該非水性溶液包含一種非水性溶劑,該非水性溶劑係選自由碳酸伸丁酯、碳酸伸丙酯、碳酸伸乙酯、碳酸二甲酯、碳酸二乙酯、碳酸乙酯甲酯、乳酸丙酯、γ-丁內酯、3-乙氧丙酸乙酯以及二乙二醇一甲醚乙酸酯、乙二醇一甲醚乙酸酯、乙二醇一乙醚乙酸酯、二乙二醇一乙醚乙酸酯、二乙二醇一正丁醚乙酸酯、 丙二醇一甲醚乙酸酯、丙二醇一乙醚乙酸酯、丙二醇一丙醚乙酸酯、丙二醇一丁醚乙酸酯、二丙二醇一甲醚乙酸酯、二丙二醇一乙醚乙酸酯、乙二醇二乙酸酯,及前述一種或以上之組合所組成之群組。 An electroplating rack for supporting a non-conductive substrate in a plating process, wherein the electroplating rack is at least partially coated with a PVC plastisol; and wherein the electroplating rack is non-aqueous via a metallization inhibitor Solution treatment; wherein the electroplating rack treated by the non-aqueous solution containing the metallization inhibitor is processed in a chromium-free etchant; wherein the metallization inhibitor is selected from zinc dimethyldithiocarbamate, Zinc diethyldithiocarbamate, zinc dibutyldithiocarbamate, zinc ethylphenyldithiocarbamate, zinc dibenzyldithiocarbamate, zinc pentyl dithiocarbamate , bismuth diethyldithiocarbamate, nickel dibutyldithiocarbamate, nickel dimethyldithiocarbamate, zinc diisodecyldithiocarbamate, tetrabenzylsulfide carbon disulfide Tetrabenzylthium disulfide, mercaptobenzothiazole, mercaptothiazoline, mercaptobenzimidazole, mercapto imidazole, mercaptobenzo a group consisting of azole, mercaptothiazole, decyltriazole, dithiocyanuric acid, trithiocyanuric acid, and a combination of one or more of the foregoing; wherein the non-aqueous solution comprises a non-aqueous solvent, the non-aqueous solvent Select free butyl carbonate, propyl carbonate, ethyl carbonate, dimethyl carbonate, diethyl carbonate, ethyl methyl carbonate, propyl lactate, γ-butyrolactone, 3-ethoxypropionic acid Ester and diethylene glycol monomethyl ether acetate, ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, diethylene glycol monoethyl ether acetate, diethylene glycol mono-n-butyl ether Acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol monopropyl ether acetate, propylene glycol monobutyl ether acetate, dipropylene glycol monomethyl ether acetate, dipropylene glycol monoethyl ether acetate An ester, ethylene glycol diacetate, and a combination of one or more of the foregoing. 如請求項1之電鍍掛架,其中該金屬化抑制劑至少實質上不溶於水性介質中。 The electroplated rack of claim 1, wherein the metallization inhibitor is at least substantially insoluble in the aqueous medium. 如請求項2之電鍍掛架,其中該金屬化抑制劑為含有2價硫的有機化合物。 The electroplating rack of claim 2, wherein the metallization inhibitor is an organic compound containing divalent sulfur. 如請求項2之電鍍掛架,其中該金屬化抑制劑包含雙取代二硫胺基甲酸鹽的過渡金屬鹽或四取代硫化甲硫碳醯胺。 The electroplating pylon of claim 2, wherein the metallization inhibitor comprises a transition metal salt of a disubstituted dithiocarbamate or a tetra-substituted sulfurized methyl carbamide. 如請求項2之電鍍掛架,其中該金屬化抑制劑包含二丁基二硫胺基甲酸鎳或二硫化四苄基甲硫碳醯胺。 The electroplating pylon of claim 2, wherein the metallization inhibitor comprises nickel dibutyl dithiocarbamate or tetrabenzyl methane carbamide disulfide. 如請求項1之電鍍掛架,其中該非水性溶劑為非揮發性且能夠溶解有效量的金屬化抑制劑。 The electroplated rack of claim 1, wherein the non-aqueous solvent is non-volatile and capable of dissolving an effective amount of a metallization inhibitor. 如請求項6之電鍍掛架,其中該非水性溶劑包含3-乙氧丙酸乙酯、乳酸正丙酯、γ-丁內酯或前述一種或以上之組合。 The electroplating rack of claim 6, wherein the non-aqueous solvent comprises ethyl 3-ethoxypropionate, n-propyl lactate, γ-butyrolactone or a combination of one or more of the foregoing. 一種處理電鍍掛架之方法,該掛架係在鍍覆製程中用於支撐非導電性基材,其中該電鍍掛架至少部分被塗覆PVC塑性溶膠,該方法包括:a)使該電鍍掛架與含金屬化抑制劑之非水性溶液接觸;b)將非導電性基材安裝在已與該含金屬化抑制劑之非水性溶液接觸的該電鍍掛架上; c)以不含鉻酸的蝕刻劑來蝕刻該被支撐在該電鍍掛架上的該非導電性基材;其中該金屬化抑制劑係選自由二甲基二硫胺基甲酸鋅、二乙基二硫胺基甲酸鋅、二丁基二硫胺基甲酸鋅、乙基苯基二硫胺基甲酸鋅、二苄基二硫胺基甲酸鋅、伸戊基二硫胺基甲酸鋅、二乙基二硫胺基甲酸碲、二丁基二硫胺基甲酸鎳、二甲基二硫胺基甲酸鎳、二異壬基二硫胺基甲酸鋅、二硫化四苄基甲硫碳醯胺、巰基苯并噻唑、巰基噻唑啉、巰基苯并咪唑、巰基咪唑、巰基苯并唑、巰基噻唑、巰基三唑、二硫三聚氰酸、三硫三聚氰酸、及前述一種或以上之組合所組成之群組;其中該非水性溶液包含一種非水性溶劑,該非水性溶劑係選自由碳酸伸丁酯、碳酸伸丙酯、碳酸伸乙酯、碳酸二甲酯、碳酸二乙酯、碳酸乙酯甲酯、乳酸丙酯、γ-丁內酯、3-乙氧丙酸乙酯以及二乙二醇一甲醚乙酸酯、乙二醇一甲醚乙酸酯、乙二醇一乙醚乙酸酯、二乙二醇一乙醚乙酸酯、二乙二醇一正丁醚乙酸酯、丙二醇一甲醚乙酸酯、丙二醇一乙醚乙酸酯、丙二醇一丙醚乙酸酯、丙二醇一丁醚乙酸酯、二丙二醇一甲醚乙酸酯、二丙二醇一乙醚乙酸酯、乙二醇二乙酸酯,及前述一種或以上之組合所組成之群組。 A method of processing a plating rack for supporting a non-conductive substrate in a plating process, wherein the plating rack is at least partially coated with a PVC plastisol, the method comprising: a) hanging the plating The rack is contacted with a non-aqueous solution containing a metallization inhibitor; b) the non-conductive substrate is mounted on the plating rack that has been in contact with the non-aqueous solution containing the metallization inhibitor; c) is free of chromic acid An etchant to etch the non-conductive substrate supported on the plating rack; wherein the metallization inhibitor is selected from the group consisting of zinc dimethyldithiocarbamate, zinc diethyldithiocarbamate, Zinc dibutyl dithiocarbamate, zinc ethyl phenyl dithiocarbamate, zinc dibenzyl dithiocarbamate, zinc pentyl dithiocarbamate, bismuth diethyl dithiocarbamate , nickel dibutyl dithiocarbamate, nickel dimethyl dithiocarbamate, zinc diisodecyl dithiocarbamate, tetrabenzyl methanethiocarbamate disulfide, mercaptobenzothiazole, mercaptothiazole Porphyrin, mercaptobenzimidazole, mercapto imidazole, mercaptobenzo a group consisting of azole, mercaptothiazole, decyltriazole, dithiocyanuric acid, trithiocyanuric acid, and a combination of one or more of the foregoing; wherein the non-aqueous solution comprises a non-aqueous solvent, the non-aqueous solvent Select free butyl carbonate, propyl carbonate, ethyl carbonate, dimethyl carbonate, diethyl carbonate, ethyl methyl carbonate, propyl lactate, γ-butyrolactone, 3-ethoxypropionic acid Ester and diethylene glycol monomethyl ether acetate, ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, diethylene glycol monoethyl ether acetate, diethylene glycol mono-n-butyl ether Acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol monopropyl ether acetate, propylene glycol monobutyl ether acetate, dipropylene glycol monomethyl ether acetate, dipropylene glycol monoethyl ether acetate An ester, ethylene glycol diacetate, and a combination of one or more of the foregoing. 如請求項8之方法,其中該電鍍掛架係藉由將該電鍍掛架浸入該非水性溶液中而與該非水性溶液接觸。 The method of claim 8, wherein the plating rack is contacted with the non-aqueous solution by dipping the plating rack into the non-aqueous solution. 如請求項8之方法,其中該金屬化抑制劑至少實質上 不溶於水性介質中。 The method of claim 8, wherein the metallization inhibitor is at least substantially Insoluble in aqueous media. 如請求項10之方法,其中該金屬化抑制劑為含有2價硫的有機化合物。 The method of claim 10, wherein the metallization inhibitor is an organic compound containing divalent sulfur. 如請求項10之方法,其中該金屬化抑制劑包含雙取代二硫胺基甲酸鹽的過渡金屬鹽或四取代硫化甲硫碳醯胺。 The method of claim 10, wherein the metallation inhibitor comprises a transition metal salt of a disubstituted dithiocarbamate or a tetra-substituted sulfurized methanecarbamide. 如請求項12之方法,其中該金屬化抑制劑包含二丁基二硫胺基甲酸鎳或二硫化四苄基甲硫碳醯胺。 The method of claim 12, wherein the metallization inhibitor comprises nickel dibutyl dithiocarbamate or tetrabenzyl methylthiocarbamate disulfide. 如請求項8之方法,其中該非水性溶劑為非揮發性且能夠溶解有效數量的金屬化抑制劑。 The method of claim 8, wherein the non-aqueous solvent is non-volatile and capable of dissolving an effective amount of a metalation inhibitor. 如請求項14之方法,其中該非水性溶劑包含3-乙氧丙酸乙酯、乳酸正丙酯、γ-丁內酯或前述一種或以上之組合。 The method of claim 14, wherein the non-aqueous solvent comprises ethyl 3-ethoxypropionate, n-propyl lactate, γ-butyrolactone or a combination of one or more of the foregoing. 如請求項8之方法,其中該非水性溶液含有約5克/升至約40克/升的該金屬化抑制劑。 The method of claim 8, wherein the non-aqueous solution contains from about 5 grams per liter to about 40 grams per liter of the metallization inhibitor. 如請求項16之方法,其中該非水性溶液含有約10克/升至約25克/升的該金屬化抑制劑。 The method of claim 16, wherein the non-aqueous solution contains from about 10 grams per liter to about 25 grams per liter of the metallization inhibitor. 如請求項17之方法,其中該非水性溶液含有約15克/升至約20克/升的該金屬化抑制劑。 The method of claim 17, wherein the non-aqueous solution contains from about 15 grams per liter to about 20 grams per liter of the metallization inhibitor. 如請求項9之方法,其中在該電鍍掛架浸入該非水性溶液的期間,該非水性溶液係維持在約25℃至約75℃之間的溫度。 The method of claim 9, wherein the non-aqueous solution is maintained at a temperature between about 25 ° C and about 75 ° C during the immersion of the electroplated pylon into the non-aqueous solution. 如請求項19之方法,其中在該電鍍掛架浸入該非水性溶液的期間,該非水性溶液係維持在約35℃至約65℃之間的溫度。 The method of claim 19, wherein the non-aqueous solution is maintained at a temperature between about 35 ° C and about 65 ° C during the immersion of the electroplated pylon in the non-aqueous solution. 如請求項9之方法,其中該電鍍掛架浸入該非水性溶液約1分鐘至約60分鐘之間。 The method of claim 9, wherein the plating rack is immersed in the non-aqueous solution for between about 1 minute and about 60 minutes. 如請求項21之方法,其中該電鍍掛架浸入該非水性溶液約2分鐘至約30分鐘之間。 The method of claim 21, wherein the plating rack is immersed in the non-aqueous solution for between about 2 minutes and about 30 minutes. 如請求項8之方法,還進一步包括的步驟為:a)藉由將其上安裝了該非導電性基材的該電鍍掛架浸入含有膠態鈀/錫或離子鈀的溶液中而活化該非導電性基材的表面;b)將包含安裝於其上之經蝕刻及活化的非導電性基材的該電鍍掛架浸入無電金屬化浴液中,以無電的方式於其上沉積金屬;以及c)電鍍該非導電性基材以在其上鍍覆金屬,其中該電鍍掛架的經處理塗層的部分仍然沒有無電沉積的金屬。 The method of claim 8, further comprising the steps of: a) activating the non-conductive material by immersing the plating rack on which the non-conductive substrate is mounted in a solution containing colloidal palladium/tin or ionic palladium; The surface of the substrate; b) immersing the plating rack comprising the etched and activated non-conductive substrate mounted thereon in an electroless metallization bath to deposit metal thereon in an electroless manner; The non-conductive substrate is electroplated to plate a metal thereon, wherein the portion of the treated coating of the plating rack is still free of electrolessly deposited metal.
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