TWI621853B - Wafer inspection positioning device - Google Patents

Wafer inspection positioning device Download PDF

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Publication number
TWI621853B
TWI621853B TW106114350A TW106114350A TWI621853B TW I621853 B TWI621853 B TW I621853B TW 106114350 A TW106114350 A TW 106114350A TW 106114350 A TW106114350 A TW 106114350A TW I621853 B TWI621853 B TW I621853B
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Taiwan
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groove
wafer
gas
air
mounting
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TW106114350A
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Chinese (zh)
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TW201839403A (en
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Kai-Yuan Hou
Ren-Sheng Zheng
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Main Science Machinery Company Ltd
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Publication of TW201839403A publication Critical patent/TW201839403A/en

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Abstract

一種晶片檢查定位裝置,用於安裝於一氣座,該氣座包括一安裝面,及形成於該安裝面的一吸氣孔及一吹氣孔,該晶片檢查定位裝置包含一定位座,該定位座包括一晶片安裝部、一氣座安裝部及一導氣部,該晶片安裝部具有一晶片安裝槽、一第一氣槽及一第二氣槽,該氣座安裝部具有一用來供該氣座插設的氣座安裝槽,該導氣部具有一用來靠設於該安裝面的表面、一貫穿該表面的貫孔,及一連通該第一氣槽及該第二氣槽的第三氣槽,藉此使一晶片可受到來自該貫孔的吸附,以及受到來自該第一氣槽及該第二氣槽的氣體的吹送而定位,以方便後續檢測。A wafer inspection positioning device for mounting on an air bearing seat, the air socket includes a mounting surface, and an air suction hole and a blowing hole formed on the mounting surface, the wafer inspection positioning device includes a positioning seat, the positioning seat The device includes a wafer mounting portion, a gas mounting portion, and a gas guiding portion. The wafer mounting portion has a wafer mounting groove, a first gas groove and a second gas groove. The gas seat mounting portion has a gas for the gas. The air bearing mounting groove is inserted into the seat, the air guiding portion has a surface for the mounting surface, a through hole penetrating the surface, and a first portion connecting the first air groove and the second air groove A three-gas tank whereby a wafer is subjected to adsorption from the through-hole and is positioned by blowing of gas from the first gas tank and the second gas tank to facilitate subsequent detection.

Description

晶片檢查定位裝置Wafer inspection positioning device

本發明是有關於一種檢查裝置,特別是指一種晶片檢查定位裝置。The present invention relates to an inspection apparatus, and more particularly to a wafer inspection positioning apparatus.

現有的一晶片在經過打線製程後,都要藉由一顯微鏡來進行人工檢視,以確定電路及銲點是否正常,若一切正常就可進行後續的封裝作業,但若有異常狀況時,就必須進行其他的異常狀況排除作業,例如將異常的該晶片取出。After the existing wire is processed through a wire, a manual inspection is performed by a microscope to determine whether the circuit and the solder joints are normal. If everything is normal, the subsequent packaging operation can be performed, but if there is an abnormal condition, it must be Perform other abnormal condition exclusion tasks, such as taking out the abnormal wafer.

然而,該晶片在進行人工檢視前,必須先手動將該晶片移動至可供該顯微鏡觀測的位置,而手動作業無法精準的將該晶片放置在固定的基準位置,導致由該顯微鏡觀測時,還必須進行位置調整,因此操作麻煩且又相當耗費時間。However, before the manual inspection, the wafer must be manually moved to a position that can be observed by the microscope, and the manual operation cannot accurately place the wafer at a fixed reference position, resulting in observation by the microscope. Position adjustments must be made, so the operation is cumbersome and time consuming.

因此,本發明之目的,即在提供一種至少克服先前技術所述缺點的晶片檢查定位裝置。Accordingly, it is an object of the present invention to provide a wafer inspection positioning apparatus that overcomes at least the disadvantages of the prior art.

於是,本發明晶片檢查定位裝置,用於安裝於一氣座,該氣座包括一安裝面,及形成於該安裝面的一吸氣孔及一吹氣孔,該晶片檢查定位裝置包含一定位座。Therefore, the wafer inspection positioning device of the present invention is mounted on an air bearing seat, the air socket includes a mounting surface, and an air suction hole and a blowing hole formed on the mounting surface, and the wafer inspection positioning device includes a positioning seat.

該定位座包括一晶片安裝部、一相反該晶片安裝部的氣座安裝部,及一位於該晶片安裝部及該氣座安裝部之間的導氣部,該晶片安裝部具有一晶片安裝槽、依序圍繞界定出方型的該晶片安裝槽的一第一供氣面、一第二供氣面、一第一貼靠面及一第二貼靠面、一形成於該第一供氣面的第一氣槽,及一形成於該第二供氣面的第二氣槽,該氣座安裝部具有一相鄰該導氣部且用來供該氣座插設的氣座安裝槽,該導氣部具有一朝向該晶片安裝槽的第一表面、一相反該第一表面且朝向該氣座安裝槽並用來靠設於該安裝面的第二表面、一貫穿該第一表面及該第二表面的貫孔,及一形成於該第二表面並連通該第一氣槽及該第二氣槽的第三氣槽。The positioning base includes a wafer mounting portion, an air bearing mounting portion opposite to the wafer mounting portion, and a gas guiding portion between the wafer mounting portion and the air bearing mounting portion, the wafer mounting portion having a wafer mounting groove Forming a first gas supply surface, a first gas supply surface, a first abutment surface and a second abutment surface, respectively, around the defined wafer mounting groove a first air groove of the surface, and a second air groove formed on the second air supply surface, the air seat mounting portion has a gas seat mounting groove adjacent to the air guiding portion for inserting the air seat The air guiding portion has a first surface facing the wafer mounting groove, a first surface opposite the first surface and facing the air bearing mounting groove, and is disposed on the second surface of the mounting surface, through the first surface, and a through hole of the second surface, and a third air groove formed on the second surface and communicating with the first air groove and the second air groove.

本發明之功效在於:藉由設置該晶片安裝槽、該貫孔、該第一氣槽、該第二氣槽及該第三氣槽,使該晶片可受到來自該貫孔的吸附,以及受到來自該第一氣槽及該第二氣槽的氣體的吹送而定位,以方便後續檢測。The effect of the present invention is that the wafer can be subjected to adsorption from the through hole by providing the wafer mounting groove, the through hole, the first gas groove, the second gas groove and the third gas groove, and The gas from the first gas tank and the second gas tank is positioned by blowing to facilitate subsequent detection.

參閱圖1、2、3,本發明晶片檢查定位裝置之一實施例,用於安裝於一可受操作而移動的移動裝置(圖未示),並用來吸附一待檢驗並呈方型的晶片5,該移動裝置包括一氣座6,該氣座6包括一安裝面61,及形成於該安裝面61並可分別提供吸氣及吹氣的效用的一吸氣孔62及一吹氣孔63。Referring to Figures 1, 2 and 3, an embodiment of the wafer inspection positioning device of the present invention is mounted on an operable mobile device (not shown) for adsorbing a wafer to be inspected and squared. 5. The moving device includes a gas seat 6 including a mounting surface 61, and an air suction hole 62 and a blowing hole 63 formed on the mounting surface 61 and respectively providing the effects of suction and blowing.

參閱圖3、4、5,該晶片檢查定位裝置包含一定位座2。Referring to Figures 3, 4, and 5, the wafer inspection positioning device includes a positioning base 2.

該定位座2包括一晶片安裝部21、一相反該晶片安裝部21的氣座安裝部23,及一位於該晶片安裝部21及該氣座安裝部23之間的導氣部25。The positioning base 2 includes a wafer mounting portion 21, an air bearing mounting portion 23 opposite to the wafer mounting portion 21, and an air guiding portion 25 between the wafer mounting portion 21 and the air bearing mounting portion 23.

該晶片安裝部21具有一晶片安裝槽211、依序圍繞界定出方型的該晶片安裝槽211的一第一供氣面212、一第二供氣面213、一第一貼靠面214及一第二貼靠面215、一形成於該第一供氣面212的第一氣槽216、一形成於該第二供氣面213的第二氣槽217、二形成於該第一貼靠面214的第一穿孔218,及二形成於該第二貼靠面215的第二穿孔219。The wafer mounting portion 21 has a wafer mounting groove 211, a first air supply surface 212, a second air supply surface 213, and a first contact surface 214, which are sequentially defined around the wafer mounting groove 211. a second abutment surface 215, a first air groove 216 formed on the first air supply surface 212, a second air groove 217 formed on the second air supply surface 213, and two formed on the first abutment The first through hole 218 of the surface 214 and the second through hole 219 formed on the second abutting surface 215.

該第一氣槽216具有一連接該晶片安裝槽211的第一槽區221,及二連接該第一槽區221的第一導引道222。The first air channel 216 has a first slot region 221 connecting the chip mounting slot 211 and a first guiding channel 222 connecting the first slot region 221.

該第二氣槽217具有一連接該晶片安裝槽211的第二槽區223,及二連接該第二槽區223的第二導引道224。The second air channel 217 has a second slot 223 connecting the chip mounting slot 211 and a second guiding channel 224 connecting the second slot 223.

參閱圖4、6、7,該氣座安裝部23具有一相鄰該導氣部25且用來供該氣座6插設的氣座安裝槽231。Referring to Figures 4, 6, and 7, the air seat mounting portion 23 has an air bearing mounting groove 231 adjacent to the air guiding portion 25 for inserting the air bearing 6.

參閱圖3、4、7,該導氣部25具有一朝向該晶片安裝槽211的第一表面251、一相反該第一表面251且朝向該氣座安裝槽231並用來靠設於該安裝面61的第二表面252、一貫穿該第一表面251及該第二表面252的貫孔253,及一形成於該第二表面252並連通該第一氣槽216及該第二氣槽217的第三氣槽254。Referring to FIGS. 3, 4, and 7, the air guiding portion 25 has a first surface 251 facing the wafer mounting groove 211, a first surface 251 opposite to the air mounting groove 231, and is disposed on the mounting surface. a second surface 252 , a through hole 253 extending through the first surface 251 and the second surface 252 , and a second surface 252 formed on the second surface 252 and communicating with the first air groove 216 and the second air groove 217 The third gas groove 254.

該第三氣槽254具有一相鄰該安裝面61的第三槽區255、二分別連接該等第一導引道222及該第三槽區255的第三導引道256,及二分別連接該等第二導引道224及該第三槽區255的第四導引道257。The third air channel 254 has a third slot 255 adjacent to the mounting surface 61, a third guiding channel 256 connecting the first guiding channel 222 and the third slot 255, respectively. The second guiding track 224 and the fourth guiding track 257 of the third groove area 255 are connected.

該第三槽區255呈環型,且環繞於該貫孔253的外側。The third groove region 255 is annular and surrounds the outer side of the through hole 253.

參閱圖2、6、7,See Figures 2, 6, and 7,

安裝時,是將該定位座2裝設於該氣座6上,以使該氣座6嵌合於該氣座安裝槽231,此時該安裝面61及該第二表面252相互推抵而達到密封的效果,使該貫孔253僅能連通該吸氣孔62,以及使該第三氣槽254僅能連通該吹氣孔63。The mounting seat 2 is mounted on the air base 6 so that the air seat 6 is fitted to the air seat mounting groove 231. At this time, the mounting surface 61 and the second surface 252 are pushed against each other. The sealing effect is achieved such that the through hole 253 can only communicate with the suction hole 62, and the third air groove 254 can only communicate with the air blowing hole 63.

參閱圖2、7、8,接著即可操作該移動裝置以使該晶片安裝槽211對準該晶片5,並透過該吸氣孔62開始吸氣,由於該吸氣孔62是連通該貫孔253,因此就能使該晶片5受到該貫孔253的吸附而貼附於該第一表面251,並可操作該移動裝置以使該晶片5朝向上方。Referring to FIGS. 2, 7, and 8, the mobile device can be operated to align the wafer mounting groove 211 with the wafer 5, and the inhalation is started through the air suction hole 62. Since the air suction hole 62 is connected to the through hole. 253, so that the wafer 5 can be attached to the first surface 251 by the adsorption of the through hole 253, and the moving device can be operated to face the wafer 5 upward.

參閱圖2、7、9,最後透過該吹氣孔63開始吹氣,由於該吹氣孔63是連通該第三氣槽254的該第三槽區255,因此吹氣時,氣體會自該吹氣孔63進入該第三槽區255內,並由該第三槽區255通過該等第三導引道256、該等第一導引道222而由該第一槽區221朝該晶片5吹送,以及由該第三槽區255通過該等第四導引道257、該等第二導引道224而由該第二槽區223朝該晶片5吹送,由於該第一槽區221及該第二槽區223形成方型的其中一角,因此該晶片5就會被吹往對角方向,進而使該晶片5的兩相鄰邊能分別貼靠於該第一貼靠面214及該第二貼靠面215,如此一來,在該移動裝置每一次移動的位置皆為固定的位置的狀況下,該晶片5就能確保在一個固定的基準位置,因此在後續對該晶片5進行電路或銲點的檢測時,就能確保該晶片5的位置不會產生偏差,使後續以顯微鏡進行檢測時就不需再對該顯微鏡進行調整,而可加速檢測時間。Referring to Figures 2, 7, and 9, finally, air is blown through the air blowing hole 63. Since the air blowing hole 63 is the third groove portion 255 that communicates with the third air groove 254, gas is blown from the air blowing hole when blowing. The third slot area 255 is inserted into the third slot area 255, and the third slot area 255 is blown by the first slot area 221 toward the wafer 5 through the third guiding track 256 and the first guiding track 222. And the third slot region 255 passes through the fourth guiding channel 257 and the second guiding channel 224, and is blown toward the wafer 5 by the second slot region 223, because the first slot region 221 and the first slot The two-groove area 223 forms one corner of the square shape, so that the wafer 5 is blown in a diagonal direction, so that two adjacent sides of the wafer 5 can respectively abut the first abutting surface 214 and the second The contact surface 215, so that the wafer 5 can be secured at a fixed reference position in the case where the position of each movement of the mobile device is a fixed position, so that the wafer 5 is subsequently circuit-on or When the solder joint is detected, it is ensured that the position of the wafer 5 is not deviated, so that it is not necessary to perform subsequent inspection by the microscope. The microscope is adjusted to speed up the inspection time.

要說明的是,在透過該吹氣孔63吹氣時,透過該吸氣孔62進行吸氣的吸氣量也可以對應調低,以使該晶片5容易被吹動而完成定位。It is to be noted that when the air is blown through the air blowing hole 63, the amount of intake air that is inhaled through the air intake hole 62 can be lowered accordingly, so that the wafer 5 can be easily blown to complete positioning.

此外,為了加速該晶片5的定位,還能透過該等第一穿孔218及該等第二穿孔219而對該晶片5吸氣,而使該晶片5能更快且更穩固的貼靠於該第一貼靠面214及該第二貼靠面215。In addition, in order to accelerate the positioning of the wafer 5, the wafer 5 can be inhaled through the first through holes 218 and the second through holes 219, so that the wafer 5 can be pressed against the wafer 5 more quickly and more stably. The first abutment surface 214 and the second abutment surface 215.

綜上所述,藉由設置該晶片安裝槽211、該貫孔253、該第一氣槽216、該第二氣槽217及該第三氣槽254,使該晶片5可受到來自該貫孔253的吸附,以及受到來自該第一氣槽216及該第二氣槽217的氣體的吹送而定位,以方便後續檢測,故確實能達成本發明之目的。In summary, the wafer 5 can be received from the through hole by providing the wafer mounting groove 211, the through hole 253, the first gas groove 216, the second gas groove 217 and the third gas groove 254. The adsorption of 253 and the blowing of the gas from the first gas tank 216 and the second gas tank 217 are positioned to facilitate subsequent detection, so that the object of the present invention can be achieved.

惟以上所述者,僅為本發明之實施例而已,當不能以此限定本發明實施之範圍,凡是依本發明申請專利範圍及專利說明書內容所作之簡單的等效變化與修飾,皆仍屬本發明專利涵蓋之範圍內。However, the above is only the embodiment of the present invention, and the scope of the invention is not limited thereto, and all the equivalent equivalent changes and modifications according to the scope of the patent application and the patent specification of the present invention are still The scope of the invention is covered.

2‧‧‧定位座
21‧‧‧晶片安裝部
211‧‧‧晶片安裝槽
212‧‧‧第一供氣面
213‧‧‧第二供氣面
214‧‧‧第一貼靠面
215‧‧‧第二貼靠面
216‧‧‧第一氣槽
217‧‧‧第二氣槽
218‧‧‧第一穿孔
219‧‧‧第二穿孔
221‧‧‧第一槽區
222‧‧‧第一導引道
223‧‧‧第二槽區
224‧‧‧第二導引道
23‧‧‧氣座安裝部
231‧‧‧氣座安裝槽
25‧‧‧導氣部
251‧‧‧第一表面
252‧‧‧第二表面
253‧‧‧貫孔
254‧‧‧第三氣槽
255‧‧‧第三槽區
256‧‧‧第三導引道
257‧‧‧第四導引道
5‧‧‧晶片
6‧‧‧氣座
61‧‧‧安裝面
62‧‧‧吸氣孔
63‧‧‧吹氣孔
2‧‧‧ Positioning Block
21‧‧‧ Wafer Installation Department
211‧‧‧ wafer mounting slot
212‧‧‧First gas supply surface
213‧‧‧second gas supply surface
214‧‧‧First contact surface
215‧‧‧Second affixed
216‧‧‧First gas trough
217‧‧‧Second gas tank
218‧‧‧ first perforation
219‧‧‧Second perforation
221‧‧‧First trough area
222‧‧‧First Guide Road
223‧‧‧Second trough area
224‧‧‧Second Guide Road
23‧‧‧Air seat installation
231‧‧‧Air seat installation slot
25‧‧‧Gas Guide
251‧‧‧ first surface
252‧‧‧ second surface
253‧‧‧through holes
254‧‧‧ third gas trough
255‧‧‧ third trough area
256‧‧‧ Third Guide Road
257‧‧‧fourth guiding channel
5‧‧‧chip
6‧‧‧ Air Seat
61‧‧‧Installation surface
62‧‧‧ suction holes
63‧‧‧Blow holes

本發明之其他的特徵及功效,將於參照圖式的實施方式中清楚地呈現,其中: 圖1是本發明晶片檢查定位裝置的一實施例、一氣座及一晶片的一立體組合圖; 圖2是該實施例、該氣座及該晶片的一立體分解圖; 圖3是該實施例的一俯視圖; 圖4是該實施例的一仰視圖; 圖5是該實施例的一立體圖; 圖6是該實施例於另一視角的一立體圖; 圖7是該實施例、該氣座及該晶片的剖視示意圖; 圖8是一使用示意圖,說明該晶片被吸附於該定位座的狀態;及 圖9是一類似於圖8的視圖,說明該晶片被吹動定位的狀態。BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a perspective view of an embodiment of a wafer inspection and positioning apparatus, a gas holder and a wafer according to an embodiment of the present invention; 2 is a perspective view of the embodiment, the air block and the wafer; FIG. 3 is a plan view of the embodiment; FIG. 4 is a bottom view of the embodiment; FIG. 5 is a perspective view of the embodiment; 6 is a perspective view of the embodiment from another perspective; FIG. 7 is a cross-sectional view of the embodiment, the air holder and the wafer; FIG. 8 is a schematic view showing the state in which the wafer is adsorbed to the positioning seat; And Fig. 9 is a view similar to Fig. 8 illustrating the state in which the wafer is blown and positioned.

Claims (3)

一種晶片檢查定位裝置,用於安裝於一氣座,該氣座包括一安裝面,及形成於該安裝面的一吸氣孔及一吹氣孔,該晶片檢查定位裝置包含:一定位座,包括一晶片安裝部、一相反該晶片安裝部的氣座安裝部,及一位於該晶片安裝部及該氣座安裝部之間的導氣部,該晶片安裝部具有一晶片安裝槽、依序圍繞界定出方型的該晶片安裝槽的一第一供氣面、一第二供氣面、一第一貼靠面及一第二貼靠面、一形成於該第一供氣面的第一氣槽,及一形成於該第二供氣面的第二氣槽,該氣座安裝部具有一相鄰該導氣部且用來供該氣座插設的氣座安裝槽,該導氣部具有一朝向該晶片安裝槽的第一表面、一相反該第一表面且朝向該氣座安裝槽並用來靠設於該安裝面的第二表面、一貫穿該第一表面及該第二表面的貫孔,及一形成於該第二表面並連通該第一氣槽及該第二氣槽的第三氣槽,該第一氣槽具有一連接該晶片安裝槽的第一槽區,及複數連接該第一槽區的第一導引道,該第二氣槽具有一連接該晶片安裝槽的第二槽區,及複數連接該第二槽區的第二導引道,該第三氣槽具有一相鄰該安裝面的第三槽區、複數分別連接該等第一導引道及該第三槽區的第三導引道,及複數分別連接該等第二導引道及該第三槽區的第四導引道。 A wafer inspection positioning device for mounting on an air bearing seat, the air socket includes a mounting surface, and an air suction hole and a blowing hole formed on the mounting surface, the wafer inspection positioning device comprises: a positioning seat, including a a wafer mounting portion, an air bearing mounting portion opposite to the wafer mounting portion, and a gas guiding portion between the wafer mounting portion and the air bearing mounting portion, the wafer mounting portion having a wafer mounting groove and sequentially defining a first air supply surface, a second air supply surface, a first abutting surface and a second abutting surface of the chip mounting slot of the outlet type, and a first gas formed on the first air supply surface a groove, and a second gas groove formed on the second gas supply surface, the air seat mounting portion has a gas seat mounting groove adjacent to the gas guiding portion for inserting the gas seat, the gas guiding portion Having a first surface facing the wafer mounting groove, a surface opposite the first surface and facing the air bearing mounting groove for abutting the second surface of the mounting surface, a first surface and the second surface a through hole, and one formed on the second surface and communicating with the first air groove and the second a third gas groove of the groove, the first gas groove has a first groove region connecting the wafer mounting groove, and a plurality of first guide channels connecting the first groove region, the second gas groove has a connection to the wafer a second slot of the mounting slot, and a second guiding channel connected to the second slot, the third air slot has a third slot adjacent to the mounting surface, and the plurality of first guides are respectively connected And a third guiding channel of the third slot area, and a plurality of fourth guiding tracks respectively connecting the second guiding track and the third slot area. 如請求項1所述的晶片檢查定位裝置,其中,該晶片安裝部還具有複數形成於該第一貼靠面的第一穿孔,及複數形成於該第二貼靠面的第二穿孔。 The wafer inspection positioning device according to claim 1, wherein the wafer mounting portion further has a plurality of first perforations formed on the first abutting surface, and a plurality of second perforations formed on the second abutting surface. 如請求項1所述的晶片檢查定位裝置,其中,該第三槽區呈環型,且環繞於該貫孔的外側。 The wafer inspection positioning device of claim 1, wherein the third groove region is annular and surrounds an outer side of the through hole.
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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5034688A (en) * 1988-05-05 1991-07-23 Ets Gourdon Temperature conditioning support for small objects such as semi-conductor components and thermal regulation process using said support
CN1479873A (en) * 2000-12-07 2004-03-03 ��ʽ���簮������� Socket for electronic component test and electronic component test apparatus using the socket
TWM270358U (en) * 2004-11-17 2005-07-11 Winway Technology Co Ltd Testing seat for integrated circuit devices
TW201637974A (en) * 2015-03-30 2016-11-01 尼康股份有限公司 Object carrier device, exposure apparats, manufacturing method of flat panel display, device manufacturing method, object carrying method, and exposure method
TW201709402A (en) * 2015-06-25 2017-03-01 克佛羅有限公司 Wafer gripper

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5034688A (en) * 1988-05-05 1991-07-23 Ets Gourdon Temperature conditioning support for small objects such as semi-conductor components and thermal regulation process using said support
CN1479873A (en) * 2000-12-07 2004-03-03 ��ʽ���簮������� Socket for electronic component test and electronic component test apparatus using the socket
TWM270358U (en) * 2004-11-17 2005-07-11 Winway Technology Co Ltd Testing seat for integrated circuit devices
TW201637974A (en) * 2015-03-30 2016-11-01 尼康股份有限公司 Object carrier device, exposure apparats, manufacturing method of flat panel display, device manufacturing method, object carrying method, and exposure method
TW201709402A (en) * 2015-06-25 2017-03-01 克佛羅有限公司 Wafer gripper

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