TWI620383B - Double polarization mode-locked laser system, gain module thereof and control method thereof - Google Patents

Double polarization mode-locked laser system, gain module thereof and control method thereof Download PDF

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TWI620383B
TWI620383B TW105132780A TW105132780A TWI620383B TW I620383 B TWI620383 B TW I620383B TW 105132780 A TW105132780 A TW 105132780A TW 105132780 A TW105132780 A TW 105132780A TW I620383 B TWI620383 B TW I620383B
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gain medium
heat
stress
gain
mode
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TW105132780A
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TW201814987A (en
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Cheng Lin Sung
Hao Ping Cheng
Cheng Yeh Lee
Chun Yu Cho
Hsing Chih Liang
Kuan Wei Su
Yung Fu Chen
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Yung Fu Chen
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Abstract

本發明闡述一種雙偏振鎖模雷射系統,包括一激發光源,產生一激發光;一鎖模共振腔,相鄰於該激發光源,且該共振腔內設置一增益介質並具有一光軸,從而使該激發光進入該增益介質,並產生一自鎖模雷射的輸出;以及一應力施加裝置,設置於該共振腔內且相鄰於該增益介質,並對該增益介質施予一熱或應力,俾使該增益介質產生雙折射現象,以產生一具有雙正交偏振的雷射輸出。 The present invention provides a dual-polarization mode-locked laser system comprising an excitation light source for generating an excitation light; a mode-locking cavity adjacent to the excitation light source, and a gain medium disposed in the cavity and having an optical axis, Thereby causing the excitation light to enter the gain medium and generating an output of a self-mode-locked laser; and a stress applying device disposed in the resonant cavity adjacent to the gain medium and applying a heat to the gain medium Or stress, causing the gain medium to produce a birefringence phenomenon to produce a laser output having a bi-orthogonal polarization.

Description

雙偏振鎖模雷射系統及其增益模組及其控制方法 Dual polarization mode-locked laser system, gain module thereof and control method thereof

本案係關於雷射,尤指一種雙偏振鎖模雷射。 This case relates to lasers, especially a dual polarization mode-locked laser.

請參閱圖1,為習用的雙偏振雷射示意圖。其中揭示一共振腔1,一端具有一全反射鏡10、而另一端具有一與該全反射鏡10相對的部分反射輸出鏡13。而全反射鏡10與部分反射輸出鏡13之間形成一光軸A,當雷射光增益至所需的能量後,部分反射輸出鏡13讓雷射光自共振腔1射出。為了達到雙偏振的效果,習用技術如圖1者通常是以兩個串連的增益介質來達到效果,即第一增益介質11與第二增益介質12,兩者的偏振方向垂直。而如果需要此雙偏振係以鎖模的型態輸出,則更需要嚴謹的控制第一增益介質11、第二增益介質12的尺寸、材料種類、擺設位置、激發光源、共振腔尺寸的選擇等等眾多變數。且通常第一、二增益介質的雷射模態是不同的,因此當需要鎖模效果時,共振腔內的兩面反射鏡的之間的距離就必需是各自的半波長的最小公倍數,進而導致共振腔體積龐大,成本亦高。圖1所產生的鎖模雷射輸出為使用自鎖模 (self-mode-locked)的方式達成,另外也可使用主被動式的元件,如半導體飽和吸收體來達成,但其架構則更為複雜。因此,基於上述的各種不便利的情形,實際上非常需要一種可以將共振腔內的各元件的控制予以簡化的雙偏振鎖模雷射、其所使用的增益模組、雙偏振控制裝置、及其控制方法,以盡其所能的將共振腔內的變因減少到最低,或將共振腔內元件的控制方法予以簡化。 Please refer to FIG. 1 , which is a schematic diagram of a conventional dual polarization laser. There is disclosed a resonant cavity 1 having a total reflection mirror 10 at one end and a partial reflection output mirror 13 opposite the total reflection mirror 10 at the other end. An optical axis A is formed between the total reflection mirror 10 and the partial reflection output mirror 13, and after the laser light gains to the required energy, the partial reflection output mirror 13 causes the laser light to be emitted from the resonance cavity 1. In order to achieve the effect of dual polarization, the conventional technique is generally achieved by two series of gain media, that is, the first gain medium 11 and the second gain medium 12, the polarization directions of which are perpendicular. If the dual polarization system is required to be outputted in a mode-locked mode, it is more necessary to strictly control the size of the first gain medium 11, the second gain medium 12, the material type, the placement position, the excitation light source, the size of the resonant cavity, and the like. Many variables are waiting. And usually the laser modes of the first and second gain media are different, so when the clamping effect is required, the distance between the two-sided mirrors in the resonant cavity must be the least common multiple of the respective half wavelengths, which leads to The resonant cavity is bulky and costly. The mode-locked laser output produced in Figure 1 is self-mode-locked. The (self-mode-locked) approach is achieved, and active-passive components, such as semiconductor saturable absorbers, can be used, but the architecture is more complex. Therefore, based on the above various inconvenient situations, there is a great need for a dual polarization mode-locked laser that can simplify the control of each component in the resonant cavity, a gain module used therein, a dual polarization control device, and The control method is to minimize the variation in the resonant cavity as much as possible, or to simplify the control method of the components in the resonant cavity.

爰是之故,申請人有鑑於習知技術之缺失,發明出本案「雙偏振鎖模雷射系統及其增益模組及其控制方法」,用以改善上述習用手段之缺失。 For this reason, the applicant invented the "dual polarization mode-locked laser system and its gain module and its control method" in view of the lack of the prior art to improve the lack of the above-mentioned conventional means.

本發明之目的是為了創造一種嶄新的雙偏振鎖模雷射的裝置、系統、產生之方法、以及應用於其中的增益模組,透過本發明可以僅僅使用一個增益介質就可以產出具有雙偏振特性的鎖模雷射,無須因為使用超過一個的增益介質而使得對增益介質的控制如增益介質的尺寸、材料種類、擺設位置、激發光源、共振腔尺寸的選擇等等變得複雜,意即使用本發明可以很容易的就得到雙偏振鎖模雷射的輸出,降低了雙偏振鎖模雷射的成本,並進而促進了雙偏振鎖模雷射的應用。 The object of the present invention is to create a new dual-polarization mode-locked laser device, system, method of generating the same, and a gain module applied thereto, by which the dual polarization can be produced using only one gain medium. The characteristic mode-locked laser does not need to be complicated by the use of more than one gain medium, such as the size of the gain medium, the type of material, the position of the excitation, the selection of the excitation source, the size of the cavity, etc., The use of the present invention makes it easy to obtain the output of a dual polarization mode-locked laser, reducing the cost of dual-polarization mode-locked lasers and, in turn, promoting the application of dual-polarization mode-locked lasers.

為了達到上述之目的,本創作提供一種雙偏振鎖模雷射系統,包括:一激發光源,可以但不限定為一雷 射二極體模組,產生一激發光;一可產生自鎖模雷射之輸出的共振腔,相鄰於該激發光源模組,且該共振腔內設置一增益介質並具有一光軸,從而使激發光進入該增益介質;以及一熱或應力施加裝置,設置於該共振腔內且相鄰於該增益介質,並對該增益介質施予一熱或應力,俾使該增益介質產生雙折射現象,以產生一具有雙正交偏振的雷射輸出。 In order to achieve the above object, the present invention provides a dual polarization mode-locked laser system comprising: an excitation light source, which may be, but is not limited to, a mine The diode module generates an excitation light; a resonant cavity that can generate an output of the self-mode-locked laser is adjacent to the excitation light source module, and a gain medium is disposed in the resonant cavity and has an optical axis. Thereby causing excitation light to enter the gain medium; and a heat or stress applying device disposed in the resonant cavity adjacent to the gain medium and applying a heat or stress to the gain medium to cause the gain medium to generate double The phenomenon of refraction to produce a laser output with bi-orthogonal polarization.

為了達到上述之目的,本創作又提供一種用於一雙偏振鎖模雷射裝置的增益模組,包括:一增益介質,具有一光軸;以及一熱或應力施加裝置,相鄰於該增益介質,並對該增益介質施予一熱或應力,俾使該增益介質產生雙折射現象。 In order to achieve the above object, the present invention further provides a gain module for a dual polarization mode-locked laser device, comprising: a gain medium having an optical axis; and a heat or stress applying device adjacent to the gain The medium is applied with a heat or stress to the gain medium to cause birefringence.

為了達到上述之目的,本創作再提供一種用於一雷射增益模組的雙偏振控制裝置,包括:一增益介質;一定位裝置,用以定位該增益介質於該雷射增益模組內;以及一熱或應力施加裝置,對該增益介質施予一特定熱或應力,俾當一光經該增益介質後產生一特定雙折射現象。 In order to achieve the above object, the present invention further provides a dual polarization control device for a laser gain module, comprising: a gain medium; and a positioning device for positioning the gain medium in the laser gain module; And a heat or stress applying device for applying a specific heat or stress to the gain medium to generate a specific birefringence phenomenon after passing through the gain medium.

為了達到上述之目的,本創作又再提供一種用於控制一雙偏振雷射增益模組的方法,包括:提供一增益介質;定位該增益介質於該雷射增益模組內;以及對該增益介質施予一特定熱或應力,俾當一光經該增益介質後產生一特定雙折射現象。 In order to achieve the above object, the present invention further provides a method for controlling a dual polarized laser gain module, comprising: providing a gain medium; positioning the gain medium in the laser gain module; and the gain The medium imparts a specific heat or stress that produces a specific birefringence phenomenon as soon as a light passes through the gain medium.

1‧‧‧共振腔 1‧‧‧Resonance cavity

10‧‧‧全反射鏡 10‧‧‧ total reflection mirror

11‧‧‧第一增益介質 11‧‧‧First gain medium

12‧‧‧第二增益介質 12‧‧‧second gain medium

13‧‧‧部分反射輸出鏡 13‧‧‧Partial reflection output mirror

2‧‧‧雙折射晶體 2‧‧‧Birefringent crystal

3‧‧‧增益介質 3‧‧‧gain medium

4‧‧‧熱施加裝置 4‧‧‧Thermal application device

5‧‧‧機械應力施加裝置、施力機構 5‧‧‧Mechanical stress applying device, force applying mechanism

50‧‧‧固定部 50‧‧‧ Fixed Department

50a‧‧‧第一固定部 50a‧‧‧First fixed department

50b‧‧‧第二固定部 50b‧‧‧Second fixed department

51‧‧‧施力部 51‧‧‧ Force Department

51a‧‧‧第一施力部 51a‧‧‧First Force Department

51b‧‧‧第二施力部 51b‧‧‧Second Force Department

6‧‧‧激發光源 6‧‧‧Excitation source

7‧‧‧耦合透鏡 7‧‧‧Coupling lens

8‧‧‧主分光鏡 8‧‧‧Main beam splitter

9‧‧‧偏極分光鏡 9‧‧‧polar polarizer

91‧‧‧第一示波器 91‧‧‧First oscilloscope

92‧‧‧第二示波器 92‧‧‧Second oscilloscope

A‧‧‧光軸 A‧‧‧ optical axis

L‧‧‧光線 L‧‧‧Light

PM‧‧‧功率計 PM‧‧‧Power Meter

no‧‧‧尋常光 n o ‧‧‧ ordinary light

ne‧‧‧非尋常光 n e ‧‧‧ unusual light

圖1,為習用的雙偏振鎖模雷射示意圖;圖2,為雙折射原理示意圖;圖3,為作為增益介質之用的雙偏振晶體示意圖;圖4,為本發明的實施例示意圖;圖5,為本發明另一實施例示意圖;圖6,為本發明的系統示意圖;圖7,為本發明的機械應力施加的實施例示意圖;圖8,為本發明的機械應力施加裝置的另一實施例示意圖;圖9,為本發明的激發功率與差頻之間的關係圖;圖10,為本發明的機械應力與差頻之間的關係圖;圖11,為本發明的熱與差頻之間的關係圖;以及圖12(A)與圖12(B),為本發明的二偏振光的重覆率差異示意圖。 1 is a schematic diagram of a conventional dual polarization mode-locked laser; FIG. 2 is a schematic diagram of a birefringence principle; FIG. 3 is a schematic diagram of a dual polarization crystal used as a gain medium; FIG. 4 is a schematic view of an embodiment of the present invention; 5 is a schematic view of another embodiment of the present invention; FIG. 6 is a schematic view of a system according to the present invention; FIG. 7 is a schematic view of an embodiment of mechanical stress application of the present invention; and FIG. 8 is another embodiment of the mechanical stress applying device of the present invention. FIG. 9 is a diagram showing relationship between excitation power and difference frequency according to the present invention; FIG. 10 is a diagram showing relationship between mechanical stress and difference frequency according to the present invention; FIG. 11 is a diagram showing heat and difference of the present invention; A relationship diagram between frequencies; and FIG. 12(A) and FIG. 12(B) are schematic diagrams showing a difference in repetition rate of dipolarized light of the present invention.

以下針對本案之「雙偏振鎖模雷射系統及其增益模組及其控制方法」的各實施例進行描述,請參考附圖,但實際之配置及所採行的方法並不必須完全符合所描述的內容,熟習本技藝者當能在不脫離本案之實際精神及範圍的情況下,做出種種變化及修改。 The following describes the embodiments of the "dual polarization mode-locked laser system and its gain module and its control method" in the present case. Please refer to the drawings, but the actual configuration and the method adopted do not have to be completely consistent with the method. In the description, those skilled in the art can make various changes and modifications without departing from the actual spirit and scope of the present invention.

請參閱圖2,為雙折射原理示意圖。其中揭示一雙折射晶體2,當其左方有一隨機偏振的光線L以非垂直的角度射入晶體2時,原本重合的兩個偏振方向的光(一個是左右偏振、另一個是上下偏振)就會因兩個偏振方向的折射率不同而分開,如在晶體2的右邊所示,左右偏振的光線依原來的路徑離開晶體2,所以稱為尋常光no,而上下偏振的光線則以略偏下的路徑離開晶體2,故稱為非尋常光ne。至此,對雙折射、雙偏振的效應即有一初步的理解。 Please refer to Figure 2 for a schematic diagram of the birefringence principle. It discloses a birefringent crystal 2, when a light L having a random polarization on the left side is incident on the crystal 2 at a non-perpendicular angle, the two polarization directions of light originally coincident (one is left and right polarization, and the other is up and down polarization). It will be separated by the different refractive indices of the two polarization directions. As shown on the right side of the crystal 2, the left and right polarized rays leave the crystal 2 according to the original path, so it is called ordinary light n o , and the upper and lower polarized rays are The slightly lower path leaves the crystal 2, so it is called the extraordinary light n e . At this point, there is a preliminary understanding of the effects of birefringence and dual polarization.

請參閱圖3,為作為增益介質之用的雙偏振晶體示意圖。其中穿過雙偏振增益介質3的光線若以a軸輸出,由於對應到a軸(a-cut)的截面為b軸與c軸,而此二軸為不等向,故輸出的光會有偏振的現象。若沿a軸輸出即會有某一方向的偏振特別強;但若沿c軸(c-cut)輸出則是隨機偏振。因此,當使用等向性(isotropic)晶體或使用c-cut的雙偏振介質3作為增益介質時,輸出的雷射光就不會有偏振而是以隨機偏振的方式呈現。 Please refer to FIG. 3, which is a schematic diagram of a dual polarization crystal used as a gain medium. The light passing through the dual-polarization gain medium 3 is outputted on the a-axis. Since the cross-section corresponding to the a-cut is the b-axis and the c-axis, and the two axes are unequal, the output light will be The phenomenon of polarization. If the output along the a-axis is, the polarization in a certain direction is particularly strong; but if it is output along the c-axis (c-cut), it is a random polarization. Therefore, when an isotropic crystal or a double polarizing medium 3 using c-cut is used as the gain medium, the output laser light is not polarized but is presented in a random polarization manner.

請參閱圖4與圖5。其中,圖4,為本發明的實施例示意圖;而圖5,為本發明另一實施例示意圖。由於機 械應力或熱應力可以讓等向性晶體或c-cut方向晶體從原本的隨機偏振被改變而產生雙折射、雙偏振的現象,意即產生兩個正交偏振的輸出,即如同圖2所示的輸出。圖4與圖5均揭示了一增益模組,包括一共振腔1,其一端設置一前反射鏡10,相對的另一端則設置一部份反射輸出鏡13,兩者之間設有一增益介質3,而雷射光即在增益介質3中逐漸增強其功率直到需要的數值而自部份反射輸出鏡13射出。但與如圖1所示的習用技術不同的是,本發明更具有一熱或應力施加裝置,於圖4中是一熱施加裝置4;而於圖5中則是一機械應力施加裝置5。以圖4而言,由於增益介質3在操作時會產生熱,因此需要冷卻,故而本發明的熱施加裝置4亦以冷卻裝置為主要之應用例,在增益介質3以一冷卻殼體(圖中未揭示)包覆,並使用如鼓風機以送風的方式來達到氣冷的效果。當然,亦可使用液冷的方式達到冷卻效果,如在增益介質3以一冷卻殼體(圖中未揭示)包覆、亦或是將增益介質3放入一冷卻池(圖中未揭示)中,均可達到液態冷卻的效果。而冷卻溫度與雙偏振、雙折射之間的差頻關係請參考圖11,為本發明的熱與差頻之間的關係圖,其中可見透過溫度控制,等向性晶體的雙折射、雙偏振現象是可受控制的。例如在某些實施例中,如圖11,冷卻溫度愈低,差頻愈高,而在大約攝氏27.5度左右時幾乎沒有差頻現象產生。而在攝氏22.5度與35度之間則幾乎具有相同的差頻。因此可以透過溫度的增減以達到使用者所欲得到的差頻數值。然而熱與差頻之間的關係為正相關或負相關仍要看增 益介質的特性,非僅有圖11所示者。 Please refer to Figure 4 and Figure 5. 4 is a schematic view of an embodiment of the present invention; and FIG. 5 is a schematic view of another embodiment of the present invention. Due to machine Mechanical stress or thermal stress can cause the isotropic crystal or c-cut direction crystal to be changed from the original random polarization to produce birefringence and double polarization, which means that two orthogonally polarized outputs are produced, as shown in Figure 2. The output shown. 4 and FIG. 5 respectively disclose a gain module including a resonant cavity 1 having a front mirror 10 at one end and a partial reflection output mirror 13 at the opposite end with a gain medium therebetween. 3, and the laser light is gradually increased in the gain medium 3 until the required value is emitted from the partial reflection output mirror 13. However, unlike the conventional technique shown in Fig. 1, the present invention has a heat or stress applying device, which is a heat applying device 4 in Fig. 4; and a mechanical stress applying device 5 in Fig. 5. 4, since the gain medium 3 generates heat during operation, cooling is required. Therefore, the heat application device 4 of the present invention also uses a cooling device as a main application example, and the gain medium 3 is cooled by a housing (Fig. It is not disclosed in the coating, and the effect of air cooling is achieved by using a blower such as a blower. Of course, the cooling effect can also be achieved by using liquid cooling, such as coating the gain medium 3 with a cooling casing (not shown), or placing the gain medium 3 in a cooling pool (not shown). In both, the effect of liquid cooling can be achieved. For the difference frequency relationship between the cooling temperature and the dual polarization and birefringence, please refer to FIG. 11 , which is a relationship diagram between the heat and the difference frequency of the present invention, wherein the transmission temperature control, the birefringence of the isotropic crystal, and the double polarization are seen. The phenomenon is controllable. For example, in some embodiments, as shown in Figure 11, the lower the cooling temperature, the higher the difference frequency, and there is almost no difference frequency phenomenon occurring at about 27.5 degrees Celsius. And between 22.5 degrees Celsius and 35 degrees, there is almost the same difference frequency. Therefore, it is possible to increase or decrease the temperature to achieve the difference frequency value desired by the user. However, the relationship between heat and difference frequency is positive or negative. The characteristics of the medium are not only those shown in Figure 11.

請參閱圖5,為本發明另一實施例示意圖。其中揭示的應力施加裝置是一機械應力施加裝置,其包括一固定部50、一施力部51、以及一施力機構5,固定部50與施力部51之間呈面對面的設置,而中間即置放該增益介質3,固定部50通常是一座體,其上即安置增益介質3。施力機構5係提供一推力用以推擠施力部51朝向固定部50移動,亦可說是以朝向固定部50的方向對施力部51施予壓力,而施力部51即向增益介質3施予壓力。因此增益介質3即產生雙偏振、雙折射的功能,並進而輸出雙偏振的雷射光。而應力之施予與雙偏振、雙折射之間的差頻關係請參考圖10,為本發明的機械應力與差頻之間的關係圖。其中可見若以旋轉施力的方式如以螺桿將旋轉運動變為直線運動施力,則施力即以扭力為計算單位,可見扭力愈高、差頻愈高,因此由圖10可見透過施力的控制,等向性晶體的雙折射、雙偏振現象是可受控制的。透過扭力的增減以達到使用者所欲得到的差頻數值。此外,在圖5或圖4的實施例中,更可增加一主被動式鎖模元件以協助產生自鎖模雷射,或是直接以主被動式鎖模元件代替共振腔而輸出一自鎖模雷射。 Please refer to FIG. 5, which is a schematic diagram of another embodiment of the present invention. The stress applying device disclosed therein is a mechanical stress applying device, which comprises a fixing portion 50, a urging portion 51, and a urging mechanism 5, and the fixing portion 50 and the urging portion 51 are disposed face to face, and the middle portion That is, the gain medium 3 is placed, and the fixing portion 50 is usually a body on which the gain medium 3 is placed. The urging mechanism 5 provides a thrust for pushing the urging portion 51 to move toward the fixing portion 50. It can be said that the urging portion 51 is biased in a direction toward the fixing portion 50, and the urging portion 51 is biased. The medium 3 is subjected to pressure. Therefore, the gain medium 3 generates a function of dual polarization and birefringence, and further outputs double-polarized laser light. Please refer to FIG. 10 for the difference frequency relationship between the application of stress and the dual polarization and birefringence, which is a relationship between the mechanical stress and the difference frequency of the present invention. It can be seen that if the rotary motion is changed into a linear motion by a screw, the force is calculated by the torque, and the higher the torque and the higher the frequency difference, the visible force is shown in FIG. The control, the birefringence of the isotropic crystal, and the double polarization phenomenon are controllable. Through the increase or decrease of the torque to achieve the difference frequency value that the user wants. In addition, in the embodiment of FIG. 5 or FIG. 4, an active-passive mode-locking component may be added to assist in generating a self-mode-locking laser, or a self-locking mode ray may be directly outputted by replacing the resonant cavity with the active-passive mode-locking component. Shoot.

請參閱圖6,為本發明的系統示意圖。其中除了包括共振腔1及其內的增益介質3之外,還包括一激發光源6,可以但不限定為一二極體雷射產生器作為功率來源,其激發光源6發出的激發光可以但不限定經過耦合透鏡7增益介質3中。增益介質3產生增益後於共振腔1內產生雷射, 形成一光軸A(請參考圖1),並透過部分反射輸出耦合鏡13輸出。雷射光經過一主分光鏡8的其中一部分被一功率計PM接收以計算輸出之功率值,另一部份的雷射光則再經過偏極分光鏡9將由增益介質3所產生的具有雙偏振的雷射光依各自的偏極方向予以分離,其中一偏振方向的雷射光射到一第一示波器91,而另一偏振方向的雷射光則射到一第二示波器92,此二示波器通常以光敏元件為主要的感測元件。關於此二偏振光的重覆率的差異,請參考圖12(A)與圖12(B),為本發明的二偏振光的重覆率差異示意圖。圖12(A)為偏振四十五度、而圖12(B)為偏振一三五度,兩圖所揭示的重覆率解析度均為100ns/div,而二圖中的波峰間距皆為3MHz。其中可見兩個正交的偏振光在同一橫座標的位置上時(即同一時點),波峰的位置不同,也就是產生了差頻(beat frequency,又稱拍頻)的現象。由此可見本發明的特色在於,由於採用的共振腔具鎖模效果,且此二偏振的雷射光又來自同一增益介質3,因此除了重覆率略有不同之外,其它的特性幾乎完全相同,所以利用本發明可以十分簡單、輕鬆、快速且成本低廉的產生雙偏振雷射之輸出,可適用於非常多的場合。增益介質3可以採用摻釹釔鋁石榴石(Nd:YAG)。 Please refer to FIG. 6, which is a schematic diagram of the system of the present invention. In addition to the resonant cavity 1 and the gain medium 3 therein, an excitation light source 6 is included, which may be, but is not limited to, a diode laser generator as a power source, and the excitation light emitted by the excitation light source 6 may be It is not limited to pass through the coupling lens 7 in the gain medium 3. After the gain medium 3 generates a gain, a laser is generated in the resonant cavity 1, An optical axis A (refer to FIG. 1) is formed and output through the partially reflective output coupling mirror 13. The laser light is received by a power meter PM through a portion of a main beam splitter 8 to calculate the output power value, and the other portion of the laser light is passed through the polarizing beam splitter 9 to have a dual polarization generated by the gain medium 3. The laser light is separated according to the respective polarization directions, wherein the laser light of one polarization direction is incident on a first oscilloscope 91, and the laser light of the other polarization direction is incident on a second oscilloscope 92, which is usually a photosensitive element. As the main sensing element. Regarding the difference in the repetition rate of the two polarized lights, please refer to FIG. 12(A) and FIG. 12(B), which are schematic diagrams showing the difference in the repetition rate of the dipolarized light of the present invention. Fig. 12(A) shows polarization of forty-five degrees, and Fig. 12(B) shows polarization of one to five degrees. Both of the resolutions shown in the two figures are 100 ns/div, and the peak spacing in both figures is 3MHz. It can be seen that when two orthogonal polarized lights are at the same abscissa position (ie, at the same time point), the positions of the peaks are different, that is, a phenomenon of a beat frequency (also called a beat frequency) is generated. It can be seen that the present invention is characterized in that, since the resonant cavity used has a clamping effect, and the polarized light of the two polarizations comes from the same gain medium 3, the other characteristics are almost identical except that the repetition rate is slightly different. Therefore, the invention can be used to produce a dual-polarized laser output which is very simple, easy, fast and cost-effective, and can be applied to a large number of occasions. The gain medium 3 may be yttrium aluminum garnet (Nd: YAG).

請參閱圖7與圖8,其中,圖7,為本發明的機械應力施加的實施例示意圖;而圖8,為本發明的機械應力施加裝置的另一實施例示意圖。當增益介質3透過一定位裝置(圖中未揭示)固定於共振腔(請參考圖6)內之後,則使用 一應力施加裝置(圖7的50a、51a;圖8的50b、51b)對增益介質3盡可能的均勻的施予機械應力。在圖7中,應力施加裝置為一第一固定部50a與一第一施力部51a共同作用,兩者大致上呈一正一反的L型的元件以各自的凹處將增益介質3夾於其中,而施力機構5(請參考圖5)則以水平方向調整對第一施力部51a施力,使第一施力部51a向增益介質3以推擠的方式施力於其上,施力機構可以適當的增減推擠力道。在圖8中,應力施加裝置為一第二固定部50b與一第二施力部51b共同作用,兩者均具有一V型凹處將增益介質3夾於其中,而施力機構5(請參考圖5)則以垂直的方向調整對第二施力部51b施力,使第二施力部51b向增益介質3以推擠的方式施力於其上,施力機構可以適當的增減推擠力道。此外,在圖7中,第一施力部51a的施力是平行於增益介質3的上下兩邊,而在圖8中,第二施力部51b的施力則是平行於增益介質3的對角線方向,因此兩者分別產生的雙偏振的偏振角度也有不同,但圖7或圖8各自的雙偏振之偏振夾角均為正交。此外,圖7、圖8的繪製平面正好是正對著增益介質3的c軸(請配合圖3),而圖5則可以說是正對著a軸或b軸繪製,由此可見,當以機械應力對增益介質3施力時,施力方向與光軸A成一夾角,通常是九十度。此外,圖7或圖8的應力施加裝置亦可直接作為夾具來固定增益介質3,然而這將造成之後在調整應力與雙偏振的匹配關係時造成困擾,意即之後的應力調整可能使得夾持力過大或過小,過大將損壞增益介質,過小則增益介質可能晃動而使輸出不穩定。 因此,本發明建議將用以定位增益介質的裝置與用以施加應力的裝置分開,以利雙偏振雷射的良好輸出效果。 Please refer to FIG. 7 and FIG. 8. FIG. 7 is a schematic view showing an embodiment of mechanical stress application according to the present invention; and FIG. 8 is a schematic view showing another embodiment of the mechanical stress applying device of the present invention. When the gain medium 3 is fixed in the resonant cavity (refer to FIG. 6) through a positioning device (not shown), it is used. A stress applying device (50a, 51a of Fig. 7; 50b, 51b of Fig. 8) applies mechanical stress to the gain medium 3 as uniformly as possible. In FIG. 7, the stress applying device is a first fixing portion 50a that cooperates with a first urging portion 51a, and the two L-shaped members that are substantially positive and negative with the respective recesses sandwich the gain medium 3 In the middle, the urging mechanism 5 (please refer to FIG. 5) biases the first urging portion 51a in the horizontal direction, and urges the first urging portion 51a to the gain medium 3 by pushing it. The force-applying mechanism can appropriately increase or decrease the pushing force. In FIG. 8, the stress applying device is a second fixing portion 50b and a second urging portion 51b, both of which have a V-shaped recess to sandwich the gain medium 3, and the urging mechanism 5 (please Referring to FIG. 5), the second urging portion 51b is biased in a vertical direction, and the second urging portion 51b is biased to the gain medium 3 by pushing, and the urging mechanism can be appropriately increased or decreased. Push the power. Further, in FIG. 7, the biasing force of the first urging portion 51a is parallel to the upper and lower sides of the gain medium 3, and in FIG. 8, the urging force of the second urging portion 51b is parallel to the pair of the gain medium 3. In the angular direction, the polarization angles of the dual polarizations generated by the two are also different, but the polarization angles of the dual polarizations of FIG. 7 or FIG. 8 are all orthogonal. In addition, the drawing planes of Figs. 7 and 8 are exactly opposite to the c-axis of the gain medium 3 (please refer to Fig. 3), and Fig. 5 can be said to be drawn directly opposite the a-axis or the b-axis, thereby showing that when mechanically When the stress is applied to the gain medium 3, the direction of the force applied is at an angle to the optical axis A, which is usually ninety degrees. In addition, the stress applying device of FIG. 7 or FIG. 8 can also directly fix the gain medium 3 as a jig, however, this will cause troubles in the subsequent adjustment of the matching relationship between the stress and the dual polarization, that is, the subsequent stress adjustment may cause the clamping. If the force is too large or too small, too much will damage the gain medium. If it is too small, the gain medium may shake and the output will be unstable. Accordingly, the present invention suggests separating the means for positioning the gain medium from the means for applying stress to facilitate a good output of the dual polarized laser.

請參閱圖9,為本發明的激發功率與差頻之間的關係圖。其中可見當激發功率愈高時,輸出的偏振光的重覆率愈高。且各圓圈所代表的實驗結果亦顯示輸入與輸出之功率對應關係與線性迴歸者幾乎相同,故激發功率與輸出的雙偏振重覆率是線性正相關。 Please refer to FIG. 9 , which is a diagram showing the relationship between the excitation power and the difference frequency according to the present invention. It can be seen that the higher the excitation power, the higher the repetition rate of the output polarized light. The experimental results represented by the circles also show that the power dependence of the input and output is almost the same as that of the linear regression, so the excitation power and the output dual polarization repetition rate are linear positive correlation.

請參閱圖10,為本發明的機械應力與差頻之間的關係圖。其中機械應力透過扭力實施,可見當扭力提高時,差頻也隨之上升。 Please refer to FIG. 10, which is a diagram showing the relationship between mechanical stress and difference frequency of the present invention. The mechanical stress is transmitted through the torsion force. It can be seen that when the torque is increased, the difference frequency also increases.

請參閱圖11,為本發明的熱與差頻之間的關係圖。其中溫度可以但不限定透過冷卻實施,當冷卻改變時,差頻則隨改變。至於熱與差頻之間的關係為正相關或負相關則要看增益介質的特性,非僅有圖11所示者。 Please refer to FIG. 11 , which is a diagram showing the relationship between heat and difference frequency of the present invention. The temperature can be, but is not limited to, effected by cooling, and as the cooling changes, the difference frequency changes. As for the relationship between the heat and the difference frequency is positive correlation or negative correlation, it depends on the characteristics of the gain medium, which is not only shown in FIG.

綜上所述,本發明的「雙偏振鎖模雷射裝置及其增益模組及其控制方法」,基本上就是對一鎖模雷射的增益介質施予一外力,使其產生雙偏振的雷射輸出。此外力,通常以機械應力或熱應力為主,當然看情形亦可兩者同時實施,如此即可非常簡單的就達到輸出雙偏振鎖模雷射的效果,當然即可取代如圖1所示的習用技術。因此透過本發明的裝置,雙偏振雷射的鎖模可以輕易的完成,無須過於精細的結構與組裝,體積也比習用技術小,整體成本也下降許多,因此本發明對於雷射的應用與普及,具有莫大的 貢獻。 In summary, the "dual polarization mode-locked laser device and the gain module thereof and the control method thereof" of the present invention basically apply an external force to a gain medium of a mode-locked laser to generate a dual polarization. Laser output. In addition, the force is usually based on mechanical stress or thermal stress. Of course, the situation can be implemented at the same time, so that the effect of outputting the dual-polarized mode-locked laser can be achieved very simply, and of course, it can be replaced as shown in FIG. Conventional technology. Therefore, through the device of the invention, the mode locking of the double-polarized laser can be easily completed, the structure and assembly are not too fine, the volume is smaller than the conventional technology, and the overall cost is also reduced, so the application and popularization of the laser for the present invention. With great contribution.

實施例: Example:

1.一種雙偏振鎖模雷射系統,包括:一激發光源,產生一激發光;一自鎖模共振腔,相鄰於該激發光源,且該共振腔內設置一增益介質並具有一光軸,從而使該激發光進入該增益介質,並產生一自鎖模雷射的輸出;以及一熱或應力施加裝置,設置於該共振腔內且相鄰於該增益介質,並對該增益介質施予一熱或應力,俾使該增益介質產生雙折射現象,以產生一具有雙正交偏振的雷射輸出。 A dual polarization mode-locked laser system comprising: an excitation light source to generate an excitation light; a self-mode-locking cavity adjacent to the excitation light source, wherein a gain medium is disposed in the resonant cavity and has an optical axis So that the excitation light enters the gain medium and produces an output of a self-mode-locked laser; and a heat or stress applying device disposed in the resonant cavity adjacent to the gain medium and applying the gain medium A heat or stress is applied to cause the gain medium to produce a birefringence phenomenon to produce a laser output having a bi-orthogonal polarization.

2.如實施例1所述的系統,其中該應力施加裝置是一用以夾持該增益介質的夾具。 2. The system of embodiment 1 wherein the stress applying means is a clamp for holding the gain medium.

3.如實施例1所述的系統,更包括一感測模組,該感測模組還包括:一偏極分光鏡(polarization beam splitter),將該雷射輸出依據偏振方向之不同而分為一第一偏振光與一第二偏振光;一第一光敏元件,用以感測該第一偏振光;以及一第二光敏元件,用以感側該第二偏振光。 3. The system of embodiment 1, further comprising a sensing module, the sensing module further comprising: a polarization beam splitter, the laser output is divided according to a polarization direction a first polarized light and a second polarized light; a first photosensitive element for sensing the first polarized light; and a second photosensitive element for sensing the second polarized light.

4.如實施例1所述的系統,其中該自鎖模雷射的輸出亦可以利用主被動式鎖模元件加入或替代該共振腔。 4. The system of embodiment 1, wherein the output of the self-mode-locked laser can also incorporate or replace the resonant cavity with a master-passive mode-locking component.

5.一種用於一雙偏振鎖模雷射裝置的增益模組,包括:一增益介質,具有一光軸;以及一熱或應力施加裝置,相鄰於該增益介質,並對該增益介質施予一熱或 應力,俾使該增益介質產生雙折射現象。 5. A gain module for a dual polarization mode-locked laser device, comprising: a gain medium having an optical axis; and a heat or stress applying device adjacent to the gain medium and applying the gain medium Give a hot or Stress, 俾 causes the gain medium to produce birefringence.

6.如實施例5所述的增益模組,其中當該熱或應力施加裝置是施加熱時,該熱或應力施加裝置是一加熱/冷卻器。 6. The gain module of embodiment 5 wherein the heat or stress applying means is a heater/cooler when the heat or stress applying means is applying heat.

7.如實施例5所述的增益模組,其中當該應力施加裝置是施加機械應力時,該應力施加裝置是一夾持該增益介質的夾具,且該夾具的施力方向與該光軸之間形成一大於零度的夾角。 7. The gain module of embodiment 5, wherein when the stress applying device applies mechanical stress, the stress applying device is a clamp that clamps the gain medium, and a direction of application of the clamp and the optical axis An angle greater than zero degrees is formed between them.

8.如實施例5所述的增益模組,其中該增益介質是摻釹釔鋁石榴石(Nd:YAG)。 8. The gain module of embodiment 5 wherein the gain medium is yttrium aluminum garnet (Nd:YAG).

9.一種用於一雷射增益模組的雙偏振控制裝置,包括:一增益介質;一定位裝置,用以定位該增益介質於該雷射增益模組內;以及一應力施加裝置,對該增益介質施予一特定應力,俾當一光經該增益介質後產生一特定雙折射現象。 9. A dual polarization control apparatus for a laser gain module, comprising: a gain medium; a positioning device for positioning the gain medium in the laser gain module; and a stress applying device The gain medium is applied with a specific stress that produces a specific birefringence phenomenon as soon as a light passes through the gain medium.

10.一種用於控制一雙偏振雷射增益模組的方法,包括:提供一增益介質;定位該增益介質於該雷射增益模組內;以及對該增益介質施予一特定應力,俾當一光經該增益介質後產生一特定雙折射現象。 10. A method for controlling a dual polarized laser gain module, comprising: providing a gain medium; positioning the gain medium in the laser gain module; and applying a specific stress to the gain medium, A specific birefringence phenomenon occurs after a light passes through the gain medium.

11.如實施例1、5、9、或10所述的發明,其中該增益介質的晶體排列於垂直於該光軸的平面上具有等向性。 11. The invention of embodiment 1, 5, 9, or 10 wherein the crystal of the gain medium is arranged to be isotropic in a plane perpendicular to the optical axis.

上述實施例僅係為了方便說明而舉例,雖遭熟悉本技藝之人士任施匠思而為諸般修飾,然皆不脫如附申 請專利範圍所欲保護者。 The above embodiments are merely exemplified for convenience of explanation, and those who are familiar with the art are arbitrarily modified to do so, but they are not excluded. Please protect the scope of the patent.

Claims (6)

一種雙偏振鎖模雷射系統,包括:一激發光源,產生一激發光;一自鎖模共振腔,相鄰於該激發光源,且該共振腔內設置一增益介質並具有一光軸,從而使該激發光進入該增益介質,並產生一自鎖模雷射的輸出,其中該自鎖模雷射的輸出亦可以利用主被動式鎖模元件加入或替代該自鎖模共振腔;以及一應力施加裝置,設置於該共振腔內且相鄰於該增益介質,並對該增益介質施予一應力,俾使該增益介質產生雙折射現象,以產生一具有雙正交偏振的雷射輸出。 A dual polarization mode-locked laser system comprising: an excitation light source to generate an excitation light; a self-mode-locking resonant cavity adjacent to the excitation light source, wherein a resonant medium is disposed in the resonant cavity and has an optical axis, thereby Passing the excitation light into the gain medium and generating an output of a self-mode-locked laser, wherein the output of the self-mode-locked laser can also be added to or replaced by the active-passive mode-locking component; and a stress An application device is disposed in the resonant cavity adjacent to the gain medium and applies a stress to the gain medium to cause a birefringence phenomenon to generate a laser output having a bi-orthogonal polarization. 如申請專利範圍第1項所述的系統,其中該應力施加裝置是一用以夾持該增益介質的夾具。 The system of claim 1, wherein the stress applying device is a jig for holding the gain medium. 如申請專利範為第1項所述的系統,更包括一感測模組,該感測模組還包括:一偏極分光鏡(polarization beam splitter),將該雷射輸出依據偏振方向之不同而分為一第一偏振光與一第二偏振光;一第一光敏元件,用以感測該第一偏振光;以及一第二光敏元件,用以感側該第二偏振光。 The system of claim 1, further comprising a sensing module, the sensing module further comprising: a polarization beam splitter, the laser output is different according to a polarization direction And dividing into a first polarized light and a second polarized light; a first photosensitive element for sensing the first polarized light; and a second photosensitive element for sensing the second polarized light. 一種用於一雙偏振鎖模雷射裝置的增益模組,包括:一增益介質,具有一光軸;以及一熱或應力施加裝置,相鄰於該增益介質,並對該增 益介質施予一熱或應力,俾使該增益介質產生雙折射現象,其中當該熱或應力施加裝置是施加熱時,該熱或應力施加裝置是一加熱/冷卻器。 A gain module for a dual polarization mode-locked laser device, comprising: a gain medium having an optical axis; and a heat or stress applying device adjacent to the gain medium and increasing The heat medium is subjected to a heat or stress which causes the gain medium to produce a birefringence phenomenon, wherein the heat or stress applying means is a heater/cooler when the heat or stress applying means applies heat. 如申請專利範圍第4項所述的增益模組,其中當該熱或應力施加裝置是施加機械應力時,該熱或應力施加裝置是一夾持該增益介質的夾具,且該夾具的施力方向與該光軸之間形成一大於零度的夾角。 The gain module of claim 4, wherein when the heat or stress applying device applies mechanical stress, the heat or stress applying device is a clamp that clamps the gain medium, and the force of the clamp is An angle greater than zero degrees is formed between the direction and the optical axis. 如申請專利範圍第4項所述的增益模組,其中該增益介質是摻釹釔鋁石榴石(Nd:YAG)。 The gain module of claim 4, wherein the gain medium is yttrium aluminum garnet (Nd:YAG).
TW105132780A 2016-10-11 2016-10-11 Double polarization mode-locked laser system, gain module thereof and control method thereof TWI620383B (en)

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Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN2506002Y (en) * 2001-10-31 2002-08-14 清华大学 Two-dimension force applying mode zecman double reflection bifrequency laser

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN2506002Y (en) * 2001-10-31 2002-08-14 清华大学 Two-dimension force applying mode zecman double reflection bifrequency laser

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* Cited by examiner, † Cited by third party
Title
曾映舜,利用短的線性共振腔產生多波長自鎖模雷射,交通大學,2015/06 *

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