TWI619057B - Display device - Google Patents

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Publication number
TWI619057B
TWI619057B TW106118096A TW106118096A TWI619057B TW I619057 B TWI619057 B TW I619057B TW 106118096 A TW106118096 A TW 106118096A TW 106118096 A TW106118096 A TW 106118096A TW I619057 B TWI619057 B TW I619057B
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TW
Taiwan
Prior art keywords
hole
electrode
insulating layer
display element
signal line
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TW106118096A
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Chinese (zh)
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TW201903571A (en
Inventor
徐文義
黃德群
陳茂松
洪濬成
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友達光電股份有限公司
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Priority to TW106118096A priority Critical patent/TWI619057B/en
Priority to CN201710576473.XA priority patent/CN107368220B/en
Application granted granted Critical
Publication of TWI619057B publication Critical patent/TWI619057B/en
Publication of TW201903571A publication Critical patent/TW201903571A/en

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    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/0412Digitisers structurally integrated in a display
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/12Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
    • H01L27/1214Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
    • H01L27/124Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or layout of the wiring layers specially adapted to the circuit arrangement, e.g. scanning lines in LCD pixel circuits
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/12Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
    • H01L27/1214Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
    • H01L27/124Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or layout of the wiring layers specially adapted to the circuit arrangement, e.g. scanning lines in LCD pixel circuits
    • H01L27/1244Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or layout of the wiring layers specially adapted to the circuit arrangement, e.g. scanning lines in LCD pixel circuits for preventing breakage, peeling or short circuiting
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices

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  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Human Computer Interaction (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Liquid Crystal (AREA)

Abstract

一種顯示元件,包括基板、訊號線、第一絕緣層、第一電 極、第二絕緣層以及第二電極。訊號線位於基板上。第一絕緣層位於訊號線上。第一電極位於第一絕緣層上。第二絕緣層位於第一電極以及第一絕緣層上。第二電極位於第二絕緣層上。第二絕緣層具有第一通孔,且第一絕緣層以及第二絕緣層共同具有第二通孔。訊號線以及第一電極藉由第一通孔、第二通孔以及第二電極電性連接。 A display element includes a substrate, a signal line, a first insulating layer, and a first electrical layer. Electrode, second insulating layer, and second electrode. The signal line is located on the substrate. The first insulation layer is located on the signal line. The first electrode is on the first insulating layer. The second insulating layer is located on the first electrode and the first insulating layer. The second electrode is on the second insulating layer. The second insulating layer has a first through hole, and the first insulating layer and the second insulating layer have a second through hole in common. The signal line and the first electrode are electrically connected through the first through hole, the second through hole, and the second electrode.

Description

顯示元件 Display element

本發明是有關於一種元件,且特別是有關於一種顯示元件。 The invention relates to an element, and in particular to a display element.

近年來,為了達到更便利、體積更輕巧化以及更人性化的目的,許多資訊產品已由傳統之鍵盤或滑鼠等輸入裝置,轉變為使用觸控面板作為輸入裝置,其中同時具有觸控與顯示功能的觸控顯示裝置更是成為現今最流行的產品之一。依照結構及製造方式的不同,觸控顯示裝置大致上可區分為外貼式(out-cell)、整合式(on-cell)與內嵌式(in-cell)三種。 In recent years, in order to achieve more convenient, lighter, and more humane purposes, many information products have been transformed from traditional keyboard or mouse input devices to use touch panels as input devices. The touch display device with a display function has become one of the most popular products today. According to different structures and manufacturing methods, touch display devices can be roughly divided into three types: out-cell, on-cell and in-cell.

在內嵌式觸控顯示裝置的製造過程中,需透過蝕刻製程以形成通孔(through hole)。然而,於習知的通孔設計中,可能因為橫向蝕刻而導致底切(undercut)的現象發生,進而造成膜層剝離(peeling)的風險,或是因為蝕刻不足(under-etching)而使膜層間所產生的氣體無法排出,進而造成膜層間產生氣泡(bubble)。如此一來,可能造成短路或斷路的狀況,最終造成良率過低及產品可靠度不佳問題。因此,如何克服上述習知技術的種種問題,實已 成目前亟欲解決的課題。 In the manufacturing process of the in-cell touch display device, a through hole needs to be formed through an etching process. However, in the conventional through-hole design, the undercut may occur due to lateral etching, which may lead to the risk of peeling of the film, or the film may be under-etched due to under-etching. The gas generated between the layers cannot be exhausted, thereby causing bubbles between the layers of the film. As a result, short-circuit or open-circuit conditions may be caused, eventually causing low yield and poor product reliability. Therefore, how to overcome the problems of the above-mentioned conventional technologies has already been achieved. It has become a problem to be solved urgently.

本發明之至少一實施例提供一種電子元件,具有較佳的可靠度。 At least one embodiment of the present invention provides an electronic component with better reliability.

本發明之至少一實施例提供一種電子元件,包括基板、訊號線、第一絕緣層、第一電極、第二絕緣層以及第二電極。訊號線位於基板上。第一絕緣層位於訊號線上。第一電極位於第一絕緣層上。第二絕緣層位於第一電極以及第一絕緣層上。第二電極位於第二絕緣層上,其中第二絕緣層具有第一通孔,且第一絕緣層以及第二絕緣層共同具有第二通孔,訊號線以及第一電極藉由第一通孔、第二通孔以及第二電極電性連接。 At least one embodiment of the present invention provides an electronic component including a substrate, a signal line, a first insulating layer, a first electrode, a second insulating layer, and a second electrode. The signal line is located on the substrate. The first insulation layer is located on the signal line. The first electrode is on the first insulating layer. The second insulating layer is located on the first electrode and the first insulating layer. The second electrode is located on the second insulating layer. The second insulating layer has a first through hole, and the first insulating layer and the second insulating layer have a second through hole in common. The signal line and the first electrode pass through the first through hole. The second through hole and the second electrode are electrically connected.

本發明之至少一實施例提供一種電子元件,包括訊號線、第一電極以及第二電極。第一電極具有主體部以及與主體部相連接的延伸部。主體部與訊號線不重疊,延伸部與訊號線重疊。訊號線以及第一電極藉由第一通孔、第二通孔以及第二電極電性連接。第二通孔實質上不與延伸部重疊。第二通孔的尺寸大於延伸部的寬度。 At least one embodiment of the present invention provides an electronic component including a signal line, a first electrode, and a second electrode. The first electrode includes a main body portion and an extension portion connected to the main body portion. The main body portion does not overlap the signal line, and the extension portion overlaps the signal line. The signal line and the first electrode are electrically connected through the first through hole, the second through hole, and the second electrode. The second through hole does not substantially overlap the extension portion. The size of the second through hole is larger than the width of the extension portion.

在本發明之至少一實施例提供的電子元件,在電子元件的製造過程中,降低了膜層剝離的風險。 In the electronic component provided in at least one embodiment of the present invention, during the manufacturing process of the electronic component, the risk of film peeling is reduced.

在本發明之至少一實施例提供的電子元件,在電子元件的製造過程中,可使膜層間所產生的氣體較易排出。 In the electronic component provided by at least one embodiment of the present invention, during the manufacturing process of the electronic component, the gas generated between the film layers can be easily discharged.

在本發明之至少一實施例提供的電子元件的製造過程,可有效提升產品良率。 The manufacturing process of electronic components provided in at least one embodiment of the present invention can effectively improve product yield.

為讓本發明的上述特徵和優點能更明顯易懂,下文特舉實施例,並配合所附圖式作詳細說明如下。如本領域技術人員將認識到的,可以以各種不同的方式修改所描述的實施例,而不脫離本發明的精神或範圍。 In order to make the above features and advantages of the present invention more comprehensible, embodiments are hereinafter described in detail with reference to the accompanying drawings. As those skilled in the art would realize, the described embodiments may be modified in various different ways, all without departing from the spirit or scope of the present invention.

在附圖中,為了清楚起見,放大了各元件等的厚度。在整個說明書中,相同的附圖標記表示相同的元件。應當理解,當諸如層、膜、區域或基板的元件被稱為在“另一元件上”、或“連接到另一元件”、“重疊於另一元件”時,其可以直接在另一元件上或與另一元件連接,或者中間元件可以也存在。相反,當元件被稱為“直接在另一元件上”或“直接連接到”另一元件時,不存在中間元件。如本文所使用的,“連接”可以指物理及/或電連接。 In the drawings, the thickness of each element and the like is exaggerated for clarity. Throughout the description, the same reference numerals denote the same elements. It should be understood that when an element such as a layer, film, region, or substrate is referred to as being "on another element" or "connected to another element" or "overlapping on another element", it may be directly on the other element It may be connected to another element, or an intermediate element may be present. In contrast, when an element is referred to as being "directly on" or "directly connected to" another element, there are no intervening elements present. As used herein, "connected" may refer to a physical and / or electrical connection.

應當理解,儘管術語“第一”、“第二”、“第三”等在本文中可以用於描述各種元件、部件、區域、層及/或部分,但是這些元件、部件、區域、及/或部分不應受這些術語的限制。這些術語僅用於將一個元件、部件、區域、層或部分與另一個元件、部件、區域、層或部分區分開。因此,下面討論的“第一元件”、“部件”、“區域”、“層”、或“部分”可以被稱為第二元件、部件、區域、層或部分而不脫離本文的教導。 It should be understood that, although the terms "first," "second," "third," etc. may be used herein to describe various elements, components, regions, layers and / or sections, these elements, components, regions, and / or sections, and / Or in part should not be limited by these terms. These terms are only used to distinguish one element, component, region, layer or section from another element, component, region, layer or section. Thus, a "first element," "component," "region," "layer," or "portion" discussed below may be termed a second element, component, region, layer, or section without departing from the teachings herein.

這裡使用的術語僅僅是為了描述特定實施例的目的,而不是限制性的。如本文所使用的,除非內容清楚地指示,否則單數 形式“一”、“一個”和“該”旨在包括複數形式,包括“至少一個”。“或”表示“及/或”。如本文所使用的,術語“及/或”包括一個或多個相關所列項目的任何和所有組合。還應當理解,當在本說明書中使用時,術語“包括”及/或“包括”指定所述特徵、區域、整體、步驟、操作、元件的存在及/或部件,但不排除一個或多個其它特徵、區域整體、步驟、操作、元件、部件及/或其組合的存在或添加。 The terminology used herein is for the purpose of describing particular embodiments only and is not limiting. As used herein, unless the content clearly indicates otherwise, the singular The forms "a", "an" and "the" are intended to include the plural forms, including "at least one". "Or" means "and / or". As used herein, the term "and / or" includes any and all combinations of one or more of the associated listed items. It should also be understood that when used in this specification, the terms "including" and / or "including" designate the stated features, regions, wholes, steps, operations, presence of elements and / or components, but do not exclude one or more The presence or addition of other features, areas as a whole, steps, operations, elements, components, and / or combinations thereof.

此外,諸如“下”或“底部”和“上”或“頂部”的相對術語可在本文中用於描述一個元件與另一元件的關係,如圖所示。應當理解,相對術語旨在包括除了圖中所示的方位之外的裝置的不同方位。例如,如果一個附圖中的裝置翻轉,則被描述為在其他元件的“下”側的元件將被定向在其他元件的“上”側。因此,示例性術語“下”可以包括“下”和“上”的取向,取決於附圖的特定取向。類似地,如果一個附圖中的裝置翻轉,則被描述為在其它元件“下方”或“下方”的元件將被定向為在其它元件“上方”。因此,示例性術語“下面”或“下面”可以包括上方和下方的取向。 In addition, relative terms such as "lower" or "bottom" and "upper" or "top" may be used herein to describe the relationship of one element to another element, as shown. It should be understood that relative terms are intended to include different orientations of the device in addition to the orientation shown in the figures. For example, if the device in one of the figures is turned over, elements described as being on the "lower" side of other elements would then be oriented on "upper" sides of the other elements. Thus, the exemplary term "down" may include orientations of "down" and "up", depending on the particular orientation of the drawings. Similarly, if the device in one of the figures is turned over, elements described as "below" or "beneath" other elements would then be oriented "above" the other elements. Thus, the exemplary terms "below" or "below" may include orientations above and below.

本文使用的“約”、“實質上”、或“近似”包括所述值和在本領域普通技術人員確定的特定值的可接受的偏差範圍內的平均值,考慮到所討論的測量和與測量相關的誤差的特定數量(即,測量系統的限制)。例如,“約”可以表示在所述值的一個或多個標準偏差內,或±30%、±20%、±10%、±5%內。 As used herein, "about", "substantially", or "approximately" includes the stated value and the average value within an acceptable deviation range of a particular value determined by one of ordinary skill in the art, taking into account the measurements and A specific number of measurement-related errors (ie, limitations of the measurement system). For example, "about" may mean within one or more standard deviations of the stated value, or within ± 30%, ± 20%, ± 10%, ± 5%.

除非另有定義,本文使用的所有術語(包括技術和科學術語)具有與本發明所屬領域的普通技術人員通常理解的相同的含義。將進一步理解的是,諸如在通常使用的字典中定義的那些術語應當被解釋為具有與它們在相關技術和本發明的上下文中的含義一致的含義,並且將不被解釋為理想化的或過度正式的意義,除非本文中明確地這樣定義。 Unless otherwise defined, all terms (including technical and scientific terms) used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. It will be further understood that terms such as those defined in commonly used dictionaries should be interpreted to have meanings consistent with their meanings in the context of the related art and the present invention, and will not be interpreted as idealized or excessive Formal meaning unless explicitly defined as such in this article.

本文參考作為理想化實施例的示意圖的截面圖來描述示例性實施例。因此,可以預期到作為例如製造技術及/或公差的結果的圖示的形狀變化。因此,本文所述的實施例不應被解釋為限於如本文所示的區域的特定形狀,而是包括例如由製造導致的形狀偏差。例如,示出或描述為平坦的區域通常可以具有粗糙及/或非線性特徵。此外,所示的銳角可以是圓的。因此,圖中所示的區域本質上是示意性的,並且它們的形狀不是旨在示出區域的精確形狀,並且不是旨在限制權利要求的範圍。 Exemplary embodiments are described herein with reference to cross-sectional views that are schematic views of idealized embodiments. Accordingly, variations in the shapes of the illustrations as a result, for example, of manufacturing techniques and / or tolerances, are to be expected. Therefore, the embodiments described herein should not be construed as limited to the particular shape of the area as shown herein, but include shape deviations caused by, for example, manufacturing. For example, a region shown or described as flat may generally have rough and / or non-linear characteristics. Furthermore, the acute angles shown may be round. Thus, the regions illustrated in the figures are schematic in nature and their shapes are not intended to illustrate the precise shape of a region and are not intended to limit the scope of the claims.

100、200、300、400‧‧‧電子元件 100, 200, 300, 400‧‧‧ electronic components

110‧‧‧基板 110‧‧‧ substrate

120‧‧‧訊號線 120‧‧‧ signal line

120c‧‧‧導線側壁 120c‧‧‧conductor side wall

122‧‧‧第一部份 122‧‧‧Part I

122a‧‧‧第二上表面 122a‧‧‧Second upper surface

124‧‧‧第二部份 124‧‧‧ Part Two

130‧‧‧第一絕緣層 130‧‧‧first insulating layer

140‧‧‧第一電極 140‧‧‧first electrode

142‧‧‧主體部 142‧‧‧Main body

144‧‧‧延伸部 144‧‧‧ extension

144a‧‧‧第一延伸部 144a‧‧‧First extension

140a1‧‧‧第一上表面 140a1‧‧‧First upper surface

144b‧‧‧第二延伸部 144b‧‧‧second extension

144b1‧‧‧第三上表面 144b1‧‧‧ Third upper surface

144d‧‧‧第一寬度 144d‧‧‧first width

146‧‧‧連接墊 146‧‧‧Connecting pad

150‧‧‧第二絕緣層 150‧‧‧Second insulation layer

160‧‧‧第二電極 160‧‧‧Second electrode

170、270、370、470‧‧‧第一通孔 170, 270, 370, 470‧‧‧ first through hole

170a‧‧‧第一側壁 170a‧‧‧first side wall

170b‧‧‧第一尺寸 170b‧‧‧first size

172‧‧‧第一輔助通孔 172‧‧‧First auxiliary through hole

172a‧‧‧第三側壁 172a‧‧‧Third side wall

180、280‧‧‧第二通孔 180, 280‧‧‧Second through hole

180a‧‧‧第二側壁 180a‧‧‧Second sidewall

180b‧‧‧第二尺寸 180b‧‧‧Second size

190‧‧‧第三通孔 190‧‧‧Third through hole

190a‧‧‧第四側壁 190a‧‧‧Fourth side wall

d‧‧‧水平間距 d‧‧‧horizontal spacing

PE‧‧‧畫素電極 PE‧‧‧Pixel electrode

T、T’‧‧‧主動元件 T, T’‧‧‧ Active components

GE、GE’‧‧‧閘極 GE, GE’‧‧‧ Gate

GI‧‧‧閘極絕緣層 GI‧‧‧Gate insulation

CH、CH’‧‧‧通道層 CH, CH’‧‧‧ channel layer

SE、SE’‧‧‧源極 SE, SE’‧‧‧Source

DE、DE’‧‧‧汲極 DE, DE’‧‧‧ Drain

DEa‧‧‧第四上表面 DEa‧‧‧ fourth upper surface

SL‧‧‧掃描線 SL‧‧‧scan line

DL、DL’‧‧‧資料線 DL, DL’‧‧‧ data line

R‧‧‧區域 R‧‧‧ area

圖1是依照本發明之一實施例之電子元件的上視示意圖。 FIG. 1 is a schematic top view of an electronic component according to an embodiment of the present invention.

圖2是圖1中區域R的放大圖。 FIG. 2 is an enlarged view of a region R in FIG. 1.

圖3是圖2之電子元件沿剖面線A-A’的剖面示意圖。 Fig. 3 is a schematic cross-sectional view of the electronic component of Fig. 2 along a section line A-A '.

圖4是圖1之電子元件沿剖面線B-B’的剖面示意圖。 Fig. 4 is a schematic cross-sectional view of the electronic component of Fig. 1 along a section line B-B '.

圖5是依照本發明之另一實施例之電子元件的上視示意圖。 FIG. 5 is a schematic top view of an electronic component according to another embodiment of the invention.

圖6是圖5之電子元件沿剖面線C-C’的剖面示意圖。 Fig. 6 is a schematic cross-sectional view of the electronic component of Fig. 5 along a section line C-C '.

圖7是依照本發明之又一實施例之電子元件的上視示意圖。 FIG. 7 is a schematic top view of an electronic component according to another embodiment of the present invention.

圖8是圖7之電子元件沿剖面線D-D’的剖面示意圖。 Fig. 8 is a schematic cross-sectional view of the electronic component of Fig. 7 taken along a section line D-D '.

圖9是依照本發明之再一實施例之電子元件的上視示意圖。 FIG. 9 is a schematic top view of an electronic component according to another embodiment of the present invention.

圖10是圖9之電子元件沿剖面線E-E’的剖面示意圖。 Fig. 10 is a schematic cross-sectional view of the electronic component of Fig. 9 taken along a section line E-E '.

圖1是依照本發明之一實施例之電子元件的上視示意圖。圖2是圖1中區域R的放大圖。圖3是圖2之電子元件沿剖面線A-A’的剖面示意圖。圖4是圖1之電子元件沿剖面線B-B’的剖面示意圖。為求清楚表示與便於說明,圖1以及圖2省略繪示部分的膜層。以下,將藉由圖1至圖4來詳細描述本發明的一實施例。 FIG. 1 is a schematic top view of an electronic component according to an embodiment of the present invention. FIG. 2 is an enlarged view of a region R in FIG. 1. Fig. 3 is a schematic cross-sectional view of the electronic component of Fig. 2 along a section line A-A '. Fig. 4 is a schematic cross-sectional view of the electronic component of Fig. 1 along a section line B-B '. For clarity and convenience of explanation, the film layers in the drawing are omitted in FIGS. 1 and 2. Hereinafter, an embodiment of the present invention will be described in detail with reference to FIGS. 1 to 4.

請同時參照圖1至圖4,電子元件100包括基板110、訊號線120、第一絕緣層130、第一電極140、第二絕緣層150以及第二電極160。訊號線120位於基板110上。第一絕緣層130位於訊號線120上。第一電極140位於第一絕緣層130上。第二絕緣層150位於第一電極140以及第一絕緣層130上。第二電極160位於第二絕緣層150上。第二絕緣層150具有第一通孔170。第一絕緣層130以及第二絕緣層150共同具有第二通孔180。訊號線120以及第一電極140藉由第一通孔170、第二通孔180以及第二電極160彼此電性連接。 Referring to FIGS. 1 to 4 at the same time, the electronic component 100 includes a substrate 110, a signal line 120, a first insulating layer 130, a first electrode 140, a second insulating layer 150, and a second electrode 160. The signal line 120 is located on the substrate 110. The first insulating layer 130 is located on the signal line 120. The first electrode 140 is located on the first insulating layer 130. The second insulating layer 150 is located on the first electrode 140 and the first insulating layer 130. The second electrode 160 is located on the second insulating layer 150. The second insulating layer 150 has a first through hole 170. The first insulating layer 130 and the second insulating layer 150 have a second through hole 180 in common. The signal line 120 and the first electrode 140 are electrically connected to each other through the first through hole 170, the second through hole 180, and the second electrode 160.

基板110的材質可為玻璃、石英、有機聚合物、或是其它 可適用的材料。第一電極140以及第二電極160的材質舉例為包括金屬氧化物或是其它適合的透明導電材料,例如銦錫氧化物(Indium Tin Oxide,ITO)、銦鋅氧化物(Indium Zinc Oxide,IZO)、鋁錫氧化物(Aluminum Tin Oxide,ATO)、鋁鋅氧化物(Aluminum Zinc Oxide,AZO)、或其它適合的氧化物、或者是上述至少二者之堆疊層。第一絕緣層130以及第二絕緣層150的材料包含無機材料,無機材料例如為氧化矽(Silicon oxide)、氮化矽(Silicon nitride)、氮氧化矽(Silicon oxynitride)、其它適合的材料、或上述至少二種材料的堆疊層,第一絕緣層130以及第二絕緣層150的材料亦可包含有機材料、其它適合的材料或上述之組合。在本實施例中,第一絕緣層130可以是有機平坦層,以提供較佳平整度。此外,基於導電性的考量,訊號線120一般是使用金屬材料,但本發明不限於此。值得注意的是,在本實施例中,第二電極160位於第一電極140上,為了方便觀察及說明,在圖1與圖2中,仍繪示出第一電極140的輪廓,以便清楚表示第一電極140與第二電極160之位置的相對應關係。 The material of the substrate 110 may be glass, quartz, organic polymer, or other materials. Applicable materials. Examples of the material of the first electrode 140 and the second electrode 160 include metal oxide or other suitable transparent conductive materials, such as Indium Tin Oxide (ITO), Indium Zinc Oxide (IZO). , Aluminum Tin Oxide (ATO), Aluminum Zinc Oxide (AZO), or other suitable oxides, or a stacked layer of at least two of the foregoing. The material of the first insulating layer 130 and the second insulating layer 150 includes an inorganic material. For example, the inorganic material is silicon oxide, silicon nitride, silicon oxynitride, other suitable materials, or The above-mentioned stacked layers of at least two materials, and the materials of the first insulating layer 130 and the second insulating layer 150 may also include organic materials, other suitable materials, or combinations thereof. In this embodiment, the first insulating layer 130 may be an organic flat layer to provide better flatness. In addition, based on considerations of electrical conductivity, the signal line 120 is generally made of a metal material, but the present invention is not limited thereto. It is worth noting that, in this embodiment, the second electrode 160 is located on the first electrode 140. In order to facilitate observation and description, the outline of the first electrode 140 is still drawn in FIG. 1 and FIG. Corresponding relationship between the positions of the first electrode 140 and the second electrode 160.

第一電極140具有主體部142以及與主體部142相連接的延伸部144。第一電極140的主體部142與訊號線120不重疊,且第一電極140的延伸部144與訊號線120重疊。在本實施例中,第一電極140的延伸部144為具有第一延伸部144a與第二延伸部144b的分段式電極。第一延伸部144a上方形成有第一通孔170。第一通孔170貫穿第一延伸部144a上方的第二絕緣層150,且第 二電極160覆蓋於第一通孔170的第一側壁170a以及其所對應之第一延伸部144a的第一上表面144a1之一部分,如此一來,可使第二電極160與第一電極140藉由第一通孔170彼此電性連接。 The first electrode 140 includes a main body portion 142 and an extension portion 144 connected to the main body portion 142. The body portion 142 of the first electrode 140 does not overlap the signal line 120, and the extension portion 144 of the first electrode 140 overlaps the signal line 120. In this embodiment, the extending portion 144 of the first electrode 140 is a segmented electrode having a first extending portion 144a and a second extending portion 144b. A first through hole 170 is formed above the first extension portion 144a. The first through hole 170 penetrates the second insulating layer 150 above the first extension portion 144a, and the first The two electrodes 160 cover a portion of the first side wall 170a of the first through hole 170 and a portion of the first upper surface 144a1 of the corresponding first extension portion 144a. In this way, the second electrode 160 and the first electrode 140 can be borrowed. The first through holes 170 are electrically connected to each other.

訊號線120具有第一部份122以及與第一部份122相連接的第二部份124。訊號線120的第一部份122與第一電極140不重疊,且訊號線120的第二部份124與第一電極140的延伸部144重疊。第一部份122上方形成有第二通孔180。第二通孔180貫穿第一部份122上方的第一絕緣層130以及第二絕緣層150,且第二電極160覆蓋於第二通孔180的第二側壁180a以及其所對應之訊號線120的第一部份122的第二上表面122a之一部分。如此一來,可使第二電極160與訊號線120藉由第二通孔180彼此電性連接,而使訊號線120以及第一電極140藉由第一通孔170、第二通孔180以及第二電極160彼此電性連接。 The signal line 120 has a first portion 122 and a second portion 124 connected to the first portion 122. The first portion 122 of the signal line 120 and the first electrode 140 do not overlap, and the second portion 124 of the signal line 120 and the extension portion 144 of the first electrode 140 overlap. A second through hole 180 is formed above the first portion 122. The second through hole 180 penetrates the first insulating layer 130 and the second insulating layer 150 above the first portion 122, and the second electrode 160 covers the second sidewall 180 a of the second through hole 180 and the corresponding signal line 120. Part of the second upper surface 122a of the first portion 122. In this way, the second electrode 160 and the signal line 120 can be electrically connected to each other through the second through hole 180, and the signal line 120 and the first electrode 140 can be connected through the first through hole 170, the second through hole 180, and The second electrodes 160 are electrically connected to each other.

就製程上而言,第一通孔170以及第二通孔180可以是藉由類似的方法所形成。舉例來說,可藉由蝕刻製程(etching process)或其他類似的製程於第二絕緣層150中形成貫穿第二絕緣層150的第一通孔170以及第二通孔180。位於第一電極140的第一延伸部144a上方的第一通孔170貫穿第二絕緣層150。位於訊號線120的第一部份122上方的第二通孔180貫穿第二絕緣層150,且貫穿第一絕緣層130。舉例來說,貫穿第二絕緣層150的第一通孔170是以第一電極140作為蝕刻停止層(etching stop layer),而貫穿第二絕緣層150與第一絕緣層130的第二通孔180 是以訊號線120作為蝕刻停止層。如此一來,可以減少底切現象的發生,而降低了膜層剝離的風險。除此之外,也可以藉由第一通孔170及/或第二通孔180來增加後續製程中的排氣(outgassing)空間或效率,以使膜層間所產生的氣體可以較易排出,而降低了膜層間產生氣泡。 In terms of manufacturing process, the first through hole 170 and the second through hole 180 may be formed by a similar method. For example, the first through hole 170 and the second through hole 180 penetrating the second insulating layer 150 can be formed in the second insulating layer 150 by an etching process or other similar processes. The first through hole 170 located above the first extension portion 144 a of the first electrode 140 penetrates the second insulating layer 150. The second through hole 180 located above the first portion 122 of the signal line 120 penetrates the second insulating layer 150 and penetrates the first insulating layer 130. For example, the first through hole 170 penetrating the second insulating layer 150 uses the first electrode 140 as an etching stop layer, and the second through hole penetrating the second insulating layer 150 and the first insulating layer 130 180 The signal line 120 is used as an etch stop layer. In this way, the occurrence of undercut can be reduced, and the risk of film peeling is reduced. In addition, the first through hole 170 and / or the second through hole 180 can also be used to increase the outgassing space or efficiency in subsequent processes, so that the gas generated between the membrane layers can be easily discharged. And reduce the bubble generation between the film layers.

接著,再於第一通孔170及/或第二通孔180中填入導電物質,以使第二電極160藉由第一通孔170與第一電極140電性連接,且使第二電極160藉由第二通孔180與訊號線120電性連接。在本實施例中,於第一通孔170及/或第二通孔180中所填入的導電物質可以類似於第二電極160的材質或是第二電極160本身的一部份,但本發明不限於此。在本實施例中,第一通孔170以及第二通孔180可以藉由類似的製程形成,故能簡化製程上的流程而提高製作效率與良率。 Then, a conductive substance is filled in the first through hole 170 and / or the second through hole 180, so that the second electrode 160 is electrically connected to the first electrode 140 through the first through hole 170, and the second electrode is 160 is electrically connected to the signal line 120 through the second through hole 180. In this embodiment, the conductive material filled in the first through hole 170 and / or the second through hole 180 may be similar to the material of the second electrode 160 or a part of the second electrode 160 itself. The invention is not limited to this. In this embodiment, the first through hole 170 and the second through hole 180 can be formed by a similar process, so the process flow can be simplified and the production efficiency and yield can be improved.

在本實施例中,第二通孔180對應於第二絕緣層150上方的開口區域(open area)的長度或寬度定義為第二尺寸180b,第一通孔170對應於第二絕緣層150上方的開口區域的長度或寬度定義為第一尺寸170b,第一尺寸170b與第二尺寸180b舉例係具有相同的延伸方向,第一尺寸170b與第二尺寸180b之延伸方向舉例為垂直於訊號線120之延伸方向,或是第一尺寸170b與第二尺寸180b之延伸方向舉例為平行於掃描線SL之延伸方向,第二尺寸180b大於第一尺寸170b,但本發明不限於此。 In this embodiment, the length or width of the second open hole 180 corresponding to the open area above the second insulating layer 150 is defined as a second dimension 180b, and the first through hole 170 corresponds to the second insulating layer 150 The length or width of the opening area is defined as the first dimension 170b. The first dimension 170b and the second dimension 180b have the same extending direction. The first dimension 170b and the second dimension 180b are perpendicular to the signal line 120. For example, the extending direction of the first dimension 170b and the second dimension 180b is parallel to the scanning line SL. The second dimension 180b is larger than the first dimension 170b, but the present invention is not limited thereto.

在本實施例中,第一通孔170與第二通孔180彼此連接。 第一電極140的延伸部144在與第二電極160重疊的部分可具有較大的寬度,以形成連接墊(landing pad)146,且第一通孔170位於連接墊146上。除此之外,由於第二絕緣層150覆蓋緊鄰或鄰近於第二通孔180的部分連接墊146,因此可以降低第一電極140及/或後續形成於第一電極140上的膜層(如:第二絕緣層150及/或第二電極160)因為底切現象而造成膜層剝離的風險。前述連接墊146的形狀例如是圓形、橢圓形或多邊形,但本發明並不限於此。 In this embodiment, the first through hole 170 and the second through hole 180 are connected to each other. The extending portion 144 of the first electrode 140 may have a larger width in a portion overlapping the second electrode 160 to form a landing pad 146, and the first through hole 170 is located on the connection pad 146. In addition, since the second insulating layer 150 covers a portion of the connection pad 146 immediately adjacent to or adjacent to the second through hole 180, the first electrode 140 and / or a subsequent film layer formed on the first electrode 140 (such as : The second insulation layer 150 and / or the second electrode 160) may cause the film to peel off due to the undercut phenomenon. The shape of the aforementioned connection pad 146 is, for example, a circle, an oval or a polygon, but the present invention is not limited thereto.

在本實施例中,延伸部144遠離於第一通孔170的一端具有第一寬度144d,且第二通孔180的第二尺寸180b大於延伸部144的第一寬度144d。如此一來,在電子元件的製造過程中,可以使膜層間所產生的氣體或液體藉由第一通孔170及第二通孔180排出,而降低了膜層間產生氣泡。 In this embodiment, an end of the extending portion 144 far from the first through hole 170 has a first width 144d, and the second dimension 180b of the second through hole 180 is larger than the first width 144d of the extending portion 144. In this way, during the manufacturing process of the electronic component, the gas or liquid generated between the film layers can be discharged through the first through hole 170 and the second through hole 180, thereby reducing the generation of bubbles between the film layers.

在本實施例中,第二延伸部144b上方形成有第一輔助通孔172。第一輔助通孔172與第二通孔180連接,且第二通孔180位於第一通孔170與第一輔助通孔172之間。第一輔助通孔172貫穿第二延伸部144b上方的第二絕緣層150,且第二電極160覆蓋於第一輔助通孔172的第三側壁172a以及其所對應之第二延伸部144b的第三上表面144b1之一部分。第一輔助通孔172可以是藉由類似於第一通孔170的方法所形成,故在此就不再贅述。在本實施例中,第一電極140與訊號線120可以藉由第一電極140的第一延伸部144a、第一通孔170、第二電極160、第二通孔180 彼此電性連接,及/或藉由第一電極140第二延伸部144b、第一輔助通孔172、第二電極160、第二通孔180彼此電性連接。舉例來說,第一電極140與訊號線120可以藉由不同的電流路徑(current path)彼此電性連接。如此一來,可以降低斷路的風險,以提升良率及產品可靠度。 In this embodiment, a first auxiliary through hole 172 is formed above the second extension portion 144b. The first auxiliary through hole 172 is connected to the second through hole 180, and the second through hole 180 is located between the first through hole 170 and the first auxiliary through hole 172. The first auxiliary through-hole 172 penetrates the second insulating layer 150 above the second extension 144b, and the second electrode 160 covers the third side wall 172a of the first auxiliary through-hole 172 and the first extension of the second extension 144b corresponding thereto. Part of the three upper surfaces 144b1. The first auxiliary through-hole 172 may be formed by a method similar to the first through-hole 170, and thus will not be described again here. In this embodiment, the first electrode 140 and the signal line 120 may pass through the first extension portion 144 a of the first electrode 140, the first through hole 170, the second electrode 160, and the second through hole 180. They are electrically connected to each other, and / or are electrically connected to each other through the first electrode 140, the second extension 144b, the first auxiliary through hole 172, the second electrode 160, and the second through hole 180. For example, the first electrode 140 and the signal line 120 may be electrically connected to each other through different current paths. In this way, the risk of disconnection can be reduced to improve yield and product reliability.

在一些實施例中,電子元件100例如為顯示元件,且電子元件100包括畫素電極PE、主動元件T、掃描線SL以及資料線DL。畫素電極PE位於第二絕緣層150上,且畫素電極PE與第一電極140重疊。主動元件T例如是薄膜電晶體(Thin Film Transistor,TFT),其包括閘極GE、源極SE、汲極DE以及通道層CH,其中第一絕緣層130覆蓋主動元件T,第一電極140的主體部142與主動元件T重疊,汲極DE與畫素電極PE電性連接。掃描線SL與閘極GE電性連接。資料線DL與源極SE電性連接。 In some embodiments, the electronic device 100 is, for example, a display device, and the electronic device 100 includes a pixel electrode PE, an active device T, a scan line SL, and a data line DL. The pixel electrode PE is located on the second insulating layer 150, and the pixel electrode PE overlaps the first electrode 140. The active device T is, for example, a thin film transistor (TFT), which includes a gate electrode GE, a source electrode SE, a drain electrode DE, and a channel layer CH. The first insulating layer 130 covers the active device T, and the first electrode 140 The main body portion 142 overlaps the active device T, and the drain electrode DE is electrically connected to the pixel electrode PE. The scan line SL is electrically connected to the gate electrode GE. The data line DL is electrically connected to the source SE.

閘極GE與掃描線SL舉例為連續的導電圖案,此表示閘極GE與掃描線SL彼此電性連接。在本實施例中,掃描線SL的部分區域是作為閘極GE。源極SE與資料線DL舉例為連續的導電圖案,此表示源極SE與資料線DL彼此電性連接。 The gate electrode GE and the scan line SL are exemplified by a continuous conductive pattern, which means that the gate electrode GE and the scan line SL are electrically connected to each other. In this embodiment, a part of the scan line SL is used as the gate electrode GE. The source SE and the data line DL are exemplified by continuous conductive patterns, which means that the source SE and the data line DL are electrically connected to each other.

通道層CH位於閘極GE的上方。源極SE以及汲極DE位於通道層CH的上方。在本實施例中,源極SE、汲極DE以及訊號線120屬於同一膜層。也就是說,在本實施例中,主動元件T是以底部閘極型薄膜電晶體(bottom gate TFT)為例來說明,但本發明不限於此。在其他實施例中,主動元件T也可以是頂部閘極 型薄膜電晶體(top gate TFT)。 The channel layer CH is located above the gate electrode GE. The source SE and the drain DE are located above the channel layer CH. In this embodiment, the source SE, the drain DE, and the signal line 120 belong to the same film layer. That is to say, in this embodiment, the active device T is described by taking a bottom gate thin film transistor (bottom gate TFT) as an example, but the present invention is not limited thereto. In other embodiments, the active element T may also be a top gate. Thin film transistor (top gate TFT).

在本實施例中,主動元件T的閘極GE上方更覆蓋有閘極絕緣層GI。閘極絕緣層GI的材質可為無機材料、有機材料或其組合,無機材料例如為氧化矽、氮化矽、氮氧化矽、或上述至少二種材料的堆疊層,有機材料例如為聚醯亞胺(Polyimide,PI)樹脂、環氧(Epoxy)樹脂或壓克力(Acrylic)樹脂等高分子材料。 In this embodiment, the gate GE of the active element T is further covered with a gate insulating layer GI. The material of the gate insulating layer GI may be an inorganic material, an organic material, or a combination thereof. The inorganic material is, for example, silicon oxide, silicon nitride, silicon oxynitride, or a stacked layer of at least two of the foregoing materials. The organic material is, for example, polysilicon. Polymer materials such as amine (Polyimide, PI) resin, epoxy resin or acrylic resin.

畫素電極PE與主動元件T的汲極DE電性連接,且畫素電極PE以及第二電極160彼此分離。在本實施例中,畫素電極PE以及第二電極160屬於同一膜層,且畫素電極PE的材質例如是類似於第一電極140或第二電極160的透明導電材料,但本發明不限於此。另外,在本實施例中,畫素電極PE可以包括多個條狀電極圖案。在本實施例中,畫素電極PE位於第一電極140上,為了方便觀察及說明,在圖1中,仍繪示出第一電極140的輪廓,以便清楚表示第一電極140與畫素電極PE之位置的相對應關係。 The pixel electrode PE is electrically connected to the drain electrode DE of the active device T, and the pixel electrode PE and the second electrode 160 are separated from each other. In this embodiment, the pixel electrode PE and the second electrode 160 belong to the same film layer, and the material of the pixel electrode PE is, for example, a transparent conductive material similar to the first electrode 140 or the second electrode 160, but the present invention is not limited to this. this. In addition, in this embodiment, the pixel electrode PE may include a plurality of strip-shaped electrode patterns. In this embodiment, the pixel electrode PE is located on the first electrode 140. In order to facilitate observation and description, the outline of the first electrode 140 is still drawn in FIG. 1 so as to clearly show the first electrode 140 and the pixel electrode. Correspondence of the position of PE.

在本實施例中,畫素電極PE是藉由第三通孔190而與汲極DE電性連接。第三通孔190貫穿第一絕緣層130以及第二絕緣層150,且畫素電極PE實質上覆蓋於第三通孔190的第四側壁190a以及其所對應之汲極DE的第四上表面DEa之一部份,以使汲極DE以及畫素電極PE藉由第三通孔190彼此電性連接。第三通孔190可以是藉由類似於形成第二通孔180的方法所形成,故在此就不再贅述。 In this embodiment, the pixel electrode PE is electrically connected to the drain electrode DE through the third through hole 190. The third through hole 190 penetrates the first insulating layer 130 and the second insulating layer 150, and the pixel electrode PE substantially covers the fourth sidewall 190a of the third through hole 190 and the fourth upper surface of the corresponding drain electrode DE. A part of DEa, so that the drain electrode DE and the pixel electrode PE are electrically connected to each other through the third through hole 190. The third through-hole 190 may be formed by a method similar to the formation of the second through-hole 180, so it will not be repeated here.

在一些實施例中,電子元件100包括多條掃描線SL以及 多條資料線DL。掃描線SL與資料線DL彼此交錯,且畫素電極PE之至少一部份以及訊號線120實質上位於相鄰的兩個資料線DL之間(如後述圖5、圖7或圖9所繪示的實施例)。 In some embodiments, the electronic component 100 includes a plurality of scan lines SL and Multiple data lines DL. The scanning lines SL and the data lines DL are staggered with each other, and at least a part of the pixel electrode PE and the signal line 120 are substantially located between two adjacent data lines DL (as shown in FIG. 5, FIG. 7 or FIG. 9 described later). Exemplified embodiment).

在一些實施例中,電子元件100例如為觸控顯示元件,且訊號線120可以為前述觸控顯示元件的觸控電極。舉例來說,第二電極160以及訊號線120可以電性連接至控制系統(Control System),且控制系統可以傳送時序訊號,以使電子元件100在第一時間週期時具有顯示功能,且在第二時間週期時具有觸控功能,第一時間週期和第二時間週期舉例係為交替排列。 In some embodiments, the electronic device 100 is, for example, a touch display device, and the signal line 120 may be a touch electrode of the aforementioned touch display device. For example, the second electrode 160 and the signal line 120 can be electrically connected to a control system, and the control system can transmit a timing signal so that the electronic component 100 has a display function during the first time period, and The two time periods have a touch function, and the first time period and the second time period are alternately arranged as an example.

圖5是依照本發明之另一實施例之電子元件的上視示意圖,圖6是圖5之電子元件沿剖面線C-C’的剖面示意圖。為求清楚表示與便於說明,圖5省略繪示部分的膜層。在此必須說明的是,圖5至圖6的實施例沿用圖1至圖4的實施例的元件標號與部分內容,其中採用相同或近似的標號來表示相同或近似的元件,並且省略了相同技術內容的說明,關於省略部分的說明可參考前述實施例,下述實施例不再重複贅述。 Fig. 5 is a schematic top view of an electronic component according to another embodiment of the present invention, and Fig. 6 is a schematic cross-sectional view of the electronic component of Fig. 5 along a section line C-C '. For clarity and ease of description, FIG. 5 omits the film layer of the drawing portion. It must be explained here that the embodiments of FIGS. 5 to 6 inherit the component numbers and parts of the embodiments of FIGS. 1 to 4, in which the same or similar reference numerals are used to indicate the same or similar components, and the same are omitted. For the description of the technical content, for the description of the omitted parts, refer to the foregoing embodiments, and the following embodiments are not repeated.

請同時參照圖5至圖6,本實施例的電子元件200與圖1至圖4的實施例的電子元件100相似,兩者的差異在於:第一通孔270與第二通孔280彼此分離且具有一水平間距d,第一通孔270與第二通孔280之間的水平間距d為3微米(micrometer,μm)至6微米,但本發明不限於此。第一電極140的延伸部144與第一通孔270相接觸的區域遠離於第一電極140的邊緣,且第 二通孔280遠離於第一電極140的邊緣。舉例來說,第一通孔270與第二通孔280不與延伸部144的邊緣重疊。如此一來,由於第二絕緣層150覆蓋鄰近於第一通孔270的第一電極140,因此可以降低第一電極140及/或後續形成於第一電極140上的膜層因為底切現象而造成膜層剝離的風險。值得注意的是,在本實施例中,第二電極160位於第一電極140上,為了方便觀察及說明,在圖5中,仍繪示出第一電極140的輪廓,以便清楚表示第一電極140與第二電極160及畫素電極PE之位置的相對應關係。 Please refer to FIG. 5 to FIG. 6 at the same time. The electronic component 200 of this embodiment is similar to the electronic component 100 of the embodiment of FIGS. 1 to 4. A horizontal distance d is provided. The horizontal distance d between the first through hole 270 and the second through hole 280 is 3 micrometers (μm) to 6 micrometers, but the present invention is not limited thereto. The area where the extending portion 144 of the first electrode 140 contacts the first through hole 270 is far from the edge of the first electrode 140, and the first The two through holes 280 are far from the edge of the first electrode 140. For example, the first through hole 270 and the second through hole 280 do not overlap the edges of the extending portion 144. In this way, since the second insulating layer 150 covers the first electrode 140 adjacent to the first through hole 270, the first electrode 140 and / or the subsequent film layer formed on the first electrode 140 can be reduced due to the undercut phenomenon. Risk of film peeling. It is worth noting that, in this embodiment, the second electrode 160 is located on the first electrode 140. In order to facilitate observation and description, in FIG. 5, the outline of the first electrode 140 is still drawn in order to clearly show the first electrode The corresponding relationship between 140 and the position of the second electrode 160 and the pixel electrode PE.

在本實施例中,第一通孔270位於訊號線120上。舉例來說,第一通孔270與訊號線120重疊,就製程上而言,由於至少部分的第一電極140位於第二絕緣層150與訊號線120之間,因此藉由蝕刻或其他類似的製程於第二絕緣層150中形成貫穿第二絕緣層150的第一通孔270是以第一電極140作為蝕刻停止層,以使蝕刻製程能終止於第一電極140而不會繼續對位於第一電極140下的訊號線120進行蝕刻。然而,本發明不限於此,在其他變化例中,可以將第一通孔270形成於其他元件上或其他適合的位置,以增加後續製程中的排氣空間或效率,而使膜層間所產生的氣體可以較易排出,以降低了膜層間產生氣泡。 In this embodiment, the first through hole 270 is located on the signal line 120. For example, the first through hole 270 overlaps with the signal line 120. As far as the manufacturing process is concerned, at least part of the first electrode 140 is located between the second insulating layer 150 and the signal line 120. Therefore, by etching or other similar The first through-hole 270 penetrating the second insulating layer 150 is formed in the second insulating layer 150 by using the first electrode 140 as an etch stop layer, so that the etching process can be terminated at the first electrode 140 without continuing to be located at the first electrode 140. The signal line 120 under an electrode 140 is etched. However, the present invention is not limited to this. In other variations, the first through hole 270 may be formed on other elements or other suitable positions, so as to increase the exhaust space or efficiency in the subsequent process, so that the generation between the film layers is generated. The gas can be easily discharged to reduce air bubbles between the layers.

在本實施例中,電子元件200包括多條掃描線SL以及多條資料線DL、DL’,為方便說明,圖5僅示例性地繪示出一條掃描線SL,掃描線SL與資料線DL、DL’彼此交錯。各子畫素包括對應的主動元件T、T’。主動元件T包括對應的閘極GE、源極SE、 汲極DE以及通道層CH,且與對應的資料線DL以及掃描線SL電性連接。主動元件T’包括對應的閘極GE’、源極SE’、汲極DE’以及通道層CH’,且與對應的資料線DL’以及掃描線SL電性連接。主動元件T’與主動元件T類似,於此不再重複贅述。畫素電極PE之至少一部份以及訊號線120實質上位於資料線DL與相鄰資料線DL’之間。 In this embodiment, the electronic component 200 includes a plurality of scan lines SL and a plurality of data lines DL and DL ′. For convenience of explanation, FIG. 5 only illustrates one scan line SL by way of example, and the scan line SL and the data line DL , DL 'are intertwined with each other. Each sub-pixel includes corresponding active elements T, T '. The active element T includes the corresponding gate GE, source SE, The drain electrode DE and the channel layer CH are electrically connected to corresponding data lines DL and scan lines SL. The active device T 'includes a corresponding gate electrode GE', a source electrode SE ', a drain electrode DE', and a channel layer CH ', and is electrically connected to the corresponding data line DL' and the scanning line SL. The active element T 'is similar to the active element T, and is not repeated here. At least a part of the pixel electrode PE and the signal line 120 are substantially located between the data line DL and an adjacent data line DL '.

圖7是依照本發明之又一實施例之電子元件的上視示意圖。圖8是圖7之電子元件沿剖面線D-D’的剖面示意圖。為求清楚表示與便於說明,圖7省略繪示部分的膜層。在此必須說明的是,圖7至圖8的實施例沿用圖5至圖6的實施例的元件標號與部分內容,其中採用相同或近似的標號來表示相同或近似的元件,並且省略了相同技術內容的說明。關於省略部分的說明可參考前述實施例,下述實施例不再重複贅述。 FIG. 7 is a schematic top view of an electronic component according to another embodiment of the present invention. Fig. 8 is a schematic cross-sectional view of the electronic component of Fig. 7 taken along a section line D-D '. For clarity and ease of description, FIG. 7 omits the film layer of the drawing portion. It must be explained here that the embodiments of FIGS. 7 to 8 inherit the component numbers and parts of the embodiments of FIGS. 5 to 6, in which the same or similar reference numerals are used to indicate the same or similar components, and the same are omitted. Description of technical content. For the description of the omitted parts, reference may be made to the foregoing embodiments, and the following embodiments are not repeated.

請同時參照圖7至圖8,本實施例的電子元件300與圖5至圖6的實施例的電子元件200相似,兩者的差異在於:第一通孔370位於主動元件T’上。舉例來說,第一通孔370與主動元件T’重疊。就製程上而言,由於部分的第一電極140位於第二絕緣層150與主動元件T’之間,因此藉由蝕刻或其他類似的製程於第二絕緣層150中形成貫穿第二絕緣層150的第一通孔370是以第一電極140作為蝕刻停止層,以使蝕刻製程能終止於第一電極140而不會繼續對位於第一電極140下的主動元件T’進行蝕刻。在本實施例中,第二電極160及畫素電極PE位於第一電極140上,為 了方便觀察及說明,在圖7中,仍繪示出第一電極140的輪廓,以便清楚表示第一電極140與第二電極160及畫素電極PE之位置的相對應關係。 Please refer to FIG. 7 to FIG. 8 at the same time. The electronic component 300 of this embodiment is similar to the electronic component 200 of the embodiment of FIG. 5 to FIG. 6. For example, the first through hole 370 overlaps the active device T '. In terms of manufacturing process, since part of the first electrode 140 is located between the second insulating layer 150 and the active device T ′, the second insulating layer 150 is formed through the second insulating layer 150 by etching or other similar processes. The first through hole 370 uses the first electrode 140 as an etching stop layer, so that the etching process can be terminated at the first electrode 140 without continuing to etch the active device T ′ located under the first electrode 140. In this embodiment, the second electrode 160 and the pixel electrode PE are located on the first electrode 140, which is For convenience of observation and description, in FIG. 7, the outline of the first electrode 140 is still drawn, so as to clearly show the corresponding relationship between the positions of the first electrode 140 and the second electrode 160 and the pixel electrode PE.

在本實施例中,第一通孔370與主動元件T’的源極SE’重疊,但本發明不限於此。在其他的實施例中,第一通孔370也可以與主動元件T’的汲極DE’重疊。在其他的實施例中,第一通孔370也可以與通道層CH’重疊。在其他的實施例中,第一通孔370也可以位於主動元件T’的源極SE’以及汲極DE’之間。在其他的實施例中,第一通孔370也可以與資料線DL、DL’或掃描線SL重疊。 In this embodiment, the first through hole 370 overlaps the source electrode SE 'of the active device T', but the present invention is not limited thereto. In other embodiments, the first through hole 370 may also overlap the drain electrode DE 'of the active device T'. In other embodiments, the first through hole 370 may also overlap the channel layer CH '. In other embodiments, the first through hole 370 may also be located between the source electrode SE 'and the drain electrode DE' of the active device T '. In other embodiments, the first through hole 370 may overlap the data line DL, DL 'or the scan line SL.

圖9是依照本發明之再一實施例之電子元件的上視示意圖。圖10是圖9之電子元件沿剖面線E-E’的剖面示意圖。為求清楚表示與便於說明,圖9省略繪示部分的膜層。在此必須說明的是,圖9至圖10的實施例沿用圖5至圖6的實施例的元件標號與部分內容,其中採用相同或近似的標號來表示相同或近似的元件,並且省略了相同技術內容的說明。關於省略部分的說明可參考前述實施例,下述實施例不再重複贅述。 FIG. 9 is a schematic top view of an electronic component according to another embodiment of the present invention. Fig. 10 is a schematic cross-sectional view of the electronic component of Fig. 9 taken along a section line E-E '. For clarity and ease of description, FIG. 9 omits the film layer of the drawing portion. It must be explained here that the embodiments of FIGS. 9 to 10 inherit the component numbers and parts of the embodiments of FIGS. 5 to 6, in which the same or similar reference numerals are used to indicate the same or similar components, and the same are omitted. Description of technical content. For the description of the omitted parts, reference may be made to the foregoing embodiments, and the following embodiments are not repeated.

請同時參照圖9至圖10,本實施例的電子元件400與圖5至圖6的實施例的電子元件200相似,兩者的差異在於:第一通孔470位於部分的訊號線120上。舉例來說,第一通孔470與部分的訊號線120重疊,第一通孔470的一部分係不與訊號線120重疊。就製程上而言,由於至少部分的第一電極140位於第二絕 緣層150與訊號線120之間,且部分的第一電極140與訊號線120的導線側壁120c重疊。因此藉由蝕刻或其他類似的製程於第二絕緣層150中形成貫穿第二絕緣層150的第一通孔470是以第一電極140作為蝕刻停止層,以使蝕刻製程能終止於第一電極140而不會繼續對位於第一電極140下的訊號線120進行蝕刻。值得注意的是,在本實施例中,第二電極160及畫素電極PE位於第一電極140上,為了方便觀察及說明,在圖9中,仍繪示出第一電極140的輪廓,以便清楚表示第一電極140與第二電極160及畫素電極PE之位置的相對應關係。 Please refer to FIG. 9 to FIG. 10 at the same time. The electronic component 400 of this embodiment is similar to the electronic component 200 of the embodiments of FIGS. 5 to 6. The difference between the two is that the first through hole 470 is located on a part of the signal line 120. For example, the first through hole 470 overlaps with a part of the signal line 120, and a part of the first through hole 470 does not overlap with the signal line 120. As far as the manufacturing process is concerned, at least part of the first electrode 140 is located in the second insulation. Between the edge layer 150 and the signal line 120, a part of the first electrode 140 overlaps with the side wall 120 c of the wire of the signal line 120. Therefore, the first through hole 470 penetrating through the second insulating layer 150 is formed in the second insulating layer 150 by etching or other similar processes, and the first electrode 140 is used as an etching stop layer, so that the etching process can be terminated at the first electrode 140 without continuing to etch the signal line 120 under the first electrode 140. It is worth noting that, in this embodiment, the second electrode 160 and the pixel electrode PE are located on the first electrode 140. In order to facilitate the observation and description, the outline of the first electrode 140 is still drawn in FIG. The corresponding relationship between the positions of the first electrode 140, the second electrode 160, and the pixel electrode PE is clearly shown.

綜上所述,本發明之至少一實施例的電子元件透過第一通孔、第二通孔與第二電極,以使訊號線以及第一電極彼此電性連接。因此,在本發明之至少一實施例的電子元件的製造過程中,降低了膜層剝離的風險,及/或可使膜層間所產生的氣體較易排出,藉以有效提升產品良率。在一實施例中,第一通孔以及第二通孔也可以藉由類似的製程形成,故能簡化製程上的流程而提高製作效率與良率。 In summary, the electronic component of at least one embodiment of the present invention passes through the first through hole, the second through hole and the second electrode, so that the signal line and the first electrode are electrically connected to each other. Therefore, in the manufacturing process of the electronic component according to at least one embodiment of the present invention, the risk of film layer peeling is reduced, and / or the gas generated between the film layers can be easily discharged, thereby effectively improving the product yield. In an embodiment, the first through hole and the second through hole can also be formed by a similar process, so the process flow can be simplified and the production efficiency and yield can be improved.

雖然本發明已以實施例揭露如上,然其並非用以限定本發明,任何所屬技術領域中具有通常知識者,在不脫離本發明的精神和範圍內,當可作些許的更動與潤飾,故本發明的保護範圍當視後附的申請專利範圍所界定者為準。 Although the present invention has been disclosed as above with the examples, it is not intended to limit the present invention. Any person with ordinary knowledge in the technical field can make some modifications and retouching without departing from the spirit and scope of the present invention. The protection scope of the present invention shall be determined by the scope of the attached patent application.

100‧‧‧電子元件 100‧‧‧Electronic components

120‧‧‧訊號線 120‧‧‧ signal line

140‧‧‧第一電極 140‧‧‧first electrode

142‧‧‧主體部 142‧‧‧Main body

144‧‧‧延伸部 144‧‧‧ extension

160‧‧‧第二電極 160‧‧‧Second electrode

170‧‧‧第一通孔 170‧‧‧The first through hole

172‧‧‧第一輔助通孔 172‧‧‧First auxiliary through hole

180‧‧‧第二通孔 180‧‧‧Second through hole

190‧‧‧第三通孔 190‧‧‧Third through hole

PE‧‧‧畫素電極 PE‧‧‧Pixel electrode

T‧‧‧主動元件 T‧‧‧active element

GE‧‧‧閘極 GE‧‧‧Gate

SE‧‧‧源極 SE‧‧‧Source

DE‧‧‧汲極 DE‧‧‧ Drain

CH‧‧‧通道層 CH‧‧‧ Channel layer

SL‧‧‧掃描線 SL‧‧‧scan line

DL‧‧‧資料線 DL‧‧‧Data Line

R‧‧‧區域 R‧‧‧ area

Claims (43)

一種顯示元件,包括:一基板;一訊號線,位於該基板上;一第一絕緣層,位於該訊號線上;一第一電極,位於該第一絕緣層上;一第二絕緣層,位於該第一電極以及該第一絕緣層上;以及一第二電極,位於該第二絕緣層上,其中該第二絕緣層具有一第一通孔,且該第一絕緣層以及該第二絕緣層共同具有一第二通孔,該訊號線以及該第一電極藉由該第一通孔、該第二通孔以及該第二電極電性連接,其中該第一電極具有一主體部以及與該主體部相連接的一延伸部,該主體部與該訊號線不重疊,該延伸部與該訊號線重疊,且該第二通孔的尺寸大於該延伸部的寬度。 A display element includes: a substrate; a signal line on the substrate; a first insulation layer on the signal line; a first electrode on the first insulation layer; a second insulation layer on the substrate A first electrode and the first insulating layer; and a second electrode located on the second insulating layer, wherein the second insulating layer has a first through hole, and the first insulating layer and the second insulating layer There is a second through hole in common, the signal line and the first electrode are electrically connected through the first through hole, the second through hole and the second electrode, wherein the first electrode has a main body portion and is in contact with the first electrode. An extension portion connected to the main body portion does not overlap with the signal line, the extension portion overlaps with the signal line, and the size of the second through hole is greater than the width of the extension portion. 如申請專利範圍第1項所述的顯示元件,其中該第二通孔的尺寸大於該第一通孔的尺寸。 The display element according to item 1 of the scope of patent application, wherein a size of the second through hole is larger than a size of the first through hole. 如申請專利範圍第1項所述的顯示元件,其中該第一通孔與該第二通孔彼此連接。 The display element according to item 1 of the scope of patent application, wherein the first through hole and the second through hole are connected to each other. 如申請專利範圍第3項所述的顯示元件,其中該第二絕緣層更具有一第一輔助通孔與該第二通孔連接,其中該第二通孔位於該第一通孔與該第一輔助通孔之間,該訊號線以及該第一電極藉由該第一通孔、該第二通孔、該第一輔助通孔以及該第二電極電性連接。 The display element according to item 3 of the scope of patent application, wherein the second insulating layer further has a first auxiliary through hole connected to the second through hole, wherein the second through hole is located between the first through hole and the first through hole. Between an auxiliary via, the signal line and the first electrode are electrically connected through the first via, the second via, the first auxiliary via, and the second electrode. 如申請專利範圍第1項所述的顯示元件,其中該第二電極完全覆蓋該第一通孔的通孔側壁。 The display element according to item 1 of the scope of patent application, wherein the second electrode completely covers a through-hole sidewall of the first through-hole. 如申請專利範圍第5項所述的顯示元件,其中該第二電極完全覆蓋該第二通孔的通孔側壁。 The display element according to item 5 of the application, wherein the second electrode completely covers a sidewall of the through hole of the second through hole. 如申請專利範圍第1項所述的顯示元件,更包括:一畫素電極,位於該第二絕緣層上,且該畫素電極與該第一電極重疊;一主動元件,包括一閘極、一源極以及一汲極,其中該第一絕緣層覆蓋該主動元件,該第一電極與該主動元件重疊,該汲極與該畫素電極電性連接;一掃描線,與該閘極連接;以及一資料線,與該源極連接。 The display element according to item 1 of the patent application scope further includes: a pixel electrode located on the second insulating layer, and the pixel electrode overlaps the first electrode; an active element including a gate electrode, A source electrode and a drain electrode, wherein the first insulating layer covers the active element, the first electrode overlaps the active element, the drain electrode is electrically connected to the pixel electrode, and a scan line is connected to the gate electrode ; And a data line connected to the source. 如申請專利範圍第7項所述的顯示元件,其中該源極、該汲極以及該訊號線為同一圖案化導電層。 The display element according to item 7 of the scope of patent application, wherein the source electrode, the drain electrode, and the signal line are the same patterned conductive layer. 如申請專利範圍第8項所述的顯示元件,其中該畫素電極之至少一部份以及該訊號線實質上係位於該資料線以及另一資料線之間。 The display element according to item 8 of the scope of patent application, wherein at least a part of the pixel electrode and the signal line are substantially located between the data line and another data line. 如申請專利範圍第7項所述的顯示元件,其中該畫素電極以及該第二電極為同一圖案化導電層。 The display element according to item 7 of the scope of patent application, wherein the pixel electrode and the second electrode are the same patterned conductive layer. 如申請專利範圍第7項所述的顯示元件,其中該第一絕緣層以及該第二絕緣層更共同具有一第三通孔,其中該畫素電極 覆蓋該第三通孔,以使該汲極以及該畫素電極藉由該第三通孔電性連接。 The display element according to item 7 of the scope of patent application, wherein the first insulating layer and the second insulating layer more commonly have a third through hole, wherein the pixel electrode The third through hole is covered so that the drain electrode and the pixel electrode are electrically connected through the third through hole. 如申請專利範圍第7項所述的顯示元件,其中該第一通孔與另一主動元件重疊。 The display element according to item 7 of the application, wherein the first through hole overlaps with another active element. 如申請專利範圍第1項所述的顯示元件,其中該第一通孔與該訊號線重疊。 The display element according to item 1 of the scope of patent application, wherein the first through hole overlaps the signal line. 一種顯示元件,包括:一訊號線;一第一電極,具有一主體部以及與該主體部相連接的一延伸部,該主體部與該訊號線不重疊,該延伸部與該訊號線重疊;以及一第二電極,該訊號線以及該第一電極藉由一第一通孔、一第二通孔以及該第二電極電性連接,該第二通孔實質上不與該延伸部重疊,其中該第二通孔的尺寸大於該延伸部的寬度。 A display element includes: a signal line; a first electrode having a main body portion and an extension portion connected to the main body portion, the main body portion does not overlap with the signal line, and the extension portion overlaps with the signal line; And a second electrode, the signal line and the first electrode are electrically connected through a first through hole, a second through hole and the second electrode, and the second through hole does not substantially overlap the extension portion, The size of the second through hole is larger than the width of the extension portion. 如申請專利範圍第14項所述的顯示元件,其中該第一通孔與該第二通孔彼此連接,該第二通孔的尺寸大於該第一通孔的尺寸。 The display element according to item 14 of the application, wherein the first through hole and the second through hole are connected to each other, and the size of the second through hole is larger than the size of the first through hole. 一種顯示元件,包括:一基板;一訊號線,位於該基板上;一第一絕緣層,位於該訊號線上;一第一電極,位於該第一絕緣層上;一第二絕緣層,位於該第一電極以及該第一絕緣層上;以及 一第二電極,位於該第二絕緣層上,其中該第二絕緣層具有一第一通孔,且該第一絕緣層以及該第二絕緣層共同具有一第二通孔,該訊號線以及該第一電極藉由該第一通孔、該第二通孔以及該第二電極電性連接,其中該第一通孔與該第二通孔彼此分離且其間之水平距離為3微米至6微米。 A display element includes: a substrate; a signal line on the substrate; a first insulation layer on the signal line; a first electrode on the first insulation layer; a second insulation layer on the substrate A first electrode and the first insulating layer; and A second electrode is located on the second insulating layer, wherein the second insulating layer has a first through hole, and the first insulating layer and the second insulating layer together have a second through hole, the signal line and The first electrode is electrically connected through the first through-hole, the second through-hole, and the second electrode, wherein the first through-hole and the second through-hole are separated from each other with a horizontal distance between 3 micrometers and 6 Microns. 如申請專利範圍第16項所述的顯示元件,其中該第二電極完全覆蓋該第一通孔的通孔側壁。 The display element according to item 16 of the application, wherein the second electrode completely covers a sidewall of the through hole of the first through hole. 如申請專利範圍第17項所述的顯示元件,其中該第二電極完全覆蓋該第二通孔的通孔側壁。 The display element according to item 17 of the application, wherein the second electrode completely covers a sidewall of the through hole of the second through hole. 如申請專利範圍第16項所述的顯示元件,更包括:一畫素電極,位於該第二絕緣層上,且該畫素電極與該第一電極重疊;一主動元件,包括一閘極、一源極以及一汲極,其中該第一絕緣層覆蓋該主動元件,該第一電極與該主動元件重疊,該汲極與該畫素電極電性連接;一掃描線,與該閘極連接;以及一資料線,與該源極連接。 The display element according to item 16 of the scope of patent application, further comprising: a pixel electrode on the second insulating layer, and the pixel electrode and the first electrode overlap; an active element including a gate electrode, A source electrode and a drain electrode, wherein the first insulating layer covers the active element, the first electrode overlaps the active element, the drain electrode is electrically connected to the pixel electrode, and a scan line is connected to the gate electrode ; And a data line connected to the source. 如申請專利範圍第19項所述的顯示元件,其中該源極、該汲極以及該訊號線為同一圖案化導電層。 The display element according to item 19 of the application, wherein the source electrode, the drain electrode, and the signal line are the same patterned conductive layer. 如申請專利範圍第20項所述的顯示元件,其中該畫素電極之至少一部份以及該訊號線實質上係位於該資料線以及另一資料線之間。 According to the display element described in claim 20, at least a part of the pixel electrode and the signal line are substantially located between the data line and another data line. 如申請專利範圍第19項所述的顯示元件,其中該畫素電極以及該第二電極為同一圖案化導電層。 The display element according to item 19 of the application, wherein the pixel electrode and the second electrode are the same patterned conductive layer. 如申請專利範圍第19項所述的顯示元件,其中該第一絕緣層以及該第二絕緣層更共同具有一第三通孔,其中該畫素電極覆蓋該第三通孔,以使該汲極以及該畫素電極藉由該第三通孔電性連接。 The display element according to item 19 of the scope of patent application, wherein the first insulating layer and the second insulating layer more commonly have a third through hole, and the pixel electrode covers the third through hole so that the drain The electrode and the pixel electrode are electrically connected through the third through hole. 如申請專利範圍第19項所述的顯示元件,其中該第一通孔與另一主動元件重疊。 The display element according to item 19 of the application, wherein the first through hole overlaps with another active element. 如申請專利範圍第16項所述的顯示元件,其中該第一通孔與該訊號線重疊。 The display element according to item 16 of the application, wherein the first through hole overlaps the signal line. 一種顯示元件,包括:一基板;一訊號線,位於該基板上;一第一絕緣層,位於該訊號線上;一第一電極,位於該第一絕緣層上;一第二絕緣層,位於該第一電極以及該第一絕緣層上;一第二電極,位於該第二絕緣層上,其中該第二絕緣層具有一第一通孔,且該第一絕緣層以及該第二絕緣層共同具有一第二通孔,該訊號線以及該第一電極藉由該第一通孔、該第二通孔以及該第二電極電性連接;一畫素電極,位於該第二絕緣層上,且該畫素電極與該第一電極重疊; 一主動元件,包括一閘極、一源極以及一汲極,其中該第一絕緣層覆蓋該主動元件,該第一電極與該主動元件重疊,該汲極與該畫素電極電性連接;一掃描線,與該閘極連接;以及一資料線,與該源極連接。 A display element includes: a substrate; a signal line on the substrate; a first insulation layer on the signal line; a first electrode on the first insulation layer; a second insulation layer on the substrate A first electrode and the first insulating layer; a second electrode located on the second insulating layer, wherein the second insulating layer has a first through hole, and the first insulating layer and the second insulating layer are common; A second through hole, the signal line and the first electrode are electrically connected through the first through hole, the second through hole and the second electrode; a pixel electrode is located on the second insulating layer, And the pixel electrode overlaps the first electrode; An active element includes a gate, a source, and a drain, wherein the first insulating layer covers the active element, the first electrode overlaps the active element, and the drain is electrically connected to the pixel electrode; A scan line is connected to the gate; and a data line is connected to the source. 如申請專利範圍第26項所述的顯示元件,其中該第二通孔的尺寸大於該第一通孔的尺寸。 The display element according to item 26 of the application, wherein a size of the second through hole is larger than a size of the first through hole. 如申請專利範圍第26項所述的顯示元件,其中該第一通孔與該第二通孔彼此連接。 The display element according to item 26 of the application, wherein the first through hole and the second through hole are connected to each other. 如申請專利範圍第28項所述的顯示元件,其中該第二絕緣層更具有一第一輔助通孔與該第二通孔連接,其中該第二通孔位於該第一通孔與該第一輔助通孔之間,該訊號線以及該第一電極藉由該第一通孔、該第二通孔、該第一輔助通孔以及該第二電極電性連接。 According to the display element in claim 28, wherein the second insulating layer further has a first auxiliary through hole connected to the second through hole, wherein the second through hole is located between the first through hole and the first through hole. Between an auxiliary via, the signal line and the first electrode are electrically connected through the first via, the second via, the first auxiliary via, and the second electrode. 如申請專利範圍第26項所述的顯示元件,其中該第二電極完全覆蓋該第一通孔的通孔側壁。 The display element according to item 26 of the application, wherein the second electrode completely covers the through-hole sidewall of the first through-hole. 如申請專利範圍第30項所述的顯示元件,其中該第二電極完全覆蓋該第二通孔的通孔側壁。 The display element according to item 30 of the application, wherein the second electrode completely covers a sidewall of the through hole of the second through hole. 如申請專利範圍第26項所述的顯示元件,其中該源極、該汲極以及該訊號線為同一圖案化導電層。 The display element according to item 26 of the application, wherein the source electrode, the drain electrode, and the signal line are the same patterned conductive layer. 如申請專利範圍第32項所述的顯示元件,其中該畫素電極之至少一部份以及該訊號線實質上係位於該資料線以及另一資料線之間。 The display element according to item 32 of the scope of patent application, wherein at least a part of the pixel electrode and the signal line are substantially located between the data line and another data line. 如申請專利範圍第26項所述的顯示元件,其中該畫素電極以及該第二電極為同一圖案化導電層。 The display element according to item 26 of the application, wherein the pixel electrode and the second electrode are the same patterned conductive layer. 如申請專利範圍第26項所述的顯示元件,其中該第一絕緣層以及該第二絕緣層更共同具有一第三通孔,其中該畫素電極覆蓋該第三通孔,以使該汲極以及該畫素電極藉由該第三通孔電性連接。 The display element according to item 26 of the scope of patent application, wherein the first insulating layer and the second insulating layer more commonly have a third through hole, and the pixel electrode covers the third through hole so that the drain The electrode and the pixel electrode are electrically connected through the third through hole. 如申請專利範圍第26項所述的顯示元件,其中該第一通孔與另一主動元件重疊。 The display element according to item 26 of the application, wherein the first through hole overlaps with another active element. 如申請專利範圍第26項所述的顯示元件,其中該第一通孔與該訊號線重疊。 The display element according to item 26 of the application, wherein the first through hole overlaps the signal line. 一種顯示元件,包括:一基板;一訊號線,位於該基板上;一第一絕緣層,位於該訊號線上;一第一電極,位於該第一絕緣層上;一第二絕緣層,位於該第一電極以及該第一絕緣層上;以及一第二電極,位於該第二絕緣層上,其中該第二絕緣層具有一第一通孔,且該第一絕緣層以及該第二絕緣層共同具有一第二通孔,該訊號線以及該第一電極藉由該第一通孔、該第二通孔以及 該第二電極電性連接,其中該第一通孔與該訊號線重疊。 A display element includes: a substrate; a signal line on the substrate; a first insulation layer on the signal line; a first electrode on the first insulation layer; a second insulation layer on the substrate A first electrode and the first insulating layer; and a second electrode located on the second insulating layer, wherein the second insulating layer has a first through hole, and the first insulating layer and the second insulating layer There is a second through hole in common, the signal line and the first electrode pass through the first through hole, the second through hole and The second electrode is electrically connected, wherein the first through hole overlaps the signal line. 如申請專利範圍第38項所述的顯示元件,其中該第二通孔的尺寸大於該第一通孔的尺寸。 The display element as described in claim 38, wherein a size of the second through hole is larger than a size of the first through hole. 如申請專利範圍第38項所述的顯示元件,其中該第一通孔與該第二通孔彼此連接。 The display element according to item 38 of the application, wherein the first through hole and the second through hole are connected to each other. 如申請專利範圍第40項所述的顯示元件,其中該第二絕緣層更具有一第一輔助通孔與該第二通孔連接,其中該第二通孔位於該第一通孔與該第一輔助通孔之間,該訊號線以及該第一電極藉由該第一通孔、該第二通孔、該第一輔助通孔以及該第二電極電性連接。 According to the display element in claim 40, wherein the second insulating layer further has a first auxiliary through hole connected to the second through hole, and the second through hole is located between the first through hole and the first through hole. Between an auxiliary via, the signal line and the first electrode are electrically connected through the first via, the second via, the first auxiliary via, and the second electrode. 如申請專利範圍第38項所述的顯示元件,其中該第二電極完全覆蓋該第一通孔的通孔側壁。 The display element according to item 38 of the application, wherein the second electrode completely covers a through-hole sidewall of the first through-hole. 如申請專利範圍第42項所述的顯示元件,其中該第二電極完全覆蓋該第二通孔的通孔側壁。 The display element according to item 42 of the application, wherein the second electrode completely covers the sidewall of the through hole of the second through hole.
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