TWI617001B - Semiconductor device - Google Patents
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- TWI617001B TWI617001B TW102149178A TW102149178A TWI617001B TW I617001 B TWI617001 B TW I617001B TW 102149178 A TW102149178 A TW 102149178A TW 102149178 A TW102149178 A TW 102149178A TW I617001 B TWI617001 B TW I617001B
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Abstract
本發明之一實施例係關於一種半導體裝置,該半導體裝置包括:第一及第二電極,其分別包括沿相反方向在剖面上減小之第一及第二匯流條;及複數個交錯第一及第二導電指狀物,其分別自該等第一及第二匯流條延伸。 An embodiment of the present invention is directed to a semiconductor device including: first and second electrodes respectively including first and second bus bars that are reduced in cross section in opposite directions; and a plurality of interleaved first And second conductive fingers extending from the first and second bus bars, respectively.
Description
本發明之實施例係關於半導體裝置(「SD」)之結構。 Embodiments of the invention relate to the structure of a semiconductor device ("SD").
諸如二極體及場效應電晶體(「FET」)之各種SD可操作以選擇性地處於一接通或關斷狀態。SD可包括透過一介入半導體組件以導電方式可連接之一第一電極及一第二電極,該介入半導體組件在SD處於接通狀態時具有一相對低電阻且在SD處於關斷狀態時具有一相對高電阻。因此,SD能夠在處於接通狀態時而非處於關斷狀態時將一「接通電流」傳遞穿過第一及第二電極。舉例而言,在SD係經加正向偏壓之一個二極體之情況下,該二極體處於接通狀態且可操作以在第一電極(陽極)與第二電極(陰極)之間將接通電流傳遞穿過介入及經適當組態半導體組件。在另一實例中,在SD係一FET(其中一適當電壓施加至充當一閘極電極之一第三電極)之情況下,該FET可操作以在第一電極(源極)與第二電極(汲極)之間將接通電流傳遞穿過介入及經適當組態半導體組件。電極可形成於生長於基板上之一或多個磊晶層(「層」)上。應瞭解,形成或設置於基板「上」之一結構可形成於該等磊晶層中之一者上且並不與該基板本身直接接觸。此外,透過其傳遞接通電流之半導體組件可包含生長於該半導體基板上之該一或多個磊晶層之一部分,其中視需要適當組態該等層。為便於呈現,如本文中所使用,「半導體基板」或「基板」可包含該一或多個磊晶層。 Various SDs, such as diodes and field effect transistors ("FETs"), are operable to selectively be in an on or off state. The SD may include a first electrode and a second electrode electrically connected through an intervening semiconductor component, the intervening semiconductor component having a relatively low resistance when the SD is in an on state and having a state when the SD is in an off state Relatively high resistance. Therefore, the SD can transmit an "on current" through the first and second electrodes while in the on state rather than in the off state. For example, in the case where the SD system is biased by a diode, the diode is in an on state and is operable to be between the first electrode (anode) and the second electrode (cathode) The on current is passed through the intervening and appropriately configured semiconductor components. In another example, in the case of an SD-based FET in which a suitable voltage is applied to a third electrode that acts as one of the gate electrodes, the FET is operable to operate at the first electrode (source) and the second electrode The switching current is passed between the (drain) and the appropriately configured semiconductor components. The electrode can be formed on one or more epitaxial layers ("layers") grown on the substrate. It will be appreciated that a structure formed or disposed "on" the substrate can be formed on one of the epitaxial layers and is not in direct contact with the substrate itself. Moreover, the semiconductor component through which the on-current is delivered may comprise a portion of the one or more epitaxial layers grown on the semiconductor substrate, wherein the layers are suitably configured as needed. For ease of presentation, as used herein, a "semiconductor substrate" or "substrate" can include the one or more epitaxial layers.
隨著SD在大小上減小以達成具有較小晶粒面積之裝置及具有較小剖面之電路之較高濃度,穿過彼等電路之電流密度趨於增加。電流密度通常表達為(舉例而言)以單位安培/mm2之每剖面面積之電流。在SD中,電極形成為可具有實質上均勻厚度之經圖案化薄金屬層。此外,尤其在於高頻率下操作電流時,電流可優先發生於電極之表面處或附近。因此,在SD電路之上下文中可將電流密度表達為(舉例而言)以單位安培/mm2之每剖面寬度之電流。增加之電流密度趨於使SD由於歐姆過熱而易受損害影響。增加之電流密度亦可導致電遷移,其中電極之一部分由於自導電電子至電極之動量轉移而變位,最終引起電極之故障或失敗。另外,穿過SD之電流之不均勻分佈可減小一SD可安全傳遞之總體電流,此乃因不均勻性形成過高電流密度之溝袋。 As SD is reduced in size to achieve higher concentrations of devices with smaller die areas and circuits with smaller profiles, the current density across these circuits tends to increase. The current density is typically expressed as, for example, a current per unit area of unit amps/mm 2 . In SD, the electrode is formed as a patterned thin metal layer that can have a substantially uniform thickness. Furthermore, especially when operating current at high frequencies, current can occur preferentially at or near the surface of the electrode. Thus, the current density can be expressed in the context of an SD circuit as, for example, a current per section width in units of amps/mm 2 . The increased current density tends to make the SD susceptible to damage due to ohmic overheating. The increased current density can also result in electromigration, where one of the electrodes is displaced due to momentum transfer from the conducting electrons to the electrode, ultimately causing failure or failure of the electrode. In addition, the uneven distribution of current through the SD can reduce the overall current that an SD can safely transfer, which is due to the non-uniformity forming a pocket of excessive current density.
本發明之一實施例之一態樣係提供一種具有用於傳遞一接通電流之電極之SD(舉例而言,一個二極體或一FET),該等電極經組態以減輕電流密度沿著該接通電流之路徑之不均勻性。 An aspect of an embodiment of the present invention provides an SD (for example, a diode or a FET) having an electrode for delivering an on current, the electrodes being configured to mitigate current density along the edge The non-uniformity of the path of the on current.
根據本發明之一實施例,提供一種下文中稱作一「梳狀電極SD」之SD,該SD包含分別具有沿相反方向在剖面上減小之第一及第二匯流條之第一及第二「梳狀電極」。該等第一及第二梳狀電極進一步包括分別自該等第一及第二匯流條延伸之複數個第一及第二交錯導電指狀物。在該梳狀電極SD處於接通狀態時,該等第一及第二梳狀電極可透過其各別導電指狀物及介入半導體組件以導電方式連接,其中該等第一與第二導電指狀物之間的界面界定該等第一與第二導電指狀物之間的可用於電流之一周長。 According to an embodiment of the present invention, there is provided an SD hereinafter referred to as a "comb electrode SD", the SD comprising first and second first and second bus bars respectively reduced in cross section in opposite directions Two "comb electrodes". The first and second comb electrodes further include a plurality of first and second staggered conductive fingers extending from the first and second bus bars, respectively. When the comb electrodes SD are in an on state, the first and second comb electrodes are electrically connected through the respective conductive fingers and the intervening semiconductor components, wherein the first and second conductive fingers The interface between the objects defines a perimeter of the current available between the first and second conductive fingers.
該梳狀電極SD可操作以在該第一梳狀電極之一端子(「第一端子」)與該第二梳狀電極一端子(「第二端子」)之間傳遞一接通電流。取決於該梳狀電極SD之組態,該接通電流可自該第一端子流動至該 第二端子,或以其他方向自該第二端子流動至該第一端子。此外,穿過該等匯流條之該接通電流之量值在該電流在該等第一與第二導電指狀物之間轉移時可沿著該等各別匯流條之長度改變。根據本發明之一實施例,每一匯流條之剖面在其遠離其各別端子延伸時減小。在自該第一梳狀電極之該端子流動至該第二梳狀電極之該端子之該接通電流之上下文中,第一匯流條剖面相對於該接通電流之方向減小而陰極匯流條剖面相對於該接通電流之該方向增加。 The comb electrode SD is operable to transfer an on current between a terminal ("first terminal") of the first comb electrode and a terminal ("second terminal") of the second comb electrode. Depending on the configuration of the comb electrode SD, the turn-on current can flow from the first terminal to the The second terminal flows from the second terminal to the first terminal in other directions. Moreover, the magnitude of the turn-on current through the bus bars can vary along the length of the respective bus bars as the current is transferred between the first and second conductive fingers. In accordance with an embodiment of the invention, the cross-section of each bus bar decreases as it extends away from its respective terminal. In the context of the on current flowing from the terminal of the first comb electrode to the terminal of the second comb electrode, the first bus bar profile is reduced relative to the direction of the on current and the cathode bus bar The profile increases in this direction relative to the on current.
根據本發明之一實施例,該等第一及第二匯流條可經組態以減輕電流密度沿著該等匯流條之長度之改變,儘管總體電流發生改變。在本發明之特定實施例中,沿著匯流條之長度,匯流條剖面可與接通電流之該量值實質上成比例。在此一成比例組態中,可實質上消除電流密度沿著該等匯流條之長度之改變,儘管總體電流發生改變。在本發明之特定實施例中,該電流密度沿著該等匯流條之該長度可係實質上恆定的。 In accordance with an embodiment of the present invention, the first and second bus bars can be configured to mitigate changes in current density along the length of the bus bars, although the overall current changes. In a particular embodiment of the invention, the bus bar profile may be substantially proportional to the magnitude of the on current along the length of the bus bar. In this proportional configuration, the change in current density along the length of the bus bars can be substantially eliminated, although the overall current changes. In a particular embodiment of the invention, the current density can be substantially constant along the length of the bus bars.
在本發明之特定實施例中,在沿著該兩個匯流條之縱向軸之每一點處,該陽極匯流條之剖面與該陰極匯流條之剖面之總和保持實質上恆定。在本發明之特定實施例中,該等匯流條之剖面可以彼此成反比之一比率線性地改變。 In a particular embodiment of the invention, the sum of the cross-section of the anode bus bar and the cross-section of the cathode bus bar remains substantially constant at each point along the longitudinal axis of the two bus bars. In a particular embodiment of the invention, the profiles of the bus bars may vary linearly in inverse proportion to each other.
根據本發明之一實施例,面對彼此之該等第一及第二匯流條之側可彼此實質上平行。在本發明之特定實施例中,該等第一及第二匯流條可相對於彼此配置呈一凹槽中之舌組態,其中該等電極中之一者包括位於另一電極之一單個中心匯流條之兩側上且「環繞」該中心匯流條之兩個匯流條臂。視情況,該等第一及第二導電指狀物可彼此實質上平行。視情況,該等第一及第二導電指狀物可在該等第一與第二匯流條之間的介入空間中交錯。視情況,該等第一及第二導電指狀物可具有實質上相同長度。 According to an embodiment of the invention, the sides of the first and second bus bars facing each other may be substantially parallel to each other. In a particular embodiment of the invention, the first and second bus bars are configurable relative to one another in a tongue configuration in a recess, wherein one of the electrodes includes a single center at one of the other electrodes Two bus bar arms on both sides of the bus bar and "surrounding" the center bus bar. Optionally, the first and second electrically conductive fingers may be substantially parallel to each other. Optionally, the first and second conductive fingers may be staggered in the intervening space between the first and second bus bars. Optionally, the first and second conductive fingers can have substantially the same length.
根據本發明之一實施例,包含該等各別端子、匯流條及導電指狀物之該等第一及第二梳狀電極不重疊。在本發明之特定實施例中,該等第一及第二梳狀電極形成於半導體基板之一相同磊晶層上。 According to an embodiment of the invention, the first and second comb electrodes including the respective terminals, bus bars and conductive fingers do not overlap. In a particular embodiment of the invention, the first and second comb electrodes are formed on one of the same epitaxial layers of the semiconductor substrate.
根據本發明之一實施例,該梳狀電極SD可進一步包含一第三梳狀電極,該第三梳狀電極包括通常連接至自一第三端子延伸之一第三匯流條之複數個第三導電指狀物。該等第三導電指狀物經配置以使得每一第三導電指狀物設置於一個第一導電指狀物與一個第二導電指狀物之間。 According to an embodiment of the present invention, the comb electrode SD may further include a third comb electrode including a plurality of third portions that are generally connected to one of the third bus bars extending from a third terminal. Conductive fingers. The third conductive fingers are configured such that each third conductive finger is disposed between a first conductive finger and a second conductive finger.
根據本發明之一實施例,具有該等第一及第二梳狀電極之該梳狀電極SD可係一橫向二極體(「梳狀二極體」),其中該第一梳狀電極係一陽極且該第二梳狀電極係一陰極。另一選擇係,該梳狀電極SD可係進一步包含一閘極電極(可視情況為第三電極)之一橫向FET(「梳狀FET」),其中該第一梳狀電極係一源極,該第二電極係一汲極。 According to an embodiment of the invention, the comb electrode SD having the first and second comb electrodes may be a lateral diode ("comb diode"), wherein the first comb electrode system An anode and the second comb electrode is a cathode. Alternatively, the comb electrode SD may further comprise a lateral FET ("comb FET") of a gate electrode (which may be a third electrode), wherein the first comb electrode is a source, The second electrode is a drain.
在論述中,除非另有陳述,否則修改本發明之一實施例之一特徵或特徵之一條件或關係特性之諸如「實質上」、「相對」及「大約」之形容詞理解為意指該條件或特性界定於其意欲用於的一應用之實施例之操作可接受之容差內。除非另有指示,否則說明書及申請專利範圍中之詞「或」視為包含性「或」而非排他性「或」,且指示其結合之物項中之至少一者或任何組合。 In the discussion, unless stated otherwise, an adjective such as "substantially", "relative" and "about" which is a condition or characteristic of one of the features or features of an embodiment of the invention is understood to mean the condition. Or the characteristics are defined within tolerances acceptable for the operation of an embodiment of an application for which it is intended. The word "or" in the specification and claims is to be construed as an inclusive or "or" or "an"
提供本發明內容以按一簡化形式引入下文在實施方式中進一步闡述之概念之一選擇。本發明內容並不意欲識別所主張標的物之關鍵特徵或主要特徵,亦不意欲用以限制所主張標的物之範疇。 The Summary is provided to introduce a selection of concepts that are further described below in the Detailed Description. The summary is not intended to identify key features or features of the claimed subject matter, and is not intended to limit the scope of the claimed subject matter.
100‧‧‧例示性梳狀二極體/梳狀二極體 100‧‧‧Exemplified comb-shaped diode/comb diode
110‧‧‧半導體基板/基板 110‧‧‧Semiconductor substrate/substrate
120‧‧‧陽極/梳狀陽極 120‧‧‧Anode/Comb Anode
121‧‧‧陽極端子 121‧‧‧Anode terminal
122‧‧‧中心陽極匯流條/陽極匯流條/各別匯流條/匯流條 122‧‧‧Center anode bus bar / anode bus bar / individual bus bar / bus bar
124‧‧‧導電指狀物/陽極指狀物 124‧‧‧ Conductive fingers/anode fingers
130‧‧‧陰極/梳狀陰極 130‧‧‧Cathode/comb cathode
131‧‧‧陰極端子 131‧‧‧cathode terminal
132‧‧‧陰極匯流條/各別匯流條/匯流條 132‧‧‧Cathode bus bars/different bus bars/bus bars
134‧‧‧導電指狀物/陰極指狀物 134‧‧‧ Conductive fingers/cathode fingers
170‧‧‧替代梳狀二極體 170‧‧‧Alternative comb diode
200‧‧‧例示梳狀場效應電晶體/梳狀場效應電晶體 200‧‧‧Example of comb-like field effect transistor/comb field effect transistor
210‧‧‧半導體基板/基板 210‧‧‧Semiconductor substrate/substrate
212‧‧‧絕緣層 212‧‧‧Insulation
214‧‧‧溝渠 214‧‧‧ Ditch
220‧‧‧源極/梳狀源極 220‧‧‧Source/comb source
221‧‧‧源極端子 221‧‧‧ source terminal
222‧‧‧中心源極匯流條/源極匯流條/匯流條 222‧‧‧Center source bus bar/source bus bar/bus bar
224‧‧‧源極指狀物/導電指狀物 224‧‧‧Source finger/conductive finger
230‧‧‧汲極/梳狀汲極 230‧‧‧Bungee/comb bungee
231‧‧‧汲極端子 231‧‧‧汲 Extreme
232‧‧‧汲極匯流條/陰極匯流條/匯流條 232‧‧‧Bungy bus bar/cathode bus bar/bus bar
234‧‧‧導電指狀物/汲極指狀物 234‧‧‧Electrical fingers/bungee fingers
240‧‧‧閘極 240‧‧‧ gate
241‧‧‧汲極端子 241‧‧‧汲 Extreme
242‧‧‧閘極匯流條 242‧‧ ‧ gate bus bar
245‧‧‧突出脊柱/閘極接觸條 245‧‧ ‧ prominent spine/gate contact strip
244‧‧‧導電指狀物/閘極指狀物 244‧‧‧Electrical fingers/gate fingers
262‧‧‧空橋 262‧‧ ‧ empty bridge
270‧‧‧替代梳狀場效應電晶體 270‧‧‧Replaceable comb field effect transistor
下文參考續接此段落列示之本文附帶之各圖來闡述本發明之實施例之非限制實例。出現於一個以上圖中之相同結構、元件或部件通常用一相同編號在其中出現該等相同結構、元件或部件之所有圖中標 示。為方便及呈現之清晰度起見,挑選各圖中所展示之組件及特徵之尺寸且未必展示為按比例。 Non-limiting examples of embodiments of the invention are set forth below with reference to the accompanying drawings, which are incorporated herein by reference. The same structures, elements or components that are present in one or more of the figures are generally identified by the same reference numerals in the drawings. Show. For the sake of clarity and clarity of presentation, the dimensions of the components and features shown in the various figures are not necessarily to scale.
圖1在一俯視圖中示意性地展示根據本發明之一實施例之一梳狀二極體之陽極及陰極電極;圖2在一俯視圖中示意性地展示根據本發明之一實施例之一梳狀FET之源極、汲極及閘極電極;圖3在一俯視圖中示意性地展示根據本發明之一實施例之一替代梳狀二極體之電極;且圖4在一俯視圖中示意性地展示根據本發明之一實施例之一替代梳狀FET之電極。 1 schematically shows, in a top view, an anode and a cathode electrode of a comb diode according to an embodiment of the invention; FIG. 2 schematically shows a comb according to an embodiment of the invention in a top view. a source, a drain and a gate electrode of a FET; FIG. 3 schematically shows, in a top view, an electrode in place of a comb diode according to an embodiment of the invention; and FIG. 4 is schematically illustrated in a top view An electrode of a comb FET is replaced in accordance with one of the embodiments of the present invention.
在以下詳細說明中,在圖1中示意性地圖解說明且參考彼圖論述根據本發明之一實施例之一梳狀二極體之組件。在圖2中示意性地圖解說明且參考彼圖論述根據本發明之一實施例之一梳狀FET之組件。在圖3至圖4示意性地圖解說明且參考彼等圖論述一替代梳狀二極體及一替代梳狀FET。 In the following detailed description, an assembly of a comb diode according to an embodiment of the present invention is schematically illustrated in FIG. 1 and discussed with reference to the drawings. An assembly of a comb FET according to one embodiment of the present invention is schematically illustrated in FIG. 2 and discussed with reference to the drawings. An alternative comb diode and an alternative comb FET are schematically illustrated in Figures 3 through 4 and discussed with reference to the figures.
現在參考圖1,圖1展示具有形成於一半導體基板110上之一陽極120(「梳狀陽極」)及陰極130(「梳狀陰極」)之一例示性梳狀二極體100之一示意圖。基板110可視情況包括Si、SiC、GaAs或GaN。該基板可視情況係一分層基板,諸如在一Si上GaN晶圓基板或一SiC上GaN基板。梳狀陽極120包含以一「魚骨」組態自一中心陽極匯流條122之兩側中之每一者延伸之多個導電指狀物124(「陽極指狀物」)。梳狀陰極130包含呈一凹槽中之舌的組態之陽極匯流條122之兩側中之每一者上之兩個陰極匯流條132。多個導電指狀物134(「陰極指狀物」)自每一陰極匯流條132延伸且與陽極指狀物124交錯。梳狀陽極120進一步包含連接至陽極匯流條122之一個端之一陽極端子121且梳狀陰極 130進一步包含連接至陰極匯流條132之一個端之一陰極端子131。在給該梳狀二極體加正向偏壓時,梳狀二極體100可操作以在陽極指狀物124與陰極指狀物134之間將一「接通電流」傳遞穿過介入半導體基板中之一電流路徑。梳狀陽極120與梳狀陰極130不重疊或彼此不接觸。在本發明之特定實施例中,陽極指狀物124及陰極指狀物134可處於半導體基板110上之一相同磊晶層上。在如圖1中所展示之梳狀二極體100中,陽極指狀物124示意性地呈現為具有圓形端而陰極指狀物134示意性地呈現為具有有角端。製成此區別係促進在視覺上區分陽極與陰極指狀物,且並不意欲限制性。 Referring now to Figure 1, there is shown a schematic diagram of an exemplary comb diode 100 having an anode 120 ("comb anode") and a cathode 130 ("comb cathode") formed on a semiconductor substrate 110. . The substrate 110 may optionally include Si, SiC, GaAs or GaN. The substrate may optionally be a layered substrate such as a GaN wafer substrate on a Si or a GaN substrate on a SiC. The comb anode 120 includes a plurality of electrically conductive fingers 124 ("anode fingers") extending from each of the sides of a central anode bus bar 122 in a "fishbone" configuration. The comb cathode 130 includes two cathode bus bars 132 on each of the two sides of the configured anode bus bar 122 in the form of a tongue in a recess. A plurality of conductive fingers 134 ("cathode fingers") extend from each of the cathode bus bars 132 and are interleaved with the anode fingers 124. The comb anode 120 further includes an anode terminal 121 connected to one end of the anode bus bar 122 and a comb cathode 130 further includes a cathode terminal 131 connected to one of the ends of the cathode bus bar 132. When the comb diode is forward biased, the comb diode 100 is operable to pass an "on current" through the intervening semiconductor between the anode finger 124 and the cathode finger 134. One of the current paths in the substrate. The comb anodes 120 do not overlap with the comb cathodes 130 or are not in contact with each other. In a particular embodiment of the invention, anode fingers 124 and cathode fingers 134 can be on one of the same epitaxial layers on semiconductor substrate 110. In the comb diode 100 as shown in FIG. 1, the anode fingers 124 are schematically presented with rounded ends and the cathode fingers 134 are schematically presented with angled ends. Making this distinction promotes visual differentiation of the anode and cathode fingers and is not intended to be limiting.
梳狀陽極120及梳狀陰極130可視情況包括諸如鋁、金、銅、鎳或鈦或其一組合之金屬中之一或多者。該組合可呈合金之形式。另一選擇係,該組合可係不同金屬之多個層,該等金屬可係元素金屬或合金。在半導體基板上施加經圖案化金屬層之各種方法為在此項技術中已知。 The comb anode 120 and the comb cathode 130 may optionally include one or more of metals such as aluminum, gold, copper, nickel or titanium or a combination thereof. The combination can be in the form of an alloy. Alternatively, the combination can be a plurality of layers of different metals that can be elemental metals or alloys. Various methods of applying a patterned metal layer on a semiconductor substrate are known in the art.
藉由慣例方式,在給梳狀二極體100加正向偏壓時,接通電流自陽極端子121流動至陰極端子131。該接通電流自陽極端子121進入該梳狀二極體,行進穿過陽極匯流條122,進入陽極指狀物124且穿過半導體基板110之介入部分轉移至毗鄰陰極指狀物134,且繼續穿過陰極匯流條132至陰極端子131。陽極指狀物與陰極指狀物之交錯配置形成陽極120與陰極130之間的可用於電流之一大總周長。 By a conventional manner, when the comb diode 100 is forward biased, the on current flows from the anode terminal 121 to the cathode terminal 131. The turn-on current enters the comb diode from the anode terminal 121, travels through the anode bus bar 122, enters the anode finger 124 and passes through the intervening portion of the semiconductor substrate 110 to the adjacent cathode finger 134, and continues It passes through the cathode bus bar 132 to the cathode terminal 131. The staggered configuration of the anode fingers and the cathode fingers forms a large total circumference available for the current between the anode 120 and the cathode 130.
圖1中所展示之變化大小之白色方塊箭頭示意性地展示穿過梳狀二極體100之不同電極匯流條之接通電流之方向及量值,且小填充箭頭示意性地展示穿過電極指狀物之接通電流之方向及量值。白色方塊箭頭之不同大小反映接通電流在行進穿過該等匯流條時之量值之改變。如藉由白色方塊箭頭所指示,穿過陽極匯流條122之接通電流沿著其長度自陽極端子121開始減小,此乃因更多接通電流自陽極匯流 條122轉向穿過交錯導電指狀物至陰極。藉由白色方塊箭頭之大小同時地並如示意性地指示,穿過陰極匯流條132之接通電流沿著其長度朝向陰極端子131增加,此乃因更多接通電流自陽極匯流條122穿過交錯導電指狀物進入陰極匯流條132。如藉由相同小填充箭頭所指示,穿過每一導電指狀物124、134之接通電流可具有實質上相同量值。 The varying white square arrows shown in Figure 1 schematically show the direction and magnitude of the turn-on current through the different electrode bus bars of the comb diode 100, and the small fill arrows schematically show through the electrodes The direction and magnitude of the on current of the finger. The different sizes of the white square arrows reflect the change in the magnitude of the turn-on current as it travels through the bus bars. As indicated by the white square arrows, the turn-on current through the anode bus bar 122 decreases from the anode terminal 121 along its length, as more on current flows from the anode. Strip 122 is turned through the staggered conductive fingers to the cathode. Simultaneously and as indicated schematically by the size of the white square arrow, the turn-on current through the cathode bus bar 132 increases along its length towards the cathode terminal 131, since more turn-on current is drawn from the anode bus bar 122. The staggered conductive fingers enter the cathode bus bar 132. The turn-on current through each of the conductive fingers 124, 134 can have substantially the same magnitude as indicated by the same small fill arrows.
根據本發明之一實施例,第一及第二匯流條沿相反方向在剖面上減小。沿著電流路徑,距陽極端子之距離與距陰極端子之距離成反比。亦即,隨著接通電流遠離陽極端子流動,該接通電流朝向陰極端子流動。因此,根據本發明之一實施例,每一匯流條之剖面隨著其遠離其各別端子延伸而減小。在自陽極端子流動至陰極端子之接通電流之慣例中,陽極匯流條剖面相對於接通電流之方向而減小而陰極匯流條剖面相對於接通電流之方向而增加。 According to an embodiment of the invention, the first and second bus bars are reduced in cross section in opposite directions. Along the current path, the distance from the anode terminal is inversely proportional to the distance from the cathode terminal. That is, as the on current flows away from the anode terminal, the on current flows toward the cathode terminal. Thus, in accordance with an embodiment of the present invention, the cross-section of each bus bar decreases as it extends away from its respective terminals. In the practice of switching the current from the anode terminal to the cathode terminal, the anode bus bar profile decreases relative to the direction of the on current and the cathode bus bar profile increases relative to the direction of the on current.
根據本發明之一實施例,每一匯流條可經塑形以沿著其長度改變其剖面以具有與接通電流之量值實質上成比例之剖面。此成比例組態用於減小電流密度沿著匯流條之長度之改變,儘管總體電流發生改變。沿著陽極匯流條之長度與接通電流量值之減少相協調地減少陽極匯流條剖面用於穩定沿著陽極匯流條之長度之電流密度。類似地,沿著陰極匯流條之長度與接通電流之增加相協調地增加陰極匯流條之剖面用於穩定沿著陰極匯流條之長度之電流密度。在本發明之特定實施例中,該電流密度沿著該等匯流條之該長度可係實質上恆定的。 In accordance with an embodiment of the present invention, each bus bar can be shaped to change its profile along its length to have a profile that is substantially proportional to the magnitude of the on current. This proportional configuration is used to reduce the change in current density along the length of the bus bar, although the overall current changes. The anode bus bar profile is reduced in accordance with the length of the anode bus bar in accordance with the decrease in the amount of turn-on current for stabilizing the current density along the length of the anode bus bar. Similarly, the profile of the cathode bus bar is increased in accordance with the increase in the length of the cathode bus bar in accordance with the increase in the on current for stabilizing the current density along the length of the cathode bus bar. In a particular embodiment of the invention, the current density can be substantially constant along the length of the bus bars.
電流在沿著匯流條之每一點處之改變可取決於穿過導電指狀物之電流之量值。因此,在本發明之特定實施例中,每一匯流條之形狀可取決於導電指狀物之電阻及該等導電指狀物沿著該等匯流條之分佈。 The change in current at each point along the bus bar may depend on the magnitude of the current through the conductive fingers. Thus, in a particular embodiment of the invention, the shape of each bus bar may depend on the resistance of the conductive fingers and the distribution of the conductive fingers along the bus bars.
剖面之改變可為漸變的。另一選擇係,可(舉例而言)在每一導電指狀物之前、之處或之後以一逐步方式進行剖面之改變。在本發明之 特定實施例中,剖面之改變實質上為線性的。 The change in profile can be gradual. Alternatively, the profile change can be made, for example, in a stepwise manner before, during or after each conductive finger. In the invention In a particular embodiment, the change in profile is substantially linear.
在本發明之特定實施例中,第一及第二匯流條沿著其各別長度之剖面之改變係藉由在匯流條之厚度保持實質上恆定的同時匯流條之寬度之一改變來完成。在電極在半導體基板110上形成為實質上均勻厚度之經圖案化薄金屬層之情況下,匯流條剖面之此一基於寬度之改變係有利的。此外,在接通電流具有一高頻率之情況下,匯流條剖面之基於寬度之改變係有利的。在高電流頻率下,電流趨於發生於電極之表面處或附近,且與增加電極寬度相比增加電極厚度在減小電流密度上不太有效。 In a particular embodiment of the invention, the change in the profile of the first and second bus bars along their respective lengths is accomplished by varying one of the widths of the bus bars while the thickness of the bus bars remains substantially constant. In the case where the electrode is formed as a patterned thin metal layer of substantially uniform thickness on the semiconductor substrate 110, such a change in the width of the bus bar profile is advantageous. Furthermore, the change in width of the bus bar profile is advantageous in the case where the turn-on current has a high frequency. At high current frequencies, current tends to occur at or near the surface of the electrode, and increasing electrode thickness is less effective at reducing current density than increasing electrode width.
如本發明之一實施例中所提供,使陽極及陰極匯流條在寬度上減小之梳狀二極體100可有利地覆蓋一較小表面積且與具有恆定寬度之匯流條之一習用橫向二極體相比允許每晶圓製作更多二極體。如上文所論述,沿著匯流條之總電流朝向各別端子為最高,且梳狀二極體100之匯流條之寬度在其最接近其各別端子之處為相應地最寬。一原本類似經組態之習用二極體之恆定寬度之匯流條需要與梳狀二極體100之減小寬度之匯流條之最寬部分相同之寬度以便具有一相當的電流容量及最大電流密度。因此,如本發明之一實施例中所提供,梳狀二極體100之減小寬度之匯流條佔據一相對較小表面積。因此,梳狀二極體100整體上可佔據一較小表面積。另一選擇係,佔據與梳狀二極體100相同之總表面積的具有恆定寬度之匯流條之一習用二極體可需要縮短陽極及陰極指狀物以便適應由恆定寬度之匯流條所佔據之較大表面積,因此導致該習用二極體由於陽極與陰極之間的可用於電流之一較小總周長而具有一較高接通電流電阻。 As provided in an embodiment of the present invention, the comb diode 100 having the anode and cathode bus bars reduced in width may advantageously cover a smaller surface area and one of the bus bars having a constant width. The polar body allows more diodes to be fabricated per wafer. As discussed above, the total current along the bus bars is highest toward the respective terminals, and the width of the bus bars of the comb diode 100 is correspondingly the widest at its closest to its respective terminals. A bus bar of a constant width similar to a conventional diode configured to be configured needs to have the same width as the widest portion of the reduced width bus bar of the comb diode 100 to have a comparable current capacity and maximum current density. . Thus, as provided in an embodiment of the invention, the reduced width bus bars of the comb diode 100 occupy a relatively small surface area. Therefore, the comb diode 100 as a whole can occupy a small surface area. Alternatively, one of the bus bars having a constant width that occupies the same total surface area as the comb diode 100 may require the anode and cathode fingers to be shortened to accommodate the constant width of the bus bar. The larger surface area, thus resulting in the conventional diode having a higher on-current resistance due to the smaller total circumference of one of the available currents between the anode and the cathode.
在本發明之特定實施例中,每一陽極指狀物124彼此實質上平行且每一陰極指狀物134彼此實質上平行。視情況,導電指狀物可以一實質上垂直角度連接至其各別匯流條。視情況,陽極指狀物124實質 上平行於陰極指狀物134。視情況,面對彼此之陽極匯流條122及陰極匯流條132之側可彼此實質上平行。 In a particular embodiment of the invention, each anode finger 124 is substantially parallel to each other and each cathode finger 134 is substantially parallel to each other. Optionally, the conductive fingers can be connected to their respective bus bars at a substantially vertical angle. Depending on the situation, the anode fingers 124 are substantially It is parallel to the cathode fingers 134. Optionally, the sides of the anode bus bar 122 and the cathode bus bar 132 facing each other may be substantially parallel to each other.
根據本發明之一實施例,每一導電指狀物可在大小及形狀上實質上相同。每一導電指狀物可進一步在組合上實質上相同。在每一導電指狀物在大小、形狀及組合上實質上相同之情況下,每一指狀物之電阻亦通常實質上相同。 According to one embodiment of the invention, each of the electrically conductive fingers can be substantially identical in size and shape. Each of the electrically conductive fingers can be further substantially identical in combination. In the case where each of the conductive fingers is substantially identical in size, shape and combination, the electrical resistance of each of the fingers is also generally substantially the same.
在圖1之例示性梳狀二極體中,導電指狀物124、134之尺寸實質上相等,穿過每一導電指狀物之接通電流實質上相等(如藉由相同小填充箭頭所指示),且導電指狀物124、134以規則間隔自其各別匯流條122、132延伸。在導電指狀物之此一組態中,穿過陽極匯流條122之電流沿著其長度以一實質上線性方式與距陽極端子121之距離成比例地減小。類似地,穿過陰極匯流條132之電流沿著其長度以一實質上線性方式與距陰極端子131之距離成比例地減小。換言之,陽極匯流條剖面相對於接通電流之方向實質上線性地減小而陰極匯流條剖面相對於接通電流之方向實質上線性地增加。根據本發明之一實施例,沿著匯流條之長度以實質上相等於接通電流之量值之改變的一比率線性地改變匯流條122、132之寬度用於減輕或實質上消除電流密度沿著陽極及陰極匯流條之長度之改變。在本發明之特定實施例中,陽極及陰極匯流條中之電流密度沿著匯流條之長度實質上均勻地分佈且實質上恆定。 In the exemplary comb diode of FIG. 1, the conductive fingers 124, 134 are substantially equal in size, and the turn-on current through each of the conductive fingers is substantially equal (eg, by the same small fill arrow) Indicative), and the conductive fingers 124, 134 extend from their respective bus bars 122, 132 at regular intervals. In this configuration of conductive fingers, the current through the anode bus bar 122 decreases along its length in a substantially linear manner proportional to the distance from the anode terminal 121. Similarly, the current through the cathode bus bar 132 decreases along its length in a substantially linear manner proportional to the distance from the cathode terminal 131. In other words, the anode bus bar profile decreases substantially linearly with respect to the direction of the on current and the cathode bus bar profile increases substantially linearly with respect to the direction of the on current. According to an embodiment of the invention, the width of the bus bars 122, 132 is linearly varied along a length of the bus bar at a ratio substantially equal to the change in magnitude of the on current for mitigating or substantially eliminating current density along the length of the bus bar The change in the length of the anode and cathode bus bars. In a particular embodiment of the invention, the current density in the anode and cathode bus bars is substantially evenly distributed along the length of the bus bar and is substantially constant.
此外,在圖1之例示性梳狀二極體100中,陽極匯流條122平行於陰極匯流條132且導電指狀物124、134自其各別匯流條垂直地延伸。此外,所有導電指狀物124、134彼此實質上平行。根據本發明之一實施例,在此一組態中,陽極及陰極匯流條在沿著該等匯流條之各別長度之每一點處之經組合寬度保持實質上恆定。 Moreover, in the exemplary comb diode 100 of FIG. 1, the anode bus bar 122 is parallel to the cathode bus bar 132 and the conductive fingers 124, 134 extend perpendicularly from their respective bus bars. Moreover, all of the conductive fingers 124, 134 are substantially parallel to one another. In accordance with an embodiment of the present invention, in this configuration, the anode and cathode bus bars remain substantially constant over the combined width at each of the respective lengths of the bus bars.
在梳狀二極體之一替代組態中,接通電流可沿相反方向流動,其中梳狀陽極120充當陰極且梳狀陰極130充當陽極,且其中半導體基 板110經適當地組態。 In an alternative configuration of the comb diode, the turn-on current can flow in the opposite direction, wherein the comb anode 120 acts as a cathode and the comb cathode 130 acts as an anode, and wherein the semiconductor base The board 110 is suitably configured.
梳狀陽極120及梳狀陰極130亦可有利地併入於一橫向FET而非一橫向二極體中。相對於圖2進一步詳細地闡述併入有與梳狀陽極120實質上相同之一源極及與梳狀陰極130實質上相同之一汲極之一例示性橫向FET。 The comb anode 120 and the comb cathode 130 can also be advantageously incorporated into a lateral FET rather than a lateral diode. An exemplary lateral FET incorporating one of the sources substantially identical to the comb anode 120 and one of the drains substantially identical to the comb cathode 130 is illustrated in greater detail with respect to FIG.
現在參考圖2,圖2展示具有形成於一半導體基板210上之一源極220(「梳狀源極」)及汲極230(「梳狀汲極」)之一例示性梳狀FET 200之一示意圖。梳狀源極220在結構上與梳狀陽極120實質上相同,具有以一「魚骨」組態自一中心源極匯流條222之兩側中之每一者延伸之多個導電指狀物224(「源極指狀物」),及連接至源極匯流條222之一端之一源極端子221。梳狀汲極230在結構上與梳狀陰極130實質上相同,具有呈一凹槽中之舌的組態之源極匯流條222之兩側中之每一者上之兩個汲極匯流條232,其中導電指狀物234(「汲極指狀物」)自汲極匯流條232中之每一者延伸,及連接至汲極匯流條232之一端之一汲極端子231。匯流條222、232分別具有與上文相對於匯流條122、132所闡述之組態及性質相同之組態及性質。 Referring now to FIG. 2, FIG. 2 shows an exemplary comb FET 200 having a source 220 ("comb source") and a drain 230 ("comb") formed on a semiconductor substrate 210. A schematic diagram. The comb source 220 is substantially identical in construction to the comb anode 120 and has a plurality of conductive fingers extending from each of the two sides of a central source bus bar 222 in a "fishbone" configuration. 224 ("source finger"), and one source terminal 221 connected to one end of the source bus bar 222. The comb-shaped drain 230 is substantially identical in construction to the comb-shaped cathode 130 and has two drain bus bars on each of the two sides of the source bus bar 222 in the configuration of a tongue in a recess. 232, wherein the conductive fingers 234 ("dual pole fingers") extend from each of the drain bus bars 232 and are connected to one of the terminals 231 of one of the drain bus bars 232. The bus bars 222, 232 have the same configuration and properties as described above with respect to the bus bars 122, 132, respectively.
梳狀FET 200可進一步包含一閘極240(「梳狀閘極」),該閘極包含源極匯流條222之兩側中之每一者上之兩個閘極匯流條242,及連接至汲極匯流條242之一端之一汲極端子241。多個導電指狀物244(「閘極指狀物」)自閘極匯流條242中之每一者延伸。閘極指狀物244經配置以使得每一閘極指狀物244設置於一個源極指狀物224與一個汲極指狀物234之間。 The comb FET 200 can further include a gate 240 ("comb gate") including two gate bus bars 242 on each of the two sides of the source bus bar 222, and connected to One of the ends of the buckering bus bar 242 is the terminal 241. A plurality of conductive fingers 244 ("gate fingers") extend from each of the gate bus bars 242. Gate fingers 244 are configured such that each gate finger 244 is disposed between a source finger 224 and a drain finger 234.
在圖2之插圖中較詳細地展示閘極指狀物244與源極指狀物224及汲極指狀物234在基板210上之配置。根據本發明之一實施例,閘極指狀物244與源極指狀物224及汲極指狀物234分離且不接觸。閘極指狀物244視情況經設置為距源極指狀物224比距汲極指狀物234更近。在本發明之特定實施例中,閘極指狀物244設置於半導體基板210之一絕 緣層212上。閘極指狀物244視情況經塑形為包含一突出脊柱(「閘極接觸條」)245之一「洋菇式閘極」(亦稱作一「T形閘極」),該突出脊柱窄於該閘極指狀物之主體且沿著其縱向軸延續。閘極指狀物244透過閘極接觸條245視情況與絕緣層212接觸。基板210及絕緣層212視情況經組態以形成溝渠214,且閘極接觸條245視情況設置於溝渠214內。 The arrangement of gate fingers 244 and source fingers 224 and drain fingers 234 on substrate 210 is shown in greater detail in the inset of FIG. In accordance with an embodiment of the invention, the gate fingers 244 are separated from the source fingers 224 and the drain fingers 234 and are not in contact. The gate fingers 244 are optionally disposed closer to the source fingers 224 than to the drain fingers 234. In a particular embodiment of the invention, the gate fingers 244 are disposed on one of the semiconductor substrates 210. On the edge layer 212. The gate finger 244 is shaped to include a protruding spine ("gate contact strip") 245, one of which is "the mushroom type gate" (also referred to as a "T-shaped gate"), which protrudes from the spine. It is narrower than the body of the gate finger and continues along its longitudinal axis. Gate fingers 244 are in contact with insulating layer 212 via gate contact strips 245 as appropriate. Substrate 210 and insulating layer 212 are optionally configured to form trenches 214, and gate contact strips 245 are disposed within trenches 214 as appropriate.
在一適當電壓被施加至閘極指狀物時,梳狀FET 200能夠在源極指狀物224與汲極指狀物234之間將「接通電流」傳遞穿過介入半導體基板中之一電流路徑。 When an appropriate voltage is applied to the gate fingers, the comb FET 200 can pass an "on current" between the source fingers 224 and the drain fingers 234 through one of the interposing semiconductor substrates. Current path.
根據本發明之一實施例,接近於源極匯流條222之源極指狀物224之基底部分與閘極匯流條242重合。包含與該閘極匯流條重疊之至少該部分之源極指狀物224之基底部分可包括一空橋262,該空橋在該閘極匯流條與源極指狀物之基底部分之間提供一間隙以使得兩個電極在不接觸之情況下重疊。視情況,源極指狀物224之基底部分可關於閘極匯流條242(未展示)較高或較低。視情況,空橋262薄於源極指狀物224之剩餘部分以便在源極指狀物與閘極匯流條(未展示)之間提供間隙,且亦可寬於源極指狀物之剩餘部分以便減輕源極指狀物剖面之減小且因此穩定空橋處之電流密度。源極指狀物基底部分與閘極匯流條之重疊但不接觸部分可由一絕緣結構(未展示)分離。 In accordance with an embodiment of the present invention, the base portion of the source fingers 224 proximate to the source bus bar 222 coincides with the gate bus bar 242. A base portion of the source fingers 224 including at least the portion overlapping the gate bus bar can include an empty bridge 262 that provides a gap between the gate bus bar and the base portion of the source fingers The gap is such that the two electrodes overlap without contact. Optionally, the base portion of the source fingers 224 can be higher or lower with respect to the gate bus bar 242 (not shown). Optionally, the empty bridge 262 is thinner than the remainder of the source fingers 224 to provide clearance between the source fingers and the gate bus bars (not shown) and may also be wider than the remainder of the source fingers Partially to mitigate the reduction in the profile of the source fingers and thus stabilize the current density at the bridge. The overlap of the base finger base portion with the gate bus bar but the non-contact portion may be separated by an insulating structure (not shown).
梳狀二極體100具有反射對稱性,其中對稱軸等效於陽極匯流條122之縱向軸。本發明之一實施例之一態樣亦可提供一不對稱梳狀二極體。在圖3中展示一例示性不對稱梳狀二極體,圖3示意性地圖解說明包括梳狀二極體100在其對稱軸之一側上之實質上一半之一替代梳狀二極體170。 The comb diode 100 has a reflection symmetry in which the axis of symmetry is equivalent to the longitudinal axis of the anode bus bar 122. An aspect of an embodiment of the present invention may also provide an asymmetric comb diode. An exemplary asymmetric comb diode is shown in FIG. 3, and FIG. 3 schematically illustrates the replacement of a comb diode including one half of the comb diode 100 on one side of its axis of symmetry. 170.
梳狀FET 200亦具有反射對稱性,其中對稱軸等效於源極匯流條222之縱向軸。本發明之一實施例之一態樣亦可提供一不對稱梳狀 FET。在圖4中展示一例示性不對稱梳狀FET,圖4示意性地圖解說明包括梳狀FET 200在其對稱軸之一側上之實質上一半之一替代梳狀FET 270。 The comb FET 200 also has reflection symmetry, wherein the axis of symmetry is equivalent to the longitudinal axis of the source bus bar 222. An aspect of an embodiment of the present invention may also provide an asymmetric comb FET. An exemplary asymmetric comb FET is shown in FIG. 4, which schematically illustrates the replacement of comb FET 270 by one half of comb FET 200 on one side of its axis of symmetry.
在本申請案之說明及申請專利範圍中,動詞中之每一者「包括」、「包含」及「具有」以及其同源詞用以指示動詞之賓語或若干賓語未必係動詞之主語或若干主語之組件、元件或部件之一完整清單。 In the description of the present application and the scope of the patent application, each of the verbs "including", "including" and "having" and its cognates are used to indicate the verb's object or several objects that are not necessarily the subject or verbs of the verb. A complete list of the components, components, or components of the subject.
本申請案中之本發明之實施例之說明係藉由實例方式提供且並不意欲限制本發明之範疇。所闡述實施例包括不同特徵,在本發明之所有實施例中並非需要所有該等特徵。某些實施例僅利用該等特徵中之某些特徵或該等特徵之可能組合。所闡述之本發明之實施例及包括該等所闡述之實施例中所述之不同組合之特徵之本發明之實施例的變化形式將發生於熟習此項技術者。本發明之範疇僅限於申請專利範圍。 The description of the embodiments of the present invention in this application is by way of example and is not intended to limit the scope of the invention. The illustrated embodiments include various features that are not required in all embodiments of the invention. Some embodiments utilize only some of these features or possible combinations of such features. Variations of the embodiments of the invention as set forth in the Detailed Description of the Invention and the features of the various combinations described in the embodiments described herein will occur to those skilled in the art. The scope of the invention is limited to the scope of the patent application.
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