TWI614134B - Optical film, method of manufacturing the same, and backlight unit and display device including the optical film - Google Patents

Optical film, method of manufacturing the same, and backlight unit and display device including the optical film Download PDF

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TWI614134B
TWI614134B TW105107445A TW105107445A TWI614134B TW I614134 B TWI614134 B TW I614134B TW 105107445 A TW105107445 A TW 105107445A TW 105107445 A TW105107445 A TW 105107445A TW I614134 B TWI614134 B TW I614134B
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polymer
optical film
barrier layer
layer
film according
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TW201641284A (en
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李大圭
金補宣
李垠和
李俊雨
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三星Sdi 股份有限公司
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/28Layered products comprising a layer of synthetic resin comprising synthetic resins not wholly covered by any one of the sub-groups B32B27/30 - B32B27/42
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors

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  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Laminated Bodies (AREA)
  • Optical Filters (AREA)
  • Planar Illumination Modules (AREA)

Abstract

本文中揭露一種光學膜、其製造方法及含有光學膜的背 光單元和顯示裝置。所述光學膜包括:芯層,包含第一聚合物及散佈於所述第一聚合物中的多個量子點;以及有機/無機障壁層,包括至少一個無機障壁層及至少一個有機障壁層,且安置於所述芯層上;其中包含第二聚合物的聚合物層安置於以下中的至少一者處:所述芯層與所述有機/無機障壁層之間、以及所述有機/無機障壁層的外表面上。 An optical film, a manufacturing method thereof, and a back containing the optical film are disclosed herein. Light unit and display device. The optical film includes: a core layer including a first polymer and a plurality of quantum dots dispersed in the first polymer; and an organic / inorganic barrier layer including at least one inorganic barrier layer and at least one organic barrier layer, And is disposed on the core layer; a polymer layer including a second polymer therein is disposed at least one of the following: between the core layer and the organic / inorganic barrier layer, and the organic / inorganic On the outer surface of the barrier layer.

Description

光學膜、其製造方法及含有光學膜的背光單元 和顯示裝置 Optical film, manufacturing method thereof, and backlight unit containing the same And display

本發明揭露一種光學膜、其製造方法及含有光學膜的背光單元和顯示裝置。 The invention discloses an optical film, a manufacturing method thereof, a backlight unit and a display device containing the optical film.

與使用自發光來形成影像的電漿顯示面板(plasma display panel,PDP)及場發射顯示器(field emission display,FED)不同,液晶顯示器(liquid crystal display,LCD)裝置是藉由接收外部光而形成影像。因此,LCD裝置需要背光單元(backlight unit,BLU),以對LCD裝置的後表面發射光。 And plasma display panels that use self-luminescence to form images A display panel (PDP) is different from a field emission display (FED). A liquid crystal display (LCD) device forms an image by receiving external light. Therefore, the LCD device requires a backlight unit (BLU) to emit light to the rear surface of the LCD device.

就LCD裝置的背光單元而言,已使用冷陰極螢光燈(cold cathode fluorescent lamp,CCFL)作為光源。然而,使用CCFL作為光源可能難以確保均勻的照度,且當LCD裝置具有較大的螢幕時,色純度(color purity)可能劣化。 As for the backlight unit of the LCD device, a cold cathode fluorescent lamp (cold cathode fluorescent lamp (CCFL) as the light source. However, it may be difficult to ensure uniform illuminance using CCFL as a light source, and when the LCD device has a large screen, color purity may deteriorate.

因此,近來已開發出使用三色發光二極體(light emitting diode,LED)作為光源的背光單元。由於使用三色LED作為光源的背光單元會產生提高的色純度,因此相較於使用CCFL的背光單元,其用於例如高品質的顯示裝置。然而,使用三色LED作為光源的背光單元較使用CCFL作為光源的背光單元的成本高。為減輕此問題,已提出藉由將自單色LED晶片輸出的光轉換成白光而發射光的白光LED。 Therefore, the use of three-color light emitting diodes has recently been developed. diode (LED) as the backlight unit of the light source. Since a backlight unit using a tri-color LED as a light source produces improved color purity, it is used in, for example, a high-quality display device compared to a backlight unit using a CCFL. However, a backlight unit using a tri-color LED as a light source is more expensive than a backlight unit using a CCFL as a light source. To alleviate this problem, a white light LED that emits light by converting light output from a monochromatic LED chip into white light has been proposed.

儘管白光LED不似三色LED般昂貴,然而相較於包含三色LED的LCD裝置的色純度及色再現性(color reproducibility),色純度及色再現性有所降低。因此,已作出各種嘗試來開發能夠既維持價格競爭力又提高色純度及色再現性的包含量子點(quantum dot)的背光單元。 Although white light LEDs are not as expensive as tri-color LEDs, they have a lower color purity and color reproducibility than LCD devices that include tri-color LEDs. Therefore, various attempts have been made to develop a backlight unit including a quantum dot capable of maintaining color competitiveness while improving color purity and color reproducibility.

量子點極易被氧氣等損壞,且包含量子點的光學膜包括障壁層。此障壁層是藉由以下方式製造而成:在基板上沈積無機氧化物或在塗佈無機氧化物前驅物之後執行溶膠-凝膠製程(sol-gel process),以形成無機氧化物層。然而,所述沈積製程耗時長且需要昂貴的設備,且因此不經濟,而所述溶膠-凝膠製程需要高溫固化,且因此不適於塑膠基板。因此,需要開發包含能夠確保極佳障壁特性的障壁層的光學膜。 The quantum dots are easily damaged by oxygen and the like, and the optical film containing the quantum dots includes a barrier layer. The barrier layer is manufactured by depositing an inorganic oxide on a substrate or performing a sol-gel process after coating an inorganic oxide precursor to form an inorganic oxide layer. However, the deposition process is time consuming and requires expensive equipment, and is therefore uneconomical, and the sol-gel process requires high temperature curing, and is therefore not suitable for plastic substrates. Therefore, it is necessary to develop an optical film including a barrier layer capable of securing excellent barrier characteristics.

一個實施例提供一種在不降低光學性質的同時具有改良的水份及氣體阻隔性質的光學膜。 One embodiment provides an optical film having improved moisture and gas barrier properties without reducing optical properties.

另一實施例提供一種製造所述光學膜的方法。 Another embodiment provides a method of manufacturing the optical film.

又一實施例提供包含所述光學膜的背光單元和顯示裝置。 Yet another embodiment provides a backlight unit and a display device including the optical film.

根據一個實施例,一種光學膜包括:芯層,包含第一聚合物及散佈於所述第一聚合物中的多個量子點;有機/無機障壁層,包括至少一個無機障壁層及至少一個有機障壁層,且安置於所述芯層上;以及聚合物層,包含第二聚合物,其中所述聚合物層安置於以下中的至少一者處:所述芯層與所述有機/無機障壁層之間、以及所述有機/無機障壁層的外表面上。 According to one embodiment, an optical film includes a core layer including a first polymer and a plurality of quantum dots dispersed in the first polymer; an organic / inorganic barrier layer including at least one inorganic barrier layer and at least one organic A barrier layer and disposed on the core layer; and a polymer layer including a second polymer, wherein the polymer layer is disposed at at least one of: the core layer and the organic / inorganic barrier Between layers, and on the outer surface of the organic / inorganic barrier layer.

在一個實施例中,所述至少一個無機障壁層安置於所述芯層上,所述至少一個無機障壁層安置於所述至少一個有機障壁層上;且包含第二聚合物的所述聚合物層安置於所述芯層的兩側上。 In one embodiment, the at least one inorganic barrier layer is disposed on the core layer, the at least one inorganic barrier layer is disposed on the at least one organic barrier layer; and the polymer including a second polymer Layers are placed on both sides of the core layer.

在一個實例中,包含第二聚合物的所述聚合物層安置於所述芯層的兩側上,所述至少一個無機障壁層安置於所述聚合物層上,且所述至少一個有機障壁層安置於所述至少一個無機障壁層上。 In one example, the polymer layer including a second polymer is disposed on both sides of the core layer, the at least one inorganic barrier layer is disposed on the polymer layer, and the at least one organic barrier A layer is disposed on the at least one inorganic barrier layer.

在一個實施例中,包含第二聚合物的所述聚合物層安置於所述芯層的兩側上,所述至少一個有機障壁層安置於所述聚合物層上,且所述至少一個無機障壁層安置於所述至少一個有機障壁層上。 In one embodiment, the polymer layer including a second polymer is disposed on both sides of the core layer, the at least one organic barrier layer is disposed on the polymer layer, and the at least one inorganic layer A barrier layer is disposed on the at least one organic barrier layer.

在一個實施例中,所述第一聚合物可包含矽酮樹脂、環氧樹脂、(甲基)丙烯酸酯系樹脂、聚碳酸酯、聚苯乙烯、聚烯烴、或其組合,且所述量子點可選自II-VI族化合物、III-V族化合物、IV-IV族化合物、IV族元素、IV族化合物、及其組合。 In one embodiment, the first polymer may include a silicone resin, an epoxy resin, a (meth) acrylate resin, polycarbonate, polystyrene, polyolefin, or a combination thereof, and the quantum The dot may be selected from a group II-VI compound, a group III-V compound, a group IV-IV compound, a group IV element, a group IV compound, and combinations thereof.

在一個實施例中,所述第二聚合物可選自聚酯、聚(甲基)丙烯腈、聚碳酸酯、聚烯烴、環烯烴聚合物(cyclic olefin polymer,COP)、聚醯亞胺、及其組合。 In one embodiment, the second polymer may be selected from polyester, poly (meth) acrylonitrile, polycarbonate, polyolefin, cyclic olefin polymer (COP), polyimide, And combinations.

在一個實施例中,所述無機障壁層可包含選自以下中的至少一者:氧化矽(SiOx,0<x<3)、氧化鋁(AlxOy,0<x<3,0<y<3)、氧化鉭(TaxOy,0<x<3,0<y<3)、及氧化鈦(TiOx,0<x<3)、以及其組合。 In one embodiment, the inorganic barrier layer may include at least one selected from the group consisting of silicon oxide (SiO x , 0 <x <3), aluminum oxide (Al x O y , 0 <x <3, 0). <y <3), tantalum oxide (Ta x O y , 0 <x <3, 0 <y <3), and titanium oxide (TiO x , 0 <x <3), and combinations thereof.

在一個實施例中,所述有機障壁層可包含選自以下中的至少一者:(甲基)丙烯酸樹脂、環氧樹脂、胺基甲酸酯(urethane)樹脂、硫醇烯樹脂及其組合。 In one embodiment, the organic barrier layer may include at least one selected from the group consisting of (meth) acrylic resin, epoxy resin, urethane resin, thiolene resin, and combinations thereof .

在一個實施例中,所述光學膜可更包括位於所述光學膜的最外表面上的保護層。 In one embodiment, the optical film may further include a protective layer on an outermost surface of the optical film.

在一個實施例中,所述保護層可包含選自以下的聚合物:聚酯、聚(甲基)丙烯腈、聚碳酸酯、聚烯烴、環烯烴聚合物(COP)、聚醯亞胺及其組合。 In one embodiment, the protective layer may include a polymer selected from the group consisting of polyester, poly (meth) acrylonitrile, polycarbonate, polyolefin, cycloolefin polymer (COP), polyimide, and Its combination.

在一個實施例中,所述光學膜可在其最外表面上具有凹槽及突起。 In one embodiment, the optical film may have grooves and protrusions on its outermost surface.

另一實施例提供一種製造光學膜的方法,所述製造光學膜的方法包括:藉由以下方式製備障壁膜:在包含第二聚合物的聚合物層上沈積無機氧化物以形成無機障壁層,並接著在所述無機障壁層上塗佈包含可固化單體、起始劑及溶劑的有機障壁層組成物,然後固化所述有機障壁層組成物以形成有機障壁層,或者在包含第二聚合物的聚合物層上塗佈包含可固化單體、起始劑及溶劑的有機障壁層組成物並接著固化所述有機障壁層組成物以形成有機障壁層,並接著在所述有機障壁層上沈積無機氧化物以形成無機障壁層;以及將所述障壁膜的最外表面處的所述聚合物層、所述有機障壁層或所述無機障壁層轉移至芯層的兩側上,所述芯層包含散佈於第一聚合物中的多個量子點。 Another embodiment provides a method for manufacturing an optical film, the method including: preparing a barrier film by depositing an inorganic oxide on a polymer layer including a second polymer to form an inorganic barrier layer, And then coating the inorganic barrier layer with an organic barrier layer composition containing a curable monomer, an initiator and a solvent, and then curing the organic barrier layer composition to form an organic barrier layer, or An organic barrier layer composition including a curable monomer, an initiator, and a solvent is coated on the polymer layer of the material, and then the organic barrier layer composition is cured to form an organic barrier layer, and then on the organic barrier layer Depositing an inorganic oxide to form an inorganic barrier layer; and transferring the polymer layer, the organic barrier layer, or the inorganic barrier layer at the outermost surface of the barrier film to both sides of the core layer, the The core layer includes a plurality of quantum dots dispersed in the first polymer.

在一個實施例中,所述製造光學膜的方法可更包括在所述光學膜的最外表面處形成保護層。 In one embodiment, the method of manufacturing an optical film may further include forming a protective layer at an outermost surface of the optical film.

在一個實施例中,所述第一聚合物、所述第二聚合物、所述無機障壁層及所述保護層與上述者相同。 In one embodiment, the first polymer, the second polymer, the inorganic barrier layer, and the protective layer are the same as those described above.

在一個實施例中,所述可固化單體可為在固化後提供(甲基)丙烯酸樹脂、環氧樹脂、胺基甲酸酯樹脂或硫醇烯樹脂或其組合的單體。 In one embodiment, the curable monomer may be a monomer that provides a (meth) acrylic resin, an epoxy resin, a urethane resin, or a thiolene resin or a combination thereof after curing.

在一個實施例中,所述固化可藉由紫外(ultraviolet,UV)光固化或熱固化而執行。 In one embodiment, the curing may be performed by ultraviolet (UV) light curing or thermal curing.

另一實施例提供一種包含所述光學膜的背光單元。 Another embodiment provides a backlight unit including the optical film.

又一實施例提供一種包含所述背光單元的顯示裝置。 Yet another embodiment provides a display device including the backlight unit.

其他實施例會在詳細說明中進行闡述。 Other embodiments will be described in the detailed description.

可藉由在包含量子點的芯層上形成聚合物層、無機障壁層及有機障壁層作為多層來提供具有極佳水份及氣體阻隔性質的光學膜,以彌補無機障壁層的缺陷並提供緻密的障壁層。 The optical film with excellent moisture and gas barrier properties can be provided by forming a polymer layer, an inorganic barrier layer, and an organic barrier layer on a core layer including a quantum dot as a multilayer to compensate for the defects of the inorganic barrier layer and provide compactness Bund layer.

10A、10B、20、30、40‧‧‧光學膜 10A, 10B, 20, 30, 40‧‧‧ optical film

12‧‧‧芯層 12‧‧‧ core layer

14a、14b‧‧‧聚合物層 14a, 14b‧‧‧Polymer layer

16a、16b‧‧‧無機障壁層 16a, 16b‧‧‧‧Inorganic barrier layer

18a、18b‧‧‧有機障壁層 18a, 18b‧‧‧ organic barrier layer

22a、22b‧‧‧保護層 22a, 22b‧‧‧protective layer

100‧‧‧液晶顯示裝置 100‧‧‧LCD display device

101‧‧‧背光單元 101‧‧‧ backlight unit

110‧‧‧光源 110‧‧‧light source

120‧‧‧光導 120‧‧‧light guide

500‧‧‧液晶面板 500‧‧‧LCD panel

501‧‧‧第一偏光片 501‧‧‧first polarizer

502‧‧‧液晶層 502‧‧‧LCD layer

503‧‧‧第二偏光片 503‧‧‧second polarizer

504‧‧‧濾色片 504‧‧‧ color filter

圖1是示出根據一個實施例的光學膜的示意剖視圖。 FIG. 1 is a schematic cross-sectional view illustrating an optical film according to an embodiment.

圖2是示出根據另一實施例的光學膜的示意剖視圖。 FIG. 2 is a schematic sectional view showing an optical film according to another embodiment.

圖3是示出根據另一實施例的光學膜的示意剖視圖。 FIG. 3 is a schematic cross-sectional view illustrating an optical film according to another embodiment.

圖4是示出根據另一實施例的光學膜的示意剖視圖。 FIG. 4 is a schematic cross-sectional view illustrating an optical film according to another embodiment.

圖5是示出根據另一實施例的光學膜的示意剖視圖。 FIG. 5 is a schematic sectional view showing an optical film according to another embodiment.

圖6是示出包含根據實施例的光學膜的液晶顯示裝置的示意圖。 FIG. 6 is a schematic diagram showing a liquid crystal display device including an optical film according to an embodiment.

在下文中,在以下對本發明的詳細說明中將更充分地闡述本發明,本發明的詳細說明闡述了本發明的某些實施例而非全部實施例。然而,本發明可實施為諸多不同形式,而不應被視為僅限於本文所述示例性實施例。 Hereinafter, the present invention will be explained more fully in the following detailed description of the present invention, which describes some embodiments of the present invention instead of all the embodiments. The invention may, however, be embodied in many different forms and should not be construed as limited to the exemplary embodiments described herein.

為清晰起見,不再對與本說明無關的部分予以贅述,且在本說明書通篇中相同或相似的構成元件由相同的參考編號指示。 For the sake of clarity, parts that are not relevant to this description are not repeated, and the same or similar constituent elements are indicated by the same reference numerals throughout the specification.

在圖式中,為清晰起見,誇大了層、膜、面板、區等的厚度。在本說明書通篇中,相同的參考編號表示相同的元件。 In the drawings, the thicknesses of layers, films, panels, regions, etc. have been exaggerated for clarity. Throughout this specification, the same reference numbers refer to the same elements.

應理解,當稱一元件(例如,層、膜、區、或基板)位於另一元件「上」時,所述元件可直接位於所述另一元件上、抑或可存在中間元件。相比之下,當稱一元件「直接」位於另一元件「上」時,則不存在中間元件。 It will be understood that when an element (eg, layer, film, region, or substrate) is referred to as being “on” another element, it can be directly on the other element or intervening elements may be present. In contrast, when an element is referred to as being "directly on" another element, there are no intervening elements present.

當未另外提供具體定義時,本文所用「其組合」指代混合物、共聚物或積層體。 When a specific definition is not otherwise provided, "a combination thereof" as used herein refers to a mixture, a copolymer, or a laminate.

當未另外提供具體定義時,本文所用(甲基)丙烯酸酯系樹脂指代丙烯酸酯系樹脂或甲基丙烯酸酯系樹脂,聚(甲基)丙烯腈指 代聚丙烯腈或聚甲基丙烯腈,且(甲基)丙烯酸樹脂指代丙烯酸樹脂或甲基丙烯酸樹脂。 When a specific definition is not otherwise provided, (meth) acrylate resin as used herein refers to acrylate resin or methacrylate resin, and poly (meth) acrylonitrile refers to Polyacrylonitrile or polymethacrylonitrile is substituted, and (meth) acrylic resin refers to acrylic resin or methacrylic resin.

根據一個實施例,一種光學膜包括:芯層,包含第一聚合物及散佈於所述第一聚合物中的多個量子點;以及有機/無機障壁層,包括至少一個無機障壁層及至少一個有機障壁層,且安置於芯層上,其中包含第二聚合物的聚合物層安置於以下中的至少一者處:芯層與有機/無機障壁層之間、以及有機/無機障壁層的外表面上。 According to an embodiment, an optical film includes: a core layer including a first polymer and a plurality of quantum dots dispersed in the first polymer; and an organic / inorganic barrier layer including at least one inorganic barrier layer and at least one An organic barrier layer and disposed on the core layer, wherein the polymer layer containing the second polymer is disposed at least one of: between the core layer and the organic / inorganic barrier layer, and outside the organic / inorganic barrier layer On the surface.

所述芯層可被定位成接觸至少有機/無機障壁層中的有機障壁層或無機障壁層中的一者或者聚合物層。在一個實施例中,芯層可接觸有機障壁層,而在另一實施例中,芯層可接觸聚合物層。有機/無機障壁層由堆疊於芯層上的至少一個無機障壁層及至少一個有機障壁層、或堆疊於所述芯層上的至少一個有機障壁層及至少一個無機障壁層組成。此外,無機障壁層及有機障壁層可交替地堆疊。 The core layer may be positioned to contact at least one of an organic barrier layer or an inorganic barrier layer or a polymer layer of the organic / inorganic barrier layer. In one embodiment, the core layer may contact the organic barrier layer, and in another embodiment, the core layer may contact the polymer layer. The organic / inorganic barrier layer is composed of at least one inorganic barrier layer and at least one organic barrier layer stacked on the core layer, or at least one organic barrier layer and at least one inorganic barrier layer stacked on the core layer. In addition, the inorganic barrier layer and the organic barrier layer may be alternately stacked.

在下文中,參照圖式來闡述根據一個實施例的光學膜。 Hereinafter, an optical film according to an embodiment is explained with reference to the drawings.

圖1是示出根據一個實施例的光學膜的示意剖視圖,且圖2是根據另一實施例的光學膜的示意剖視圖。圖1示出其中包含第二聚合物的聚合物層位於有機/無機障壁層的外表面上的光學 膜,且圖2示出其中包含第二聚合物的聚合物層位於芯層與有機/無機障壁層之間的光學膜。 FIG. 1 is a schematic cross-sectional view showing an optical film according to one embodiment, and FIG. 2 is a schematic cross-sectional view of an optical film according to another embodiment. Fig. 1 shows the optics in which a polymer layer containing a second polymer is located on the outer surface of an organic / inorganic barrier layer Film, and FIG. 2 shows an optical film in which a polymer layer containing a second polymer is located between a core layer and an organic / inorganic barrier layer.

參照圖1,根據一個實施例的光學膜10A包括:芯層12,包含第一聚合物及散佈於所述第一聚合物中的多個量子點;無機障壁層16a及16b,位於芯層12的兩側上;有機障壁層18a及18b,位於無機障壁層16a及16b上;以及聚合物層14a及14b,包含第二聚合物且位於有機障壁層18a及18b的兩側上。 Referring to FIG. 1, an optical film 10A according to an embodiment includes: a core layer 12 including a first polymer and a plurality of quantum dots dispersed in the first polymer; and inorganic barrier layers 16 a and 16 b located at the core layer 12. Organic barrier layers 18a and 18b are located on inorganic barrier layers 16a and 16b; and polymer layers 14a and 14b include a second polymer and are positioned on both sides of organic barrier layers 18a and 18b.

參照圖2,根據一個實施例的光學膜10B包括:芯層12,包含第一聚合物及散佈於所述第一聚合物中的多個量子點;聚合物層14a及14b,包含第二聚合物且位於芯層12的兩側上;無機障壁層16a及16b,位於聚合物層14a及14b上;以及有機障壁層18a及18b,位於無機障壁層16a及16b上。 Referring to FIG. 2, an optical film 10B according to an embodiment includes: a core layer 12 including a first polymer and a plurality of quantum dots dispersed in the first polymer; and polymer layers 14 a and 14 b including a second polymer It is located on both sides of the core layer 12; inorganic barrier layers 16a and 16b are located on the polymer layers 14a and 14b; and organic barrier layers 18a and 18b are located on the inorganic barrier layers 16a and 16b.

芯層12包含散佈於第一聚合物中的多個量子點。第一聚合物可選自:矽酮樹脂;環氧樹脂;(甲基)丙烯酸酯系樹脂;聚碳酸酯;聚苯乙烯;聚烯烴,例如聚乙烯、聚丙烯、或聚異丁烯;及其組合。 The core layer 12 includes a plurality of quantum dots dispersed in a first polymer. The first polymer may be selected from the group consisting of: silicone resin; epoxy resin; (meth) acrylate resin; polycarbonate; polystyrene; polyolefin, such as polyethylene, polypropylene, or polyisobutylene; and combinations thereof .

所述量子點可選自II-VI族化合物、III-V族化合物、IV-IV族化合物、IV族元素、IV族化合物、及其組合,其中用語「族」指代元素週期表的族。II-VI族化合物包括:二元化合物,選自CdSe、CdTe、ZnS、ZnSe、ZnTe、ZnO、HgS、HgSe、HgTe、 MgSe、MgS及其組合;三元化合物,選自CdSeS、CdSeTe、CdSTe、ZnSeS、ZnSeTe、ZnSTe、HgSeS、HgSeTe、HgSTe、CdZnS、CdZnSe、CdZnTe、CdHgS、CdHgSe、CdHgTe、HgZnS、HgZnSe、HgZnTe、MgZnSe、MgZnS及其組合;以及四元化合物,選自HgZnTeS、CdZnSeS、CdZnSeTe、CdZnSTe、CdHgSeS、CdHgSeTe、CdHgSTe、HgZnSeS、HgZnSeTe、HgZnSTe及其組合。III-V族化合物包括:二元化合物,選自GaN、GaP、GaAs、GaSb、AlN、AlP、AlAs、AlSb、InN、InP、InAs、InSb及其組合;三元化合物,選自GaNP、GaNAs、GaNSb、GaPAs、GaPSb、AlNP、AlNAs、AlNSb、AlPAs、AlPSb、InNP、InNAs、InNSb、InPAs、InPSb、GaAlNP及其組合;以及四元化合物,選自GaAlNAs、GaAlNSb、GaAlPAs、GaAlPSb、GaInNP、GaInNAs、GaInNSb、GaInPAs、GaInPSb、InAlNP、InAlNAs、InAlNSb、InAlPAs、InAlPSb及其組合。IV-VI族化合物包括:二元化合物,選自SnS、SnSe、SnTe、PbS、PbSe、PbTe及其組合;三元化合物,選自SnSeS、SnSeTe、SnSTe、PbSeS、PbSeTe、PbSTe、SnPbS、SnPbSe、SnPbTe及其組合;以及四元元素化合物,選自SnPbSSe、SnPbSeTe、SnPbSTe及其組合。IV族元素可選自Si、Ge及其混合物。IV族化合物包括:二元化合物,選自SiC、SiGe及其混合物。 The quantum dot may be selected from a group II-VI compound, a group III-V compound, a group IV-IV compound, a group IV element, a group IV compound, and a combination thereof, wherein the term "family" refers to a family of the periodic table of elements. Group II-VI compounds include: binary compounds selected from CdSe, CdTe, ZnS, ZnSe, ZnTe, ZnO, HgS, HgSe, HgTe, MgSe, MgS and combinations thereof; ternary compounds selected from CdSeS, CdSeTe, CdSTe, ZnSeS, ZnSeTe, ZnSTe, HgSeS, HgSeTe, HgSTe, CdZnS, CdZnSe, CdZnTe, CdHgS, CdHgSe, CdHgTe, HgZnS, ZnSe , MgZnS, and combinations thereof; and quaternary compounds selected from HgZnTeS, CdZnSeS, CdZnSeTe, CdZnSTe, CdHgSeS, CdHgSeTe, CdHgSTe, HgZnSeS, HgZnSeTe, HgZnSTe, and combinations thereof. Group III-V compounds include: binary compounds selected from GaN, GaP, GaAs, GaSb, AlN, AlP, AlAs, AlSb, InN, InP, InAs, InSb, and combinations thereof; ternary compounds selected from GaNP, GaAs, GaNSb, GaPAs, GaPSb, AlNP, AlNAs, AlNSb, AlPAs, AlPSb, InNP, InNAs, InNSb, InPAs, InPSb, GaAlNP, and combinations thereof; and quaternary compounds selected from GaAlNAs, GaAlNSb, GaAlPAs, GaAlPSb, GaInNP, GaInNAs, GaInNSb, GaInPAs, GaInPSb, InAlNP, InAlNAs, InAlNSb, InAlPAs, InAlPSb, and combinations thereof. Group IV-VI compounds include: binary compounds selected from SnS, SnSe, SnTe, PbS, PbSe, PbTe, and combinations thereof; ternary compounds selected from SnSeS, SnSeTe, SnSTe, PbSeS, PbSeTe, PbSTe, SnPbS, SnPbSe, SnPbTe and combinations thereof; and quaternary element compounds selected from SnPbSSe, SnPbSeTe, SnPbSTe, and combinations thereof. Group IV elements may be selected from Si, Ge, and mixtures thereof. Group IV compounds include: binary compounds selected from SiC, SiGe, and mixtures thereof.

本文中,元素、二元化合物、三元化合物或四元化合物可以具有實質上均勻濃度的粒子形式、或以在同一粒子中具有不同濃度分佈的粒子形式存在。此外,每一粒子可具有其中第二量子點環繞第一量子點的芯/殼結構(core/shell structure)。所述芯及殼可具有介面,所述介面可在自所述粒子的表面至其中心的方向上具有減小的元素濃度梯度。 Here, the element, binary compound, ternary compound or quaternary compound may exist in the form of particles having a substantially uniform concentration, or in the form of particles having different concentration distributions in the same particle. In addition, each particle may have a core / shell structure in which the second quantum dot surrounds the first quantum dot. The core and shell may have an interface that may have a reduced elemental concentration gradient in a direction from the surface of the particle to its center.

量子點在發光波長譜中的半峰全寬(full width at half maximum,FWHM)可為小於或等於約45nm,具體而言,小於或等於約40nm,且更具體而言,小於或等於約30nm。在所述範圍內,光學膜10A及10B的色純度或色再現性可得到提高。 Full width at half of a quantum dot in the emission wavelength spectrum Maximum, FWHM) may be less than or equal to about 45 nm, specifically, less than or equal to about 40 nm, and more specifically, less than or equal to about 30 nm. Within this range, the color purity or color reproducibility of the optical films 10A and 10B can be improved.

芯層12可被形成為二或更多個層。舉例而言,芯層12可包括包含紅色量子點的第一層及包含綠色量子點的第二層。 The core layer 12 may be formed as two or more layers. For example, the core layer 12 may include a first layer including a red quantum dot and a second layer including a green quantum dot.

量子點可以基於芯層12的總重量計約1wt%至約20wt%的量包含於芯層12中。 The quantum dots may be contained in the core layer 12 in an amount of about 1 wt% to about 20 wt% based on the total weight of the core layer 12.

芯層12的厚度可為小於或等於約500μm,小於或等於約350μm,小於或等於約250μm,或約50μm至約200μm。在所述範圍內,光學膜10A及10B的光學性質可易於控制。 The thickness of the core layer 12 may be less than or equal to about 500 μm, less than or equal to about 350 μm, less than or equal to about 250 μm, or about 50 μm to about 200 μm. Within this range, the optical properties of the optical films 10A and 10B can be easily controlled.

無機障壁層16a及16b存在於芯層12的兩側上。無機障壁層16a及16b可包含氧化矽(SiOx,0<x<3)、氧化鋁(AlxOy, 0<x<3,0<y<3)、氧化鉭(TaxOy,0<x<3,0<y<3)、氧化鈦(TiOx,0<x<3)及其組合。 Inorganic barrier layers 16 a and 16 b exist on both sides of the core layer 12. The inorganic barrier layers 16a and 16b may include silicon oxide (SiO x , 0 <x <3), aluminum oxide (Al x O y , 0 <x <3, 0 <y <3), tantalum oxide (Ta x O y , 0 <x <3,0 <y < 3), titanium oxide (TiO x, 0 <x < 3) , and combinations thereof.

無機障壁層16a及16b的厚度可為小於或等於約1μm,小於或等於約500nm,或約10nm至約200nm。在所述範圍內,在確保光學膜10A及10B的光學性質的同時,障壁特性可得到改良。無機障壁層16a及16b可包括彼此包含不同的無機氧化物的二或更多個層。 The thickness of the inorganic barrier layers 16a and 16b may be less than or equal to about 1 μm, less than or equal to about 500 nm, or about 10 nm to about 200 nm. Within this range, barrier properties can be improved while ensuring the optical properties of the optical films 10A and 10B. The inorganic barrier layers 16a and 16b may include two or more layers containing different inorganic oxides from each other.

有機障壁層18a及18b可包含選自以下的樹脂:(甲基)丙烯酸樹脂、環氧樹脂、胺基甲酸酯樹脂、硫醇烯樹脂及其組合。 The organic barrier layers 18a and 18b may include a resin selected from a (meth) acrylic resin, an epoxy resin, a urethane resin, a thiolene resin, and combinations thereof.

有機障壁層18a及18b的厚度可為小於或等於約100μm,小於或等於約50μm,或約1μm至約100μm。在所述範圍內,在確保光學膜10A及10B的光學性質的同時,障壁特性可得到改良。有機障壁層18a及18b可包括包含彼此不同的樹脂的二或更多個層。 The thickness of the organic barrier layers 18a and 18b may be less than or equal to about 100 μm, less than or equal to about 50 μm, or about 1 μm to about 100 μm. Within this range, barrier properties can be improved while ensuring the optical properties of the optical films 10A and 10B. The organic barrier layers 18a and 18b may include two or more layers including resins different from each other.

有機障壁層18a及18b可彌補無機障壁層16a及16b的缺陷,以提供緻密的層。 The organic barrier layers 18a and 18b can make up for the defects of the inorganic barrier layers 16a and 16b to provide a dense layer.

包含第二聚合物的聚合物層14a及14b可存在於有機障壁層18a及18b上。第二聚合物可選自:聚酯、聚(甲基)丙烯腈、聚碳酸酯、聚烯烴、環烯烴聚合物(COP)、聚醯亞胺及其組合。 Polymer layers 14a and 14b including the second polymer may be present on the organic barrier layers 18a and 18b. The second polymer may be selected from the group consisting of polyester, poly (meth) acrylonitrile, polycarbonate, polyolefin, cycloolefin polymer (COP), polyimide, and combinations thereof.

所述聚酯可選自:聚對苯二甲酸乙二酯(polyethylene terepbthalate,PET)、聚對苯二甲酸丁二酯、聚萘二甲酸乙二酯、聚乙酸乙烯酯及其組合。 The polyester may be selected from the group consisting of polyethylene terephthalate terepbthalate (PET), polybutylene terephthalate, polyethylene naphthalate, polyvinyl acetate, and combinations thereof.

所述聚烯烴可包括:聚乙烯、聚丙烯及聚苯乙烯等。環烯烴聚合物可為藉由將環二烯化合物(例如,環戊烯、降冰片烯或二環戊二烯)與線性烯烴化合物(例如,乙烯、丙烯或丁烯)進行反應以製備環烯烴單體並對所述環烯烴單體進行聚合而獲得的聚合物。 The polyolefin may include polyethylene, polypropylene, and polystyrene. The cycloolefin polymer may be prepared by reacting a cyclodiene compound (for example, cyclopentene, norbornene, or dicyclopentadiene) with a linear olefin compound (for example, ethylene, propylene, or butene) to prepare a cycloolefin. A polymer obtained by polymerizing the monomer and the cycloolefin monomer.

聚合物層14a及14b的厚度可為小於或等於約100μm,小於或等於約50μm,或約1μm至約100μm。在所述範圍內,在確保光學膜10A及10B的光學性質的同時,障壁特性可得到改良。 The thickness of the polymer layers 14a and 14b may be less than or equal to about 100 μm, less than or equal to about 50 μm, or about 1 μm to about 100 μm. Within this range, barrier properties can be improved while ensuring the optical properties of the optical films 10A and 10B.

如圖2中所示,聚合物層14a及14b可位於芯層12與無機障壁層16a及16b之間。 As shown in FIG. 2, the polymer layers 14 a and 14 b may be located between the core layer 12 and the inorganic barrier layers 16 a and 16 b.

光學膜10A及10B在其最外表面上可具有凹槽及突起。 換言之,圖1中的聚合物層14a及14b在不接觸有機障壁層18a及18b的一側上可具有凹槽及突起,且圖2中的有機障壁層18a及18b在不接觸無機障壁層16a及16b的一側上可具有凹槽及突起。在表面上具有凹槽及突起的聚合物層14a及14b或有機障壁層18a及18b可起到使自LED光源發射的光漫射的作用。 The optical films 10A and 10B may have grooves and protrusions on their outermost surfaces. In other words, the polymer layers 14a and 14b in FIG. 1 may have grooves and protrusions on a side that does not contact the organic barrier layers 18a and 18b, and the organic barrier layers 18a and 18b in FIG. 2 do not contact the inorganic barrier layers 16a And 16b may have grooves and protrusions on one side. The polymer layers 14a and 14b or the organic barrier layers 18a and 18b having grooves and protrusions on the surface can play a role in diffusing light emitted from the LED light source.

圖3是示出根據另一實施例的光學膜20的示意剖視圖。 光學膜20可更包括位於圖2中的光學膜10B的有機障壁層18a及18b上的保護層22a及22b。相同地,保護層22a及22b可另外位於圖1中的光學膜10A的聚合物層14a及14b上。本文中,保護層22a及22b可包含與包含於聚合物層14a及14b中的聚合物不同的聚合物。 FIG. 3 is a schematic sectional view showing an optical film 20 according to another embodiment. The optical film 20 may further include protective layers 22 a and 22 b on the organic barrier layers 18 a and 18 b of the optical film 10B in FIG. 2. Similarly, the protective layers 22 a and 22 b may be additionally located on the polymer layers 14 a and 14 b of the optical film 10A in FIG. 1. Herein, the protective layers 22a and 22b may include a polymer different from the polymers included in the polymer layers 14a and 14b.

保護層22a及22b可包含選自以下的聚合物:聚酯、聚(甲基)丙烯腈、聚碳酸酯、聚烯烴、環烯烴聚合物(COP)、聚醯亞胺及其組合。 The protective layers 22a and 22b may include a polymer selected from the group consisting of polyester, poly (meth) acrylonitrile, polycarbonate, polyolefin, cycloolefin polymer (COP), polyimide, and combinations thereof.

所述聚酯可選自:聚對苯二甲酸乙二酯、聚對苯二甲酸丁二酯、聚萘二甲酸乙二酯、聚乙酸乙烯酯及其組合。 The polyester may be selected from the group consisting of polyethylene terephthalate, polybutylene terephthalate, polyethylene naphthalate, polyvinyl acetate, and combinations thereof.

所述聚烯烴可選自:聚乙烯、聚丙烯及聚苯乙烯等。環烯烴聚合物可為藉由將環二烯化合物(例如,環戊烯、降冰片烯或二環戊二烯)與線性烯烴化合物(例如,乙烯、丙烯或丁烯)進行反應以製備環烯烴單體並對所述環烯烴單體進行聚合而獲得的聚合物。 The polyolefin may be selected from the group consisting of polyethylene, polypropylene, and polystyrene. The cycloolefin polymer may be prepared by reacting a cyclodiene compound (for example, cyclopentene, norbornene, or dicyclopentadiene) with a linear olefin compound (for example, ethylene, propylene, or butene) to prepare a cycloolefin. A polymer obtained by polymerizing the monomer and the cycloolefin monomer.

保護層22a及22b的厚度可為小於或等於約50μm,小於或等於約40μm,或約10μm至約40μm。在所述範圍內,在確保光學膜10A及10B的光學性質的同時,障壁特性可得到改良。 The thickness of the protective layers 22a and 22b may be less than or equal to about 50 μm, less than or equal to about 40 μm, or about 10 μm to about 40 μm. Within this range, barrier properties can be improved while ensuring the optical properties of the optical films 10A and 10B.

保護層22a及22b在不接觸有機障壁層18a及18b的一側上可具有凹槽及突起。表面上具有凹槽及突起的保護層22a及22b可起到使自LED光源發射的光漫射的作用。 The protective layers 22a and 22b may have grooves and protrusions on a side that does not contact the organic barrier layers 18a and 18b. The protective layers 22a and 22b with grooves and protrusions on the surface can play a role in diffusing light emitted from the LED light source.

圖4是示出根據另一實施例的光學膜30的示意剖視圖。 FIG. 4 is a schematic sectional view showing an optical film 30 according to another embodiment.

參照圖4,根據一個實施例的光學膜30包括:芯層12,包含第一聚合物及散佈於所述第一聚合物中的多個量子點;包含第二聚合物的聚合物層14a及14b,位於芯層12的兩側上;有機障壁層18a及18b,位於聚合物層14a及14b上;以及無機障壁層16a及16b,位於有機障壁層18a及18b上。 Referring to FIG. 4, an optical film 30 according to an embodiment includes: a core layer 12 including a first polymer and a plurality of quantum dots dispersed in the first polymer; a polymer layer 14 a including a second polymer; and 14b is located on both sides of the core layer 12; organic barrier layers 18a and 18b are located on the polymer layers 14a and 14b; and inorganic barrier layers 16a and 16b are located on the organic barrier layers 18a and 18b.

圖4示出其中聚合物層14a及14b位於芯層12與有機障壁層18a及18b之間的光學膜,但聚合物層14a及14b可位於無機障壁層16a及16b上。 FIG. 4 shows an optical film in which the polymer layers 14a and 14b are located between the core layer 12 and the organic barrier layers 18a and 18b, but the polymer layers 14a and 14b may be located on the inorganic barrier layers 16a and 16b.

芯層12、聚合物層14a及14b、有機障壁層18a及18b、以及無機障壁層16a及16b與上述者相同。 The core layer 12, the polymer layers 14a and 14b, the organic barrier layers 18a and 18b, and the inorganic barrier layers 16a and 16b are the same as those described above.

無機障壁層16a及16b在不接觸有機障壁層18a及18b的一側上可具有凹槽及突起。表面上具有凹槽及突起的無機障壁層16a及16b可起到使自LED光源發射的光漫射的作用。 The inorganic barrier layers 16a and 16b may have grooves and protrusions on a side that does not contact the organic barrier layers 18a and 18b. The inorganic barrier layers 16a and 16b having grooves and protrusions on the surface can play a role of diffusing light emitted from the LED light source.

圖5是示出根據另一實施例的光學膜40的示意剖視圖。 光學膜40可更包括位於無機障壁層16a及16b上的保護層22a及22b。本文中,保護層22a及22b與圖3中所示者相同。 FIG. 5 is a schematic sectional view showing an optical film 40 according to another embodiment. The optical film 40 may further include protective layers 22a and 22b on the inorganic barrier layers 16a and 16b. Herein, the protective layers 22 a and 22 b are the same as those shown in FIG. 3.

保護層22a及22b在不接觸無機障壁層16a及16b的一側上可具有凹槽及突起。表面上具有凹槽及突起的保護層22a及22b可起到使自LED光源發射的光漫射的作用。 The protective layers 22a and 22b may have grooves and protrusions on a side that does not contact the inorganic barrier layers 16a and 16b. The protective layers 22a and 22b with grooves and protrusions on the surface can play a role in diffusing light emitted from the LED light source.

在下文中,說明一種製造光學膜10A、10B、20、30及40的方法。 Hereinafter, a method of manufacturing the optical films 10A, 10B, 20, 30, and 40 is explained.

光學膜10A、10B及30是藉由以下方式製造而成:藉由以下方式製備障壁膜:在包含第二聚合物的聚合物層14a及14b上沈積無機氧化物以形成無機障壁層16a及16b,並接著在無機障壁層16a及16b上塗佈包含可固化單體、起始劑及溶劑的有機障壁層組成物,然後固化所述有機障壁層組成物以形成有機障壁層18a及18b,或者在包含第二聚合物的聚合物層14a及14b上塗佈包含可固化單體、起始劑及溶劑的有機障壁層組成物並接著固化所述有機障壁層組成物以形成有機障壁層18a及18b,並接著在所述有機障壁層上沈積無機氧化物以形成無機障壁層16a及16b;以及將所述障壁膜的最外表面處的聚合物層14a及14b、有機障壁層18a及18b、或無機障壁層16a及16b轉移至芯層12的兩側上,芯層12包含散佈於第一聚合物中的多個量子點。 The optical films 10A, 10B, and 30 are manufactured by preparing a barrier film by depositing an inorganic oxide on the polymer layers 14a and 14b containing a second polymer to form the inorganic barrier layers 16a and 16b. And then coating the inorganic barrier layer 16a and 16b with an organic barrier layer composition containing a curable monomer, an initiator and a solvent, and then curing the organic barrier layer composition to form the organic barrier layers 18a and 18b, or An organic barrier layer composition including a curable monomer, an initiator, and a solvent is coated on the polymer layers 14a and 14b including the second polymer, and then the organic barrier layer composition is cured to form the organic barrier layer 18a and 18b, and then depositing an inorganic oxide on the organic barrier layer to form inorganic barrier layers 16a and 16b; and polymer layers 14a and 14b, organic barrier layers 18a and 18b at the outermost surface of the barrier film, Or the inorganic barrier layers 16a and 16b are transferred to both sides of the core layer 12, and the core layer 12 includes a plurality of quantum dots dispersed in the first polymer.

所述可固化單體可為提供以下者的可光固化單體:(甲基)丙烯酸樹脂(丙烯酸樹脂或甲基丙烯酸樹脂)、環氧樹脂、胺基甲酸酯樹脂、硫醇烯樹脂或其組合。 The curable monomer may be a photocurable monomer that provides: (meth) acrylic resin (acrylic resin or methacrylic resin), epoxy resin, urethane resin, thiolene resin, or Its combination.

舉例而言,提供(甲基)丙烯酸樹脂的單體可為:單官能可光固化單體,選自(甲基)丙烯酸異冰片基酯、(甲基)丙烯酸異辛基酯、(甲基)丙烯酸月桂基酯、(甲基)丙烯酸苯甲醯酯、(甲基)丙烯酸降冰片基酯、(甲基)丙烯酸環己基酯、(甲基)丙烯酸正己基酯、丙烯酸金剛烷基酯、丙烯酸環戊基酯及其組合;多官能可光固化單體,選自雙官能(甲基)丙烯酸酯、三(甲基)丙烯酸酯、乙氧基加成季戊四醇四(甲基)丙烯酸酯、及二季戊四醇六(甲基)丙烯酸酯(dipentaerythritol hexa(meth)acrylate,DPHA)等,所述雙官能(甲基)丙烯酸酯選自二(甲基)丙烯酸己二醇酯、二(甲基)丙烯酸三環癸烷二甲醇酯、1,10-癸二醇二(甲基)丙烯酸酯、二(甲基)丙烯酸丁二醇酯、二(甲基)丙烯酸新苯基二醇酯、二(甲基)丙烯酸新戊二醇酯、二(甲基)丙烯酸壬基丙二醇酯、二(甲基)丙烯酸二丙二醇酯、二(甲基)丙烯酸二乙二醇酯、二(甲基)丙烯酸乙二醇酯、二(甲基)丙烯酸四-三乙二醇酯、乙氧基化二雙酚A二(甲基)丙烯酸酯及二(甲基)丙烯酸三乙二醇酯等,所述三(甲基)丙烯酸酯選自三(甲基)丙烯酸三羥甲基丙烷酯、三(甲基)丙烯酸季戊四醇酯、乙氧基化三羥甲基(甲基)丙烷三(甲基)丙烯酸酯、環氧乙烷加成三羥甲基丙烷 三(甲基)丙烯酸酯(ethylene oxide addition trimethylolpropane tri(meth)acrylate,EO-TMPTA)、甘油環氧丙烷加成三(甲基)丙烯酸酯(glycerine propylene oxide addition tri(meth)acrylate,PETTA)。 For example, the monomer providing the (meth) acrylic resin may be: a monofunctional photocurable monomer selected from the group consisting of isobornyl (meth) acrylate, isooctyl (meth) acrylate, (meth) ) Lauryl acrylate, benzoyl (meth) acrylate, norbornyl (meth) acrylate, cyclohexyl (meth) acrylate, n-hexyl (meth) acrylate, adamantyl acrylate, Cyclopentyl acrylate and combinations thereof; multifunctional photocurable monomers selected from the group consisting of difunctional (meth) acrylates, tris (meth) acrylates, ethoxy addition pentaerythritol tetra (meth) acrylates, And dipentaerythritol hexa (meth) acrylate (DPHA), and the like, the bifunctional (meth) acrylate is selected from the group consisting of hexanediol di (meth) acrylate, di (meth) Tricyclodecane dimethanol acrylate, 1,10-decanediol di (meth) acrylate, butanediol di (meth) acrylate, neophenyldiol di (meth) acrylate, bis (meth) acrylate Neopentyl glycol methacrylate, nonyl propylene glycol di (meth) acrylate, dipropylene glycol di (meth) acrylate, di (meth) propylene Diethylene glycol enoate, ethylene glycol di (meth) acrylate, tetra-triethylene glycol di (meth) acrylate, ethoxylated bisphenol A di (meth) acrylate, and Triethylene glycol (meth) acrylate and the like, the tri (meth) acrylate is selected from the group consisting of trimethylolpropane tri (meth) acrylate, pentaerythritol tri (meth) acrylate, ethoxylated tris Methylol (meth) propane tri (meth) acrylate, ethylene oxide addition trimethylolpropane Tri (meth) acrylate (ethylene oxide addition trimethylolpropane tri (meth) acrylate, EO-TMPTA), glycerine propylene oxide addition tri (meth) acrylate (PETTA).

可單獨地使用或以二或更多個單體的混合物形式使用單體。 The monomers may be used alone or as a mixture of two or more monomers.

可使用在末端包含至少一個硫醇基團的單體及在末端包含至少一個碳-碳不飽和鍵的單體來製備硫醇烯樹脂。 A thiol ene resin can be prepared using a monomer including at least one thiol group at the terminal and a monomer including at least one carbon-carbon unsaturated bond at the terminal.

在末端包含至少一個硫醇基團的單體的實例可為季戊四醇四(3-巰基乙酸)酯、三羥甲基丙烷三(3-巰基丙酸)酯、季戊四醇四(3-巰基丙酸)酯及二季戊四醇六(3-巰基丙酸)酯等。 Examples of the monomer including at least one thiol group at the terminal may be pentaerythritol tetra (3-mercaptoacetate) ester, trimethylolpropane tri (3-mercaptopropionate) ester, pentaerythritol tetra (3-mercaptopropionate) Esters and dipentaerythritol hexa (3-mercaptopropionic acid) esters.

在末端包含至少一個碳-碳不飽和鍵的單體的實例可為2,4,6-三烯丙氧基-1,3,5-三嗪、季戊四醇烯丙基醚及1,3,5-三烯丙基-1,3,5-三嗪-2,4,6三酮等。此外,亦可使用提供(甲基)丙烯酸樹脂的單體。 Examples of the monomer containing at least one carbon-carbon unsaturated bond at the terminal may be 2,4,6-triallyloxy-1,3,5-triazine, pentaerythritol allyl ether, and 1,3,5 -Triallyl-1,3,5-triazine-2,4,6 trione and the like. Alternatively, a monomer that provides a (meth) acrylic resin may be used.

所述起始劑可為可光固化起始劑或可熱固化起始劑。特定實例可為選自以下中的至少一種化合物,但並非僅限於此:1-羥基環己基苯基甲酮、2-甲基-1(4-(甲硫基)苯基)-2-嗎啉基-1-丙酮、羥基酮、二苯甲酮(benzophenone)、苄基二甲基酮、2-羥基-2-甲基-1-苯基-丙-1-酮、二醯基氧化膦、二苯基(2,4,6-三甲基苯甲 醯基)-氧化膦、及苯基雙(2,3,6-三甲基苯甲醯基)氧化膦。可以基於單體的100重量份計約0.1重量份至約5重量份的量來使用起始劑。 The initiator may be a photo-curable initiator or a heat-curable initiator. Specific examples may be at least one compound selected from, but not limited to, 1-hydroxycyclohexylphenylmethanone, 2-methyl-1 (4- (methylthio) phenyl) -2-? Phenyl-1-acetone, hydroxy ketone, benzophenone, benzyl dimethyl ketone, 2-hydroxy-2-methyl-1-phenyl-propan-1-one, difluorenylphosphine oxide , Diphenyl (2,4,6-trimethylbenzyl Fluorenyl) -phosphine oxide and phenylbis (2,3,6-trimethylbenzylfluorenyl) phosphine oxide. The initiator may be used in an amount of about 0.1 parts by weight to about 5 parts by weight based on 100 parts by weight of the monomer.

溶劑可包括2-甲氧乙醇、異丙醇、N,N-二甲基乙醯胺(dimethylacetamide,DMAc)、N-甲基-2-吡咯烷酮(N-methyl-2-pyrrolidone,NMP)、四氫呋喃(tetrahydrofuran,THF)、N,N-二甲基甲醯胺(dimethylformamide,DMF)、甲苯、二甲苯、甲基乙基酮或其組合,但並非僅限於此。 The solvent may include 2-methoxyethanol, isopropanol, N, N-dimethylacetamide (DMAc), N-methyl-2-pyrrolidone (NMP), tetrahydrofuran (tetrahydrofuran, THF), N, N-dimethylformamide (DMF), toluene, xylene, methyl ethyl ketone, or a combination thereof, but is not limited thereto.

若需要,有機障壁層組成物可更包括勻平改良添加劑(leveling improvement additive)。 If necessary, the organic barrier layer composition may further include a leveling improvement additive.

可以旋轉塗佈、網板印刷(screen printing)、凹版印刷(gravure printing)、染料塗佈等方法將有機障壁層組成物塗佈於基板上。 The organic barrier layer composition may be coated on the substrate by a method such as spin coating, screen printing, gravure printing, and dye coating.

所述固化可為紫外(UV)固化或熱固化。 The curing may be ultraviolet (UV) curing or thermal curing.

所述光學膜10A、10B及30在其最外表面上可更包括保護層22a及22b。 The optical films 10A, 10B, and 30 may further include protective layers 22a and 22b on their outermost surfaces.

第一聚合物、第二聚合物、無機障壁層及保護層與以上光學膜10A、10B、20、30及40中所述者相同。 The first polymer, the second polymer, the inorganic barrier layer, and the protective layer are the same as those described in the above optical films 10A, 10B, 20, 30, and 40.

光學膜10A、10B、20、30及40可用於液晶顯示裝置的背光單元(BLU)。 The optical films 10A, 10B, 20, 30, and 40 can be used for a backlight unit (BLU) of a liquid crystal display device.

在下文中,參照圖6來說明分別包含光學膜10A、10B、20、30及40的液晶顯示裝置。圖6是示出包含根據一個實施例的光學膜的液晶顯示裝置的示意圖。 Hereinafter, a liquid crystal display device including the optical films 10A, 10B, 20, 30, and 40 will be described with reference to FIG. 6. FIG. 6 is a schematic diagram illustrating a liquid crystal display device including an optical film according to an embodiment.

參照圖6,液晶顯示裝置100包括背光單元101及使用自背光單元101提供的白光來達成預定彩色影像的液晶面板500。 Referring to FIG. 6, the liquid crystal display device 100 includes a backlight unit 101 and a liquid crystal panel 500 using white light provided from the backlight unit 101 to achieve a predetermined color image.

背光單元101包括:發光二極體(LED)光源110;光學膜10A、10B、20、30及40,用於將自LED光源110發射的光轉換成白光;以及光導120,安置於LED光源110與光學膜10A、10B、20、30及40之間,以朝光學膜10A、10B、20、30及40引導自LED光源110發射的光。LED光源110包括:多個LED晶片,發射具有預定波長的光。LED光源110可為藍色發光LED光源或紫外(UV)發光LED光源。在圖3中,光源110位於側面,但亦可位於光學膜10A、10B、20、30及40下方。 The backlight unit 101 includes: a light emitting diode (LED) light source 110; optical films 10A, 10B, 20, 30, and 40 for converting light emitted from the LED light source 110 into white light; and a light guide 120 disposed on the LED light source 110 And the optical films 10A, 10B, 20, 30, and 40 to guide the light emitted from the LED light source 110 toward the optical films 10A, 10B, 20, 30, and 40. The LED light source 110 includes a plurality of LED chips and emits light having a predetermined wavelength. The LED light source 110 may be a blue light emitting LED light source or an ultraviolet (UV) light emitting LED light source. In FIG. 3, the light source 110 is located on the side, but may also be located below the optical films 10A, 10B, 20, 30, and 40.

反射器(圖中未示出)可更位於光導120的下側上。 A reflector (not shown in the figure) may be further positioned on the lower side of the light guide 120.

光學膜10A、10B、20、30及40被安置成與LED光源110分隔開,且充當光轉換層以將自LED光源110發射的光轉換成白光,且因此將白光提供至液晶面板500。 The optical films 10A, 10B, 20, 30, and 40 are disposed to be separated from the LED light source 110 and serve as a light conversion layer to convert light emitted from the LED light source 110 into white light, and thus provide white light to the liquid crystal panel 500.

儘管圖6中未示出,然而選自漫射板、棱鏡片、微透鏡片及照度改良膜(例如,雙亮度增強膜(double brightness enhancement film,DBEF))中的至少一個膜可更安置於光學膜10A、10B、20、30及40上。 Although not shown in FIG. 6, it is selected from a diffusion plate, a prism sheet, a microlens sheet, and an illumination improving film (for example, a double brightness enhancement film (double brightness enhancement film) At least one of the enhancement films (DBEF)) may be further disposed on the optical films 10A, 10B, 20, 30, and 40.

此外,光學膜10A、10B、20、30及40可安置於選自以下中的至少兩個膜之間:光導、漫射板、棱鏡片、微透鏡片及照度改良膜(例如,雙亮度增強膜(DBEF))。 In addition, the optical films 10A, 10B, 20, 30, and 40 may be disposed between at least two films selected from the group consisting of a light guide, a diffusion plate, a prism sheet, a microlens sheet, and an illumination improving film (for example, dual brightness enhancement Membrane (DBEF)).

光學膜10A、10B、20、30及40及上述膜可彼此接觸或彼此分隔開。 The optical films 10A, 10B, 20, 30, and 40 and the above-mentioned films may be in contact with each other or separated from each other.

自背光單元101發射的白光朝液晶面板500入射。液晶面板500使用自背光單元101入射的白光而達成預定顏色影像。 液晶面板500可具有其中第一偏光片501、液晶層502、第二偏光片503及濾色片504依序安置的結構。自背光單元101發射的白光透射過第一偏光片501、液晶層502及第二偏光片503,且接著透射入濾色片504中以顯現預定顏色影像。 The white light emitted from the backlight unit 101 is incident toward the liquid crystal panel 500. The liquid crystal panel 500 uses white light incident from the backlight unit 101 to achieve a predetermined color image. The liquid crystal panel 500 may have a structure in which a first polarizer 501, a liquid crystal layer 502, a second polarizer 503, and a color filter 504 are sequentially disposed. The white light emitted from the backlight unit 101 is transmitted through the first polarizer 501, the liquid crystal layer 502, and the second polarizer 503, and then transmitted into the color filter 504 to develop a predetermined color image.

在下文中,參照實例更詳細地說明實施例。然而,該些實例決不應被解釋為限定本發明的範圍。 Hereinafter, the embodiments will be described in more detail with reference to examples. However, these examples should in no way be interpreted as limiting the scope of the invention.

障壁膜的製造 Manufacturing of barrier films 製備實例1 Preparation Example 1

以高頻加熱方法(high frequency heating method)在75μm厚的聚對苯二甲酸乙二酯(PET)膜(T910-E,三菱株式會社 (Mitsubishi Inc.))上沈積氧化矽(SiO),以形成約30nm厚的SiOx(0<x<3)沈積層作為無機障壁層。 A high frequency heating method was used to deposit silicon oxide (SiO) on a 75 μm-thick polyethylene terephthalate (PET) film (T910-E, Mitsubishi Inc.) to An approximately 30 nm thick SiO x (0 <x <3) deposition layer was formed as an inorganic barrier layer.

另一方面,以500轉/分(revolutions per minute,rpm)將50g季戊四醇四(3-巰基乙酸)酯(4T,布魯諾博克含硫化學製品公司(Bruno Bock Thiochemicals))及500ppm對苯二酚單甲醚(MEHQ,奧德裏奇公司(Aldrich Co.))攪動30分鐘,對其添加50g TOT(2,4,6-三烯丙氧基-1,3,5三嗪)、0.5g巴斯夫公司(BASF Co.)製造的豔佳固(Irgacure)754及0.5g巴斯夫公司製造的TPO-L,並以500rpm將混合物攪動30分鐘,以製備有機障壁層組成物。 On the other hand, 50 g of pentaerythritol tetrakis (3-mercaptoacetate) ester (4T, Bruno Bock Thiochemicals) and 500 ppm of hydroquinone were added at 500 revolutions per minute (rpm). Methyl ether (MEHQ, Aldrich Co.) was stirred for 30 minutes, and 50 g of TOT (2,4,6-triallyloxy-1,3,5 triazine) and 0.5 g of BASF were added thereto. (BASF Co.) manufactured Irgacure 754 and 0.5 g of TPO-L manufactured by BASF, and the mixture was stirred at 500 rpm for 30 minutes to prepare an organic barrier layer composition.

以邁耶棒(Meyor bar)塗佈所述有機障壁層組成物,以在無機障壁層上形成20μm厚的有機障壁層,並使用金屬鹵化物燈以1500mJ/cm2進行紫外(UV)固化,以製造障壁膜。 Coating the organic barrier layer composition with a Meyor bar to form a 20 μm thick organic barrier layer on an inorganic barrier layer, and performing ultraviolet (UV) curing at 1500 mJ / cm 2 using a metal halide lamp, To make a barrier film.

製備實例2 Preparation Example 2

以高頻加熱方法在75μm厚的聚對苯二甲酸乙二酯(PET)膜(T910-E,三菱株式會社)上沈積氧化矽(SiO),以形成約30nm厚的SiOx(0<x<3)沈積層作為無機障壁層。 A high-frequency heating method was used to deposit silicon oxide (SiO) on a 75 μm-thick polyethylene terephthalate (PET) film (T910-E, Mitsubishi Corporation) to form a 30-nm-thick SiO x (0 <x <3) The deposited layer serves as an inorganic barrier layer.

另一方面,以500rpm將50g布魯諾博克含硫化學製品公司製造的4T(季戊四醇四(3-巰基乙酸)酯)及500ppm奧德裏奇公司製造的MEHQ(對苯二酚單甲醚)攪動30分鐘,對其添加 50g TOT(2,4,6-三烯丙氧基-1,3,5三嗪)、0.5g巴斯夫公司製造的豔佳固754、及0.5g巴斯夫公司製造的TPO-L,並以500rpm將混合物攪動30分鐘,以製備有機障壁層組成物。 On the other hand, 50 g of 4T (pentaerythritol tetrakis (3-mercaptoacetate)) manufactured by Bruno Bock Sulfur Chemicals and 500 ppm of MEHQ (hydroquinone monomethyl ether) manufactured by Aldrich were stirred at 500 rpm for 30 minutes. , Add it 50 g of TOT (2,4,6-triallyloxy-1,3,5 triazine), 0.5 g of Yanjiagu 754 manufactured by BASF, and 0.5 g of TPO-L manufactured by BASF. The mixture was agitated for 30 minutes to prepare an organic barrier layer composition.

在無機障壁層上,以邁耶棒塗佈所述有機障壁層組成物,並在被覆蓋以50μm厚的聚對苯二甲酸乙二酯(PET)膜(T910-E50,三菱株式會社)後接著使用金屬鹵化物燈以1500mJ/cm2進行紫外(UV)固化來形成20μm厚的有機障壁層,以製造障壁膜。 On the inorganic barrier layer, the organic barrier layer composition was coated with a Meyer bar, and after being covered with a 50 μm-thick polyethylene terephthalate (PET) film (T910-E50, Mitsubishi Corporation) Then, a metal halide lamp was subjected to ultraviolet (UV) curing at 1500 mJ / cm 2 to form a 20 μm-thick organic barrier layer to manufacture a barrier film.

製備實例3 Preparation Example 3

除以如下方式製備有機障壁層組成物之外,根據與製備實例1相同的方法來製造障壁膜:以500rpm將50g布魯諾博克含硫化學製品公司製造的4T(季戊四醇四(3-巰基乙酸)酯)及500ppm奧德裏奇公司製造的MEHQ攪動30分鐘。以500rpm將作為多官能芳基化物的40g荒川化學工業公司(Arakawa)製造的HBSQ2052、0.5g巴斯夫公司製造的豔佳固754、及0.5g TPO-L混合並攪動30分鐘,以製備有機障壁層組成物。 A barrier film was manufactured according to the same method as in Preparation Example 1 except that the organic barrier layer composition was prepared as follows: 50 g of 4T (pentaerythritol tetrakis (3-mercaptoacetate)) manufactured by Bruno Bock Sulfur Chemical Co., Ltd. was subjected to 500 rpm ) And 500 ppm of MEHQ manufactured by Aldridge Corporation for 30 minutes. At 500 rpm, 40 g of HBSQ2052 manufactured by Arakawa Chemical Co., Ltd. (Arakawa) as a polyfunctional arylate was mixed with 0.5 g of Yanjiagu 754 manufactured by BASF and 0.5 g of TPO-L for 30 minutes to prepare an organic barrier layer组合 物。 Composition.

製備實例4 Preparation Example 4

除以如下方式製備有機障壁層組成物之外,根據與製備實例1相同的方法來製造障壁膜:以500rpm將50g布魯諾博克含硫化學製品公司製造的4T(季戊四醇四(3-巰基乙酸)酯)及500 ppm奧德裏奇公司製造的MEHQ攪動30分鐘。接著,以500rpm將10g季戊四醇三丙烯酸酯(pentaerythritoltriacrylate,PETA)(M340,韓國美源商事株式會社(Miwon Commercial Co.,Ltd))、0.5g巴斯夫公司製造的豔佳固754、及0.5g TPO-L混合30分鐘,以製備有機障壁層組成物。 A barrier film was manufactured according to the same method as in Preparation Example 1 except that the organic barrier layer composition was prepared as follows: 50 g of 4T (pentaerythritol tetrakis (3-mercaptoacetate)) manufactured by Bruno Bock Sulfur Chemical Co., Ltd. was charged at 500 rpm. ) And 500 The MEHQ manufactured by ppm Aldridge was stirred for 30 minutes. Next, 10 g of pentaerythritol triacrylate (PETA) (M340, Miwon Commercial Co., Ltd., Korea), 0.5 g of Yanjiagu 754 manufactured by BASF, and 0.5 g of TPO- L was mixed for 30 minutes to prepare an organic barrier layer composition.

製備實例5 Preparation Example 5

除以如下方式製備有機障壁層組成物之外,根據與製備實例1相同的方法來製造障壁膜:使用500mJ/cm2的紫外(UV)光劑量、並將3g汽巴精化公司(Ciba Specialty Chemical Inc.)製造的豔佳固184作為聚合起始劑與作為溶劑的25.0g 2-甲氧乙醇(MCS)混合。接著將10g二季戊四醇六丙烯酸酯(dipentaerythritolhexaacrylate,DPHA)(NOPCOMER 4612,聖諾譜科(Sanopco)株式會社)、10g季戊四醇三丙烯酸酯(pentaerythritoltriacrylate,PETA)(M340,韓國美源商事株式會社)、11g A-TMPT-3EO(即,乙氧基化三羥甲基丙烷三丙烯酸酯(ethoxylated trimethylolpropanetriacrylate,TMPT3EOA))作為多官能丙烯酸酯單體、及39.8g異丙醇(isopropyl alcohol,IPA)作為溶劑添加至混合溶液,並攪動所述混合物。最後,對其添加0.2g經聚醚改性的聚二甲基矽氧烷(BYK 306,德國畢克化學公司 (BYK Chemie Inc.))作為勻平改良添加劑的,以製備障壁層組成物。 A barrier film was manufactured according to the same method as in Preparation Example 1 except that the organic barrier layer composition was prepared as follows: 500 mJ / cm 2 of an ultraviolet (UV) light dose was used, and 3 g of Ciba Specialty Yanjiagu 184 manufactured by Chemical Inc.) was mixed as a polymerization initiator with 25.0 g of 2-methoxyethanol (MCS) as a solvent. Next, 10 g of dipentaerythritolhexaacrylate (DPHA) (NOPCOMER 4612, Sanopco Co., Ltd.), 10 g of pentaerythritoltriacrylate (PETA) (M340, Korea Mimoto Corporation), 11g A-TMPT-3EO (that is, ethoxylated trimethylolpropanetriacrylate (TMPT3EOA)) was added as a polyfunctional acrylate monomer, and 39.8 g of isopropyl alcohol (IPA) was added as a solvent To a mixed solution and stir the mixture. Finally, 0.2 g of polyether-modified polydimethylsiloxane (BYK 306, BYK Chemie Inc.) was added as a leveling improvement additive to prepare a barrier layer composition.

製備實例6 Preparation Example 6

除以如下方式製備有機障壁層組成物之外,根據與製備實例1相同的方法來製造障壁膜:使用500mJ/cm2的紫外(UV)光劑量、並將3重量份的汽巴精化公司製造的豔佳固184作為聚合起始劑與作為溶劑的30.0重量份的2-甲氧乙醇(MCS)混合。接著,將5.0重量份的二季戊四醇六丙烯酸酯(dipentaerythritolhexaacrylate,DPHA)(NOPCOMER 4612,聖諾譜科株式會社)、15.0重量份的季戊四醇三丙烯酸酯(PETA)(M340,韓國美源商事株式會社)、及20.0重量份的A-TMPT-3EO作為多官能丙烯酸單體添加至混合溶液,並攪動所述混合物,且接著對其添加26.8重量份的異丙醇(isopropyl alcohol,IPA)作為溶劑,並攪動所獲得的混合物。最後,對其添加0.2重量份的經聚醚改性的聚二甲基矽氧烷(BYK 306,德國畢克化學公司)作為勻平改良添加劑,以獲得紫外(UV)固化型有機障壁層組成物。 A barrier film was manufactured according to the same method as in Preparation Example 1 except that the organic barrier layer composition was prepared as follows: 500 mJ / cm 2 of an ultraviolet (UV) light dose was used, and 3 parts by weight of Ciba Refinery Co., Ltd. was used. The manufactured Yanjiagu 184 was mixed as a polymerization initiator with 30.0 parts by weight of 2-methoxyethanol (MCS) as a solvent. Next, 5.0 parts by weight of dipentaerythritolhexaacrylate (DPHA) (NOPCOMER 4612, Sinopec Co., Ltd.) and 15.0 parts by weight of pentaerythritol triacrylate (PETA) (M340, Korea Miwon Corporation) And 20.0 parts by weight of A-TMPT-3EO as a polyfunctional acrylic monomer is added to the mixed solution, and the mixture is stirred, and then 26.8 parts by weight of isopropyl alcohol (IPA) is added as a solvent, and The obtained mixture was stirred. Finally, 0.2 parts by weight of polyether-modified polydimethylsiloxane (BYK 306, BYK, Germany) was added as a leveling improvement additive to obtain an ultraviolet (UV) curable organic barrier layer composition Thing.

製備實例7 Preparation Example 7

除以如下方式製備有機障壁層組成物之外,根據與製備實例1相同的方法來製造障壁膜:使用500mJ/cm2的紫外(UV)光劑量、並將3重量份的(汽巴精化公司)製造的豔佳固184用 作聚合起始劑與作為溶劑的20.0重量份的2-甲氧乙醇(MCS)混合。接著,將5.0重量份的二季戊四醇六丙烯酸酯(DPHA)(NOPCOMER 4612,聖諾譜科株式會社)、15.0重量份的季戊四醇三丙烯酸酯(PETA)(M340,韓國美源商事株式會社)、及40.0重量份的A-TMPT-3EO作為多官能丙烯酸單體添加至混合溶液,並攪動所述混合物,且接著對其添加16.8重量份的異丙醇(IPA)作為溶劑,並攪動所獲得的混合物。最後,對其添加0.2重量份的經聚醚改性的聚二甲基矽氧烷(BYK 306,德國畢克化學公司)作為勻平改良添加劑,以製備有機障壁層組成物。 A barrier film was manufactured according to the same method as in Preparation Example 1 except that the organic barrier layer composition was prepared in the following manner: an ultraviolet (UV) light dose of 500 mJ / cm 2 was used, and 3 parts by weight of (ciba refined Yanjiagu 184 manufactured by the company) was used as a polymerization initiator and 20.0 parts by weight of 2-methoxyethanol (MCS) as a solvent was mixed. Next, 5.0 parts by weight of dipentaerythritol hexaacrylate (DPHA) (NOPCOMER 4612, Synopsys Co., Ltd.), 15.0 parts by weight of pentaerythritol triacrylate (PETA) (M340, Korea Mimoto Corporation), and 40.0 parts by weight of A-TMPT-3EO was added to the mixed solution as a polyfunctional acrylic monomer, and the mixture was stirred, and then 16.8 parts by weight of isopropyl alcohol (IPA) was added thereto as a solvent, and the obtained mixture was stirred . Finally, 0.2 parts by weight of polyether-modified polydimethylsiloxane (BYK 306, BYK, Germany) was added as a leveling improvement additive to prepare an organic barrier layer composition.

製備實例8 Preparation Example 8

除以如下方式製備有機障壁層組成物之外,根據與製備實例1相同的方法來製造障壁膜:使用500mJ/cm2的紫外(UV)光劑量、並將0.6重量份的芳香族鋶銻鹽(三新化學株式會社(Sanshin Chemical Inc.))用作陽離子起始劑與作為溶劑的20.0重量份的2-甲氧乙醇(MCS)混合。接著將40.0重量份的環脂環氧樹脂(CELLOXIDE 2021P,大賽璐株式會社(Daicel Co.))添加至混合溶液,並對其進行攪動,且接著對其添加39.2重量份的異丙醇(IPA)作為溶劑,並對其進行攪動。最後,對其添加0.2重量份的經聚醚改性的聚二甲基矽氧烷(BYK 306,德國畢克化學公司)作為勻平改良添加劑,以製備障壁層組成物。 A barrier film was manufactured according to the same method as in Preparation Example 1 except that the organic barrier layer composition was prepared in the following manner: an ultraviolet (UV) light dose of 500 mJ / cm 2 was used, and 0.6 parts by weight of an aromatic samarium antimony salt was used. (Sanshin Chemical Inc.) was used as a cationic initiator and 20.0 parts by weight of 2-methoxyethanol (MCS) as a solvent was mixed. Next, 40.0 parts by weight of a cycloaliphatic epoxy resin (CELLOXIDE 2021P, Daicel Co.) was added to the mixed solution, and it was stirred, and then 39.2 parts by weight of isopropyl alcohol (IPA ) As a solvent and agitate it. Finally, 0.2 parts by weight of polyether-modified polydimethylsiloxane (BYK 306, BYK, Germany) was added as a leveling improvement additive to prepare a barrier layer composition.

製備實例9 Preparation Example 9

藉由以高頻加熱方法沈積氧化矽(SiO)以在75μm厚的聚對苯二甲酸乙二酯(PET)膜(T910-E,三菱株式會社)上形成約30nm厚的SiOx(0<x<3)沈積層作為無機障壁層來製造障壁膜。 A silicon oxide (SiO) was deposited by a high-frequency heating method to form an approximately 30 nm-thick SiO x on a 75 μm-thick polyethylene terephthalate (PET) film (T910-E, Mitsubishi Corporation) (0 < x <3) The deposited layer is used as an inorganic barrier layer to make a barrier film.

製備實例10 Preparation Example 10

藉由以高頻加熱方法沈積SiOx(0<x<3)以在75μm厚的聚對苯二甲酸乙二酯(PET)膜(T910-E,三菱株式會社)上形成約100nm厚的無機障壁層來製造障壁膜。 SiO x (0 <x <3) was deposited by a high-frequency heating method to form an approximately 100 nm-thick inorganic film on a 75 μm-thick polyethylene terephthalate (PET) film (T910-E, Mitsubishi Corporation). Barrier layer to make a barrier film.

實例1 Example 1

藉由以下方式來製造光學膜:將具有InP/ZnS芯/殼結構的含量子點塗佈液(Nanodot 520,意高弗勒克斯公司(Ecoflux))注射入根據製備實例1的障壁膜的有機障壁層中,以形成100μm的含量子點塗佈層;以根據製備實例1的障壁膜的有機障壁層覆蓋所述塗佈層的未接觸有機障壁層的另一側;以及調整間隔壁,以使用金屬鹵化物燈以700mJ/cm2的紫外(UV)光來固化所述含量子點塗佈層。 An optical film was manufactured by injecting a content sub-dot coating solution (Nanodot 520, Ecoflux) having an InP / ZnS core / shell structure into the organic barrier of the barrier film according to Preparation Example 1 Layer to form a sub-dot coating layer with a content of 100 μm; cover the other side of the coating layer that does not contact the organic barrier layer with the organic barrier layer of the barrier film according to Preparation Example 1; and adjust the partition wall to use The metal halide lamp cures the content sub-dot coating layer with ultraviolet (UV) light of 700 mJ / cm 2 .

實例2 Example 2

藉由以下方式來製造光學膜:將具有InP/ZnS芯/殼結構的含量子點塗佈液(Nanodot 520,意高弗勒克斯公司)注射入根據製備實例1的障壁膜的PET層中,以形成100μm厚的含量子點 塗佈層;以根據製備實例1的障壁膜的PET層覆蓋所述塗佈層的未接觸PET的另一側;以及調整間隔壁,以使用金屬鹵化物燈以700mJ/cm2的紫外(UV)光來固化所述含量子點塗佈層。 An optical film was manufactured by injecting a content sub-dot coating solution (Nanodot 520, Egoflex Co., Ltd.) having an InP / ZnS core / shell structure into the PET layer of the barrier film according to Preparation Example 1 to Forming a 100 μm thick sub-dot coating layer; covering the non-contacting PET side of the coating layer with the PET layer of the barrier film according to Preparation Example 1; and adjusting the partition wall to use a metal halide lamp at 700 mJ / cm 2 of ultraviolet (UV) light to cure the content sub-dot coating layer.

實例3 Example 3

藉由以下方式來製造光學膜:將具有InP/ZnS芯/殼結構的含量子點塗佈液(Nanodot 520,意高弗勒克斯公司)注射入根據製備實例2的障壁膜的75μm厚的PET層中,以形成100μm厚的含量子點塗佈層;以根據實例2的障壁膜的50μm厚的PET層覆蓋所述塗佈層的未接觸PET層的另一側;以及調整間隔壁,以使用金屬鹵化物燈以700mJ/cm2的紫外(UV)光來固化所述含量子點塗佈層。 An optical film was manufactured by injecting a content dot coating solution (Nanodot 520, Egoflex Co., Ltd.) having an InP / ZnS core / shell structure into a 75 μm-thick PET layer of the barrier film according to Preparation Example 2 In order to form a 100 μm thick sub-dot coating layer; cover the other side of the coating layer that is not in contact with the PET layer with a 50 μm thick PET layer of the barrier film according to Example 2; and adjust the partition wall to use The metal halide lamp cures the content sub-dot coating layer with ultraviolet (UV) light of 700 mJ / cm 2 .

實例4 Example 4

藉由以下方式來製造光學膜:注射具有InP/ZnS芯/殼結構的含量子點塗佈液(Nanodot 520,意高弗勒克斯公司),以在根據製備實例2的障壁膜的50μm厚的PET層上形成100μm厚的含量子點塗佈層;以根據製備實例2的障壁膜的50μm厚的PET層覆蓋塗佈層的未接觸PET層的另一側;以及調整間隔壁,以使用金屬鹵化物燈以700mJ/cm2的紫外(UV)光來固化所述含量子點塗佈層。 An optical film was manufactured by injecting a content sub-dot coating solution (Nanodot 520, Egoflex Co., Ltd.) having an InP / ZnS core / shell structure to a 50 μm-thick PET film of the barrier film according to Preparation Example 2 A 100 μm thick sub-dot coating layer was formed on the layer; the other side of the coating layer that was not in contact with the PET layer was covered with a 50 μm thick PET layer of the barrier film according to Preparation Example 2; and the partition wall was adjusted to use metal halide The object lamp cures the content sub-dot coating layer with 700 mJ / cm 2 of ultraviolet (UV) light.

實例5 Example 5

除使用根據製備實例3的障壁膜而非使用根據製備實例1的障壁膜外,根據與實例1相同的方法來製造光學膜。 An optical film was manufactured according to the same method as in Example 1 except that the barrier film according to Preparation Example 3 was used instead of the barrier film according to Preparation Example 1.

實例6 Example 6

除使用根據製備實例4的障壁膜而非使用根據製備實例1的障壁膜外,根據與實例1相同的方法來製造光學膜。 An optical film was manufactured according to the same method as in Example 1 except that the barrier film according to Preparation Example 4 was used instead of the barrier film according to Preparation Example 1.

實例7 Example 7

除使用根據製備實例5的障壁膜而非使用根據製備實例1的障壁膜外,根據與實例1相同的方法來製造光學膜。 An optical film was manufactured according to the same method as in Example 1 except that the barrier film according to Preparation Example 5 was used instead of the barrier film according to Preparation Example 1.

實例8 Example 8

除使用根據製備實例6的障壁膜而非使用根據製備實例1的障壁膜外,根據與實例1相同的方法來製造光學膜。 An optical film was manufactured according to the same method as in Example 1 except that the barrier film according to Preparation Example 6 was used instead of using the barrier film according to Preparation Example 1.

實例9 Example 9

除使用根據製備實例7的障壁膜而非使用根據製備實例1的障壁膜外,根據與實例1相同的方法來製造光學膜。 An optical film was manufactured according to the same method as in Example 1 except that the barrier film according to Preparation Example 7 was used instead of using the barrier film according to Preparation Example 1.

實例10 Example 10

除使用根據製備實例8的障壁膜而非使用根據製備實例1的障壁膜外,根據與實例1相同的方法來製造光學膜。 An optical film was manufactured according to the same method as in Example 1 except that the barrier film according to Preparation Example 8 was used instead of the barrier film according to Preparation Example 1.

比較實例1 Comparative Example 1

除使用根據製備實例9的障壁膜而非使用根據製備實例1的障壁膜外,根據與實例1相同的方法來製造光學膜。 An optical film was manufactured according to the same method as in Example 1 except that the barrier film according to Preparation Example 9 was used instead of using the barrier film according to Preparation Example 1.

比較實例2 Comparative Example 2

除使用根據製備實例10的障壁膜而非使用根據製備實例1的障壁膜外,根據與實例1相同的方法來製造光學膜。 An optical film was manufactured according to the same method as in Example 1 except that the barrier film according to Preparation Example 10 was used instead of using the barrier film according to Preparation Example 1.

高溫儲存的評估 Evaluation of high temperature storage

將根據實例1至實例10及比較實例1及比較實例2的光學膜(試樣大小:100mm×100mm)在60℃下儲存500小時,打開藍色LED,並在60℃下儲存,且接著使用分光輻射計(CS2000,柯尼卡美能達株式會社(Konica Minnolta Inc.))對照度進行量測。當將在高溫儲存之前的照度視作100%時,在高溫儲存之後的相對照度提供於表1中。 The optical films (sample size: 100 mm × 100 mm) according to Examples 1 to 10 and Comparative Examples 1 and 2 were stored at 60 ° C for 500 hours, the blue LED was turned on, and stored at 60 ° C, and then used Spectroradiometer (CS2000, Konica Minnolta Inc.) was measured against the degree. When the illuminance before high temperature storage is regarded as 100%, the relative degree after high temperature storage is provided in Table 1.

水份蒸汽透過率(Moisture Vapor Transmittance RateWVTR) Moisture Vapor Transmittance Rate ( WVTR )

根據ASTM F-1249使用Aquatran Model1(美國摩康有限公司(Mocon Inc.))對根據製備實例1至製備實例10的障壁膜(試樣大小:100mm×100mm)的水份蒸汽透過率進行量測。結果提供於表1中。 The water vapor transmission rate of the barrier film (sample size: 100 mm × 100 mm) according to Preparation Example 1 to Preparation Example 10 was measured using Aquatran Model 1 (Mocon Inc.) according to ASTM F-1249. . The results are provided in Table 1.

氧氣透過率(Oxygen Transmittance RateOTR) Oxygen Transmittance Rate ( OTR )

根據ASTM D-3985使用OX-tran 2/21(美國摩康有限公司)對根據製備實例1至製備實例10的障壁膜(試樣大小:100mm×100mm)的氧氣透過率進行量測。結果提供於表1中。 The oxygen transmission rate of the barrier films (sample size: 100 mm × 100 mm) according to Preparation Example 1 to Preparation Example 10 was measured using OX-tran 2/21 (American Mocom Inc.) according to ASTM D-3985. The results are provided in Table 1.

Figure TWI614134BD00001
Figure TWI614134BD00001
Figure TWI614134BD00002
Figure TWI614134BD00002

參照表1,根據實例1至實例10的光學膜當在高溫下儲存時未表現出量子點特性劣化,且表現出極佳的水份及氧氣阻隔性質及極佳的膜特性。 Referring to Table 1, the optical films according to Examples 1 to 10 did not exhibit degradation of quantum dot characteristics when stored at high temperatures, and exhibited excellent moisture and oxygen barrier properties and excellent film characteristics.

儘管已結合當前被視為可行的示例性實施例闡述了本發明,然而應理解,本發明並非僅限於所揭露的實施例,而是相反,旨在覆蓋包含於隨附申請專利範圍的精神及範圍內的各種潤飾及等效配置。因此,應將上述實施例理解為示例性的,而非以任何方式限制本發明。 Although the invention has been described in connection with exemplary embodiments that are presently considered feasible, it should be understood that the invention is not limited to the disclosed embodiments, but rather, is intended to cover the spirit and Various retouching and equivalent configurations within the range. Therefore, the above-mentioned embodiments should be understood as exemplary, rather than limiting the present invention in any way.

10B‧‧‧光學膜 10B‧‧‧ Optical Film

12‧‧‧芯層 12‧‧‧ core layer

14a、14b‧‧‧聚合物層 14a, 14b‧‧‧Polymer layer

16a、16b‧‧‧無機障壁層 16a, 16b‧‧‧‧Inorganic barrier layer

18a、18b‧‧‧有機障壁層 18a, 18b‧‧‧ organic barrier layer

Claims (21)

一種光學膜,包括:芯層,包含第一聚合物及散佈於所述第一聚合物中的多個量子點;有機/無機障壁層,包括至少一個無機障壁層及至少一個有機障壁層,且安置於所述芯層上;以及聚合物層,包含第二聚合物,其中所述聚合物層安置於所述芯層與所述有機/無機障壁層之間。 An optical film includes a core layer including a first polymer and a plurality of quantum dots dispersed in the first polymer; an organic / inorganic barrier layer including at least one inorganic barrier layer and at least one organic barrier layer, and Disposed on the core layer; and a polymer layer including a second polymer, wherein the polymer layer is disposed between the core layer and the organic / inorganic barrier layer. 如申請專利範圍第1項所述的光學膜,其中所述至少一個無機障壁層安置於所述芯層上,所述至少一個無機障壁層安置於所述至少一個有機障壁層上,且包含所述第二聚合物的所述聚合物層安置於所述芯層的兩側上。 The optical film according to item 1 of the patent application scope, wherein the at least one inorganic barrier layer is disposed on the core layer, the at least one inorganic barrier layer is disposed on the at least one organic barrier layer, and includes The polymer layer of the second polymer is disposed on both sides of the core layer. 如申請專利範圍第1項所述的光學膜,其中包含所述第二聚合物的所述聚合物層安置於所述芯層的兩側上,所述至少一個無機障壁層安置於所述聚合物層上,且所述至少一個有機障壁層安置於所述至少一個無機障壁層上。 The optical film according to item 1 of the patent application scope, wherein the polymer layer including the second polymer is disposed on both sides of the core layer, and the at least one inorganic barrier layer is disposed on the polymer And the at least one organic barrier layer is disposed on the at least one inorganic barrier layer. 如申請專利範圍第1項所述的光學膜,其中包含所述第二聚合物的所述聚合物層安置於所述芯層的兩側上,所述至少一個有機障壁層安置於所述聚合物層上,且所述至少一個無機障壁層安置於所述至少一個有機障壁層上。 The optical film according to claim 1, wherein the polymer layer containing the second polymer is disposed on both sides of the core layer, and the at least one organic barrier layer is disposed on the polymer And the at least one inorganic barrier layer is disposed on the at least one organic barrier layer. 如申請專利範圍第1項所述的光學膜,其中所述第一聚合物包含矽酮樹脂、環氧樹脂、(甲基)丙烯酸酯系樹脂、聚碳酸酯、聚苯乙烯、聚烯烴或其組合。 The optical film according to item 1 of the patent application scope, wherein the first polymer comprises a silicone resin, an epoxy resin, a (meth) acrylate resin, a polycarbonate, a polystyrene, a polyolefin, or the like combination. 如申請專利範圍第1項所述的光學膜,其中所述量子點選自II-VI族化合物、III-V族化合物、IV-IV族化合物、IV族元素、IV族化合物及其組合。 The optical film according to item 1 of the scope of patent application, wherein the quantum dot is selected from the group consisting of a group II-VI compound, a group III-V compound, a group IV-IV compound, a group IV element, a group IV compound, and a combination thereof. 如申請專利範圍第1項所述的光學膜,其中所述第二聚合物選自聚酯、聚(甲基)丙烯腈、聚碳酸酯、聚烯烴、環烯烴聚合物、聚醯亞胺及其組合。 The optical film according to item 1 of the patent application range, wherein the second polymer is selected from the group consisting of polyester, poly (meth) acrylonitrile, polycarbonate, polyolefin, cycloolefin polymer, polyimide, and Its combination. 如申請專利範圍第1項所述的光學膜,其中所述無機障壁層包含選自以下中的至少一者:氧化矽(SiOx,0<x<3)、氧化鋁(AlxOy,0<x<3,0<y<3)、氧化鉭(TaxOy,0<x<3,0<y<3)、氧化鈦(TiOx,0<x<3)及其組合。 The optical film according to item 1 of the scope of patent application, wherein the inorganic barrier layer includes at least one selected from the group consisting of silicon oxide (SiO x , 0 <x <3), aluminum oxide (Al x O y , 0 <x <3, 0 <y <3), tantalum oxide (Ta x O y , 0 <x <3, 0 <y <3), titanium oxide (TiO x , 0 <x <3), and combinations thereof. 如申請專利範圍第1項所述的光學膜,其中所述有機障壁層包含選自以下中的至少一者:(甲基)丙烯酸樹脂、環氧樹脂、胺基甲酸酯樹脂、硫醇烯樹脂及其組合。 The optical film according to item 1 of the scope of patent application, wherein the organic barrier layer comprises at least one selected from the group consisting of (meth) acrylic resin, epoxy resin, urethane resin, thiolene Resin and its combination. 如申請專利範圍第1項所述的光學膜,其中所述光學膜更包括位於所述光學膜的最外表面上的保護層。 The optical film according to item 1 of the patent application scope, wherein the optical film further includes a protective layer on an outermost surface of the optical film. 如申請專利範圍第10項所述的光學膜,其中所述保護層包含選自以下的聚合物:聚酯、聚(甲基)丙烯腈、聚碳酸酯、聚烯烴、環烯烴聚合物、聚醯亞胺及其組合。 The optical film of claim 10, wherein the protective layer comprises a polymer selected from the group consisting of polyester, poly (meth) acrylonitrile, polycarbonate, polyolefin, cycloolefin polymer, poly Hydrazone and combinations thereof. 如申請專利範圍第1項所述的光學膜,其中所述光學膜在其最外表面上具有凹槽及突起。 The optical film according to item 1 of the scope of patent application, wherein the optical film has grooves and protrusions on its outermost surface. 一種製造光學膜的方法,包括:藉由以下方式製備障壁膜:在包含第二聚合物的聚合物層上沈積無機氧化物以形成無機障壁層,並接著在所述無機障壁層上塗佈包含可固化單體、起始劑及溶劑的有機障壁層組成物,然後固化所述有機障壁層組成物以形成有機障壁層,或者在包含第二聚合物的聚合物層上塗佈包含可固化單體、起始劑及溶劑的有機障壁層組成物並接著固化所述有機障壁層組成物以形成有機障壁層,並接著在所述有機障壁層上沈積無機氧化物以形成無機障壁層;以及將所述障壁膜的最外表面處的所述聚合物層轉移至芯層的兩側上,所述芯層包含散佈於第一聚合物中的多個量子點。 A method of manufacturing an optical film, comprising: preparing a barrier film by depositing an inorganic oxide on a polymer layer including a second polymer to form an inorganic barrier layer, and then coating the inorganic barrier layer with An organic barrier layer composition of a curable monomer, an initiator, and a solvent, and then curing the organic barrier layer composition to form an organic barrier layer, or coating a polymer layer including a curable monomer on a polymer layer including a second polymer An organic barrier layer composition of a polymer, an initiator and a solvent, and then curing the organic barrier layer composition to form an organic barrier layer, and then depositing an inorganic oxide on the organic barrier layer to form an inorganic barrier layer; and The polymer layer at the outermost surface of the barrier film is transferred to both sides of a core layer, and the core layer includes a plurality of quantum dots dispersed in a first polymer. 如申請專利範圍第13項所述的製造光學膜的方法,其中所述第一聚合物選自矽酮樹脂、環氧樹脂、(甲基)丙烯酸酯系樹脂、聚碳酸酯、聚苯乙烯、聚烯烴及其組合。 The method for manufacturing an optical film according to item 13 of the scope of patent application, wherein the first polymer is selected from the group consisting of silicone resin, epoxy resin, (meth) acrylate resin, polycarbonate, polystyrene, Polyolefins and combinations thereof. 如申請專利範圍第13項所述的製造光學膜的方法,其中所述第二聚合物選自聚酯、聚(甲基)丙烯腈、聚碳酸酯、聚烯烴、環烯烴聚合物、聚醯亞胺及其組合。 The method for manufacturing an optical film according to item 13 of the scope of patent application, wherein the second polymer is selected from the group consisting of polyester, poly (meth) acrylonitrile, polycarbonate, polyolefin, cycloolefin polymer, and polyfluorene Imine and combinations thereof. 如申請專利範圍第13項所述的製造光學膜的方法,其中所述無機障壁層包含選自以下中的至少一者:氧化矽(SiOx, 0<x<3)、氧化鋁(AlxOy,0<x<3,0<y<3)、氧化鉭(TaxOy,0<x<3,0<y<3)、氧化鈦(TiOx,0<x<3)及其組合。 The method for manufacturing an optical film according to item 13 of the scope of patent application, wherein the inorganic barrier layer comprises at least one selected from the group consisting of silicon oxide (SiO x , 0 <x <3), aluminum oxide (Al x O y , 0 <x <3, 0 <y <3), tantalum oxide (Ta x O y , 0 <x <3, 0 <y <3), titanium oxide (TiO x , 0 <x <3), and Its combination. 如申請專利範圍第13項所述的製造光學膜的方法,其中所述有機障壁層包含選自以下中的至少一者:(甲基)丙烯酸樹脂、環氧樹脂、胺基甲酸酯樹脂、硫醇烯樹脂及其組合。 The method for manufacturing an optical film according to item 13 of the scope of patent application, wherein the organic barrier layer comprises at least one selected from the group consisting of (meth) acrylic resin, epoxy resin, urethane resin, Thiolene resins and combinations thereof. 如申請專利範圍第13項所述的製造光學膜的方法,其中所述製造光學膜的方法更包括:在所述光學膜的最外表面上形成保護層。 The method for manufacturing an optical film according to item 13 of the patent application scope, wherein the method for manufacturing an optical film further comprises: forming a protective layer on an outermost surface of the optical film. 如申請專利範圍第13項所述的製造光學膜的方法,其中所述可固化單體是在固化後提供(甲基)丙烯酸樹脂、環氧樹脂、胺基甲酸酯樹脂、硫醇烯樹脂或其組合的單體。 The method for manufacturing an optical film according to item 13 of the scope of patent application, wherein the curable monomer is to provide a (meth) acrylic resin, an epoxy resin, a urethane resin, a thiolene resin after curing. Or a combination thereof. 一種背光單元,包括如申請專利範圍第1項至第12項中的一項所述的光學膜。 A backlight unit includes the optical film according to one of items 1 to 12 of the scope of patent application. 一種顯示裝置,包括如申請專利範圍第1項至第12項中的一項所述的光學膜。 A display device includes the optical film according to one of items 1 to 12 of the scope of patent application.
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