TWI612493B - Dose distribution computing apparatus and particle beam therapy apparatus having dose distribution computing apparatus - Google Patents

Dose distribution computing apparatus and particle beam therapy apparatus having dose distribution computing apparatus Download PDF

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TWI612493B
TWI612493B TW105140414A TW105140414A TWI612493B TW I612493 B TWI612493 B TW I612493B TW 105140414 A TW105140414 A TW 105140414A TW 105140414 A TW105140414 A TW 105140414A TW I612493 B TWI612493 B TW I612493B
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error
line quantity
line
distribution
distribution calculation
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TW201741989A (en
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坂本裕介
西沢志
林真照
東哲史
笹野理
本田泰三
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三菱電機股份有限公司
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    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61NELECTROTHERAPY; MAGNETOTHERAPY; RADIATION THERAPY; ULTRASOUND THERAPY
    • A61N5/00Radiation therapy
    • A61N5/10X-ray therapy; Gamma-ray therapy; Particle-irradiation therapy

Abstract

藉由線量誤差分布演算部13,對於依據治療計畫資訊記憶部11所記憶之治療計畫資訊之照射,因應誤差資訊記憶部12所記憶之由於粒子射線治療裝置所包含之機器的動作誤差、照射對象的動作所產生之點位置、能量、射束照射量之中至少一者之誤差的資訊,考慮誤差對線量分布造成之影響而演算線量誤差的分布,藉此可不使線量分布的測量精確度下降而謀求縮短測量時間。 The radiation error distribution calculation unit 13 irradiates the treatment plan information stored in the treatment plan information storage unit 11 in accordance with the operation error of the machine included in the particle beam treatment device stored in the error information storage unit 12, Information on the error of at least one of the point position, energy, and beam exposure caused by the action of the irradiation target. The distribution of the linear error is calculated by considering the effect of the error on the linear quantity distribution, thereby preventing the measurement of the linear quantity distribution from being accurate. The degree is reduced to reduce the measurement time.

Description

線量分布演算裝置及具有線量分布演算裝置之粒子射線治療裝置 Line quantity distribution calculation device and particle ray treatment device with line quantity distribution calculation device

本發明係關於線量分布演算裝置及具備線量分布演算裝置之粒子射線治療裝置,該線量分布演算裝置係在對腫瘤等患部照射質子及碳離子等粒子射束(粒子射線)而進行治療之粒子射線治療中,藉由配合患部的三維形狀照射預定的線量之粒子射線的線量分布測量而進行線量分布之演算者。 The present invention relates to a radiation distribution calculation device and a particle beam treatment device provided with the radiation distribution calculation device. The radiation distribution calculation device is a particle beam that is irradiated with a particle beam (particle beam) such as protons and carbon ions to an affected part such as a tumor. In the treatment, the calculation of the line volume distribution is performed by measuring the line volume distribution of particle rays irradiating a predetermined line volume in accordance with the three-dimensional shape of the affected part.

粒子射線治療係使用加速器等機器將質子或碳離子等帶電粒子加速至數百百萬(mega)電子伏特程度,並對患者進行照射而藉此對腫瘤賦予線量,以治療癌症之方法。此時對於腫瘤形成由醫師所指示之線量分布,亦即形成盡可能接近目標分布之線量分布係極為重要。在大多數情形,目標分布係在腫瘤內線量為儘可能均勻,且在腫瘤外係比腫瘤內使線量成為儘可能成為更低之分布。然而,並不一定要成為上述分布,亦可能設為例如以對腫 瘤外之線量儘可能設成較低為優先,而使在腫瘤內的線量不均勻之目標分布。再者,在藉由對於患者組合來自複數個角度之粒子射線照射,並將每個角度的照射量及線量分布最佳化而使整體的賦予線量成為更為理想之分布IMPT(Intensity Modulated Particle Therapy,強度調控粒子線治療)中,來自單一角度之照射線量分布在腫瘤內通常並不均勻。 Particle beam therapy is a method of treating cancer by accelerating charged particles such as protons or carbon ions to the level of hundreds of millions of electron volts using a device such as an accelerator, and irradiating a patient to give a tumor a linear amount. At this time, it is extremely important for the tumor to form a line volume distribution instructed by the physician, that is, to form a line volume distribution as close as possible to the target distribution. In most cases, the target distribution line is as uniform as possible in the tumor, and the line distribution in the extra-tumor system is as low as possible. However, it does not have to be the above distribution, and it may be set to It is preferred to set the line outside the tumor as low as possible, so that the target distribution of the line inside the tumor is uneven. Furthermore, by combining particle radiation from a plurality of angles to the patient, and optimizing the irradiation dose and line quantity distribution at each angle, the overall given line quantity becomes a more ideal distribution IMPT (Intensity Modulated Particle Therapy) (Intensity-regulated particle beam therapy), the radiation dose distribution from a single angle is usually not uniform in the tumor.

一般而言,在對物體(包含人體)照射經過加速器加速之粒子射束時,在物體內的三維線量分布具有在某1點成為線量最大峰值之特性。該線量最大峰值稱為布拉格峰值。再者,在三維空間中,於1點具有線量最大峰值時,將該峰值位置定義為粒子射束的「照射位置」。為了使用具有上述峰值構造之粒子射束而形成三維的目標分布,需要某些特別的技術手段。 Generally speaking, when an object (including a human body) is irradiated with a particle beam accelerated by an accelerator, the three-dimensional line volume distribution in the object has a characteristic that the line volume peaks at a certain point. This line maximum peak is called the Bragg peak. In addition, in a three-dimensional space, when there is a peak of the line quantity at one point, the peak position is defined as the "irradiation position" of the particle beam. In order to form a three-dimensional target distribution using a particle beam having the above-mentioned peak structure, some special technical means are required.

用以形成目標分布之一種方法係有掃描照射法。為了使用該種方法,首先係使用利用電磁鐵等將粒子射束朝相對於粒子射束的行進方向之Z方向成正交之2個方向,亦即朝X及Y方向任意地偏向之機構。再者,需要有藉由粒子能量的調整,而於Z方向任意地調整形成布拉格峰值之位置之功能。一般而言,進行粒子射束的輸送及遮斷之粒子射束產生輸送裝置係具備加速粒子射束之加速器,該加速器亦具備能量調整功能。然後在腫瘤內設定複數個照射位置(亦稱為點(spot)),並利用上述2個機構對各個照射位置依序照射粒子射束。預先調整並決定對各照射位置分別賦予之線量的平衡,並合計在各照射位置賦予 之各個線量分布,而在結果形成目標分布。 One method for forming a target distribution is a scanning irradiation method. In order to use this method, first, a mechanism that uses an electromagnet or the like to make the particle beam perpendicular to the Z direction with respect to the traveling direction of the particle beam in two directions, that is, arbitrarily biased in the X and Y directions. Furthermore, it is necessary to have a function of arbitrarily adjusting the position where the Bragg peak is formed in the Z direction by adjusting the particle energy. Generally speaking, a particle beam generating and conveying device that transports and blocks a particle beam is an accelerator that accelerates the particle beam, and the accelerator also has an energy adjustment function. Then, a plurality of irradiation positions (also called spots) are set in the tumor, and the above-mentioned two mechanisms are used to sequentially irradiate a particle beam to each irradiation position. Adjust and determine the balance of the amount of radiation given to each irradiation position in advance, and add the total amount of radiation to each irradiation position. Each line quantity is distributed, and a target distribution is formed in the result.

於掃描照射法中,於實際的照射會有各種不確定因素,因此即便在計算上能夠獲得目標分布,在實際獲得之線量分布亦可能不會成為目標分布。就不確定因素而言,例如有粒子射束量的時間變化、掃描電磁鐵的磁場時間變化及磁滯、線量監視器的靈敏度差異、控制機器的訊號延遲及雜訊等。被認為由於該等影響,而導致實際的線量分布與計算值不同。 In the scanning irradiation method, there are various uncertain factors in the actual irradiation, so even if the target distribution can be calculated, the actual linear distribution may not become the target distribution. In terms of uncertain factors, such as the time variation of the particle beam amount, the time variation of the magnetic field of the scanning electromagnet and the hysteresis, the sensitivity difference of the line monitor, the signal delay and noise of the control device, and so on. It is considered that due to these effects, the actual line volume distribution is different from the calculated value.

為了排除前述不確定性,通常在策劃好粒子線治療的計畫後且對患者實際進行照射前,進行以與計畫盡可能相同之條件對假體(患者代替物)實施射束照射,測量線量絕對值及線量分布,而確認是否符合計畫之作業(例如參閱非專利文獻1)。該作業稱為患者QA(Quality Assurance,品質保證)。假體通常使用裝入水槽之水,並使用設置於水中之線量測量裝置來測量線量。從患者QA之目的考量,不僅是腫瘤中心之決定線量值而亦期望確認其周圍之線量分布,因此較佳是在複數個測量點測量線量。 In order to eliminate the aforementioned uncertainties, usually after planning a particle beam treatment and before actually irradiating the patient, a beam irradiation and measurement are performed on the prosthesis (patient substitute) under the same conditions as the plan The absolute value of the line quantity and the line quantity distribution are checked for compliance with the planned operation (for example, see Non-Patent Document 1). This operation is called patient QA (Quality Assurance). The prosthesis usually uses water filled in a water tank, and uses a line quantity measuring device provided in the water to measure the line quantity. Considering the purpose of patient QA, it is not only the determination of the line quantity of the tumor center but also the confirmation of the line quantity distribution around it. Therefore, it is preferable to measure the line quantity at a plurality of measurement points.

[先前技術文獻] [Prior technical literature] [專利文獻] [Patent Literature]

非專利文獻1:T. Inaniwa, et al., “Development of treatment planning for scanning irradiation at HIMAC”, Nuclear Instruments and Methods in Physics Research B 266 (2008)2194-2198 Non-Patent Document 1: T. Inaniwa, et al., "Development of treatment planning for scanning irradiation at HIMAC", Nuclear Instruments and Methods in Physics Research B 266 (2008) 2194-2198

於粒子射線之掃描照射中測量線量分布時,在使用利用一般的電離箱之線量計時,對於1次的掃描照射僅能測量1個點。因此,要在複數個點測量線量時,必須實施與測量點的數量相同次數之掃描照射,而有耗費時間之問題。再者,在一般的粒子射線治療設施中,係規定有在1周內能夠照射之射束照射量的上限。由於患者QA必須按每個患者實施,故當患者QA所耗費的時間及照射次數變大,就會有治療設施能夠接受亦即能夠進行治療之患者人數變少之問題。 When measuring the line quantity distribution during particle beam scanning irradiation, when using a general ionization box line timing, only one point can be measured for one scanning irradiation. Therefore, in order to measure the line quantity at a plurality of points, it is necessary to perform scanning irradiation the same number of times as the number of measurement points, and there is a problem that it takes time. Furthermore, in a general particle beam treatment facility, there is an upper limit on the amount of beam irradiation that can be irradiated in one week. Since patient QA must be implemented on a per-patient basis, as the time and number of exposures to patient QA increases, there will be a problem that the number of patients that can be treated by the treatment facility, that is, can be reduced.

就為了解決上述課題之單純的方法而言,係考量有一次測量多點的線量之方法。例如,藉由利用輻射線感受性膜,可一次測量二維面內的線量分布。然而,在該方法中,有膜生產之每個批次間的差異及線量與膜靈敏度的線質相依性等問題,相較於一般的電離箱有測量精確度較低之問題。再者,就一次測量多點的線量之別的方法而言,亦可排列多個小型電離箱。然而,在該方法中,難以使電離箱的配置間隔比大約1cm更小,而有工作精確度及配線等困難之問題。再者,打至電離箱的電極而散射之粒子射束係可能影響其他的電離箱的測量值,而仍有測量精確度會下降之問題。 In order to solve the above-mentioned problem, the simple method is to consider the method of measuring the line quantity of multiple points at one time. For example, by using a radiation-sensitive film, the line quantity distribution in a two-dimensional plane can be measured at one time. However, in this method, there are problems such as the difference between each batch of film production and the linear quality dependence of the line quantity and the film sensitivity. Compared with the general ionization box, there is a problem of lower measurement accuracy. In addition, in the method of measuring the line quantity of a plurality of points at a time, a plurality of small ionization boxes may be arranged. However, in this method, it is difficult to make the arrangement interval of the ionization box smaller than about 1 cm, and there are problems such as working accuracy and wiring. Furthermore, the scattered particle beam hitting the electrodes of the ionization box may affect the measurement values of other ionization boxes, but there is still a problem that the measurement accuracy will decrease.

本發明係有為了解決上述課題而研創者,目的在於提種一種線量分布演算裝置及具備線量分布演算 裝置之粒子射線治療裝置,係可於粒子射線掃描照射之患者QA中不會使線量分布的測量精確度下降,而謀求縮短測量時間。 The present invention was developed by a researcher to solve the above-mentioned problems, and an object thereof is to provide a line quantity distribution calculation device and a line quantity distribution calculation device. The particle ray treatment device of the device can reduce the measurement accuracy of the line volume distribution in the QA of the patient irradiated by the particle ray scan, and strives to shorten the measurement time.

本發明之線量分布演算裝置之特徵在於包括:治療計畫資訊記憶部,係記憶治療計畫的資訊;誤差資訊記憶部,係記憶誤差之資訊;以及線量誤差分布演算部,係對於依據前述治療計畫資訊記憶部所記憶之前述治療計畫資訊之照射,因應前述誤差資訊記憶部所記憶之前述誤差資訊,演算線量誤差之分布。 The line quantity distribution calculation device of the present invention is characterized by comprising: a treatment plan information storage unit, which stores information of the treatment plan; an error information storage unit, which stores information of the error; The irradiation of the aforementioned treatment plan information stored in the plan information storage unit calculates the distribution of the line error in accordance with the aforementioned error information stored in the aforementioned error information storage unit.

依據本發明,對於依據治療計畫資訊之照射,係藉由因應前述誤差資訊而演算線量誤差之分布,而可不使線量分布的測量精確度下降來謀求縮短測量時間。 According to the present invention, the irradiation time based on the treatment plan information is calculated by reducing the distribution of the line quantity error in accordance with the aforementioned error information without reducing the measurement accuracy of the line quantity distribution, thereby reducing the measurement time.

1‧‧‧線量分布演算裝置 1‧‧‧ Line quantity distribution calculation device

2‧‧‧粒子射束 2‧‧‧ particle beam

3‧‧‧掃描裝置 3‧‧‧ scanning device

4‧‧‧x方向掃描電磁鐵 4‧‧‧ x-direction scanning electromagnet

5‧‧‧y方向掃描電磁鐵 5‧‧‧y Scanning Electromagnet

7‧‧‧線量測量裝置 7‧‧‧line measuring device

9‧‧‧假體 9‧‧‧ prosthesis

10‧‧‧粒子射束產生裝置 10‧‧‧ particle beam generating device

11‧‧‧治療計畫資訊記憶部 11‧‧‧ Treatment plan information memory

12‧‧‧誤差資訊記憶部 12‧‧‧ Error Information Memory

13‧‧‧線量誤差分布演算部 13‧‧‧Line Error Distribution Calculation Department

14‧‧‧顯示部 14‧‧‧Display

15、35、45、55‧‧‧顯示器 15, 35, 45, 55‧‧‧ Display

16、18、19‧‧‧值 16, 18, 19‧‧‧ values

20‧‧‧射束輸送裝置 20‧‧‧ Beam Conveyor

22‧‧‧誤差最大點 22‧‧‧ the point of maximum error

25‧‧‧合計線量分布 25‧‧‧Total line volume distribution

26、27、28、29‧‧‧線量分布 26, 27, 28, 29‧‧‧ Line Distribution

30‧‧‧粒子射線照射裝置 30‧‧‧ particle ray irradiation device

31、32‧‧‧基準範圍 31, 32‧‧‧ benchmark range

33a、33b‧‧‧基準超過區域 33a, 33b ‧ ‧ ‧ benchmark exceeded area

35‧‧‧顯示器 35‧‧‧ Display

41‧‧‧誤差腳本 41‧‧‧Error script

43‧‧‧最大誤差產生位置 43‧‧‧Maximum error generation position

44‧‧‧測量結果 44‧‧‧ measurement results

46‧‧‧容許範圍 46‧‧‧Allowable range

51‧‧‧半峰半寬 51‧‧‧half-peak half-width

100‧‧‧粒子射線治療裝置 100‧‧‧ Particle Ray Therapy Device

sp1至sp4‧‧‧點 sp1 to sp4‧‧‧ points

p1至p13‧‧‧線量評估點 p1 to p13‧‧‧ line volume evaluation points

第1圖係具備本發明實施形態1之線量分布演算裝置之粒子射線治療裝置的概略構成圖。 FIG. 1 is a schematic configuration diagram of a particle beam treatment apparatus provided with a line quantity distribution calculation device according to Embodiment 1 of the present invention.

第2圖係顯示本發明實施形態1之線量分布演算裝置之方塊圖。 Fig. 2 is a block diagram showing a line quantity distribution calculation device according to the first embodiment of the present invention.

第3圖係說明由本發明實施形態1之線量分布演算裝置所測量之合計線量分布及線量評估點之例之圖。 FIG. 3 is a diagram illustrating an example of a total line quantity distribution and a line quantity evaluation point measured by the line quantity distribution calculation device according to the first embodiment of the present invention.

第4圖係顯示由本發明實施形態1之線量分布演算裝置所演算之線量誤差分布之顯示例。 FIG. 4 is a display example showing a line amount error distribution calculated by the line amount distribution calculation device according to the first embodiment of the present invention.

第5圖係顯示由本發明實施形態1之線量分布演算裝置所演算之線量誤差分布之顯示例。 Fig. 5 is a display example showing a line amount error distribution calculated by the line amount distribution calculation device according to the first embodiment of the present invention.

第6圖係顯示由本發明實施形態1之線量分布演算裝置所演算之線量誤差分布之顯示例。 Fig. 6 is a display example showing a line amount error distribution calculated by the line amount distribution calculation device according to the first embodiment of the present invention.

第7圖係說明本發明實施形態1之線量分布演算裝置所用之誤差腳本(scenario)的概念之圖。 Fig. 7 is a diagram illustrating the concept of an error scenario used by the line quantity distribution calculation device according to the first embodiment of the present invention.

第8圖係使用本發明實施形態1之線量分布演算裝置之線量誤差分布演算的流程圖。 FIG. 8 is a flowchart of a line amount error distribution calculation using the line amount distribution calculation device according to the first embodiment of the present invention.

第9圖係使用本發明實施形態1之線量分布演算裝置之線量誤差分布演算流程的各步驟對應之誤差腳本的示意圖。 FIG. 9 is a schematic diagram of an error script corresponding to each step of a line amount error distribution calculation process using the line amount distribution calculation device according to the first embodiment of the present invention.

第10圖係使用本發明實施形態1之線量分布演算裝置之線量誤差分布演算流程的各步驟對應之誤差腳本的示意圖。 Fig. 10 is a schematic diagram of an error script corresponding to each step of a line amount error distribution calculation process using the line amount distribution calculation device according to the first embodiment of the present invention.

第11圖係使用本發明實施形態1之線量分布演算裝置之線量誤差分布演算流程的各步驟對應之誤差腳本的示意圖。 FIG. 11 is a schematic diagram of an error script corresponding to each step of a line amount error distribution calculation process using the line amount distribution calculation device according to the first embodiment of the present invention.

第12圖係使用本發明實施形態1之線量分布演算裝置之線量誤差分布演算流程的各步驟對應之誤差腳本的示意圖。 FIG. 12 is a schematic diagram of an error script corresponding to each step of a line amount error distribution calculation process using the line amount distribution calculation device according to the first embodiment of the present invention.

第13圖係使用本發明實施形態1之線量分布演算裝置之線量誤差分布演算流程的各步驟對應之誤差腳本的示意圖。 FIG. 13 is a schematic diagram of an error script corresponding to each step of a line amount error distribution calculation process using the line amount distribution calculation device according to the first embodiment of the present invention.

第14圖係顯示由本發明實施形態4之線量分布演算裝 置所演算之線量誤差分布之顯示例。 Fig. 14 is a diagram showing a line quantity distribution calculation device according to the fourth embodiment of the present invention; Display example of calculated linear error distribution.

第15圖係說明由本發明實施形態5之線量分布演算裝置所計算之平均自我相關函數之圖。 Fig. 15 is a diagram illustrating an average self-correlation function calculated by the line quantity distribution calculation device according to the fifth embodiment of the present invention.

實施形態1. Embodiment 1.

第1圖係具備本發明實施形態1之線量分布演算裝置1之粒子射線治療裝置100的概略構成圖。如第1圖所示,粒子射線治療裝置100係包括:粒子射束產生裝置10,係產生治療所需能量之粒子射束2;粒子射線照射裝置30,係設有線量分布演算裝置1;以及射束輸送裝置20,係從粒子射束產生裝置10將粒子射束2輸送至粒子射線照射裝置30。 FIG. 1 is a schematic configuration diagram of a particle beam treatment apparatus 100 including a line quantity distribution calculation apparatus 1 according to Embodiment 1 of the present invention. As shown in FIG. 1, the particle beam therapy apparatus 100 includes a particle beam generating apparatus 10 that generates a particle beam 2 required for treatment energy, and a particle beam irradiation apparatus 30 that is provided with a line quantity calculation apparatus 1; The beam transfer device 20 transfers the particle beam 2 from the particle beam generating device 10 to the particle beam irradiation device 30.

粒子射束產生裝置10係產生治療所需之能量之粒子射束2,並具備控制粒子射束2的射出開始及遮蔽之控制部(未圖示)。粒子射線照射裝置30係具備:掃描裝置3,係使粒子射束2往對於屬於射束行進方向之z方向成正交之2方向,亦即往x方向及y方向偏向,而能夠於患者位置進行粒子射束2的掃描照射之掃描;以及控制部(未圖示),係控制掃描裝置3進行之粒子射束2的掃描。再者,粒子射線照射裝置30係具備:線量測量裝置7,係測量將由掃描裝置3所掃描之粒子射束2照射至治療對象(患者)的各照射位置之線量值;以及位置監視器(未圖示),係檢測用以演算由x方向掃描電磁鐵4及y方向掃描電磁鐵5所掃描之粒子射束2通過之射束之通過位置(重心位置) 及尺寸之射束資訊。 The particle beam generating device 10 is a particle beam 2 that generates energy required for treatment, and includes a control unit (not shown) that controls the emission start and shielding of the particle beam 2. The particle beam irradiation device 30 is provided with a scanning device 3 for making the particle beam 2 in two directions orthogonal to the z direction belonging to the traveling direction of the beam, that is, biased in the x direction and the y direction, and can be positioned at the patient's position. Scanning and scanning of the particle beam 2 is performed; and a control unit (not shown) controls scanning of the particle beam 2 by the scanning device 3. In addition, the particle beam irradiation device 30 is provided with a line amount measuring device 7 that measures a line amount value at each irradiation position where the particle beam 2 scanned by the scanning device 3 is irradiated to a treatment target (patient); and a position monitor (not shown) (Pictured), which is used to calculate the passing position (gravity center position) of the beam passing by the particle beam 2 scanned by the x-direction scanning electromagnet 4 and the y-direction scanning electromagnet 5 And size beam information.

線量分布演算裝置1係包括治療計畫資訊記憶部11、誤差資訊記憶部12、及線量誤差分布演算部13。治療計畫資訊記憶部11係記憶治療計畫資訊,該治療計畫資訊包括在粒子射線治療中由治療計畫所定之掃描治療所需的點的數量及位置,及照射至各點之粒子射束的能量及射束量。誤差資訊記憶部12係記憶粒子射線治療裝置所包含之機器的動作誤差,或因照射對象的動作而可能產生之前述點位置、能量、射束照射量中至少一者的誤差相關資訊。線量誤差分布演算部13係對於依據治療計畫資訊之照射,因應誤差資訊考慮誤差對線量分布產生之影響而演算線量誤差之分布。 The line quantity distribution calculation device 1 includes a treatment plan information storage unit 11, an error information storage unit 12, and a line quantity error distribution calculation unit 13. The treatment plan information storage unit 11 is for memorizing the treatment plan information. The treatment plan information includes the number and positions of points required for scanning treatment determined by the treatment plan in the particle ray treatment, and the particle radiation irradiated to each point. Beam energy and beam quantity. The error information storage unit 12 stores information related to an operation error of a device included in the particle beam therapy device or at least one of the aforementioned point position, energy, and beam irradiation amount that may be generated due to the motion of the irradiation target. The line quantity error distribution calculation unit 13 calculates the line quantity error distribution for the irradiation based on the treatment plan information, considering the influence of the error on the line quantity distribution according to the error information.

接著,針對藉由治療計畫之掃描照射而對腫瘤體積(腫瘤區域)賦予之合計線量進行說明。於掃描照射中係在腫瘤體積(腫瘤區域)內設有複數個點,並藉由對各點照射適當的量之粒子射束2,而例如第3圖所示形成所期望的合計線量分布25。將點編號設為j,假體9內的線量評估點編號設為i,將在對第j個點照射單位射束量之粒子射束時賦予第i個線量評估點pi之線量設為di,j,將第j個點賦予之射束量設為wj,並且將點的總數設為n時,在全部的點完成照射時之於第i個線量評估點pi賦予的合計線量Di係可表示如式(1)。 Next, the total line amount given to the tumor volume (tumor area) by the scanning irradiation of the treatment plan will be described. In the scanning irradiation, a plurality of points are provided in the tumor volume (tumor area), and an appropriate amount of the particle beam 2 is irradiated to each point, and for example, a desired total line distribution 25 is formed as shown in FIG. 3 . Set the point number to j, the line amount evaluation point number in the prosthesis 9 to i, and the line amount assigned to the i-th line amount evaluation point pi when the j-th point is irradiated with a particle beam of a unit beam amount as d i, j , setting the beam amount given by the j-th point to w j , and setting the total number of points to n, the total line amount D given by the i-th line amount evaluation point pi when all the points are irradiated The i series can be expressed as in formula (1).

[數1]數1

Figure TWI612493BD00001
[Number 1] number 1
Figure TWI612493BD00001

需要在進行照射前以該各線量評估點pi之合計線量Di儘可能接近屬於目標之線量分布之方式,算出在最佳的點賦予之射束量wj之步驟。該步驟稱為治療計畫。適當將射束量wj稱為點射束量wjIt is necessary to calculate the beam amount w j given at the optimal point in such a way that the total line amount D i of each line amount evaluation point pi is as close as possible to the line amount distribution belonging to the target before irradiation. This step is called a treatment plan. The beam amount w j is appropriately referred to as a spot beam amount w j .

第3圖係治療計畫進行之決定點的數量及位置以及點射束量wj之一例。第3圖之縱軸為線量,橫軸為z方向的位置。在第3圖中,為便於說明而顯示點配置及線量分布皆為z軸方向(射束行進方向)之一維之例。第3圖係顯示4個點sp1、sp2、sp3、sp4,及13個線量評估點p1、p2、p3、p4、p5、p6、p7、p8、p9、p10、p11、p12、p13。線量分布26係照射於點sp1之點射束量之線量分布。同樣地,線量分布27、28、29係分別為照射於點sp2、sp3、sp4之點線量分布之線量分布。合計線量分布25係將線量分布26、27、28、29相加合計之線量分布。腫瘤內之線量評估點有8個,為線量評估點p3至p10。腫瘤外之線量評估點有5個,為線量評估點p1、p2、p11至p13。 Fig. 3 is an example of the number and position of decision points and the spot beam amount w j in the treatment plan. In Fig. 3, the vertical axis is the linear amount, and the horizontal axis is the position in the z direction. In FIG. 3, for convenience of explanation, the display point arrangement and the line amount distribution are examples of one dimension in the z-axis direction (beam traveling direction). Figure 3 shows four points sp1, sp2, sp3, and sp4, and 13 line volume evaluation points p1, p2, p3, p4, p5, p6, p7, p8, p9, p10, p11, p12, and p13. The line amount distribution 26 is a line amount distribution of a point beam amount irradiated on the point sp1. Similarly, the line volume distributions 27, 28, and 29 are the line volume distributions of the point-line volume distributions irradiated on the points sp2, sp3, and sp4, respectively. The total line volume distribution 25 is a line volume distribution in which the line volume distributions 26, 27, 28, and 29 are added together. There are 8 evaluation points of line volume in the tumor, which are the line evaluation points p3 to p10. There are 5 evaluation points of the line quantity outside the tumor, which are the line quantity evaluation points p1, p2, p11 to p13.

如第3圖所示,藉由適當決定對點sp1至sp4賦予之射束量wj,可使合計線量分布25在腫瘤內較高,在腫瘤外則變低。在第3圖中雖點數量為4個,線量評估點為13個,惟通常係配合腫瘤的尺寸以短間隔配置更多點及線量評估點。再者,在第3圖中雖為便於說明而皆僅以z軸方向的一維來顯示點配置及線量分布,惟實際上係配 合腫瘤形狀將點配置在x軸方向及y軸方向之三維。由於配合實際的腫瘤形狀必須亦以三維來計算線量分布,故線量評估點亦以三維配置。 As shown in FIG. 3, by appropriately determining the beam amounts w j given to the points sp1 to sp4, the total line volume distribution 25 can be made high inside the tumor and low outside the tumor. Although the number of points is 4 in the third figure, and the number of line evaluation points is 13, usually more points and line evaluation points are arranged at short intervals in accordance with the size of the tumor. Moreover, although the point arrangement and line volume distribution are shown in only one dimension in the z-axis direction for the convenience of illustration in FIG. 3, the points are actually arranged in three dimensions in the x-axis direction and the y-axis direction in accordance with the tumor shape. . Since the line volume distribution must also be calculated in three dimensions to match the actual tumor shape, the line volume evaluation points are also arranged in three dimensions.

一般而言,與射束行進方向(z軸方向)正交的方向之x軸方向、y軸方向之點位置,係藉由射束踢出腳而決定,而射束踢出腳係與掃描裝置3所形成之磁場強度相依而決定。再者,屬於射束行進方向之z軸方向的點位置係與粒子射束2的射束能量相依而決定。因此,粒子射線治療裝置100的粒子射線照射裝置30係因應粒子射束2的射束能量來調整掃描裝置3的磁場強度,藉此調整點位置。 Generally speaking, the positions of the x-axis direction and the y-axis direction in a direction orthogonal to the beam traveling direction (z-axis direction) are determined by the kicking of the beam, and the kicking of the beam is related to scanning. The strength of the magnetic field generated by the device 3 is determined in dependence. Furthermore, the position of a point belonging to the z-axis direction of the beam traveling direction is determined depending on the beam energy of the particle beam 2. Therefore, the particle beam irradiation apparatus 30 of the particle beam therapy apparatus 100 adjusts the magnetic field strength of the scanning apparatus 3 according to the beam energy of the particle beam 2, thereby adjusting the position of the point.

在式(1)中,藉由將每個點的線量分布相加合計而求出第i個線量評估點pi之合計線量分布。對於相同對象之粒子射束2的照射結束後的線量分布可為按每個時間相加合計,亦可為與式(1)同樣地以式(2)之方式計算。 In Equation (1), the total line volume distribution of the i-th line volume evaluation point pi is obtained by adding up the total line volume distributions of each point. The line quantity distribution after the irradiation of the particle beam 2 of the same object may be added up at each time, or may be calculated by the formula (2) similarly to the formula (1).

Figure TWI612493BD00002
Figure TWI612493BD00002

於此,式(2)為將全照射時間分成m個時間區間之情形。k為時間區間的編號。於第i個線量評估點pi中,將於第k個時間區間所照射之射束量定義為wk,將於第k個時間區間滯留之射束的平均位置照射單位射束量之粒子射束時在第i個線量評估點pi賦予的線量(單位粒子 線量)定義為di,k。只要將時間間隔設為充分短,則該式(2)能夠以高精確度重現線量分布。於此,時間間隔較佳為與每1點的所需時間大致相同或更短,例如為數十微秒至1毫秒程度較佳。將相同時間區間之射束量wk與單位粒子射線量di,k相乘而得之wkdi,k為時間區間線量。 Here, Equation (2) is a case where the total irradiation time is divided into m time intervals. k is the number of the time interval. In the i-th line quantity evaluation point pi, the beam amount irradiated at the k-th time interval is defined as w k , and the average position of the beams retained in the k-th time interval is irradiated with a particle beam of a unit beam amount. The line amount (line amount per unit particle) given by the i-th line amount evaluation point pi at the time of the beam is defined as d i, k . As long as the time interval is sufficiently short, this formula (2) can reproduce the line quantity distribution with high accuracy. Here, the time interval is preferably substantially the same as or shorter than the time required for each point, for example, it is preferably about several tens of microseconds to 1 millisecond. Multiplying the beam quantity w k and the unit particle ray quantity d i, k in the same time interval by w k d i, k is the time interval line quantity.

在式(2)之線量評估點為三維時,線量di,k可以下述方式求出。三維線量分布d(x,y,z)已知可由z方向之線量分布與x方向之線量分布及y方向之線量分布之積來近似。在Inaniwa等人的論文(非專利文獻1)中,介紹有將相對於1條射束之三維線量分布d(x,y,z)以式(3)之方式,因數分解成z方向與x方向及y方向之各個分布之方法。 When the line quantity evaluation point of the formula (2) is three-dimensional, the line quantity d i, k can be obtained in the following manner. The three-dimensional linear volume distribution d (x, y, z) is known to be approximated by the product of the linear volume distribution in the z direction, the linear volume distribution in the x direction, and the linear volume distribution in the y direction. In the paper by Inaniwa et al. (Non-Patent Document 1), it is described that the three-dimensional line quantity distribution d (x, y, z) with respect to one beam is decomposed into the z-direction and x-factor by the formula (3). The method of each distribution of the direction and the y direction.

[數3]數3 d(x,y,z)=dz(z,E)×dx(x-x0,z,E)×dy(y-y0,z,E)…(3) [Number 3] Number 3 d (x, y, z) = d z (z, E) × d x (xx 0 , z, E) × d y (yy 0 , z, E) ... (3)

使式(3)的左邊配合式(1)之記載方式,則在對第j個點照射單位照射線量之粒子射束時對第i個線量評估點pi賦予之線量di,j可表示成式(4)。 When the left side of the formula (3) is matched with the description method of the formula (1), the line amount d i, j given to the i-th line amount evaluation point pi when the j-th point is irradiated with a particle beam of a line amount can be expressed as Equation (4).

[數4]數4 di,j=dz(zi,Ej)×dx(xi-xj,zi,Ej)×dy(yi-yj,zi,Ej)…(4) [Number 4] Number 4 d i, j = d z (z i , E j ) × d x (x i -x j , z i , E j ) × d y (y i -y j , z i , E j ) ... (4)

於此,xi、yi、zi分別為第i個線量評估點pi的x、y、z座標。再者,xj、yj係分別為第j個點的x、y座標,Ej為照射第j個點時的粒子射束的能量。 Here, x i , y i , and z i are the x, y, and z coordinates of the i-th line quantity evaluation point pi, respectively. In addition, x j and y j are respectively the x and y coordinates of the j-th point, and E j is the energy of the particle beam when the j-th point is irradiated.

同樣地,在考量如式(2)將線量分布分為時間區間時,在第k個時間區間照射單位射束量的粒子射束時對第i個線量評估點pi賦予的線量di,k係可表示成式(5)。 Similarly, when the line quantity distribution is divided into time intervals by considering formula (2), the line quantity d i, k given to the i-th line quantity evaluation point pi when the particle beam of a unit beam quantity is irradiated in the k-th time interval系 can be expressed as Formula (5).

[數5]數5 di,k=dz(zi,Ek)×dx(xi-xk,zi,Ek)×dy(yi-yk,zi,Ek)…(5) [Number 5] Number 5 d i, k = d z (z i , E k ) × d x (x i -x k , z i , E k ) × d y (y i -y k , z i , E k ) ... (5)

於此,xi、yi、zi係分別為第i個線量評估點pi的x、y、z座標。再者,xk、yk分別為第k個時間區間之射束位置的x、y座標,Ek為第k個時間區間之粒子射束的能量。 Here, x i , y i , and z i are the x, y, and z coordinates of the i-th line quantity evaluation point pi, respectively. Furthermore, x k and y k are the x and y coordinates of the beam position in the k-th time interval, respectively, and E k is the energy of the particle beam in the k-th time interval.

關於式(4)及式(5)之z軸方向的成分dz(z,E)雖亦可藉由已知之Bragg之式之理論進行計算,惟認為最簡便者為在事前使用水假體(假體9)及線量計實際進行測量,並予以資料庫化。在進行事前測量時,係一邊於水假體中注水並配置線量計且照射粒子射束2一邊沿z軸方向移動線量計的位置,藉此可獲得分布。實施該測量前若先實施用以取得比例係數C(E)之測量,則可藉由將當時的QA用電離箱配置於上游而取得所照射的射束量w及水假體中的線量d。並且,藉由求出該比就可得知相對於單位射束量之線量分布dz(z,E)。 Although the component d z (z, E) in the z-axis direction of formula (4) and formula (5) can also be calculated by the theory of the known Bragg formula, it is considered that the simplest is to use a water prosthesis beforehand (Prosthesis 9) and line meter actually measured and databaseed. During the pre-measurement, the distribution is obtained by injecting water into the hydroprosthesis, placing a line meter and irradiating the particle beam 2 while moving the position of the line meter in the z-axis direction. If the measurement to obtain the proportionality coefficient C (E) is performed before the measurement is performed, the amount of irradiated beam w and the amount of line d in the hydroprosthesis can be obtained by arranging the current QA ionization box upstream. . In addition, by obtaining the ratio, the line quantity distribution d z (z, E) with respect to the unit beam quantity can be obtained.

關於式(4)之x軸方向成分dx(xi-xj,zi,Ej)及式(5)之x軸方向成分dx(xi-xk,zi,Ek),係可進行Moliere、Fermi-Eyges、Highland等人之多重散射理論來計算。再者,同樣地可在事前使用水假體(假體9)及線量計來 實際測量,並予以資料庫化。該測量相較於線量分布dz(z,E)之測量,由於線量分布與x及z兩者相依而變化,故必須對全部的x、z實施測量,惟其極費工夫。因此,只要使用已知的如Geant4等蒙特卡羅模擬工具,即可計算在水假體(假體9)中的任意位置之每單位射束量的線量。具體而言,在執行蒙特卡羅模擬時,藉由輸入假體9等物體的形狀,粒子射束2的能量及電離的產生位置與產生方向,被掃描裝置3的電磁鐵(x方向掃描電磁鐵4、y方向掃描電磁鐵5)偏向之射束中心軸位置等資訊,即可求出水假體(假體9)中的任意位置之每單位射束量之線量。因此,只要執行蒙特卡羅模擬,可比實際測量更有效率地求得x軸方向成分dx(x-x0,z,E)及dx(x,z,E)。關於y方向成分,亦即式(4)之dy(yi-yj,zi,Ej)及式(5)之dy(yi-yk,zi,Ek)亦相同。 About the x-axis direction component d x (x i -x j , z i , E j ) of formula (4) and the x-axis direction component d x (x i -x k , z i , E k ) of formula (5) It can be calculated by the multiple scattering theory of Moliere, Fermi-Eyges, Highland and others. Furthermore, similarly, a hydroprosthesis (prosthesis 9) and a line meter can be used for actual measurement beforehand, and the data can be databased. Compared with the measurement of the line quantity distribution d z (z, E), this measurement varies depending on both x and z, so it is necessary to measure all x and z, but it takes a lot of time. Therefore, as long as a known Monte Carlo simulation tool such as Geant4 is used, the line quantity per unit beam quantity at any position in the hydroprosthesis (prosthesis 9) can be calculated. Specifically, when performing a Monte Carlo simulation, by inputting the shape of an object such as a prosthesis 9, the energy of the particle beam 2 and the generation position and direction of ionization, the electromagnet of the scanning device 3 (scanning electromagnetic in x direction Scanning the electromagnet 5) in the direction of iron 4 and 5), such as the position of the central axis of the beam deflected, the line quantity per unit of the beam quantity at any position in the water prosthesis (prosthesis 9) can be obtained. Therefore, as long as the Monte Carlo simulation is performed, the x-axis direction components d x (xx 0 , z, E) and d x (x, z, E) can be obtained more efficiently than the actual measurement. Regarding the y-direction component, that is, d y (y i -y j , z i , E j ) in formula (4) and d y (y i -y k , z i , E k ) in formula (5) are the same .

在使用蒙特卡羅模擬工具時,不僅是一維方向之線量分布,亦可直接求出三維線量分布d(x,y,z),亦可採用在事前計算取得而將d(x,y,z)的資訊作為資料庫之方法。然而,要將於三維擴展之線量分布記憶於記憶裝置係需要大量的記憶體容量,因此,必須考量記憶裝置的性能及所需的資訊精確度,而檢討要採用哪種形式保持資料較佳。 When using the Monte Carlo simulation tool, not only the linear quantity distribution in one dimension, but also the three-dimensional linear quantity distribution d (x, y, z) can be directly obtained, and d (x, y, z) information as a database method. However, in order to memorize the linear volume distribution in the three-dimensional expansion in the memory device system, a large amount of memory capacity is required. Therefore, the performance of the memory device and the required accuracy of the information must be considered.

接著,說明使用本發明實施形態1之線量分布演算裝置1演算線量誤差分布之流程。在如式(1)按每個點考慮線量分布時,及在如式(2)按每個時間區間考慮時,由於基本流程皆相同,故在後述中僅針對如式(1)按每個點 考慮之情形進行說明。 Next, a flow of calculating a line amount error distribution using the line amount distribution calculation device 1 according to the first embodiment of the present invention will be described. When formula (1) considers the line volume distribution for each point, and when formula (2) considers each time interval, the basic flow is the same, so in the following description, only for formula (1) point The situation considered will be explained.

為了以線量誤差分布演算部13演算線量誤差分布,須先演算在存在有照射誤差之情形下之線量分布。在式(1)及式(4)中,針對照射至第j個點之射束量wj、點位置xj、yj、粒子射束能量Ej,考量分別產生有射束量誤差△wj、點位置誤差△xj、△yj、粒子射束能量誤差△Ej之情形。此時,於在對第j個點照射單位射束量之粒子射束時對第i個線量評估點pi賦予之線量di,j,及全部的點合計時對第i個線量評估點pi賦予之線量Di係分別產生有誤差△di,j、△Di,該等係可表示成式(6)及式(7)。 In order to calculate the line amount error distribution by the line amount error distribution calculation unit 13, it is necessary to first calculate the line amount distribution when there is an irradiation error. In equations (1) and (4), considering the beam amount w j irradiated to the j-th point, the point positions x j , y j , and the particle beam energy E j , the beam amount error △ is generated, respectively. w j , point position error Δx j , Δy j , particle beam energy error ΔE j . At this time, when the j-th point is irradiated with a particle beam of a unit beam amount, the line amount d i, j given to the i-th line amount evaluation point pi, and all points are counted together for the i-th line amount evaluation point pi The given line quantities D i have errors Δd i, j and ΔD i , respectively, and these systems can be expressed as equations (6) and (7).

Figure TWI612493BD00003
Figure TWI612493BD00003

[數7]數7 di,j+△di,j=dz(zi,Ej+△Ej)×dx(xi-(xj+△xj),zi,Ej+△Ej)×dy(yi-(yj+△yj),zi,Ej+△Ej)…(7) [Number 7] Number 7 d i, j + △ d i, j = d z (z i , E j + △ E j ) × d x (x i- (x j + △ x j ), z i , E j + △ E j ) × d y (y i- (y j + △ y j ), z i , E j + △ E j ) ... (7)

於此,雖舉例射束量誤差△wj、點位置誤差△xj、△yj、粒子射束能量誤差△Ej作為誤差種類,惟在本實施形態中並不一定非考慮該等全部的誤差。例如,在就裝置的特性而言保障了較高的粒子射束能量Ej的精確度,而使誤差△Ej不存在或小至可以忽視時,則可將其忽視而 計算如式(8)。 Here, although the beam amount error Δw j , the point position error Δx j , Δy j , and the particle beam energy error ΔE j are exemplified as error types, it is not necessary to consider all of them in this embodiment. The error. For example, when the accuracy of the particle beam energy E j is ensured in terms of the characteristics of the device, and the error ΔE j does not exist or is small enough to be ignored, it can be ignored and calculated as Equation (8 ).

[數8]數8 di,j+△di,j=dz(zi,Ej)×dx(xi-(xj+△xj),zi,Ej)×dy(yi-(yj+△yj),zi,Ej)…(8) [Number 8] Number 8 d i, j + △ d i, j = d z (z i , E j ) × d x (x i- (x j + △ x j ), z i , E j ) × d y (y i- (y j + △ y j ), z i , E j ) ... (8)

再者,除了射束量誤差△wj、點位置誤差△xj、△yj、粒子射束能量誤差△Ej以外亦可考慮到無數種誤差因素,若可以適當的形式反映該等誤差則可加入計算。 Furthermore, in addition to the beam amount error Δw j , the point position error Δx j , △ y j , and the particle beam energy error ΔE j , countless error factors can be considered. If these errors can be reflected in an appropriate form You can add calculations.

誤差△wj、△xj、△yj、△Ej產生之因素係考慮有各種因素。例如,在以一般的粒子射線治療裝置進行之粒子射束的照射時,點的射束量wj係被設置於射束線路上之線量監視器管理,進行控制為在對該點之照射射束量達到預先計畫之射束量時暫時停止加速器之粒子射束的照射,或藉由掃描電磁鐵使射束位置移動至下一個點等。然而,由於在從射束照射至線量監視器至線量監視器檢測出該射束並輸出訊號之期間,以及從線量監視器輸出訊號至加速器或照射電磁鐵開始動作之期間必定存在時間延遲,因此可能會產生射束量誤差△wjThe factors that cause the errors Δw j , Δx j , Δy j , and ΔE j include various factors. For example, when a particle beam is irradiated by a general particle beam therapy device, the beam amount w j of a point is managed by a line amount monitor provided on a beam line, and is controlled to be irradiated at the point. When the beam amount reaches the planned beam amount, temporarily stop the irradiation of the particle beam of the accelerator, or move the beam position to the next point by scanning the electromagnet. However, there must be a time lag from the time the beam is irradiated to the line monitor to the line monitor detects the beam and outputs a signal, and the time from the line monitor output signal to the start of the accelerator or the irradiation electromagnet. A beam amount error Δw j may occur.

點位置xj、yj雖由流動於掃描電磁鐵之電流值所控制,惟會因電磁鐵電源的電流控制誤差或電磁雜訊而造成電流值變動,而可能產生點位置誤差△xj、△yj。或者因溫度變化之熱膨脹或收縮而導致之電磁鐵位置與假體位置之距離變化亦會導致產生點位置誤差△xj、△yj。再 者,為了減輕前述位置誤差,雖考量進行依據設置於射束線路上之射束位置監視器的輸出,而修正至正確的點位置之回饋控制,惟此時亦會因射束位置監視器的精確度而導致產生點位置誤差△xj、△yjAlthough the point positions x j and y j are controlled by the current value flowing through the scanning electromagnet, the current value changes due to the current control error or electromagnetic noise of the power supply of the electromagnet, and the point position error △ x j , △ y j . Or the change in the distance between the position of the electromagnet and the position of the prosthesis due to thermal expansion or contraction due to temperature changes will also cause point position errors Δx j , Δy j . Moreover, in order to reduce the aforementioned position error, although the feedback control based on the output of the beam position monitor set on the beam line is considered to be corrected to the correct point position, the beam position monitor will also be affected at this time. Point accuracy Δx j , Δy j .

例如,在對於如肺或肝臟等會因呼吸而移動之患部之粒子射線治療中,可能選擇呼吸同步照射法,該呼吸同步照射法係設定稱為呼吸閘門之閘門,僅在患部位於預先指定之範圍內時進行粒子射束之照射。並且在該情況下,就治療前的驗證而言可能實施使用能夠輸入3軸方向的動作之呼吸同步假體之QA。此時,雖並非粒子射束的位置本身產生變化,惟從屬於照射對象之患部觀看到之相對的粒子射束的位置,係有可能成為與患部沒有動作時之計畫位置不同之位置,因此可認為是產生點位置誤差。此時的點位置誤差△xj、△yj的大小係對應於在所設定之呼吸閘門內的患部的動作的大小而決定。 For example, in particle-ray therapy of a diseased part such as the lung or liver, which may move due to breathing, a synchronized breathing method may be selected. The synchronized breathing method sets a gate called a breathing gate, which is located only when the affected part is located in advance. Within the range, the particle beam is irradiated. In this case, it is possible to implement a QA using a respiratory synchronization prosthesis capable of inputting a movement in a 3-axis direction for verification before treatment. At this time, although the position of the particle beam does not change itself, the relative position of the particle beam viewed from the affected part belonging to the irradiation target may be different from the planned position when the affected part is not operating. It can be considered that a point position error occurs. The magnitude of the point position errors Δx j and Δy j at this time is determined according to the magnitude of the operation of the affected part in the set breathing gate.

粒子射束的能量Ej雖由粒子加速器所控制,惟會因構成加速器之射束偏向電磁鐵所產生之磁場強度,或高頻加速空洞的電場強度或頻率等誤差而可能產生射束能量誤差△Ej。再者,在例如粒子加速器為迴旋加速器型加速器,且採用能量選擇系統(ESS)時,會由於構成ESS之偏向電磁鐵的磁場強度誤差及能量選擇縫隙的位置誤差等而導致可能產生射束能量誤差△EjAlthough the energy E j of the particle beam is controlled by the particle accelerator, the beam energy error may occur due to errors in the magnetic field intensity generated by the beam constituting the accelerator toward the electromagnet or the electric field intensity or frequency of the high-frequency acceleration cavity. △ E j . Furthermore, when the particle accelerator is a cyclotron accelerator and an energy selection system (ESS) is used, the beam energy may be generated due to the magnetic field strength error of the biased electromagnet constituting the ESS and the position error of the energy selection gap. Error ΔE j .

雖可考慮各種方法估算該等誤差的大小,惟最簡便之方法為直接測量。例如,就測量射束量誤差△ wj之方法而言,可藉由下述方法求得:對線量監視器設定配合對於點的照射開始時序而動作之計測開始觸發器、以及配合結束開始時序而動作之計測結束觸發器,藉由求出在該期間所計測之射束量與由治療計畫所指定之射束量之差而求得測量射束量誤差。反覆進行複數次上述測量,可掌握誤差的趨勢。例如,可計算誤差△wj的平均值及變異量數、標準差等。 Although various methods can be considered to estimate the magnitude of these errors, the simplest method is direct measurement. For example, the method of measuring the beam amount error Δ w j can be obtained by setting a measurement start trigger for the line amount monitor to operate in accordance with the irradiation start timing of the point, and the start timing of the end of cooperation. The measurement end trigger of the action is to determine the measurement beam amount error by determining the difference between the beam amount measured during this period and the beam amount specified by the treatment plan. Repeat the above measurements several times to grasp the trend of errors. For example, the average value of the error Δw j , the number of variations, and the standard deviation can be calculated.

關於點位置係藉由線量計及Gafchromic膜片實際測量位置,並藉由求出與計畫位置之差而得到誤差△xj、△yj。再者,關於能量係使用閃爍檢測器等實際測量能量,並藉由求出與計畫能量之差而得到誤差△Ej。關於該等誤差亦可藉由反覆進行複數次測量而掌握誤差的平均值、變異量數、標準差等趨勢。 The point position is obtained by measuring the actual position with a line meter and Gafchromic diaphragm, and by obtaining the difference from the planned position, the errors Δx j and Δy j are obtained . As for the energy, an actual measurement of energy is performed using a scintillation detector or the like, and an error ΔE j is obtained by calculating a difference from the planned energy. Regarding these errors, it is also possible to grasp the trends of the average value, the number of variations, and the standard deviation by performing multiple measurements repeatedly.

該等誤差的趨勢由於會因所計畫之射束量、所計畫之點位置、所計畫之能量等條件而可能不同,因此必須在事前以各種條件進行測量,並掌握因條件導致之誤差的趨勢的差異。其他亦會因季節、時刻、室溫、氣壓等各種條件而導致趨勢變化。並且,在因條件而導致誤差的趨勢變化時,於以下段落之後說明之演算中需選擇配合當下的條件之適當的誤差的趨勢。 The trend of these errors may be different due to conditions such as the planned beam amount, planned point position, planned energy, etc. Therefore, it is necessary to measure in advance under various conditions, and to grasp the causes caused by the conditions Difference in trend of errors. Others may also change trends due to various conditions such as season, time, room temperature, and air pressure. In addition, when the trend of errors due to conditions changes, it is necessary to select an appropriate trend of errors in accordance with the current conditions in the calculations described later in the following paragraphs.

演算線量誤差分布之方法大致考慮有2種。前者為假定誤差因素的獨立性及線性之方法,後者為使用「誤差腳本」之方法。在本實施形態中係針對前者進行說明。 There are roughly two methods for calculating the linear error distribution. The former is a method that assumes the independence and linearity of the error factors, and the latter is a method that uses an "error script". In the present embodiment, the former will be described.

藉由誤差△wj的趨勢分析,可定義誤差△wj遵從之機率分布函數ρ△wj(u)。亦即,設定誤差△wj的大小會落在u與u+du之間的範圍內之機率為ρ△wj(u)du之函數ρ△wj(u)。機率分布函數ρ△wj(u)係標準化成滿足式(9)。對於其他誤差亦可定義同樣的機率分布函數ρ△xj(u)、ρ△yj(u)、ρ△Ej(u)。 By trend analysis error △ w j, the probability of error △ w j may be defined to comply with the distribution function ρ △ wj (u). That is, the probability that the magnitude of the setting error Δw j will fall within a range between u and u + du is a function ρ Δwj (u) of ρ Δwj (u) du. The probability distribution function ρ Δwj (u) is standardized so as to satisfy Equation (9). For other errors, the same probability distribution functions ρ Δxj (u), ρ Δyj (u), and ρ ΔEj (u) can also be defined.

Figure TWI612493BD00004
Figure TWI612493BD00004

依據該等機率分布函數及由式(6)求出之△Di,可分別以式(10)、式(11)、式(12)求出線量誤差△Di的期望值E(△Di)、變異量數V(△Di)及標準差σ(△Di)。 Based on these probability distribution functions and △ D i obtained from equation (6), the expected value E (△ D i ) of the line error ΔD i can be obtained from equations (10), (11), and (12), respectively. ), The number of variations V (△ D i ), and the standard deviation σ (△ D i ).

Figure TWI612493BD00005
Figure TWI612493BD00005

Figure TWI612493BD00006
Figure TWI612493BD00006

Figure TWI612493BD00007
Figure TWI612493BD00007

於此,積分演算子∫…∫係分別對應於uw,j、ux,j、uy,j、uE,j。由於點編號j存在有1至n,故積分演算子全部存在有4n個,積分範圍全部皆為[-∞,∞]。 Here, the integral operators ∫ ... ∫ correspond to u w, j , u x, j , u y, j , u E, j respectively . Since the point number j exists from 1 to n, there are 4n integral operators, and the integral range is all [-∞, ∞].

如此,藉由線量誤差分布演算部13,因應由於粒子射線治療裝置所包含之機器的動作誤差、照射對象的動作所產生之點位置、能量、射束照射量中至少一者之誤差的資訊,考慮誤差對線量分布造成之影響而演算線量誤差的分布,藉此可不使線量分布的測量精確度下降而謀求縮短測量時間。再者,將以上述方式演算出之線量誤差△Di相關資訊藉由顯示器等顯示部顯示給使用者,藉此使用者可容易的規劃使用假體之QA的線量測量的方針。 In this way, the line error distribution calculation unit 13 responds to at least one of the position error, the energy, and the beam irradiation amount due to the operation error of the device included in the particle beam treatment device and the operation of the irradiation target. Considering the influence of the error on the line volume distribution, the line volume error distribution is calculated, thereby reducing the measurement accuracy of the line volume distribution and reducing the measurement time. Furthermore, the information related to the line error ΔD i calculated in the above manner is displayed to the user through a display portion such as a display, so that the user can easily plan a line measurement policy using the QA of the prosthesis.

第4圖係顯示對於顯示器15之顯示例。以橫軸為線量評估點i,縱軸為線量,顯示出分別描繪於計畫線量加上線量誤差期待值之值16(Di+E(△Di)),及對其增減線量誤差標準差(σ(△Di))之值18、19(Di+E(△Di)+σ(△Di)、Di+E(△Di)-σ(△Di))。使用者藉由觀看該圖,例如可在線量誤差標準差較大之部分的附近將線量測量點的間隔設成較小進行密集測量,或反之在線量誤差標準差較小之部分的附近將線量測量點的間隔設成較大而謀求縮短測量時間等,而可規劃有效率的線量測定方案。 FIG. 4 shows a display example on the display 15. Taking the horizontal axis as the line quantity evaluation point i and the vertical axis as the line quantity, the values 16 (D i + E (△ D i )) plotted on the planned line quantity plus the expected value of the line quantity error are displayed, and the line quantity error is increased or decreased. Standard deviation (σ (△ D i )) values 18, 19 (D i + E (△ D i ) + σ (△ D i ), D i + E (△ D i ) -σ (△ D i )) . By viewing the figure, the user can, for example, set the interval of the measurement points of the line measurement near the part with the larger standard deviation of the line error to make the measurement intensive, or vice versa. The interval between the measurement points is set to be large to shorten the measurement time, etc., and an efficient line quantity measurement scheme can be planned.

在第4圖中,雖顯示了顯示具有±σ(△Di)的寬度之分布之例,惟此可例如Di+E(△Di)+2σ(△Di)及Di+E(△Di)-2σ(△Di),為具有±σ(△Di)的2倍的寬度之分布,同樣地亦可為具有3倍的寬度分布。 In Fig. 4, although an example showing a distribution having a width of ± σ (△ Di) is shown, for example, D i + E (△ D i ) + 2σ (△ D i ) and D i + E ( ΔD i ) -2σ (ΔD i ) is a distribution having a width twice as large as ± σ (ΔDi), and similarly a distribution having a width three times.

線量分布演算裝置1係藉由線量誤差分布演算部13搜尋線量誤差標準差最大之線量評估點,並可如第5圖以誤差最大點22的形式顯示於顯示部14的顯示器35。再者,線量分布演算裝置1係藉由線量誤差分布演算部13搜尋線量誤差標準差超過預先決定之基準範圍31、32之線量評估點,並可如第6圖所示將該存在範圍作為基準超過區域33a、33b顯示於顯示部14的顯示器45。藉由該等顯示,使用者可更迅速地掌握住線量誤差標準差較大的點及範圍。 The line quantity distribution calculation device 1 searches for the line quantity evaluation point with the largest line error standard deviation by the line quantity error distribution calculation unit 13 and can be displayed on the display 35 of the display unit 14 as the maximum error point 22 as shown in FIG. 5. Furthermore, the line quantity distribution calculation device 1 searches for a line quantity evaluation point whose standard deviation of the line quantity error exceeds a predetermined reference range 31 or 32 by the line quantity error distribution calculation unit 13 and can use the existence range as a reference as shown in FIG. 6 The overrun areas 33 a and 33 b are displayed on the display 45 of the display unit 14. With these displays, users can more quickly grasp the points and ranges with larger standard deviations of line volume errors.

如上述,具備本發明實施形態1之線量分布演算裝置1粒子射線治療裝置100係藉由線量誤差分布演算部13,對於依據治療計畫資訊記憶部11所記憶之治療計畫資訊之照射,因應於誤差資訊記憶部12所記憶之因粒子射線治療裝置所包含之機器的動作誤差、照射對象的動作所產生之點位置、能量、射束照射量中至少一者的誤差的資訊,考慮誤差對線量分布造成之影響而演算線量誤差的分布,故可不使線量分布的預測精確度下降而謀求縮短測量時間。 As described above, the particle quantity treatment device 100 provided with the line quantity distribution calculation device 1 according to the first embodiment of the present invention is adapted to irradiate the treatment plan information memorized by the treatment plan information storage portion 11 by the line quantity error distribution calculation portion 13. Consider the error information stored in the error information memory 12 due to at least one of the operation error of the device included in the particle beam therapy device, the position of the point generated by the operation of the irradiation target, the energy, and the amount of beam exposure. The influence of the line volume distribution causes the line volume error distribution to be calculated. Therefore, the measurement time can be shortened without reducing the accuracy of the line volume distribution prediction.

實施形態2. Embodiment 2.

在實施形態1中雖針對假定誤差因素的獨立性及線性之方法,惟在實施形態2中係針對使用「誤差腳本」之概念來算出線量誤差分布之方法進行說明。關於具備實施形態2之線量分布演算裝置之粒子射線治療裝置的構成,係與實施形態1之粒子射線治療裝置100相同,而省略其說 明。 Although the method of assuming the independence and linearity of the error factors is described in the first embodiment, the method of calculating the line error distribution using the concept of "error script" is described in the second embodiment. The configuration of the particle beam treatment device provided with the line quantity distribution calculation device according to the second embodiment is the same as that of the particle beam treatment device 100 according to the first embodiment, and the description is omitted. Bright.

第7圖係顯示本實施形態之誤差腳本的思維。首先,對j=1至j=n之全部的點決定各誤差△wj、△xj、△yj、△Ej的大小。將該等一連串之誤差的組合稱為一個「誤差腳本」。 Fig. 7 shows the thinking of the error script of this embodiment. First, the magnitude of each error Δw j , Δx j , Δy j , and ΔE j is determined for all points from j = 1 to j = n. The combination of these series of errors is called an "error script".

在誤差腳本的製作中決定各誤差之方法基本上係與實施形態1相同之思維,使用依據事前調查之誤差的趨勢之機率分布函數,並使用線量誤差分布演算部13所產生之亂數而隨機地決定。此時雖只要獨立且隨機地決定全部的誤差,則可期望得到與實施形態1相同之結果,惟在使用誤差腳本之方法中,於此係可考慮2個以上的誤差的關聯。 The method of determining each error in the production of the error script is basically the same as that of the first embodiment. It uses a probability distribution function based on the error trend investigated in advance, and uses random numbers generated by the linear error distribution calculation unit 13 to randomly select To decide. In this case, as long as all the errors are determined independently and randomly, the same result as that of the first embodiment can be expected, but in the method using the error script, the correlation of two or more errors can be considered here.

例如,在射束能量誤差△Ej為正值,亦即在射束能量誤差比計畫值更大時,由於掃描電磁鐵所產生之磁場的強度即便相同射束亦難以彎曲,故點位置偏向靠中心之可能性較高。再者,此時位置誤差△xj與能量誤差△Ej係難謂屬於獨立,位置誤差△xj的機率分布函數係與能量誤差△Ej相依而變動。流動於電磁鐵之電流值與射束能量及射束踢出腳的關係由於為已知,故在先依據能量誤差的機率分布函數使用亂數決定△Ej後,求出藉由該能量誤差所產生之點位置的移位量,並使依據點位置誤差的原來的機率分布函數使用別的亂數來決定之△xj產生相當於移位量之變化,而藉此可決定考慮了關聯之誤差腳本。 For example, when the beam energy error ΔE j is a positive value, that is, when the beam energy error is greater than the planned value, because the intensity of the magnetic field generated by the scanning electromagnet is difficult to bend even with the same beam, the point position It is more likely to lean towards the center. Further, when the position error △ x j △ E j and the energy error is an independent system that is difficult, the position error △ x j the probability distribution function of the energy based error △ E j varies dependent. The relationship between the value of the current flowing in the electromagnet and the energy of the beam and the kick kick of the beam is known. Therefore, the ΔE j is determined using a random number based on the probability distribution function of the energy error, and then the energy error is obtained. The shift amount of the generated point position, and the original probability distribution function based on the point position error is determined by using other random numbers. △ x j produces a change equivalent to the shift amount, and thus it can be determined that the correlation is considered. Error script.

再者,在一般的掃描照射時,射束滯留在 一個點之時間大多為毫秒至微秒之級別,依據事前的趨勢調查,在點位置誤差的時間變動並未以如上述般迅速的週期產生變化,例如為以100毫秒程度的變動週期時,在某個點的位置誤差△xj與在相鄰的點的位置誤差△xj+1之差不會有較大程度的分離。此時,位置誤差△xj與△xj+1難謂屬於獨立。此時,考慮在先依據機率分布函數使用亂數決定△xj後,以△xj+1會從已決定之△xj的一定範圍內被選擇之方式,對機率分布函數加入修正等之方法。或者,亦考慮在一開始即獨立地決定△xj與△xj+1,並在兩者的差為一定以上時廢棄該誤差腳本,並使用別的亂數再度獨立地決定△xj與△xj+1,且反覆進行至兩者的差成為一定以內等方法。 In addition, during general scanning irradiation, the time that the beam stays at a point is mostly in the millisecond to microsecond range. According to the prior trend investigation, the time variation of the point position error does not occur at a rapid cycle as described above. For example, when the variation period is about 100 milliseconds, the difference between the position error Δx j at a certain point and the position error Δx j + 1 at an adjacent point will not be largely separated. At this time, it is difficult to say that the position errors Δx j and Δx j + 1 are independent. At this time, consider firstly using the random number to determine △ x j according to the probability distribution function, and then adding a correction to the probability distribution function in such a manner that △ x j + 1 will be selected from a certain range of the determined Δx j . method. Alternatively, it is also considered to independently determine △ x j and △ x j + 1 at the beginning, and discard the error script when the difference between the two is more than a certain value, and use another random number to independently determine △ x j and Δx j + 1 , and the method is repeated until the difference between the two becomes within a certain range.

以上述方式,改變亂數而產生複數個誤差腳本。所產生之誤差腳本的個數雖會因條件而異,但較佳為1000至100萬個程度。對於各個誤差腳本依據式(6)、式(7)算出線量誤差△Di。在將誤差腳本的個數表現為N,將誤差腳本的編號表現為s,將與第s個誤差腳本對應之線量誤差表現為△Di,s時,可分別以式(13)、式(14)、式(15)來求出線量誤差的期望值E(△Di)及變異量數V(△Di)、標準差σ(△Di)。 In the above manner, the random number is changed to generate a plurality of error scripts. Although the number of error scripts generated varies depending on conditions, it is preferably about 10 to 1 million. For each error script, the line amount error ΔD i is calculated according to the formulas (6) and (7). When the number of error scripts is represented as N, the number of the error scripts is represented as s, and the line quantity error corresponding to the s-th error scenario is represented as ΔD i, s , it can be expressed by equations (13) and ( 14) and Expression (15) to find the expected value E (ΔD i ) of the linear error, the number of variations V (ΔD i ), and the standard deviation σ (ΔD i ).

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如此,藉由線量誤差分布演算部13,依據點位置、能量、射束量的誤差的趨勢,準備複數筆屬於誤差的值之集合之誤差腳本,並演算與各個誤差腳本對應之各個線量分布,算出各計算點之每個誤差腳本的偏差作為線量誤差,藉此即便在2個以上的誤差因素具有關聯且其效應較大時,亦可計算正確的線量誤差分布。再者,藉由與實施形態1相同之顯示方法,以顯示器等顯示部將以上述方式演算出之線量誤差△Di之相關資訊對使用者顯示,藉此,使用者可容易地規劃使用假底之QA線量測量的方案。 In this way, the line quantity error distribution calculation unit 13 prepares a plurality of error scripts belonging to a set of error values according to the trend of the error of the point position, energy, and beam quantity, and calculates each line quantity distribution corresponding to each error script. Calculate the deviation of each error script at each calculation point as the line quantity error, so that even when more than two error factors are related and their effects are large, the correct line quantity error distribution can be calculated. In addition, by using the same display method as in Embodiment 1, the display unit and other display units display the relevant information of the line volume error ΔD i calculated in the above manner to the user, so that the user can easily plan the use of the leave. The bottom of the QA line measurement program.

如上述,具備本發明之實施形態2之線量分布演算裝置1之粒子射線治療裝置100,係藉由線量誤差分布演算部13,依據點位置、能量、射束量的誤差的趨勢,準備複數筆屬於誤差的值之集合之誤差腳本,並演算與各個誤差腳本對應之各個線量分布,算出各計算點之每個誤差腳本的偏差作為線量誤差,故不僅是可謀求縮短測量時間,亦可計算正確的線量誤差分布。 As described above, the particle beam treatment apparatus 100 provided with the line quantity distribution calculation device 1 according to the second embodiment of the present invention uses the line quantity error distribution calculation unit 13 to prepare a plurality of pens according to the trend of the error of the point position, energy, and beam quantity. An error script that belongs to the set of error values, and calculates the line volume distribution corresponding to each error script, and calculates the deviation of each error script at each calculation point as the line volume error, so not only can shorten the measurement time, but also calculate correctly The linear error distribution.

實施形態3. Embodiment 3.

在實施形態1及實施形態2中,雖說明了藉由在線量測量前實施線量誤差分布演算,而有效地進行QA測量之方法,惟在實施形態3中,係說明藉由交互反覆進行線量誤差分布演算及線量測量而有效地實施QA測量之方法。關於具備實施形態3之線量分布演算裝置之粒子射線治療裝置的構成,係與實施形態1之粒子射線治療裝置100相同,而省略其說明。 In the first embodiment and the second embodiment, although a method for effectively performing QA measurement by performing a line quantity error distribution calculation before on-line quantity measurement has been described, in the third embodiment, it is explained that the line quantity error is performed by interaction repeatedly. A method for effectively implementing QA measurement by distribution calculation and line measurement. The configuration of the particle beam treatment device provided with the line quantity distribution calculation device according to the third embodiment is the same as that of the particle beam treatment device 100 according to the first embodiment, and description thereof is omitted.

在實施形態1及2中,雖如線量Di及線量誤差△Di,以相對於離散的線量評估點i之線量值及線量誤差值之形式來表現,惟藉由將線量評估點i取充分小的間隔,或在相鄰的線量評估點間進行內插,即可容易地表現為連續的評估點(x,y,z)之線量及線量誤差。亦即,可將Di改寫成D(x,y,z),將△Di改寫成△D(x,y,z)。在下述段落中係以連續的評估點所形成的表記為前提進行說明。 In Embodiments 1 and 2, although the line amount D i and the line amount error ΔD i are expressed in terms of the line amount value and the line amount error value with respect to the discrete line amount evaluation point i, the line amount evaluation point i is taken as Sufficiently small intervals, or interpolation between adjacent line quantity evaluation points, can be easily expressed as the line quantity and line quantity errors of continuous evaluation points (x, y, z). That is, D i can be rewritten as D (x, y, z), and ΔD i can be rewritten as ΔD (x, y, z). In the following paragraphs, descriptions are made on the premise of a table formed by successive evaluation points.

第8圖係使用本發明實施形態3之線量分布演算裝置1之線量誤差分布演算的流程圖。使用第8圖,說明藉由本實施形態3交互反覆進行線量誤差分布演算及線量測量之流程。第9圖至第13圖係對應於第8圖之流程圖的各步驟之誤差腳本的示意圖。 FIG. 8 is a flowchart of a line amount error distribution calculation using the line amount distribution calculation device 1 according to Embodiment 3 of the present invention. Using FIG. 8, the flow of line quantity error distribution calculation and line quantity measurement performed interactively and repeatedly by the third embodiment will be described. Figures 9 to 13 are schematic diagrams of error scripts corresponding to the steps of the flowchart of Figure 8.

首先最初在步驟S801中,線量分布演算裝置1係藉由線量誤差分布演算部13以與實施形態2所記載者相同之方法來產生複數筆誤差腳本41(參閱第9圖)。接著,在步驟S802中,計算與該等複數筆誤差腳本對應之複 數筆線量分布,並計算其期望值及標準差,然後具體指定屬於線量誤差的標準差最大之座標之最大誤差產生位置43(參閱第10圖)。 First, in step S801, the line amount distribution calculation device 1 generates a plurality of error scripts 41 (see FIG. 9) by the line amount error distribution calculation unit 13 in the same manner as described in the second embodiment. Next, in step S802, the complexes corresponding to the plural error scripts are calculated. Count the line quantity distribution, calculate its expected value and standard deviation, and then specify the maximum error generation position 43 (see Figure 10) that belongs to the coordinate with the largest standard deviation of the line quantity error.

接著,在步驟S803中,藉由線量誤差分布演算部13於該座標實施線量測量,並在確認測量結果44後,將該測量結果之資訊亦即線量測量位置與測量線量值、配置位置誤差與測量線量值誤差輸入誤差資訊記憶部12(參閱第11圖)。在線量測量中,在水假體9中的該座標配置線量測量裝置7,並實際進行粒子射束2之照射。此時,線量測量裝置7的配置位置誤差及測量線量誤差係作為線量測量裝置配置固定件及線量測量裝置的規格而設為已知者。 Next, in step S803, the line volume error distribution calculation unit 13 performs line volume measurement at the coordinates, and after confirming the measurement result 44, the information of the measurement result, that is, the line volume measurement position and the measurement line volume value, the placement position error and Measurement line error input error information memory 12 (see FIG. 11). In the linear measurement, a linear measurement device 7 is arranged at this coordinate in the hydroprosthesis 9 and irradiation of the particle beam 2 is actually performed. At this time, the placement position error and the measurement line amount error of the line amount measurement device 7 are known as specifications of the line amount measurement device arrangement fixture and the line amount measurement device.

接著,在步驟S804中,藉由線量誤差分布演算部13將全部的誤差腳本分類成適合測量結果及不適合之2個群組,屬於不適合之群組之誤差腳本係廢棄(參閱第12圖)。於此,就判斷的基準而言,係藉由線量誤差分布演算裝置13來比較複數筆誤差腳本所對應之複數個誤差分布與所輸入之測量資訊,在相對於測量位置及線量測量值,線量分布落入配置位置誤差及線量測量值誤差的容許範圍內時,將該線量分布所對應之誤差腳本設為「適合測量結果」。反之,在相對於測量位置及線量測量值,線量分布未落入配置位置誤差及線量測量值誤差的容許範圍內時,將該線量分布所對應之誤差腳本設為「不適合測量結果」。 Next, in step S804, the error error calculation unit 13 classifies all the error scripts into two groups suitable for the measurement result and the unsuitable ones, and the error scripts belonging to the unsuitable group are discarded (see FIG. 12). Here, as far as the criterion of judgment is concerned, the line error distribution calculation device 13 is used to compare the plurality of error distributions corresponding to the plurality of error scripts with the input measurement information. The line quantity is relative to the measurement position and the line quantity measurement value. When the distribution falls within the allowable range of the placement position error and the measurement error of the line quantity, the error script corresponding to the line quantity distribution is set to "suitable for measurement results". Conversely, when the line quantity distribution does not fall within the allowable range of the position error and the line quantity measurement value relative to the measurement position and the line quantity measurement value, the error script corresponding to the line quantity distribution is set to "not suitable for the measurement result".

最後,藉由步驟S805,僅使用相對於測量位置及線量測量值,線量分布落入配置位置誤差及線量測量值誤差的容許範圍46內之屬於適合之群組之誤差腳本,再度計算線量誤差的期望值、變異量數、標準差,並再度顯示於顯示器(參閱第13圖)。藉由上述方式,使用者可得知與測量結果適合之線量誤差分布的資訊,而可反映於第2次以後的線量測量。 Finally, by step S805, using only the error scripts belonging to the appropriate group within the allowable range 46 of the position error and the measurement error of the line measurement relative to the measurement position and the measurement of the line measurement, the calculation of the error of the line measurement is calculated again. The expected value, the amount of variation, and the standard deviation are displayed on the display again (see Figure 13). With the above method, the user can know the information of the line quantity error distribution suitable for the measurement result, and it can be reflected in the second and subsequent line quantity measurements.

線量分布演算裝置1係藉由線量誤差分布演算部13將剩餘的誤差腳本再度分類為符合第2次的線量測量結果與不符合者之2個群組,屬於不符合之群組之誤差腳本係廢棄,而僅使用屬於符合之群組之誤差腳本再度計算線量誤差之期望值、變異量數、標準差,並再度顯示於顯示器。使用者可持續進行該作業至滿足結束條件。所謂結束條件係例如為相對於全部的誤差腳本,線量分布落入預先決定之容許範圍內時,或相對於全部的座標,線量誤差的標準差落入預先決定的容許範圍內時,或反覆進行線量誤差分布演算及線量測量達到預先決定之次數時,或因其他理由令使用者判斷停止反覆處理時等。 The line quantity distribution calculation device 1 uses the line quantity error distribution calculation unit 13 to classify the remaining error scripts into two groups that meet the second line quantity measurement result and the non-conforming ones, and the error scripts belong to the non-conforming group. Obsolete, and only use the error script belonging to the matching group to calculate the expected value, the amount of variation, and the standard deviation of the linear error again, and display it on the display again. The user can continue the operation until the end condition is satisfied. The end condition is, for example, when the line quantity distribution falls within a predetermined allowable range with respect to all the error scripts, or when the standard deviation of the line quantity error falls within a predetermined allowable range with respect to all the coordinates, or repeatedly When the line volume error distribution calculation and line volume measurement reaches a predetermined number of times, or when the user decides to stop iterative processing for other reasons, etc.

如上述,本發明實施形態3之線量分布演算裝置1所具備之粒子射線治療裝置100,係將使用假體之QA測量時的線量測量之測量位置、測量線量值、測量位置誤差、測量線量值誤差輸入誤差資訊記憶部12,並藉由線量誤差分布演算部13將輸入於誤差資訊記憶部12之測量位置及測量線量值之資訊與前述各誤差腳本所對應之前 述線量分布予以比對,而分類成相對於測量位置及測量線量值為在測量位置誤差及測量線量值誤差的容許範圍內之適合的誤差腳本及不適合的誤差腳本,並僅留下適合的誤差腳本而依據每個誤差腳本的偏差再度算出線量誤差,故不僅可謀求縮短測量時間,亦可藉由反覆進行線量誤差顯算及線量分布測量而提升QA測量的精確度。 As described above, the particle beam treatment device 100 included in the line quantity distribution calculation device 1 according to Embodiment 3 of the present invention is a measurement position, a measurement line value, a measurement position error, and a measurement line value when the line quantity measurement is performed when the prosthesis is used for QA measurement. The error is input into the error information storage unit 12, and the information of the measurement position and the measurement line value input in the error information storage unit 12 is corresponded to each of the foregoing error scripts by the line error distribution calculation unit 13. The line quantity distributions are compared, and classified into suitable error scripts and unsuitable error scripts with respect to the measurement position and the measurement line value within the allowable range of the measurement position error and the measurement line value error, leaving only suitable errors. The script calculates the line error again based on the deviation of each error script, so not only can you shorten the measurement time, but you can also improve the accuracy of the QA measurement by repeatedly performing the line error display and line measurement.

實施形態4. Embodiment 4.

在實施形態4中,針對依據測量結果將誤差腳本分類成複數個群組進行取捨選擇之方法。關於具備實施形態4之線量分布演算裝置之粒子射線治療裝置的構成,係與實施形態1之粒子射線治療裝置100相同,而省略其說明。 In the fourth embodiment, a method for classifying an error script into a plurality of groups based on a measurement result and selecting between them is selected. The configuration of the particle beam treatment device provided with the line quantity distribution calculation device according to the fourth embodiment is the same as that of the particle beam treatment device 100 according to the first embodiment, and description thereof is omitted.

首先在最初線量分布演算裝置1係藉由線量誤差分布演算部13實施線量誤差分布演算。在決定複數個線量測量座標後,藉由線量誤差分布演算部13於各座標使用線量測量裝置7進行線量測量,並將結果輸入誤差資訊記憶部12。接著線量分布演算裝置1係藉由線量誤差分布演算部13,依據誤差資訊記憶部12所記憶之測量結果,針對各誤差腳本算出「可靠度」之參數。 First, in the first line quantity distribution calculation device 1, the line quantity error distribution calculation is performed by the line quantity error distribution calculation unit 13. After determining a plurality of line volume measurement coordinates, the line volume error distribution calculation unit 13 uses the line volume measurement device 7 to perform line volume measurement at each coordinate, and inputs the results to the error information storage unit 12. Next, the line quantity distribution calculation device 1 calculates a parameter of "reliability" for each error script based on the measurement result stored in the error information storage unit 12 by the line quantity error distribution calculation unit 13.

所謂「可靠度」係具有誤差腳本所對應之線量分布愈接近測量結果就愈大之特徵之參數,於此係說明其定義之一例。將s設為腳本編號,將t設為線量測量座標編號,並將第s個誤差腳本所對應之線量分布設為Ds(x,y,z),將第t個線量測量座標設為(xm,t,ym,t,zm,t),而將在第七個線量測量座標的測量線量值設為Dm,t時,將線量分布 Ds(x,y,z)與測量結果(Dm,t,xm,t,ym,t,zm,t)之「距離」ls,t定義為式(16)。 The so-called "reliability" is a parameter having the characteristic that the line quantity distribution corresponding to the error script is closer to the measurement result, and an example of its definition is explained here. Set s as the script number, t as the line quantity measurement coordinate number, and the line quantity distribution corresponding to the s-th error script as D s (x, y, z), and set the t-th line quantity measurement coordinate as ( x m, t , y m, t , z m, t ), and when the measurement line value at the seventh line measurement coordinate is set to D m, t , the line distribution D s (x, y, z) and The “distance” l s, t of the measurement result (D m, t , x m, t , y m, t , z m, t ) is defined as Equation (16).

Figure TWI612493BD00011
Figure TWI612493BD00011

在此,σD以以及σr係用以統一線量與座標之單位制的基準常數,推薦例如使用測量線量值誤差與位置誤差。 Here, σ D and σ r are reference constants used to unify the unit system of line quantities and coordinates, and it is recommended to use, for example, measurement line quantity error and position error.

第s個誤差腳本的可靠度Rs係對於第s個誤差腳本,可以相對於全部的測量點(t=1至m)之距離的平方值的合計的平方根的倒數而定義成式(17)。 The reliability Rs of the s-th error script can be defined as Equation (17) with respect to the inverse of the square root of the total of the squared values of the distances of all the measurement points (t = 1 to m).

Figure TWI612493BD00012
Figure TWI612493BD00012

可靠度之值愈大,則與該誤差腳本對應之線量分布及線量測量結果之平均距離愈短,亦即可謂屬於接近測量結果之誤差腳本。 The greater the reliability value, the shorter the line volume distribution and the average distance of the line volume measurement result corresponding to the error script, which can be said to be an error script close to the measurement result.

依據可靠度之值,線量分布演算裝置1係藉由線量誤差分布演算部13可將誤差腳本分成複數個群組。例如,將最初準備之複數筆誤差腳本中依可靠度高之順序將一半分為群組A,另一半分為群組B。此時,將屬 於群組B之誤差腳本廢棄,並僅以屬於群組A之誤差腳本再度計算線量誤差的期望值、變異量數、標準差,且藉由如第4圖顯示於顯示部14,使用者可得知更加反映出測量結果之線量誤差分布。於此,亦可考量其他將誤差腳本分類成2個群組之方法。例如亦可從可靠度高之順序將其中6成設為為A群組,將剩下的4成設為B群組,亦可預先設定可靠度的臨限值,而將可靠度超過臨限值者設為A群組,將臨限值以下者設為B群組。 Based on the reliability value, the line quantity distribution calculation device 1 can divide the error script into a plurality of groups by the line quantity error distribution calculation unit 13. For example, among the plurality of error scripts prepared initially, one half is divided into group A and the other half is divided into group B in order of high reliability. At this time, the The error script in group B is discarded, and only the error script belonging to group A is used to calculate the expected value, the amount of variation, and the standard deviation of the line error again. By displaying it on the display section 14 as shown in FIG. 4, the user can obtain The knowledge more reflects the linear error distribution of the measurement results. Here, other methods for classifying the error script into two groups can also be considered. For example, from the order of high reliability, 60% of them can be set as group A, and the remaining 40% can be set as group B. The threshold of reliability can be set in advance, and the reliability exceeds the threshold. Values are set as group A, and those below the threshold are set as group B.

再者,依可靠度進行之分群,並不一定要分成2個群組。例如亦可依可靠度高之順序將3分之1分成A群組,將次高的3分之1分成B群組,並將剩下的3分之1分成C群組。此時,可如集合I係僅群組A,集合II係群組A及B之聯集,集合III係群組A及B及C之聯集之方式定義3個集合,並對於屬於各個集合之誤差腳本所對應之線量分布分別再度計算線量誤差的期望值、變異量數、標準差。使用再度計算之結果,如第14圖所示,在顯示部14的顯示器55顯示Di+E(△Di)+σ(△Di)及Di+E(△Di)-σ(△Di)之圖表。藉此,使用者能夠更加地以視覺方式理解線量之可靠性的範圍。 Furthermore, grouping according to reliability does not have to be divided into two groups. For example, one third of them can be divided into group A, one third of the next highest can be divided into group B, and the remaining one third can be divided into group C in the order of high reliability. At this time, three sets can be defined in the way that set I is only group A, set II is the linked set of groups A and B, and set III is the linked set of groups A, B, and C, and for each set that belongs to each set The line quantity distribution corresponding to the error script calculates again the expected value, the number of variation, and the standard deviation of the line quantity error. Using the recalculation result, as shown in FIG. 14, D i + E (△ D i ) + σ (△ Di) and D i + E (△ D i ) -σ (△ Di) chart. Thereby, the user can understand the range of the reliability of the line quantity more visually.

亦可使用可靠度之參數,不進行分群而再度計算線量誤差分布。在計算線量誤差的期望值及變異量數時,因應誤差腳本的可靠度對誤差腳本附加加權係數Ws,藉此可使可靠度較高的誤差腳本更加反映至結果。此時,線量誤差的期望值E(△Di)及變異量數V(△Di)、標準 差σ(△Di)分別可如式(18)、(19)、(20)之方式求出。 You can also use the reliability parameter to calculate the line error distribution again without grouping. When calculating the expected value of the linear error and the number of variations, a weighting coefficient W s is added to the error script according to the reliability of the error script, so that the error script with higher reliability can be more reflected to the result. At this time, the expected value E (△ D i ), the number of variations V (△ D i ), and the standard deviation σ (△ D i ) of the linear error can be obtained by the formulas (18), (19), and (20), respectively. Out.

Figure TWI612493BD00013
Figure TWI612493BD00013

Figure TWI612493BD00014
Figure TWI612493BD00014

Figure TWI612493BD00015
Figure TWI612493BD00015

於此,誤差腳本加權係數Ws的決定方式雖考慮有各種方法,惟重點在於要有可靠度愈高則誤差腳本加權係數就愈高之關係。最簡單的決定方法係使誤差腳本加權係數之值與可靠度相同,亦即定義成式(21)。 Here, although there are various methods for determining the error script weighting coefficient W s , the important point is that the higher the reliability, the higher the error script weighting coefficient. The simplest decision method is to make the value of the error script weighting coefficient the same as the reliability, which is defined as equation (21).

[數21]數21 Ws=Rs…(21) [Number 21] Number 21 W s = R s … (21)

如上述,具備本發明實施形態4之線量分布演算裝置1之粒子射線治療裝置100係將使用假體之QA測量時之線量測量之測量位置、測量線量值、測量位置誤差、測量線量值誤差輸入誤差資訊記憶部12,並藉由線量誤差分布演算部13依據輸入至誤差資訊記憶部12之測量位置及測量線量值之資訊,對各誤差腳本算出可靠度,然後依據算出的可靠度將誤差腳本分類成至少2個群組,並因應屬於分類出群組之中之至少一個群組之誤差腳本所對應之線量分布的偏差而算出線量誤差分布,因此,不僅是可謀求縮短測量時間,亦藉由將複數筆誤差腳本分類成群組並予以取捨選擇,而可使QA測量之精確度提升。 As described above, the particle beam treatment apparatus 100 provided with the line quantity distribution calculation device 1 according to the fourth embodiment of the present invention inputs the measurement position, the measurement line quantity, the measurement position error, and the measurement line quantity error when the line quantity is measured during the QA measurement of the prosthesis. The error information storage unit 12, and the line error distribution calculation unit 13 calculates the reliability of each error script based on the information of the measurement position and the measurement line input to the error information storage unit 12, and then calculates the error script based on the calculated reliability. Classify into at least 2 groups, and calculate the line volume error distribution according to the deviation of the line volume distribution corresponding to the error script belonging to at least one of the classified groups. Therefore, not only can shorten the measurement time, but also borrow The accuracy of QA measurement can be improved by classifying a plurality of error scripts into groups and selecting them.

實施形態5. Embodiment 5.

在實施形態5中,說明在與實施形態2同樣地,線量分布演算裝置在產生複數筆誤差腳本後,依據平均自我相關函數設定測量間隔而計算線量分布之方法。關於具備實施形態5之線量分布演算裝置之粒子射線治療裝置之構成係與實施形態1之粒子射線治療裝置100相同,而省略其說明。 In the fifth embodiment, as in the second embodiment, a method for calculating a line quantity distribution by setting a measurement interval based on an average self-correlation function after generating a plurality of error scripts is described by the line quantity distribution calculation device. The configuration of the particle beam treatment device provided with the line quantity distribution calculation device according to the fifth embodiment is the same as that of the particle beam treatment device 100 according to the first embodiment, and a description thereof is omitted.

對於相對於一個誤差腳本s之線量誤差△Ds(x,y,z),其自我相關函數Is(τ x,τ y,τ z)係可表示成式(22)。 For the linear error ΔD s (x, y, z) with respect to an error script s, its self-correlation function I s ( τ x , τ y , τ z ) can be expressed as Equation (22).

[數22]數22 lsxyz)=∫ ∫ ∫ △Ds(x,y,z)△Ds(x-τx,y-τy,z-τz)dxdydz…(22) [Number 22] Number 22 l sx , τ y , τ z ) = ∫ ∫ ∫ △ D s (x, y, z) △ D s (x-τ x , y-τ y , z-τ z dxdydz ... (22)

於此,三維積分∫ ∫ ∫的積分範圍理想上x、y、z皆為取負無限大至無限大為佳,惟在實際上係難以計算無限大的範圍之線量分布,故亦可將範圍限定成重要的部分,例如關心區域,亦即於患者QA中將必須確認線量分布之範圍設為積分範圍。為簡化說明,於此係考慮屬於僅關注於x方向之自我相關函數之式(23)。 Here, the three-dimensional integral ∫ ∫ ∫ ideally the integral range of x, y, and z is preferably negative infinity to infinity, but in reality it is difficult to calculate the linear distribution of the infinite range, so the range can also be It is limited to an important part, for example, a region of interest, that is, a range in which a line amount distribution must be confirmed in a patient QA is set as an integral range. In order to simplify the description, the equation (23) which belongs to the self-correlation function focusing only on the x direction is considered here.

[數23]數23 lsx)=lsx,0,0)=∫ ∫ ∫ △Ds(x,y,z)△Ds(x-τx,y,z)dxdydz…(23) [Number 23] Number 23 l sx ) = l sx , 0,0) = ∫ ∫ ∫ △ D s (x, y, z) △ D s (x-τ x , y, z) dxdydz ... (23)

此時,相對於全部的誤差腳本之平均的自我相關函數IAVERAGE(τ x)係可以式(24)之方式計算。 At this time, the average self-correlation function I AVERAGE ( τ x ) with respect to all the error scripts can be calculated by the formula (24).

Figure TWI612493BD00016
Figure TWI612493BD00016

一般而言,函數Ds(x,y,z)係包含誤差因素而不會成為週期函數,平均自我相關函數IAVERAGE(τ x)係如第15圖所示在τ x=0時成為最大。平均自我相關函數 IAVERAGE(τ x)的值為正時,意味著某點x之線量誤差值,與從該處離開τ x之點x+τ x之線量誤差值係為某種程度接近之值之可能性較高。並且,平均自我相關函數IAVERAGE(τ x)的值愈大,則2個點之線量誤差值相近之可能性愈高,故在QA測量中對該2點都進行測量並無太大意義。因此,只要依據平均自我相關函數IAVERAGE(τ x)來決定線量測量點的間隔,即可實施有效率的QA測量。於此,所謂依據平均自我相關函數決定線量測量點的間隔,係指例如將自我相關函數的半峰半寬(Half Width at Half Maximum)51設為測量間隔。 In general, the function D s (x, y, z) contains an error factor and does not become a periodic function. The average self-correlation function I AVERAGE ( τ x ) is the maximum when τ x = 0, as shown in Figure 15. . When the value of the average self-correlation function I AVERAGE ( τ x ) is positive, it means that the linear error value of a certain point x is close to the linear error value of the point x + τ x that leaves τ x from there. The probability is higher. In addition, the larger the value of the average self-correlation function I AVERAGE ( τ x ), the higher the possibility that the linear error values of the two points are similar. Therefore, it is not meaningful to measure both points in the QA measurement. Therefore, as long as the interval between line measurement points is determined according to the average self-correlation function I AVERAGE ( τ x ), efficient QA measurement can be performed. Here, the determination of the interval of the line measurement points based on the average self-correlation function means, for example, that the half-width at half maximum 51 of the auto-correlation function is set as the measurement interval.

同樣的計算亦可針對y、z方向進行,亦可求出y、z方向的平均自我相關函數IAVERAGE(τ y)及IAVERAGE(τ z),亦可求出該等之半峰半寬。在QA測量中,使用者係可對於x、y、z方向依據各自的平均自我相關函數設定測量間隔,並可以三維方式配置測量點。 The same calculation can also be performed for the y and z directions, and the average self-correlation functions I AVERAGE ( τ y ) and I AVERAGE ( τ z ) in the y and z directions can also be obtained. . In QA measurement, the user can set the measurement interval for the x, y, and z directions according to their respective average self-correlation functions, and can configure the measurement points in three dimensions.

如上述,具備本發明實施形態5之線量分布演算裝置1之粒子射線治療裝置100係藉由線量分布演算裝置13,對各誤差腳本所對應之線量分布計算其自我相關函數,並依據自我相關函數算出線量測量間隔之值,故可實施有效率的QA測量。 As described above, the particle beam treatment device 100 provided with the line quantity distribution calculation device 1 according to the fifth embodiment of the present invention uses the line quantity distribution calculation device 13 to calculate its self-correlation function for the line quantity distribution corresponding to each error script, and according to the self-correlation function Calculate the value of the line measurement interval, so you can implement efficient QA measurement.

另外本發明係可在其發明的範圍內自由組合各實施形態,或將各實施形態適當地變形、省略。 In addition, the present invention can freely combine various embodiments within the scope of the invention, or appropriately deform or omit each embodiment.

1‧‧‧線量分布演算裝置 1‧‧‧ Line quantity distribution calculation device

7‧‧‧線量測量裝置 7‧‧‧line measuring device

11‧‧‧治療計畫資訊記憶部 11‧‧‧ Treatment plan information memory

12‧‧‧誤差資訊記憶部 12‧‧‧ Error Information Memory

13‧‧‧線量誤差分布演算部 13‧‧‧Line Error Distribution Calculation Department

14‧‧‧顯示部 14‧‧‧Display

Claims (29)

一種線量分布演算裝置,係包括:治療計畫資訊記憶部,係記憶治療計畫之資訊;誤差資訊記憶部,係記憶誤差之資訊;以及線量誤差分布演算部,係對於依據前述治療計畫資訊記憶部所記憶之前述治療計畫之資訊之照射,因應前述誤差資訊記憶部所記憶之前述誤差之資訊,演算線量誤差之分布;其中,前述治療計畫之資訊係包括由前述治療計畫所定之點的位置,以及照射至前述各點之粒子射束的能量及射束量;前述誤差之資訊係包括因機器的動作誤差、照射對象的動作而可能產生之前述點的位置、前述能量、前述射束量之中至少一者的誤差。 A linear distribution calculation device includes: a treatment plan information storage unit, which stores information of a treatment plan; an error information storage unit, which stores information of error; and a linear amount distribution calculation unit, which is based on the aforementioned treatment plan information. The irradiation of the information of the aforementioned treatment plan memorized by the memory unit is calculated based on the information of the aforementioned error memorized by the error information memorization unit, and the distribution of the linear error is calculated; wherein the information of the aforementioned treatment plan includes the information determined by the aforementioned treatment plan The position of the point, and the energy and amount of the beam of particles irradiated to the aforementioned points; the information of the aforementioned error includes the position of the aforementioned point, the aforementioned energy, An error in at least one of the aforementioned beam amounts. 如申請專利範圍第1項所述之線量分布演算裝置,其中,前述線量誤差分布演算部係從預先指定之區域中搜尋前述線量誤差最大之點。 The line quantity distribution calculation device according to item 1 of the scope of patent application, wherein the above-mentioned line quantity error distribution calculation unit searches for a point where the above-mentioned line quantity error is greatest from a pre-designated area. 如申請專利範圍第1項所述之線量分布演算裝置,其中,前述線量誤差分布演算部係從預先指定之區域中搜尋前述線量誤差的大小比預先指定之容許範圍更大之範圍。 The line quantity distribution calculation device according to item 1 of the scope of patent application, wherein the above-mentioned line quantity error distribution calculation unit searches for a range of the above-mentioned line quantity error from a pre-designated area that is larger than a pre-designated allowable range. 如申請專利範圍第2項所述之線量分布演算裝置,其中,前述線量誤差分布演算部係從預先指定之區域中搜尋前述線量誤差的大小比預先指定之容許範圍更大 之範圍。 The line quantity distribution calculation device according to item 2 of the scope of the patent application, wherein the above-mentioned line quantity error distribution calculation unit searches for a magnitude of the above-mentioned line quantity error from a pre-designated area that is larger than a pre-specified allowable range Range. 如申請專利範圍第1項所述之線量分布演算裝置,其中,前述線量誤差分布演算部係依據前述點的位置、前述能量、前述射束量的誤差的趨勢,製作屬於前述誤差之值的組合之誤差腳本,並演算前述誤差腳本所對應之線量分布,且演算每個前述誤差腳本的偏差作為前述線量誤差的分布。 The line quantity distribution calculation device according to item 1 of the scope of the patent application, wherein the line quantity error distribution calculation unit makes a combination of the values of the errors based on the position of the point, the energy, and the tendency of the error of the beam amount. The error script is calculated, and the line quantity distribution corresponding to the foregoing error script is calculated, and the deviation of each of the foregoing error scripts is calculated as the foregoing line quantity error distribution. 如申請專利範圍第2項所述之線量分布演算裝置,其中,前述線量誤差分布演算部係依據前述點的位置、前述能量、前述射束量的誤差的趨勢,製作屬於前述誤差之值的組合之誤差腳本,並演算前述誤差腳本所對應之線量分布,且演算每個前述誤差腳本的偏差作為前述線量誤差的分布。 The line quantity distribution calculation device according to item 2 of the scope of the patent application, wherein the line quantity error distribution calculation unit makes a combination of the values of the errors based on the position of the point, the energy, and the tendency of the error of the beam amount. The error script is calculated, and the line quantity distribution corresponding to the foregoing error script is calculated, and the deviation of each of the foregoing error scripts is calculated as the foregoing line quantity error distribution. 如申請專利範圍第3項所述之線量分布演算裝置,其中,前述線量誤差分布演算部係依據前述點的位置、前述能量、前述射束量的誤差的趨勢,製作屬於前述誤差之值的組合之誤差腳本,並演算前述誤差腳本所對應之線量分布,且演算每個前述誤差腳本的偏差作為前述線量誤差的分布。 According to the line quantity distribution calculation device described in item 3 of the scope of the patent application, wherein the line quantity error distribution calculation unit is based on the position of the point, the energy, and the tendency of the error of the beam amount, and generates a combination of the values of the errors. The error script is calculated, and the line quantity distribution corresponding to the foregoing error script is calculated, and the deviation of each of the foregoing error scripts is calculated as the foregoing line quantity error distribution. 如申請專利範圍第4項所述之線量分布演算裝置,其中,前述線量誤差分布演算部係依據前述點的位置、前述能量、前述射束量的誤差的趨勢,製作屬於前述誤差之值的組合之誤差腳本,並演算前述誤差腳本所對應之線量分布,且演算每個前述誤差腳本的偏差作 為前述線量誤差的分布。 The line quantity distribution calculation device according to item 4 of the scope of patent application, wherein the line quantity error distribution calculation unit is based on the position of the point, the energy, and the tendency of the error of the beam amount, and generates a combination of the values of the errors. Error script, and calculate the line volume distribution corresponding to the foregoing error script, and calculate the deviation of each of the foregoing error scripts. Is the distribution of the aforementioned linearity error. 如申請專利範圍第5項所述之線量分布演算裝置,其中,前述線量誤差分布演算部係將進行過線量測量之位置、線量值、位置誤差、及線量值誤差輸入前述誤差資訊記憶部,並比對前述位置及前述線量值之資訊與對應前述誤差腳本而演算出之線量誤差分布,並分類成相對於前述位置及前述線量值在前述位置誤差及前述線量值誤差的容許範圍內為適合之前述誤差腳本及不適合之前述誤差腳本,而僅將前述適合之誤差腳本依據每個前述適合之誤差腳本的偏差來再度演算作為前述線量誤差的分布。 According to the line quantity distribution calculation device described in item 5 of the scope of patent application, wherein the line quantity error distribution calculation unit inputs the position, line quantity value, position error, and line quantity error of the line quantity measurement into the error information storage unit, and Compare the information of the position and the line quantity with the line quantity error distribution calculated in accordance with the error script, and classify it into the position and line quantity within the allowable range of the position error and the line quantity error. The aforementioned error script and the aforementioned error script that are not suitable, and only the aforementioned appropriate error script is calculated again as the distribution of the aforementioned line quantity error according to the deviation of each of the aforementioned appropriate error scripts. 如申請專利範圍第6項所述之線量分布演算裝置,其中,前述線量誤差分布演算部係將進行過線量測量之位置、線量值、位置誤差、及線量值誤差輸入前述誤差資訊記憶部,並比對前述位置及前述線量值之資訊與對應前述誤差腳本而演算出之線量誤差分布,並分類成相對於前述位置及前述線量值在前述位置誤差及前述線量值誤差的容許範圍內為適合之前述誤差腳本及不適合之前述誤差腳本,而僅將前述適合之誤差腳本依據每個前述適合之誤差腳本的偏差來再度演算作為前述線量誤差的分布。 According to the line quantity distribution calculation device described in item 6 of the scope of patent application, wherein the line quantity error distribution calculation unit inputs the position, line quantity value, position error, and line quantity error of the line quantity measurement into the error information storage unit, and Compare the information of the position and the line quantity with the line quantity error distribution calculated in accordance with the error script, and classify it into the position and line quantity within the allowable range of the position error and the line quantity error. The aforementioned error script and the aforementioned error script that are not suitable, and only the aforementioned appropriate error script is calculated again as the distribution of the aforementioned line quantity error according to the deviation of each of the aforementioned appropriate error scripts. 如申請專利範圍第7項所述之線量分布演算裝置,其中,前述線量誤差分布演算部係將進行過線量測量之位置、線量值、位置誤差、及線量值誤差輸入前述誤 差資訊記憶部,並比對前述位置及前述線量值之資訊與對應前述誤差腳本而演算出之線量誤差分布,並分類成相對於前述位置及前述線量值在前述位置誤差及前述線量值誤差的容許範圍內為適合之前述誤差腳本及不適合之前述誤差腳本,而僅將前述適合之誤差腳本依據每個前述適合之誤差腳本的偏差來再度演算作為前述線量誤差的分布。 According to the line quantity distribution calculation device described in item 7 of the scope of patent application, wherein the above-mentioned line quantity error distribution calculation unit inputs the position, line quantity value, position error, and line quantity error of the line quantity measurement, into the error The difference information memory section compares the information of the aforementioned position and the aforementioned line magnitude value with the calculated linear error distribution corresponding to the aforementioned error script, and classifies it into the position error and the aforementioned line magnitude error relative to the aforementioned position and the aforementioned line magnitude value. Within the allowable range are the aforementioned error scripts that are suitable and the aforementioned error scripts that are not suitable, and only the aforementioned appropriate error scripts are recalculated as the distribution of the aforementioned line error according to the deviation of each of the aforementioned appropriate error scripts. 如申請專利範圍第8項所述之線量分布演算裝置,其中,前述線量誤差分布演算部係將進行過線量測量之位置、線量值、位置誤差、及線量值誤差輸入前述誤差資訊記憶部,並比對前述位置及前述線量值之資訊與對應前述誤差腳本而演算出之線量誤差分布,並分類成相對於前述位置及前述線量值在前述位置誤差及前述線量值誤差的容許範圍內為適合之前述誤差腳本及不適合之前述誤差腳本,而僅將前述適合之誤差腳本依據每個前述適合之誤差腳本的偏差來再度演算作為前述線量誤差的分布。 The line quantity distribution calculation device according to item 8 in the scope of the patent application, wherein the line quantity error distribution calculation unit inputs the position, line quantity value, position error, and line quantity error of the line quantity measurement into the error information storage unit, and Compare the information of the position and the line quantity with the line quantity error distribution calculated in accordance with the error script, and classify it into the position and line quantity within the allowable range of the position error and the line quantity error. The aforementioned error script and the aforementioned error script that are not suitable, and only the aforementioned appropriate error script is calculated again as the distribution of the aforementioned line quantity error according to the deviation of each of the aforementioned appropriate error scripts. 如申請專利範圍第5項所述之線量分布演算裝置,其中,前述線量誤差分布演算部係將經過線量測定之位置、線量值輸入前述誤差資訊記憶部,並依據前述位置及前述線量值之資訊,對前述誤差腳本算出可靠度,且因應前述算出之可靠度演算前述線量誤差的分布。 According to the line quantity distribution calculation device described in item 5 of the scope of patent application, wherein the above-mentioned line quantity error distribution calculation unit inputs the position and line quantity value measured through the line quantity into the foregoing error information memory unit, and based on the information of the foregoing location and the line quantity value , Calculate the reliability of the error script, and calculate the distribution of the line error according to the calculated reliability. 如申請專利範圍第6項所述之線量分布演算裝置,其 中,前述線量誤差分布演算部係將經過線量測定之位置、線量值輸入前述誤差資訊記憶部,並依據前述位置及前述線量值之資訊,對前述誤差腳本算出可靠度,且因應前述算出之可靠度演算前述線量誤差的分布。 The line quantity distribution calculation device as described in item 6 of the scope of patent application, which In the above-mentioned line volume error distribution calculation unit, the position and line volume value measured by the line volume are input into the above error information storage unit, and the reliability of the error script is calculated based on the information of the position and line volume value, and the reliability of the calculation is based on the calculation The degree calculates the distribution of the aforementioned linearity error. 如申請專利範圍第7項所述之線量分布演算裝置,其中,前述線量誤差分布演算部係將經過線量測定之位置、線量值輸入前述誤差資訊記憶部,並依據前述位置及前述線量值之資訊,對前述誤差腳本算出可靠度,且因應前述算出之可靠度演算前述線量誤差的分布。 According to the line quantity distribution calculation device described in item 7 of the scope of the patent application, wherein the above-mentioned line quantity error distribution calculation unit inputs the position and line quantity value measured through the line quantity into the foregoing error information memory unit, and based on the information of the foregoing location and the line quantity value , Calculate the reliability of the error script, and calculate the distribution of the line error according to the calculated reliability. 如申請專利範圍第8項所述之線量分布演算裝置,其中,前述線量誤差分布演算部係將經過線量測定之位置、線量值輸入前述誤差資訊記憶部,並依據前述位置及前述線量值之資訊,對前述誤差腳本算出可靠度,且因應前述算出之可靠度演算前述線量誤差的分布。 The line quantity distribution calculation device described in item 8 of the scope of patent application, wherein the above-mentioned line quantity error distribution calculation unit inputs the position and line quantity value measured through the line quantity into the foregoing error information storage unit, and based on the information of the foregoing location and the line quantity value , Calculate the reliability of the error script, and calculate the distribution of the line error according to the calculated reliability. 如申請專利範圍第13項之線量分布演算裝置,其中,前述線量誤差分布演算部係依據前述算出之可靠度將前述誤差腳本分成至少2個群組,並依據屬於分類出之中至少1個群組之前述誤差腳本所對應之線量分布的偏差,演算前述線量差的分布。 For example, the line quantity distribution calculation device for item 13 of the scope of patent application, wherein the line quantity error distribution calculation unit divides the error script into at least two groups based on the calculated reliability and belongs to at least one of the classified groups. The deviation of the line quantity distribution corresponding to the foregoing error script of the group calculates the distribution of the line quantity difference. 如申請專利範圍第14項之線量分布演算裝置,其中,前述線量誤差分布演算部係依據前述算出之可靠度將 前述誤差腳本分成至少2個群組,並依據屬於分類出之中至少1個群組之前述誤差腳本所對應之線量分布的偏差,演算前述線量差的分布。 For example, the line quantity distribution calculation device for item 14 of the scope of patent application, wherein the above-mentioned line quantity error distribution calculation unit is based on the reliability calculated above. The error script is divided into at least two groups, and the distribution of the line error is calculated based on the deviation of the line quantity distribution corresponding to the error script belonging to at least one of the classified groups. 如申請專利範圍第15項之線量分布演算裝置,其中,前述線量誤差分布演算部係依據前述算出之可靠度將前述誤差腳本分成至少2個群組,並依據屬於分類出之中至少1個群組之前述誤差腳本所對應之線量分布的偏差,演算前述線量差的分布。 For example, the line quantity distribution calculation device for item 15 of the scope of patent application, wherein the line quantity error distribution calculation unit divides the error script into at least two groups based on the calculated reliability and belongs to at least one of the classified groups. The deviation of the line quantity distribution corresponding to the foregoing error script of the group calculates the distribution of the line quantity difference. 如申請專利範圍第16項之線量分布演算裝置,其中,前述線量誤差分布演算部係依據前述算出之可靠度將前述誤差腳本分成至少2個群組,並依據屬於分類出之中至少1個群組之前述誤差腳本所對應之線量分布的偏差,演算前述線量差的分布。 For example, the line quantity distribution calculation device for item 16 of the scope of patent application, wherein the line quantity error distribution calculation unit divides the error script into at least two groups according to the calculated reliability, and belongs to at least one of the classified groups. The deviation of the line quantity distribution corresponding to the foregoing error script of the group calculates the distribution of the line quantity difference. 如申請專利範圍第13項所述之線量分布演算裝置,其中,前述線量誤差分布演算部係依據前述算出之可靠度,對各誤差腳本設定加權係數,並因應前述加權係數演算前述線量誤差的分布。 According to the line quantity distribution calculation device described in item 13 of the scope of the patent application, the line quantity error distribution calculation unit sets a weighting coefficient for each error script based on the calculated reliability, and calculates the line quantity error distribution according to the weighting coefficient. . 如申請專利範圍第14項所述之線量分布演算裝置,其中,前述線量誤差分布演算部係依據前述算出之可靠度,對各誤差腳本設定加權係數,並因應前述加權係數演算前述線量誤差的分布。 According to the line quantity distribution calculation device according to item 14 of the scope of the patent application, the line quantity error distribution calculation unit sets a weighting coefficient for each error script according to the calculated reliability, and calculates the line quantity error distribution according to the weighting coefficient. . 如申請專利範圍第15項所述之線量分布演算裝置,其中,前述線量誤差分布演算部係依據前述算出之可靠度,對各誤差腳本設定加權係數,並因應前述加權係 數演算前述線量誤差的分布。 According to the line quantity distribution calculation device described in Item 15 of the scope of patent application, wherein the line quantity error distribution calculation unit is based on the reliability calculated above, sets a weighting coefficient for each error script, and responds to the weighting system. Calculate the distribution of the aforementioned linear error. 如申請專利範圍第16項所述之線量分布演算裝置,其中,前述線量誤差分布演算部係依據前述算出之可靠度,對各誤差腳本設定加權係數,並因應前述加權係數演算前述線量誤差的分布。 According to the line quantity distribution calculation device described in item 16 of the scope of the patent application, the line quantity error distribution calculation unit sets a weighting coefficient for each error script based on the calculated reliability, and calculates the line quantity error distribution according to the weighting coefficient. . 如申請專利範圍第5項所述之線量分布演算裝置,其中,前述線量誤差分布演算部係依據前述誤差腳本所對應之線量分布相對之自我相關函數,設定線量測量間隔,而演算前述線量誤差的分布。 According to the line quantity distribution calculation device described in Item 5 of the scope of the patent application, wherein the line quantity error distribution calculation unit sets a line quantity measurement interval based on the self-correlation function of the line quantity distribution corresponding to the error script, and calculates the line quantity error. distributed. 如申請專利範圍第6項所述之線量分布演算裝置,其中,前述線量誤差分布演算部係依據前述誤差腳本所對應之線量分布相對之自我相關函數,設定線量測量間隔,而演算前述線量誤差的分布。 According to the line quantity distribution calculation device described in item 6 of the scope of the patent application, wherein the line quantity error distribution calculation unit sets a line quantity measurement interval based on the self-correlation function of the line quantity distribution corresponding to the error script, and calculates the line quantity error. distributed. 如申請專利範圍第7項所述之線量分布演算裝置,其中,前述線量誤差分布演算部係依據前述誤差腳本所對應之線量分布相對之自我相關函數,設定線量測量間隔,而演算前述線量誤差的分布。 According to the line quantity distribution calculation device described in item 7 of the scope of the patent application, wherein the line quantity error distribution calculation unit sets a line quantity measurement interval based on the self-correlation function of the line quantity distribution corresponding to the error script, and calculates the line quantity error. distributed. 如申請專利範圍第8項所述之線量分布演算裝置,其中,前述線量誤差分布演算部係依據前述誤差腳本所對應之線量分布相對之自我相關函數,設定線量測量間隔,而演算前述線量誤差的分布。 According to the line quantity distribution calculation device described in item 8 of the scope of patent application, wherein the line quantity error distribution calculation unit sets a line quantity measurement interval based on the self-correlation function of the line quantity distribution corresponding to the error script, and calculates the line quantity error. distributed. 一種粒子射線治療裝置,係具備申請專利範圍第1至28項中任一項所述之線量分布演算裝置。 A particle ray treatment device is provided with a line quantity distribution calculation device according to any one of claims 1 to 28 of the scope of patent application.
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