TWI600451B - Particle irradiation treatment device and treatment planning corrective method - Google Patents

Particle irradiation treatment device and treatment planning corrective method Download PDF

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TWI600451B
TWI600451B TW105117949A TW105117949A TWI600451B TW I600451 B TWI600451 B TW I600451B TW 105117949 A TW105117949 A TW 105117949A TW 105117949 A TW105117949 A TW 105117949A TW I600451 B TWI600451 B TW I600451B
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amount
particle beam
line
distribution
energy
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TW105117949A
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TW201716104A (en
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坂本裕介
西沢志
林真照
東哲史
山本和男
平野有希子
前田奈津子
岸井保人
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三菱電機股份有限公司
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    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61NELECTROTHERAPY; MAGNETOTHERAPY; RADIATION THERAPY; ULTRASOUND THERAPY
    • A61N5/00Radiation therapy
    • A61N5/10X-ray therapy; Gamma-ray therapy; Particle-irradiation therapy

Description

粒子射線治療裝置及治療計畫補正方法 Particle beam therapy device and treatment plan correction method

本發明係關於對腫瘤等患部照射質子或碳離子等粒子射束(粒子射線)而進行治療之粒子射線治療裝置,該粒子射線治療裝置係用於為了將粒子射束配合患部的三維形狀而照射預定線量者。 The present invention relates to a particle beam therapy apparatus that treats an affected part such as a tumor by irradiation with a particle beam (particle beam) such as protons or carbon ions, and the particle beam therapy apparatus is used to irradiate a particle beam with a three-dimensional shape of an affected part. The amount of the line is scheduled.

粒子射線治療係利用加速器等機器將質子或碳離子等帶電粒子加速至數百倍的百萬電子伏特等級,並照射至患者,以對體內的腫瘤賦予線量,從而治療癌症之方法。此時對於腫瘤形成線量分布時,以盡可能接近醫師所指示之線量分布亦即目標分布,乃至為重要。 The particle beam therapy system uses a device such as an accelerator to accelerate a charged particle such as a proton or a carbon ion to a million electron volt level of several hundred times, and irradiates it to a patient to provide a linear amount to a tumor in the body, thereby treating cancer. At this time, when the tumor is formed into a linear amount distribution, it is important to be as close as possible to the linear quantity distribution indicated by the physician, that is, the target distribution.

一般而言,在將加速器所加速之粒子射束照射至物體(包含人體)時,在物體內的三維線量分布會有在某一點具有線量最大峰值之特性。該線量最大峰值係稱為布拉格峰值。再者,在三維空間中於一點具有線量最大峰值時,將該峰值位置定義為該粒子射束的「照射位置」。為了使用具有如上述之峰值構造之粒子射束而以三維方式形成目標分布,係需要某些技術手段。 In general, when a particle beam accelerated by an accelerator is irradiated onto an object (including a human body), the three-dimensional line amount distribution in the object has a characteristic of having a maximum peak amount at a certain point. The maximum peak value of this line quantity is called the Bragg peak. Furthermore, when there is a maximum peak amount of the line at one point in the three-dimensional space, the peak position is defined as the "irradiation position" of the particle beam. In order to form a target distribution in a three-dimensional manner using a particle beam having a peak configuration as described above, some technical means are required.

就形成目標分布之方法之一,係有掃描(scanning)照射法。為了使用該種方法,首先須使用偏向機構,該偏向機構係利用電磁鐵等,將粒子射束朝向與屬於粒子射束的行進方向之Z方向垂直之方向,亦即X及Y方向任意地偏向。再者,需要藉由調整粒子能量而將形成布拉格峰值之位置沿Z方向任意地調整之功能。一般而言,進行粒子射線的輸送及遮斷之粒子射束產生輸送裝置係具備將粒子射束加速之加速器,該加速器亦具備能量調整功能。然後在腫瘤內設定複數個照射位置(亦稱為光點(spot)),利用上述二個功能,對於各個照射位置依序照射粒子射束。預先調整並決定對各照射位置分別賦予之線量的均衡性,並藉由合計對各照射位置分別賦予之線量分布,而於最終形成目標分布。 One of the methods for forming a target distribution is a scanning irradiation method. In order to use such a method, it is first necessary to use a biasing mechanism that arbitrarily biases the particle beam in a direction perpendicular to the Z direction belonging to the traveling direction of the particle beam, that is, in the X and Y directions by an electromagnet or the like. . Furthermore, it is necessary to arbitrarily adjust the position at which the Bragg peak is formed in the Z direction by adjusting the particle energy. In general, a particle beam generation and transport device that performs particle beam transport and blockage includes an accelerator that accelerates a particle beam, and the accelerator also has an energy adjustment function. Then, a plurality of irradiation positions (also referred to as spots) are set in the tumor, and the particle beams are sequentially irradiated to the respective irradiation positions by the above two functions. The balance of the amount of the lines given to each of the irradiation positions is adjusted in advance, and the line distribution is given to each of the irradiation positions to form a target distribution.

就掃描照射法而言,在原理上能夠對腫瘤形成任意的線量分布。然而,在大多數的情況下,目標分布在腫瘤內線量須盡可能地均等,且在腫瘤外的線量須為盡可能比腫瘤內的線量低之分布。 In the case of the scanning irradiation method, it is possible in principle to form an arbitrary linear quantity distribution for the tumor. However, in most cases, the target distribution within the tumor must be as equal as possible, and the amount of line outside the tumor must be as low as possible within the tumor.

再者,在一般的粒子射線治療中,並不會將治療所需之線量一次照射完畢,大多是會分割成數次到數十次,經1週到2個月左右反覆進行照射。 Furthermore, in general particle beam therapy, the amount of thread required for treatment is not irradiated once, and it is often divided into several to several tens of times, and is irradiated repeatedly over a period of one week to two months.

(先前技術文獻) (previous technical literature) (專利文獻) (Patent Literature)

專利文獻1:日本專利第5555826號公報(第0015段、 第0035段至第0040段,第3圖) Patent Document 1: Japanese Patent No. 5555826 (paragraph 0015, Paragraph 0035 to 0040, Figure 3)

專利文獻2:日本專利第4936723號公報(第0008段至第0015段) Patent Document 2: Japanese Patent No. 4936723 (paragraphs 0008 to 0015)

非專利文獻1:T. Inaniwa, et al., “Development of treatment planning for scanning irradiation at HIMAC”, Nuclear Instruments and Methods in Physics Research B 266, 2194-2198 (2008) Non-Patent Document 1: T. Inaniwa, et al., "Development of treatment planning for scanning irradiation at HIMAC", Nuclear Instruments and Methods in Physics Research B 266, 2194-2198 (2008)

非專利文獻2:T. Akagi, et al., “The PTSim and TOPAS Projects, Bringing Geant4 to the Particle Therapy Clinic”, Progress in NUCLEAR SCIENCE and TECHNOLOGY, Vol. 2, pp. 912-917 (2011) Non-Patent Document 2: T. Akagi, et al., "The PTSim and TOPAS Projects, Bringing Geant 4 to the Particle Therapy Clinic", Progress in NUCLEAR SCIENCE and TECHNOLOGY, Vol. 2, pp. 912-917 (2011)

於掃描照射法中,在實際照射粒子射束時,由於會有各種不確定因素,故即便在計算上應能獲得目標分布,實際獲得之線量分布亦有可能不會成為目標分布。就不確定因素而言,係有粒子射束強度的時間變化、掃描電磁鐵的磁場的時間變化或磁滯(hysteresis)、線量監視器的靈敏度不均、控制機器的訊號延遲、雜訊等。由於該等影響,會有實際的線量分布成為與計算值不同之可能性。 In the scanning irradiation method, when the particle beam is actually irradiated, since there are various uncertain factors, even if the target distribution should be obtained in calculation, the actually obtained line quantity distribution may not become the target distribution. In terms of uncertainties, there are time variations of the beam intensity, temporal changes in the magnetic field of the scanning electromagnet or hysteresis, sensitivity of the line amount monitor, signal delay of the control machine, and noise. Due to these effects, there is a possibility that the actual line quantity distribution becomes different from the calculated value.

用以補償前述不確定因素造成之不確定性之方法之一例而言,例如,在照射中檢測出誤差產生時,考量針對因該誤差之影響所產生之線量的超過或不足,藉由在隔日以後修正照射線量分布,以使複數天的總和線量 分布接近目標線量分布。此時,正確且定量的估算照射中所產生之誤差對線量分布造成之影響乃至為重要。 An example of a method for compensating for the uncertainty caused by the aforementioned uncertainty factor, for example, when detecting an error in the illumination, considering the excess or deficiency of the amount of the line due to the influence of the error, by the next day Correct the distribution of the amount of illumination line in the future so that the sum of the lines of the number of days The distribution is close to the target line quantity distribution. At this point, it is even more important to accurately and quantitatively estimate the impact of the error produced in the illumination on the line size distribution.

專利文獻1中記載有進行患者特有之IMRT驗證之方法及裝置。專利文獻1之IMRT驗證方法係依據二維檢測器(二維線量檢測器)之回應,重新建構對應於射束之照射光子通量(fluence)(通過單位剖面之球之粒子數)的分布,並依據該重新建構之照射光子通量分布計算三維之線量分布之方法。然而,專利文獻1之計算線量分布之方法,係在要求三維線量計算之高精確度及高位置解析度時,二位檢測器之二維檢測的精確度及位置解析度亦必須隨之提高,而有二維檢測器的開發、製造、使用方法等變得困難之疑慮。 Patent Document 1 describes a method and apparatus for performing patient-specific IMRT verification. The IMRT verification method of Patent Document 1 reconstructs the distribution of the illuminance of the illuminating photon (the number of particles passing through the unit section) corresponding to the beam according to the response of the two-dimensional detector (two-dimensional linear detector). And calculating a three-dimensional line quantity distribution method according to the reconstructed illumination photon flux distribution. However, in the method of calculating the line quantity distribution in Patent Document 1, when the high accuracy and high position resolution of the three-dimensional line quantity calculation are required, the accuracy and position resolution of the two-dimensional detection of the two-position detector must also be improved. However, there are doubts about the development, manufacture, and use of two-dimensional detectors.

專利文獻2中記載有使用有限的資料量進行放射線治療系統的放射線量分布的計算之方法及裝置。在專利文獻2中,係決定表現放射線射束之射束品質指數,並使用依據射束品質指數而參數化之線量沉積和函數來求出放射線線量分布。在該方法中,係可將起因於每個裝置之偏差、特性、患者的腫瘤形狀、照射域形狀等所造成之線量計算之靜態不確定性予以排除。然而,專利文獻2之方法係難以補償動態不確定因素,例如粒子射束量的時間性變化、使掃描電磁鐵的電流值變化之控制電路的延遲、雜訊等。 Patent Document 2 describes a method and an apparatus for calculating a radiation amount distribution of a radiation therapy system using a limited amount of data. In Patent Document 2, it is determined that the beam quality index of the radiation beam is expressed, and the radiation amount distribution is obtained using a line amount deposition function that is parameterized in accordance with the beam quality index. In this method, the static uncertainty of the calculation of the amount of the line caused by the deviation of each device, the characteristics, the shape of the tumor of the patient, the shape of the irradiation field, and the like can be excluded. However, the method of Patent Document 2 is difficult to compensate for dynamic uncertainties such as temporal changes in the amount of particle beam, delay of the control circuit for changing the current value of the scanning electromagnet, noise, and the like.

因此,本發明之目的係在於無須具有高位置解析度之線量檢測器,且可正確且定量地估算靜態及動 態的不確定性兩者對線量分布賦予之影響,進而補償該兩種不確定性。 Therefore, the object of the present invention is to provide a linear quantity detector without high position resolution, and to accurately and quantitatively estimate static and dynamic The uncertainty of the state imposes an influence on the distribution of the linear quantity, thereby compensating for the two uncertainties.

本發明之粒子射線治療裝置係將粒子射線治療所需之線量分割成複數次而對照射對象賦予之粒子射線治療裝置,係包括:粒子射束產生裝置,係產生粒子射線治療所需之能量之粒子射束;掃描裝置,係使粒子射束朝向相對於射束行進方向垂直之2方向偏向,並於照射對象之配置位置掃描粒子射束;射束輸送裝置,係將粒子射束輸送至掃描裝置;測量裝置,係測量由粒子射束產生裝置所產生之粒子射束的粒子射束資訊;線量分布演算裝置,係演算藉由粒子射束而賦予至照射對象之照射線量分布,以及照射線量分布與目標線量分布之差異之線量分布差異;粒子射束資訊係包含粒子射束之射束量、能量、以及射束中心軸位置。線量分布演算裝置係包括:射束資訊記憶部,係記憶由測量裝置所測量之測量粒子射束資訊;合計線量演算部,係依據測量粒子射束資訊,演算照射線量分布;以及計畫線量比較部,係演算線量分布差異;射束資訊記憶部係包含:測量能量記憶部,係將在複數個時刻測量粒子射束的能量所得之測量能量予以記憶;測量射束中心軸記憶部,係將在複數個時刻測量粒子射束的射束中心軸位置所得之測量射束中心軸位置予以記憶;以及測量射束量記憶部,係將在複數個時刻測量粒子射束的射束量所得之測量射束量予以記憶;合計線量演算部係藉由在全部的時 間區間將照射粒子數與單位粒子線量相乘之時間區間線量予以加總,而演算照射對象的演算對象點之線量,其中,該照射粒子數係依據粒子射束資訊被測量之時間區間的相同區間中之測量能量及測量射束量而求得者,該單位粒子射線量為依據在時間區間的相同區間中之測量能量及測量射束中心軸位置而求得之由粒子射束中之一個粒子所賦予之線量;該粒子射線治療裝置係在第2次以後之治療照射中,係依據由治療計畫裝置所演算之包含將線量分布差異予以修正之修正射束量之控制資料而進行控制。 The particle beam therapy apparatus according to the present invention is a particle beam therapy apparatus that divides a line amount required for particle beam therapy into a plurality of times and applies to an irradiation target, and includes a particle beam generating device that generates energy required for particle beam therapy. a particle beam; the scanning device deflects the particle beam in two directions perpendicular to the direction in which the beam travels, and scans the particle beam at the position where the object is irradiated; the beam transport device transports the particle beam to the scan a measuring device that measures particle beam information of a particle beam generated by a particle beam generating device; a linear amount distribution calculating device that calculates a distribution of an amount of illumination applied to an object to be irradiated by a particle beam, and an amount of illumination line The difference in the distribution of the line quantity between the distribution and the target line quantity distribution; the particle beam information includes the beam amount of the particle beam, the energy, and the position of the beam center axis. The line quantity distribution calculation device includes: a beam information memory unit that memorizes the measured particle beam information measured by the measuring device; and a total line quantity calculation unit that calculates the illumination line quantity distribution according to the measured particle beam information; and the calculation of the line quantity comparison Department, the calculation of the difference in the amount of line calculation; the beam information memory department includes: the measurement energy memory unit, which measures the measured energy obtained by measuring the energy of the particle beam at a plurality of times; the measurement of the central axis of the beam is performed. The position of the central axis of the measurement beam obtained by measuring the position of the central axis of the beam of the particle beam at a plurality of times is memorized; and the measurement of the amount of beam of the beam is measured by measuring the beam amount of the particle beam at a plurality of times. The amount of beam is memorized; the total line amount calculation is performed at all times The inter-section sums the amount of the time interval in which the number of the irradiated particles is multiplied by the unit particle amount, and calculates the line amount of the calculation target point of the irradiation target, wherein the number of the irradiated particles is the same as the time interval in which the particle beam information is measured. Obtaining the measured energy in the interval and measuring the beam amount, the unit particle beam amount being one of the particle beams obtained by measuring the measured energy in the same interval of the time interval and measuring the central axis position of the beam. The amount of the line given by the particle; the particle beam therapy device is controlled in the second and subsequent therapeutic irradiation according to the control data calculated by the treatment planning device and including the corrected beam amount for correcting the difference in the line quantity distribution. .

本發明之粒子射線治療裝置係依據測量粒子射束資訊演算照射線量分布及線量分布差異,並於第2次以後之治療照射,依據治療計畫裝置所演算之包含修正線量分布差異之修正射束量之控制資料進行控制,故無需具有高位置解析度之線量檢測器,且可將靜態及動態的不確定性之兩者予以補償。 The particle beam therapy device of the present invention calculates the illumination line quantity distribution and the line quantity distribution difference according to the measurement particle beam information, and the treatment beam after the second and subsequent treatments, according to the correction beam containing the difference of the correction line quantity distribution calculated by the treatment planning device The amount of control data is controlled so that a line detector with high position resolution is not required and both static and dynamic uncertainties can be compensated.

1‧‧‧射束產生裝置 1‧‧‧beam generating device

2‧‧‧射束輸送裝置 2‧‧‧beam conveyor

3‧‧‧掃描裝置 3‧‧‧Scanning device

4‧‧‧x方向掃描電磁鐵 4‧‧‧x direction scanning electromagnet

5‧‧‧y方向掃描電磁鐵 5‧‧‧y direction scanning electromagnet

6‧‧‧射束能量測量裝置 6‧‧‧beam energy measuring device

7‧‧‧線量測量裝置 7‧‧‧Wire measuring device

8‧‧‧射束偏向資訊測量裝置 8‧‧‧beam deflection information measuring device

10‧‧‧線量分布演算裝置 10‧‧‧Wire quantity distribution calculation device

11‧‧‧資料庫 11‧‧‧Database

12‧‧‧測量電荷記憶部(測量射束量記憶部) 12‧‧‧Measured charge memory (measured beam amount memory)

13‧‧‧測量射束中心軸記憶部 13‧‧‧Measurement beam central axis memory

14‧‧‧測量能量記憶部 14‧‧‧Measurement Energy Memory Department

15‧‧‧合計線量演算部 15‧‧ ‧ Total Line Calculation Department

16‧‧‧計畫線量比較部 16‧‧‧Development Line Comparison Department

20‧‧‧粒子射束 20‧‧‧Particle beam

21‧‧‧假體 21‧‧‧Prosthesis

22‧‧‧治療計畫裝置 22‧‧‧Treatment planning device

25‧‧‧合計線量分布 25‧‧ ‧ Total line distribution

26‧‧‧線量分布 26‧‧‧Line distribution

27‧‧‧線量分布 27‧‧‧Line volume distribution

28‧‧‧線量分布 28‧‧‧Line volume distribution

29‧‧‧線量分布 29‧‧‧Line volume distribution

35‧‧‧測量值記憶資訊 35‧‧‧Measured value memory information

36‧‧‧資料庫資訊 36‧‧‧Database Information

37‧‧‧測量值資訊 37‧‧‧Measured value information

38‧‧‧演算結果資訊 38‧‧‧ Calculation results information

41‧‧‧線量分布 41‧‧‧Line volume distribution

42‧‧‧線量分布 42‧‧‧Line volume distribution

43‧‧‧線量分布 43‧‧‧Line volume distribution

50‧‧‧粒子射線治療裝置 50‧‧‧Particle ray therapy device

98‧‧‧處理器 98‧‧‧ Processor

99‧‧‧記憶體 99‧‧‧ memory

pi‧‧‧線量評估點(演算對象點) Pi‧‧‧Quantity evaluation point (calculation point)

E‧‧‧能量 E‧‧‧Energy

E(t)‧‧‧測量能量 E(t)‧‧‧Measure energy

Q、Q(t)‧‧‧測量電荷數(測量射束量) Q, Q(t)‧‧‧Measure the number of charges (measured beam amount)

Px、Py、Px(t)、Py(t)‧‧‧測量射束中心軸位置 Px, Py, Px(t), Py(t)‧‧‧Measure beam center axis position

C(E)‧‧‧比例係數 C(E)‧‧‧ scale factor

di,k‧‧‧線量(單位粒子線量)或線量分布 d i,k ‧‧‧Line quantity (unit particle amount) or line quantity distribution

wk‧‧‧粒子數(照射粒子數) w k ‧‧‧Number of particles (number of irradiated particles)

Di‧‧‧合計線量或合計線量分布(照射線量分布) D i ‧‧‧ Total line quantity or total line quantity distribution (irradiation line quantity distribution)

△Di‧‧‧線量分布差異 △D i ‧‧‧Distribution of line quantity

Dobj i‧‧‧目標線量分布 D obj i ‧‧‧target line quantity distribution

Qc j‧‧‧修正總電荷數(修正射束量) Q c j ‧‧‧correct total charge number (corrected beam amount)

Qk‧‧‧總電荷數 Q k ‧‧‧ total charge number

dz‧‧‧z方向的線量(選擇z方向線量) d z ‧‧‧z direction line quantity (select z-direction line quantity)

dx‧‧‧x方向的線量(選擇x方向線量) d x ‧‧‧x direction line quantity (select x direction line quantity)

dy‧‧‧y方向的線量(選擇y方向線量) d y ‧ ‧ y direction line amount (select y direction line amount)

dz(z,E)‧‧‧z方向的線量或線量分布(z方向線量分布) Line quantity or line quantity distribution in the z z (z, E) ‧ ‧ z direction (z direction line quantity distribution)

dx(x,z,E)‧‧‧x方向的線量或線量分布(x方向線量分布) dose or dose d x (x, z, E ) ‧‧‧x distribution in the direction (x-direction dose distribution)

dy(y,z,E)‧‧‧y方向的線量或線量分布(z方向線量分布) d y (y, z, E) ‧ ‧ y direction line quantity or line quantity distribution (z direction line quantity distribution)

θ x‧‧‧x方向的偏向角(選擇x方向偏向角) Deflection angle in the direction of θ x‧‧‧x (select the x-direction deflection angle)

θ y‧‧‧y方向的偏向角(選擇y方向偏向角) Deflection angle in the direction of θ y‧‧‧y (select the y-direction deflection angle)

θ x(B,E)‧‧‧x方向的偏向角 θ x (B, E) ‧ ‧ x direction deflection angle

θ y(B,E)‧‧‧y方向的偏向角 θ y (B, E) ‧ ‧ y direction of the deflection angle

sp1至sp4‧‧‧光點 Sp1 to sp4‧‧‧ light spots

p1至p13‧‧‧線量評估點 P1 to p13‧‧‧ line quantity assessment point

第1圖係依據本發明之實施形態1之粒子射線治療裝置的概略構成圖。 Fig. 1 is a schematic configuration diagram of a particle beam therapy system according to a first embodiment of the present invention.

第2圖係顯示第1圖之線量分布演算裝置的構成之圖。 Fig. 2 is a view showing the configuration of the line amount distribution calculation device of Fig. 1.

第3圖係顯示實現第2圖的功能方塊之硬體構成之圖。 Fig. 3 is a view showing the hardware configuration of the functional blocks for realizing Fig. 2.

第4圖係顯示輸入於第1圖之線量分布演算裝置之資料構造之例之圖。 Fig. 4 is a view showing an example of a data structure of the linear amount distribution calculating device input to Fig. 1.

第5圖係說明依據本發明實施形態1之粒子射線治療中之合計線量分布與線量評估點之例之圖。 Fig. 5 is a view showing an example of the total line amount distribution and the line amount evaluation point in the particle beam therapy according to the first embodiment of the present invention.

第6圖係說明依據本發明實施形態1之粒子射線治療的流程之圖。 Fig. 6 is a view showing the flow of particle beam therapy according to the first embodiment of the present invention.

第7圖係說明依據本發明實施形態1之粒子射線治療的流程之圖。 Fig. 7 is a view showing the flow of particle beam therapy according to the first embodiment of the present invention.

第8圖係顯示依據本發明實施形態1之線量分布之修正例之圖。 Fig. 8 is a view showing a modified example of the line amount distribution according to the first embodiment of the present invention.

實施形態1. Embodiment 1.

第1圖係依據本發明實施形態1之粒子射線治療裝置的概略構成圖。第2圖係顯示第1圖之線量分布演算裝置的構成之圖,第3圖係顯示實現第2圖之功能方塊之硬體構成之圖。第4圖係顯示輸入至第1圖之線量分布演算裝置之資料構造之例之圖,第5圖係說明依據本發明實施形態1之粒子射線治療中之合計線量分布與線量評估點之例之圖。第6、7圖係說明依據本發明實施形態1之粒子射線治療的流程之圖。第8圖係顯示依據本發明實施形態1之線量分布之修正例之圖。一般而言,實施粒子射線掃描照射之粒子射線治療裝置50係具備粒子射束產生裝置1、射束輸送裝置2、及掃描裝置3。該射束產生裝置1係產生治療所需之能量之粒子射束20。該射束輸送裝置2係將粒子 射束20輸送至具備掃描裝置3之粒子射線照射裝置。該掃描裝置3係使粒子射束20朝向相對於屬於射束行進方向之z方向為垂直之2方向,亦即x方向及y方向偏向,而於患者位置能夠掃描粒子射束20。 Fig. 1 is a schematic configuration diagram of a particle beam therapy apparatus according to a first embodiment of the present invention. Fig. 2 is a view showing a configuration of a line amount distribution calculation device of Fig. 1, and Fig. 3 is a view showing a hardware configuration for realizing a function block of Fig. 2. Fig. 4 is a view showing an example of a data structure of the linear amount distribution calculating device input to Fig. 1, and Fig. 5 is a view showing an example of a total line amount distribution and a line amount evaluation point in the particle beam therapy according to the first embodiment of the present invention. Figure. Fig. 6 and Fig. 7 are views showing the flow of the particle beam therapy according to the first embodiment of the present invention. Fig. 8 is a view showing a modified example of the line amount distribution according to the first embodiment of the present invention. In general, the particle beam therapy apparatus 50 that performs particle beam scanning irradiation includes a particle beam generating device 1, a beam transport device 2, and a scanning device 3. The beam generating device 1 is a particle beam 20 that produces the energy required for treatment. The beam transport device 2 is a particle The beam 20 is sent to a particle beam irradiation apparatus including the scanning device 3. In the scanning device 3, the particle beam 20 is oriented in two directions perpendicular to the z direction belonging to the beam traveling direction, that is, in the x direction and the y direction, and the particle beam 20 can be scanned at the patient position.

掃描裝置3係具備使粒子射束20朝向x方向偏向之x方向掃描電磁鐵4,及使粒子射束20朝向y方向偏向之y方向掃描電磁鐵5。粒子射線治療裝置50係具備控制部(未圖示)、線量測量裝置7及位置監視器(未圖示)。該控制部係控制粒子射束產生裝置1所進行之粒子射束20的出射開始及遮斷,以及掃描裝置3所進行之粒子射束20的掃瞄。該線量測量裝置7係測量由掃描裝置3所掃描之粒子射束20照射至治療對象(患者)的各照射部位之線量值。該位置監視器係檢測用以演算由x方向掃描電磁鐵4及y方向掃描電磁鐵5所掃描之粒子射束20通過之射束之通過位置(重心位置)及尺寸之射束資訊。治療對象(患者)係照射粒子射束20之照射對象。 The scanning device 3 includes the scanning electromagnet 4 in the x direction in which the particle beam 20 is deflected in the x direction, and the scanning electromagnet 5 in the y direction in which the particle beam 20 is deflected in the y direction. The particle beam therapy system 50 includes a control unit (not shown), a line amount measuring device 7, and a position monitor (not shown). The control unit controls the start and stop of the emission of the particle beam 20 by the particle beam generator 1 and the scanning of the particle beam 20 by the scanner device 3. The line amount measuring device 7 measures the line amount of each of the irradiation portions of the treatment target (patient) irradiated by the particle beam 20 scanned by the scanning device 3. The position monitor detects beam information for calculating the passing position (center of gravity position) and size of the beam through which the particle beam 20 scanned by the x-direction scanning electromagnet 4 and the y-direction scanning electromagnet 5 passes. The treatment target (patient) is an object to be irradiated that irradiates the particle beam 20.

為了排除在實際照射粒子射束20時的不確定因素,在規劃好粒子射線治療的計畫之後且在實際將粒子射束20照射於患者之前,一般而言係進行以與治療計畫盡可能相同之條件對假體(phantom;患者代替物)21實施粒子射束照射,測量線量絕對值(絕對線量值)及線量分布,並確認是否符合治療計畫之作業。該作業稱為患者QA(Quality Assurance,品質保證)。假體21大多使用注入水槽之水,並使用設置於水中之線量測量裝置來測量線量。 In order to eliminate the uncertainties in actually illuminating the particle beam 20, after planning the particle beam therapy plan and before actually irradiating the particle beam 20 to the patient, it is generally carried out with the treatment plan as much as possible Under the same conditions, the phantom (patient substitute) 21 is subjected to particle beam irradiation, and the absolute value (absolute line value) and the line amount distribution of the linear amount are measured, and it is confirmed whether or not the treatment plan is satisfied. This operation is called Patient QA (Quality Assurance). The prosthesis 21 mostly uses water poured into a water tank, and measures the amount of thread using a line amount measuring device provided in water.

在執行患者QA時,如第1圖所示,將假體21配置於治療時固定患者之位置。在執行患者QA時之粒子射線治療裝置50係包括粒子射束產生裝置1、射束輸送裝置2、掃描裝置3、射束能量測量裝置6、線量測量裝置7、射束偏向資訊測量裝置8及線量分布演算裝置10。在治療時,將位置監視器(未圖示)配置於掃描裝置3與線量測量裝置7之間,並將患者固定於假體21的位置。射束能量測量裝置6係測量粒子射束20之粒子的能量。射束能量測量裝置6係例如為薄膜閃爍(scintillation)檢測器等。在執行患者QA及治療時的線量測量裝置7係例如為游離腔,測量由粒子射束20所產生之游離離子的電荷數(單位電荷之計數值)。游離離子的電荷數與粒子射束20的射束量為1對1對應。 When the patient QA is executed, as shown in Fig. 1, the prosthesis 21 is placed at a position where the patient is fixed at the time of treatment. The particle beam therapy apparatus 50 when performing the patient QA includes a particle beam generating device 1, a beam delivery device 2, a scanning device 3, a beam energy measuring device 6, a line amount measuring device 7, a beam deflection information measuring device 8, and The line amount distribution calculation device 10. At the time of treatment, a position monitor (not shown) is disposed between the scanning device 3 and the linear amount measuring device 7, and the patient is fixed at the position of the prosthesis 21. The beam energy measuring device 6 measures the energy of the particles of the particle beam 20. The beam energy measuring device 6 is, for example, a thin film scintillation detector or the like. The line amount measuring device 7 at the time of performing the patient QA and the treatment is, for example, an free cavity, and measures the number of charges (counting value of the unit charge) of the free ions generated by the particle beam 20. The number of charges of the free ions corresponds to the beam amount of the particle beam 20 in a one-to-one correspondence.

射束偏向資訊測量裝置8係測量由x方向掃描電磁鐵4及y方向掃描電磁鐵5所形成之射束中心軸的位置x、y。具體而言,射束偏向資訊測量裝置8係依據掃描裝置3在粒子射束20的行進路線上產生之磁場強度B進行演算,而測量屬於射束中心軸的位置之射束中心軸位置x、y。射束中心軸位置x係x方向之位置,射束中心軸位置y係y方向之位置。線量分布演算裝置10係依據由射束能量測量裝置6在複數個時刻,例如以預定的時間間隔△t測量之測量能量E(t),由線量測量裝置7在複數個時刻測量之測量電荷數Q(t)(測量射束量),以及由射束偏向資訊測量裝置8在複數個時刻測量之測量射束中心軸位置 Px(t)、Py(t),而演算線量分布。粒子射束20的能量E、測量射束量(測量電荷數Q)及測量射束中心軸位置Px、Py係粒子射束20的粒子射束資訊。測量能量E(t)、測量射束量(測量電荷數Q(t))及測量射束中心軸位置Px(t)、Py(t)係測量粒子射束資訊。 The beam deflection information measuring device 8 measures the positions x and y of the beam central axes formed by the x-direction scanning electromagnet 4 and the y-direction scanning electromagnet 5. Specifically, the beam deflection information measuring device 8 performs calculation based on the magnetic field strength B generated by the scanning device 3 on the traveling path of the particle beam 20, and measures the beam central axis position x at a position belonging to the central axis of the beam, y. The beam center axis position x is the position in the x direction, and the beam center axis position y is the position in the y direction. The line amount distribution calculating device 10 measures the number of measured charges measured by the line amount measuring device 7 at a plurality of times in accordance with the measured energy E(t) measured by the beam energy measuring device 6 at a plurality of times, for example, at a predetermined time interval Δt. Q(t) (measurement beam amount), and the measurement beam center axis position measured by the beam deflection information measuring device 8 at a plurality of times Px(t), Py(t), and calculate the line quantity distribution. The energy E of the particle beam 20, the measured beam amount (measured charge number Q), and the measured beam center axis position Px, Py are particle beam information of the particle beam 20. The measured energy E(t), the measured beam amount (measured charge number Q(t)), and the measured beam central axis position Px(t), Py(t) are measured by particle beam information.

線量分布演算裝置10係包括資料庫(data base)11、測量電荷記憶部12、測量射束中心軸記憶部13、測量能量記憶部14、合計線量演算部15以及計畫線量比較部16。該資料庫11係記憶於第6圖之資料庫資訊36記載之5個資訊。該測量電荷記憶部12係記憶測量電荷數Q(t)。該測量射束中心軸記憶部13係記憶測量射束中心軸位置Px(t)、Py(t)。該測量能量記憶部14係記憶測量能量E(t)。合計線量演算部15、計畫線量比較部16係藉由處理器98執行記憶於記憶體99之程式而實現。再者,亦可由複數個處理器98及複數個記憶體99協同作業而執行上述功能。線量分布演算裝置10的詳細內容係於後述。 The linear amount distribution calculation device 10 includes a data base 11, a measurement charge storage unit 12, a measurement beam central axis storage unit 13, a measurement energy storage unit 14, a total line amount calculation unit 15, and a plan line amount comparison unit 16. The database 11 is stored in the five pieces of information described in the database information 36 of FIG. The measured charge storage unit 12 memorizes the measured charge number Q(t). The measurement beam central axis memory unit 13 memorizes the measurement beam central axis positions Px(t) and Py(t). The measurement energy storage unit 14 memorizes the measured energy E(t). The total line amount calculation unit 15 and the plan line amount comparison unit 16 are realized by the processor 98 executing a program stored in the memory 99. Furthermore, the above functions may be performed by a plurality of processors 98 and a plurality of memories 99 operating in cooperation. The details of the linear amount distribution calculation device 10 will be described later.

首先,針對藉由掃描照射對腫瘤體積(腫瘤區域)賦予之合計線量進行說明。掃描照射中係於腫瘤體積(腫瘤區域)內設定複數個光點(spot),藉由對各光點照射適當量之粒子射束20,而例如第5圖所示形成所期望的合計線量分布25。將光點編號設為j,將假體21內的線量評估點編號設為i,將在第j個光點照射1個粒子時賦予第i個線量評估點pi之線量設為di,j,將賦予第j個光點之粒子數設為wj,並將光點的總數設為n時,對全部光點進行完 照射時之賦予第i個線量評估點pi之合計線量Di係能夠以式(1)表示。 First, the total amount of lines given to the tumor volume (tumor area) by scanning irradiation will be described. In the scanning irradiation, a plurality of spots are set in the tumor volume (tumor region), and by irradiating each spot with an appropriate amount of the particle beam 20, for example, the desired total line amount distribution is formed as shown in FIG. 25. The spot number is set to j, the line amount evaluation point number in the prosthesis 21 is set to i, and the line amount given to the i-th line quantity evaluation point pi when the j-th spot is irradiated with one particle is set to d i,j When the number of particles to the jth spot is set to w j and the total number of spots is n, the total line amount D i given to the i-th line amount evaluation point pi when all the spots are irradiated is It can be represented by the formula (1).

為了使該各線量評估點pi之合計線量Di盡可能接近作為目標之線量分布(目標線量分布)Dobj i,需要有在照射前算出對最佳的賦予光點之粒子數wj之步驟。該步驟稱為治療計畫。將粒子數wj適當的稱為光點粒子數wjIn order to make the total line amount D i of the respective line amount evaluation points pi as close as possible to the target line amount distribution (target line amount distribution) D obj i , it is necessary to calculate the number of particles that are optimally given to the light spot w j before the irradiation. . This step is called a treatment plan. The number of particles w j is appropriately referred to as the number of spot particles w j .

第5圖係治療計畫所進行之決定光點的數量及位置以及光點粒子數wj之一例。第5圖的縱軸為線量,橫軸為z方向之位置。在第5圖中,為了簡便係顯示光點配置及線量分布之z軸(射束行進方向)方向之一維度之例。於第5圖中,顯示4個光點sp1、sp2、sp3、sp4,及13個線量評估點p1、p2、p3、p4、p5、p6、p7、p8、p9、p10、p11、p12、p13。線量分布26係依據照射於光點sp1之光點粒子數而得之線量分布。同樣地,線量分布27、28、29係分別為依據照射於光點sp2、sp3、sp4之光點粒子數而得之線量分布。合計線量分布25係將線量分布26、27、28、29加總而得之線量分布。腫瘤內之線量評估點係線量評估點p3至p10,計有8個。腫瘤外之線量評估點係線量評估點p1、p2、p11至p13,計有5個。 FIG 5 based on the number and position of the light spot, and one case of w j of the number of particles for the treatment decision program spot. In the fifth diagram, the vertical axis represents the line amount, and the horizontal axis represents the position in the z direction. In Fig. 5, an example of one of the z-axis (beam traveling direction) directions of the spot arrangement and the line amount distribution is shown for the sake of simplicity. In Fig. 5, four spots sp1, sp2, sp3, sp4, and 13 line quantity evaluation points p1, p2, p3, p4, p5, p6, p7, p8, p9, p10, p11, p12, p13 are shown. . The line amount distribution 26 is a line amount distribution obtained based on the number of spot particles irradiated to the spot sp1. Similarly, the linear quantity distributions 27, 28, and 29 are linear quantity distributions according to the number of light spot particles irradiated on the light spots sp2, sp3, and sp4, respectively. The total line quantity distribution 25 is a line quantity distribution in which the line quantity distributions 26, 27, 28, and 29 are added together. There are 8 evaluation points for the line quantity evaluation points in the tumor, p3 to p10. There are 5 counts of the line evaluation points p1, p2, p11 to p13 of the line evaluation points outside the tumor.

如第5圖所示,藉由適當決定賦予光點sp1 至sp4之粒子數wj,可使合計線量分布25在腫瘤內較高,而在腫瘤外較低。在第5圖中,光點數為4個,線量評估點為13個,惟一般而言係配合腫瘤的尺寸而以更短的間隔配置更多光點及線量評估點。再者,第5圖為了簡便而僅以z軸方向之一維度顯示光點配置及線量分布,惟實際上,配合腫瘤形狀,光點係配置成亦包含x軸方向及y軸方向之三維。配合實際的腫瘤形狀,線量分布亦必須以三維進行計算,故線量評估點亦配置成三維。 As shown in Fig. 5, by appropriately determining the number of particles w j imparted to the spots sp1 to sp4, the total line amount distribution 25 can be made higher in the tumor and lower in the outside of the tumor. In Fig. 5, the number of spots is four, and the number of line evaluation points is 13. However, in general, more spots and line evaluation points are arranged at shorter intervals in accordance with the size of the tumor. Further, in the fifth drawing, the spot arrangement and the line amount distribution are displayed only in one dimension in the z-axis direction for the sake of simplicity, but actually, the spot pattern is arranged so as to include three-dimensional directions in the x-axis direction and the y-axis direction in accordance with the shape of the tumor. In line with the actual tumor shape, the line quantity distribution must also be calculated in three dimensions, so the line quantity evaluation point is also configured in three dimensions.

一般而言,屬於與射束行進方向(z方向)垂直之方向之x方向、y方向之光點位置,係取決於射束偏向角,射束偏向角係依存並取決於掃描裝置3所形成之磁場強度。再者,屬於射束行進方向之z軸方向的光點位置係依存並取決於粒子射束20的射束能量。因此,粒子射線治療裝置50係藉由調整粒子射束20的射束能量及掃描裝置3的磁場強度,而調整光點位置。 In general, the position of the light spot in the x direction and the y direction which are perpendicular to the beam traveling direction (z direction) depends on the beam deflection angle, and the beam deflection angle depends on the scanning device 3 The strength of the magnetic field. Furthermore, the position of the spot in the z-axis direction belonging to the direction of travel of the beam depends on and depends on the beam energy of the particle beam 20. Therefore, the particle beam therapy apparatus 50 adjusts the position of the light spot by adjusting the beam energy of the particle beam 20 and the magnetic field intensity of the scanning device 3.

在式(1)中,藉由將每個光點的線量分布予以合計,而求出第i個線評估點pi之合計線量分布。對於相同對象,粒子射束20之照射結束後之線量分布,亦可按每個時間予以合計,與式(1)同樣地,能以式(2)之方式進行計算。 In the formula (1), the total line quantity distribution of the i-th line evaluation point pi is obtained by summing the line quantity distribution of each light spot. For the same object, the line amount distribution after completion of the irradiation of the particle beam 20 can be totaled for each time, and can be calculated in the same manner as in the formula (1) by the formula (2).

於此,式(2)係將全照射時間分為m個時間區間之情形。k係時間區間的編號。在第i個線量評估點pi中,將於第k個時間區間照射之粒子數設定義為wk,將1個粒子射束照射於在第k個時間區間停留之射束的平均位置時賦予第i個線量評估點pi之線量(單位粒子射線量)定義為di,k。只要使時間間隔充分地短,該式(2)即能以高精確度再現線量分布。於此,時間間隔較佳為與每1個光點所需之時間相同或更短,例如考量為數十微秒至1毫秒左右為佳。將相同時間區間之粒子數wk與單位粒子射線量di,k相乘之wkdi,k為時間區間線量。 Here, the formula (2) is a case where the total irradiation time is divided into m time intervals. k is the number of the time interval. In the i-th line quantity evaluation point pi, the number of particles to be irradiated in the k-th time interval is defined as w k , and one particle beam is irradiated to the average position of the beam staying in the k-th time interval. The line amount (unit particle ray amount) of the i-th line quantity evaluation point pi is defined as d i,k . As long as the time interval is sufficiently short, the equation (2) can reproduce the line amount distribution with high accuracy. Here, the time interval is preferably the same as or shorter than the time required for each light spot, and it is preferably, for example, about several tens of microseconds to about 1 millisecond. The number of particles w k in the same time interval is multiplied by the unit particle ray amount d i,k by w k d i,k as the time interval line quantity.

在某個時間區間照射之粒子數wk係可例如藉由游離腔之線量測量裝置7進行測量。一般之游離腔係藉由粒子射束20通過而發出電訊號之機器,在通過之粒子射束20的粒子個數與所發出之游離離子的電荷數(單位電荷的計數值)之間係有比例關係。據此,將在某個時間區間的開始至結束為止所發出總電荷數設為Qk,將總電荷數Qk與粒子射束20之粒子數wk之比例係數設為C(E)時,能以式(3)之方式求出粒子數wk。總電荷數Qk係表示射束量,故比例係數C(E)亦可稱為相對於射束量之粒子數wk之比。另外,適當將粒子數wk稱為照射粒子數wkThe number of particles w k irradiated in a certain time interval can be measured, for example, by the line amount measuring device 7 of the free chamber. Generally, a free cavity is a machine that emits an electric signal by passing a particle beam 20, and is connected between the number of particles passing through the particle beam 20 and the number of charges of the emitted free ions (count value of the unit charge). ratio. Accordingly, the total number of charges emitted from the beginning to the end of a certain time interval is Q k , and the ratio coefficient between the total charge number Q k and the particle number w k of the particle beam 20 is C (E). The number of particles w k can be obtained by the equation (3). The total charge number Q k represents the beam amount, so the proportional coefficient C(E) can also be referred to as the ratio of the number of particles w k to the beam amount. Further, the number of particles w k is appropriately referred to as the number of irradiated particles w k .

[數3]數3 wk=C(E)Qk‧‧‧(3) [Number 3] Number 3 w k = C (E) Q k ‧‧‧ (3)

於此,E為粒子射束20之粒子的能量。一般而言,比例係數係有能量依存性,比例係數係成為包含粒子射束20中之粒子的能量E之表示式。 Here, E is the energy of the particles of the particle beam 20. In general, the proportional coefficient is energy dependent, and the proportional coefficient is an expression of the energy E including the particles in the particle beam 20.

比例係數C(E)係必須在進行治療前事先取得。就取得方法之一例而言,係準備總電荷數Qkr與粒子數wkr之比例係數為已知之參考用游離腔,以及治療時實際使用之治療用游離腔,藉由測量值的比較而求出比例係數C(E)。具體而言,將參照用游離腔配置於治療用游離腔的下游側,藉由照射適當量之固定能量E之粒子射束20,依據由治療用游離腔的輸出而得之粒子數wk及從參考游離腔的輸出求得之粒子數wkr之比,可求出相對於該能量之比例係數C(E)。藉由改變能量E而實施相同的測量,可得知相對於任意的能量E之比例係數(E)。 The proportionality factor C(E) must be obtained beforehand for treatment. In one example of the acquisition method, the ratio of the total charge number Q kr to the number of particles w kr is known as the reference free cavity, and the therapeutic free cavity actually used during the treatment is obtained by comparing the measured values. The scale factor C(E) is derived. Specifically, the reference free cavity is disposed on the downstream side of the therapeutic free cavity, and by irradiating an appropriate amount of the fixed energy E of the particle beam 20, the number of particles obtained by the output of the therapeutic free cavity w k and The ratio coefficient C(E) with respect to the energy can be obtained from the ratio of the number of particles w kr obtained by referring to the output of the free cavity. By performing the same measurement by changing the energy E, the proportionality coefficient (E) with respect to the arbitrary energy E can be known.

理想為對於在治療有可能使用到之全部的能量E,進行參考用游離腔及治療用游離腔之測量,取得C(E)並作為資料庫而予以記憶。然而,為了省略測量的手續,亦考量僅對若干個能量E進行測量,並將其間隔線性內插而獲得比例係數C(E)的函數之方法。此時,必須充分驗證並掌握使用內插而獲得之近似精確度。 It is desirable to measure the total energy E that is likely to be used in the treatment, and to measure the free cavity and the therapeutic free cavity to obtain C(E) and store it as a database. However, in order to omit the measurement procedure, a method of measuring only a plurality of energies E and linearly interpolating the intervals to obtain a function of the proportional coefficient C(E) is also considered. At this point, the approximate accuracy obtained using interpolation must be fully verified and mastered.

粒子射束20之粒子的能量E係可藉由使用薄膜閃爍檢測器等射束能量測量裝置6而進行測量。就射 束能量測量裝置6的其他例而言,在從粒子射束產生裝置1將射束輸送至患者或假體21為止之路徑中存在有曲線部分之情形時,係考量有使用配置於射束路徑的曲線部分之偏向電磁鐵的磁場之方法。具體而言,可依據配置於射束路徑的曲線部分之偏向電磁鐵所產生之磁場強度與射束路徑的曲率半徑之關係而求出射束能量。 The energy E of the particles of the particle beam 20 can be measured by using a beam energy measuring device 6 such as a thin film scintillation detector. Shooting In another example of the beam energy measuring device 6, when there is a curved portion in the path from the particle beam generating device 1 to the patient or the prosthesis 21, it is considered to be used in the beam path. The method of biasing the magnetic field of the electromagnet. Specifically, the beam energy can be obtained from the relationship between the intensity of the magnetic field generated by the electromagnet and the radius of curvature of the beam path, which are arranged on the curved portion of the beam path.

在式(2)之線量評估點為三維時,線量di,k係可以下述方式求出。已知三維線量分布d(x,y,z)係能夠以z方向的線量分布與x方向的線量分布及y方向的線量分布之積來近似。在Inaniwa等人的論文(非專利文獻1)中,係介紹有以式(4)之方式將相對於1條光束之三維線量分布d(x,y,z)予以因式分解成z方向與x方向及y方向之各者的分布之方法。 When the line amount evaluation point of the formula (2) is three-dimensional, the line quantity d i,k can be obtained in the following manner. It is known that the three-dimensional linear quantity distribution d(x, y, z) can be approximated by the product of the linear quantity distribution in the z direction and the linear quantity distribution in the x direction and the linear quantity distribution in the y direction. In the paper by Inaniwa et al. (Non-Patent Document 1), it is introduced that the three-dimensional linear quantity distribution d(x, y, z) with respect to one light beam is factorized into the z direction in the manner of the formula (4). A method of distributing each of the x direction and the y direction.

[數4]數4 d(x,y,z)=dz(z,E)×dx(x-x0,z,E)×dy(y-y0,z,E)‧‧‧(4) [Number 4] number 4 d(x, y, z) = d z (z, E) × d x (xx 0 , z, E) × d y (yy 0 , z, E) ‧ ‧ (4)

於此,x0及y0係深度z之1條射束的中心軸之座標。由該式(4)可知,z方向之線量分布並未依存於x方向之座標及y方向之座標,而僅取決於z方向之座標與射束能量E(射束的能量E),惟x方向及y方向之線量分布係不僅是x方向的座標及y方向之座標及射束能量,亦會因z方向之座標與射束中心軸的位置(x0,y0)而改變。如前述,對於相同對象,粒子射束20的照射結束後之線量分布係與將每個光點的線量分布予以合計之情形同樣地,可 按每個時間加以合計,故線量評估點為三維的情形之線量di,k係因式分解成z方向與x方向及y方向之各者的線量,並能以式(5)之方式表示。 Here, x 0 and y 0 are coordinates of the central axis of one beam of depth z. It can be seen from the equation (4) that the linear quantity distribution in the z direction does not depend on the coordinates of the x direction and the coordinates of the y direction, but only depends on the coordinates of the z direction and the beam energy E (the energy E of the beam), but x dose of distribution and y-coordinate system is not only the beam energy and direction of the x coordinate and the y direction, also depending on the position (x 0, 0 y) coordinates of the beam central axis of the z direction is changed. As described above, in the same object, the line amount distribution after the end of the irradiation of the particle beam 20 is equal to the case where the line amount distribution of each spot is totaled, and can be totaled for each time, so the line amount evaluation point is three-dimensional. The linear amount d i,k of the case is factorized into the linear quantities of each of the z direction and the x direction and the y direction, and can be expressed by the formula (5).

[數5]數5 di,k=dz(z,E)×dx(x,z,E)×dy(y,z,E)‧‧‧(5) [Number 5] number 5 d i,k =d z (z,E)×d x (x,z,E)×d y (y,z,E)‧‧‧(5)

另外,dz(z,E)係相對於任意的z座標為z方向之線量分布,惟相對於唯一的z座標而言則為其z座標的線量之值,故依據z座標為唯一或任意而區分使用線量分布或線量。對於dx(x,z,E)、dy(y,z,E)亦相同,相對於任意的(x,y)座標分別為x方向之線量分布、y方向之線量分布,惟相對於唯一的(x,y)座標為該(x,y)座標之線量的值,故依據(x,y)座標為唯一或任意而區分使用線量分布或線量。第i個線量評估點pi係由於其座標(x,y,z)為唯一決定者,故dz(z,E)、dx(x,z,E)、dy(y,z,E)係分別為z方向的線量、x方向的線量、y方向的線量。在考量任意的第i個線量評估點pi時,係表現為各方向的線量分布。再者,同樣地針對Di、di,k亦依據線量評估點為唯一或任意而區分使用線量分布或線量。在針對於唯一之線量評估點使用時,係表現為合計線量Di、線量di,k,而針對任意之線量評估點使用時,則表現為合計線量分布Di、線量分布di,kFurther, d z (z, E) system relative to an arbitrary z coordinate curve of the z-direction of the profile, but with respect to the unique z coordinate in terms of the value of dose of the their z coordinate, it is based on z coordinates of the sole or any Instead, use a line quantity distribution or line quantity. The same is true for d x (x, z, E) and d y (y, z, E), and the linear distribution of the x direction and the linear distribution of the y direction with respect to arbitrary (x, y) coordinates, respectively. The unique (x,y) coordinate is the value of the line quantity of the (x,y) coordinate, so the line quantity distribution or line quantity is used depending on whether the (x,y) coordinate is unique or arbitrary. The i-th linear quantity evaluation point pi is due to its coordinate (x, y, z) being the sole determinant, so d z (z, E), d x (x, z, E), d y (y, z, E The lines are the amount of lines in the z direction, the amount of lines in the x direction, and the amount of lines in the y direction. When considering an arbitrary i-th line quantity evaluation point pi, it is expressed as a line quantity distribution in each direction. Furthermore, similarly, for D i , d i , k , the line quantity distribution or the line quantity is also distinguished according to whether the line quantity evaluation point is unique or arbitrary. When used for the unique line quantity evaluation point, it is expressed as the total line quantity D i and the line quantity d i,k , and when used for any line quantity evaluation point, it is expressed as the total line quantity distribution D i and the line quantity distribution d i,k .

式(4)之射束中心軸的位置亦可藉由式(6)所表示之依據勞倫茲力之解析計算求出。 The position of the central axis of the beam of the formula (4) can also be obtained by analytical calculation based on the Lorentz force expressed by the formula (6).

[數6]數6 f=qvB‧‧‧(6) [Number 6] number 6 f=qvB‧‧‧(6)

於此,式(6)之q、v、B係分別為粒子的電荷、粒子的速度、賦予粒子之磁場的磁通量密度。另外,僅式(6)及勞倫茲力之說明將B作為磁通量密度進行說明。 Here, the q, v, and B systems of the formula (6) are the charge of the particles, the velocity of the particles, and the magnetic flux density of the magnetic field imparted to the particles. In addition, only the description of the formula (6) and the Lorentz force will describe B as the magnetic flux density.

射束中心軸的位置係亦可在事前直接測量並予以資料庫化。亦即,只要在掃描裝置3更下游側設置位置監視器,並產生某個磁場強度B的磁場,在某個射束能量E中照射粒子射束20,而測量射束中心軸所通過之位置,即可依據掃描裝置3與位置監視器之配置距離得知粒子射束20的偏向角θ。依據射束的偏向角係可算出以任意的位置z(z座標)之射束中心軸為基準之x座標及y座標。此射束的偏向角θ的測量亦在理想上較佳為對於在治療中有可能使用之全部的射束能量E及磁場強度B在事前進行,惟為了省略手續,亦可在取得若干個資料後使用線性內插。尤其,關於磁場強度B係依據勞倫茲力的定義而可期待在磁場強度B與偏向角θ之間存在有線性關係,因此即便省略某程度之測量並加以內插亦可期待精確度不會降低。另外,將x方向之偏向角θ標記為θx,將y方向之偏向角θ標記為θ y。再者,偏向角θ由於依存於磁場強度B、位置z(z座標),故適當將偏向角θx標記為θx(B,E),將偏向角θy標記為θy(B,E)。 The position of the central axis of the beam can also be directly measured and databaseed beforehand. That is, as long as the position monitor is provided on the downstream side of the scanning device 3, and a magnetic field of a certain magnetic field strength B is generated, the particle beam 20 is irradiated in a certain beam energy E, and the position at which the beam central axis passes is measured. The deflection angle θ of the particle beam 20 can be known from the arrangement distance of the scanning device 3 and the position monitor. The x coordinate and the y coordinate based on the beam center axis at an arbitrary position z (z coordinate) can be calculated from the deflection angle of the beam. The measurement of the deflection angle θ of the beam is also preferably performed in advance for all of the beam energy E and the magnetic field strength B that are likely to be used in the treatment, but in order to omit the procedure, several data may be obtained. Use linear interpolation afterwards. In particular, regarding the magnetic field strength B, it is expected that there is a linear relationship between the magnetic field strength B and the deflection angle θ according to the definition of the Lorentz force. Therefore, even if a certain degree of measurement is omitted and interpolation is performed, accuracy may not be expected. reduce. Further, the deflection angle θ in the x direction is denoted by θ x , and the deflection angle θ in the y direction is denoted as θ y . Further, since the deflection angle θ depends on the magnetic field strength B and the position z (z coordinate), the deflection angle θ x is appropriately labeled as θ x (B, E), and the deflection angle θ y is marked as θ y (B, E). ).

關於式(4)及式(5)之z方向的線量分布dz(z, E),係可藉由布拉格之式之已知的理論進行計算,惟認為在事前使用水假體(假體21)及線量計實際地測量並予以資料庫化,為最簡便之方法。在事前進行測量時,在水假體中注入水並配置線量計,一面照射粒子射束20並一面沿z方向移動線量計的位置,而藉此取得分布。若在實施該測量前先實施用以取得比例係數C(E)之測量,則藉由將當下的治療用游離腔配置於上游,可取得所照射之粒子數w及水假體中的線量d。並且,藉由求得該比,可得知相對於1個粒子之線量分布dz(z,E)。 The linear quantity distribution d z (z, E) in the z direction of the equations (4) and (5) can be calculated by the known theory of the Bragg formula, but it is considered that the water prosthesis (prosthesis) is used beforehand. 21) and the line gauge is actually measured and databaseed, which is the easiest method. When the measurement is performed in advance, the water is injected into the water prosthesis, and the astigmatometer is placed, and the particle beam 20 is irradiated while moving the position of the line gauge in the z direction, thereby obtaining the distribution. If the measurement for obtaining the proportional coefficient C(E) is performed before the measurement is performed, the number of irradiated particles w and the amount of line d in the water prosthesis can be obtained by arranging the current therapeutic free cavity upstream. . Further, by obtaining the ratio, the linear amount distribution d z (z, E) with respect to one particle can be known.

關於式(4)之線量分布dx(x-x0,z,E)及式(5)之線量分布dx(x,z,E),係可進行依據Moliere、Fermi-Eyges、Highland等人之多重散射理論來計算。再者,同樣地亦可在事前使用水假體(假體21)及線量計實際進行測量,並予以資料庫化。此測量相較於線量分布dz(z,E)之測量,由於線量分布依存於x及z兩者而變化,故必須對於全部的x、z實施測量,惟其相當耗費工夫。因此,使用Geant4等已知之蒙地卡羅模擬工具(Monte Carlo simulation tool)(非專利文獻2),即可計算在水假體(假體21)中的任意位置之每1個粒子之線量。具體而言,在執行蒙地卡羅模擬時,藉由輸入假體21等的物的形狀、粒子射束20的能量、游離的產生位置、產生方向、藉由掃描裝置3的電磁鐵(x方向掃描電磁鐵4、y方向掃描電磁鐵5)而偏向之射束中心軸位置等資訊,可計算水假體(假體21)中的任意的位置之每1個粒子的線量。因此,只要執行蒙地卡羅模擬,即可比 實際測量更有效率地取得x方向的線量分布dx(x-x0,z,E)、線量分布dx(x,z,E)等。關於y方向之線量分布,亦即式(4)之線量分布dy(y-y0,z,E)、式(5)之線量分布dy(y,z,E)等亦相同。 Dose of formula (4) The distribution of d x dose (xx 0, z, E) and (5) the distribution of d x (x, z, E ), based can be based on Moliere, Fermi-Eyges, Highland et al.'S Multiple scattering theory to calculate. Furthermore, it is also possible to actually measure the water prosthesis (prosthesis 21) and the linear meter beforehand and store the data. This measurement is compared to the measurement of the linear quantity distribution d z (z, E). Since the linear quantity distribution varies depending on both x and z, measurement must be performed for all x and z, but it takes considerable effort. Therefore, by using a known Monte Carlo simulation tool such as Geant4 (Non-Patent Document 2), the amount of each particle at any position in the water prosthesis (prosthesis 21) can be calculated. Specifically, when the Monte Carlo simulation is performed, the shape of the object such as the prosthesis 21, the energy of the particle beam 20, the free generation position, the generation direction, and the electromagnet of the scanning device 3 (x) By scanning the electromagnet 4, scanning the electromagnet 5 in the y direction, and deflecting the position of the central axis of the beam, it is possible to calculate the linear amount of each particle at any position in the water prosthesis (prosthesis 21). Therefore, as long as the Monte Carlo simulation is performed, the linear quantity distribution d x (xx 0 , z, E), the linear quantity distribution d x (x, z, E), and the like in the x direction can be obtained more efficiently than the actual measurement. Regarding the linear quantity distribution in the y direction, that is, the linear quantity distribution d y (yy 0 , z, E) of the formula (4) and the linear quantity distribution d y (y, z, E) of the formula (5) are also the same.

在使用蒙地卡羅模擬工具時,不僅是一維方向之線量分布,亦可直接求出三維方向線量分布d(x,y,z),亦可進行在事前計算並將d(x,y,z)的資訊作為資料庫而加以持有之方法。然而,由於將三維擴展之線量分布記憶於記憶裝置係需要大量的記憶體容量,故必須考量記憶裝置的性能與所需之資料精確度,檢討要以何種形式保持資料。 When using the Monte Carlo simulation tool, not only the linear quantity distribution in the one-dimensional direction, but also the three-dimensional direction linear quantity distribution d(x, y, z) can be directly calculated, and can be calculated beforehand and d(x, y , z) The method of holding information as a database. However, since it is necessary to store a large amount of memory capacity in a memory device system, it is necessary to consider the performance of the memory device and the required data accuracy, and to review the form in which the data is to be maintained.

使用第6圖及第7圖,說明本發明之粒子射線治療的流程。在第6圖中,依時間序列由上至下記載在進行粒子射線治療前準備之資料庫資訊36、在粒子射線治療中分割出之每次射束照射中所測量之測量值資訊37、及在射束照射後演算之演算結果資訊38。在第7圖中,顯示分割成複數次之粒子射線治療的流程圖。首先,在開始照射前(設施的啟動時等),就事前準備而言,需進行藉由說明至此之方法取得所需之資料,而製作記憶有資料庫資訊36所記載之5個資訊之資料庫11之作業(資料庫製作步驟)。第1個資料庫係將屬於線量測量裝置7的輸出電荷數之測量電荷數Q(t)換算成粒子數w之係數,亦即比例係數C(E)。第2個資料庫係z方向的線量分布dz(z,E)。第3個資料庫係x方向線量分布dx(x,z,E)。第4個資料庫係y方向線量 分布dy(y,z,E)。第5個資料庫係掃描裝置3的電磁鐵(x方向掃描電磁鐵4、y方向掃描電磁鐵5)所形成之磁場強度B與粒子射束20的偏向角θx(B,E)、θy(B,E)的換算表。 The flow of the particle beam treatment of the present invention will be described using Figs. 6 and 7. In Fig. 6, the database information 36 prepared before the particle beam treatment is recorded from top to bottom in time series, and the measured value information 37 measured in each beam irradiation divided in the particle beam therapy, and The calculation result information 38 after the beam irradiation calculation. In Fig. 7, a flow chart showing the particle beam treatment divided into a plurality of times is shown. First of all, before the start of the irradiation (at the start of the facility, etc.), in order to obtain the required information by the method described above, the information of the five information recorded in the database information 36 is created. The operation of the library 11 (database creation steps). The first database converts the measured charge number Q(t) belonging to the number of output charges of the linear quantity measuring device 7 into a coefficient of the number of particles w, that is, a proportional coefficient C(E). The second database is the linear quantity distribution d z (z, E) in the z direction. The third database is the x-direction line quantity distribution d x (x, z, E). The fourth database is the y-direction line quantity distribution d y (y, z, E). The fifth database is the magnetic field intensity B formed by the electromagnet (the x-direction scanning electromagnet 4 and the y-direction scanning electromagnet 5) of the scanning device 3 and the deflection angle θ x (B, E), θ of the particle beam 20 . Conversion table for y (B, E).

接著,在實際對患者實施治療時,首先進行CT攝影,找出腫瘤的位置、形狀之後,以治療計畫裝置22實施治療計畫之規劃(治療計畫製作步驟)。並且進行依據治療計畫將粒子射束20照射於患者(治療照射步驟)之流程。另外,在從治療計畫之規劃到對患者之照射為止之期間,須在某個時期進行患者QA作業(患者QA步驟)。患者QA一般係認為大多在對患者進行照射之前一天進行,惟並不侷限於此。 Next, when the patient is actually treated, CT photography is first performed to find the position and shape of the tumor, and then the treatment plan device 22 performs the planning of the treatment plan (the treatment plan preparation step). And a flow of irradiating the particle beam 20 to the patient (the treatment irradiation step) according to the treatment plan is performed. In addition, during the period from the planning of the treatment plan to the irradiation of the patient, the patient QA operation (patient QA step) must be performed at a certain time. Patient QA is generally considered to be performed mostly one day before the irradiation of the patient, but is not limited thereto.

在粒子射線治療的射束照射中,係按每個預先決定之時間區間△t,測量屬於測量值資訊37所記載之3個測量值之測量電荷數Q、測量射束中心軸位置Px、Py及能量E(治療資料測量步驟)。測量電荷數Q(測量射束量)係按每個時間區間△t測量之屬於線量測量裝置7的電荷數之測量電荷數Q(t)(測量射束量的資訊)的全部資料。測量射束中心軸位置Px、Py係按每個時間區間△t測量之屬於掃描電磁鐵3的x方向掃描電磁鐵4及y方向掃描電磁鐵5的磁場之測量射束中心軸位置Px(t)、Py(t)的全部資料。能量E係按每個時間區間△t測量之屬於粒子射束20的射束能量之測量能量E(t)的全部資料。 In the beam irradiation of the particle beam therapy, the measured charge number Q and the measurement beam central axis position Px, Py belonging to the three measured values described in the measured value information 37 are measured for each predetermined time interval Δt. And energy E (therapeutic data measurement step). The measured charge number Q (measured beam amount) is all the data of the measured charge number Q(t) (information for measuring the beam amount) belonging to the number of charges of the line amount measuring device 7 measured per time interval Δt. The measurement beam central axis positions Px and Py are measurement beam center axis positions Px of the magnetic fields of the x-direction scanning electromagnet 4 and the y-direction scanning electromagnet 5 of the scanning electromagnet 3 measured for each time interval Δt. ), Py(t) full information. The energy E is the total amount of the measured energy E(t) of the beam energy belonging to the particle beam 20 measured per time interval Δt.

測量電荷數Q、測量射束中心軸位置Px、Py、及能量E係分別記憶於測量電荷記憶部12、測量射束 中心軸記憶部13、及測量能量記憶部14。測量電荷數Q亦稱為測量射束量,故測量電荷記憶部亦可稱為測量射束量記憶部。測量電荷數Q、測量射束中心軸位置Px、Py、及能量E可彙整成如第4圖所記載之測量值記憶資訊35的資料構造。在代表第1測量區間之時刻t1,測量測量電荷數Q(t1)、測量能量E(t1)、測量射束中心軸位置Px(t1)、Py(t1)。在經過時間區間△t之時刻t2,測量測量電荷數Q(t2)、測量能量E(t2)、測量射束中心軸位置Px(t2)、Py(t2)。在每次經過時間區間△t時,同樣地測量測量電荷數Q(t)、測量能量E(t)、測量射束中心軸位置Px(t)、Py(t)。在代表最後之測量區間之時刻tn,測量測量電荷數Q(tn)、測量能量E(tn)、測量射束中心軸位置Px(tn)、Py(tn)。另外,測量電荷記憶部12、測量射束中心軸記憶部13、測量能量記憶部14亦可非線量分布演算裝置10的內部的記憶區域而為外部記憶區域。 The measured charge number Q, the measured beam central axis position Px, Py, and the energy E are respectively stored in the measured charge storage unit 12, and the measurement beam The central axis memory unit 13 and the measurement energy storage unit 14. The measured charge number Q is also referred to as the measured beam amount, so the measured charge memory portion may also be referred to as a measured beam amount memory portion. The measured charge number Q, the measured beam center axis positions Px, Py, and the energy E can be aggregated into a data structure of the measured value memory information 35 as shown in FIG. At time t1 representing the first measurement section, the measured charge number Q(t1), the measured energy E(t1), and the measured beam central axis position Px(t1), Py(t1) are measured. At time t2 when the time interval Δt elapses, the measured charge number Q(t2), the measured energy E(t2), and the measured beam central axis position Px(t2), Py(t2) are measured. The measured charge number Q(t), the measured energy E(t), and the measured beam central axis position Px(t), Py(t) are measured in the same manner each time the time interval Δt elapses. At the time tn representing the last measurement interval, the measured charge number Q(tn), the measured energy E(tn), the measured beam central axis position Px(tn), Py(tn) are measured. Further, the measurement charge storage unit 12, the measurement beam central axis storage unit 13, and the measurement energy storage unit 14 may be external storage areas of the memory area of the non-linear amount distribution calculation device 10.

在照射後,依據記憶於測量電荷記憶部12、測量射束中心軸位置記憶部13、測量能量記憶部14之各資訊(測量電荷數Q、測量射束中心軸位置Px、Py、能量E)及資料庫11的資訊,線量分布演算裝置10係算出患者的體內的合計線量分布Di(合計線量分布演算步驟)。於合計線量分布演算步驟,演算記載於演算結果資訊38之3個照射粒子數wk、線量分布di,k、合計線量分布Di。合計線量演算部15係藉由式(3)而按每個測量區間從比例係數C(E)與相當於總電荷數Qk之測量電荷數Q(t),演算照射粒 子數wk。再者,合計線量演算部15係依據藉由測量射束中心軸位置Px、Py、能量E所選擇之z方向線量分布dz(z,E)、x方向線量分布dx(x,z,E)、y方向線量分布dy(y,z,E),藉由式(5)演算線量分布di,kAfter the irradiation, information (measured charge number Q, measured beam center axis position Px, Py, energy E) stored in the measured charge storage unit 12, the measured beam central axis position memory unit 13, and the measured energy storage unit 14 is measured. And the information of the database 11, the linear quantity distribution calculation device 10 calculates the total line amount distribution D i in the body of the patient (total line amount distribution calculation step). In the total line quantity distribution calculation step, the three irradiation particle numbers w k , the line quantity distributions d i, k , and the total line quantity distribution D i described in the calculation result information 38 are calculated. The total line amount calculation unit 15 calculates the number of irradiation particles w k from the proportional coefficient C(E) and the measured charge number Q(t) corresponding to the total number of charges Q k for each measurement section by the equation (3). Further, the total line amount calculation unit 15 is based on the z-direction line quantity distribution d z (z, E) selected by measuring the beam center axis positions Px, Py, and energy E, and the x-direction line quantity distribution d x (x, z, E), y direction line quantity distribution d y (y, z, E), the line quantity distribution d i,k is calculated by the formula (5).

再者,線量分布演算裝置10係藉由計畫線量比較部16比較算出之合計線量分布Di與每1日的目標線量分布Dobj i,並以式(7)之方式算出其線量分布差異△DI(線量分布差異演算步驟)。 In addition, the linear quantity distribution calculation device 10 compares the calculated total line quantity distribution D i with the target line quantity distribution D obj i per day by the plan line quantity comparison unit 16 , and calculates the difference in the line quantity distribution by the equation (7). ΔD I (Line amount distribution difference calculation step).

在線量分布差異演算步驟中,線量分布演算裝置10係算出演算結果資訊38所記載之線量分布差異△Di。並且,線量分布演算裝置10係將線量分布差異△Di傳送至治療計畫裝置22。治療計畫裝置22係以修正線量分布差異△Di之方式,規劃隔天的治療計畫(治療計畫修正步驟)。亦即,以滿足式(8)之方式,算出修正光點粒子數wc jIn the linear quantity distribution difference calculation step, the linear quantity distribution calculation device 10 calculates the linear quantity distribution difference ΔD i described in the calculation result information 38. Further, the linear amount distribution calculating device 10 transmits the linear amount distribution difference ΔD i to the treatment planning device 22. The treatment planning device 22 plans the next day's treatment plan (the treatment plan correction step) in such a manner as to correct the line amount distribution difference ΔD i . That is, the corrected spot particle number w c j is calculated in such a manner as to satisfy the formula (8).

於隔天的治療照射中,粒子射線治療裝置50係依據修正光點粒子數wc j進行粒子射束20之照射。藉 此,如第8圖所示,粒子射線治療裝置50係能夠使兩天合計的照射線量分布(合計線量分布43)與兩天份的目標線量分布相等。第8圖的縱軸為線量,橫軸為x方向的位置。線量分布41為第1天的治療中由射束照射所產生之x方向的線量分布,線量分布42係第2天的治療中由射束照射所產生之x方向的線量分布。合計線量分布43係兩天合計之x方向的線量分布。 In the next day of therapeutic irradiation, the particle beam therapy apparatus 50 irradiates the particle beam 20 based on the corrected spot particle number w c j . As a result, as shown in Fig. 8, the particle beam therapy system 50 is capable of making the total irradiation line amount distribution (total line amount distribution 43) of two days equal to the target line amount distribution of two days. In the eighth diagram, the vertical axis represents the line amount, and the horizontal axis represents the position in the x direction. The linear amount distribution 41 is a linear quantity distribution in the x direction generated by the beam irradiation in the treatment on the first day, and the linear quantity distribution 42 is a linear quantity distribution in the x direction generated by the beam irradiation in the treatment on the second day. The total line amount distribution 43 is a line amount distribution in the x direction in total for two days.

使用第7圖說明上述實施形態1之粒子射線治療的流程。於步驟S001,治療計畫裝置22係依據每1日的目標線量分布Dobj i,算出每個光點的總電荷數Qj(粒子數wj)(治療計畫製作步驟)。於步驟S002,粒子線治療裝置50係依據治療計畫製作步驟的治療計畫所決定之每個光點的總電荷數Qj(粒子數wj)對患者照射粒子射束20(初次照射步驟)。於步驟S003,線量分布演算裝置10係算出合計線量分布Di、及線量分布差異△Di(線量分布演算步驟)。線量分布演算步驟係執行上述合計線量分布演算步驟及線量分布差異演算步驟之步驟。 The flow of the particle beam therapy of the first embodiment described above will be described using Fig. 7 . In step S001, the treatment planning device 22 calculates the total number of charges Q j (number of particles w j ) for each spot based on the target line amount distribution D obj i per day (the treatment plan preparation step). In step S002, the particle beam therapy device 50 irradiates the patient with the particle beam 20 according to the total charge number Q j (number of particles w j ) of each spot determined by the treatment plan of the treatment planning step (primary irradiation step) ). In step S003, the linear quantity distribution calculation device 10 calculates the total line amount distribution D i and the line amount distribution difference ΔD i (the line amount distribution calculation step). The line quantity distribution calculation step is a step of performing the above-mentioned total line quantity distribution calculation step and the line quantity distribution difference calculation step.

於步驟S004中,治療計畫裝置22係依據線量分布差異△Di算出每個光點的修正總電荷數Qc j(修正光點粒子數wc j)(治療計畫修正步驟)。於步驟S005中,粒子線治療裝置50係對於由治療計畫製作步驟所決定之光點,依據修正總電荷數Qc j(修正光點粒子數wc j)對患者照射粒子射束20。於步驟S006中,在達到治療計畫所決定之治療次數為止反覆進行步驟S003至步驟S005。 In step S004, the treatment planning device 22 calculates the corrected total charge number Q c j (the corrected spot particle number w c j ) for each spot based on the line amount distribution difference ΔD i (the treatment plan correction step). In step S005, the particle beam therapy device 50 irradiates the patient with the particle beam 20 based on the corrected total charge number Q c j (the corrected spot particle number w c j ) for the spot determined by the treatment plan creation step. In step S006, steps S003 to S005 are repeatedly performed until the number of treatments determined by the treatment plan is reached.

在此詳細說明合計線量演算部15的演算動作。合計線量演算部15係從資料庫11讀出符合能量E之比例係數C(E),並將測量電荷數Q(t)與比例係數C(E)相乘而演算照射粒子數wk。再者,以第i個線量評估點pi為例說明合計線量演算部15之線量分布di,k之演算。合計線量演算部15係從資料庫11的z方向線量分布dz(z,E)導出屬於第i個線量評估點pi之z座標且為符合能量E之z方向之線量,亦即選擇z方向線量dzHere, the calculation operation of the total line amount calculation unit 15 will be described in detail. Total dose calculation unit 15 reads from the database system 11 to scale the coefficient of energy E C (E), and the number of measuring charge Q (t) and the proportionality coefficient C (E) by multiplying the number of particles irradiated calculating w k. Furthermore, the calculation of the line quantity distribution d i,k of the total line quantity calculation unit 15 will be described by taking the ith line quantity evaluation point pi as an example. The total line amount calculation unit 15 derives the z coordinate belonging to the i-th line quantity evaluation point pi from the z-direction line quantity distribution d z (z, E) of the database 11 and is a line amount in accordance with the z direction of the energy E, that is, the z direction is selected. Line quantity d z .

合計線量演算部15係從資料庫11的射束偏向角θx(B,E)、θy(B,E)導出符合測量射束中心軸位置Px、Py及能量E之x方向偏向角(選擇x方向偏向角)θx、y方向偏向角(選擇y方向偏向角)θy。合計線量演算部15係從x方向的偏向角θx演算x座標,並從資料庫11的x方向線量分布dx(x,z,E)導出符合該x座標、線量評估點的z座標及能量E之x方向的線量(選擇x方向線量)dx。合計線量演算部15係同樣地,從y方向的偏向角θy演算y座標,並從資料庫11的y方向線量分布dy(y,z,E)導出符合該y座標、線量評估點的z座標及能量E之y方向的線量(選擇y方向線量)dyThe total line amount calculation unit 15 derives the x-direction deflection angle corresponding to the measurement beam center axis positions Px and Py and the energy E from the beam deflection angles θ x (B, E) and θ y (B, E) of the database 11 ( Select the x-direction deflection angle) θ x and the y-direction deflection angle (select the y-direction deflection angle) θ y . The total line amount calculation unit 15 calculates the x coordinate from the deflection angle θ x in the x direction, and derives the z coordinate corresponding to the x coordinate and the line quantity evaluation point from the x direction line quantity distribution d x (x, z, E) of the database 11 and The amount of line in the x direction of energy E (select the amount of x direction line) d x . Similarly, the total line amount calculation unit 15 calculates the y coordinate from the deflection angle θ y in the y direction, and derives the y coordinate and the line quantity evaluation point from the y direction line quantity distribution d y (y, z, E) of the database 11 . The z-coordinate and the amount of line in the y direction of the energy E (select the amount of y-direction line) d y .

合計線量演算部15係依據導出的z方向的線量dz、x方向的線量dx、y方向的線量dy,藉由式(5)將三個線量dz、dx、dy相乘,藉此演算di,k。合計線量演算部15係按每個線量評估點、時間區間來演算線量di,k,並求出線量分布di,k。合計線量演算部15係依據已演算出之照 射粒子數wk及線量分布di,k,藉由式(2)而算出合計線量分布DiRelative to the total amount calculating unit 15 based according to the z-direction derived from the dose D z, dose d x x direction, dose d y y direction, three dose d z, d x, d y is multiplied by the formula (5) To calculate d i,k by this . The total line amount calculation unit 15 calculates the line amount d i,k for each line amount evaluation point and time interval, and obtains the line quantity distribution d i,k . W k the number of particles and the total irradiation dose based system 15 has dose calculation unit calculating a distribution of d i, k, by the formula (2) the total calculated dose distribution D i.

實施形態1之線量分布演算裝置10係依據測量粒子射束資訊(能量E、測量射束量(測量電荷數Q)、測量射束中心軸位置Px、Py),算出賦予患者之照射線量分布(合計線量分布Di),並比較照射線量分布(合計線量分布Di)與1日該當的目標線量分布Dobj i,而算出屬於照射線量分布(合計線量分布Di)與目標線量分布Dobj i的差異之線量分布差異△Di,因此無需具有高位置解析度之線量檢測器,且可正確且定量地估計靜態及動態的不確定性之兩者對線量分布造成之影響。實施形態1之粒子射線治療裝置50係在第2次以後的治療照射時,依照治療計畫裝置22依據線量分布差異△Di算出之修正總電荷數Qc j(修正光點粒子數wc j)對患者照射粒子射束20,因此無需具有高位置解析度之線量檢測器,且可補償靜態及動態的不確定性之兩者。 The linear amount distribution calculation device 10 of the first embodiment calculates the distribution of the irradiation dose amount given to the patient based on the measured particle beam information (energy E, the measured beam amount (measured charge number Q), and the measured beam central axis position Px, Py) ( total dose distribution D i), and compare the irradiation amount distribution (total dose distribution D i) D obj i and dose target 1 should be distributed, calculated belongs irradiation amount distribution (total dose distribution D i) and the target dose distribution D obj differences in dose distribution difference i △ D i, and therefore need not have a high resolution position detector dose, and may be accurately and quantitatively estimate the effect of both the static and dynamic uncertainty of the cause of the dose distribution. The particle beam therapy apparatus 50 according to the first embodiment is a modified total number of charges Q c j (corrected number of spot particles w c ) calculated by the treatment planning device 22 based on the linear amount distribution difference ΔD i at the time of the second and subsequent treatment irradiations. j) irradiating the particle beam 20 patients, there is no need of having a high resolution position detector dose, and may be both static and dynamic compensation of the uncertainties.

實施形態1之線量分布演算裝置10係在粒子射線治療裝置50藉由掃描裝置3於照射對象掃描粒子射束20而進行粒子射線治療時,演算粒子射線治療裝置50賦予照射對象之照射線量分布(合計線量分布Di)及照射線量分布(合計線量分布Di)與屬於目標線量分布Dobj i的差異之線量分布差異△Di者,該線量分布演算裝置10係包括:射束資訊記憶部(測量能量記憶部14、測量射束量記憶部(測量電荷記憶部12)、測量射束中心軸記憶部13),係記憶 由測量裝置(射束能量測量裝置6、線量測量裝置7、射束偏向資訊測量裝置8)所測量之屬於粒子射束20的粒子射束資訊之測量粒子射束資訊;合計線量演算部15,係依據測量粒子射束資訊(能量E、測量射束量(測量電荷數Q)、測量射束中心軸位置Px、Py),演算照射線量分布;以及計畫線量比較部16,係演算屬於照射線量分布(合計線量分布Di)與目標線量分布Dobj i的差異之線量分布差異△Di。實施形態1之線量分布演算裝置10係藉由此特徵,依據測量粒子射束資訊演算照射線量分布(合計線量分布Di)及線量分布差異△Di,故無需具有高位置解析度之線量檢測器,可正確且定量地估計靜態及動態的不確定性之兩者對線量分布造成之影響。 In the particle amount distribution calculation device 10 of the first embodiment, when the particle beam therapy device 50 performs the particle beam therapy on the irradiation target scanning particle beam 20 by the scanning device 3, the particle beam irradiation device 50 is provided with the irradiation line amount distribution to be irradiated ( total dose distribution D i) and the irradiation amount distribution (total dose distribution D i) belonging to the target dose distribution of the dose differences D obj i distributional difference △ D i by, the dose distribution calculating means 10 based comprising: a beam information storage unit (Measurement energy storage unit 14, measurement beam amount storage unit (measurement charge storage unit 12), measurement beam central axis storage unit 13), memory measurement device (beam energy measurement device 6, linear amount measurement device 7, shot) The beam deflection information measuring device 8) measures the particle beam information of the particle beam information belonging to the particle beam 20; the total line amount calculation unit 15 is based on measuring the particle beam information (energy E, measuring beam amount (measurement) The charge number Q), the measurement beam central axis position Px, Py), the calculation of the irradiation line quantity distribution, and the plan line quantity comparison unit 16 are calculated to belong to the illumination line quantity distribution (total line quantity distribution D) i ) The difference in the amount distribution of the difference from the target line quantity distribution D obj i ΔD i . According to the linear quantity distribution calculation device 10 of the first embodiment, the illumination line quantity distribution (the total line quantity distribution D i ) and the line quantity distribution difference ΔD i are calculated based on the measured particle beam information, so that the line quantity detection with high position resolution is not required. The correct and quantitative estimate of the effects of both static and dynamic uncertainties on the linear distribution.

再者,實施形態1之線量分布演算裝置10之粒子射束資訊係包含粒子射束20之射束量、能量、射束中心軸位置,射束資訊記憶部係包含:測量能量記憶部14,係將在複數個時刻測量粒子射束20的能量所得之測量能量E(t)予以記憶;測量射束中心軸記憶部13,係將在複數個時刻測量粒子射束20的射束中心軸位置所得之測量射束中心軸位置Px(t)、Py(t)予以記憶;以及測量射束量記憶部(測量電荷記憶部12),係將在複數個時刻測量粒子射束20的射束量所得之測量射束量(測量電荷數Q(t))予以記憶。實施形態1之線量分布演算裝置10的合計線量演算部15係藉由在全部的時間區間將照射粒子數wk與單位粒子射線量(線量di,k)相乘之時間區間線量予以加總,而演算照射 對象的演算對象點(線量評估點pi)之線量,其中,該照射粒子數係依據粒子射束資訊被測量之時間區間的相同區間中之測量能量E(t)及測量射束量(測量電荷數Q(t))而求得者,該單位粒子射線量為依據在時間區間的相同區間中之測量能量E(t)及測量射束中心軸位置Px(t)、Py(t)而求得之由粒子射束20中之一個粒子所賦予之線量。實施形態1之線量分布演算裝置10的計畫線量比較部16係演算屬於照射線量分布(合計線量分布Di)與目標線量分布Dobj i的差異之線量分布差異△Di。實施形態1之線量分布演算裝置10係藉由該等特徵,合計線量演算部15依據每個時間區間之測量能量E(t)、測量射束中心軸位置Px(t)、Py(t)及測量射束量(測量電荷數Q(t)),演算照射線量分布(合計線量分布Di)及線量分布差異△Di,因此無需具有高位置解析度之線量檢測器,可正確且定量地估計靜態及動態的不確定性之兩者對線量分布造成之影響。 Further, the particle beam information of the linear amount distribution computing device 10 of the first embodiment includes the beam amount, energy, and beam central axis position of the particle beam 20, and the beam information memory unit includes a measurement energy storage unit 14. The measurement energy E(t) obtained by measuring the energy of the particle beam 20 at a plurality of times is memorized; the measurement beam central axis memory portion 13 measures the beam central axis position of the particle beam 20 at a plurality of times. The measured beam center axis positions Px(t), Py(t) are memorized; and the measured beam amount memory portion (measured charge memory portion 12) is used to measure the beam amount of the particle beam 20 at a plurality of times. The resulting measured beam amount (measured charge number Q(t)) is memorized. The total line amount calculation unit 15 of the linear quantity distribution calculation device 10 of the first embodiment adds up the time interval amount by multiplying the number of irradiation particles w k by the unit particle beam amount (line amount d i,k ) in all time intervals. And calculating the line amount of the calculation target point (line quantity evaluation point pi) of the irradiation target, wherein the number of the irradiation particles is the measurement energy E(t) and the measurement beam in the same interval of the time interval in which the particle beam information is measured. The amount of the unit particle ray is determined based on the measured energy E(t) in the same interval of the time interval and the measured beam center axis positions Px(t), Py (the amount of charge Q(t)) is obtained. t) The amount of line given by one of the particle beams 20 is determined. The program line amount comparison unit 16 of the linear quantity distribution calculation device 10 according to the first embodiment calculates the linear quantity distribution difference ΔD i belonging to the difference between the irradiation line quantity distribution (the total line quantity distribution D i ) and the target line quantity distribution D obj i . According to the linear quantity distribution calculation device 10 of the first embodiment, the total line amount calculation unit 15 measures the energy E(t) of each time interval, the measurement beam center axis positions Px(t), Py(t), and Measuring the beam amount (measuring the charge number Q(t)), calculating the illumination line quantity distribution (total line quantity distribution D i ) and the line quantity distribution difference ΔD i , thus eliminating the need for a line amount detector with high position resolution, which can be correctly and quantitatively Estimate the impact of both static and dynamic uncertainties on the distribution of linear quantities.

實施形態1之粒子射線治療裝置50係將粒子射線治療所需之線量分割成複數次而對照射對象賦予者,該粒子射線治療裝置係包括:粒子射束產生裝置1,係產生粒子射線治療所需之能量之粒子射束20;掃描裝置3,係使粒子射束20朝相對於射束行進方向垂直之2方向偏向,並於照射對象之配置位置掃描粒子射束20;射束輸送裝置2,係將粒子射束20輸送至掃描裝置3;測量裝置(射束能量測量裝置6、射束偏向資訊測量裝置8、射束量測量裝置(線量測量裝置7)),係測量粒子射束產生裝置1所產生之 粒子射束20的粒子射束資訊;以及線量分布演算裝置10,係演算屬於粒子射束20賦予至照射對象之照射線量分布(合計線量分布Di)及照射線量分布(合計線量分布Di)與目標線量分布Dobj i之差異之線量分布差異△Di;粒子射線治療裝置50係在第2次以後之治療照射中,依據由治療計畫裝置22所演算之包含將線量分布差異△Di予以修正之修正射束量(修正總電荷數Qc j)之控制資料而進行控制。實施形態1之粒子射線治療裝置50之線量分布演算裝置10係包括:射束資訊記憶部(測量能量記憶部14、測量射束量記憶部(測量電荷記憶部12)、測量射束中心軸記憶部13),係記憶由測量裝置(射束能量測量裝置6、線量測量裝置7、射束偏向資訊測量裝置8)所測量之測量粒子射束資訊;合計線量演算部15,係依據測量粒子射束資訊(能量E、測量射束量(測量電荷數Q)、測量射束中心軸位置Px、Py),演算照射線量分布(合計線量分布Di);以及計畫線量比較部16,係算出線量分布差異△Di。實施形態1之粒子射線治療裝置50係藉由該等特徵,依據測量粒子射束資訊(能量E、測量射束量(測量電荷數Q)、測量射束中心軸位置Px、Py),演算照射線量分布(合計線量分布Di)及線量分布差異△Di,並在第2次以後之治療照射中,依據由治療計畫裝置22所演算之包含將線量分布差異△Di予以修正之修正射束量(修正總電荷數Qc j)之控制資料而進行控制,因此無需具有高位置解析度之線量檢測器,且可補償靜態及動態的不確定性之兩者。 The particle beam therapy apparatus 50 according to the first embodiment is configured to divide a line amount required for particle beam therapy into a plurality of times, and to provide an object to be irradiated. The particle beam therapy apparatus includes a particle beam generating apparatus 1 for generating a particle beam therapy facility. a particle beam 20 of energy required; the scanning device 3 deflects the particle beam 20 in two directions perpendicular to the direction in which the beam travels, and scans the particle beam 20 at an arrangement position of the irradiation target; the beam delivery device 2 The particle beam 20 is sent to the scanning device 3; the measuring device (the beam energy measuring device 6, the beam deflecting information measuring device 8, and the beam amount measuring device (the line measuring device 7)) measure the particle beam generation The particle beam information of the particle beam 20 generated by the device 1 and the linear quantity distribution calculation device 10 calculate the distribution of the illumination line amount (total line quantity distribution D i ) and the irradiation line quantity distribution which are given to the irradiation target by the particle beam 20 (total dose distribution D i) of the difference in dose distribution D obj i the difference △ D i to the target dose distribution; particle beam therapy system 50 in the treatment after the irradiation of the second time, according to the rule Program means 22 comprises calculating the dose distribution difference △ D i be the amount of correction of the correction beam (corrected total charge Q c j) of the control data and controls. The linear amount distribution calculation device 10 of the particle beam therapy system 50 according to the first embodiment includes a beam information storage unit (measurement energy storage unit 14, measurement beam amount storage unit (measurement charge storage unit 12), and measurement beam central axis memory). The part 13) memorizes the measured particle beam information measured by the measuring device (the beam energy measuring device 6, the line amount measuring device 7, and the beam deflecting information measuring device 8); the total line amount calculating unit 15 is based on the measured particle beam Beam information (energy E, measured beam amount (measured charge number Q), measured beam center axis position Px, Py), calculated irradiation line quantity distribution (total line quantity distribution D i ); and planned line quantity comparing unit 16 is calculated The line quantity distribution difference ΔD i . According to the particle beam therapy apparatus 50 of the first embodiment, the particle beam information (energy E, the measured beam amount (measured charge number Q), the measured beam center axis position Px, Py) is measured by the characteristics, and the irradiation is calculated. The line quantity distribution (total line quantity distribution D i ) and the line quantity distribution difference ΔD i , and in the second and subsequent treatment irradiations, according to the correction calculated by the treatment planning device 22 including the correction of the line quantity distribution difference ΔD i The control data of the beam amount (corrected total charge number Q c j ) is controlled, so that a line amount detector with high position resolution is not required, and both static and dynamic uncertainties can be compensated.

實施形態1之治療計畫修正方法係修正粒子射線治療計畫者,該粒子射線治療計畫係將粒子射線治療所需之線量分割成複數次而藉由粒子射線治療裝置50賦予照射對象之治療計畫。該治療計畫修正方法包括以下步驟:治療資料測量步驟,係於複數個時刻測量粒子射線治療裝置50所產生之粒子射束20的粒子射束資訊(能量、射束量、射束中心軸),並收集測量粒子射束資訊(能量E、測量射束量(測量電荷數Q)、測量射束中心軸位置Px、Py);合計線量分布演算步驟,係依據測量粒子射束資訊被測量之每個時間區間之測量粒子射束資訊(能量E、測量射束量(測量電荷數Q)、測量射束中心軸位置Px、Py),演算由粒子射束20對照射對象賦予之照射線量分布(合計線量分布Di);線量分布差異演算步驟,係演算屬於照射線量分布(合計線量分布Di)與目標線量分布Dobj i的差異之線量分布差異△Di;以及治療計畫修正步驟,係演算將線量分布差異△Di予以修正之修正射束量(修正總電荷數Qc j)。實施形態1之治療計畫修正方法係依據測量粒子射束資訊(能量E、測量射束量(測量電荷數Q)、測量射束中心軸位置Px、Py),演算照射線量分布(合計線量分布Di)及線量分布差異△Di,並將線量分布差異△Di傳送至粒子射線治療裝置50,故在第2次以後之治療照射中,藉由依據由治療計畫裝置22所演算之包含將線量分布差異△Di予以修正之修正射束量(修正總電荷數Qc j)之控制資料而控制粒子射線治療裝置50,因此無需具有高位置解析度之線量檢測器,可補償靜 態及動態的不確定性之兩者。 The treatment plan correction method according to the first embodiment is a modified particle beam therapy program that divides the amount of wire required for particle beam therapy into a plurality of times and provides treatment to the irradiation target by the particle beam therapy device 50. plan. The treatment plan correction method includes the following steps: a treatment data measurement step of measuring particle beam information (energy, beam amount, beam center axis) of the particle beam 20 generated by the particle beam therapy device 50 at a plurality of times. And collecting and measuring particle beam information (energy E, measuring beam amount (measuring charge number Q), measuring beam central axis position Px, Py); total line quantity distribution calculation step is measured according to measuring particle beam information The particle beam information (energy E, the measured beam amount (measured charge number Q), the measured beam center axis position Px, Py) is measured for each time interval, and the distribution of the illumination line amount given to the irradiated object by the particle beam 20 is calculated. (Total line quantity distribution D i ); the line quantity distribution difference calculation step is to calculate the line quantity distribution difference ΔD i of the difference between the irradiation line quantity distribution (total line quantity distribution D i ) and the target line quantity distribution D obj i ; and the treatment plan correction step , the dose distribution calculation based difference △ D i be the amount of correction of the correction beam (corrected total charge Q c j). The treatment plan correction method according to the first embodiment is based on measuring particle beam information (energy E, measuring beam amount (measured charge number Q), measuring beam central axis position Px, Py), and calculating the irradiation line quantity distribution (total line quantity distribution) D i ) and the difference in the amount distribution ΔD i , and the difference in the amount distribution ΔD i is transmitted to the particle beam therapy device 50, so in the second and subsequent treatment irradiation, according to the calculation by the treatment planning device 22 The particle beam therapy device 50 is controlled by controlling the particle beam therapy device 50 including control data for correcting the beam amount (corrected total charge number Q c j ) for correcting the line amount distribution difference ΔD i , thereby eliminating the need for a line amount detector having high position resolution, and compensating for static And dynamic uncertainty.

另外,本發明係以同時使用能量E、測量射束量(測量電荷量Q)、測量射束中心軸位置Px、Py之三者作為由測量裝置所測量之測量粒子射束資訊之例進行說明,惟亦可僅使用一者。如前述,在專利文獻1之計算線量分布之方法中,需要二維線量檢測之精確度及位置解析度皆高之二維線量檢測器。相對於此,在本發明中,若將測量射束量(測量電荷數Q)設為測量粒子射束資訊,則無需具有高位置解析度之線量檢測器,且可補償靜態及動態的不確定性之兩者。再者,本發明在其發明之範圍內,可組合各構成,或適當變形、省略各構成。 Further, the present invention is described by taking three examples of the simultaneous use energy E, the measured beam amount (measured charge amount Q), and the measured beam central axis position Px, Py as measured particle beam information measured by the measuring device. , but only one can be used. As described above, in the method of calculating the line amount distribution of Patent Document 1, a two-dimensional line amount detector in which the accuracy of two-dimensional line quantity detection and the position resolution are both high is required. On the other hand, in the present invention, if the measurement beam amount (measured charge number Q) is set as the measurement particle beam information, a line amount detector having high position resolution is not required, and static and dynamic uncertainties can be compensated for. Both of sex. Further, the present invention can be combined with various configurations within the scope of the invention, or modified as appropriate, and the respective configurations are omitted.

1‧‧‧射束產生裝置 1‧‧‧beam generating device

2‧‧‧射束輸送裝置 2‧‧‧beam conveyor

3‧‧‧掃描裝置 3‧‧‧Scanning device

4‧‧‧x方向掃描電磁鐵 4‧‧‧x direction scanning electromagnet

5‧‧‧y方向掃描電磁鐵 5‧‧‧y direction scanning electromagnet

6‧‧‧射束能量測量裝置 6‧‧‧beam energy measuring device

7‧‧‧射束測量裝置 7‧‧‧beam measuring device

8‧‧‧射束偏向資訊測量裝置 8‧‧‧beam deflection information measuring device

10‧‧‧線量分布演算裝置 10‧‧‧Wire quantity distribution calculation device

20‧‧‧資料庫 20‧‧‧Database

21‧‧‧假體 21‧‧‧Prosthesis

22‧‧‧治療計畫裝置 22‧‧‧Treatment planning device

50‧‧‧粒子射線治療裝置 50‧‧‧Particle ray therapy device

E(t)‧‧‧測量能量 E(t)‧‧‧Measure energy

Px(t)、Py(t)‧‧‧測量射束中心軸位置 Px(t), Py(t)‧‧‧measuring beam center axis position

Q(t)‧‧‧測量電荷數 Q(t)‧‧‧Measured charge number

△Di‧‧‧線量分布差異 △D i ‧‧‧Distribution of line quantity

Claims (4)

一種粒子射線治療裝置,係將粒子射線治療所需之線量分割成複數次而對照射對象賦予者,該粒子射線治療裝置係包括:粒子射束產生裝置,係產生粒子射線治療所需之能量之粒子射束;掃描裝置,係使前述粒子射束朝向相對於射束行進方向垂直之2方向偏向,並於前述照射對象之配置位置掃描前述粒子射束;射束輸送裝置,係將前述粒子射束輸送至掃描裝置;測量裝置,係測量由前述粒子射束產生裝置所產生之前述粒子射束的粒子射束資訊;以及線量分布演算裝置,係演算藉由前述粒子射束而賦予至前述照射對象之照射線量分布以及屬於照射線量分布與目標線量分布之差異之線量分布差異;前述粒子射束資訊係包含前述粒子射束之射束量、能量、以及射束中心軸位置;前述線量分布演算裝置係包括:射束資訊記憶部,係記憶由前述測量裝置所測量之測量粒子射束資訊;合計線量演算部,係依據前述測量粒子射束資訊,演算前述照射線量分布;以及計畫線量比較部,係演算前述線量分布差異;前述射束資訊記憶部係包括:測量能量記憶部,係將在複數個時刻測量前述粒子射束的能量所得之測量能量予以記憶;測量射束中心軸記憶部,係記憶測量射束中心軸 位置,該測量射束中心軸位置係在複數個時刻依據前述掃描裝置所偏向之前述射束的偏向資訊來測量前述粒子射束的射束中心軸位置所得者;以及測量射束量記憶部,係將在複數個時刻測量前述粒子射束的射束量所得之測量射束量予以記憶;前述合計線量演算部係藉由在全部的時間區間將照射粒子數與單位粒子射線量相乘之時間區間線量予以加總,而演算前述照射對象的演算對象點之線量,其中,該照射粒子數係依據前述粒子射束資訊被測量之時間區間的相同區間中之前述測量能量及前述測量射束量而求得者,該單位粒子射線量為依據在前述時間區間的相同區間中之前述測量能量及前述測量射束中心軸位置而求得之由前述粒子射束中之一個粒子所賦予之線量;該粒子射線治療裝置係在第2次以後之治療照射中,依據治療計畫裝置所演算之包含將前述線量分布差異予以修正之修正射束量之控制資料而進行控制。 A particle beam therapy apparatus for dividing an amount of a line required for particle beam therapy into a plurality of times to be given to an object to be irradiated, the particle beam therapy apparatus comprising: a particle beam generating device for generating energy required for particle beam therapy a particle beam; the scanning device deflects the particle beam in two directions perpendicular to a direction in which the beam travels, and scans the particle beam at an arrangement position of the irradiation target; and the beam transport device emits the particle The beam is transported to the scanning device; the measuring device measures the particle beam information of the particle beam generated by the particle beam generating device; and the linear amount distribution calculating device is calculated by the particle beam to impart the aforementioned irradiation The illumination line quantity distribution of the object and the difference in the line quantity distribution belonging to the difference between the illumination line quantity distribution and the target line quantity distribution; the particle beam information includes the beam amount, the energy, and the beam central axis position of the particle beam; the aforementioned line quantity distribution calculation The device system includes: a beam information memory unit, and the memory is measured by the foregoing measuring device The measurement of the particle beam information; the total line amount calculation unit calculates the radiation line quantity distribution based on the measured particle beam information; and the plan line quantity comparison unit calculates the difference of the line quantity distribution; the beam information memory part includes: The measuring energy memory unit memorizes the measured energy obtained by measuring the energy of the particle beam at a plurality of times; measuring the central axis of the beam, and measuring the central axis of the beam Position, the measurement beam center axis position is obtained by measuring the beam center axis position of the particle beam according to the deflection information of the beam deflected by the scanning device at a plurality of times; and measuring the beam amount memory portion, The measured beam amount obtained by measuring the beam amount of the particle beam at a plurality of times is memorized; the total line amount calculation unit multiplies the number of irradiated particles by the unit particle beam amount in all time intervals. The interval line quantity is added to calculate the line amount of the calculation target point of the irradiation target, wherein the number of the irradiation particles is the aforementioned measurement energy and the aforementioned measurement beam amount in the same section of the time interval in which the particle beam information is measured. And the unit particle beam amount is a line amount given by one of the particle beams obtained based on the measured energy in the same interval of the time interval and the position of the measurement beam central axis; The particle beam therapy device is based on the calculation of the treatment plan device in the second and subsequent treatment irradiations. The difference in the amount of line distribution is controlled by the corrected control data of the corrected beam amount. 如申請專利範圍第1項所述之粒子射線治療裝置,其中,前述線量分布演算裝置具備資料庫,該資料庫記憶有:比例係數,係對於前述粒子射束之射束量之粒子數的比;z方向線量分布,係前述粒子射束的行進方向之線量分布;x方向線量分布,係與前述粒子射束的行進方向垂直之x方向的線量分布;以及y方向線量 分布,係與前述粒子射束的行進方向及前述x方向垂直之y方向的線量分布;前述合計線量演算部係將從前述比例係數對應前述測量能量而選擇之選擇比例係數與前述測量射束能量相乘,而求出前述照射粒子數,在求取前述單位粒子射線量時,係藉由將以下線量相乘而求出前述單位粒子線量:從前述z方向線量分布對應於前述測量能量而選擇之選擇z方向線量;從前述x方向線量分布對應於前述測量射束中心軸位置之前述x方向的位置及前述測量能量而選擇之選擇x方向線量;以及從前述y方向線量分布對應於前述測量射束中心軸位置之前述y方向的位置及前述測量能量而選擇之選擇y方向線量。 The particle beam therapy device according to claim 1, wherein the linear quantity distribution calculation device includes a database that stores a ratio coefficient, which is a ratio of a particle amount of the beam amount of the particle beam. The z-direction line quantity distribution is a line quantity distribution of the traveling direction of the particle beam; the x-direction line quantity distribution is a line quantity distribution in the x direction perpendicular to the traveling direction of the particle beam; and the y-direction line quantity a distribution is a linear quantity distribution in a y direction perpendicular to a traveling direction of the particle beam and the x direction, and the total line amount calculating unit selects a selected proportional coefficient and the measured beam energy from the measurement coefficient corresponding to the measured energy. The number of the irradiated particles is multiplied, and when the unit particle beam amount is obtained, the unit particle amount is obtained by multiplying the following line amounts: the z-direction line amount distribution is selected in accordance with the measured energy. Selecting a z-direction line quantity; selecting a x-direction line quantity from the x-direction line quantity distribution corresponding to the position of the x-direction of the measurement beam central axis position and the aforementioned measurement energy; and the line quantity distribution from the y-direction corresponding to the aforementioned measurement The y-direction line amount is selected by selecting the position of the beam center axis position in the y direction and the aforementioned measurement energy. 如申請專利範圍第2項所述之粒子射線治療裝置,其中,前述資料庫係記憶有屬於前述掃描裝置之前述粒子射束的前述x方向的偏向角之x方向偏向角,以及屬於前述掃描裝置之前述粒子射束的前述y方向的偏向角之y方向偏向角;前述合計線量演算部係在選擇前述選擇x方向線量時,依據從前述x方向偏向角對應於前述測量射束中心軸位置之前述x方向的位置及前述測量能量而選擇 之選擇x方向偏向角,而演算x座標;並且從前述x方向線量分布選擇對應於前述x座標之線量作為前述選擇x方向線量;前述合計線量演算部係在選擇前述選擇y方向線量時,依據從前述y方向偏向角對應於前述測量射束中心軸位置之前述y方向的位置及前述測量能量而選擇之選擇y方向偏向角,而演算y座標;並且從前述y方向線量分布選擇對應於前述y座標之線量作為前述選擇y方向線量。 The particle beam therapy apparatus according to claim 2, wherein the database stores an x-direction deflection angle of a deflection angle of the x-direction of the particle beam belonging to the scanning device, and belongs to the scanning device a y-direction deflection angle of the deflection angle of the particle beam in the y direction; wherein the total line amount calculation unit selects the selected x-direction line amount, and the deflection angle from the x direction corresponds to the measurement beam central axis position Selecting the position in the x direction and the aforementioned measurement energy Selecting the x-direction deflection angle to calculate the x-coordinate; and selecting the line amount corresponding to the x-coordinate from the x-direction line quantity distribution as the selected x-direction line quantity; the total line quantity calculation unit is based on selecting the selected y-direction line quantity, Determining the y coordinate from the y-direction deflection angle corresponding to the position of the aforementioned y-direction of the measurement beam central axis position and the selected measurement energy, and calculating the y-coordinate; and selecting the y-direction line quantity distribution corresponding to the foregoing The line amount of the y coordinate is used as the aforementioned y direction line amount. 一種治療計畫修正方法,係修正粒子射線治療計畫者,該粒子射線治療計畫係將粒子射線治療所需之線量分割成複數次而藉由粒子射線治療裝置賦予照射對象之治療計畫,該治療計畫修正方法係包括以下步驟:治療資料測量步驟,係於複數個時刻測量前述粒子射線治療裝置所產生之粒子射束的粒子射束資訊,並收集測量粒子射束資訊;合計線量分布演算步驟,係依據前述粒子射束資訊被測量之每個時間區間之前述粒子射束資訊,演算由前述粒子射束對前述照射對象賦予之照射線量分布;線量分布差異演算步驟,係演算屬於前述照射線量分布與目標線量分布的差異之線量分布差異;以及治療計畫修正步驟,係演算將前述線量分布差異 予以修正之修正射束量;前述粒子射束資訊係包含前述粒子射束之射束量、能量以及射束中心軸位置;前述測量粒子射束資訊係包含測量射束量、測量能量以及依據前述掃描裝置所偏向之前述射束的偏向資訊而測量出之測量射束中心軸位置;於前述合計線量分布演算步驟中,藉由在全部的時間區間將照射粒子數與單位粒子射線量相乘之時間區間線量予以加總,而演算前述照射對象的演算對象點之線量,其中,該照射粒子數係依據前述時間區間的相同區間中之前述測量能量及前述測量射束量而求得者,該單位粒子射線量為依據在前述時間區間的相同區間中之前述測量能量及前述測量射束中心軸位置而求得之由前述粒子射束中之一個粒子所賦予之線量。 A treatment plan correction method is a modified particle beam therapy program that divides a line amount required for particle beam therapy into a plurality of times and provides a treatment plan for an object to be irradiated by a particle beam therapy device. The treatment plan correction method comprises the following steps: a therapeutic data measuring step of measuring particle beam information of the particle beam generated by the particle beam therapy device at a plurality of times, and collecting measurement beam beam information; total line quantity distribution The calculation step is based on the particle beam information in each time interval in which the particle beam information is measured, and calculates an illumination line quantity distribution given by the particle beam to the illumination object; the line quantity distribution difference calculation step is performed by the calculation The difference in the linear quantity distribution between the distribution of the illumination line quantity and the target line quantity distribution; and the treatment plan correction step, which is the calculus of the difference in the aforementioned line quantity distribution Correcting the corrected beam amount; the particle beam information includes a beam amount, an energy, and a beam center axis position of the particle beam; the measuring particle beam information includes measuring a beam amount, measuring energy, and according to the foregoing The measurement beam center axis position is measured by the deflection information of the beam deflected by the scanning device; in the total line quantity distribution calculation step, the number of the irradiation particles is multiplied by the unit particle beam amount in all time intervals The time interval line amount is added to calculate a line amount of the calculation target point of the irradiation target, wherein the number of the irradiation particles is obtained based on the measurement energy and the measurement beam amount in the same section of the time interval, The unit particle beam amount is a line amount given by one of the particle beams obtained based on the measured energy in the same section of the time interval and the position of the measurement beam central axis.
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