TWI602095B - Touch display device - Google Patents

Touch display device Download PDF

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Publication number
TWI602095B
TWI602095B TW105119075A TW105119075A TWI602095B TW I602095 B TWI602095 B TW I602095B TW 105119075 A TW105119075 A TW 105119075A TW 105119075 A TW105119075 A TW 105119075A TW I602095 B TWI602095 B TW I602095B
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TW
Taiwan
Prior art keywords
electrode
display device
touch display
substrate
touch
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Application number
TW105119075A
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Chinese (zh)
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TW201738708A (en
Inventor
蔡嘉豪
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群創光電股份有限公司
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Priority to US15/489,028 priority Critical patent/US20170300160A1/en
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Publication of TWI602095B publication Critical patent/TWI602095B/en
Publication of TW201738708A publication Critical patent/TW201738708A/en

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    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/0414Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means using force sensing means to determine a position

Description

觸控顯示裝置 Touch display device

本揭露實施例係有關於觸控顯示裝置,且特別係有關於一種具有壓力感測功能的之觸控顯示裝置。 The disclosed embodiments relate to a touch display device, and in particular to a touch display device having a pressure sensing function.

觸控顯示裝置已被廣泛地應用在各式電子產品當中,像是智慧型手機、平板電腦、筆電等等。為提升使用者體驗,市面上更提出一種具備壓力感測功能的觸控顯示裝置。此種觸控顯示裝置除了可感測手指/觸控筆在觸控平面上移動的軌跡,更可回應於不同的按壓力道而觸發相應的操作。然而,此種觸控顯示裝置往往需額外將壓力感測器疊構於面板的背面,使得相關零組件之成本及製造難度增加,更可能導致面板厚度的提高或影響液晶顯示面板的穿透率。 Touch display devices have been widely used in various electronic products, such as smart phones, tablets, notebooks and so on. In order to enhance the user experience, a touch display device with a pressure sensing function has been proposed on the market. In addition to sensing the trajectory of the finger/stylus moving on the touch plane, the touch display device can trigger corresponding operations in response to different pressure strokes. However, such a touch display device often requires an additional pressure sensor to be stacked on the back side of the panel, which increases the cost and manufacturing difficulty of the related components, and is more likely to cause an increase in the thickness of the panel or affect the transmittance of the liquid crystal display panel. .

因此,如何改善具備壓力感測功能的觸控顯示裝置的性能並降低其製造成本,乃目前業界所致力的課題之一。 Therefore, how to improve the performance of the touch display device with the pressure sensing function and reduce the manufacturing cost thereof is one of the problems that the industry is currently focusing on.

本揭露之一些實施例提供一種觸控顯示裝置,包括:第一基板,包括多個畫素及多個電晶體;第二基板,與第一基板相對設置;第一電極,形成於第一基板之上,用以偵測平面觸控事件;第二電極,形成於第一基板之上,且與第一電極電性 隔離;及第三電極,形成於第二基板之上,其中第二電極與第三電極係用以偵測按壓觸控事件。 Some embodiments of the present disclosure provide a touch display device including: a first substrate including a plurality of pixels and a plurality of transistors; a second substrate disposed opposite to the first substrate; and a first electrode formed on the first substrate The second electrode is formed on the first substrate and electrically connected to the first electrode. The third electrode is formed on the second substrate, wherein the second electrode and the third electrode are used to detect a pressing touch event.

為讓本揭露實施例之特徵、和優點能更明顯易懂,下文特舉出較佳實施例,並配合所附圖式,作詳細說明如下。 The features and advantages of the embodiments of the present invention will be more apparent and understood.

EL1‧‧‧第一電極 EL1‧‧‧ first electrode

EL2‧‧‧第二電極 EL2‧‧‧second electrode

EL3‧‧‧第三電極 EL3‧‧‧ third electrode

MT1‧‧‧金屬導線 MT1‧‧‧Metal wire

MT2‧‧‧金屬導線 MT2‧‧‧Metal wire

VH1‧‧‧連接孔 VH1‧‧‧ connection hole

VH2‧‧‧連接孔 VH2‧‧‧ connection hole

VH3‧‧‧連接孔 VH3‧‧‧ connection hole

100‧‧‧觸控顯示裝置 100‧‧‧Touch display device

101A‧‧‧顯示區 101A‧‧‧ display area

101B‧‧‧非顯示區 101B‧‧‧Non-display area

102‧‧‧基板 102‧‧‧Substrate

104‧‧‧薄膜電晶體 104‧‧‧film transistor

106‧‧‧閘極電極 106‧‧‧gate electrode

108‧‧‧閘極介電層 108‧‧‧ gate dielectric layer

110‧‧‧半導體層 110‧‧‧Semiconductor layer

112‧‧‧源極電極 112‧‧‧Source electrode

114‧‧‧汲極電極 114‧‧‧汲electrode

116‧‧‧第一絕緣層 116‧‧‧First insulation

118‧‧‧第二絕緣層 118‧‧‧Second insulation

118S‧‧‧表面 118S‧‧‧ surface

120‧‧‧連接孔 120‧‧‧connection hole

122‧‧‧連接孔 122‧‧‧connection hole

124‧‧‧畫素電極 124‧‧‧pixel electrodes

126‧‧‧第三絕緣層 126‧‧‧ third insulation

128‧‧‧第四絕緣層 128‧‧‧fourth insulation

130‧‧‧顯示介質 130‧‧‧Display media

132‧‧‧基板 132‧‧‧Substrate

134‧‧‧遮光層 134‧‧‧ shading layer

136‧‧‧彩色濾光層 136‧‧‧Color filter layer

138‧‧‧保護層 138‧‧‧protection layer

140‧‧‧間隔物 140‧‧‧ spacers

142‧‧‧連接元件 142‧‧‧Connecting components

144‧‧‧介電層 144‧‧‧ dielectric layer

146‧‧‧彩色濾光層基板 146‧‧‧Color filter substrate

148‧‧‧介電層 148‧‧‧ dielectric layer

150‧‧‧保護玻璃 150‧‧‧protective glass

152‧‧‧次畫素 152‧‧‧ pixels

154‧‧‧資料線 154‧‧‧Information line

156‧‧‧閘極線 156‧‧ ‧ gate line

600‧‧‧觸控顯示裝置 600‧‧‧Touch display device

700‧‧‧觸控顯示裝置 700‧‧‧Touch display device

800‧‧‧觸控顯示裝置 800‧‧‧Touch display device

800’‧‧‧觸控顯示裝置 800'‧‧‧ touch display device

900‧‧‧觸控顯示裝置 900‧‧‧Touch display device

20‧‧‧控制器 20‧‧‧ Controller

30‧‧‧控制器 30‧‧‧ Controller

40‧‧‧控制器 40‧‧‧ Controller

50‧‧‧控制器 50‧‧‧ Controller

M1‧‧‧第一導電層 M1‧‧‧ first conductive layer

M2‧‧‧第二導電層 M2‧‧‧Second conductive layer

M3‧‧‧第三導電層 M3‧‧‧ third conductive layer

M4‧‧‧第四導電層 M4‧‧‧4th conductive layer

GP‧‧‧間隙 GP‧‧‧ gap

GP1‧‧‧間隙 GP1‧‧‧ gap

GP2‧‧‧間隙 GP2‧‧‧ gap

1B-1B‧‧‧線段 1B-1B‧‧‧ line segment

d‧‧‧間隙 D‧‧‧ gap

df‧‧‧間隙 Df‧‧‧ gap

d1‧‧‧間隙 D1‧‧‧ gap

df1‧‧‧間隙 Df1‧‧‧ gap

Cp‧‧‧電容 Cp‧‧‧ capacitor

Cf‧‧‧電容 Cf‧‧‧ capacitor

Cp1‧‧‧電容 Cp1‧‧‧ capacitor

Cf1‧‧‧電容 Cf1‧‧‧ capacitor

Ctp‧‧‧電容 Ctp‧‧‧ capacitor

Cfb‧‧‧迴授電容 Cfb‧‧‧ feedback capacitor

SB1‧‧‧第一基板 SB1‧‧‧ first substrate

SB2‧‧‧第二基板 SB2‧‧‧second substrate

SB2T‧‧‧上表面 SB2T‧‧‧ upper surface

A1‧‧‧方向 A1‧‧ Direction

A2‧‧‧方向 A2‧‧‧ direction

Vdd‧‧‧電源 Vdd‧‧‧ power supply

SW1‧‧‧開關 SW1‧‧‧ switch

SW2‧‧‧開關 SW2‧‧‧ switch

Amp‧‧‧放大器 Amp‧‧Amplifier

Vref‧‧‧參考電壓 Vref‧‧‧reference voltage

Vout‧‧‧感測輸出訊號 Vout‧‧‧Sensing output signal

Rtp‧‧‧電阻 Rtp‧‧‧ resistance

OB‧‧‧物體 OB‧‧‧ objects

L0‧‧‧訊號值 L0‧‧‧ signal value

L1‧‧‧訊號值 L1‧‧‧ signal value

L2‧‧‧訊號值 L2‧‧‧ signal value

TH1‧‧‧閥值 TH1‧‧‧ threshold

TH2‧‧‧閥值 TH2‧‧‧ threshold

Tx1‧‧‧傳送電極 Tx1‧‧‧Transfer electrode

Tx2‧‧‧傳送電極 Tx2‧‧‧Transfer electrode

Txn‧‧‧傳送電極 Txn‧‧‧Transfer electrode

TU‧‧‧傳送電極單元 TU‧‧‧Transfer electrode unit

BG‧‧‧橋接結構 BG‧‧‧Bridge structure

第1A圖係根據本揭露一些實施例之觸控顯示裝置之上視圖。 FIG. 1A is a top view of a touch display device according to some embodiments of the present disclosure.

第1B圖係根據本揭露一些實施例之觸控顯示裝置之剖面圖。 1B is a cross-sectional view of a touch display device in accordance with some embodiments of the present disclosure.

第2A圖係根據本揭露一些實施例之第一電極與第二電極之上視圖。 2A is a top view of a first electrode and a second electrode in accordance with some embodiments of the present disclosure.

第2B圖係根據本揭露另外一些實施例之第一電極與第二電極之上視圖。 2B is a top view of the first electrode and the second electrode in accordance with still other embodiments of the present disclosure.

第2C圖係根據本揭露另外一些實施例之第一電極與第二電極之上視圖。 2C is a top view of the first electrode and the second electrode in accordance with further embodiments of the present disclosure.

第2D圖係根據本揭露另外一些實施例之第一電極與第二電極之上視圖。 2D is a top view of a first electrode and a second electrode in accordance with further embodiments of the present disclosure.

第3A圖係根據本揭露一些實施例之第三電極之上視圖。 3A is a top view of a third electrode in accordance with some embodiments of the present disclosure.

第3B圖係根據本揭露另外一些實施例之第三電極之上視圖。 Figure 3B is a top view of a third electrode in accordance with further embodiments of the present disclosure.

第3C圖係根據本揭露另外一些實施例之第三電極之上視圖。 3C is a top view of a third electrode in accordance with further embodiments of the present disclosure.

第4A圖係根據本揭露一些實施例之觸控顯示裝置之剖面圖。 4A is a cross-sectional view of a touch display device in accordance with some embodiments of the present disclosure.

第4B圖繪示第4A圖之觸控顯示裝置之相關等效電路圖。 FIG. 4B is a diagram showing a related equivalent circuit diagram of the touch display device of FIG. 4A.

第4C圖係根據本揭露一些實施例之觸控顯示裝置之剖面圖。 4C is a cross-sectional view of a touch display device in accordance with some embodiments of the present disclosure.

第4D圖繪示第4C圖之觸控顯示裝置之相關等效電路圖。 FIG. 4D is a diagram showing a related equivalent circuit diagram of the touch display device of FIG. 4C.

第4E圖係根據本揭露一些實施例之感測輸出訊號之波形圖。 Figure 4E is a waveform diagram of a sensed output signal in accordance with some embodiments of the present disclosure.

第4F圖係根據本揭露一些實施例之觸控顯示裝置之剖面圖。 FIG. 4F is a cross-sectional view of a touch display device according to some embodiments of the present disclosure.

第4G圖繪示第4F圖之觸控顯示裝置之相關等效電路圖。 FIG. 4G is a diagram showing a related equivalent circuit diagram of the touch display device of FIG. 4F.

第5A圖係根據本揭露一些實施例之觸控顯示裝置之剖面圖。 FIG. 5A is a cross-sectional view of a touch display device according to some embodiments of the present disclosure.

第5B圖繪示第5A圖之觸控顯示裝置之相關等效電路圖。 FIG. 5B is a diagram showing a related equivalent circuit diagram of the touch display device of FIG. 5A.

第5C圖係根據本揭露明一些實施例之觸控顯示裝置之剖面圖。 FIG. 5C is a cross-sectional view of a touch display device according to some embodiments of the present disclosure.

第5D圖繪示第5C圖之觸控顯示裝置之相關等效電路圖。 FIG. 5D is a diagram showing an equivalent circuit diagram of the touch display device of FIG. 5C.

第5E圖係根據本揭露一些實施例之感測輸出訊號之波形圖。 Figure 5E is a waveform diagram of a sensed output signal in accordance with some embodiments of the present disclosure.

第6圖係根據本揭露另外一些實施例之觸控顯示裝置之剖面圖。 Figure 6 is a cross-sectional view of a touch display device in accordance with still other embodiments of the present disclosure.

第7圖係根據本揭露另外一些實施例之觸控顯示裝置之剖面圖。 Figure 7 is a cross-sectional view of a touch display device in accordance with still other embodiments of the present disclosure.

第8A圖係根據本揭露另外一些實施例之觸控顯示裝置之上視圖。 FIG. 8A is a top view of a touch display device according to other embodiments of the present disclosure.

第8B圖係根據本揭露另外一些實施例之觸控顯示裝置之剖面圖。 FIG. 8B is a cross-sectional view of a touch display device according to other embodiments of the present disclosure.

第8C圖係根據本揭露另外一些實施例之觸控顯示裝置之上視圖。 FIG. 8C is a top view of a touch display device according to other embodiments of the present disclosure.

第9A圖係根據本揭露另外一些實施例之觸控顯示裝置之上 視圖。 9A is a touch display device according to other embodiments of the present disclosure. view.

第9B圖係根據本揭露另外一些實施例之觸控顯示裝置之剖面圖。 FIG. 9B is a cross-sectional view of a touch display device according to other embodiments of the present disclosure.

第9C圖係根據本揭露另外一些實施例之觸控顯示裝置之上視圖。 FIG. 9C is a top view of a touch display device according to other embodiments of the present disclosure.

以下針對本揭露一些實施例之觸控顯示裝置作詳細說明。應了解的是,以下之敘述提供許多不同的實施例或例子,用以實施本揭露一些實施例之不同樣態。以下所述特定的元件及排列方式僅為簡單清楚描述本揭露一些實施例。當然,這些僅用以舉例而非本揭露之限定。此外,在不同實施例中可能使用重複的標號或標示。這些重複僅為了簡單清楚地敘述本揭露一些實施例,不代表所討論之不同實施例及/或結構之間具有任何關連性。再者,當述及一第一材料層位於一第二材料層上或之上時,包括第一材料層與第二材料層直接接觸之情形。或者,亦可能間隔有一或更多其它材料層之情形,在此情形中,第一材料層與第二材料層之間可能不直接接觸。 The touch display device of some embodiments of the present disclosure is described in detail below. It will be appreciated that the following description provides many different embodiments or examples for implementing the various embodiments of the present disclosure. The specific elements and arrangements described below are merely illustrative of some embodiments of the present disclosure. Of course, these are only used as examples and not as a limitation of the disclosure. Moreover, repeated numbers or labels may be used in different embodiments. These repetitive examples are merely illustrative of some embodiments of the present disclosure and are not intended to represent any of the various embodiments and/or structures discussed. Furthermore, when a first material layer is on or above a second material layer, the first material layer is in direct contact with the second material layer. Alternatively, it is also possible to have one or more layers of other materials interposed, in which case there may be no direct contact between the first layer of material and the second layer of material.

此外,實施例中可能使用相對性的用語,例如「較低」或「底部」及「較高」或「頂部」,以描述圖式的一個元件對於另一元件的相對關係。能理解的是,如果將圖式的裝置翻轉使其上下顛倒,則所敘述在「較低」側的元件將會成為在「較高」側的元件。 In addition, relative terms such as "lower" or "bottom" and "higher" or "top" may be used in the embodiments to describe the relative relationship of one element of the drawing to another. It will be understood that if the device of the drawing is flipped upside down, the component described on the "lower" side will become the component on the "higher" side.

在此,「約」、「大約」、「大抵」之用語通常表示在一給定值或範圍的20%之內,較佳是10%之內,且更佳是5%之內,或3%之內,或2%之內,或1%之內,或0.5%之內。在此給定的數量為大約的數量,亦即在沒有特定說明「約」、「大約」、「大抵」的情況下,仍可隱含「約」、「大約」、「大抵」之含義。 Here, the terms "about", "about" and "major" generally mean within 20% of a given value or range, preferably within 10%, and more preferably within 5%, or 3 Within %, or within 2%, or within 1%, or within 0.5%. The quantity given here is an approximate quantity, that is, in the absence of specific descriptions of "about", "about" and "major", the meanings of "about", "about" and "major" may still be implied.

能理解的是,雖然在此可使用用語「第一」、「第二」、「第三」等來敘述各種元件、組成成分、區域、層、及/或部分,這些元件、組成成分、區域、層、及/或部分不應被這些用語限定,且這些用語僅是用來區別不同的元件、組成成分、區域、層、及/或部分。因此,以下討論的一第一元件、組成成分、區域、層、及/或部分可在不偏離本揭露一些實施例之教示的情況下被稱為一第二元件、組成成分、區域、層、及/或部分。 It will be understood that the terms "first", "second", "third", etc. may be used herein to describe various elements, components, regions, layers, and/or portions, such elements, components, and regions. The layers, and/or portions are not to be limited by the terms, and the terms are used to distinguish different elements, components, regions, layers, and/or parts. Therefore, a first element, component, region, layer, and/or portion discussed below may be referred to as a second element, component, region, layer, without departing from the teachings of the disclosed embodiments. And / or part.

除非另外定義,在此使用的全部用語(包括技術及科學用語)具有與此篇發明所屬之一般技藝者所通常理解的相同涵義。能理解的是,這些用語,例如在通常使用的字典中定義的用語,應被解讀成具有與相關技術及本揭露的背景或上下文一致的意思,而不應以一理想化或過度正式的方式解讀,除非在本揭露實施例有特別定義。 Unless otherwise defined, all terms (including technical and scientific terms) used herein have the same meaning meaning It will be understood that these terms, such as those defined in commonly used dictionaries, should be interpreted as having a meaning consistent with the relevant art and the context or context of the present disclosure, and should not be in an idealized or overly formal manner. Interpretation, unless specifically defined in the disclosed embodiments.

本揭露一些實施例可配合圖式一併理解,本揭露實施例之圖式亦被視為發明說明之一部分。需了解的是,本揭露實施例之圖式並未以實際裝置及元件之比例繪示。在圖式中可能誇大實施例的形狀與厚度以便清楚表現出本揭露實施例之特徵。此外,圖式中之結構及裝置係以示意之方式繪示,以便清楚表現出本揭露實施例之特徵。 The embodiments of the present disclosure are also to be understood as part of the description of the invention. It should be understood that the drawings of the present embodiments are not to be The shapes and thicknesses of the embodiments may be exaggerated in the drawings in order to clearly illustrate the features of the disclosed embodiments. In addition, the structures and devices in the drawings are schematically illustrated in order to clearly illustrate the features of the disclosed embodiments.

在本揭露一些實施例中,相對性的用語例如「下」、「上」、「水平」、「垂直」、「之下」、「之上」、「頂部」、「底部」等等應被理解為該段以及相關圖式中所繪示的方位。此相對性的用語僅是為了方便說明之用,其並不代表其所敘述之裝置需以特定方位來製造或運作。而關於接合、連接之用語例如「連接」、「互連」等,除非特別定義,否則可指兩個結構係直接接觸,或者亦可指兩個結構並非直接接觸,其中有其它結構設於此兩個結構之間。且此關於接合、連接之用語亦可包括兩個結構都可移動,或者兩個結構都固定之情況。 In some embodiments of the disclosure, relative terms such as "down", "upper", "horizontal", "vertical", "below", "above", "top", "bottom", etc. should be It is understood to be the orientation depicted in this paragraph and related figures. This relative term is used for convenience of description only, and does not mean that the device described therein is to be manufactured or operated in a particular orientation. Terms such as "joining" and "interconnecting", etc., unless otherwise defined, may mean that two structures are in direct contact, or that two structures are not in direct contact, and other structures are provided here. Between the two structures. The term "joining and joining" may also include the case where both structures are movable or both structures are fixed.

應注意的是,在後文中「基板」一詞可包括透明基板上已形成的元件與覆蓋在基板上的各種膜層,其上方可以已形成任何所需的電晶體元件,不過此處為了簡化圖式,僅以平整的基板表示之。此外,「基板表面」係包括透明基板上最上方且暴露之膜層,例如一絕緣層及/或金屬線。 It should be noted that the term "substrate" may hereinafter include the formed elements on the transparent substrate and the various film layers overlying the substrate, and any desired transistor elements may have been formed thereon, but here to simplify The figure is shown only on a flat substrate. In addition, the "substrate surface" includes the uppermost and exposed film layer on the transparent substrate, such as an insulating layer and/or metal lines.

本揭露之一些實施例係於第一基板上同時設置用以偵測平面觸控事件之第一電極以及用以偵測按壓觸控事件之第二電極。透過此方式,觸控顯示裝置中將不需增設壓力感測器以專門感測按壓觸控事件,而控制器亦不用透過專屬的訊號通道以處理來自壓力感測器的壓力感測訊號。 Some embodiments of the present disclosure are configured to simultaneously provide a first electrode for detecting a planar touch event and a second electrode for detecting a touch event on the first substrate. In this way, the touch sensor device does not need to add a pressure sensor to specifically sense the pressing touch event, and the controller does not need to use a dedicated signal channel to process the pressure sensing signal from the pressure sensor.

此外,本揭露之一些實施例將上述用以偵測平面觸控事件之第一電極以及用以偵測按壓觸控事件之第二電極彼此電性隔離,使上述第一電極以及第二電極可藉由獨立且不同之訊號通道分別將平面觸控感測訊號及按壓觸控感測訊號傳遞至控制器。故本揭露一些實施例之控制器可藉由上述平面觸控感測訊號 單獨判斷平面觸控事件是否發生,並藉由上述按壓觸控感測訊號單獨判斷按壓觸控事件是否發生。 In addition, some embodiments of the present disclosure electrically isolate the first electrode for detecting a planar touch event and the second electrode for detecting a touch touch event, so that the first electrode and the second electrode are The planar touch sensing signal and the pressing touch sensing signal are respectively transmitted to the controller through independent and different signal channels. Therefore, the controller of some embodiments may be configured by the above planar touch sensing signal. Determine whether a flat touch event occurs, and determine whether a press touch event occurs by pressing the touch sensing signal.

此外,由於本揭露一些實施例之觸控顯示裝置可單獨判斷按壓觸控事件是否發生,故可使觸控顯示裝置之按壓感測更為精準,且可實現多點及多階之按壓觸控感測。 In addition, since the touch display device of some embodiments can separately determine whether a pressing touch event occurs, the touch sensing device can be more accurately sensed and can perform multi-point and multi-step pressing touch. Sensing.

首先,參見第1A-1B圖,第1A圖係根據本揭露一些實施例之觸控顯示裝置100之上視圖。第1B圖係沿著第1A圖之線段1B-1B’所繪製之剖面圖。如第1A-1B圖所示,根據本揭露一些實施例,觸控顯示裝置100包括第一基板SB1、第二基板SB2、設於第一基板SB1上之第一電極EL1及第二電極EL2、以及設於第二基板SB2上之第三電極EL3。 First, referring to FIG. 1A-1B, FIG. 1A is a top view of a touch display device 100 according to some embodiments of the present disclosure. Fig. 1B is a cross-sectional view taken along line 1B-1B' of Fig. 1A. As shown in FIG. 1A-1B, according to some embodiments of the present disclosure, the touch display device 100 includes a first substrate SB1, a second substrate SB2, and a first electrode EL1 and a second electrode EL2 disposed on the first substrate SB1. And a third electrode EL3 disposed on the second substrate SB2.

在本揭露之一些實施例中,第一基板SB1例如是薄膜電晶體(Thin-Film Transistor,TFT)基板,當中包括多個畫素及多個電晶體(未繪示於本圖)。第二基板SB2與第一基板SB1相對設置。在本揭露之一些實施例中,第二基板SB2例如是,但不限於,彩色濾光基板或透明基板。 In some embodiments of the present disclosure, the first substrate SB1 is, for example, a Thin-Film Transistor (TFT) substrate, and includes a plurality of pixels and a plurality of transistors (not shown in the figure). The second substrate SB2 is disposed opposite to the first substrate SB1. In some embodiments of the present disclosure, the second substrate SB2 is, for example, but not limited to, a color filter substrate or a transparent substrate.

如第1A-1B圖所示,根據一些實施例,第一電極EL1及第二電極EL2形成於第一基板SB1之上,並介於第一基板SB1與第二基板SB2之間。且第一電極EL1與第二電極EL2彼此電性隔離。 As shown in FIGS. 1A-1B, according to some embodiments, the first electrode EL1 and the second electrode EL2 are formed on the first substrate SB1 and interposed between the first substrate SB1 and the second substrate SB2. And the first electrode EL1 and the second electrode EL2 are electrically isolated from each other.

第一電極EL1及第二電極EL2的電壓係受控於觸控顯示裝置100中的控制器20,可於一控制週期內選擇性地作為第一基板SB1上之畫素的共同電極(common electrode)層,或是用以感測觸控事件的觸控電極層。舉例來說,控制器可在觸控顯示裝置 100操作於顯示模式時對第一電極層輸出第一訊號(如共同電壓),使第一電極EL1及第二電極EL2作為畫素之共同電極,並可在觸控顯示裝置100操作於觸控模式時對第一電極EL1及第二電極EL2輸出第二訊號(例如觸控感測脈衝),使第一電極EL1及第二電極EL2作為觸控電極。 The voltages of the first electrode EL1 and the second electrode EL2 are controlled by the controller 20 in the touch display device 100, and can be selectively used as a common electrode of the pixel on the first substrate SB1 in a control period. a layer or a touch electrode layer for sensing a touch event. For example, the controller can be in a touch display device The first signal EL1 and the second electrode EL2 are used as the common electrodes of the pixels, and the touch display device 100 is operated on the touch display device 100. In the mode, the first electrode EL1 and the second electrode EL2 output a second signal (for example, a touch sensing pulse), and the first electrode EL1 and the second electrode EL2 are used as the touch electrodes.

繼續參見第1A-1B圖所示,根據本揭露之一些實施例,第三電極EL3形成於第二基板SB2之上,並介於第一基板SB1與第二基板SB2之間。此外,第二基板SB2上之第三電極EL3係對應第一基板SB1上之第二電極EL2設置,以和第二電極EL2形成電容Cp。第三電極EL3的材料可以是透明導電材料或金屬材料。 Continuing to refer to FIGS. 1A-1B, according to some embodiments of the present disclosure, the third electrode EL3 is formed over the second substrate SB2 and between the first substrate SB1 and the second substrate SB2. Further, the third electrode EL3 on the second substrate SB2 is disposed corresponding to the second electrode EL2 on the first substrate SB1 to form a capacitance Cp with the second electrode EL2. The material of the third electrode EL3 may be a transparent conductive material or a metal material.

此外,在本揭露之一些實施例中,第一基板SB1上之第一電極EL1係用以偵測平面觸控事件,而第一基板SB1上之第二電極EL2與第二基板SB2上之第三電極EL3係用以偵測按壓觸控事件。 In addition, in some embodiments of the present disclosure, the first electrode EL1 on the first substrate SB1 is used to detect a planar touch event, and the second electrode EL2 on the first substrate SB1 and the second substrate SB2 are The three-electrode EL3 is used to detect a pressing touch event.

詳細而言,在第1A圖的實施例中,第一電極EL1及第二電極EL2係以自容式(self-capacitive)內嵌觸控(in cell)結構來實現。如第1A圖所示,第一基板SB1上設有多個第一電極EL1及第二電極EL2。多個第一電極EL1之間具有間隙GP,且上述多個第二電極EL2係設於此間隙GP中。各第一電極EL1透過一金屬導線MT1連接至控制器20。各第二電極EL2透過一金屬導線MT2連接至控制器20。各金屬導線MT1與MT2彼此之間係獨立的訊號源,故控制器20可透過金屬導線MT1來設定第一電極EL1的電壓位準,使其作為畫素之共同電極或平面觸控電極。且控制器20可透過金屬導線MT2來設定第二電極EL2的電壓位準,使其作為畫 素之共同電極或按壓觸控電極。 In detail, in the embodiment of FIG. 1A, the first electrode EL1 and the second electrode EL2 are realized by a self-capacity in-cell structure. As shown in FIG. 1A, a plurality of first electrodes EL1 and second electrodes EL2 are provided on the first substrate SB1. A gap GP is provided between the plurality of first electrodes EL1, and the plurality of second electrodes EL2 are disposed in the gap GP. Each of the first electrodes EL1 is connected to the controller 20 through a metal wire MT1. Each of the second electrodes EL2 is connected to the controller 20 through a metal wire MT2. Each of the metal wires MT1 and MT2 is independent of each other. Therefore, the controller 20 can set the voltage level of the first electrode EL1 through the metal wire MT1 to serve as a common electrode or a planar touch electrode of the pixel. And the controller 20 can set the voltage level of the second electrode EL2 through the metal wire MT2 to make it as a picture. The common electrode or the touch electrode.

金屬導線MT1及MT2與第一電極EL1及第二電極EL2可設置於兩不同層,且兩層之間係間隔一絕緣層。各金屬導線MT1與相應的第一電極EL1可透過連接孔VH1貫穿絕緣層以電性連接。而各金屬導線MT2與相應的第二電極EL2可透過連接孔VH2貫穿絕緣層以電性連接。 The metal wires MT1 and MT2 and the first electrode EL1 and the second electrode EL2 may be disposed in two different layers, and an insulating layer is spaced between the two layers. Each of the metal wires MT1 and the corresponding first electrode EL1 are electrically connected to the insulating layer through the connection hole VH1. The metal wires MT2 and the corresponding second electrodes EL2 are electrically connected to the insulating layer through the connection holes VH2.

當觸控顯示裝置操作於觸控模式時,控制器20可透過金屬導線MT1感應來自第一電極EL1的訊號變化,並基於所感應的訊號變化產生感測輸出訊號。藉由判斷感測輸出訊號的大小,控制器20可判斷是否發生平面觸控事件。 When the touch display device is operated in the touch mode, the controller 20 can sense the signal change from the first electrode EL1 through the metal wire MT1, and generate a sensing output signal based on the sensed signal change. By determining the magnitude of the sensed output signal, the controller 20 can determine whether a planar touch event has occurred.

詳細而言,當物件(例如手指、觸控筆或其它任何可用於進行觸控操作的物體)觸碰至第二基板SB2之上表面SB2T時,物件與第一電極EL1間會產生電容,使電性連接至此第一電極EL1之金屬導線MT1的電容增加。因此,控制器20感應到來自金屬導線MT1的訊號亦變大。若基於此變大的訊號所產生感測輸出訊號高於一預定之閥值,則控制器20可判斷有發生平面觸控事件。 In detail, when an object (such as a finger, a stylus, or any other object that can be used for a touch operation) touches the upper surface SB2T of the second substrate SB2, a capacitance is generated between the object and the first electrode EL1, so that a capacitance is generated. The capacitance of the metal wire MT1 electrically connected to the first electrode EL1 is increased. Therefore, the controller 20 senses that the signal from the metal wire MT1 also becomes large. If the sensed output signal generated based on the increased signal is higher than a predetermined threshold, the controller 20 can determine that a planar touch event has occurred.

此外,當觸控顯示裝置操作於按壓觸控模式時,控制器20可透過金屬導線MT2感應來自第二電極EL2的訊號變化,並基於所感應的訊號變化產生感測輸出訊號。藉由判斷感測輸出訊號的大小,控制器20可判斷是否發生按壓觸控事件。 In addition, when the touch display device is operated in the touch control mode, the controller 20 can sense the signal change from the second electrode EL2 through the metal wire MT2, and generate a sensing output signal based on the sensed signal change. By determining the magnitude of the sensed output signal, the controller 20 can determine whether a press touch event has occurred.

詳細而言,依據本揭露之實施例,第二、三電極層EL2、EL3間的間隙d會受到外力變化,例如當手指按壓基板造成間隙d下降時,將使得電容Cp的電容值變大,使電性連接至此第 二電極EL2之金屬導線MT2的電容增加。因此,控制器20感應到來自金屬導線MT2的訊號亦變大。若基於此變大的訊號所產生感測輸出訊號高於一預定之閥值,則控制器20可判斷所發生的觸控事件係一縱向(例如z方向)的按壓觸控事件(例如施加一定力道按壓觸控螢幕)。 In detail, according to the embodiment of the present disclosure, the gap d between the second and third electrode layers EL2 and EL3 is changed by an external force. For example, when the finger presses the substrate to cause the gap d to decrease, the capacitance value of the capacitor Cp is increased. Electrically connect to this The capacitance of the metal wire MT2 of the two electrodes EL2 is increased. Therefore, the controller 20 senses that the signal from the metal wire MT2 also becomes large. If the sensing output signal generated based on the increased signal is higher than a predetermined threshold, the controller 20 can determine that the touch event occurred is a vertical (eg, z-direction) pressing touch event (eg, applying a certain amount) Force the touch screen).

由上述可知,本揭露之一些實施例係於第一基板SB1上同時設置用以偵測平面觸控事件之第一電極EL1,以及用以偵測按壓觸控事件之第二電極EL2。透過此方式,觸控顯示裝置中將不需增設壓力感測器以專門感測按壓觸控事件,而控制器亦不用透過專屬的訊號通道以處理來自壓力感測器的壓力感測訊號。 As can be seen from the above, some embodiments of the present disclosure are provided with a first electrode EL1 for detecting a planar touch event and a second electrode EL2 for detecting a touch event. In this way, the touch sensor device does not need to add a pressure sensor to specifically sense the pressing touch event, and the controller does not need to use a dedicated signal channel to process the pressure sensing signal from the pressure sensor.

此外,本揭露之一些實施例將上述用以偵測平面觸控事件之第一電極EL1以及用以偵測按壓觸控事件之第二電極EL2彼此電性隔離,使上述第一電極EL1以及第二電極EL2可藉由獨立且不同之訊號通道(亦即上述金屬導線MT1與金屬導線MT2)分別將平面觸控感測訊號及按壓觸控感測訊號傳遞至控制器20。故本揭露一些實施例之控制器20可藉由上述平面觸控感測訊號單獨判斷平面觸控事件是否發生,並藉由上述按壓觸控感測訊號單獨判斷按壓觸控事件是否發生。 In addition, some embodiments of the present disclosure electrically isolate the first electrode EL1 for detecting a planar touch event and the second electrode EL2 for detecting a touch touch event, so that the first electrode EL1 and the first electrode The two electrodes EL2 can transmit the planar touch sensing signal and the pressing touch sensing signal to the controller 20 by independent and different signal channels (that is, the metal wire MT1 and the metal wire MT2). Therefore, the controller 20 of the embodiment may determine whether a planar touch event occurs by using the planar touch sensing signal, and determine whether the pressing touch event occurs by pressing the touch sensing signal.

此外,由於本揭露一些實施例之觸控顯示裝置100可單獨判斷按壓觸控事件是否發生,故可使觸控顯示裝置100之按壓感測更為精準,且可實現多點及多階之按壓觸控感測。 In addition, since the touch display device 100 of some embodiments can separately determine whether a pressing touch event occurs, the touch sensing device 100 can be more accurately sensed and can perform multi-point and multi-step pressing. Touch sensing.

繼續參見第1A-1B圖所示,根據本揭露之一些實施例,第三電極EL3不與第一電極EL1重疊,以避免第三電極EL3影響第一電極EL1之平面觸控偵測。 Continuing to refer to FIGS. 1A-1B , according to some embodiments of the present disclosure, the third electrode EL3 does not overlap with the first electrode EL1 to prevent the third electrode EL3 from affecting the planar touch detection of the first electrode EL1.

此外,應注意的是,雖然第1A-1B圖中一條第二電極EL2僅對應一條第三電極EL3,然而本揭露實施例並不以此為限。在本揭露其它一些實施例中,一條第二電極EL2可對應多條第三電極EL3,例如3至20條第三電極EL3。 In addition, it should be noted that although a second electrode EL2 in FIG. 1A-1B corresponds to only one third electrode EL3, the embodiment of the present disclosure is not limited thereto. In some other embodiments of the present disclosure, one second electrode EL2 may correspond to a plurality of third electrodes EL3, for example, 3 to 20 third electrodes EL3.

第2A-2D圖係根據本揭露一些實施例之第一電極與第二電極之不同配置的上視圖。如第2A圖所示,根據本揭露一些實施例,每一電晶體與資料線(未繪示於本圖)以及掃描線(未繪示於本圖)電性連接,其中資料線與掃描線交錯設置,且掃描線係沿著一第一方向A1延伸,而與此第一方向A1大抵垂直之方向為第二方向A2。在第2A圖所示之實施例中,第二電極EL2係設於平行於第一方向之間隙GP1中。 2A-2D is a top view of a different configuration of a first electrode and a second electrode in accordance with some embodiments of the present disclosure. As shown in FIG. 2A, according to some embodiments of the present disclosure, each of the transistors is electrically connected to a data line (not shown in the figure) and a scan line (not shown in the figure), wherein the data line and the scan line are electrically connected. Interlaced, and the scanning line extends along a first direction A1, and the direction perpendicular to the first direction A1 is a second direction A2. In the embodiment shown in Fig. 2A, the second electrode EL2 is disposed in the gap GP1 parallel to the first direction.

第2B圖係根據本揭露另外一些實施例之第一電極EL1與第二電極EL2之上視圖。在此實施例中,第二電極EL2係設於垂直於第一方向A1之間隙GP2中。如第2B圖所示,間隙GP2亦平行於第二方向A2。 2B is a top view of the first electrode EL1 and the second electrode EL2 according to other embodiments of the present disclosure. In this embodiment, the second electrode EL2 is disposed in the gap GP2 perpendicular to the first direction A1. As shown in FIG. 2B, the gap GP2 is also parallel to the second direction A2.

第2C圖係根據本揭露另外一些實施例之第一電極EL1與第二電極EL2之上視圖。在此實施例中,第二電極EL2同時設於平行於第一方向A1之間隙GP1以及垂直於第一方向A1之間隙GP2中。 2C is a top view of the first electrode EL1 and the second electrode EL2 according to other embodiments of the present disclosure. In this embodiment, the second electrode EL2 is simultaneously disposed in the gap GP1 parallel to the first direction A1 and the gap GP2 perpendicular to the first direction A1.

第2D圖係根據本揭露另外一些實施例之第一電極EL1與第二電極EL2之上視圖。在此實施例中,第一電極EL1與第二電極EL2重疊。在此實施例中,第一電極EL1與第二電極EL2可位於兩不同層,且兩層之間係間隔一絕緣層。 2D is a top view of the first electrode EL1 and the second electrode EL2 according to other embodiments of the present disclosure. In this embodiment, the first electrode EL1 overlaps with the second electrode EL2. In this embodiment, the first electrode EL1 and the second electrode EL2 may be located in two different layers, and an insulating layer is spaced between the two layers.

第3A-3C圖係根據本揭露一些實施例之第三電極EL3 之圖案的上視圖。以第3A圖為例,當第一基板SB1中的電晶體係與多條資料線(如第9C圖之資料線)以及掃描線(如第9C圖之掃描線)電性連接,且此些資料線與掃描線係交錯設置,第三電極EL3之電極圖案可與掃描線重疊或平行(如第3A圖所示)。易言之,在此實施例中,第三電極EL3之電極圖案平行於第一方向A1。 3A-3C is a third electrode EL3 according to some embodiments of the present disclosure The upper view of the pattern. Taking FIG. 3A as an example, when the electro-crystal system in the first substrate SB1 is electrically connected to a plurality of data lines (such as the data line of FIG. 9C) and the scan lines (such as the scan line of FIG. 9C), and The data lines are alternately arranged with the scanning lines, and the electrode patterns of the third electrode EL3 may overlap or be parallel to the scanning lines (as shown in FIG. 3A). In other words, in this embodiment, the electrode pattern of the third electrode EL3 is parallel to the first direction A1.

第3B圖係根據本揭露另外一些實施例之第三電極EL3之上視圖。在此實施例中,第三電極EL3之電極圖案與資料線重疊或平行。在本發明之一些實施例中,若資料線係沿著上述第二方向A2延伸,則第三電極EL3之電極圖案平行於第二方向A2。 3B is a top view of a third electrode EL3 in accordance with still other embodiments of the present disclosure. In this embodiment, the electrode pattern of the third electrode EL3 is overlapped or parallel to the data line. In some embodiments of the present invention, if the data line extends along the second direction A2, the electrode pattern of the third electrode EL3 is parallel to the second direction A2.

第3C圖係根據本揭露另外一些實施例之第三電極EL3之上視圖。在此實施例中,第三電極EL3同時與資料線以及掃描線重疊或平行以形成網格圖案。 3C is a top view of a third electrode EL3 in accordance with further embodiments of the present disclosure. In this embodiment, the third electrode EL3 is simultaneously overlapped or parallel with the data lines and the scan lines to form a grid pattern.

第4A圖係根據本發明一些實施例之觸控顯示裝置100之剖面圖。在本發明之一些實施例中,第4A圖例如為第2B圖於第二電極EL2處沿著第一方向A1之剖面圖。觸控顯示裝置100具有一顯示區101A及非顯示區101B。第一基板SB1可包括一基板102,此基板102可包括透明基板,例如為玻璃基板、陶瓷基板、塑膠基板或其它任何適合之基板。此外,第一基板SB1可包括薄膜電晶體104,此薄膜電晶體104包括設於此基板102上之閘極電極106,以及設於閘極電極106及基板102上之閘極介電層108。 4A is a cross-sectional view of a touch display device 100 in accordance with some embodiments of the present invention. In some embodiments of the present invention, FIG. 4A is, for example, a cross-sectional view of the second electrode EL2 along the first direction A1 in FIG. 2B. The touch display device 100 has a display area 101A and a non-display area 101B. The first substrate SB1 may include a substrate 102, which may include a transparent substrate, such as a glass substrate, a ceramic substrate, a plastic substrate, or any other suitable substrate. In addition, the first substrate SB1 may include a thin film transistor 104 including a gate electrode 106 disposed on the substrate 102, and a gate dielectric layer 108 disposed on the gate electrode 106 and the substrate 102.

此閘極電極106可為非晶矽、複晶矽、一或多種金屬、金屬氮化物、導電金屬氧化物、或上述之組合。上述金屬可包括但不限於鉬(molybdenum)、鎢(tungsten)、鈦(titanium)、鉭(tantalum)、鉑(platinum)或鉿(hafnium)。上述金屬氮化 物可包括但不限於氮化鉬(molybdenum nitride)、氮化鎢(tungsten nitride)、氮化鈦(titanium nitride)以及氮化鉭(tantalum nitride)。上述導電金屬氧化物可包括但不限於釕金屬氧化物(ruthenium oxide)以及銦錫金屬氧化物(indium tin oxide)。此閘極電極106可藉由前述之化學氣相沉積法(CVD)、濺鍍法、電阻加熱蒸鍍法、電子束蒸鍍法、或其它任何適合的沈積方式形成,例如,在一實施例中,可用低壓化學氣相沈積法(LPCVD)在525~650℃之間沈積而製得非晶矽導電材料層或複晶矽導電材料層,其厚度範圍可為約1000Å至約10000Å。 The gate electrode 106 can be an amorphous germanium, a germanium germanium, one or more metals, a metal nitride, a conductive metal oxide, or a combination thereof. The above metals may include, but are not limited to, molybdenum, tungsten, titanium, tantalum, platinum or hafnium. Metal nitridation Materials may include, but are not limited to, molybdenum nitride, tungsten nitride, titanium nitride, and tantalum nitride. The above conductive metal oxide may include, but is not limited to, ruthenium oxide and indium tin oxide. The gate electrode 106 can be formed by the aforementioned chemical vapor deposition (CVD), sputtering, resistance heating evaporation, electron beam evaporation, or any other suitable deposition method, for example, in an embodiment. The amorphous germanium conductive material layer or the polycrystalline germanium conductive material layer may be deposited by low pressure chemical vapor deposition (LPCVD) at a temperature between 525 and 650 ° C, and may have a thickness ranging from about 1000 Å to about 10000 Å.

此閘極介電層108可為氧化矽、氮化矽、氮氧化矽、高介電常數(high-k)介電材料、或其它任何適合之介電材料、或上述之組合。此高介電常數(high-k)介電材料之材料可為金屬氧化物、金屬氮化物、金屬矽化物、過渡金屬氧化物、過渡金屬氮化物、過渡金屬矽化物、金屬的氮氧化物、金屬鋁酸鹽、鋯矽酸鹽、鋯鋁酸鹽。例如,此高介電常數(high-k)介電材料可為LaO、AlO、ZrO、TiO、Ta2O5、Y2O3、SrTiO3(STO)、BaTiO3(BTO)、BaZrO、HfO2、HfO3、HfZrO、HfLaO、HfSiO、HfSiON、LaSiO、AlSiO、HfTaO、HfTiO、HfTaTiO、HfAlON、(Ba,Sr)TiO3(BST)、Al2O3、其它適當材料之其它高介電常數介電材料、或上述組合。此閘極介電層108可藉由化學氣相沉積法(CVD)或旋轉塗佈法形成,此化學氣相沉積法例如可為低壓化學氣相沉積法(low pressure chemical vapor deposition,LPCVD)、低溫化學氣相沉積法(low temperature chemical vapor deposition,LTCVD)、快速升溫化學氣相沉積法(rapid thermal chemical vapor deposition,RTCVD)、電漿輔助化學氣相沉積法(plasma enhanced chemical vapor deposition,PECVD)、原子層化學氣相沉積法之原子層沉積法(atomic layer deposition,ALD)或其它常用的方法。 The gate dielectric layer 108 can be hafnium oxide, tantalum nitride, hafnium oxynitride, a high-k dielectric material, or any other suitable dielectric material, or a combination thereof. The material of the high-k dielectric material may be a metal oxide, a metal nitride, a metal halide, a transition metal oxide, a transition metal nitride, a transition metal telluride, a metal oxynitride, Metal aluminate, zirconium silicate, zirconium aluminate. For example, the high-k dielectric material may be LaO, AlO, ZrO, TiO, Ta 2 O 5 , Y 2 O 3 , SrTiO 3 (STO), BaTiO 3 (BTO), BaZrO, HfO. 2 , HfO 3 , HfZrO, HfLaO, HfSiO, HfSiON, LaSiO, AlSiO, HfTaO, HfTiO, HfTaTiO, HfAlON, (Ba, Sr)TiO 3 (BST), Al 2 O 3 , other high dielectric constants of other suitable materials Dielectric material, or a combination of the above. The gate dielectric layer 108 can be formed by chemical vapor deposition (CVD) or spin coating. The chemical vapor deposition method can be, for example, low pressure chemical vapor deposition (LPCVD). Low temperature chemical vapor deposition (LTCVD), rapid thermal chemical vapor deposition (RTCVD), plasma enhanced chemical vapor deposition (PECVD) Atomic layer deposition (ALD) or other commonly used methods of atomic layer chemical vapor deposition.

此外,一第一導電層M1可與閘極電極106同時形成,且位於觸控顯示裝置100之非顯示區101B。 In addition, a first conductive layer M1 can be formed simultaneously with the gate electrode 106 and located in the non-display area 101B of the touch display device 100.

薄膜電晶體104更包括設於閘極介電層108上之半導體層110,此半導體層110與閘極電極106重疊,且源極電極112與汲極電極114係分別設於半導體層110之兩側,且分別與半導體層110兩側之部分重疊。 The thin film transistor 104 further includes a semiconductor layer 110 disposed on the gate dielectric layer 108. The semiconductor layer 110 overlaps the gate electrode 106, and the source electrode 112 and the drain electrode 114 are respectively disposed on the semiconductor layer 110. The sides overlap with portions of both sides of the semiconductor layer 110, respectively.

此半導體層110可包括元素半導體,包括矽、鍺(germanium);化合物半導體,包括氮化鎵(gallium nitride,GaN)、碳化矽(silicon carbide)、砷化鎵(gallium arsenide)、磷化鎵(gallium phosphide)、磷化銦(indium phosphide)、砷化銦(indium arsenide)及/或銻化銦(indium antimonide);合金半導體,包括矽鍺合金(SiGe)、磷砷鎵合金(GaAsP)、砷鋁銦合金(AlInAs)、砷鋁鎵合金(AlGaAs)、砷銦鎵合金(GaInAs)、磷銦鎵合金(GaInP)及/或磷砷銦鎵合金(GaInAsP)、氧化銦鎵鋅(InGaZnO)、非晶矽(A-Si)、低溫多晶矽(LTPS)或上述材料之組合。 The semiconductor layer 110 may include an elemental semiconductor including germanium, germanium; a compound semiconductor including gallium nitride (GaN), silicon carbide, gallium arsenide, gallium phosphide ( Gallium phosphide, indium phosphide, indium arsenide and/or indium antimonide; alloy semiconductors including bismuth alloy (SiGe), phosphorus gallium arsenide (GaAsP), arsenic Aluminum indium alloy (AlInAs), arsenic aluminum gallium alloy (AlGaAs), arsenic gallium alloy (GaInAs), indium gallium alloy (GaInP) and/or phosphorus indium gallium alloy (GaInAsP), indium gallium zinc oxide (InGaZnO), Amorphous germanium (A-Si), low temperature polycrystalline germanium (LTPS) or a combination of the above.

上述源極電極112與汲極電極114之材料可包括銅、鋁、鉬、鎢、金、鉻、鎳、鉑、鈦、銥、銠、上述之合金、上述之組合或其它導電性佳的金屬材料,例如可為鉬鋁鉬(Mo/Al/Mo)或鈦鋁鈦(Ti/Al/Ti)之三層結構。於其它實施例中,上述源極電 極112與汲極電極114之材料可為一非金屬材料,只要使用之材料具有導電性即可。此源極電極112與汲極電極114之材料可藉由前述之化學氣相沉積法(CVD)、濺鍍法、電阻加熱蒸鍍法、電子束蒸鍍法、或其它任何適合的沉積方式形成。在一些實施例中,上述源極電極112與汲極電極114之材料可相同,且可藉由同一道沈積步驟形成。然而,在其它實施例中,上述源極電極112與汲極電極114亦可藉由不同之沈積步驟形成,且其材料可彼此不同。 The material of the source electrode 112 and the drain electrode 114 may include copper, aluminum, molybdenum, tungsten, gold, chromium, nickel, platinum, titanium, niobium, tantalum, the above alloy, the above combination or other conductive metal. The material may be, for example, a three-layer structure of molybdenum aluminum molybdenum (Mo/Al/Mo) or titanium aluminum titanium (Ti/Al/Ti). In other embodiments, the source is electrically The material of the pole 112 and the drain electrode 114 may be a non-metallic material as long as the material used is electrically conductive. The material of the source electrode 112 and the drain electrode 114 can be formed by the aforementioned chemical vapor deposition (CVD), sputtering, resistance heating evaporation, electron beam evaporation, or any other suitable deposition method. . In some embodiments, the material of the source electrode 112 and the drain electrode 114 may be the same and may be formed by the same deposition step. However, in other embodiments, the source electrode 112 and the drain electrode 114 may be formed by different deposition steps, and the materials thereof may be different from each other.

此外,一第二導電層M2可與上述源極電極112與汲極電極114同時形成,且位於觸控顯示裝置100之非顯示區101B。此第二導電層M2電性連接至第一導電層M1。 In addition, a second conductive layer M2 can be formed simultaneously with the source electrode 112 and the drain electrode 114, and is located in the non-display area 101B of the touch display device 100. The second conductive layer M2 is electrically connected to the first conductive layer M1.

繼續參見第4A圖,第一基板SB1更包括覆蓋薄膜電晶體104與閘極介電層108之第一絕緣層116。此第一絕緣層116可為氮化矽、二氧化矽、或氮氧化矽。第一絕緣層116可藉由化學氣相沉積法(CVD)或旋轉塗佈法形成,此化學氣相沉積法例如可為低壓化學氣相沉積法(low pressure chemical vapor deposition,LPCVD)、低溫化學氣相沉積法(low temperature chemical vapor deposition,LTCVD)、快速升溫化學氣相沉積法(rapid thermal chemical vapor deposition,RTCVD)、電漿輔助化學氣相沉積法(plasma enhanced chemical vapor deposition,PECVD)、原子層化學氣相沉積法之原子層沉積法(atomic layer deposition,ALD)或其它常用的方法。 Continuing to refer to FIG. 4A, the first substrate SB1 further includes a first insulating layer 116 covering the thin film transistor 104 and the gate dielectric layer 108. The first insulating layer 116 may be tantalum nitride, hafnium oxide, or hafnium oxynitride. The first insulating layer 116 can be formed by chemical vapor deposition (CVD) or spin coating. The chemical vapor deposition method can be, for example, low pressure chemical vapor deposition (LPCVD), low temperature chemistry. Low temperature chemical vapor deposition (LTCVD), rapid thermal chemical vapor deposition (RTCVD), plasma enhanced chemical vapor deposition (PECVD), atom Atomic layer deposition (ALD) or other commonly used methods of layer chemical vapor deposition.

接著,此第一絕緣層116上可選擇性設有第二絕緣層118。此第二絕緣層118之材質可為有機之絕緣材料(光感性樹脂)或無機之絕緣材料(氮化矽、氧化矽、氮氧化矽、碳化矽、氧化 鋁、或上述材質之組合)。此外,可藉由兩次蝕刻步驟分別蝕刻上述第二絕緣層118與第一絕緣層116,以形成連接孔120及122。此連接孔120由第二絕緣層118之上表面118S向下延伸至汲極電極114,並暴露出汲極電極114。連接孔122由第二絕緣層118之上表面118S向下延伸至第二導電層M2,且暴露出第二導電層M2。 Then, a second insulating layer 118 is selectively disposed on the first insulating layer 116. The material of the second insulating layer 118 may be an organic insulating material (photosensitive resin) or an inorganic insulating material (tantalum nitride, hafnium oxide, antimony oxynitride, niobium carbide, oxidation). Aluminum, or a combination of the above materials). In addition, the second insulating layer 118 and the first insulating layer 116 may be respectively etched by two etching steps to form the connection holes 120 and 122. The connection hole 120 extends downward from the upper surface 118S of the second insulating layer 118 to the drain electrode 114 and exposes the drain electrode 114. The connection hole 122 extends downward from the upper surface 118S of the second insulating layer 118 to the second conductive layer M2, and exposes the second conductive layer M2.

繼續參見第4A圖,顯示裝置100更包括設於第二絕緣層118上之畫素電極124,此畫素電極124延伸入連接孔120中並電性連接薄膜電晶體104。此外,顯示裝置100更包括設於第二絕緣層118上之第三導電層M3。此第三導電層M3係位於觸控顯示裝置100之非顯示區101B,且透過連接孔122電性連接第二導電層M2。 Continuing to refer to FIG. 4A, the display device 100 further includes a pixel electrode 124 disposed on the second insulating layer 118. The pixel electrode 124 extends into the connection hole 120 and is electrically connected to the thin film transistor 104. In addition, the display device 100 further includes a third conductive layer M3 disposed on the second insulating layer 118. The third conductive layer M3 is located in the non-display area 101B of the touch display device 100, and is electrically connected to the second conductive layer M2 through the connection hole 122.

此第三導電層M3與畫素電極124之材料可相同,且可藉由同一道沈積與微影蝕刻步驟形成。此第三導電層M3與畫素電極124之材料可包括透明導電材料,例如為銦錫氧化物(ITO),氧化錫(SnO)、氧化銦鋅(IZO)、氧化銦鎵鋅(IGZO)、氧化銦錫鋅(ITZO)、氧化銻錫(ATO)、氧化銻鋅(AZO)、上述之組合或其它任何適合之透明導電氧化物材料。 The material of the third conductive layer M3 and the pixel electrode 124 can be the same, and can be formed by the same deposition and lithography etching step. The material of the third conductive layer M3 and the pixel electrode 124 may include a transparent conductive material such as indium tin oxide (ITO), tin oxide (SnO), indium zinc oxide (IZO), indium gallium zinc oxide (IGZO), Indium tin zinc oxide (ITZO), antimony tin oxide (ATO), antimony zinc oxide (AZO), combinations of the foregoing or any other suitable transparent conductive oxide material.

繼續參見第4A圖,顯示裝置100更包括設於第二絕緣層118上且覆蓋畫素電極124之第三絕緣層126。此第三絕緣層126可為氮化矽、二氧化矽、或氮氧化矽。 Continuing to refer to FIG. 4A, the display device 100 further includes a third insulating layer 126 disposed on the second insulating layer 118 and covering the pixel electrode 124. The third insulating layer 126 may be tantalum nitride, hafnium oxide, or hafnium oxynitride.

繼續參見第4A圖,顯示裝置100更包括設於第三絕緣層126上之金屬導線MT2。上述金屬導線MT2之材料可包括銅、鋁、鉬、鎢、金、鉻、鎳、鉑、鈦、銥、銠、上述之合金、上述之組合或其它導電性佳的金屬材料,例如可為鉬鋁鉬(Mo/Al/Mo)或鈦鋁鈦(Ti/Al/Ti)之三層結構。於其它實施例中,上述金屬導 線MT2之材料可為一非金屬材料,只要使用之材料具有導電性即可。此金屬導線MT2之材料可藉由前述之化學氣相沉積法(CVD)、濺鍍法、電阻加熱蒸鍍法、電子束蒸鍍法、或其它任何適合的沉積方式形成。 Continuing to refer to FIG. 4A, the display device 100 further includes a metal wire MT2 disposed on the third insulating layer 126. The material of the metal wire MT2 may include copper, aluminum, molybdenum, tungsten, gold, chromium, nickel, platinum, titanium, niobium, tantalum, the above alloy, the above combination or other conductive metal materials, for example, molybdenum. A three-layer structure of aluminum molybdenum (Mo/Al/Mo) or titanium aluminum titanium (Ti/Al/Ti). In other embodiments, the above metal guide The material of the wire MT2 may be a non-metallic material as long as the material used is electrically conductive. The material of the metal wire MT2 can be formed by the aforementioned chemical vapor deposition (CVD), sputtering, resistance heating evaporation, electron beam evaporation, or any other suitable deposition method.

繼續參見第4A圖,顯示裝置100更包括設於此第三絕緣層126上且覆蓋金屬導線MT2之第四絕緣層128。此第四絕緣層128可為氮化矽、二氧化矽、或氮氧化矽。 Continuing to refer to FIG. 4A, the display device 100 further includes a fourth insulating layer 128 disposed on the third insulating layer 126 and covering the metal wires MT2. The fourth insulating layer 128 may be tantalum nitride, hafnium oxide, or hafnium oxynitride.

繼續參見第4A圖,顯示裝置100更包括設於第四絕緣層128上且電性連接金屬導線MT2之第二電極EL2。此外,第四絕緣層128上更可設有一第四導電層M4,此第四導電層M4位於觸控顯示裝置100之非顯示區101B,且電性連接第三導電層M3。此第四導電層M4與第二電極EL2之材料可相同,且可藉由同一道沈積與微影蝕刻步驟形成。 Continuing to refer to FIG. 4A, the display device 100 further includes a second electrode EL2 disposed on the fourth insulating layer 128 and electrically connected to the metal wire MT2. In addition, a fourth conductive layer M4 is disposed on the fourth insulating layer 128. The fourth conductive layer M4 is located in the non-display area 101B of the touch display device 100, and is electrically connected to the third conductive layer M3. The material of the fourth conductive layer M4 and the second electrode EL2 may be the same, and may be formed by the same deposition and lithography etching step.

可對第二電極EL2進行圖案化使其形成狹縫(slit)以作為觸控顯示裝置100之共同電極及觸控電極。此外,第二電極EL2係透過連接孔VH2以連接至下層的金屬導線MT2。而第四導電層M4亦透過另一連接孔VH3。 The second electrode EL2 may be patterned to form a slit as a common electrode and a touch electrode of the touch display device 100. Further, the second electrode EL2 is transmitted through the connection hole VH2 to be connected to the metal wire MT2 of the lower layer. The fourth conductive layer M4 also passes through the other connection hole VH3.

此第二電極EL2與第四導電層M4之材料可包括透明導電材料,例如為銦錫氧化物(ITO)、氧化錫(SnO)、氧化銦鋅(IZO)、氧化銦鎵鋅(IGZO)、氧化銦錫鋅(ITZO)、氧化銻錫(ATO)、氧化銻鋅(AZO)、上述之組合或其它任何適合之透明導電氧化物材料。 The material of the second electrode EL2 and the fourth conductive layer M4 may include a transparent conductive material such as indium tin oxide (ITO), tin oxide (SnO), indium zinc oxide (IZO), indium gallium zinc oxide (IGZO), Indium tin zinc oxide (ITZO), antimony tin oxide (ATO), antimony zinc oxide (AZO), combinations of the foregoing or any other suitable transparent conductive oxide material.

此外,繼續參見第4A圖,顯示裝置100更包括相對第一基板SB1設置之第二基板SB2以及設於第一基板SB1與第二基 板SB2之間的顯示介質130。 In addition, referring to FIG. 4A, the display device 100 further includes a second substrate SB2 disposed opposite to the first substrate SB1 and a first substrate SB1 and a second base. Display medium 130 between boards SB2.

上述顯示裝置100可為觸控液晶顯示器,例如為薄膜電晶體液晶顯示器。或者,此液晶顯示器可為扭轉向列(Twisted Nematic,TN)型液晶顯示器、超扭轉向列(Super Twisted Nematic,STN)型液晶顯示器、雙層超扭轉向列(Double layer Super Twisted Nematic,DSTN)型液晶顯示器、垂直配向(Vertical Alignment,VA)型液晶顯示器、水平電場效應(In-Plane Switching,IPS)型液晶顯示器、膽固醇(Cholesteric)型液晶顯示器、藍相(Blue Phase)型液晶顯示器、邊際電場效應(FFS)型液晶顯示器、或其它任何適合之液晶顯示器。 The display device 100 can be a touch liquid crystal display, such as a thin film transistor liquid crystal display. Alternatively, the liquid crystal display can be a Twisted Nematic (TN) type liquid crystal display, a Super Twisted Nematic (STN) type liquid crystal display, or a Double Layer Super Twisted Nematic (DSTN). Liquid crystal display, Vertical Alignment (VA) type liquid crystal display, In-Plane Switching (IPS) type liquid crystal display, Cholesteric type liquid crystal display, Blue Phase type liquid crystal display, margin An electric field effect (FFS) type liquid crystal display, or any other suitable liquid crystal display.

在本揭露一些實施例中,顯示介質130可為液晶材料,此液晶材料可包括向列型液晶(nematic)、層列型液晶(smectic)、膽固醇液晶(cholesteric)、藍相液晶(Blue phase)或其它任何適合之液晶材料。在本揭露一些實施例中,顯示介質130可為有機發光二極體。 In some embodiments of the present disclosure, the display medium 130 may be a liquid crystal material, which may include nematic, smectic, cholesteric, blue phase. Or any other suitable liquid crystal material. In some embodiments of the present disclosure, display medium 130 can be an organic light emitting diode.

在一些實施例中,第二基板SB2為彩色濾光層基板。詳細而言,作為彩色濾光層基板之第二基板SB2可包括一基板132、設於此基板132上之遮光層134、設於此遮光層134及基板132上之彩色濾光層136、以及覆蓋遮光層134與彩色濾光層136之保護層138。 In some embodiments, the second substrate SB2 is a color filter layer substrate. In detail, the second substrate SB2 as the color filter layer substrate may include a substrate 132, a light shielding layer 134 disposed on the substrate 132, a color filter layer 136 disposed on the light shielding layer 134 and the substrate 132, and The protective layer 138 of the light shielding layer 134 and the color filter layer 136 is covered.

上述基板132可包括透明基板,例如可為玻璃基板、陶瓷基板、塑膠基板或其它任何適合之透明基板,上述遮光層134可包括黑色光阻、黑色印刷油墨、黑色樹脂。而上述彩色濾光層136可包括紅色濾光層、綠色濾光層、藍色濾光層、或其它任何適 合之彩色濾光層。 The substrate 132 may include a transparent substrate, such as a glass substrate, a ceramic substrate, a plastic substrate, or any other suitable transparent substrate. The light shielding layer 134 may include a black photoresist, a black printing ink, and a black resin. The color filter layer 136 may include a red filter layer, a green filter layer, a blue filter layer, or any other suitable Combined with a color filter layer.

顯示裝置100可更包括設於第一基板SB1與第二基板SB2之間的間隔物140,此間隔物140為用以間隔第一基板SB1與第二基板SB2之主要結構,以防止顯示裝置100被按壓時第一基板SB1與第二基板SB2接觸。 The display device 100 further includes a spacer 140 disposed between the first substrate SB1 and the second substrate SB2. The spacer 140 is a main structure for spacing the first substrate SB1 and the second substrate SB2 to prevent the display device 100. The first substrate SB1 is in contact with the second substrate SB2 when pressed.

繼續參見第4A圖所示,根據本揭露之一些實施例,第二基板SB2之保護層138上更設有第三電極EL3。此第三電極EL3之材料可包括透明導電材料及金屬材料。上述透明導電材料例如為銦錫氧化物(ITO)、氧化錫(SnO)、氧化銦鋅(IZO)、氧化銦鎵鋅(IGZO)、氧化銦錫鋅(ITZO)、氧化銻錫(ATO)、氧化銻鋅(AZO)、上述之組合或其它任何適合之透明導電氧化物材料。上述金屬材料可包括銅、鋁、鉬、鎢、金、鉻、鎳、鉑、鈦、銥、銠、上述之合金、上述之組合或其它導電性佳的金屬材料。 Continuing to refer to FIG. 4A, according to some embodiments of the present disclosure, the third electrode EL3 is further disposed on the protective layer 138 of the second substrate SB2. The material of the third electrode EL3 may include a transparent conductive material and a metal material. The transparent conductive material is, for example, indium tin oxide (ITO), tin oxide (SnO), indium zinc oxide (IZO), indium gallium zinc oxide (IGZO), indium tin zinc oxide (ITZO), antimony tin oxide (ATO), Zinc oxide oxide (AZO), combinations of the foregoing, or any other suitable transparent conductive oxide material. The above metal material may include copper, aluminum, molybdenum, tungsten, gold, chromium, nickel, platinum, titanium, niobium, tantalum, the above alloys, combinations thereof, or other highly conductive metal materials.

在本揭露之一些實施例中,第三電極EL3係介於遮光層134與第二電極EL2之間,並位於遮光層134所形成的光學遮蔽區內,但不以此為限,第三電極EL3亦可設置於遮光層134與第二基板SB2之間或是遮光層134與保護層138之間。 In some embodiments of the present disclosure, the third electrode EL3 is interposed between the light shielding layer 134 and the second electrode EL2, and is located in the optical shielding region formed by the light shielding layer 134, but not limited thereto, the third electrode The EL 3 may be disposed between the light shielding layer 134 and the second substrate SB2 or between the light shielding layer 134 and the protective layer 138.

之後,將第一基板SB1與第二基板SB2對組,即可在第二、三電極層EL2、EL3之間形成電容Cp,此電容Cp的電容值可隨按壓後的電極間距改變而變化。此外,如第4A圖所示,根據一些實施例,第二電極EL2係設於畫素電極124與第三電極EL3之間。 Thereafter, by pairing the first substrate SB1 and the second substrate SB2, a capacitance Cp can be formed between the second and third electrode layers EL2 and EL3, and the capacitance value of the capacitance Cp can be changed as the electrode spacing after pressing changes. Further, as shown in FIG. 4A, according to some embodiments, the second electrode EL2 is disposed between the pixel electrode 124 and the third electrode EL3.

在一些實施例中,觸控顯示裝置100更包括連接元件142,其位於觸控顯示裝置100的非顯示區101B。第三電極EL3可 透過此連接元件142、第四導電層M4、第三導電層M3、第二導電層M2及第一導電層M1電性連接至第一基板SB1。 In some embodiments, the touch display device 100 further includes a connection component 142 located in the non-display area 101B of the touch display device 100. The third electrode EL3 can The connecting member 142, the fourth conductive layer M4, the third conductive layer M3, the second conductive layer M2, and the first conductive layer M1 are electrically connected to the first substrate SB1.

連接元件142可以是金球(Au ball)、異方向性導電膠(Anisotropic Conductive Film,ACF)、銀膠(Silver glue)或其它導電材料。透過連接元件142,第三電極EL3的電壓可被設定。舉例來說,第三電極EL3之電壓可以是前述第一訊號之電壓(如共同電極電壓)、第二訊號之電壓(如感測訊號電壓)、接地電壓或其它特定電壓。或者,觸控顯示裝置100可不包括連接元件142,此時第三電極EL3的電壓處於浮接狀態。 The connecting member 142 may be an Au ball, an anisotropic conductive film (ACF), a silver glue or other conductive material. The voltage of the third electrode EL3 can be set through the connection element 142. For example, the voltage of the third electrode EL3 may be the voltage of the first signal (such as the common electrode voltage), the voltage of the second signal (such as the sensing signal voltage), the ground voltage or other specific voltage. Alternatively, the touch display device 100 may not include the connection element 142, and the voltage of the third electrode EL3 is in a floating state.

第4B圖繪示第4A圖之觸控顯示裝置100之相關等效電路圖。在此實施例中,金屬導線MT2的等效電阻為Rtp、沿其鋪設路徑上所看到的等效電容為Ctp(即,金屬導線MT2與其它電極/金屬層間所形成的電容總和),而金屬導線MT2在與第二電極EL2電性連接處更可看到電容Cp。控制器30包括第一開關SW1、第二開關SW2、放大器Amp以及迴授電容Cfb。第一開關SW1與第二開關SW2係交替地開啟/關閉以對電容Ctp及Cp充放電。進一步說,第一開關SW1的一端耦接電源Vdd,當第一開關SW1導通,第二開關SW2將會關閉,此時電源Vdd將對電容Ctp及Cp進行充電。反之,當第二開關SW2導通,第一開關SW1將會關閉,此時累積於電容Ctp及Cp的電荷將輸出至放大器Amp的其中一輸入端,放大器Amp的另一輸入端則例如耦接參考電壓Vref。放大器Amp的輸入與輸出端之間跨有迴授電容Cfb,以符合電路穩定性和頻寬考量。放大器Amp可回應於來自金屬導線MT2的訊號產生感測輸出訊號Vout。在無觸控事件發生時,感測輸出訊號Vout可表示如下: FIG. 4B is a diagram showing a related equivalent circuit diagram of the touch display device 100 of FIG. 4A. In this embodiment, the equivalent resistance of the metal wire MT2 is Rtp, and the equivalent capacitance seen along the laying path is Ctp (ie, the sum of capacitances formed between the metal wire MT2 and other electrode/metal layers), and The metal wire MT2 is more visible in the electrical connection with the second electrode EL2. The controller 30 includes a first switch SW1, a second switch SW2, an amplifier Amp, and a feedback capacitor Cfb. The first switch SW1 and the second switch SW2 are alternately turned on/off to charge and discharge the capacitors Ctp and Cp. Further, one end of the first switch SW1 is coupled to the power source Vdd. When the first switch SW1 is turned on, the second switch SW2 is turned off, and the power source Vdd will charge the capacitors Ctp and Cp. Conversely, when the second switch SW2 is turned on, the first switch SW1 will be turned off, at which time the charges accumulated in the capacitors Ctp and Cp will be output to one of the inputs of the amplifier Amp, and the other input of the amplifier Amp is, for example, coupled to the reference. Voltage Vref. A feedback capacitor Cfb is interposed between the input and output of the amplifier Amp to meet circuit stability and bandwidth considerations. The amplifier Amp can generate a sensed output signal Vout in response to a signal from the metal wire MT2. When no touch event occurs, the sensed output signal Vout can be expressed as follows:

其中n為感測週期的次數。 Where n is the number of sensing cycles.

接著,參見第4C圖,該圖係根據本發明一些實施例之當平面觸控事件發生於觸控顯示裝置100,而按壓觸控事件未發生之示意圖。 Next, referring to FIG. 4C, the figure is a schematic diagram of a touch-touch event occurring when the planar touch event occurs on the touch display device 100 according to some embodiments of the present invention.

如第4C圖所示,當物體OB(例如手指、觸控筆或其它任何可用於進行觸控操作的物體)碰觸觸控顯示裝置100時,物體OB與觸控顯示裝置100中的第二電極EL2之間會產生感應電容Cf。此時,相關的等效電路係如第4D圖所示,金屬導線MT2更看到感應電容Cf。因此,在單純平面觸控事件發生時,感測輸出訊號Vout可表示如下: As shown in FIG. 4C, when the object OB (for example, a finger, a stylus, or any other object that can be used for a touch operation) touches the touch display device 100, the object OB and the second of the touch display device 100 A sensing capacitor Cf is generated between the electrodes EL2. At this time, the relevant equivalent circuit is as shown in FIG. 4D, and the metal wire MT2 sees the sensing capacitor Cf more. Therefore, when a simple planar touch event occurs, the sensed output signal Vout can be expressed as follows:

由以上式2可知,當物體OB碰觸觸控顯示裝置100時,感測輸出訊號Vout會變大。亦即式2之感測輸出訊號Vout之值會大於式1之感測輸出訊號Vout之值。 As can be seen from the above formula 2, when the object OB touches the touch display device 100, the sense output signal Vout becomes large. That is, the value of the sense output signal Vout of Equation 2 is greater than the value of the sense output signal Vout of Equation 1.

參見第4E圖,該圖為根據本發明一些實施例之感測輸出訊號之波形圖。在本發明之一些實施例中,如第4E圖所示,控制器設一第一閥值TH1用以判斷有無發生按壓觸控事件。此第一閥值TH1例如對應訊號值300。 See Figure 4E, which is a waveform diagram of a sensed output signal in accordance with some embodiments of the present invention. In some embodiments of the present invention, as shown in FIG. 4E, the controller sets a first threshold TH1 for determining whether a touch touch event has occurred. This first threshold TH1 corresponds, for example, to a signal value of 300.

當觸控事件未發生時,感測輸出訊號Vout的值為 L0,其值為約50(此處感測輸出訊號Vout的值僅是用以表達訊號的大小關係,並無單位)。當發生單純的平面觸控事件(未重按壓)時,感測輸出訊號Vout的值為L1,其值為約150。如第4E圖所示,此值L1並未高於第一閥值TH1(例如對應訊號值300),故控制器可判斷並無按壓觸控事件發生。 When the touch event does not occur, the value of the sensed output signal Vout is L0 has a value of about 50 (where the value of the sensed output signal Vout is only used to express the magnitude relationship of the signal, there is no unit). When a simple planar touch event occurs (not repressed), the value of the sensed output signal Vout is L1, which is about 150. As shown in FIG. 4E, the value L1 is not higher than the first threshold TH1 (for example, the corresponding signal value 300), so the controller can determine that no touch event has occurred.

此外,應瞭解的是,感應電容Cf的電容值係與物體OB和第二電極EL2之間的間距df呈負相關。也就是說,當物體OB進行按壓使間距df變小,感應電容Cf的電容值將增大,使得感測輸出訊號Vout變大。 Further, it should be understood that the capacitance value of the sensing capacitor Cf is inversely related to the spacing df between the object OB and the second electrode EL2. That is, when the object OB is pressed to make the pitch df small, the capacitance value of the sensing capacitor Cf will increase, so that the sensing output signal Vout becomes large.

此外,感應電容Cp的電容值係與第二電極EL2和第三電極EL3之間的間距d呈負相關。也就是說,當物體OB進行按壓使間距d變小,感應電容Cp的電容值將增大,使得感測輸出訊號Vout變大。 Further, the capacitance value of the sensing capacitor Cp is negatively correlated with the spacing d between the second electrode EL2 and the third electrode EL3. That is, when the object OB is pressed to make the pitch d small, the capacitance value of the sensing capacitor Cp will increase, so that the sensing output signal Vout becomes large.

接著,參見第4F圖,該圖係根據本揭露一些實施例之觸控顯示裝置100之剖面圖。當物體OB進行重壓使得原間隙d及df變小為間隙d1及df1,此時由於第二電極EL2和第三電極EL3之間的間距變小,故感應電容Cp的電容值變大為電容Cp1。而由於物體OB和第二電極EL2之間的間距變小,故感應電容Cf的電容值變大為電容Cf1。此時,相關的等效電路係如第4G圖所示。因此,在按壓觸控事件發生時,感測輸出訊號Vout可表示如下: Next, referring to FIG. 4F, the figure is a cross-sectional view of a touch display device 100 according to some embodiments of the present disclosure. When the object OB is heavily pressed so that the original gaps d and df become smaller than the gaps d1 and df1, the capacitance between the second electrode EL2 and the third electrode EL3 becomes smaller, so that the capacitance of the sensing capacitor Cp becomes larger. Cp1. Since the pitch between the object OB and the second electrode EL2 becomes small, the capacitance value of the sensing capacitor Cf becomes large as the capacitance Cf1. At this time, the relevant equivalent circuit is as shown in Fig. 4G. Therefore, when the pressing touch event occurs, the sensing output signal Vout can be expressed as follows:

在本揭露之一些實施例中,當按壓觸控事件發生時,感測輸出訊號Vout的值為L2,其值為約300。如第4E圖所示,此值L2高於第一閥值TH1(例如對應訊號值250),故控制器可判斷此時發生按壓觸控事件。 In some embodiments of the present disclosure, when the pressing touch event occurs, the value of the sensing output signal Vout is L2, and the value is about 300. As shown in FIG. 4E, the value L2 is higher than the first threshold TH1 (for example, the corresponding signal value 250), so the controller can determine that the pressing touch event occurs at this time.

第5A圖係根據本揭露一些實施例之觸控顯示裝置100在無觸控事件發生時之剖面圖。在本揭露之一些實施例中,第5A圖例如為第2B圖於第一電極EL1處沿著第一方向A1之剖面圖。如第5圖所示,根據一些實施例,於第二基板SB2上對應第一電極EL1之區域中並無設置第三電極EL3,故金屬導線MT1無前述由第三電極EL3產生之電容Cp。 FIG. 5A is a cross-sectional view of the touch display device 100 according to some embodiments of the present disclosure when a touchless event occurs. In some embodiments of the present disclosure, FIG. 5A is, for example, a cross-sectional view of the second electrode B1 along the first direction A1 at the first electrode EL1. As shown in FIG. 5, according to some embodiments, the third electrode EL3 is not disposed in the region corresponding to the first electrode EL1 on the second substrate SB2, so the metal wire MT1 has no capacitance Cp generated by the third electrode EL3.

此外,如第5A圖所示,根據本揭露一些實施例,第一電極EL1係設於畫素電極124與第三電極EL3之間。 In addition, as shown in FIG. 5A, according to some embodiments of the present disclosure, the first electrode EL1 is disposed between the pixel electrode 124 and the third electrode EL3.

如第5A圖之相關的等效電路係如第5B圖所示。在無觸控事件發生時,感測輸出訊號Vout可表示如下: The equivalent circuit associated with Figure 5A is shown in Figure 5B. When no touch event occurs, the sensed output signal Vout can be expressed as follows:

如第5C圖所示,當物體OB(例如手指、觸控筆或其它任何可用於進行觸控操作的物體)碰觸觸控顯示裝置100時,物體OB與觸控顯示裝置100中的第二電極EL2之間會產生感應電容Cf。此時,相關的等效電路係如第5D圖所示,金屬導線MT1更看到感應電容Cf。因此,在單純平面觸控事件發生時,感測輸出訊號Vout可表示如下: As shown in FIG. 5C, when the object OB (for example, a finger, a stylus, or any other object that can be used for a touch operation) touches the touch display device 100, the object OB and the second of the touch display device 100 A sensing capacitor Cf is generated between the electrodes EL2. At this time, the relevant equivalent circuit is as shown in FIG. 5D, and the metal wire MT1 sees the sensing capacitance Cf more. Therefore, when a simple planar touch event occurs, the sensed output signal Vout can be expressed as follows:

由以上式5可知,當物體OB碰觸觸控顯示裝置100時,感測輸出訊號Vout會變大。亦即式5之感測輸出訊號Vout之值會大於式4之感測輸出訊號Vout之值。 As can be seen from the above formula 5, when the object OB touches the touch display device 100, the sense output signal Vout becomes large. That is, the value of the sense output signal Vout of Equation 5 is greater than the value of the sense output signal Vout of Equation 4.

參見第5E圖,該圖為根據本揭露一些實施例之感測輸出訊號之波形圖。在本揭露之一些實施例中,如第5E圖所示,控制器設一第二閥值TH2用以判斷有無發生平面觸控事件。此第二閥值TH2例如對應訊號值150。 See FIG. 5E, which is a waveform diagram of a sensed output signal in accordance with some embodiments of the present disclosure. In some embodiments of the present disclosure, as shown in FIG. 5E, the controller sets a second threshold TH2 for determining whether a planar touch event occurs. This second threshold TH2 corresponds, for example, to the signal value 150.

當平面觸控事件未發生時,感測輸出訊號Vout的值為L0,其值為約50(此處感測輸出訊號Vout的值僅是用以表達訊號的大小關係,並無單位)。當發生單純的平面觸控事件(未重按壓)時,感測輸出訊號Vout的值為L1,其值為約200。如第5E圖所示,此值L1高於第二閥值TH2(例如對應訊號值150),故控制器可判斷有發生平面觸控事件。 When the planar touch event does not occur, the value of the sensed output signal Vout is L0, and its value is about 50 (where the value of the sensed output signal Vout is only used to express the magnitude relationship of the signal, there is no unit). When a simple planar touch event occurs (no heavy press), the value of the sensed output signal Vout is L1, which is about 200. As shown in FIG. 5E, the value L1 is higher than the second threshold TH2 (for example, the corresponding signal value 150), so the controller can determine that a planar touch event has occurred.

第6圖係根據本揭露另外一些實施例之觸控顯示裝置600之剖面圖。此觸控顯示裝置600與前述之觸控顯示裝置100的主要差別在於,觸控顯示裝置600係一畫素電極124形成於共同電極(例如第二電極EL2及/或第一電極EL1)上方的結構(Top Pixel)。如第6圖所示,畫素電極124係形成於第一、第二電極EL1、EL2與第三電極EL3之間,並與第一基板SB1中的薄膜電晶體104電性連接。採用此架構一般而言可使觸控顯示裝置的光穿透率獲 得改善。觸控顯示裝置600的相關訊號操作及觸控判斷與前述實施例類似,故不另贅述。 Figure 6 is a cross-sectional view of a touch display device 600 in accordance with still other embodiments of the present disclosure. The main difference between the touch display device 600 and the touch display device 100 is that the touch display device 600 is formed by a pixel electrode 124 over a common electrode (for example, the second electrode EL2 and/or the first electrode EL1). Structure (Top Pixel). As shown in FIG. 6, the pixel electrode 124 is formed between the first and second electrodes EL1, EL2 and the third electrode EL3, and is electrically connected to the thin film transistor 104 in the first substrate SB1. Using this architecture generally allows the light transmittance of the touch display device to be obtained. Have to improve. The related signal operation and touch determination of the touch display device 600 are similar to those of the previous embodiment, and therefore are not described herein.

第7圖係根據本揭露另外一些實施例之觸控顯示裝置700之剖面圖。此觸控顯示裝置700與前述之觸控顯示裝置100的主要差別在於,第二基板SB2為背光單元(backlight unit),且設於第一基板SB1之下側。此外,在本揭露之一些實施例中,第三電極EL3可圖案化成條狀。然而,在本揭露其它一些實施例中,設於背光單元上之第三電極EL3可為一完整平面。 FIG. 7 is a cross-sectional view of a touch display device 700 in accordance with still other embodiments of the present disclosure. The main difference between the touch display device 700 and the touch display device 100 is that the second substrate SB2 is a backlight unit and is disposed on the lower side of the first substrate SB1. Moreover, in some embodiments of the present disclosure, the third electrode EL3 may be patterned into strips. However, in some other embodiments of the present disclosure, the third electrode EL3 disposed on the backlight unit may be a complete plane.

在此實施例中,第三電極EL3之材料可包括透明導電材料,例如為銦錫氧化物(ITO)、氧化錫(SnO)、氧化銦鋅(IZO)、氧化銦鎵鋅(IGZO)、氧化銦錫鋅(ITZO)、氧化銻錫(ATO)、氧化銻鋅(AZO)、上述之組合或其它任何適合之透明導電氧化物材料。 In this embodiment, the material of the third electrode EL3 may include a transparent conductive material such as indium tin oxide (ITO), tin oxide (SnO), indium zinc oxide (IZO), indium gallium zinc oxide (IGZO), oxidation. Indium tin zinc (ITZO), antimony tin oxide (ATO), antimony zinc oxide (AZO), combinations of the foregoing or any other suitable transparent conductive oxide material.

此外,在此實施例中,第三電極EL3與第一基板SB1之間設置有一介電層144,此介電層144例如為光學膠(Optically Clear Adhesive/Resin)層或空氣層。 In addition, in this embodiment, a dielectric layer 144 is disposed between the third electrode EL3 and the first substrate SB1. The dielectric layer 144 is, for example, an Optically Clear Adhesive/Resin layer or an air layer.

此外,在此實施例中,顯示裝置100亦可包括彩色濾光層基板146。且此彩色濾光層基板146係與作為背光單元之第二基板SB2分別設於第一基板SB1之相反側。例如,彩色濾光層基板146設於第一基板SB1之上側,第二基板SB26設於第一基板SB1之下側。 In addition, in this embodiment, the display device 100 may further include a color filter layer substrate 146. The color filter layer substrate 146 is disposed on the opposite side of the first substrate SB1 from the second substrate SB2 as a backlight unit. For example, the color filter layer substrate 146 is disposed on the upper side of the first substrate SB1, and the second substrate SB26 is disposed on the lower side of the first substrate SB1.

第8A圖係根據本揭露另外一些實施例之觸控顯示裝置800之上視圖。第8B圖係此觸控顯示裝置800之剖面圖。在第8A-8B圖的實施例中,觸控顯示裝置100更包括設於第一基板SB1 上之多條傳送電極Tx1~Txn,且此多條傳送電極Tx1~Txn與第一電極EL1及第二電極EL2交錯設置,並連接至控制器40。控制器40例如為一觸控控制單元。此外,控制器40可更進一步連接至另一控制器50,控制器50例如為一顯示控制單元。 FIG. 8A is a top view of a touch display device 800 according to other embodiments of the present disclosure. FIG. 8B is a cross-sectional view of the touch display device 800. In the embodiment of FIG. 8A-8B, the touch display device 100 further includes a first substrate SB1. The plurality of transfer electrodes Tx1 T Txn are arranged, and the plurality of transfer electrodes Tx1 T Txn are interleaved with the first electrode EL1 and the second electrode EL2 and connected to the controller 40. The controller 40 is, for example, a touch control unit. Further, the controller 40 can be further connected to another controller 50, such as a display control unit.

此外,如第8A圖所示,根據本發明一些實施例,每一條傳送電極Tx1~Txn包括設於第一基板SB1上之多個傳送電極單元TU以及多個橋接結構BG。每一橋接結構BG電性連接兩相鄰之傳送電極單元TU,以將多個傳送電極單元TU電性連接以形成一條傳送電極。 In addition, as shown in FIG. 8A, according to some embodiments of the present invention, each of the transfer electrodes Tx1 T Txn includes a plurality of transfer electrode units TU and a plurality of bridge structures BG disposed on the first substrate SB1. Each of the bridge structures BG is electrically connected to two adjacent transfer electrode units TU to electrically connect the plurality of transfer electrode units TU to form one transfer electrode.

在此實施例中,傳送電極Tx1~Txn、第一電極EL1及第二電極EL2係以互容式內嵌觸控結構來實現。在本揭露之一些實施例中,第一電極EL1及第二電極EL2為接收電極。 In this embodiment, the transfer electrodes Tx1 TTxn, the first electrode EL1, and the second electrode EL2 are implemented by a mutual capacitive touch structure. In some embodiments of the present disclosure, the first electrode EL1 and the second electrode EL2 are receiving electrodes.

在此實施例中,作為接收電極之第一電極EL1及第二電極EL2係以多行排列設置,而傳送電極Tx1~Txn係以多列排列設置。此外,如第8A-8B圖所示,根據本揭露一些實施例,兩個第一電極EL1與一個第二電極EL2彼此交替設置。然而,在本揭露其它一些實施例中,亦可為一個第一電極EL1與一個第二電極EL2彼此交替設置。 In this embodiment, the first electrode EL1 and the second electrode EL2 as the receiving electrodes are arranged in a plurality of rows, and the transfer electrodes Tx1 to Txn are arranged in a plurality of rows. Further, as shown in FIGS. 8A-8B, according to some embodiments of the present disclosure, the two first electrodes EL1 and one second electrode EL2 are alternately arranged with each other. However, in some other embodiments of the disclosure, a first electrode EL1 and a second electrode EL2 may be alternately arranged with each other.

如第8B圖所示,根據本揭露一些實施例,觸控顯示裝置800的第二基板SB2上係設置一介電層148(例如光學膠層或空氣層),而介電層148之上係設置一保護玻璃150。 As shown in FIG. 8B, according to some embodiments of the present disclosure, a dielectric layer 148 (eg, an optical adhesive layer or an air layer) is disposed on the second substrate SB2 of the touch display device 800, and the dielectric layer 148 is attached. A protective glass 150 is provided.

應注意的是,第8A圖所示之實施例僅為說明之用,本揭露之範圍並不以此為限。雖然第8A圖所示之實施例中一條傳送電極(或一個傳送電極單元TU)僅對應一條第三電極EL3,然 而一條傳送電極(或一個傳送電極單元TU)亦可對應其它數量之第三電極EL3,如第8C圖之實施例所示,此部分將於後文詳細說明。故本揭露之範圍並不以第8A圖所示之實施例為限。 It should be noted that the embodiment shown in FIG. 8A is for illustrative purposes only, and the scope of the disclosure is not limited thereto. Although in the embodiment shown in FIG. 8A, one of the transfer electrodes (or one transfer electrode unit TU) corresponds to only one third electrode EL3, A transfer electrode (or a transfer electrode unit TU) may also correspond to other numbers of third electrodes EL3, as shown in the embodiment of Fig. 8C, which will be described later in detail. Therefore, the scope of the disclosure is not limited to the embodiment shown in FIG. 8A.

第8C圖係根據本揭露另外一些實施例之觸控顯示裝置800’之上視圖。如第8C圖所示,根據本揭露一些實施例,一個傳送電極單元TU可覆蓋多行次畫素152、多行資料線154、以及多列閘極線(掃描線)156。例如,在本揭露之一些實施例中,一個傳送電極單元TU可覆蓋2至30行次畫素152、及2至30多行資料線154,例如覆蓋10至20行次畫素152、及10至20多行資料線154。此外,在本揭露之一些實施例中,一條傳送電極(或一個傳送電極單元TU)可對應5至30列閘極線(掃描線)156及第三電極EL3,例如10至20列閘極線(掃描線)156及第三電極EL3。 FIG. 8C is a top view of the touch display device 800' according to other embodiments of the present disclosure. As shown in FIG. 8C, in accordance with some embodiments of the present disclosure, a transfer electrode unit TU may cover a plurality of rows of pixels 152, a plurality of rows of data lines 154, and a plurality of columns of gate lines (scan lines) 156. For example, in some embodiments of the present disclosure, one of the transmitting electrode units TU may cover 2 to 30 rows of pixels 152, and 2 to 30 rows of data lines 154, for example, covering 10 to 20 lines of pixels 152, and 10 Up to 20 lines of data line 154. In addition, in some embodiments of the present disclosure, one transmitting electrode (or one transmitting electrode unit TU) may correspond to 5 to 30 columns of gate lines (scanning lines) 156 and third electrodes EL3, for example, 10 to 20 columns of gate lines. (scanning line) 156 and third electrode EL3.

此外,如第8C圖所示,根據本揭露一些實施例,一條第一電極EL1可覆蓋多行次畫素152、多行資料線154、以及多列閘極線(掃描線)156及第三電極EL3。例如,在本揭露之一些實施例中,一條第一電極EL1可覆蓋2至30行次畫素152、及2至30多行資料線154,例如覆蓋10至20行次畫素152、及10至20多行資料線154。此外,在本揭露之一些實施例中,一條第一電極EL1可對應5至30列閘極線(掃描線)156及第三電極EL3,例如10至20列閘極線(掃描線)156及第三電極EL3。 In addition, as shown in FIG. 8C, according to some embodiments of the present disclosure, a first electrode EL1 may cover a plurality of rows of pixels 152, a plurality of rows of data lines 154, and a plurality of columns of gate lines (scan lines) 156 and a third portion. Electrode EL3. For example, in some embodiments of the present disclosure, a first electrode EL1 may cover 2 to 30 rows of pixels 152, and 2 to 30 rows of data lines 154, for example, covering 10 to 20 rows of pixels 152, and 10 Up to 20 lines of data line 154. In addition, in some embodiments of the present disclosure, one first electrode EL1 may correspond to 5 to 30 columns of gate lines (scanning lines) 156 and third electrodes EL3, for example, 10 to 20 columns of gate lines (scanning lines) 156 and The third electrode EL3.

此外,如第8C圖所示,根據本揭露一些實施例,一條第二電極EL2亦可覆蓋多行次畫素152、多行資料線154、以及多列閘極線(掃描線)156。例如,在本揭露之一些實施例中,一條第二電極EL2可覆蓋2至30行次畫素152、及2至30多行資料線 154,例如覆蓋10至20行次畫素152、及10至20多行資料線154。此外,在本揭露之一些實施例中,一條第二電極EL2可對應5至30列閘極線(掃描線)156及第三電極EL3,例如10至20列閘極線(掃描線)156及第三電極EL3。 In addition, as shown in FIG. 8C, according to some embodiments of the present disclosure, a second electrode EL2 may also cover a plurality of rows of pixels 152, a plurality of rows of data lines 154, and a plurality of columns of gate lines (scan lines) 156. For example, in some embodiments of the present disclosure, one second electrode EL2 may cover 2 to 30 rows of pixels 152 and 2 to 30 rows of data lines. 154, for example, covers 10 to 20 rows of pixels 152, and 10 to 20 rows of data lines 154. In addition, in some embodiments of the present disclosure, one second electrode EL2 may correspond to 5 to 30 columns of gate lines (scan lines) 156 and third electrodes EL3, for example, 10 to 20 columns of gate lines (scan lines) 156 and The third electrode EL3.

第9A圖係根據本揭露另外一些實施例之觸控顯示裝置900之上視圖。第9B圖係此觸控顯示裝置900之剖面圖。在第9A-9B圖的實施例中,設於第二基板SB2上之第三電極EL3包括多條傳送電極Tx1~Txn,且此多條傳送電極Tx1~Txn與第一電極EL1及第二電極EL2交錯設置。 FIG. 9A is a top view of a touch display device 900 according to other embodiments of the present disclosure. FIG. 9B is a cross-sectional view of the touch display device 900. In the embodiment of the 9A-9B, the third electrode EL3 disposed on the second substrate SB2 includes a plurality of transfer electrodes Tx1 T Txn, and the plurality of transfer electrodes Tx1 T Txn and the first electrode EL1 and the second electrode EL2 interlaced settings.

此外,在此實施例中,第一電極EL1及第二電極EL2之間未設有傳送電極。 Further, in this embodiment, the transfer electrode is not provided between the first electrode EL1 and the second electrode EL2.

在此實施例中,傳送電極Tx1~Txn、第一電極EL1及第二電極EL2係以互容式內嵌觸控結構來實現。在本揭露之一些實施例中,第一電極EL1及第二電極EL2為接收電極。但並不以此為限,在本揭露另外一些實施例中,設於第二基板SB2上之第三電極EL3可包括多條接收電極,而第一電極EL1及第二電極EL2為傳送電極。 In this embodiment, the transfer electrodes Tx1 TTxn, the first electrode EL1, and the second electrode EL2 are implemented by a mutual capacitive touch structure. In some embodiments of the present disclosure, the first electrode EL1 and the second electrode EL2 are receiving electrodes. However, in other embodiments of the present disclosure, the third electrode EL3 disposed on the second substrate SB2 may include a plurality of receiving electrodes, and the first electrode EL1 and the second electrode EL2 are transmitting electrodes.

在此實施例中,作為接收電極之第一電極EL1及第二電極EL2係以多行排列設置,而傳送電極Tx1~Txn係以多列排列設置。此外,如第9A-9B圖所示,根據本揭露一些實施例,兩個第一電極EL1與一個第二電極EL2彼此交替設置。然而,在本揭露其它一些實施例中,亦可為一個第一電極EL1與一個第二電極EL2彼此交替設置。 In this embodiment, the first electrode EL1 and the second electrode EL2 as the receiving electrodes are arranged in a plurality of rows, and the transfer electrodes Tx1 to Txn are arranged in a plurality of rows. Further, as shown in FIGS. 9A-9B, according to some embodiments of the present disclosure, the two first electrodes EL1 and one second electrode EL2 are alternately arranged with each other. However, in some other embodiments of the disclosure, a first electrode EL1 and a second electrode EL2 may be alternately arranged with each other.

如第9B圖所示,根據本揭露一些實施例,觸控顯示 裝置900的第二基板SB2上係設置一介電層148(例如光學膠層或空氣層),而介電層148之上係設置一保護玻璃150。 As shown in FIG. 9B, according to some embodiments of the present disclosure, the touch display A dielectric layer 148 (eg, an optical adhesive layer or an air layer) is disposed on the second substrate SB2 of the device 900, and a protective glass 150 is disposed on the dielectric layer 148.

第9C圖為第9A圖之一條第一電極EL1之部分放大圖。如第9C圖所示,根據本揭露一些實施例,一條第一電極EL1可覆蓋多行次畫素152、多行資料線154、多列閘極線(掃描線)156、以及多列傳送電極。例如,在本揭露之一些實施例中,一條第一電極EL1可覆蓋3至30行次畫素152、及4至30多行資料線154,例如覆蓋10至20行次畫素152、及10至20多行資料線154。 Fig. 9C is a partially enlarged view of the first electrode EL1 of one of the sheets of Fig. 9A. As shown in FIG. 9C, according to some embodiments of the present disclosure, a first electrode EL1 may cover a plurality of rows of pixels 152, a plurality of rows of data lines 154, a plurality of columns of gate lines (scan lines) 156, and a plurality of columns of transfer electrodes. . For example, in some embodiments of the present disclosure, a first electrode EL1 may cover 3 to 30 rows of pixels 152, and 4 to 30 rows of data lines 154, for example, covering 10 to 20 rows of pixels 152, and 10 Up to 20 lines of data line 154.

此外,根據本揭露一些實施例,一條第一電極EL1可覆蓋3至30列閘極線156以及傳送電極,例如10至20列閘極線156以及傳送電極。此外,在本揭露之一些實施例中,第二電極EL2之配置與上述第一電極EL1相同或相似。 Further, according to some embodiments of the present disclosure, one first electrode EL1 may cover 3 to 30 columns of gate lines 156 and transfer electrodes, such as 10 to 20 columns of gate lines 156 and transfer electrodes. Moreover, in some embodiments of the present disclosure, the configuration of the second electrode EL2 is the same as or similar to the first electrode EL1 described above.

綜上所述,本揭露之一些實施例係於第一基板上同時設置用以偵測平面觸控事件之第一電極以及用以偵測按壓觸控事件之第二電極。透過此方式,觸控顯示裝置中將不需增設壓力感測器以專門感測按壓觸控事件,而控制器亦不用透過專屬的訊號通道以處理來自壓力感測器的壓力感測訊號。 In summary, some embodiments of the present disclosure are configured to simultaneously provide a first electrode for detecting a planar touch event and a second electrode for detecting a touch event on the first substrate. In this way, the touch sensor device does not need to add a pressure sensor to specifically sense the pressing touch event, and the controller does not need to use a dedicated signal channel to process the pressure sensing signal from the pressure sensor.

此外,本揭露之一些實施例將上述用以偵測平面觸控事件之第一電極以及用以偵測按壓觸控事件之第二電極彼此電性隔離,使上述第一電極以及第二電極可藉由獨立且不同之訊號通道分別將平面觸控感測訊號及按壓觸控感測訊號傳遞至控制器。故本揭露一些實施例之控制器可藉由上述平面觸控感測訊號單獨判斷平面觸控事件是否發生,並藉由上述按壓觸控感測訊號單獨判斷按壓觸控事件是否發生。 In addition, some embodiments of the present disclosure electrically isolate the first electrode for detecting a planar touch event and the second electrode for detecting a touch touch event, so that the first electrode and the second electrode are The planar touch sensing signal and the pressing touch sensing signal are respectively transmitted to the controller through independent and different signal channels. Therefore, the controller of the embodiment can determine whether the planar touch event occurs by using the flat touch sensing signal, and determine whether the pressing touch event occurs by pressing the touch sensing signal.

此外,由於本揭露一些實施例之觸控顯示裝置可單獨判斷按壓觸控事件是否發生,故可使觸控顯示裝置之按壓感測更為精準,且可實現多點及多階之按壓觸控感測。 In addition, since the touch display device of some embodiments can separately determine whether a pressing touch event occurs, the touch sensing device can be more accurately sensed and can perform multi-point and multi-step pressing touch. Sensing.

此外,應注意的是,熟習本技術領域之人士均深知,本揭露一些實施例所述之汲極與源極可互換,因其定義係與本身所連接的電壓位準有關。 In addition, it should be noted that those skilled in the art are well aware that the drains and sources described in some embodiments are interchangeable, as their definition is related to the voltage level to which they are connected.

值得注意的是,以上所述之元件尺寸、元件參數、以及元件形狀皆非為本揭露之限制條件。此技術領域中具有通常知識者可以根據不同需要調整這些設定值。另外,本揭露一些實施例之觸控顯示裝置並不僅限於第1A-9C圖所圖示之狀態。本揭露一些實施例可以僅包括第1A-9C圖之任何一或複數個實施例之任何一或複數項特徵。換言之,並非所有圖示之特徵均須同時實施於本揭露明一些實施例之觸控顯示裝置中。 It should be noted that the component sizes, component parameters, and component shapes described above are not limitations of the disclosure. Those of ordinary skill in the art can adjust these settings according to different needs. In addition, the touch display device of some embodiments is not limited to the state illustrated in FIG. 1A-9C. Some embodiments may include any one or more of the features of any one or a plurality of embodiments of Figures 1A-9C. In other words, not all of the illustrated features must be simultaneously implemented in the touch display device of some embodiments of the present disclosure.

雖然本揭露的實施例及其優點已揭露如上,但應該瞭解的是,任何所屬技術領域中具有通常知識者,在不脫離本揭露之精神和範圍內,當可作更動、替代與潤飾。此外,本揭露之保護範圍並未侷限於說明書內所述特定實施例中的製程、機器、製造、物質組成、裝置、方法及步驟,任何所屬技術領域中具有通常知識者可從本揭露一些實施例揭示內容中理解現行或未來所發展出的製程、機器、製造、物質組成、裝置、方法及步驟,只要可以在此處所述實施例中實施大抵相同功能或獲得大抵相同結果皆可根據本揭露一些實施例使用。因此,本揭露之保護範圍包括上述製程、機器、製造、物質組成、裝置、方法及步驟。另外,每一申請專利範圍構成個別的實施例,且本揭露之保護範圍也包 括各個申請專利範圍及實施例的組合。 Although the embodiments of the present disclosure and its advantages are disclosed above, it should be understood that those skilled in the art can make changes, substitutions, and refinements without departing from the spirit and scope of the disclosure. Furthermore, the scope of protection of the present disclosure is not limited to the processes, machines, manufactures, compositions, devices, methods and steps in the specific embodiments described in the specification, and any one of ordinary skill in the art may The present disclosure discloses processes, machines, manufacturing, material compositions, devices, methods, and steps that are currently or in the future, as long as they can perform substantially the same function or obtain substantially the same result in the embodiments described herein. Some embodiments are disclosed for use. Accordingly, the scope of protection of the present disclosure includes the above-described processes, machines, manufacturing, material compositions, devices, methods, and procedures. In addition, each patent application scope constitutes an individual embodiment, and the scope of protection of the disclosure also includes The scope of each patent application and the combination of the embodiments are included.

EL1‧‧‧第一電極 EL1‧‧‧ first electrode

EL2‧‧‧第二電極 EL2‧‧‧second electrode

EL3‧‧‧第三電極 EL3‧‧‧ third electrode

MT1‧‧‧金屬導線 MT1‧‧‧Metal wire

MT2‧‧‧金屬導線 MT2‧‧‧Metal wire

VH1‧‧‧連接孔 VH1‧‧‧ connection hole

VH2‧‧‧連接孔 VH2‧‧‧ connection hole

100‧‧‧觸控顯示裝置 100‧‧‧Touch display device

20‧‧‧控制器 20‧‧‧ Controller

GP‧‧‧間隙 GP‧‧‧ gap

1B-1B‧‧‧線段 1B-1B‧‧‧ line segment

Claims (20)

一種觸控顯示裝置,包括:一第一基板,包括複數個畫素及複數個薄膜電晶體;一第二基板,與該第一基板相對設置;一顯示介質,設置於該第一基板與該第二基板之間;一第一電極,形成於該第一基板之上,用以偵測平面觸控事件;一第二電極,形成於該第一基板之上,且與該第一電極電性隔離;及一第三電極,形成於該第二基板之上,其中該第二電極與該第三電極係用以偵測按壓觸控事件。 A touch display device includes: a first substrate comprising a plurality of pixels and a plurality of thin film transistors; a second substrate disposed opposite the first substrate; a display medium disposed on the first substrate and the a first electrode is formed on the first substrate for detecting a planar touch event; a second electrode is formed on the first substrate and electrically connected to the first electrode And a third electrode is formed on the second substrate, wherein the second electrode and the third electrode are used to detect a pressing touch event. 如申請專利範圍第1項所述之觸控顯示裝置,其中該觸控顯示裝置包括:複數個該第一電極,其中複數個該第一電極之間具有一間隙,且該第二電極係設於該間隙中。 The touch display device of claim 1, wherein the touch display device comprises: a plurality of the first electrodes, wherein a plurality of the first electrodes have a gap therebetween, and the second electrode is provided In the gap. 如申請專利範圍第2項所述之觸控顯示裝置,其中每一該薄膜電晶體與一資料線以及一掃描線電性連接,其中該資料線與該掃描線交錯設置,且該掃描線係沿著一第一方向延伸,其中該第二電極係設於平行於該第一方向之該間隙中。 The touch display device of claim 2, wherein each of the thin film transistors is electrically connected to a data line and a scan line, wherein the data line is interlaced with the scan line, and the scan line is Extending along a first direction, wherein the second electrode is disposed in the gap parallel to the first direction. 如申請專利範圍第2項所述之觸控顯示裝置,其中每一該薄膜電晶體與一資料線以及一掃描線電性連接,其中該資料線與該掃描線交錯設置,且該掃描線係沿著一第一方向延伸,其中該第二電極係設於垂直於該第一方向之該間隙中。 The touch display device of claim 2, wherein each of the thin film transistors is electrically connected to a data line and a scan line, wherein the data line is interlaced with the scan line, and the scan line is Extending along a first direction, wherein the second electrode is disposed in the gap perpendicular to the first direction. 如申請專利範圍第2項所述之觸控顯示裝置,其中每一該 薄膜電晶體與一資料線以及一掃描線電性連接,其中該資料線與該掃描線交錯設置,且該掃描線係沿著一第一方向延伸,其中該第二電極同時設於平行於該第一方向之該間隙以及垂直於該第一方向之該間隙中。 The touch display device of claim 2, wherein each of the The thin film transistor is electrically connected to a data line and a scan line, wherein the data line is interlaced with the scan line, and the scan line extends along a first direction, wherein the second electrode is simultaneously disposed parallel to the The gap in the first direction and in the gap perpendicular to the first direction. 如申請專利範圍第1項所述之觸控顯示裝置,其中該第一電極與該第二電極於一控制週期內選擇性地作為該些畫素的一共同電極(common electrode)層,或是用以偵測觸控事件的一觸控電極層。 The touch display device of claim 1, wherein the first electrode and the second electrode are selectively used as a common electrode layer of the pixels in a control period, or A touch electrode layer for detecting touch events. 如申請專利範圍第1項所述之觸控顯示裝置,其中每一該薄膜電晶體與一資料線以及一掃描線電性連接,且該資料線與該掃描線交錯設置,其中該第三電極之電極圖案與該資料線重疊或平行。 The touch display device of claim 1, wherein each of the thin film transistors is electrically connected to a data line and a scan line, and the data line is interleaved with the scan line, wherein the third electrode The electrode pattern is overlapped or parallel to the data line. 如申請專利範圍第1項所述之觸控顯示裝置,其中每一該薄膜電晶體與一資料線以及一掃描線電性連接,且該資料線與該掃描線交錯設置,其中該第三電極之電極圖案與該掃描線重疊或平行。 The touch display device of claim 1, wherein each of the thin film transistors is electrically connected to a data line and a scan line, and the data line is interleaved with the scan line, wherein the third electrode The electrode pattern overlaps or is parallel to the scan line. 如申請專利範圍第1項所述之觸控顯示裝置,其中每一該薄膜電晶體與一資料線以及一掃描線電性連接,且該資料線與該掃描線交錯設置,其中該第三電極之電極圖案與該資料線以及該掃描線重疊或平行。 The touch display device of claim 1, wherein each of the thin film transistors is electrically connected to a data line and a scan line, and the data line is interleaved with the scan line, wherein the third electrode The electrode pattern is overlapped or parallel to the data line and the scan line. 如申請專利範圍第1項所述之觸控顯示裝置,更包括:一連接元件,位於該觸控顯示裝置的一非顯示區,用以使該第三電極電性連接至該第一基板。 The touch display device of claim 1, further comprising: a connecting component disposed in a non-display area of the touch display device for electrically connecting the third electrode to the first substrate. 如申請專利範圍第1項所述之觸控顯示裝置,其中該第三電極之電壓係一共同電極電壓、一接地電壓或處於一浮接狀態。 The touch display device of claim 1, wherein the voltage of the third electrode is a common electrode voltage, a ground voltage, or a floating state. 如申請專利範圍第1項所述之觸控顯示裝置,更包括:一畫素電極,電性連接至其中一個該薄膜電晶體,其中該第一電極與該第二電極係設於該畫素電極與該第三電極之間。 The touch display device of claim 1, further comprising: a pixel electrode electrically connected to one of the thin film transistors, wherein the first electrode and the second electrode are disposed on the pixel Between the electrode and the third electrode. 如申請專利範圍第1項所述之觸控顯示裝置,更包括:一畫素電極,電性連接至其中一個該薄膜電晶體,且設於該第二電極與該第三電極之間。 The touch display device of claim 1, further comprising: a pixel electrode electrically connected to one of the thin film transistors and disposed between the second electrode and the third electrode. 如申請專利範圍第1項所述之觸控顯示裝置,其中該第二基板為彩色濾光基板。 The touch display device of claim 1, wherein the second substrate is a color filter substrate. 如申請專利範圍第1項所述之觸控顯示裝置,其中該第二基板為背光單元(backlight unit)。 The touch display device of claim 1, wherein the second substrate is a backlight unit. 如申請專利範圍第1項所述之觸控顯示裝置,更包括:複數條傳送電極,設於該第一基板上,其中該複數條傳送電極與該第一電極及該第二電極交錯設置。 The touch display device of claim 1, further comprising: a plurality of transmitting electrodes disposed on the first substrate, wherein the plurality of transmitting electrodes are interleaved with the first electrode and the second electrode. 如申請專利範圍第16項所述之觸控顯示裝置,其中每一條該傳送電極包括:複數個傳送電極單元,設於該第一基板上;及複數個橋接結構,其中每一該橋接結構電性連接兩相鄰之該傳送電極單元。 The touch display device of claim 16, wherein each of the transmitting electrodes comprises: a plurality of transmitting electrode units disposed on the first substrate; and a plurality of bridge structures, wherein each of the bridge structures is electrically The two adjacent transmitting electrode units are connected. 如申請專利範圍第16項所述之觸控顯示裝置,其中該第一電極及該第二電極為接收電極。 The touch display device of claim 16, wherein the first electrode and the second electrode are receiving electrodes. 如申請專利範圍第1項所述之觸控顯示裝置,其中該第三電極包括:複數條傳送電極,設於該第二基板上,其中該複數條傳送電極與該第一電極及該第二電極交錯設置。 The touch display device of claim 1, wherein the third electrode comprises: a plurality of transmitting electrodes disposed on the second substrate, wherein the plurality of transmitting electrodes and the first electrode and the second The electrodes are staggered. 如申請專利範圍第19項所述之觸控顯示裝置,其中該第一電極及該第二電極為接收電極。 The touch display device of claim 19, wherein the first electrode and the second electrode are receiving electrodes.
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Cited By (3)

* Cited by examiner, † Cited by third party
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CN110488543A (en) * 2019-01-21 2019-11-22 友达光电股份有限公司 Display device
TWI685775B (en) * 2018-11-13 2020-02-21 友達光電股份有限公司 Touch module and operation method of touch module
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Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111356972A (en) * 2017-12-11 2020-06-30 深圳市柔宇科技有限公司 Touch panel, pressure touch sensing structure thereof and touch pressure judgment method
TWI676837B (en) * 2018-04-24 2019-11-11 友達光電股份有限公司 Pixel array substrate
CN109101138A (en) * 2018-08-21 2018-12-28 武汉华星光电半导体显示技术有限公司 Array substrate and display panel
CN209044564U (en) * 2019-01-02 2019-06-28 京东方科技集团股份有限公司 A kind of array substrate, In-cell touch panel and display device

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5855604B2 (en) * 2013-02-23 2016-02-09 日本写真印刷株式会社 Touch panel with pressure measurement
CN204990228U (en) * 2015-06-10 2016-01-20 宸鸿科技(厦门)有限公司 Touch device
CN204965385U (en) * 2015-10-15 2016-01-13 京东方科技集团股份有限公司 In cell touch panel and display device
CN205121513U (en) * 2015-10-26 2016-03-30 京东方科技集团股份有限公司 In cell touch panel and display device

Cited By (4)

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CN110488543A (en) * 2019-01-21 2019-11-22 友达光电股份有限公司 Display device
CN110488543B (en) * 2019-01-21 2022-01-21 友达光电股份有限公司 Display device
TWI758838B (en) * 2020-08-25 2022-03-21 大陸商業成光電(無錫)有限公司 Touch structure, electronic device and method for driving touch structure

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